WO2025044517A1 - Display substrate and display device - Google Patents
Display substrate and display device Download PDFInfo
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- WO2025044517A1 WO2025044517A1 PCT/CN2024/104157 CN2024104157W WO2025044517A1 WO 2025044517 A1 WO2025044517 A1 WO 2025044517A1 CN 2024104157 W CN2024104157 W CN 2024104157W WO 2025044517 A1 WO2025044517 A1 WO 2025044517A1
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- 239000000758 substrate Substances 0.000 title claims abstract description 140
- 239000010408 film Substances 0.000 claims description 127
- 239000002184 metal Substances 0.000 claims description 49
- 238000005452 bending Methods 0.000 claims description 35
- 230000002093 peripheral effect Effects 0.000 claims description 32
- 238000004804 winding Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 5
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- 238000000034 method Methods 0.000 description 17
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- 230000009286 beneficial effect Effects 0.000 description 2
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
Definitions
- the present disclosure relates to the field of display technology, and in particular to a display substrate and a display device.
- the embodiments of the present disclosure provide a display substrate and a display device, which can reduce crosstalk between different signals and improve product quality.
- a display substrate comprising:
- a second conductive layer located on the base substrate, wherein the first conductive layer and the second conductive layer are arranged in different layers, and the second conductive layer has a second signal pattern, wherein the orthographic projections of the first signal pattern and the second signal pattern on the base substrate have an overlapping area;
- a shielding layer is located on the base substrate, the shielding layer is located between the first conductive layer and the second conductive layer, and the shielding layer, the first conductive layer and the second conductive layer are insulated from each other by an insulating layer;
- the shielding layer comprises at least two stacked sub-shielding film layers, each of which Both are provided with a hollow area and a shielding area, and the part where the orthographic projection of the hollow area of one layer of the sub-shielding film layer on the base substrate overlaps with the orthographic projection of the shielding area of another layer of the sub-shielding film layer on the base substrate is the first overlapping area, and the first overlapping area at least partially overlaps with the overlapping area.
- different electrical signals may be applied to the first signal pattern and the second signal pattern, respectively.
- the display substrate has a display area and a peripheral area located outside the display area, and a driving integrated circuit is disposed in the peripheral area on the binding side of the display substrate;
- the display substrate comprises:
- a plurality of touch control leads extending from the display area, wherein the plurality of touch control leads are located in the peripheral area and connected to the driving integrated circuit;
- a plurality of data line leads extending from the display area, the data line leads being located in the peripheral area and connected to the drive integrated circuit;
- the first signal pattern includes one of the overlapping touch leads and the data line leads
- the second signal pattern includes the other of the overlapping touch leads and the data line leads.
- the peripheral area includes a non-bending area, a bending area and a binding area, the non-bending area is adjacent to the display area, and the bending area is located between the binding area and the non-bending area;
- the plurality of touch leads extend from the non-bending area through the bending area to the binding area, and the lead portion of at least part of the touch leads extending into the binding area is bent along a second direction intersecting the first direction to form a winding segment, and the end of the winding segment extends along the first direction to the driver integrated circuit; wherein the winding segment intersects with the data line lead corresponding to its position, and the orthographic projection of the shielding layer on the base substrate at least covers the orthographic projection of the winding segment on the base substrate.
- the display substrate further includes:
- the plurality of touch leads include: a plurality of first touch leads drawn from a plurality of rows of the first electrode chains, and a plurality of second touch leads drawn from a plurality of columns of the second electrode chains.
- the peripheral region further includes a first side and a second side opposite to each other in the extending direction of the gate lines;
- the plurality of touch leads are divided into a first group of touch leads and a second group of touch leads;
- the first group of touch leads includes a plurality of first touch leads extending from a first side of the first electrode chain, and a plurality of second touch leads close to the first side;
- Each of the touch leads in the second group of touch leads is bent toward the direction approaching the first group of touch leads after extending from the non-bending area through the bending area to the binding area to form the winding segment.
- the same signal is connected to each sub-shielding film layer.
- the display substrate further includes:
- the source-drain metal layer has a pattern including a source and a drain of a thin film transistor, and at least one of a data line; at least one layer of the sub-shielding film layer is in the same layer and made of the same material as the source-drain metal layer.
- the display substrate further includes:
- the patterns of the at least two touch metal layers at least include the patterns of touch electrodes; wherein at least one of the sub-shielding film layers and at least one of the touch metal layers are in the same layer and are made of the same material.
- the hollow area on each of the sub-shielding film layers includes an opening array, and the opening array includes a plurality of openings distributed in an array, wherein the opening array on one of the sub-shielding film layers is The opening array on the other sub-shielding film layer is arranged in a staggered manner along the row direction or the column direction so that the hollow area on one of the sub-shielding film layers and the shielding area of the other sub-shielding film layer at least partially overlap with the orthographic projection on the base substrate; and/or
- the hollow area on each of the sub-shielding film layers includes a plurality of strip openings arranged at intervals, wherein one of the sub-shielding film layers is staggered relative to the strip openings on another sub-shielding film layer in a direction perpendicular to the strip openings, so that the hollow area on one of the sub-shielding film layers at least partially overlaps with the orthographic projection of the shielding area on the other sub-shielding film layer on the base substrate.
- a display device comprising the display substrate as described above.
- the display substrate and display device there is an overlapping area between the first signal pattern and the second signal pattern in the display substrate, and a shielding layer is arranged between the two, which can reduce signal crosstalk.
- a shielding layer is arranged between the two, which can reduce signal crosstalk.
- the first signal pattern and the second signal pattern are in different layers and are insulated, there is an insulating layer between the two, and the insulating layer can be made of organic or inorganic materials.
- the shielding layer located above the organic insulating layer needs to be provided with a hollow area, and the hollow area serves as an exhaust hole.
- the shielding layer is set to at least two layers of sub-shielding film layers, and the part where the orthographic projection of the hollow area on at least one sub-shielding film layer overlaps with the shielding area of another sub-shielding film layer on the base substrate is the first overlapping area, and the first overlapping area at least partially overlaps with the overlapping area.
- the hollow areas of at least two layers of sub-shielding film layers compensate each other at least in the overlapping area of the first signal pattern and the second signal pattern, so that the entire shielding layer forms a complete shielding surface at least in the overlapping area, which can effectively avoid crosstalk between different signals on the first signal pattern and the second signal pattern, thereby improving product quality.
- FIG1A is a schematic diagram showing the structure of a display substrate provided by an embodiment of the present disclosure, wherein a display function layer is not shown;
- FIG. 1B is a schematic diagram showing the structure of a display substrate provided in an embodiment of the present disclosure, wherein The touch layer is exposed;
- FIG. 2 is an enlarged view of the wiring of the touch lead and the data line lead at the local position O in FIG. 1A and FIG. 1B ;
- FIG3 shows an enlarged view of the pattern of the first sub-shielding film layer at a local position O in FIG1A and FIG1B;
- FIG4 shows an enlarged view of the pattern of the second sub-shielding film layer at a local position O in FIG1A and FIG1B;
- FIG5 is a schematic diagram showing a structure in which only one first sub-shielding film layer is provided at a local position O in FIG1A;
- Fig. 6 is a cross-sectional view taken along line A-A' in Fig. 5;
- Fig. 7 is a cross-sectional view taken along line B-B' in Fig. 5;
- FIG8 is a schematic diagram showing a stacking pattern of a data line lead, a touch control lead, a first sub-shielding film layer and a second sub-shielding film layer at a local position O in FIG1A and FIG1B;
- Fig. 9 is a cross-sectional view taken along line A-A' in Fig. 8;
- Fig. 10 is a cross-sectional view taken along line B-B' in Fig. 8;
- Fig. 11 is a cross-sectional view taken along line C-C' in Fig. 8;
- FIG12 is a schematic diagram showing a pattern of the first sub-shielding film layer in another embodiment
- FIG13 is a schematic diagram showing a pattern of the second sub-shielding film layer in another embodiment
- FIG14 is a schematic diagram showing a pattern stacking of a first sub-shielding film layer and a second sub-shielding film layer in another embodiment
- FIG15 is a schematic diagram showing a pattern of the first sub-shielding film layer in another embodiment
- FIG16 is a schematic diagram showing a pattern of the second sub-shielding film layer in another embodiment
- FIG17 is a schematic diagram showing a pattern stacking of a first sub-shielding film layer and a second sub-shielding film layer in another embodiment
- FIG18 is a schematic diagram showing a circuit structure of a pixel circuit structure in a sub-LTPS mode in a display panel provided in an embodiment of the present disclosure
- FIG. 19 is a schematic diagram of the circuit structure of a sub-pixel driving circuit of an LTPO mode in a display substrate provided in an embodiment of the present disclosure.
- Touch display devices integrate a touch panel and a display panel.
- a touch display device When using a touch display device, a user can directly input or control operations by touch, making the application of the touch display device more convenient.
- TSP Touch Sensor Panel
- FMLOC Flexible Multi Layer On Cell
- PNL packaging substrate of the display panel
- peripheral routing is inevitably required in the peripheral area of the display panel, such as peripheral display routing (BP routing), peripheral touch routing (TP routing) and screen crack detection routing (PCD routing), etc.
- BP routing peripheral display routing
- TP routing peripheral touch routing
- PCD routing screen crack detection routing
- the peripheral touch routing is used to realize the touch function
- the peripheral display routing is used to realize the display function
- the screen crack detection routing is used to realize the edge fracture or hole area fracture detection function.
- the periphery of the FMLOC display panel is equipped with a variety of peripheral signal lines. There are overlapping areas between signal routings, which causes signal crosstalk and affects the quality of display products.
- the embodiments of the present disclosure provide a display substrate and a display device, which can reduce the signal crosstalk problem and improve the quality of display products.
- the gate drive circuit 230 is located in the peripheral area B, and the gate drive circuit 230 is connected to a plurality of gate lines Gate1, Gate2, ..., Gaten.
- the gate drive circuit 230 includes a plurality of shift registers GOA0, GOA1, ..., GOAn in a multi-stage cascade, that is, the output end of the first shift register GOAi of the i-th stage is connected to the reset end of the first shift register GOA(i+1) of the i+1-th stage.
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Abstract
Description
相关申请的交叉引用CROSS-REFERENCE TO RELATED APPLICATIONS
本申请主张在2023年08月31日在中国提交的中国专利申请号No.:202311120193.X的优先权,其全部内容通过引用包含于此。This application claims priority to Chinese patent application No.: 202311120193.X filed in China on August 31, 2023, the entire contents of which are incorporated herein by reference.
本公开涉及显示技术领域,尤其涉及一种显示基板及显示装置。The present disclosure relates to the field of display technology, and in particular to a display substrate and a display device.
在相关技术中,显示面板内部布设线路众多,一些线路上分别施加不同信号的,但是在会存在交叠,这些交叠区的存在会导致不同信号相互串扰,而影响产品品质。In the related art, there are many circuits arranged inside the display panel, and different signals are applied to some of the circuits, but there will be overlaps. The existence of these overlapping areas will cause crosstalk between different signals, thus affecting product quality.
发明内容Summary of the invention
本公开实施例提供了一种显示基板及显示装置,能够减少不同信号串扰,提升产品品质。The embodiments of the present disclosure provide a display substrate and a display device, which can reduce crosstalk between different signals and improve product quality.
本公开实施例所提供的技术方案如下:The technical solutions provided by the embodiments of the present disclosure are as follows:
根据本公开的第一方面,提供了一种显示基板,包括:According to a first aspect of the present disclosure, there is provided a display substrate, comprising:
衬底基板;substrate substrate;
位于所述衬底基板之上的第一导电层,所述第一导电层具有第一信号图案;A first conductive layer located on the base substrate, wherein the first conductive layer has a first signal pattern;
位于所述衬底基板之上的第二导电层,所述第一导电层与所述第二导电层不同层设置,且所述第二导电层具有第二信号图案,其中所述第一信号图案与所述第二信号图案在所述衬底基板上的正投影具有交叠区;及a second conductive layer located on the base substrate, wherein the first conductive layer and the second conductive layer are arranged in different layers, and the second conductive layer has a second signal pattern, wherein the orthographic projections of the first signal pattern and the second signal pattern on the base substrate have an overlapping area; and
位于所述衬底基板之上的屏蔽层,所述屏蔽层位于所述第一导电层与所述第二导电层之间,且所述屏蔽层、所述第一导电层和所述第二导电层之间通过绝缘层彼此绝缘设置;其中,A shielding layer is located on the base substrate, the shielding layer is located between the first conductive layer and the second conductive layer, and the shielding layer, the first conductive layer and the second conductive layer are insulated from each other by an insulating layer; wherein,
所述屏蔽层包括堆叠设置的至少两层子屏蔽膜层,每层所述子屏蔽膜层 均设有镂空区和遮蔽区,且一层所述子屏蔽膜层的镂空区在所述衬底基板上的正投影与另一层所述子屏蔽膜层的遮蔽区在所述衬底基板上的正投影交叠的部分为第一叠置区,所述第一叠置区与所述交叠区至少部分重合。The shielding layer comprises at least two stacked sub-shielding film layers, each of which Both are provided with a hollow area and a shielding area, and the part where the orthographic projection of the hollow area of one layer of the sub-shielding film layer on the base substrate overlaps with the orthographic projection of the shielding area of another layer of the sub-shielding film layer on the base substrate is the first overlapping area, and the first overlapping area at least partially overlaps with the overlapping area.
