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WO2020085500A1 - Lithographic printing original plate, layered body of lithographic printing original plates, and method for producing lithographic printing plate - Google Patents

Lithographic printing original plate, layered body of lithographic printing original plates, and method for producing lithographic printing plate Download PDF

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Publication number
WO2020085500A1
WO2020085500A1 PCT/JP2019/041989 JP2019041989W WO2020085500A1 WO 2020085500 A1 WO2020085500 A1 WO 2020085500A1 JP 2019041989 W JP2019041989 W JP 2019041989W WO 2020085500 A1 WO2020085500 A1 WO 2020085500A1
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WO
WIPO (PCT)
Prior art keywords
group
printing plate
lithographic printing
image recording
plate precursor
Prior art date
Application number
PCT/JP2019/041989
Other languages
French (fr)
Japanese (ja)
Inventor
加奈 栢木
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to CN201980070171.2A priority Critical patent/CN112912249A/en
Publication of WO2020085500A1 publication Critical patent/WO2020085500A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/12Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14Lithographic printing foils
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Definitions

  • the present disclosure relates to a lithographic printing plate precursor, a lithographic printing plate precursor laminate, and a method for producing a lithographic printing plate.
  • ⁇ Lithographic printing plate precursors are often stored and transported as a stack of multiple sheets.
  • this laminate usually, for the purpose of preventing accumulation deviation of the lithographic printing plate precursor, preventing adhesion between the lithographic printing plate precursors, preventing scratches on the image recording layer side surface of the lithographic printing plate precursor, A slip sheet is inserted between them.
  • interleaving paper itself involves problems such as cost increase and disposal processing, and since it needs to be removed before the exposure process, the load of the plate making process and the risk of occurrence of troubles in the interleaf paper peeling defect Will also be.
  • it is necessary to take care so that the surface of the planographic printing plate precursor on the recording layer side is not damaged. Therefore, it is required to develop a lithographic printing plate precursor that can be laminated even in a mode that does not include interleaving paper (also referred to as "interleaving paperless").
  • an infrared-sensitive particle mat for a photosensitive lithographic printing plate that is used by being attached to the surface of the photosensitive lithographic printing plate
  • a matting agent characterized by containing an infrared absorbing dye is disclosed (for example, refer to Patent Document 1).
  • one side of the support has a recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorber and capable of forming an image by infrared irradiation, and a matte layer on the upper recording layer.
  • An organic polymer layer having a film thickness of 1.0 ⁇ m to 20 ⁇ m is provided on the surface opposite to the surface having the recording layer, and the coefficient of static friction between the recording layer and the organic polymer layer is 0.45 to 0.60.
  • An infrared-sensitive lithographic printing plate precursor characterized by having a range is disclosed (see, for example, Patent Document 2).
  • Patent Document 1 Japanese Patent Laid-Open No. 2007-114221
  • Patent Document 2 Japanese Patent No. 4680098
  • the problem to be solved by one embodiment of the present disclosure is to provide a planographic printing plate precursor excellent in scratch resistance even without interleaving paper, a planographic printing plate laminate, and a method for producing a planographic printing plate. is there.
  • Means for solving the above problems include the following aspects. ⁇ 1> Having a positive image recording layer on an aluminum support, The Bekk smoothness of the outermost layer surface on the side having the image recording layer is 1,000 seconds or less, The outermost layer contains particles, A lithographic printing plate precursor in which the elastic modulus of the particles is 3.0 GPa or less. ⁇ 2> The lithographic printing plate precursor as described in ⁇ 1>, wherein the arithmetic average height Sa of the outermost layer surface on the side having the image recording layer is 0.3 ⁇ m or more and 20 ⁇ m or less.
  • ⁇ 3> The lithographic printing plate precursor as described in ⁇ 1> or ⁇ 2> above, wherein the particles contain at least one selected from the group consisting of acrylic resin particles, silica particles and urethane resin particles.
  • the image recording layer contains a resin having a glass transition temperature of 60 ° C to 230 ° C.
  • ⁇ 5> The above-mentioned ⁇ 1>, wherein the image recording layer contains at least one selected from the group consisting of acetal resin, phenol resin, acrylic resin, and resin having a urea bond, urethane bond or amide bond in the main chain.
  • ⁇ 6> The lithographic printing plate precursor as described in ⁇ 5>, wherein the image recording layer contains an acrylic resin having a maleimide structure.
  • ⁇ 7> The lithographic printing plate precursor as described in any one of the above items ⁇ 1> to ⁇ 6>, wherein the image recording layer is a single layer.
  • ⁇ 8> The lithographic printing plate precursor as described in any one of ⁇ 1> to ⁇ 6> above, wherein the image recording layer is a multi-layer comprising an upper layer and a lower layer on the support.
  • ⁇ 9> The lithographic printing plate precursor as described in any one of ⁇ 1> to ⁇ 8>, wherein the outermost layer is the image recording layer.
  • lithographic printing plate precursor as described in any one of ⁇ 1> to ⁇ 9>, further including an overcoat layer on the image recording layer, and the overcoat layer is the outermost layer. .
  • ⁇ 13> The method for producing a lithographic printing plate as described in ⁇ 12> above, wherein the alkaline aqueous solution has a pH of 11 or less.
  • ⁇ 15> The outermost layer on the side having the image recording layer of the lithographic printing plate precursor and the outermost layer on the side opposite to the side having the image recording layer of the other lithographic printing plate precursor were directly contacted and laminated.
  • a lithographic printing plate precursor a lithographic printing plate precursor laminate excellent in scratch resistance even without a slip sheet, and a method for producing a lithographic printing plate.
  • the description of the constituent elements described below may be made based on the representative embodiment of the present disclosure, but the present disclosure is not limited to such an embodiment.
  • “to” indicating a numerical range is used to mean that numerical values described before and after the numerical range are included as a lower limit value and an upper limit value.
  • the notation in which substitution and non-substitution are not included includes not only those having no substituent but also those having a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • (meth) acrylic is a term used as a concept including both acryl and methacryl
  • (meth) acryloyl is a term used as a concept including both acryloyl and methacryloyl.
  • process in the present specification is included in the term not only as an independent process but also when it cannot be clearly distinguished from other processes as long as the intended purpose of the process is achieved. . In the present disclosure, a combination of two or more preferable aspects is a more preferable aspect.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (both manufactured by Tosoh Corporation) unless otherwise specified.
  • the gel permeation chromatography (GPC) analyzer was used to detect the solvent THF (tetrahydrofuran) with a differential refractometer, and the molecular weight was calculated using polystyrene as a standard substance.
  • the term “lithographic printing plate precursor” includes not only the lithographic printing plate precursor but also the discarded plate precursor.
  • lithographic printing plate includes not only a lithographic printing plate precursor prepared through an operation such as exposure and development, but also a discarding plate, if necessary. In the case of a waste original plate, the operations of exposure and development are not always necessary.
  • the waste plate is a lithographic printing plate precursor to be attached to a plate cylinder that is not used when a part of the paper surface is printed in a single color or two colors in color newspaper printing, for example.
  • the lithographic printing plate precursor according to the present disclosure has a positive image recording layer (hereinafter, also simply referred to as “image recording layer”) on an aluminum support (hereinafter also simply referred to as “support”) aluminum support.
  • image recording layer positive image recording layer
  • support aluminum support
  • Bekk smoothness of the outermost layer surface on the side having the image recording layer is 1,000 seconds or less
  • the outermost layer contains particles
  • the elastic modulus of the particles is 3.0 GPa or less.
  • the outermost layer surface of the lithographic printing plate precursor on the side having the image recording layer is also referred to as “front side”, and the outermost layer surface on the side opposite to the side having the image recording layer is also referred to as “back side”. .
  • planographic printing plate precursor according to the present disclosure can provide a planographic printing plate precursor excellent in scratch resistance even with no interleaving paper by adopting the above configuration. Further, it has been found that the planographic printing plate precursor according to the present disclosure is likely to obtain the suppression of ablation. Although the mechanism by which the above excellent effects are obtained is not clear, it is estimated as follows.
  • a lithographic printing plate precursor (hereinafter, also simply referred to as “original plate”) is usually used for preventing misalignment of plates during production of the original plate, prevention of adhesion between the original plates, and multiple plate making in the plate making process in which the original plates are taken out one by one from the stack.
  • the master plates are laminated with a slip sheet interposed between the master plates.
  • the interleaving paper is not used for the purpose of preventing the trouble of peeling of interleaving paper at the time of user plate making, improving the plate making speed, and reducing the cost.
  • the infrared absorbing agent is a dissolution inhibitor that substantially reduces the solubility of the alkali-soluble resin due to the interaction with the alkali-soluble resin in the unexposed area (image area).
  • the generated heat weakens the interaction between the infrared absorbing agent and the alkali-soluble resin and dissolves in the alkali developing solution to form an image. Therefore, the positive type lithographic printing plate precursor has insufficient mechanical strength of the recording layer, and when the plate surface and various members come into strong contact with each other during manufacturing processing, transportation, and handling of the plate, defects occur on the plate surface, and There was a problem that the image part was missing.
  • a matting agent is attached to the surface of the photosensitive lithographic printing plate to provide adhesion prevention.
  • the present inventor in the positive type lithographic printing plate precursor, simply attaches the matting agent or the like described in Patent Document 1 to the surface of the original plate in order to simply give unevenness to the front surface, and the original plate is made without interleaving paper.
  • the matting agent deforms the image recording layer and the image recording layer becomes thin.Therefore, during development, the image recording layer is dissolved from the thinned portion to expose the support (hereinafter, referred to as “film I also found that there is a problem of "missing.” Further, in the lithographic printing plate precursor described in Patent Document 2, it is required to develop a lithographic printing plate precursor that is more excellent in scratch resistance when interleaving paper is omitted.
  • the outermost layer surface on the side having an image recording layer contains particles having a specific elastic modulus or less (that is, moderately soft particles).
  • the Bekk smoothness of the outermost layer to a specific number of seconds or less, the occurrence of scratches on the lithographic printing plate precursors can be suppressed when the lithographic printing plate precursors are stacked (when laminated) without interleaving paper, and scratch resistance It is presumed that it has excellent properties.
  • the lithographic printing original plate according to the present disclosure includes particles having a specific elastic modulus or less on the outermost layer surface on the side having the image recording layer, so that it prevents the components of the image recording layer from scattering during exposure. Conceivable. Further, it is speculated that since the particles spread on the image recording layer at the time of exposure, scattering of components of the image recording layer is suppressed, and thus suppression of ablation can be easily obtained. Further, since the lithographic printing original plate according to the present disclosure contains particles having a specific elastic modulus or less (that is, particles that are moderately soft), even when the original plates are laminated without interleaving paper, the image recording layer is It is presumed that the film is less likely to be deformed and the film omission is easily suppressed.
  • the lithographic printing plate precursor according to the present disclosure has an image recording layer (positive type image recording layer) on a support.
  • the image recording layer may be the outermost layer.
  • the lithographic printing plate precursor according to the present disclosure may have an undercoat layer between the support and the image recording layer, and also has an overcoat layer (protective layer) on the image recording layer.
  • a resin layer (back coat layer) may be provided on the side (back side) opposite to the side having the image recording layer of the support.
  • the image recording layer may be a single layer or a multi-layer composed of an upper layer and a lower layer.
  • the lithographic printing plate precursor according to the present disclosure may be a lithographic printing plate precursor used for on-press development or a lithographic printing plate precursor used for development with a developer.
  • the outermost layer surface is the surface of the overcoat layer when the above-mentioned overcoat layer is included.
  • the lithographic printing plate precursor according to the present disclosure has a Bekk smoothness of the outermost layer surface (front surface) on the side having an image recording layer (hereinafter, also referred to as “Bekk smoothness a”) from the viewpoint of scratch resistance during stacking without interleaving paper. Is 1,000 seconds or less, preferably 300 seconds or less, and more preferably 100 seconds or less.
  • the Bekk smoothness a is preferably 0 second or more, and more preferably 0.5 second or more, from the viewpoints of plate feeding property for taking out the original plate from the laminate and ease of peeling at the time of laminating without interleaving paper. More preferably, it is more preferably 1 second or longer, and particularly preferably 5 seconds or longer.
  • the lithographic printing plate precursor according to the present disclosure has a Bekk smoothness b (hereinafter, referred to as “Bekk smoothness b Is also preferably 1,000 seconds or less, more preferably 500 seconds or less, and further preferably 300 seconds or less.
  • Bekk smoothness b Is also preferably 1,000 seconds or less, more preferably 500 seconds or less, and further preferably 300 seconds or less.
  • the Bekk smoothness (Bekk seconds) according to the present disclosure is measured according to JIS P8119 (1998).
  • a Beck smoothness tester manufactured by Kumagai Riki Kogyo Co., Ltd. is used, and measurement is performed with an air amount of 1/10 of the standard air amount, that is, 1 mL.
  • the measurement of the arithmetic mean height Sa in the present disclosure shall be performed according to the method described in ISO 25178. Specifically, using Micromap MM3200-M100 manufactured by Ryoka Systems Co., Ltd., five points are selected from the same sample and measured, and the average value thereof is taken as the arithmetic average height Sa. Regarding the measurement range, a range of 1 cm ⁇ 1 cm randomly selected from the sample surface is measured.
  • the lithographic printing plate precursor according to the present disclosure has an arithmetic average height Sa of the outermost layer surface (front surface) on the side having an image recording layer, from the viewpoint of scratch resistance and peeling ease during interleaving without interleaving paper. It is preferably 0.3 ⁇ m or more and 20 ⁇ m or less, more preferably 0.5 ⁇ m or more and less than 10 ⁇ m, further preferably 0.5 ⁇ m or more and less than 7 ⁇ m, and particularly preferably 0.5 ⁇ m or more and less than 3 ⁇ m. . Further, the arithmetic average height Sa of the front surface is preferably smaller than the arithmetic average height Sa of the back surface.
  • the front surface may be the surface of the image recording layer or the surface of the protective layer when the image recording layer has a protective layer.
  • the arithmetic average height Sa of the outermost layer surface (back surface) on the side opposite to the side having the image recording layer is preferably 0.3 ⁇ m or more and 20 ⁇ m or less.
  • the arithmetic mean height Sa of the outermost layer surface on the side opposite to the side having the image recording layer is 0.3 ⁇ m or more and 20 ⁇ m or less, it is the side opposite to the side having the image recording layer when laminated without interleaving paper. It is possible to suppress the development delay due to the fact that the convex portion of the outermost layer surface (back surface) in (3) is suppressed to the depth of the image recording layer and the image recording layer is damaged.
  • the arithmetic average height of the back surface is 0.5 ⁇ m or more and less than 10 ⁇ m, and more preferably 0.5 ⁇ m or more and less than 7 ⁇ m. It is preferably 0.5 ⁇ m or more and less than 3 ⁇ m.
  • the outermost layer surface (back surface) on the side opposite to the side having the image recording layer may be the surface of the support opposite to the side having the image recording layer, or the back coat layer surface. .
  • the arithmetic mean height Sa of the surface of the outermost layer on the side opposite to the side having the image recording layer is the on-machine development delay prevention property, the plate feeding property for taking out the original plate from the laminate, the particle Is more than 0.3 ⁇ m and 20 ⁇ m or less, more preferably 0.4 ⁇ m to 20 ⁇ m, still more preferably 1 ⁇ m to 20 ⁇ m, from the viewpoints of drop-off prevention property, scratch resistance, and ease of peeling when laminated without interleaving paper. , Particularly preferably 1 ⁇ m to 14 ⁇ m.
  • the outermost layer (front surface) contains particles, and the elastic modulus of the particles is 3.0 GPa or less.
  • the elastic modulus of the specific particles is 3.0 GPa or less, the specific particles are appropriately soft, and suppress the occurrence of scratches on the lithographic printing plate precursor when the lithographic printing plate precursors are stacked (when laminated) without interleaving paper, Excellent scratch resistance.
  • the elastic modulus of the specific particles is preferably 0.001 GPa or more and 3.0 GPa or less, more preferably 0.05 GPa or more and 0.5 GPa or less, and further preferably 0.01 GPa or more and 1.0 GPa or less. is there.
  • the elastic modulus of the specific particles is obtained by an indentation test, and more specifically, it can be measured by the following method. A sample in which specific particles are coated on a glass substrate is set in a micro hardness tester. Aiming at one particle of the installed sample, assuming that the plane indenter is sufficiently harder than the particle (sphere), sample particles are compressed with the plane indenter under the following measurement conditions, and a sphere indentation test is performed. The obtained load variation curve is fitted to the contact formula (Hertz formula) shown in the following formula 1 to calculate the elastic modulus (GPa).
  • ⁇ 3 , P 2 , E 1 , v 1 and R 0 in Formula 1 are as follows. ⁇ 3 : displacement P 2 : load E 1 : elastic modulus of particle (sphere) v 1 : Poisson's ratio of particle (sphere) R 0 : radius of particle
  • the outermost layer on the front surface may include one type of specific particles, or may include two or more types in combination.
  • the average particle diameter of the specific particles is preferably 0.7 ⁇ m to 20 ⁇ m, more preferably 1 ⁇ m to 15 ⁇ m, and further preferably 3 ⁇ m to 10 ⁇ m, from the viewpoint of scratch resistance and film removal prevention property. And particularly preferably 4 ⁇ m to 7 ⁇ m.
  • the specific particles may be a combination of two or more specific particles having different average particle sizes.
  • the average particle size of the specific particles is preferably 1.3 times or more, and 1.3 times or more and 10 times or less the thickness of the overcoat layer. Is more preferable.
  • the average particle size of the specific particles in the present disclosure means a volume average particle size, and the volume average particle size is measured by a laser diffraction / scattering type particle size distribution meter. Specifically, for example, the particle size distribution measurement device “Microtrac MT-3300II” (manufactured by Nikkiso Co., Ltd.) is used. In addition, in the present disclosure, the average particle size of other particles is also measured by the above measuring method unless otherwise specified.
  • the in-plane density of the specific particles is preferably 100 particles / mm 2 to 5000 particles / mm 2 , and more preferably 100 particles / mm 2 to 3000 particles / mm 2 .
  • the in-plane density in the present disclosure can be confirmed by observing the surface of the lithographic printing plate precursor with a scanning electron microscope (SEM). Specifically, the number of specific particles is counted by observing the surface of the lithographic printing plate precursor at 5 points with a scanning electron microscope (SEM), and converted into the number of specific particles per observation visual field area mm 2 , and the average value is calculated. It can be done by asking.
  • SEM scanning electron microscope
  • the specific particles are not particularly limited, but from the viewpoint of scratch resistance, at least one kind of particles selected from the group consisting of organic resin particles and inorganic particles may be used. Organic resin particles are more preferable.
  • organic resin particles examples include poly (meth) acrylic acid esters, polystyrene and its derivatives, polyamides, polyimides, low density polyethylene, high density polyethylene, polypropylene and other polyolefins, polyurethanes, polyureas, polyesters, etc.
  • Preferable examples thereof include particles made of the synthetic resin described above, and particles made of natural polymers such as chitin, chitosan, cellulose, crosslinked starch, and crosslinked cellulose.
  • the organic resin particles have advantages such as easy particle size control and easy control of desired surface characteristics by surface modification, and from the viewpoint of excellent scratch resistance, the organic resin particles include urethane resin particles. , Or acrylic resin particles are preferred.
  • a relatively hard resin such as polymethylmethacrylate (PMMA) can be made into fine particles by a crushing method, but a method of synthesizing particles by an emulsion suspension polymerization method is It is preferably used because of its ease of diameter control and accuracy.
  • PMMA polymethylmethacrylate
  • the method for producing organic resin particles is published in "Ultrafine Particles and Materials” edited by Japan Society for Materials Science, published by Sohbo, 1993, "Preparation and application of fine particles and powders” supervised by Haruma Kawaguchi, CMC Publishing, 2005 Etc. in detail.
  • Organic resin particles are also available as commercial products, for example, cross-linked acrylic resins MX-40T, MX-80H3wT, MX-150, MX-180TA, MX-300, MX-500, MX, manufactured by Soken Chemical Industry Co., Ltd.
  • Inorganic particles examples include silica, alumina, zirconia, titania, carbon black, graphite, BaSO 4 , ZnS, MgCO 3 , CaCO 3 , ZnO, CaO, WS 2 , MoS 2 , MgO, SnO 2 , ⁇ -Fe 2 O 3. , ⁇ -FeOOH, SiC, CeO 2 , BN, SiN, MoC, BC, WC, titanium carbide, corundum, artificial diamond, gemstone, garnet, silica stone, triboli, diatomaceous earth, dolomite, and the like.
  • silica particles are preferable as the inorganic particles from the viewpoint of scratch resistance.
  • the silica particles may be silica particles obtained by firing silicone resin particles.
  • Examples of silica particles obtained by baking the silicone resin particles include Tospearl 2000B, Tospearl 120 (particle diameter 2 ⁇ m), Tospearl 145 (particle diameter 4.5 ⁇ m) and the like manufactured by Tanac Co., Ltd.
  • the specific particles may be surface-treated.
  • the surface treatment method is not particularly limited and may be a known method. Further, as the specific particles, two or more kinds of particles having different surface treatments may be used in combination.
  • the specific particles are preferably organic resin particles coated with at least one inorganic compound selected from the group consisting of silica, alumina, titania and zirconia, and particularly preferably silica-coated organic resin particles.
  • the organic resin is preferably at least one resin selected from the group consisting of polyacrylic resins, polyurethane resins, polystyrene resins, polyester resins, epoxy resins, phenol resins and melamine resins.
  • silica-coated organic resin particles the organic resin particles coated with silica (hereinafter, also referred to as “silica-coated organic resin particles”) will be described in detail as an example, but the specific particles in the present disclosure are not limited thereto.
  • the silica-coated organic resin particles are particles in which particles made of an organic resin are surface-coated with silica. It is preferable that the organic resin particles forming the core do not soften or become sticky depending on moisture in the air or temperature.
  • the organic resin forming the organic resin particles in the silica-coated organic resin particles include polyacrylic resin, polyurethane resin, polystyrene resin, polyester resin, epoxy resin, phenol resin, and melamine resin.
  • silica layer As a material for forming the silica layer that coats the surface of the silica-coated organic resin particles, a compound having an alkoxysilyl group such as a condensation product of an alkoxysiloxane-based compound, particularly a siloxane-based material, specifically, silica sol or colloidal silica.
  • silica particles such as silica nanoparticles.
  • Silica does not necessarily have to cover the entire surface of the organic resin particles, and it is preferable that the surface is coated with at least 0.5 mass% of the total mass of the organic resin particles. That is, by virtue of the presence of silica on at least a part of the surface of the organic resin particles, the affinity for the coexisting water-soluble polymer, for example, polyvinyl alcohol (PVA) on the surface of the organic particles is improved, and external stress is applied. Even when the sheet is exposed, falling of particles is suppressed, and excellent scratch resistance and easy peeling at the time of stacking without interleaving paper can be maintained. Therefore, the “silica coating” in the present disclosure includes such a state that silica is present on at least a part of the surface of the organic resin particles.
  • PVA polyvinyl alcohol
  • the surface coverage of silica can be confirmed by morphological observation with a scanning electron microscope (SEM) or the like.
  • the silica coating amount can be confirmed by detecting Si atoms by elemental analysis such as fluorescent X-ray analysis and calculating the amount of silica present therein.
  • the method for producing the silica-coated organic resin particles is not particularly limited, and a method of coexisting silica particles or a silica precursor compound with a monomer component as a raw material for the organic resin particles to form the organic resin particles and simultaneously form a silica surface coating layer Alternatively, after forming the organic resin particles, silica particles may be physically attached to the surface and then fixed.
  • the following is an example of a method for producing silica-coated organic resin particles.
  • a water containing a suspension stabilizer appropriately selected from water-soluble polymers such as polyvinyl alcohol, methyl cellulose, and polyacrylic acid, and inorganic suspending agents such as calcium phosphate and calcium carbonate silica and the raw material resin (more Specifically, a monomer capable of suspension polymerization, a prepolymer capable of suspension crosslinking, or a raw material resin such as a resin liquid, which constitutes the above organic resin, is added, stirred, and mixed to obtain silica and a raw material.
  • a suspension in which a resin is dispersed is prepared.
  • a suspension having a desired particle size can be formed by adjusting the type of the suspension stabilizer, its concentration, the stirring rotation speed, and the like.
  • the suspension is heated to start the reaction, and the resin raw material is subjected to suspension polymerization or suspension crosslinking to generate resin particles.
  • the coexisting silica is fixed to the resin particles which are cured by the polymerization or the crosslinking reaction, particularly in the vicinity of the surface of the resin particles due to its physical properties.
  • the suspension is subjected to solid-liquid separation, the suspension stabilizer attached to the particles is removed by washing, and the suspension is dried.
  • substantially spherical silica-coated organic resin particles having a desired particle size on which silica is immobilized can be obtained.
  • the silica-coated organic resin particles having a desired particle size can be obtained by controlling the conditions during suspension polymerization or suspension cross-linking, and the silica-coated organic resin can be strictly controlled without such control. It is also possible to obtain silica-coated organic particles having a desired size by a mesh filtration method or the like after the particles are generated.
  • the amount of the raw material added to the mixture when the silica-coated organic particles are produced by the above method for example, when the total amount of the raw material resin and the silica is 100 parts by mass, first, 200 parts by mass to 800 parts by mass of water as a dispersion medium is used. 0.1 to 20 parts by mass of a suspension stabilizer is added to parts by mass to sufficiently dissolve or disperse the mixture, and the mixture of 100 parts by mass of the raw material resin and silica is added to the solution to prepare dispersed particles.
  • a preferable mode is one in which stirring is performed while adjusting the stirring speed so that the particle size becomes a predetermined particle size, the particle size is adjusted, and then the liquid temperature is raised to 30 ° C. to 90 ° C. and the reaction is performed for 1 hour to 8 hours.
  • the above-mentioned method is one example thereof.
  • JP-A-2002-327036, JP-A-2002-173410, JP-A-2004-307837, and The silica-coated organic resin particles obtained by the method described in detail in Japanese Unexamined Patent Publication No. 2006-38246 can also be suitably used in the present disclosure.
  • the silica-coated organic resin particles are also available as a commercial product, and specifically, as the silica / melamine composite particles, NISSAN CHEMICAL INDUSTRIES CO., LTD. Opto beads 2000M, opto beads 3500M, opto beads 6500M, opto beads are available. Examples include beads 10500M, opto beads 3500S, opto beads 6500S, and the like. Examples of the silica / urethane composite particles include dynamic beads CN5070D manufactured by Dainichiseika Kogyo Co., Ltd., and DAMPRACOAT THU.
  • organic resin particles used in the present disclosure have been described above by taking the silica-coated organic resin particles as an example, alumina, titania or zirconia is used instead of silica for the organic resin particles coated with alumina, titania or zirconia. It can be carried out similarly.
  • the specific particles preferably include at least one selected from the group consisting of acrylic resin particles, silica particles and urethane resin particles, and more preferably acrylic resin particles and silica particles. It is preferable to include at least one selected from the group consisting of
  • the shape of the specific particles is preferably a true spherical shape, but may be a flat plate shape or a so-called spindle shape such that the projection is elliptical.
  • the lithographic printing plate precursor according to the present disclosure has an outermost layer (for example, a backcoat layer) on the side opposite to the side having the image recording layer of the support, and by containing the specific particles in the outermost layer, The Bekk smoothness of the outermost layer surface and the arithmetic mean height Sa of the outermost layer surface can be adjusted to the above desired ranges. As a result, the planographic printing plate precursor according to the present disclosure has even more excellent characteristics.
  • an outermost layer for example, a backcoat layer
  • the lithographic printing plate precursor according to the present disclosure has an aluminum support.
  • a suitable aluminum plate used for the aluminum support is a pure aluminum plate or an alloy plate containing aluminum as a main component and a slight amount of a foreign element, and may be a plastic film on which aluminum is laminated or vapor-deposited.
  • the foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium.
  • the content of the foreign element in the alloy is preferably 10 mass% or less.
  • Aluminum which is particularly suitable in the present disclosure is pure aluminum, but completely pure aluminum is difficult to produce due to refining technology, and thus may contain slightly different elements.
  • the aluminum plate applied to the present disclosure is not specified in composition, and an aluminum plate made of a known and publicly known material can be appropriately used.
  • the aluminum plate used in the present disclosure preferably has a thickness of 0.1 mm to 0.6 mm, more preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm. preferable.
  • Such aluminum plate may be subjected to surface treatment such as surface roughening treatment and anodizing treatment, if necessary.
  • surface treatment such as surface roughening treatment and anodizing treatment
  • a degreasing treatment with a surfactant, an organic solvent or an alkaline aqueous solution, a rough surface as described in paragraphs 0167 to 0169 of JP2009-175195A Chemical treatment, anodization treatment, etc. are appropriately performed.
  • the aluminum surface that has been subjected to the anodizing treatment is optionally subjected to a hydrophilic treatment.
  • hydrophilic treatment a method of treating with an alkali metal silicate (for example, sodium silicate aqueous solution) method, potassium fluorozirconate or polyvinylphosphonic acid, as disclosed in paragraph 0169 of JP2009-175195A, is used.
  • alkali metal silicate for example, sodium silicate aqueous solution
  • potassium fluorozirconate or polyvinylphosphonic acid, as disclosed in paragraph 0169 of JP2009-175195A
  • the support described in JP 2011-245844 A is also preferably used.
  • the lithographic printing plate precursor according to the present disclosure has an image recording layer on a support.
  • the image recording layer preferably contains a binder polymer.
  • the binder polymer preferably contains a resin having a glass transition temperature of 60 ° C. to 230 ° C., and contains a resin having a glass transition temperature (Tg) of 65 ° C. to 225 ° C., from the viewpoint of scratch resistance and film loss prevention. Is more preferable, and it is further preferable that the resin contains 75 ° C to 220 ° C.
  • Tg is a value measured by a differential scanning calorimetry (DSC).
  • DSC differential scanning calorimeter
  • EXSTAR 6220 manufactured by SII Nanotechnology Inc. can be used.
  • the image recording layer is at least one selected from the group consisting of an acetal resin, a phenol resin, an acrylic resin, and a resin having a urea bond, a urethane bond or an amide bond in the main chain (hereinafter, also referred to as “specific binder polymer”). It is preferable to include one.
  • the specific binder polymers may be used alone or in combination of two or more.
  • the image recording layer preferably contains the above-mentioned specific binder polymer and an infrared absorbing agent described later.
  • the image recording layer in the present disclosure can be formed, for example, by applying the specific binder polymer and the infrared absorbing agent on the support and drying the support, if necessary.
  • the drying method is not particularly limited, and examples thereof include natural drying, air drying, and drying by heating.
  • the image recording layer is preferably a thermal positive type image recording layer capable of imagewise exposure with an infrared laser.
  • the image recording layer according to the present disclosure preferably contains a specific binder polymer having an acid group.
  • the specific binder polymer is preferably an alkali-soluble resin.
  • alkali-soluble refers to being soluble in a 1 mol / L sodium hydroxide solution at 25 ° C.
  • the specific binder polymer includes a homopolymer containing an acid group in the main chain and / or side chain in a polymer, a copolymer thereof, and a mixture thereof. Therefore, the thermal positive type heat-sensitive layer has a characteristic of being dissolved when it is brought into contact with an alkali developing solution.
  • the specific binder polymer those having at least one of the following acid groups (1) to (7) in the polymer main chain and / or side chain are preferable from the viewpoint of solubility in an alkali developing solution. .
  • Phenolic hydroxy group (-Ar-OH) (2) Sulfonamide group (-SO 2 NH-R or divalent group represented by -SO 2 NH-) (3) Substituted sulfonamide acid group (—SO 2 NHCOR, —SO 2 NHSO 2 R, —CONHSO 2 R) (hereinafter referred to as “active imide group”) (4) Carboxy group (-CO 2 H) (5) Sulfo group (-SO 3 H) (6) Phosphate group (-OPO 3 H 2 ) (7) Phosphonic acid group (-PO 3 H 2 )
  • Ar represents a divalent aryl group which may have a substituent
  • R represents a hydrocarbon group which may have a substituent
  • the specific binder polymer having an acid group selected from the above (1) to (7) the specific binder polymer having (1) a phenolic hydroxy group, (2) a sulfonamide group or (3) an active imide group is preferable,
  • the specific binder polymer having (1) a phenolic hydroxy group or (2) a sulfonamide group is particularly preferable from the viewpoint of ensuring sufficient solubility in an alkali developing solution and film strength.
  • the acid group contained in the specific binder polymer is at least 1 selected from the group consisting of (4) carboxy group, (2) sulfonamide group, and (1) phenolic hydroxy group. It is preferred that it is a seed acid group.
  • polyurethane or polyurea contained in the specific binder polymer used in the present disclosure is not particularly limited as long as it is a conventionally known one, but for example, the following urea resin or urethane resin is preferably used. Examples thereof include urea resins and urethane resins disclosed in WO 2015/152209.
  • urea resin a polymer whose main chain is formed by a urea bond
  • the “urea bond” is represented by the formula: —NR 1 CONR 2 —.
  • R 1 and R 2 are each independently a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, And a hydrogen atom or an alkyl group having 5 or less carbon atoms is more preferable.
  • the urea bond may be formed by any means, but can be obtained by reacting an isocyanate compound with an amine compound.
  • an isocyanate compound with an amine compound.
  • the above-mentioned isocyanate compound used as a raw material can be used without particular limitation as long as it is a polyisocyanate compound having two or more isocyanate groups in the molecule, but a diisocyanate compound is preferable.
  • the polyisocyanate compound include 1,3-bis (isocyanatomethyl) cyclohexane, isophorone diisocyanate, trimethylene diisocyanate, tetramethylene diisocyanate, pentamethylene diisocyanate, hexamethylene diisocyanate, 1,3-cyclopentane diisocyanate, 9H-fluorene.
  • any polyamine compound having two or more amino groups in the molecule can be used without particular limitation, but a diamine compound is preferable.
  • the polyamine compound include 2,7-diamino-9H-fluorene, 3,6-diaminoacridine, acriflavine, acridine yellow, 2,2-bis (4-aminophenyl) hexafluoropropane, 4,4′-diamino Benzophenone, bis (4-aminophenyl) sulfone, 4,4′-diaminodiphenyl ether, bis (4-aminophenyl) sulfide, 1,1-bis (4-aminophenyl) cyclohexane, 4,4′-diaminodiphenylmethane, 3 , 3'-diaminodiphenylmethane, 3,3'-diaminobenzophenone, 4,4'-d
  • urethane resin a polymer whose main chain is formed of urethane bonds is referred to as a urethane resin.
  • urethane bond is represented by the formula: —OC ( ⁇ O) NR 3 —.
  • R 3 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, cyclohexyl group, etc.)
  • a hydrogen atom or an alkyl group having 5 or less carbon atoms is more preferable, and a hydrogen atom or a methyl group is further preferable.
  • the urethane bond may be formed by any means, and can be obtained by reacting an isocyanate compound with a compound having a hydroxy group.
  • the isocyanate compound used as a raw material is preferably a polyisocyanate compound having two or more isocyanate groups in the molecule, and more preferably a diisocyanate compound.
  • the polyisocyanate compound include the polyisocyanate compounds mentioned as the raw materials for forming the urea bond.
  • the compound having a hydroxy group used as a raw material include a polyol compound, an aminoalcohol compound, an aminophenol compound, an alkylaminophenol compound and the like, but a polyol compound or an aminoalcohol compound is preferable.
  • the polyol compound is a compound having at least two or more hydroxy groups in the molecule, and is preferably a diol compound. Further, it may have an ester bond or an ether bond in the molecule.
  • Examples of the polyol compound include ethylene glycol, propylene glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, neopentyl glycol, polyethylene glycol, polytetramethylene glycol, 1,4-cyclohexane.
  • the amino alcohol compound is a compound having an amino group and a hydroxy group in the molecule, and may further have an ether bond in the molecule.
  • amino alcohols examples include amino ethanol, 3-amino-1-propanol, 2- (2-aminoethoxy) ethanol, 2-amino-1,3-propanediol, 2-amino-2-methyl-1,3- Examples thereof include propanediol and 1,3-diamino-2-propanol.
  • a diol compound or a polyol compound having a sulfone group such as bis (4- (2-hydroxyethoxy) phenyl sulfone) may be used.
  • the polyurea or polyurethane used in the present disclosure further has an acid group.
