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WO2024134670A1 - Appareil et procédé de revêtement à motifs d'un verre par dépôt chimique en phase vapeur - Google Patents

Appareil et procédé de revêtement à motifs d'un verre par dépôt chimique en phase vapeur Download PDF

Info

Publication number
WO2024134670A1
WO2024134670A1 PCT/IN2023/051146 IN2023051146W WO2024134670A1 WO 2024134670 A1 WO2024134670 A1 WO 2024134670A1 IN 2023051146 W IN2023051146 W IN 2023051146W WO 2024134670 A1 WO2024134670 A1 WO 2024134670A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
glass
coating
duct
director
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IN2023/051146
Other languages
English (en)
Inventor
Srikanth GANNE
Sabaresan M
Venkatamurugan NS
Kumaresan Thangaraj
Sivakumar V
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Publication of WO2024134670A1 publication Critical patent/WO2024134670A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles

Definitions

  • the present disclosure relates generally to an apparatus for coating of glass, it particularly relates to an apparatus for patterned coating of a glass by chemical vapour deposition.
  • BACKGROUND [0002] Background description includes information that may be useful in understanding the present disclosure. It is not an admission that any of the information provided herein is prior art or relevant to the presently claimed disclosure, or that any publication specifically or implicitly referenced is prior art.
  • Chemical Vapour Deposition (CVD) is a well-known process in which substances that are in vapour phase are deposited on another material under a controlled environment.
  • CVD is one of the widely used techniques in coating glass surfaces.
  • the glass surface is subjected to gas containing coating substances that are in vapour phase. Further, the coating substances are deposited on the glass surface layer by layer to finally obtain a coated glass.
  • CVD coating of the glass is performed on-line i.e., on the glass that is exiting the float.
  • Conventional CVD coating apparatus comprises a beam that runs across the entire width of the glass.
  • the beam comprises of a gas duct within which the gas is supplied and further the gas is directed towards the glass surface using a graphite block that spans across the entire width of the glass surface. As a result, the entire surface of the glass is coated with a coating material.
  • a conventional solution to obtain patterned coating on a glass is by selective etching process. Firstly, the entire glass surface is coated by the CVD coating apparatus. Further, certain portions where coating is not required are selectively removed by etching thereby forming patterns/textures of coating on the glass surface. As it is apparent, such a process is not an efficient way of obtaining patterned coating on a glass surface because, firstly, the entire glass surface is coated including the region where the coating is undesirable. This results in increased consumption of coating material and energy for coating. Secondly, to etch the coating additional chemicals are used and further considerable energy is also spent on etching.
  • US20040161614A1 discloses a technique of obtaining patterned coating of glass surface.
  • the cited reference particularly relates to air-atomized spray coating which is completely different from the CVD coating process.
  • the reference discloses a technique of obtaining a gradient of coating using CVD but completely fails to disclose about obtaining patterned CVD coating of glass.
  • an apparatus for patterned coating of a glass by chemical vapour deposition is disclosed.
  • the apparatus comprises a gas distributor unit and at least two gas director units.
  • the gas distributor unit further comprises a gas duct configured to receive a gas for coating the glass by chemical vapour deposition, wherein a slot is defined on an inferior side of the gas duct to serve as an exit for the gas from the gas duct.
  • Each of the gas director units is engaged to the gas distributor unit, wherein each of the gas director units is positioned below the gas duct and configured to receive gas from the gas duct and direct the gas towards the glass.
  • the method includes supplying a gas comprising a coating material through a gas duct, wherein the gas duct defines a slot for the gas to exit the gas duct into at least two gas director units. Further, covering a region of the slot between the two gas director units using a cover plate. Furthermore, passing the gas from the gas duct to at least two gas director units positioned below the gas duct. Finally, coating the glass by the gas flowing through the gas director units, wherein a region of the glass between the gas director units is devoid of coating due to the cover plate, thereby forming a patterned coating on the glass surface.
  • FIG. 1 illustrates a schematic of a system 100 for conventional chemical vapour deposition (CVD) coating of a glass
  • FIG.2 illustrates a schematic of a conventional CVD coating apparatus 108 for coating glass
  • FIG.3 illustrates a schematic of an apparatus 300 for patterned coating of a glass by CVD, in accordance with an embodiment
  • FIG. 4 illustrates an isometric view of the apparatus 300 for patterned coating of a glass by CVD, in accordance with an embodiment
  • FIG.5 illustrates a cross-section view across the plane A-A of the apparatus 300 for patterned coating of a glass by CVD, in accordance with an embodiment
  • FIG.6 illustrates a cross-section view of the apparatus 300 across the plane B-B, in accordance with an embodiment
  • FIG.7 illustrates an exploded view of the apparatus 300, in accordance with an embodiment
  • FIG. 8 illustrates a perspective view of the first block 506 of the gas director unit 304, in accordance with an embodiment
  • FIG. 10 illustrates a schematic of an apparatus 1000 for patterned coating of a glass by CVD, in accordance with an embodiment.
  • FIG.10 illustrates a schematic of an apparatus 1000 for patterned coating of a glass by CVD, in accordance with an embodiment.
  • FIG. 1 illustrates a schematic of a system 100 for conventional chemical vapour deposition (CVD) coating of a glass.
  • the system 100 comprises a furnace 102, a float bath 106, and a CVD coater 108.
  • the furnace 102 is configured to receive the raw material for glass production and heat and process the raw material to produce molten glass 104. Further, the molten glass 104 is floated on a float bath 106 to form thin sheet of glass 104.
  • the float bath 106 contains a bed of molten metal, typically tin, over which the molten glass from the furnace 102 flows to form a sheet of glass 104. Further, the sheet of glass 104 is subjected to the CVD coater 108 where the glass sheet 104 is coated using the CVD technique. The coating material that is in vapour state interacts with the glass surface and further the coating material is deposited on the surface of the glass 104 thereby coating the glass.
  • FIG.2 illustrates a schematic of a conventional CVD coating apparatus 108 for coating glass.
