WO2024089343A1 - Coating comprising hafnium - Google Patents
Coating comprising hafnium Download PDFInfo
- Publication number
- WO2024089343A1 WO2024089343A1 PCT/FR2023/051626 FR2023051626W WO2024089343A1 WO 2024089343 A1 WO2024089343 A1 WO 2024089343A1 FR 2023051626 W FR2023051626 W FR 2023051626W WO 2024089343 A1 WO2024089343 A1 WO 2024089343A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- hafnium
- substrate
- platinum
- coating
- Prior art date
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- 229910052735 hafnium Inorganic materials 0.000 title claims abstract description 68
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 238000000576 coating method Methods 0.000 title claims abstract description 27
- 239000011248 coating agent Substances 0.000 title claims abstract description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 82
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 41
- 238000000034 method Methods 0.000 claims abstract description 39
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 238000000151 deposition Methods 0.000 claims abstract description 18
- 230000004888 barrier function Effects 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 24
- 238000009792 diffusion process Methods 0.000 claims description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 17
- 230000008021 deposition Effects 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000005240 physical vapour deposition Methods 0.000 claims description 4
- 229910000601 superalloy Inorganic materials 0.000 claims description 3
- 229910000995 CMSX-10 Inorganic materials 0.000 claims description 2
- 238000005269 aluminizing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 97
- 229910052782 aluminium Inorganic materials 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
- C23C10/34—Embedding in a powder mixture, i.e. pack cementation
- C23C10/36—Embedding in a powder mixture, i.e. pack cementation only one element being diffused
- C23C10/48—Aluminising
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
- F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
- F01D5/12—Blades
- F01D5/28—Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
- F01D5/288—Protective coatings for blades
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
- F05D2230/90—Coating; Surface treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2260/00—Function
- F05D2260/95—Preventing corrosion
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2300/00—Materials; Properties thereof
- F05D2300/10—Metals, alloys or intermetallic compounds
- F05D2300/12—Light metals
- F05D2300/121—Aluminium
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2300/00—Materials; Properties thereof
- F05D2300/10—Metals, alloys or intermetallic compounds
- F05D2300/13—Refractory metals, i.e. Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W
- F05D2300/135—Hafnium
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2300/00—Materials; Properties thereof
- F05D2300/60—Properties or characteristics given to material by treatment or manufacturing
- F05D2300/611—Coating
Definitions
- the invention relates to the field of metal parts coated with a thermal barrier and more precisely to bonding layers to increase adhesion between the thermal barrier and the metal parts.
- materials used for parts in such environments are coated with a thermal barrier and/or an environmental barrier in order to improve their lifespan.
- an adhesion layer also called an “underlayer” between the substrate and the thermal barrier, the adhesion layer fulfilling two main roles : protect the substrate against oxidation and corrosion and promote adhesion of the thermal barrier.
- the adhesion of the adhesion layer to the substrate and to the thermal barrier is important because it increases the lifespan of the thermal barrier and, consequently, of the entire part.
- the invention aims precisely to meet this need and proposes, according to a first of its aspects, a method of forming a coating on a surface of a metal substrate, the method comprising at least the following steps: a) the deposition of a hafnium layer whose thickness is between 0.2 pm and 10 pm; b) depositing a layer of platinum whose thickness is between 2.0 pm and 10 pm; c) aluminization of the part obtained after steps a) and b).
- the process is advantageously better controlled and more repeatable than the processes of the prior art.
- it makes it possible to obtain a coating which ensures an improvement in the lifespan of the final part, after a thermal barrier is deposited on the coating, compared to the parts of the prior art.
- the coating is an adhesion layer for a thermal barrier, for example an adhesion layer comprising nickel, platinum and aluminum which is doped with hafnium.
- the coating described can be used as an adhesion layer for a thermal barrier on a metal substrate.
- Such an adhesion layer will have all the advantages of the presence of hafnium described above and also having good homogeneity of the hafnium in the adhesion layer, and this without the need to modify the composition of the metal substrate.
- steps a) and b) can be carried out by chemical vapor deposition (CVD) processes or physical vapor deposition (CVD) processes. Vapor Deposition” or PVD). In one embodiment, the deposition of the platinum layer in step b) is carried out by electrolytic deposition.
- step b) may or may not be followed by a diffusion heat treatment.
- such a diffusion heat treatment can be carried out at a temperature of between 1050°C and 1100°C and for a time of between 30 minutes and 2 hours and at a pressure of between W 5 and W 6 mbar.
- step b) is carried out after step a).
- step b) is carried out before step a).
- hafnium layer makes it possible to reinforce the grain boundaries in the coating, which blocks the diffusion of metal cations and also slows down the diffusion of oxygen.
- hafnium in the coating also makes it possible to block the diffusion of sulfur, whether it comes from the substrate or from the electrolytic platinum deposit.
- the presence of the platinum layer makes it possible to provide the platinum necessary for the formation of the desired coating.
- the thicknesses of the platinum and hafnium layers ensure that the content of these elements in the final part conforms to what is desired.
- Aluminization step c) is a step known as such. Applied to the process of the invention, it allows on the one hand an enrichment of the aluminum coating, and also the diffusion of the species present in the hafnium and platinum layers or even of the species present in the substrate to form, at the surface of the substrate a single coating layer, for example an adhesion layer.
- a surface layer of the coating is formed which includes a significant content of aluminum, platinum and nickel which also includes hafnium, due to the diffusion of these species from the substrate or the layers deposited in steps a) and b).
- the layers of platinum and hafnium formed during steps a) and b) are no longer discrete because the diffusion caused by the aluminization has allowed the elements of these two layers to mix in the layer formed.
- the aluminization can be carried out at a temperature between 980°C and 1150°C, preferably between 1040°C and 1150°C for a period of between 2 and 8 hours, for example between 2 and 3 hours.
- the coating is no longer present in the form of distinct layers but in the form of a single layer comprising all the species having diffused during the aluminization.
- Such a coating notably comprises a high and homogeneous hafnium content, compared to the coatings obtained by prior art processes.
- the aluminization step is carried out without additional addition of hafnium.
- the presence of the hafnium layer deposited during step a) is sufficient to guarantee the beneficial effects of the presence of hafnium without it being necessary to add more.
- the aluminization step without additional addition of hafnium is much easier and does not require adaptation of existing aluminization processes compared to an aluminization stage during which we would also like to provide hafnium.
- Hafnium having a great affinity for sulfur the latter remains blocked in the presence of hafnium and therefore no longer migrates towards the layer formed by aluminization.
- hafnium in the form of a thin layer rather than a deposit carried out jointly with the formation of the adhesion layer ensures excellent homogeneity of the distribution of hafnium in the layer. hook.
- the invention also relates to a method of manufacturing a metal part coated with a thermal barrier comprising at least the following steps:
- the invention is not limited by the nature of the thermal barrier, or the method of depositing it on the coating. As has just been described, this embodiment makes it possible to have bonding layers guaranteeing better adhesion and better resistance to oxidation of thermal barriers than the bonding layers of the prior art.
- the parts according to the invention have better resistance over time than those of the prior art, whose underlayers would be different.
- the thermal barrier may comprise zirconia stabilized with yttrium oxide (often called YSZ for the acronym in English “Yttria-stabilized zirconia”) or gadolinium zirconate, of formula Gd2Zr 2 O 7 (often called GdZ).
