WO2021093104A1 - Preparation method for flexible display panel, material of sacrificial layer, and preparation method therefor - Google Patents
Preparation method for flexible display panel, material of sacrificial layer, and preparation method therefor Download PDFInfo
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- WO2021093104A1 WO2021093104A1 PCT/CN2019/127899 CN2019127899W WO2021093104A1 WO 2021093104 A1 WO2021093104 A1 WO 2021093104A1 CN 2019127899 W CN2019127899 W CN 2019127899W WO 2021093104 A1 WO2021093104 A1 WO 2021093104A1
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- group
- core
- sacrificial layer
- organic solvent
- shell
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- 239000000463 material Substances 0.000 title claims abstract description 96
- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- 239000011162 core material Substances 0.000 claims abstract description 71
- 239000003960 organic solvent Substances 0.000 claims abstract description 66
- 239000011257 shell material Substances 0.000 claims abstract description 65
- 239000002245 particle Substances 0.000 claims abstract description 51
- 239000011258 core-shell material Substances 0.000 claims abstract description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 60
- 150000001875 compounds Chemical class 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 39
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 claims description 32
- 239000000376 reactant Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 29
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 claims description 22
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 claims description 22
- 239000011521 glass Substances 0.000 claims description 22
- 239000011148 porous material Substances 0.000 claims description 22
- DEDZSLCZHWTGOR-UHFFFAOYSA-N propylcyclohexane Chemical compound CCCC1CCCCC1 DEDZSLCZHWTGOR-UHFFFAOYSA-N 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 18
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 claims description 16
- 239000011824 nuclear material Substances 0.000 claims description 12
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 claims description 12
- 238000006116 polymerization reaction Methods 0.000 claims description 11
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 6
- 230000000996 additive effect Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000013067 intermediate product Substances 0.000 claims description 6
- 239000010420 shell particle Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 239000000377 silicon dioxide Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the application relates to the field of display panels, and in particular to a method for preparing a flexible display panel, sacrificial layer material and a method for preparing the same.
- a sacrificial layer is usually added to attach the flexible substrate to the glass substrate.
- a laser is used to peel off the flexible substrate and the glass substrate.
- the laser is used to irradiate the flexible substrate.
- the flexible substrate is ablated, causing the flexible substrate to warp, which in turn reduces the yield of the flexible display panel.
- the laser consumes a lot of energy, which makes the flexible display panel The cost of preparation has risen.
- the present application provides a preparation method of a sacrifice layer material, a sacrificial layer material, and a preparation method of a flexible display panel, so as to solve the problem of yield and production cost of the flexible display panel.
- the present application provides a sacrificial layer material
- the host material further includes a silane coupling agent.
- the host material further includes a photoinitiator.
- the particles further include a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
- This application provides a method for preparing a sacrificial layer material, including:
- a first compound and a first reactant are provided, the first compound and the first reactant form a core-shell material, the core-shell material includes a shell material and a core material, and the shell material covers the core material,
- An organic solvent is provided, the core-shell material is added to the organic solvent, the organic solvent is adsorbed in the core material, the shell material covers the organic solvent and the core material to form particles, the organic Solvents include one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene;
- the particles further include a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
- the core-shell material formed by the first compound and the first reactant has a first additive
- the first additive includes tert-butyl hydroperoxide and 2,2- One of dimethoxy-1,2-diphenylethane-1-one.
- the host material further includes a silane coupling agent.
- the host material further includes a photoinitiator.
- the present application provides a method for manufacturing a flexible display panel, including:
- An array layer and a light-emitting layer are sequentially arranged on the flexible substrate to form an intermediate product
- Heat treatment is performed on the intermediate product in a vacuum environment to vaporize the organic solvent in the particles, and peel the flexible substrate from the glass substrate.
- the host material further includes a silane coupling agent.
- the host material further includes a photoinitiator.
- the particles further include a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
- the step of forming the sacrificial layer on the glass substrate includes laser processing the sacrificial layer material to form a sacrificial layer.
- the present application provides a sacrificial layer material, a method for preparing a sacrificial layer, and a method for preparing a flexible display panel.
- a core-shell material is formed by a first compound and a first reactant, and the core-shell material includes a shell material and a core material, The shell material coats the core material to provide an organic solvent, and the obtained core-shell material is added to the organic solvent to form particles in which the shell material coats the organic solvent and the core material to provide a second compound , The obtained particles are mixed with the second compound to form a sacrificial layer material, and when the sacrificial layer material is used to prepare a flexible display panel, the organic solvent in the sacrificial layer material is vaporized by heating in a vacuum environment, thereby separating The flexible display panel and the glass substrate avoid the use of laser lift-off methods, thereby improving the yield of the flexible display panel and reducing the production cost.
- FIG. 1 is a cross-sectional view of a process for preparing a flexible display panel provided by this application.
- the sacrificial layer material includes host material and particles.
- the particles are dispersed in the host material.
- the particles include core-shell materials and organic solvents.
- the core-shell material includes a shell material and a core material.
- the shell material covers the core material and the organic solvent.
- the organic solvent is adsorbed in the core material.
- the sacrificial layer material is used in the manufacturing process of the flexible display panel.
- the host material further includes a silane coupling agent.
- the host material further includes a photoinitiator.
- the particles further include a porous material.
- the porous material covers the core material and all organic solvents.
- the shell material covers the porous material.
- the porous material may be silica.
- This application provides a method for preparing a sacrificial layer material, including:
- the core-shell material is composed of a core material and a shell material, the shell material covers the core material, the shell material is a first compound, and the structural formula of the first compound is
- the core material is prepared by the polymerization reaction of the first reactant, and the structural formula of the first reactant may be
- the A 1 group, the A 2 group and the A 3 group are selected from
- the X 1 group and the X 2 group are selected from
- the structural formula of the first reactant can be any structural formula of the first reactant.
- the general reaction formula for the polymerization reaction of the first reactant to form a core material may be:
- the shell material is added to deionized water, and then the core material is added to the shell material added with deionized water to form a core-shell material.
- the shell material and the core material form a core shell material in the first additive
- the first additive includes tert-butyl hydroperoxide and 2,2-dimethoxy-1 , One of 2-diphenylethane-1-one.
- the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene, and ethylbenzene.
- the structural formula of the first reactant may be any structural formula of the first reactant.
- the reaction formula for the first reactant to react to form the core material may be:
- the structural formula of the first reactant may be any structural formula of the first reactant.
