Pürlü et al., 2022 - Google Patents
Growth and characterization of PALE Si-doped AlN on sapphire substrate by MOVPEPürlü et al., 2022
- Document ID
- 4056976006671351740
- Author
- Pürlü K
- Kocak M
- Yolcu G
- Perkitel I
- Altuntaş
- Demir I
- Publication year
- Publication venue
- Materials Science in Semiconductor Processing
External Links
Snippet
In this study, we report different SiH 4 flow condition effects on crystal, surface, optical, and electrical characteristics of heteroepitaxial Metal-Organic Vapor Phase Epitaxy (MOVPE) grown AlN layers on sapphire substrates. Adjustment of growth kinetics is very important to …
- 229910017083 AlN 0 title abstract description 105
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- H01L21/02612—Formation types
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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