[go: up one dir, main page]

 
 
Sign in to use this feature.

Years

Between: -

Subjects

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Journals

Article Types

Countries / Regions

Search Results (112)

Search Parameters:
Keywords = RF MEMS

Order results
Result details
Results per page
Select all
Export citation of selected articles as:
18 pages, 4912 KiB  
Article
Piezoelectrically and Capacitively Transduced Hybrid MEMS Resonator with Superior RF Performance and Enhanced Parasitic Mitigation by Low-Temperature Batch Fabrication
by Adnan Zaman, Ugur Guneroglu, Abdulrahman Alsolami and Jing Wang
Appl. Sci. 2024, 14(18), 8166; https://doi.org/10.3390/app14188166 - 11 Sep 2024
Viewed by 266
Abstract
This study investigates a hybrid microelectromechanical system (MEMS) acoustic resonator through a hybrid approach to combine capacitive and piezoelectric transduction mechanisms, thus harnessing the advantages of both transducer technologies within a single device. By seamlessly integrating both piezoelectric and capacitive transducers, the newly [...] Read more.
This study investigates a hybrid microelectromechanical system (MEMS) acoustic resonator through a hybrid approach to combine capacitive and piezoelectric transduction mechanisms, thus harnessing the advantages of both transducer technologies within a single device. By seamlessly integrating both piezoelectric and capacitive transducers, the newly designed hybrid resonators mitigate the limitations of capacitive and piezoelectric resonators. The unique hybrid configuration holds promise to significantly enhance overall device performance, particularly in terms of quality factor (Q-factor), insertion loss, and motional impedance. Moreover, the dual-transduction approach improves the signal-to-noise ratio and reduces feedthrough noise levels at higher frequencies. In this paper, the detailed design, complex fabrication processes, and thorough experimental validation are presented, demonstrating substantial performance enhancement potentials. A hybrid disk resonator with a single side-supporting anchor achieved an outstanding loaded Q-factor higher than 28,000 when operating under a capacitive drive and piezoelectric sense configuration. This is comparably higher than the measured Q-factor of 7600 for another disk resonator with two side-supporting anchors. The hybrid resonator exhibits a high Q-factor at its resonance frequency at 20 MHz, representing 2-fold improvement over the highest reported Q-factor for similar MEMS resonators in the literature. Also, the dual-transduction approach resulted in a more than 30 dB improvement in feedthrough suppression for devices with a 500 nm-thick ZnO layer, while hybrid resonators with a thicker piezoelectric layer of 1300 nm realized an even greater feedthrough suppression of more than 50 dB. The hybrid resonator integration strategy discussed offers an innovative solution for current and future advanced RF front-end applications, providing a versatile platform for future innovations in on-chip resonator technology. This work has the potential to lead to advancements in MEMS resonator technology, facilitating some significant improvements in multi-frequency and frequency agile RF applications through the original designs equipped with integrated capacitive and piezoelectric transduction mechanisms. The hybrid design also results in remarkable performance metrics, making it an ideal candidate for integrating next-generation wireless communication devices where size, cost, and energy efficiency are critical. Full article
(This article belongs to the Section Acoustics and Vibrations)
Show Figures

Figure 1

Figure 1
<p>Schematic illustration of electrode and anchor design configurations for a hybrid MEMS resonator. This hybrid resonator integrates capacitive and piezoelectric transducers, which are designed to enhance performance metrics such as quality factor, insertion loss, and motional impedance, and so on.</p>
Full article ">Figure 2
<p>COMSOL<sup>®</sup> finite element eigenfrequency simulation depicting the first four lateral extensional contour modes of a disk-shaped resonator: (<b>a</b>) 1st lateral extensional mode, (<b>b</b>) 2nd lateral extensional mode, (<b>c</b>) 3rd lateral extensional mode, (<b>d</b>) 4th lateral extensional mode.</p>
Full article ">Figure 3
<p>(<b>a</b>) Top-view (3D) and (<b>b</b>) cross-sectional view (3D) diagrams of proposed hybrid resonator; (<b>c</b>–<b>f</b>) step-by-step illustration of the simplified fabrication process flow of a hybrid lateral extensional mode resonator with capacitive and piezoelectric transducers. The process begins with the preparation of a silicon-on-insulator (SOI) wafer and proceeds through steps such as photolithography, deep-reactive ion-etching (DRIE), atomic layer deposition (ALD) for gap spacing, and the deposition of a ZnO piezoelectric layer, which concludes with the final releasing step to suspend the resonator structure.</p>
Full article ">Figure 4
<p>(<b>a</b>) Top-view microscope image of the fabricated hybrid resonator after etching the ZnO piezoelectric transducer and silicon device layer to define the disk resonator body, (<b>b</b>) Zoomed-in view of the device showing piezoelectric and capacitive transducers. (<b>c</b>) Further zoomed-in view photo showing the resonator body with piezoelectric and capacitive electrodes, and the capacitive air gap between the resonator body and the capacitive electrode.</p>
Full article ">Figure 5
<p>Conceptual illustration of the primary feedthrough signal paths with different strengths for (<b>a</b>) a capacitively transduced resonator, and (<b>b</b>) a piezoelectrically transduced resonator.</p>
Full article ">Figure 6
<p>Cross-sectional schematic of a resonator device fabricated in an SOI wafer depicting the LCR circuit components, showing the key parasitics between electrodes and through the substrate, for (<b>a</b>) a capacitively transduced resonator, and (<b>b</b>) a piezoelectrically transduced resonator.</p>
Full article ">Figure 7
<p>Illustration of signal paths for a hybrid capacitive/piezoelectric resonator with reduced feedthrough as the device operates under different configurations, including (<b>a</b>) piezoelectric drive and capacitive sense, and (<b>b</b>) capacitive drive and piezoelectric sense.</p>
Full article ">Figure 8
<p>Illustration of RF probe measurement set-up for hybrid resonator devices with a set of two capacitive ports and another one or a pair of piezoelectric transducer ports, fully isolated by the resonator body and ground, showing two different activation schemes to generate electrostatic force in the capacitive gap. (<b>a</b>) One applies an AC voltage to the capacitive electrodes and a DC voltage to the resonator body with two anchors to generate electrostatic force; and (<b>b</b>) The other applies both AC and DC voltages to the capacitive electrodes to induce electrostatic force in the capacitive gap for a resonator design with wider capacitive electrodes and one side-supporting anchor.</p>
Full article ">Figure 9
<p>Measured feedthrough levels versus frequency for piezoelectric only, capacitive only, and hybrid resonators with different thin-film piezoelectric transducer thicknesses. The measured feedthrough level of a CS−5 calibration standard is included that exhibits a feedthrough level on par to that of a hybrid device.</p>
Full article ">Figure 10
<p>Measured broadband frequency response of a 125 µm−radius hybrid disk resonator with a 5 µm−thick Si device layer operating in its 1st later extensional mode, which is actuated by the fully integrated capacitive transducer through its surrounding electrodes and detected by a piezoelectric transducer via a pair of top electrodes on top of the ZnO piezoelectric layer.</p>
Full article ">Figure 11
<p>Measured broadband frequency response of a 150 µm−radius hybrid disk resonator, with a 5 µm−thick Si device layer operating in its 4th later extensional mode, which is actuated by the fully integrated capacitive transducer through its surrounding electrodes and detected by a piezoelectric transducer via a pair of top electrodes on top of the ZnO piezoelectric layer.</p>
Full article ">
13 pages, 6510 KiB  
Article
Temperature Effects in Packaged RF MEMS Switches with Optimized Gold Electroplating Process
by Lifeng Wang, Lili Jiang, Ning Ma and Xiaodong Huang
Micromachines 2024, 15(9), 1085; https://doi.org/10.3390/mi15091085 - 28 Aug 2024
Viewed by 341
Abstract
Due to its excellent electrical performance, mechanical reliability, and thermal stability, electroplated gold is still the most commonly used material for movable beams in RF MEMS switches. This paper investigates the influence of process conditions on the quality and growth rate of gold [...] Read more.
Due to its excellent electrical performance, mechanical reliability, and thermal stability, electroplated gold is still the most commonly used material for movable beams in RF MEMS switches. This paper investigates the influence of process conditions on the quality and growth rate of gold electroplating, and the optimized process parameters for the gold electroplating process are obtained. The characterization of the optimized electroplated gold layer shows that it has small surface roughness and excellent thermal stability. With this optimized gold electroplating process, the RF MEMS switches are fabricated and hermetic packaged. In order to obtain the temperature environment adaptability of the packaged switch, the influence of working temperature is studied. The temperature effects on mechanical performance (includes pull-in voltage and lifetime) and RF performance (includes insertion loss and isolation) are revealed. Full article
Show Figures

