WO2020211547A1 - Digital microfluidic substrate and digital microfluidic chip - Google Patents
Digital microfluidic substrate and digital microfluidic chip Download PDFInfo
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- WO2020211547A1 WO2020211547A1 PCT/CN2020/077147 CN2020077147W WO2020211547A1 WO 2020211547 A1 WO2020211547 A1 WO 2020211547A1 CN 2020077147 W CN2020077147 W CN 2020077147W WO 2020211547 A1 WO2020211547 A1 WO 2020211547A1
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- driving
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- insulating layer
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- 239000000758 substrate Substances 0.000 title claims abstract description 140
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 230000000149 penetrating effect Effects 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 20
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- 239000007769 metal material Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- 239000011733 molybdenum Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
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- 230000035945 sensitivity Effects 0.000 description 2
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- 238000006243 chemical reaction Methods 0.000 description 1
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
Definitions
- the present disclosure relates to the technical field of microfluidics, and in particular to a digital microfluidic substrate and a digital microfluidic chip.
- Microfluidic technology can integrate basic operation units such as sample preparation, reaction, separation, and detection in biological, chemical, and medical analysis processes on a micron-scale chip, automatically completing the entire analysis process, because it can reduce costs and short detection time , High sensitivity and other advantages, has shown great prospects in biology, chemistry, medicine and other fields.
- the present disclosure provides a digital microfluidic substrate, including:
- a driving transistor which is arranged on the first substrate
- a metal layer including a source electrode and a drain electrode of the driving transistor and a first driving electrode electrically connected to one of the source electrode and the drain electrode;
- a second driving electrode, the second driving electrode is electrically connected to the first driving electrode through a via hole penetrating the insulating layer;
- the first ground electrode is disposed in the insulating layer and between the metal layer and the second driving electrode.
- the second driving electrode is configured to drive the movement of liquid droplets on the digital microfluidic substrate according to the state of the driving transistor.
- the insulating layer includes a first insulating layer covering the driving transistor and the first driving electrode, and a second insulating layer covering the first ground electrode and the first insulating layer.
- the orthographic projection of the first ground electrode on the first substrate covers the orthographic projection of the active layer of the driving transistor on the first substrate, and the material of the first ground electrode It is a non-transparent metal material.
- the driving transistor includes a plurality of driving transistors arranged in an array
- the digital microfluidic substrate further includes a plurality of gate signal lines extending in a row direction and a plurality of source signal lines extending in a column direction;
- the sources of the plurality of driving transistors are respectively connected to the plurality of source signal lines, and the gates of the plurality of driving transistors are respectively connected to the plurality of gate signal lines;
- the orthographic projection of the first ground electrode on the first substrate covers the orthographic projection of the gate signal line and the source signal line on the first substrate.
- the orthographic projection of the first ground electrode on the first substrate covers the first area of the first substrate, and the first area is the first area of the first substrate except for the via hole. The area outside the area covered by the orthographic projection on the first substrate.
- the driving transistor includes a gate provided on the first substrate, a third insulating layer covering the gate, an active layer provided on the third insulating layer, and the drain
- the electrode is arranged on the active layer
- the first driving electrode is arranged on the third insulating layer
- the drain and the first driving electrode are integrally formed.
- the sum of the projected area of the drain of the drive transistor and the first drive electrode on the first substrate is smaller than the projected area of the second drive electrode on the first substrate.
- the thickness of the first ground electrode is 10 nm-1000 nm.
- the digital microfluidic substrate further includes a first dielectric layer covering the second driving electrode and a first hydrophobic layer disposed on a side of the first dielectric layer away from the first substrate.
- the present disclosure provides a digital microfluidic chip, including the above-mentioned digital microfluidic substrate and a counter substrate disposed opposite to the digital microfluidic substrate, and the counter substrate includes a second substrate And the second ground electrode, the second dielectric layer and the second hydrophobic layer which are sequentially arranged on the side of the second substrate facing the microfluidic chip, and the droplets are arranged between the first hydrophobic layer and the second hydrophobic layer between.
- Figure 1 shows a schematic structural diagram of a traditional digital microfluidic substrate
- Figure 2 shows a schematic structural diagram of a digital microfluidic substrate according to an embodiment of the present disclosure
- Figure 3 shows a plan view of a digital microfluidic substrate according to an embodiment of the present disclosure
- FIG. 4 shows a cross-sectional view taken along a line parallel to the extending direction of the source signal line in FIG. 3 in an embodiment of the present disclosure
- FIG. 5 shows a cross-sectional view taken along a line parallel to the extending direction of the gate signal line in FIG. 3 in an embodiment of the present disclosure
- Fig. 6 shows a schematic structural diagram of a digital microfluidic chip according to an embodiment of the present disclosure.
- the digital microfluidic substrate includes a first substrate 111, a gate 112, a first insulating layer 113, an active layer 114, a source 115, a drain 116, a second insulating layer 117, a driving electrode 118,
- the dielectric layer 119 and the hydrophobic layer 120, the driving electrode 118 is connected to the drain 116 through a via hole penetrating the second insulating layer 117, and the driving voltage is applied to the driving electrode 118 to drive the droplets.
- the digital microfluidic substrate requires a high driving voltage, generally tens of volts or even hundreds of volts, and the storage capacitance in the current digital microfluidic substrate is small, resulting in a faster leakage rate of the driving voltage, which affects The driving effect of the droplet.
- the embodiment of the present disclosure provides a digital microfluidic substrate, including: a first substrate 21, a driving transistor 22 and a first driving electrode 23 provided on the first substrate 21, and covering the driving transistor 22 and the first driving electrode 23
- the first insulating layer 24; on the first insulating layer 24 is provided with a first ground electrode 25, the digital microfluidic substrate also includes a second insulating layer 26 covering the first ground electrode 25 and the first insulating layer 24, and set
- the second driving electrode 27 on the second insulating layer 26 is connected to the first driving electrode 23 through a via hole penetrating the second insulating layer 26 and the first insulating layer 24, and the first driving electrode 23 is connected to the driving The drain 225 of the transistor 22 is connected.
