Sun et al., 2015 - Google Patents
Optimization of TiO2/Cu/TiO2 multilayers as a transparent composite electrode deposited by electron-beam evaporation at room temperatureSun et al., 2015
View HTML- Document ID
- 4364431383742523033
- Author
- Sun H
- Wang X
- Kou Z
- Wang L
- Wang J
- Sun Y
- Publication year
- Publication venue
- Chinese Physics B
External Links
Snippet
Highly transparent indium-free composite electrodes of TiO 2/Cu/TiO 2 are deposited by electron-beam evaporation at room temperature. The effects of Cu thickness and annealing temperature on the electrical and optical properties of the multilayer film are investigated …
- 239000002131 composite material 0 title abstract description 6
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GASES [GHG] EMISSION, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/54—Material technologies
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Dhar et al. | Optimization of Nb2O5/Ag/Nb2O5 multilayers as transparent composite electrode on flexible substrate with high figure of merit | |
Sun et al. | Optimization of TiO2/Cu/TiO2 multilayers as a transparent composite electrode deposited by electron-beam evaporation at room temperature | |
Dhar et al. | High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering | |
Dhar et al. | Optimization of TiO2/Cu/TiO2 multilayer as transparent composite electrode (TCE) deposited on flexible substrate at room temperature | |
Gong et al. | Conductive Ga doped ZnO/Cu/Ga doped ZnO thin films prepared by magnetron sputtering at room temperature for flexible electronics | |
Kim et al. | Al-doped ZnO/Ag/Al-doped ZnO multilayer films with a high figure of merit | |
Lu et al. | High quality of IWO films prepared at room temperature by reactive plasma deposition for photovoltaic devices | |
Kim et al. | Realization of highly transparent and low resistance TiO2/Ag/TiO2 conducting electrode for optoelectronic devices | |
Choi et al. | Crystallized indium-tin oxide (ITO) thin films grown at low temperature onto flexible polymer substrates | |
Kim et al. | Control of refractive index by annealing to achieve high figure of merit for TiO2/Ag/TiO2 multilayer films | |
Wu et al. | Characterization of aluminum-doped zinc oxide thin films by RF magnetron sputtering at different substrate temperature and sputtering power | |
Potlog et al. | Influence of RF sputtering power and thickness on structural and optical properties of NiO thin films | |
Shin et al. | Silver nanowires network encapsulated by low temperature sol–gel ZnO for transparent flexible electrodes with ambient stability | |
Lv et al. | Preparation of porous Mo-doped VO2 films via atomic layer deposition and post annealing | |
Bahadoran et al. | The Ag layer thickness effect on the figure of merit of the AZO/Ag bilayer prepared by DC sputtering of AZO and thermal evaporation method of Ag | |
Taha et al. | Improving the optoelectronic properties of titanium-doped indium tin oxide thin films | |
Qasem et al. | Effective role of vacuum annealing in improving structural, optical, and electrical properties of SiO2/Ag/ZnO multilayers deposited by RF sputtering for optoelectronic applications | |
Sugimoto et al. | Thermal durability of AZO/Ag (Al)/AZO transparent conductive films | |
Van Eek et al. | Investigation of material properties and thermal stabilities of magnetron-sputter-deposited ZnO: Al/Ag/ZnO: Al transparent conductive coatings for thin-film solar cell applications | |
Hong et al. | Investigation of the effect of oxygen gas on properties of GAZO thin films fabricated by facing targets sputtering system | |
Maleki et al. | Structural, electrical and optical properties of transparent conducting SnO2 films: effect of the oxygen flow rate | |
Mozaffari et al. | The effect of annealing and layer numbers on the optical and electrical properties of cobalt-doped TiO2 thin films | |
Daza et al. | AZO nanocolumns grown by GLAD: adjustment of optical and structural properties | |
Huh et al. | Improving the morphological and optical properties of sputtered indium tin oxide thin films by adopting ultralow-pressure sputtering | |
You et al. | Fabrication of Ag nanowire and Al-doped ZnO hybrid transparent electrodes |