Figure 1

Figure 1
<p>RF MEMS switch design: (<b>a</b>) Schematic diagram of the switch; (<b>b</b>) The cross-sectional view of the movable part; (<b>c</b>) Simulated ON state RF performances of the designed switch witch package; (<b>d</b>) Simulated OFF state RF performances of the designed switch with the package.</p>
Full article ">Figure 2
<p>Relationship between the duty ratio of the pulse and the deposition rate of electroplating. Electroplating condition: frequency is 1 kHz, current density is 0.5 A/dm<sup>2</sup>, temperature is 50 °C, flow rate is 20 L/min. The insets show the grain size at different duty ratios.</p>
Full article ">Figure 3
<p>Relationship between current density and deposition rate. Electroplating condition: frequency is 1 kHz, duty ratio is 50%, temperature is 50 °C, flow rate is 20 L/min. The insets are the electroplated gold surface at different current densities.</p>
Full article ">Figure 4
<p>Relationship between temperature and deposition rate. Electroplating condition: frequency is 1 kHz, duty ratio is 50%, current density is 0.5 A/dm<sup>2</sup>, flow rate is 20 L/min. The insets show the electroplated gold surface at different temperatures.</p>
Full article ">Figure 5
<p>The surface roughness of the electroplated gold tested by AFM.</p>
Full article ">Figure 6
<p>Profile scans of the released electroplated gold beam. The inset displays the released gold beam and profile scanning path.</p>
Full article ">Figure 7
<p>(<b>a</b>) SEM image of the fabricated switch. (<b>b</b>) SEM image of the switch with a hermetic package.</p>
Full article ">Figure 8
<p>An automatic testing system for pull-in voltage and lifetime test of the switch.</p>
Full article ">Figure 9
<p>Temperature effect on the pull-in voltage of the packaged switches.</p>
Full article ">Figure 10
<p>The pull-in voltage shift with the operation time at different temperatures.</p>
Full article ">Figure 11
<p>Electric field distribution of the switch under DC bias voltage.</p>
Full article ">Figure 12
<p>The lifetime of the switches at different temperatures.</p>
Full article ">Figure 13
<p>The insertion loss and isolation curves of the packaged switch measured at room temperature.</p>
Full article ">Figure 14
<p>The RF performance variation of the switches working at different temperature environments: (<b>a</b>) The insertion loss variation of three switch samples versus temperature @ 30 GHz; (<b>b</b>) The isolation variation of three switch samples versus temperature @ 30 GHz; (<b>c</b>) The insertion loss variation at different operation frequencies versus temperature; (<b>d</b>) The isolation variation at different operation frequencies versus temperature.</p>
Full article ">
14 pages, 12721 KiB  
Article
Stress Suppression Design for Radiofrequency Microelectromechanical System Switch Based on a Flexible Substrate
by Kang Wang, Zhaoer Chai, Yutang Pan, Chuyuan Gao, Yaxin Xu, Jiawei Ren, Jie Wang, Fei Zhao, Ming Qin and Lei Han
Materials 2024, 17(16), 4068; https://doi.org/10.3390/ma17164068 - 16 Aug 2024
Viewed by 363
Abstract
A novel stress suppression design for flexible RF MEMS switches has been presented and demonstrated through theoretical and experimental research to isolate the stress caused by substrate bending. An RF MEMS switch with an S-shaped microspring structure was fabricated by the two-step etching [...] Read more.
A novel stress suppression design for flexible RF MEMS switches has been presented and demonstrated through theoretical and experimental research to isolate the stress caused by substrate bending. An RF MEMS switch with an S-shaped microspring structure was fabricated by the two-step etching process as a developmental step toward miniaturization and high reliability. The RF MEMS switches with an S-shaped microspring exhibited superior microwave performance and stable driving voltage under different substrate curvatures compared to the conventional non-microspring switches, demonstrating that the bending stress is successfully suppressed by the S-shaped microspring and the island structure. Furthermore, this innovative design could be easily extended to other flexible devices. Full article
Show Figures

Figure 1

Figure 1
<p>A model of an electrostatic double-clamped switch.</p>
Full article ">Figure 2
<p>Stretched line model of the double-clamped switch.</p>
Full article ">Figure 3
<p>The two-dimension model of the double-clamped beam under the bending condition.</p>
Full article ">Figure 4
<p>The 2D model of the beam without a spring structure under bending.</p>
Full article ">Figure 5
<p>The 2D model of the S-shaped microspring.</p>
Full article ">Figure 6
<p>The design of the S-shaped microspring structure.</p>
Full article ">Figure 7
<p>The simulated and calculated driving voltages of switches with non-microsprings and S-shaped microsprings as the substrate bending curvature increases.</p>
Full article ">Figure 8
<p>The simulated results of the non-microspring switch in the on state. (<b>a</b>) Return loss S<sub>11</sub>; (<b>b</b>) insertion loss S<sub>21</sub>.</p>
Full article ">Figure 9
<p>The simulated results of the S-shaped microspring switch in the on state. (<b>a</b>) Return loss S<sub>11</sub>; (<b>b</b>) insertion loss S<sub>21</sub>.</p>
Full article ">Figure 10
<p>The simulated results of the stress distribution. (<b>a</b>) Non-microspring structure; (<b>b</b>) S-shaped microspring structure.</p>
Full article ">Figure 11
<p>The fabrication of S-shaped microspring structures. (<b>a</b>) sample preparation; (<b>b</b>) laser etching; (<b>c</b>) temporary bonding; (<b>d</b>) preparation of functional layers; (<b>e</b>) debonding; (<b>f</b>) the backside etching to get the S-shaped microspring.</p>
Full article ">Figure 12
<p>An optical image of two types of switches. (<b>a</b>) A switch with a non-microspring structure; (<b>b</b>) a switch with an S-shaped microspring structure.</p>
Full article ">Figure 13
<p>(<b>a</b>) The test circuit for the driving voltage and the microwave performance. (<b>b</b>) The measurement setup for testing the as-fabricated switches.</p>
Full article ">Figure 14
<p>The measured and calculated driving voltage of a switch with a non-microspring structure.</p>
Full article ">Figure 15
<p>The measured driving voltage of non-microspring and S-shaped microspring switches as the bending curvature increases.</p>
Full article ">Figure 16
<p>The measured results of the non-microspring switch in the on state. (<b>a</b>) Return loss S<sub>11</sub>; (<b>b</b>) insertion loss S<sub>21</sub>.</p>
Full article ">Figure 17
<p>The measured results of the S-shaped microspring switch in the on state. (<b>a</b>) Return loss S<sub>11</sub>; (<b>b</b>) insertion loss S<sub>21</sub>.</p>
Full article ">Figure 18
<p>The isolation S<sub>21</sub> of two types of switches in the off state. (<b>a</b>) the non-microspring switch; (<b>b</b>) the S-shaped microspring switch.</p>
Full article ">
16 pages, 4273 KiB  
Article
The Design, Simulation, and Parametric Optimization of an RF MEMS Variable Capacitor with an S-Shaped Beam
by Shakila Shaheen, Tughrul Arslan and Peter Lomax
Micro 2024, 4(3), 474-489; https://doi.org/10.3390/micro4030030 - 14 Aug 2024
Viewed by 561
Abstract
This study presents the design and simulation of an RF MEMS variable capacitor with a high tuning ratio and high linearity factor of capacitance–voltage response. An electrostatic torsion actuator with planar and non-planar structures is presented to obtain the high tuning ratio by [...] Read more.
This study presents the design and simulation of an RF MEMS variable capacitor with a high tuning ratio and high linearity factor of capacitance–voltage response. An electrostatic torsion actuator with planar and non-planar structures is presented to obtain the high tuning ratio by avoiding the occurrence of pull-in point. In the proposed design, the capacitor plate is connected to the electrostatic actuators by using the s-shaped beam. The proposed design shows a 138% tuning ratio with the planar structure of the actuator and 167% tuning ratio by implementing the non-planar structure. A linearity factor of 99% is attained by adjusting the rates at which the capacitor plate rises as the actuation voltage increases and the rate at which the capacitance decreases as the plate rises. Parametric optimization of the design is performed by utilizing the finite element method (FEM) analysis and high-frequency structural simulator (HFSS) analysis to obtain an optimized high-tuning ratio RF MEMS varactor at low actuation voltage. S-parameters of the design are presented on HFSS, with a 50 ohm coplanar waveguide (CPW) serving as the transmission line. The proposed RF MEMS varactor can be utilized in tunable RF devices. Full article
Show Figures

