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WO2022001449A1 - Polariseur à grille métallique, procédé de fabrication s'y rapportant et dispositif d'affichage - Google Patents

Polariseur à grille métallique, procédé de fabrication s'y rapportant et dispositif d'affichage Download PDF

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Publication number
WO2022001449A1
WO2022001449A1 PCT/CN2021/094596 CN2021094596W WO2022001449A1 WO 2022001449 A1 WO2022001449 A1 WO 2022001449A1 CN 2021094596 W CN2021094596 W CN 2021094596W WO 2022001449 A1 WO2022001449 A1 WO 2022001449A1
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WIPO (PCT)
Prior art keywords
wire grid
sub
wire
metal
grids
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Ceased
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PCT/CN2021/094596
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English (en)
Chinese (zh)
Inventor
王国强
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a metal wire grid polarizer, a manufacturing method thereof, and a display device.
  • Polarizing devices play a pivotal role in modern optical systems.
  • polarizers are used to reduce the impact of ambient reflected light on the display, and polarizers are added in front of photographic lenses to eliminate reflected light.
  • wire grid polarizers also have good polarization effects when the angle of incident light changes greatly. They are cheap, have good temperature adaptability, and are small in size, making them easy to use in microsystems. . Therefore, wire grid polarizers have advantages that traditional polarizers cannot match.
  • the main methods of making metal wire grid polarizers include: nano-imprint technology, electron beam direct writing exposure technology, X-ray lithography technology and holographic lithography technology.
  • the minimum separation distance between the adjacent two wire grids of the metal wire grid polarizer produced by the above method is relatively large, resulting in a small degree of polarization, which cannot meet the requirements for the degree of polarization of some products.
  • the technical problem to be solved by the present disclosure is to provide a metal wire grid polarizer, a manufacturing method thereof, and a display device, which can manufacture a metal wire grid polarizer with a high degree of polarization.
  • embodiments of the present disclosure provide a method for fabricating a metal wire grid polarizer, including:
  • the first sub-wire grid structure includes a plurality of first sub-wire grids parallel to each other, and the first sub-wire grid adopts a metal material;
  • a metal thin film with a thickness smaller than a first threshold is deposited on the substrate on which the first sub-wire grid structure is formed, and the metal thin film is deposited on the side of the first sub-wire grid away from the substrate to form a plurality of first Two sub-wire grids, the second sub-wire grid and the corresponding first sub-wire grid form a wire grid of the metal wire grid polarizer.
  • the method further includes:
  • the metal thin film on the substrate is etched as a whole, and the metal thin film in the spaced region between the first sub-wire grids is removed, and the etching thickness is smaller than the deposition thickness of the metal thin film.
  • the metal thin film includes: Al, Ag, Cu or Ir thin film.
  • the thickness of the metal thin film is greater than a second threshold, the first threshold is 500 nm, and the second threshold is 30 nm.
  • the deposited thickness of the metal thin film is 40-50 nm.
  • the etch thickness is 25-30 nm.
  • the longitudinal section of the first sub-wire grid perpendicular to its own extension direction is rectangular
  • the profile of the longitudinal section of the second sub-wire grid perpendicular to its own extension direction is a part of an ellipse.
  • the preparing the first sub-wire grid structure on the substrate includes:
  • the first sub-wire grid structure is prepared by using nano-imprinting technology.
  • the depositing a metal thin film with a thickness smaller than a first threshold on the substrate on which the first sub-wire grid structure is formed includes:
  • a layer of metal thin film is covered on the first sub-wire grid structure by sputtering.
  • the first sub-wire grid structure located on the substrate, the first sub-wire grid structure includes a plurality of first sub-wire grids parallel to each other, and the first sub-wire grid adopts a metal material;
  • the second sub-wire grid structure includes a plurality of second sub-wire grids, the second sub-wire grids are in one-to-one correspondence with the first sub-wire grids, each of the second sub-wire grids
  • the wire grid is located on a side of the corresponding first sub-wire grid away from the substrate, and the second sub-wire grid and the corresponding first sub-wire grid form a wire grid of the metal wire grid polarizer.
  • the distance between two adjacent first sub-grids is equal to D1; the minimum distance between two adjacent wire grids is equal to D2, and D2 is smaller than D1.