- the reaction formula for the polymerization reaction of the first reactant to form the core material may be:
- the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene.
- an organic solvent is added to a core-shell material composed of a core material and a shell material to form particles in which the shell material covers the organic solvent and the core material, and the organic solvent includes a methyl group.
- a core-shell material composed of a core material and a shell material to form particles in which the shell material covers the organic solvent and the core material, and the organic solvent includes a methyl group.
- the reaction was continuously stirred at 60°C-120°C for 1 hour-10 hours, and dried to obtain the shell material Coating the core material And the microparticles of the methylcyclohexane.
- Toluene is added to it, and the reaction is continuously stirred at 60°C-120°C for 1 hour to 10 hours, and dried to obtain the shell material Coating the core material And the toluene particles.
- Methylcyclohexane is added to the porous silica, and the reaction is continuously stirred at 60 degrees Celsius to 120 degrees Celsius for 1 hour to 10 hours, and dried to obtain particles.
- the particles are made of the shell material Coating the porous silica, the porous silica coating the core material And methylcyclohexane.
- the structural formula of the second compound may be
- the second compound With the particles Mixed with toluene to form a sacrificial layer material.
- the structural formula of the second compound may be
- the second compound With the particles Mixed with toluene to form a sacrificial layer material.
- the structural formula of the second compound may be
- the second compound with the particles Toluene and porous silica are mixed to form the material of the sacrificial layer.
- the sacrificial layer material further includes a silane coupling agent.
- the sacrificial layer material further includes a photoinitiator.
- FIG. 1 is a cross-sectional view of a process for preparing a flexible display panel provided by this application.
- the present application provides a method for manufacturing a flexible display panel.
- the manufacturing method of the flexible display panel includes:
- a glass substrate 100 is provided.
- the glass substrate 100 is used to carry the structure constituting the flexible display panel.
- a sacrificial layer material is coated on the glass substrate 100 to form a sacrificial layer 200.
- the sacrificial layer 200 is attached to the glass substrate 100 by ultraviolet light or heating.
- a flexible substrate 300 is provided on the sacrificial layer 220.
- the structural formula of the host material may be The main body material Under heating or ultraviolet light, the host material A polymerization reaction occurs, so that the flexible substrate 300 is attached to the glass substrate 100.
- the reaction formula of the polymerization reaction may be:
- the host material Because of the main material After the polymerization reaction, the host material The adhesiveness is enhanced, so that the flexible substrate 300 is attached to the glass substrate 200, and because of the main material After the polymerization reaction occurs, the moisture resistance is improved, and at the same time, it can prevent the edge of the flexible display panel from being warped due to water absorption during cleaning during the manufacturing process of the flexible display panel.
- the array layer 400 and the light emitting layer 500 are sequentially arranged on the flexible substrate 300 to form an intermediate product 20.
- the intermediate product 20 is heated to 80 degrees Celsius to 150 degrees Celsius in a vacuum environment, so that the organic gas in the particles 210 is vaporized, and the adsorption force of the sacrificial layer 200 is reduced, so that the flexible substrate 300 and the glass substrate 100 glass to obtain a flexible display panel.
- the present application provides a sacrificial layer material, a method for preparing a sacrificial layer, and a method for preparing a flexible display panel.
- a core-shell material is formed by a first compound and a first reactant, and the core-shell material includes a shell material and a core material, The shell material coats the core material to provide an organic solvent, and the obtained core-shell material is added to the organic solvent to form particles in which the shell material coats the organic solvent and the core material to provide a second compound , The obtained particles are mixed with the second compound to form a sacrificial layer material, and when the sacrificial layer material is used to prepare a flexible display panel, the organic solvent in the sacrificial layer material is vaporized by heating in a vacuum environment, thereby separating The flexible display panel and the glass substrate avoid the use of laser lift-off methods, thereby improving the yield of the flexible display panel and reducing the production cost.
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Abstract
A material of a sacrificial layer (200), a preparation method for the material of the sacrificial layer (200), and a preparation method for a flexible display panel. The material of the sacrificial layer (200) comprises a main material (220) and particles (210), wherein the particles (210) are dispersed in the main material (220); the particles (210) comprise a core-shell material and an organic solvent; the core-shell material comprises a shell material and a core material; the shell material covers the core material and the organic solvent; and the organic solvent is adsorbed onto the core material.
Description
本申请涉及显示面板领域，具体涉及一种柔性显示面板的制备方法、牺牲层材料及其制备方法。The application relates to the field of display panels, and in particular to a method for preparing a flexible display panel, sacrificial layer material and a method for preparing the same.
目前，在柔性显示面板的的制作中，通常增加一层牺牲层将柔性基板贴附于玻璃基板上，柔性显示面板制程结束后，使用激光将柔性基板和玻璃基板剥离，但，使用激光照射柔性基板和玻璃基板时，柔性基板被烧蚀，造成了柔性基板翘曲，进而导致柔性显示面板的良率降低，且使用激光将柔性基板和玻璃基板剥离时，激光耗能大，使得柔性显示面板的制备成本升高。At present, in the manufacture of flexible display panels, a sacrificial layer is usually added to attach the flexible substrate to the glass substrate. After the flexible display panel is manufactured, a laser is used to peel off the flexible substrate and the glass substrate. However, the laser is used to irradiate the flexible substrate. When the substrate and the glass substrate are ablated, the flexible substrate is ablated, causing the flexible substrate to warp, which in turn reduces the yield of the flexible display panel. When the flexible substrate and the glass substrate are peeled off by the laser, the laser consumes a lot of energy, which makes the flexible display panel The cost of preparation has risen.
本申请提供一种牲层材料、牺牲层材料的制备方法及柔性显示面板的制备方法，以解决柔性显示面板的良率和生产成本问题。The present application provides a preparation method of a sacrifice layer material, a sacrificial layer material, and a preparation method of a flexible display panel, so as to solve the problem of yield and production cost of the flexible display panel.
本申请提供一种牺牲层材料，所述牺牲层材料包括主体材料和微粒，所述微粒分散于所述主体材料中，所述微粒包括核壳材料和有机溶剂，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料和所述有机溶剂，所述有机溶剂吸附于所述核材料，所述主体材料结构式选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，n＝1-20，所述壳材料的结构式为
其中， m
1＝1-2000，所述核材料选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合。
The present application provides a sacrificial layer material, the sacrificial layer material includes a host material and particles, the particles are dispersed in the host material, the particles include a core-shell material and an organic solvent, the core-shell material includes a shell material And a core material, the shell material covers the core material and the organic solvent, the organic solvent is adsorbed on the core material, and the structural formula of the host material is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, and the structural formula of the shell material is Wherein, m 1 =1-2000, and the nuclear material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Wherein, m 2 =2-2000, the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene.