- YSZ zirconia stabilized with yttrium oxide
- GdZ gadolinium zirconate
- the thermal barrier can be deposited by plasma suspension (or SPS for the acronym in English “Suspension Plasma Spraying”), or by electron beam physical vapor deposition processes (or EBPVD, for the acronym in English “Electron Beam Physical Vapor Deposition”).
- the thermal barrier may comprise a single layer of zirconia stabilized with yttrium oxide or a layer of zirconia stabilized with yttrium oxide and a layer of gadolinium zirconate.
- the invention relates to a coated metal part comprising:
- the invention relates to a coated metal part comprising:
- the metal substrate can be chosen from nickel superalloys known under the names AMI, N5, AM21, MCNG or CMSX10.
- the platinum layer comprises platinum at more than 90% by mass, or even more than 99% by mass.
- the platinum layer does not include any element other than platinum and inevitable impurities.
- the hafnium layer comprises hafnium at more than 90% by weight, or even more than 99% by weight.
- the hafnium layer does not include any element other than hafnium and inevitable impurities.
- the invention is not limited by the relative arrangement of the hafnium layer and the platinum layer.
- the hafnium layer is located between the metal substrate and the platinum layer and preferably directly in contact with them.
- Such an embodiment makes it possible to reinforce the grain boundaries of the sub-layer, thus blocking the diffusion of metal cations and slowing down the diffusion of oxygen in the latter and therefore the kinetics of oxidation of the sub-layer and neutralizing the sulfur. in consideration of the substrate.
- the hafnium layer is located on the platinum layer and preferably directly in contact with it.
- Such an embodiment makes it possible to reinforce the grain boundaries of the underlayer, thus blocking the diffusion of metal cations and slowing down the diffusion of oxygen in the latter and therefore the kinetics of oxidation of the underlayer.
- this makes it possible to neutralize sulfur coming from the substrate and also platinum deposits, which ensures an even better lifespan for the thermal barrier. Sulfur is in fact known to cause the bonding layer to peel off.
- the metal substrate is a turbomachine blade or a turbomachine distributor.
- Figure 1 schematically represents a method according to one embodiment of the invention.
- FIG. 2 Figure 2 schematically represents a method according to another embodiment of the invention.
- Figure 3 schematically represents a part according to one embodiment of the invention.
- Figure 4 schematically represents a part according to another embodiment of the invention.
- Figure 5 schematically represents a part according to another embodiment of the invention.
- Figure 6 represents test results comparing two parts according to the invention to two parts of the prior art.
- Figure 7 is a micrograph obtained by scanning electron microscopy, identifying points for measuring the atomic composition of an adhesion layer obtained by a method of the invention.
- the invention relates to a method 2000, comprising the following steps: a) depositing a layer of hafnium whose thickness is between 0.2 pm and 10 pm; b) depositing a layer of platinum whose thickness is between 2.0 pm and 10 pm; c) aluminization of the part obtained after steps a) and b).
- step a) is carried out before step b).
- step b) is carried out before step a).
- the deposition of the platinum layer to be carried out specifically before or after the deposition of the hafnium layer, provided that these two layers are deposited before the aluminization step.
- the aluminization step can be carried out in a manner known per se.
- aluminization processes are carried out by bringing the superalloy into contact with gaseous aluminum precursors, for example FAICh, under pressure and temperature conditions which allow the formation of gaseous aluminum.
- gaseous aluminum precursors for example FAICh
- the aluminum thus formed reacts with the nickel of the substrate which diffuses towards the surface of the substrate, with the help of the temperature to form a layer comprising nickel and aluminum on the surface of the substrate, for example Ni 2 AI 3 .
- the layer formed by aluminization therefore also comprises these elements.
- the coating includes the elements of the substrate, as well as a majority of nickel, platinum and aluminum as well as hafnium.
- a layer is often called NiPtAI, and is here doped with hafnium.
- the coating does not include other elements present in a content of more than 5% by mass than nickel, aluminum and platinum.
- the coating further comprises up to 5% by weight of chromium and/or cobalt.
- the coating comprises between 0.5 and 3% by weight of hafnium.
- an aluminization treatment can be carried out at a temperature of between 1040°C and 1080°C, for a duration of between 200 and 500 minutes, and with a flow rate of aluminum precursor, for example of FAICh, of between 0.23 and 1.0 L.min 1 .
- the presence of the hafnium layer allowing the production of the adhesion layer by diffusion ensures on the one hand the presence, and on the other hand a homogeneous distribution of the hafnium in the adhesion layer, without requiring modification of the composition of the underlying substrate. This ensures that the thermal barrier which will be deposited on the adhesion layer has improved adhesion properties, which will improve the lifespan of the part, as will be described in the example, in connection with the figure 6.
- Figure 3 describes a part 1000 obtained at the end of step c) of aluminization of a process 2000 carried out in accordance with the embodiment of Figure 1.
- Such a part 1000 includes:
- the two layers 20, 30 are intended to form the adhesion layer 50 by aluminization.
- the hafnium layer 20 can be directly in contact with the substrate 10.
- the platinum layer 30 can be directly in contact with the hafnium layer 20, on the side opposite the substrate 10.
- Figure 4 describes a part 1000 obtained at the end of the step c) a process 2000 carried out in accordance with the embodiment of Figure 2.
- steps a) and b) has the effect of obtaining on the surface of the metal substrate 10 the platinum layer 30 and the hafnium layer 20 on the surface of the platinum layer 30.
- the platinum layer 30 can be directly in contact with the substrate 10.
- the hafnium layer 20 can be directly in contact with the platinum layer 30, on the side opposite the substrate 10.
- Figure 5 describes a part 1000 obtained after aluminization of a part such as described in Figure 3 or 4 indifferently.
- the part 1000 no longer comprises two distinct layers 20, 30 but a single layer 50, which further comprises aluminum provided by aluminization.
- Figure 6 illustrates comparative results of oxidation resistance for two parts according to the invention 101, 102 and two parts outside the invention 201, 202.
- the four parts are similar and include a metal substrate, an adhesion layer and a thermal barrier placed on the adhesion layer.
- the bonding layers of the parts outside the invention 201, 202 were obtained according to a process of the prior art, and do not include hafnium, while the parts according to the invention include hafnium and have been obtained according to a process of the invention.
- Figure 6 represents on the abscissa 100 the number of oxidation cycles, and on the ordinate 200 the mass gain in mg.cnT 2 observed for the part. The experiments are carried out at 1150°C.
- Figure 6 It can be read in Figure 6 that the mass loss (in Figure 6, the mass gain 200 is in fact negative) is greater from 2000 cycles for the parts of the prior art than for the parts of the invention.
- Figure 7 aims to characterize the homogeneity of the distribution of hafnium in a primer layer 50 of the invention.
- Table 1 clearly illustrates that the process of the invention makes it possible to obtain low variations in the hafnium content in the adhesion layer 50, the hafnium content remaining everywhere between 1.2% and 1.6% by weight. .
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Abstract
The invention relates to a method for forming a coating (50) on a surface of a metal substrate (10), the method (2000) comprising at least the following steps: a) depositing a hafnium layer (20), the thickness e1 of which is between 0.2 μm and 10 μm; b) depositing a platinum layer (30), the thickness of which is between 2.0 μm and 10 μm; c) aluminizing the part obtained after steps a) and b).