  • the longitudinal section of the first sub-wire grid perpendicular to its own extension direction is rectangular
  • the profile of the longitudinal section of the second sub-wire grid perpendicular to its own extension direction is a part of an ellipse.
  • the value range of D1 is 50-500 nm, and the value range of D2 is 20-450 nm.
  • An embodiment of the present disclosure is a display device including the metal wire grid polarizer as described above.
  • FIG. 1 is a schematic diagram of forming a first wire grid structure on a substrate according to an embodiment of the present disclosure
  • Fig. 2 is the sectional schematic diagram of Fig. 1 in AA' direction;
  • FIG. 3 is a schematic diagram of forming a second wire grid structure on a substrate according to an embodiment of the present disclosure
  • Fig. 4 is a schematic cross-sectional view in the direction AA' of Fig. 3 .
  • Some display products require the polarization degree of the wire grid polarizer to be greater than 99.986% to meet the contrast requirement. However, the existing process capability is temporarily unable to achieve the polarization degree of the metal wire grid polarizer greater than 99.986%, and the polarization degree uniformity is poor.
  • Some wire grid polarizers have a degree of polarization of only 99%. For example, in the related art, when a metal wire grid polarizer is fabricated by a nano-imprinting process, an embossing glue is formed on a substrate, nano-imprinting is performed to form an embossing glue pattern, a metal film is deposited on the imprinting glue pattern, and the pressure is removed. The rubber pattern is printed to obtain a metal wire grid polarizer. In this solution, the polarization degree of the metal wire grid polarizer can only reach about 99%.
  • a double-layer WGP wire grid polarizer
  • a first layer of metal wire grid is formed on the first surface of the substrate, and then a second layer is formed on the second surface of the substrate.
  • the metal wire grid, double-layer WGP process can increase the polarization degree of the metal wire grid polarizer to more than 99.99%, but the double-layer WGP (wire grid polarizer) process is complicated, the efficiency is low, and the first layer of metal wire The alignment requirements of the grid and the second-layer wire grid are high.
  • the preparation process includes: cleaning the substrate; depositing a metal film, such as an aluminum film, on the substrate; patterning the aluminum film; depositing a layer of SiO; Coating tackifier, IPA isopropyl alcohol and embossing glue in sequence; embossing the embossing glue to form an embossing glue pattern; etching the aluminum film with the embossing glue as a pattern to form the first layer of metal wire grid ; forming a flat layer; forming a buffer layer; depositing a metal film, such as an aluminum film; patterning the aluminum film; depositing a layer of SiO; The embossing glue is embossed to form an embossing glue pattern; the aluminum film is etched with the embossing glue as a pattern to form a second layer of metal wire grids.
  • Embodiments of the present disclosure provide a metal wire grid polarizer, a manufacturing method thereof, and a display device, which can manufacture a metal wire grid polarizer with a high degree of polarization.
  • Embodiments of the present disclosure provide a method for fabricating a metal wire grid polarizer, including:
  • the first sub-wire grid structure includes a plurality of first sub-wire grids parallel to each other, and the first sub-wire grid adopts a metal material;
  • a metal thin film with a thickness smaller than a first threshold is deposited on the substrate on which the first sub-wire grid structure is formed, and the metal thin film is deposited on the side of the first sub-wire grid away from the substrate to form a plurality of first Two sub-wire grids, the second sub-wire grid and the corresponding first sub-wire grid form a wire grid of the metal wire grid polarizer.
  • the degree of polarization is determined by the duty cycle of the wire grid polarizer and the height of the wire grid, where the duty cycle is the ratio of the wire width of the wire grid to the spacing between the wire grids, the wire grid.
  • the duty cycle is the ratio of the wire width of the wire grid to the spacing between the wire grids, the wire grid.
  • the first sub-wire grid structure and the second sub-wire grid structure constitute a metal wire grid polarizer
  • the second sub-wire grid structure is formed on the basis of the first sub-wire grid structure, which increases the height of the wire grid, Therefore, the degree of polarization of the wire grid polarizer can be improved; in this embodiment, the first sub-wire grid structure and the second sub-wire grid structure are fabricated on the same side of the substrate to avoid alignment deviation and ensure the wire grid polarizer.