本申请所提供的牺牲层材料中，所述主体材料还包括硅烷偶联剂。In the sacrificial layer material provided in the present application, the host material further includes a silane coupling agent.
本申请所提供的牺牲层材料中，所述主体材料还包括光引发剂。In the sacrificial layer material provided in the present application, the host material further includes a photoinitiator.
本申请所提供的牺牲层材料中，所述微粒还包括多孔材料，所述多孔材料包覆核材料和有机溶剂，所述壳材料包覆所述多孔材料。In the sacrificial layer material provided in the present application, the particles further include a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
本申请提供一种牺牲层材料的制备方法，包括：This application provides a method for preparing a sacrificial layer material, including:
提供第一化合物和第一反应物，所述第一化合物和所述第一反应物形成核壳材料，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料，所述第一化合物形成壳材料，所述第一化合物的结构式为
m
1＝1-2000，所述第一反应物进行聚合反应形成核材料，所述第一反应物选自
其中所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，n＝1-20，所述核材料选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000；
A first compound and a first reactant are provided, the first compound and the first reactant form a core-shell material, the core-shell material includes a shell material and a core material, and the shell material covers the core material, The first compound forms a shell material, and the structural formula of the first compound is m 1 =1-2000, the first reactant undergoes polymerization reaction to form a core material, and the first reactant is selected from Wherein the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, and the core material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Among them, m 2 =2-2000;
提供有机溶剂，将所述核壳材料加入所述有机溶剂中，所述有机溶剂吸附于所述核材料中，所述壳材料包覆所述有机溶剂和所述核材料形成微粒，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合；An organic solvent is provided, the core-shell material is added to the organic solvent, the organic solvent is adsorbed in the core material, the shell material covers the organic solvent and the core material to form particles, the organic Solvents include one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene;
提供第二化合物，将所述微粒与所述第二化合物混合形成牺牲层材料，所述第二化合物的结构式选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，其中，n＝1-20。
A second compound is provided, the particles are mixed with the second compound to form a sacrificial layer material, and the structural formula of the second compound is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , where n=1-20.
本申请所提供的牺牲层材料的制备方法中，所述微粒还包括多孔材料，所述多孔材料包覆核材料和有机溶剂，所述壳材料包覆所述多孔材料。In the method for preparing the sacrificial layer material provided in the present application, the particles further include a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
本申请所提供的牺牲层材料的制备方法中，在所述第一化合物和第一反应物形成核壳材料中具有第一添加剂，所述第一添加剂包括叔丁基氢过氧化物和2,2-二甲氧基-1,2-二苯乙烷-1-酮中的一种。In the method for preparing the sacrificial layer material provided in the present application, the core-shell material formed by the first compound and the first reactant has a first additive, and the first additive includes tert-butyl hydroperoxide and 2,2- One of dimethoxy-1,2-diphenylethane-1-one.
本申请所提供的牺牲层材料的制备方法中，所述主体材料还包括硅烷偶联剂。In the method for preparing the sacrificial layer material provided in the present application, the host material further includes a silane coupling agent.
本申请所提供的牺牲层材料的制备方法中，所述主体材料还包括光引发剂。In the method for preparing the sacrificial layer material provided in the present application, the host material further includes a photoinitiator.
本申请提供一种柔性显示面板的制备方法，包括：The present application provides a method for manufacturing a flexible display panel, including:
提供一玻璃基板；Provide a glass substrate;
在所述玻璃基板上涂覆牺牲层材料形成牺牲层，所述牺牲层材料包括主体材料和微粒，所述微粒分散于所述主体材料中，所述微粒包括核壳材料和有机溶剂，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料和所述有机溶剂，所述有机溶剂吸附于所述 核材料，所述主体材料结构式选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、CH
3、-C
nH
2n+1和-OC
nH
2n+1，n＝1-20，所述壳材料的结构式为
其中，m
1＝1-2000，所述核材料选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合；
A sacrificial layer material is coated on the glass substrate to form a sacrificial layer. The sacrificial layer material includes a host material and particles. The particles are dispersed in the host material. The particles include a core-shell material and an organic solvent. The core-shell material includes a shell material and a core material, the shell material covers the core material and the organic solvent, the organic solvent is adsorbed on the core material, and the structural formula of the host material is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, and the structural formula of the shell material is Wherein, m 1 =1-2000, and the nuclear material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Wherein, m 2 =2-2000, the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene;
在所述牺牲层上设置柔性基板；Setting a flexible substrate on the sacrificial layer;
在所述柔性基板上依次设置阵列层和发光层形成一中间产品；An array layer and a light-emitting layer are sequentially arranged on the flexible substrate to form an intermediate product;
对所述中间产品在真空环境下进行加热处理以汽化所述微粒中的有机溶剂，将所述柔性基板与所述玻璃基板剥离。Heat treatment is performed on the intermediate product in a vacuum environment to vaporize the organic solvent in the particles, and peel the flexible substrate from the glass substrate.
在本申请所提供的柔性显示面板的制备方法中，所述主体材料还包括硅烷偶联剂。In the method for preparing a flexible display panel provided by the present application, the host material further includes a silane coupling agent.
在本申请所提供的柔性显示面板的制备方法中，所述主体材料还包括光引发剂。In the method for manufacturing a flexible display panel provided by the present application, the host material further includes a photoinitiator.
在本申请所提供的柔性显示面板的制备方法中，所述微粒还包括多孔材料，所述多孔材料包覆所述核材料和所述有机溶剂，所述壳材料包覆所述多孔材料。In the method for manufacturing a flexible display panel provided in the present application, the particles further include a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
在本申请所提供的柔性显示面板的制备方法中，所述在所述玻璃基板上形成所述牺牲层的步骤中包括，对所述牺牲层材料进行激光处理，形成牺牲层。In the method for manufacturing a flexible display panel provided by the present application, the step of forming the sacrificial layer on the glass substrate includes laser processing the sacrificial layer material to form a sacrificial layer.
