Liu et al., 2023 - Google Patents
Novel green chemical mechanical polishing of fused silica through designing synergistic CeO2/h-BN abrasives with lubricityLiu et al., 2023
- Document ID
- 10099777893125731898
- Author
- Liu J
- Zhang Z
- Shi C
- Ren Z
- Feng J
- Zhou H
- Liu Z
- Meng F
- Zhao S
- Publication year
- Publication venue
- Applied Surface Science
External Links
Snippet
It is a challenge to produce an atomic-scale surface of fused silica with a high material removal rate (MRR) using green chemical mechanical polishing (CMP). In traditional CMP, a slurry usually contains four or more components and is normally toxic and corrosive, causing …
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; MISCELLANEOUS COMPOSITIONS; MISCELLANEOUS APPLICATIONS OF MATERIALS
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
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