WO2023086238A1

WO2023086238A1 - Coated articles and methods of making

Info

Publication number: WO2023086238A1
Application number: PCT/US2022/048546
Authority: WO
Inventors: Haixing CHEN; Xu Ouyang; Yawei Sun
Original assignee: Corning Incorporated
Priority date: 2021-11-15
Filing date: 2022-11-01
Publication date: 2023-05-19
Also published as: TW202330863A; CN116119938A

Abstract

Coated articles comprise a coating disposed on a substrate. The coating comprises a surface having a contact angle with deionized water of 90° or more. A refractive index of the coating is less than a refractive index of the substrate. The coating comprises interpenetrating networks of hydrogenated amorphous carbon and amorphous silicon oxide. Methods of forming coated articles can comprise disposing a coating over a substrate using plasma-enhanced chemical vapor deposition or physical vapor deposition of a precursor. The precursor comprises hydrogen, carbon, and silicon and one or more of oxygen or nitrogen. The coating comprises a surface having a contact angle with deionized water of 90° or more. A refractive index of the coating is less than a refractive index of the substrate. The coating comprises interpenetrating networks of hydrogenated amorphous carbon and at least one of amorphous silicon oxide or amorphous silicon nitride.

Description

COATED ARTICLES AND METHODS OF MAKING

PRIORITY

[0001] This application claims the benefit of priority of China Patent Application Serial No. 2021 11345695.3, filed on November 15, 2021, the content of which is relied upon and incorporated herein by reference in its entirety.

FIELD

[0002] The present disclosure relates generally to coated articles and method s of making and, more particularly, to coated articles comprising a contact angle with deionized water of 90° or more and methods of making the same.

BACKGROUND

[0003] Glass-based substrates are commonly used, for example, in display devices, for example, liquid crystal displays (LCDs), electrophoretic displays (EPD), organic light-emitting diode displays (OLEDs), plasma display panels (PDPs), or the like.

[0004] It is known to provide a fluorinated easy-to-clean coating on glassbased substrates. However, such coatings can exhibit poor durability with decreased contact angle and/or increased coefficient of friction after repeated use, which can remove the functionality of such coatings. Consequently, there is a need to develop coatings that can be used in a coated article that are durable and can provide functionality, for example, as an easy-to-clean functionality.

SUMMARY

[0005] There are set forth herein coated articles comprising a contact angle with deionized water of 90° or more. The coated article can comprise a substrate comprising a glass-based material and/or a ceramic-based material, which can provide good dimensional stability, good impact resistance, and/or good puncture resistance. The substrate comprising a glass-based material and/or a ceramic-based material can comprise one or more compressive stress regions, which can further provide increased impact resistance and/or increased puncture resistance.

[0006] The coating of the coated articles described herein can be porous and hydrophobic to reduce the transfer of material (e.g., fingerprint oils, water) onto a surface of the coating. Providing a porous coating can decrease a refractive index of the coating and beneficially decrease an accessible surface area for material to transfer onto. Providing a porous coating can increase the water contact angle, making the surface more hydrophobic. The coating can comprise a skew Rsk greater than 0 and a kurtosis Rku less than 3, which reduces a surface area for material to transfer onto. For example, the coating can function as an easy-to-clean coating and/or an antifingerprint coating. Further, the coating can be durable, for example, maintaining its properties after being repeated abraded. Providing the coating can increase transmittance and/or decrease reflectance of the coated article compared to a substrate without the coating. Providing a coating with a low refractive index can enable the coating to be disposed on top of or be included as an outermost layer in an anti- reflective stack.

[0007] Methods of the disclosure can be used to create coated articles using plasma-enhanced chemical vapor deposition (PECVD) and/or physical vapor deposition (PVD), which can produce the coating in a single-step process. Methods can enable the formation of interpenetrating networks of hydrogenated amorphous carbon with amorphous silicon oxide and/or amorphous silicon nitride, which can provide the above-mentioned benefits.

[0008] Some example aspects of the disclosure are described below with the understanding that any of the features of the various aspects may be used alone or in combination with one another.

[0009] Aspect 1. A coated article comprises a substrate comprising a first major surface. The coated article comprises a coating disposed on the substrate. The coating comprises a surface having a contact angle with deionized water of 90° or more. A refractive index of the coating is less than a refractive index of the substrate . The coating comprising interpenetrating networks of hydrogenated amorphous carbon and amorphous silicon oxide.

[0010] Aspect 2. The coated article of aspect 1, wherein the refractive index of the coating is in a range from about 1.3 to about 1.4.

[0011] Aspect 3. The coated article of any one of aspects 1-2, wherein the refractive index of the coating is less than 1.37.

[0012] Aspect 4. The coated article of any one of aspects 1-3, wherein a thickness of the coating is in a range from about 0.1 nanometers to about 200 nanometers.

[0013] Aspect s. The coated article of aspect 4, wherein the thickness of the coating is in a range from about 1 nanometer to about 50 nanometers. [0014] Aspect 6. The coated article of any one of aspects 1-5, wherein the contact angle is in a range from about 100° to about 140°.

[0015] Aspect 7. The coated article of any one of aspects 1-6, wherein the surface of the coating comprises a surface roughness Ra in a range from about 10 nanometers to about 20 nanometers.

[0016] Aspect 8. The coated article of any one of aspects 1-7, wherein the surface of the coating comprises a surface roughness Rz in a range from about 100 nanometers to about 300 nanometers.

[0017] Aspect 9. The coated article of any one of aspects 1-8, wherein the surface of the coating comprises a skewRsk in a range from 0 to about 0.3.

[0018] Aspect 10. The coated article of any one of aspects 1-9, wherein the surface coating comprises a kurtosis Rku less than 3.

[0019] Aspect 11. The coated article of any one of aspects 1-10, wherein the coated article comprises a transmittance of 91% or more at 500 nm.

[0020] Aspect 12. The coated article of aspect 1, wherein the transmittance of the coated article at 500 nanometers is greater than a transmittance at 500 nanometers of the substrate without the coating.

[0021] Aspect 13. The coated article of any one of aspects 1- 12, wherein an average transmittance of the coated article is about 91% or more averaged over optical wavelengths from 400 nanometers to 700 nanometers.

[0022] Aspect 14. The coated article of aspect 13, wherein the average transmittance of the coated article is in a range from about 92% to about 95%.

[0023] Aspect 15. The coated article of any one of aspects 1- 14, wherein an average reflectance of the surface of the coating is about 2.0% or less averaged over optical wavelengths from 400 nanometers to 700 nanometers.

[0024] Aspect 16. The coated article of aspect 15, wherein the average reflectance of the surface of the coating is in a range from about 0.5% to about 1.5%.

[0025] Aspect 17. The coated article of any one of aspects 1-16, wherein the coating comprises an extinction coefficient at 500 nanometers of about 0.01 cm'¹ or less.

[0026] Aspect 18. The coated article of any one of aspects 1- 17, wherein an average extinction coefficient is in a range from about 0.001 cm'¹ to about 0.004 cm'¹ averaged over optical wavelengths from 400 nanometers to about 700 nanometers. [0027] Aspect 19. The coated article of any one of aspects 1-18, wherein a porosity of the coating is in a range from about 5% to about 50%.

[0028] Aspect20. The coated article of any oneof aspects 1-19, wherein the surface of the coating is an exterior surface of the coated article.

[0029] Aspect21. The coated article of any oneof aspects 1-20, wherein the coating contacts the first major surface of the substrate.

[0030] Aspect 22. The coated article of any one of aspects 1-20, further comprising a layer disposed between the coating and the substrate, the layer comprising one or more of silicon oxide, silicon nitride, titanium oxide, or niobium oxide.

[0031] Aspect23. The coated article of aspect 22, wherein the layer comprises a plurality of layers that functions as an anti-reflective stack.

[0032] Aspect 24. The coated article of aspect 23, wherein the refractive index of the coating is less than an outermost layer of the plurality of layers by about 0.05 or more.

[0033] Aspect 25. The coated article of aspect 23, wherein the refractive index of the coating is less than an outermost layer of the plurality of layers by about 0. 1 or more.

[0034] Aspect26. The coated article of any oneof aspects 1-25, wherein the contact angle of the coating is about 70° or more after the surface of the coating is abraded with cheesecloth for 10,000 cycles in accordance with ISO 9211-4:2012.

[0035] Aspect27. The coated article of any oneof aspects 1-26, wherein the coated article comprises a CIEb* value in a range from 0 to about -6.

[0036] Aspect28. The coated article of aspect 27, wherein the coated article comprises a CIE a* value in a range from 0 to about -6.

[0037] Aspect29. The coated article of any oneof aspects 1-28, wherein the coating is fluorine-free.

[0038] Aspect 30. The coated article of any oneof aspects 1-29, wherein the coating is nitrogen-free.

[0039] Aspect 31. The coated article of any oneof aspects 1-29, wherein the coating further comprises amorphous silicon nitride.

[0040] Aspect32. The coated article of any oneof aspects 1-31, wherein the coating comprises an atomic ratio of silicon to carbon from about 0.7 to about2. [0041] Aspect33. The coated article of any oneof aspects 1-32, wherein the coating comprises an atomic ratio of oxygen to carbon from about 2 to about 5.

[0042] Aspect 34. The coated article of any oneof aspects 1-33, wherein the coating comprises a kinetic coefficient of friction of about 0.3 or less.

[0043] Aspect35. The coated article of any oneof aspects 1-34, wherein the substrate comprises a glass-based material or a ceramic-based material.

[0044] Aspect 36. The coated article of aspect 35, wherein the substrate is a cover lens of a display, and the coating functions as an easy-to-clean coating.

[0045] Aspect 37. The coated article of aspect 35, wherein the display is a component of a vehicle interior system.

[0046] Aspect 38. A method of forming a coated article comprising disposing a coating over a substrate using plasma-enhanced chemical vapor deposition of a precursor. The precursor comprises hydrogen, carbon, and silicon. The precursor further comprising at least one of oxygen or nitrogen. A surface of the coating comprises a contact angle with deionized water of 90° or more. A refractive index of the coating is less than a refractive index of the substrate. The coating comprises interpenetrating networks of the coating comprising interpenetrating networks of hydrogenated amorphous carbon and at least one of amorphous silicon oxide or amorphous silicon nitride.

[0047] Aspect 39. A method of forming a coated article comprises disposing a coating over a substrate using physical vapor deposition of a precursor. The precursor comprises hydrogen, carbon, and silicon. The precursor further comprising at least one of oxygen or nitrogen. A surface of the coating comprises a contact angle with deionized water of 90° or more. A refractive index of the coating is less than a refractive index of the substrate. The coating comprises interpenetrating networks of the coating comprising interpenetrating networks of hydrogenated amorphous carb on and at least one of amorphous silicon oxide or amorphous silicon nitride.

[0048] Aspect 40. The method of any one of aspects 38-39, wherein the precursor comprises methane, hydrogen, and an orthosilicate.

[0049] Aspect 41. The method of any one of aspects 38-40, wherein the refractive index of the coating is in a range from about 1.3 to about 1.4.

[0050] Aspect 42. The method of any one of aspects 38-40, wherein the refractive index of the coating is less than 1.37. [0051] Aspect 43. The method of any one of aspects 38-42, wherein a thickness of the coating is in a range from about 0.1 nanometers to about 200 nanometers.

[0052] Aspect 44. The method of aspect 43, wherein the thickness of the coating is in a range from about 1 nanometer to about 50 nanometers.

[0053] Aspect 45. The method of any one of aspects 38-44, wherein the contact angle is in a range from about 100° to about 140°.

