Simone Ferrari

We report on the structural and electrical properties of ZrO2 thin layers grown on Si by atomic layer chemical vapour deposition. Atomic force microscopy, X-ray diffraction, X-ray reflectivity and time-of-flight secondary ion mass spectrometry have been used to characterize as-grown and annealed samples. High frequency capacitance–voltage measurements have been performed to determine the capacitance of the gate dielectric stack. The

Hybrid poly(3-hexylthiophene)/ZnO devices are investigated as rectifying heterojunctions for microelectronics applications. A low-temperature atomic layer deposition of ZnO on top of poly(3-hexylthiophene) allows the fabrication of diodes featuring a rectification ratio of nearly 105 at ±4 V and a current density of 104 A/cm2. Electrical characteristics are discussed taking into account the chemical structure of the stack and the energy band diagram.