- the first driving electrode 23 may be connected to the source electrode 224 of the driving transistor 22.
- the driving transistor 22 includes a gate electrode 221 disposed on the first substrate 21, a third insulating layer 222 covering the gate electrode 221, an active layer 223 disposed on the third insulating layer 222, and a third insulating layer 223 partially covering the third insulating layer.
- the driving electrode 23 can be fabricated at the same time, so that the drain electrode 225 and the first driving electrode 23 are integrally formed, which makes the fabrication process of the digital microfluidic substrate easier.
- the portion of the drain electrode 225 located on the third insulating layer 222 may be used as the first driving electrode.
- the drain 225 and the first driving electrode 23 may not be an integrally formed structure.
- the drain 225 and the first driving electrode 23 are manufactured in two separate steps, but the drain of the manufactured first driving electrode 23 and the driving transistor 22 is ensured. Pole 225 connection.
- the driving transistor 22 By applying a gate voltage to the gate 221 of the driving transistor 22, the driving transistor 22 is turned on, and then a driving voltage is applied to the source 224 of the driving transistor 22, so that the drain 225 of the driving transistor 22 is applied with a driving voltage.
- the drain 225 of the driving transistor 22 is connected to the first driving electrode 23, and the second driving electrode 27 is connected to the first driving electrode 23 through a via hole penetrating the second insulating layer 26 and the first insulating layer 24, so that the second driving electrode 27 is also applied with a driving voltage. Therefore, the driving of the droplets can be realized based on the driving voltage on the second driving electrode 27.
- the first ground electrode 25 is arranged between the first driving electrode 23 and the second driving electrode 27, so that the first driving electrode 23 and the first ground electrode 25 and the second A plate capacitor is formed between the driving electrode 27 and the first ground electrode 25, which greatly increases the storage capacitor of the digital microfluidic substrate, thereby reducing the leakage speed of the driving voltage, so that the driving voltage can be kept relatively stable, thereby increasing The driving effect of the droplet.
- first ground electrode 25 is electrically insulated from both the first driving electrode 23 and the second driving electrode 27.
- the sum of the projection area of the drain 225 of the driving transistor 22 and the first driving electrode 23 on the first substrate 21 is slightly smaller than the projection of the second driving electrode 27 on the first substrate 21 area. That is to say, with respect to the source electrode 224, the area of the first driving electrode 23, the drain electrode 225, and the second driving electrode 27 is as large as possible.
- the storage capacity of the two plate capacitors formed is stronger.
- the digital microfluidic substrate further includes a first dielectric layer 28 covering the second driving electrode 27 and a first hydrophobic layer 29 disposed on the first dielectric layer 28.
- the first substrate 21 may be a glass substrate; the material of the gate 221 of the driving transistor 22 is any one of molybdenum, aluminum and copper, and the thickness of the gate 221 of the driving transistor 22 is 10nm-1000nm
- the material of the third insulating layer 222 is silicon nitride or silicon oxide, the thickness of the third insulating layer 222 is 10nm-2000nm; the material of the active layer 223 of the driving transistor 22 is amorphous silicon; the source 224 of the driving transistor 22
- the material of the driving transistor 22 is any one of molybdenum, aluminum, and copper.
- the thickness of the source electrode 224 of the driving transistor 22 is 10nm-1000nm; the material of the drain electrode 225 of the driving transistor 22 is any one of molybdenum, aluminum and copper.
- the thickness of the drain 225 of the transistor 22 is 10 nm-1000 nm; the material of the first driving electrode 23 is any one of molybdenum, aluminum and copper, and the thickness of the first driving electrode 23 is 10 nm-1000 nm; the thickness of the first insulating layer 24
- the material is silicon nitride or silicon oxide.
- the thickness of the first insulating layer 24 is 10nm-2000nm; the thickness of the first ground electrode 25 is 10nm-1000nm; the material of the second insulating layer 26 is silicon nitride or silicon oxide.
- the thickness of the insulating layer 26 is 10 nm-2000 nm; the material of the second driving electrode 27 is molybdenum, aluminum, copper, or ITO (Indium Tin Oxide), etc., and the thickness of the second driving electrode 27 is 10 nm-1000 nm;
- the material of the dielectric layer 28 is silicon nitride, silicon oxide, aluminum oxide or SU-8 photoresist, etc., the thickness of the first dielectric layer 28 is 10nm-10000nm; the material of the first hydrophobic layer 29 is polytetrafluoroethylene or containing Fluoropolymer or the like, the thickness of the first hydrophobic layer 29 is 10 nm-1000 nm.
- the gate electrode 221 is formed on the first substrate 21 through a patterning process, and then a third insulating layer 222 covering the gate electrode 221 and the first substrate 21 is formed, and then the patterning process is performed on the third insulating layer 222.
- the active layer 223 is formed, and a metal layer is formed by a patterning process.
- the metal layer includes the first driving electrode 23 and partially covering the third insulating layer 222 and the active layer 223, so as to form the driving transistor 22 and the second substrate on the first substrate 21.
- a driving electrode 23, and the first driving electrode 23 is connected to the drain 225 of the driving transistor 22, and then a first insulating layer 24 covering the driving transistor 22 and the first driving electrode 23 is formed, and the first insulating layer 24 is patterned
- the first ground electrode 25 is formed by a process, and then a second insulating layer 26 covering the first ground electrode 25 and the first insulating layer 24 is formed, and a via hole penetrating the second insulating layer 26 and the first insulating layer 24 is formed by a patterning process,
- the second driving electrode 27 is formed on the second insulating layer 26, so that the second driving electrode 27 is connected to the first driving electrode 23 through the via hole penetrating the second insulating layer 26 and the first insulating layer 24, and then forming a cover
- the first dielectric layer 28 of the two driving electrodes 27, and finally, a first hydrophobic layer 29 is formed on the first dielectric layer 28 to obtain a digital microfluidic substrate; wherein the patterning process includes photoresist coating, exposure,
- the first driving electrode 23 is located on the side of the third insulating layer 222 of the driving transistor 22 away from the first substrate 21.
