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Niesar et al., 2010 - Google Patents

Defect reduction in silicon nanoparticles by low-temperature vacuum annealing

Niesar et al., 2010

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Document ID
915610579933857132
Author
Niesar S
Stegner A
Pereira R
Hoeb M
Wiggers H
Brandt M
Stutzmann M
Publication year
Publication venue
Applied Physics Letters

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Using electron paramagnetic resonance, we find that vacuum annealing at 200 C leads to a significant reduction in the silicon dangling bond (Si-db) defect density in silicon nanoparticles (Si-NPs). The best improvement of the Si-db density by a factor of 10 is …
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