[0054] Aspect 46. The method of any one of aspects 38-45, wherein the surface of the coating comprises a surface roughness Ra in a range from about 10 nanometers to about 20 nanometers.

[0055] Aspect 47. The method of any one of aspects 38-46, wherein the surface of the coating comprises a surf ace roughness Rz in a range from about 100 nanometers to about 300 nanometers.

[0056] Aspect 48. The method of any one of aspects 38-47, wherein the surface of the coating comprises a skew Rsk in a range from 0 to about 0.3.

[0057] Aspect 49. The method of any one of aspects 38-48, wherein the surface coating comprises a kurtosis Rku less than 3.

[0058] Aspect 50. The method of any one of aspects 38-49, wherein the coating comprises an atomic ratio of silicon to carbon from about 0.7 to about 2.

[0059] Aspect 51. The method of any one of aspects 38-50, wherein the coating comprises an atomic ratio of oxygen to carbon from about 2 to about 5.

[0060] Aspect 52. The method of any one of aspects 38-51, wherein the coating comprises a kinetic coefficient of friction of about 0.3 or less.

[0061] Aspect 53. The method of any one of aspects 38-52, wherein the substrate comprises a glass-based material or a ceramic-based material.

[0062] Aspect 54. The method of any one of aspects 38-53, wherein the coated article comprises a transmittance of 92% or more at 500 nm.

[0063] Aspect 55. The method of aspect 54, wherein the transmittance of the coated article at 500 nanometers is greater than a transmittance at 500 nanometers of the substrate without the coating.

[0064] Aspect 56. The method of any one of aspects 35-55, wherein an average transmittance of the coated article is about 91% or more averaged over optical wavelengths from 400 nanometers to 700 nanometers. [0065] Aspect 57. The method of aspect 56, wherein the average transmittance of the coated article is in a range from about 92% to about 95%.

[0066] Aspect 58. The method of any one of aspects 38-57, wherein an average reflectance of the surface of the coating is about 0.2% or less averaged over optical wavelengths from 400 nanometers to 700 nanometers.

[0067] Aspect 59. The method of aspect 58, wherein the average reflectance of the surface of the coating is in a range from about 0.05% to about 0.15%.

[0068] Aspect 60. The method of any one of aspects 38-59, wherein the coating comprises an extinction coefficient at 500 nanometers of about 0.01 cm'¹ or less.

[0069] Aspect 61. The method of any one of aspects 38-60, wherein an average extinction coefficient is in a range from about 0.001 cm'¹ to about 0.004 cm'¹ averaged over optical wavelengths from 400 nanometers to about 700 nanometers.

[0070] Aspect 62. The method of any one of aspects 38-61, wherein a porosity of the coating is in a range from about 5% to about 50%.

[0071] Aspect 63. The method of any one of aspects 38-62, wherein the coating comprises the contact angle is about 70° or more after the surface is abraded with cheesecloth for 10,000 cycles in accordance with ISO 9211-4:2012.

[0072] Aspect 64. The method of any one of aspects 38-63, wherein the coated article comprises a CIEb* value in a range from 0 to about -6.

[0073] Aspect 65. The method of aspect 64, wherein the coated article comprises a CIE a* value in a range from 0 to about -6.

[0074] Aspect 66. The method of any one of aspects 38-65, wherein the coating contacts the substrate.

[0075] Aspect 67. The method of any one of aspects 38-65, further comprising disposing one or more layers before disposing the coating, wherein the one or more layers comprise one or more of silicon oxide, silicon nitride, or niobium oxide.

[0076] Aspect 68. The method of aspect 67, wherein the layer comprises a plurality of layers that functions as an anti-reflective stack.

[0077] Aspect 69. The method of aspect 67, wherein the refractive index of the coating is less than an outermost layer of the plurality of layers by ab out 0.05 or more. [0078] Aspect 70. The method of aspect 67, wherein the refractive index of the coating is less than an outermost layer of the plurality of layers by about 0.1 or more.

[0079] Aspect71. The method of any one of aspects 38-70, wherein and the coating is fluorine-free.

[0080] Aspect 72. The method of any one of aspects 38-71, wherein the coating is nitrogen-free.

BRIEF DESCRIPTION OF THE DRAWINGS

[0081] The above and other features and advantages of aspects of the present disclosure are better understood when the following detailed description is read with reference to the accompanying drawings, in which:

[0082] FIG. 1 is a schematic view of an example coated article;

[0083] FIG. 2 is a schematic view of an example coated article;

[0084] FIG. 3 is a schematic view of an example coated article;

[0085] FIGS. 4 is a perspective view of a vehicle interior with vehicle interior systems according to aspects;

[0086] FIG. 5 is a schematic plan view of an example consumer electronic device according to aspects;

[0087] FIG. 6 is a schematic perspective view of the example consumer electronic device of FIG. 5;

[0088] FIG. 7 schematically illustrates a scanning electron microscope (SEM) image of a surface of a coating in accordance with aspects;

[0089] FIG. 8 shows transmittance of a coated article in accordance with aspects;

[0090] FIG. 9 shows reflectance of a surface of a coating of a coated article in accordance with aspects;

[0091] FIG. 10 shows absorption and extinction coefficient of a coated article in accordance with aspects;

[0092] FIG. 11 shows refractive index of a coating of a coated article in accordance with aspects;

[0093] FIG. 12 shows reflectance of a surface of a coating of a coated article in accordance with aspects;

[0094] FIG. 13 is a flow chart illustrating example methods making coated articles in accordance with aspects of the disclosure; [0095] FIG. 14 schematically illustrates a step in methods of making coated articles;

[0096] FIG. 15 schematically illustrate a step in methods of making coated articles; and

[0097] FIG. 16 schematically illustrate a step in methods of making coated articles.

[0098] Throughout the disclosure, the drawings are used to emphasize certain aspects. As such, it should notbe assumed that the relative size of different regions, portions, and substrates shown in the drawings are proportional to its actual relative size, unless explicitly indicated otherwise.

DETAILED DESCRIPTION

[0099] Aspects will now be described more fully hereinafter with reference to the accompanying drawings in which example aspects are shown. Whenever possible, the same reference numerals are used throughout the drawings to refer to the same or like parts.

[00100] FIGS. 1-3 illustrate views of coated articles 101, 201, and 301 comprising a coating 113 disposed on a substrate 103 in accordance with aspects of the disclosure. Unless otherwise noted, a discussion of features of aspects of one coated article can apply equally to corresponding features of any aspects of the disclosure. For example, identical part numbers throughout the disclosure can indicate that, in some aspects, the identified features are identical to one another and that the discussion of the identified feature of one aspect, unless otherwise noted, can apply equally to the identified feature of any of the other aspects of the disclosure.

[00101] As shown in FIGS. 1-3, the substrate 103 of each of the coated articles 101, 201, and 301 comprises a first major surface 105 and a second major surface 107 opposite the first major surface 105. In aspects, as shown, the first maj or surface 105 can extend along a first plane 104, and/or the secondmajor surface 107 can extend along a second plane 106. In further aspects, as shown, the first plane 104 and the firstmajor surface 105 canbe parallel to the second plane 106 and the second major surface 107. As shown in FIGS. 1-3, the substrate 103 can comprise a substrate thickness 109 defined as an average distance between the first major surface 105 and the second major surface 107. In aspects, the substrate thickness 109 canbe about 25 micrometers (pm) or more, about 80 pm or more, about 100 pm or more, about 125 pm or more, about 150 pm or more, about200 pm ormore, about 500 pm or more, about 700 pm or more, about 3 millimeters (mm) or less, about 2 mm or less, about 1 mm or less, about 800 pm or less, about 500 pm or less, about 300 pm or less, about 200 pm or less, about 180 pm or less, or about 160 pm or less. In aspects, the substrate thickness 109 can be less in a range from about 25 pm to about 3 mm, from about 25 pm to about 2 mm, from about 80 pm to about 1 mm, from about 80 pm to about 800 pm, from about 100 pm to about 500 pm, from about 100 pm to about 300 pm, from about 125 pm to about200 pm, from about 150 pm to about 160 pm, or any range or subrange therebetween. In aspects, the substrate thickness 109 can be about 500 pm or more, for example, from about 500 pm to about 3 mm, from about 700 pm to about 2 mm, from about 700 pm to about 1 mm, or any range or subrange therebetween.

[00102] The substrate 103 can comprise a glass-based material and/or a ceramic-based material. For example, the substrate 103 can comprise a glass-based material and/or a ceramic-based material having a pencil hardness of 8H or more, f or example, 9H or more. As used herein, pencil hardness is measured using ASTM D 3363-20 with standard lead graded pencils. Throughout the disclosure, an elastic modulus (e.g., Young’s modulus) is measured using ISO 527-1 :2019. In aspects, the substrate 103 can comprise an elastic modulus of about 1 GigaPascal (GPa) or more, about 10 GPa or more, about 30 GPa or more, about 100 GPa or less, about 80 GPa or less, about 75 GPa or less. In aspects, the substrate 103 can comprise an elastic modulus in a range from about 1 GPa to about 100 GPa, from about 10 GPa to about 80 GPa, from about 30 GPa to about 80 GPa, from about 50 GPa to about 75 GPa, or any range or subrange therebetween.

[00103] As used herein, “glass-based” includes both glasses and glassceramics, wherein glass-ceramics have one or more crystalline phases and an amorphous, residual glass phase. A glass-based material can comprise an amorphous material (e.g., glass) and optionally one or more crystalline materials (e.g., ceramic). Amorphous materials and glass-based materials canbe strengthened. As used herein, the term “strengthened” can refer to a material that has been chemically strengthened, for example, through ion exchange of larger ions for smaller ions in the surface of the substrate. As used here, the term “strengthened” can also refer to a material strengthened by other techniques, for example, thermal tempering, or utilizing a mismatch of the coefficient of thermal expansion between portions of the substrate to create compressive stress and central tension regions, can be utilized to form strengthened substrates. Exemplary glass-based materials, which maybe free oflithia or not, comprise soda-lime glass, alkali aluminosilicate glass, alkali-containing borosilicate glass, alkali-containing aluminoborosilicate glass, alkali-containing phosphosilicate glass, and alkali-containing aluminophosphosilicate glass. In aspects, glass-based material can comprise an alkali-containing glass or an alkali-free glass, either of which may be free of lithia or not. In aspects, the glass material can be alkali-free and/or comprise a low content of alkali metals (e.g., R2O of about 10 mol% or less, wherein R₂O comprises Li₂O Na₂O, K₂O). “Glass-ceramics” include materials produced through controlled crystallization of glass. In aspects, glass-ceramics have about 1% to about 99% crystallinity. Examples of suitable glass-ceramics may include Li₂O-Al₂O₃-SiO₂ system (i.e., LAS-System) glass-ceramics, MgO-Al₂O₃-SiO₂ system (i.e., MAS-System) glass-ceramics, ZnO x A1₂O₃ x nSiO₂ (i.e., ZAS system), and/or glass-ceramics that include a predominant crystal phase including P-quartz solid solution, P-spodumene, cordierite, petalite, and/or lithium disilicate. The glassceramic substrates may be strengthened using the chemical strengthening processes. In one or more aspects, MAS-System glass-ceramic substrates may be strengthened in Li₂SO₄ molten salt, whereby an exchange of 2Li⁺ for Mg²⁺ can occur.