- the drain 225 and the first driving electrode 23 shown in FIG. The area on the active layer 223 is regarded as the area where the drain 225 is located, and the rest are areas where the first driving electrode 23 is located.
- the orthographic projection of the first ground electrode 25 on the first substrate 21 covers the orthographic projection of the active layer 223 of the driving transistor 22 on the first substrate 21, and the orthographic projection of the first ground electrode 25
- the material is non-transparent metal material.
- the orthographic projection of the first ground electrode 25 on the first substrate 21 covers the orthographic projection of the driving transistor 22 on the first substrate 21 and the orthographic projection of a part of the first driving electrode 23 on the first substrate.
- the external light will irradiate the active layer of the driving transistor through the counter substrate arranged opposite to the digital microfluidic substrate, which will cause the leakage current of the driving transistor to increase and make the driving electrode
- the driving voltage is reduced, which affects the driving effect of the droplets; and the digital microfluidic substrate in the embodiment of the present disclosure adds a layer of the first ground electrode 25 made of non-transparent metal, and the first ground electrode 25 is in the first
- the orthographic projection on the substrate 21 covers the orthographic projection of the active layer 223 of the driving transistor 22 on the first substrate 21.
- the first ground electrode 25 can block the light above the active layer 223, so that external light will not irradiate the active layer 223 of the driving transistor 22, thereby reducing the leakage current of the driving transistor 22, so that the driving voltage can be kept grounded. It is more stable, thereby improving the driving effect of the droplets.
- the material of the first ground electrode 25 is a non-transparent metal material, which may be any one of molybdenum, aluminum, and copper.
- FIG. 3 there is shown a plan view of a digital microfluidic substrate according to an embodiment of the present disclosure
- FIG. 4 shows a cross-sectional view taken along a line parallel to the extension direction of the source signal line in the embodiment of the present disclosure
- 5 shows a cross-sectional view taken along a line parallel to the extending direction of the gate signal line in the embodiment of the present disclosure.
- the digital microfluidic substrate further includes a gate signal line 226 and a source signal line 227, and the orthographic projection of the first ground electrode 25 on the first substrate 21 covers the gate signal line 226 and the source signal line.
- the digital microfluidic substrate includes a plurality of gate signal lines 226 extending in the row direction and a plurality of source signal lines 227 extending in the column direction.
- the gate signal lines 226 and the source signal lines 227 can be connected to each other.
- the digital microfluidic substrate is divided into a plurality of areas arranged in an array, each area is provided with a driving transistor 22, the gate 221 of the driving transistor 22 is connected to the gate signal line 226, and the source 224 of the driving transistor 22 is connected to the source
- the gate signal line 227 is connected, and a gate voltage signal is input to the gate signal line 226, so that the gate voltage is applied to the gate 221 of the driving transistor 22 connected to the gate signal line 226, so that the gate
- the driving transistors 22 connected to the signal line 226 are all turned on.
- the driving voltage is applied to the source 224 of the driving transistor 22 connected to the source signal line 227.
- the drain 225 is connected to the first driving electrode 23, and the second driving electrode 27 is connected to the first driving electrode 23 through a via hole penetrating the second insulating layer 26 and the first insulating layer 24, so that the second driving electrode 27 is applied
- the upper driving voltage is based on the second driving electrode 27 to drive the droplets; in the embodiment, the second driving electrodes 27 in each area are independent of each other, based on the driving transistor 22 and the second driving electrode 27 in each area, and then The direction of movement of the droplets can be controlled. Therefore, it is possible that the second driving electrode 27 can drive the droplet based on the state of the driving transistor 22.
- the first ground electrode 25 can shield the gate signal
- the line 226 and the source signal line 227 prevent the fringe electric field between the second driving electrode 27 and the gate signal line 226 and the source signal line 227 from affecting the movement of the droplet, thereby improving the stability and sensitivity of the droplet movement, so that Digital microfluidic substrate control is more precise.
- first ground electrodes 25 in each area are connected to each other, but they are not connected at the via holes connecting the second driving electrodes 27 and the first driving electrodes 23, so as to ensure that the first ground electrodes 25 are on the first substrate 21.
- the orthographic projection on the upper surface may cover the orthographic projection of the gate signal line 226 and the source signal line 227 on the first substrate 21.
- the gate signal line 226 is also provided on the first substrate 21, and is provided on the same layer as the gate electrode 221 of the driving transistor 22, and the material of the gate signal line 226 is the same as that of the gate electrode 221;
- the line 227 is disposed on the third insulating layer 222 and is disposed in the same layer as the source electrode 224 of the driving transistor 22, and the material of the source signal line 227 is the same as that of the source electrode 224.
- the driving transistor and the first driving electrode on the first substrate, and the first insulating layer covering the driving transistor and the first driving electrode, the first ground electrode, A second insulating layer covering the first ground electrode and the first insulating layer, and a second driving electrode disposed on the second insulating layer.
- the second driving electrode passes through the second insulating layer and the first insulating layer through the via hole and the first insulating layer.
- a driving electrode is connected, and the first driving electrode is connected to the drain of the driving transistor.
- a plate capacitor is formed between the first driving electrode and the first ground electrode and between the second driving electrode and the first ground electrode.
- the storage capacitor of the digital microfluidic substrate is increased, thereby reducing the leakage speed of the driving voltage, so that the driving voltage can be kept relatively stable, thereby improving the driving effect of the droplets.
- FIG. 6 there is shown a schematic structural diagram of a digital microfluidic chip according to an embodiment of the present disclosure.
- the embodiment of the present disclosure also provides a digital microfluidic chip, which includes the above-mentioned digital microfluidic substrate and a counter substrate 30 disposed opposite to the digital microfluidic substrate.
- the counter substrate 30 includes a second substrate 31 and is sequentially disposed The second ground electrode 32, the second dielectric layer 33 and the second hydrophobic layer 34 on the second substrate 31, and the droplet 40 is arranged between the first hydrophobic layer 29 and the second hydrophobic layer 34.