  • the acid group is preferably at least one group selected from the group consisting of a phenolic hydroxy group, a sulfonamide group, an active imide group and a carboxy group, and a phenolic hydroxy group, a sulfonamide group and a carboxy group It is more preferably at least one group selected from the group consisting of, and further preferably a phenolic hydroxy group or a sulfonamide group.
  • the acid group may be contained in either the main chain or side chain of the polymer, but it is preferable to have it in the main chain.
  • having a phenolic hydroxyl group in the main chain means having an arylene group bonded to the phenolic hydroxyl group in the main chain.
  • Having a sulfonamide group in the main chain means having a divalent group represented by —SO 2 NH— in the main chain.
  • the polyurea or polyurethane used in the present disclosure is at least one selected from the group consisting of a polyurethane containing a constitutional unit represented by the following formula 1 and a polyurea containing a constitutional unit represented by the following formula 1. It is preferable to include a polymer.
  • X 1 represents —CR 2 —, —O— or —S—, and R's each independently represent a hydrogen atom or an alkyl group.
  • the constituent unit represented by the above formula 1 is preferably contained in the main chain of polyurethane or polyurea.
  • X 1 is -CH 2 -, - preferably O- or -S-, -CH 2 -, or, more preferably -O-, -CH 2 - that is More preferable.
  • the halogen atom of the alkyl group in X 1 may be substituted with a halogen atom or the like.
  • the bonding position of —NHC ( ⁇ O) — bonded to the two benzene rings is not particularly limited, but is preferably the meta position of X 1 in the benzene ring.
  • the constitutional unit represented by Formula 1 is preferably a constitutional unit derived from the diisocyanate compound represented by the following Formula 1A.
  • a diisocyanate compound represented by Formula 1A is reacted with an amine compound (for example, a diamine compound) or an alcohol compound (for example, a diol compound) to contain a structural unit represented by Formula 1. It is possible to synthesize polyurea or polyurethane.
  • polyurethane or polyurea used as the specific binder polymer in the present disclosure are shown below, but the present disclosure is not limited thereto.
  • the numerical value at the lower right of the parentheses represents the molar ratio of the constituent units.
  • the following formulas PU-1 to PU-6 are described in a form in which carbon atoms and hydrogen atoms of hydrocarbon are omitted.
  • a polyamide resin having an amide bond in the main chain can be used as the specific binder polymer.
  • the polymers described in JP-A-2004-157461 and JP-A-2005-91429 are preferably used.
  • Specific examples of these compounds include, but are not limited to, polymers represented by the following formula PA-1.
  • the phenol resin used as the specific binder polymer is preferably a phenol resin having a weight average molecular weight of more than 2,000.
  • the phenol resin having a weight average molecular weight of more than 2,000 is a phenol resin containing phenol or a substituted phenol as a constitutional unit, preferably a novolac resin.
  • the novolac resin is preferably used in the lithographic printing plate precursor because it causes a strong hydrogen bonding property in the unexposed area and a part of the hydrogen bonding is easily released in the exposed area.
  • the novolac resin is not particularly limited as long as it contains phenols as a constituent unit in the molecule.
  • the novolac resin in the present disclosure is a resin obtained by a condensation reaction of phenol, a substituted phenol shown below, and an aldehyde.
  • the phenol include phenol, isopropylphenol, t-butylphenol, Examples thereof include t-amylphenol, hexylphenol, cyclohexylphenol, 3-methyl-4-chloro-6-t-butylphenol, isopropylcresol, t-butylcresol and t-amylcresol.
  • Preferred are t-butylphenol and t-butylcresol.
  • aldehydes include aliphatic and aromatic aldehydes such as formaldehyde, acetaldehyde, acrolein, and crotonaldehyde. Formaldehyde and acetaldehyde are preferable.
  • examples of the novolac resin in the present disclosure include a condensation polymer of phenol and formaldehyde (phenol formaldehyde resin), a condensation polymer of m-cresol and formaldehyde (m-cresol formaldehyde resin), p -Polycondensation polymer of cresol and formaldehyde (p-cresol formaldehyde resin), polycondensation polymer of m- / p-mixed cresol and formaldehyde (m- / p-mixed cresol-formaldehyde resin), phenol and cresol (m-, Condensation polymer of p- or m- / p-mixture) and formaldehyde (phenol / cresol (m-, p-, or m- / p-mixture) mixed formaldehyde resin), etc.
  • phenol formaldehyde resin phenol formaldehyde resin
  • m-cresol formaldehyde resin a condensation poly
  • novolac resin as described in US Pat. No. 4,123,279, an alkyl group having 3 to 8 carbon atoms such as t-butylphenolformaldehyde resin and octylphenolformaldehyde resin is further used. Examples thereof include a condensation polymer of phenol and formaldehyde having a substituent. Among these novolac resins, phenol formaldehyde resin and phenol / cresol mixed formaldehyde resin are particularly preferable.
  • the weight average molecular weight of the phenol resin is preferably more than 2,000 and 50,000 or less, more preferably 2,500 to 20,000, and particularly preferably 3,000 to 10,000. .
  • the dispersity is preferably 1.1 to 10.
  • the number average molecular weight is a polystyrene equivalent number average molecular weight measured by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
  • GPC gel permeation chromatography
  • THF tetrahydrofuran
  • the content of the phenol resin in the image recording layer in the present disclosure is preferably 1% by mass to 90% by mass based on the total mass of the specific binder polymer, from the viewpoint of obtaining a lithographic printing plate precursor having excellent image forming properties. It is more preferably from 50% by mass to 50% by mass, and particularly preferably from 10% by mass to 30% by mass.
  • the specific binder polymer is a phenol resin
  • specific examples of the phenol resin are shown below, but the present disclosure is not limited thereto.
  • the acrylic resin is not particularly limited as long as it is a resin containing at least a structural unit derived from an acrylic compound.
  • the acrylic resin may have the above acidic group, acrylonitrile group, or styrene group, but it is preferable to have the above acidic group from the viewpoint of developability.
  • known acrylic resins used for the image recording layer of the positive planographic printing plate precursor can be used without particular limitation.
  • the acrylic resin may be used alone or in combination of two or more.
  • As the acrylic resin a polymer produced by polymerizing a monomer containing at least one ethylenically unsaturated monomer having an acidic group or a mixture thereof is preferably used.
  • (meth) acrylic acid or a monomer represented by the following formula is preferably exemplified.
  • R s1 represents a hydrogen atom or an alkyl group.
  • Z represents —O— or —NR s2
  • R s2 represents a hydrogen atom, an alkyl group, an alkenyl group, or an alkynyl group.
  • Ar 1 represents an aromatic group, at least one of which is a heteroaromatic group, and
  • X represents a hydrogen atom or an aromatic group.
  • sa and sb each independently represent 0 or 1.
  • R s1 represents a hydrogen atom or an alkyl group, and the alkyl group is a substituted or unsubstituted alkyl group, and preferably has no substituent.
  • the alkyl group represented by R s1 include lower alkyl groups such as a methyl group, an ethyl group, a propyl group and a butyl group.
  • R s1 is preferably a hydrogen atom or a methyl group.
  • Z represents —O— or —NR s2 —, preferably —NR s2 —.
  • R s2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a substituted or unsubstituted alkynyl group, preferably a hydrogen atom or an unsubstituted alkyl group, and It is preferably a hydrogen atom.
  • sa and sb each independently represent 0 or 1, and a preferred embodiment is when sa is 0 and sb is 1, more preferably sa and sb are both 0, and particularly preferably sa And sb are both 1. More specifically, in the above structural unit, when sa is 0 and sb is 1, Z is preferably O. Further, when both sa and sb are 1, Z is preferably NR s2 , and R s2 is preferably a hydrogen atom.
  • Ar 1 and Ar 2 each independently represent an aromatic group, at least one of which is a heteroaromatic group.
  • Ar 1 is a divalent aromatic group and Ar 2 is a monovalent aromatic group.
  • the aromatic group is a substituent formed by replacing one or two hydrogen atoms forming the aromatic ring with a linking group.
  • the aromatic ring and heteroaromatic ring in the aromatic group may be selected from hydrocarbon aromatic rings such as benzene, naphthalene, and anthracene, and furan, thiophene, pyrrole, imidazole, 1,2,3-triazole.
  • 1,2,4-triazole tetrazole, oxazole, isoxazole, thiazole, isothiazole, thiadiazole, oxadiazole, pyridine, pyridazine, pyrimidine, pyrazine, 1,3,5-triazine, 1,2,4-triazine It may be selected from heteroaromatic rings such as 1,2,3-triazine.
  • a plurality of rings may be condensed to form a condensed ring such as benzofuran, benzothiophene, indole, indazole, benzoxazole, quinoline, quinazoline, benzimidazole, or benzotriazole.
  • the aromatic group and the heteroaromatic group may have a substituent, and examples of the substituent that can be introduced include an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an aryl group and a heteroaryl group.
  • Ar 2 is preferably a heteroaromatic group which may have a substituent, more preferably pyridine, pyridazine, pyrimidine, pyrazine, 1,3,5-triazine, 1,2,4-triazine, Heteroaromatic rings containing nitrogen atoms selected from 1,2,3-triazine, tetrazole, oxazole, isoxazole, thiazole, isothiazole, thiadiazole, and oxadiazole.
  • a substituent more preferably pyridine, pyridazine, pyrimidine, pyrazine, 1,3,5-triazine, 1,2,4-triazine, Heteroaromatic rings containing nitrogen atoms selected from 1,2,3-triazine, tetrazole, oxazole, isoxazole, thiazole, isothiazole, thiadiazole, and oxadiazole.
  • the content of the constitutional unit represented by the formula S-1 or S-2 (converted as a monomer unit) is preferably 10 mol% to 100 mol% with respect to the total amount of the monomer units in the acrylic resin, 20 mol% to 90 mol% is more preferable, 30 mol% to 80 mol% is still more preferable, and 30 mol% to 70 mol% is particularly preferable.
  • the number average molecular weight (Mn) of the acrylic resin having at least one of the structural unit represented by the formula S-1 and the structural unit represented by the formula S-2 is preferably 10,000 to 500,000. 10,000 to 200,000 is more preferable, and 10,000 to 100,000 is particularly preferable.
  • the weight average molecular weight (Mw) is preferably 10,000 to 1,000,000, more preferably 20,000 to 500,000, and particularly preferably 20,000 to 200,000.
  • the content of the structural unit represented by the ethylenically unsaturated monomer having an acidic group is preferably 1% by mass to 30% by mass, and more preferably 5% by mass to 25% by mass, because of excellent developability. Mass% is more preferable, and 10 mass% to 20 mass% is further preferable.
  • constitutional unit represented by a monomer other than the ethylenically unsaturated monomer having an acidic group alkyl (meth) acrylate, (meth) acrylic acid ester having an aliphatic hydroxyl group, (meth) acrylamide, vinyl ester And styrenes, nitrogen atom-containing monomers such as N-vinylpyrrolidone, and constitutional units represented by maleimides.
  • the monomers preferably used are (meth) acrylic acid ester, (meth) acrylamide, maleimide compound, and (meth) acrylonitrile, and more preferably Are (meth) acrylamide and maleimide compounds. :
  • the maleimide compound capable of forming a maleimide structure is preferably N-substituted maleimide, and examples of the N-substituted maleimide include N-methylmaleimide, N-ethylmaleimide, Nn-propylmaleimide and Ni-propylmaleimide. , Nn-butylmaleimide, Nt-butylmaleimide, Nn-hexylmaleimide, N-cyclopentylmaleimide, N-cyclohexylmaleimide, N-phenylmaleimide, N-1-naphthylmaleimide and the like.
  • N-cyclohexylmaleimide and N-phenylmaleimide are preferable, and N-phenylmaleimide is more preferable.
  • the N-substituted maleimides may be used alone or in combination of two or more.
  • the image recording layer preferably contains an acrylic resin having a maleimide structure, and more preferably an acrylic resin having an N-substituted maleimide structure, from the viewpoints of scratch resistance, film detachment suppressing property, and ablation suppressing property.
  • the content of the structural unit derived from the N-substituted maleimide is preferably 50% by mass or less, more preferably 5% by mass to 50% by mass, further preferably 10% by mass to 40% by mass, based on the total mass of the acrylic resin. .
  • the content of the structural unit is preferably 40% by mass or less, more preferably 1% by mass to 40% by mass, based on the total mass of the acrylic resin. More preferably, it is from 30% by mass to 30% by mass.
  • the weight average molecular weight of the acrylic resin is preferably 2,000 or more, more preferably 10,000 to 100,000, further preferably 30,000 to 60,000.
  • the content of the acrylic resin in the image recording layer is preferably 1% by mass to 60% by mass, more preferably 5% by mass to 50% by mass, based on the total mass of the image recording layer.
  • the specific binder polymer is an acrylic resin
  • specific examples of the acrylic resin are shown below, but the present disclosure is not limited thereto.
  • Me represents a methyl group.
  • the image recording layer in the present disclosure may further contain an acetal resin.
  • the acetal resin include polymer compounds containing a structural unit represented by the following formula EV-1 and the following formula EV-2.
  • L represents a divalent linking group
  • x is 0 or 1
  • R 1 represents an aromatic ring group or a heteroaromatic ring group having at least one hydroxy group
  • R 2 and R 3 are each independently a hydrogen atom, a halogen atom, a linear or branched group which may have a substituent, or a cyclic alkyl group, a linear or branched group which may have a substituent, Alternatively, it represents a cyclic alkenyl group, an aromatic ring that may have a substituent, or a heteroaromatic ring that may have a substituent.
  • R 1 represents an aromatic ring or a heteroaromatic ring having at least one hydroxy group, and the hydroxy group may be at the ortho, meta or para position with respect to the binding site with L. Good.
  • Preferred examples of the aromatic ring include phenyl group, benzyl group, tolyl group, o-, m-, p-xylyl group, naphthyl group, anthracenyl group, and phenanthrenyl group.
  • Preferred examples of the heteroaromatic ring include a furyl group, a pyridyl group, a pyrimidyl group, a pyrazoyl group, and a thiophenyl group.
  • aromatic rings or heteroaromatic rings may have a substituent other than a hydroxyl group, and examples of the substituent include an alkyl group such as a methyl group and an ethyl group, an alkoxy group such as a methoxy group and an ethoxy group, an aryloxy group.
  • substituent include an alkyl group such as a methyl group and an ethyl group, an alkoxy group such as a methoxy group and an ethoxy group, an aryloxy group.
  • Examples thereof include alicyclic groups.
  • R 1 is preferably a hydroxyphenyl group having a hydroxy group or a hydroxynaphthyl group, and more preferably a hydroxyphenyl group.
  • the hydroxyphenyl group include 2-, 3-, or 4-hydroxyphenyl groups.
  • the hydroxynaphthyl group include 2,3-, 2,4-, or 2,5-dihydroxynaphthyl group, 1,2,3-trihydroxynaphthyl group, and hydroxynaphthyl group.
  • the hydroxyphenyl group or hydroxynaphthyl group may have a substituent, and preferable examples of the substituent include alkoxy groups such as methoxy group and ethoxy group.
  • the alkylene group, the arylene group, or the heteroarylene group may have a substituent, and as the substituent, an alkyl group, a hydroxy group, an amino group, a monoalkylamino group, a dialkylamino group, an alkoxy group, and , Phosphonic acid groups or salts thereof.
  • L is an alkylene group, an arylene group, or, more preferably heteroarylene group, -CH 2 -, - CH 2 -CH 2 -, - CH 2 -CH 2 -CH 2 -, or, phenylene group More preferably,
  • R 2 and R 3 may each independently have a hydrogen atom, a halogen atom, a linear or branched alkyl group which may have a substituent, or a cyclic alkyl group which may have a substituent. It represents a linear, branched, or cyclic alkenyl group, an aromatic ring that may have a substituent, or a heteroaromatic ring that may have a substituent.
  • alkyl group examples include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group, an n-hexyl group, a chloromethyl group, a trichloromethyl group, an isopropyl group, an isobutyl group, an isopentyl group and a neopentyl group. , 1-methoxybutyl group, isohexyl group, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, and methylcyclohexyl group.
  • alkenyl group examples include ethenyl group, n-propenyl group, n-butenyl group, n-pentenyl group, n-hexenyl group, isopropenyl group, isobutenyl group, isopentenyl group, neopentenyl group, 1-methylbutenyl group, isohexenyl group.
  • a chlorine atom is mentioned as a halogen atom.
  • the aromatic ring is preferably an aryl group such as a phenyl group, a benzyl group, a tolyl group, an o-, m-, p-xylyl group, a naphthyl group, an anthracenyl group, and a phenanthrenyl group.
  • Examples of the heteroaromatic ring include a furyl group, a pyridyl group, a pyrimidyl group, a pyrazoyl group, and a thiophenyl group.
  • R 2 and R 3 each independently preferably represent a hydrogen atom, a chlorine atom or a methyl group, and more preferably a hydrogen atom.
  • Examples of the substituents on the alkyl group, alkenyl group, aromatic ring or heteroaromatic ring include alkoxy groups such as methoxy group and ethoxy group, thioalkyl groups, and —SH.
  • the aromatic ring or heteroaromatic ring may have an azo group such as an aryloxy group, a thioaryl group, an azoalkyl group and an azoaryl group, or an amino group as a substituent.
  • the content of the structural unit represented by the formula EV-1 (provided that it is converted into a monomer unit) is preferably 10 mol% or more, and 10 mol% to 55 mol% based on the total amount of the monomer unit in the polymer compound. Is more preferable, 15 mol% to 45 mol% is further preferable, and 20 mol% to 35 mol% is particularly preferable.
  • the content of the structural unit represented by the formula EV-2 (however, converted as a monomer unit) is preferably 15 mol% or more, and preferably 15 mol% to 60 mol% with respect to the total amount of monomer units in the polymer compound. Is more preferable, 20 mol% to 50 mol% is further preferable, and 25 mol% to 45 mol% is particularly preferable.
  • the total content of the constitutional unit represented by the formula EV-1 and the constitutional unit represented by the formula EV-2 is based on the total amount of the monomer units in the polymer compound.
  • 50 mol% to 90 mol% is preferable, 60 mol% to 80 mol% is more preferable, and 65 mol% to 75 mol% is further preferable.
  • the weight average molecular weight of the acetal resin is preferably 5,000 or more, more preferably 10,000 to 500,000, further preferably 10,000 to 300,000.
  • Such acetal resins may be used alone or in combination of two or more.
  • the content of the specific binder polymer in the present disclosure is preferably 5% by mass to 75% by mass, more preferably 10% by mass to 60% by mass, and further preferably 15% by mass with respect to the total mass of the image recording layer. It is more preferably from about 50% by mass.
  • the specific binder polymer is preferably contained in the lower layer at least.
  • the content of the specific binder polymer in the lower layer is preferably 3% by mass or more, more preferably 10% by mass or more, and further preferably 25% by mass or more, based on the total mass of the lower layer. .
  • the image recording layer preferably contains an infrared absorber.
  • the infrared absorbent is not particularly limited as long as it is a pigment or dye that absorbs infrared light and generates heat, and various pigments or dyes known as infrared absorbents can be used.
  • dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinone imine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complex dyes. Is mentioned.
  • cyanine dyes Preferred among these dyes are cyanine dyes, squarylium dyes, pyrylium salts, nickel thiolate complexes, and indolenine cyanine dyes. Further, cyanine dyes and indolenine cyanine dyes are more preferred.
  • a particularly preferred dye is a cyanine dye represented by the following formula (a).
  • X 1 represents a hydrogen atom, a halogen atom, a diarylamino group (—NPh 2 ), X 2 —L 1 or a group shown below.
  • X 2 represents an oxygen atom or a sulfur atom.
  • L 1 represents a hydrocarbon group having 1 to 12 carbon atoms, an aromatic ring having a hetero atom, or a hydrocarbon group having 1 to 12 carbon atoms containing a hetero atom.
  • a hetero atom here shows N, S, O, a halogen atom, and Se.
  • Xa ⁇ is defined in the same manner as Za ⁇ described later, and R a is a substituent selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, a substituted or unsubstituted amino group, and a halogen atom. Represents a group.
  • R 21 and R 22 each independently represent a hydrocarbon group having 1 to 12 carbon atoms.
  • R 21 and R 22 are preferably a hydrocarbon group having 2 or more carbon atoms, and R 21 and R 22 are bonded to each other to form a 5-membered ring. Or, it is particularly preferable to form a 6-membered ring.
  • Ar 1 and Ar 2 may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent.
  • Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring.
  • a C12 or less hydrocarbon group, a halogen atom, and a C12 or less alkoxy group are mentioned.
  • Preferable substituents include an alkoxy group having 12 or less carbon atoms, a carboxyl group and a sulfo group.
  • Za ⁇ represents a counter anion. However, when the cyanine dye represented by the formula (a) has an anionic substituent in its structure and neutralization of charge is not necessary, Za ⁇ is not necessary.
  • Preferred Za ⁇ is a halide ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion in view of the storage stability of the positive lithographic printing plate precursor, and particularly preferably, perchloric acid.
  • cyanine dye represented by the formula (a) which can be preferably used include, for example, paragraphs 0017 to 0019 of JP 2001-133969 A, paragraphs 0012 to 0038 of JP 2002-40638 A, and JP 2002 A. Examples thereof include those described in paragraphs 0012 to 0023 of JP-A-23360.
  • the cyanine dye A shown below is particularly preferable as the infrared absorber contained in the image recording layer.
  • the content of the infrared absorbing agent is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 30% by mass, based on the total mass of the image recording layer. It is particularly preferably from 0.0% by mass to 30% by mass.
  • the addition amount is 0.01% by mass or more, the sensitivity becomes high, and when the addition amount is 50% by mass or less, the uniformity of the layer is good and the durability of the layer is excellent.
  • the exposure sensitivity is improved by including an infrared absorber in the lower layer.
  • the addition amount of the infrared absorber in the lower layer is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 30% by mass, based on the total mass of the lower layer. It is particularly preferably from 0.0% by mass to 10% by mass.
  • the addition amount is 0.01% by mass or more, the sensitivity is improved, and when it is 50% by mass or less, the uniformity of the layer is good and the durability of the layer is excellent.
  • the image recording layer in the present disclosure preferably contains an acid generator from the viewpoint of improving the sensitivity of the lithographic printing plate precursor obtained.
  • the acid generator is a compound that generates an acid by light or heat, and refers to a compound that decomposes to generate an acid when irradiated with infrared rays or heated at 100 ° C. or higher.
  • the generated acid is preferably a strong acid having a pKa of 2 or less such as sulfonic acid and hydrochloric acid.
  • the acid generated from the acid generator enhances the permeability of the developing solution into the image recording layer in the exposed area of the lithographic printing plate precursor, and further improves the solubility of the image recording layer in the aqueous alkaline solution.
  • the acid generator preferably used in the image recording layer in the present disclosure includes the acid generators described in paragraphs 0116 to 0130 of WO 2016/047392. Above all, it is preferable to use an onium salt compound as the acid generator from the viewpoint of sensitivity and stability.
  • the onium salt compound will be described below. Examples of onium salt compounds that can be suitably used in the present disclosure include compounds known as compounds that generate an acid by being exposed to infrared rays and decomposed by thermal energy generated from the infrared absorber upon exposure.
  • onium salt compounds suitable for the present disclosure include known thermal polymerization initiators and compounds having an onium salt structure described below having a bond with a small bond dissociation energy from the viewpoint of sensitivity.
  • onium salts preferably used in the present disclosure include known diazonium salts, iodonium salts, sulfonium salts, ammonium salts, pyridinium salts, azinium salts, and the like. Among them, triarylsulfonium or diaryliodonium sulfonates , Carboxylate, BF 4 ⁇ , PF 6 ⁇ , ClO 4 ⁇ and the like are preferable.
  • onium salts that can be used as an acid generator in the present disclosure include onium salts represented by the following formulas III to V.
  • Ar 11 and Ar 12 each independently represent an aryl group having 20 or less carbon atoms, which may have a substituent.
  • a preferable substituent is a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or an aryloxy group having 12 or less carbon atoms. Is mentioned.
  • Z 11- is a pair selected from the group consisting of a halide ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a sulfonate ion, and a sulfonate ion having a fluorine atom such as a perfluoroalkylsulfonate ion. It represents an ion, and is preferably a perchlorate ion, a hexafluorophosphate ion, an aryl sulfonate ion, and a perfluoroalkyl sulfonic acid.
  • Ar 21 represents an aryl group having 1 to 20 carbon atoms which may have a substituent.
  • Preferred substituents are a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aryloxy group having 1 to 12 carbon atoms, an alkylamino group having 1 to 12 carbon atoms, Examples thereof include a dialkylamino group having 2 to 12 carbon atoms, an arylamino group having 6 to 12 carbon atoms, and a diarylamino group (the carbon numbers of two aryl groups are each independently 6 to 12).
  • Z 21- represents a counter ion having the same meaning as Z 11- .
  • R 31 , R 32 and R 33 which may be the same or different, each represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.
  • substituents include a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and an aryloxy group having 1 to 12 carbon atoms.
  • Z 31- represents a counter ion having the same meaning as Z 11- .
  • onium salt that can be preferably used in the image recording layer according to the present disclosure are the same as the compounds described in paragraphs 0121 to 0124 of International Publication WO2016 / 047392.
  • the compounds described as examples of the radical polymerization initiator in paragraphs 0036 to 0045 of JP 2008-195018 are related to the present disclosure. It can be suitably used as an acid generator.
  • More preferred examples of the acid generator usable in the present disclosure include the following compounds (PAG-1) to (PAG-5).
  • these acid generators When these acid generators are contained in the image recording layer in the present disclosure, these compounds may be used alone or in combination of two or more kinds.
  • the content of the acid generator is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 40% by mass, and 0.5% by mass with respect to the total mass of the image recording layer. More preferably, it is from about 30% by mass.
  • the content is within the above range, the sensitivity, which is an effect of the addition of the acid generator, is improved, and the generation of the residual film in the non-image area is suppressed.
  • the image recording layer in the present disclosure may contain an acid multiplying agent.
  • the acid multiplying agent in the present disclosure is a compound substituted with a residue of a relatively strong acid, and is a compound which is easily eliminated in the presence of an acid catalyst to newly generate an acid. That is, it decomposes by an acid-catalyzed reaction to generate an acid again.
  • One or more acids are increased in one reaction, and the acid concentration is accelerated as the reaction progresses, so that the sensitivity is dramatically improved.
  • the strength of the generated acid is preferably 3 or less as an acid dissociation constant (pKa), and more preferably 2 or less. When the acid dissociation constant is 3 or less, the elimination reaction by the acid catalyst is likely to occur.
  • Examples of the acid used for such an acid catalyst include dichloroacetic acid, trichloroacetic acid, methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid and phenylsulfonic acid.
  • the usable acid multiplying agent is the same as those described in paragraphs 0133 to 0135 of WO 2016/047392.
  • the content thereof is preferably 0.01% by mass to 20% by mass, and 0.01% by mass to 10% by mass based on the total mass of the image recording layer. Is more preferable, and 0.1% by mass to 5% by mass is further preferable.
  • the content of the acid proliferating agent is in the above range, the effect of adding the acid proliferating agent is sufficiently obtained, the sensitivity is improved, and the reduction of the film strength of the image area is suppressed.
  • the image recording layer in the present disclosure may contain a development accelerator, a surfactant, a printout agent, a colorant, a plasticizer, a wax agent, etc. as other additives.
  • -Development accelerator- An acid anhydride, a phenol, or an organic acid may be added to the image recording layer in the present disclosure for the purpose of improving sensitivity.
  • Cyclic acid anhydrides are preferred as the acid anhydrides, and specific examples of the cyclic acid anhydrides include phthalic anhydride, tetrahydrophthalic anhydride, and hexahydroanhydride described in US Pat. No. 4,115,128.
  • Phthalic acid, 3,6-endooxytetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, ⁇ -phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride and the like can be used.
  • Acetic anhydride etc. are mentioned as an acyclic acid anhydride.
  • phenols include bisphenol A, 2,2′-bishydroxysulfone, p-nitrophenol, p-ethoxyphenol, 2,4,4′-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4- Examples include hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "-tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane. .
  • Organic acids are described in JP-A-60-88942, JP-A-2-96755, and the like.
  • p-toluenesulfonic acid dodecylbenzenesulfonic acid, p-toluenesulfinic acid, Ethyl sulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene Examples include -1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid.
  • the proportion of the above-mentioned acid anhydride, phenols and organic acids in the total mass of the image recording layer is preferably 0.05% by mass to 20% by mass, more preferably 0.1% by mass to 15% by mass, and 0.1% by mass. 1% by mass to 10% by mass is particularly preferable.
  • JP-A-62-251740 and JP-A-3-208514 The image recording layer in the present disclosure is described in JP-A-62-251740 and JP-A-3-208514 in order to improve the coating property and to broaden the stability of processing under developing conditions.
  • Such nonionic surfactants, amphoteric surfactants as described in JP-A-59-121044 and JP-A-4-13149, JP-A-62-170950, JP-A-11- Fluorine-containing monomer copolymers as described in JP-A-288093 and JP-A-2003-57820 can be added.
  • nonionic surfactant examples include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride and polyoxyethylene nonylphenyl ether.
  • amphoteric activator examples include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine and N-tetradecyl-N, N-betaine.
  • the ratio of the surfactant to the total mass of the image recording layer is preferably 0.01% by mass to 15% by mass, more preferably 0.01% by mass to 5% by mass, and 0.05% by mass to 2.0% by mass. % Is more preferable.
  • a printout agent for obtaining a visible image immediately after heating by exposure and a dye or pigment as an image colorant can be added.
  • a dye or pigment as an image colorant examples of the print-out agent and the colorant are described in detail in paragraphs 0122 to 0123 of JP 2009-229917 A, and the compounds described therein can be applied to the present disclosure.
  • These dyes are preferably added in a proportion of 0.01 to 10% by mass, more preferably 0.1 to 3% by mass, based on the total mass of the image recording layer.
  • plasticizer may be added to the image recording layer in the present disclosure in order to impart flexibility to the coating film.
  • plasticizers are preferably added in a proportion of 0.5% by mass to 10% by mass, more preferably 1.0% by mass to 5% by mass, based on the total mass of the image recording layer. preferable.
  • a compound that lowers the coefficient of static friction of the surface can be added for the purpose of imparting resistance to scratches.
  • Examples thereof include compounds having an ester of a long-chain alkylcarboxylic acid.
  • the addition amount is preferably 0.1% by mass to 10% by mass, more preferably 0.5% by mass to 5% by mass, based on the total mass of the image recording layer.
  • the lithographic printing plate precursor according to the present disclosure preferably further has an overcoat layer on the image recording layer, and the overcoat layer may be the outermost layer on the front surface.
  • components of the overcoat include alkali-soluble polyurethane resins and acetal resins, with polyurethane resins having a carboxyl group in the polymer main chain being preferred.
  • An aromatic diisocyanate such as tolylene diisocyanate is preferable as the isocyanate for producing the polyurethane resin, and 3,5-dihydroxybenzoic acid or 2,2-bis (hydroxymethyl) propionic acid is preferable as the diol.
  • examples of the acetal resin include polyvinyl alcohol (PVA) and polyvinyl butyral PVB.
  • the thickness of the overcoat layer is preferably 0.2 ⁇ m to 10 ⁇ m, more preferably 0.3 ⁇ m to 5 ⁇ m, still more preferably 0.5 ⁇ m to 3 ⁇ m.
  • the content of the specific particles is preferably 20% by mass to 80% by mass, more preferably 30% by mass to 60% by mass, based on the total mass of the overcoat layer. Is.
  • the lithographic printing plate precursor can be manufactured by applying a coating solution for each constituent layer according to a usual method and drying to form each constituent layer.
  • a coating solution for each constituent layer for coating, a die coating method, a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, a slide coating method and the like are used.
  • the image recording layer may be a multi-layer including an upper layer and a lower layer.
  • a lithographic printing plate precursor having such a lower layer and an upper layer is also referred to as “a planographic printing plate precursor having a multilayer structure”.
  • the lower layer and the upper layer are preferably formed by separating the two layers.
  • a method for forming the two layers separately for example, a method of utilizing a difference in solvent solubility between a component contained in the lower layer and a component contained in the upper layer, or a method of applying a solvent rapidly after coating the upper layer Examples of the method include drying and removing.
  • the specific binder polymer is preferably contained in either the lower layer or the upper layer, and more preferably contained in the lower layer.
  • these methods will be described in detail, but the method of separating and applying the two layers is not limited thereto.
  • a solvent system in which none of the components contained in the lower layer is insoluble is used when the coating liquid for the upper layer is applied. It is a thing. As a result, even if two-layer coating is performed, each layer can be clearly separated to form a coating film.
  • a component insoluble in a solvent such as methyl ethyl ketone or 1-methoxy-2-propanol that dissolves the specific binder polymer as the upper layer component is selected, and the lower layer is applied using a solvent system that dissolves the lower layer component. After drying, the upper layer containing the specific binder polymer is dissolved with methyl ethyl ketone, 1-methoxy-2-propanol or the like, coated and dried to form a double layer.
  • high-pressure air is blown from a slit nozzle installed almost at right angles to the running direction of the web, or heating with steam or the like.
  • This can be achieved by applying heat energy as conduction heat from the lower surface of the web from a roll (heating roll) that is internally supplied with the medium, or by combining them.
  • the coating amount of the lower layer component coated on the support of the lithographic printing plate precursor according to the present disclosure after drying is preferably in the range of 0.5 g / m 2 to 4.0 g / m 2 , and is 0.6 g. / M 2 to 2.5 g / m 2 is more preferable. When it is 0.5 g / m 2 or more, printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
  • the coating amount after drying of the upper layer component is preferably in the range of 0.05g / m 2 ⁇ 1.0g / m 2, in the range of 0.08g / m 2 ⁇ 0.7g / m 2 Is more preferable.
  • the combined coating amount of the lower layer and the upper layer after drying is preferably in the range of 0.6 g / m 2 to 4.0 g / m 2 , and in the range of 0.7 g / m 2 to 2.5 g / m 2 . Is more preferable.
  • 0.6 g / m 2 or more printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
  • the lower layer of the planographic printing plate precursor having a multilayer structure in the present disclosure is preferably an infrared-sensitive positive recording layer whose solubility in an aqueous alkali solution is improved by heat.
  • the heat used for image formation includes heat generated when the lower layer containing the infrared absorber is exposed.
  • the lower layer whose solubility in an aqueous alkali solution is improved by heat includes, for example, novolac, a layer containing an alkali-soluble resin having hydrogen bonding ability such as urethane, a water-insoluble and alkali-soluble resin and a compound having a dissolution inhibiting action. Layers and the like are preferred.
  • the heat generated in the lower layer can be used for image formation.
  • the structure of the lower layer containing an infrared absorbing agent for example, a layer containing an infrared absorbing agent and a water-insoluble and alkali-soluble resin and a compound having a dissolution suppressing action, an infrared absorbing agent and a water-insoluble and alkali-soluble resin and an acid generator.
  • a layer containing is preferable.
  • the lower layer in the present disclosure preferably contains a water-insoluble and alkali-soluble resin.
  • a water-insoluble and alkali-soluble resin By containing the water-insoluble and alkali-soluble resin, an interaction is formed between the infrared absorber and the polar group of the water-insoluble and alkali-soluble resin, and a positive photosensitive layer is formed.
  • the general water-insoluble and alkali-soluble resin will be described in detail below, and among them, for example, a polyamide resin, an epoxy resin, a polyacetal resin, an acrylic resin, a methacrylic resin, a polystyrene resin, a novolac type phenolic resin, etc. are preferred. be able to.
  • the water-insoluble and alkali-soluble resin that can be used in the present disclosure is not particularly limited as long as it has the property of dissolving when contacted with an alkaline developer, but the main chain and / or side chain in the polymer is acidic. It is preferably a homopolymer containing a group, a copolymer thereof, or a mixture thereof.
  • the water-insoluble and alkali-soluble resin having such an acidic group preferably has a functional group such as a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, a phosphoric acid group, a sulfonamide group and an active imide group.
  • such a resin can be suitably produced by copolymerizing a monomer mixture containing at least one ethylenically unsaturated monomer having the above functional group.
  • a compound represented by the following formula and a mixture thereof can be preferably exemplified in addition to acrylic acid and methacrylic acid.
  • R 40 represents a hydrogen atom or a methyl group.
