[go: up one dir, main page]

Taya et al., 2014 - Google Patents

A spectroscopic ellipsometer using rotating polarizer and analyzer at a speed ratio 1: 1 and a compensator

Taya et al., 2014

Document ID
9230826019038878042
Author
Taya S
El-Agez T
Alkanoo A
Publication year
Publication venue
Optical and Quantum Electronics

External Links

Snippet

Ellipsometers have been widely used in thin film characterization. They have shown a high degree of accuracy. We here propose theoretically a rotating polarizer and analyzer ellipsometer at a speed ratio 1: 1 with a fixed compensator placed just after the rotating …
Continue reading at link.springer.com (other versions)

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/23Bi-refringence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infra-red light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • G01N2021/214Variangle incidence arrangement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical means
    • G01B11/02Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
    • G01B11/0641Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating with measurement of polarization
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical means
    • G01B11/02Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
    • G01B11/0675Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41Refractivity; Phase-affecting properties, e.g. optical path length
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colour
    • G01J3/28Investigating the spectrum
    • G01J3/447Polarisation spectrometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00Investigating or analyzing materials by the use of thermal means
    • G01N25/56Investigating or analyzing materials by the use of thermal means by investigating moisture content
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00Measuring polarisation of light
    • G01J4/04Polarimeters using electric detection means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation
    • G01N23/207Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation by means of diffractometry using detectors, e.g. using an analysing crystal or a crystal to be analysed in a central position and one or more displaceable detectors in circumferential positions

Similar Documents

Publication Publication Date Title
Fujiwara Spectroscopic ellipsometry: principles and applications
Li et al. Depolarization artifacts in dual rotating-compensator Mueller matrix ellipsometry
Laskarakis et al. Mueller matrix spectroscopic ellipsometry: formulation and application
Ghim et al. Fast, precise, tomographic measurements of thin films
Negara et al. Simplified Stokes polarimeter based on division-of-amplitude
Taya et al. A spectroscopic ellipsometer using rotating polarizer and analyzer at a speed ratio 1: 1 and a compensator
Kanehara et al. Measurement of ionic polarization of SrTiO3 single crystal by far-infrared spectroscopic ellipsometry
Dorywalski et al. Spectroscopic ellipsometry technique as a materials characterization tool for mechatronic systems—The case of composition and doping concentration monitoring in SBN crystals
Rubano et al. Mid-infrared time-domain ellipsometry: Application to Nb-doped SrTiO3
Collins Measurement technique of ellipsometry
US7463355B1 (en) Nondestructive optical technique for simultaneously measuring optical constants and thickness of thin films
Pourjamal et al. Characterization of thin-film thickness
El-Agez et al. Development and construction of rotating polarizer analyzer ellipsometer
Mainali et al. Optical properties of 4H-SiC and 6H-SiC from infrared to vacuum ultraviolet spectral range ellipsometry (0.05–8.5 eV)
El-Agez et al. Rotating polarizer-analyzer scanning ellipsometer
Taya et al. Rotating polarizer analyzer ellipsometer with a fixed compensator
Alkanoo et al. Effect of the orientation of the fixed analyzer on the ellipsometric parameters in rotating polarizer and compensator ellipsometer with speed ratio 1: 1
Hong et al. Mueller matrix ellipsometry study of a circular polarizing filter
Taya et al. Effect of noise on the optical parameters extracted from different ellipsometric configurations
Azzam Polarization, thin-film optics, ellipsometry, and polarimetry: Retrospective
Yuan et al. Polarization measurement method based on liquid crystal variable retarder (LCVR) for atomic thin-film thickness
Qi et al. Broadband surface plasmon resonance spectroscopy for determination of refractive-index dispersion of dielectric thin films
Koleják et al. Mueller matrix ellipsometry of waveplates for control of their properties and alignment
Hassani et al. Thin film characterization with a simple Stokes ellipsometer
Taya et al. Ellipsometric configurations using a phase retarder and a rotating polarizer and analyzer at any speed ratio