[go: up one dir, main page]

Goldstein et al., 1981 - Google Patents

Practical techniques of x-ray analysis

Goldstein et al., 1981

Document ID
6542271373840150100
Author
Goldstein J
Newbury D
Echlin P
Joy D
Fiori C
Lifshin E
Goldstein J
Newbury D
Echlin P
Joy D
Fiori C
Lifshin E
Publication year
Publication venue
Scanning Electron Microscopy and X-Ray Microanalysis: A Text for Biologist, Materials Scientist, and Geologists

External Links

Snippet

It has already been shown in Chapter 6 that qualitative analysis is based on the ability of a spectrometer system to measure characteristic line energies and relate those energies to the presence of specific elements. This process is relatively straightforward if (1) the …
Continue reading at link.springer.com (other versions)

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam
    • G01N23/2251Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam with incident electron beam
    • G01N23/2252Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission using electron or ion microprobe or incident electron or ion beam with incident electron beam and measuring excited X-rays
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation
    • G01N23/207Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation by means of diffractometry using detectors, e.g. using an analysing crystal or a crystal to be analysed in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation by means of diffractometry using detectors, e.g. using an analysing crystal or a crystal to be analysed in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by measuring secondary emission by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons by transmitting the radiation through the material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited

Similar Documents

Publication Publication Date Title
Powell et al. Precision, accuracy, and uncertainty in quantitative surface analyses by Auger‐electron spectroscopy and x‐ray photoelectron spectroscopy
Hawn et al. Deconvolution as a correction for photoelectron inelastic energy losses in the core level XPS spectra of iron oxides
US7595489B2 (en) Method and apparatus for material identification
Assmann et al. ERDA with very heavy ion beams
Pons et al. Quantitative approach of Auger electron spectrometry: I. A formalism for the calculation of surface concentrations
Statham Limitations to accuracy in extracting characteristic line intensities from X-ray spectra
Statham X‐ray microanalysis with Si (Li) detectors
Cuthill et al. Density of States of Ni: Soft-X-Ray Spectrum and Comparison with Photoemission and Ion Neutralization Studies
KR0127503B1 (en) Element analyzing method
Rez Inner-shell spectroscopy: An atomic view
Smith et al. The calculation of background in wavelength‐dispersive electron microprobe analysis
Pouchou Use of soft X-rays in microanalysis
EP1459056A1 (en) A method of determining the background corrected counts of radiation quanta in an x-ray energy spectrum
Goldstein et al. Practical techniques of x-ray analysis
Powell Recent developments in quantitative surface analysis by electron spectroscopy
Lewis A deconvolution technique for depth profiling with nuclear microanalysis
Goldstein et al. Current problems in X-ray emission spectroscopy
Engel et al. Electron energy-loss spectroscopy and the crystal chemistry of rhodizite. Part 1.—Instrumentation and chemical analysis
Nishimori et al. Comparison of escape depths between Auger electron and disappearance potential spectroscopy electron
Goldstein et al. Special techniques in the X-ray analysis of samples
Hutchins Electron probe microanalysis
Cazaux Auger microscopy and electron probe microanalysis
Grant et al. The status of reference data, reference materials and reference procedures in surface analysis
Helms A review of surface spectroscopies for semiconductor characterization
Reuter Techniques for the compositional and chemical state analysis of surfaces and thin films