  • the manufacturing process of this embodiment is simple, the production efficiency is high, and the cost of the metal wire grid polarizer is reduced.
  • the degree of polarization of the wire grid polarizer is further improved.
  • the degree of polarization of the wire grid polarizer can be increased to more than 99.986%, or even more than 99.998%.
  • a small amount of metal may be deposited in the spaced area between the first sub-wire grids, which affects the transmittance of the metal wire grid polarizer.
  • part of the metal thin film is located in the spaced area between the first sub-wire grids.
  • the metal thin film on the substrate needs to be etched as a whole to remove the first sub-wire grid.
  • the metal film in the spaced area between the wire grids can be completely removed by controlling the etching time; since only a small part of the metal is deposited between the first sub-wire grids. Therefore, the thickness of the etching is smaller than the thickness of the metal film.
  • the side of the first sub-wire grid away from the substrate still retains most of the metal film to form the second sub-wire grid.
  • the degree of polarization of the wire grid polarizer is improved under the condition of ensuring the transmittance of the wire grid polarizer.
  • the deposition thickness of the metal film can also be controlled to avoid deposition of the metal film in the spacer regions between the first sub-wire grids, or to reduce the thickness of the metal film deposition in the spacer regions between the first sub-wire grids.
  • the manufacturing method of the metal wire grid polarizer of this embodiment includes the following steps:
  • Step 1 As shown in FIG. 1 and FIG. 2, a first sub-wire grid structure is formed on the substrate 1, and the first sub-wire grid structure includes a plurality of first sub-wire grids 2 parallel to each other;
  • the first sub-wire grid structure may be prepared by using a nanoimprint technology.
  • an imprinting glue is formed on the substrate 1
  • nano-imprinting is performed to form an imprinting glue pattern
  • a metal film is deposited on the imprinting glue pattern
  • the imprinting glue pattern is removed, A first sub-wire grid structure is obtained.
  • the metal film in this step can be made of Al film.
  • the metal film in this step is not limited to the use of Al film, and Ag, Cu or Ir film can also be used .
  • the manufactured first sub-wire grid 2 has a rectangular longitudinal section perpendicular to its own extending direction.
  • the distances between adjacent first sub-grids 2 are all equal to D1.
  • Step 2 As shown in FIG. 3 and FIG. 4 , a metal film is deposited on the first sub-wire grid 2 to form a second sub-wire grid 3 .
  • a metal thin film can be deposited on the first sub-wire grid 2 by a sputtering method, and the sputtering method includes atomic layer deposition technology and magnetron sputtering technology.
  • the first sub-wire grid structure can be covered with a layer of metal thin film by the atomic layer deposition method.
  • this embodiment is not limited to the use of atomic layer deposition to form metal thin films, and magnetron sputtering can also be used to form metal thin films.
  • the metal thin films can be made It is only formed on the first sub-wire grid 2, and will not be deposited on the spaced regions between adjacent first sub-wire grids 2; Deposited to the spacer regions between adjacent first sub-wire grids 2 .
  • the metal film in this step can be made of Al film.
  • the metal film in this step is not limited to the use of Al film, and Ag, Cu or Ir film can also be used .
  • a metal film with a thickness of H may be deposited on the substrate 1 on which the first sub-wire grid structure is formed; when the metal film is deposited by magnetron sputtering, the By controlling the electric and magnetic fields, the metal thin film can be formed only on the first sub-wire grid 2, as shown in FIG.
  • the metal film on the substrate 1 needs to be etched as a whole to remove the space area between the adjacent first sub-wire grids 2.
  • part of the metal film on the top of the first sub-wire grid 2 is also removed, and the etching thickness K is less than H.
  • a second sub-wire grid structure is formed on the side away from the substrate.
  • a sub-wire grid structure, the second sub-wire grid structure includes a plurality of second sub-wire grids 3 parallel to each other, the second sub-wire grids 3 are in one-to-one correspondence with the first sub-wire grids 2, and each second sub-wire grid 2 3 is located on the side of the corresponding first sub-wire grid 2 away from the substrate 1.
  • Each second sub-wire grid 3 and the corresponding first sub-wire grid 2 form a wire grid of a metal wire grid polarizer.