- the second substrate 31 may be a glass substrate; the material of the second ground electrode 32 is molybdenum, aluminum, copper, ITO, etc., the thickness of the second ground electrode 32 is 10 nm-1000 nm; the material of the second dielectric layer 33 It is silicon nitride, silicon oxide, aluminum oxide, or SU-8 photoresist, etc., the thickness of the second dielectric layer 33 is 10nm-10000nm; the material of the second hydrophobic layer 34 is polytetrafluoroethylene or fluoropolymer, etc., The thickness of the second hydrophobic layer 34 is 10 nm-1000 nm.
- the second ground electrode 32 is first formed on the second substrate 31, and then the second dielectric layer 33 is formed on the second ground electrode 32, and then a second hydrophobic layer is formed on the second dielectric layer 33 34.
- the counter substrate 30 is boxed to obtain a digital microfluidic chip.
- a accommodating cavity is formed between the digital microfluidic substrate and the counter substrate 30, and droplets 40 can be subsequently injected into the accommodating cavity based on the second driving electrode 27 and the counter substrate on the digital microfluidic substrate.
- the droplet 40 is controlled to move in the digital microfluidic chip.
- the driving transistor and the first driving electrode on the first substrate, and the first insulating layer covering the driving transistor and the first driving electrode, the first ground electrode, A second insulating layer covering the first ground electrode and the first insulating layer, and a second driving electrode disposed on the second insulating layer.
- the second driving electrode passes through the second insulating layer and the first insulating layer through the via hole and the first insulating layer.
- a driving electrode is connected, and the first driving electrode is connected to the drain of the driving transistor.
- a plate capacitor is formed between the first driving electrode and the first ground electrode and between the second driving electrode and the first ground electrode.
- the storage capacitor of the digital microfluidic substrate is increased, thereby reducing the leakage speed of the driving voltage, so that the driving voltage can be kept relatively stable, thereby improving the driving effect of the droplets.
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Abstract
Description
相关申请的交叉引用Cross references to related applications
本申请要求于2019年4月18日提交至中国知识产权局的中国专利申请NO.201920534876.2的优先权,其公开内容以引用方式并入本文中。This application claims the priority of Chinese Patent Application No. 201920534876.2 filed to the China Intellectual Property Office on April 18, 2019, the disclosure of which is incorporated herein by reference.
本公开涉及微流控技术领域,特别是涉及一种数字微流控基板及数字微流控芯片。The present disclosure relates to the technical field of microfluidics, and in particular to a digital microfluidic substrate and a digital microfluidic chip.
微流控技术可以将生物、化学、医学分析过程的样品制备、反应、分离、检测等基本操作单元集成到一块微米尺度的芯片上,自动完成分析全过程,由于其可以降低成本,检测时间短,灵敏度高等优点,已经在生物、化学、医学等领域展现巨大前景。Microfluidic technology can integrate basic operation units such as sample preparation, reaction, separation, and detection in biological, chemical, and medical analysis processes on a micron-scale chip, automatically completing the entire analysis process, because it can reduce costs and short detection time , High sensitivity and other advantages, has shown great prospects in biology, chemistry, medicine and other fields.
发明内容Summary of the invention
一方面,本公开提供一种数字微流控基板,包括:In one aspect, the present disclosure provides a digital microfluidic substrate, including:
第一基板;First substrate
驱动晶体管,其设置在所述第一基板上;A driving transistor, which is arranged on the first substrate;
金属层,所述金属层包括所述驱动晶体管的源极和漏极以及与所述源极和漏极中的一个电连接的第一驱动电极;A metal layer, the metal layer including a source electrode and a drain electrode of the driving transistor and a first driving electrode electrically connected to one of the source electrode and the drain electrode;
绝缘层,所述绝缘层覆盖所述驱动晶体管和所述第一驱动电极;An insulating layer covering the driving transistor and the first driving electrode;
第二驱动电极,所述第二驱动电极通过贯穿所述绝缘层的过孔与所述第一驱动电极电连接;A second driving electrode, the second driving electrode is electrically connected to the first driving electrode through a via hole penetrating the insulating layer;
第一地电极,其设置在所述绝缘层中并位于所述金属层与所述第二驱动 电极之间。The first ground electrode is disposed in the insulating layer and between the metal layer and the second driving electrode.
在实施例中,所述第二驱动电极被构造为根据所述驱动晶体管的状态来驱动所述数字微流控基板上的液滴移动。In an embodiment, the second driving electrode is configured to drive the movement of liquid droplets on the digital microfluidic substrate according to the state of the driving transistor.
在实施例中,所述绝缘层包括覆盖所述驱动晶体管和所述第一驱动电极的第一绝缘层和覆盖所述第一地电极和所述第一绝缘层的第二绝缘层。In an embodiment, the insulating layer includes a first insulating layer covering the driving transistor and the first driving electrode, and a second insulating layer covering the first ground electrode and the first insulating layer.
在实施例中,所述第一地电极在所述第一基板上的正投影覆盖所述驱动晶体管的有源层在所述第一基板上的正投影,且所述第一地电极的材料为非透明金属材料。In an embodiment, the orthographic projection of the first ground electrode on the first substrate covers the orthographic projection of the active layer of the driving transistor on the first substrate, and the material of the first ground electrode It is a non-transparent metal material.
在实施例中,所述驱动晶体管包括以阵列布置的多个驱动晶体管,In an embodiment, the driving transistor includes a plurality of driving transistors arranged in an array,
所述数字微流控基板还包括在行方向上延伸的多条栅极信号线和在列方向上延伸的多条源极信号线;The digital microfluidic substrate further includes a plurality of gate signal lines extending in a row direction and a plurality of source signal lines extending in a column direction;
所述多个驱动晶体管的源极分别连接至所述多条源极信号线,所述多个驱动晶体管的栅极分别连接至多条栅极信号线;且The sources of the plurality of driving transistors are respectively connected to the plurality of source signal lines, and the gates of the plurality of driving transistors are respectively connected to the plurality of gate signal lines; and
所述第一地电极在所述第一基板上的正投影覆盖所述栅极信号线和所述源极信号线在所述第一基板上的正投影。The orthographic projection of the first ground electrode on the first substrate covers the orthographic projection of the gate signal line and the source signal line on the first substrate.