示例性的,所述第一信号图案与所述第二信号图案上可分别施加不同电信号。Exemplarily, different electrical signals may be applied to the first signal pattern and the second signal pattern, respectively.
示例性的,所述显示基板具有显示区域及位于所述显示区域外围的外围区域,在所述显示基板的绑定侧,所述外围区域设置有驱动集成电路;Exemplarily, the display substrate has a display area and a peripheral area located outside the display area, and a driving integrated circuit is disposed in the peripheral area on the binding side of the display substrate;
所述显示基板包括:The display substrate comprises:
由所述显示区域引出的多条触控引线,多条所述触控引线位于所述外围区域,且连接至所述驱动集成电路;及A plurality of touch control leads extending from the display area, wherein the plurality of touch control leads are located in the peripheral area and connected to the driving integrated circuit; and
由所述显示区域引出的多条数据线引线,所述数据线引线位于所述外围区域,且连接至所述驱动集成电路;其中,A plurality of data line leads extending from the display area, the data line leads being located in the peripheral area and connected to the drive integrated circuit; wherein,
至少部分所述触控引线与部分所述数据线引线在所述衬底基板上的正投影交叠,所述第一信号图案包括交叠的所述触控引线和所述数据线引线中的一者,所述第二信号图案包括交叠的所述触控引线和所述数据线引线中的另一者。At least part of the touch leads overlap with part of the data line leads in their orthographic projections on the base substrate, the first signal pattern includes one of the overlapping touch leads and the data line leads, and the second signal pattern includes the other of the overlapping touch leads and the data line leads.
示例性的,在所述绑定侧,所述外围区域包括非弯折区、弯折区及绑定区,所述非弯折区邻接所述显示区域,所述弯折区位于所述绑定区与所述非弯折区之间;其中,Exemplarily, on the binding side, the peripheral area includes a non-bending area, a bending area and a binding area, the non-bending area is adjacent to the display area, and the bending area is located between the binding area and the non-bending area; wherein,
多条所述数据线引线自所述非弯折区经过所述弯折区延伸至所述绑定区内,且所述至少部分数据线引线中延伸至所述绑定区内的引线部分沿第一方向延伸并连接至所述驱动集成电路上;A plurality of data line leads extend from the non-bending area through the bending area to the binding area, and the lead portions of at least some of the data line leads extending into the binding area extend along a first direction and are connected to the driver integrated circuit;
多条所述触控引线自所述非弯折区经过所述弯折区延伸至所述绑定区内,且所述至少部分触控引线中延伸至所述绑定区内的引线部分沿与所述第一方向交叉的第二方向弯折,以形成绕线段,所述绕线段的端部沿所述第一方向延伸至所述驱动集成电路上;其中所述绕线段和与其位置对应的所述数据线引线交叉,所述屏蔽层在所述衬底基板上的正投影至少覆盖所述绕线段在所述衬底基板上的正投影。The plurality of touch leads extend from the non-bending area through the bending area to the binding area, and the lead portion of at least part of the touch leads extending into the binding area is bent along a second direction intersecting the first direction to form a winding segment, and the end of the winding segment extends along the first direction to the driver integrated circuit; wherein the winding segment intersects with the data line lead corresponding to its position, and the orthographic projection of the shielding layer on the base substrate at least covers the orthographic projection of the winding segment on the base substrate.
示例性的,所述显示基板还包括: Exemplarily, the display substrate further includes:
多条栅线和多条数据线,多条栅线与多条数据线交叉,所述数据线引线自所述数据线向所述外围区域引出;A plurality of gate lines and a plurality of data lines, wherein the plurality of gate lines intersect with the plurality of data lines, and the data line leads are led out from the data lines to the peripheral area;
多行第一电极链,所述第一电极链与所述栅线延伸方向相同;A plurality of rows of first electrode chains, wherein the first electrode chains and the gate lines extend in the same direction;
多列第二电极链,所述第二电极链与所述数据线延伸方向相同;A plurality of columns of second electrode chains, wherein the second electrode chains and the data lines extend in the same direction;
所述多条触控引线包括:自多行所述第一电极链引出的多条第一触控引线、及自多列所述第二电极链引出的多条第二触控引线。The plurality of touch leads include: a plurality of first touch leads drawn from a plurality of rows of the first electrode chains, and a plurality of second touch leads drawn from a plurality of columns of the second electrode chains.
示例性的,所述外围区域还包括在所述栅线延伸方向上相对的第一侧和第二侧;Exemplarily, the peripheral region further includes a first side and a second side opposite to each other in the extending direction of the gate lines;
所述多条触控引线分为第一组触控引线和第二组触控引线;The plurality of touch leads are divided into a first group of touch leads and a second group of touch leads;
所述第一组触控引线包括自所述第一电极链的第一侧引出的若干第一触控引线、及靠近所述第一侧的若干所述第二触控引线;The first group of touch leads includes a plurality of first touch leads extending from a first side of the first electrode chain, and a plurality of second touch leads close to the first side;
所述第二组触控引线包括自所述第一电极链的第二侧引出的若干第一触控引线、及靠近所述第二侧的若干所述第二触控引线;The second group of touch leads includes a plurality of first touch leads extending from the second side of the first electrode chain and a plurality of second touch leads close to the second side;
其中,所述第二组触控引线中的各触控引线在自所述非弯折区经过所述弯折区延伸至所述绑定区之后向靠近所述第一组触控引线的方向弯折,以形成所述绕线段。Each of the touch leads in the second group of touch leads is bent toward the direction approaching the first group of touch leads after extending from the non-bending area through the bending area to the binding area to form the winding segment.
示例性的,各层所述子屏蔽膜层上接入相同的信号。Exemplarily, the same signal is connected to each sub-shielding film layer.
示例性的,所述显示基板还包括:Exemplarily, the display substrate further includes:
源漏金属层,所述源漏金属层的图案包括薄膜晶体管的源极和漏极、及数据线中至少一种;至少一层所述子屏蔽膜层与所述源漏金属层同层且同材质。The source-drain metal layer has a pattern including a source and a drain of a thin film transistor, and at least one of a data line; at least one layer of the sub-shielding film layer is in the same layer and made of the same material as the source-drain metal layer.
示例性的,所述显示基板还包括:电极层,所述电极层的图案包括阳极,至少一层所述子屏蔽膜层与所述电极层同层且同材质。Exemplarily, the display substrate further includes: an electrode layer, the pattern of the electrode layer includes an anode, and at least one layer of the sub-shielding film layer is in the same layer and made of the same material as the electrode layer.
示例性的,所述显示基板还包括:Exemplarily, the display substrate further includes:
至少两层触控金属层,至少两层触控金属层的图案至少包括触控电极的图案;其中,至少一层所述子屏蔽膜层与至少一层所述触控金属层同层且同材质设置。At least two touch metal layers, the patterns of the at least two touch metal layers at least include the patterns of touch electrodes; wherein at least one of the sub-shielding film layers and at least one of the touch metal layers are in the same layer and are made of the same material.
示例性的,每一所述子屏蔽膜层上的所述镂空区包括开口阵列,所述开口阵列包括阵列分布的多个开口,其中一个所述子屏蔽膜层上的开口阵列相 对另一个所述子屏蔽膜层上的开口阵列沿行方向或列方向错位排列,以使其中一层所述子屏蔽膜层上的镂空区与另一层所述子屏蔽膜层的遮蔽区在所述衬底基板上的正投影至少部分重合;和/或Exemplarily, the hollow area on each of the sub-shielding film layers includes an opening array, and the opening array includes a plurality of openings distributed in an array, wherein the opening array on one of the sub-shielding film layers is The opening array on the other sub-shielding film layer is arranged in a staggered manner along the row direction or the column direction so that the hollow area on one of the sub-shielding film layers and the shielding area of the other sub-shielding film layer at least partially overlap with the orthographic projection on the base substrate; and/or
每一所述子屏蔽膜层上的所述镂空区包括间隔设置的多个条形开口,其中一个所述子屏蔽膜层相对另一个所述子屏蔽膜层上的条形开口在垂直所述条形开口方向上错位排列,以使其中一层所述子屏蔽膜层上的镂空区与另一层所述子屏蔽膜层的遮蔽区在所述衬底基板上的正投影至少部分重合。The hollow area on each of the sub-shielding film layers includes a plurality of strip openings arranged at intervals, wherein one of the sub-shielding film layers is staggered relative to the strip openings on another sub-shielding film layer in a direction perpendicular to the strip openings, so that the hollow area on one of the sub-shielding film layers at least partially overlaps with the orthographic projection of the shielding area on the other sub-shielding film layer on the base substrate.
根据本公开的第二方面,提供了一种显示装置,包括如上所述的显示基板。According to a second aspect of the present disclosure, a display device is provided, comprising the display substrate as described above.
本公开实施例所带来的有益效果如下:The beneficial effects brought by the embodiments of the present disclosure are as follows:
本公开实施例所提供的显示基板及显示装置中,显示基板中的第一信号图案与第二信号图案存在交叠区,在两者之间设置屏蔽层,可以降低信号相互串扰。但是,由于第一信号图案与第二信号图案不同层且绝缘设置,两者之间具有绝缘层,绝缘层可选用有机或无机材料制成,为了便于有机绝缘层的工艺制程中气体排出,位于有机绝缘层之上的屏蔽层需设置镂空区,该镂空区作为排气孔。若屏蔽层仅设置有一层,在镂空区处第一信号图案和第二信号图案仍会存在一定程度的信号串扰,并且由于镂空区的存在,在布设信号图案时也会空间受限。因此,在上述方案中,将屏蔽层设置为至少两层子屏蔽膜层,且至少一层子屏蔽膜层上的镂空区与另一层子屏蔽膜层的遮蔽区在衬底基板上的正投影交叠的部分为第一叠置区,所述第一叠置区与所述交叠区至少部分重合。也就是说,至少两层子屏蔽膜层的镂空区至少在第一信号图案和第二信号图案的交叠区相互补偿,从而使得整个屏蔽层至少在该交叠区形成一个完整的屏蔽面,可以有效避免第一信号图案与第二信号图案上不同信号的相互串扰,提升产品品质。In the display substrate and display device provided by the embodiments of the present disclosure, there is an overlapping area between the first signal pattern and the second signal pattern in the display substrate, and a shielding layer is arranged between the two, which can reduce signal crosstalk. However, since the first signal pattern and the second signal pattern are in different layers and are insulated, there is an insulating layer between the two, and the insulating layer can be made of organic or inorganic materials. In order to facilitate the gas discharge in the process of the organic insulating layer, the shielding layer located above the organic insulating layer needs to be provided with a hollow area, and the hollow area serves as an exhaust hole. If the shielding layer is provided with only one layer, there will still be a certain degree of signal crosstalk between the first signal pattern and the second signal pattern at the hollow area, and due to the existence of the hollow area, the space will also be limited when arranging the signal pattern. Therefore, in the above scheme, the shielding layer is set to at least two layers of sub-shielding film layers, and the part where the orthographic projection of the hollow area on at least one sub-shielding film layer overlaps with the shielding area of another sub-shielding film layer on the base substrate is the first overlapping area, and the first overlapping area at least partially overlaps with the overlapping area. That is to say, the hollow areas of at least two layers of sub-shielding film layers compensate each other at least in the overlapping area of the first signal pattern and the second signal pattern, so that the entire shielding layer forms a complete shielding surface at least in the overlapping area, which can effectively avoid crosstalk between different signals on the first signal pattern and the second signal pattern, thereby improving product quality.