在本申请提供了一种牺牲层材料、牺牲层的制备方法及柔性显示面板的制备方法，通过第一化合物和第一反应物形成核壳材料，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料，提供有机溶剂，将得到的所述核壳材料加入所述有机溶剂中形成所述壳材料包覆所述有机溶剂和核材料的微粒，提供第二化合物，将得到的所述微粒与所述第二化合物混合形成牺牲层材料，采用所述牺牲层材料制备柔性显示面板时，通过在真空环境下加热处理使得牺牲层材料中的有机溶剂汽化，从而分离柔性显示面板和玻璃基板，从而避免使用激光剥离的方法，进而提高了柔性显示面板的的良率，并降低生产成本。The present application provides a sacrificial layer material, a method for preparing a sacrificial layer, and a method for preparing a flexible display panel. A core-shell material is formed by a first compound and a first reactant, and the core-shell material includes a shell material and a core material, The shell material coats the core material to provide an organic solvent, and the obtained core-shell material is added to the organic solvent to form particles in which the shell material coats the organic solvent and the core material to provide a second compound , The obtained particles are mixed with the second compound to form a sacrificial layer material, and when the sacrificial layer material is used to prepare a flexible display panel, the organic solvent in the sacrificial layer material is vaporized by heating in a vacuum environment, thereby separating The flexible display panel and the glass substrate avoid the use of laser lift-off methods, thereby improving the yield of the flexible display panel and reducing the production cost.
为了更清楚地说明本申请中的技术方案，下面将对实施方式描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施方式，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。In order to explain the technical solutions in this application more clearly, the following will briefly introduce the drawings needed in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the application. For those skilled in the art, without creative work, other drawings can be obtained based on these drawings.
图1为本申请所提供的制备柔性显示面板的流程剖视图。FIG. 1 is a cross-sectional view of a process for preparing a flexible display panel provided by this application.
下面将结合本申请实施方式中的附图，对本申请中的技术方案进行清楚、完整地描述。显然，所描述的实施方式仅仅是本申请一部分实施方式，而不是全部的实施方式。基于本申请中的实施方式，本领域技术人员在没有做出创造性劳动前提下所获得的所有其他实施方式，都属于本申请保护的范围。The technical solutions in the present application will be described clearly and completely in conjunction with the drawings in the embodiments of the present application. Obviously, the described implementations are only a part of the implementations of the present application, rather than all of the implementations. Based on the implementation in this application, all other implementations obtained by those skilled in the art without creative work fall within the protection scope of this application.
本申请提供一种牺牲层材料。所述牺牲层材料包括主体材料和微粒。所述微粒分散于所述主体材料中。所述微粒包括核壳材料和有机溶剂。所述核壳材料包括壳材料和核材料。所述壳材料包覆所述核材料和所述有机溶剂。所述有机溶剂吸附于所述核材料中。所述主体材料结构式选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和所述B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，n＝1-20，所述壳材料的结构式为
其中，m
1＝1-2000，所述核材料选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合。
This application provides a sacrificial layer material. The sacrificial layer material includes host material and particles. The particles are dispersed in the host material. The particles include core-shell materials and organic solvents. The core-shell material includes a shell material and a core material. The shell material covers the core material and the organic solvent. The organic solvent is adsorbed in the core material. The structural formula of the host material is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, the structural formula of the shell material for Wherein, m 1 =1-2000, and the nuclear material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Wherein, m 2 =2-2000, the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene.
所述牺牲层材料应用在柔性显示面板的制作过程中。通过第一反应物进行聚合反应形成的所述核材料，所述核材料结构式选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和所述B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，n＝1-20。在一些实施例中，所述核材料的结构式为
等，m
2＝2-2000。
The sacrificial layer material is used in the manufacturing process of the flexible display panel. The core material formed by the polymerization reaction of the first reactant, and the structural formula of the core material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Wherein, m 2 =2-2000, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20. In some embodiments, the structural formula of the nuclear material is Etc., m 2 =2-2000.
在另一实施例中，所述主体材料还包括硅烷偶联剂。In another embodiment, the host material further includes a silane coupling agent.
在另一实施例中，所述主体材料还包括光引发剂。In another embodiment, the host material further includes a photoinitiator.
在另一实施例中，所述微粒还包括多孔材料。所述多孔材料包覆所述核材料和所有机溶剂。所述壳材料包覆所述多孔材料。所述多孔材料可以为二氧化硅。In another embodiment, the particles further include a porous material. The porous material covers the core material and all organic solvents. The shell material covers the porous material. The porous material may be silica.
本申请提供一种牺牲层材料的制备方法，包括：This application provides a method for preparing a sacrificial layer material, including:
A、提供第一化合物和第一反应物，所述第一化合物和所述第一反应物形成核壳材料，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料，所述第一化合物形成壳材料，所述第一化合物的结构式为
m
1＝1-2000，所述第一反应物进行聚合反应形成核材料，所述第一反应物选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，n＝1-20，所述核材料选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000。
A. Provide a first compound and a first reactant, the first compound and the first reactant form a core-shell material, the core-shell material includes a shell material and a core material, and the shell material covers the core Material, the first compound forms a shell material, and the structural formula of the first compound is m 1 =1-2000, the first reactant undergoes polymerization reaction to form a core material, and the first reactant is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, and the core material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Wherein, m 2 =2-2000.
所述核壳材料由核材料和壳材料组成，所述壳材料包覆所述核材料，所述壳材料为第一化合物，所述第一化合物的结构式为The core-shell material is composed of a core material and a shell material, the shell material covers the core material, the shell material is a first compound, and the structural formula of the first compound is
所述第一反应物的结构式可以为
The structural formula of the first reactant can be
所述第一反应物进行聚合反应形成核材料的反应通式可以为：The general reaction formula for the polymerization reaction of the first reactant to form a core material may be:
其中，所述X
1’和所述X
2’选自
m
2＝2-2000。
Wherein, the X 1 'and the X 2 ' are selected from m 2 =2-2000.
在一种实施方式中，将所述壳材料加入到去离子水中，然后向所述加有去离子水的壳材料中加入所述核材料形成核壳材料。In one embodiment, the shell material is added to deionized water, and then the core material is added to the shell material added with deionized water to form a core-shell material.