Figure 1

Figure 1
<p>Schematic view of the (<b>a</b>) conventional MEMS variable capacitor and (<b>b</b>) proposed MEMS variable capacitor showing linear capacitance–voltage response.</p>
Full article ">Figure 2
<p>Schematic view of the (<b>a</b>) proposed RF MEMS variable capacitor and (<b>b</b>) electrostatic actuator.</p>
Full article ">Figure 3
<p>(<b>a</b>) Simplified view of the RF MEMS variable capacitor in un-actuated condition (<b>b</b>) up state of the proposed RF MEMS varactor after applying the voltage.</p>
Full article ">Figure 4
<p>Top view of proposed RF MEMS variable capacitor.</p>
Full article ">Figure 5
<p>ANSYS results showing central plate displacement in the z-direction.</p>
Full article ">Figure 6
<p>Graphical view of (<b>a</b>) central plate displacement (<b>b</b>) capacitance.</p>
Full article ">Figure 7
<p>(<b>a</b>) Von Mises stress analysis (<b>b</b>) showing maximum stress at the end of torsion springs.</p>
Full article ">Figure 8
<p>HFSS layout of the proposed RF MEMS variable capacitor.</p>
Full article ">Figure 9
<p>Scattering parameters of RF-MEMS variable capacitor in OFF state: (<b>a</b>) return loss; (<b>b</b>) insertion loss.</p>
Full article ">Figure 10
<p>RF-MEMS variable capacitor in un-actuated condition: (<b>a</b>) return loss; (<b>b</b>) insertion loss.</p>
Full article ">Figure 11
<p>RF-MEMS variable capacitor in actuated condition: (<b>a</b>) return loss; (<b>b</b>) insertion loss.</p>
Full article ">Figure 12
<p>Parametric optimization approach for proposed RF MEMS variable capacitor.</p>
Full article ">Figure 13
<p>Comparison of (<b>a</b>) central plate displacement at different electrode lengths and (<b>b</b>) up-capacitance at different electrode lengths.</p>
Full article ">Figure 14
<p>ANSYS APDL results at different lengths of s-shaped beam: (<b>a</b>) 290 um; (<b>b</b>) 190 um.</p>
Full article ">Figure 15
<p>Comparison of (<b>a</b>) central plate displacement at different torsion spring lengths and (<b>b</b>) up-capacitance at different torsion spring lengths.</p>
Full article ">Figure 16
<p>Comparison of the (<b>a</b>) return loss and (<b>b</b>) insertion loss at different gaps between the plates in the capacitor section.</p>
Full article ">Figure 17
<p>Top view of the non-planar electrostatic actuator.</p>
Full article ">Figure 18
<p>Graphical representation of RF-MEMS variable capacitor showing (<b>a</b>) central plate displacement and (<b>b</b>) central plate capacitance.</p>
Full article ">
19 pages, 8806 KiB  
Article
Discussion and Demonstration of RF-MEMS Attenuators Design Concepts and Modules for Advanced Beamforming in the Beyond-5G and 6G Scenario—Part 2
by Girolamo Tagliapietra, Flavio Giacomozzi, Massimiliano Michelini, Romolo Marcelli, Giovanni Maria Sardi and Jacopo Iannacci
Micromachines 2024, 15(7), 895; https://doi.org/10.3390/mi15070895 - 9 Jul 2024
Viewed by 2886
Abstract
In this paper, different concepts of reconfigurable RF-MEMS attenuators for beamforming applications are proposed and critically assessed. Capitalizing on the previous part of this work, the 1-bit attenuation modules featuring series and shunt resistors and low-voltage membranes (7–9 V) are employed to develop [...] Read more.
In this paper, different concepts of reconfigurable RF-MEMS attenuators for beamforming applications are proposed and critically assessed. Capitalizing on the previous part of this work, the 1-bit attenuation modules featuring series and shunt resistors and low-voltage membranes (7–9 V) are employed to develop a 3-bit attenuator for fine-tuning attenuations (<−10 dB) in the 24.25–27.5 GHz range. More substantial attenuation levels are investigated using fabricated samples of coplanar waveguide (CPW) sections equipped with Pi-shaped resistors aiming at attenuations of −15, −30, and −45 dB. The remarkable electrical features of such configurations, showing flat attenuation curves and limited return losses, and the investigation of a switched-line attenuator design based on them led to the final proposed concept of a low-voltage 24-state attenuator. Such a simulated device combines the Pi-shaped resistors for substantial attenuations with the 3-bit design for fine-tuning operations, showing a maximum attenuation level of nearly −50 dB while maintaining steadily flat attenuation levels and limited return losses (<−11 dB) along the frequency band of interest. Full article
Show Figures

Figure 1

Figure 1
<p>(<b>a</b>) Top view and (<b>b</b>) magnified view representing the beams of the first variant (Dev1), (<b>c</b>) magnified view of the second (Dev2), and (<b>d</b>) third variant (Dev3).</p>
Full article ">Figure 2
<p>Simulated pull-in voltage of the three discussed membranes (dot marks) and their measured pull-in voltage by resistance drop along the RF signal line (square marks).</p>
Full article ">Figure 3
<p>(<b>a</b>) Basic attenuator module based on a series resistor, (<b>b</b>) basic attenuator module based on two shunt resistors, (<b>c</b>) equivalent circuit topology of the series module, in which the resistor is short-circuited upon the actuation of the membrane, and (<b>d</b>) equivalent circuit topology of the shunt module.</p>
Full article ">Figure 4
<p>Circuital model describing the working principle of the basic attenuator module based on: (<b>a</b>) one series resistor, and (<b>b</b>) two shunt equal resistors.</p>
Full article ">Figure 5
<p>Behavior of the Insertion Loss for the CPW loaded by a series resistor, as a function of the resistor value.</p>
Full article ">Figure 6
<p>Behavior of the Insertion Loss for the CPW loaded by two equal shunt resistors, as a function of the resistor value.</p>
Full article ">Figure 7
<p>(<b>a</b>) Top view of the 3-bit reconfigurable attenuator, featuring a central series cell and lateral shunt cells; (<b>b</b>) detail of the optimized resistors, with the thinner ones (left cell) neighboring the input port; and (<b>c</b>) its equivalent circuit topology (not accounting, by purpose, parasitic impedances).</p>
Full article ">Figure 8
<p>(<b>a</b>) Attenuation levels introduced by the device in all its states, and (<b>b</b>) return loss curves of the different states. The color of the S21 and S11 curves of a specific state is the same.</p>
Full article ">Figure 8 Cont.
<p>(<b>a</b>) Attenuation levels introduced by the device in all its states, and (<b>b</b>) return loss curves of the different states. The color of the S21 and S11 curves of a specific state is the same.</p>
Full article ">Figure 9
<p>(<b>a</b>) Layout of the CPW transmission line loaded with three cascaded cells of optimized Pi-shaped resistors, aiming at an attenuation level of −45 dB. Return loss (red) and attenuation (green) curves in the (<b>b</b>) comparison between the measurement outcomes of the plain CPW and the CPW loaded with a single −15 dB Pi resistor, and in the (<b>c</b>) comparison between the measurement outcomes of CPW samples loaded with two and three Pi resistors.</p>
Full article ">Figure 9 Cont.
<p>(<b>a</b>) Layout of the CPW transmission line loaded with three cascaded cells of optimized Pi-shaped resistors, aiming at an attenuation level of −45 dB. Return loss (red) and attenuation (green) curves in the (<b>b</b>) comparison between the measurement outcomes of the plain CPW and the CPW loaded with a single −15 dB Pi resistor, and in the (<b>c</b>) comparison between the measurement outcomes of CPW samples loaded with two and three Pi resistors.</p>
Full article ">Figure 10
<p>(<b>a</b>) Partial layout of the attenuation cell featuring two branches, detail of the loaded branch. Measured (<b>b</b>) insertion loss of the unloaded branch (in red) and attenuation levels of both the loaded branch (in blue) and the equivalent parallel attenuation (in green), and the (<b>c</b>) related return losses.</p>
Full article ">Figure 11
<p>Layout, by principle, of the proposed complete variable attenuator. The dotted boxes identify the sections of CPW lines considered for the final optimization.</p>
Full article ">Figure 12
<p>Smith chart representation of the simulated input impedances: (<b>a</b>) all eight states of the 3-bit cell variable attenuator; (<b>b</b>) the three designed Pi-shaped fixed attenuation CPW section.</p>
Full article ">Figure 13
<p>Schematic of the proposed complete variable attenuator in Cadence AWR Design Environment. This figure represents the configuration where the Pi-loaded CPW section is selected by the two SPDTs and the 3-bit cell is set at a state with a maximum attenuation of −10.15 dB.</p>
Full article ">Figure 14
<p>Optimized configuration for the complete attenuator in both its (<b>a</b>) return loss and (<b>b</b>) insertion loss curves, in all the three selected attenuation states: Case 1 (in black), Case 2 (in red), and Case 3 (in blue).</p>
Full article ">
13 pages, 4837 KiB  
Article
Design of Broadband High-Frequency Multi-Throw RF-MEMS Switches
by Jian Yu, Maoyun Zhang, Jing Li, Yuheng Si, Zijun Zhu, Qiannan Wu and Mengwei Li
Micromachines 2024, 15(7), 813; https://doi.org/10.3390/mi15070813 - 23 Jun 2024
Viewed by 3304
Abstract
This paper introduces a broadband triple-pole triple-throw (3P3T) RF MEMS switch with a frequency range from DC to 380 GHz. The switch achieves precise signal control and efficient modulation through its six-port design. It achieves an insertion loss of −0.66 dB across its [...] Read more.
This paper introduces a broadband triple-pole triple-throw (3P3T) RF MEMS switch with a frequency range from DC to 380 GHz. The switch achieves precise signal control and efficient modulation through its six-port design. It achieves an insertion loss of −0.66 dB across its frequency range, with isolation and return loss metrics of −32 dB and −15 dB, respectively. With its low actuation voltage of 6.8 V and rapid response time of 2.28 μs, the switch exemplifies power-efficient and prompt switching performance. The compact design is ideal for integration into space-conscious systems. This switch is pivotal for 6G research and has potential applications in satellite communications, military radar systems, and next-generation radio applications that require multi-antenna access. Full article
Show Figures