在实施例中,所述第一地电极在所述第一基板上的正投影覆盖所述第一基板的第一区域,所述第一区域为所述第一基板的除了所述过孔在所述第一基板上的正投影覆盖的区域之外的区域。In an embodiment, the orthographic projection of the first ground electrode on the first substrate covers the first area of the first substrate, and the first area is the first area of the first substrate except for the via hole. The area outside the area covered by the orthographic projection on the first substrate.
在实施例中,所述驱动晶体管包括设置在所述第一基板上的栅极、覆盖所述栅极的第三绝缘层、设置在所述第三绝缘层上的有源层,所述漏极设置在所述有源层上,所述第一驱动电极设置在所述第三绝缘层上,所述漏极和所述第一驱动电极为一体成型结构。In an embodiment, the driving transistor includes a gate provided on the first substrate, a third insulating layer covering the gate, an active layer provided on the third insulating layer, and the drain The electrode is arranged on the active layer, the first driving electrode is arranged on the third insulating layer, and the drain and the first driving electrode are integrally formed.
在实施例中,所述驱动晶体管的漏极和所述第一驱动电极在所述第一基板上的投影面积之和小于所述第二驱动电极在所述第一基板上的投影面积。In an embodiment, the sum of the projected area of the drain of the drive transistor and the first drive electrode on the first substrate is smaller than the projected area of the second drive electrode on the first substrate.
在实施例中,所述第一地电极的厚度为10nm-1000nm。In an embodiment, the thickness of the first ground electrode is 10 nm-1000 nm.
在实施例中,所述数字微流控基板还包括覆盖所述第二驱动电极的第一介质层以及设置在所述第一介质层的背离所述第一基板一侧的第一疏水层。In an embodiment, the digital microfluidic substrate further includes a first dielectric layer covering the second driving electrode and a first hydrophobic layer disposed on a side of the first dielectric layer away from the first substrate.
另一方面,本公开提供一种数字微流控芯片,包括如上所述的数字微流控基板以及与所述数字微流控基板相对设置的对向基板,所述对向基板包括第二基板以及依次设置在第二基板的面向所述微流控芯片一侧的第二地电极、第二介质层和第二疏水层,且液滴设置在第一疏水层和所述第二疏水层之间。On the other hand, the present disclosure provides a digital microfluidic chip, including the above-mentioned digital microfluidic substrate and a counter substrate disposed opposite to the digital microfluidic substrate, and the counter substrate includes a second substrate And the second ground electrode, the second dielectric layer and the second hydrophobic layer which are sequentially arranged on the side of the second substrate facing the microfluidic chip, and the droplets are arranged between the first hydrophobic layer and the second hydrophobic layer between.
为了更清楚地说明本公开实施例的技术方案,下面将对本公开实施例的描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to explain the technical solutions of the embodiments of the present disclosure more clearly, the following will briefly introduce the drawings that need to be used in the description of the embodiments of the present disclosure. Obviously, the drawings in the following description are only some embodiments of the present disclosure. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative labor.
图1示出了传统的一种数字微流控基板的结构示意图;Figure 1 shows a schematic structural diagram of a traditional digital microfluidic substrate;
图2示出了本公开实施例的一种数字微流控基板的结构示意图;Figure 2 shows a schematic structural diagram of a digital microfluidic substrate according to an embodiment of the present disclosure;
图3示出了本公开实施例的一种数字微流控基板的平面图;Figure 3 shows a plan view of a digital microfluidic substrate according to an embodiment of the present disclosure;
图4示出了本公开实施例的图3中沿着与源极信号线的延伸方向平行的线截取的截面图;FIG. 4 shows a cross-sectional view taken along a line parallel to the extending direction of the source signal line in FIG. 3 in an embodiment of the present disclosure;
图5示出了本公开实施例的图3中沿着与栅极信号线的延伸方向平行的线截取的截面图;FIG. 5 shows a cross-sectional view taken along a line parallel to the extending direction of the gate signal line in FIG. 3 in an embodiment of the present disclosure;
图6示出了本公开实施例的一种数字微流控芯片的结构示意图。Fig. 6 shows a schematic structural diagram of a digital microfluidic chip according to an embodiment of the present disclosure.
下面将结合本公开实施例中的附图,对本公开实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本公开一部分实施例,而不是全部的实施例。基于本公开中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本公开保护的范围。The technical solutions in the embodiments of the present disclosure will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present disclosure.
如图1所示,数字微流控基板包括第一基板111、栅极112、第一绝缘层113、有源层114、源极115、漏极116、第二绝缘层117、驱动电极118、介质层119和疏水层120,驱动电极118通过贯穿第二绝缘层117的过孔与 漏极116连接,通过在驱动电极118上施加驱动电压,实现液滴的驱动。As shown in Figure 1, the digital microfluidic substrate includes a
但是,由于数字微流控基板需要的驱动电压较高,一般需要几十伏甚至上百伏,而目前的数字微流控基板中的存储电容较小,导致驱动电压的漏电速度较快,影响液滴的驱动效果。However, because the digital microfluidic substrate requires a high driving voltage, generally tens of volts or even hundreds of volts, and the storage capacitance in the current digital microfluidic substrate is small, resulting in a faster leakage rate of the driving voltage, which affects The driving effect of the droplet.
参照图2,示出了本公开实施例的一种数字微流控基板的结构示意图。2, there is shown a schematic structural diagram of a digital microfluidic substrate according to an embodiment of the present disclosure.
