Marrian et al., 1994 - Google Patents
Low voltage electron beam lithography in self‐assembled ultrathin films with the scanning tunneling microscopeMarrian et al., 1994
View PDF- Document ID
- 3670083078513481166
- Author
- Marrian C
- Perkins F
- Brandow S
- Koloski T
- Dobisz E
- Calvert J
- Publication year
- Publication venue
- Applied physics letters
External Links
Snippet
With a scanning tunneling microscope (STM) operating in vacuum, we have studied the lithographic patterning of self‐assembling organosilane monolayer resist films. Where the organic group is benzyl chloride, the resist layer can be patterned with electrons down to 4 …
- 230000005641 tunneling 0 title abstract description 5
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANO-TECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
- B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANO-TECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
- B82Y40/00—Manufacture or treatment of nano-structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANO-TECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
- B82Y30/00—Nano-technology for materials or surface science, e.g. nano-composites
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Marrian et al. | Low voltage electron beam lithography in self‐assembled ultrathin films with the scanning tunneling microscope | |
| Geyer et al. | Electron-induced crosslinking of aromatic self-assembled monolayers: Negative resists for nanolithography | |
| Pallandre et al. | Binary nanopatterned surfaces prepared from silane monolayers | |
| Hoeppener et al. | Metal nanoparticles, nanowires, and contact electrodes self‐assembled on patterned monolayer templates—a bottom‐up chemical approach | |
| Turchanin et al. | Molecular self‐assembly, chemical lithography, and biochemical tweezers: a path for the fabrication of functional nanometer‐scale protein arrays | |
| Gölzhäuser et al. | Chemical nanolithography with electron beams | |
| US6835534B2 (en) | Chemical functionalization nanolithography | |
| Snow et al. | Nanofabrication with proximal probes | |
| Sugimura et al. | Organosilane monolayer resists for scanning probe lithography | |
| Tully et al. | Synthesis and preparation of ionically bound dendrimer monolayers and application toward scanning probe lithography | |
| Perkins et al. | Proximal probe study of self‐assembled monolayer resist materials | |
| Kleineberg et al. | STM Lithography in an Organic Self‐Assembled Monolayer | |
| Liu et al. | Fabrication of colloidal gold micro-patterns using photolithographed self-assembled monolayers as templates | |
| Marrian et al. | Proximal probe lithography and surface modification | |
| Brandow et al. | Metal pattern fabrication using the local electric field of a conducting atomic force microscope probe | |
| Anderson et al. | Advances in nanolithography using molecular rulers | |
| Anderson et al. | Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography | |
| Diegoli et al. | Engineering nanostructures at surfaces using nanolithography | |
| Ballav et al. | UV-promoted exchange reaction as a tool for gradual tuning the composition of binary self-assembled monolayers and chemical lithography | |
| Djenizian et al. | Electron-beam induced nanomasking for metal electrodeposition on semiconductor surfaces | |
| Xu et al. | Ambient scanning tunneling lithography of Langmuir–Blodgett and self‐assembled monolayers | |
| Chen et al. | Polymer pattern formation on SiO~ 2 surfaces using surface monolayer initiated polymerization | |
| Sugimura et al. | Scanning probe nanofabrication of chemically active areas on substrate covered with organosilane monolayers | |
| Yamada et al. | Evaluation of organic monolayers formed on Si (111): Exploring the possibilities for application in electron beam nanoscale patterning | |
| Lee et al. | Organized molecular assemblies for scanning probe microscope lithography |