Figure 1

Figure 1
<p>Proposed switch. (<b>a</b>) 3D schematic; (<b>b</b>) Top view; (<b>c</b>) Operating modes.</p>
Full article ">Figure 2
<p>Equivalent circuit of the proposed switch.</p>
Full article ">Figure 3
<p>(<b>a</b>) Designed folded beam; (<b>b</b>) Pull-down voltage versus displacement relation; (<b>c</b>) Load–displacement relationship diagram.</p>
Full article ">Figure 4
<p>COMSOL stress simulation. (<b>a</b>) Regular perforated beam; (<b>b</b>) Improved unperforated beam; (<b>c</b>) Improved perforated beam; (<b>d</b>) COMSOL simulation in pull-down state.</p>
Full article ">Figure 5
<p>Comparison curve of the isolation of the flat plate and the electrode proposed in this research.</p>
Full article ">Figure 6
<p>Switch (<b>a</b>) return loss and (<b>b</b>) isolation curve under different <span class="html-italic">g</span> values.</p>
Full article ">Figure 7
<p>Power divider. (<b>a</b>) <span class="html-italic">D1</span> optimization; (<b>b</b>) <span class="html-italic">D2</span> optimization.</p>
Full article ">Figure 8
<p>Representative current density patterns of the switch in various operational modes.</p>
Full article ">Figure 9
<p>Switch S-parameters. (<b>a</b>) Insertion loss; (<b>b</b>) Isolation (average isolation across ports); (<b>c</b>) Return loss.</p>
Full article ">Figure 10
<p>Switch S-parameters with packaging. (<b>a</b>) Insertion loss; (<b>b</b>) Isolation (average isolation across ports); (<b>c</b>) Return loss.</p>
Full article ">
30 pages, 6129 KiB  
Review
Comprehensive Review of RF MEMS Switches in Satellite Communications
by Bingqian Shao, Chengjian Lu, Yinjie Xiang, Feixiong Li and Mingxin Song
Sensors 2024, 24(10), 3135; https://doi.org/10.3390/s24103135 - 15 May 2024
Viewed by 1684
Abstract
The miniaturization and low power consumption characteristics of RF MEMS (Radio Frequency Microelectromechanical System) switches provide new possibilities for the development of microsatellites and nanosatellites, which will play an increasingly important role in future space missions. This paper provides a comprehensive review of [...] Read more.
The miniaturization and low power consumption characteristics of RF MEMS (Radio Frequency Microelectromechanical System) switches provide new possibilities for the development of microsatellites and nanosatellites, which will play an increasingly important role in future space missions. This paper provides a comprehensive review of RF MEMS switches in satellite communication, detailing their working mechanisms, performance optimization strategies, and applications in reconfigurable antennas. It explores various driving mechanisms (electrostatic, piezoelectric, electromagnetic, thermoelectric) and contact mechanisms (capacitive, ohmic), highlighting their advantages, challenges, and advancements. The paper emphasizes strategies to enhance switch reliability and RF performance, including minimizing the impact of shocks, reducing driving voltage, improving contacts, and appropriate packaging. Finally, it discusses the enormous potential of RF MEMS switches in future satellite communications, addressing their technical advantages, challenges, and the necessity for further research to optimize design and manufacturing for broader applications and increased efficiency in space missions. The research findings of this review can serve as a reference for further design and improvement of RF MEMS switches, which are expected to play a more important role in future aerospace communication systems. Full article
Show Figures

