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Xu et al., 2013 - Google Patents

New strategies for Ge-on-Si materials and devices using non-conventional hydride chemistries: the tetragermane case

Xu et al., 2013

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Document ID
3716584635791473088
Author
Xu C
Beeler R
Jiang L
Grzybowski G
Chizmeshya A
Menéndez J
Kouvetakis J
Publication year
Publication venue
Semiconductor science and technology

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We introduce a practical chemical vapor deposition strategy for next-generation Ge-on-Si epitaxy utilizing recently introduced Ge 4 H 10 hydride sources that confer unprecedented deposition efficiencies at very low-temperatures (< 400 C). The corresponding high growth …
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
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    • H01L21/02518Deposited layers
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    • C30B23/00Single-crystal growth by condensing evaporated or sublimed material

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