  • the sub-wire grid structure and the second sub-wire grid structure constitute a metal wire grid polarizer. It can be seen from FIG. 4 that the longitudinal section of the first sub-wire grid 2 perpendicular to its own extension direction is rectangular, and the profile of the longitudinal section of the second sub-wire grid 3 perpendicular to its own extension direction is elliptical. part
  • the minimum distance between adjacent second sub-grids 3 is D2, and D2 is smaller than D1.
  • the minimum spacing between adjacent second sub-wire grids 3 also determines the minimum spacing between the wire grids of the metal wire grid polarizer.
  • the degree of polarization of the wire grid polarizer is proportional to the height of the wire grid, and increasing the thickness of the deposited metal film will also increase the degree of polarization of the wire grid polarizer, but if the thickness of the deposited metal film is too large, the adjacent The distance between the two sub-wire grids will be reduced to 0. Therefore, the thickness H of the metal film should be less than 500 nm, which can ensure that there is a certain gap between the adjacent second sub-wire grids.
  • the deposition thickness H of the metal film may be 40-50 nm, and the etching thickness K may be 25-30 nm.
  • the height of the wire grid structure of the metal wire grid polarizer is higher than that of the first sub-wire grid.
  • the height of the wire grid polarizer is about 25nm larger, which can increase the polarization degree of the metal wire grid polarizer to 99.999%.
  • An embodiment of the present disclosure also provides a metal wire grid polarizer, as shown in FIG. 3 and FIG. 4 , including:
  • the first sub-wire grid structure located on the substrate 1, the first sub-wire grid structure includes a plurality of first sub-wire grids 2 parallel to each other, and the first sub-wire grid 2 adopts a metal material;
  • a second sub-wire grid structure includes a plurality of second sub-wire grids 3, the second sub-wire grids 3 are in one-to-one correspondence with the first sub-wire grids 2, each of the The second sub-wire grid 3 is located on the side of the corresponding first sub-wire grid 2 away from the substrate 1 , and the second sub-wire grid 3 and the corresponding first sub-wire grid 2 constitute the metal wire grid polarizer. wire grid.
  • the degree of polarization is determined by the duty cycle of the wire grid polarizer and the height of the wire grid, where the duty cycle is the ratio of the wire width of the wire grid to the spacing between the wire grids, the wire grid.
  • the duty cycle is the ratio of the wire width of the wire grid to the spacing between the wire grids, the wire grid.
  • the first sub-wire grid structure and the second sub-wire grid structure constitute a metal wire grid polarizer
  • the second sub-wire grid structure is formed on the basis of the first sub-wire grid structure, which increases the height of the wire grid, Therefore, the degree of polarization of the wire grid polarizer can be improved; in this embodiment, the first sub-wire grid structure and the second sub-wire grid structure are fabricated on the same side of the substrate to avoid alignment deviation and ensure the wire grid polarizer.
  • the manufacturing process of this embodiment is simple, the production efficiency is high, and the cost of the metal wire grid polarizer is reduced.
  • a first sub-wire grid structure may be prepared on a substrate, and the first sub-wire grid structure includes a plurality of first sub-wire grids parallel to each other; A metal thin film with a thickness smaller than a first threshold is deposited on the substrate of the first sub-wire grid structure, and the metal thin film is deposited on the side of the first sub-wire grid away from the substrate to form a plurality of second sub-wire grids, The second sub-wire grid and the corresponding first sub-wire grid form a wire grid of the metal wire grid polarizer.
  • this embodiment when a metal thin film is deposited on the first sub-wire grid structure, part of the metal will be deposited on the sidewall of the first sub-wire grid, which can increase the width of the wire grid and reduce the distance between two adjacent wire grids , for example, the distance between two adjacent first sub-grids is equal to D1; the minimum distance D2 between two adjacent grids is smaller than D1.
  • this embodiment improves the duty cycle of the wire grid, and further improves the polarization degree of the metal wire grid polarizer.
  • the polarization degree of the metal wire grid polarizer can be increased to more than 99.986%, or even It can reach more than 99.998%.
  • the first sub-wire grid 2 can be made of Al.
  • the first sub-wire grid 2 is not limited to using Al, but also Ag, Cu or Ir;
  • the two sub-wire grids 3 can be made of Al.
  • the second sub-wire grid 3 is not limited to be made of Al, and can also be made of Ag, Cu or Ir.
