[go: up one dir, main page]

Martz et al., 2010 - Google Patents

High-energy 13.9 nm table-top soft-x-ray laser at 2.5 Hz repetition rate excited by a slab-pumped Ti: sapphire laser

Martz et al., 2010

View HTML
Document ID
7751739151027798288
Author
Martz D
Alessi D
Luther B
Wang Y
Kemp D
Berrill M
Rocca J
Publication year
Publication venue
Optics letters

External Links

Snippet

We have demonstrated repetitive operation of a table-top λ= 13.9? nm Ni-like Ag soft-x-ray laser that generates laser pulses with 10? μJ energy. The soft-x-ray laser is enabled by a Ti: sapphire laser pumped by high-repetition-rate frequency-doubled high-energy Nd: glass …
Continue reading at opg.optica.org (HTML) (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/05—Construction or shape of optical resonators; Accomodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/05—Construction or shape of optical resonators; Accomodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0619—Coatings, e.g. AR, HR, passivation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/39—Non-linear optics for parametric generation or amplification of light, infra-red or ultra-violet waves
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • G—PHYSICS
    • G02—OPTICS
    • G02F—DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam with frequency components different from those of the incident light beams is generated
    • G02F1/3544—Particular phase matching techniques
    • G02F2001/3548—Quasi-phase-matching [QPM], e.g. using a periodic domain inverted structure
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling a device placed within the cavity
    • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling a device placed within the cavity using a non-linear optical device, e.g. exhibiting Brillouin- or Raman-scattering
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/14—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media

Similar Documents

Publication Publication Date Title
Wang et al. 1.1 J Yb: YAG picosecond laser at 1 kHz repetition rate
Sung et al. 0.1 Hz 1.0 PW Ti: sapphire laser
Yanovsky et al. Ultra-high intensity-300-TW laser at 0.1 Hz repetition rate.
Kmetec et al. 0.5-TW, 125-fs Ti: sapphire laser
Baumgarten et al. 1 J, 0.5 kHz repetition rate picosecond laser
Lozhkarev et al. 200 TW 45 fs laser based on optical parametric chirped pulse amplification
Hong et al. High-energy, phase-stable, ultrabroadband kHz OPCPA at 2.1 μm pumped by a picosecond cryogenic Yb: YAG laser
Liang et al. Parasitic lasing suppression in high gain femtosecond petawatt Ti: sapphire amplifier
Bagnoud et al. 5 Hz,> 250 mJ optical parametric chirped-pulse amplifier at 1053 nm
Hong et al. High-energy, kHz-repetition-rate, ps cryogenic Yb: YAG chirped-pulse amplifier
Zapata et al. 250 W average power, 100 kHz repetition rate cryogenic Yb: YAG amplifier for OPCPA pumping
Martz et al. High-energy 13.9 nm table-top soft-x-ray laser at 2.5 Hz repetition rate excited by a slab-pumped Ti: sapphire laser
Novák et al. Thin disk amplifier-based 40 mJ, 1 kHz, picosecond laser at 515 nm
Murnane et al. High-power femtosecond dye-laser system
Rothhardt et al. High average and peak power few-cycle laser pulses delivered by fiber pumped OPCPA system
Chang et al. Multi-mJ, kHz, ps deep-ultraviolet source
Wang et al. Generation of 10-W average-power, 40-TW peak-power, 24-fs pulses from a Ti: sapphire amplifier system
Jung et al. Thin-disk ring amplifier for high pulse energy
Liu et al. Adaptive-feedback spectral-phase control for interactions with transform-limited ultrashort high-power laser pulses
Ozawa et al. Non-collinear high harmonic generation: a promising outcoupling method for cavity-assisted XUV generation
Furch et al. Demonstration of an all-diode-pumped soft x-ray laser
Bock et al. Ho: YLF regenerative amplifier delivering 22 mJ, 2.0 ps pulses at a 1 kHz repetition rate
Tokita et al. 0.3% energy stability, 100-millijoule-class, Ti: sapphire chirped-pulse eight-pass amplification system
Yang et al. 0.09-terawatt pulses with a 31% efficient, kilohertz repetition-rate Ti: sapphire regenerative amplifier
Yamakawa et al. Two-color chirped-pulse amplification in an ultrabroadband Ti: sapphire ring regenerative amplifier