de Freitas Daudt et al., 2012 - Google Patents
TiN thin film deposition by cathodic cage discharge: effect of cage configuration and active speciesde Freitas Daudt et al., 2012
View PDF- Document ID
- 218052124561737871
- Author
- de Freitas Daudt N
- Barbosa J
- Braz D
- Pereira M
- Junior C
- Publication year
- Publication venue
- Journal of Physics: Conference Series
External Links
Snippet
Plasma cathodic cage technique was developed recently in order to eliminate phenomena such as edge effects and overheating, which occur during conventional nitriding processes. In this work, the effect of plasma active species and cage configurations during thin film …
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride data:image/svg+xml;base64,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 data:image/svg+xml;base64,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 [Sn] 0 title abstract description 17
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Plasma treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pre-treatment of the material to be coated
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Husna et al. | Influence of annealing temperature on the properties of ZnO thin films grown by sputtering | |
Chawla et al. | Structural and optical characterization of ZnO nanocrystalline films deposited by sputtering | |
Shi et al. | Room temperature preparation of high performance AZO films by MF sputtering | |
Shi et al. | Effect of oxygen flow ratio on the wetting behavior, microstructure and mechanical properties of CeO2− x coatings prepared by magnetron sputtering | |
de Freitas Daudt et al. | TiN thin film deposition by cathodic cage discharge: effect of cage configuration and active species | |
Sreedhar et al. | Improved physical properties of Al-doped ZnO thin films deposited by unbalanced RF magnetron sputtering | |
Khan et al. | Deposition and characterization of molybdenum thin films using dc-plasma magnetron sputtering | |
Jamali et al. | Effect of deposition parameters on the microstructure and deposition rate of germanium-carbon coatings prepared by plasma enhanced chemical vapor deposition | |
De Mesa et al. | Effects of Deposition Pressure and Target-Substrate Distance on Growth of ZnO by Femtosecond Pulsed Laser Deposition. | |
Sajjad et al. | Effect of substrate temperature in the synthesis of BN nanostructures | |
Figueiredo et al. | Reducing the incorporation of contaminant oxygen in decorative TiN coatings deposited by low temperature reactive sputtering | |
Tseng et al. | Photoelectron spectroscopy and optical properties of Al-Doped ZnO films prepared by sputtering with radio frequency power applied to Al target | |
Daudt et al. | Effect of cage configuration in structural and optical properties of TiN films grown by cathodic cage discharge | |
Shanmugan et al. | Effect of Ar+ ion irradiation on structural and optical properties of e-beam evaporated cadmium telluride thin films | |
Lu et al. | Influence of ion-beam energy and substrate temperature on the synthesis of carbon nitride thin films by nitrogen-ion-assisted pulsed laser deposition | |
Kavitha et al. | Effect of nitrogen content on physical and chemical properties of TiN thin films prepared by DC magnetron sputtering with supported discharge | |
Semenov et al. | CuO films deposited by superimposed high power impulse and DC magnetron sputtering | |
Flores et al. | Characterization of CdTe films with in situ CdCl2 treatment grown by a simple vapor phase deposition technique | |
Xiao et al. | Structure and oxidation resistance of W1–xAlxN composite films | |
Mickan | Deposition of Al-doped ZnO films by high power impulse magnetron sputtering | |
Chen et al. | Modifications in structure and properties of p-type nickel oxide films after argon ion beam bombardment | |
Kreutz et al. | PLD of perovskite coatings for optoelectronics, microelectronics, and microtechnology | |
Borysiewicz et al. | Investigation of porous Zn growth mechanism during Zn reactive sputter deposition | |
HUANG et al. | Structural and optical properties of ZnO films with different thicknesses grown on sapphire by MOCVD | |
Ohmi et al. | Low-temperature synthesis of microcrystalline 3C-SiC film by high-pressure hydrogen-plasma-enhanced chemical transport |