  • the apparatus 108 comprises a gas distributor unit 202 (beam) and a gas director unit 204 that has a width substantially equal to the width of the glass to be coated.
  • FIG.3 illustrates a schematic of an apparatus 300 for patterned coating of a glass by CVD, in accordance with an embodiment.
  • the apparatus 300 comprises a gas distributor unit 302 and a plurality of gas director units 304.
  • the gas director units 304 are engaged to the gas distributor unit 302 and further fluidically connected to the gas distributor unit 304 to receive the gas from the gas distributor unit 302.
  • the gas director units 304 are spaced apart along the longitudinal direction of the gas distributor unit 304 thereby obtaining a patterned coating 306 of the glass.
  • FIG. 4 illustrates an isometric view of the apparatus 300 for patterned coating of a glass by CVD, in accordance with an embodiment.
  • the apparatus 300 comprises a gas distributor unit 302 and multiple gas director units 304 coupled to the gas distributor unit 302.
  • FIG.5 illustrates a cross-section view across the plane A-A (of FIG.4) of the apparatus 300 for patterned coating of a glass by CVD, in accordance with an embodiment.
  • the gas distributor unit 302 comprises a gas duct 502 configured to receive the gas for coating the glass by chemical vapour deposition.
  • a slot 504 is defined on an inferior side of the gas duct to serve as an exit for the gas from the gas duct 502.
  • the gas is supplied into the gas duct 502 and then exits the gas duct 502 via the slot 504.
  • at least two gas director units 304 are positioned below the gas duct 502 and configured to receive gas exiting the gas duct 502 and further direct the gas towards the glass surface.
  • the gas director unit 304 comprises a first block 506, a second block 508 and a third block 510.
  • the second block 508 is placed adjacent to the first block 506 to define a downstream passage 512.
  • the third block 510 is placed adjacent to the second block 508 to define an upstream passage 514.
  • Each of the gas director units 304 is positioned below the gas duct 502 in a manner that the downstream passage 512 aligns with the slot 504 of the gas duct 502 to receive the gas from the gas duct 502.
  • the downstream passage 512 and the upstream passage 514 are connected via a guiding passage 516 defined between an inferior side of the second block 508 facing the glass and the surface of the glass to be coated.
  • the apparatus further comprises a waffle pack 518 disposed between the slot 504 and the downstream passage 512 configured to direct the gas from the gas duct 502 into the downstream passage 512.
  • gas exiting the gas duct 502 is configured to flow into the downstream passage 512 via the slot 504 and further through the guiding passage 516 to coat the glass surface and exit through the upstream passage 514.
  • the gas exiting via the upstream passage 514 may be further collected and processed using any conventionally known extractor.
  • the gas director units 304 are positioned along a longitudinal direction of the gas duct 502.
  • the gas director units 304 are uniformly spaced apart from each other.
  • FIG.6 illustrates a cross-section view of the apparatus 300 across the plane B-B (of FIG.4), in accordance with an embodiment.
  • the apparatus 300 comprises a cover plate 602 configured to cover a portion of the slot 504 between successive gas director units 304.
  • a cover plate 602 configured to cover a portion of the slot 504 between successive gas director units 304.
  • Such a configuration of using a cover plate 602 to cover a portion of the slot 504 between the gas director units 304 and the spacing of the gas director units 304 results in obtaining patterned coating wherein the region of the glass between the gas director units 304 are devoid of coating and the region of the glass below the gas director units 304 are coated.
  • more than one slots are defined on the gas duct 502 for the gas in the gas duct to flow into the gas director unit 304.
  • the number of gas director units may be same as the number of slots in the gas duct and the width of each of the slots defines the width of the coating formed on the glass surface.
  • the gas supplied to one gas director unit may be different from the gas supplied to another gas director unit. Separate gas supply lines supplying gas to each of the slots may be provided. This configuration enables in obtaining patterned coating wherein the patterns are formed with different coating materials.
  • FIG. 8 illustrates a perspective view of the first block 506 of the gas director unit 304, in accordance with an embodiment.
  • the first block 506 of the gas director unit defines at least one depressed region 802.
  • FIG. 9 illustrates a cross-section view of the gas director unit, in accordance with another embodiment.
  • the gas director unit 304 further comprises at least one extension plug 902 extending from the inferior side of the second block 508 towards the glass surface.
  • the extension plug 902 causes the gas to flow around the plug thereby causing the formation of patterned coatings with thin patterns.
  • the extension plug 902 may be made using but not limited to graphite.
  • FIG.10 illustrates a schematic of an apparatus 1000 for patterned coating of a glass by CVD, in accordance with an embodiment.
  • the apparatus 1000 further comprises an oscillation unit 1002 coupled to the gas distributor unit 302.
  • the oscillation unit 1002 is configured to enable movement of the gas distributor unit 302 along with the gas director units in a first direction.
  • the first direction is typically orthogonal to the direction of the movement of the glass.
  • This oscillating movement of the gas distributor unit causes the wavy pattern 1004 of coating on the glass surface 104.
  • a method of obtaining patterned coating of a glass by chemical vapour deposition is disclosed.
  • the gas comprising the coating material is supplied through the gas duct 502.
  • the gas further exits the gas duct 502 via the slot 504 defined on the gas duct 502 and enter into at least two gas director units 304.
  • a region of the slot 504 that is between successive gas director units 304 is covered using a cover plate 602.
  • This configuration enables the gas to only pass through the gas director units 304 and prevents the leakage of gas from the portion of the slot that is between the gas director units 304.
  • the gas director units 304 receive the gas from the gas duct 502 and direct the gas towards the glass to be coated.
  • the gas flowing over the glass surface coats the glass surface below the gas director units with the coating material.
  • the glass surface that is beneath the region between the gas director units are devoid of coating.
  • INDUSTRIAL APPLICATION [0049]
  • the disclosed apparatus may be used in glass coating industries, specifically, in on-line CVD coating process.
  • the apparatus enables forming patterned coating on glass surface.