[00104] In aspects, the substrate 103 can comprise a ceramic-based material. As used herein, “ceramic-based” includes both ceramics and glass-ceramics, wherein glass-ceramics have one or more crystalline phases and an amorphous, residual glass phase. Ceramic-based materials can be strengthened (e.g. , chemically strengthened). In aspects, a ceramic-based material can be formed by heating a glassbased material to form ceramic (e.g., crystalline) portions. In further aspects, ceramicbased materials can comprise one or more nucleating agents that can facilitate the formation of crystalline phase(s). In aspects, ceramic-based materials can comprise one or more oxides, nitrides, oxynitrides, carbides, borides, and/or silicides. Example aspects of ceramic oxides include zirconia (ZrO₂), zircon (ZrSiO₄), an alkali-metal oxide (e.g., sodium oxide (Na₂O)), an alkali earth metal oxide (e.g., magnesium oxide (MgO)), titania (TiO₂), hafnium oxide (Hf₂O), yttrium oxide (Y₂O₃), iron oxides, beryllium oxides, vanadium oxide (VO₂), fused quartz, mullite (a mineral comprising a combination of aluminum oxide and silicon dioxide), and spinel (MgAl₂O₄). Example aspects of ceramic nitrides include silicon nitride (Si₃N₄), aluminum nitride (AIN), gallium nitride (GaN), beryllium nitride (Be₃N₂), boron nitride (BN), tungsten nitride (WN), vanadium nitride, alkali earth metal nitrides (e.g., magnesium nitride (Mg₃N₂)), nickel nitride, and tantalum nitride. Example aspects of oxynitride ceramics include silicon oxynitride, aluminum oxynitride, and a silicon-aluminum oxynitride. Example aspects of carbidesand carbon-containing ceramics include silicon carbide (SiC), tungsten carbide (WC), an iron carbide, boron carbide (B₄C), alkali-metal carbides (e.g., lithium carbide (Li₄C₃)), alkali earth metal carbides (e.g., magnesium carbide (Mg₂C₃)), and graphite. Example aspects of borides include chromium boride (CrB₂), molybdenum boride (Mo₂B₅), tungsten boride (W₂B₅), iron boride, titanium boride, zirconium boride (ZrB₂), hafnium boride (HfB₂), vanadium boride (VB₂), Niobium boride (NbB₂), and lanthanum boride (LaB₆). Example aspects of silicides include molybdenum disilicide (MoSi₂), tungsten disilicide (WSi₂), titanium disilicide (TiSi₂), nickel silicide (NiSi), alkali earth silicide (e.g., sodium silicide (NaSi)), alkali- metal silicide (e.g., magnesium silicide (Mg₂Si)), hafnium disilicide (HfSi₂), and platinum silicide (PtSi).

[00105] In aspects, the substrate 103 can be optically transparent. As used herein, “optically transparent” or “optically clear” means an average transmittance of 70% or more in the wavelength range of 400 nm to 700 nm through a 1.0 mm thick piece of a material. Throughout the disclosure, transmittance (and average transmittance) is measured in accordance with ASTM 0649-14(2021). In aspects, an “optically transparent material” or an “optically clear material” can have an average transmittance of 75% or more, 80% or more, 85% or more, or 90% or more, 92% or more, 94% or more, 96% or more in the wavelength range of 400 nm to 700 nm through a 1.0 mm thick piece of the material. The average transmittance in the wavelength range of 400 nm to 700 nm is calculated by measuring the transmittance of whole number wavelengths from about 400 nm to about 700 nm and averaging the measurements. For example, the substrate 103 can comprise a transmittance in a range from about 80% to about 92%, from about 85% to about 91%, from about 88% to about 91%, or any range or subrange therebetween.

[00106] As shown in FIGS. 1-3, the coating 113 can comprise a first surface area 115 and a second surface area 117 opposite the first surface area 115. In aspects, as shown in FIGS. 1-3, the first surface area 115 can comprise a planar surface, and/orthe second surface area ll7 can comprise a planar surface. A coating thickness 119 of the coating 113 canbe defined as an average distance between the first surface area 115 and the second surface area 117 in a direction perpendicular to the first major surface 105. In aspects, the coating thickness 119 can be about 0.1 nanometers (nm) or more, about 1 nm or more, about 5 nm or more, ab out 10 nm or more, about 200 nm or less, about lOO nm or less, about 50 nm or less, or about 30 nm or less. In aspects, the coating thickness 119 can be in a range from about 0. 1 nm to about200 nm, from about 1 nm to about 100 nm, from about 1 nm to about 50 nm, from about 5 nm to about 50 nm, from about 5 nm to about 30 nm, from about 10 nm to about 30 nm, or any range or subrange therebetween.

[00107] As used herein, if a first layer and/or component is described as “disposed on” a second layer and/or component, other layers may or may not be present between the first layer and/or component and the second layer and/or component. Furthermore, as used herein, “disposed on” does not refer to a relative position with reference to gravity. For example, a first layer and/or component can b e considered “disposed on” a second layer and/or component, for example, when the first layer and/or component is positioned underneath, above, or to one side of a second layer and/or component. As used herein, a first layer and/or component described as “bonded to” a second layer and/or component means that the layers and/or components are bonded to each other, either by direct contact and/or b onding between the two layers and/or components or via an adhesive layer. As used herein, a first layer and/or component described as “contacting” or “in contact with” a second layer and/or components refers to direct contact and includes the situations where the layers and/or components are bonded to each other.

[00108] In aspects, as shown in FIGS. 1-3, the first surface area 115 of the coating 113 can be an exterior surface of the coated article 101, 201, and/or 301. In aspects, as shown in FIGS. 1-3, the coating 113 (e.g., the second surface area 117) can be disposed on the substrate 103 (e.g., the first major surface 105). In further aspects, as shown in FIG. 1, the coating 113 (e.g., the second surface area 117) can contact and/or be bonded to the substrate 103 (e.g., firstmajor surface 105). In further aspects, as shown in FIGS. 2-3, one or more layers 223 can be positioned between the second surface area 117 of the coating 113 and the first major surface 105 of the substrate 103, which will be discussed in more detail below.

[00109] The coating 113 comprises interpenetrating networks of hydrogenated amorphous carbon and amorphous silicon oxide. As used herein, amorphous means non-crystalline. As used herein, amorphous carbon comprises a mixture of sp² hybridization and sp³ hybridization, which puts itbetween the all-sp³ hybridized network of diamond and the all-sp² hybridized network of graphite or graphene. As used herein, “interpenetrating” and “interpenetrated” means that there is at least one bond between the networks. For networks of hydrogenated amorphous carbon and amorphous silicon oxide, there is at least one carbon to silicon bond where the networks interpenetrate. In aspects, the coating 113 can further comprise amorphous silicon nitride. In further aspects, the amorphous silicon nitride can interpenetrate the hydrogenated amorphous carbon. In further aspects, amorphous silicon nitride can be substituted in at least a portion of the network of amorphous silicon oxide. In aspects, the coating 113 can be fluorine-free. In aspects, the coating 113 can be nitrogen-free.

[00110] Throughout the disclosure, contact angle is measured by measuring an angle formed by a drop of deionized water on a surface in accordance with ASTM D7334-08(2013). In aspects, the coating 113 can be hydrophobic, for example, comprising a contact angle of the first surface area 115 greater than about 90°. In aspects, the first surface area 115 of the coating 113 can comprise a contact angle of about 90° or more, about 100° or more, about 110° or more, about 120° or more, about 150° orless, about 140° or less, or about 130° or less. In aspects, the first surface area 115 of the coating 113 can comprise a contact angle in a range from about 90° to about 150°, from about 100° to about 140°, from about 110° to about 140°, from about 120° to about 130°, or any range or subrange therebetween. Throughout the disclosure, the kinetic coefficient of friction is measured in accordance with ASTM DI 894-14. In aspects, the first surface area 115 of the coating 113 can comprise a kinetic coefficient of friction (i.e., dynamic coefficient of friction) of about 0.3 or less, about 0.25 or less, about 0.2 or less, or about 0.1 or less. In aspects, the first surface area 115 of the coating 113 can comprise a kinetic coefficient of friction in a range from about 0.01 to about 0.3, from about 0.05 to about 0.25, from about 0.1 to about 0.2, or any range or subrange therebetween.

[00111] In aspects, the coating 113 can function as an easy-to-clean coating and/or an anti-fingerprint coating. For example, the coating 113 can be hydrophobic and/or comprise a kinetic coefficient of friction of about 0.3 or less. Anti-fingerprint coatings can reduce the transfer of material (e.g., fingerprint oils, water) onto the surface of the coating. Easy-to-clean coatings can allow any material transferred to the surface of the coating to be easily removed (e.g., with a microfiber). In further aspects, the coating can function as an easy-to-clean coating and an antifingerprint coating. [00112] Throughoutthe disclosure, a surface profile of the first surface area of the coating is measured over a test area of 10 pm by 10 pm as measured using atomic force microscopy (AFM), which is used to characterize the first surface area using the parameters defined in ISO 4287 : 1997. As used herein, surface roughness Ra is calculated as an arithmetical mean of the absolute deviation of a surface profile from an average position. As used herein, surface roughness Rz is calculated as an average of the five greatest height differences between a peak and an adjacent trough of a surface profile. As used herein, surface roughness Rq is calculated as a root mean square (RMS) of the deviation of a surface profile from an average position in a direction normal to the surface. As used herein, skewness Rsk is an average of the cube of the deviation of a surface profile from an average position divided by the cube of surface roughness Rq. As used herein, kurtosis Rku is an average of the deviation of a surface profile from an average position raised to the fourth power divided by the surface roughness Rq raised to the fourth power. In aspects, the first surface area 115 of the coating 113 can comprise a surface roughness Ra of about 5 nm or more, about 10 nm or more, about 12 nm or more, about 25 nm or less, about 20 nm or less, or about 17 nm or less. In aspects, the first surface area 115 of the coating 113 can comprise a surface roughness Ra in a range from about 5 nm to about 25 nm, from about 10 nm to about 20 nm, from about 12 nm to about 17 nm, or any range or subrange therebetween. In aspects, the first surface area 115 of the coating 113 can comprise a surface roughness Rz of about 100 nm or more, about 200 nm or more, about230 nm ormore, about 350 nm orless, about 300 nm or less, or about 280 nm or less. In aspects, the first surface area 115 of the coating 113 can comprise a surface roughness Rz in a range from about 100 nm to about 350 nm, from about 100 nm to about 300 nm, from about 200 nm to about 300 nm, from about 230 nm to about 280 nm, or any range or subrange therebetween, the first surface area 115 of the coating 113 can comprise a surface roughness Rq of about 5 nm or more, about 10 nm or more, about 12 nm or more, about25 nm or less, about20 nm orless, or about 17 nm orless. In aspects, the first surface area 115 of the coating 113 can comprise a surface roughness Rq in a range from about 5 nm to about 25 nm, from about 10 nm to ab out 20 nm, from about 12 nm to about 17 nm, or any range or subrange therebetween. In aspects, the first surface area 115 of the coating 113 can comprise a skew Rsk of about O ormore, about O. l or more, about 0.3 or less, or about 0.2 orless. In aspects, the first surface area 115 of the coating 113 can comprise a surface roughness Rq in a range from about 0 to about 0.3, from about 0.1 to about 0.2, or any range or subrange therebetween. Without wishing to be bound by theory, a skew Rsk greater than 0 means that the surface profile is skewed towards lower heights while a skew Rsk less than 0 means that the surface profile is skewed towards higher heights. In aspects, the first surface area 115 of the coating 113 can comprise a kurtosis Rku less than 3. Without wishing to be bound by theory, a kurtosis Rku of less than 3 can be characterized as relatively flat while a kurtosis of greater than 3 can be characterized as relatively sharp. In further aspects, a skew Rsk greater than 0 and a kurtosis Rku less than 3 can create a porous structure, which reduces a surface area accessible on a micrometer scale. Without wishing to be bound by theory, reducing the surface area accessible on a micrometer scale can produce a hydrophobic surface. Providing a surface roughness Ra, Rz, or Rq within one or more of the above-mentioned ranges can enable the coating to be hydrophobic.