  • the water-insoluble and alkali-soluble resin that can be used in the present disclosure is preferably a polymer compound obtained by copolymerizing another polymerizable monomer in addition to the above polymerizable monomer.
  • the copolymerization ratio in this case is 10 mol of a monomer that imparts alkali solubility, such as a monomer having a functional group such as a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, a phosphoric acid group, a sulfonamide group, and an active imide group. % Or more, and more preferably 20 mol% or more.
  • the copolymerization component of the monomer imparting alkali solubility is 10 mol% or more, sufficient alkali solubility is obtained and the developability is excellent.
  • Examples of other polymerizable monomers that can be used include the compounds listed below.
  • Alkyl acrylates and alkyl methacrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, benzyl acrylate, methyl methacrylate, ethyl methacrylate, cyclohexyl methacrylate and benzyl methacrylate.
  • Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
  • Acrylamide or methacrylamide such as acrylamide, methacrylamide, N-methyl acrylamide, N-ethyl acrylamide, N-phenyl acrylamide.
  • Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
  • Styrenes such as styrene, ⁇ -methylstyrene, methylstyrene and chloromethylstyrene.
  • Other nitrogen atom-containing monomers such as N-vinylpyrrolidone, N-vinylpyridine, acrylonitrile and methacrylonitrile.
  • (meth) acrylic acid esters, (meth) acrylamide, maleimide compounds, and (meth) acrylonitrile are preferably used.
  • the alkali-soluble resin the novolak resin mentioned as the other binder polymer mentioned as an optional component of the image recording layer according to the present disclosure is also preferably exemplified. It is also possible to use the above water-insoluble and alkali-soluble resin in the image recording layer in the present disclosure.
  • water-insoluble and alkali-soluble resins are examples of resins that can be used in combination.
  • the general water-insoluble and alkali-soluble resin will be described in detail below, and among them, for example, a polyamide resin, an epoxy resin, a polyacetal resin, an acrylic resin, a methacrylic resin, a polystyrene resin, a novolac type phenolic resin, etc. are preferred. be able to.
  • the amount to be mixed is preferably 50% by mass or less with respect to the water-insoluble and alkali-soluble resin.
  • the water-insoluble and alkali-soluble resin preferably has a weight average molecular weight of 2,000 or more and a number average molecular weight of 500 or more, a weight average molecular weight of 5,000 to 300,000, and a number average molecular weight of 800 to More preferably, it is 250,000.
  • the degree of dispersion (weight average molecular weight / number average molecular weight) of the alkali-soluble resin is preferably 1.1 to 10.
  • the alkali-soluble resin in the lower layer according to the present disclosure may be used alone or in combination of two or more.
  • the content of the alkali-soluble resin in the total solid content of the lower layer in the present disclosure is preferably 2.0% by mass to 99.5% by mass, and 10.0% by mass to 99.% by mass, based on the total mass of the lower layer. It is more preferably 0% by mass, further preferably 20.0% by mass to 90.0% by mass.
  • the addition amount of the alkali-soluble resin is 2.0% by mass or more, the durability of the image recording layer (photosensitive layer) is excellent, and when it is 99.5% by mass or less, both the sensitivity and the durability are improved. Excel.
  • the lower layer of the lithographic printing plate precursor having a multi-layer structure may contain an acid generator, an acid multiplying agent, a development accelerator, a surfactant, a printing-out agent / colorant, a plasticizer, a wax agent and the like.
  • the upper layer of the lithographic printing plate precursor having the multi-layer structure in the present disclosure is preferably an infrared-sensitive positive type image recording layer whose solubility in an alkaline aqueous solution is improved by heat. ..
  • the heat used for image formation includes heat generated when the lower layer containing the infrared absorber is exposed.
  • the upper layer whose solubility in an aqueous alkali solution is improved by heat includes, for example, a layer containing an alkali-soluble resin having hydrogen bonding ability such as novolac and urethane, a water-insoluble and alkali-soluble resin and a compound having a dissolution suppressing action.
  • a layer, a layer containing a compound capable of suppressing ablation, and the like are preferable.
  • the positive lithographic printing plate precursor according to the present disclosure may have an undercoat layer between the support and the image recording layer (or the lower layer in the recording layer), if necessary.
  • the undercoat layer component various organic compounds are used, for example, carboxymethyl cellulose, phosphonic acids having an amino group such as dextrin, organic phosphonic acid, organic phosphoric acid, organic phosphinic acid, amino acids, and a hydroxy group.
  • Preferable examples are the hydrochlorides of the amines that it has.
  • These undercoat layer components may be used alone or in combination of two or more.
  • the coating amount of the undercoat layer is preferably 2 mg / m 2 to 200 mg / m 2 , and more preferably 5 mg / m 2 to 100 mg / m 2 . When the coating amount is within the above range, sufficient printing durability can be obtained.
  • a back coat layer is provided on the back surface of the support of the lithographic printing plate precursor according to the present disclosure, if necessary.
  • the back coat layer is composed of an organic polymer compound described in JP-A-5-45885 and a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound described in JP-A-6-35174.
  • a coating layer is preferably used.
  • silicon alkoxy compounds such as Si (OCH 3 ) 4 , Si (OC 2 H 5 ) 4 , Si (OC 3 H 7 ) 4 and Si (OC 4 H 9 ) 4 are inexpensively available. It is particularly preferable because the coating layer of the metal oxide obtained therefrom is excellent in the resistance to developing solution.
  • the lithographic printing plate precursor laminate according to the present disclosure is a laminate formed by laminating the lithographic printing plate precursor according to the present disclosure, and is formed by laminating a plurality of lithographic printing plate precursors according to the present disclosure.
  • the lithographic printing plate precursor laminate according to the present disclosure is preferably a laminate formed by laminating a plurality of lithographic printing plate precursors according to the present disclosure without interposing interleaving paper.
  • the number of laminated sheets is not particularly limited, but is preferably 2 to 500 sheets.
  • the lithographic printing plate precursor according to the present disclosure has excellent properties of the lithographic printing plate precursor according to the present disclosure in terms of prevention of multiple plate feeding and scratch resistance, and is less likely to cause misalignment. It has the characteristic that
  • Method of preparing lithographic printing plate The method for producing a lithographic printing plate according to the present disclosure, a step of exposing the lithographic printing plate precursor according to the present disclosure imagewise, to form an exposed portion and an unexposed portion (hereinafter, also referred to as "image exposure step"), And a developing step of developing the exposed lithographic printing plate precursor using a developer having a pH of 13.5 or less in this order.
  • image exposure step a developing step of developing the exposed lithographic printing plate precursor using a developer having a pH of 13.5 or less in this order.
  • the method for producing a lithographic printing plate according to the present disclosure includes an image exposure step.
  • a light source of actinic rays used for image exposure of the lithographic printing plate precursor according to the present disclosure a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser and a semiconductor laser are more preferable.
  • the laser output is preferably 100 mW or more, and it is preferable to use a multi-beam laser device in order to shorten the exposure time.
  • the exposure time per pixel is preferably within 20 ⁇ sec.
  • the energy applied to the lithographic printing plate precursor is preferably 10 mJ / cm 2 to 300 mJ / cm 2 .
  • the solubility of the image recording layer in an alkaline aqueous solution can be sufficiently improved, laser ablation can be suppressed, and image damage can be prevented.
  • the exposure in the present disclosure can be performed by overlapping the light beams of the light source.
  • the overlap means that the sub-scanning pitch width is smaller than the beam diameter.
  • the overlap can be quantitatively expressed by FWHM / sub-scanning pitch width (overlap coefficient) when the beam diameter is expressed by the full width at half maximum (FWHM) of the beam intensity. In the present disclosure, this overlap coefficient is preferably 0.1 or more.
  • the light source scanning method of the exposure apparatus that can be used in the present disclosure is not particularly limited, and a cylinder outer surface scanning method, a cylinder inner surface scanning method, a flat surface scanning method, or the like can be used.
  • the light source channel may be a single channel or a multi-channel, but in the case of the cylindrical outer surface system, the multi-channel is preferably used.
  • the method of preparing a lithographic printing plate according to the present disclosure includes a developing step of developing the exposed positive lithographic printing plate precursor using a developer having a pH of 13.5 or less.
  • the pH of the developer used in the developing step is preferably 11 or less.
  • the developing solution used in the developing step is not particularly limited as long as it is a developing solution of 13.5 or less.
  • the developer is preferably an aqueous solution.
  • the lithographic printing plate precursor according to the present disclosure may be developed using a developer having a pH of more than 13.5. For example, development can be performed using a known developing solution such as the developing solutions described in paragraphs 0270 to 0292 of JP-A-2003-1956.
  • the developer may contain a surfactant.
  • the surfactant used in the developer may be any of anionic, nonionic, cationic, and amphoteric surfactants, but as described above, anionic and nonionic surfactants. Agents are preferred.
  • anionic, nonionic, cationic and amphoteric surfactants used in the developing solution in the present disclosure those described in paragraphs 0128 to 0131 of JP2013-134341A can be used.
  • the HLB value is preferably 6 or more, more preferably 8 or more.
  • anionic surfactants and nonionic surfactants are preferable, and anionic surfactants containing sulfonic acid or sulfonate, and nonionics having an aromatic ring and an ethylene oxide chain. Surfactants are especially preferred.
  • the surfactants can be used alone or in combination.
  • the content of the surfactant in the developer is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass.
  • the developing solution used in the developing step is not particularly limited as long as it is a developing solution having a pH of 13.5 or less, but is preferably a developing solution having a pH of 11 or less, and a developing solution having a pH of 8.0 to 10.0.
  • the developer having a pH of 9.0 to pH 9.9 is more preferable, and the developer is further preferable.
  • a developer having a relatively low pH such as a developer having a pH of 8.0 to 10.0, is used, for example, as compared with a developer having a high pH of about 12, the dissolution of CO 2 in the atmosphere, etc. It is easy to suppress the lowering of the derived pH. That is, it can be said that the low pH provides excellent stability during use or storage of the developer.
  • the buffer solution is preferably a carbonate buffer system.
  • the carbonate buffer system refers to a buffer solution containing carbonate ion and hydrogen carbonate ion as a buffering agent.
  • carbonate and hydrogen carbonate may be added to the developing solution, or the carbonate may be added by adjusting the pH after adding the carbonate or hydrogen carbonate.
  • the carbonate and hydrogen carbonate are not particularly limited, but are preferably alkali metal salts.
  • alkali metal include lithium, sodium and potassium, with sodium being particularly preferred. These may be used alone or in combination of two or more.
  • the total amount of carbonate and hydrogen carbonate is preferably 0.3% by mass to 20% by mass, more preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass, based on the total mass of the developer. % Is particularly preferred. If the total amount is 0.3% by mass or more, developability and processing ability are not deteriorated, and if the total amount is 20% by mass or less, it becomes difficult to generate a precipitate or a crystal. It does not easily gel and does not interfere with waste liquid treatment.
  • alkali agents for example, organic alkali agents may be supplementarily used.
  • organic alkaline agent monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, Examples thereof include diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, tetramethylammonium hydroxide and the like.
  • the developer may contain a wetting agent, a preservative, a chelate compound, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt and the like.
  • a wetting agent e.g., a preservative, a chelate compound, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt and the like.
  • the wetting agent described in paragraph 0141 of JP2013-134341A can be preferably used.
  • the wetting agents may be used alone or in combination of two or more.
  • the wetting agent is preferably used in an amount of 0.1% by mass to 5% by mass, based on the total mass of the developer.
  • the preservative described in paragraph 0142 of JP2013-134341A can be preferably used. It is preferable to use two or more preservatives in combination so as to be effective against various molds and sterilizations.
  • the addition amount of the preservative is an amount that exerts a stable effect on bacteria, molds, yeasts and the like, and varies depending on the types of bacteria, molds, yeasts, but it is 0 for the total mass of the developer. A range of 0.01% by mass to 4% by mass is preferable.
  • the chelate compound described in paragraph 0143 of JP2013-134341A can be preferably used.
  • the chelating agent is selected so that it stably exists in the developer composition and does not impair the printability.
  • the addition amount is preferably 0.001% by mass to 1.0% by mass with respect to the total mass of the developer.
  • the defoaming agent described in paragraph 0144 of JP2013-134341A can be preferably used.
  • the content of the defoaming agent is preferably in the range of 0.001% by mass to 1.0% by mass with respect to the total mass of the developer.
  • the defoaming agent described in paragraph 0145 of JP2013-134341A can be preferably used.
  • the content of the organic acid is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
  • organic solvent examples include aliphatic hydrocarbons (hexane, heptane, “Isopar E, H, G” (manufactured by Esso Chemical Co., Ltd.), gasoline, or kerosene), aromatic hydrocarbons (toluene, Xylene) or halogenated hydrocarbons (methylene dichloride, ethylene dichloride, trichlene, monochlorobenzene, etc.) and polar solvents.
  • aliphatic hydrocarbons hexane, heptane, “Isopar E, H, G” (manufactured by Esso Chemical Co., Ltd.)
  • aromatic hydrocarbons toluene, Xylene
  • halogenated hydrocarbons methylene dichloride, ethylene dichloride, trichlene, monochlorobenzene, etc.
  • polar solvents examples include alcohols (methanol, ethanol, propanol, isopropanol, benzyl alcohol, ethylene glycol monomethyl ether, 2-ethoxyethanol, etc.), ketones (methyl ethyl ketone, cyclohexanone, etc.), esters (ethyl acetate, methyl lactate, propylene). Glycol monomethyl ether acetate, etc.) and others (triethyl phosphate, tricresyl phosphate, N-phenylethanolamine, N-phenyldiethanolamine, etc.) and the like.
  • the above organic solvent is insoluble in water, it can be solubilized in water with a surfactant or the like before use.
  • the concentration of the solvent is preferably less than 40 mass% from the viewpoint of safety and flammability.
  • the inorganic acid and the inorganic salt phosphoric acid, metaphosphoric acid, monobasic ammonium phosphate, dibasic ammonium phosphate, monobasic sodium phosphate, dibasic sodium phosphate, monobasic potassium phosphate, dibasic potassium phosphate, Examples thereof include sodium tripolyphosphate, potassium pyrophosphate, sodium hexametaphosphate, magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium sulfite, ammonium sulfite, sodium hydrogensulfate and nickel sulfate.
  • the content of the inorganic salt is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
  • the developing temperature is not particularly limited as long as it can be developed, but is preferably 60 ° C. or lower, more preferably 15 ° C. to 40 ° C.
  • the developing solution may become fatigued depending on the processing amount, and therefore the replenishing solution or a fresh developing solution may be used to recover the processing ability.
  • a method of performing alkali development, removing the alkali in the post-water washing step, performing gum treatment in the gumming step, and drying in the drying step can be exemplified.
  • a method of simultaneously performing pre-washing, developing and gumming can be preferably exemplified by using an aqueous solution containing carbonate ion, hydrogen carbonate ion and a surfactant. Therefore, the pre-water washing step does not have to be particularly carried out, and it is preferable to carry out the pre-water washing, development and gumming in one bath only after using one solution, and then to carry out the drying step. After the development, it is preferable to remove excess developer using a squeeze roller or the like and then perform drying.
  • Development process can be preferably carried out by an automatic processor equipped with a rubbing member.
  • the automatic processor for example, the automatic processor described in JP-A-2-220061 and JP-A-60-59351, which performs rubbing treatment while conveying the planographic printing plate precursor after image exposure, and a cylinder
  • the lithographic printing plate precursor after image exposure set on the above is subjected to a rubbing treatment while rotating a cylinder
  • the automatic processor described in each specification of US Pat. Nos. 5,148,746, 5,568,768, and British Patent 2,297,719 is Can be mentioned.
  • an automatic processor using a rotating brush roll as the rubbing member is particularly preferable.
  • the rotating brush roll used in the present disclosure can be appropriately selected in consideration of the scratch resistance of the image area, the rigidity of the support of the planographic printing plate precursor, and the like.
  • a known roll formed by planting a brush material on a plastic or metal roll can be used.
  • a metal or plastic in which brush materials are implanted in rows as described in JP-A-58-159533 and JP-A-3-100554, and JP-B-62-167253. It is possible to use a brush roll in which the groove-shaped material is wound around a plastic or metal roll serving as a core in a radial pattern without a gap.
  • plastic fibers for example, polyester type such as polyethylene terephthalate and polybutylene terephthalate, polyamide type such as nylon 6.6 and nylon 6.10, polyacryl type such as polyacrylonitrile, alkyl poly (meth) acrylate
  • Polyolefin-based synthetic fibers such as polypropylene and polystyrene
  • fibers having a hair diameter of 20 ⁇ m to 400 ⁇ m and a hair length of 5 mm to 30 mm can be preferably used.
  • the outer diameter of the rotating brush roll is preferably 30 mm to 200 mm, and the peripheral speed of the tip of the brush rubbing the plate surface is preferably 0.1 m / sec to 5 m / sec. It is preferable to use a plurality of rotating brush rolls.
  • the rotating brush roll may be rotated in the same direction or in the opposite direction with respect to the conveying direction of the lithographic printing plate precursor, but when using two or more rotating brush rolls, at least one rotating brush roll is used. It is preferable that the rotating brush rolls of 1 rotate in the same direction and at least one rotating brush roll rotate in the opposite direction. This further ensures removal of the image recording layer in the non-image area. Further, it is also effective to swing the rotating brush roll in the rotation axis direction of the brush roll.
  • a drying step continuously or discontinuously. Drying is performed with hot air, infrared rays, far infrared rays, or the like.
  • an automatic processor preferably used in the method for producing a lithographic printing plate according to the present disclosure, an apparatus having a developing unit and a drying unit is used, and a lithographic printing plate precursor is developed and gummed in a developing tank. And then dried in the drying section to obtain a lithographic printing plate.
  • the printing plate after development can be heated under extremely strong conditions for the purpose of improving printing durability.
  • the heating temperature is preferably in the range of 200 ° C to 500 ° C. If the temperature is low, a sufficient image strengthening effect cannot be obtained, and if it is too high, problems such as deterioration of the support and thermal decomposition of the image area may occur.
  • the lithographic printing plate thus obtained is set on an offset printing machine and is suitably used for printing a large number of sheets.
  • the molecular weight is a weight average molecular weight (Mw) and the ratio of the constitutional repeating units is a molar percentage, except for those specified otherwise.
  • Mw weight average molecular weight
  • the weight average molecular weight (Mw) is a value measured as a polystyrene conversion value by a gel permeation chromatography (GPC) method.
  • Binder polymer P1-1 was synthesized by a method similar to the method described in paragraph 0221 of Japanese Patent No. 6243010 to obtain binder polymer P1-1 having the structural units shown below.
  • parenthesized subscripts represent the content (molar ratio) of each structural unit. The same applies hereinafter.
  • Binder polymer P2-1 As the binder polymer P2-1, a binder polymer (commercially available product) having a constitutional unit shown below (manufactured by Sumitomo Bakelite Co., Ltd., trade name: Sumilite Resin PR54046) was used.
  • Binder polymer P3-1 As the binder polymer P3-1, a binder polymer P3-1 having the constitutional units shown below was synthesized by the method described in JP-A-2011-186139.
  • the mixture was further stirred at 65 ° C for 3 hours.
  • the reaction solution was added dropwise to a mixed solution of 0.5 L of pure water and 0.5 L of methanol to precipitate a polymer. This was collected by filtration, washed and dried to obtain 11.2 g of a binder polymer P4-2 having the following structural unit with a weight average molecular weight of 50,000.
  • Binder polymer P5-1 As the binder polymer P5-1, a binder polymer (commercially available product) having a constitutional unit shown below (manufactured by Sekisui Chemical Co., Ltd., trade name: S-REC BL-1H) was used.
  • undercoat layer coating liquid 1 shown below on the support After coating the undercoat layer coating liquid 1 shown below on the support, it was dried at 80 ° C. for 15 seconds to form an undercoat layer. The coating amount after drying was 15 mg / m 2 .
  • Photosensitive resin composition (I) was prepared by mixing the components described in the following composition.
  • the photosensitive resin composition (I) is a positive type photosensitive resin composition.
  • Photosensitive resin composition (I) -Specific binder polymer shown in Table 1 or Table 2: Amount shown in Table 1 or Table 2-Infrared absorber (IR dye (1): structure below): 0.045 part-Megafac F-780: 0. 03 parts Methyl ethyl ketone: 13.0 parts 1-Methoxy-2-propanol: 30.0 parts 1- (4-methylbenzyl) -1-phenylpiperidinium 5-benzoyl-4-hydroxy-2-methoxy Benzene sulfonate: 0.01 part
  • Example 37 ⁇ Formation of image recording layer (multilayer)>
  • the following lower layer forming composition (I) was applied onto a support similar to those in Examples 1 to 36 and Comparative Examples 1 and 2 with a wire bar, and then dried in a drying oven at 150 ° C. for 40 seconds to specify.
  • the wire bar so that the coating liquid composition (I) for forming the upper layer having the following composition is 0.22 g / m 2.
  • the coating was dried at 150 ° C. for 40 seconds.
  • a lithographic printing plate precursor of Example 37 was obtained by providing a lower layer and an upper layer and further providing an overcoat layer.
  • Example 38 The composition for forming an underlayer (I) was applied onto a support similar to those in Examples 1 to 36 and Comparative Examples 1 and 2 with a wire bar, and then dried in a drying oven at 150 ° C. for 40 seconds to specify.
  • the coating amount of the binder polymer was applied so as to be the amount shown in Table 3, and after the lower layer was provided, the particles shown in Table 3 in the coating liquid composition (II) for forming the upper layer having the following composition are shown in Table 3.
  • the coating was dried at 150 ° C. for 40 seconds to obtain a lithographic printing plate precursor of Example 38 having an image recording layer as a lower layer and an upper layer. .
  • lithographic printing plate precursor was conditioned at 25 ° C. and 60% RH for 2 hours, and then punched into 2.5 cm ⁇ 2.5 cm, and the continuous weighted scratch strength tester TYPE-18 manufactured by Shinto Kagaku Co., Ltd. was used. Set so that the back surface of the punched lithographic printing plate precursor is in contact with the surface of the lithographic printing plate precursor that has not been attached or punched, and the lithographic printing plate precursor is applied at a pressure of 0 gf to 1,500 gf (0N to 14.7N). I scratched several places.
  • the lithographic printing plate precursor with scratches was set on the Trendsetter 3244 manufactured by Creo, and the output was 7 W at the resolution of 2,400 dpi (dot per inch, 1 inch was 2.54 cm), the outer surface drum rotation speed was 150 rpm (revolutions per minute), and the plate surface energy was set. Image exposure was performed at 110 mJ / cm 2 .
  • the lithographic printing plate precursor after image exposure was mounted on an offset rotary printing machine manufactured by Tokyo Kikai Seisakusho, and Soybee KKST-S (red) manufactured by Inktec Co., Ltd.
  • planographic printing plate precursor was developed using Fuji Film Co., Ltd. PS plate processor LP940H in which developer XP-D (diluted to have an electric conductivity of 43 mS / cm) was prepared. Development was performed at a temperature of 30 ° C. and a development time of 20 seconds. The lithographic printing plate after development was cut into 5.0 cm ⁇ 5.0 cm, and the presence or absence and degree of omission of the image area were visually observed. The evaluation of the film omission suppressing property is performed by the following sensory evaluations 1 to 5, and 4 or more is a practically preferable level. 5: No omission was observed in the image area.
  • a transparent polyethylene terephthalate film (manufactured by Fuji Film Co., Ltd.) having a thickness of 0.1 mm was brought into close contact with the surface of the lithographic printing plate precursor, and a drum rotating speed of 150 rpm and a beam intensity of 10 W were applied by a Creo Trendsetter. The entire surface was exposed. After the exposure, the polyethylene terephthalate film was removed and visually inspected to observe the degree of dirt on the surface. The case where no stain was observed was 5, the case where a little stain was observed was 4, and the case where the film was contaminated to the extent that it was not visible through the film through the film was rated as 3. It can be said that the less the dirt is, the more excellent the abrasion resistance is. Therefore, the evaluation is preferably 5 or 4, and more preferably 5.
  • the description in the type column indicates the type of the specific binder polymer or particles used.
  • Art Pearl C-800 and Art Pearl J-7PY were contained at a ratio of 50:50 (molar ratio)
  • the elastic modulus (GPa) of Art Pearl C-800 was 0.03 GPa
  • the particle diameter was ( ⁇ m) is 6.0 ⁇ m
  • the elastic modulus (GPa) of Art Pearl J-7PY is 0.55 GPa
  • the particle size ( ⁇ m) is 6.5 ⁇ m.
  • Table 2 the examples in which "-" is written in the column of particles indicate that particles were not added.
  • the details of the particles are as follows. Art Pearl C-800; Urethane resin, Negami Kogyo Co., Ltd.
  • Art Pearl J-7PS Medium cross-linked acrylic resin, Negami Kogyo Co., Ltd. Tospearl 2000B; Silica, Tanac Co. Art Pearl J-7PY; Highly cross-linked acrylic Resin, Negami Kogyo Co., Ltd. Optobeads 6500M; Composite spherical particles composed of melamine resin and silica, Nissan Chemical Industries, Ltd. Art Pearl J-4P; Medium cross-linked acrylic resin, Negami Kogyo Co., Ltd. Art Pearl J- 5P: Medium-crosslinked acrylic resin, manufactured by Negami Kogyo Co., Ltd. Art Pearl J-6P; Medium-crosslinked acrylic resin, manufactured by Negami Kogyo Co., Ltd.
  • Art Pearl GR600 Medium-crosslinked acrylic crosslinked (PMMA) resin, manufactured by Negami Kogyo Co., Ltd.
  • Art Pearl P-800T Urethane resin, Negami Kogyo Co., Ltd.
  • Art Pearl CE-800T Urethane resin, Negami Product
  • the lithographic printing plate precursor according to the present disclosure has excellent scratch resistance even without interleaving paper. Further, it can be seen that the lithographic printing plate precursor according to the present disclosure is also excellent in the prevention of film omission and the ablation.

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Abstract

Provided are: a lithographic printing original plate that comprises a positive-type image recording layer on an aluminum support and in which the Bekk smoothness of the surface of the outermost layer on the side on which the image recording layer is present is 1,000 seconds or less, the outermost layer contains particles, and the modulus of elasticity of the particles is 3.0 GPa or less; a layered body of lithographic printing original plates; a method for producing a lithographic printing plate; and a lithographic printing method.

Description

平版印刷版原版、平版印刷版原版積層体、及び、平版印刷版の作製方法Lithographic printing plate precursor, lithographic printing plate precursor laminate, and method for producing lithographic printing plate
 本開示は、平版印刷版原版、平版印刷版原版積層体、及び、平版印刷版の作製方法に関する。 The present disclosure relates to a lithographic printing plate precursor, a lithographic printing plate precursor laminate, and a method for producing a lithographic printing plate.
 平版印刷版原版は、しばしば、複数枚重ね合わせた積層体として保管、搬送される。この積層体においては、通常、平版印刷版原版の集積ズレ防止、平版印刷版原版同士の接着防止、平版印刷版原版の画像記録層側表面の擦れ傷防止などの目的で、平版印刷版原版の間に合紙が挿入される。しかしながら、合紙の使用は、それ自体、コストアップ、廃棄処理などの問題を含んでおり、また、露光工程の前に取り除く必要があるため、製版工程の負荷、合紙剥離不良トラブル発生のリスクともなる。更に、合紙を取り除く際には、平版印刷版原版の記録層側表面が損傷を受けないよう配慮が必要となる。したがって、合紙を含まない態様(「合紙レス」ともいう。)であっても、積層可能な平版印刷版原版の開発が求められている。 《Lithographic printing plate precursors are often stored and transported as a stack of multiple sheets. In this laminate, usually, for the purpose of preventing accumulation deviation of the lithographic printing plate precursor, preventing adhesion between the lithographic printing plate precursors, preventing scratches on the image recording layer side surface of the lithographic printing plate precursor, A slip sheet is inserted between them. However, the use of interleaving paper itself involves problems such as cost increase and disposal processing, and since it needs to be removed before the exposure process, the load of the plate making process and the risk of occurrence of troubles in the interleaf paper peeling defect Will also be. Furthermore, when removing the slip sheet, it is necessary to take care so that the surface of the planographic printing plate precursor on the recording layer side is not damaged. Therefore, it is required to develop a lithographic printing plate precursor that can be laminated even in a mode that does not include interleaving paper (also referred to as "interleaving paperless").
 合紙の使用を省略することも可能な感光性平版印刷版に使用されるマット剤として、感光性平版印刷版の表面に付着させて使用される赤外線感受性の感光性平版印刷版用粒子状マット剤であって、赤外線吸収染料を含むことを特徴とするマット剤が開示されている(例えば、特許文献1参照)。
 また、支持体の片面に、水不溶性且つアルカリ可溶性樹脂と赤外線吸収剤とを含み、赤外線照射により画像を形成し得る記録層と、上記録層上にマット層とを有し、上記支持体の記録層を有する面とは反対の面に、膜厚が1.0μm~20μmである有機ポリマー層を有し、上記記録層と上記有機ポリマー層との静摩擦係数が0.45~0.60の範囲であることを特徴とする赤外線感光性平版印刷版原版が開示されている(例えば、特許文献2参照。)
As a matting agent used in a photosensitive lithographic printing plate that can omit the use of interleaving paper, an infrared-sensitive particle mat for a photosensitive lithographic printing plate that is used by being attached to the surface of the photosensitive lithographic printing plate A matting agent characterized by containing an infrared absorbing dye is disclosed (for example, refer to Patent Document 1).
Further, one side of the support has a recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorber and capable of forming an image by infrared irradiation, and a matte layer on the upper recording layer. An organic polymer layer having a film thickness of 1.0 μm to 20 μm is provided on the surface opposite to the surface having the recording layer, and the coefficient of static friction between the recording layer and the organic polymer layer is 0.45 to 0.60. An infrared-sensitive lithographic printing plate precursor characterized by having a range is disclosed (see, for example, Patent Document 2).
  特許文献1:特開2007-114221号公報
  特許文献2:特許第4680098号公報
Patent Document 1: Japanese Patent Laid-Open No. 2007-114221 Patent Document 2: Japanese Patent No. 4680098
 本開示の一実施形態が解決しようとする課題は、合紙レスであっても耐傷性に優れる平版印刷版原版、平版印刷版原版積層体、及び、平版印刷版の作製方法を提供することである。 The problem to be solved by one embodiment of the present disclosure is to provide a planographic printing plate precursor excellent in scratch resistance even without interleaving paper, a planographic printing plate laminate, and a method for producing a planographic printing plate. is there.
 上記課題を解決するための手段には、以下の態様が含まれる。
<1> アルミニウム支持体上に、ポジ型画像記録層を有し、
 上記画像記録層を有する側における最外層表面のBekk平滑度が1,000秒以下であり、
 上記最外層が粒子を含み、
 上記粒子の弾性率が3.0GPa以下である、平版印刷版原版。
<2> 上記画像記録層を有する側における最外層表面の算術平均高さSaが、0.3μm以上20μm以下である、上記<1>に記載の平版印刷版原版。
<3> 上記粒子が、アクリル樹脂粒子、シリカ粒子及びウレタン樹脂粒子よりなる群から選ばれる少なくとも1種を含む、上記<1>又は<2>に記載の平版印刷版原版。
<4> 上記画像記録層が、ガラス転移温度が60℃~230℃の樹脂を含む、上記<1>~<3>のいずれか1つに記載の平版印刷版原版。
<5> 上記画像記録層が、アセタール樹脂、フェノール樹脂、アクリル樹脂、及び、ウレア結合、ウレタン結合又はアミド結合を主鎖に有する樹脂よりなる群から選ばれる少なくとも1つを含む、上記<1>~<4>のいずれか1つに記載の平版印刷版原版。
<6> 上記画像記録層が、マレイミド構造を有するアクリル樹脂を含む、上記<5>に記載の平版印刷版原版。
<7> 上記画像記録層が、単層である、上記<1>~<6>のいずれか1つに記載の平版印刷版原版。
<8> 上記支持体上に、上記画像記録層が、上層及び下層からなる重層である、上記<1>~<6>のいずれか1つに記載の平版印刷版原版。
<9> 上記最外層が、上記画像記録層である、上記<1>~<8>のいずれか1つに記載の平版印刷版原版。
<10> 上記画像記録層上に、オーバーコート層を更に有し、上記オーバーコート層が、上記最外層である、上記<1>~<9>のいずれか1つに記載の平版印刷版原版。
<11> 上記画像記録層を有する側と反対の側にバックコート層を有する、上記<1>~<10>のいずれか1つに記載の平版印刷版原版。
<12> 上記<1>~<11>のいずれか1つに記載の平版印刷版原版を、画像様に露光し、露光部と未露光部とを形成する工程と、
 pH13.5以下のアルカリ水溶液を用いて現像する工程と、
 を含む、
 平版印刷版の作製方法。
<13> 上記アルカリ水溶液のpHが11以下である、上記<12>に記載の平版印刷版の作製方法。
<14> 上記<1>~<11>のいずれか1つに記載の平版印刷版原版を積層した、平版印刷版原版積層体。
<15> 上記平版印刷版原版の画像記録層を有する側における最外層と、他の平版印刷版原版の画像記録層を有する側とは反対側における最外層とを、直接接触させて積層させた、上記<14>に記載の平版印刷版原版積層体。
Means for solving the above problems include the following aspects.
<1> Having a positive image recording layer on an aluminum support,
The Bekk smoothness of the outermost layer surface on the side having the image recording layer is 1,000 seconds or less,
The outermost layer contains particles,
A lithographic printing plate precursor in which the elastic modulus of the particles is 3.0 GPa or less.
<2> The lithographic printing plate precursor as described in <1>, wherein the arithmetic average height Sa of the outermost layer surface on the side having the image recording layer is 0.3 μm or more and 20 μm or less.
<3> The lithographic printing plate precursor as described in <1> or <2> above, wherein the particles contain at least one selected from the group consisting of acrylic resin particles, silica particles and urethane resin particles.
<4> The lithographic printing plate precursor as described in any one of <1> to <3> above, wherein the image recording layer contains a resin having a glass transition temperature of 60 ° C to 230 ° C.
<5> The above-mentioned <1>, wherein the image recording layer contains at least one selected from the group consisting of acetal resin, phenol resin, acrylic resin, and resin having a urea bond, urethane bond or amide bond in the main chain. The lithographic printing plate precursor as described in any one of <4>.
<6> The lithographic printing plate precursor as described in <5>, wherein the image recording layer contains an acrylic resin having a maleimide structure.
<7> The lithographic printing plate precursor as described in any one of the above items <1> to <6>, wherein the image recording layer is a single layer.
<8> The lithographic printing plate precursor as described in any one of <1> to <6> above, wherein the image recording layer is a multi-layer comprising an upper layer and a lower layer on the support.
<9> The lithographic printing plate precursor as described in any one of <1> to <8>, wherein the outermost layer is the image recording layer.
<10> The lithographic printing plate precursor as described in any one of <1> to <9>, further including an overcoat layer on the image recording layer, and the overcoat layer is the outermost layer. .
<11> The lithographic printing plate precursor as described in any one of <1> to <10>, which has a back coat layer on the side opposite to the side having the image recording layer.
<12> A step of exposing the lithographic printing plate precursor according to any one of <1> to <11> above in an imagewise manner to form an exposed portion and an unexposed portion,
developing with an alkaline aqueous solution having a pH of 13.5 or less,
including,
Method of making a lithographic printing plate.
<13> The method for producing a lithographic printing plate as described in <12> above, wherein the alkaline aqueous solution has a pH of 11 or less.
<14> A lithographic printing plate precursor laminate obtained by laminating the lithographic printing plate precursor as described in any one of <1> to <11> above.
<15> The outermost layer on the side having the image recording layer of the lithographic printing plate precursor and the outermost layer on the side opposite to the side having the image recording layer of the other lithographic printing plate precursor were directly contacted and laminated. The lithographic printing plate precursor laminate according to <14> above.
 本開示の一実施形態によれば、合紙レスであっても耐傷性に優れる平版印刷版原版、平版印刷版原版積層体、及び、平版印刷版の作製方法を提供することができる。 According to an embodiment of the present disclosure, it is possible to provide a lithographic printing plate precursor, a lithographic printing plate precursor laminate excellent in scratch resistance even without a slip sheet, and a method for producing a lithographic printing plate.