Description
Description Description
Titre de l'invention : Revêtement comprenant de ITiafnium Title of the invention: Coating comprising ITiafnium
Domaine Technique Technical area
L'invention concerne le domaine des pièces métalliques revêtues d'une barrière thermique et plus précisément des couches d'accroches pour augmenter l'adhérence entre la barrière thermique et les pièces métalliques. The invention relates to the field of metal parts coated with a thermal barrier and more precisely to bonding layers to increase adhesion between the thermal barrier and the metal parts.
Technique antérieure Prior art
De manière générale, les performances d'une turbomachine aéronautique sont fonctions des températures atteintes. Generally speaking, the performance of an aeronautical turbomachine depends on the temperatures reached.
Toutefois, les températures élevées et l'environnement chimique particulier des turbomachines soumettent les pièces de la turbomachine à des contraintes importantes. However, the high temperatures and the particular chemical environment of turbomachines subject the parts of the turbomachine to significant stresses.
Classiquement, les matériaux utilisés pour des pièces dans de tels environnements sont revêtus d'une barrière thermique et/ou d'une barrière environnementale afin d'améliorer leurs durées de vie. Conventionally, materials used for parts in such environments are coated with a thermal barrier and/or an environmental barrier in order to improve their lifespan.
Pour améliorer l'adhésion de la barrière thermique à un substrat, il est généralement proposé d'interposer une couche d'accroche, aussi dite « sous-couche » entre le substrat et la barrière thermique, la couche d'accroche remplissant deux rôles principaux : protéger le substrat contre l'oxydation et la corrosion et favoriser l'adhérence de la barrière thermique. To improve the adhesion of the thermal barrier to a substrate, it is generally proposed to interpose an adhesion layer, also called an “underlayer” between the substrate and the thermal barrier, the adhesion layer fulfilling two main roles : protect the substrate against oxidation and corrosion and promote adhesion of the thermal barrier.
L'adhérence de la couche d'accroche au substrat et à la barrière thermique est importante car elle permet d'augmenter la durée de vie de la barrière thermique et, en conséquence, de l'ensemble de la pièce. The adhesion of the adhesion layer to the substrate and to the thermal barrier is important because it increases the lifespan of the thermal barrier and, consequently, of the entire part.
Pour améliorer l'adhérence de la pièce, il est parfois proposé de doper la couche d'accroche avec de l'hafnium. Deux solutions existent pour cela, mais aucune n'offre complète satisfaction. To improve the adhesion of the part, it is sometimes proposed to boost the adhesion layer with hafnium. Two solutions exist for this, but neither offers complete satisfaction.
Selon une première option, il est possible d'ajouter une grande quantité d'hafnium dans la composition du substrat, de sorte que la quantité d'hafnium migrant par
diffusion dans la couche d'accroche, lors de la réalisation de celle-ci soit plus importante. According to a first option, it is possible to add a large quantity of hafnium to the composition of the substrate, so that the quantity of hafnium migrating through diffusion in the adhesion layer, during the production of this is more important.
Cette option impose néanmoins de modifier la composition du substrat métallique ce qui est rarement souhaitable. En outre, cela impose de travailler avec des substrats comprenant une teneur en hafnium plus grande qui rend plus difficile la mise en solution de l'hafnium dans ledit substrat. This option nevertheless requires modifying the composition of the metal substrate, which is rarely desirable. In addition, this requires working with substrates comprising a greater hafnium content which makes it more difficult to dissolve the hafnium in said substrate.
Selon une seconde option, il est possible d'ajouter une faible quantité d'hafnium à la couche d'accroche directement pendant le dépôt de celle-ci. According to a second option, it is possible to add a small quantity of hafnium to the primer layer directly during its deposition.
Malheureusement, on constate en essayant de mettre cette option en pratique que la quantité d'hafnium et l'homogénéité de la répartition de l'hafnium dans l'épaisseur de la couche d'accroche n'est pas parfaitement contrôlée. Il y a donc un risque de dégrader la durée de vie à l'oxydation et la tenue de la barrière thermique. Unfortunately, we note when trying to put this option into practice that the quantity of hafnium and the homogeneity of the distribution of hafnium in the thickness of the adhesion layer is not perfectly controlled. There is therefore a risk of degrading the oxidation life and the performance of the thermal barrier.
Il demeure donc un besoin pour un procédé de fabrication d'une couche d'accroche permettant de maîtriser la quantité d'hafnium et l'homogénéité de sa répartition dans la couche d'accroche. There therefore remains a need for a process for manufacturing an adhesion layer making it possible to control the quantity of hafnium and the homogeneity of its distribution in the adhesion layer.
Exposé de l'invention Presentation of the invention
L'invention vise précisément à répondre à ce besoin et propose selon un premier de ses aspects un procédé de formation d'un revêtement sur une surface d'un substrat métallique, le procédé comprenant au moins les étapes suivantes : a) le dépôt d'une couche d'hafnium dont l'épaisseur est comprise entre 0,2 pm et 10 pm ; b) le dépôt d'une couche de platine dont l'épaisseur est comprise entre 2,0 pm et 10 pm; c) une aluminisation de la pièce obtenue après les étapes a) et b). The invention aims precisely to meet this need and proposes, according to a first of its aspects, a method of forming a coating on a surface of a metal substrate, the method comprising at least the following steps: a) the deposition of a hafnium layer whose thickness is between 0.2 pm and 10 pm; b) depositing a layer of platinum whose thickness is between 2.0 pm and 10 pm; c) aluminization of the part obtained after steps a) and b).
Le procédé est avantageusement mieux contrôlé et plus répétable que les procédés de l'art antérieur. En outre, il permet d'obtenir un revêtement qui assure une amélioration de la durée de vie à la pièce finale, après qu'une barrière thermique soit déposée sur le revêtement, comparativement aux pièces de l'art antérieur.
Dans un mode de réalisation, le revêtement est une couche d'accroche pour une barrière thermique, par exemple une couche d'accroche comprenant du nickel, du platine et de l'aluminium laquelle est dopée à l'hafnium. The process is advantageously better controlled and more repeatable than the processes of the prior art. In addition, it makes it possible to obtain a coating which ensures an improvement in the lifespan of the final part, after a thermal barrier is deposited on the coating, compared to the parts of the prior art. In one embodiment, the coating is an adhesion layer for a thermal barrier, for example an adhesion layer comprising nickel, platinum and aluminum which is doped with hafnium.
En effet, le revêtement décrit peut être utilisé en tant que couche d'accroche pour une barrière thermique sur un substrat métallique. Une telle couche d'accroche aura tous les avantages de la présence d'hafnium décrits plus haut et présentant en outre une bonne homogénéité de l'hafnium dans la couche d'accroche, et cela sans nécessité de modifier la composition du substrat métallique. Indeed, the coating described can be used as an adhesion layer for a thermal barrier on a metal substrate. Such an adhesion layer will have all the advantages of the presence of hafnium described above and also having good homogeneity of the hafnium in the adhesion layer, and this without the need to modify the composition of the metal substrate.
Dans un mode de réalisation, les étapes a) et b) peuvent être réalisées par des procédés de dépôt chimique en phase vapeur (en anglais « Chemical Vapor Deposition » ou CVD) ou des procédés de dépôt physique en phase vapeur (en anglais «Physical Vapor Deposition » ou PVD). Dans un mode de réalisation, le dépôt de la couche de platine à l'étape b) est réalisé par dépôt électrolytique. In one embodiment, steps a) and b) can be carried out by chemical vapor deposition (CVD) processes or physical vapor deposition (CVD) processes. Vapor Deposition” or PVD). In one embodiment, the deposition of the platinum layer in step b) is carried out by electrolytic deposition.