[00113] As used herein, porosity of a coating is defined as a percentage of a volume of the coating occupied by voids (e.g., air, lack of coating material). Porosity of the coating is calculated from an image taken using a scanning electron microscope (SEM), where the SEM image is analyzed using ImageJ with autothresholding to determine the fraction of the image corresponding to heights below the threshold. Without wishing to be bound by theory, the effect of increasing porosity is that the portion of the coating accessible to a probe (e.g., water) decreases since more of the surface of the coating is recessed from surface peaks of the coating. In aspects, the coating 113 can comprise a porosity of about 5% or more, about 10% or more, about 20% or more, about 30% or more, about 70% or less, about 50% or less, about 40% or less, or about 35% or less. In aspects, the coating 113 can comprise a porosity in a range from about 5% to about 70%, from about 5% to about 50%, from about 10% to about 40%, from about 20% to about 35%, from ab out 30% to ab out 35%, or any range or subrange therebetween. Providing a porous coating can decrease a refractive index of the coating because there is more air (with a refractive index of 1) in the coating. Providing a porous coating can increase a contact angle of deionized water, for example, by decreasing a surface area accessible to water.

[00114] Throughoutthe disclosure, a composition of the coating of the coated article is measured using energy dispersive X-ray analysis (EDX). Without wishingto be bound by theory, EDX cannot provide information on the presence of hydrogen in coatings. Consequently, the composition of the coating measured experimentally is on a hydrogen-free basis, meaning the contribution from hydrogen is ignored in determining the composition. As used herein, atom% refers to a fraction of all atoms comprising the specified atomic element. In aspects, the coating 113 can comprise an atomic ratio (i.e., ratio of atomic%) of silicon (Si) to carbon (C) of about 0.3 or more, about 0.5 ormore, about 0.7 ormore, about 1 or more, about 8 or less, about 4 or less, about 2 or less, or about 1.5 or less. In aspects, the coating 113 can comprise an atomic ratio of Si to C in a range from about 0.3 to about 8, from about 0.5 to about4, from about 0.7 to about 2, from about 1 to about 1.5, or any range of subrange therebetween. In aspects, the coating 113 can comprise an atomic ratio of oxygen (O) to carbon (C) of about 1.5 or more, about 2 ormore, about 2.5 or more, about 3 ormore, about 10 or less, about 6 or less, about 5 or less, or about4.5 or less. In aspects, the coating 113 can comprise an atomic ratio of O to C in a range from about 1.5 to about 10, from about 1.5 to about 6, from about2 to about 5, from about 2.5 to about 4.5, from about 3 to about 4.5, or any range or subrange therebetween. In aspects, the coating 113 can comprise a scaled composition (i.e., on a hydrogen-free basis and excluding other, non-mentioned elements) in atom% of C, O, and Si. In further aspects, the scaled composition can comprise C in an amount of about 5 atom% or more, about 10 atom% ormore, about 50 atom% or less, or about 20% or less. In further aspects, the scaled composition can comprise C in a range from ab out 5 atom% to about 50 atom%, from about 10 atom% to about 20 atom%, or any range or subrange therebetween. In further aspects, the scaled composition can comprise O in an amount of about 10 atom% or more, about 30 atom% or more, about 50 atom% or more, about 80 atom% or less, or about 70 atom% or less. In further aspects, the scaled composition can comprise O in a range from about 10 atom% to about 80 atom%, from about 30 atom% to about 70 atom%, from about 50 atom% to ab out 70 atom%, or any range or subrange therebetween. In further aspects, the scaled composition can comprise Si in an amount from about 10 atom% or more, about 15 atom% or more, about 30 atom% or less, or about 25 atom% or less. In further aspects, the scaled composition can comprise Si in a range from about 10 atom% to about 30 atom%, from about 15 atom%to about 25 atom%, or any range of subrange therebetween.

[00115] In aspects, the coating 113 can be optically clear. In further aspects, the coating 113 and/or the coated article 101, 201, and/or 301 can comprise a transmittance at an optical wavelength of 500 nm of about 91% or more, ab out 92% or more, or about 93% or more. In further aspects, the coating 113 and/or the coated article 101, 201, and/or 301 can comprise a transmittance at an optical wavelength of 500 nm in a range from about 91% to about 95%, from about 92% to about 95%, from about 93% to about 94%, or any range or subrange therebetween. In further aspects, a transmittance of the coated article 101, 201, and/or 301 (i.e., comprising the coating 113) can be greater than the transmittance of the substrate 103 without the coating 113 (i.e., a bare substrate), where the transmittance is measured at an optical wavelength of 500 nm. In further aspects, the coating 113 and/or the coated article 101, 201, and/or 301 can comprise an average transmittance averaged over optical wavelengths from 400 nm to 700 nm of about 91% or more, about 92% or more, or about 93 % or more. In further aspects, the coating 113 and/or the coated article 101, 201, and/or 301 can comprise an average transmittance averaged over optical wavelengths from 400 nm to 700 nm in a range from about 91% to about 95%, from about 92% to about 95%, from about 93% to about 94%, or any range or subrange therebetween. In further aspects, an average transmittance of the coated article 101, 201, and/or 301 (i.e., comprisingthe coating 113) can be greaterthan an average transmittance of the substrate 103 without the coating 113 (i.e., a bare substrate), where the average transmittance is averaged over optical wavelengths from 400 nm to 700 nm.

[00116] As used herein, reflectance (and average reflectance) is measured in accordance with ASTM Fl 252-21 at an angle of 8° relative to a direction normal to the surface. As with average transmittance, average reflectance is calculated by measuring reflectance at whole number wavelengths from about 400 nm to ab out 700 nm and then the measurements are averaged. In aspects, the coated article 101, 201, and/or 301 and/orthe coating 113 can comprise an average reflectance of the first surface area 115 of the coating 113 at 500 nm of about 2.0% or less, about 1 .8% or less, about 1.5% or less, about 1.2% or less, or about 1.0% orless. In aspects, the coated article 101, 201, and/or 301 and/orthe coating 113 can comprise an average reflectance of the first surface area 115 of the coating 113 at 500 nm in a range from ab out 0.1% to ab out 2.0% , from ab out 0.5% to ab out 1 .5 %, f rom ab out 0.8% to ab o ut 1.2%, from about 0.8% to about 1.0%, or any range or subrange therebetween. In aspects, the coated article 101, 201, and/or 301 and/orthe coating 113 can comprise an average reflectance of the first surface area 115 of the coating 113 averaged over optical wavelengths from 400 nm to 700 nm of about 2.0% or less, about 1.8% or less, about 1.5% or less, about 1.2% orless, or about 1.0% or less. In aspects, the coated article 101, 201, and/or 301 and/or the coating 113 can comprise an average reflectance of the first surface area 115 of the coating 113 averaged over optical wavelengths from 400 nm to 700 nm in a range from about 0.1% to about 2.0%, from about 0.5% to about 1.5%, from about 0.8% to about 1 .2%, from about 0.8% to about 1.0%, or any range or subrange therebetween.

[00117] Throughout the disclosure, the extinction coefficient is calculated based on an absorbance, which is equal to 100% minus the reflectance and the transmittance. In aspects, the coating 113 can comprise an extinction coefficient at 500 nm of about O.Ol cm^-1 or less, about 0.007 cm^-1 orless, about 0.004 cm^-1 or less, or about 0.002 cm^-1 or less. In aspects, the coating 113 can comprise an extinction coefficient at 500 nm in a range from about 0.0005 cm⁴ to about 0.01 cm⁴, from about 0.001 cm⁴ to about 0.007 cm⁴, from about 0.001 cm⁴ to about 0.004 cm⁴, from about 0.002 cm'¹ to about 0.004 cm'¹, or any range or subrange therebetween.

[00118] The coating 113 can comprise a first refractive index. The first refractive index may be a function of a wavelength of light passing through the coating 113. For light of a first wavelength, a refractive index of a material is defined as the ratio between the speed of light in a vacuum and the speed of light in the corresponding material. Without wishing to be bound by theory, a refractive index of the coating 113 can be determined using a ratio of a sine of a first angle to a sine of a second angle, where light of the first wavelength is incident from air on a surface of the coating 113 at the first angle and refracts at the surface of the coating 113 to propagate light within the coating 113 at a second angle. The first angle and the second angle are both measured relative to a direction normal to a surface of the coating 113. As used herein, the refractive index is measured in accordance with ASTM E1967-19, where the first wavelength comprises 500 nm, unless indicated otherwise. In aspects, the first refractive index of the coating 113 can be about 1 .2 or more, about 1.3 or more, about 1.35 or more, about 1.5 or less, about 1.45 or less, about 1.4 or less, or about 1.37 or less. In aspects, the first refractive index of the coating 113 can be in a range from about 1.2 to about 1.5, from about 1.3 to about 1.45, from about 1.3 to about 1.4, from about 1.35 to about 1.37, or any range or subrange therebetween. As with average transmittance an average reflectance, average refractive index is measured at whole number wavelengths from about 400 nm to about 700 nm and then the measurements are averaged. In aspects, the average refractive index can be within one or more of the ranges discussed above in this paragraph with reference to the refractive index.

[00119] In aspects, the substrate 103 can comprise a second refractive index. In aspects, the second refractive index of the substrate 103 canbe about 1.45 or more, about 1.49 or more, about 1.7 or less, about 1.6 or less, about 1 .55 or less, or about 1.52 or less. In aspects, the second refractive index of the substrate 103 can be in a range from about 1.45 to about 1 .7, from about 1 .45 to about 1.6, from about 1.45 to about 1.55, from about 1.49 to about 1.52, or any range or subrange therebetween. In aspects, the first refractive index of the coating 113 can be less than the second refractive index of the substrate 103. In further aspects, the first refractive index of the coating can be less than the second refractive index by about 0.05 or more, about 0. 1 or more, about 0.15 or more, or about 0.2 or more. In further aspects, an amount that the first refractive index of the coating 113 is less than the second refractive index can be in a range from about 0.05 to about 0.3, from about O. l to about 0.2, from about 0.15 to about 0.2, or any range or subrange therebetween.

[00120] In aspects, as shown in FIGS. 2-3, one or more layers 223 can be positioned between the second surface area 117 of the coating 113 and the first major surface 105 of the substrate 103. In further aspects, the one or more layers 223 disposed on the substrate 103 can function as an anti-reflective stack either in combination with the coating 113 or on its own. As used herein, an anti-reflective stack can reduce a reflectance when disposed on the substrate relative to a reflectance of the substrate without the anti-reflectance stack. Without wishing to be bound by theory, the coating 113 can have a minimal influence on the optical performance of an anti-reflectance stack if the coating thickness 119 is less than 10 nm or less than 5 nm. In aspects, the one or more layers 223 can comprise silicon oxide (e.g., silica), silicon nitride, titanium oxide (e.g., titania), or niobium oxide. In further aspects, the one or more layers can further comprise one or more of aluminum oxide (e.g., alumina), zirconium oxide (e.g., zirconia), tin oxide, titanium nitride, an alkali earth metal fluoride (e.g., magnesium fluoride, calcium fluoride, barium fluoride), magnesium oxide or oxynitride, for example, aluminum oxynitride or silicon oxynitride. In some aspects, as shown in FIGS. 2-3, the one or more layers 223 can comprise a stack thickness 229 of about 50 nm or more, about 100 nm or more, about200 nm or more, about 1 pm or less, about 500 nm or less, or about 300 nm or less. In aspects, the stack thickness 229 canbe in a range from about 50 nm to about 1 pm, from about 100 nm to about 500 nm, from about 200 nm to about 300 nm, or any range or subrange therebetween.