 以下に記載する構成要件の説明は、本開示の代表的な実施態様に基づいてなされることがあるが、本開示はそのような実施態様に限定されるものではない。
 本明細書において、数値範囲を示す「~」とはその前後に記載される数値を下限値及び上限値として含む意味で使用される。
 本明細書における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 本明細書において、「(メタ)アクリル」は、アクリル及びメタクリルの両方を包含する概念で用いられる語であり、「(メタ)アクリロイル」は、アクリロイル及びメタクリロイルの両方を包含する概念として用いられる語である。
 本明細書中の「工程」の用語は、独立した工程だけではなく、他の工程と明確に区別できない場合であっても、その工程の所期の目的が達成されれば本用語に含まれる。
 本開示において、2以上の好ましい態様の組み合わせは、より好ましい態様である。
 また、本開示における重量平均分子量(Mw)及び数平均分子量(Mn)は、特に断りのない限り、TSKgel GMHxL、TSKgel G4000HxL、TSKgel G2000HxL(何れも東ソー(株)製の商品名)のカラムを使用したゲルパーミエーションクロマトグラフィー(GPC)分析装置により、溶媒THF(テトラヒドロフラン)、示差屈折計により検出し、標準物質としてポリスチレンを用いて換算した分子量である。
 本明細書において、「平版印刷版原版」の用語は、平版印刷版原版だけでなく、捨て版原版を包含する。また、「平版印刷版」の用語は、平版印刷版原版を、必要により、露光、現像などの操作を経て作製された平版印刷版だけでなく、捨て版を包含する。捨て版原版の場合には、必ずしも、露光、現像の操作は必要ない。捨て版とは、例えばカラーの新聞印刷において一部の紙面を単色又は2色で印刷を行う場合に、使用しない版胴に取り付けるための平版印刷版原版である。
 以下、本開示を詳細に説明する。
The description of the constituent elements described below may be made based on the representative embodiment of the present disclosure, but the present disclosure is not limited to such an embodiment.
In the present specification, “to” indicating a numerical range is used to mean that numerical values described before and after the numerical range are included as a lower limit value and an upper limit value.
In the description of the group (atom group) in the present specification, the notation in which substitution and non-substitution are not included includes not only those having no substituent but also those having a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, “(meth) acrylic” is a term used as a concept including both acryl and methacryl, and “(meth) acryloyl” is a term used as a concept including both acryloyl and methacryloyl. Is.
The term "process" in the present specification is included in the term not only as an independent process but also when it cannot be clearly distinguished from other processes as long as the intended purpose of the process is achieved. .
In the present disclosure, a combination of two or more preferable aspects is a more preferable aspect.
In addition, the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (both manufactured by Tosoh Corporation) unless otherwise specified. The gel permeation chromatography (GPC) analyzer was used to detect the solvent THF (tetrahydrofuran) with a differential refractometer, and the molecular weight was calculated using polystyrene as a standard substance.
In the present specification, the term “lithographic printing plate precursor” includes not only the lithographic printing plate precursor but also the discarded plate precursor. In addition, the term "lithographic printing plate" includes not only a lithographic printing plate precursor prepared through an operation such as exposure and development, but also a discarding plate, if necessary. In the case of a waste original plate, the operations of exposure and development are not always necessary. The waste plate is a lithographic printing plate precursor to be attached to a plate cylinder that is not used when a part of the paper surface is printed in a single color or two colors in color newspaper printing, for example.
Hereinafter, the present disclosure will be described in detail.
〔平版印刷版原版〕
 本開示に係る平版印刷版原版は、アルミニウム支持体(以下、単に「支持体」ともいう。)アルミニウム支持体上に、ポジ型画像記録層(以下、単に「画像記録層」ともいう。)を有し、上記画像記録層を有する側における最外層表面のBekk平滑度が1,000秒以下であり、上記最外層が粒子を含み、上記粒子の弾性率が3.0GPa以下である平版印刷版原版である。
 また、以降、本開示において、平版印刷版原版の画像記録層を有する側の最外層表面を「オモテ面」、画像記録層を有する側と反対の側の最外層表面を「ウラ面」ともいう。
[Lithographic printing plate precursor]
The lithographic printing plate precursor according to the present disclosure has a positive image recording layer (hereinafter, also simply referred to as “image recording layer”) on an aluminum support (hereinafter also simply referred to as “support”) aluminum support. And the Bekk smoothness of the outermost layer surface on the side having the image recording layer is 1,000 seconds or less, the outermost layer contains particles, and the elastic modulus of the particles is 3.0 GPa or less. The original version.
Further, hereinafter, in the present disclosure, the outermost layer surface of the lithographic printing plate precursor on the side having the image recording layer is also referred to as “front side”, and the outermost layer surface on the side opposite to the side having the image recording layer is also referred to as “back side”. .
 本開示者が鋭意検討した結果、本開示に係る平版印刷版原版は、上記構成をとることにより、合紙レスであっても耐傷性にも優れる平版印刷版原版を提供できることを見出した。また、本開示に係る平版印刷版原版は、アブレーションの抑制性が得られやすいことを見出した。
 上記優れた効果が得られる機序は明確ではないが、次のように推定している。
As a result of diligent studies by the present disclosure, it has been found that the planographic printing plate precursor according to the present disclosure can provide a planographic printing plate precursor excellent in scratch resistance even with no interleaving paper by adopting the above configuration. Further, it has been found that the planographic printing plate precursor according to the present disclosure is likely to obtain the suppression of ablation.
Although the mechanism by which the above excellent effects are obtained is not clear, it is estimated as follows.
 平版印刷版原版(以下、単に「原版」ともいう。)は、通常、原版製造時の版集積ズレ防止、原版同士の接着防止、集積体から原版を一枚ずつ取り出す製版工程における多重給版の防止、原版製造集積、輸送、ユーザー製版時、及び、印刷前といった一連の工程におけるコスレ傷防止等のために、原版と原版の間に合紙を挟んで原版を積層している。ユーザー製版時の合紙剥離不良トラブル防止、製版スピード向上、コストダウンの目的で合紙レスにする場合がある。一方、ポジ型平版印刷版原版の記録層では、赤外線吸収剤が、未露光部(画像部)ではアルカリ可溶性樹脂との相互作用により、アルカリ可溶性樹脂の溶解性を実質的に低下させる溶解阻止剤として働き、露光部(非画像部)では、発生した熱により赤外線吸収剤とアルカリ可溶性樹脂との相互作用が弱まりアルカリ現像液に溶解して画像を形成する。そのため、ポジ型平版印刷版原版は、記録層の機械的強度が充分でなく、製造加工、輸送、及び刷版取り扱い時に、版面と種々部材が強く接触すると、版面に欠陥が生じ、現像後の画像部に抜けが起こってしまう問題があった。このように合紙レスにする場合は、マット剤を感光性平版印刷版の表面に付着させて、接着防止を付与している。
 本発明者は、ポジ型平版印刷版原版において、単純にオモテ面に凹凸を付与するために、例えば、特許文献1に記載のマット剤等を原版の表面に付着させて、合紙レスにより原版を積層した場合、マット剤が画像記録層を変形させて画像記録層が薄くなるので、現像の際に、画像記録層が薄くなった部分から溶解することで支持体の露出(以下、「膜抜け」ともいう。)する問題があることが見出した。また、特許文献2に記載の平版印刷版原版において、合紙レスとした場合の耐傷性により優れる平版印刷版原版の開発が求められている。
A lithographic printing plate precursor (hereinafter, also simply referred to as “original plate”) is usually used for preventing misalignment of plates during production of the original plate, prevention of adhesion between the original plates, and multiple plate making in the plate making process in which the original plates are taken out one by one from the stack. In order to prevent scratches and prevent scratches in a series of processes such as prevention, master production accumulation, transportation, user plate making, and before printing, the master plates are laminated with a slip sheet interposed between the master plates. There is a case where the interleaving paper is not used for the purpose of preventing the trouble of peeling of interleaving paper at the time of user plate making, improving the plate making speed, and reducing the cost. On the other hand, in the recording layer of the positive lithographic printing plate precursor, the infrared absorbing agent is a dissolution inhibitor that substantially reduces the solubility of the alkali-soluble resin due to the interaction with the alkali-soluble resin in the unexposed area (image area). In the exposed area (non-image area), the generated heat weakens the interaction between the infrared absorbing agent and the alkali-soluble resin and dissolves in the alkali developing solution to form an image. Therefore, the positive type lithographic printing plate precursor has insufficient mechanical strength of the recording layer, and when the plate surface and various members come into strong contact with each other during manufacturing processing, transportation, and handling of the plate, defects occur on the plate surface, and There was a problem that the image part was missing. In the case where interleaving paper is not used in this way, a matting agent is attached to the surface of the photosensitive lithographic printing plate to provide adhesion prevention.
The present inventor, in the positive type lithographic printing plate precursor, simply attaches the matting agent or the like described in Patent Document 1 to the surface of the original plate in order to simply give unevenness to the front surface, and the original plate is made without interleaving paper. When the image recording layer is laminated, the matting agent deforms the image recording layer and the image recording layer becomes thin.Therefore, during development, the image recording layer is dissolved from the thinned portion to expose the support (hereinafter, referred to as “film I also found that there is a problem of "missing." Further, in the lithographic printing plate precursor described in Patent Document 2, it is required to develop a lithographic printing plate precursor that is more excellent in scratch resistance when interleaving paper is omitted.
 本発明者が鋭意検討した結果、本開示に係る平版印刷版原版において、画像記録層を有する側における最外層表面に、特定の弾性率以下である粒子(すなわち、適度に柔らかい粒子)を含ませ、かつ、最外層のBekk平滑度を特定の秒数以下とすることにより、合紙レスにおいて平版印刷版原版を重ねた場合(積層時)における平版印刷版原版の傷の発生を抑制し、耐傷性に優れると推察される。
 本開示に係る平版印刷原版は、画像記録層を有する側における最外層表面に、特定の弾性率以下の粒子を含ませているので、画像記録層の成分が露光時による飛散することを阻害すると考えられる。また、露光時に上記粒子が画像記録層に広がることで、画像記録層の成分の飛散を抑制するため、アブレーションの抑制が得られやすいと推察される。
 また、本開示に係る平版印刷原版は、特定の弾性率以下である粒子(すなわち、適度に柔らかい粒子)を含んでいるので、合紙レスとして原版を積層した場合であっても画像記録層が変形しにくくなり、膜抜けが抑制されやすいと推察される。
As a result of intensive studies by the present inventors, in the lithographic printing plate precursor according to the present disclosure, the outermost layer surface on the side having an image recording layer contains particles having a specific elastic modulus or less (that is, moderately soft particles). In addition, by controlling the Bekk smoothness of the outermost layer to a specific number of seconds or less, the occurrence of scratches on the lithographic printing plate precursors can be suppressed when the lithographic printing plate precursors are stacked (when laminated) without interleaving paper, and scratch resistance It is presumed that it has excellent properties.
The lithographic printing original plate according to the present disclosure includes particles having a specific elastic modulus or less on the outermost layer surface on the side having the image recording layer, so that it prevents the components of the image recording layer from scattering during exposure. Conceivable. Further, it is speculated that since the particles spread on the image recording layer at the time of exposure, scattering of components of the image recording layer is suppressed, and thus suppression of ablation can be easily obtained.
Further, since the lithographic printing original plate according to the present disclosure contains particles having a specific elastic modulus or less (that is, particles that are moderately soft), even when the original plates are laminated without interleaving paper, the image recording layer is It is presumed that the film is less likely to be deformed and the film omission is easily suppressed.
 本開示に係る平版印刷版原版は、支持体上に画像記録層(ポジ型画像記録層)を有する。本開示に係る平版印刷版原版は、画像記録層が、最外層であってもよい。
 また、本開示に係る平版印刷版原版は、支持体と画像記録層との間に下塗り層を有していてもよいし、また、画像記録層上にオーバーコート層(保護層)を有していてもよいし、支持体の画像記録層を有する側とは反対側(ウラ面)に、樹脂層(バックコート層)を有していてもよい。
 画像記録層は、単層であってもよく、上層及び下層からなる重層であってもよい。
 本開示に係る平版印刷版原版は、機上現像に用いられる平版印刷版原版であってもよいし、現像液による現像に用いられる平版印刷版原版であってもよい。
 上記最外層表面は、上記オーバーコート層を有する場合にはオーバーコート層の表面である。
The lithographic printing plate precursor according to the present disclosure has an image recording layer (positive type image recording layer) on a support. In the lithographic printing plate precursor according to the present disclosure, the image recording layer may be the outermost layer.
Further, the lithographic printing plate precursor according to the present disclosure may have an undercoat layer between the support and the image recording layer, and also has an overcoat layer (protective layer) on the image recording layer. Alternatively, a resin layer (back coat layer) may be provided on the side (back side) opposite to the side having the image recording layer of the support.
The image recording layer may be a single layer or a multi-layer composed of an upper layer and a lower layer.
The lithographic printing plate precursor according to the present disclosure may be a lithographic printing plate precursor used for on-press development or a lithographic printing plate precursor used for development with a developer.
The outermost layer surface is the surface of the overcoat layer when the above-mentioned overcoat layer is included.
<Bekk平滑度>
〔オモテ面〕
 本開示に係る平版印刷版原版は、合紙レス積層時の耐傷性の観点から、画像記録層を有する側における最外層表面(オモテ面)のBekk平滑度(以下、「Bekk平滑度a」ともいう。)が、1,000秒以下であり、300秒以下であることが好ましく、100秒以下であることがより好ましい。また、Bekk平滑度aとしては、積層体から原版を取り出す給版性、及び、合紙レス積層時の剥離容易性の観点から、0秒以上であることが好ましく、0.5秒以上であることがより好ましく、1秒以上であることが更に好ましく、5秒以上であることが特に好ましい。
<Bekk smoothness>
[Front side]
The lithographic printing plate precursor according to the present disclosure has a Bekk smoothness of the outermost layer surface (front surface) on the side having an image recording layer (hereinafter, also referred to as “Bekk smoothness a”) from the viewpoint of scratch resistance during stacking without interleaving paper. Is 1,000 seconds or less, preferably 300 seconds or less, and more preferably 100 seconds or less. The Bekk smoothness a is preferably 0 second or more, and more preferably 0.5 second or more, from the viewpoints of plate feeding property for taking out the original plate from the laminate and ease of peeling at the time of laminating without interleaving paper. More preferably, it is more preferably 1 second or longer, and particularly preferably 5 seconds or longer.
〔ウラ面〕
 本開示に係る平版印刷版原版は、積層体から原版を取り出す給版性、及び、合紙レス積層時の剥離容易性の観点から、ウラ面のBekk平滑度b(以下、「Bekk平滑度b」ともいう。)が、1,000秒以下であることが好ましく、500秒以下であることがより好ましく、300秒以下であることが更に好ましい。
[Back side]
The lithographic printing plate precursor according to the present disclosure has a Bekk smoothness b (hereinafter, referred to as “Bekk smoothness b Is also preferably 1,000 seconds or less, more preferably 500 seconds or less, and further preferably 300 seconds or less.
 本開示に係るBekk平滑度(Bekk秒)の測定は、JIS P8119(1998)に準拠して行うものとする。具体的な測定方法としては、熊谷理機工業(株)製ベック平滑度試験機を用い、標準空気量の1/10、すなわち1mLの空気量で測定する。 The Bekk smoothness (Bekk seconds) according to the present disclosure is measured according to JIS P8119 (1998). As a specific measuring method, a Beck smoothness tester manufactured by Kumagai Riki Kogyo Co., Ltd. is used, and measurement is performed with an air amount of 1/10 of the standard air amount, that is, 1 mL.
 本開示における算術平均高さSaの測定は、ISO 25178に記載の方法に準じて行うものとする。具体的には、菱化システム(株)製のマイクロマップMM3200-M100を用いて、同一サンプルから5か所選択して測定し、それらの平均値を算術平均高さSaとする。測定範囲に関しては、サンプル表面からランダムに選んだ1cm×1cmの範囲を測定する。 The measurement of the arithmetic mean height Sa in the present disclosure shall be performed according to the method described in ISO 25178. Specifically, using Micromap MM3200-M100 manufactured by Ryoka Systems Co., Ltd., five points are selected from the same sample and measured, and the average value thereof is taken as the arithmetic average height Sa. Regarding the measurement range, a range of 1 cm × 1 cm randomly selected from the sample surface is measured.
<算術平均高さSa>
〔オモテ面〕
 本開示に係る平版印刷版原版は、画像記録層を有する側における最外層表面(オモテ面)の算術平均高さSaが、耐傷性、及び、合紙レス積層時の剥離容易性の観点から、0.3μm以上20μm以下であることが好ましく、0.5μm以上10μm未満であることがより好ましく、0.5μm以上7μm未満であることが更に好ましく、0.5μm以上3μm未満であることが特に好ましい。
 また、オモテ面の算術平均高さSaは、ウラ面の算術平均高さSaよりも小さいことが好ましい。
 なお、オモテ面としては、画像記録層の表面、又は、画像記録層上に保護層を有する場合には保護層の表面が挙げられる。
<Arithmetic mean height Sa>
[Front side]
The lithographic printing plate precursor according to the present disclosure has an arithmetic average height Sa of the outermost layer surface (front surface) on the side having an image recording layer, from the viewpoint of scratch resistance and peeling ease during interleaving without interleaving paper. It is preferably 0.3 μm or more and 20 μm or less, more preferably 0.5 μm or more and less than 10 μm, further preferably 0.5 μm or more and less than 7 μm, and particularly preferably 0.5 μm or more and less than 3 μm. .
Further, the arithmetic average height Sa of the front surface is preferably smaller than the arithmetic average height Sa of the back surface.
The front surface may be the surface of the image recording layer or the surface of the protective layer when the image recording layer has a protective layer.
 〔ウラ面〕
 本開示に係る平版印刷版原版は、上記画像記録層を有する側と反対の側における最外層表面(ウラ面)の算術平均高さSaが、0.3μm以上20μm以下であることが好ましい。
 画像記録層を有する側とは反対側における最外層表面の算術平均高さSaが、0.3μm以上20μm以下であると、合紙レス積層した場合等で画像記録層を有する側とは反対側における最外層表面(ウラ面)の凸部が画像記録層深くまで抑えつけられて画像記録層がダメージを受けてしまい現像遅れが生じることが抑制される。
 機上現像遅れ防止性及び、合紙レス積層時の耐傷性の観点から、ウラ面の算術平均高さとしては、0.5μm以上10μm未満であり、0.5μm以上7μm未満であることが更に好ましく、0.5μm以上3μm未満であることが特に好ましい。
 なお、上記画像記録層を有する側とは反対側における最外層表面(ウラ面)としては、支持体の上記画像記録層を有する側とは反対側の表面、又は、バックコート層表面が挙げられる。
[Back side]
In the lithographic printing plate precursor according to the present disclosure, the arithmetic average height Sa of the outermost layer surface (back surface) on the side opposite to the side having the image recording layer is preferably 0.3 μm or more and 20 μm or less.
When the arithmetic mean height Sa of the outermost layer surface on the side opposite to the side having the image recording layer is 0.3 μm or more and 20 μm or less, it is the side opposite to the side having the image recording layer when laminated without interleaving paper. It is possible to suppress the development delay due to the fact that the convex portion of the outermost layer surface (back surface) in (3) is suppressed to the depth of the image recording layer and the image recording layer is damaged.
From the viewpoint of the on-press development delay prevention property and the scratch resistance at the time of stacking without interleaving paper, the arithmetic average height of the back surface is 0.5 μm or more and less than 10 μm, and more preferably 0.5 μm or more and less than 7 μm. It is preferably 0.5 μm or more and less than 3 μm.
The outermost layer surface (back surface) on the side opposite to the side having the image recording layer may be the surface of the support opposite to the side having the image recording layer, or the back coat layer surface. .
〔合計値〕
 本開示に係る平版印刷版原版は、上記画像記録層を有する面における最外層表面の算術平均高さSaと、上記画像記録層を有する面とは反対側における最外層表面の算術平均高さSaとの合計値は、画像記録層を有する側とは反対側における最外層表面の算術平均高さSaとの合計値が、機上現像遅れ防止性、積層体から原版を取り出す給版性、粒子の脱落抑制性、耐傷性、及び、合紙レス積層時の剥離容易性の観点から0.3μmを超え20μm以下であることが好ましく、より好ましくは0.4μm~20μm、更に好ましくは1μm~20μm、特に好ましくは1μm~14μmである。
[Total value]
In the lithographic printing plate precursor according to the present disclosure, the arithmetic average height Sa of the outermost layer surface on the surface having the image recording layer and the arithmetic average height Sa of the outermost layer surface on the side opposite to the surface having the image recording layer Sa. And the arithmetic mean height Sa of the surface of the outermost layer on the side opposite to the side having the image recording layer is the on-machine development delay prevention property, the plate feeding property for taking out the original plate from the laminate, the particle Is more than 0.3 μm and 20 μm or less, more preferably 0.4 μm to 20 μm, still more preferably 1 μm to 20 μm, from the viewpoints of drop-off prevention property, scratch resistance, and ease of peeling when laminated without interleaving paper. , Particularly preferably 1 μm to 14 μm.
-特定粒子-
<弾性率が3.0GPa以下である粒子>
 本開示に係る平版印刷版原版において、上記最外層(オモテ面)が粒子を含み、上記粒子の弾性率は3.0GPa以下である。
 特定粒子の弾性率が3.0GPa以下であると、特定粒子は適度に柔らかく、合紙レスにおいて平版印刷版原版を重ねた場合(積層時)における平版印刷版原版の傷の発生を抑制し、耐傷性に優れる。
 上記観点から、特定粒子の弾性率としては、0.001GPa以上3.0GPa以下であることが好ましく、より好ましくは0.05GPa以上0.5GPa以下、更に好ましくは0.01GPa以上1.0GPa以下である。
 特定粒子の弾性率は、押し込み試験により求められ、より詳細には以下の方法で測定することができる。
 ガラス基板上に特定粒子を塗布したサンプルを、微小硬度試験機に設置する。設置されたサンプルの粒子1つを狙い、平面圧子は粒子(球)に比べて十分硬いと仮定して、下記測定条件にて、平面圧子でサンプル粒子を圧縮し、球押し込み試験を行う。
 得られた荷重変異曲線を、下記数式1に示される接触式(ヘルツ式)にフィッティングして、弾性率(GPa)を算出する。
-Specific particles-
<Particles having an elastic modulus of 3.0 GPa or less>
In the lithographic printing plate precursor according to the present disclosure, the outermost layer (front surface) contains particles, and the elastic modulus of the particles is 3.0 GPa or less.
When the elastic modulus of the specific particles is 3.0 GPa or less, the specific particles are appropriately soft, and suppress the occurrence of scratches on the lithographic printing plate precursor when the lithographic printing plate precursors are stacked (when laminated) without interleaving paper, Excellent scratch resistance.
From the above viewpoint, the elastic modulus of the specific particles is preferably 0.001 GPa or more and 3.0 GPa or less, more preferably 0.05 GPa or more and 0.5 GPa or less, and further preferably 0.01 GPa or more and 1.0 GPa or less. is there.
The elastic modulus of the specific particles is obtained by an indentation test, and more specifically, it can be measured by the following method.
A sample in which specific particles are coated on a glass substrate is set in a micro hardness tester. Aiming at one particle of the installed sample, assuming that the plane indenter is sufficiently harder than the particle (sphere), sample particles are compressed with the plane indenter under the following measurement conditions, and a sphere indentation test is performed.
The obtained load variation curve is fitted to the contact formula (Hertz formula) shown in the following formula 1 to calculate the elastic modulus (GPa).
<測定条件>
 装置:微小硬度試験機HM500((株)フィッシャー・インストルメンツ社製)
 平面圧子:50μm×50μmの平面圧子
 荷重:1mN/20secで押し込み
<Measurement conditions>
Equipment: Micro hardness tester HM500 (manufactured by Fisher Instruments Inc.)
Plane indenter: 50 μm x 50 μm plane indenter Load: 1 mN / 20 sec.
Figure JPOXMLDOC01-appb-M000001
Figure JPOXMLDOC01-appb-M000001
 式1中のσ、P、E、v及びRは、下記のとおりである。
σ:変位
:荷重
:粒子(球)の弾性率
:粒子(球)のポアソン比
:粒子の半径
Σ 3 , P 2 , E 1 , v 1 and R 0 in Formula 1 are as follows.
σ 3 : displacement P 2 : load E 1 : elastic modulus of particle (sphere) v 1 : Poisson's ratio of particle (sphere) R 0 : radius of particle
 本開示に係る平版印刷版原版において、オモテ面における最外層は特定粒子を1種含んでいてもよく、2種以上を併用して含んでいてもよい。 In the lithographic printing plate precursor according to the present disclosure, the outermost layer on the front surface may include one type of specific particles, or may include two or more types in combination.
-平均粒子径-
 オモテ面における最外層において、上記特定粒子の平均粒子径は、耐傷性及び膜抜け抑制性の観点から、好ましくは0.7μm~20μm、より好ましくは1μm~15μm、更に好ましくは3μm~10μmであり、特に好ましくは4μm~7μmである。
 上記特定粒子は、平均粒子径の異なる特定粒子を2種以上併用してもよい。
-Average particle size-
In the outermost layer on the front surface, the average particle diameter of the specific particles is preferably 0.7 μm to 20 μm, more preferably 1 μm to 15 μm, and further preferably 3 μm to 10 μm, from the viewpoint of scratch resistance and film removal prevention property. And particularly preferably 4 μm to 7 μm.
The specific particles may be a combination of two or more specific particles having different average particle sizes.
 上記特定粒子が後述のオーバーコート層に含まれる場合、特定粒子の平均粒子径は、オーバーコート層の厚さの1.3倍以上であることが好ましく、1.3倍以上10倍以下であることがより好ましい。 When the specific particles are contained in the overcoat layer described below, the average particle size of the specific particles is preferably 1.3 times or more, and 1.3 times or more and 10 times or less the thickness of the overcoat layer. Is more preferable.
 本開示における特定粒子の平均粒径は、体積平均粒径を意味し、体積平均粒径の測定は、レーザー回折・散乱式粒度分布計により測定する。具体的には、例えば、粒度分布測定装置「マイクロトラックMT-3300II」(日機装(株)製)を用いて測定する。
 また、本開示において、特に断りのない限り、他の粒子についても、上記測定方法により平均粒径を測定するものとする。
The average particle size of the specific particles in the present disclosure means a volume average particle size, and the volume average particle size is measured by a laser diffraction / scattering type particle size distribution meter. Specifically, for example, the particle size distribution measurement device “Microtrac MT-3300II” (manufactured by Nikkiso Co., Ltd.) is used.
In addition, in the present disclosure, the average particle size of other particles is also measured by the above measuring method unless otherwise specified.
 オモテ面における最外層において、上記特定粒子の面内密度は、好ましくは100個/mm~5000個/mm、より好ましくは100個/mm~3000個/mmである。 In the outermost layer on the front surface, the in-plane density of the specific particles is preferably 100 particles / mm 2 to 5000 particles / mm 2 , and more preferably 100 particles / mm 2 to 3000 particles / mm 2 .
 本開示における面内密度は、平版印刷版原版の表面を走査型電子顕微鏡(SEM)により観察することによって確認することができる。具体的には走査型電子顕微鏡(SEM)で平版印刷版原版の表面を5箇所観察して特定粒子の個数をカウントし、観察視野面積mm当たりの特定粒子個数に変換し、その平均値を求めることにより行うことができる。 The in-plane density in the present disclosure can be confirmed by observing the surface of the lithographic printing plate precursor with a scanning electron microscope (SEM). Specifically, the number of specific particles is counted by observing the surface of the lithographic printing plate precursor at 5 points with a scanning electron microscope (SEM), and converted into the number of specific particles per observation visual field area mm 2 , and the average value is calculated. It can be done by asking.
 本開示に係る平版印刷版原版において、特定粒子としては、特に制限はないが、耐傷性の観点から、有機樹脂粒子、及び、無機粒子よりなる群から選ばれる少なくとも1種の粒子であることが好ましく、有機樹脂粒子であることがより好ましい。 In the lithographic printing plate precursor according to the present disclosure, the specific particles are not particularly limited, but from the viewpoint of scratch resistance, at least one kind of particles selected from the group consisting of organic resin particles and inorganic particles may be used. Organic resin particles are more preferable.
<<有機粒子>>
 有機樹脂粒子としては、ポリ(メタ)アクリル酸エステル類、ポリスチレン及びその誘導体、ポリアミド類、ポリイミド類、低密度ポリエチレン、高密度ポリエチレン、ポリプロピレン、などのポリオレフィン類、ポリウレタン類、ポリウレア類、ポリエステル類などの合成樹脂からなる粒子、及び、キチン、キトサン、セルロース、架橋澱粉、架橋セルロース等の天然高分子からなる粒子などが好ましく挙げられる。
 中でも、有機樹脂粒子は、粒子サイズ制御の容易さや、表面改質により所望の表面特性を制御し易いなどの利点があり、また、耐傷性に優れる観点から、有機樹脂粒子としては、ウレタン樹脂粒子、又は、アクリル樹脂粒子であることが好ましい。
<< organic particles >>
Examples of the organic resin particles include poly (meth) acrylic acid esters, polystyrene and its derivatives, polyamides, polyimides, low density polyethylene, high density polyethylene, polypropylene and other polyolefins, polyurethanes, polyureas, polyesters, etc. Preferable examples thereof include particles made of the synthetic resin described above, and particles made of natural polymers such as chitin, chitosan, cellulose, crosslinked starch, and crosslinked cellulose.
Among them, the organic resin particles have advantages such as easy particle size control and easy control of desired surface characteristics by surface modification, and from the viewpoint of excellent scratch resistance, the organic resin particles include urethane resin particles. , Or acrylic resin particles are preferred.
 有機樹脂粒子の製造方法については、ポリメチルメタクリレート(PMMA)のような比較的に硬い樹脂では、破砕法による微粒子化も可能であるが、乳化懸濁重合法により粒子を合成する方法が、粒子径制御の容易性、精度から好ましく採用されている。
 有機樹脂粒子の製造方法は、「超微粒子と材料」日本材料科学会編、裳華房、1993年発刊、「微粒子・粉体の作製と応用」川口春馬監修、シーエムシー出版、2005年発刊等に詳細に記載されている。
Regarding the production method of organic resin particles, a relatively hard resin such as polymethylmethacrylate (PMMA) can be made into fine particles by a crushing method, but a method of synthesizing particles by an emulsion suspension polymerization method is It is preferably used because of its ease of diameter control and accuracy.
The method for producing organic resin particles is published in "Ultrafine Particles and Materials" edited by Japan Society for Materials Science, published by Sohbo, 1993, "Preparation and application of fine particles and powders" supervised by Haruma Kawaguchi, CMC Publishing, 2005 Etc. in detail.
 有機樹脂粒子は市販品としても入手可能であり、例えば、綜研化学(株)製、架橋アクリル樹脂MX-40T、MX-80H3wT、MX-150、MX-180TA、MX-300、MX-500、MX-1000、MX-1500H、MR-2HG、MR-7HG,MR-10HG、MR-3GSN、MR-5GSN、MR-7G、MR-10G、MR-5C、MR-7GC、スチリル樹脂系のSX-350H、SX-500H、積水化成品工業(株)製アクリル樹脂MBX-5、MBX-8、MBX-12MBX-15、MBX-20,MB20X-5、MB30X-5、MB30X-8、MB30X-20、SBX-6、SBX-8、SBX-12、SBX-17、三井化学(株)製ポリオレフィン樹脂、ケミパール(登録商標)W100、W200、W300、W308、W310、W400、W401、W405、W410、W500、WF640、W700、W800、W900、W950、WP100などが挙げられる。 Organic resin particles are also available as commercial products, for example, cross-linked acrylic resins MX-40T, MX-80H3wT, MX-150, MX-180TA, MX-300, MX-500, MX, manufactured by Soken Chemical Industry Co., Ltd. -1000, MX-1500H, MR-2HG, MR-7HG, MR-10HG, MR-3GSN, MR-5GSN, MR-7G, MR-10G, MR-5C, MR-7GC, styryl resin SX-350H , SX-500H, acrylic resin MBX-5, MBX-8, MBX-12MBX-15, MBX-20, MB20X-5, MB30X-5, MB30X-8, MB30X-20, SBX manufactured by Sekisui Plastics Co., Ltd. -6, SBX-8, SBX-12, SBX-17, polyolefin resin manufactured by Mitsui Chemicals, Inc., Chemipearl (registered trademark) 100, W200, W300, W308, W310, W400, W401, W405, W410, W500, WF640, W700, W800, W900, W950, WP100, and the like.
<<無機粒子>>
 無機粒子としては、シリカ、アルミナ、ジルコニア、チタニア、カーボンブラック、グラファイト、BaSO、ZnS、MgCO、CaCO、ZnO、CaO、WS、MoS、MgO、SnO、α-Fe、α-FeOOH、SiC、CeO、BN、SiN、MoC、BC、WC、チタンカーバイド、コランダム、人造ダイヤモンド、石榴石、ガーネット、珪石、トリボリ、珪藻土、ドロマイトなどの粒子が挙げられる。
 これらの中でも、耐傷性の観点から、無機粒子としては、シリカ粒子であることが好ましい。また、上記シリカ粒子は、シリコーン樹脂粒子を焼成して得られるシリカ粒子であってもよい。
 シリコーン樹脂粒子を焼成して得られるシリカ粒子としては、例えば、(株)タナック製のトスパール2000B、トスパール120(粒子径2μm)、トスパール145(粒子径4.5μm)等が挙げられる。
<< Inorganic particles >>
Examples of the inorganic particles include silica, alumina, zirconia, titania, carbon black, graphite, BaSO 4 , ZnS, MgCO 3 , CaCO 3 , ZnO, CaO, WS 2 , MoS 2 , MgO, SnO 2 , α-Fe 2 O 3. , Α-FeOOH, SiC, CeO 2 , BN, SiN, MoC, BC, WC, titanium carbide, corundum, artificial diamond, gemstone, garnet, silica stone, triboli, diatomaceous earth, dolomite, and the like.
Among these, silica particles are preferable as the inorganic particles from the viewpoint of scratch resistance. Further, the silica particles may be silica particles obtained by firing silicone resin particles.
Examples of silica particles obtained by baking the silicone resin particles include Tospearl 2000B, Tospearl 120 (particle diameter 2 μm), Tospearl 145 (particle diameter 4.5 μm) and the like manufactured by Tanac Co., Ltd.
 上記特定粒子は、表面処理が施されていてもよい。表面処理方法としては、特に制限はなく、公知の方法が挙げられる。また、上記特定粒子は、表面処理の異なる粒子を2種以上併用してもよい。
 耐傷性の観点から、特定粒子は、シリカ、アルミナ、チタニア及びジルコニアよりなる群から選ばれる少なくとも1種の無機化合物で被覆された有機樹脂粒子が好ましく、シリカで被覆された有機樹脂粒子が特に好ましい。
 上記有機樹脂は、ポリアクリル系樹脂、ポリウレタン系樹脂、ポリスチレン系樹脂、ポリエステル系樹脂、エポキシ系樹脂、フェノール系樹脂及びメラミン樹脂よりなる群から選ばれる少なくとも1種の樹脂であることが好ましい。
The specific particles may be surface-treated. The surface treatment method is not particularly limited and may be a known method. Further, as the specific particles, two or more kinds of particles having different surface treatments may be used in combination.
From the viewpoint of scratch resistance, the specific particles are preferably organic resin particles coated with at least one inorganic compound selected from the group consisting of silica, alumina, titania and zirconia, and particularly preferably silica-coated organic resin particles. .
The organic resin is preferably at least one resin selected from the group consisting of polyacrylic resins, polyurethane resins, polystyrene resins, polyester resins, epoxy resins, phenol resins and melamine resins.
 以下に、シリカで被覆された有機樹脂粒子(以下、「シリカ被覆有機樹脂粒子」ともいう。)を例として詳細に説明するが、本開示における特定粒子はこれに限定されるものではない。 Hereinafter, the organic resin particles coated with silica (hereinafter, also referred to as “silica-coated organic resin particles”) will be described in detail as an example, but the specific particles in the present disclosure are not limited thereto.