在一种实施方式中，所述壳材料与所述核材料在所述第一添加剂中形成核壳材料，所述第一添加剂包括叔丁基氢过氧化物和2,2-二甲氧基-1,2-二苯乙烷-1-酮中的一种。In one embodiment, the shell material and the core material form a core shell material in the first additive, and the first additive includes tert-butyl hydroperoxide and 2,2-dimethoxy-1 , One of 2-diphenylethane-1-one.
在一种实施方式中，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合。In one embodiment, the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene, and ethylbenzene.
在一种实施例中，所述第一反应物的结构式可以为
In an embodiment, the structural formula of the first reactant may be
所述第一反应物进行反应形成所述核材料的反应式可以为：The reaction formula for the first reactant to react to form the core material may be:
在一种实施方式中，向加有去离子水的烧杯中，加入所述第一化合物
m
1＝1-2000，加入所述第一反应物
在60摄氏度-120摄氏度下搅拌均匀，然后加入叔丁基氢过氧化物为催化剂，反应2小时后，通过离心除去澄清液中未反应的所述第一反应物
冷冻干燥形成由所述壳材料
包覆所述核材料
组成的核壳材料，其中，m
1＝1-2000，m
2＝2-2000。
In one embodiment, the first compound is added to a beaker with deionized water m 1 =1-2000, add the first reactant Stir uniformly at 60°C-120°C, then add tert-butyl hydroperoxide as a catalyst, and after reacting for 2 hours, remove the unreacted first reactant in the clear liquid by centrifugation Freeze-dried to form the shell material Coating the core material The composition of the core-shell material, where m 1 =1-2000, m 2 =2-2000.
在一种实施例中，所述第一反应物的结构式可以为
In an embodiment, the structural formula of the first reactant may be
所述第一反应物进行聚合反应形成所述核材料的反应式可以为：The reaction formula for the polymerization reaction of the first reactant to form the core material may be:
在一种实施例中，向加有去离子水的烧杯中，加入所述第一化合物
m
1＝1-2000，加入所述第一反应物
在60摄氏度-120摄氏度下搅拌均匀，然后加入叔丁基氢过氧化物为催化剂，反应2小时后，然后通过离心除去澄清液中未反应所述第一反应物
冷冻干燥形成由所述壳材料
包覆所述核材料
组成的核壳材料，其中，m
1＝1-2000，m
2＝2-2000。
In one embodiment, the first compound is added to a beaker with deionized water m 1 =1-2000, add the first reactant Stir uniformly at 60 degrees Celsius-120 degrees Celsius, then add tert-butyl hydroperoxide as a catalyst, and after reacting for 2 hours, remove the unreacted first reactant from the clear liquid by centrifugation Freeze-dried to form the shell material Coating the core material The composition of the core-shell material, where m 1 =1-2000, m 2 =2-2000.
在一种实施方式中，向烧杯中加入多孔二氧化硅，将入乙醇溶液进行机械搅拌24小时， 使多孔二氧化硅的表面羟基活化，加入所述第一化合物
m
1＝1-2000，加入所述第一反应物
在60摄氏度-120摄氏度下搅拌均匀，然后加入叔丁基氢过氧化物为催化剂，反应2小时后，然后通过离心除去澄清液中未反应的所述第一反应物
冷冻干燥形成核壳材料，所述核壳材料由所述壳材料
包覆所述核材料
和所述多孔二氧化硅组成，其中，m
1＝1-2000，m
2＝2-2000。
In one embodiment, porous silica is added to the beaker, the ethanol solution is mechanically stirred for 24 hours to activate the surface hydroxyl groups of the porous silica, and the first compound is added m 1 =1-2000, add the first reactant Stir uniformly at 60 degrees Celsius-120 degrees Celsius, then add tert-butyl hydroperoxide as a catalyst, and react for 2 hours, then remove the unreacted first reactant in the clear liquid by centrifugation Freeze-drying to form a core-shell material, the core-shell material consists of the shell material Coating the core material And the porous silica composition, wherein m 1 =1-2000, m 2 =2-2000.
B、提供有机溶剂，将所述核壳材料加入所述有机溶剂中，所述有机溶剂吸附于所述核材料中，所述壳材料包覆所述有机溶剂和所述核材料形成微粒，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合。B. Provide an organic solvent, add the core-shell material to the organic solvent, the organic solvent is adsorbed in the core material, the shell material coats the organic solvent and the core material to form particles, so The organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene.
在一种实施方式中，将有机溶剂加入由核材料和壳材料组成的核壳材料，以形成所述壳材料包覆所述有机溶剂和所述核材料的微粒，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合。In one embodiment, an organic solvent is added to a core-shell material composed of a core material and a shell material to form particles in which the shell material covers the organic solvent and the core material, and the organic solvent includes a methyl group. One or a combination of cyclohexane, ethylcyclohexane, propylcyclohexane, toluene, and ethylbenzene.
在一种实施例中，所述核材料的结构式可以为
m
2＝2-2000，所述壳材料的结构式为
m
1＝1-2000，所述有机溶剂可以为甲基环己烷。
In an embodiment, the structural formula of the nuclear material may be m 2 =2-2000, the structural formula of the shell material is m 1 =1-2000, and the organic solvent may be methylcyclohexane.
在一种实施方式中，向所述核材料
和所述壳材料
中加入甲基环己烷，在60摄氏度-120摄氏度下不断搅拌反应1小时-10小时，干燥获得由所述壳材料
包覆所述核材料
和所述甲基环己烷的微粒。
In one embodiment, to the nuclear material And the shell material Methylcyclohexane was added to it, the reaction was continuously stirred at 60°C-120°C for 1 hour-10 hours, and dried to obtain the shell material Coating the core material And the microparticles of the methylcyclohexane.
在一种实施例中，所述核材料的结构式可以为
m
2＝2-2000，所述壳材料的结构式为
m
1＝1-2000，所述有机溶剂可以为甲苯。
In an embodiment, the structural formula of the nuclear material may be m 2 =2-2000, the structural formula of the shell material is m 1 =1-2000, and the organic solvent may be toluene.
在一种实施方式中，向所述核材料
和所述壳材料
中加入甲苯，在60摄氏度-120摄氏度下不断搅拌反应1小时-10小时，干燥获得由所述壳材料
包覆所述核材料
和所述甲苯的微粒。
In one embodiment, to the nuclear material And the shell material Toluene is added to it, and the reaction is continuously stirred at 60°C-120°C for 1 hour to 10 hours, and dried to obtain the shell material Coating the core material And the toluene particles.