Dans un mode de réalisation, l'étape b) peut être suivie ou non d'un traitement thermique de diffusion. In one embodiment, step b) may or may not be followed by a diffusion heat treatment.
Par exemple, un tel traitement thermique de diffusion peut être réalisé à une température comprise entre 1050°C et 1100°C et pendant une durée comprise entre 30 minutes et 2 heures et à une pression comprise entre W5 et W6 mbar. For example, such a diffusion heat treatment can be carried out at a temperature of between 1050°C and 1100°C and for a time of between 30 minutes and 2 hours and at a pressure of between W 5 and W 6 mbar.
Toutefois, un tel traitement thermique de diffusion n'est pas nécessaire, car il a été observé que l'étape c) ultérieure d'aluminisation permettait déjà une bonne diffusion des espèces entre les couches déposées au cours des étapes a) et b). However, such diffusion heat treatment is not necessary, because it was observed that the subsequent aluminization step c) already allowed good diffusion of the species between the layers deposited during steps a) and b).
Le procédé n'est pas limité par l'organisation relative des étapes a) et b). The process is not limited by the relative organization of steps a) and b).
Dans un mode de réalisation, l'étape b) est réalisée après l'étape a). In one embodiment, step b) is carried out after step a).
Dans un mode de réalisation, l'étape b) est réalisée avant l'étape a). In one embodiment, step b) is carried out before step a).
La présence de la couche d'hafnium permet de renforcer les joints de grains dans le revêtement, ce qui permet de bloquer la diffusion des cations métalliques et également de ralentir la diffusion d'oxygène.
En outre, la présence d'hafnium dans le revêtement permet également de bloquer la diffusion du soufre, que celui-ci viennent du substrat ou du dépôt électrolytique de platine. The presence of the hafnium layer makes it possible to reinforce the grain boundaries in the coating, which blocks the diffusion of metal cations and also slows down the diffusion of oxygen. In addition, the presence of hafnium in the coating also makes it possible to block the diffusion of sulfur, whether it comes from the substrate or from the electrolytic platinum deposit.
La présence de la couche de platine permet d'apporter le platine nécessaire à la formation du revêtement souhaité. The presence of the platinum layer makes it possible to provide the platinum necessary for the formation of the desired coating.
Egalement, les épaisseurs des couches de platine et d'hafnium permettent d'assurer que la teneur en ces éléments dans la pièce finale est conforme à ce qui est souhaité. Also, the thicknesses of the platinum and hafnium layers ensure that the content of these elements in the final part conforms to what is desired.
L'étape c) d'aluminisation est une étape connue en tant que telle. Appliquée au procédé de l'invention, elle permet d'une part un enrichissement du revêtement en aluminium, et également la diffusion des espèces présentes dans les couches d'hafnium et de platine ou encore des espèces présentes dans le substrat pour former, à la surface du substrat une unique couche de revêtement, par exemple une couche d'accroche. Aluminization step c) is a step known as such. Applied to the process of the invention, it allows on the one hand an enrichment of the aluminum coating, and also the diffusion of the species present in the hafnium and platinum layers or even of the species present in the substrate to form, at the surface of the substrate a single coating layer, for example an adhesion layer.
On forme, grâce à l'étape d'aluminisation, une couche en surface du revêtement qui comprend une teneur importante en aluminium, en platine et en nickel qui comprend en outre de l'hafnium, du fait de la diffusion de ces espèces depuis le substrat ou les couches déposées aux étapes a) et b). Thanks to the aluminization step, a surface layer of the coating is formed which includes a significant content of aluminum, platinum and nickel which also includes hafnium, due to the diffusion of these species from the substrate or the layers deposited in steps a) and b).
En effet, après l'aluminisation, les couches de platine et d'hafnium formées au cours des étapes a) et b) ne sont plus discrètes car la diffusion occasionnée par l'aluminisation a permis le mélange des éléments de ces deux couches dans la couche formée. Indeed, after aluminization, the layers of platinum and hafnium formed during steps a) and b) are no longer discrete because the diffusion caused by the aluminization has allowed the elements of these two layers to mix in the layer formed.
Dans un mode de réalisation, l'aluminisation peut être réalisée à une température comprise entre 980°C et 1150°C, de préférence entre 1040°C et 1150°C pendant une durée comprise entre 2 et 8 heures, par exemple entre 2 et 3 heures. In one embodiment, the aluminization can be carried out at a temperature between 980°C and 1150°C, preferably between 1040°C and 1150°C for a period of between 2 and 8 hours, for example between 2 and 3 hours.
Après le traitement d'aluminisation de l'étape c), le revêtement n'est plus présent sous la forme de couches distinctes mais sous forme d'une unique couche comprenant toutes les espèces ayant diffusé pendant l'aluminisation.
Un tel revêtement comprend notamment une teneur élevée et homogène en hafnium, comparativement aux revêtements obtenus par des procédés de l'art antérieur. After the aluminization treatment of step c), the coating is no longer present in the form of distinct layers but in the form of a single layer comprising all the species having diffused during the aluminization. Such a coating notably comprises a high and homogeneous hafnium content, compared to the coatings obtained by prior art processes.
Dans un mode de réalisation, l'étape d'aluminisation est réalisée sans apport supplémentaire d'hafnium. In one embodiment, the aluminization step is carried out without additional addition of hafnium.
En effet, la présence de la couche d'hafnium déposée au cours de l'étape a) suffit pour garantir les effets bénéfiques de la présence d'hafnium sans qu'il soit nécessaire d'en apporter davantage. Indeed, the presence of the hafnium layer deposited during step a) is sufficient to guarantee the beneficial effects of the presence of hafnium without it being necessary to add more.
L'étape d'aluminisation sans apport supplémentaire d'hafnium est bien plus aisée et ne nécessite pas d'adaptation des procédés d'aluminisation existants comparativement à une étape d'aluminisation au cours de laquelle on souhaiterait en plus apporter de l'hafnium. The aluminization step without additional addition of hafnium is much easier and does not require adaptation of existing aluminization processes compared to an aluminization stage during which we would also like to provide hafnium.
L'hafnium ayant une grande affinité pour le soufre, ce dernier reste bloqué en présence d'hafnium et ne migre donc plus vers la couche formée par l'aluminisation.Hafnium having a great affinity for sulfur, the latter remains blocked in the presence of hafnium and therefore no longer migrates towards the layer formed by aluminization.
Il s'ensuit une meilleure adhérence de la couche de barrière thermique à la couche d'accroche, le soufre étant connu pour causer le décollement de la couche d'accroche, et donc nuire à la tenue de la barrière thermique. This results in better adhesion of the thermal barrier layer to the adhesion layer, sulfur being known to cause the adhesion layer to detach, and therefore harm the performance of the thermal barrier.
En outre, l'apport d'hafnium sous la forme d'une couche mince plutôt qu'un dépôt réalisé conjointement à la formation de la couche d'accroche permet d'assurer une excellente homogénéité de la répartition de l'hafnium dans la couche d'accroche.In addition, the provision of hafnium in the form of a thin layer rather than a deposit carried out jointly with the formation of the adhesion layer ensures excellent homogeneity of the distribution of hafnium in the layer. hook.