本公开实施例提供了一种数字微流控基板,包括:第一基板21、设置在第一基板21上的驱动晶体管22和第一驱动电极23,以及覆盖驱动晶体管22和第一驱动电极23的第一绝缘层24;在第一绝缘层24上设置有第一地电极25,数字微流控基板还包括覆盖第一地电极25和第一绝缘层24的第二绝缘层26,以及设置在第二绝缘层26上的第二驱动电极27,第二驱动电极27通过贯穿第二绝缘层26和第一绝缘层24的过孔与第一驱动电极23连接,第一驱动电极23与驱动晶体管22的漏极225连接。The embodiment of the present disclosure provides a digital microfluidic substrate, including: a
可替换地,第一驱动电极23可以和驱动晶体管22的源极224连接。Alternatively, the
在实施例中,驱动晶体管22包括设置在第一基板21上的栅极221、覆盖栅极221的第三绝缘层222、设置在第三绝缘层222上的有源层223以及部分覆盖第三绝缘层222和有源层223的金属层,金属层包括源极224、漏极225和第一驱动电极23,漏极225和第一驱动电极23为一体成型结构。In an embodiment, the
在制作驱动晶体管22的漏极225时,可同时制作得到驱动电极23,使得漏极225和第一驱动电极23为一体成型结构,使得数字微流控基板的制作工艺更为简单。例如,漏极225的位于第三绝缘层222上的部分可以用作第一驱动电极。可替换地,漏极225和第一驱动电极23也可以不是一体成型结构,漏极225和第一驱动电极23分两次制作,但是保证制作得到的第一驱动电极23与驱动晶体管22的漏极225连接。When the
通过在驱动晶体管22的栅极221上施加栅极电压,使得驱动晶体管22打开,然后在驱动晶体管22的源极224上施加驱动电压,使得驱动晶体管22的漏极225被施加上驱动电压,由于驱动晶体管22的漏极225与第一驱动电极23连接,第二驱动电极27通过贯穿第二绝缘层26和第一绝缘层24的过孔与第一驱动电极23连接,从而使得第二驱动电极27也被施加上驱动 电压。因此,可以基于第二驱动电极27上的驱动电压实现液滴的驱动。By applying a gate voltage to the
本公开实施例中的数字微流控基板,在第一驱动电极23与第二驱动电极27之间设置第一地电极25,使得第一驱动电极23与第一地电极25之间以及第二驱动电极27与第一地电极25之间分别形成一个平板电容,大大增加了数字微流控基板的存储电容,从而减小了驱动电压的漏电速度,使得驱动电压可以保持地较为稳定,进而提高液滴的驱动效果。In the digital microfluidic substrate in the embodiment of the present disclosure, the
可以理解的是,第一地电极25与第一驱动电极23和第二驱动电极27两者电绝缘。It can be understood that the
在本公开一种优选的实施例中,驱动晶体管22的漏极225和第一驱动电极23在第一基板21上的投影面积之和略小于第二驱动电极27在第一基板21上的投影面积。也就是说,相对于源极224而言,将第一驱动电极23和漏极225以及第二驱动电极27的面积尽可能做大。In a preferred embodiment of the present disclosure, the sum of the projection area of the
通过将驱动晶体管22的漏极225和第一驱动电极23在第一基板21上的投影面积之和略小于第二驱动电极27在第一基板21上的投影面积,且第一地电极25位于第一驱动电极23与第二驱动电极27之间,使得形成的两个平板电容的存储电容的能力更强。By making the sum of the projected area of the
如图2所示,数字微流控基板还包括覆盖第二驱动电极27的第一介质层28以及设置在第一介质层28上的第一疏水层29。As shown in FIG. 2, the digital microfluidic substrate further includes a first
在本公开实施例中,第一基板21可以为玻璃基板;驱动晶体管22的栅极221的材料为钼、铝和铜中的任意一种,驱动晶体管22的栅极221的厚度为10nm-1000nm;第三绝缘层222的材料为氮化硅或氧化硅,第三绝缘层222的厚度为10nm-2000nm;驱动晶体管22的有源层223的材料为非晶硅;驱动晶体管22的源极224的材料为钼、铝和铜中的任意一种,驱动晶体管22的源极224的厚度为10nm-1000nm;驱动晶体管22的漏极225的材料为钼、铝和铜中的任意一种,驱动晶体管22的漏极225的厚度为10nm-1000nm;第一驱动电极23的材料为钼、铝和铜中的任意一种,第一驱动电极23的厚度为10nm-1000nm;第一绝缘层24的材料为氮化硅或氧化硅,第一绝缘层24的厚度为10nm-2000nm;第一地电极25的厚度为10nm-1000nm;第二绝 缘层26的材料为氮化硅或氧化硅,第二绝缘层26的厚度为10nm-2000nm;第二驱动电极27的材料为钼、铝、铜或ITO(Indium Tin Oxide,氧化铟锡)等,第二驱动电极27的厚度为10nm-1000nm;第一介质层28的材料为氮化硅、氧化硅、氧化铝或SU-8光刻胶等,第一介质层28的厚度为10nm-10000nm;第一疏水层29的材料为聚四氟乙烯或含氟聚合物等,第一疏水层29的厚度为10nm-1000nm。In the embodiment of the present disclosure, the
在实际制作过程中,首先在第一基板21上通过构图工艺形成栅极221,然后,形成覆盖栅极221和第一基板21的第三绝缘层222,在第三绝缘层222上通过构图工艺形成有源层223,通过构图工艺形成金属层,金属层包括第一驱动电极23以及部分覆盖第三绝缘层222和有源层223的,以实现在第一基板21上形成驱动晶体管22和第一驱动电极23,且第一驱动电极23与驱动晶体管22的漏极225连接,然后,形成覆盖驱动晶体管22和第一驱动电极23的第一绝缘层24,在第一绝缘层24上通过构图工艺形成第一地电极25,接着,形成覆盖第一地电极25和第一绝缘层24的第二绝缘层26,通过构图工艺形成贯穿第二绝缘层26和第一绝缘层24的过孔,然后,在第二绝缘层26形成第二驱动电极27,使得第二驱动电极27通过贯穿第二绝缘层26和第一绝缘层24的过孔与第一驱动电极23连接,接着,形成覆盖第二驱动电极27的第一介质层28,最后,在第一介质层28上形成第一疏水层29,得到数字微流控基板;其中,构图工艺包括光刻胶涂覆、曝光、显影、刻蚀和光刻胶剥离等工艺。In the actual manufacturing process, first the
需要说明的是,第一驱动电极23位于驱动晶体管22的第三绝缘层222远离第一基板21的一侧,图2中示出的漏极225和第一驱动电极23为一体成型结构,可以将有源层223上的区域当作漏极225所在的区域,其余均为第一驱动电极23所在的区域。It should be noted that the
在本公开另一种实施例中,第一地电极25在第一基板21上的正投影覆盖驱动晶体管22的有源层223在第一基板21上的正投影,且第一地电极25的材料为非透明金属材料。In another embodiment of the present disclosure, the orthographic projection of the
在实施例中,第一地电极25在第一基板21上的正投影覆盖驱动晶体管 22在第一基板21上的正投影和第一驱动电极23的一部分在第一基板上的正投影。In the embodiment, the orthographic projection of the
传统的数字微流控基板,由于外界的光线会透过与数字微流控基板相对设置的对向基板照射到驱动晶体管的有源层上,会导致驱动晶体管的漏电流增加,使得驱动电极上的驱动电压降低,影响液滴的驱动效果;而本公开实施例中的数字微流控基板,通过增加一层材料为非透明金属的第一地电极25,且第一地电极25在第一基板21上的正投影覆盖驱动晶体管22的有源层223在第一基板21上的正投影,当外界的光线透过与数字微流控基板相对设置的对向基板照射到数字微流控基板时,第一地电极25可以遮挡有源层223上方的光照,使得外界的光线不会照射到驱动晶体管22的有源层223上,从而降低驱动晶体管22的漏电流,使得驱动电压可以保持地较为稳定,进而提高液滴的驱动效果。In the traditional digital microfluidic substrate, the external light will irradiate the active layer of the driving transistor through the counter substrate arranged opposite to the digital microfluidic substrate, which will cause the leakage current of the driving transistor to increase and make the driving electrode The driving voltage is reduced, which affects the driving effect of the droplets; and the digital microfluidic substrate in the embodiment of the present disclosure adds a layer of the
