[go: up one dir, main page]

Sitch et al., 1976 - Google Patents

The noise measure of GaAs and InP transferred electron amplifiers

Sitch et al., 1976

Document ID
9744019290386089804
Author
Sitch J
Robson P
Publication year
Publication venue
IEEE Transactions on Electron Devices

External Links

Snippet

The noise measures of both GaAs and InP transferred electron amplifiers (TEA's) are calculated by a small-signal computer simulation for devices having a range of realistic doping profiles, some of which are designed specifically to limit the amount of free charge …
Continue reading at ieeexplore.ieee.org (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L31/00Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L47/00Bulk negative resistance effect devices, e.g. Gunn-effect devices; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof

Similar Documents

Publication Publication Date Title
Costa et al. Low-frequency noise properties of Npn AlGaAs/GaAs heterojunction bipolar transistors
David et al. Gate-drain avalanche breakdown in GaAs power MESFET's
Pilgrim et al. Gunn oscillations in planar heterostructure diodes
Misawa Negative resistance in pn junctions under avalanche breakdown conditions, part II
US4903092A (en) Real space electron transfer device using hot electron injection
Zirath High‐frequency noise and current‐voltage characteristics of mm‐wave platinum n–n+–GaAs Schottky barrier diodes
Farahmand et al. Full band Monte Carlo simulation of zincblende GaN MESFET's including realistic impact ionization rates
Tait et al. Electron transport in rectifying semiconductor alloy ramp heterostructures
Sitch et al. The noise measure of GaAs and InP transferred electron amplifiers
Subramanian et al. Geometrical and light-induced effects on back-gating in ion-implanted GaAs MESFET's
Pattanaik et al. A new mm-wave GaAs~ Ga0. 52In0. 48p heterojunction impatt diode
Sun et al. Hot-electron-induced degradation and post-stress recovery of bipolar transistor gain and noise characteristics
Rees et al. Turn-on response of the triangular barrier switch
Vo et al. Optimization and realization of planar isolated GaAs zero-biased planar doped barrier diodes for microwave/millimeter-wave power detectors/sensors
Sinha et al. Effect of heavy doping on the properties of high-low junction
Van Zyl et al. The gunn-diode: Fundamentals and fabrication
De Jaeger et al. High efficiency GaInAs/InP heterojunction IMPATT diodes
Gaul et al. Pulsed high-power operation of p/sup+/pnn/sup+/-avalanche diodes near avalanche resonance for mm-wave oscillators
Gunn The theory of rectification and injection at a metal-semiconductor contact
Bhapkar et al. InGaAs Schottky barrier mixer diodes for minimum conversion loss and low LO power requirements at terahertz frequencies
Mattauch et al. Local-oscillator-induced noise in GaAs Schottky mixer diodes
Posse et al. Transferred‐electron induced current instabilities in heterojunction bipolar transistors
Constant Noise in microwave, injection, transit time and transferred-electron devices
Evans et al. On the electrical properties of the I 2 L npn transistor
Neudeck et al. High‐Frequency Noise in Germanium‐Silicon n‐n Heterojunctions