  • the longitudinal section of the first sub-wire grid 2 in the direction perpendicular to its own extension may be rectangular; the longitudinal section of the second sub-wire grid 3 in the direction perpendicular to its own extension
  • the profile of the cross-section can be a part of an ellipse, a part of the second sub-wire grid 3 is located on the surface of the first sub-wire grid 2 away from the substrate 1, and the other part extends to the sidewall of the first sub-wire grid 2, which is the same as the first sub-wire grid 2.
  • the sub-wire grids together constitute the wire grid of the metal wire grid polarizer.
  • the minimum distance D2 between two adjacent second sub-wire grids 3 is 20-450 nm, that is, the minimum distance between two adjacent wire grids of the metal wire grid polarizer is 20-450 nm.
  • the value range of the distance D1 between the adjacent first sub-wire grids 2 is 50-500 nm. It can be seen that the minimum distance between two adjacent wire grids of the metal wire grid polarizer is smaller than the adjacent first sub-wires The distance D1 between the grids 2 can effectively improve the polarization degree of the wire grid polarizer.
  • the height of the wire grid of the wire grid polarizer can be about 25 nm larger than the height of the first sub-wire grid, and the polarization degree of the wire grid polarizer can be increased to 99.999%, which can meet the needs of various products .
  • Embodiments of the present disclosure also provide a display device including the metal wire grid polarizer as described above.
  • the display device includes but is not limited to: a radio frequency unit, a network module, an audio output unit, an input unit, a sensor, a display unit, a user input unit, an interface unit, a memory, a processor, and a power supply and other components.
  • a radio frequency unit a network module
  • an audio output unit an input unit, a sensor, a display unit, a user input unit, an interface unit, a memory, a processor, and a power supply and other components.
  • the structure of the above-mentioned display device does not constitute a limitation on the display device, and the display device may include more or less components described above, or combine some components, or arrange different components.
  • the display device includes, but is not limited to, a display, a mobile phone, a tablet computer, a television, a wearable electronic device, a navigation display device, and the like.
  • the display device can be any product or component with display function, such as LCD TV, LCD, digital photo frame, mobile phone, tablet computer, etc., wherein the display device also includes a flexible circuit board, a printed circuit board and a backplane.
  • sequence numbers of the steps are not used to limit the sequence of the steps.
  • the sequence of the steps can be changed without creative work. Also within the scope of protection of the present disclosure.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)

Abstract

L'invention concerne un polariseur à grille métallique et un procédé de fabrication s'y rapportant. Le polariseur à grille métallique comprend : un substrat (1) ; une première structure de grille de fils secondaires située sur le substrat (1), la première structure de grille de fils secondaires comprenant une pluralité de premières grilles de fils secondaires (2) parallèles les unes aux autres, les premières grilles de fils secondaires (2) étant constituées d'un matériau métallique ; et une seconde structure de grille de fils secondaires comprenant une pluralité de secondes grilles de fils secondaires (3), les secondes grilles de fils secondaires (3) correspondant une à une aux premières grilles de fils secondaires (2), chaque seconde grille de fils secondaires (3) étant située du côté de la première grille de fils secondaires correspondante (2) à l'opposé du substrat (1), les secondes grilles de fils secondaires (3) et les premières grilles de fils secondaires correspondantes (2) formant une grille métallique du polariseur à grille métallique. Le polariseur à grille métallique présente un degré de polarisation élevé.
PCT/CN2021/094596 2020-06-29 2021-05-19 Polariseur à grille métallique, procédé de fabrication s'y rapportant et dispositif d'affichage Ceased WO2022001449A1 (fr)

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CN202010607618.XA CN113933924A (zh) 2020-06-29 2020-06-29 金属线栅偏振器及其制作方法、显示装置
CN202010607618.X 2020-06-29

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CN104765094A (zh) * 2015-04-24 2015-07-08 张家港康得新光电材料有限公司 偏振结构、其制备方法与包含其的显示设备
CN110398799A (zh) * 2018-04-25 2019-11-01 迪睿合株式会社 偏振片和偏振片的制备方法
CN111090176A (zh) * 2020-01-08 2020-05-01 上海交通大学 一种反射不对称的金属光栅偏振分束器

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