图1A表示本公开实施例所提供的显示基板的结构示意图,其中未示意出显示功能层;FIG1A is a schematic diagram showing the structure of a display substrate provided by an embodiment of the present disclosure, wherein a display function layer is not shown;
图1B表示本公开实施例所提供的显示基板的结构示意图,其中未示意 出触控层;FIG. 1B is a schematic diagram showing the structure of a display substrate provided in an embodiment of the present disclosure, wherein The touch layer is exposed;
图2表示在图1A和图1B中O局部位置处的触控引线与数据线引线的布线放大图;FIG. 2 is an enlarged view of the wiring of the touch lead and the data line lead at the local position O in FIG. 1A and FIG. 1B ;
图3表示在图1A和图1B中O局部位置处的的第一子屏蔽膜层的图案放大图;FIG3 shows an enlarged view of the pattern of the first sub-shielding film layer at a local position O in FIG1A and FIG1B;
图4表示在图1A和图1B中O局部位置处的的第二子屏蔽膜层的图案放大图;FIG4 shows an enlarged view of the pattern of the second sub-shielding film layer at a local position O in FIG1A and FIG1B;
图5表示图1A中O局部位置处的仅设置一层第一子屏蔽膜层时的结构示意图;FIG5 is a schematic diagram showing a structure in which only one first sub-shielding film layer is provided at a local position O in FIG1A;
图6表示图5中A-A’的剖视图;Fig. 6 is a cross-sectional view taken along line A-A' in Fig. 5;
图7表示图5中B-B’的剖视图;Fig. 7 is a cross-sectional view taken along line B-B' in Fig. 5;
图8表示在图1A和图1B中O局部位置处数据线引线、触控引线、第一子屏蔽膜层与第二子屏蔽膜层的堆叠图案示意图;FIG8 is a schematic diagram showing a stacking pattern of a data line lead, a touch control lead, a first sub-shielding film layer and a second sub-shielding film layer at a local position O in FIG1A and FIG1B;
图9表示图8中A-A’的剖视图;Fig. 9 is a cross-sectional view taken along line A-A' in Fig. 8;
图10表示图8中B-B’的剖视图;Fig. 10 is a cross-sectional view taken along line B-B' in Fig. 8;
图11表示图8中C-C’的剖视图;Fig. 11 is a cross-sectional view taken along line C-C' in Fig. 8;
图12表示另一实施例中第一子屏蔽膜层的图案示意图;FIG12 is a schematic diagram showing a pattern of the first sub-shielding film layer in another embodiment;
图13表示另一实施例中第二子屏蔽膜层的图案示意图;FIG13 is a schematic diagram showing a pattern of the second sub-shielding film layer in another embodiment;
图14表示另一实施例中第一子屏蔽膜层与第二子屏蔽膜层的图案堆叠示意图;FIG14 is a schematic diagram showing a pattern stacking of a first sub-shielding film layer and a second sub-shielding film layer in another embodiment;
图15表示另一实施例中第一子屏蔽膜层的图案示意图;FIG15 is a schematic diagram showing a pattern of the first sub-shielding film layer in another embodiment;
图16表示另一实施例中第二子屏蔽膜层的图案示意图;FIG16 is a schematic diagram showing a pattern of the second sub-shielding film layer in another embodiment;
图17表示另一实施例中第一子屏蔽膜层与第二子屏蔽膜层的图案堆叠示意图;FIG17 is a schematic diagram showing a pattern stacking of a first sub-shielding film layer and a second sub-shielding film layer in another embodiment;
图18表示本公开一实施例中提供的显示面板中子LTPS模式的像素电路结构的电路结构示意图;FIG18 is a schematic diagram showing a circuit structure of a pixel circuit structure in a sub-LTPS mode in a display panel provided in an embodiment of the present disclosure;
图19为本公开实施例提供的显示基板中LTPO模式的子像素驱动电路的电路结构示意图。 FIG. 19 is a schematic diagram of the circuit structure of a sub-pixel driving circuit of an LTPO mode in a display substrate provided in an embodiment of the present disclosure.
为使本公开实施例的目的、技术方案和优点更加清楚,下面将结合本公开实施例的附图,对本公开实施例的技术方案进行清楚、完整地描述。显然,所描述的实施例是本公开的一部分实施例,而不是全部的实施例。基于所描述的本公开的实施例,本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例,都属于本公开保护的范围。In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.
除非另外定义,本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。同样,“一个”、“一”或者“该”等类似词语也不表示数量限制,而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接,而是可以包括电性的连接,不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系,当被描述对象的绝对位置改变后,则该相对位置关系也可能相应地改变。Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, similar words such as "one", "one" or "the" do not indicate quantity restrictions, but indicate that there is at least one. Similar words such as "include" or "comprise" mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Similar words such as "connect" or "connected" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.
随着显示技术的不断发展,触控显示装置的应用越来越广泛,触控显示装置集成了触控面板和显示面板,使用者在使用触控显示装置时,可以直接通过触控进行输入或控制操作,使得触控显示装置的应用变得更加的便捷。With the continuous development of display technology, touch display devices are more and more widely used. Touch display devices integrate a touch panel and a display panel. When using a touch display device, a user can directly input or control operations by touch, making the application of the touch display device more convenient.
TSP(Touch Sensor Panel,触控感应面板)可采用FMLOC(Flexible Multi Layer On Cell,柔性多层结构)工艺设计触控结构,FMLOC工艺是指,在显示面板(PNL)的封装基板上制作金属网格电极层,从而进行触控控制,无需外挂TSP,达到了减薄效果。TSP (Touch Sensor Panel) can use FMLOC (Flexible Multi Layer On Cell) process to design the touch structure. The FMLOC process refers to the production of a metal grid electrode layer on the packaging substrate of the display panel (PNL) for touch control. There is no need for an external TSP, thus achieving a thinning effect.
由于基础功能或探测功能需求,在显示面板外围区不可避免需要外围走线,例如:外围显示走线(BP走线)、外围触控走线(TP走线)和屏幕裂纹检测走线(PCD走线)等。其中,外围触控走线用于实现触控功能,外围显示走线用于实现显示功能,屏幕裂纹检测走线用于实现边缘断裂或孔区断裂检测功能。Due to the requirements of basic functions or detection functions, peripheral routing is inevitably required in the peripheral area of the display panel, such as peripheral display routing (BP routing), peripheral touch routing (TP routing) and screen crack detection routing (PCD routing), etc. Among them, the peripheral touch routing is used to realize the touch function, the peripheral display routing is used to realize the display function, and the screen crack detection routing is used to realize the edge fracture or hole area fracture detection function.
FMLOC显示面板的外围布设多种外围信号走线,在一些被施加不同电 信号的信号走线之间存在交叠区,导致信号相互串扰,影响显示产品品质。The periphery of the FMLOC display panel is equipped with a variety of peripheral signal lines. There are overlapping areas between signal routings, which causes signal crosstalk and affects the quality of display products.
为了解决上述问题,本公开实施例提供了一种显示基板及显示装置,能够减少信号串扰问题,提升显示产品品质。In order to solve the above problems, the embodiments of the present disclosure provide a display substrate and a display device, which can reduce the signal crosstalk problem and improve the quality of display products.
如图1A、图1B、图2至图3、图8所示,本公开实施例所提供的一种显示基板,包括:As shown in FIG. 1A , FIG. 1B , FIG. 2 to FIG. 3 , and FIG. 8 , a display substrate provided in an embodiment of the present disclosure includes:
衬底基板100;Base substrate 100;
位于所述衬底基板100之上的第一导电层,所述第一导电层具有第一信号图案201;A first conductive layer located on the base substrate 100 , wherein the first conductive layer has a first signal pattern 201 ;
位于所述衬底基板100之上的第二导电层,所述第一导电层与所述第二导电层不同层设置,且所述第二导电层具有第二信号图案301,第一信号图案201与第二信号图案301在所述衬底基板100上的正投影具有交叠区S1;及A second conductive layer located on the base substrate 100, wherein the first conductive layer and the second conductive layer are arranged in different layers, and the second conductive layer has a second signal pattern 301, and the orthographic projections of the first signal pattern 201 and the second signal pattern 301 on the base substrate 100 have an overlapping area S1; and
位于所述衬底基板100之上的屏蔽层400,在垂直衬底基板100的方向上,所述屏蔽层400位于所述第一导电层与所述第二导电层之间,且所述屏蔽层400、所述第一导电层和所述第二导电层之间通过绝缘层500彼此绝缘设置;a shielding layer 400 located on the base substrate 100, wherein in a direction perpendicular to the base substrate 100, the shielding layer 400 is located between the first conductive layer and the second conductive layer, and the shielding layer 400, the first conductive layer and the second conductive layer are insulated from each other by an insulating layer 500;
其中,所述屏蔽层400包括堆叠设置的至少两层子屏蔽膜层401,每层所述子屏蔽膜层401均设有镂空区400A和遮蔽区400B,且一层所述子屏蔽膜层401的镂空区400A与另一层所述子屏蔽膜层401的遮蔽区400B在所述衬底基板100上的正投影交叠的部分为第一叠置区S2,所述第一叠置区S2与所述交叠区S1至少部分重合。In which, the shielding layer 400 includes at least two stacked sub-shielding film layers 401, each of the sub-shielding film layers 401 is provided with a hollow area 400A and a shielding area 400B, and the part where the hollow area 400A of one layer of the sub-shielding film layer 401 overlaps with the shielding area 400B of another layer of the sub-shielding film layer 401 on the base substrate 100 is a first overlapping area S2, and the first overlapping area S2 at least partially overlaps with the overlapping area S1.
上述方案中,显示基板中的第一信号图案201与第二信号图案301存在交叠区S1,因此在两者之间设置屏蔽层400,可以降低信号相互串扰。但是,由于第一信号图案201与第二信号图案301不同层且绝缘设置,两者之间具有绝缘层500,绝缘层500可选用有机或无机材料制成,为了便于有机绝缘层500的工艺制程中气体排出,位于有机绝缘层500之上的屏蔽层400需设置镂空区400A,该镂空区400A作为排气孔。In the above scheme, the first signal pattern 201 and the second signal pattern 301 in the display substrate have an overlapping area S1, so a shielding layer 400 is set between the two to reduce signal crosstalk. However, since the first signal pattern 201 and the second signal pattern 301 are in different layers and are insulated, there is an insulating layer 500 between the two, and the insulating layer 500 can be made of organic or inorganic materials. In order to facilitate the gas discharge during the process of the organic insulating layer 500, the shielding layer 400 located on the organic insulating layer 500 needs to be provided with a hollow area 400A, and the hollow area 400A serves as an exhaust hole.
若屏蔽层400仅设置有一层,在镂空区400A处第一信号图案201和第二信号图案301仍会存在一定程度的信号串扰,并且由于镂空区400A的存在,在布设信号图案时也会空间受限。因此,在上述方案中,将屏蔽层400设 置为至少两层子屏蔽膜层401,且一层子屏蔽膜层401上的镂空区400A与另一层子屏蔽膜层401的遮蔽区400B在衬底基板100上的正投影交叠的部分为第一叠置区S2,所述第一叠置区S2与所述交叠区S1至少部分重合。交叠区S1If the shielding layer 400 is provided with only one layer, there will still be a certain degree of signal crosstalk between the first signal pattern 201 and the second signal pattern 301 at the hollow area 400A, and due to the existence of the hollow area 400A, the space for arranging the signal patterns will also be limited. At least two sub-shielding film layers 401 are provided, and the portion where the hollow area 400A on one sub-shielding film layer 401 overlaps with the shielding area 400B of another sub-shielding film layer 401 in their orthographic projection on the base substrate 100 is a first overlapping area S2, and the first overlapping area S2 at least partially overlaps with the overlapping area S1.
也就是说,至少两层子屏蔽膜层401的镂空区400A至少在第一信号图案201和第二信号图案301的交叠区S1相互补偿,从而使得整个屏蔽层400至少在该交叠区S1形成一个完整的屏蔽面,可以有效避免第一信号图案201与第二信号图案301上不同信号的相互串扰,提升产品品质。That is to say, the hollow areas 400A of at least two layers of sub-shielding film layers 401 compensate each other at least in the overlapping area S1 of the first signal pattern 201 and the second signal pattern 301, so that the entire shielding layer 400 forms a complete shielding surface at least in the overlapping area S1, which can effectively avoid mutual crosstalk between different signals on the first signal pattern 201 and the second signal pattern 301, thereby improving product quality.
需要说明的是,如图1A和1B所示,所述显示基板具有显示区域AA、及位于显示区域AA外围的外围区域B。所述第一信号图案201和所述第二信号图案301可以是设置在所述外围区域B的信号图案,也可以是设置在所述显示区域AA的信号图案。1A and 1B , the display substrate has a display area AA and a peripheral area B located outside the display area AA. The first signal pattern 201 and the second signal pattern 301 may be signal patterns disposed in the peripheral area B or in the display area AA.
并且,所述第一信号图案201与所述第二信号图案301上分别可施加不同电信号,所述第一信号图案201和所述第二信号图案301的信号图案可以是信号走线图案,也可以是电极图案等。此外,本公开实施例提供的显示基板可应用于触控显示基板,但是并不限定于此。Furthermore, different electrical signals can be applied to the first signal pattern 201 and the second signal pattern 301, respectively. The signal patterns of the first signal pattern 201 and the second signal pattern 301 can be signal routing patterns or electrode patterns, etc. In addition, the display substrate provided in the embodiment of the present disclosure can be applied to a touch display substrate, but is not limited thereto.
以下以本公开实施例所提供的显示基板为触控显示基板为例,对本公开实施例提供的显示基板进行更为详细的说明。The display substrate provided in the embodiment of the present disclosure is described in more detail below by taking the display substrate provided in the embodiment of the present disclosure as a touch display substrate as an example.