Selon un autre de ses aspects, l'invention concerne également un procédé de fabrication d'une pièce métallique revêtue d'une barrière thermique comprenant au moins les étapes suivantes : According to another of its aspects, the invention also relates to a method of manufacturing a metal part coated with a thermal barrier comprising at least the following steps:
- la formation d'un revêtement sur une surface d'un substrat métallique par un procédé tel qu'il vient d'être décrit ; - the formation of a coating on a surface of a metal substrate by a process as just described;
- le dépôt d'une barrière thermique sur ledit revêtement. - the deposition of a thermal barrier on said coating.
L'invention n'est pas limitée par la nature de la barrière thermique, ou la méthode de dépôt de celle-ci sur le revêtement.
Ainsi qu'il vient d'être décrit, ce mode de réalisation permet de disposer de couches d'accroche garantissant une meilleure adhérence, et une meilleure tenue à l'oxydation des barrières thermiques que les couches d'accroche de l'art antérieur.The invention is not limited by the nature of the thermal barrier, or the method of depositing it on the coating. As has just been described, this embodiment makes it possible to have bonding layers guaranteeing better adhesion and better resistance to oxidation of thermal barriers than the bonding layers of the prior art.
Ainsi, les pièces selon l'invention ont une meilleure résistance dans le temps que celles de l'art antérieur, dont les sous-couches seraient différentes. Thus, the parts according to the invention have better resistance over time than those of the prior art, whose underlayers would be different.
Dans un mode de réalisation, la barrière thermique peut comprendre de la zircone stabilisée à l'oxyde d'yttrium (souvent dite YSZ pour l'acronyme en langue anglaise « Yttria-stabilized zirconia ») ou de zirconate de gadolinium, de formule Gd2Zr2O7 (souvent dit GdZ). In one embodiment, the thermal barrier may comprise zirconia stabilized with yttrium oxide (often called YSZ for the acronym in English “Yttria-stabilized zirconia”) or gadolinium zirconate, of formula Gd2Zr 2 O 7 (often called GdZ).
Dans un mode de réalisation, la barrière thermique peut être déposée par suspension de plasma (ou SPS pour l'acronyme en langue anglaise « Suspension Plasma Spraying »), ou par des procédés de dépôt physique en phase vapeur à faisceau d'électrons (ou EBPVD, pour l'acronyme en langue anglaise « Electron Beam Physical Vapour Deposition »). Par exemple, la barrière thermique peut comprendre une unique couche de zircone stabilisée à l'oxyde d'yttrium ou une couche de zircone stabilisée à l'oxyde d'yttrium et une couche de zirconate de gadolinium. In one embodiment, the thermal barrier can be deposited by plasma suspension (or SPS for the acronym in English "Suspension Plasma Spraying"), or by electron beam physical vapor deposition processes (or EBPVD, for the acronym in English “Electron Beam Physical Vapor Deposition”). For example, the thermal barrier may comprise a single layer of zirconia stabilized with yttrium oxide or a layer of zirconia stabilized with yttrium oxide and a layer of gadolinium zirconate.
Selon un autre de ses aspects, l'invention concerne une pièce métallique revêtue comprenant: According to another of its aspects, the invention relates to a coated metal part comprising:
- un substrat métallique ; - a metal substrate;
- une couche d'hafnium dont l'épaisseur est comprise entre 0,2 pm et 10 pm, et disposée sur une face du substrat ; et - a layer of hafnium whose thickness is between 0.2 pm and 10 pm, and placed on one side of the substrate; And
- une couche de platine dont l'épaisseur est comprise entre 2,0 pm et 10 pm, et disposée sur la couche d'hafnium, du côté de la couche d'hafnium opposé au substrat. - a platinum layer whose thickness is between 2.0 pm and 10 pm, and placed on the hafnium layer, on the side of the hafnium layer opposite the substrate.
Selon un autre de ses aspects, l'invention concerne une pièce métallique revêtue comprenant : According to another of its aspects, the invention relates to a coated metal part comprising:
- un substrat métallique ; - a metal substrate;
- une couche de platine dont l'épaisseur est comprise entre 2,0 pm et 10 pm, et disposée sur une face du substrat ; et
- une couche d'hafnium dont l'épaisseur est comprise entre 0,2 pm et 10 pm et disposée sur la couche de platine, du côté de la couche de platine opposé au substrat. - a layer of platinum whose thickness is between 2.0 pm and 10 pm, and placed on one face of the substrate; And - a hafnium layer whose thickness is between 0.2 pm and 10 pm and placed on the platinum layer, on the side of the platinum layer opposite the substrate.
Ces deux empilements permettent après une étape c) d'aluminisation, telle que décrite plus haut, d'obtenir un revêtement comprenant une teneur en hafnium élevée et homogène. These two stacks make it possible, after an aluminization step c), as described above, to obtain a coating comprising a high and homogeneous hafnium content.
Par exemple, le substrat métallique peut être choisi parmi les superalliages de nickels connus sous les dénominations AMI, N5, AM21, MCNG ou CMSX10. For example, the metal substrate can be chosen from nickel superalloys known under the names AMI, N5, AM21, MCNG or CMSX10.
Dans un mode de réalisation, la couche de platine comprend du platine à plus de 90 % massique, voire de plus de 99% massique. Par exemple, la couche de platine ne comprend pas d'autre élément que du platine et des impuretés inévitables. In one embodiment, the platinum layer comprises platinum at more than 90% by mass, or even more than 99% by mass. For example, the platinum layer does not include any element other than platinum and inevitable impurities.
Dans un mode de réalisation, la couche d'hafnium comprend de l'hafnium à plus de 90 % massique, voire de plus de 99% massique. Par exemple, la couche d'hafnium ne comprend pas d'autre élément que de l'hafnium et des impuretés inévitables.In one embodiment, the hafnium layer comprises hafnium at more than 90% by weight, or even more than 99% by weight. For example, the hafnium layer does not include any element other than hafnium and inevitable impurities.
L'invention n'est pas limitée par la disposition relative de la couche d'hafnium et de la couche de platine. The invention is not limited by the relative arrangement of the hafnium layer and the platinum layer.
Dans un mode de réalisation, la couche d'hafnium est située comprise entre le substrat métallique et la couche de platine et de préférence directement au contact de celles-ci. In one embodiment, the hafnium layer is located between the metal substrate and the platinum layer and preferably directly in contact with them.
Un tel mode de réalisation permet de renforcer les joints de grains de la sous- couche, bloquant ainsi la diffusion des cations métalliques et ralentissant la diffusion d'oxygène dans cette dernière et donc la cinétique d'oxydation de la sous couche et neutraliser le soufre en prévenance du substrat. Such an embodiment makes it possible to reinforce the grain boundaries of the sub-layer, thus blocking the diffusion of metal cations and slowing down the diffusion of oxygen in the latter and therefore the kinetics of oxidation of the sub-layer and neutralizing the sulfur. in consideration of the substrate.
Dans un mode de réalisation, la couche d'hafnium est située sur la couche de platine et de préférence directement au contact de celle-ci. In one embodiment, the hafnium layer is located on the platinum layer and preferably directly in contact with it.
Un tel mode de réalisation permet de renforcer les joints de grains de la sous couche, bloquant ainsi la diffusion des cations métalliques et ralentissant la diffusion d'oxygène dans cette dernière et donc la cinétique d'oxydation de la sous couche.
