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Kechidi et al., 2020 - Google Patents

of a Capacitively Coupled Oxygen Plasma Driven by

Kechidi et al., 2020

Document ID
8180147439215122303
Author
Kechidi Z
Tahraoui A
Belbachir A
Adress W
Publication year
Publication venue
ICREEC 2019: Proceedings of the 1st International Conference on Renewable Energy and Energy Conversion

External Links

Snippet

The Single and double frequency non-equilibrium capacitively coupled (CCP) radiofrequency plasma sources are commonly used in the laboratory for research and for a variety of processing and techniques. This study is carried out on the basis of a one …
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Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material

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