 シリカ被覆有機樹脂粒子は、有機樹脂からなる粒子をシリカで表面被覆した粒子である。コアを構成する有機樹脂粒子は、空気中の湿分や、温度によって、軟化したり、べとついたりすることがないことが好ましい。
 シリカ被覆有機樹脂粒子における有機樹脂粒子を構成する有機樹脂としては、例えば、ポリアクリル系樹脂、ポリウレタン系樹脂、ポリスチレン系樹脂、ポリエステル系樹脂、エポシキ系樹脂、フェノール樹脂、メラミン樹脂などが挙げられる。
The silica-coated organic resin particles are particles in which particles made of an organic resin are surface-coated with silica. It is preferable that the organic resin particles forming the core do not soften or become sticky depending on moisture in the air or temperature.
Examples of the organic resin forming the organic resin particles in the silica-coated organic resin particles include polyacrylic resin, polyurethane resin, polystyrene resin, polyester resin, epoxy resin, phenol resin, and melamine resin.
 シリカ被覆有機樹脂粒子の表面を被覆するシリカ層を形成する材料としては、アルコキシシロキサン系化合物の縮合物などのアルコキシシリル基を有する化合物、特に、シロキサン系材料、具体的には、シリカゾル、コロイダルシリカ、シリカナノ粒子などのシリカ粒子などが好ましく挙げられる。
 シリカ被覆有機樹脂粒子の構成は、有機樹脂粒子表面にシリカ粒子が固体成分として付着している構成であっても、アルコキシシロキサン系化合物を縮合反応させて有機樹脂粒子表面にシロキサン系化合物層を形成した構成であってもよい。
As a material for forming the silica layer that coats the surface of the silica-coated organic resin particles, a compound having an alkoxysilyl group such as a condensation product of an alkoxysiloxane-based compound, particularly a siloxane-based material, specifically, silica sol or colloidal silica. Preferred are silica particles such as silica nanoparticles.
Even if the silica-coated organic resin particles have a structure in which silica particles are adhered to the surface of the organic resin particles as a solid component, the siloxane compound layer is formed on the surface of the organic resin particles by condensation reaction of the alkoxysiloxane compound. It may be configured.
 シリカは必ずしも有機樹脂粒子表面全域を被覆している必要はなく、少なくとも有機樹脂粒子の全質量に対し、0.5質量%以上の量で表面を被覆していることが好ましい。すなわち、有機樹脂粒子の表面の少なくとも一部にシリカが存在することで、有機粒子表面における、共存する水溶性高分子、例えば、ポリビニルアルコール(PVA)との親和性の向上が達成され、外部応力を受けた場合でも粒子の脱落が抑制され、優れた耐傷性、合紙レス積層時の剥離容易性を維持することができる。このため、本開示における「シリカ被覆」とは、このように有機樹脂粒子の表面の少なくとも一部にシリカが存在する状態をも包含するものである。
 シリカの表面被覆状態は、走査型電子顕微鏡(SEM)等による形態観察により確認することができる。また、シリカの被覆量は、蛍光X線分析などの元素分析によりSi原子を検知し、そこに存在するシリカの量を算出することで確認することができる。
Silica does not necessarily have to cover the entire surface of the organic resin particles, and it is preferable that the surface is coated with at least 0.5 mass% of the total mass of the organic resin particles. That is, by virtue of the presence of silica on at least a part of the surface of the organic resin particles, the affinity for the coexisting water-soluble polymer, for example, polyvinyl alcohol (PVA) on the surface of the organic particles is improved, and external stress is applied. Even when the sheet is exposed, falling of particles is suppressed, and excellent scratch resistance and easy peeling at the time of stacking without interleaving paper can be maintained. Therefore, the “silica coating” in the present disclosure includes such a state that silica is present on at least a part of the surface of the organic resin particles.
The surface coverage of silica can be confirmed by morphological observation with a scanning electron microscope (SEM) or the like. The silica coating amount can be confirmed by detecting Si atoms by elemental analysis such as fluorescent X-ray analysis and calculating the amount of silica present therein.
 シリカ被覆有機樹脂粒子の製造方法は特に制限はなく、シリカ粒子あるいはシリカ前駆体化合物を、有機樹脂粒子の原料となるモノマー成分と共存させて有機樹脂粒子形成と同時にシリカ表面被覆層を形成させる方法であってもよく、また、有機樹脂粒子を形成した後、シリカ粒子を物理的に表面に付着させ、その後、固定化する方法であってもよい。 The method for producing the silica-coated organic resin particles is not particularly limited, and a method of coexisting silica particles or a silica precursor compound with a monomer component as a raw material for the organic resin particles to form the organic resin particles and simultaneously form a silica surface coating layer Alternatively, after forming the organic resin particles, silica particles may be physically attached to the surface and then fixed.
 以下に、シリカ被覆有機樹脂粒子の製造方法の1例を挙げる。まず、ポリビニルアルコール、メチルセルロース、ポリアクリル酸などの水溶性高分子やリン酸カルシウム、炭酸カルシウムなどの無機系懸濁剤などから適宜選択される懸濁安定剤を含む水中に、シリカと、原料樹脂(より具体的には、上記有機樹脂を構成する、懸濁重合が可能なモノマー、懸濁架橋が可能なプレポリマー、又は樹脂液などの原料樹脂)とを添加、撹拌、混合して、シリカと原料樹脂とを分散させた懸濁液を調製する。その際、懸濁安定剤の種類、その濃度、撹拌回転数などを調節することにより、目的の粒径を有する懸濁液を形成することができる。次いで、この懸濁液を加温して反応を開始させ、樹脂原料を、懸濁重合又は懸濁架橋させることにより樹脂粒子を生成させる。このとき、共存するシリカが重合或いは架橋反応により硬化する樹脂粒子に、特に、その物性に起因して樹脂粒子表面近傍に、固定化される。その後、懸濁液を固液分離し、洗浄により粒子に付着している懸濁安定剤を除去し、乾燥させる。かくして、シリカが固定化された所望粒径の略球状のシリカ被覆有機樹脂粒子が得られる。 The following is an example of a method for producing silica-coated organic resin particles. First, in a water containing a suspension stabilizer appropriately selected from water-soluble polymers such as polyvinyl alcohol, methyl cellulose, and polyacrylic acid, and inorganic suspending agents such as calcium phosphate and calcium carbonate, silica and the raw material resin (more Specifically, a monomer capable of suspension polymerization, a prepolymer capable of suspension crosslinking, or a raw material resin such as a resin liquid, which constitutes the above organic resin, is added, stirred, and mixed to obtain silica and a raw material. A suspension in which a resin is dispersed is prepared. At that time, a suspension having a desired particle size can be formed by adjusting the type of the suspension stabilizer, its concentration, the stirring rotation speed, and the like. Next, the suspension is heated to start the reaction, and the resin raw material is subjected to suspension polymerization or suspension crosslinking to generate resin particles. At this time, the coexisting silica is fixed to the resin particles which are cured by the polymerization or the crosslinking reaction, particularly in the vicinity of the surface of the resin particles due to its physical properties. Thereafter, the suspension is subjected to solid-liquid separation, the suspension stabilizer attached to the particles is removed by washing, and the suspension is dried. Thus, substantially spherical silica-coated organic resin particles having a desired particle size on which silica is immobilized can be obtained.
 このように、懸濁重合又は懸濁架橋の際に条件を制御して所望の粒径のシリカ被覆有機樹脂粒子を得ることもできるし、このような制御を厳密に行うことなくシリカ被覆有機樹脂粒子を生成した後、メッシュ濾過法などにより所望の大きさのシリカ被覆有機粒子を得ることもできる。 Thus, the silica-coated organic resin particles having a desired particle size can be obtained by controlling the conditions during suspension polymerization or suspension cross-linking, and the silica-coated organic resin can be strictly controlled without such control. It is also possible to obtain silica-coated organic particles having a desired size by a mesh filtration method or the like after the particles are generated.
 上記方法によりシリカ被覆有機粒子を製造する際の混合物における原料の添加量などについては、例えば、原料樹脂とシリカとの総量が100質量部の場合、まず、分散媒である水200質量部~800質量部に懸濁安定剤0.1質量部~20質量部を添加し、十分に溶解又は分散させ、その液中に、上記100質量部の原料樹脂とシリカとの混合物を投入し、分散粒子が所定の粒度になるように撹拌速度を調整しながら撹拌し、この粒度調整を行った後に液温を30℃~90℃に昇温し、1時間~8時間反応させる態様が好ましく挙げられる。 Regarding the amount of the raw material added to the mixture when the silica-coated organic particles are produced by the above method, for example, when the total amount of the raw material resin and the silica is 100 parts by mass, first, 200 parts by mass to 800 parts by mass of water as a dispersion medium is used. 0.1 to 20 parts by mass of a suspension stabilizer is added to parts by mass to sufficiently dissolve or disperse the mixture, and the mixture of 100 parts by mass of the raw material resin and silica is added to the solution to prepare dispersed particles. A preferable mode is one in which stirring is performed while adjusting the stirring speed so that the particle size becomes a predetermined particle size, the particle size is adjusted, and then the liquid temperature is raised to 30 ° C. to 90 ° C. and the reaction is performed for 1 hour to 8 hours.
 シリカ被覆有機樹脂粒子の製造方法については、上記した方法はその1例であり、例えば、特開2002-327036号公報、特開2002-173410号公報、特開2004-307837号公報、及び、特開2006-38246号公報などに詳細に記載された方法により得られるシリカ被覆有機樹脂粒子も本開示に好適に使用することができる。 Regarding the method for producing the silica-coated organic resin particles, the above-mentioned method is one example thereof. For example, JP-A-2002-327036, JP-A-2002-173410, JP-A-2004-307837, and The silica-coated organic resin particles obtained by the method described in detail in Japanese Unexamined Patent Publication No. 2006-38246 can also be suitably used in the present disclosure.
 また、シリカ被覆有機樹脂粒子は市販品としても入手可能であり、具体的には、シリカ/メラミン複合粒子としては、日産化学工業(株)製オプトビーズ2000M、オプトビーズ3500M、オプトビーズ6500M、オプトビーズ10500M、オプトビーズ3500S、オプトビーズ6500S等が挙げられる。シリカ/ウレタン複合粒子としては、大日精化工業(株)製ダイナミックビーズCN5070D、ダンプラコートTHU等が挙げられる。 Further, the silica-coated organic resin particles are also available as a commercial product, and specifically, as the silica / melamine composite particles, NISSAN CHEMICAL INDUSTRIES CO., LTD. Opto beads 2000M, opto beads 3500M, opto beads 6500M, opto beads are available. Examples include beads 10500M, opto beads 3500S, opto beads 6500S, and the like. Examples of the silica / urethane composite particles include dynamic beads CN5070D manufactured by Dainichiseika Kogyo Co., Ltd., and DAMPRACOAT THU.
 以上、シリカ被覆有機樹脂粒子を例として、本開示に用いられる有機樹脂粒子について説明したが、アルミナ、チタニア又はジルコニアで被覆された有機樹脂粒子についても、シリカの代りにアルミナ、チタニア又はジルコニアを用いることにより同様に実施することができる。 Although the organic resin particles used in the present disclosure have been described above by taking the silica-coated organic resin particles as an example, alumina, titania or zirconia is used instead of silica for the organic resin particles coated with alumina, titania or zirconia. It can be carried out similarly.
 上記特定粒子としては、耐傷性の観点から、アクリル樹脂粒子、シリカ粒子及びウレタン樹脂粒子よりなる群から選ばれる少なくとも1種を含むことが好ましく、より好ましくは、アクリル樹脂粒子、及び、シリカ粒子よりなる群から選ばれる少なくとも1種を含むことが好ましい。 From the viewpoint of scratch resistance, the specific particles preferably include at least one selected from the group consisting of acrylic resin particles, silica particles and urethane resin particles, and more preferably acrylic resin particles and silica particles. It is preferable to include at least one selected from the group consisting of
<<形状>>
 上記特定粒子の形状は、真球状形状が好ましいが、平板形状又は投影図が楕円形状となるような、いわゆる紡錘形状であってもよい。
<< shape >>
The shape of the specific particles is preferably a true spherical shape, but may be a flat plate shape or a so-called spindle shape such that the projection is elliptical.
 本開示に係る平版印刷版原版は、支持体の画像記録層を有する側とは反対側に最外層(例えば、バックコート層)を有し、最外層中に上記特定粒子を含有させることにより、最外層表面のBekk平滑度及び最外層表面の算術平均高さSaを上記所望の範囲に調整することができる。これにより、本開示に係る平版印刷版原版は、上記特性が更に優れるものとなる。 The lithographic printing plate precursor according to the present disclosure has an outermost layer (for example, a backcoat layer) on the side opposite to the side having the image recording layer of the support, and by containing the specific particles in the outermost layer, The Bekk smoothness of the outermost layer surface and the arithmetic mean height Sa of the outermost layer surface can be adjusted to the above desired ranges. As a result, the planographic printing plate precursor according to the present disclosure has even more excellent characteristics.
<支持体>
 本開示に係る平版印刷版原版は、アルミニウム支持体を有する。
 アルミニウム支持体に用いられる好適なアルミニウム板は、純アルミニウム板及びアルミニウムを主成分とし、微量の異元素を含む合金板であり、更にアルミニウムがラミネート又は蒸着されたプラスチックフィルムでもよい。アルミニウム合金に含まれる異元素には、ケイ素、鉄、マンガン、銅、マグネシウム、クロム、亜鉛、ビスマス、ニッケル、チタンなどがある。合金中の異元素の含有量は10質量%以下であることが好ましい。
<Support>
The lithographic printing plate precursor according to the present disclosure has an aluminum support.
A suitable aluminum plate used for the aluminum support is a pure aluminum plate or an alloy plate containing aluminum as a main component and a slight amount of a foreign element, and may be a plastic film on which aluminum is laminated or vapor-deposited. The foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium. The content of the foreign element in the alloy is preferably 10 mass% or less.
 本開示において特に好適なアルミニウムは、純アルミニウムであるが、完全に純粋なアルミニウムは精錬技術上製造が困難であるので、僅かに異元素を含有するものでもよい。
 このように本開示に適用されるアルミニウム板は、その組成が特定されるものではなく、従来の公知公用の素材のアルミニウム板を適宜に利用することができる。本開示において用いられるアルミニウム板の厚みは、0.1mm~0.6mmであることが好ましく、0.15mm~0.4mmであることがより好ましく、0.2mm~0.3mmであることが特に好ましい。
Aluminum which is particularly suitable in the present disclosure is pure aluminum, but completely pure aluminum is difficult to produce due to refining technology, and thus may contain slightly different elements.
As described above, the aluminum plate applied to the present disclosure is not specified in composition, and an aluminum plate made of a known and publicly known material can be appropriately used. The aluminum plate used in the present disclosure preferably has a thickness of 0.1 mm to 0.6 mm, more preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm. preferable.
 このようなアルミニウム板には、必要に応じて粗面化処理、陽極酸化処理などの表面処理を行ってもよい。アルミニウム支持体の表面処理については、例えば、特開2009-175195号公報の段落0167~0169に詳細に記載されるような、界面活性剤、有機溶剤又はアルカリ性水溶液などによる脱脂処理、表面の粗面化処理、陽極酸化処理などが適宜、施される。
 陽極酸化処理を施されたアルミニウム表面は、必要により親水化処理が施される。
 親水化処理としては、特開2009-175195号公報の段落0169に開示されているような、アルカリ金属シリケート(例えばケイ酸ナトリウム水溶液)法、フッ化ジルコン酸カリウムあるいは、ポリビニルホスホン酸で処理する方法などが用いられる。
 また、特開2011-245844号公報に記載された支持体も好ましく用いられる。
Such aluminum plate may be subjected to surface treatment such as surface roughening treatment and anodizing treatment, if necessary. Regarding the surface treatment of the aluminum support, for example, a degreasing treatment with a surfactant, an organic solvent or an alkaline aqueous solution, a rough surface as described in paragraphs 0167 to 0169 of JP2009-175195A Chemical treatment, anodization treatment, etc. are appropriately performed.
The aluminum surface that has been subjected to the anodizing treatment is optionally subjected to a hydrophilic treatment.
As the hydrophilic treatment, a method of treating with an alkali metal silicate (for example, sodium silicate aqueous solution) method, potassium fluorozirconate or polyvinylphosphonic acid, as disclosed in paragraph 0169 of JP2009-175195A, is used. Are used.
Further, the support described in JP 2011-245844 A is also preferably used.
 支持体には必要に応じて、ウラ面に、特開平5-45885号公報に記載されている有機高分子化合物、特開平6-35174号公報に記載されているケイ素のアルコキシ化合物を含むバックコート層を設けることができる。 A back coat containing the organic polymer compound described in JP-A-5-45885 and the silicon alkoxy compound described in JP-A-6-35174 on the back surface of the support, if necessary. Layers can be provided.
<画像記録層>
 本開示に係る平版印刷版原版は、支持体上に、画像記録層を有する。
 上記画像記録層は、バインダーポリマーを含むことが好ましい。バインダーポリマーとしては、耐傷性及び膜抜け抑制性の観点から、ガラス転移温度が60℃~230℃の樹脂を含むことが好ましく、ガラス転移温度(Tg)が65℃~225℃の樹脂を含むことがより好ましく、75℃~220℃の樹脂を含むことが更に好ましい。
 本明細書において、Tgは、示差走査熱量計(DSC:Differential scanning calorimetry)により測定される値である。示差走査熱量計(DSC)としては、例えば、エスアイアイ・ナノテクノロジー社のEXSTAR6220を用いることができる。
<Image recording layer>
The lithographic printing plate precursor according to the present disclosure has an image recording layer on a support.
The image recording layer preferably contains a binder polymer. The binder polymer preferably contains a resin having a glass transition temperature of 60 ° C. to 230 ° C., and contains a resin having a glass transition temperature (Tg) of 65 ° C. to 225 ° C., from the viewpoint of scratch resistance and film loss prevention. Is more preferable, and it is further preferable that the resin contains 75 ° C to 220 ° C.
In the present specification, Tg is a value measured by a differential scanning calorimetry (DSC). As the differential scanning calorimeter (DSC), for example, EXSTAR 6220 manufactured by SII Nanotechnology Inc. can be used.
-アセタール樹脂、フェノール樹脂、アクリル樹脂、及び、ウレア結合、ウレタン結合又はアミド結合を主鎖に有する樹脂-
 画像記録層は、アセタール樹脂、フェノール樹脂、アクリル樹脂、及び、ウレア結合、ウレタン結合又はアミド結合を主鎖に有する樹脂(以下、「特定バインダーポリマー」ともいう。)よりなる群から選ばれる少なくとも1つを含むことが好ましい。
 特定バインダーポリマーは1種単独で使用しても、2種以上を併用してもよい。
 また、画像記録層は、上記特定バインダーポリマーと、後述の赤外線吸収剤と、を含むことが好ましい。
 本開示における画像記録層は、例えば、特定バインダーポリマーと、赤外線吸収剤と、を、上記支持体上に塗布し、必要に応じて乾燥することにより形成することができる。乾燥方法としては特に限定されず、自然乾燥、風乾、加熱による乾燥等が挙げられる。
 また、上記画像記録層は、赤外線レーザーによる像様露光が可能なサーマルポジタイプの画像記録層であることが好ましい。
-Acetal resin, phenol resin, acrylic resin, and resin having urea bond, urethane bond or amide bond in the main chain-
The image recording layer is at least one selected from the group consisting of an acetal resin, a phenol resin, an acrylic resin, and a resin having a urea bond, a urethane bond or an amide bond in the main chain (hereinafter, also referred to as “specific binder polymer”). It is preferable to include one.
The specific binder polymers may be used alone or in combination of two or more.
Further, the image recording layer preferably contains the above-mentioned specific binder polymer and an infrared absorbing agent described later.
The image recording layer in the present disclosure can be formed, for example, by applying the specific binder polymer and the infrared absorbing agent on the support and drying the support, if necessary. The drying method is not particularly limited, and examples thereof include natural drying, air drying, and drying by heating.
The image recording layer is preferably a thermal positive type image recording layer capable of imagewise exposure with an infrared laser.
 本開示に係る画像記録層は、現像性の観点から、酸基を有する特定バインダーポリマーを含むことが好ましい。特定バインダーポリマーとしては、アルカリ可溶性樹脂であることが好ましい。
 本開示において、アルカリ可溶性とは、25℃の1mol/L水酸化ナトリウム溶液に可溶であることをいう。
From the viewpoint of developability, the image recording layer according to the present disclosure preferably contains a specific binder polymer having an acid group. The specific binder polymer is preferably an alkali-soluble resin.
In the present disclosure, alkali-soluble refers to being soluble in a 1 mol / L sodium hydroxide solution at 25 ° C.
 ここで、上記特定バインダーポリマーは、高分子中の主鎖及び/又は側鎖に酸基を含有する単独重合体、これらの共重合体、およびこれらの混合物を包含する。したがって、サーマルポジタイプの感熱層は、アルカリ現像液に接触すると溶解する特性を有する。上記特定バインダーポリマーとしては、下記(1)~(7)の酸基のうち少なくとも一つを高分子の主鎖及び/又は側鎖中に有するものが、アルカリ現像液に対する溶解性の点で好ましい。 Here, the specific binder polymer includes a homopolymer containing an acid group in the main chain and / or side chain in a polymer, a copolymer thereof, and a mixture thereof. Therefore, the thermal positive type heat-sensitive layer has a characteristic of being dissolved when it is brought into contact with an alkali developing solution. As the specific binder polymer, those having at least one of the following acid groups (1) to (7) in the polymer main chain and / or side chain are preferable from the viewpoint of solubility in an alkali developing solution. .
(1)フェノール性ヒドロキシ基(-Ar-OH)
(2)スルホンアミド基(-SONH-R、又は、-SONH-により表される二価の基)
(3)置換スルホンアミド系酸基(-SONHCOR、-SONHSOR、-CONHSOR)(以下「活性イミド基」という。)
(4)カルボキシ基(-COH)
(5)スルホ基(-SOH)
(6)リン酸基(-OPO
(7)ホスホン酸基(-PO
(1) Phenolic hydroxy group (-Ar-OH)
(2) Sulfonamide group (-SO 2 NH-R or divalent group represented by -SO 2 NH-)
(3) Substituted sulfonamide acid group (—SO 2 NHCOR, —SO 2 NHSO 2 R, —CONHSO 2 R) (hereinafter referred to as “active imide group”)
(4) Carboxy group (-CO 2 H)
(5) Sulfo group (-SO 3 H)
(6) Phosphate group (-OPO 3 H 2 )
(7) Phosphonic acid group (-PO 3 H 2 )
 上記(1)~(7)中、Arは、置換基を有していてもよい2価のアリール基を表し、Rは、置換基を有していてもよい炭化水素基を表す。 In the above (1) to (7), Ar represents a divalent aryl group which may have a substituent, and R represents a hydrocarbon group which may have a substituent.
 上記(1)~(7)より選ばれる酸基を有する特定バインダーポリマーの中でも、(1)フェノール性ヒドロキシ基、(2)スルホンアミド基又は(3)活性イミド基を有する特定バインダーポリマーが好ましく、(1)フェノール性ヒドロキシ基又は(2)スルホンアミド基を有する特定バインダーポリマーが、アルカリ現像液に対する溶解性、膜強度を十分に確保する点から特に好ましい。
 また、現像性の観点からは、特定バインダーポリマーに含まれる酸基が、(4)カルボキシ基、(2)スルホンアミド基、及び、(1)フェノール性ヒドロキシ基よりなる群から選ばれた少なくとも1種の酸基であることが好ましい。
Among the specific binder polymers having an acid group selected from the above (1) to (7), the specific binder polymer having (1) a phenolic hydroxy group, (2) a sulfonamide group or (3) an active imide group is preferable, The specific binder polymer having (1) a phenolic hydroxy group or (2) a sulfonamide group is particularly preferable from the viewpoint of ensuring sufficient solubility in an alkali developing solution and film strength.
From the viewpoint of developability, the acid group contained in the specific binder polymer is at least 1 selected from the group consisting of (4) carboxy group, (2) sulfonamide group, and (1) phenolic hydroxy group. It is preferred that it is a seed acid group.
-ポリウレタン又はポリウレア-
 本開示に用いられる特定バインダーポリマーに含まれるポリウレタン又はポリウレアは、従来公知のものであれば特に制限はないが、例えば、以下のウレア樹脂や、ウレタン樹脂が好ましく使用される。例えば、国際公開第2015/152209号のウレア樹脂、ウレタン樹脂等が挙げられる。
-Polyurethane or polyurea-
The polyurethane or polyurea contained in the specific binder polymer used in the present disclosure is not particularly limited as long as it is a conventionally known one, but for example, the following urea resin or urethane resin is preferably used. Examples thereof include urea resins and urethane resins disclosed in WO 2015/152209.
<<ウレア樹脂>>
 本開示において、主鎖がウレア結合により形成されているポリマーをウレア樹脂とする。
 本開示において、「ウレア結合」は、式:-NR1CONR2-で表される。本開示においては、R1及びR2はそれぞれ独立に、水素原子又は炭素数1~10のアルキル基(メチル基、エチル基、プロピル基、イソプロピル基、tert-ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基等)であることが好ましく、水素原子又は炭素数5以下のアルキル基であることがより好ましい。
<< Urea resin >>
In the present disclosure, a polymer whose main chain is formed by a urea bond is referred to as a urea resin.
In the present disclosure, the “urea bond” is represented by the formula: —NR 1 CONR 2 —. In the present disclosure, R 1 and R 2 are each independently a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, And a hydrogen atom or an alkyl group having 5 or less carbon atoms is more preferable.
 ウレア結合は、如何なる手段を用いて形成されてもよいが、イソシアネート化合物とアミン化合物との反応で得ることができる。また、1,3-ビス(2-アミノエチル)ウレア、1,3-ビス(2-ヒドロキシエチル)ウレア、1,3-ビス(2-ヒドロキシプロピル)ウレア等のように、末端にヒドロキシ基又はアミノ基を有するアルキル基で置換されたウレア化合物を原料として合成してもよい。 The urea bond may be formed by any means, but can be obtained by reacting an isocyanate compound with an amine compound. In addition, as in 1,3-bis (2-aminoethyl) urea, 1,3-bis (2-hydroxyethyl) urea, 1,3-bis (2-hydroxypropyl) urea, etc., a hydroxy group at the terminal or A urea compound substituted with an alkyl group having an amino group may be synthesized as a raw material.
 原料として使用する上記イソシアネート化合物は、分子内にイソシアネート基を2つ以上有するポリイソシアネート化合物であれば特に制限なく使用可能であるが、ジイソシアネート化合物が好ましい。
 ポリイソシアネート化合物として、例えば、1,3-ビス(イソシアナトメチル)シクロヘキサン、ジイソシアン酸イソホロン、トリメチレンジイソシアネート、テトラメチレンジイソシアネート、ペンタメチレンジイソシアネート、ヘキサメチレンジイソシアネート、1,3-シクロペンタンジイソシアネート、9H-フルオレン-2,7-ジイソシアネート、9H-フルオレン-9-オン-2,7-ジイソシアネート、4,4’-ジフェニルメタンジイソシアナート、1,3-フェニレンジイソシアナート、トリレン-2,4-ジイソシアナート、トリレン-2,6-ジイソシアナート、1,3-ビス(イソシアナトメチル)シクロヘキサン、2,2-ビス(4-イソシアナトフェニル)ヘキサフルオロプロパン、1,5-ジイソシアナトナフタレン、4,4’-ジアミノ-3,3’-ジヒドロキシジフェニルメタン等が挙げられる。
The above-mentioned isocyanate compound used as a raw material can be used without particular limitation as long as it is a polyisocyanate compound having two or more isocyanate groups in the molecule, but a diisocyanate compound is preferable.
Examples of the polyisocyanate compound include 1,3-bis (isocyanatomethyl) cyclohexane, isophorone diisocyanate, trimethylene diisocyanate, tetramethylene diisocyanate, pentamethylene diisocyanate, hexamethylene diisocyanate, 1,3-cyclopentane diisocyanate, 9H-fluorene. -2,7-diisocyanate, 9H-fluoren-9-one-2,7-diisocyanate, 4,4'-diphenylmethane diisocyanate, 1,3-phenylene diisocyanate, tolylene-2,4-diisocyanate, Tolylene-2,6-diisocyanate, 1,3-bis (isocyanatomethyl) cyclohexane, 2,2-bis (4-isocyanatophenyl) hexafluoropropane, 1,5-diisocyanato Examples thereof include naphthalene and 4,4′-diamino-3,3′-dihydroxydiphenylmethane.
 原料として使用する上記アミン化合物としては、分子内にアミノ基を2つ以上有するポリアミン化合物であれば特に制限なく使用可能であるが、ジアミン化合物が好ましい。
 ポリアミン化合物として、例えば、2,7-ジアミノ-9H-フルオレン、3,6-ジアミノアクリジン、アクリフラビン、アクリジンイエロー、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、4,4’-ジアミノベンゾフェノン、ビス(4-アミノフェニル)スルホン、4,4’-ジアミノジフェニルエーテル、ビス(4-アミノフェニル)スルフィド、1,1-ビス(4-アミノフェニル)シクロヘキサン、4,4’-ジアミノジフェニルメタン、3,3’-ジアミノジフェニルメタン、3,3’-ジアミノベンゾフェノン、4,4’-ジアミノ-3,3’-ジメチルジフェニルメタン、4-(フェニルジアゼニル)ベンゼン-1,3-ジアミン、1,5-ジアミノナフタレン、1,3-フェニレンジアミン、2,4-ジアミノトルエン、2,6-ジアミノトルエン、1,8-ジアミノナフタレン、1,3-ジアミノプロパン、1,3-ジアミノペンタン、2,2-ジメチル-1,3-プロパンジアミン、1,5-ジアミノペンタン、2-メチル-1,5-ジアミノペンタン、1,7-ジアミノヘプタン、N,N-ビス(3-アミノプロピル)メチルアミン、1,3-ジアミノ-2-プロパノール、ジエチレングリコールビス(3-アミノプロピル)エーテル、m-キシリレンジアミン、テトラエチレンペンタミン、1,3-ビス(アミノメチル)シクロヘキサン、ベンゾグアナミン、2,4-ジアミノ-1,3,5-トリアジン、2,4-ジアミノ-6-メチル-1,3,5-トリアジン、6-クロロ-2,4-ジアミノピリミジン、2-クロロ-4,6-ジアミノ-1,3,5-トリアジン等が挙げられる。
 これらのポリアミン化合物にホスゲン又はトリホスゲンを反応させて、ポリイソシアネートを合成し、原料として用いてもよい。
As the amine compound used as a raw material, any polyamine compound having two or more amino groups in the molecule can be used without particular limitation, but a diamine compound is preferable.
Examples of the polyamine compound include 2,7-diamino-9H-fluorene, 3,6-diaminoacridine, acriflavine, acridine yellow, 2,2-bis (4-aminophenyl) hexafluoropropane, 4,4′-diamino Benzophenone, bis (4-aminophenyl) sulfone, 4,4′-diaminodiphenyl ether, bis (4-aminophenyl) sulfide, 1,1-bis (4-aminophenyl) cyclohexane, 4,4′-diaminodiphenylmethane, 3 , 3'-diaminodiphenylmethane, 3,3'-diaminobenzophenone, 4,4'-diamino-3,3'-dimethyldiphenylmethane, 4- (phenyldiazenyl) benzene-1,3-diamine, 1,5-diaminonaphthalene , 1,3-Phenylenediamine, 2,4-Diaminoto Ruene, 2,6-diaminotoluene, 1,8-diaminonaphthalene, 1,3-diaminopropane, 1,3-diaminopentane, 2,2-dimethyl-1,3-propanediamine, 1,5-diaminopentane, 2-methyl-1,5-diaminopentane, 1,7-diaminoheptane, N, N-bis (3-aminopropyl) methylamine, 1,3-diamino-2-propanol, diethylene glycol bis (3-aminopropyl) Ether, m-xylylenediamine, tetraethylenepentamine, 1,3-bis (aminomethyl) cyclohexane, benzoguanamine, 2,4-diamino-1,3,5-triazine, 2,4-diamino-6-methyl- 1,3,5-triazine, 6-chloro-2,4-diaminopyrimidine, 2-chloro-4,6-diamino- , 3,5-triazine.
You may make these polyamine compounds react with phosgene or triphosgene, synthesize | combine polyisocyanate, and may use it as a raw material.
<<ウレタン樹脂>>
 本開示では、主鎖がウレタン結合により形成されているポリマーをウレタン樹脂という。本開示において、「ウレタン結合」は、式:-OC(=O)NR-で表される。ここ
で、Rは、水素原子又は炭素数1~10のアルキル基(メチル基、エチル基、プロピル基、イソプロピル基、tert-ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基等)であることが好ましく、水素原子又は炭素数5以下のアルキル基であることがより好ましく、水素原子又はメチル基であることが更に好ましい。
<< urethane resin >>
In the present disclosure, a polymer whose main chain is formed of urethane bonds is referred to as a urethane resin. In the present disclosure, “urethane bond” is represented by the formula: —OC (═O) NR 3 —. Here, R 3 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, cyclohexyl group, etc.) A hydrogen atom or an alkyl group having 5 or less carbon atoms is more preferable, and a hydrogen atom or a methyl group is further preferable.
 ウレタン結合は、如何なる手段を用いて形成されてもよいが、イソシアネート化合物とヒドロキシ基を有する化合物との反応により得ることができる。
 原料として用いるイソシアネート化合物は、分子内にイソシアネート基を2つ以上有するポリイソシアネート化合物が好ましく、ジイソシアネート化合物が更に好ましい。ポリイソシアネート化合物としては、上記ウレア結合を形成する原料として挙げたポリイソシアネート化合物を挙げることができる。
 原料として用いるヒドロキシ基を有する化合物としては、ポリオール化合物、アミノアルコール化合物、アミノフェノール化合物、アルキルアミノフェノール化合物等を挙げることができるが、好ましくはポリオール化合物又はアミノアルコール化合物である。
 ポリオール化合物は、分子内に少なくとも2つ以上のヒドロキシ基を有する化合物であり、好ましくはジオール化合物である。又、分子内にエステル結合又はエーテル結合を有していてもよい。ポリオール化合物として、例えば、エチレングリコール、プロピレングリコール、1,4-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、ネオペンチルグリコール、ポリエチレングリコール、ポリテトラメチレングリコール、1,4-シクロヘキサンジメタノール、ペンタエリスリトール、3-メチル-1,5-ペンタンジオール、ポリ(エチレンアジペート)、ポリ(ジエチレンアジペート)、ポリ(プロピレンアジペート)、ポリ(テトラメチレンアジペート)、ポリ(ヘキサメチレンアジペート)、ポリ(ネオペンチレンアジペート)等を挙げることができる。
 アミノアルコール化合物は、分子内にアミノ基とヒドロキシ基とを有する化合物であり、更に分子内にエーテル結合を有していてもよい。アミノアルコールとして、例えば、アミノエタノール、3-アミノ-1-プロパノール、2-(2-アミノエトキシ)エタノール、2-アミノ-1,3-プロパンジオール、2-アミノ-2-メチル-1,3-プロパンジオール、1,3-ジアミノ-2-プロパノール等を挙げることができる。
 その他に、ビス(4ー(2ーヒドロキシエトキシ)フェニルスルホン等のスルホン基を有するジオール化合物またはポリオール化合物を用いてもよい。
The urethane bond may be formed by any means, and can be obtained by reacting an isocyanate compound with a compound having a hydroxy group.
The isocyanate compound used as a raw material is preferably a polyisocyanate compound having two or more isocyanate groups in the molecule, and more preferably a diisocyanate compound. Examples of the polyisocyanate compound include the polyisocyanate compounds mentioned as the raw materials for forming the urea bond.
Examples of the compound having a hydroxy group used as a raw material include a polyol compound, an aminoalcohol compound, an aminophenol compound, an alkylaminophenol compound and the like, but a polyol compound or an aminoalcohol compound is preferable.
The polyol compound is a compound having at least two or more hydroxy groups in the molecule, and is preferably a diol compound. Further, it may have an ester bond or an ether bond in the molecule. Examples of the polyol compound include ethylene glycol, propylene glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, neopentyl glycol, polyethylene glycol, polytetramethylene glycol, 1,4-cyclohexane. Dimethanol, pentaerythritol, 3-methyl-1,5-pentanediol, poly (ethylene adipate), poly (diethylene adipate), poly (propylene adipate), poly (tetramethylene adipate), poly (hexamethylene adipate), poly (Neopentylene adipate) and the like.