按照触摸屏的工作原理和传输信息的介质,可把触摸屏分为四大类,分别是电阻式、电容感应式、红外线式以及表面声波式触摸屏,应用广泛的有电阻式和电容式,其中投射式电容式由于可以实现多类触控(Multi-Touch)应用的最广泛,它们的缺点主要是成本较高、比较厚重等,而低成本、轻薄化成为当前触控领域的新趋势。为了实现触控面板的薄型化和轻量化,将触控面板和液晶显示面板一体化的研究日渐盛行。其中将触控面板嵌入到液晶显示面板内部的内嵌式(In-Cell)触控方案受到人们的广泛关注。According to the working principle of the touch screen and the medium for transmitting information, the touch screen can be divided into four categories, namely resistive, capacitive, infrared and surface acoustic wave touch screens. The most widely used are resistive and capacitive. Among them, projected capacitive is the most widely used because it can realize multi-touch applications. Their main disadvantages are high cost and heavy weight. Low cost and thinness have become the new trend in the current touch field. In order to achieve thin and lightweight touch panels, research on integrating touch panels and liquid crystal display panels is becoming increasingly popular. Among them, the in-cell touch solution that embeds the touch panel into the liquid crystal display panel has attracted widespread attention.
In-Cell触控技术有电阻式、电容式和光学式三种。电容式方案包括自电容触控和互电容触控两种方式。自电容触控方式是,将显示基板上用作公共电极(Vcom)的透明导电层分割成若干方块作为触控电极,利用触控信号线(Tx线)一端通过过孔和触控电极连通,另一端连接至驱动集成电路,当手 指触碰显示基板时,会引起相应位置处触控电极电容值的波动,驱动集成电路通过检测电容值的波动能够确定触碰点的位置,从而实现触控功能。In-Cell touch technology includes three types: resistive, capacitive and optical. Capacitive solutions include self-capacitive touch and mutual-capacitive touch. Self-capacitive touch is to divide the transparent conductive layer used as the common electrode (Vcom) on the display substrate into several blocks as touch electrodes, and use one end of the touch signal line (Tx line) to connect to the touch electrode through a via hole, and the other end to the driver integrated circuit. When a finger touches the display substrate, it will cause the capacitance value of the touch electrode at the corresponding position to fluctuate. The driver integrated circuit can determine the position of the touch point by detecting the fluctuation of the capacitance value, thereby realizing the touch function.
FIC(Full In Cell Touch,内嵌式触控结构)触控显示屏是将触控电极和触控信号线均集成在显示基板的内部,从而使得在利用该显示基板制作液晶显示面板时,该液晶显示面板能够将用于实现触控功能的触控电极和触控信号线集成在液晶显示面板的内部,以实现内嵌式触控结构的液晶触控显示面板。Full In Cell Touch结构的液晶触控显示面板,将触控功能和显示功能整合在一起,不仅能够实现一站式无缝生产,而且具有集成化、轻薄、低成本、低功耗、高画质、可以实现多类触控(即Multi-Touch)等优势。The FIC (Full In Cell Touch) touch screen integrates the touch electrodes and touch signal lines inside the display substrate, so that when the display substrate is used to make a liquid crystal display panel, the liquid crystal display panel can integrate the touch electrodes and touch signal lines for realizing the touch function inside the liquid crystal display panel to realize a liquid crystal touch display panel with an embedded touch structure. The liquid crystal touch display panel with a Full In Cell Touch structure integrates the touch function and the display function together, which can not only realize one-stop seamless production, but also has the advantages of integration, lightness, low cost, low power consumption, high image quality, and the ability to realize multiple types of touch (i.e. Multi-Touch).
本公开一些实施例提供的显示基板可以应用于OLED显示基板,其触控功能可包括但不限于选用自电容触控或互电容触控方式实现。本公开实施例提供的显示基板中触控层可以是柔性多层屏上触控结构(FMLOC)触控结构,也可以是柔性单层屏上触控结构(FSLOC)触控结构。具体结构此处不再赘述。The display substrate provided in some embodiments of the present disclosure can be applied to an OLED display substrate, and its touch function can include but is not limited to being implemented by self-capacitive touch or mutual-capacitive touch. The touch layer in the display substrate provided in the embodiments of the present disclosure can be a flexible multi-layer touch-on-screen structure (FMLOC) touch structure or a flexible single-layer touch-on-screen structure (FSLOC) touch structure. The specific structure will not be described in detail here.
在本公开的一些示例性的实施例中,所述显示基板可以包括显示功能层和触控层,显示功能层用于实现显示功能,可以包括多个子像素,所述子像素包括相耦接的像素驱动电路和发光元件等,所述像素驱动电路用于为所述发光元件提供驱动信号,以驱动发光元件发光,实现显示基板的显示功能。下文会对显示功能层进行更为详细说明。触控层包括阵列分布的多个触控电极、及连接至触控电极上的触控信号线等。下文会对触控层进行更为详细说明。In some exemplary embodiments of the present disclosure, the display substrate may include a display function layer and a touch layer. The display function layer is used to realize the display function and may include a plurality of sub-pixels. The sub-pixels include a coupled pixel driving circuit and a light-emitting element, etc. The pixel driving circuit is used to provide a driving signal to the light-emitting element to drive the light-emitting element to emit light and realize the display function of the display substrate. The display function layer will be described in more detail below. The touch layer includes a plurality of touch electrodes distributed in an array, and touch signal lines connected to the touch electrodes, etc. The touch layer will be described in more detail below.
如图1A所示,所述显示基板包括绑定侧BA,在所述绑定侧设置有驱动集成电路(IC)600,即柔性电路板(FPC)。所述显示功能层和所述触控层均连接至驱动集成电路600上。As shown in FIG1A , the display substrate includes a binding side BA, on which a driver integrated circuit (IC) 600, ie, a flexible printed circuit (FPC) is disposed. The display function layer and the touch control layer are both connected to the driver integrated circuit 600.
具体地,如图1A和1B所示,所述外围区域B包括非弯折区BA1、弯折区(Bending区)BA2及绑定区(Bonding区)BA3,所述非弯折区BA1邻接所述显示区域AA,所述弯折区BA2位于所述绑定区BA3与所述非弯折区BA1之间,在绑定区BA3绑定连接有驱动集成电路600。驱动集成电路600可以包括第一驱动集成电路601和第二驱动集成电路602。 Specifically, as shown in FIGS. 1A and 1B , the peripheral area B includes a non-bending area BA1, a bending area BA2 and a bonding area BA3, wherein the non-bending area BA1 is adjacent to the display area AA, the bending area BA2 is located between the bonding area BA3 and the non-bending area BA1, and the driving integrated circuit 600 is bonded and connected in the bonding area BA3. The driving integrated circuit 600 may include a first driving integrated circuit 601 and a second driving integrated circuit 602.
如图1B所示,该显示基板的显示功能层中像素驱动电路包括位于显示区域AA内的多条栅线210和多条数据线220,多条栅线210和多条数据线220彼此交叉以限定出多个子像素P,每个子像素P中可设置至少一个薄膜晶体管和至少一个发光元件。所述像素驱动电路还包括位于外围区域的多条栅线引线和多条数据线引线,其中栅线引线由栅线210引出,并连接至位于外围区域B的栅极驱动电路230;数据线引线由数据线引出,并连接至第一驱动集成电路601。As shown in FIG1B , the pixel driving circuit in the display function layer of the display substrate includes a plurality of gate lines 210 and a plurality of data lines 220 located in the display area AA, and the plurality of gate lines 210 and the plurality of data lines 220 intersect each other to define a plurality of sub-pixels P, and at least one thin film transistor and at least one light-emitting element may be provided in each sub-pixel P. The pixel driving circuit also includes a plurality of gate line leads and a plurality of data line leads located in the peripheral area, wherein the gate line leads are led out from the gate lines 210 and connected to the gate driving circuit 230 located in the peripheral area B; and the data line leads are led out from the data lines and connected to the first driving integrated circuit 601.
示例性的,如图1B所示,在显示区域AA中设有多个子像素P,多个子像素P可以布置成阵列,例如排列成多行的形式,包括第一行子像素P1,第二行子像素P2,……,第n行子像素Pn。Exemplarily, as shown in FIG. 1B , a plurality of sub-pixels P are provided in the display area AA, and the plurality of sub-pixels P may be arranged in an array, for example, in the form of a plurality of rows, including a first row of sub-pixels P1, a second row of sub-pixels P2, ..., an nth row of sub-pixels Pn.
如图1B所示,多条数据线DATA1,DATA2,…,DATAk位于所述显示区域中且沿第一方向Y延伸,所述多条数据线DATA1,DATA2,…,DATAk电连接至所述多个子像素P。例如在图1B中,数据线DATA1连接至第一列子像素P,数据线DATA2连接至第2列子像素P,以此类推,数据线DATAk连接至第k列子像素。As shown in FIG1B , a plurality of data lines DATA1, DATA2, ..., DATAk are located in the display area and extend along a first direction Y, and the plurality of data lines DATA1, DATA2, ..., DATAk are electrically connected to the plurality of sub-pixels P. For example, in FIG1B , the data line DATA1 is connected to the first column of sub-pixels P, the data line DATA2 is connected to the second column of sub-pixels P, and so on, the data line DATAk is connected to the kth column of sub-pixels.
多条栅线Gate1,Gate2,…,Gaten位于显示区域10中且沿第二方向X延伸。第一方向Y和第二方向X交叉。多条栅极线Gate1,Gate2,…,Gaten电连接至所述多个子像素P。例如栅极线Gate1连接至第一行子像素P1,栅极线Gate2连接至第二行子像素P2,以此类推,栅极线Gaten连接至第n行子像素Pn。A plurality of gate lines Gate1, Gate2, ..., Gaten are located in the display area 10 and extend along the second direction X. The first direction Y intersects the second direction X. The plurality of gate lines Gate1, Gate2, ..., Gaten are electrically connected to the plurality of sub-pixels P. For example, the gate line Gate1 is connected to the first row of sub-pixels P1, the gate line Gate2 is connected to the second row of sub-pixels P2, and so on, the gate line Gaten is connected to the nth row of sub-pixels Pn.
栅极驱动电路230位于外围区B,栅极驱动电路230与多条栅极线Gate1,Gate2,…,Gaten连接。例如,在图1B中,栅极驱动电路230包括多级级联的多个移位寄存器GOA0,GOA1,…,GOAn,即,第i级第一移位寄存器GOAi的输出端连接至第i+1级第一移位寄存器GOA(i+1)的复位端。第一级第一移位寄存器GOA1连接至栅极线Gate1以向第一行子像素P1提供栅极驱动信号,第二级第一移位寄存器GOA2连接至栅极线Gate2以向第二行子像素P2提供栅极驱动信号,以此类推。在图1B中,第i级移位寄存器GOAi产生的针对第i行子像素Pi的栅极驱动信号也被用作针对第i+1行子像素P(i+1)的复位信号RST(i+1)。例如,第0级第一移位寄存器GOA0产生的针对第0行 子像素P0的栅极驱动信号也被用作针对第1行子像素P1的复位信号RST1,第1级第一移位寄存器GOA1产生的针对第1行子像素P1的栅极驱动信号也被用作针对第2行子像素P2的复位信号RST2,以此类推。The gate drive circuit 230 is located in the peripheral area B, and the gate drive circuit 230 is connected to a plurality of gate lines Gate1, Gate2, ..., Gaten. For example, in FIG1B, the gate drive circuit 230 includes a plurality of shift registers GOA0, GOA1, ..., GOAn in a multi-stage cascade, that is, the output end of the first shift register GOAi of the i-th stage is connected to the reset end of the first shift register GOA(i+1) of the i+1-th stage. The first-stage first shift register GOA1 is connected to the gate line Gate1 to provide a gate drive signal to the first-row sub-pixel P1, and the second-stage first shift register GOA2 is connected to the gate line Gate2 to provide a gate drive signal to the second-row sub-pixel P2, and so on. In FIG1B, the gate drive signal for the i-th row sub-pixel Pi generated by the i-th stage shift register GOAi is also used as the reset signal RST(i+1) for the i+1-th row sub-pixel P(i+1). For example, the gate drive signal for the 0-th row sub-pixel P(i+1) generated by the 0-th stage first shift register GOA0 The gate drive signal of sub-pixel P0 is also used as the reset signal RST1 for sub-pixel P1 in the first row, and the gate drive signal for sub-pixel P1 in the first row generated by the first-stage first shift register GOA1 is also used as the reset signal RST2 for sub-pixel P2 in the second row, and so on.
