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Chiang et al., 2007 - Google Patents

Systematic Yield-Lithography

Chiang et al., 2007

Document ID
10001450807639175278
Author
Chiang C
Kawa J
Publication year
Publication venue
Design for Manufacturability and Yield for Nano-Scale CMOS

External Links

Snippet

As technology advances from one technology node to the next in the nano era of CMOS processing one theme that must be carefully attended to is the transition from random to systematic failure modes as the main cause of yield loss. And, the deeper we go in the nano …
Continue reading at link.springer.com (other versions)

Classifications

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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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