在一种实施例中。所述核壳材料还包括多孔二氧化硅，所述核材料的结构式可以为
m
2＝2-2000，所述壳材料的结构式为
m
1＝1-2000，所述有机溶剂可以为甲基环己烷。
In one embodiment. The core-shell material also includes porous silica, and the structural formula of the core material may be m 2 =2-2000, the structural formula of the shell material is m 1 =1-2000, and the organic solvent may be methylcyclohexane.
在一种实施方式中，向所述核材料
所述壳材料
和多孔二氧化硅中加入甲基环己烷，在60摄氏度-120摄氏度下不断搅拌反应1小时-10小时，干燥获得微粒。所述微粒由所述壳 材料
包覆所述多孔二氧化硅，所述多孔二氧化硅包覆所述核材料
和甲基环己烷。
In one embodiment, to the nuclear material The shell material Methylcyclohexane is added to the porous silica, and the reaction is continuously stirred at 60 degrees Celsius to 120 degrees Celsius for 1 hour to 10 hours, and dried to obtain particles. The particles are made of the shell material Coating the porous silica, the porous silica coating the core material And methylcyclohexane.
C、提供第二化合物，将所述微粒与所述第二化合物混合形成牺牲层材料，所述第二化合物的结构式选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、-CH
3、-C
nH
2n+1和-OC
nH
2n+1，其中，n＝1-20。
C. Provide a second compound, mix the particles with the second compound to form a sacrificial layer material, and the structural formula of the second compound is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , where n=1-20.
在一种实施例中，所述第二化合物的结构式可以为
所述微粒可以由
和甲苯组成，其中，m
2＝2-2000，m
1＝1-2000。
In an embodiment, the structural formula of the second compound may be The particles can be made of And toluene composition, where m 2 =2-2000, m 1 =1-2000.
将所述第二化合物
与所述微粒
和甲苯混合形成牺牲层材料。
The second compound With the particles Mixed with toluene to form a sacrificial layer material.
在一种实施例中，所述第二化合物的结构式可以为
所述微粒可以由
和甲苯组成，其中，m
2＝2-2000，m
1＝1-2000。
In an embodiment, the structural formula of the second compound may be The particles can be made of And toluene composition, where m 2 =2-2000, m 1 =1-2000.
将所述第二化合物
与所述微粒
和甲苯混合形成牺牲层材料。
The second compound With the particles Mixed with toluene to form a sacrificial layer material.
在一种实施例中，所述第二化合物的结构式可以为
所述微粒可以由
甲苯和所述多孔二氧化硅组成，其中，m
2＝2-2000，m
1＝1-2000。
In an embodiment, the structural formula of the second compound may be The particles can be made of Toluene and the porous silica are composed, wherein m 2 =2-2000 and m 1 =1-2000.
将所述第二化合物
与所述微粒
甲苯和多孔二氧化硅混合形成牺牲层材料。
The second compound With the particles Toluene and porous silica are mixed to form the material of the sacrificial layer.
在一种实施例中，所述牺牲层材料还包括硅烷偶联剂。In an embodiment, the sacrificial layer material further includes a silane coupling agent.
在一种实施例中，所述牺牲层材料还包括光引发剂。In an embodiment, the sacrificial layer material further includes a photoinitiator.
请参阅图1，图1为本申请提供的一种制备柔性显示面板的流程剖视图。本申请提供一种柔性显示面板的制备方法。所述柔性显示面板的制备方法包括：Please refer to FIG. 1. FIG. 1 is a cross-sectional view of a process for preparing a flexible display panel provided by this application. The present application provides a method for manufacturing a flexible display panel. The manufacturing method of the flexible display panel includes:
提供一玻璃基板100。所述玻璃基板100用于承载组成柔性显示面板的结构。A glass substrate 100 is provided. The glass substrate 100 is used to carry the structure constituting the flexible display panel.
在所述玻璃基板100上涂覆牺牲层材料形成牺牲层200。通过紫外光或加热方式将所述牺牲层200贴附于所述玻璃基板100上。所述牺牲层材料包括主体材料220和微粒210， 所述微粒210分散于所述主体材料220中，所述微粒210包括核壳材料和有机溶剂，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料和所述有机溶剂，所述有机溶剂吸附于所述核材料中，所述主体材料结构式选自
其中，所述A
1基团、所述A
2基团和所述A
3基团选自
所述X
1基团和所述X
2基团选自
所述B
1基团和B
2基团选自-F、-CH
3、-C
nH
2n+1和OC
nH
2n+1，n＝1-20，所述壳材料的结构式为
其中，m
1＝1-2000，所述核材料选自
中的一种，其中，m
2＝2-2000，所述X
1’和所述X
2’选自
其中，m
2＝2-2000， 所述有机溶剂选自甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯。所述主体材料还包括光引发剂和硅烷偶联剂。
A sacrificial layer material is coated on the glass substrate 100 to form a sacrificial layer 200. The sacrificial layer 200 is attached to the glass substrate 100 by ultraviolet light or heating. The sacrificial layer material includes a host material 220 and particles 210, the particles 210 are dispersed in the host material 220, the particles 210 include a core-shell material and an organic solvent, the core-shell material includes a shell material and a core material, The shell material covers the core material and the organic solvent, the organic solvent is adsorbed in the core material, and the structural formula of the host material is selected from Wherein, the A 1 group, the A 2 group and the A 3 group are selected from The X 1 group and the X 2 group are selected from The B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and OC n H 2n+1 , n=1-20, and the structural formula of the shell material is Wherein, m 1 =1-2000, and the nuclear material is selected from One of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected from Wherein, m 2 =2-2000, and the organic solvent is selected from methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene. The host material also includes a photoinitiator and a silane coupling agent.
在所述牺牲层220上设置柔性基板300。在本实施例中，所述主体材料的结构式可以为
所述主体材料
在加热或紫外光的照射下，所述主体材料
发生聚合反应，使得所述柔性基板300贴附于所述玻璃基板100上。
A flexible substrate 300 is provided on the sacrificial layer 220. In this embodiment, the structural formula of the host material may be The main body material Under heating or ultraviolet light, the host material A polymerization reaction occurs, so that the flexible substrate 300 is attached to the glass substrate 100.
