Shadmehr et al., 1992 - Google Patents
Principal component analysis of optical emission spectroscopy and mass spectrometry: Application to reactive ion etch process parameter estimation using neural …Shadmehr et al., 1992
View PDF- Document ID
- 3642257597690452782
- Author
- Shadmehr R
- Angell D
- Chou P
- Oehrlein G
- Jaffe R
- Publication year
- Publication venue
- Journal of the Electrochemical Society
External Links
Snippet
We report on a simple technique that characterizes the effect of process parameters (ie, pressure, RF power, and gas mixture) on the optical emission and mass spectra of CHFJO2 plasma. This technique is sensitive to changes in chamber contamination levels (eg …
- 238000000034 method 0 title abstract description 65
Classifications
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
- G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
- G05B23/024—Quantitative history assessment, e.g. mathematical relationships between available data; Functions therefor; Principal component analysis [PCA]; Partial least square [PLS]; Statistical classifiers, e.g. Bayesian networks, linear regression or correlation analysis; Neural networks
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