[00121] As used herein, an outermost layer of the one or more layers 223 refers to the layer contacting the second surface area 117 of the coating 113. In further aspects, a third refractive index of the outermost layer of the one or more layers 223 can be greater than the first refractive index of the coating 113. In even further aspects, the first refractive index of the coating 113 can be greater than the third refractive index of the outermost layer of the one or more layers 223 by about 0.05 ormore, about O. l ormore, about 0.15 ormore, or about 0.2 or more. In even further aspects, an amountthatthe first refractive index ofthe coating 113 is greater than the third refractive index of the outermost layer of the one or more layers 223 can be in a range from about 0.05 to about 0.5, from about O. l to about 0.4, from about 0.15 to about 0.35, from about 0.2 to about 0.3, or any range or subrange therebetween.

[00122] In further aspects, as shown in FIG. 3, the one or more layers 223 can comprise five layers, although other numbers of layers can be provided in further aspects. In even further aspects, as shown in FIG. 3, going from the sub strate 103 to the coating 113, the one or more layers can comprise a first layer 303, a second layer 313, a third layer 323, a fourth layer 333, and a fifth layer 343. As used herein, a “high RI” layer has a refractive index greater than about 1 .6, and a “low RI” layer has a refractive index less than about 1.5. In even further aspects, the first lay er 303, the third layer 323, and the fifth layer 343 can be low RI layers, and the second layer313 and the fourth layer 333 can be high RI layers. Exemplary aspects of high RI layers can comprise niobium oxide, silicon nitride, and/or titanium oxide. Exemplary aspects of low RI layers can comprise but are not limited to silicon oxide, silicon oxynitride, aluminum oxynitride, and/or alkali earth metal fluorides. In even further aspects, the first layer 303 can contact the first major surface 105 of the substrate 103, and the fifth layer 343 can contact the second surface area 117 ofthe coating 113. In further aspects, although not shown, the one or more layers 223 can comprise four layers, where the outermost layer of the one or more layers 223 comprises a high RI layer contacting the coating 113, and the coating 113 serves as a low RI layer.

[00123] Throughoutthe disclosure, coated article 101, 201, and/or 301 can comprise CIE (L*, a*, b*) color coordinates measured using a D65 illuminant at an observer angle of 10° using a colorimeter (e.g., tristimulus colorimeter) and/or spectrophotometer, for example, CR-400 Chroma Meter (Konica Minolta) or a TR 520 Spectrophotometer (Lazar Scientific). In aspects, a CIE b* value of the coated article 101, 201, and/or 301 can be O or less, about -0.5 or less, about -1 or less, about -6 ormore, about -4 or more, or about -2 or more. In aspects, a CIEb* values of the coated article 101, 201, and/or 301 can be in a range from 0 to about -6, from about - 0.5 to about -4, from about -1 to about -2, or any range or subrange therebetween. In aspects, a CIE a* value of the coated article 101, 201, and/or 301 can be about 2 or less, about 1 or less, 0 or less, -0.5 or less, or about -1 or less. In aspects, a CIE a* value of the coated article can be less than 0, for example, in a range from 0 to about - 6, from about -0.5 to about -4, from about -1 to about -2, or any range or subrange therebetween. In aspects, a CIE a* value of the coated article 101 , 201 , and/or 301 can be in a range from about 2 to about -2, from about 1 to about -1, from about 0.5 to about -0.5, or any range or subrange therebetween.

[00124] Throughout the disclosure, abrasion resistance of the coating of the coated article is measured in a moderate abrasion test in accordance with ISO 9211 -4 :2012 using a Taber abrasion tester with 4 layers of cheesecloth under a load of 750 g at 23 °C and 50% relative humidity. In aspects, the coating 113 of the coated article 101, 201, and/or 301 can withstand 10,000 cycles in the moderate abrasion test. In further aspects, after 10,000 cycles in the moderate abrasion test, the second surface area 117 can comprise a contact angle of about 70° or more, about 75° or more, or about 80° or more. In further aspects, after 10,000 cycles in the moderate abrasion test, the coated article can comprise a CIE a* value and/or a CIE b* value within one or more of the ranges discussed above.

[00125] In aspects, the substrate 103 can comprise a glass-based substrate and/or a ceramic-based substrate and can comprise one or more compressive stress regions. In aspects, a compressive stress region can be created by chemically strengthening. Chemically strengthening comprises an ion exchange process, where ions in a surface layer are replaced by-or exchanged with-larger ions having the same valence or oxidation state. Methods of chemically strengthening will be discussed later. A compressive stress region can extend into a portion of the first portion and/or the second portion for a depth called the depth of compression. As used herein, depth of compression means the depth at which the stress in the chemically strengthened substrates and/or portions described herein changes from compressive stress to tensile stress. Depth of compression is measured by a surface stress meter or a scattered light polariscope (SCALP, wherein values reported herein were made using SCALP-5 made by Glasstress Co., Estonia) depending on the ion exchange treatment and the thickness of the article being measured. Where the stress in the substrate and/or portion is generated by exchanging potassium ions into the substrate, a surface stress meter, for example, the FSM-6000 (Orihara Industrial Co., Ltd. (Japan)), is used to measure depth of compression. Unless specified otherwise, compressive stress (including surface CS) is measured by surface stress meter (FSM) using commercially available instruments, for example the FSM-6000, manufactured by Orihara. Surface stress measurements rely upon the accurate measurement of the stress optical coefficient (SOC), which is related to the birefringence of the glass. Unless specified otherwise, SOC is measured according to Procedure C (Glass Disc Method) described in ASTM standard C770-16(2020), entitled “Standard Test Method for Measurement of Glass Stress-Optical Coefficient,” the contents of which are incorporated herein by reference in their entirety. Where the stress is generated by exchanging sodium ions into the substrate, and the article being measured is thicker than about 400 pm, SCALP is used to measure the depth of compression and central tension (CT). Where the stress in the substrate and/or portion is generated by exchanging both potassium and sodium ions into the substrate and/or portion, and the article being measured is thicker than about 400 pm, the depth of compression and CT are measured by SCALP. Without wishing to be bound by theory, the exchange depth of sodium may indicate the depth of compression while the exchange depth of potassium ions may indicate a change in the magnitude of the compressive stress (but not the change in stress from compressive to tensile). The refracted near-field (RNF; the RNF method is described in U.S. Patent No. 8,854,623, entitled “Systems andmethods for measuring a profile characteristic of a glass sample”, which is incorporated herein by reference in its entirety) method also may be used to derive a graphical representation of the stress profile. When the RNF method is utilized to derive a graphical representation of the stress profile, the maximum central tension value provided by SCALP is utilized in the RNF method. The graphical representation of the stress profile derived by RNF is force balanced and calibrated to the maximum central tension value provided by a SCALP measurement. As used herein, “depth of laye ’ (DOL) means the depth that the ions have exchanged into the substrate and/or portion (e.g., sodium, potassium). Through the disclosure, when the maximum central tension cannot be measured directly by SCALP (as when the article being measured is thinner than about 400 pm) the maximum central tension can be approximated by a product of a maximum compressive stress and a depth of compression divided by the difference between the thickness of the substrate and twice the depth of compression, wherein the compressive stress and depth of compression are measured by FSM.

[00126] In aspects, the substrate 103 comprising the glass-based portion and/or ceramic-based portion can comprise a first compressive stress region at the first major surface 105 that can extend to a first depth of compression from the first major surface 105. In aspects, the substrate 103 comprising a first glass-based and/or ceramic-based portion can comprise a second compressive stress region at the second major surface 107 that can extend to a second depth of compression from the second major surface 107. In aspects, the first depth of compression and/or the second depth of compression as a percentage of the substrate thickness 109 can be about 1% or more, about 5% or more, about 10% or more, about 30% or less, about 25% or less, or about 20% or less. In aspects, the first depth of compression and/or the second depth of compression as a percentage of the substrate thickness 109 canbe in a range from about 1% to about 30%, from about 5% to about 25%, from about 10% to about 30%, from about 10% to about 25%, from about 10% to about 20%, or any range or subrange therebetween. In further aspects, the first depth of compression and/or the second depth of compression as a percentage of the substrate thickness 109 can be about 10% or less, for example, from about 1% to about 10%, from about 3% to about 8%, from about 5% to about 8%, or any range or subrange therebetween. In further aspects, the first depth of compression can be substantially equal to the second depth of compression. In aspects, the first depth of compression and/or the second depth of compression canbe about 1 pm or more, about 10 pm or more, about 30 pm or more, about 50 pm or more, about 200 pm or less, about 150 pm or less, about 100 pm or less, or about 60 pm or less. In aspects, the first depth of compression and/or the second depth of compression can be in a range from about 1 pm to about 200 pm, from about 10 pm to about 150 pm, from about 30 pm to about 100 pm, from about 50 pm to about 60 pm, or any range or subrange therebetween.

[00127] In aspects, the first compressive stress region can comprise a maximum first compressive stress. In aspects, the second compressive stress region can comprise a maximum second compressive stress. In further aspects, the maximum first compressive stress and/or the maximum second compressive stress canbe about 100 MegaPascals (MPa) or more, about 300 MPa or more, about 500 MPa or more, about 600 MPa or more, about 700 MPa or more, about 1,500 MPa or less, about 1,200 MPa or less, about 1,000 MPa or less, or about 800 MPa or less. In further aspects, the maximum first compressive stress and/or the maximum second compressive stress can be in a range from about 100 MPa to about 1,500 MPa, from about 300 MPa to about 1,200 MPa, from about 500 MPa to about 1,000 MPa, from about 600 MPa to about 1,000 MPa, from about 600 MPa to about 1,000 MPa, from about 700 MPa to about 800 MPa, from about 500 MPa to about 800 MPa, or any range or subrange therebetween.

[00128] In aspects, the substrate 103 can comprise a first depth of layer of one or more alkali-metal ions associated with the first compressive stress region. In aspects, the substrate 103 can comprise a second depth of layer of one or more alkali- metal ions associated with the second compressive stress region and the second depth of compression. As used herein, the one or more alkali-metal ions of a depth of layer of one or more alkali-metal ions can include sodium, potassium, rubidium, cesium, and/or francium. In aspects, the one or more alkali ions of the first depth of layer of the one ormore alkali ions and/or the second depth of layer of the one or more alkali ions comprises potassium. In aspects, the first depth of layer and/or the second depth of layer as a percentage of the substrate thickness 109 canbe about 1% ormore, about 5% ormore, about 10% or more, about 40% or less, about 35% or less, about 30% or less, about 25% or less, or about 20% or less. In aspects, the first depth of lay er and/or the second depth oflayer as a percentage of the substrate thickness 109 can be in a range from about 1 % to about 40%, from about 1 % to about 35%, from ab out 5 % to about 30%, from about 10% to about 25%, from about 10% to about 20%, or any range or subrange therebetween. In further aspects, the first depth oflayer of the one or more alkali-metal ions and/or the second depth oflayer of the one ormore alkali- metal ions as a percentage of the substrate thickness 109 can be about 10% or less, for example, from about 1% to about 10%, from about 3% to about 8%, from about 5% to about 8%, or any range or subrange therebetween. In aspects, the first depth of layer of the one or more alkali-metal ions and/or the second depth of layer of the one or more alkali-metal ions can be about 1 pm or more, about 10 pm or more, about 30 pm or more, about 50 pm ormore, about 200 pm or less, about 150 pm or less, about 100 pm or less, or about 60 pm or less. In aspects, the first depth of layer of the one or more alkali-metal ions and/or the second depth of layer of the one or more alkali- metal ions can be in a range from about 1 pm to about 200 pm, from about 10 pm to about 150 pm, from about 30 pm to about 100 pm, from about 50 pm to about 60 pm, or any range or subrange therebetween.