En outre, cela permet, comme de neutraliser le soufre en provenance du substrat et aussi de dépôt de platine, ce qui assure une encore meilleure durée de vie à la barrière thermique. Le soufre est en effet connu pour causer le décollement de la couche d'accroche. Such an embodiment makes it possible to reinforce the grain boundaries of the underlayer, thus blocking the diffusion of metal cations and slowing down the diffusion of oxygen in the latter and therefore the kinetics of oxidation of the underlayer. In addition, this makes it possible to neutralize sulfur coming from the substrate and also platinum deposits, which ensures an even better lifespan for the thermal barrier. Sulfur is in fact known to cause the bonding layer to peel off.
Dans un mode de réalisation, le substrat métallique est une aube de turbomachine ou un distributeur de turbomachine. In one embodiment, the metal substrate is a turbomachine blade or a turbomachine distributor.
Brève description des dessins Brief description of the drawings
[Fig. 1] La figure 1 représente schématiquement un procédé selon un mode de réalisation de l'invention. [Fig. 1] Figure 1 schematically represents a method according to one embodiment of the invention.
[Fig. 2] La figure 2 représente schématiquement un procédé selon un autre mode de réalisation de l'invention. [Fig. 2] Figure 2 schematically represents a method according to another embodiment of the invention.
[Fig. 3] La figure 3 représente schématiquement une pièce selon un mode de réalisation de l'invention. [Fig. 3] Figure 3 schematically represents a part according to one embodiment of the invention.
[Fig. 4] La figure 4 représente schématiquement une pièce selon autre mode de réalisation de l'invention. [Fig. 4] Figure 4 schematically represents a part according to another embodiment of the invention.
[Fig. 5] La figure 5 représente schématiquement une pièce selon un autre mode de réalisation de l'invention. [Fig. 5] Figure 5 schematically represents a part according to another embodiment of the invention.
[Fig. 6] La figure 6 représente des résultats d'essais comparant deux pièces selon l'invention à deux pièces de l'art antérieur. [Fig. 6] Figure 6 represents test results comparing two parts according to the invention to two parts of the prior art.
[Fig. 7] La figure 7 est une micrographie obtenue par microscopie électronique à balayage, identifiant des points de mesure de la composition atomique d'une couche d'accroche obtenue par un procédé de l'invention. [Fig. 7] Figure 7 is a micrograph obtained by scanning electron microscopy, identifying points for measuring the atomic composition of an adhesion layer obtained by a method of the invention.
Description des modes de réalisation Description of embodiments
L'invention est à présent décrite au moyen de figures, présentes à but descriptif pour illustrer certains modes de réalisation de l'invention et qui ne doivent pas être interprétées comme limitant cette dernière. En particulier et sauf mention contraire, les figures sont représentées sans échelles, et les rapports entre les distances n'ont pas vocation à être réalistes.
Comme décrit, l'invention concerne un procédé 2000, comprenant les étapes suivantes : a) le dépôt d'une couche d'hafnium dont l'épaisseur est comprise entre 0,2 pm et 10 pm ; b) le dépôt d'une couche de platine dont l'épaisseur est comprise entre 2,0 pm et 10 pm; c) une aluminisation de la pièce obtenue après les étapes a) et b). The invention is now described by means of figures, presented for descriptive purposes to illustrate certain embodiments of the invention and which should not be interpreted as limiting the latter. In particular and unless otherwise stated, the figures are represented without scales, and the relationships between the distances are not intended to be realistic. As described, the invention relates to a method 2000, comprising the following steps: a) depositing a layer of hafnium whose thickness is between 0.2 pm and 10 pm; b) depositing a layer of platinum whose thickness is between 2.0 pm and 10 pm; c) aluminization of the part obtained after steps a) and b).
Selon un premier mode de réalisation de l'invention, décrit en figure 1, l'étape a) est réalisée avant l'étape b). According to a first embodiment of the invention, described in Figure 1, step a) is carried out before step b).
Selon un autre mode de réalisation de l'invention, décrit en figure 2, l'étape b) est réalisée avant l'étape a). According to another embodiment of the invention, described in Figure 2, step b) is carried out before step a).
En effet, il n'est pas nécessaire, pour l'obtention de l'effet technique de l'invention, que le dépôt de la couche de platine soit réalisé spécifiquement avant ou après le dépôt de la couche d'hafnium, pourvu que ces deux couches soient déposées avant l'étape d'aluminisation. Indeed, it is not necessary, to obtain the technical effect of the invention, for the deposition of the platinum layer to be carried out specifically before or after the deposition of the hafnium layer, provided that these two layers are deposited before the aluminization step.
Dans un mode de réalisation, l'étape d'aluminisation peut être réalisée de manière connue en soi. In one embodiment, the aluminization step can be carried out in a manner known per se.
De manière générale, les procédés d'aluminisation sont réalisés par mise en présence du superalliage avec des précurseurs d'aluminium gazeux, par exemple FAICh, dans des conditions de pression et de température qui permettent la formation d'aluminium gazeux. L'aluminium ainsi formé réagit avec le nickel du substrat qui diffuse vers la surface du substrat, avec l'aide de la température pour former une couche comprenant du nickel et de l'aluminium à la surface du substrat, par exemple Ni2AI3. Generally speaking, aluminization processes are carried out by bringing the superalloy into contact with gaseous aluminum precursors, for example FAICh, under pressure and temperature conditions which allow the formation of gaseous aluminum. The aluminum thus formed reacts with the nickel of the substrate which diffuses towards the surface of the substrate, with the help of the temperature to form a layer comprising nickel and aluminum on the surface of the substrate, for example Ni 2 AI 3 .
En outre, dans le procédé de l'invention, l'aluminisation étant réalisée après le dépôt des couches de platine et d'hafnium, la couche formée par aluminisation comprend donc également ces éléments. Furthermore, in the process of the invention, the aluminization being carried out after the deposition of the platinum and hafnium layers, the layer formed by aluminization therefore also comprises these elements.
Bien entendu, d'autres éléments présents dans le substrat peuvent migrer par diffusion dans la couche formée par aluminisation.
Par exemple, le revêtement comprend les éléments du substrat, ainsi qu'une majorité de nickel, platine et aluminium ainsi que de l'hafnium. Une telle couche est souvent dite NiPtAI, et est ici dopée à l'hafnium. Of course, other elements present in the substrate can migrate by diffusion into the layer formed by aluminization. For example, the coating includes the elements of the substrate, as well as a majority of nickel, platinum and aluminum as well as hafnium. Such a layer is often called NiPtAI, and is here doped with hafnium.
Dans un mode de réalisation, le revêtement ne comprend pas d'autres éléments présents en une teneur de plus de 5 % massique que le nickel, l'aluminium et le platine. In one embodiment, the coating does not include other elements present in a content of more than 5% by mass than nickel, aluminum and platinum.
Dans un mode de réalisation, le revêtement comprend en outre jusqu'à 5 % massique de chrome et/ou de cobalt. In one embodiment, the coating further comprises up to 5% by weight of chromium and/or cobalt.
Dans un mode de réalisation, le revêtement comprend entre 0,5 et 3% massique d'hafnium. In one embodiment, the coating comprises between 0.5 and 3% by weight of hafnium.
Par exemple, un traitement d'aluminisation peut être réalisé à une température comprise entre 1040°C et 1080°C, pendant une durée comprise entre 200 et 500 minutes, et avec un débit de précurseur d'aluminium, par exemple de FAICh compris entre 0,23 et 1,0 L.min 1. For example, an aluminization treatment can be carried out at a temperature of between 1040°C and 1080°C, for a duration of between 200 and 500 minutes, and with a flow rate of aluminum precursor, for example of FAICh, of between 0.23 and 1.0 L.min 1 .