如图1B所示,显示基板还可以包括多条发光控制线EM1,EM2,…,EMn和发光控制驱动电路240。多条发光控制线EM1,EM2,…,EMn穿过显示区域AA且沿第二方向X延伸。多条发光控制线EM1,EM2,…,EMn电连接至多个子像素P。例如在图1B中,发光控制线EM1电连接至第一行子像素P1,发光控制线EM2电连接至第二行子像素P2,以此类推。As shown in FIG1B , the display substrate may further include a plurality of light emitting control lines EM1, EM2, ..., EMn and a light emitting control driving circuit 240. The plurality of light emitting control lines EM1, EM2, ..., EMn pass through the display area AA and extend along the second direction X. The plurality of light emitting control lines EM1, EM2, ..., EMn are electrically connected to a plurality of sub-pixels P. For example, in FIG1B , the light emitting control line EM1 is electrically connected to the first row of sub-pixels P1, the light emitting control line EM2 is electrically connected to the second row of sub-pixels P2, and so on.
发光控制驱动电路240位于所述外围区域B且位于栅极驱动电路230远离显示区域AA的一侧。在图1B中,发光控制驱动电路240包括多级级联的第二移位寄存器EOA0,EOA1,…,EOAm,其中第0级第二移位寄存器EOA0连接至发光控制线EM1和EM2,以分别向第一行子像素P1和第二行子像素P2提供发光控制信号,第1级第二移位寄存器EOA1连接至发光控制线EM3和EM4,以分别向第三行子像素P3和第四行子像素P4提供发光控制信号。The light emitting control driving circuit 240 is located in the peripheral area B and on the side of the gate driving circuit 230 away from the display area AA. In FIG1B , the light emitting control driving circuit 240 includes a multi-stage cascade of second shift registers EOA0, EOA1, ..., EOAm, wherein the 0th stage second shift register EOA0 is connected to the light emitting control lines EM1 and EM2 to provide light emitting control signals to the first row of sub-pixels P1 and the second row of sub-pixels P2, respectively, and the first stage second shift register EOA1 is connected to the light emitting control lines EM3 and EM4 to provide light emitting control signals to the third row of sub-pixels P3 and the fourth row of sub-pixels P4, respectively.
外围区域B中还可以布置第二启动电压信号线ESTV、第三时钟信号线ECK和第四时钟信号线ECB。发光控制驱动电路240还与第二启动电压信号线ESTV、第三时钟信号线ECK和第四时钟信号线ECB电连接,以便在其控制下产生发光控制信号。例如,发光控制驱动电路240中的第0级第二移位寄存器EOA0与第二启动电压信号线ESTV、第三时钟信号线ECK和第四时钟信号线ECB电连接,以便在第二启动电压信号线ESTV、第三时钟信号线ECK和第四时钟信号线ECB的控制下产生针对第1行子像素P1和第2行子像素P2的发光控制信号。类似地,发光控制驱动电路240中的第1级第二移位寄存器EOA1与第三时钟信号线ECK和第四时钟信号线ECB电连接,以便在第三时钟信号线ECK和第四时钟信号线ECB的控制下产生针对第2行子像素P2和第3行子像素P3的发光控制信号。A second start voltage signal line ESTV, a third clock signal line ECK, and a fourth clock signal line ECB may also be arranged in the peripheral area B. The light emitting control driving circuit 240 is also electrically connected to the second start voltage signal line ESTV, the third clock signal line ECK, and the fourth clock signal line ECB so as to generate a light emitting control signal under the control thereof. For example, the 0th-stage second shift register EOA0 in the light emitting control driving circuit 240 is electrically connected to the second start voltage signal line ESTV, the third clock signal line ECK, and the fourth clock signal line ECB so as to generate a light emitting control signal for the first-row sub-pixel P1 and the second-row sub-pixel P2 under the control of the second start voltage signal line ESTV, the third clock signal line ECK, and the fourth clock signal line ECB. Similarly, the first-stage second shift register EOA1 in the light emitting control driving circuit 240 is electrically connected to the third clock signal line ECK and the fourth clock signal line ECB so as to generate a light emitting control signal for the second-row sub-pixel P2 and the third-row sub-pixel P3 under the control of the third clock signal line ECK and the fourth clock signal line ECB.
如图1A所示,所述显示基板中的触控层可以包括:位于显示区域AA内的多个触控电极320、及位于外围区域B的多条触控引线310,其中,所述触控电极320用于实现触控功能,多条所述触控引线310自显示区域AA引出,且所述触控引线310用于连接所述触控电极320与所述第二驱动集成电路 602,以进行触控信号传输。As shown in FIG. 1A , the touch layer in the display substrate may include: a plurality of touch electrodes 320 located in the display area AA, and a plurality of touch leads 310 located in the peripheral area B, wherein the touch electrodes 320 are used to implement the touch function, the plurality of touch leads 310 are led out from the display area AA, and the touch leads 310 are used to connect the touch electrodes 320 and the second driver integrated circuit 602, to transmit a touch signal.
多个触控电极320可以包括第一触控电极321和第二触控电极322。示例性的,触控层可以由相互交叉的两条金属线通道构成,即,Tx通道和Rx通道,Tx通道由多行第一电极链构成,每行第一电极链包括依次排列且相连的多个第一触控电极321,Rx通道由多列第二电极链构成,每列第二电极链包括依次排列且相连的多个第二触控电极322,通过检测接触前后两通道间的互容变化值△Cm,来确定是否有触控产生。The multiple touch electrodes 320 may include a first touch electrode 321 and a second touch electrode 322. Exemplarily, the touch layer may be composed of two metal wire channels that cross each other, i.e., a Tx channel and an Rx channel, the Tx channel is composed of a plurality of rows of first electrode chains, each row of the first electrode chain includes a plurality of first touch electrodes 321 that are sequentially arranged and connected, the Rx channel is composed of a plurality of columns of second electrode chains, each column of the second electrode chain includes a plurality of second touch electrodes 322 that are sequentially arranged and connected, and whether a touch is generated is determined by detecting the mutual capacitance change value △Cm between the two channels before and after the contact.
多条所述触控引线310包括:连接至多行所述第一电极链上的多条第一触控引线311、及连接至多列所述第二电极链上的多条第二触控引线312,其中所述第一电极链与所述栅线210延伸方向相同,所述第二电极链与所述数据线220延伸方向相同。The multiple touch leads 310 include: multiple first touch leads 311 connected to multiple rows of the first electrode chains, and multiple second touch leads 312 connected to multiple columns of the second electrode chains, wherein the first electrode chains extend in the same direction as the gate lines 210, and the second electrode chains extend in the same direction as the data lines 220.
至少部分所述触控引线310与部分所述数据线引线221在所述衬底基板100上的正投影交叠,所述第一信号图案201包括交叠的所述触控引线310和所述数据线引线221中的一者,所述第二信号图案301包括交叠的所述触控引线310和所述数据线引线221中的另一者。At least part of the touch lead 310 overlaps with part of the data line lead 221 in their orthographic projection on the base substrate 100, the first signal pattern 201 includes one of the overlapping touch lead 310 and the data line lead 221, and the second signal pattern 301 includes the other of the overlapping touch lead 310 and the data line lead 221.
在上述方案中,所述屏蔽层400设置于位于所述外围区域B的所述数据线引线221和所述触控引线310之间,用于屏蔽所述数据线引线221与所述触控引线310交叠区S1的信号干扰。In the above solution, the shielding layer 400 is disposed between the data line lead 221 and the touch lead 310 in the peripheral area B to shield signal interference in the overlapping area S1 of the data line lead 221 and the touch lead 310 .
应当理解的是,在其他未示意出的实施例中,所述显示基板还可以包括自所述显示区域AA引出的栅线引线、电学测试引线或者屏幕裂纹检测走线等走线,所述第一导电图案和所述第二导电图案可以分别为所述栅线引线、所述电学测试引线、所述触控引线310、所述数据线引线221和所述屏幕裂纹检测走线中的任意交叠的两者。It should be understood that in other embodiments not illustrated, the display substrate may further include gate line leads, electrical test leads or screen crack detection leads extending from the display area AA, and the first conductive pattern and the second conductive pattern may respectively be any two of the overlapping gate line leads, the electrical test leads, the touch leads 310, the data line leads 221 and the screen crack detection leads.
在本公开的一些示例性的实施例中,以图1A和图1B所示为例,在所述绑定侧BA,多条所述数据线引线221和多条触控引线310均自所述非弯折区BA1经过所述弯折区BA2延伸至所述绑定区BA3内,并连接至所述驱动集成电路600上。所显示基板还包括与所述绑定侧BA相对的对侧BB、以及在所述栅线210延伸方向上相对的第一侧BC和第二侧BD。以显示基板在一种使用场景下的方位为例,绑定侧BA即为下侧,对侧BB即为上侧,第一侧 BC和第二侧BD即为左侧和右侧。In some exemplary embodiments of the present disclosure, taking FIG. 1A and FIG. 1B as an example, on the binding side BA, the plurality of data line leads 221 and the plurality of touch leads 310 extend from the non-bending area BA1 through the bending area BA2 to the binding area BA3, and are connected to the driver integrated circuit 600. The display substrate also includes an opposite side BB opposite to the binding side BA, and a first side BC and a second side BD opposite to each other in the extending direction of the gate line 210. Taking the orientation of the display substrate in a usage scenario as an example, the binding side BA is the lower side, the opposite side BB is the upper side, and the first side BB is the upper side. BC and the second side BD are the left side and the right side.
如图1A所示,部分触控引线310可分别从显示基板显示区域AA的第一侧BC和第二侧BD引出,即从显示基板的左、右两侧引出。多条触控引线310可分为第一组触控引线310A和第二组触控引线310B,所述第一组触控引线310A包括若干自所述第一电极链的第一侧BC引出的第一触控引线311、及靠近所述第一侧BC的若干所述第二触控引线312;所述第二组触控引线310B包括若干自所述第一电极链的第二侧BD引出的若干第一触控引线311、及靠近所述第二侧BD的若干所述第二触控引线312。As shown in FIG1A , part of the touch leads 310 can be led out from the first side BC and the second side BD of the display area AA of the display substrate, that is, from the left and right sides of the display substrate. The plurality of touch leads 310 can be divided into a first group of touch leads 310A and a second group of touch leads 310B. The first group of touch leads 310A includes a plurality of first touch leads 311 led out from the first side BC of the first electrode chain, and a plurality of second touch leads 312 close to the first side BC; the second group of touch leads 310B includes a plurality of first touch leads 311 led out from the second side BD of the first electrode chain, and a plurality of second touch leads 312 close to the second side BD.
由于第一组触控引线310A靠近第一侧BC,第二组触控引线310B靠近第二侧BD,若将第一组触控引线310A与第二组触控引线310B分布在显示基板的第一侧BC和第二侧BD时,由于第一组触控引线310A和第二组触控引线310B之间相隔间距较远,因此驱动集成电路600在进行设计时需要有足够布线宽度。Since the first group of touch leads 310A is close to the first side BC and the second group of touch leads 310B is close to the second side BD, if the first group of touch leads 310A and the second group of touch leads 310B are distributed on the first side BC and the second side BD of the display substrate, since the first group of touch leads 310A and the second group of touch leads 310B are far apart, the driver integrated circuit 600 needs to have sufficient wiring width when designing.
为了减少驱动集成电路600的布线宽度,在本公开的一些示例性的实施例中,如图1A和图1B所示,至少部分所述数据线引线221自所述非弯折区BA1经过所述弯折区BA2延伸至所述绑定区BA3内,且所述数据线引线221中延伸至所述绑定区BA3内的引线部分沿第一方向Y延伸并连接至所述驱动集成电路600上;In order to reduce the wiring width of the driver integrated circuit 600, in some exemplary embodiments of the present disclosure, as shown in FIG. 1A and FIG. 1B, at least part of the data line lead 221 extends from the non-bending area BA1 through the bending area BA2 to the binding area BA3, and the lead portion of the data line lead 221 extending to the binding area BA3 extends along the first direction Y and is connected to the driver integrated circuit 600;
至少部分所述触控引线310自所述非弯折区BA1经过所述弯折区BA2延伸至所述绑定区BA3内,且所述触控引线310中延伸至所述绑定区BA3内的引线部分沿与所述第一方向Y交叉的第二方向X弯折,以形成绕线段310a,所述绕线段310a的端部沿所述第一方向Y延伸至所述驱动集成电路600上。具体地,所述绕线段310a连接至第二驱动集成电路602上。请结合图2所示,所述绕线段310a和与其位置对应的所述数据线引线221交叉,以形成所述交叠区S1。At least part of the touch lead 310 extends from the non-bending area BA1 through the bending area BA2 to the binding area BA3, and the lead portion of the touch lead 310 extending to the binding area BA3 is bent along a second direction X intersecting the first direction Y to form a winding segment 310a, and the end of the winding segment 310a extends to the driver integrated circuit 600 along the first direction Y. Specifically, the winding segment 310a is connected to the second driver integrated circuit 602. As shown in FIG. 2, the winding segment 310a crosses the data line lead 221 corresponding to its position to form the overlapping area S1.