The amino alcohol compound is a compound having an amino group and a hydroxy group in the molecule, and may further have an ether bond in the molecule. Examples of amino alcohols include amino ethanol, 3-amino-1-propanol, 2- (2-aminoethoxy) ethanol, 2-amino-1,3-propanediol, 2-amino-2-methyl-1,3- Examples thereof include propanediol and 1,3-diamino-2-propanol.
In addition, a diol compound or a polyol compound having a sulfone group such as bis (4- (2-hydroxyethoxy) phenyl sulfone) may be used.
 本開示に用いられるポリウレア又はポリウレタンは、酸基を更に有する。
 上記酸基としては、フェノール性ヒドロキシ基、スルホンアミド基、活性イミド基及びカルボキシ基よりなる群から選ばれた少なくとも1つの基であることが好ましく、フェノール性ヒドロキシ基、スルホンアミド基、及びカルボキシ基よりなる群から選ばれた少なくとも1つの基であることがより好ましく、フェノール性ヒドロキシ基又はスルホンアミド基であることが更に好ましい。
 上記酸基は、ポリマーの主鎖、側鎖のどちらに有してもよいが、主鎖に有することが好ましい。
 なお、本開示において、主鎖にフェノール性水酸基を有するとは、フェノール性水酸基が結合したアリーレン基を主鎖に有することを意味する。また、主鎖にスルホンアミド基を有するとは、-SONH-により表される二価の基を主鎖に有することを意味する。
The polyurea or polyurethane used in the present disclosure further has an acid group.
The acid group is preferably at least one group selected from the group consisting of a phenolic hydroxy group, a sulfonamide group, an active imide group and a carboxy group, and a phenolic hydroxy group, a sulfonamide group and a carboxy group It is more preferably at least one group selected from the group consisting of, and further preferably a phenolic hydroxy group or a sulfonamide group.
The acid group may be contained in either the main chain or side chain of the polymer, but it is preferable to have it in the main chain.
In the present disclosure, having a phenolic hydroxyl group in the main chain means having an arylene group bonded to the phenolic hydroxyl group in the main chain. Having a sulfonamide group in the main chain means having a divalent group represented by —SO 2 NH— in the main chain.
 また、本開示において用いられるポリウレア又はポリウレタンは、下記式1により表される構成単位を含むポリウレタン、及び、下記式1により表される構成単位を含むポリウレアよりなる群から選ばれた少なくとも1種のポリマーを含むことが好ましい。 Further, the polyurea or polyurethane used in the present disclosure is at least one selected from the group consisting of a polyurethane containing a constitutional unit represented by the following formula 1 and a polyurea containing a constitutional unit represented by the following formula 1. It is preferable to include a polymer.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 式1中、Xは-CR-、-O-又は-S-を表し、Rはそれぞれ独立に、水素原子又はアルキル基を表す。
 上記式1で表される構成単位は、ポリウレタン又はポリウレアの主鎖に含まれることが好ましい。
 式1中、Xは-CH-、-O-又は-S-であることが好ましく、-CH-、又は、-O-であることがより好ましく、-CH-で有ることが更に好ましい。またXにおけるアルキル基のハロゲン原子はハロゲン原子等により置換されていてもよい。
 式1中、2つのベンゼン環に結合している-NHC(=O)-により表される2つの基は、それぞれ-O-と結合してウレタン結合を形成するか、又は、それぞれ-NH-と結合してウレア結合を形成することが好ましい。
 式1中、2つのベンゼン環に結合している-NHC(=O)-の結合位置は、特に限定されないが、ベンゼン環におけるXのメタ位であることが好ましい。
 式1により表される構成単位は、下記式1Aにより表されるジイソシアネート化合物に由来する構成単位であることが好ましい。ポリウレア又はポリウレタンの製造において、式1Aにより表されるジイソシアネート化合物を、アミン化合物(たとえば、ジアミン化合物)又はアルコール化合物(例えば、ジオール化合物)と反応させることにより、式1により表される構成単位を含む、ポリウレア又はポリウレタンを合成することが可能である。
In Formula 1, X 1 represents —CR 2 —, —O— or —S—, and R's each independently represent a hydrogen atom or an alkyl group.
The constituent unit represented by the above formula 1 is preferably contained in the main chain of polyurethane or polyurea.
In Formula 1, X 1 is -CH 2 -, - preferably O- or -S-, -CH 2 -, or, more preferably -O-, -CH 2 - that is More preferable. Moreover, the halogen atom of the alkyl group in X 1 may be substituted with a halogen atom or the like.
In formula 1, the two groups represented by —NHC (═O) — which are bonded to the two benzene rings each bond with —O— to form a urethane bond, or each —NH— It is preferable to combine with to form a urea bond.
In Formula 1, the bonding position of —NHC (═O) — bonded to the two benzene rings is not particularly limited, but is preferably the meta position of X 1 in the benzene ring.
The constitutional unit represented by Formula 1 is preferably a constitutional unit derived from the diisocyanate compound represented by the following Formula 1A. In the production of polyurea or polyurethane, a diisocyanate compound represented by Formula 1A is reacted with an amine compound (for example, a diamine compound) or an alcohol compound (for example, a diol compound) to contain a structural unit represented by Formula 1. It is possible to synthesize polyurea or polyurethane.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 以下に本開示において特定バインダーポリマーとして用いられるポリウレタン又はポリウレアの具体例を示すが、本開示は、これらに限定されるものではない。なお、下記式中、括弧の右下の数値は構成単位の含有モル比を表す。また、下記式PU-1~式PU-6は、炭化水素の炭素原子及び水素原子を省略した形での記載としている。 Specific examples of polyurethane or polyurea used as the specific binder polymer in the present disclosure are shown below, but the present disclosure is not limited thereto. In the formula below, the numerical value at the lower right of the parentheses represents the molar ratio of the constituent units. Further, the following formulas PU-1 to PU-6 are described in a form in which carbon atoms and hydrogen atoms of hydrocarbon are omitted.
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000005

 
Figure JPOXMLDOC01-appb-C000005

 
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
<<ポリアミド>>
 本開示では、特定バインダーポリマーとして、主鎖にアミド結合を有するポリアミド樹脂を用いることができる。例えば、特開2004-157461号公報、特開2005-91429号公報に記載されているようなポリマーが好適に用いられる。ただし、アルカリ可溶性のため、上記の酸基を有しており、主鎖にアミド結合を有していれば、これらに限定されるものではない。
 これらの具体的な化合物として、下記式PA-1で表されるポリマーが挙げられるが、これに限定されない。
<<< polyamide >>
In the present disclosure, a polyamide resin having an amide bond in the main chain can be used as the specific binder polymer. For example, the polymers described in JP-A-2004-157461 and JP-A-2005-91429 are preferably used. However, as long as it has the above-mentioned acid group and has an amide bond in the main chain because it is soluble in alkali, it is not limited thereto.
Specific examples of these compounds include, but are not limited to, polymers represented by the following formula PA-1.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
-フェノール樹脂-
 特定バインダーポリマーとして用いられるフェノール樹脂としては、重量平均分子量が2,000を超えるフェノール樹脂であることが好ましい。重量平均分子量が2,000を超えるフェノール樹脂は、構成単位としてフェノール、あるいは置換フェノール類を含むフェノール樹脂であり、好ましくはノボラック樹脂である。ノボラック樹脂は、平版印刷版原版において、未露光部において強い水素結合性を生起し、露光部において一部の水素結合が容易に解除されるといった点から好ましく用いられる。
 このノボラック樹脂は、分子内に構成単位としてフェノール類を含むものであれば特に制限はない。
 本開示におけるノボラック樹脂は、フェノール、以下に示される置換フェノール類と、アルデヒド類との縮合反応により得られる樹脂であり、フェノール類としては、具体的には、フェノール、イソプロピルフェノール、t-ブチルフェノール、t-アミルフェノール、ヘキシルフェノール、シクロヘキシルフェノール、3-メチル-4-クロロ-6-t-ブチルフェノール、イソプロピルクレゾール、t-ブチルクレゾール、t-アミルクレゾールが挙げられる。好ましくは、t-ブチルフェノール、t-ブチルクレゾールである。また、アルデヒド類の例としては、ホルムアルデヒド、アセトアルデヒド、アクロレイン、クロトンアルデヒド等の脂肪族及び芳香族アルデヒドが挙げられる。好ましくは、ホルムアルデヒド、アセトアルデヒドである。
 より具体的には、本開示におけるノボラック樹脂しては、例えば、フェノールとホルムアルデヒドとの縮重合体(フェノールホルムアルデヒド樹脂)、m-クレゾールとホルムアルデヒドとの縮重合体(m-クレゾールホルムアルデヒド樹脂)、p-クレゾールとホルムアルデヒドとの縮重合体(p-クレゾールホルムアルデヒド樹脂)、m-/p-混合クレゾールとホルムアルデヒドとの縮重合体(m-/p-混合クレゾールホルムアルデヒド樹脂)、フェノールとクレゾール(m-,p-,又はm-/p-混合のいずれでもよい)とホルムアルデヒドとの縮重合体(フェノール/クレゾール(m-,p-,又はm-/p-混合のいずれでもよい)混合ホルムアルデヒド樹脂)等が挙げられる。
 また、ノボラック樹脂としては、更に、米国特許第4,123,279号明細書に記載されているように、t-ブチルフェノールホルムアルデヒド樹脂、オクチルフェノールホルムアルデヒド樹脂のような、炭素数3~8のアルキル基を置換基として有するフェノールとホルムアルデヒドとの縮重合体が挙げられる。
 これらノボラック樹脂の中でも、特に好ましいものとして、フェノールホルムアルデヒド樹脂、フェノール/クレゾール混合ホルムアルデヒド樹脂が挙げられる。
-Phenolic resin-
The phenol resin used as the specific binder polymer is preferably a phenol resin having a weight average molecular weight of more than 2,000. The phenol resin having a weight average molecular weight of more than 2,000 is a phenol resin containing phenol or a substituted phenol as a constitutional unit, preferably a novolac resin. The novolac resin is preferably used in the lithographic printing plate precursor because it causes a strong hydrogen bonding property in the unexposed area and a part of the hydrogen bonding is easily released in the exposed area.
The novolac resin is not particularly limited as long as it contains phenols as a constituent unit in the molecule.
The novolac resin in the present disclosure is a resin obtained by a condensation reaction of phenol, a substituted phenol shown below, and an aldehyde. Specific examples of the phenol include phenol, isopropylphenol, t-butylphenol, Examples thereof include t-amylphenol, hexylphenol, cyclohexylphenol, 3-methyl-4-chloro-6-t-butylphenol, isopropylcresol, t-butylcresol and t-amylcresol. Preferred are t-butylphenol and t-butylcresol. In addition, examples of aldehydes include aliphatic and aromatic aldehydes such as formaldehyde, acetaldehyde, acrolein, and crotonaldehyde. Formaldehyde and acetaldehyde are preferable.
More specifically, examples of the novolac resin in the present disclosure include a condensation polymer of phenol and formaldehyde (phenol formaldehyde resin), a condensation polymer of m-cresol and formaldehyde (m-cresol formaldehyde resin), p -Polycondensation polymer of cresol and formaldehyde (p-cresol formaldehyde resin), polycondensation polymer of m- / p-mixed cresol and formaldehyde (m- / p-mixed cresol-formaldehyde resin), phenol and cresol (m-, Condensation polymer of p- or m- / p-mixture) and formaldehyde (phenol / cresol (m-, p-, or m- / p-mixture) mixed formaldehyde resin), etc. Is mentioned.
Further, as the novolac resin, as described in US Pat. No. 4,123,279, an alkyl group having 3 to 8 carbon atoms such as t-butylphenolformaldehyde resin and octylphenolformaldehyde resin is further used. Examples thereof include a condensation polymer of phenol and formaldehyde having a substituent.
Among these novolac resins, phenol formaldehyde resin and phenol / cresol mixed formaldehyde resin are particularly preferable.
 上記フェノール樹脂の重量平均分子量は、好ましくは2,000を超え50,000以下であり、2,500~20,000であることが更に好ましく、3,000~10,000であることが特に好ましい。また、分散度(重量平均分子量/数平均分子量)は、1.1~10であることが好ましい。
 上記数平均分子量は、テトラヒドロフラン(THF)を溶剤とした場合のゲルパーミエーションクロマトグラフィー(GPC)により測定されるポリスチレン換算の数平均分子量である。
 このようなフェノール樹脂は1種のみを用いてもよく、2種以上を混合して用いてもよい。
 本開示における画像記録層中のフェノール樹脂の含有量は、画像形成性に優れた平版印刷版原版を得る観点から、特定バインダーポリマーの全質量に対し、1質量%~90質量%が好ましく、5質量%~50質量%であることがより好ましく、10質量%~30質量%であることが特に好ましい。
The weight average molecular weight of the phenol resin is preferably more than 2,000 and 50,000 or less, more preferably 2,500 to 20,000, and particularly preferably 3,000 to 10,000. . The dispersity (weight average molecular weight / number average molecular weight) is preferably 1.1 to 10.
The number average molecular weight is a polystyrene equivalent number average molecular weight measured by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
Such phenol resins may be used alone or in combination of two or more.
The content of the phenol resin in the image recording layer in the present disclosure is preferably 1% by mass to 90% by mass based on the total mass of the specific binder polymer, from the viewpoint of obtaining a lithographic printing plate precursor having excellent image forming properties. It is more preferably from 50% by mass to 50% by mass, and particularly preferably from 10% by mass to 30% by mass.
 特定バインダーポリマーが、フェノール樹脂である場合、フェノール樹脂の具体例を下記に示すが、本開示は、これらに限定されるものではない。 When the specific binder polymer is a phenol resin, specific examples of the phenol resin are shown below, but the present disclosure is not limited thereto.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
<<アクリル樹脂>>
 アクリル樹脂は、アクリル化合物由来の構成単位を少なくとも含む樹脂であれば、特に制限はない。アクリル樹脂としては、上記酸性基、アクリロニトリル基、スチレン基を有していてもよいが、現像性の観点から、上記酸性基を有することが好ましい。 また、アクリル樹脂としては、ポジ型平版印刷版原版の画像記録層に用いるものとして公知のものを特に制限なく使用することができる。
 アクリル樹脂は1種のみを用いてもよく、2種以上を混合して用いてもよい。
 アクリル樹脂としては、酸性基を有するエチレン性不飽和モノマーを1つ以上含むモノマー又はその混合物を重合することによって生成した高分子が好適に用いられる。
<< acrylic resin >>
The acrylic resin is not particularly limited as long as it is a resin containing at least a structural unit derived from an acrylic compound. The acrylic resin may have the above acidic group, acrylonitrile group, or styrene group, but it is preferable to have the above acidic group from the viewpoint of developability. As the acrylic resin, known acrylic resins used for the image recording layer of the positive planographic printing plate precursor can be used without particular limitation.
The acrylic resin may be used alone or in combination of two or more.
As the acrylic resin, a polymer produced by polymerizing a monomer containing at least one ethylenically unsaturated monomer having an acidic group or a mixture thereof is preferably used.
 酸性基を有するエチレン性不飽和モノマーとしては、(メタ)アクリル酸、又は、下記式により表されるモノマーが好ましく挙げられる。 As the ethylenically unsaturated monomer having an acidic group, (meth) acrylic acid or a monomer represented by the following formula is preferably exemplified.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式S-1及び式S-2中、Rs1は水素原子又はアルキル基を表す。Zは-O-又は-NRs2を表し、ここでRs2は、水素原子、アルキル基、アルケニル基、又はアルキニル基を表す。Arは、芳香族基を表し、少なくとも1方はヘテロ芳香族基であり、Xは、水素原子又は芳香族基を表す。sa及びsbはそれぞれ独立に、0又は1を表す。 In formulas S-1 and S-2, R s1 represents a hydrogen atom or an alkyl group. Z represents —O— or —NR s2 , and R s2 represents a hydrogen atom, an alkyl group, an alkenyl group, or an alkynyl group. Ar 1 represents an aromatic group, at least one of which is a heteroaromatic group, and X represents a hydrogen atom or an aromatic group. sa and sb each independently represent 0 or 1.
 式S-1中、Rs1は水素原子又はアルキル基を表すが、アルキル基は、置換若しくは非置換のアルキル基であり、置換基を有しないものが好ましい。Rs1で表されるアルキル基としては、メチル基、エチル基、プロピル基、ブチル基などの低級アルキル基が挙げられる。Rs1は好ましくは水素原子又はメチル基である。
 Zは-O-又は-NRs2-を表し、好ましくは、-NRs2-を表す。ここでRs2は、水素原子、置換若しくは非置換のアルキル基、置換若しくは非置換のアルケニル基、又は置換若しくは非置換のアルキニル基を表し、好ましくは水素原子又は非置換のアルキル基であり、より好ましくは水素原子である。
 sa及びsbはそれぞれ独立に、0又は1を表し、好ましい態様は、saが0で且つsbが1である場合であり、更に好ましくはsa及びsbがともに0の場合であり、特に好ましくはsa及びsbがともに1の場合である。
 更に詳細には、上記構成単位において、saが0で且つsbが1である場合、Zは好ましくはOである。また、sa及びsbがいずれも1である場合、Zは好ましくはNRs2であり、ここでRs2は、水素原子であることが好ましい。
In formula S-1, R s1 represents a hydrogen atom or an alkyl group, and the alkyl group is a substituted or unsubstituted alkyl group, and preferably has no substituent. Examples of the alkyl group represented by R s1 include lower alkyl groups such as a methyl group, an ethyl group, a propyl group and a butyl group. R s1 is preferably a hydrogen atom or a methyl group.
Z represents —O— or —NR s2 —, preferably —NR s2 —. Here, R s2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a substituted or unsubstituted alkynyl group, preferably a hydrogen atom or an unsubstituted alkyl group, and It is preferably a hydrogen atom.
sa and sb each independently represent 0 or 1, and a preferred embodiment is when sa is 0 and sb is 1, more preferably sa and sb are both 0, and particularly preferably sa And sb are both 1.
More specifically, in the above structural unit, when sa is 0 and sb is 1, Z is preferably O. Further, when both sa and sb are 1, Z is preferably NR s2 , and R s2 is preferably a hydrogen atom.
 Ar及びArはそれぞれ独立に、芳香族基を表し、少なくとも1方はヘテロ芳香族基である。Arは2価の芳香族基であり、Arは1価の芳香族基である。芳香族基は、芳香環を構成する水素原子の1つ又は2つが連結基と置き換わって形成された置換基である。
 芳香族基における芳香環及び複素芳香環としては、ベンゼン、ナフタレン、アントラセンなどの炭化水素芳香環から選択されるものであってもよく、フラン、チオフェン、ピロール、イミダゾール、1,2,3-トリアゾール、1,2,4-トリアゾール、テトラゾール、オキサゾール、イソオキサゾール、チアゾール、イソチアゾール、チアジアゾール、オキサジアゾール、ピリジン、ピリダジン、ピリミジン、ピラジン、1,3,5-トリアジン、1,2,4-トリアジン、1,2,3-トリアジンなどの複素芳香環から選択されるものであってもよい。
 複数の環が縮合して、例えば、ベンゾフラン、ベンゾチオフェン、インドール、インダゾール、ベンゾオキサゾール、キノリン、キナゾリン、ベンゾイミダゾール、又は、ベンゾトリアゾールのような縮合環の態様をとるものであってもよい。
Ar 1 and Ar 2 each independently represent an aromatic group, at least one of which is a heteroaromatic group. Ar 1 is a divalent aromatic group and Ar 2 is a monovalent aromatic group. The aromatic group is a substituent formed by replacing one or two hydrogen atoms forming the aromatic ring with a linking group.
The aromatic ring and heteroaromatic ring in the aromatic group may be selected from hydrocarbon aromatic rings such as benzene, naphthalene, and anthracene, and furan, thiophene, pyrrole, imidazole, 1,2,3-triazole. , 1,2,4-triazole, tetrazole, oxazole, isoxazole, thiazole, isothiazole, thiadiazole, oxadiazole, pyridine, pyridazine, pyrimidine, pyrazine, 1,3,5-triazine, 1,2,4-triazine It may be selected from heteroaromatic rings such as 1,2,3-triazine.
A plurality of rings may be condensed to form a condensed ring such as benzofuran, benzothiophene, indole, indazole, benzoxazole, quinoline, quinazoline, benzimidazole, or benzotriazole.
 芳香族基、ヘテロ芳香族基は、更に置換基を有するものであってもよく、導入可能な置換基としては、アルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基、アリール基、ヘテロアリール基、ヒドロキシ基、メルカプト基、カルボキシ基又はそのアルキルエステル、スルホン酸基又はそのアルキルエステル、ホスフィン酸基又はそのアルキルエステル、アミノ基、スルホンアミド基、アミド基、ニトロ基、ハロゲン原子、あるいは、これらが複数結合してなる置換基などが挙げられ、置換基が、更にここに挙げた置換基を有するものであってもよい。 The aromatic group and the heteroaromatic group may have a substituent, and examples of the substituent that can be introduced include an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an aryl group and a heteroaryl group. A hydroxy group, a mercapto group, a carboxy group or an alkyl ester thereof, a sulfonic acid group or an alkyl ester thereof, a phosphinic acid group or an alkyl ester thereof, an amino group, a sulfonamide group, an amide group, a nitro group, a halogen atom, or these Examples thereof include a substituent formed by combining a plurality of the substituents, and the substituent may further have the substituents described here.
 Arは好ましくは、置換基を有していてもよい複素芳香族基であり、より好ましくは、ピリジン、ピリダジン、ピリミジン、ピラジン、1,3,5-トリアジン、1,2、4-トリアジン、1,2,3-トリアジン、テトラゾール、オキサゾール、イソオキサゾール、チアゾール、イソチアゾール、チアジアゾール、及び、オキサジアゾールから選択される窒素原子を含む複素芳香環が挙げられる。 Ar 2 is preferably a heteroaromatic group which may have a substituent, more preferably pyridine, pyridazine, pyrimidine, pyrazine, 1,3,5-triazine, 1,2,4-triazine, Heteroaromatic rings containing nitrogen atoms selected from 1,2,3-triazine, tetrazole, oxazole, isoxazole, thiazole, isothiazole, thiadiazole, and oxadiazole.
 式S-1又は式S-2で表される構成単位(ただし、モノマー単位として換算する。)の含有量は、アクリル樹脂におけるモノマー単位の全量に対し、10モル%~100モル%が好ましく、20モル%~90モル%がより好ましく、30モル%~80モル%が更に好ましく、30モル%~70モル%が特に好ましい。 The content of the constitutional unit represented by the formula S-1 or S-2 (converted as a monomer unit) is preferably 10 mol% to 100 mol% with respect to the total amount of the monomer units in the acrylic resin, 20 mol% to 90 mol% is more preferable, 30 mol% to 80 mol% is still more preferable, and 30 mol% to 70 mol% is particularly preferable.
 上記式S-1で表される構成単位及び上記式S-2で表される構成単位のうち少なくとも1種を有するアクリル樹脂の数平均分子量(Mn)は、10,000~500,000が好ましく、10,000~200,000がより好ましく、10,000~100,000が特に好ましい。また、重量平均分子量(Mw)は、10,000~1,000,000が好ましく、20,000~500,000がより好ましく、20,000~200,000が特に好ましい。 The number average molecular weight (Mn) of the acrylic resin having at least one of the structural unit represented by the formula S-1 and the structural unit represented by the formula S-2 is preferably 10,000 to 500,000. 10,000 to 200,000 is more preferable, and 10,000 to 100,000 is particularly preferable. The weight average molecular weight (Mw) is preferably 10,000 to 1,000,000, more preferably 20,000 to 500,000, and particularly preferably 20,000 to 200,000.
 現像性に優れることから、酸性基を有するエチレン性不飽和モノマーで表される構成単位の含有量は、アクリル樹脂の全質量に対し、1質量%~30質量%が好ましく、5質量%~25質量%がより好ましく、10質量%~20質量%が更に好ましい。 The content of the structural unit represented by the ethylenically unsaturated monomer having an acidic group is preferably 1% by mass to 30% by mass, and more preferably 5% by mass to 25% by mass, because of excellent developability. Mass% is more preferable, and 10 mass% to 20 mass% is further preferable.
 上記酸性基を有するエチレン性不飽和モノマー以外の他のモノマーで表される構成単位としては、アルキル(メタ)アクリレート、脂肪族水酸基を有する(メタ)アクリル酸エステル類、(メタ)アクリルアミド、ビニルエステル類、スチレン類、N-ビニルピロリドン等の窒素原子含有モノマー、マレイミド類で表される構成単位が挙げられる。これらの他のモノマーで表される構成単位のうち、好適に使用されるモノマーとしては、(メタ)アクリル酸エステル、(メタ)アクリルアミド、マレイミド化合物、及び、(メタ)アクリロニトリルであり、より好適には(メタ)アクリルアミド、及び、マレイミド化合物である。    As the constitutional unit represented by a monomer other than the ethylenically unsaturated monomer having an acidic group, alkyl (meth) acrylate, (meth) acrylic acid ester having an aliphatic hydroxyl group, (meth) acrylamide, vinyl ester And styrenes, nitrogen atom-containing monomers such as N-vinylpyrrolidone, and constitutional units represented by maleimides. Among the structural units represented by these other monomers, the monomers preferably used are (meth) acrylic acid ester, (meth) acrylamide, maleimide compound, and (meth) acrylonitrile, and more preferably Are (meth) acrylamide and maleimide compounds. :
 マレイミド構造を形成し得るマレイミド化合物としては、N-置換マレイミドが好ましく、N-置換マレイミドとしては、例えば、N-メチルマレイミド、N-エチルマレイミド、N-n-プロピルマレイミド、N-i-プロピルマレイミド、N-n-ブチルマレイミド、N-t-ブチルマレイミド、N-n-ヘキシルマレイミド、N-シクロペンチルマレイミド、N-シクロヘキシルマレイミド、N-フェニルマレイミド、N-1-ナフチルマレイミド等を挙げることができる。中でも、N-シクロヘキシルマレイミド、N-フェニルマレイミドが好ましく、N-フェニルマレイミドがより好ましい。N-置換マレイミドは、1種のみを用いてもよいし、2種以上を併用してもよい。 The maleimide compound capable of forming a maleimide structure is preferably N-substituted maleimide, and examples of the N-substituted maleimide include N-methylmaleimide, N-ethylmaleimide, Nn-propylmaleimide and Ni-propylmaleimide. , Nn-butylmaleimide, Nt-butylmaleimide, Nn-hexylmaleimide, N-cyclopentylmaleimide, N-cyclohexylmaleimide, N-phenylmaleimide, N-1-naphthylmaleimide and the like. Among them, N-cyclohexylmaleimide and N-phenylmaleimide are preferable, and N-phenylmaleimide is more preferable. The N-substituted maleimides may be used alone or in combination of two or more.
 画像記録層は、耐傷性、膜抜け抑制性、及び、アブレーション抑制性の観点から、マレイミド構造を有するアクリル樹脂を含むことが好ましく、N-置換マレイミド構造を有するアクリル樹脂を含むことがより好ましい。
 N-置換マレイミドに由来する構成単位の含有量は、アクリル樹脂の全質量に対し、50質量%以下が好ましく、5質量%~50質量%がより好ましく、10質量%~40質量%が更に好ましい。
The image recording layer preferably contains an acrylic resin having a maleimide structure, and more preferably an acrylic resin having an N-substituted maleimide structure, from the viewpoints of scratch resistance, film detachment suppressing property, and ablation suppressing property.
The content of the structural unit derived from the N-substituted maleimide is preferably 50% by mass or less, more preferably 5% by mass to 50% by mass, further preferably 10% by mass to 40% by mass, based on the total mass of the acrylic resin. .
 また、(メタ)アクリルアミドに由来する構成単位を含む場合、上記構成単位の含有量は、アクリル樹脂の全質量に対し、40質量%以下が好ましく、1質量%~40質量%がより好ましく、2質量%~30質量%が更に好ましい。 When it contains a structural unit derived from (meth) acrylamide, the content of the structural unit is preferably 40% by mass or less, more preferably 1% by mass to 40% by mass, based on the total mass of the acrylic resin. More preferably, it is from 30% by mass to 30% by mass.
 アクリル樹脂の重量平均分子量としては、2,000以上が好ましく、10,000~100,000がより好ましく、30,000~60,000が更に好ましい。 The weight average molecular weight of the acrylic resin is preferably 2,000 or more, more preferably 10,000 to 100,000, further preferably 30,000 to 60,000.
 画像記録層中におけるアクリル樹脂の含有量は、画像記録層の全質量に対して、1質量%~60質量%が好ましく、5質量%~50質量%がより好ましい。 The content of the acrylic resin in the image recording layer is preferably 1% by mass to 60% by mass, more preferably 5% by mass to 50% by mass, based on the total mass of the image recording layer.
 特定バインダーポリマーがアクリル樹脂である場合、アクリル樹脂の具体例を下記に示すが、本開示は、これらに限定されるものではない。下記式中、Meはメチル基を表す。 When the specific binder polymer is an acrylic resin, specific examples of the acrylic resin are shown below, but the present disclosure is not limited thereto. In the following formula, Me represents a methyl group.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
<<アセタール樹脂>>
 本開示における画像記録層は、アセタール樹脂を更に含んでいてもよい。
 アセタール樹脂としては、下記式EV-1及び下記式EV-2により表される構成単位を含む高分子化合物が挙げられる。
<< Acetal resin >>
The image recording layer in the present disclosure may further contain an acetal resin.
Examples of the acetal resin include polymer compounds containing a structural unit represented by the following formula EV-1 and the following formula EV-2.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 式EV-1又は式EV-2中、Lは二価の連結基を表し、xは0又は1であり、Rは少なくとも一つのヒドロキシ基を有する芳香環基又はヘテロ芳香環基を表し、R及びRはそれぞれ独立に、水素原子、ハロゲン原子、置換基を有してもよい線状又は分岐状、あるいは環状のアルキル基、置換基を有してもよい線状又は分岐状、あるいは環状のアルケニル基、又は、置換基を有してもよい芳香環、若しくは、置換基を有してもよいヘテロ芳香環を表す。 In formula EV-1 or formula EV-2, L represents a divalent linking group, x is 0 or 1, R 1 represents an aromatic ring group or a heteroaromatic ring group having at least one hydroxy group, R 2 and R 3 are each independently a hydrogen atom, a halogen atom, a linear or branched group which may have a substituent, or a cyclic alkyl group, a linear or branched group which may have a substituent, Alternatively, it represents a cyclic alkenyl group, an aromatic ring that may have a substituent, or a heteroaromatic ring that may have a substituent.
 式EV-1中、Rは少なくとも一つのヒドロキシ基を有する芳香環又はヘテロ芳香環を表し、ヒドロキシ基はLとの結合部位に対し、オルト、メタ、パラ位のいずれに有していてもよい。
 芳香環の好ましい例としては、フェニル基、ベンジル基、トリル基、o-、m-、p-キシリル基、ナフチル基、アントラセニル基、及び、フェナントレニル基が挙げられる。
 ヘテロ芳香環の好ましい例としては、フリル基、ピリジル基、ピリミジル基、ピラゾイル基、及び、チオフェニル基が挙げられる。
 これらの芳香環又はヘテロ芳香環は、水酸基以外の置換基を有していてもよく、置換基としては、メチル基、エチル基等のアルキル基、メトキシ基、エトキシ基等のアルコキシ基、アリールオキシ基、チオアルキル基、チオアリール基、-SH、アゾアルキル基やアゾフェニル基等のアゾ基、チオアルキル基、アミノ基、エテニル基、アルケニル基、アルキニル基、シクロアルキル基、アリール基、ヘテロアリール基、又は、複素脂環式基が挙げられる。
 Rはヒドロキシ基を有するヒドロキシフェニル基又はヒドロキシナフチル基であることが好ましく、ヒドロキシフェニル基であることがより好ましい。
 ヒドロキシフェニル基としては、2-、3-、又は、4-ヒドロキシフェニル基が挙げられる。
 ヒドロキシナフチル基としては、2,3-、2,4-、又は、2,5-ジヒドロキシナフチル基、1,2,3-トリヒドロキシナフチル基、及び、ヒドロキシナフチル基が挙げられる。
 ヒドロキシフェニル基又はヒドロキシナフチル基は置換基を有していてもよく、好ましい置換基としては、メトキシ基、エトキシ基等のアルコキシ基が挙げられる。
In the formula EV-1, R 1 represents an aromatic ring or a heteroaromatic ring having at least one hydroxy group, and the hydroxy group may be at the ortho, meta or para position with respect to the binding site with L. Good.
Preferred examples of the aromatic ring include phenyl group, benzyl group, tolyl group, o-, m-, p-xylyl group, naphthyl group, anthracenyl group, and phenanthrenyl group.
Preferred examples of the heteroaromatic ring include a furyl group, a pyridyl group, a pyrimidyl group, a pyrazoyl group, and a thiophenyl group.
These aromatic rings or heteroaromatic rings may have a substituent other than a hydroxyl group, and examples of the substituent include an alkyl group such as a methyl group and an ethyl group, an alkoxy group such as a methoxy group and an ethoxy group, an aryloxy group. Group, thioalkyl group, thioaryl group, -SH, azo group such as azoalkyl group and azophenyl group, thioalkyl group, amino group, ethenyl group, alkenyl group, alkynyl group, cycloalkyl group, aryl group, heteroaryl group, or hetero group Examples thereof include alicyclic groups.
R 1 is preferably a hydroxyphenyl group having a hydroxy group or a hydroxynaphthyl group, and more preferably a hydroxyphenyl group.
Examples of the hydroxyphenyl group include 2-, 3-, or 4-hydroxyphenyl groups.
Examples of the hydroxynaphthyl group include 2,3-, 2,4-, or 2,5-dihydroxynaphthyl group, 1,2,3-trihydroxynaphthyl group, and hydroxynaphthyl group.
The hydroxyphenyl group or hydroxynaphthyl group may have a substituent, and preferable examples of the substituent include alkoxy groups such as methoxy group and ethoxy group.
 式EV-1中、Lは二価の連結基を表し、アルキレン基、アリーレン基、ヘテロアリーレン基、-O-、-C(=O)-、-C(=O)O-、-C(=O)-NH-、-NH-C(=O)-、-NH-C(=O)-O-、-O-C(=O)-NH-、-NH-C(=O)-NH-、-NH-C(=S)-NH-、-S(=O)-、-S(=O)2-、-CH=N-、-NH-NH-、又は、これらの結合により表される基を表すことが好ましい。
 上記アルキレン基、アリーレン基、又は、ヘテロアリーレン基は置換基を有していてもよく、置換基としては、アルキル基、ヒドロキシ基、アミノ基、モノアルキルアミノ基、ジアルキルアミノ基、アルコキシ基、及び、ホスホン酸基又はその塩が挙げられる。
 Lは、アルキレン基、アリーレン基、又は、ヘテロアリーレン基であることがより好ましく、-CH-、-CH-CH-、-CH-CH-CH-、又は、フェニレン基であることが更に好ましい。
In Formula EV-1, L represents a divalent linking group, and is an alkylene group, an arylene group, a heteroarylene group, —O—, —C (═O) —, —C (═O) O—, —C ( = O) -NH-, -NH-C (= O)-, -NH-C (= O) -O-, -OC-(= O) -NH-, -NH-C (= O)- NH-, -NH-C (= S) -NH-, -S (= O)-, -S (= O) 2-, -CH = N-, -NH-NH-, or a combination thereof It is preferred to represent the groups represented.
The alkylene group, the arylene group, or the heteroarylene group may have a substituent, and as the substituent, an alkyl group, a hydroxy group, an amino group, a monoalkylamino group, a dialkylamino group, an alkoxy group, and , Phosphonic acid groups or salts thereof.
