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Rhee et al., 2013 - Google Patents

Stabilized two-dimensional linewidth enhancement in direct laser lithography

Rhee et al., 2013

Document ID
16004381789589294870
Author
Rhee H
Ghim Y
Lee Y
Publication year
Publication venue
Precision Engineering

External Links

Snippet

In order to realize a small linewidth two-dimensional direct laser lithographic technique with enhanced resolution, we propose two apparatuses. The first one uses a polarizing beam splitter to separate a source beam into two output beams, and these two beams overlap on …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70258—Projection system adjustment, alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70375—Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02055—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques
    • G01B9/02056—Passive error reduction, i.e. not varying during measurement, e.g. by constructional details of optics
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02055—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques
    • G01B9/02075—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques of particular errors
    • G01B9/02078—Caused by ambiguity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00—Other optical systems; Other optical apparatus
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02001—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by manipulating or generating specific radiation properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00—Other optical systems; Other optical apparatus
    • G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02015—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
    • G01B9/02022—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infra-red or ultra-violet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms

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