在上述方案中,至少部分所述触控引线310在延伸至所述绑定区BA3之后进行了绕线设计,这样,可以根据实际中布线空间,将触控引线310进行绕线,以尽可能地使从第一侧BC引出和第二侧BD引出的触控引线310彼此靠近,以减少驱动集成电路600的布线宽度。 In the above scheme, at least part of the touch leads 310 are designed to be wound after extending to the binding area BA3. In this way, the touch leads 310 can be wound according to the actual wiring space to make the touch leads 310 led out from the first side BC and the second side BD as close to each other as possible to reduce the wiring width of the driver integrated circuit 600.
在本公开的一些示例性的实施例中,如图5至图8所示所述屏蔽层400在所述衬底基板100上的正投影至少覆盖所述绕线段310a在所述衬底基板100上的正投影。In some exemplary embodiments of the present disclosure, as shown in FIG. 5 to FIG. 8 , the orthographic projection of the shielding layer 400 on the base substrate 100 at least covers the orthographic projection of the winding segment 310 a on the base substrate 100 .
当然可以理解的是,在其他实施例中,所述屏蔽层400也可以仅覆盖所述绕线段310a与所述数据线引线221的交叠区S1。Of course, it is understandable that in other embodiments, the shielding layer 400 may also only cover the overlapping area S1 between the winding segment 310 a and the data line lead 221 .
此外,本公开的一些示例性的实施例中,如图1A所示,所述第一组触控引线310A包括自所述第一电极链的第一侧BC引出的若干第一触控引线311、及靠近所述第一侧BC的若干所述第二触控引线312;所述第二组触控引线310B包括自所述第一电极链的第二侧BD引出的若干第一触控引线311、及靠近所述第二侧BD的若干所述第二触控引线312;其中,所述第二组触控引线310B中的各触控引线310在自所述非弯折区BA1经过所述弯折区BA2延伸至所述绑定区BA3之后向靠近所述第一组触控引线310A的方向弯折,以形成所述绕线段310a。In addition, in some exemplary embodiments of the present disclosure, as shown in Figure 1A, the first group of touch leads 310A includes a plurality of first touch leads 311 led out from the first side BC of the first electrode chain, and a plurality of second touch leads 312 close to the first side BC; the second group of touch leads 310B includes a plurality of first touch leads 311 led out from the second side BD of the first electrode chain, and a plurality of second touch leads 312 close to the second side BD; wherein, each touch lead 310 in the second group of touch leads 310B bends toward the direction close to the first group of touch leads 310A after extending from the non-bending area BA1 through the bending area BA2 to the binding area BA3, so as to form the winding segment 310a.
这样,通过将位于显示区域AA相对两侧的两组触控引线310中的一组触控引线310向靠近另一组触控引线310方向进行绕线,以使两组触控引线310靠近。在其他实施例中,也可以是两组触控引线310分别向靠近对方的方向进行绕线。In this way, one of the two groups of touch leads 310 located on opposite sides of the display area AA is wound toward the other group of touch leads 310, so that the two groups of touch leads 310 are brought closer together. In other embodiments, the two groups of touch leads 310 may be wound toward each other.
在本公开的一些示例性的实施例中,各层所述子屏蔽膜层401上接入相同的信号。例如,各层所述子屏蔽膜层401都接地(GND)设置。这样,可以防止信号串扰。所述子屏蔽膜层401可以选用金属材质制成。In some exemplary embodiments of the present disclosure, the same signal is connected to each layer of the sub-shielding film layer 401. For example, each layer of the sub-shielding film layer 401 is grounded (GND). In this way, signal crosstalk can be prevented. The sub-shielding film layer 401 can be made of metal material.
在本公开一些示例性的实施例中,所述显示基板中可包括源漏金属层(SD),所述源漏金属层的图案包括薄膜晶体管的源极和漏极、及数据线220中至少一种。其中,至少一层所述子屏蔽膜层401与所述源漏金属层同层且同材质设置。这样,可以在形成源漏金属层上的源极、漏极和数据线220中至少一种图案时,通过同一次构图工艺形成至少一层所述子屏蔽膜层401。In some exemplary embodiments of the present disclosure, the display substrate may include a source-drain metal layer (SD), and the pattern of the source-drain metal layer includes at least one of the source and drain of the thin film transistor and the data line 220. Among them, at least one layer of the sub-shielding film layer 401 is in the same layer and is made of the same material as the source-drain metal layer. In this way, when forming at least one pattern of the source, drain and data line 220 on the source-drain metal layer, at least one layer of the sub-shielding film layer 401 can be formed by the same patterning process.
图5所示为触控引线310、数据线引线221及一层子屏蔽膜层的结构示意图。图6为图5中A-A’的剖视图;图7为图5中B-B’的剖视图。Fig. 5 is a schematic diagram showing the structure of a touch lead 310, a data line lead 221 and a sub-shielding film layer. Fig. 6 is a cross-sectional view taken along line A-A' in Fig. 5; and Fig. 7 is a cross-sectional view taken along line B-B' in Fig. 5.
请参见图5至图7所示,示例性的,所述显示基板的外围区域B在绑定侧BA的膜层堆叠结构可包括堆叠设置在衬底基板100之上的第一栅金属层 Gate1、层间绝缘层ILD、第二栅金属层Gate2、第一平坦层PLN1、源漏金属层SD、第二平坦层PLN2和第一金属层TM。其中一层子屏蔽膜层为第一子屏蔽膜层401,第一子屏蔽膜层401采用源漏金属层材料制成。5 to 7 , exemplarily, the film layer stack structure of the peripheral region B of the display substrate at the bonding side BA may include a first gate metal layer stacked on the base substrate 100. Gate1, interlayer insulating layer ILD, second gate metal layer Gate2, first planar layer PLN1, source-drain metal layer SD, second planar layer PLN2 and first metal layer TM. One of the sub-shielding film layers is the first sub-shielding film layer 401, which is made of source-drain metal layer material.
在一些实施例中,显示基板可以包括一层源漏金属层,即第一源漏金属层(SD1层),也可以是包括多层源漏金属层,即还包括第二源漏金属层(SD2层)等。其中其中一层子屏蔽膜层为第一子屏蔽膜层401,另一层子屏蔽膜层为第二子屏蔽膜层402,第一子屏蔽膜层401可以与任一层源漏金属层同层且同材质设置,第二子屏蔽膜层402可以与另一层源漏金属层同层且同材质设置。例如,请参见图6、图9和图10,第一子屏蔽膜层401选用第二源漏金属层SD2制成;第二子屏蔽膜层402选用第一源漏金属层SD1制成。In some embodiments, the display substrate may include a source-drain metal layer, i.e., a first source-drain metal layer (SD1 layer), or may include multiple source-drain metal layers, i.e., a second source-drain metal layer (SD2 layer), etc. One of the sub-shielding film layers is the first sub-shielding film layer 401, and another sub-shielding film layer is the second sub-shielding film layer 402. The first sub-shielding film layer 401 may be in the same layer and made of the same material as any source-drain metal layer, and the second sub-shielding film layer 402 may be in the same layer and made of the same material as another source-drain metal layer. For example, referring to FIG. 6, FIG. 9 and FIG. 10, the first sub-shielding film layer 401 is made of the second source-drain metal layer SD2; the second sub-shielding film layer 402 is made of the first source-drain metal layer SD1.
需要说明的是,对于源漏金属层而言,其是由包含金属导电材料在内的多膜层堆叠结构,所述子屏蔽膜层401与所述源漏金属层同层且同材质设置,具体是指,所述子屏蔽膜层401与所述源漏金属层中的金属膜层同层且同材质设置。即,可以在形成源漏金属层中的金属膜层时,通过同一次构图工艺形成至少一层所述子屏蔽膜层401。It should be noted that, for the source-drain metal layer, it is a multi-layer stacked structure including a metal conductive material, and the sub-shielding film layer 401 is in the same layer and made of the same material as the source-drain metal layer, specifically, the sub-shielding film layer 401 is in the same layer and made of the same material as the metal film layer in the source-drain metal layer. That is, when forming the metal film layer in the source-drain metal layer, at least one layer of the sub-shielding film layer 401 can be formed by the same patterning process.
在另一些实施例中,所述显示基板还可以包括电极层,所述电极层的图案包括阳极,至少一层所述子屏蔽膜层401与所述电极层同层且同材质设置。这样,可以在形成电极层上的阳极等图案时,通过同一次构图工艺形成至少一层所述子屏蔽膜层401。In some other embodiments, the display substrate may further include an electrode layer, the pattern of the electrode layer includes an anode, and at least one layer of the sub-shielding film layer 401 is in the same layer and made of the same material as the electrode layer. In this way, when forming the pattern of the anode on the electrode layer, at least one layer of the sub-shielding film layer 401 may be formed by the same patterning process.
在另一些实施例中,所述显示基板还包括至少两层触控金属层,至少两层触控属层的图案至少包括触控电极320的图案。其中,至少一层所述子屏蔽膜层401与至少一层所述触控金属层同层且同材质设置。这样,可以在形成触控电极320等图案时,通过同一次构图工艺形成至少一层所述子屏蔽膜层401。In some other embodiments, the display substrate further includes at least two touch metal layers, and the patterns of the at least two touch metal layers at least include the pattern of the touch electrode 320. Among them, at least one sub-shielding film layer 401 is in the same layer and made of the same material as at least one touch metal layer. In this way, when forming the patterns such as the touch electrode 320, at least one sub-shielding film layer 401 can be formed by the same patterning process.
应当理解的是,所述屏蔽层400的各层子屏蔽膜层401可以与显示基板上的其他金属层同层且同材质,也可以是采用单独的构图工艺形成。It should be understood that each sub-shielding film layer 401 of the shielding layer 400 may be formed in the same layer and with the same material as other metal layers on the display substrate, or may be formed by a separate patterning process.
此外,在本公开的一些实施例中,每一所述子屏蔽膜层401上的所述镂空区400A包括开口阵列,所述开口阵列包括阵列分布的多个开口,其中一个所述子屏蔽膜层401上的开口阵列相对另一个所述子屏蔽膜层401上的开口 阵列沿行方向或列方向错位排列,也就是说,其中一个所述子屏蔽膜层401上的开口正对另一个所述子屏蔽膜层401上的遮蔽区400B设置。这样,使其中一层所述子屏蔽膜层401上的镂空区400A与另一层所述子屏蔽膜层401的遮蔽区400B在所述衬底基板100上的正投影至少部分重合。In addition, in some embodiments of the present disclosure, the hollow area 400A on each of the sub-shielding film layers 401 includes an opening array, and the opening array includes a plurality of openings distributed in an array, wherein the opening array on one of the sub-shielding film layers 401 is opposite to the openings on another sub-shielding film layer 401. The array is staggered in the row direction or the column direction, that is, the opening on one of the sub-shielding film layers 401 is arranged opposite to the shielding area 400B on another sub-shielding film layer 401. In this way, the orthographic projection of the hollow area 400A on one of the sub-shielding film layers 401 and the shielding area 400B of another sub-shielding film layer 401 on the base substrate 100 at least partially overlaps.
其中,所述开口的形状可以是圆形、矩形、三角形、多边形等各种规则或不规则图形。且各层子屏蔽膜层401上的开口图形可以相同,也可以不同。The shape of the opening can be various regular or irregular shapes such as circle, rectangle, triangle, polygon, etc. The shapes of the openings on each sub-shielding film layer 401 can be the same or different.
请参见图3、图4和图12至图17所示,在一些示例性的实施例中,以其中一层所述子屏蔽膜层记为第一子屏蔽膜层401,另一层所述子屏蔽膜层记为第二子屏蔽膜层402。每层所述子屏蔽膜层的开口阵列中相邻两行开口交错排列,以形成类似城墙式的开口排列结构两层所述子屏蔽膜层上的开口形状相同,且第一子屏蔽膜层401上的开口与第二子屏蔽膜层402上的开口错位排列,以使得两者可相互补偿,实现整面屏蔽效果。Please refer to Figures 3, 4, and 12 to 17. In some exemplary embodiments, one of the sub-shielding film layers is recorded as a first sub-shielding film layer 401, and the other sub-shielding film layer is recorded as a second sub-shielding film layer 402. Two adjacent rows of openings in the opening array of each sub-shielding film layer are staggered to form a wall-like opening arrangement structure. The openings on the two sub-shielding film layers are of the same shape, and the openings on the first sub-shielding film layer 401 and the openings on the second sub-shielding film layer 402 are staggered so that the two can compensate each other to achieve a full-surface shielding effect.
