Nishizawa et al., 1996 - Google Patents
Stoichiometry‐dependent deep levels in n‐type InP prepared by annealing under controlled phosphorus vapor pressureNishizawa et al., 1996
View PDF- Document ID
- 18125199317674881095
- Author
- Nishizawa J
- Oyama Y
- Suto K
- Kim K
- Publication year
- Publication venue
- Journal of applied physics
External Links
Snippet
The photocapacitance method is applied to investigate the stoichiometry‐dependent deep levels in intentionally‐undoped n‐type InP crystals prepared by 4 h annealing at 700° C under controlled phosphorus vapor pressure. The present photocapacitance measurements …
- OAICVXFJPJFONN-UHFFFAOYSA-N phosphorus 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 [P] 0 title abstract description 32
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
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- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
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- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
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- H01L21/0405—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
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- H01L31/0248—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
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- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
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- H01L31/08—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
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- H01L31/18—Processes or apparatus peculiar to the manufacture or treatment of these devices or of parts thereof
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- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
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