[go: up one dir, main page]

Malinauskas et al., 2013 - Google Patents

Ultrafast laser nanostructuring of photopolymers: A decade of advances

Malinauskas et al., 2013

View PDF
Document ID
1567763648219090244
Author
Malinauskas M
Farsari M
Piskarskas A
Juodkazis S
Publication year
Publication venue
Physics Reports

External Links

Snippet

Research into the three-dimensional nanostructuring of photopolymers by ultrashort laser pulses has seen immense growth over the last decade. In this paper, we review the basic principles and the most important developments and applications of this technology. We …
Continue reading at www.academia.edu (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking, vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking, vulcanising during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking, vulcanising during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking, vulcanising during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking, vulcanising during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made
    • G02B1/002—Optical elements characterised by the material of which they are made made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00—Light guides
    • G02B6/10—Light guides of the optical waveguide type
    • G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
    • B29C67/0051—Rapid manufacturing and prototyping of 3D objects by additive depositing, agglomerating or laminating of plastics material, e.g. by stereolithography or selective laser sintering
    • B29C67/0055—Rapid manufacturing and prototyping of 3D objects by additive depositing, agglomerating or laminating of plastics material, e.g. by stereolithography or selective laser sintering using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C67/0062—Rapid manufacturing and prototyping of 3D objects by additive depositing, agglomerating or laminating of plastics material, e.g. by stereolithography or selective laser sintering using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00—Optical elements other than lenses

Similar Documents

Publication Publication Date Title
Malinauskas et al. Ultrafast laser nanostructuring of photopolymers: A decade of advances
Harinarayana et al. Two-photon lithography for three-dimensional fabrication in micro/nanoscale regime: A comprehensive review
Skliutas et al. Polymerization mechanisms initiated by spatio-temporally confined light
Wang et al. Two‐photon polymerization lithography for optics and photonics: fundamentals, materials, technologies, and applications
Malinauskas et al. Ultrafast laser processing of materials: from science to industry
Wang et al. Toward near-perfect diffractive optical elements via nanoscale 3D printing
Jaiswal et al. Two decades of two-photon lithography: Materials science perspective for additive manufacturing of 2D/3D nano-microstructures
Li et al. Multiphoton polymerization
LaFratta et al. Multiphoton fabrication
Lee et al. Advances in 3D nano/microfabrication using two-photon initiated polymerization
Wu et al. Two-photon polymerisation for three-dimensional micro-fabrication
Gao et al. 3D printed optics and photonics: Processes, materials and applications
US20220234282A1 (en) Continuous and scalable 3d nanoprinting
Sekkat et al. Laser nanofabrication in photoresists and azopolymers
Malinauskas et al. Two-photon polymerization for fabrication of three-dimensional micro-and nanostructures over a large area
JP2003001599A (en) Manufacture method of three-dimensional minute structure and apparatus thereof
Butkus et al. Femtosecond-laser direct writing 3D micro/nano-lithography using VIS-light oscillator
Bieda et al. Two-photon polymerization of a branched hollow fiber structure with predefined circular pores
Jipa et al. Femtosecond laser lithography in organic and non-organic materials
Ladika et al. X-photon 3D lithography by fs-oscillators: wavelength-independent and photoinitiator-free
Malinauskas et al. Direct laser writing of microoptical structures using a Ge-containing hybrid material
Žukauskas et al. Single-step direct laser fabrication of complex shaped microoptical components
Seok et al. Micro/nanoscale 3-dimensional fabrication using multi-photons polymerization
Zheng et al. Fabrication of sub-150 nm structures by two-photon polymerization for plasmon excitation
Žukauskas et al. 3D micro-optics via ultrafast laser writing: miniaturization, integration, and multifunctionalities