Photoluminescence Study of Copper Selenide Thin Films: K.S Urmila, Namitha Asokan T and B.Pradeep
Photoluminescence Study of Copper Selenide Thin Films: K.S Urmila, Namitha Asokan T and B.Pradeep
Photoluminescence Study of Copper Selenide Thin Films: K.S Urmila, Namitha Asokan T and B.Pradeep
Solid State Physics Laboratory, Cochin University of Science and Technology, Kochi 682 022, Kerala, India
E-mail: urmilaks7@gmail.com
Abstract. Thin films of Copper Selenide of composition of composition Cu 7Se4 with thickness 350nm are deposited on
glass substrate at a temperature of 498K±5K and pressure of 10-5 mbar using reactive evaporation, a variant of Gunther’s
three temperature method with high purity Copper (99.999%) and Selenium (99.99%) as the elemental starting material.
The deposited film is characterized structurally using X-ray Diffraction. The structural parameters such as lattice
constant, particle size, dislocation density; number of crystallites per unit area and strain in the film are evaluated.
Photoluminescence of the film is analyzed at room temperature using Fluoro Max-3 Spectrofluorometer.
770
X-Ray Diffraction (XRD) analysis is used to 1
identify the phase and structure of the film and is ρ=
D2
carried out using Rigaku D MaxC X-Ray The number of crystallites N per unit area is
Diffractometer for 2 varying from 100 to 900 with estimated as 16.204
1014 m-2 using the relation [15]
CuK (1.5404 Ǻ) as the radiation source. The t
accelerating voltage is 30 KV and tube current is N= 3
20mA. Photoluminescence spectrum of the film is D
recorded at room temperature using Fluoro Max-3 where t is the thickness of the film.
Spectrofluorometer that functions under the control of The strain is calculated as 9.899
10-1 using the
DataMax Spectroscopy software. The excitation expression [15]
source used is a 150W Xenon flash lamp. 1 λ
S= βcos θ
sinθ D
RESULTS AND DISCUSSION
Photoluminescence Properties
Structural Properties
PL spectrum of a typical Cu7Se4 thin film of
The XRD pattern of the as prepared Cu7Se4 thin thickness 350nm is shown in figure 2.
film of thickness 350nm is shown in figure 1.
5500
60000
(222) 5000
50000 4500
4000
Intensity(arbitrary units)
3000
30000
2500
20000
2000
1500
10000
1000
0 500
0 20 40 60 80 100
0
2(Degree)
600 650 700 750 800 850 900
Wavelength (nm)
771
CONCLUSION 5. Ivan Grozdanov, Synthetic Metals 63, 213-216 (1994).
6. R.N.O’Brien and K.S.V. Santhanam, Journal of the
Electrochemical Society 139, 434-437 (1992).
Copper Selenide thin films of composition Cu7Se4 7. Z.A. Talib, L.Y.C Josephine, W.M.M. Yunus, Z.Zainal,
are successfully deposited on glass substrates under S.A.Halim, M.M. Moksin, K.P. Lim and W.D.W.
optimized deposition conditions using reactive Yusoff, Solid State Science and Technology 16, 147-152
evaporation. XRD shows that the prepared films are (2008).
polycrystalline in nature. The films possess a simple 8. V.M. Garcia, P.K. Nair and M.T.S. Nair, Journal of
cubic structure. Structural parameters such as lattice Crystal Growth 203, 113-124 (1999).
constant, particle size, dislocation density; number of 9. L.Thousin, S.Rouquette- Sanchez and J. Vedel,
crystallites per unit area and strain in the film are Electrochimica Acta 38, 2387-2394 (1993).
10. J. Ying Chyi Liew, Zainal. A. Talib, W. Mahmood M.
estimated. PL spectrum of the sample is recorded at
Yunus, Zulkarnain Zainal, Shaari A. Halim, Mohd M.
room temperature. PL emissions are observed at Moksin, Wan Mohd Yusoff and K. Pah Lim, Central
energies 2.1eV, 1.9eV and 1.5eV. The excitation European Journal of Physics 7, 379-384 (2009).
wavelength given is 550nm. The film shows p-type 11. Santhosh.K.Haram and K.S.V. Santhanam, Journal of
conductivity, which on further work, can be Electroanalytical Chemistry 396, 63-68 (1995).
considered as an absorber layer in solar cell 12. Ming-Zhe Xue, Yong- Ning Zhou, Bin Zhang, Le Yu,
fabrication. Hua Zhang and Zheng-Wen Fu, Journal of the
Electrochemical Society 153, A2262-A2268 (2006).
13. Karl-Georg Gunther, “Interfacial and Condensation
ACKNOWLEDGMENTS Processes Occurring with Multicomponent Vapours”, in
The Use of Thin Films in Physical Investigations, edited
The first author (UKS) would like to thank Cochin by J.C. Anderson, London: Academic press, 1996, pp.
University of Science and Technology for financial 213-232.
support in the form of Research Fellowship. Second 14. M.C. Santhosh Kumar and B. Pradeep, Semiconductor
author (NAT) would like to thank UGC for financial Science and Technology 17, 261-265 (2002).
assistance in the form of research fellowship RFSMS. 15. M. Dhanam, P.K. Manoj and Rajeev. R. Prabhu,
Journal of Crystal Growth 280, 425-435 (2005).
16. Urmila K.S, Namitha Asokan. T and B.Pradeep,
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