Figure 1

Figure 1
<p>Structures of four conventional RF MEMS switches: (<b>a</b>) Electrostatically actuated RF MEMS switch [<a href="#B25-sensors-24-03135" class="html-bibr">25</a>]. Reprinted/adapted with permission from [<a href="#B25-sensors-24-03135" class="html-bibr">25</a>]. Copyright 2011, with permission from Elsevier. (<b>b</b>) Piezoelectrically actuated RF MEMS switch [<a href="#B26-sensors-24-03135" class="html-bibr">26</a>]. Reprinted/adapted with permission from [<a href="#B26-sensors-24-03135" class="html-bibr">26</a>], 2012, IEEE. (<b>c</b>) Electromagnetically actuated RF MEMS switch [<a href="#B27-sensors-24-03135" class="html-bibr">27</a>]. Reprinted/adapted with permission from [<a href="#B27-sensors-24-03135" class="html-bibr">27</a>]. (<b>d</b>) Electrothermally actuated RF MEMS switch [<a href="#B28-sensors-24-03135" class="html-bibr">28</a>]. Reprinted/adapted with permission from [<a href="#B28-sensors-24-03135" class="html-bibr">28</a>], 2020, IEEE.</p>
Full article ">Figure 2
<p>Structures of capacitive RF MEMS switches: (<b>a</b>) Li et al. [<a href="#B51-sensors-24-03135" class="html-bibr">51</a>]. Reprinted/adapted with permission from [<a href="#B51-sensors-24-03135" class="html-bibr">51</a>]. Copyright 2016, with permission from Elsevier. (<b>b</b>) Shi et al. [<a href="#B8-sensors-24-03135" class="html-bibr">8</a>]. Configuration diagram of flexible RF MEMS switch in different modes: (i) On state and (ii) Off state of MEMS switch with flat substrate; (iii) On state and (iv) Off state of MEMS switch with curved substrate. Reprinted/adapted with permission from [<a href="#B8-sensors-24-03135" class="html-bibr">8</a>].</p>
Full article ">Figure 3
<p>Structures of ohmic RF MEMS switches: (<b>a</b>) Bansal et al. [<a href="#B68-sensors-24-03135" class="html-bibr">68</a>]. Reprinted/adapted with permission from [<a href="#B68-sensors-24-03135" class="html-bibr">68</a>], 2019, IEEE. (<b>b</b>) Bajwa et al. [<a href="#B9-sensors-24-03135" class="html-bibr">9</a>]. Reprinted/adapted with permission from [<a href="#B9-sensors-24-03135" class="html-bibr">9</a>].</p>
Full article ">Figure 4
<p>(<b>a</b>) Schematics of three designs of capacitive RF MEMS switches. (i) Design 1: T-support, (ii) Design 2: parallel-support, and (iii) Design 3: L-support beams [<a href="#B90-sensors-24-03135" class="html-bibr">90</a>]. Reprinted/adapted with permission from [<a href="#B90-sensors-24-03135" class="html-bibr">90</a>], 2017, IEEE. (<b>b</b>) Illustration of the nonlinear command shapers for electrostatically actuated MEMS systems. (i) Two-step nonlinear shaping method for positioning and (ii) shaper for contact force minimization [<a href="#B93-sensors-24-03135" class="html-bibr">93</a>]. Reprinted/adapted with permission from [<a href="#B93-sensors-24-03135" class="html-bibr">93</a>], 2011, IEEE. (<b>c</b>) Soft-landing by patterning the electrode upper/lower or dielectric. Electrode upper/lower can be a (p1) rectangular plate, (p2) array of cylinders, or (p3) array of spheres, and dielectric can be (p4) an array of linear slots or (p5) a fractal of linear slots [<a href="#B88-sensors-24-03135" class="html-bibr">88</a>]. Reprinted from [<a href="#B88-sensors-24-03135" class="html-bibr">88</a>], with the permission of AIP Publishing.</p>
Full article ">Figure 5
<p>Structures of graphene MEMS devices: (<b>a</b>) Bunch et al. [<a href="#B112-sensors-24-03135" class="html-bibr">112</a>]. From [<a href="#B112-sensors-24-03135" class="html-bibr">112</a>]. Reprinted with permission from AAAS. (<b>b</b>) Kim et al. [<a href="#B113-sensors-24-03135" class="html-bibr">113</a>]. Reprinted from [<a href="#B113-sensors-24-03135" class="html-bibr">113</a>], with the permission of AIP Publishing. (<b>c</b>) Zhang et al. [<a href="#B70-sensors-24-03135" class="html-bibr">70</a>]. Reprinted from [<a href="#B70-sensors-24-03135" class="html-bibr">70</a>]. Copyright 2023, with permission from Elsevier.</p>
Full article ">Figure 6
<p>Atomic-scale contact–separation simulation using DFT calculations. [<a href="#B122-sensors-24-03135" class="html-bibr">122</a>] (<b>a</b>) DFT-optimized atomic structures of the gold (Au) tip and nickel (Ni) surface; (<b>b</b>) calculated atomic force of the Au tip, <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>F</mi> </mrow> <mrow> <mi>t</mi> <mi>i</mi> <mi>p</mi> </mrow> </msub> </mrow> </semantics></math> Ftip, during approach (left) and retraction (right). <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>F</mi> </mrow> <mrow> <mi>t</mi> <mi>i</mi> <mi>p</mi> </mrow> </msub> </mrow> </semantics></math> fluctuates considerably and gradually recovers during approach and retraction, respectively, because of the rearrangement of Au atoms, resulting in significant hysteresis; (<b>c</b>) DFT-optimized atomic structures of the Au tip and graphene (Gr)-coated surface; (<b>d</b>) calculated <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>F</mi> </mrow> <mrow> <mi>t</mi> <mi>i</mi> <mi>p</mi> </mrow> </msub> </mrow> </semantics></math> Ftip during approach (left) and retraction (right). Reprinted/adapted with permission from [<a href="#B122-sensors-24-03135" class="html-bibr">122</a>].</p>
Full article ">Figure 7
<p>(<b>a</b>) Top view of switch with series protection contact [<a href="#B123-sensors-24-03135" class="html-bibr">123</a>]. Reprinted/adapted with permission from [<a href="#B123-sensors-24-03135" class="html-bibr">123</a>], 2016, IEEE. (<b>b</b>) Top view of the shunt-protected switch [<a href="#B124-sensors-24-03135" class="html-bibr">124</a>]. Reprinted/adapted with permission from [<a href="#B124-sensors-24-03135" class="html-bibr">124</a>], 2017, IEEE. (<b>c</b>) The structure of the compact single-cantilever multicontact switch [<a href="#B125-sensors-24-03135" class="html-bibr">125</a>]. Reprinted/adapted with permission from [<a href="#B125-sensors-24-03135" class="html-bibr">125</a>], 2018, IEEE. (<b>d</b>) The structure of levitation-based micro-switch [<a href="#B126-sensors-24-03135" class="html-bibr">126</a>]. Reproduced with permission from Springer Nature. (<b>e</b>) The structure of a non-contact-type switch [<a href="#B127-sensors-24-03135" class="html-bibr">127</a>]. Reprinted/adapted with permission from [<a href="#B127-sensors-24-03135" class="html-bibr">127</a>], 2009, IEEE. (<b>f</b>) The structure of a three-state contactless switch [<a href="#B128-sensors-24-03135" class="html-bibr">128</a>]. The inset shows the initial gap between the signal lines and grounded movable electrodes. Reprinted/adapted with permission from [<a href="#B128-sensors-24-03135" class="html-bibr">128</a>], 2015, IEEE.</p>
Full article ">Figure 8
<p>(<b>a</b>) Proposed wafer-level packaging approach for RF MEMS devices using BCB bonding [<a href="#B131-sensors-24-03135" class="html-bibr">131</a>]. Reprinted/adapted with permission from [<a href="#B131-sensors-24-03135" class="html-bibr">131</a>], 2019, IEEE. (<b>b</b>) Schematic of the ohmic RF MEMS with a zoom on vias connecting the CPW line to the probing pads outside the seal ring [<a href="#B135-sensors-24-03135" class="html-bibr">135</a>]. Reprinted/adapted with permission from [<a href="#B135-sensors-24-03135" class="html-bibr">135</a>], 2022, IEEE. (<b>c</b>) Layout and dimensions of the zero-level packaged RF MEMS switched capacitors [<a href="#B136-sensors-24-03135" class="html-bibr">136</a>]. Reprinted/adapted with permission from [<a href="#B136-sensors-24-03135" class="html-bibr">136</a>], 2020, IEEE. (<b>d</b>) Top view of a SPST switch including TFP encapsulation [<a href="#B72-sensors-24-03135" class="html-bibr">72</a>]. Reprinted/adapted with permission from [<a href="#B72-sensors-24-03135" class="html-bibr">72</a>], 2017, IEEE.</p>
Full article ">Figure 9
<p>(<b>a</b>) The frequency reconfigurable capacitive shunt RF MEMES switch [<a href="#B142-sensors-24-03135" class="html-bibr">142</a>]. Reprinted/adapted with permission from [<a href="#B142-sensors-24-03135" class="html-bibr">142</a>]. Copyright 2019, with permission from Elsevier. (<b>b</b>) The T-match RF MEMS capacitive switch [<a href="#B143-sensors-24-03135" class="html-bibr">143</a>]. Reproduced with permission from Springer Nature. (<b>c</b>) The SP12T RF MEMS Switch [<a href="#B145-sensors-24-03135" class="html-bibr">145</a>]. Reprinted/adapted with permission from [<a href="#B145-sensors-24-03135" class="html-bibr">145</a>], 2018, IEEE.</p>
Full article ">Figure 10
<p>(<b>a</b>) The dual-warped-beam switch [<a href="#B152-sensors-24-03135" class="html-bibr">152</a>]. Reprinted/adapted with permission from [<a href="#B152-sensors-24-03135" class="html-bibr">152</a>], 2010, IEEE. (<b>b</b>) The composite metal-dielectric warped membranes [<a href="#B153-sensors-24-03135" class="html-bibr">153</a>]. Reprinted/adapted with permission from [<a href="#B153-sensors-24-03135" class="html-bibr">153</a>], 2009, IEEE.</p>
Full article ">Figure 11
<p>A 3D schematic view of serial-shunt switches: (<b>a</b>) Khodapanahandeh et al. [<a href="#B157-sensors-24-03135" class="html-bibr">157</a>]. A, B, and C represent different pads, and the state of the switch is controlled by adjusting their voltages. Reprinted/adapted with permission from [<a href="#B157-sensors-24-03135" class="html-bibr">157</a>], 2022, IEEE. (<b>b</b>) Singh [<a href="#B158-sensors-24-03135" class="html-bibr">158</a>]. Reproduced with permission from Springer Nature. (<b>c</b>) Zhu et al. [<a href="#B42-sensors-24-03135" class="html-bibr">42</a>]. Reprinted/adapted with permission from [<a href="#B42-sensors-24-03135" class="html-bibr">42</a>]. Copyright 2014, with permission from Elsevier.</p>
Full article ">Figure 12
<p>An example of a transceiver that supports different frequency bands [<a href="#B159-sensors-24-03135" class="html-bibr">159</a>]. Reprinted/adapted with permission from Ref [<a href="#B159-sensors-24-03135" class="html-bibr">159</a>], 2022, John Wiley and Sons.</p>
Full article ">Figure 13
<p>(<b>a</b>) The MEMS-modulated scanning antenna [<a href="#B174-sensors-24-03135" class="html-bibr">174</a>]. Reprinted/adapted with permission from [<a href="#B174-sensors-24-03135" class="html-bibr">174</a>], 2016, IEEE. (<b>b</b>) Optimized E-shaped patch antenna with RF MEMS switches [<a href="#B175-sensors-24-03135" class="html-bibr">175</a>]. Reprinted/adapted with permission from [<a href="#B175-sensors-24-03135" class="html-bibr">175</a>], 2014, IEEE. (<b>c</b>) Photograph of the antenna and its MEMS biasing network [<a href="#B178-sensors-24-03135" class="html-bibr">178</a>]. Reprinted/adapted with permission from [<a href="#B178-sensors-24-03135" class="html-bibr">178</a>], 2016, IEEE. (<b>d</b>) The novel multiple-beam antenna for satellite applications [<a href="#B168-sensors-24-03135" class="html-bibr">168</a>]. Reproduced courtesy of the Electromagnetics Academy.</p>
Full article ">
17 pages, 3289 KiB  
Article
Study on SR-Crossbar RF MEMS Switch Matrix Port Configuration Scheme with Optimized Consistency
by Weiwei Zhou, Weixing Sheng and Binyun Yan
Sensors 2024, 24(10), 3099; https://doi.org/10.3390/s24103099 - 13 May 2024
Cited by 1 | Viewed by 2889
Abstract
The performance consistency of an RF MEMS switch matrix is a crucial metric that directly impacts its operational lifespan. An improved crossbar-based RF MEMS switch matrix topology, SR-Crossbar, was investigated in this article. An optimized port configuration scheme was proposed for the RF [...] Read more.
The performance consistency of an RF MEMS switch matrix is a crucial metric that directly impacts its operational lifespan. An improved crossbar-based RF MEMS switch matrix topology, SR-Crossbar, was investigated in this article. An optimized port configuration scheme was proposed for the RF MEMS switch matrix. Both the utilization probability of individual switch nodes and the path lengths in the switch matrix achieve their best consistency simultaneously under the proposed port configuration scheme. One significant advantage of this scheme lies in that it only adjusts the positions of the input and output ports, with the topology and individual switch nodes kept unchanged. This grants it a high level of generality and feasibility and also introduces an additional degree of freedom for optimizations. In this article, a universal utilization probability function of single nodes was constructed and an optimization objective function for the SR-Crossbar RF MEMS switch matrix was formulated, which provide a convenient approach to directly solving the optimized port configuration scheme for practical applications. Simulations to demonstrate the optimized dynamic and static consistencies were conducted. For an 8 × 8 SR-Crossbar switch matrix, the standard deviations of contact resistances of 128 units and losses of all 64 paths decreased from 1.00 and 0.42 to 0.51 and 0.23, respectively. These results aligned closely with theoretical calculations derived from the proposed model. Full article
(This article belongs to the Section Intelligent Sensors)
Show Figures