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

L'appareil (300) selon l'invention comprend une unité de distribution de gaz (302) et au moins deux unités d'orientation de gaz (304). L'unité de distribution de gaz (302) comprend en outre un conduit de gaz (502) conçu pour recevoir un gaz pour revêtir le verre par dépôt chimique en phase vapeur, une fente (504) étant définie sur un côté inférieur du conduit de gaz (502) pour servir de sortie pour le gaz provenant du conduit de gaz (502). Chacune des unités d'orientation de gaz (304) est en prise avec l'unité de distribution de gaz (302), chacune des unités d'orientation de gaz (304) étant positionnée au-dessous du conduit de gaz (502) et conçue pour recevoir le gaz provenant du conduit de gaz (502) et orienter le gaz vers le verre.
PCT/IN2023/051146 2022-12-22 2023-12-08 Appareil et procédé de revêtement à motifs d'un verre par dépôt chimique en phase vapeur Ceased WO2024134670A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IN202241074552 2022-12-22
IN202241074552 2022-12-22

Publications (1)

Publication Number Publication Date
WO2024134670A1 true WO2024134670A1 (fr) 2024-06-27

Family

ID=91587983

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IN2023/051146 Ceased WO2024134670A1 (fr) 2022-12-22 2023-12-08 Appareil et procédé de revêtement à motifs d'un verre par dépôt chimique en phase vapeur

Country Status (1)

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WO (1) WO2024134670A1 (fr)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4088471A (en) * 1974-06-14 1978-05-09 Pilkington Brothers Limited Apparatus for coating glass
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4088471A (en) * 1974-06-14 1978-05-09 Pilkington Brothers Limited Apparatus for coating glass
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface

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