以图12至图17所示为例,在一些示例性的实施例中,第一子屏蔽膜层401上的镂空区400A包括圆形、三角形、四边形、多边形等规则或不规则图形的多个开口,遮蔽区400B的形状则为除镂空区400A之外的区域对应的形状;第二子屏蔽膜层402上的镂空区400A被构造为与第一子屏蔽上的遮蔽区400B形状相同,而遮蔽区400B被构造为与第一子屏蔽膜层401上的镂空区400A形状相同。这样,两层子屏蔽膜层401堆叠设置,可实现相互补偿对方的开口,实现整面屏蔽效果。Taking FIGS. 12 to 17 as an example, in some exemplary embodiments, the hollow area 400A on the first sub-shielding film layer 401 includes a plurality of openings of regular or irregular shapes such as circles, triangles, quadrilaterals, polygons, etc., and the shape of the shielding area 400B is the shape corresponding to the area other than the hollow area 400A; the hollow area 400A on the second sub-shielding film layer 402 is constructed to have the same shape as the shielding area 400B on the first sub-shielding, and the shielding area 400B is constructed to have the same shape as the hollow area 400A on the first sub-shielding film layer 401. In this way, the two layers of sub-shielding film layers 401 are stacked to compensate for each other's openings and achieve a full-surface shielding effect.
在本公开的另一些实施例中,如图13至图14所示,每一所述子屏蔽膜层401上的所述镂空区400A包括间隔设置的多个条形开口,其中一个所述子屏蔽膜层401相对另一个所述子屏蔽膜层401上的条形开口在垂直所述条形开口方向上错位排列,以使其中一层所述子屏蔽膜层401上的镂空区400A与另一层所述子屏蔽膜层401的遮蔽区400B在所述衬底基板100上的正投影至少部分重合。In other embodiments of the present disclosure, as shown in Figures 13 and 14, the hollow area 400A on each of the sub-shielding film layers 401 includes a plurality of strip openings arranged at intervals, wherein one of the sub-shielding film layers 401 is staggered in a direction perpendicular to the strip openings on another sub-shielding film layer 401, so that the hollow area 400A on one of the sub-shielding film layers 401 at least partially overlaps with the orthographic projection of the shielding area 400B of the other sub-shielding film layer 401 on the base substrate 100.
本公开实施例提供的显示基板中子像素驱动电路可以采用LTPS和LTPO模式。图18所示为本公开实施例提供的显示基板中一种LTPS模式的子像素驱动电路的电路结构示意图。当然可以理解的是,所述显示基板上的子像素驱动电路的电路结构并不以此为限,仅是以图18所示的LTPS模式的子像素 电路为例对子像素驱动电路进行说明。The sub-pixel driving circuit in the display substrate provided in the embodiment of the present disclosure can adopt LTPS and LTPO modes. FIG18 is a schematic diagram of the circuit structure of a sub-pixel driving circuit in the LTPS mode in the display substrate provided in the embodiment of the present disclosure. Of course, it can be understood that the circuit structure of the sub-pixel driving circuit on the display substrate is not limited to this, and is only based on the sub-pixel in the LTPS mode shown in FIG18. The sub-pixel driving circuit is described by taking the circuit as an example.
如图18所示,像素驱动电路采用了LTPS模式。As shown in FIG18 , the pixel driving circuit adopts the LTPS mode.
所述像素驱动电路包括:第一晶体管T1,第二晶体管T2,第三晶体管3,第四晶体管T4,第五晶体管T5,第六晶体管T6,第七晶体管T7和存储电容Cst。The pixel driving circuit includes: a first transistor T1, a second transistor T2, a third transistor T3, a fourth transistor T4, a fifth transistor T5, a sixth transistor T6, a seventh transistor T7 and a storage capacitor Cst.
所述显示基板包括电源线VDD,数据线DA,栅线GA,发光控制线EM,第一复位线RE1,第二复位线RE2,第一初始化信号线Vinit1,第二初始化信号线Vinit2。The display substrate includes a power line VDD, a data line DA, a gate line GA, a light emitting control line EM, a first reset line RE1, a second reset line RE2, a first initialization signal line Vinit1, and a second initialization signal line Vinit2.
所述第一晶体管T1的栅极与对应的第一复位线RE1耦接,所述第一晶体管T1的第一极与对应的所述第一初始化信号线Vinit1耦接,所述第一晶体管T1的第二极与所述第三晶体管T3的栅极(即第一节点N1)耦接。所述第三晶体管T3的栅极复用为存储电容Cst的第一极板,所述存储电容Cst的第二极板与电源线VDD耦接。The gate of the first transistor T1 is coupled to the corresponding first reset line RE1, the first electrode of the first transistor T1 is coupled to the corresponding first initialization signal line Vinit1, and the second electrode of the first transistor T1 is coupled to the gate of the third transistor T3 (i.e., the first node N1). The gate of the third transistor T3 is multiplexed as the first plate of the storage capacitor Cst, and the second plate of the storage capacitor Cst is coupled to the power line VDD.
所述第二晶体管T2的栅极与对应的栅线GA耦接,所述第二晶体管T2第一极与所述第三晶体管T3(即驱动晶体管)的第二极(即第二节点N2)耦接,所述第二晶体管T2的第二极与所述第三晶体管T3的栅极耦接。The gate of the second transistor T2 is coupled to the corresponding gate line GA, the first electrode of the second transistor T2 is coupled to the second electrode (ie, the second node N2) of the third transistor T3 (ie, the driving transistor), and the second electrode of the second transistor T2 is coupled to the gate of the third transistor T3.
所述第四晶体管T4的栅极与对应的栅线GA耦接,所述第四晶体管T4的第一极与对应的数据线DA耦接,所述第四晶体管T4的第二极与所述第三晶体管T3的第一极(即第三节点N3)耦接。A gate of the fourth transistor T4 is coupled to the corresponding gate line GA, a first electrode of the fourth transistor T4 is coupled to the corresponding data line DA, and a second electrode of the fourth transistor T4 is coupled to the first electrode of the third transistor T3 (ie, the third node N3).
所述第五晶体管T5的栅极与对应的发光控制线EM耦接,所述第五晶体管T5第一极与电源线VDD耦接,所述第五晶体管T5的第二极与所述第三晶体管T3的第一极耦接。A gate of the fifth transistor T5 is coupled to the corresponding light emitting control line EM, a first electrode of the fifth transistor T5 is coupled to the power line VDD, and a second electrode of the fifth transistor T5 is coupled to a first electrode of the third transistor T3.
所述第六晶体管T6的栅极与对应的发光控制线EM耦接,所述第六晶体管T6的第一极与所述第三晶体管T3的第二极耦接,所述第六晶体管T6的第二极与发光元件LD的阳极(即第四节点N4)耦接。The gate of the sixth transistor T6 is coupled to the corresponding light emitting control line EM, the first electrode of the sixth transistor T6 is coupled to the second electrode of the third transistor T3, and the second electrode of the sixth transistor T6 is coupled to the anode of the light emitting element LD (ie, the fourth node N4).
所述第七晶体管T7的栅极与第二复位线RE2耦接,所述第七晶体管T7的第一极与所述第二初始化信号线Vinit2耦接,所述第七晶体管T7的第二极与所述发光元件LD的阳极耦接,所述发光元件LD的阴极接收负电源信号VSS。 The gate of the seventh transistor T7 is coupled to the second reset line RE2, the first electrode of the seventh transistor T7 is coupled to the second initialization signal line Vinit2, the second electrode of the seventh transistor T7 is coupled to the anode of the light emitting element LD, and the cathode of the light emitting element LD receives the negative power signal VSS.
上述结构的像素驱动电路在工作时,每个工作周期均包括第一复位时段P1、写入补偿时段P2、第二复位时段P3和发光时段P4。When the pixel driving circuit of the above structure is working, each working cycle includes a first reset period P1, a writing compensation period P2, a second reset period P3 and a light emitting period P4.
在所述第一复位时段P1,所述第一复位线RE1输入的复位信号处于有效电平,第一晶体管T1导通,由第一初始化信号线Vinit1传输的第一初始化信号输入至所述第三晶体管T3的栅极,使得前一帧保持在所述第三晶体管T3上的栅源电压Vgs被清零,实现对所述第三晶体管T3的栅极复位。In the first reset period P1, the reset signal input by the first reset line RE1 is at a valid level, the first transistor T1 is turned on, and the first initialization signal transmitted by the first initialization signal line Vinit1 is input to the gate of the third transistor T3, so that the gate-source voltage Vgs maintained on the third transistor T3 in the previous frame is cleared, thereby resetting the gate of the third transistor T3.
在写入补偿时段P2,所述复位信号处于非有效电平,所述第一晶体管T1截止,所述栅线GA输入的栅极扫描信号处于有效电平,控制所述第二晶体管T2和所述第四晶体管T4导通,所述数据线DA写入数据信号,并经所述第四晶体管T4传输至所述第三晶体管T3的第一极,同时,第二晶体管T2和第四晶体管T4导通,使得第三晶体管T3形成为二极管结构,因此通过第二晶体管T2、第三晶体管T3和第四晶体管T4配合工作,实现对第三晶体管T3的阈值电压补偿,当补偿的时间足够长时,可控制第三晶体管T3的栅极电位最终达到Vdata+Vth,其中,Vdata代表数据信号电压值,Vth代表第三晶体管T3的阈值电压。During the write compensation period P2, the reset signal is at a non-valid level, the first transistor T1 is turned off, the gate scan signal input by the gate line GA is at a valid level, the second transistor T2 and the fourth transistor T4 are controlled to be turned on, the data line DA writes a data signal, and transmits it to the first electrode of the third transistor T3 through the fourth transistor T4. At the same time, the second transistor T2 and the fourth transistor T4 are turned on, so that the third transistor T3 forms a diode structure. Therefore, the threshold voltage compensation of the third transistor T3 is achieved through the cooperation of the second transistor T2, the third transistor T3 and the fourth transistor T4. When the compensation time is long enough, the gate potential of the third transistor T3 can be controlled to eventually reach Vdata+Vth, wherein Vdata represents the data signal voltage value, and Vth represents the threshold voltage of the third transistor T3.
在第二复位时段P3,所述栅极扫描信号处于非有效电平,第二晶体管T2和第四晶体管T4均截止,第二复位线RE2(可选为相邻的下一行像素驱动电路耦接的第一复位线)输入的复位信号处于有效电平,控制第七晶体管T7导通,将所述第二初始化信号线Vinit2输入的初始化信号输入至发光元件LD的阳极,控制发光元件LD不发光。In the second reset period P3, the gate scan signal is at a non-valid level, the second transistor T2 and the fourth transistor T4 are both turned off, the reset signal input by the second reset line RE2 (which can be optionally the first reset line coupled to the adjacent next row of pixel driving circuits) is at a valid level, and the seventh transistor T7 is controlled to be turned on, and the initialization signal input by the second initialization signal line Vinit2 is input to the anode of the light-emitting element LD, so that the light-emitting element LD is controlled not to emit light.
在发光时段P4,发光控制线EM写入的发光控制信号处于有效电平,控制所述第五晶体管T5和所述第六晶体管T6导通,使得由电源线VDD传输的电源信号输入至第三晶体管T3的第一极,同时由于第三晶体管T3的栅极保持在Vdata+Vth,使得第三晶体管T3导通,第三晶体管T3对应的栅源电压为Vdata+Vth-Vdd,其中Vdd为电源信号对应的电压值,基于该栅源电压产生的漏电流流向对应的发光元件LD的阳极,驱动对应的发光元件LD发光。During the light-emitting period P4, the light-emitting control signal written into the light-emitting control line EM is at a valid level, and the fifth transistor T5 and the sixth transistor T6 are controlled to be turned on, so that the power signal transmitted by the power line VDD is input to the first electrode of the third transistor T3. At the same time, since the gate of the third transistor T3 is maintained at Vdata+Vth, the third transistor T3 is turned on, and the gate-source voltage corresponding to the third transistor T3 is Vdata+Vth-Vdd, wherein Vdd is the voltage value corresponding to the power signal, and the leakage current generated based on the gate-source voltage flows to the anode of the corresponding light-emitting element LD, driving the corresponding light-emitting element LD to emit light.
如图19所示,像素驱动电路采用了LTPO模式。As shown in FIG19 , the pixel driving circuit adopts the LTPO mode.