Figure 1

Figure 1
<p>A crossbar switch matrix with input 2 to output 4 and input 3 to output 2 connected.</p>
Full article ">Figure 2
<p>A random port configuration scheme of a 16 × 16 SR-Crossbar switch matrix.</p>
Full article ">Figure 3
<p>Node utilization probability of a 16 × 16 SR-Crossbar switch matrix.</p>
Full article ">Figure 4
<p>Port configuration scheme of a 16 × 16 SR-Crossbar switch matrix: (<b>a</b>) conventional port configuration; (<b>b</b>) optimized port configuration.</p>
Full article ">Figure 5
<p>Optimized node utilization probability of a 16 × 16 SR-Crossbar switch matrix.</p>
Full article ">Figure 6
<p>Normalized path lengths before and after port configuration optimization of SR-Crossbar switch matrix: (<b>a</b>) normalized path lengths in conventional port configuration of SR-Crossbar switch matrix; (<b>b</b>) normalized path lengths in optimized port configuration of SR-Crossbar switch matrix.</p>
Full article ">Figure 7
<p>Flowchart of obtaining the optimized port configuration.</p>
Full article ">Figure 8
<p>Simulated <math display="inline"><semantics> <mrow> <mn>8</mn> <mo>×</mo> <mn>8</mn> </mrow> </semantics></math> SR-Crossbar switch: (<b>a</b>) a building block with switch units; (<b>b</b>) cantilever switch with bias pad indicated.</p>
Full article ">Figure 9
<p>Simulated <math display="inline"><semantics> <mrow> <mn>8</mn> <mo>×</mo> <mn>8</mn> </mrow> </semantics></math> SR-Crossbar switch matrix: (<b>a</b>) conventional port configuration; (<b>b</b>) optimized port configuration.</p>
Full article ">Figure 10
<p>Simulated SR-Crossbar switch unit: (<b>a</b>) pull-in and release voltage with arrows indicating pull-in or release direction; (<b>b</b>) switching time.</p>
Full article ">Figure 11
<p>Simulated results of SR-Crossbar switch matrix with optimized (blue) and conventional (red) port configurations: (<b>a</b>) contact resistance of switch units in the matrix after 1 million cycles; (<b>b</b>) path losses of all possible non-blocking paths in an <math display="inline"><semantics> <mrow> <mn>8</mn> <mo>×</mo> <mn>8</mn> </mrow> </semantics></math> SR-Crossbar switch matrix.</p>
Full article ">Figure 12
<p>Simulated <math display="inline"><semantics> <mrow> <mn>8</mn> <mo>×</mo> <mn>8</mn> </mrow> </semantics></math> SR-Crossbar switch matrix with optimized and conventional port configurations: (<b>a</b>) insertion losses of Path 1, 2 and 3; (<b>b</b>) isolations of Path 1, 2 and 3.</p>
Full article ">
3 pages, 658 KiB  
Abstract
Pull-In Voltage and Stress in Fixed-Fixed Beams of RF MEMS Switches
by Anna Persano, Girolamo Tagliapietra, Jacopo Iannacci, Alvise Bagolini, Fabio Quaranta and Pietro Siciliano
Proceedings 2024, 97(1), 174; https://doi.org/10.3390/proceedings2024097174 - 10 Apr 2024
Viewed by 3178
Abstract
Electrostatically actuated microelectromechanical system (MEMS) switches with fixed- fixed beams were fabricated. FEM modeling was used to calculate the contributions of stress in the fabricated beams from the measured values of pull-in voltage. The reported study provides useful guidelines to optimize the design [...] Read more.
Electrostatically actuated microelectromechanical system (MEMS) switches with fixed- fixed beams were fabricated. FEM modeling was used to calculate the contributions of stress in the fabricated beams from the measured values of pull-in voltage. The reported study provides useful guidelines to optimize the design of fixed-fixed beams, in order to reduce the stress contributions for the successful development of efficient and reliable electrostatically actuated MEMS devices. Full article
Show Figures

Figure 1

Figure 1
<p>Typical SEM image of a fabricated RF MEMS switch. The labels <span class="html-italic">l</span>, <span class="html-italic">r</span>, and <span class="html-italic">s</span> are used to indicate the different sections of the beam and are equal to 65 µm, 100 µm, and 95 µm, respectively. The width of the beam is 100 µm.</p>
Full article ">Figure 2
<p>Diagram of the deformation (<b>a</b>) and of the stress (<b>b</b>) that are induced by the electrostatic actuation of the beam.</p>
Full article ">
18 pages, 8409 KiB  
Article
Discussion and Demonstration of RF-MEMS Attenuators Design Concepts and Modules for Advanced Beamforming in the Beyond-5G and 6G Scenario—Part 1
by Girolamo Tagliapietra, Flavio Giacomozzi, Massimiliano Michelini, Romolo Marcelli, Giovanni Maria Sardi and Jacopo Iannacci
Sensors 2024, 24(7), 2308; https://doi.org/10.3390/s24072308 - 5 Apr 2024
Cited by 1 | Viewed by 3445
Abstract
This paper describes different variants of broadband and simple attenuator modules for beamforming applications, based on radio frequency micro electro-mechanical systems (RF-MEMS), framed within coplanar waveguide (CPW) structures. The modules proposed in the first part of this work differ in their actuation voltage, [...] Read more.
This paper describes different variants of broadband and simple attenuator modules for beamforming applications, based on radio frequency micro electro-mechanical systems (RF-MEMS), framed within coplanar waveguide (CPW) structures. The modules proposed in the first part of this work differ in their actuation voltage, topology, and desired attenuation level. Fabricated samples of basic 1-bit attenuation modules, characterized by a moderate footprint of 690 × 1350 µm2 and aiming at attenuation levels of −2, −3, and −5 dB in the 24.25–27.5 GHz range, are presented in their variants featuring both low actuation voltages (5–9 V) as well as higher values (~45 V), the latter ones ensuring larger mechanical restoring force (and robustness against stiction). Beyond the fabrication non-idealities that affected the described samples, the substantial agreement between simulations and measurement outcomes proved that the proposed designs could provide precise attenuation levels up to 40 GHz, ranging up to nearly −3 dB and −5 dB for the series and shunt variants, respectively. Moreover, they could be effective building blocks for future wideband and reconfigurable RF-MEMS attenuators. In fact, in the second part of this work, combinations of the discussed cells and other configurations meant for larger attenuation levels are investigated. Full article
Show Figures

Figure 1

Figure 1
<p>Surface micromachining process used for the fabrication of the reported devices. In particular, it is worth noticing (<b>a</b>) the basic substrate, (<b>b</b>) the basic oxide covering the wafer, (<b>c</b>) the poly-silicon layer, (<b>d</b>) the subsequent openings, (<b>e</b>) the multi-metal layer, (<b>f</b>) the subsequent openings, (<b>g</b>) the evaporated gold, (<b>h</b>) the sacrificial layer, and the (<b>i</b>,<b>j</b>) two layers of electroplated gold that form the movable structure.</p>
Full article ">Figure 2
<p>Main design parameters of the employed class of membranes, including (<b>a</b>) overall view, and detail of the beams (evidenced by dashed rectangle) characterizing the membranes of (<b>b</b>) Dev1, (<b>c</b>) Dev2, and (<b>d</b>) Dev3, whose support beams are characterized by progressively elongated meanders to achieve an increasingly reduced actuation voltage.</p>
Full article ">Figure 3
<p>(<b>a</b>) Simulated vertical displacement and (<b>b</b>) measured pull-in voltage of the three membranes considered in <a href="#sensors-24-02308-f002" class="html-fig">Figure 2</a>.</p>
Full article ">Figure 4
<p>Equivalent topology of the following (<b>a</b>) series and (<b>b</b>) shunt attenuation cells.</p>
Full article ">Figure 5
<p>(<b>a</b>) Overall layout of the attenuation cell featuring a single series resistor for a desired attenuation level of −2 dB; (<b>b</b>) simulated S parameter curves in the OFF state, and (<b>c</b>) ON state. In particular, it is worth noting the central resistor (in red), that can be short-circuited by the actuation of the membrane.</p>
Full article ">Figure 6
<p>Comparison between different insertion loss (green) and return loss (red) curves. In particular, measured curves (solid lines) are compared to the simulated curves (dashed lines) taking into account the proper 100 Ohm/Sq sheet resistance (circle marks), and the simulated curves taking into account the actual 800 Ohm/Sq sheet resistance of the fabricated devices (triangle marks), in both the default attenuation state (<b>a</b>) and non-attenuation state (<b>b</b>).</p>
Full article ">Figure 7
<p>(<b>a</b>) Overall layout of the attenuation cell featuring shunt resistors for a desired attenuation level of −3 dB; (<b>b</b>) simulated S parameter curves in the OFF state, and (<b>c</b>) ON state.</p>
Full article ">Figure 8
<p>(<b>a</b>) Overall layout of the attenuation cell featuring shunt resistors for a desired attenuation level of −5 dB; (<b>b</b>) simulated S parameter curves in the OFF state, and (<b>c</b>) ON state.</p>
Full article ">Figure 9
<p>(<b>a</b>) Overall layout of the attenuation cell featuring a single series resistor for a desired attenuation level of −2 dB; (<b>b</b>) simulated S parameter curves in the OFF state, and (<b>c</b>) ON state.</p>
Full article ">Figure 10
<p>Comparison between different insertion loss (green) and return loss (red) curves. In particular, the measured curves (solid lines) are compared to the simulated curves (dashed lines) taking into account the planned 130 Ohm/Sq sheet resistance (circle marks) and the simulated curves taking into account the actual 600 Ohm/Sq sheet resistance of the fabricated devices (triangle marks) in both the default attenuation state (<b>a</b>) and non-attenuation state (<b>b</b>).</p>
Full article ">Figure 11
<p>(<b>a</b>) Overall layout of the attenuation cell featuring shunt resistors for a desired attenuation level of −3 dB; (<b>b</b>) comparison between simulated (circle marks) and measured S parameter curves (no marks) in the OFF state, and (<b>c</b>) ON state.</p>
Full article ">
13 pages, 6017 KiB  
Article
On the Evolution of Stress and Microstructure in Radio Frequency-Sputtered Lead-Free (Ba,Ca)(Zr,Ti)O3 Thin Films
by Runar Plünnecke Dahl-Hansen, Marit Synnøve Sæverud Stange, Tor Olav Sunde, Johan Henrik Ræder and Per Martin Rørvik
Actuators 2024, 13(3), 115; https://doi.org/10.3390/act13030115 - 20 Mar 2024
Viewed by 1243
Abstract
Thin-film piezoelectrics are widely investigated for actuators and energy harvesters, but there are few alternatives to toxic lead zirconate titanate. Biocompatible Ca- and Zr-modified BaTiO3 (BCZT) is one of the most promising lead-free alternatives due to its high piezoelectric response. However, the [...] Read more.
Thin-film piezoelectrics are widely investigated for actuators and energy harvesters, but there are few alternatives to toxic lead zirconate titanate. Biocompatible Ca- and Zr-modified BaTiO3 (BCZT) is one of the most promising lead-free alternatives due to its high piezoelectric response. However, the dielectric/piezoelectric properties and structural integrity of BCZT films, which are crucial for their applications, are strongly influenced by the substrate upon which the film is grown and the related processing methods. Here, the in-plane stress, microstructure, dielectric, and piezoelectric properties of 100–500 nm thick high-temperature RF-sputtered BCZT films on industrially relevant Si-based substrates were investigated. Obtaining polycrystalline piezoelectric films required deposition temperatures ≥ 700 °C, but this induced tensile stresses of over 1500 MPa, which caused cracking in all films thicker than 200 nm. This degraded the dielectric, piezoelectric, and ferroelectric properties of films with larger electrode areas for applications. Films on SrTiO3, on the other hand, had a compressive residual stress, with fewer defects and no cracks. The grain size and surface roughness increased with increasing deposition temperature. These findings highlight the challenges in processing BCZT films and their crucial role in advancing lead-free piezoelectric technologies for actual device applications. Full article
Show Figures