在实施例中,第一地电极25的材料为非透明金属材料,可以为钼、铝和铜中的任意一种。In an embodiment, the material of the
参照图3,示出了本公开实施例的一种数字微流控基板的平面图,图4示出了本公开实施例中沿着与源极信号线的延伸方向平行的线截取的截面图,图5示出了本公开实施例中沿着与栅极信号线的延伸方向平行的线截取的截面图。3, there is shown a plan view of a digital microfluidic substrate according to an embodiment of the present disclosure, and FIG. 4 shows a cross-sectional view taken along a line parallel to the extension direction of the source signal line in the embodiment of the present disclosure, 5 shows a cross-sectional view taken along a line parallel to the extending direction of the gate signal line in the embodiment of the present disclosure.
在本公开的实施例中,数字微流控基板还包括栅极信号线226和源极信号线227,且第一地电极25在第一基板21上的正投影覆盖栅极信号线226和源极信号线227在第一基板21上的正投影;驱动晶体管22的栅极221与栅极信号线226连接,驱动晶体管22的源极224与源极信号线227连接。In an embodiment of the present disclosure, the digital microfluidic substrate further includes a
在实施例中,数字微流控基板包括沿行方向延伸的多条栅极信号线226和沿列方向延伸的多条源极信号线227,栅极信号线226和源极信号线227可将数字微流控基板划分为呈阵列排布的多个区域,每个区域内设置有驱动晶体管22,驱动晶体管22的栅极221与栅极信号线226连接,驱动晶体管22的源极224与源极信号线227连接,通过向栅极信号线226输入栅极电压信号,以实现在与该栅极信号线226连接的驱动晶体管22的栅极221上施 加栅极电压,从而使得与该栅极信号线226连接的驱动晶体管22均打开,通过向源极信号线227输入驱动电压信号,以实现在与源极信号线227连接的驱动晶体管22的源极224上施加驱动电压,由于驱动晶体管22的漏极225与第一驱动电极23连接,第二驱动电极27通过贯穿第二绝缘层26和第一绝缘层24的过孔与第一驱动电极23连接,从而使得第二驱动电极27被施加上驱动电压,基于第二驱动电极27实现液滴的驱动;在实施例中,各个区域内的第二驱动电极27彼此独立,基于每个区域内的驱动晶体管22和第二驱动电极27,进而可控制液滴的移动方向。因此,可以第二驱动电极27可以基于驱动晶体管22的状态来驱动液滴。In an embodiment, the digital microfluidic substrate includes a plurality of
通过将第一地电极25在第一基板21上的正投影设置成覆盖栅极信号线226和源极信号线227在第一基板21上的正投影,第一地电极25可以屏蔽栅极信号线226和源极信号线227,避免第二驱动电极27与栅极信号线226和源极信号线227之间产生边缘电场影响液滴的移动,从而提高液滴移动的稳定性和灵敏度,使数字微流控基板控制更精准。By setting the orthographic projection of the
需要说明的是,各个区域内的第一地电极25彼此连接,只是在第二驱动电极27与第一驱动电极23连接的过孔处不连接,从而保证第一地电极25在第一基板21上的正投影可以覆盖栅极信号线226和源极信号线227在第一基板21上的正投影。It should be noted that the
在实施例中,栅极信号线226也设置在第一基板21上,与驱动晶体管22的栅极221同层设置,且栅极信号线226的材料与栅极221的材料相同;源极信号线227设置在第三绝缘层222上,与驱动晶体管22的源极224同层设置,且源极信号线227的材料与源极224的材料相同。In the embodiment, the
在本公开实施例中,通过在第一基板上设置驱动晶体管和第一驱动电极,以及覆盖驱动晶体管和第一驱动电极的第一绝缘层,在第一绝缘层上设置有第一地电极、覆盖第一地电极和第一绝缘层的第二绝缘层,以及设置在第二绝缘层上的第二驱动电极,第二驱动电极通过贯穿第二绝缘层和第一绝缘层的过孔与第一驱动电极连接,第一驱动电极与驱动晶体管的漏极连接。通过在第一驱动电极与第二驱动电极之间设置第一地电极,使得第一驱动电 极与第一地电极之间以及第二驱动电极与第一地电极之间分别形成一个平板电容,大大增加了数字微流控基板的存储电容,从而减小了驱动电压的漏电速度,使得驱动电压可以保持地较为稳定,进而提高液滴的驱动效果。In the embodiment of the present disclosure, by providing the driving transistor and the first driving electrode on the first substrate, and the first insulating layer covering the driving transistor and the first driving electrode, the first ground electrode, A second insulating layer covering the first ground electrode and the first insulating layer, and a second driving electrode disposed on the second insulating layer. The second driving electrode passes through the second insulating layer and the first insulating layer through the via hole and the first insulating layer. A driving electrode is connected, and the first driving electrode is connected to the drain of the driving transistor. By arranging the first ground electrode between the first driving electrode and the second driving electrode, a plate capacitor is formed between the first driving electrode and the first ground electrode and between the second driving electrode and the first ground electrode. The storage capacitor of the digital microfluidic substrate is increased, thereby reducing the leakage speed of the driving voltage, so that the driving voltage can be kept relatively stable, thereby improving the driving effect of the droplets.
