Bowman et al., 2010 - Google Patents
An SLM-based Shack–Hartmann wavefront sensor for aberration correction in opticaltweezersBowman et al., 2010
View PDF- Document ID
- 136247217770939131
- Author
- Bowman R
- Wright A
- Padgett M
- Publication year
- Publication venue
- Journal of Optics
External Links
Snippet
Holographic optical tweezers allow the creation of multiple optical traps in 3D configurations through the use of dynamic diffractive optical elements called spatial light modulators (SLMs). We show that, in addition to controlling traps, the SLM in a holographic tweezers …
- 230000004075 alteration 0 title abstract description 49
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B27/00—Other optical systems; Other optical apparatus
- G02B27/0025—Other optical systems; Other optical apparatus for optical correction, e.g. distorsion, aberration
- G02B27/0068—Other optical systems; Other optical apparatus for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing of optical properties of lenses
- G01M11/0242—Testing of optical properties of lenses by measuring geometrical properties or aberrations
- G01M11/0257—Testing of optical properties of lenses by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B26/00—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
- G02B26/06—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B27/00—Other optical systems; Other optical apparatus
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B27/00—Other optical systems; Other optical apparatus
- G02B27/50—Optics for phase object visualisation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical means
- G01B11/24—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B5/00—Optical elements other than lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B21/00—Microscopes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Bowman et al. | An SLM-based Shack–Hartmann wavefront sensor for aberration correction in opticaltweezers | |
KR102128642B1 (en) | Adjustment method for adaptive optics system, adaptive optics system, and storage medium storing program for adaptive optics system | |
US9519141B2 (en) | Correspondence relation specifying method for adaptive optics system, adaptive optics system, and storage medium storing program for adaptive optics system | |
JP5919100B2 (en) | ADJUSTING OPTICAL SYSTEM ADJUSTING METHOD AND COMPENSATING OPTICAL SYSTEM | |
US9575302B2 (en) | Stimulated emission depletion microscopy | |
JP5351976B2 (en) | Double grating lateral shearing wavefront sensor | |
JP5139832B2 (en) | Observation device | |
US9927608B2 (en) | Correspondence relation specifying method for adaptive optics system, wavefront distortion compensation method, adaptive optics system, and storage medium storing program for adaptive optics system | |
JP2013544377A (en) | Method and system for calibrating a spatial optical modulator in an optical microscope | |
Bos et al. | On-sky verification of Fast and Furious focal-plane wavefront sensing: Moving forward toward controlling the island effect at Subaru/SCExAO | |
EP1626257A1 (en) | Method and device for wave-front sensing | |
US20220381695A1 (en) | Focus scan type imaging device for imaging target object in sample that induces aberration | |
Carbillet et al. | Wavefront sensing: from historical roots to the state-of-the-art | |
US7232999B1 (en) | Laser wavefront characterization | |
US8009280B1 (en) | Wavefront characterization and correction | |
Zhang et al. | LCoS display phase self-calibration method based on diffractive lens schemes | |
Abdelazeem et al. | Characterization of thick and contact lenses using an adaptive Shack–Hartmann wavefront sensor: Limitations and solutions | |
Mazzoleni et al. | Design and performances of the Shack-Hartmann sensor within the Active Phasing Experiment | |
JP2022044113A (en) | Aberration estimation method, aberration estimation device, program and storage medium | |
JP2007025503A (en) | Deformable mirror deformation method, optical device using the method, and fundus oculi observation device | |
Loupias et al. | Status of an extreme adaptive optics testbench using a self-referenced Mach-Zehnder wavefront sensor | |
US8882274B1 (en) | Laser wavefront characterization | |
US20250012636A1 (en) | Ascertainment of a wavefront gradient of a light on the basis of angle-dependent transmission | |
Vallmitjana Rico et al. | Testing two techniques for wavefront analysis. Specific applications and comparative study | |
Papučka-Platukis et al. | Flattening of Convex Adaptive Secondary Mirrors Using Focal Plane Image Metrics: A Case Study on the UH-88 Telescope |