ZA200408532B - Plasma Catalyst. - Google Patents

Plasma Catalyst. Download PDF

Info

Publication number: ZA200408532B
Authority: ZA; South Africa
Prior art keywords: cavity; plasma; catalyst; radiation; mode
Prior art date: 2002-05-08

Application number

ZA200408532A

Other languages

English (en)

Inventor

Satyendra Kumar

Devendra Kumar

Original Assignee

Dana Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-05-08

Filing date

2004-10-21

Publication date

2005-05-30

2004-10-21 Application filed by Dana Corp filed Critical Dana Corp

2005-05-30 Publication of ZA200408532B publication Critical patent/ZA200408532B/en

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Physical Or Chemical Processes And Apparatus (AREA)

ZA200408532A 2002-05-08 2004-10-21 Plasma Catalyst. ZA200408532B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US37869302P	2002-05-08	2002-05-08

Publications (1)

Publication Number	Publication Date
ZA200408532B true ZA200408532B (en)	2005-05-30

Family

ID=35161028

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ZA200408532A ZA200408532B (en)	2002-05-08	2004-10-21	Plasma Catalyst.

Country Status (2)

Country	Link
CN (1)	CN101076221B (zh)
ZA (1)	ZA200408532B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN102419175B (zh) *	2011-12-15	2014-01-01	东南大学	基于柔性表面等离子体激元波导的光学陀螺
CN102419176B (zh) *	2011-12-15	2014-01-01	东南大学	基于柔性材料光波导的光学陀螺
DE102015111555B3 (de) *	2015-07-16	2016-09-29	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Anordnung zur Behandlung von Materialien mit Mikrowellen
CN105916284B (zh) *	2016-07-04	2018-04-06	江阴恩特莱特镀膜科技有限公司	一种等离子喷涂粉末熔化辅助装置
CN106731540A (zh) *	2016-11-23	2017-05-31	中科益盛科技有限公司	一种气态分子共振毒废处理机
CN111058090B (zh) *	2020-01-03	2021-08-13	北京北方华创微电子装备有限公司	金属氮化物硬掩膜的制备方法
CN111479375B (zh) *	2020-05-08	2022-12-02	高维等离子体源科技(孝感)有限公司	一种表面耦合诱导电离技术及其对应的等离子体与等离子体器件

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5015349A (en) *	1988-12-23	1991-05-14	University Of Connecticut	Low power density microwave discharge plasma excitation energy induced chemical reactions
EP0435591A3 (en) *	1989-12-27	1991-11-06	Exxon Research And Engineering Company	Conversion of methane using microwave radiation
US6248206B1 (en) *	1996-10-01	2001-06-19	Applied Materials Inc.	Apparatus for sidewall profile control during an etch process
JP2991192B1 (ja) *	1998-07-23	1999-12-20	日本電気株式会社	プラズマ処理方法及びプラズマ処理装置
AU2003230264A1 (en) *	2002-05-08	2003-11-11	Dana Corporation	Plasma assisted dry processing

2003
- 2003-05-07 CN CN 200710107412 patent/CN101076221B/zh not_active Expired - Fee Related
2004
- 2004-10-21 ZA ZA200408532A patent/ZA200408532B/en unknown

Also Published As

Publication number	Publication date
CN101076221A (zh)	2007-11-21
CN101076221B (zh)	2011-08-31

Publication	Publication Date	Title
US7608798B2 (en)	2009-10-27	Plasma catalyst
US7497922B2 (en)	2009-03-03	Plasma-assisted gas production
US7432470B2 (en)	2008-10-07	Surface cleaning and sterilization
WO2003096766A1 (en)	2003-11-20	Plasma control using phase and/or frequency of multiple radiation sources
US20060062930A1 (en)	2006-03-23	Plasma-assisted carburizing
ZA200408532B (en)	2005-05-30	Plasma Catalyst.