[00129] In aspects, the substrate 103 can comprise a first tensile stress region. In aspects, the first tensile stress region can be positioned between the first compressive stress region and the second compressive stress region. In aspects, the first tensile stress region can comprise a maximum first tensile stress. In further aspects, the maximum first tensile stress can be about 10 MPa or more, about 20 MPa or more, about 30 MPa or more, about 100 MPa or less, about 80 MPa or less, or about 60 MPa or less. In further aspects, the maximum first tensile stress can be in a range from about 10 MPa to about 100 MPa, from about 20 MPa to about 80 MPa, from about 30 MPa to about 60 MPa, or any range or subrange therebetween.

[00130] Aspects of the disclosure can comprise a consumer electronic product. The consumer electronic product can comprise a housing comprising a front surface, a back surface, and side surfaces. The consumer electronic product can further comprise electrical components at least partially within the housing. The electrical components can comprise a controller, a memory, and a display. The display can be at or adjacent to the front surface of the housing. The display can comprise a liquid crystal display (LCD), an electrophoretic display (EPD), an organic light-emitting diode (OLED) display, or a plasma display panel (PDP). The consumer electronic product can comprise a cover substrate disposed on the display. In aspects, at least one of a portion of the housing or the cover substrate comprises the coated article discussed herein. The consumer electronic product can comprise a portable electronic device, for example, a smartphone, a tablet, a wearable device, or a laptop . The consumer electronic product can comprise a cover lens, for example, disposed on a camera. In aspects, the cover lens can comprise the coated article discussed through the disclosure. In further aspects, the coating of the coated article can function as an easy-to-clean coating.

[00131] The coated article disclosed herein may be incorporated into another article, for example, an article with a display (or display articles) (e.g., consumer electronics, including mobile phones, tablets, computers, navigation systems, wearable devices (e.g., watches), and the like), architectural articles, transportation articles (e.g., automotive, trains, aircraft, sea craft, etc.), appliance articles, or any article that may benefit from some transparency, scratch-resistance, abrasion resistance, or a combination thereof. An exemplary article incorporating any of the coated article disclosed herein is shown in FIGS. 5-6. Specifically, FIGS. 5-6 show a consumer electronic device 500 including a housing 502 having front 504, back 506, and side surfaces 508. Although not shown, the consumer electronic device can comprise electrical components that are at least partially inside or entirely within the housing. For example, electrical components include at least a controller, a memory, and a display. As shown in FIGS. 5-6, the display 510 canbe at or adjacent to the front surface of the housing 502. The consumer electronic device can comprise a cover substrate 512 at or over the front surface of the housing 502 such that it is overthe display 510. In aspects, atleast one ofthe cover substrate 512 or a portion of housing 502 may include any of the coated article disclosed herein.

[00132] FIG. 4 illustrates a vehicle interior 401 that includes three different vehicle interior systems 400, 440, and 480. Vehicle interior system 400 includes a dashboard base 410 with a curved surface 420 including a display, shown curved display 430. The dashboardbase 410 typically includes an instrument panel 415 which may also include a curved display. Vehicle interior system 440 includes a center console base 450 with a curved surface 460 including a display, shown as curved display 470. Vehicle interior system 480 includes a dashboard steering-wheel base 485 with a curved surface 490 and a display, shown as a curved display 495. Any of these vehicle interior systems can include the coated article 101, 201, and/or 301 discussed herein. In aspects, the vehicle interior system may include a base that is an armrest, a pillar, a seat back, a floorboard, a headrest, a door panel, or any portion of the interior of a vehicle that includes a curved surface. While FIG. 4, shows an automobile interior, the aspect of the vehicle interior system may be incorporated into any type of vehicle, for example, trains, automobiles (e.g., cars, trucks, buses, and the like), seacraft (boats, ships, submarines, and the like), and aircraft (e.g., drones, airplanes, jets, helicopters, and the like), including both human-piloted vehicles, semi- autonomous vehicles, and fully autonomous vehicles.

[00133] Aspects of methods of making the coated article and/or substrate in accordance with aspects of the disclosure will be discussed with reference to the flow chart in FIG. 13 and example method steps illustrated in FIGS. 14-16. Example aspects of making the coated article 101, 201, and/or 301 illustrated in FIGS. 1-3 will now be discussed with reference to FIGS. 14-16 and the flow chart in FIG. 13. In a first step 1301 of methods of the disclosure, methods can start with providing a substrate 103. In aspects, the substrate 103 may be provided by purchase or otherwise obtaining a substrate or by formingthe substrate. In aspects, the substrate 103 can comprise a glass-based substrate and/or a ceramic-based substrate. In further aspects, glass-based substrates and/or ceramic-based substrates can be provided by forming them with a variety of ribbon forming processes, for example, slot draw, down-draw, fusion down-draw, up-draw, press roll, redraw, or float. In further aspects, ceramic-based substrates can be provided by heating a glass-based substrate to crystallize one or more ceramic crystals. In aspects, the substrate 103 can be strengthened, for example, chemically strengthened and/or thermally strengthened, with one or more compressive stress regions, as discussed above. The sub strate 103 may comprise the first major surface 105 and the second major surface 107 opposite the firstmajor surface 105 with the substrate thickness 109 defined therebetween.

[00134] After step 1301, as shown in FIG. 14, methods can proceed to step 1303 comprising disposing one or more layers 223 over the substrate 103 (e.g., first major surface 105). As shown, a precursor 1401 can be disposed on the first major surface 105 of the substrate 103 to form the one or more layers 223. In aspects, the one or more layers can be disposed using chemical vapor deposition (CVD) (e.g., low-pressure CVD, plasma-enhanced CVD (PECVD)), physical vapor deposition (PVD) (e.g., sputtering, evaporation, molecular beam epitaxy, ion plating), atomic layer deposition (ALD), spray pyrolysis, chemical bath deposition, sol-gel deposition. For example, step 1303 can use PECVD and/or PVD with the conditions discussed below for steps 1305 and 1307, respectively, with minor modifications to accommodate the composition of the material being disposed. The one or more layers can comprise one or more of the materials discussed above for the one or more layers 223. In aspects, the one or more layers can function as an antireflective stack.

[00135] After step 1301 or 1303, as shown in FIG. 15, methods can proceed to step 1305 comprising disposing the coating using plasma-enhanced chemical vapor deposition (PECVD) of a precursor. In aspects, as shown in FIG. 15, step 1305 can occur in a PECVD apparatus 1501 comprising a reaction chamber 1521. In further aspects, as shown, a radio frequency (RF) generator 1503 can be connected to an electrode 1517 for plasma generation, for example, through a matching network 1505. For example, the RF generator 1503 can oscillate at 13.56 MegaHertz (MHz). In further aspects, the RF generator 1503 can be connected to a power source 1507 comprising a nameplate power of about 2 kiloWatts (kW) or more, about 4 kW or more, about 10 kW or less, or about 7 kW or less, for example, in a range from about 2 kW to about 1 OkW, from about 4 kW to about 7 kW, or any range or subrange therebetween. In further aspects, a direct current (DC) bias voltage can be applied to the substrate 103 through a potential difference 1509 established between ground and a substrate holder 1531 on which the substrate 103 is disposed, for example, the second major surface 107 of the substrate 103 can contact a surface 1533 of the substrate holder 1531. In even further aspects, a direct current (DC) bias voltage can be applied to the substrate. In even further aspects, the DC bias voltage can be about -100 Volts (V) or less, about -200 V or less, about -250 V or less, ab out -400 V or more, about -350 V or more, or about -300 V or more. In even further aspects, the DC bias voltage can be in a range from about -100 V to about -400 V, from about -200 V to about -350 V, from about -250 V to about -300 V, or any range or subrange therebetween. In aspects, the reaction chamber 1521 can be maintained at a temperature of about 50°C or more, about 100°C or more, about 130°C or more, about 300°C or less, about 200°C or less, or about 170°C or less. In aspects, the reaction chamber canbe maintained at a temperature in a range from about 50°C to about 300°C, from about 100°C to about200°C, from about 130°C to about 170°C, or any range or subrange therebetween. In aspects, the reaction chamber can be under a vacuum at an absolute pressure of about 1 Pascal (Pa) or less, about 0.1 Pa or less, about 0.01 Pa or less, or about 0.005 Pa or less.

[00136] In aspects, as shown in FIG. 15, a working gas comprising a precursor can be fed through an inlet 1511 in a direction 1513, for example, from a precursor source 1527 towards the electrode 1517. In further aspects, the working gas can be introduced at an absolute working pressure of about 1 Pa or more, 5 Pa or more, 10 Pa or more, about 100 Pa or less, about 60 Pa or less, about 30 Pa or less, or about 20 Pa or less. In further aspects, the absolute working pressure can be in a range from about 1 Pa to about 100 Pa, from about 5 Pa to about 60, from about 5 Pa to about 30 Pa, from about 10 Pa to about 20 Pa, or any range or subrange therebetween. In further aspects, the precursor can comprise hydrogen, carbon, and silicon. In even further aspects, the precursor can further comprise at least one of oxygen and nitrogen. In still further aspects, the precursor can comprise a molecule comprising each of the above-mentioned atoms, for example, an alkyl silane with an amine functional group or an alkyl silane with a glycidyl, epoxy, or ether functional group . In still further aspects, the precursor can comprise a hydrocarbon, an ortho silicate, and hydrogen. As used herein, a hydrocarbon consists of hydrogen and carbon, for example, an alkane, an alkene, or an alkyne. An exemplary aspect of the hydrocarbon comprises methane. In yet further aspects, the hydrocarbon can comprise an alkane, and the orthosilicate can comprise an alkyl silicate. An exemplary aspect of the precursor comprises methane, tetraethylorthosilicate (TEOS), and hydrogen. In further aspects, the working gas can comprise an inert gas in addition to the precursor. For example, the inert gas can comprise helium, neon, argon, and/or krypton. In further aspects, the working gas can comprise a ratio on a standard cubic centim eter s (seem) basis of, for example, 1 part methane to 10 parts hydrogen at 2 parts argon (Ar), where the argon has been bubbled through the orthosilicate (e.g., TEOS). For example, the argon can be bubbled through the orthosilicate (e.g., TEOS) at an elevated temperature (e.g., from about 40°C to about 100°C, from about 50°C to about 60°C) and a vapor pressure of the orthosilicate can be in a range from about 1 kiloPascal (kPa) to about 15 kPa, from about 2 kPa to about 8 kPa, from about 3 kPa to about 5 kPa, or any range or subrange therebetween. In even further aspects, a ratio of hydrogen to methane on a seem basis can be about 5 or more, about 8 or more, about 20 or less, about 15 or less, or about 12 or less. In even further aspects, the ratio of hydrogen to methane on an seem basis can be in a range from about 5 to about 20, from about 8 to about 15, from about 8 to about 12, or any range of subrange therebetween. In even further aspects, a ratio of TEOS to methane on a seem basis can about 0.3 or more, about 0.5 or more, about 0.7 or more, about 1 or more, about 8 or less, about4 or less, about 2 or less, or about 1.5 or less. In even further aspects, the ratio of TEOS to methane on a seem basis can be in a range from about 0.3 to about 8, from about 0.5 to about4, from about 0.7 to about 2, from about 1 to about 1.5, or any range or subrange therebetween.