L is an alkylene group, an arylene group, or, more preferably heteroarylene group, -CH 2 -, - CH 2 -CH 2 -, - CH 2 -CH 2 -CH 2 -, or, phenylene group More preferably,
 式EV-2中、R及びRはそれぞれ独立に、水素原子、ハロゲン原子、置換基を有してもよい線状又は分岐状、あるいは環状のアルキル基、置換基を有してもよい線状又は分岐状、あるいは環状のアルケニル基、又は、置換基を有してもよい芳香環、若しくは、置換基を有してもよいヘテロ芳香環を表す。
 アルキル基としては、メチル基、エチル基、n-プロピル基、n-ブチル基、n-ペンチル基、n-ヘキシル基、クロロメチル基、トリクロロメチル基、イソプロピル基、イソブチル基、イソペンチル基、ネオペンチル基、1-メトキシブチル基、イソヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、及び、メチルシクロヘキシル基が挙げられる。
 アルケニル基としては、エテニル基、n-プロペニル基、n-ブテニル基、n-ペンテニル基、n-ヘキセニル基、イソプロペニル基、イソブテニル基、イソペンテニル基、ネオペンテニル基、1-メチルブテニル基、イソヘキセニル基、シクロペンテニル基、シクロヘキセニル基、及び、メチルシクロヘキセニル基が挙げられる。
 ハロゲン原子としては、塩素原子が挙げられる。
 芳香環としては、好ましくは、フェニル基、ベンジル基、トリル基、o-、m-、p-キシリル基、ナフチル基、アントラセニル基、及び、フェナントレニル基等のアリール基が挙げられる。
 ヘテロ芳香環としては、フリル基、ピリジル基、ピリミジル基、ピラゾイル基、及び、チオフェニル基等が挙げられる。
 R及びRはそれぞれ独立に、水素原子、塩素原子又はメチル基を表すことが好ましく、水素原子を表すことがより好ましい。
In Formula EV-2, R 2 and R 3 may each independently have a hydrogen atom, a halogen atom, a linear or branched alkyl group which may have a substituent, or a cyclic alkyl group which may have a substituent. It represents a linear, branched, or cyclic alkenyl group, an aromatic ring that may have a substituent, or a heteroaromatic ring that may have a substituent.
Examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group, an n-hexyl group, a chloromethyl group, a trichloromethyl group, an isopropyl group, an isobutyl group, an isopentyl group and a neopentyl group. , 1-methoxybutyl group, isohexyl group, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, and methylcyclohexyl group.
Examples of the alkenyl group include ethenyl group, n-propenyl group, n-butenyl group, n-pentenyl group, n-hexenyl group, isopropenyl group, isobutenyl group, isopentenyl group, neopentenyl group, 1-methylbutenyl group, isohexenyl group. Group, a cyclopentenyl group, a cyclohexenyl group, and a methylcyclohexenyl group.
A chlorine atom is mentioned as a halogen atom.
The aromatic ring is preferably an aryl group such as a phenyl group, a benzyl group, a tolyl group, an o-, m-, p-xylyl group, a naphthyl group, an anthracenyl group, and a phenanthrenyl group.
Examples of the heteroaromatic ring include a furyl group, a pyridyl group, a pyrimidyl group, a pyrazoyl group, and a thiophenyl group.
R 2 and R 3 each independently preferably represent a hydrogen atom, a chlorine atom or a methyl group, and more preferably a hydrogen atom.
 上記アルキル基、アルケニル基、芳香環又はヘテロ芳香環における置換基としては、メトキシ基、エトキシ基等のアルコキシ基、チオアルキル基、及び、-SHが挙げられる。
 芳香環又はヘテロ芳香環は、置換基として、アリーロキシ基、チオアリール基、アゾアルキル基及びアゾアリール基等のアゾ基、又は、アミノ基、を有していてもよい。
Examples of the substituents on the alkyl group, alkenyl group, aromatic ring or heteroaromatic ring include alkoxy groups such as methoxy group and ethoxy group, thioalkyl groups, and —SH.
The aromatic ring or heteroaromatic ring may have an azo group such as an aryloxy group, a thioaryl group, an azoalkyl group and an azoaryl group, or an amino group as a substituent.
 式EV-1により表される構成単位の含有量(ただし、モノマー単位として換算する。)は、高分子化合物におけるモノマー単位の全量に対し、10モル%以上が好ましく、10モル%~55モル%がより好ましく、15モル%~45モル%が更に好ましく、20モル%~35モル%が特に好ましい。
 式EV-2により表される構成単位の含有量(ただし、モノマー単位として換算する。)は、高分子化合物におけるモノマー単位の全量に対し、15モル%以上が好ましく、15モル%~60モル%がより好ましく、20モル%~50モル%が更に好ましく、25モル%~45モル%が特に好ましい。
The content of the structural unit represented by the formula EV-1 (provided that it is converted into a monomer unit) is preferably 10 mol% or more, and 10 mol% to 55 mol% based on the total amount of the monomer unit in the polymer compound. Is more preferable, 15 mol% to 45 mol% is further preferable, and 20 mol% to 35 mol% is particularly preferable.
The content of the structural unit represented by the formula EV-2 (however, converted as a monomer unit) is preferably 15 mol% or more, and preferably 15 mol% to 60 mol% with respect to the total amount of monomer units in the polymer compound. Is more preferable, 20 mol% to 50 mol% is further preferable, and 25 mol% to 45 mol% is particularly preferable.
 また、式EV-1により表される構成単位、及び、式EV-2により表される構成単位の合計含有量(ただし、モノマー単位として換算する。)は、高分子化合物におけるモノマー単位の全量に対し、50モル%~90モル%が好ましく、60モル%~80モル%がより好ましく、65モル%~75モル%が更に好ましい。 Further, the total content of the constitutional unit represented by the formula EV-1 and the constitutional unit represented by the formula EV-2 (however, converted as monomer units) is based on the total amount of the monomer units in the polymer compound. On the other hand, 50 mol% to 90 mol% is preferable, 60 mol% to 80 mol% is more preferable, and 65 mol% to 75 mol% is further preferable.
 上記アセタール樹脂の重量平均分子量は、5,000以上が好ましく、10,000~500,000がより好ましく、10,000~300,000が更に好ましい。 The weight average molecular weight of the acetal resin is preferably 5,000 or more, more preferably 10,000 to 500,000, further preferably 10,000 to 300,000.
 このようなアセタール樹脂は1種のみを用いてもよく、2種以上を混合して用いてもよい。 Such acetal resins may be used alone or in combination of two or more.
<<含有量>>
 本開示における特定バインダーポリマーの含有量は、画像記録層の全質量に対し、5質量%~75質量%であることが好ましく、10質量%~60質量%であることがより好ましく、15質量%~50質量%であることが更に好ましい。
 上記画像記録層が、上層及び下層を有する重層構造である場合、上記特定バインダーポリマーは、下層に少なくとも含有されることが好ましい。下層における上記特定バインダーポリマーの含有量としては、下層の全質量に対し、3質量%以上であることが好ましく、10質量%以上であることがより好ましく、25質量%以上であることが更に好ましい。
<< content >>
The content of the specific binder polymer in the present disclosure is preferably 5% by mass to 75% by mass, more preferably 10% by mass to 60% by mass, and further preferably 15% by mass with respect to the total mass of the image recording layer. It is more preferably from about 50% by mass.
When the image recording layer has a multilayer structure having an upper layer and a lower layer, the specific binder polymer is preferably contained in the lower layer at least. The content of the specific binder polymer in the lower layer is preferably 3% by mass or more, more preferably 10% by mass or more, and further preferably 25% by mass or more, based on the total mass of the lower layer. .
-赤外線吸収剤-
 上記画像記録層は、赤外線吸収剤を含むことが好ましい。
 赤外線吸収剤としては、赤外光を吸収し熱を発生する顔料又は染料であれば特に制限はなく、赤外線吸収剤として知られる種々の顔料又は染料を用いることができる。
-Infrared absorber-
The image recording layer preferably contains an infrared absorber.
The infrared absorbent is not particularly limited as long as it is a pigment or dye that absorbs infrared light and generates heat, and various pigments or dyes known as infrared absorbents can be used.
 染料としては、市販の染料及び例えば、「染料便覧」(有機合成化学協会編集、昭和45年刊)等の文献に記載されている公知のものが利用できる。具体的には、アゾ染料、金属錯塩アゾ染料、ピラゾロンアゾ染料、ナフトキノン染料、アントラキノン染料、フタロシアニン染料、カルボニウム染料、キノンイミン染料、メチン染料、シアニン染料、スクアリリウム色素、ピリリウム塩、金属チオレート錯体等の染料が挙げられる。
 これらの染料のうち好ましいものとしては、シアニン色素、スクアリリウム色素、ピリリウム塩、ニッケルチオレート錯体、インドレニンシアニン色素が挙げられる。更に、シアニン色素、インドレニンシアニン色素がより好ましく挙げられる。
 特に好ましい染料は、下記式(a)で表されるシアニン色素である。
As the dye, commercially available dyes and known dyes described in documents such as "Handbook of Dyes" (edited by The Society of Synthetic Organic Chemistry, published in 1970) can be used. Specifically, dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinone imine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complex dyes. Is mentioned.
Preferred among these dyes are cyanine dyes, squarylium dyes, pyrylium salts, nickel thiolate complexes, and indolenine cyanine dyes. Further, cyanine dyes and indolenine cyanine dyes are more preferred.
A particularly preferred dye is a cyanine dye represented by the following formula (a).
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 式(a)中、Xは、水素原子、ハロゲン原子、ジアリールアミノ基(-NPh)、X-L又は以下に示す基を表す。Xは、酸素原子又は硫黄原子を示す。Lは、炭素数1~12の炭化水素基、ヘテロ原子を有する芳香族環、又はヘテロ原子を含む炭素数1~12の炭化水素基を示す。なお、ここでヘテロ原子とは、N、S、O、ハロゲン原子、Seを示す。 In formula (a), X 1 represents a hydrogen atom, a halogen atom, a diarylamino group (—NPh 2 ), X 2 —L 1 or a group shown below. X 2 represents an oxygen atom or a sulfur atom. L 1 represents a hydrocarbon group having 1 to 12 carbon atoms, an aromatic ring having a hetero atom, or a hydrocarbon group having 1 to 12 carbon atoms containing a hetero atom. In addition, a hetero atom here shows N, S, O, a halogen atom, and Se.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 上記式中、Xa-は後述するZa-と同様に定義され、Raは、水素原子、アルキル基、アリール基、置換又は無置換のアミノ基、及び、ハロゲン原子よりなる群から選択される置換基を表す。 In the above formula, Xa is defined in the same manner as Za described later, and R a is a substituent selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, a substituted or unsubstituted amino group, and a halogen atom. Represents a group.
 R21及びR22は、それぞれ独立に、炭素数1~12の炭化水素基を示す。ポジ型平版印刷版原版の保存安定性から、R21及びR22は、炭素数2個以上の炭化水素基であることが好ましく、更に、R21とR22とは互いに結合し、5員環又は6員環を形成していることが特に好ましい。 R 21 and R 22 each independently represent a hydrocarbon group having 1 to 12 carbon atoms. From the viewpoint of storage stability of the positive type lithographic printing plate precursor, R 21 and R 22 are preferably a hydrocarbon group having 2 or more carbon atoms, and R 21 and R 22 are bonded to each other to form a 5-membered ring. Or, it is particularly preferable to form a 6-membered ring.
 Ar及びArは、それぞれ同じでも異なっていてもよく、置換基を有していてもよい芳香族炭化水素基を示す。好ましい芳香族炭化水素基としては、ベンゼン環及びナフタレン環が挙げられる。また、好ましい置換基としては、炭素数12以下の炭化水素基、ハロゲン原子、炭素数12以下のアルコキシ基が挙げられる。
 Y11及びY12は、それぞれ同じでも異なっていてもよく、硫黄原子又は炭素数12以下のジアルキルメチレン基を示す。R23及びR24は、それぞれ同じでも異なっていてもよく、置換基を有していてもよい炭素数20以下の炭化水素基を示す。好ましい置換基としては、炭素数12以下のアルコキシ基、カルボキシル基、スルホ基が挙げられる。
 R25、R26、R27及びR28は、それぞれ同じでも異なっていてもよく、水素原子又は炭素数12個以下の炭化水素基を示す。原料の入手性から、好ましくは水素原子である。また、Zaは、対アニオンを示す。但し、式(a)で示されるシアニン色素がその構造内にアニオン性の置換基を有し、電荷の中和が必要ない場合は、Zaは必要ない。好ましいZaは、ポジ型平版印刷版原版の保存安定性から、ハロゲン化物イオン、過塩素酸イオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、及びスルホン酸イオンであり、特に好ましくは、過塩素酸イオン、ヘキサフルオロホスフェートイオン、及びアリールスルホン酸イオンである。
Ar 1 and Ar 2 may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent. Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring. Moreover, as a preferable substituent, a C12 or less hydrocarbon group, a halogen atom, and a C12 or less alkoxy group are mentioned.
Y 11 and Y 12, which may be the same or different, each represents a sulfur atom or a dialkylmethylene group having 12 or less carbon atoms. R 23 and R 24, which may be the same or different, each represents a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferable substituents include an alkoxy group having 12 or less carbon atoms, a carboxyl group and a sulfo group.
R 25 , R 26 , R 27 and R 28, which may be the same or different, each represents a hydrogen atom or a hydrocarbon group having 12 or less carbon atoms. From the availability of raw materials, hydrogen atom is preferable. Za represents a counter anion. However, when the cyanine dye represented by the formula (a) has an anionic substituent in its structure and neutralization of charge is not necessary, Za is not necessary. Preferred Za is a halide ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion in view of the storage stability of the positive lithographic printing plate precursor, and particularly preferably, perchloric acid. An ion, a hexafluorophosphate ion, and an aryl sulfonate ion.
 好適に用いることのできる式(a)で示されるシアニン色素の具体例としては、特開2001-133969号公報の段落0017~0019、特開2002-40638号公報の段落0012~0038、特開2002-23360号公報の段落0012~0023に記載されたものを挙げることができる。
 画像記録層が含有する赤外線吸収剤として特に好ましくは、以下に示すシアニン染料Aである。
Specific examples of the cyanine dye represented by the formula (a) which can be preferably used include, for example, paragraphs 0017 to 0019 of JP 2001-133969 A, paragraphs 0012 to 0038 of JP 2002-40638 A, and JP 2002 A. Examples thereof include those described in paragraphs 0012 to 0023 of JP-A-23360.
The cyanine dye A shown below is particularly preferable as the infrared absorber contained in the image recording layer.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 赤外線吸収剤の含有量としては、画像記録層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~30質量%であることがより好ましく、1.0質量%~30質量%であることが特に好ましい。添加量が0.01質量%以上であると、高感度となり、また、50質量%以下であると、層の均一性が良好であり、層の耐久性に優れる。 The content of the infrared absorbing agent is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 30% by mass, based on the total mass of the image recording layer. It is particularly preferably from 0.0% by mass to 30% by mass. When the addition amount is 0.01% by mass or more, the sensitivity becomes high, and when the addition amount is 50% by mass or less, the uniformity of the layer is good and the durability of the layer is excellent.
 上記画像記録層が、上層及び下層を有する重層構造である場合、下層に赤外線吸収剤を含有させることで、露光感度が向上する。
 下層における赤外線吸収剤の添加量としては、下層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~30質量%であることがより好ましく、1.0質量%~10質量%であることが特に好ましい。添加量が0.01質量%以上であることで感度が改良され、また、50質量%以下であると、層の均一性が良好であり、層の耐久性に優れる。
When the image recording layer has a multilayer structure having an upper layer and a lower layer, the exposure sensitivity is improved by including an infrared absorber in the lower layer.
The addition amount of the infrared absorber in the lower layer is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 30% by mass, based on the total mass of the lower layer. It is particularly preferably from 0.0% by mass to 10% by mass. When the addition amount is 0.01% by mass or more, the sensitivity is improved, and when it is 50% by mass or less, the uniformity of the layer is good and the durability of the layer is excellent.
〔酸発生剤〕
 本開示における画像記録層は、得られる平版印刷版原版における感度向上の観点から、酸発生剤を含有することが好ましい。
 本開示において酸発生剤とは、光又は熱により酸を発生する化合物であり、赤外線の照射や、100℃以上の加熱によって分解し酸を発生する化合物を指す。発生する酸としては、スルホン酸、塩酸等のpKaが2以下の強酸であることが好ましい。この酸発生剤から発生した酸によって、平版印刷版原版における露光部画像記録層への現像液の浸透性が高くなり、画像記録層のアルカリ水溶液に対する溶解性がより向上するものである。
 本開示における画像記録層において好適に用いられる酸発生剤としては、国際公開第2016/047392号の段落0116から段落0130に記載の酸発生剤が挙げられる。
 中でも、感度と安定性の観点から、酸発生剤としてオニウム塩化合物を用いることが好ましい。以下、オニウム塩化合物について説明する。
 本開示において好適に用い得るオニウム塩化合物としては、赤外線露光、及び、露光により赤外線吸収剤から発生する熱エネルギーにより分解して酸を発生する化合物として知られる化合物を挙げることができる。本開示に好適なオニウム塩化合物としては、感度の観点から、公知の熱重合開始剤や結合解離エネルギーの小さな結合を有する、以下に述べるオニウム塩構造を有するものを挙げることができる。
 本開示において好適に用いられるオニウム塩としては、公知のジアゾニウム塩、ヨードニウム塩、スルホニウム塩、アンモニウム塩、ピリジニウム塩、アジニウム塩等が挙げられ、中でも、トリアリールスルホニウム、又は、ジアリールヨードニウムのスルホン酸塩、カルボン酸塩、BF 、PF 、ClO などが好ましい。
 本開示において酸発生剤として用い得るオニウム塩としては、下記式III~Vで表されるオニウム塩が挙げられる。
[Acid generator]
The image recording layer in the present disclosure preferably contains an acid generator from the viewpoint of improving the sensitivity of the lithographic printing plate precursor obtained.
In the present disclosure, the acid generator is a compound that generates an acid by light or heat, and refers to a compound that decomposes to generate an acid when irradiated with infrared rays or heated at 100 ° C. or higher. The generated acid is preferably a strong acid having a pKa of 2 or less such as sulfonic acid and hydrochloric acid. The acid generated from the acid generator enhances the permeability of the developing solution into the image recording layer in the exposed area of the lithographic printing plate precursor, and further improves the solubility of the image recording layer in the aqueous alkaline solution.
The acid generator preferably used in the image recording layer in the present disclosure includes the acid generators described in paragraphs 0116 to 0130 of WO 2016/047392.
Above all, it is preferable to use an onium salt compound as the acid generator from the viewpoint of sensitivity and stability. The onium salt compound will be described below.
Examples of onium salt compounds that can be suitably used in the present disclosure include compounds known as compounds that generate an acid by being exposed to infrared rays and decomposed by thermal energy generated from the infrared absorber upon exposure. Examples of onium salt compounds suitable for the present disclosure include known thermal polymerization initiators and compounds having an onium salt structure described below having a bond with a small bond dissociation energy from the viewpoint of sensitivity.
Examples of onium salts preferably used in the present disclosure include known diazonium salts, iodonium salts, sulfonium salts, ammonium salts, pyridinium salts, azinium salts, and the like. Among them, triarylsulfonium or diaryliodonium sulfonates , Carboxylate, BF 4 , PF 6 , ClO 4 − and the like are preferable.
Examples of onium salts that can be used as an acid generator in the present disclosure include onium salts represented by the following formulas III to V.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 上記式III中、Ar11とAr12は、それぞれ独立に、置換基を有していてもよい炭素原子数20個以下のアリール基を示す。このアリール基が置換基を有する場合の好ましい置換基としては、ハロゲン原子、ニトロ基、炭素数12個以下のアルキル基、炭素数12個以下のアルコキシ基、又は炭素数12個以下のアリールオキシ基が挙げられる。Z11-はハロゲン化物イオン、過塩素酸イオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、スルホン酸イオン、及び、ペルフルオロアルキルスルホン酸イオン等フッ素原子を有するスルホン酸イオンよりなる群から選択される対イオンを表し、好ましくは、過塩素酸イオン、ヘキサフルオロホスフェートイオン、アリールスルホン酸イオン、及びペルフルオロアルキルスルホン酸である。
 上記式IV中、Ar21は、置換基を有していてもよい炭素数1~20のアリール基を示す。好ましい置換基としては、ハロゲン原子、ニトロ基、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、炭素数1~12のアリールオキシ基、炭素数1~12のアルキルアミノ基、炭素数2~12のジアルキルアミノ基、炭素数6~12のアリールアミノ基又は、ジアリールアミノ基(2つのアリール基の炭素数が、それぞれ独立に、6~12)が挙げられる。Z21-はZ11-と同義の対イオンを表す。
 上記式V中、R31、R32及びR33は、それぞれ同じでも異なっていてもよく、置換基を有していてもよい炭素数1~20の炭化水素基を示す。好ましい置換基としては、ハロゲン原子、ニトロ基、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、又は炭素数1~12のアリールオキシ基が挙げられる。Z31-はZ11-と同義の対イオンを表す。
In Formula III, Ar 11 and Ar 12 each independently represent an aryl group having 20 or less carbon atoms, which may have a substituent. When the aryl group has a substituent, a preferable substituent is a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or an aryloxy group having 12 or less carbon atoms. Is mentioned. Z 11- is a pair selected from the group consisting of a halide ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a sulfonate ion, and a sulfonate ion having a fluorine atom such as a perfluoroalkylsulfonate ion. It represents an ion, and is preferably a perchlorate ion, a hexafluorophosphate ion, an aryl sulfonate ion, and a perfluoroalkyl sulfonic acid.
In the above formula IV, Ar 21 represents an aryl group having 1 to 20 carbon atoms which may have a substituent. Preferred substituents are a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aryloxy group having 1 to 12 carbon atoms, an alkylamino group having 1 to 12 carbon atoms, Examples thereof include a dialkylamino group having 2 to 12 carbon atoms, an arylamino group having 6 to 12 carbon atoms, and a diarylamino group (the carbon numbers of two aryl groups are each independently 6 to 12). Z 21- represents a counter ion having the same meaning as Z 11- .
In the above formula V, R 31 , R 32 and R 33, which may be the same or different, each represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. Examples of preferable substituents include a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and an aryloxy group having 1 to 12 carbon atoms. Z 31- represents a counter ion having the same meaning as Z 11- .
 本開示における画像記録層において、好適に用いることのできるオニウム塩の具体例は、国際公開第2016/047392号の段落0121~段落0124に記載された化合物と同様である。 Specific examples of the onium salt that can be preferably used in the image recording layer according to the present disclosure are the same as the compounds described in paragraphs 0121 to 0124 of International Publication WO2016 / 047392.
 また、上記式III~式Vで表される化合物の別の例としては、特開2008-195018号公報の段落0036~0045において、ラジカル重合開始剤の例として記載の化合物を、本開示に係る酸発生剤として好適に用いることができる。 Further, as another example of the compounds represented by the above formulas III to V, the compounds described as examples of the radical polymerization initiator in paragraphs 0036 to 0045 of JP 2008-195018 are related to the present disclosure. It can be suitably used as an acid generator.
 本開示に用いうる酸発生剤のより好ましい例として、下記化合物(PAG-1)~(PAG-5)が挙げられる。 More preferred examples of the acid generator usable in the present disclosure include the following compounds (PAG-1) to (PAG-5).
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 これらの酸発生剤を本開示における画像記録層に含有させる場合、これらの化合物は単独で使用してもよく、また2種以上を組み合わせて使用してもよい。
 酸発生剤の含有量は、画像記録層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~40質量%がより好ましく、0.5質量%~30質量%が更に好ましい。含有量が上記範囲において、酸発生剤添加の効果である感度の向上が見られると共に、非画像部における残膜の発生が抑制される。
When these acid generators are contained in the image recording layer in the present disclosure, these compounds may be used alone or in combination of two or more kinds.
The content of the acid generator is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 40% by mass, and 0.5% by mass with respect to the total mass of the image recording layer. More preferably, it is from about 30% by mass. When the content is within the above range, the sensitivity, which is an effect of the addition of the acid generator, is improved, and the generation of the residual film in the non-image area is suppressed.
〔酸増殖剤〕
 本開示における画像記録層は、酸増殖剤を含有してもよい。本開示における酸増殖剤とは、比較的に強い酸の残基で置換された化合物であって、酸触媒の存在下で容易に脱離して新たに酸を発生する化合物である。すなわち、酸触媒反応によって分解し、再び酸を発生する。1反応で1つ以上の酸が増えており、反応の進行に伴って加速的に酸濃度が増加することにより、飛躍的に感度が向上する。この発生する酸の強度は、酸解離定数(pKa)として3以下であることが好ましく、2以下であることがより好ましい。酸解離定数として3以下であれば、酸触媒による脱離反応を引き起こしやすい。
 このような酸触媒に使用される酸としては、ジクロロ酢酸、トリクロロ酢酸、メタンスルホン酸、エタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸、ナフタレンスルホン酸、フェニルスルホン酸等が挙げられる。
[Acid multiplying agent]
The image recording layer in the present disclosure may contain an acid multiplying agent. The acid multiplying agent in the present disclosure is a compound substituted with a residue of a relatively strong acid, and is a compound which is easily eliminated in the presence of an acid catalyst to newly generate an acid. That is, it decomposes by an acid-catalyzed reaction to generate an acid again. One or more acids are increased in one reaction, and the acid concentration is accelerated as the reaction progresses, so that the sensitivity is dramatically improved. The strength of the generated acid is preferably 3 or less as an acid dissociation constant (pKa), and more preferably 2 or less. When the acid dissociation constant is 3 or less, the elimination reaction by the acid catalyst is likely to occur.
Examples of the acid used for such an acid catalyst include dichloroacetic acid, trichloroacetic acid, methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid and phenylsulfonic acid.
 使用可能な酸増殖剤は、国際公開第2016/047392号の段落0133から段落0135に記載されたものと同様である。 The usable acid multiplying agent is the same as those described in paragraphs 0133 to 0135 of WO 2016/047392.
 これらの酸増殖剤を画像記録層中に添加する場合の含有量としては、画像記録層の全質量に対し、0.01質量%~20質量%が好ましく、0.01質量%~10質量%がより好ましく、0.1質量%~5質量%が更に好ましい。酸増殖剤の含有量が上記範囲において、酸増殖剤を添加する効果が充分に得られ、感度向上が達成されるともに、画像部の膜強度低下が抑制される。 When the acid proliferating agent is added to the image recording layer, the content thereof is preferably 0.01% by mass to 20% by mass, and 0.01% by mass to 10% by mass based on the total mass of the image recording layer. Is more preferable, and 0.1% by mass to 5% by mass is further preferable. When the content of the acid proliferating agent is in the above range, the effect of adding the acid proliferating agent is sufficiently obtained, the sensitivity is improved, and the reduction of the film strength of the image area is suppressed.
〔その他の添加剤〕
 本開示における画像記録層は、その他の添加剤として、現像促進剤、界面活性剤、焼き出し剤、着色剤、可塑剤、ワックス剤等を含んでもよい。
[Other additives]
The image recording layer in the present disclosure may contain a development accelerator, a surfactant, a printout agent, a colorant, a plasticizer, a wax agent, etc. as other additives.
-現像促進剤-
 本開示における画像記録層には、感度を向上させる目的で、酸無水物類、フェノール類、有機酸類を添加してもよい。
 酸無水物類としては環状酸無水物が好ましく、具体的に環状酸無水物としては、米国特許第4,115,128号明細書に記載されている無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、3,6-エンドオキシテトラヒドロ無水フタル酸、テトラクロロ無水フタル酸、無水マレイン酸、クロロ無水マレイン酸、α-フェニル無水マレイン酸、無水コハク酸、無水ピロメリット酸などが使用できる。非環状の酸無水物としては、無水酢酸などが挙げられる。
 フェノール類としては、ビスフェノールA、2,2’-ビスヒドロキシスルホン、p-ニトロフェノール、p-エトキシフェノール、2,4,4’-トリヒドロキシベンゾフェノン、2,3,4-トリヒドロキシベンゾフェノン、4-ヒドロキシベンゾフェノン、4,4’,4”-トリヒドロキシトリフェニルメタン、4,4’,3”,4”-テトラヒドロキシ-3,5,3’,5’-テトラメチルトリフェニルメタンなどが挙げられる。
 有機酸類としては、特開昭60-88942号公報、特開平2-96755号公報などに記載されており、具体的には、p-トルエンスルホン酸、ドデシルベンゼンスルホン酸、p-トルエンスルフィン酸、エチル硫酸、フェニルホスホン酸、フェニルホスフィン酸、リン酸フェニル、リン酸ジフェニル、安息香酸、イソフタル酸、アジピン酸、p-トルイル酸、3,4-ジメトキシ安息香酸、フタル酸、テレフタル酸、4-シクロヘキセン-1,2-ジカルボン酸、エルカ酸、ラウリン酸、n-ウンデカン酸、アスコルビン酸などが挙げられる。上記の酸無水物、フェノール類及び有機酸類の画像記録層の全質量に占める割合は、0.05質量%~20質量%が好ましく、0.1質量%~15質量%がより好ましく、0.1質量%~10質量%が特に好ましい。
-Development accelerator-
An acid anhydride, a phenol, or an organic acid may be added to the image recording layer in the present disclosure for the purpose of improving sensitivity.
Cyclic acid anhydrides are preferred as the acid anhydrides, and specific examples of the cyclic acid anhydrides include phthalic anhydride, tetrahydrophthalic anhydride, and hexahydroanhydride described in US Pat. No. 4,115,128. Phthalic acid, 3,6-endooxytetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride and the like can be used. Acetic anhydride etc. are mentioned as an acyclic acid anhydride.
Examples of phenols include bisphenol A, 2,2′-bishydroxysulfone, p-nitrophenol, p-ethoxyphenol, 2,4,4′-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4- Examples include hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "-tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane. .
Organic acids are described in JP-A-60-88942, JP-A-2-96755, and the like. Specifically, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, Ethyl sulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene Examples include -1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid. The proportion of the above-mentioned acid anhydride, phenols and organic acids in the total mass of the image recording layer is preferably 0.05% by mass to 20% by mass, more preferably 0.1% by mass to 15% by mass, and 0.1% by mass. 1% by mass to 10% by mass is particularly preferable.
-界面活性剤-
 本開示における画像記録層には、塗布性を良化するため、また、現像条件に対する処理の安定性を広げるため、特開昭62-251740号公報や特開平3-208514号公報に記載されているような非イオン界面活性剤、特開昭59-121044号公報、特開平4-13149号公報に記載されているような両性界面活性剤、特開昭62-170950号公報、特開平11-288093号公報、特開2003-57820号公報に記載されているようなフッ素含有のモノマー共重合体を添加することができる。
 非イオン界面活性剤の具体例としては、ソルビタントリステアレート、ソルビタンモノパルミテート、ソルビタントリオレート、ステアリン酸モノグリセリド、ポリオキシエチレンノニルフェニルエーテル等が挙げられる。
 両性活性剤の具体例としては、アルキルジ(アミノエチル)グリシン、アルキルポリアミノエチルグリシン塩酸塩、2-アルキル-N-カルボキシエチル-N-ヒドロキシエチルイミダゾリニウムベタインやN-テトラデシル-N,N-ベタイン型(例えば、商品名「アモーゲンK」:第一工業製薬(株)製)等が挙げられる。
 界面活性剤の画像記録層の全質量に占める割合は、0.01質量%~15質量%が好ましく、0.01質量%~5質量%がより好ましく、0.05質量%~2.0質量%が更に好ましい。
-Surfactant-
The image recording layer in the present disclosure is described in JP-A-62-251740 and JP-A-3-208514 in order to improve the coating property and to broaden the stability of processing under developing conditions. Such nonionic surfactants, amphoteric surfactants as described in JP-A-59-121044 and JP-A-4-13149, JP-A-62-170950, JP-A-11- Fluorine-containing monomer copolymers as described in JP-A-288093 and JP-A-2003-57820 can be added.
Specific examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride and polyoxyethylene nonylphenyl ether.
Specific examples of the amphoteric activator include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine and N-tetradecyl-N, N-betaine. Molds (for example, trade name “Amorgen K”: manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) and the like.
The ratio of the surfactant to the total mass of the image recording layer is preferably 0.01% by mass to 15% by mass, more preferably 0.01% by mass to 5% by mass, and 0.05% by mass to 2.0% by mass. % Is more preferable.
-焼出し剤/着色剤-
 本開示における画像記録層には、露光による加熱後直ちに可視像を得るための焼出し剤や、画像着色剤としての染料や顔料を加えることができる。
 焼出し剤及び着色剤としては、例えば、特開2009-229917号公報の段落0122~0123に詳細に記載され、ここに記載の化合物を本開示においても適用しうる。
 これらの染料は、画像記録層の全質量に対し、0.01~10質量%の割合で添加することが好ましく、0.1質量%~3質量%の割合で添加することがより好ましい。
-Bakeout agent / colorant-
To the image recording layer in the present disclosure, a printout agent for obtaining a visible image immediately after heating by exposure and a dye or pigment as an image colorant can be added.
Examples of the print-out agent and the colorant are described in detail in paragraphs 0122 to 0123 of JP 2009-229917 A, and the compounds described therein can be applied to the present disclosure.
These dyes are preferably added in a proportion of 0.01 to 10% by mass, more preferably 0.1 to 3% by mass, based on the total mass of the image recording layer.
-可塑剤-
 本開示における画像記録層には、塗膜の柔軟性等を付与するために可塑剤を添加してもよい。例えば、ブチルフタリル、ポリエチレングリコール、クエン酸トリブチル、フタル酸ジエチル、フタル酸ジブチル、フタル酸ジヘキシル、フタル酸ジオクチル、リン酸トリクレジル、リン酸トリブチル、リン酸トリオクチル、オレイン酸テトラヒドロフルフリル、アクリル酸又はメタクリル酸のオリゴマー及びポリマー等が用いられる。
 これらの可塑剤は、画像記録層の全質量に対し、0.5質量%~10質量%の割合で添加することが好ましく、1.0質量%~5質量%の割合で添加することがより好ましい。
-Plasticizer-
A plasticizer may be added to the image recording layer in the present disclosure in order to impart flexibility to the coating film. For example, butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, acrylic acid or methacrylic acid. Oligomers and polymers are used.
These plasticizers are preferably added in a proportion of 0.5% by mass to 10% by mass, more preferably 1.0% by mass to 5% by mass, based on the total mass of the image recording layer. preferable.
-ワックス剤-
 本開示における画像記録層には、傷に対する抵抗性を付与する目的で、表面の静摩擦係数を低下させる化合物を添加することもできる。具体的には、米国特許第6,117,913号明細書、特開2003-149799号公報、特開2003-302750号公報、又は、特開2004-12770号公報に記載されているような、長鎖アルキルカルボン酸のエステルを有する化合物などを挙げることができる。
 添加量として好ましいのは、画像記録層の全質量に対する割合が0.1質量%~10質量%であることが好ましく、0.5質量%~5質量%であることがより好ましい。
-Wax agent-
To the image recording layer in the present disclosure, a compound that lowers the coefficient of static friction of the surface can be added for the purpose of imparting resistance to scratches. Specifically, as described in US Pat. No. 6,117,913, JP-A 2003-149799, JP-A 2003-302750, or JP-A 2004-12770, Examples thereof include compounds having an ester of a long-chain alkylcarboxylic acid.
The addition amount is preferably 0.1% by mass to 10% by mass, more preferably 0.5% by mass to 5% by mass, based on the total mass of the image recording layer.
<オーバーコート層>
 本開示に係る平版印刷版原版は、画像記録層上に、オーバーコート層を更に有することが好ましく、上記オーバーコート層が、オモテ面の最外層であってもよい。
<Overcoat layer>
The lithographic printing plate precursor according to the present disclosure preferably further has an overcoat layer on the image recording layer, and the overcoat layer may be the outermost layer on the front surface.
 オーバーコートの成分としては、アルカリ可溶性のポリウレタン樹脂、アセタール樹脂等が挙げられ、ポリマー主鎖にカルボキシル基を有するポリウレタン樹脂が好ましく挙げられる。
 上記ポリウレタン樹脂を作製するイソシアネートとしてはトリレンジイソシアネート等の芳香族ジイソシアネートが、ジオールとしては、3,5-ジヒドロキシ安息香酸又は2,2-ビス(ヒドロキシメチル)プロピオン酸が好ましい。
 アセタール樹脂としては、例えば、ポリビニルアルコール(PVA)、ポリビニルブチラールPVB等が挙げられる。
Examples of components of the overcoat include alkali-soluble polyurethane resins and acetal resins, with polyurethane resins having a carboxyl group in the polymer main chain being preferred.
An aromatic diisocyanate such as tolylene diisocyanate is preferable as the isocyanate for producing the polyurethane resin, and 3,5-dihydroxybenzoic acid or 2,2-bis (hydroxymethyl) propionic acid is preferable as the diol.