Figure 1

Figure 1
<p>(<b>a</b>–<b>d</b>) Schematic of substrates investigated in this work: (<b>a</b>) Si, (<b>b</b>) Pt, (<b>c</b>) LNO/Pt, and (<b>d</b>) STO.</p>
Full article ">Figure 2
<p>TEM images of a cross-section of BCZT/LNO/Pt/Si stack with BCZT deposited at 700 °C: (<b>a</b>) bright-field TEM image with layers indicated, and (<b>b</b>) larger magnification bright-field TEM image of the BCZT film (gray).</p>
Full article ">Figure 3
<p>X-ray diffractograms of the Si substrate and ~100 nm BCZT thin films deposited at 400 °C, 600 °C, and 800 °C onto Si. Asterisks indicate BCZT reflections. The sticks at the bottom refer to tetragonal BaTiO<sub>3</sub> (COD 2100858).</p>
Full article ">Figure 4
<p>(<b>a</b>) AFM images showing the microstructural evolution of as-deposited BCZT films of <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>t</mi> </mrow> <mrow> <mi mathvariant="normal">f</mi> </mrow> </msub> <mo>&gt;</mo> <mn>200</mn> </mrow> </semantics></math> nm on platinized Si with increasing <span class="html-italic">T</span><sub>D</sub>. Amorphous films were obtained at 400 °C, partly crystallized films at 600 °C, and fully crystallized films at 700 °C. A considerable increase in grain size, roughness, and extension of cracks is observed for the film deposited at 800 °C. (<b>b</b>) Curvature evolution as a function of <span class="html-italic">T</span><sub>D</sub> for <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>t</mi> </mrow> <mrow> <mi mathvariant="normal">f</mi> </mrow> </msub> <mo>&gt;</mo> </mrow> </semantics></math> 200 nm BCZT films on platinized Si. The inset shows 2D x/y scans with colored height profiles, from which the line curvature is extracted.</p>
Full article ">Figure 5
<p>(<b>a</b>) Measured in-plane stress as a function of deposition temperature, <span class="html-italic">T</span><sub>D</sub>, with constant deposition pressure of =8 × 10<sup>−3</sup> mbar; predicted in-plane stress using the laminate theory model is shown by the solid red line. (<b>b</b>) Measured in-plane stress as a function of <span class="html-italic">p</span><sub>D</sub> at <span class="html-italic">T</span><sub>D</sub> = 700 °C.</p>
Full article ">Figure 6
<p>Optical microscope images showing the electrode edge and films on <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>t</mi> </mrow> <mrow> <mi mathvariant="normal">f</mi> </mrow> </msub> <mo>&gt;</mo> </mrow> </semantics></math> 200 nm thick BCZT films deposited at 700 °C on (<b>a</b>) STO and (<b>b</b>) LNO/Pt-coated Si.</p>
Full article ">Figure 7
<p>Capacitance field (<b>a</b>), polarization field (<b>b</b>), and piezoelectric force microscopy (PFM) (<b>c</b>) measurements of BCZT films with <math display="inline"><semantics> <mrow> <msub> <mrow> <mi>t</mi> </mrow> <mrow> <mi mathvariant="normal">f</mi> </mrow> </msub> <mo>&gt;</mo> <mn>200</mn> </mrow> </semantics></math> nm grown at 700 °C on the three substrates: STO (blue), LNO/Pt (orange), and Pt (green). Piezoelectric responses could only be detected for BCZT on STO and BCZT on LNO/Pt due to the high defect density for thicker films grown on Pt.</p>
Full article ">
3 pages, 845 KiB  
Abstract
Co-Design and Characterization of a Differential Wireless Passive Micro-Electromechanical System Pressure Sensor
by Romain Alcesilas, Jean Claude Bastien, Marc Sansa, Camille Jouvaud, Patrice Rey and Christophe Delaveaud
Proceedings 2024, 97(1), 24; https://doi.org/10.3390/proceedings2024097024 - 15 Mar 2024
Viewed by 632
Abstract
We present a differential wireless passive sensor based on a miniature antenna associated with a MEMS capacitive pressure sensor. In this configuration, a change in the external pressure results in a shift of the antenna resonance frequency and, thus, a variation in the [...] Read more.
We present a differential wireless passive sensor based on a miniature antenna associated with a MEMS capacitive pressure sensor. In this configuration, a change in the external pressure results in a shift of the antenna resonance frequency and, thus, a variation in the antenna Radar Cross Section (RCS) detectable from a distance of a few meters. The MEMS and the antenna are modelled and simulated, and a co-design procedure is developed to optimize their performance. The MEMS are fabricated on a 200-mm technological platform and characterized. A specific setup was conceived to characterize the antenna sensor as a function of pressure in an anechoic chamber. Full article
Show Figures

Figure 1

Figure 1
<p>(<b>a</b>) Overview of the MEMS process flow. (<b>b</b>) A 200 mm silicon wafer with the different MEMS sensors. (<b>c</b>) Working principle of the differential measurement. Dimensions are in mm.</p>
Full article ">Figure 2
<p>(<b>a</b>) Measured capacitance of the MEMS. (<b>b</b>) Simulated RCS variation at 868 MHz and equivalence in terms of relative back-propagated power. (<b>c</b>) Picture of the anechoic chamber with the interrogation antenna in the background and the plastic vacuum chamber in the foreground.</p>
Full article ">
9 pages, 3295 KiB  
Proceeding Paper
Design and Demonstration of Radio Frequency Micro Electro-Mechanical System Switches with Meandered Beams for Reduced Actuation Voltage
by Girolamo Tagliapietra, Jacopo Iannacci, Flavio Giacomozzi and Leandro Lorenzelli
Proceedings 2024, 97(1), 17; https://doi.org/10.3390/proceedings2024097017 - 14 Mar 2024
Cited by 1 | Viewed by 611
Abstract
In this paper, a class of three series ohmic switches is presented, including its design principles, the simulation results, and the outcomes of the measurements performed on the first batch of fabricated samples. The design of the adopted membranes is based on meandered [...] Read more.
In this paper, a class of three series ohmic switches is presented, including its design principles, the simulation results, and the outcomes of the measurements performed on the first batch of fabricated samples. The design of the adopted membranes is based on meandered beams, targeting a reduced actuation voltage. The initial and promising electro-mechanical simulations, performed in an Ansys Workbench environment, predicted actuation voltages in the 5–8 V range, whereas the measurements highlighted slightly greater values. The electro-magnetic behavior of such devices demonstrated a general and qualitative agreement with the simulations performed in the Ansys HFSS environment, with a satisfying performance in terms of return loss (<−20.22 dB) and isolation (<−14.86 dB) along the 5–30 GHz interval. Full article
Show Figures