A la différence des procédés de l'art antérieur, la présence de la couche d'hafnium permettant la réalisation de la couche d'accroche par diffusion assure d'une part la présence, et d'autre part une répartition homogène de l'hafnium dans la couche d'accroche, sans nécessiter de modifier la composition du substrat sous-jacent. Cela permet d'assurer à la barrière thermique qui sera déposée sur la couche d'accroche des propriétés d'adhérence améliorées, ce qui améliorera la durée de vie de la pièce, ainsi que cela sera décrit dans l'exemple, en lien avec la figure 6. Unlike the processes of the prior art, the presence of the hafnium layer allowing the production of the adhesion layer by diffusion ensures on the one hand the presence, and on the other hand a homogeneous distribution of the hafnium in the adhesion layer, without requiring modification of the composition of the underlying substrate. This ensures that the thermal barrier which will be deposited on the adhesion layer has improved adhesion properties, which will improve the lifespan of the part, as will be described in the example, in connection with the figure 6.
La figure 3 décrit une pièce 1000 obtenue à l'issue de l'étape c) d'aluminisation d'un procédé 2000 réalisé conformément au mode de réalisation de la figure 1. Figure 3 describes a part 1000 obtained at the end of step c) of aluminization of a process 2000 carried out in accordance with the embodiment of Figure 1.
Une telle pièce 1000 comprend : Such a part 1000 includes:
- un substrat métallique 10 ; - a metal substrate 10;
- une couche d'hafnium 20 d'épaisseur ei comprise entre 0,2 pm et 10 pm ; - a layer of hafnium 20 with a thickness of between 0.2 pm and 10 pm;
- une couche de platine 30 d'épaisseur e2 comprise entre 2,0 pm et 10 pm. Comme indiqué, les deux couches 20, 30 sont destinées à former la couche d'accroche 50 par aluminisation.
Dans un mode de réalisation et comme représenté, la couche d'hafnium 20 peut être directement au contact du substrat 10. - a layer of platinum 30 with a thickness e 2 of between 2.0 pm and 10 pm. As indicated, the two layers 20, 30 are intended to form the adhesion layer 50 by aluminization. In one embodiment and as shown, the hafnium layer 20 can be directly in contact with the substrate 10.
Dans un mode de réalisation et comme représenté, la couche de platine 30 peut être directement au contact de la couche d'hafnium 20, du côté opposée au substrat 10. La figure 4 décrit une pièce 1000 obtenue à l'issue de l'étape c) d'un procédé 2000 réalisé conformément au mode de réalisation de la figure 2. In one embodiment and as shown, the platinum layer 30 can be directly in contact with the hafnium layer 20, on the side opposite the substrate 10. Figure 4 describes a part 1000 obtained at the end of the step c) a process 2000 carried out in accordance with the embodiment of Figure 2.
En effet, l'inversion des étapes a) et b) a pour effet d'obtenir à la surface du substrat métallique 10 la couche de platine 30 et la couche d'hafnium 20 à la surface de la couche de platine 30. Indeed, the inversion of steps a) and b) has the effect of obtaining on the surface of the metal substrate 10 the platinum layer 30 and the hafnium layer 20 on the surface of the platinum layer 30.
Dans un mode de réalisation et comme représenté, la couche de platine 30 peut être directement au contact du substrat 10. In one embodiment and as shown, the platinum layer 30 can be directly in contact with the substrate 10.
Dans un mode de réalisation et comme représenté, la couche d'hafnium 20 peut être directement au contact de la couche de platine 30, du côté opposée au substrat 10. La figure 5 décrit une pièce 1000 obtenue après aluminisation d'une pièce telle que décrite sur la figure 3 ou 4 de manière indifférente. In one embodiment and as shown, the hafnium layer 20 can be directly in contact with the platinum layer 30, on the side opposite the substrate 10. Figure 5 describes a part 1000 obtained after aluminization of a part such as described in Figure 3 or 4 indifferently.
La pièce 1000 ne comprend plus deux couches 20, 30 distinctes mais une unique couche 50, laquelle comprend en outre de l'aluminium apporté par aluminisation.The part 1000 no longer comprises two distinct layers 20, 30 but a single layer 50, which further comprises aluminum provided by aluminization.
La figure 6 illustre des résultats comparatifs de tenue à l'oxydation pour deux pièces selon l'invention 101, 102 et deux pièces hors invention 201, 202. Figure 6 illustrates comparative results of oxidation resistance for two parts according to the invention 101, 102 and two parts outside the invention 201, 202.
Les quatre pièces sont semblables et comprennent un substrat métallique, une couche d'accroche et une barrière thermique disposée sur la couche d'accroche. Toutefois, les couches d'accroche des pièces hors invention 201, 202 ont été obtenues selon un procédé de l'art antérieur, et ne comprennent pas d'hafnium, tandis que les pièces selon l'invention comprennent de l'hafnium et ont été obtenues selon un procédé de l'invention. The four parts are similar and include a metal substrate, an adhesion layer and a thermal barrier placed on the adhesion layer. However, the bonding layers of the parts outside the invention 201, 202 were obtained according to a process of the prior art, and do not include hafnium, while the parts according to the invention include hafnium and have been obtained according to a process of the invention.
La figure 6 représente en abscisse 100 le nombre de cycles d'oxydation, et en ordonnées 200 le gain de masse en mg.cnT2 observé pour la pièce. Les expériences sont réalisées à 1150°C. Figure 6 represents on the abscissa 100 the number of oxidation cycles, and on the ordinate 200 the mass gain in mg.cnT 2 observed for the part. The experiments are carried out at 1150°C.
Il peut être lu sur la figure 6 que la perte de masse (sur la figure 6, le gain en masse 200 est en effet négatif) est plus importante dès 2000 cycles pour les pièces de l'art antérieur que pour les pièces de l'invention.
La figure 7 vise à caractériser l'homogénéité de la répartition d'hafnium dans une couche d'accroche 50 de l'invention. It can be read in Figure 6 that the mass loss (in Figure 6, the mass gain 200 is in fact negative) is greater from 2000 cycles for the parts of the prior art than for the parts of the invention. Figure 7 aims to characterize the homogeneity of the distribution of hafnium in a primer layer 50 of the invention.
Pour cela, neuf prélèvements ont été réalisés, espacés selon trois colonnes dans la largeur de l'échantillon (1, 2 et 3 sur la figure 7) et selon trois couches 50a, 50b et 50c dans l'épaisseur les points de prélèvement étant repérés par des carrés. For this, nine samples were taken, spaced in three columns across the width of the sample (1, 2 and 3 in Figure 7) and in three layers 50a, 50b and 50c in the thickness, the sampling points being identified by squares.
La composition massique en 6 éléments pour six des points identifiés est rapportée dans le tableau 1. The mass composition in 6 elements for six of the identified points is reported in Table 1.
Le tableau 1 illustre bien que le procédé de l'invention permet d'obtenir des variations faibles de la teneur en hafnium dans la couche d'accroche 50, la teneur en hafnium restant partout comprise entre 1,2 % et 1,6 % massique.
Table 1 clearly illustrates that the process of the invention makes it possible to obtain low variations in the hafnium content in the adhesion layer 50, the hafnium content remaining everywhere between 1.2% and 1.6% by weight. .