所述聚合反应的反应式可以为：The reaction formula of the polymerization reaction may be:
因所述主体材料
发生聚合反应后，所述主体材料
的粘合性增强，使得所述柔性基板300贴附于所述玻璃基板200上，且因为所述主体材料
发生聚合反应后抗湿性提高，同时可防止柔性显示面板制作过程中清洗时产生边缘吸水导致的翘曲的情况。
Because of the main material After the polymerization reaction, the host material The adhesiveness is enhanced, so that the flexible substrate 300 is attached to the glass substrate 200, and because of the main material After the polymerization reaction occurs, the moisture resistance is improved, and at the same time, it can prevent the edge of the flexible display panel from being warped due to water absorption during cleaning during the manufacturing process of the flexible display panel.
在所述柔性基板300上依次设置阵列层400和发光层500形成一中间产品20。The array layer 400 and the light emitting layer 500 are sequentially arranged on the flexible substrate 300 to form an intermediate product 20.
对所述中间产品20在真空环境下加热到80摄氏度-150摄氏度，使得所述微粒210内的有机气体汽化，降低了牺牲层200的吸附力，从而使得所述柔性基板300与所述玻璃基板100玻璃，获得柔性显示面板。The intermediate product 20 is heated to 80 degrees Celsius to 150 degrees Celsius in a vacuum environment, so that the organic gas in the particles 210 is vaporized, and the adsorption force of the sacrificial layer 200 is reduced, so that the flexible substrate 300 and the glass substrate 100 glass to obtain a flexible display panel.
在本申请提供了一种牺牲层材料、牺牲层的制备方法及柔性显示面板的制备方法，通过第一化合物和第一反应物形成核壳材料，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料，提供有机溶剂，将得到的所述核壳材料加入所述有机溶剂中形成所述壳材料包覆所述有机溶剂和核材料的微粒，提供第二化合物，将得到的所述微粒与所述第二化合物混合形成牺牲层材料，采用所述牺牲层材料制备柔性显示面板时，通过在真空环境下加热处理使得牺牲层材料中的有机溶剂汽化，从而分离柔性显示面板和玻璃基板，从而避免使用激光剥离的方法，进而提高了柔性显示面板的的良率，并降低生产成本。The present application provides a sacrificial layer material, a method for preparing a sacrificial layer, and a method for preparing a flexible display panel. A core-shell material is formed by a first compound and a first reactant, and the core-shell material includes a shell material and a core material, The shell material coats the core material to provide an organic solvent, and the obtained core-shell material is added to the organic solvent to form particles in which the shell material coats the organic solvent and the core material to provide a second compound , The obtained particles are mixed with the second compound to form a sacrificial layer material, and when the sacrificial layer material is used to prepare a flexible display panel, the organic solvent in the sacrificial layer material is vaporized by heating in a vacuum environment, thereby separating The flexible display panel and the glass substrate avoid the use of laser lift-off methods, thereby improving the yield of the flexible display panel and reducing the production cost.
以上对本申请实施方式提供了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施方式的说明只是用于帮助理解本申请。同时，对于本领域的 技术人员，依据本申请的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本申请的限制。The above provides a detailed introduction to the implementation of the application, and specific examples are used in this article to illustrate the principles and implementations of the application, and the description of the implementations above is only used to help understand the application. At the same time, for those skilled in the art, according to the idea of the application, there will be changes in the specific implementation and the scope of application. In summary, the content of this specification should not be construed as a limitation to the application.
Claims (14)
- 一种牺牲层材料，其中，所述牺牲层材料包括主体材料和微粒，所述微粒分散于所述主体材料中，所述微粒包括核壳材料和有机溶剂，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料和所述有机溶剂，所述有机溶剂吸附于所述核材料，所述主体材料结构式选自其中，所述A 1基团、所述A 2基团和所述A 3基团选自
所述X 1基团和所述X 2基团选自
所述B 1基团和B 2基团选自-F、-CH 3、-C nH 2n+1和-OC nH 2n+1，n＝1-20，所述壳材料的结构式为
其中，m 1＝1-2000，所述核材料的结构式选自
中的一种，其中，m 2＝2-2000，所述X 1’和所述X 2’选自
所述有机溶剂包括 甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合。 A sacrificial layer material, wherein the sacrificial layer material includes a host material and particles, the particles are dispersed in the host material, the particles include a core-shell material and an organic solvent, and the core-shell material includes a shell material and particles. The core material, the shell material covers the core material and the organic solvent, the organic solvent is adsorbed on the core material, and the structural formula of the host material is selected from
Wherein, the A 1 group, the A 2 group and the A 3 group are selected fromThe X 1 group and the X 2 group are selected fromThe B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, and the structural formula of the shell material isWherein, m 1 =1-2000, and the structural formula of the nuclear material is selected fromOne of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected fromThe organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene. - 如权利要求1所述的牺牲层材料，其中，所述主体材料还包括硅烷偶联剂。The sacrificial layer material of claim 1, wherein the host material further comprises a silane coupling agent.
- 如权利要求1所述的牺牲层材料，其中，所述主体材料还包括光引发剂。The sacrificial layer material of claim 1, wherein the host material further includes a photoinitiator.
