Well-defined poly(methyl methacrylate) was prepared by a photochemically induced reversible deactivation radical polymerization using 50−200 ppm of copper catalyst in dimethyl sulfoxide under both an inert atmosphere and in the presence...
moreWell-defined poly(methyl methacrylate) was prepared by a photochemically induced reversible deactivation radical polymerization using 50−200 ppm of copper catalyst in dimethyl sulfoxide under both an inert atmosphere and in the presence of limited amount of air. Effect of the ligand structure and concentration on kinetics and polymerization control was investigated. Under inert atmosphere, equimolar amount of the ligand, such as tris(2-pyridylmethyl)amine (TPMA) or N,N,N’,N’’,N’’-pentamethyldiethylenetriamine (PMDETA), was sufficient to achieve well-controlled polymerization of MMA. In the presence of air, a well-controlled polymerization started just after some induction time, which was dependent on the concentration of TPMA ligand. Irradiation at λ > 350 nm provided both a photochemical reduction of an initially-added copper(II) catalyst, which complexed with either PMDETA or TPMA ligand, to a copper(I) activator, and photochemical regeneration of the copper(I) activator after ...