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Window et al., 1989 - Google Patents

Strain, ion bombardment and energetic neutrals in magnetron sputtering

Window et al., 1989

Document ID
11241923480854568076
Author
Window B
Müller K
Publication year
Publication venue
Thin Solid Films

External Links

Snippet

The lattice strain in films of chromium, molybdenum and tungsten sputtered under the gases argon and xenon and at various bias voltages have been measured using X-ray diffraction. The results show the effects of energetic neutral bombardment in cases such as W-Ar or Mo …
Continue reading at www.sciencedirect.com (other versions)

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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
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    • C23C14/0021—Reactive sputtering or evaporation
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    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
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    • C23C14/0021—Reactive sputtering or evaporation
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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