- 如权利要求1所述的牺牲层材料，其中，所述微粒还包括多孔材料，所述多孔材料包覆所述核材料和所述有机溶剂，所述壳材料包覆所述多孔材料。The sacrificial layer material of claim 1, wherein the particles further comprise a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
- 一种牺牲层材料的制备方法，其包括：A preparation method of sacrificial layer material, which includes:提供第一化合物和第一反应物，所述第一化合物和所述第一反应物形成核壳材料，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料，所述第一化合物形成壳材料，所述第一化合物的结构式为m 1＝1-2000，所述第一反应物进行聚合反应形成核材料，所述第一反应物的结构式选自
其中，所述A 1基团、所述A 2基团和所述A 3基团选自
所述X 1基团和所述X 2基团选自
所述B 1基团和B 2基团选自-F、-CH 3、-C nH 2n+1和OC nH 2n+1，n＝1-20，所述核材料的结构式选自
中的一种，其中，m 2＝2-2000，所述X 1’和所述X 2’选自
其中，m 2＝2-2000； A first compound and a first reactant are provided, the first compound and the first reactant form a core-shell material, the core-shell material includes a shell material and a core material, and the shell material covers the core material, The first compound forms a shell material, and the structural formula of the first compound is
m 1 =1-2000, the first reactant undergoes polymerization reaction to form a core material, and the structural formula of the first reactant is selected fromWherein, the A 1 group, the A 2 group and the A 3 group are selected fromThe X 1 group and the X 2 group are selected fromThe B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and OC n H 2n+1 , n=1-20, and the structural formula of the core material is selected fromOne of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected fromAmong them, m 2 =2-2000;提供有机溶剂，将所述核壳材料加入所述有机溶剂中，所述有机溶剂吸附于所述核材料中，所述壳材料包覆所述有机溶剂和所述核材料形成微粒，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合；An organic solvent is provided, the core-shell material is added to the organic solvent, the organic solvent is adsorbed in the core material, the shell material covers the organic solvent and the core material to form particles, the organic Solvents include one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene;提供第二化合物，将所述微粒与所述第二化合物混合形成牺牲层材料，所述第二化合物的结构式选自其中，所述A 1、所述A 2基团和所述A 3基团选自
所述X 1基团和所述X 2基团选自
所述B 1基团和所述B 2基团选自-F、-CH 3、-C nH 2n+1和-OC nH 2n+1，其中，n＝1-20。 A second compound is provided, the particles are mixed with the second compound to form a sacrificial layer material, and the structural formula of the second compound is selected from
Wherein, the A 1 , the A 2 group and the A 3 group are selected fromThe X 1 group and the X 2 group are selected fromThe B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , where n=1-20. - 如权利要求5所述的牺牲层材料的制备方法，其中，所述微粒还包括多孔材料，所述多孔材料包覆核材料和有机溶剂，所述壳材料包覆所述多孔材料。5. The method for preparing a sacrificial layer material according to claim 5, wherein the particles further comprise a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material.
- 如权利要求5所述的牺牲层材料的制备方法，其中，在所述第一化合物和第一反应物形成核壳材料中具有第一添加剂，所述第一添加剂包括叔丁基氢过氧化物和2,2-二甲氧基-1,2-二苯乙烷-1-酮中的一种。The method for preparing a sacrificial layer material according to claim 5, wherein the core-shell material formed by the first compound and the first reactant has a first additive, and the first additive includes tert-butyl hydroperoxide and 2 , One of 2-dimethoxy-1,2-diphenylethane-1-one.
- 如权利要求5所述的牺牲层材料的制备方法，其中，所述主体材料还包括硅烷偶联剂。8. The method for preparing a sacrificial layer material according to claim 5, wherein the host material further comprises a silane coupling agent.
- 如权利要求5所述的牺牲层材料的制备方法，其中，所述主体材料还包括光引发剂。8. The method for preparing a sacrificial layer material according to claim 5, wherein the host material further comprises a photoinitiator.
- 一种柔性显示面板的制备方法，其包括：A method for preparing a flexible display panel, which includes:提供一玻璃基板；Provide a glass substrate;在所述玻璃基板上涂覆牺牲层材料形成牺牲层，所述牺牲层材料包括主体材料和微粒， 所述微粒分散于所述主体材料中，所述微粒包括核壳材料和有机溶剂，所述核壳材料包括壳材料和核材料，所述壳材料包覆所述核材料和所述有机溶剂，所述有机溶剂吸附于所述核材料，所述主体材料结构式选自
其中，所述A 1基团、所述A 2基团和所述A 3基团选自
所述X 1基团和所述X 2基团选自
所述B 1基团和B 2基团选自-F、-CH 3、-C nH 2n+1和-OC nH 2n+1，n＝1-20，所述壳材料的结构式为
其中，m 1＝1-2000，所述核材料的结构式选自
中的一种，其中，m 2＝2-2000，所述X 1’和所述X 2’选自
其中，m 2＝2-2000，所述有机溶剂包括甲基环己烷、乙基环己烷、丙基环己烷、甲苯和乙基苯中的一种或几种组合； A sacrificial layer material is coated on the glass substrate to form a sacrificial layer. The sacrificial layer material includes a host material and particles. The particles are dispersed in the host material. The particles include a core-shell material and an organic solvent. The core-shell material includes a shell material and a core material, the shell material covers the core material and the organic solvent, the organic solvent is adsorbed on the core material, and the structural formula of the host material is selected from
Wherein, the A 1 group, the A 2 group and the A 3 group are selected fromThe X 1 group and the X 2 group are selected fromThe B 1 group and the B 2 group are selected from -F, -CH 3 , -C n H 2n+1 and -OC n H 2n+1 , n=1-20, and the structural formula of the shell material isWherein, m 1 =1-2000, and the structural formula of the nuclear material is selected fromOne of, wherein m 2 =2-2000, and the X 1 ′ and the X 2 ′ are selected fromWherein, m 2 =2-2000, the organic solvent includes one or a combination of methylcyclohexane, ethylcyclohexane, propylcyclohexane, toluene and ethylbenzene;在所述牺牲层上设置柔性基板；Setting a flexible substrate on the sacrificial layer;在所述柔性基板上依次设置阵列层和发光层形成一中间产品；An array layer and a light-emitting layer are sequentially arranged on the flexible substrate to form an intermediate product;对所述中间产品在真空环境下进行加热处理以汽化所述微粒中的有机溶剂，将所述柔性基板与所述玻璃基板剥离。Heat treatment is performed on the intermediate product in a vacuum environment to vaporize the organic solvent in the particles, and peel the flexible substrate from the glass substrate. - 如权利要10所述的柔性显示面板的制备方法，其中，所述主体材料还包括硅烷偶联剂。10. The method for manufacturing a flexible display panel according to claim 10, wherein the host material further comprises a silane coupling agent.
- 如权利要求10所述的柔性显示面板的制备方法，其中，所述主体材料还包括光引发剂。10. The method of manufacturing a flexible display panel according to claim 10, wherein the host material further comprises a photoinitiator.
- 如权利要求10所述的柔性显示面板的制备方法，其中，所述微粒还包括多孔材料，所述多孔材料包覆所述核材料和所述有机溶剂，所述壳材料包覆所述多孔材料。The method for manufacturing a flexible display panel according to claim 10, wherein the particles further comprise a porous material, the porous material covers the core material and the organic solvent, and the shell material covers the porous material .
- 如权利要求10所述的柔性显示面板的制备方法，其中，所述在所述玻璃基板上形成所述牺牲层的步骤中包括，对所述牺牲层材料进行激光处理，形成牺牲层。10. The method for manufacturing a flexible display panel according to claim 10, wherein the step of forming the sacrificial layer on the glass substrate comprises laser processing the sacrificial layer material to form a sacrificial layer.
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