[00137] In aspects, as shown in FIG. 15, the working gas can be fed through the inlet 1511 and past the electrode 1517 to generate a plasma 1523. In further aspects, as shown, the working gas can be fed through a shower-head diffuser 1515 that can distribute the gas through a plurality of openings 1519 with one or more openings of the plurality of openings surrounded by the electrode 1517. In aspects, the plasma can dispose the coating on the substrate 103, as indicated by arrow 1525. In further aspects, the coating can be disposed directly on (i.e., contact) the first maj or surface 105 of the substrate 103. In further aspects, as indicated in dashed lines, the one or more layers 223 can be disposed on the substrate (e.g., from step 1303) such that the coating will contact the one or more layers 223 while still being disposed on the first major surface 105 of the substrate 103.

[00138] After step 1301 or 1303, as shown in FIG. 16, methods can proceed to step 1307 comprising disposing the coating using physical vapor deposition (PVD). PVD can comprise sputtering, evaporation, molecular beam epitaxy, and/or ion plating. In aspects, PVD can comprise sputtering, for example, DC magnetron sputtering. In further aspects, as shown in FIG. 16, sputtering can be performed using a sputtering apparatus 1601 comprising a sputtering target 1603 and the substrate 103 positioned in the reaction chamber 1621. In even further aspects, the substrate 103 can be positioned on and/or secured to a substrate holder 1631, for example, with the second major surface 107 of the substrate 103 contacting an outer surface 1633 of the substrate holder. In even further aspects, the sputtering target 1603 can be positioned on and/or secured to a target holder 1641.

[00139] In even further aspects, the sputtering target can comprise a source of carbon (e.g., graphite) and/or a source of silicon. In further aspects, as shown in FIG. 16, a working gas can be fed through an inlet 1611 in a direction 1613, for example, from a precursor source 1615. The working gas can comprise and/or form ions 1617 that can impact an outer surface 1605 of the sputtering target 1603, as indicated by arrow 1619, to eject material 1623 from the sputtering target, as indicated by arrow 1625. In even further aspects, the material 1623 can react with the working gas, as indicated by 1627, and be disposed on the substrate 103, as indicated by arrow 1629. In even further aspects, the working gas can comprise an inert gas and a precursor. In still further aspects, the precursor can comprise one or more of the materials discussed above for the precursor with reference to step 1305. For PVD, an exemplary aspect of a hydrocarbon for the working gas is acetylene. In even further aspects, the coating can be disposed directly on (i.e., contact) the first major surface 105 of the substrate 103. In even further aspects, as indicated in dashed lines, the one or more layers 223 can be disposed on the substrate (e.g., from step 1303) such that the coating will contact the one or more layers 223 while still being disposed on the first major surface 105 of the substrate 103.

[00140] After step 1305 or 1307, methods can proceed to step 1309 comprising assembling the coated article. In aspects, the coated article can be incorporated into another article. As discussed above, the coated article can be incorporated into a display device, for example, as a cover lens. As discussed above, with reference to FIG. 4, the coated article can be incorporated into a vehicle interior system as part of a display. It is to be understood that the coated article could be incorporated into any of the articles or applications discussed above. After step 1305, 1307, or 1309, methods ofthe disclosure according to the flow chart in FIG. 13 of makingthe substrate and/or coated article can be complete at step 1311.

[00141] In aspects, methods of making a coated article in accordance with aspects of the disclosure can proceed along steps 1301, 1303, 1305, 1309, and 1311 of the flow chart in FIG. 13 sequentially, as discussed above. In aspects, arrow 1302 can be followed from step 1301 to step 1305, for example, if the sub strate 103 already comprises one or more layers disposed thereon in step 1301 or if the coating 113 is to be disposed directly on the substrate 103 in step 1305. In aspects, arrow

1304 can be followed from step 1301 to step 1307, for example, if the coating is to be disposed using PVD rather than PECVD and either the substrate 103 already comprises one or more layers disposed thereon in step 1301 or if the coating 113 is to be disposed directly on the substrate 103 in step 1307. In aspects, arrow 1310 can be followed from step 1303 to step 1307, for example, if the coating is to be disposed using PVD rather than PECVD. In aspects, arrow 1306 can be followed from step

1305 to step 1311, for example, if the method is complete after the coating 113 is disposed in step 1305. In aspects, arrow 1308 can be followed from step 1307 to step 1311, for example, if the methodis complete after the coating 113 is disposed in step 1307. Any of the above options may be combined to make a coated article in accordance with aspects of the disclosure.

EXAMPLES

[00142] Various aspects will be further clarified by the following examples. Examples A-C and AA-BB comprise a glass-based substrate (Composition 1 having a nominal compositionin mol% of: 63.6 SiCE; 15.7 AI2O3; 10.8 Na2O; 6.2 Li₂O; 1.16 ZnO; 0.04 SnO₂; and 2.5 P₂O₅) with a substrate thickness 109 of 700 pm. Examples A-C were processed following the methods described above with the layers and/or coating comprising the material stated in Table 1. The coating for Examples A- C and BB was disposed using PECVD with a 13.56 MegaHertz (MHz) RF generator and a direct current (DC) bias voltage of -300 V applied to the substrate, where the generator was powered by a 6 kiloWatt (kW) power supply, the reaction chamber was maintained at 150°C under a vacuum at 16 milliPascal (mPa) (absolute). For Examples A-C, a working gas comprising methane (CH₄), hydrogen (H₂), tetraethylorthosilicate (TEOS), and argon (Ar) was introduced into the reaction chamber with a working pressure of 15 Pascals (Pa) (absolute). Specifically, the working gas for Examples A-C consisted of a ratio of 1 standard cubic centimeters (seem) of methane per 10 seem of hydrogen, 2 seem of argon, where the argon has been bubbled through TEOS at 50°C with a vapor pressure of the TEOS is 3.3 kPa. As used herein, seem refers to the equivalent flow rate at a temperature of 23 °C and a pressure of 101 kiloPascals (kPa). For Example BB, the working gas comprised methane (CH₄), hydrogen (H₂), and argon (Ar) with a working pressure of 15 Pa (absolute) and a ratio of 1 seem of methane per 10 seem of hydrogen and 2 seem of argon.

[00143] In Example A, the coating comprised a coating thickness of 125 nm and was directly disposed on the substrate (i.e., the coating contacted the substrate). Example A comprised a contact angle of 120°. Example BB is a comparative example comprising a diamond-like coating (DLC), which exhibited a contact angle of 56.4°.

[00144] For Example A, the surface (i.e., second surface area) of the coating comprised a surface roughnessRa of 15 nm, a surface roughness Rz of 263 nm, a surface roughness Rq of 18 nm, a skew Rsk of 0.164, and a kurtosis of 2.85. These properties indicate thatthe coating is hydrophobic and that the surface profile of the coating is skewed towards lower heights and is relatively flat. FIG. 7 schematically illustrates a scanning electron microscope (SEM) image of the surface of the coating of Example A. As shown in FIG. 7, the raised structures create a porous surface, which reduces a surface area accessible on a micrometer scale. A porosity of the coating was calculated based on FIG. 7, as discussed above. Example A comprised a porosity of 32%.

[00145] Example AA is a comparative example comprising an uncoated substrate. FIG. 8 shows transmittance on the vertical axis 803 (i.e., y-axis) over optical wavelengths on the horizontal axis 801 (i.e., x-axis). The transmittance profile for Example A is shown as curve 807 while the transmittance profile for Example AA is shown as curve 805. As shown in FIG. 8, the transmittance of Example A (curve 807) is greater than the transmittance of Example AA (curve 805) at every optical wavelength measured. For example, at 500 nm, Example A comprises a transmittance of about 93% while Example AA comprises a transmittance of about 91.5%. Averaged over optical wavelengths from 400 nm to 700 nm, Example A comprises an average transmittance of about 93.5%. As such, the coating can increase the transmittance of the coated article (Example A) relative to the substrate without the coating (Example AA), and the coated article can have a transmittance at 500 nm and an average transmittance greater than 91%, greater than 92%, and greater than about 93%.

[00146] FIG. 9 shows reflectance on the vertical axis 903 (i.e., y-axis) over optical wavelengths on the horizontal axis 801 (i.e., x-axis). The reflectance profile for Example A is shown as curve 905. The reflectance is less than 2% for every optical wavelength measured. For example, the reflectance at 500 nm is about 1.4% for Example A. Averaged over optical wavelengths from 400 nm to 700 nm, Example A comprises an average reflectance of about 1.5%.

[00147] FIG. 10 shows absorption on the vertical axis 1003 (left-side) and extinction coefficient on the vertical axis 1013 (right-side, in cm'¹) over optical wavelengths on the horizontal axis 801. Curve 1005 represents the absorption of Example A while curve 1015 represents the extinction coefficient of Example A. As shown in FIG. 10, the absorption is less than 2% for all optical wavelengths measured. Curve 1005 decreased as optical wavelength is increased from about 400 nm to about 480 nm. At 500 nm, Example A comprised an absorption of about 1 .17%. Averaged over optical wavelengths from 400 nm to 700 nm, Example A comprised an average absorption of about 0.60%. As shown in FIG. 10, the reflectanceis less than 5% for all optical wavelengths measured. Curve 1015 monotonically decreasing from about 0.01 cm at 380 nm to about 0.0002 cnr¹ at 780 nm. At 500 nm, Example A comprised an extinction coefficient of about 0.0077%. Averaged over optical wavelengths from 400 nm to 700 nm, Example A comprises an average extinction coefficient of about 0.006.

[00148] FIG. 11 shows refractive index on the vertical axis 1103 (i. e. , y-axis) over optical wavelengths on the horizontal axis 801 (i.e., x-axis). Curve 1105 represents the refractive index of Example A. As shown in FIG. 11, the refractive index of Example A monotonically and linearly decreases from 380 nm to 780 nm from about 1.44 at 380 nm to about 1 .16 at 780 nm. At 500 nm, Example A comprises a refractive index of 1.365. Averaged over optical wavelengths from 400 nm to 700 nm, Example A comprises an average refractive index of about 1 .326.

[00149] The coating of Example A was analyzed using energy dispersive X-ray analysis (EDX), which indicated that the coating comprised 13.5 atom% C, 56.6 atom% O, and 18.3 atom% Si with the balance being elements with less than 10 atom%. As discussed above, the EDX results do not include hydrogen. These results correspond to an atomic ratio of 1 part carbon to about 4.2 parts oxygen and 1.36 parts silicon. For example, if the composition of the above-mentioned elements were scaled to be 100 atomic% of the coating, the composition (on a hydrogen-free basis) would be about 15.3 atom% C, 64.0 atom% O, and 20.7 atom% Si.

[00150] Example A was subject to the moderate abrasion test described above. After 10,000 cycles, the coating of Example A was still intact. After 10,000 cycles, the surface of the coating of Example A comprised a contact angle of 70°C.