Figure 1

Figure 1
<p>(<b>a</b>) Complete layout of <span class="html-italic">Dev1</span> switch, characterized by uniform meanders. (<b>b</b>) Detailed representation of <span class="html-italic">Dev1</span> switch, including its main dimensional parameters.</p>
Full article ">Figure 2
<p>(<b>a</b>) Description of beams employed in <span class="html-italic">Dev2</span> switch in their main dimensional parameters. (<b>b</b>) Beams employed in <span class="html-italic">Dev3</span> switch in their main dimensional parameters.</p>
Full article ">Figure 3
<p>(<b>a</b>) Simulated displacements of <span class="html-italic">Dev1</span>, <span class="html-italic">Dev2</span>, and <span class="html-italic">Dev3</span> switches showing actuation voltage. (<b>b</b>) Measured actuation voltages of <span class="html-italic">Dev1</span>, <span class="html-italic">Dev2</span>, <span class="html-italic">Dev3</span> by resistance drop along RF signal line.</p>
Full article ">Figure 4
<p>(<b>a</b>) A comparison between the simulated and measured performances of <span class="html-italic">Dev1</span> in its OFF state. (<b>b</b>) A comparison between the simulated and measured performances of <span class="html-italic">Dev1</span> in its ON state.</p>
Full article ">Figure 5
<p>(<b>a</b>) A comparison between the simulated and measured performances of <span class="html-italic">Dev2</span> in its OFF state. (<b>b</b>) A comparison between the simulated and measured performances of <span class="html-italic">Dev2</span> in its ON state.</p>
Full article ">Figure 6
<p>(<b>a</b>) A comparison between the simulated and measured performances of <span class="html-italic">Dev3</span> in its OFF state. (<b>b</b>) A comparison between the simulated and measured performances of <span class="html-italic">Dev3</span> in its ON state.</p>
Full article ">
10 pages, 3800 KiB  
Article
Implementation of Highly Reliable Contacts for RF MEMS Switches
by Lili Jiang, Lifeng Wang, Xiaodong Huang, Zhen Huang and Min Huang
Micromachines 2024, 15(1), 155; https://doi.org/10.3390/mi15010155 - 20 Jan 2024
Cited by 2 | Viewed by 1516
Abstract
A contact is the key structure of RF MEMS (Radio Frequency Microelectromechanical System) switches, which has a direct impact on the switch’s electrical and mechanical properties. In this paper, the implementation of highly reliable contacts for direct-contact RF MEMS switches is provided. As [...] Read more.
A contact is the key structure of RF MEMS (Radio Frequency Microelectromechanical System) switches, which has a direct impact on the switch’s electrical and mechanical properties. In this paper, the implementation of highly reliable contacts for direct-contact RF MEMS switches is provided. As a soft metal material, gold has the advantages of low contact resistance, high chemical stability, and mature process preparation, so it is chosen as the metal material for the beam structure as well as the contacts of the switch. However, a Pt film is used in the bottom contact area to enhance the reliability of the contact. Three kinds of contacts with various shapes are fabricated using different processes. Particularly, a circular-shaped contact is obtained by dry/wet combined processes. The detailed fabrication process of the contacts as well as the Pt film on the bottom contact area are given. The experimental test shows that the contact shape has little effect on the RF performance of the switches. However, the circular contact shows better reliability than other contacts and can work well even after 1.2 × 109 cycles. Full article
Show Figures

Figure 1

Figure 1
<p>RF MEMS switch design. (<b>a</b>) Schematic view of the switch; (<b>b</b>) simulated actuation voltage of the designed switch; (<b>c</b>) simulation model of the switch in HFSS (High-Frequency Simulation Software 15.0); (<b>d</b>) simulated RF performances of the designed switch.</p>
Full article ">Figure 2
<p>Bottom contact area covered with Pt film.</p>
Full article ">Figure 3
<p>SEM (scanning electron microscope) images of three contacts with different shapes: (<b>a</b>) flat contact; (<b>b</b>) bump-type contact; (<b>c</b>) circular contact.</p>
Full article ">Figure 4
<p>Fabrication process flow of the switch. (<b>a</b>) Bottom electrode, DC-biased line, and Pt contact layer are deposited and patterned; (<b>b</b>) transmission line is formed; (<b>c</b>) sacrificial layer is deposited and patterned; (<b>d</b>) sacrificial layer is partly etched; (<b>e</b>) anchor, cantilever beam, and contact are formed at the same time, and the switch is released.</p>
Full article ">Figure 5
<p>SEM image of the fabricated switch.</p>
Full article ">Figure 6
<p>RF testing results of the switches with three different contacts.</p>
Full article ">Figure 7
<p>Lifetime test platform for the three types of switches.</p>
Full article ">Figure 8
<p>Morphology of the switch contacts after the reliability test: (<b>a</b>) flat contact; (<b>b</b>) bump-type contact; (<b>c</b>) circular contact.</p>
Full article ">
21 pages, 4298 KiB  
Review
Application of Through Glass Via (TGV) Technology for Sensors Manufacturing and Packaging
by Chen Yu, Shaocheng Wu, Yi Zhong, Rongbin Xu, Tian Yu, Jin Zhao and Daquan Yu
Sensors 2024, 24(1), 171; https://doi.org/10.3390/s24010171 - 28 Dec 2023
Viewed by 6279
Abstract
Glass has emerged as a highly versatile substrate for various sensor and MEMS packaging applications, including electromechanical, thermal, optical, biomedical, and RF devices, due to its exceptional properties such as high geometrical tolerances, outstanding heat and chemical resistance, excellent high-frequency electrical properties, and [...] Read more.
Glass has emerged as a highly versatile substrate for various sensor and MEMS packaging applications, including electromechanical, thermal, optical, biomedical, and RF devices, due to its exceptional properties such as high geometrical tolerances, outstanding heat and chemical resistance, excellent high-frequency electrical properties, and the ability to be hermetically sealed. In these applications, Through Glass Via (TGV) technology plays a vital role in manufacturing and packaging by creating electrical interconnections through glass substrates. This paper provides a comprehensive summary of the research progress in TGV fabrication along with its integrations, including through via formation and metallization. This paper also reviews the significant qualification and reliability achievements obtained by the scientific community for TGV technology. Additionally, this paper summarizes the application of TGV technology in various sensors such as MEMS sensors and discusses the potential applications and future development directions of TGV technology. Full article
(This article belongs to the Special Issue Advanced Sensors in MEMS)
Show Figures

Figure 1

Figure 1
<p>SEM image of photosensitive glass via after wet etching: (<b>a</b>) cross-sectional view; (<b>b</b>) surface view of inner wall [<a href="#B45-sensors-24-00171" class="html-bibr">45</a>].</p>
Full article ">Figure 2
<p>Glass reflow process into small cavities. (<b>a</b>) Silicon pillar mold; (<b>b</b>) silicon capillary mold; (<b>c</b>) penetration depth of pillar mold under third reflow condition; (<b>d</b>) penetration depth of capillary mold under third reflow condition [<a href="#B48-sensors-24-00171" class="html-bibr">48</a>].</p>
Full article ">Figure 3
<p>TGV samples processed by Xiamen Sky-semi: (<b>a</b>) the top view of glass through-hole array; (<b>b</b>) the cross-sectional view of ultra-high-aspect-ratio (from 20 to 100) glass vias; (<b>c</b>) the top view of slot–vias structure; (<b>d</b>) the cross-sectional view of slot–vias structure; (<b>e</b>) the cross-sectional view of trapezoidal via [<a href="#B78-sensors-24-00171" class="html-bibr">78</a>].</p>
Full article ">Figure 3 Cont.
<p>TGV samples processed by Xiamen Sky-semi: (<b>a</b>) the top view of glass through-hole array; (<b>b</b>) the cross-sectional view of ultra-high-aspect-ratio (from 20 to 100) glass vias; (<b>c</b>) the top view of slot–vias structure; (<b>d</b>) the cross-sectional view of slot–vias structure; (<b>e</b>) the cross-sectional view of trapezoidal via [<a href="#B78-sensors-24-00171" class="html-bibr">78</a>].</p>
Full article ">Figure 4
<p>(<b>a</b>) The 3D images of paste-filled vias; (<b>b</b>) dishing of the paste-filled vias before thinning; (<b>c</b>) the top view of paste-filled vias after thinning; (<b>d</b>) the OM image of daisy chains using 3D printing to fill vias and surface wiring; (<b>e</b>) the X-ray image of daisy chains using 3D printing to fill vias and surface wiring; (<b>f</b>) the OM image of daisy chains using vacuum plugging to fill vias and surface wiring (thinning causes cracks in the glass); (<b>g</b>) the X-ray image of daisy chains using vacuum plugging to fill vias and surface wiring.</p>
Full article ">Figure 5
<p>Schematic fabrication process for glass interposer.</p>
Full article ">Figure 6
<p>Cross-sectional SEM photos of (<b>a</b>) electroplated filled blind glass vias and (<b>b</b>,<b>c</b>) electroplated filled TGVs.</p>
Full article ">Figure 7
<p>Parameters of glass for sensors based on TGV technology.</p>
Full article ">Figure 8
<p>The fabrication and packaging process of (<b>a</b>) glass caps for bonding with capacitive gyroscope [<a href="#B9-sensors-24-00171" class="html-bibr">9</a>]; (<b>b</b>) the resonant pressure sensors [<a href="#B96-sensors-24-00171" class="html-bibr">96</a>].</p>
Full article ">Figure 9
<p>The fabrication and packaging process of acoustic sensors based on TGV technology: (<b>a</b>) SAW filter [<a href="#B78-sensors-24-00171" class="html-bibr">78</a>]; (<b>b</b>) CMUT [<a href="#B99-sensors-24-00171" class="html-bibr">99</a>].</p>
Full article ">
Back to TopTop