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Theirich et al., 2003 - Google Patents

Intermediate gas phase precursors during plasma CVD of HMDSO

Theirich et al., 2003

Document ID
14059504103791347489
Author
Theirich D
Soll C
Leu F
Engemann J
Publication year
Publication venue
Vacuum

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Snippet

In plasma enhanced chemical vapor deposition (PECVD) from complex molecules like hexamethyldisiloxan (HMDSO) often not the molecules themselves but intermediate and reactive radicals or molecules are the precursors for film growth. Additionally, such PECVD …
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