Claims
[Revendication 1] Procédé de formation d'un revêtement (50) sur une surface d'un substrat métallique (10), le procédé (2000) comprenant au moins les étapes suivantes : a) le dépôt d'une couche d'hafnium (20) dont l'épaisseur (ej est comprise entre 0,2 pm et 10 pm, dans lequel la couche d'hafnium comprend de l'hafnium à plus de[Claim 1] Method for forming a coating (50) on a surface of a metal substrate (10), the method (2000) comprising at least the following steps: a) depositing a layer of hafnium ( 20) whose thickness (ej is between 0.2 pm and 10 pm, in which the hafnium layer comprises hafnium at more than
90 % massique, réalisé par un procédé de dépôt chimique en phase vapeur un procédé de dépôt physique en phase vapeur ou par dépôt électrolytique ; b) le dépôt d'une couche de platine (30) dont l'épaisseur (e2) est comprise entre 2,0 pm et 10 pm, dans lequel la couche de platine comprend du platine à plus de 90 % massique, réalisé par un procédé de dépôt chimique en phase vapeur un procédé de dépôt physique en phase vapeur ; c) une aluminisation de la pièce obtenue après les étapes a) et b. 90% by mass, produced by a chemical vapor deposition process, a physical vapor deposition process or by electrolytic deposition; b) the deposition of a platinum layer (30) whose thickness (e 2 ) is between 2.0 pm and 10 pm, in which the platinum layer comprises platinum at more than 90% by weight, carried out by a chemical vapor deposition process a physical vapor deposition process; c) aluminization of the part obtained after steps a) and b.
[Revendication 2] Procédé selon la revendication 1, dans lequel l'étape b) est réalisée après l'étape a). [Claim 2] Method according to claim 1, wherein step b) is carried out after step a).
[Revendication 3] Procédé selon la revendication 1, dans lequel l'étape b) est réalisée avant l'étape a). [Claim 3] Method according to claim 1, wherein step b) is carried out before step a).
[Revendication 4] Procédé selon l’une quelconque des revendications 1 à 3, dans lequel l'étape b) est suivie d'un traitement thermique de diffusion. [Claim 4] Method according to any one of claims 1 to 3, in which step b) is followed by a diffusion heat treatment.
[Revendication 5] Procédé de fabrication d'une pièce métallique revêtue d'une barrière thermique comprenant au moins les étapes suivantes : [Claim 5] Process for manufacturing a metal part coated with a thermal barrier comprising at least the following steps:
- la formation d'un revêtement (50) sur une surface d'un substrat métallique (10) par un procédé de l'une quelconque des revendications 1 à 4 ; et - the formation of a coating (50) on a surface of a metal substrate (10) by a method of any one of claims 1 to 4; And
- le dépôt d'une barrière thermique sur ledit revêtement. - the deposition of a thermal barrier on said coating.
[Revendication 6] Pièce métallique revêtue (1000) comprenant : [Claim 6] Coated metal part (1000) comprising:
- un substrat métallique (10) ; - a metal substrate (10);
- une couche d'hafnium (20) dont l'épaisseur (ej est comprise entre 0,2 pm et 10 pm, et disposée sur une face du substrat ; et - a hafnium layer (20) whose thickness (ej is between 0.2 pm and 10 pm, and placed on one face of the substrate; and
- une couche de platine (30) dont l'épaisseur (e2) est comprise entre 2,0 pm et 10 pm et disposée sur la couche d'hafnium, du côté de la couche d'hafnium opposé au substrat.
- a platinum layer (30) whose thickness (e 2 ) is between 2.0 pm and 10 pm and placed on the hafnium layer, on the side of the hafnium layer opposite the substrate.
[Revendication 7] Pièce métallique revêtue (1000) comprenant : [Claim 7] Coated metal part (1000) comprising:
- un substrat métallique (10) ; - a metal substrate (10);
- une couche de platine (30) dont l'épaisseur (ez) est comprise entre 2,0 pm et 10 pm et disposée sur une face du substrat ; et - une couche d'hafnium (20) dont l'épaisseur (ej est comprise entre 0,2 pm et 10 pm et disposée sur la couche de platine, du côté de la couche de platine opposé au substrat. - a platinum layer (30) whose thickness (ez) is between 2.0 pm and 10 pm and placed on one face of the substrate; and - a hafnium layer (20) whose thickness (ej is between 0.2 pm and 10 pm and placed on the platinum layer, on the side of the platinum layer opposite the substrate.
[Revendication 8] Pièce métallique revêtue selon la revendication 6 ou 7, dans laquelle le substrat métallique est choisi parmi les superalliages de nickels connus sous les dénominations AMI, N5, AM21, MCNG ou CMSX10. [Claim 8] Coated metal part according to claim 6 or 7, in which the metal substrate is chosen from nickel superalloys known under the names AMI, N5, AM21, MCNG or CMSX10.
[Revendication 9] Pièce métallique revêtue selon l’une quelconque des revendications 6 à 8, dans laquelle le substrat métallique est une aube de turbomachine ou un distributeur de turbomachine.
[Claim 9] Coated metal part according to any one of claims 6 to 8, in which the metal substrate is a turbomachine blade or a turbomachine distributor.
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FR2211157A FR3141473A1 (en) | 2022-10-26 | 2022-10-26 | Coating comprising hafnium |
FRFR2211157 | 2022-10-26 |
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WO2024089343A1 true WO2024089343A1 (en) | 2024-05-02 |
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PCT/FR2023/051626 WO2024089343A1 (en) | 2022-10-26 | 2023-10-18 | Coating comprising hafnium |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1010774A1 (en) * | 1998-12-15 | 2000-06-21 | General Electric Company | Article with hafnium-silicon-modified platinum-aluminium bond or environmental coating |
EP1209247A1 (en) * | 2000-09-20 | 2002-05-29 | General Electric Company | CVD aluminiding process for producing a modified platinum aluminide bond coat for improved high temperature performance |
US6436473B2 (en) * | 1998-12-30 | 2002-08-20 | General Electric Company | Graded reactive element containing aluminide coatings for improved high temperature performance and method for producing |
US20100297471A1 (en) * | 2009-05-20 | 2010-11-25 | Howmet Corporation | Pt-Al-Hf/Zr coating and method |
-
2022
- 2022-10-26 FR FR2211157A patent/FR3141473A1/en active Pending
-
2023
- 2023-10-18 WO PCT/FR2023/051626 patent/WO2024089343A1/en unknown
Patent Citations (4)
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EP1010774A1 (en) * | 1998-12-15 | 2000-06-21 | General Electric Company | Article with hafnium-silicon-modified platinum-aluminium bond or environmental coating |
US6436473B2 (en) * | 1998-12-30 | 2002-08-20 | General Electric Company | Graded reactive element containing aluminide coatings for improved high temperature performance and method for producing |
EP1209247A1 (en) * | 2000-09-20 | 2002-05-29 | General Electric Company | CVD aluminiding process for producing a modified platinum aluminide bond coat for improved high temperature performance |
US20100297471A1 (en) * | 2009-05-20 | 2010-11-25 | Howmet Corporation | Pt-Al-Hf/Zr coating and method |
Non-Patent Citations (1)
Title |
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MORGIEL JERZY: "SEM/TEM Investigation of Aluminide Coating Co-Doped with Pt and Hf Deposited on Inconel 625", MATERIALS, vol. 11, 27 May 2018 (2018-05-27), pages 1 - 13, XP093034589, Retrieved from the Internet <URL:https://www.mdpi.com/1996-1944/11/6/898> [retrieved on 20230324], DOI: 10.3390/ma11060898 * |
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