[go: up one dir, main page]

ASAI et al., 1994 - Google Patents

Some Proposals for a Wet Grinding Process for Ceramic Raw Materials

ASAI et al., 1994

View PDF
Document ID
5949209142516462877
Author
ASAI N
SUGIE T
TOYAMA S
Publication year
Publication venue
Journal of the Society of Powder Technology, Japan

External Links

Snippet

(2) The intermixture concentration was influenced considerably by the viscosity and the specific gravity of the slurry.(3) The size of the wear debris was distributed into a finer size range of the ground product. Then, in the closed circuit wet milling process, it was estimated …
Continue reading at www.jstage.jst.go.jp (PDF) (other versions)

Similar Documents

Publication Publication Date Title
TW201130563A (en) Preparation method for stainless steel slags and steelworks slags for recovery of metal
CA1179849A (en) Metal bonded diamond aggregate abrasive
CN104619648B (en) Based on TiO2Scrub particle, and prepare and use as be based on TiO2Scrub particle method
US2694004A (en) Polishing material
ASAI et al. Some Proposals for a Wet Grinding Process for Ceramic Raw Materials
CN106241794B (en) It is a kind of that the method and product that diamond is reclaimed in slug are ground from sapphire
CN1098126C (en) Zirconium silicate grinding method
KR0164652B1 (en) Zirconium silicate grinding medium and method of milling
CN105131842B (en) Nano diamond aggregate pattern dressing method in polishing fluid
JP2507571B2 (en) Abrasive manufacturing method
JP2941749B2 (en) Method for treating wafer polishing waste liquid and sintered body mainly containing recovered abrasive
KR101525543B1 (en) Method for recycling waste-abrasive used in the lapping and polishing of semiconductor and industry wafer
JPH0686328B2 (en) Method for producing sinterable Si3N4 powder containing sintering additive
US2830884A (en) Abrasive composition
CN104107764A (en) Method for improving flatness and glossiness of titanium dioxide film
JP3986384B2 (en) Cerium-based abrasive and method for producing the same
CN100532492C (en) Composite grinding material and method for producing the same
JP2507572B2 (en) Abrasive manufacturing method
JP4290465B2 (en) Method for producing cerium-based abrasive mainly composed of cerium oxide
KR100343783B1 (en) Method of manufacturing round-edged silica powder with dry process for the EMC
EP0583517A1 (en) Process for purifying silica sand and other materials
JPH0231844A (en) Grinding machine and method for grinding ceramic powder
JPH02160893A (en) Manufacture of high-purity abrasive
JPH0349962B2 (en)
KR100534151B1 (en) Recovery method of abrasives from electrical industry sludge by dry classification