Table 1 : Materials disposed on substrate

[00151] As shown in Table 1, Examples B-C comprised five layers between the coating and the substrate. The materials for these layers are the same for both Examples B and C, namely Layers 1-5 alternate between silica (SiO₂) and niobium oxide (Nb₂O₅), where x is between 1 and 2.5. The thicknesses for Layers 1-4 are substantially the same between Examples B and C. The thickness of Layer 5 is about 7 nm less in Example C than in Example B, but the coating is about 5 nm thicker in Example C than in Example B. The total thickness of the materials disposed on the substrate in Examples B-C is about 275 nm. The coating of Examples B and C comprised a refractive index of 1 .36 at 500 nm.

[00152] The CIE color coordinates for Examples B and C are presented in Table 2. Examples B and C both comprise negative a* values (i.e., a* < 0) and b * values (i.e., b* < 0), which produced a bluish color. The CIE a* and b * values were greater for Example B than Example C, which gave Example B a stronger blue (e.g. , cyan) color than Example C. Both Examples B and C comprised b* values greater than -2 (e.g., from about -2 to about 2, from -2 to 0) and a* values greater than -2 e.g., from about -2 to about 2, from -2 to 0). Examples B and C comprise L* values greater than 1.5, namely, between 1.5 and2.

Table 2: CIE color coordinates

[00153] FIG. 12 shows reflectance on the vertical axis 1203 (i.e., y- axis) over optical wavelength on the horizontal axis 1201 (i.e., x-axis). Curve 1205 corresponds to the reflectance of Example B, and curve 1207 corresponds to the reflectance of Example C. As shown in FIG. 12, Example B comprises reflectance less than 0.02% at about 620 nm, and Example C comprises a reflectance less than 0.02% at about 440 nm. The reflectance curves for Examples B and C both comprise two minima at from about 430 nm to about 440 nm and from about 620 nm to about 630nm. Between these minima, Example C comprises a reflectance less than 0.3% while Example B comprises a reflectance of about 0.32% or less. From about 425 nm to about 650 nm, the reflectance of Examples B and C is less than about 0.32%. For Example B, an average reflectance over optical wavelengths from 400 nm to 700 nm is about 0.32%. For Example C, an average reflectance over optical wavelengths from 400 nm to 700 nm is about 0.41%.

[00154] The above observations can be combined to provide coated articles comprising a contact angle with deionized water of 90° or more . The coated article can comprise a substrate comprising a glass-based material and/or a ceramicbased material, which can provide good dimensional stability, good impact resistance, and/or good puncture resistance. The substrate comprising a glass-based material and/or a ceramic-based material can comprise one or more compressive stress regions, which can further provide increased impact resistance and/or increased puncture resistance.

[00155] The coating of the coated articles described herein can be porous and hydrophobic to reduce the transfer of material (e.g., fingerprint oils, water) onto a surface of the coating. Providing a porous coating can decrease a refractive index of the coating and beneficially decrease an accessible surface area for material to transfer onto. Providing a porous coating can increase the water contact angle, makingthe surface more hydrophobic. The coating can comprise a skew Rsk greater than 0 and a kurtosis Rku less than 3, which reduces a surface area for material to transfer onto. For example, the coating can function as an easy-to-clean coating and/or an anti-fingerprint coating. Further, the coating can be durable, for example, maintaining its properties after being repeated abraded. Providing the coating can increase transmittance and/or decrease reflectance of the coated article compared to a substrate without the coating. Providing a coating with a low refractive index can enable the coating to be disposed on top of or be included as an outermost layer in an anti-reflective stack.

[00156] Methods of the disclosure can be used to create coated articles using plasma-enhanced chemical vapor deposition (PECVD) and/or physical vapor deposition (PVD), which can produce the coating in a single-step process. Methods can enable the formation of interpenetrating networks of hydrogenated amorphous carbon with amorphous silicon oxide and/or amorphous silicon nitride, which can provide the above-mentioned benefits.

[00157] Directional terms as used herein — for example, up, down, right, left, front, back, top, bottom — are made only with reference to the figures as drawn and are not intended to imply absolute orientation.

[00158] It will be appreciated that the various disclosed aspects may involve features, elements, or steps that are describedin connection with that aspect. It will also be appreciated that a feature, element, or step, although described in relation to one aspects, may be interchanged or combined with alternate aspects in various non-illustrated combinations or permutations.

[00159] It is also to be understood that, as used herein the terms “the,”

“a,” or “an,” mean “at least one,” and should not be limited to “only one” unless explicitly indicated to the contrary. For example, reference to “a component” comprises aspects having two or more such components unless the context clearly indicates otherwise. Likewise, a “plurality” is intended to denote “more than one.”

[00160] As used herein, the term “about” means that amounts, sizes, formulations, parameters, and other quantities and characteristics are not and need not be exact, but may be approximate and/or larger or smaller, as desired, reflecting tolerances, conversion factors, rounding off, measurement error and the like, and other factors known to those of skill in the art. Ranges can be expressed herein as from “about” one particular value, and/orto “about” another particular value. When such a range is expressed, aspects include from the one particular value and/or to the other particular value. Similarly, when values are expressed as approximations, by use of the antecedent “about,” it will be understood that the particular value forms another aspect. Whether or not a numerical value or endpoint of a range in the specification recites “about,” the numerical value or endpoint of a range is intended to include two aspects: one modified by “about,” and one not modified by “about.” It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint and independently of the other endpoint.

[00161] The terms “substantial,” “substantially,” and variations thereof as used herein are intended to note that a described feature is equal or approximately equal to a value or description. For example, a “substantially planar” surface is intended to denote a surface that is planar or approximately planar. Moreover, as defined above, “substantially similar” is intended to denote thattwo values are equal or approximately equal. In aspects, “substantially similar” may denote values within about 10% of each other, for example, within about 5% of each other, or within about 2% of each other.

[00162] Unless otherwise expressly stated, it is in no way intended that any method set forth herein be construed as requiring that its steps be performed in a specific order. Accordingly, where a method claim does not actually recite an order to be followed by its steps or it is not otherwise specifically stated in the claims or descriptions that the steps are to be limited to a specific order, it is no way intended that any particular order be inferred.

[00163] While various features, elements, or steps of particular aspects may be disclosed using the transitional phrase “comprising,” it is to be understood that alternative aspects, including those that may be described using the transitional phrases “consisting of’ or “consisting essentially of,” are implied. Thus, for example, implied alternative aspects to an apparatus that comprises A+B+C include aspects where an apparatus consists of A+B+C and aspects where an apparatus consists essentially of A+B+C. As used herein, the terms “comprising” and “including”, and variations thereof shall be construed as synonymous and open-ended unless otherwise indicated.

[00164] The above aspects, and the features of those aspects, are exemplary and can be provided alone or in any combination with any one or more features of other aspects provided herein without departing from the scope of the disclosure.

[00165] It will be apparent to those skilled in the art that various modificationsand variations can be made to the present disclosure without departing from the spirit and scope of the disclosure. Thus, it is intended that the present disclosure cover the modifications and variations of the aspects herein provided they come within the scope of the appended claims and their equivalents.

Claims

What is claimed is:

1. A coated article comprising: a substrate comprising a first major surface; and a coating disposed on the substrate, the coating comprising a surface having a contact angle with deionized water of 90° or more, a refractive index of the coating is less than a refractive index of the substrate, and the coating comprising interpenetrating networks of hydrogenated amorphous carbon and amorphous silicon oxide.

2. The coated article of claim 1 , wherein the refractive index of the coating is in a range from about 1 .3 to about 1 .4.

3. The coated article of any one of claims 1 -2, wherein the refractive index of the coating is less than 1.37.

4. The coated article of any one of claims 1-3, wherein a thickness of the coating is in a range from about 0.1 nanometers to about 200 nanometers.

5. The coated article of any one of claims 1-4, wherein the contact angle is in a range from about 100° to about 140°.

6. The coated article of any one of claims 1-5, wherein the surface of the coating comprises at least one of a surface roughness Ra in a range from about 10 nanometers to about 20 nanometers, a surface roughness Rz in a range from about 100 nanometers to about 300 nanometers, and a skew Rsk in a range from 0 to about 0.3.

7. The coated article of any one of claims 1-6, wherein the surface coating comprises a kurtosis Rku less than 3.

8. The coated article of any one of claims 1-7, wherein an average transmittance of the coated article is about 91% or more averaged over optical wavelengths from 400 nanometers to 700 nanometers.

9. The coated article of any one of claims 1-8, wherein an average reflectance of the surface of the coating is about 2.0% or less averaged over optical wavelengths from 400 nanometers to 700 nanometers.

10. The coated article of any one of claims 1-9, wherein the coating comprises an extinction coefficient at 500 nanometers of about 0.01 cm^-1 or less.

11. The coated article of any one of claims 1-10, wherein a porosity of the coating is in a range from about 5% to about 50%.

12. The coated article of any one of clams 1-11, further comprising a layer disposed between the coating and the substrate, the layer comprising one or more of silicon oxide, silicon nitride, titanium oxide, or niobium oxide.

13. The coated article of claim 12, wherein the layer comprises a plurality of layers that functions as an anti-reflective stack.

14. The coated article of claim 13, wherein the refractive index of the coating is less than an outermost layer of the plurality of layers by about 0.05 or more.

15. The coated article of any oneof claims 1-14, wherein the coating comprises the contact angle is about 70° or more after the surface of the coating is abraded with cheesecloth for 10,000 cyclesin accordance with ISO 9211-4:2012.

16. The coated article of any one of claims 1-15, wherein the coated article comprises a CIE b* value in a range from 0 to about -6, wherein the coated article comprises a CIE a* value in a range from 0 to about -6.

17. The coated article of any oneof claims 1-16, wherein the coating is fluorine- free.

18. The coated article of any oneof claims 1-17, wherein the coating is nitrogen- free.

19. The coated article of any one of claims 1-17, where the coating further comprises amorphous silicon nitride.

20. The coated article of any one of claims 1-19, wherein the coating comprises an atomic ratio of silicon to carbon from about 0.7 to about 2.

21. The coated article of any one of claims 1 -20, wherein the coating comprises an atomic ratio of oxygen to carbon from about 2 to about 5.

22. The coated article of any one of claims 1-21, wherein the coating comprises a kinetic coefficient of friction of about 0.3 or less.

23. A method of forming a coated article comprising: disposing a coating over a substrate using physical vapor deposition of a precursor, the precursor comprising hydrogen, carbon, and silicon, the precursor further comprising at least one of oxygen or nitrogen, wherein a surface of the coating comprises a contact angle with deionized water of 90° or more, a refractive index of the coating is less than a refractive index of the substrate, and the coating comprising interpenetrating networks of the coating comprising interpenetrating networks of hydrogenated amorphous carbon and at least one of amorphous silicon oxide or amorphous silicon nitride.

24. The method of claim 23, wherein the precursor comprises methane, hydrogen, and an orthosilicate.

25. The method of any one of claims 23-24, wherein the refractive index of the coating is in a range from about 1.3 to about 1.4.

26. The method of any one of claims 23-25, wherein a thickness of the coating is in a range from about 0.1 nanometers to about 200 nanometers.

27. The method of any one of claims 23-26, wherein the coating comprises an atomic ratio of silicon to carbon from about 0.7 to about 2, wherein the coating comprises an atomic ratio of oxygen to carbon from about 2 to about 5.

28. The method of any one of claims 23-27, wherein the coating comprises a kinetic coefficient of friction of about 0.3 or less.

29. The method of any one of claims 23-28, further comprising disposing one or more layers before disposing the coating, wherein the one or more layers comprise one or more of silicon oxide, silicon nitride, titanium oxide, or niobium oxide.

30. The method of claim 29, wherein the layer comprises a plurality of layers that functions as an anti-reflective stack, wherein the refractive index of the coating is less than an outermost layer of the plurality of layers by about 0.05 or more.