参照图6,示出了本公开实施例的一种数字微流控芯片的结构示意图。Referring to Fig. 6, there is shown a schematic structural diagram of a digital microfluidic chip according to an embodiment of the present disclosure.
本公开实施例还提供了一种数字微流控芯片,包括上述的数字微流控基板以及与数字微流控基板相对设置的对向基板30,对向基板30包括第二基板31以及依次设置在第二基板31上的第二地电极32、第二介质层33和第二疏水层34,且液滴40设置在第一疏水层29和第二疏水层34之间。The embodiment of the present disclosure also provides a digital microfluidic chip, which includes the above-mentioned digital microfluidic substrate and a counter substrate 30 disposed opposite to the digital microfluidic substrate. The counter substrate 30 includes a
在实施例中,第二基板31可以为玻璃基板;第二地电极32的材料为钼、铝、铜或ITO等,第二地电极32的厚度为10nm-1000nm;第二介质层33的材料为氮化硅、氧化硅、氧化铝或SU-8光刻胶等,第二介质层33的厚度为10nm-10000nm;第二疏水层34的材料为聚四氟乙烯或含氟聚合物等,第二疏水层34的厚度为10nm-1000nm。In an embodiment, the
在实际制作过程中,首先在第二基板31上形成第二地电极32,然后,在第二地电极32上形成第二介质层33,接着,在第二介质层33上形成第二疏水层34,得到对向基板30,最后,将数字微流控基板和对向基板30进行对盒,从而得到数字微流控芯片。In the actual manufacturing process, the
通过在第二驱动电极27上施加驱动电压,在第二地电极32上施加地电压,使得第二驱动电极27与第二地电极32之间形成电场,通过形成的电场控制液滴40的移动。By applying a driving voltage to the
需要说明的是,在数字微流控基板和对向基板30之间形成有容纳腔,后续可将液滴40注入该容纳腔内,基于数字微流控基板上的第二驱动电极27与对向基板30上的第二地电极32,控制液滴40在数字微流控芯片内进行移动。It should be noted that a accommodating cavity is formed between the digital microfluidic substrate and the counter substrate 30, and
此外,关于数字微流控芯片的具体描述可以参照上述实施例的描述,这里不再进行描述。In addition, for the specific description of the digital microfluidic chip, reference may be made to the description of the foregoing embodiment, which will not be described here.
在本公开实施例中,通过在第一基板上设置驱动晶体管和第一驱动电极,以及覆盖驱动晶体管和第一驱动电极的第一绝缘层,在第一绝缘层上设 置有第一地电极、覆盖第一地电极和第一绝缘层的第二绝缘层,以及设置在第二绝缘层上的第二驱动电极,第二驱动电极通过贯穿第二绝缘层和第一绝缘层的过孔与第一驱动电极连接,第一驱动电极与驱动晶体管的漏极连接。通过在第一驱动电极与第二驱动电极之间设置第一地电极,使得第一驱动电极与第一地电极之间以及第二驱动电极与第一地电极之间分别形成一个平板电容,大大增加了数字微流控基板的存储电容,从而减小了驱动电压的漏电速度,使得驱动电压可以保持地较为稳定,进而提高液滴的驱动效果。In the embodiment of the present disclosure, by providing the driving transistor and the first driving electrode on the first substrate, and the first insulating layer covering the driving transistor and the first driving electrode, the first ground electrode, A second insulating layer covering the first ground electrode and the first insulating layer, and a second driving electrode disposed on the second insulating layer. The second driving electrode passes through the second insulating layer and the first insulating layer through the via hole and the first insulating layer. A driving electrode is connected, and the first driving electrode is connected to the drain of the driving transistor. By arranging the first ground electrode between the first driving electrode and the second driving electrode, a plate capacitor is formed between the first driving electrode and the first ground electrode and between the second driving electrode and the first ground electrode. The storage capacitor of the digital microfluidic substrate is increased, thereby reducing the leakage speed of the driving voltage, so that the driving voltage can be kept relatively stable, thereby improving the driving effect of the droplets.
尽管已描述了本公开实施例的优选实施例,但本领域内的技术人员一旦得知了基本创造性概念,则可对这些实施例做出另外的变更和修改。所以,所附权利要求意欲解释为包括优选实施例以及落入本公开实施例范围的所有变更和修改。Although the preferred embodiments of the embodiments of the present disclosure have been described, those skilled in the art can make additional changes and modifications to these embodiments once they learn the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the embodiments of the present disclosure.
最后,还需要说明的是,在本文中,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者终端设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者终端设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要素的过程、方法、物品或者终端设备中还存在另外的相同要素。Finally, it should be noted that in this article, the terms "include", "include" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or terminal device including a series of elements is not only Including those elements, but also including other elements not explicitly listed, or also including the inherent elements of the process, method, article or terminal equipment. If there are no more restrictions, the element defined by the sentence "including a..." does not exclude the existence of other same elements in the process, method, article or terminal device that includes the element.
以上所述,仅为本公开的具体实施方式,但本公开的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本公开揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本公开的保护范围之内。因此,本公开的保护范围应以权利要求的保护范围为准。The above are only specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed in the present disclosure. It should be covered within the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be subject to the protection scope of the claims.
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