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Sharpe Jr et al., 2007 - Google Patents

Strain measurements of silicon dioxide microspecimens by digital imaging processing

Sharpe Jr et al., 2007

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Document ID
17955381034721782866
Author
Sharpe Jr W
Pulskamp J
Gianola D
Eberl C
Polcawich R
Thompson R
Publication year
Publication venue
Experimental Mechanics

External Links

Snippet

Silicon dioxide thin film is a common component in electronic devices and in MEMS, but its mechanical properties have rarely been studied. Techniques have been adapted and developed to conduct tensile tests on 1.0 μm thick silicon dioxide specimens that are 100 …
Continue reading at www.researchgate.net (PDF) (other versions)

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2203/00Investigating strength properties of solid materials by application of mechanical stress
    • G01N2203/02Details not specific for a particular testing method

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