如图19所示,该像素驱动电路中包括第一晶体管T1、有机发光二极管 O1、驱动晶体管T0、第二晶体管T2、第三晶体管T3、第四晶体管T4、第一电容C1、第五晶体管T5和第六晶体管T6;As shown in FIG. 19 , the pixel driving circuit includes a first transistor T1, an organic light emitting diode O1, a driving transistor T0, a second transistor T2, a third transistor T3, a fourth transistor T4, a first capacitor C1, a fifth transistor T5 and a sixth transistor T6;
所述第一晶体管T1的栅极与第一节点N1电连接,所述第一晶体管T1的源极与第一初始电压线电连接,所述第一晶体管T1的漏极与所述有机发光二极管O1的阳极电连接;The gate of the first transistor T1 is electrically connected to the first node N1, the source of the first transistor T1 is electrically connected to the first initial voltage line, and the drain of the first transistor T1 is electrically connected to the anode of the organic light emitting diode O1;
所述驱动晶体管T0的栅极与第一节点N1电连接;The gate of the driving transistor T0 is electrically connected to the first node N1;
所述第二晶体管T2的栅极与发光控制线E1电连接,所述第二晶体管T2的源极与所述驱动晶体管T0的漏极电连接,所述第二晶体管T0的漏极与所述有机发光二极管O1的阳极电连接;The gate of the second transistor T2 is electrically connected to the light emitting control line E1, the source of the second transistor T2 is electrically connected to the drain of the driving transistor T0, and the drain of the second transistor T0 is electrically connected to the anode of the organic light emitting diode O1;
所述第三晶体管T3的栅极与扫描线GA电连接,所述第三晶体管T3的源极与数据线DA电连接,所述第三晶体管T3的漏极与所述驱动晶体管T0的源极电连接;The gate of the third transistor T3 is electrically connected to the scan line GA, the source of the third transistor T3 is electrically connected to the data line DA, and the drain of the third transistor T3 is electrically connected to the source of the driving transistor T0;
所述第四晶体管T4的栅极与扫描线GA电连接,所述第四晶体管T4的源极与所述驱动晶体管T0的栅极电连接,所述第四晶体管T4的漏极与所述驱动晶体管T0的漏极电连接;The gate of the fourth transistor T4 is electrically connected to the scan line GA, the source of the fourth transistor T4 is electrically connected to the gate of the driving transistor T0, and the drain of the fourth transistor T4 is electrically connected to the drain of the driving transistor T0;
所述第一电容C1的第一极板与所述驱动晶体管T0的栅极电连接,所述第一电容C1的第二极板与高电压线VDD电连接;The first plate of the first capacitor C1 is electrically connected to the gate of the driving transistor T0, and the second plate of the first capacitor C1 is electrically connected to the high voltage line VDD;
所述第五晶体管T5的栅极与复位控制线R1电连接,所述第五晶体管T5的源极与第二初始电压线电连接,所述第五晶体管T5的漏极与所述驱动晶体管T0的栅极电连接;The gate of the fifth transistor T5 is electrically connected to the reset control line R1, the source of the fifth transistor T5 is electrically connected to the second initial voltage line, and the drain of the fifth transistor T5 is electrically connected to the gate of the driving transistor T0;
所述第六晶体管T6的栅极与发光控制线E1电连接,所述第六晶体管T6的源极与高电压线VDD电连接,所述第六晶体管T6的漏极与所述驱动晶体管T0的源极电连接;所述有机发光二极管O1的阴极与低电压线VSS电连接。The gate of the sixth transistor T6 is electrically connected to the light control line E1, the source of the sixth transistor T6 is electrically connected to the high voltage line VDD, the drain of the sixth transistor T6 is electrically connected to the source of the driving transistor T0; the cathode of the organic light emitting diode O1 is electrically connected to the low voltage line VSS.
至少一实施例中,T1和T5为N型晶体管,T2、T3、T4、T6和T0为P型晶体管。In at least one embodiment, T1 and T5 are N-type transistors, and T2, T3, T4, T6 and T0 are P-type transistors.
至少一实施例中,T1和T5可以都为氧化物晶体管,T2、T3、T4、T6和T0可以都为LTPS(低温多晶硅)晶体管,此时,图19所示的像素电路为LTPO(低温多晶硅晶体管和氧化物晶体管)电路。 In at least one embodiment, T1 and T5 can both be oxide transistors, and T2, T3, T4, T6 and T0 can all be LTPS (low-temperature polysilicon) transistors. In this case, the pixel circuit shown in Figure 19 is an LTPO (low-temperature polysilicon transistor and oxide transistor) circuit.
此外,本公开实施例还提供了一种显示装置,其包括本公开实施例所提供的显示基板。显然,本公开实施例提供的显示装置也能带来本公开实施例所提供的显示基板带来的有益效果,在此不再赘述。In addition, the embodiment of the present disclosure further provides a display device, which includes the display substrate provided by the embodiment of the present disclosure. Obviously, the display device provided by the embodiment of the present disclosure can also bring the beneficial effects brought by the display substrate provided by the embodiment of the present disclosure, which will not be repeated here.
此外,本公开实施例还提供了一种显示基板的制造方法,用于制造本公开实施例提供的显示基板,所述方法包括如下步骤:In addition, the present disclosure also provides a method for manufacturing a display substrate, which is used to manufacture the display substrate provided by the present disclosure, and the method includes the following steps:
步骤S01、提供一衬底基板100;Step S01, providing a base substrate 100;
步骤S02、在所述衬底基板100上形成第一导电层、第二导电层和屏蔽层400,其中,所述第一导电层具有第一信号图案201,所述第二导电层具有第二信号图案301,所述第一信号图案201与所述第二信号图案301在所述衬底基板100上的正投影具有交叠区S1,所述屏蔽层400位于所述第一导电层与所述第二导电层之间,且所述屏蔽层400、所述第一导电层和所述第二导电层之间通过绝缘层500彼此绝缘设置,所述屏蔽层400包括堆叠设置的至少两层子屏蔽膜层401,每层所述子屏蔽膜层401均设有镂空区400A和遮蔽区400B,且至少一层所述子屏蔽膜层401的镂空区400A与其他层所述子屏蔽膜层401的遮蔽区400B在所述衬底基板100上的正投影至少在所述交叠区S1重合。Step S02, forming a first conductive layer, a second conductive layer and a shielding layer 400 on the base substrate 100, wherein the first conductive layer has a first signal pattern 201, the second conductive layer has a second signal pattern 301, and the orthographic projections of the first signal pattern 201 and the second signal pattern 301 on the base substrate 100 have an overlapping area S1, the shielding layer 400 is located between the first conductive layer and the second conductive layer, and the shielding layer 400, the first conductive layer and the second conductive layer are insulated from each other by an insulating layer 500, the shielding layer 400 includes at least two stacked sub-shielding film layers 401, each of the sub-shielding film layers 401 is provided with a hollow area 400A and a shielding area 400B, and the hollow area 400A of at least one of the sub-shielding film layers 401 and the shielding area 400B of the other sub-shielding film layer 401 overlap at least in the overlapping area S1.
上述方案中,显示基板中的第一信号图案201与第二信号图案301能够被分别施加不同信号,两者之间存在交叠区S1,因此在两者之间设置屏蔽层400,可以降低信号相互串扰。但是,由于第一信号图案201与第二信号图案301不同层且绝缘设置,两者之间具有绝缘层500,绝缘层500可选用有机或无机材料制成,为了便于有机绝缘层500的工艺制程中气体排出,位于有机绝缘层500之上的屏蔽层400需设置镂空区400A,该镂空区400A作为排气孔。In the above scheme, the first signal pattern 201 and the second signal pattern 301 in the display substrate can be applied with different signals respectively, and there is an overlapping area S1 between the two, so a shielding layer 400 is set between the two to reduce signal crosstalk. However, since the first signal pattern 201 and the second signal pattern 301 are in different layers and insulated, there is an insulating layer 500 between the two, and the insulating layer 500 can be made of organic or inorganic materials. In order to facilitate the gas discharge during the process of the organic insulating layer 500, the shielding layer 400 located on the organic insulating layer 500 needs to be provided with a hollow area 400A, and the hollow area 400A serves as an exhaust hole.
若屏蔽层400仅设置有一层,在镂空区400A处第一信号图案201和第二信号图案301仍会存在一定程度的信号串扰,并且由于镂空区400A的存在,在布设信号图案时也会空间受限。因此,在上述方案中,将屏蔽层400设置为至少两层子屏蔽膜层401,且至少一层子屏蔽膜层401上的镂空区400A与其他层子屏蔽膜层401的遮蔽区400B在衬底基板100上的正投影至少在交叠区S1重合。 If the shielding layer 400 is provided with only one layer, there will still be a certain degree of signal crosstalk between the first signal pattern 201 and the second signal pattern 301 at the hollow area 400A, and due to the existence of the hollow area 400A, the space for arranging the signal pattern will also be limited. Therefore, in the above scheme, the shielding layer 400 is provided with at least two layers of sub-shielding film layers 401, and the hollow area 400A on at least one layer of sub-shielding film layer 401 and the shielding area 400B of the other layer of sub-shielding film layer 401 overlap on the base substrate 100 at least in the overlapping area S1.
也就是说,至少两层子屏蔽膜层401的镂空区400A至少在第一信号图案201和第二信号图案301的交叠区S1相互补偿,从而使得整个屏蔽层400至少在该交叠区S1形成一个完整的屏蔽面,可以有效避免第一信号图案201与第二信号图案301上不同信号的相互串扰,提升产品品质。That is to say, the hollow areas 400A of at least two layers of sub-shielding film layers 401 compensate each other at least in the overlapping area S1 of the first signal pattern 201 and the second signal pattern 301, so that the entire shielding layer 400 forms a complete shielding surface at least in the overlapping area S1, which can effectively avoid mutual crosstalk between different signals on the first signal pattern 201 and the second signal pattern 301, thereby improving product quality.
在本公开一些示例性的实施例中,所述显示基板还包括源漏金属层;上述步骤S02具体包括:In some exemplary embodiments of the present disclosure, the display substrate further includes a source-drain metal layer; the above step S02 specifically includes:
步骤S021、在所述衬底基板100上形成所述源漏金属层,并采用同一次构图工艺对所述源漏金属层进行图案化处理,以形成薄膜晶体管的源极、漏极及数据线220中的至少一种、及至少一层所述子屏蔽膜层401。Step S021, forming the source-drain metal layer on the base substrate 100, and patterning the source-drain metal layer using the same composition process to form at least one of the source, drain and data line 220 of the thin film transistor, and at least one layer of the sub-shielding film layer 401.
这样,可以不会额外增加工艺制程。In this way, no additional process steps are required.
具体地,步骤S021中,所述源漏金属层为包括金属膜层在内的多膜层结构,其中,在形成所述源漏金属层中的金属膜层的图案时,采用同一次构图工艺同时形成至少一层所述子屏蔽膜层401。Specifically, in step S021, the source-drain metal layer is a multi-layer structure including a metal film layer, wherein when forming the pattern of the metal film layer in the source-drain metal layer, at least one layer of the sub-shielding film layer 401 is formed simultaneously by the same patterning process.
此外,在本公开一些示例性的实施例中,所述显示基板还包括电极层;上述步骤S02具体包括:In addition, in some exemplary embodiments of the present disclosure, the display substrate further includes an electrode layer; the above step S02 specifically includes:
步骤S021’、在所述衬底基板100上形成第三导电层,并采用同一次构图工艺对所述第三导电层进行图案化处理,以形成阳极层及至少一层所述子屏蔽膜层401。Step S021', forming a third conductive layer on the base substrate 100, and patterning the third conductive layer using the same composition process to form an anode layer and at least one layer of the sub-shielding film layer 401.
此外,在本公开一些示例性的实施例中,所述显示基板还包括触控电极320;上述步骤S02具体包括:In addition, in some exemplary embodiments of the present disclosure, the display substrate further includes a touch electrode 320; the above step S02 specifically includes:
步骤S021”、在所述衬底基板100上形成至少两层金属层,并采用同一次构图工艺对其中至少一层所述金属层进行图案化处理,以形成触控电极320的图案及至少一层所述子屏蔽膜层401。Step S021 ″: forming at least two metal layers on the base substrate 100 , and patterning at least one of the metal layers using the same patterning process to form a pattern of the touch electrode 320 and at least one of the sub-shielding film layers 401 .
有以下几点需要说明:There are a few points to note:
(1)本公开实施例附图只涉及到与本公开实施例涉及到的结构,其他结构可参考通常设计。(1) The drawings of the embodiments of the present disclosure only relate to the structures related to the embodiments of the present disclosure, and other structures may refer to the general design.
(2)为了清晰起见,在用于描述本公开的实施例的附图中,层或区域的厚度被放大或缩小,即这些附图并非按照实际的比例绘制。可以理解,当诸如层、膜、区域或基板之类的元件被称作位于另一元件“上”或“下”时,该 元件可以“直接”位于另一元件“上”或“下”或者可以存在中间元件。(2) For the sake of clarity, in the drawings used to describe the embodiments of the present disclosure, the thickness of layers or regions is exaggerated or reduced, that is, these drawings are not drawn according to the actual scale. It is understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, the thickness of the layer or region is exaggerated or reduced. An element may be "directly on" or "under" another element or intervening elements may be present.
(3)在不冲突的情况下,本公开的实施例及实施例中的特征可以相互组合以得到新的实施例。(3) In the absence of conflict, the embodiments of the present disclosure and the features therein may be combined with each other to obtain new embodiments.
以上,仅为本公开的具体实施方式,但本公开的保护范围并不局限于此,本公开的保护范围应以权利要求的保护范围为准。 The above are only specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto, and the protection scope of the present disclosure shall be based on the protection scope of the claims.
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