Examples of the acetal resin include polyvinyl alcohol (PVA) and polyvinyl butyral PVB.
 本開示に係る平版印刷版原版においては、オーバーコート層の厚さは0.2μm~10μmであることが好ましく、より好ましくは0.3μm~5μm、更に好ましくは0.5μm~3μmである。 In the lithographic printing plate precursor according to the present disclosure, the thickness of the overcoat layer is preferably 0.2 μm to 10 μm, more preferably 0.3 μm to 5 μm, still more preferably 0.5 μm to 3 μm.
 オーバーコート層が特定粒子を含む場合、特定粒子の含有量としては、オーバーコート層の全質量に対して20質量%~80質量%であることが好ましく、より好ましくは30質量%~60質量%である。 When the overcoat layer contains specific particles, the content of the specific particles is preferably 20% by mass to 80% by mass, more preferably 30% by mass to 60% by mass, based on the total mass of the overcoat layer. Is.
 平版印刷版原版は、各構成層の塗布液を通常の方法に従って塗布、乾燥して各構成層を形成することにより製造することができる。塗布には、ダイコート法、ディップコート法、エアーナイフコート法、カーテンコート法、ローラーコート法、ワイヤーバーコート法、グラビアコート法、スライドコート法など用いられる。 The lithographic printing plate precursor can be manufactured by applying a coating solution for each constituent layer according to a usual method and drying to form each constituent layer. For coating, a die coating method, a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, a slide coating method and the like are used.
<重層構造の平版印刷版原版>
 本開示に係る平版印刷版原版は、上記画像記録層が、上層及び下層からなる重層であってもよい。
 本開示において、このような下層及び上層を有する平版印刷版原版を、「重層構造の平版印刷版原版」ともいう。
 下層及び上層は、2つの層を分離して形成することが好ましい。
 2つの層を分離して形成する方法としては、例えば、下層に含まれる成分と、上層に含まれる成分との溶剤溶解性の差を利用する方法、又は、上層を塗布した後、急速に溶剤を乾燥、除去する方法等が挙げられる。後者の方法を併用することにより、層間の分離が一層良好に行われることになるため好ましい。
 上記特定バインダーポリマーは、下層又は上層のいずれかに含まれていることが好ましく、下層に含まれることがより好ましい。
 以下、これらの方法について詳述するが、2つの層を分離して塗布する方法はこれらに限定されるものではない。
<Layered planographic printing plate precursor>
In the lithographic printing plate precursor according to the present disclosure, the image recording layer may be a multi-layer including an upper layer and a lower layer.
In the present disclosure, a lithographic printing plate precursor having such a lower layer and an upper layer is also referred to as “a planographic printing plate precursor having a multilayer structure”.
The lower layer and the upper layer are preferably formed by separating the two layers.
As a method for forming the two layers separately, for example, a method of utilizing a difference in solvent solubility between a component contained in the lower layer and a component contained in the upper layer, or a method of applying a solvent rapidly after coating the upper layer Examples of the method include drying and removing. It is preferable to use the latter method together because the separation between layers can be more favorably performed.
The specific binder polymer is preferably contained in either the lower layer or the upper layer, and more preferably contained in the lower layer.
Hereinafter, these methods will be described in detail, but the method of separating and applying the two layers is not limited thereto.
 下層に含まれる成分と上層に含まれる成分との溶剤溶解性の差を利用する方法としては、上層用塗布液を塗布する際に、下層に含まれる成分のいずれもが不溶な溶剤系を用いるものである。これにより、二層塗布を行っても、各層を明確に分離して塗膜にすることが可能になる。例えば、下層成分として、上層成分である特定バインダーポリマーを溶解するメチルエチルケトンや1-メトキシ-2-プロパノール等の溶剤に不溶な成分を選択し、上記下層成分を溶解する溶剤系を用いて下層を塗布、乾燥し、その後、特定バインダーポリマーを含む上層をメチルエチルケトンや1-メトキシ-2-プロパノール等で溶解し、塗布、乾燥することにより二層化が可能になる。 As a method of utilizing the difference in solvent solubility between the component contained in the lower layer and the component contained in the upper layer, a solvent system in which none of the components contained in the lower layer is insoluble is used when the coating liquid for the upper layer is applied. It is a thing. As a result, even if two-layer coating is performed, each layer can be clearly separated to form a coating film. For example, as the lower layer component, a component insoluble in a solvent such as methyl ethyl ketone or 1-methoxy-2-propanol that dissolves the specific binder polymer as the upper layer component is selected, and the lower layer is applied using a solvent system that dissolves the lower layer component. After drying, the upper layer containing the specific binder polymer is dissolved with methyl ethyl ketone, 1-methoxy-2-propanol or the like, coated and dried to form a double layer.
 次に、2層目(上層)を塗布後に、極めて速く溶剤を乾燥させる方法としては、ウェブの走行方向に対してほぼ直角に設置したスリットノズルより高圧エアーを吹きつけることや、蒸気等の加熱媒体を内部に供給されたロール(加熱ロール)よりウェブの下面から伝導熱として熱エネルギーを与えること、あるいはそれらを組み合わせることにより達成できる。 Next, as a method for drying the solvent extremely quickly after applying the second layer (upper layer), high-pressure air is blown from a slit nozzle installed almost at right angles to the running direction of the web, or heating with steam or the like. This can be achieved by applying heat energy as conduction heat from the lower surface of the web from a roll (heating roll) that is internally supplied with the medium, or by combining them.
 本開示に係る平版印刷版原版の支持体上に塗布される下層成分の乾燥後の塗布量は、0.5g/m~4.0g/mの範囲にあることが好ましく、0.6g/m~2.5g/mの範囲にあることがより好ましい。0.5g/m以上であると、耐刷性に優れ、4.0g/m以下であると、画像再現性及び感度に優れる。
 また、上層成分の乾燥後の塗布量は、0.05g/m~1.0g/mの範囲にあることが好ましく、0.08g/m~0.7g/mの範囲であることがより好ましい。0.05g/m以上であると、現像ラチチュード、及び、耐傷性に優れ、1.0g/m以下であると、感度に優れる。
 下層及び上層を合わせた乾燥後の塗布量としては、0.6g/m~4.0g/mの範囲にあることが好ましく、0.7g/m~2.5g/mの範囲にあることがより好ましい。0.6g/m以上であると、耐刷性に優れ、4.0g/m以下であると、画像再現性及び感度に優れる。
The coating amount of the lower layer component coated on the support of the lithographic printing plate precursor according to the present disclosure after drying is preferably in the range of 0.5 g / m 2 to 4.0 g / m 2 , and is 0.6 g. / M 2 to 2.5 g / m 2 is more preferable. When it is 0.5 g / m 2 or more, printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
The coating amount after drying of the upper layer component is preferably in the range of 0.05g / m 2 ~ 1.0g / m 2, in the range of 0.08g / m 2 ~ 0.7g / m 2 Is more preferable. If it is 0.05 g / m 2 or more, development latitude, and excellent scratch resistance, if it is 1.0 g / m 2 or less, excellent sensitivity.
The combined coating amount of the lower layer and the upper layer after drying is preferably in the range of 0.6 g / m 2 to 4.0 g / m 2 , and in the range of 0.7 g / m 2 to 2.5 g / m 2 . Is more preferable. When it is 0.6 g / m 2 or more, printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
<<下層>>
 本開示における重層構造の平版印刷版原版の下層は、熱によりアルカリ水溶液への溶解性が向上する赤外線感応性のポジ型記録層であることが好ましい。
 下層における熱によりアルカリ水溶液への溶解性が向上する機構には特に制限はなく、バインダー樹脂を含み、加熱された領域の溶解性が向上するものであれば、いずれも用いることができる。画像形成に利用される熱としては、赤外線吸収剤を含む下層が露光された場合に発生する熱が挙げられる。
 熱によりアルカリ水溶液への溶解性が向上する下層としては、例えば、ノボラック、ウレタン等の水素結合能を有するアルカリ可溶性樹脂を含む層、水不溶性かつアルカリ可溶性樹脂と溶解抑制作用のある化合物とを含む層などが好ましく挙げられる。
<< Lower layer >>
The lower layer of the planographic printing plate precursor having a multilayer structure in the present disclosure is preferably an infrared-sensitive positive recording layer whose solubility in an aqueous alkali solution is improved by heat.
There is no particular limitation on the mechanism by which the heat in the lower layer improves the solubility in the alkaline aqueous solution, and any mechanism can be used as long as it contains a binder resin and improves the solubility in the heated region. The heat used for image formation includes heat generated when the lower layer containing the infrared absorber is exposed.
The lower layer whose solubility in an aqueous alkali solution is improved by heat includes, for example, novolac, a layer containing an alkali-soluble resin having hydrogen bonding ability such as urethane, a water-insoluble and alkali-soluble resin and a compound having a dissolution inhibiting action. Layers and the like are preferred.
 また、下層に、更に赤外線吸収剤を添加することにより、下層で発生する熱も画像形成に利用することができる。赤外線吸収剤を含む下層の構成としては、例えば、赤外線吸収剤と水不溶性かつアルカリ可溶性樹脂と溶解抑制作用のある化合物とを含む層、赤外線吸収剤と水不溶性かつアルカリ可溶性樹脂と酸発生剤とを含む層などが好ましく挙げられる。 Also, by adding an infrared absorber to the lower layer, the heat generated in the lower layer can be used for image formation. The structure of the lower layer containing an infrared absorbing agent, for example, a layer containing an infrared absorbing agent and a water-insoluble and alkali-soluble resin and a compound having a dissolution suppressing action, an infrared absorbing agent and a water-insoluble and alkali-soluble resin and an acid generator. A layer containing is preferable.
-水不溶性かつアルカリ可溶性樹脂-
 本開示における下層には、水不溶性かつアルカリ可溶性樹脂を含有することが好ましい。水不溶性かつアルカリ可溶性樹脂を含有することで、赤外線吸収剤と水不溶性かつアルカリ可溶性樹脂が有する極性基との間に相互作用が形成され、ポジ型の感光性を有する層が形成される。
 一般的な水不溶性かつアルカリ可溶性樹脂については以下に詳述するが、中でも、例えば、ポリアミド樹脂、エポキシ樹脂、ポリアセタール樹脂、アクリル樹脂、メタクリル樹脂、ポリスチレン系樹脂、ノボラック型フェノール系樹脂等を好ましく挙げることができる。
 本開示において用いることができる水不溶性かつアルカリ可溶性樹脂としては、アルカリ性現像液に接触すると溶解する特性を有するものであれば特に制限はないが、高分子中の主鎖及び/又は側鎖に酸性基を含有する単独重合体、これらの共重合体、又は、これらの混合物であることが好ましい。
 このような酸性基を有する水不溶性かつアルカリ可溶性樹脂としては、フェノール性水酸基、カルボキシ基、スルホン酸基、リン酸基、スルホンアミド基、活性イミド基等の官能基を有することが好ましい。したがって、このような樹脂は、上記官能基を有するエチレン性不飽和モノマーを1つ以上含むモノマー混合物を共重合することによって好適に生成することができる。上記官能基を有するエチレン性不飽和モノマーは、アクリル酸、メタクリル酸の他に、下式で表される化合物及びその混合物が好ましく例示できる。なお、下式中、R40は水素原子又はメチル基を表す。
-Water-insoluble and alkali-soluble resin-
The lower layer in the present disclosure preferably contains a water-insoluble and alkali-soluble resin. By containing the water-insoluble and alkali-soluble resin, an interaction is formed between the infrared absorber and the polar group of the water-insoluble and alkali-soluble resin, and a positive photosensitive layer is formed.
The general water-insoluble and alkali-soluble resin will be described in detail below, and among them, for example, a polyamide resin, an epoxy resin, a polyacetal resin, an acrylic resin, a methacrylic resin, a polystyrene resin, a novolac type phenolic resin, etc. are preferred. be able to.
The water-insoluble and alkali-soluble resin that can be used in the present disclosure is not particularly limited as long as it has the property of dissolving when contacted with an alkaline developer, but the main chain and / or side chain in the polymer is acidic. It is preferably a homopolymer containing a group, a copolymer thereof, or a mixture thereof.
The water-insoluble and alkali-soluble resin having such an acidic group preferably has a functional group such as a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, a phosphoric acid group, a sulfonamide group and an active imide group. Therefore, such a resin can be suitably produced by copolymerizing a monomer mixture containing at least one ethylenically unsaturated monomer having the above functional group. As the ethylenically unsaturated monomer having a functional group, a compound represented by the following formula and a mixture thereof can be preferably exemplified in addition to acrylic acid and methacrylic acid. In the formula below, R 40 represents a hydrogen atom or a methyl group.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 本開示において用いることができる水不溶性かつアルカリ可溶性樹脂としては、上記重合性モノマーの他に、他の重合性モノマーを共重合させて得られる高分子化合物であることが好ましい。この場合の共重合比としては、フェノール性水酸基、カルボキシ基、スルホン酸基、リン酸基、スルホンアミド基、活性イミド基等の官能基を有するモノマーのようなアルカリ可溶性を付与するモノマーを10モル%以上含むことが好ましく、20モル%以上含むものがより好ましい。アルカリ可溶性を付与するモノマーの共重合成分が10モル%以上であると、アルカリ可溶性が十分得られ、また、現像性に優れる。 The water-insoluble and alkali-soluble resin that can be used in the present disclosure is preferably a polymer compound obtained by copolymerizing another polymerizable monomer in addition to the above polymerizable monomer. The copolymerization ratio in this case is 10 mol of a monomer that imparts alkali solubility, such as a monomer having a functional group such as a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, a phosphoric acid group, a sulfonamide group, and an active imide group. % Or more, and more preferably 20 mol% or more. When the copolymerization component of the monomer imparting alkali solubility is 10 mol% or more, sufficient alkali solubility is obtained and the developability is excellent.
 使用可能な他の重合性モノマーとしては、下記に挙げる化合物を例示することができる。
 アクリル酸メチル、アクリル酸エチル、アクリル酸プロピル、アクリル酸ベンジル、メタクリル酸メチル、メタクリル酸エチル、メタクリル酸シクロヘキシル、メタクリル酸ベンジル、等のアルキルアクリレートやアルキルメタクリレート。2-ヒドロキシエチルアクリレート又は2-ヒドロキシエチルメタクリレート等の脂肪族水酸基を有するアクリル酸エステル類、及びメタクリル酸エステル類。アクリルアミド、メタクリルアミド、N-メチルアクリルアミド、N-エチルアクリルアミド、N-フェニルアクリルアミド、等のアクリルアミド若しくはメタクリルアミド。ビニルアセテート、ビニルクロロアセテート、ビニルブチレート、安息香酸ビニル等のビニルエステル類。スチレン、α-メチルスチレン、メチルスチレン、クロロメチルスチレン等のスチレン類。N-ビニルピロリドン、N-ビニルピリジン、アクリロニトリル、メタクリロニトリル等のその他の窒素原子含有モノマー。N-メチルマレイミド、N-エチルマレイミド、N-プロピルマレイミド、N-ブチルマレイミド、N-フェニルマレイミド、N-2-メチルフェニルマレイミド、N-2,6-ジエチルフェニルマレイミド、N-2-クロロフェニルマレイミド、N-シクロヘキシルマレイミド、N-ラウリルマレイミド、N-ヒドロキシフェニルマレイミド、等のマレイミド類。
 これらの他のエチレン性不飽和モノマーのうち、好適に使用されるのは、(メタ)アクリル酸エステル類、(メタ)アクリルアミド、マレイミド化合物、(メタ)アクリロニトリルである。
Examples of other polymerizable monomers that can be used include the compounds listed below.
Alkyl acrylates and alkyl methacrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, benzyl acrylate, methyl methacrylate, ethyl methacrylate, cyclohexyl methacrylate and benzyl methacrylate. Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate. Acrylamide or methacrylamide such as acrylamide, methacrylamide, N-methyl acrylamide, N-ethyl acrylamide, N-phenyl acrylamide. Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate. Styrenes such as styrene, α-methylstyrene, methylstyrene and chloromethylstyrene. Other nitrogen atom-containing monomers such as N-vinylpyrrolidone, N-vinylpyridine, acrylonitrile and methacrylonitrile. N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide, N-butylmaleimide, N-phenylmaleimide, N-2-methylphenylmaleimide, N-2,6-diethylphenylmaleimide, N-2-chlorophenylmaleimide, Maleimides such as N-cyclohexylmaleimide, N-laurylmaleimide and N-hydroxyphenylmaleimide.
Of these other ethylenically unsaturated monomers, (meth) acrylic acid esters, (meth) acrylamide, maleimide compounds, and (meth) acrylonitrile are preferably used.
 また、アルカリ可溶性樹脂としては、本開示に係る画像記録層の任意成分としてあげたその他のバインダーポリマーとして挙げたノボラック樹脂も好ましく挙げられる。
 また、上記の水不溶性かつアルカリ可溶性樹脂を本開示における画像記録層に用いることも可能である。
Further, as the alkali-soluble resin, the novolak resin mentioned as the other binder polymer mentioned as an optional component of the image recording layer according to the present disclosure is also preferably exemplified.
It is also possible to use the above water-insoluble and alkali-soluble resin in the image recording layer in the present disclosure.
 更に、本開示における下層中には、本開示に係る効果を損なわない範囲で他の樹脂を併用することができる。下層自体は、特に非画像部領域において、アルカリ可溶性を発現することを要するため、この特性を損なわない樹脂を選択する必要がある。この観点から、併用可能な樹脂としては、水不溶性かつアルカリ可溶性樹脂が挙げられる。一般的な水不溶性かつアルカリ可溶性樹脂については以下に詳述するが、中でも、例えば、ポリアミド樹脂、エポキシ樹脂、ポリアセタール樹脂、アクリル樹脂、メタクリル樹脂、ポリスチレン系樹脂、ノボラック型フェノール系樹脂等を好ましく挙げることができる。
 また、混合する量としては、上記水不溶性かつアルカリ可溶性樹脂に対して50質量%以下であることが好ましい。
Further, in the lower layer in the present disclosure, other resins can be used in combination as long as the effects according to the present disclosure are not impaired. Since the lower layer itself needs to exhibit alkali solubility, especially in the non-image area, it is necessary to select a resin that does not impair this property. From this viewpoint, water-insoluble and alkali-soluble resins are examples of resins that can be used in combination. The general water-insoluble and alkali-soluble resin will be described in detail below, and among them, for example, a polyamide resin, an epoxy resin, a polyacetal resin, an acrylic resin, a methacrylic resin, a polystyrene resin, a novolac type phenolic resin, etc. are preferred. be able to.
Further, the amount to be mixed is preferably 50% by mass or less with respect to the water-insoluble and alkali-soluble resin.
 上記水不溶性かつアルカリ可溶性樹脂は、重量平均分子量が2,000以上、かつ数平均分子量が500以上のものが好ましく、重量平均分子量が5,000~300,000で、かつ数平均分子量が800~250,000であることがより好ましい。また、上記アルカリ可溶性樹脂の分散度(重量平均分子量/数平均分子量)は、1.1~10であることが好ましい。
 本開示に係る下層におけるアルカリ可溶性樹脂は、1種単独で使用しても、2種以上を併用してもよい。
 本開示における下層の全固形分中に対するアルカリ可溶性樹脂の含有量は、下層の全質量に対し、2.0質量%~99.5質量%であることが好ましく、10.0質量%~99.0質量%であることがより好ましく、20.0質量%~90.0質量%であることが更に好ましい。アルカリ可溶性樹脂の添加量が2.0質量%以上であると画像記録層(感光層)の耐久性に優れ、また、99.5質量%以下であると、感度、及び、耐久性の両方に優れる。
The water-insoluble and alkali-soluble resin preferably has a weight average molecular weight of 2,000 or more and a number average molecular weight of 500 or more, a weight average molecular weight of 5,000 to 300,000, and a number average molecular weight of 800 to More preferably, it is 250,000. The degree of dispersion (weight average molecular weight / number average molecular weight) of the alkali-soluble resin is preferably 1.1 to 10.
The alkali-soluble resin in the lower layer according to the present disclosure may be used alone or in combination of two or more.
The content of the alkali-soluble resin in the total solid content of the lower layer in the present disclosure is preferably 2.0% by mass to 99.5% by mass, and 10.0% by mass to 99.% by mass, based on the total mass of the lower layer. It is more preferably 0% by mass, further preferably 20.0% by mass to 90.0% by mass. When the addition amount of the alkali-soluble resin is 2.0% by mass or more, the durability of the image recording layer (photosensitive layer) is excellent, and when it is 99.5% by mass or less, both the sensitivity and the durability are improved. Excel.
-その他の成分-
 その他、重層構造の平版印刷版原版における下層は、酸発生剤、酸増殖剤、現像促進剤、界面活性剤、焼き出し剤/着色剤、可塑剤、ワックス剤等を含んでもよい。
 これらの成分は、前述した、本開示における画像記録層において用いられるそれぞれの成分を同様に用いることができ、好ましい態様も同様である。
-Other ingredients-
In addition, the lower layer of the lithographic printing plate precursor having a multi-layer structure may contain an acid generator, an acid multiplying agent, a development accelerator, a surfactant, a printing-out agent / colorant, a plasticizer, a wax agent and the like.
As these components, the above-mentioned respective components used in the image recording layer in the present disclosure can be similarly used, and the preferred embodiments are also the same.
<<上層>>
 平版印刷版原版が重層構造である場合、本開示における重層構造の平版印刷版原版の上層は、熱によりアルカリ水溶液への溶解性が向上する赤外線感応性のポジ型画像記録層であることが好ましい。
 上層における熱によりアルカリ水溶液への溶解性が向上する機構には特に制限はなく、バインダー樹脂を含み、加熱された領域の溶解性が向上するものであれば、いずれも用いることができる。画像形成に利用される熱としては、赤外線吸収剤を含む下層が露光された場合に発生する熱が挙げられる。
 熱によりアルカリ水溶液への溶解性が向上する上層としては、例えば、ノボラック、ウレタン等の水素結合能を有するアルカリ可溶性樹脂を含む層、水不溶性かつアルカリ可溶性樹脂と溶解抑制作用のある化合物とを含む層、アブレーション抑制可能な化合物を含む層、などが好ましく挙げられる。
<< Upper layer >>
When the lithographic printing plate precursor has a multi-layer structure, the upper layer of the lithographic printing plate precursor having the multi-layer structure in the present disclosure is preferably an infrared-sensitive positive type image recording layer whose solubility in an alkaline aqueous solution is improved by heat. ..
There is no particular limitation on the mechanism by which the heat in the upper layer improves the solubility in the alkaline aqueous solution, and any mechanism can be used as long as it contains a binder resin and improves the solubility in the heated region. The heat used for image formation includes heat generated when the lower layer containing the infrared absorber is exposed.
The upper layer whose solubility in an aqueous alkali solution is improved by heat includes, for example, a layer containing an alkali-soluble resin having hydrogen bonding ability such as novolac and urethane, a water-insoluble and alkali-soluble resin and a compound having a dissolution suppressing action. A layer, a layer containing a compound capable of suppressing ablation, and the like are preferable.
<下塗層>
 本開示に係るポジ型平版印刷版原版は、必要に応じて支持体と画像記録層(又は、記録層における下層)との間に下塗層を有することができる。
 下塗層成分としては、種々の有機化合物が用いられ、例えば、カルボキシメチルセルロース、デキストリン等のアミノ基を有するホスホン酸類、有機ホスホン酸、有機リン酸、有機ホスフィン酸、アミノ酸類、並びに、ヒドロキシ基を有するアミンの塩酸塩等が好ましく挙げられる。また、これら下塗層成分は、1種単独で用いても、2種以上混合して用いてもよい。下塗層に使用される化合物の詳細、下塗層の形成方法は、特開2009-175195号公報の段落0171~0172に記載され、これらの記載は本開示にも適用される。
 下塗層の被覆量は、2mg/m~200mg/mであることが好ましく、5mg/m~100mg/mであることがより好ましい。被覆量が上記範囲であると、十分な耐刷性能が得られる。
<Undercoat layer>
The positive lithographic printing plate precursor according to the present disclosure may have an undercoat layer between the support and the image recording layer (or the lower layer in the recording layer), if necessary.
As the undercoat layer component, various organic compounds are used, for example, carboxymethyl cellulose, phosphonic acids having an amino group such as dextrin, organic phosphonic acid, organic phosphoric acid, organic phosphinic acid, amino acids, and a hydroxy group. Preferable examples are the hydrochlorides of the amines that it has. These undercoat layer components may be used alone or in combination of two or more. Details of the compound used for the undercoat layer and the method for forming the undercoat layer are described in paragraphs 0171 to 0172 of JP2009-175195A, and these descriptions also apply to the present disclosure.
The coating amount of the undercoat layer is preferably 2 mg / m 2 to 200 mg / m 2 , and more preferably 5 mg / m 2 to 100 mg / m 2 . When the coating amount is within the above range, sufficient printing durability can be obtained.
<バックコート層>
 本開示に係る平版印刷版原版の支持体裏面には、必要に応じてバックコート層が設けられる。かかるバックコート層としては、特開平5-45885号公報記載の有機高分子化合物及び特開平6-35174号公報記載の有機又は無機金属化合物を加水分解及び重縮合させて得られる金属酸化物からなる被覆層が好ましく用いられる。これらの被覆層のうち、Si(OCH、Si(OC、Si(OC、Si(OCなどのケイ素のアルコキシ化合物が安価で入手し易く、それから得られる金属酸化物の被覆層が耐現像液に優れており特に好ましい。
<Backcoat layer>
A back coat layer is provided on the back surface of the support of the lithographic printing plate precursor according to the present disclosure, if necessary. The back coat layer is composed of an organic polymer compound described in JP-A-5-45885 and a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound described in JP-A-6-35174. A coating layer is preferably used. Among these coating layers, silicon alkoxy compounds such as Si (OCH 3 ) 4 , Si (OC 2 H 5 ) 4 , Si (OC 3 H 7 ) 4 and Si (OC 4 H 9 ) 4 are inexpensively available. It is particularly preferable because the coating layer of the metal oxide obtained therefrom is excellent in the resistance to developing solution.
〔平版印刷版原版積層体〕
 本開示に係る平版印刷版原版積層体は、本開示に係る平版印刷版原版を積層してなる積層体であり、本開示に係る平版印刷版原版を複数枚積層してなり、上記平版印刷版原版の画像記録層を有する側における最外層と、他の平版印刷版原版の画像記録層を有する側とは反対側における最外層とを、直接接触させて積層させた平版印刷版原版積層体であることが好ましい。
 また、本開示に係る平版印刷版原版積層体は、本開示に係る平版印刷版原版を合紙を介さずに複数枚積層してなる積層体であることが好ましい。
 積層枚数としては、特に制限はないが、2枚~500枚であることが好ましい。
 本開示に係る平版印刷版原版積層体は、本開示に係る平版印刷版原版が有する特性の故に、多重給版の防止性、擦れ傷防止性においても優れており、また、集積ズレが生じ難いという特性を有する。
[Lithographic printing plate precursor laminate]
The lithographic printing plate precursor laminate according to the present disclosure is a laminate formed by laminating the lithographic printing plate precursor according to the present disclosure, and is formed by laminating a plurality of lithographic printing plate precursors according to the present disclosure. The lithographic printing plate precursor laminate in which the outermost layer on the side having the image recording layer of the original plate and the outermost layer on the side opposite to the side having the image recording layer of the other lithographic printing plate precursor are laminated in direct contact. Preferably there is.
The lithographic printing plate precursor laminate according to the present disclosure is preferably a laminate formed by laminating a plurality of lithographic printing plate precursors according to the present disclosure without interposing interleaving paper.
The number of laminated sheets is not particularly limited, but is preferably 2 to 500 sheets.
The lithographic printing plate precursor according to the present disclosure has excellent properties of the lithographic printing plate precursor according to the present disclosure in terms of prevention of multiple plate feeding and scratch resistance, and is less likely to cause misalignment. It has the characteristic that
(平版印刷版の作製方法)
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光し、露光部と未露光部とを形成する工程(以下、「画像露光工程」ともいう)、及び、露光された上記平版印刷版原版をpH13.5以下の現像液を用いて現像する現像工程、をこの順で含む。
 以下、本開示に係る作製方法の各工程について詳細に説明する。
(Method of preparing lithographic printing plate)
The method for producing a lithographic printing plate according to the present disclosure, a step of exposing the lithographic printing plate precursor according to the present disclosure imagewise, to form an exposed portion and an unexposed portion (hereinafter, also referred to as "image exposure step"), And a developing step of developing the exposed lithographic printing plate precursor using a developer having a pH of 13.5 or less in this order.
Hereinafter, each step of the manufacturing method according to the present disclosure will be described in detail.
<画像露光工程>
 本開示に係る平版印刷版の作製方法は、画像露光工程を含む。
 本開示に係る平版印刷版原版の画像露光に用いられる活性光線の光源としては、近赤外から赤外領域に発光波長を持つ光源が好ましく、固体レーザー、半導体レーザーがより好ましい。中でも、本開示においては、波長750nm~1,400nmの赤外線を放射する固体レーザー又は半導体レーザーにより画像露光されることが特に好ましい。
 レーザーの出力は、100mW以上が好ましく、露光時間を短縮するため、マルチビームレーザデバイスを用いることが好ましい。また、1画素あたりの露光時間は20μ秒以内であることが好ましい。
 平版印刷版原版に照射されるエネルギーは、10mJ/cm~300mJ/cmであることが好ましい。上記範囲であると、画像記録層のアルカリ水溶液に対する溶解性が十分に向上し、また、レーザーアブレーションを抑制し、画像の損傷を防ぐことができる。
<Image exposure process>
The method for producing a lithographic printing plate according to the present disclosure includes an image exposure step.
As a light source of actinic rays used for image exposure of the lithographic printing plate precursor according to the present disclosure, a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser and a semiconductor laser are more preferable. Among them, in the present disclosure, it is particularly preferable to perform image exposure with a solid-state laser or semiconductor laser that emits infrared rays having a wavelength of 750 nm to 1,400 nm.
The laser output is preferably 100 mW or more, and it is preferable to use a multi-beam laser device in order to shorten the exposure time. The exposure time per pixel is preferably within 20 μsec.
The energy applied to the lithographic printing plate precursor is preferably 10 mJ / cm 2 to 300 mJ / cm 2 . Within the above range, the solubility of the image recording layer in an alkaline aqueous solution can be sufficiently improved, laser ablation can be suppressed, and image damage can be prevented.
 本開示における露光は、光源の光ビームをオーバーラップさせて露光することができる。オーバーラップとは、副走査ピッチ幅がビーム径より小さいことをいう。オーバーラップは、例えば、ビーム径をビーム強度の半値幅(FWHM)で表したとき、FWHM/副走査ピッチ幅(オーバーラップ係数)で定量的に表現することができる。本開示ではこのオーバーラップ係数が、0.1以上であることが好ましい。 The exposure in the present disclosure can be performed by overlapping the light beams of the light source. The overlap means that the sub-scanning pitch width is smaller than the beam diameter. The overlap can be quantitatively expressed by FWHM / sub-scanning pitch width (overlap coefficient) when the beam diameter is expressed by the full width at half maximum (FWHM) of the beam intensity. In the present disclosure, this overlap coefficient is preferably 0.1 or more.
 本開示において使用することができる露光装置の光源の走査方式は、特に限定はなく、円筒外面走査方式、円筒内面走査方式、平面走査方式などを用いることができる。また、光源のチャンネルは単チャンネルでもマルチチャンネルでもよいが、円筒外面方式の場合にはマルチチャンネルが好ましく用いられる。 The light source scanning method of the exposure apparatus that can be used in the present disclosure is not particularly limited, and a cylinder outer surface scanning method, a cylinder inner surface scanning method, a flat surface scanning method, or the like can be used. The light source channel may be a single channel or a multi-channel, but in the case of the cylindrical outer surface system, the multi-channel is preferably used.
<現像工程>
 本開示に係る平版印刷版の作製方法は、露光された上記ポジ型平版印刷版原版をpH13.5以下の現像液を用いて現像する現像工程を含む。
 現像工程に使用される現像液のpHとしては、11以下であることが好ましい。
現像工程に使用される現像液としては、13.5以下の現像液であれば特に限定されない。
 上記現像液は、水溶液であることが好ましい。
 また、本開示に係る平版印刷版原版は、pHが13.5を超える現像液を用いて現像を行ってもよい。例えば、特開2003-1956号公報の段落0270~0292に記載の現像液など、公知の現像液を用いて現像することもできる。
<Developing process>
The method of preparing a lithographic printing plate according to the present disclosure includes a developing step of developing the exposed positive lithographic printing plate precursor using a developer having a pH of 13.5 or less.
The pH of the developer used in the developing step is preferably 11 or less.
The developing solution used in the developing step is not particularly limited as long as it is a developing solution of 13.5 or less.
The developer is preferably an aqueous solution.
The lithographic printing plate precursor according to the present disclosure may be developed using a developer having a pH of more than 13.5. For example, development can be performed using a known developing solution such as the developing solutions described in paragraphs 0270 to 0292 of JP-A-2003-1956.
 また、現像性の向上のため、現像液は界面活性剤を含んでもよい。
 上記現像液に用いられる界面活性剤は、アニオン性、ノニオン性、カチオン性、及び、両性の界面活性剤のいずれも用いることができるが、既述のように、アニオン性、ノニオン性の界面活性剤が好ましい。
 本開示において現像液に用いられるアニオン性、ノニオン性、カチオン性、及び、両性界面活性剤としては、特開2013-134341号公報の段落0128~0131に記載の物を使用することができる。
Further, in order to improve the developability, the developer may contain a surfactant.
The surfactant used in the developer may be any of anionic, nonionic, cationic, and amphoteric surfactants, but as described above, anionic and nonionic surfactants. Agents are preferred.
As the anionic, nonionic, cationic and amphoteric surfactants used in the developing solution in the present disclosure, those described in paragraphs 0128 to 0131 of JP2013-134341A can be used.
 また、水に対する安定な溶解性あるいは混濁性の観点から、HLB値が、6以上であることが好ましく、8以上であることがより好ましい。
 上記現像液に用いられる界面活性剤としては、アニオン性界面活性剤及びノニオン界面活性剤が好ましく、スルホン酸又はスルホン酸塩を含有するアニオン性界面活性剤及び、芳香環とエチレンオキサイド鎖を有するノニオン界面活性剤が特に好ましい。
 界面活性剤は、単独又は組み合わせて使用することができる。
 界面活性剤の現像液中における含有量は、0.01質量%~10質量%が好ましく、0.01質量%~5質量%がより好ましい。
Further, from the viewpoint of stable solubility or turbidity in water, the HLB value is preferably 6 or more, more preferably 8 or more.
As the surfactant used in the developing solution, anionic surfactants and nonionic surfactants are preferable, and anionic surfactants containing sulfonic acid or sulfonate, and nonionics having an aromatic ring and an ethylene oxide chain. Surfactants are especially preferred.
The surfactants can be used alone or in combination.
The content of the surfactant in the developer is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass.
 現像工程に使用される現像液は、pH13.5以下の現像液であれば特に限定されないが、pH11以下の現像液であることが好ましく、pH8.0~pH10.0の現像液であることがより好ましく、pH9.0~pH9.9の現像液であることが更に好ましい。
 pH8.0~pH10.0の現像液のような比較的低pHの現像液を用いる場合、例えばpHが12前後の高pHの現像液と比較して、例えば大気中のCOの溶解等に由来するpHの低下が抑制されやすい。すなわち、低pHであることにより現像液の使用時又は保管時における安定性に優れるといえる。
 低pHの現像液において、上記の様に現像液におけるpHの低下が抑制されることにより、現像性低下、現像カス発生等が抑制される。
 また、上記低pHの現像液におけるpHを初期値に保つために、現像液を緩衝液とすることも好ましい。緩衝液としては、特に炭酸塩緩衝系とすることが好ましい。
 本開示において、炭酸塩緩衝系とは、緩衝剤として炭酸イオン及び炭酸水素イオンを含有する緩衝液をいう。
 炭酸イオン及び炭酸水素イオンを現像液中に存在させるには、炭酸塩と炭酸水素塩を現像液に加えてもよいし、炭酸塩又は炭酸水素塩を加えた後にpHを調整することで、炭酸イオンと炭酸水素イオンを発生させてもよい。炭酸塩及び炭酸水素塩は、特に限定されないが、アルカリ金属塩であることが好ましい。アルカリ金属としては、リチウム、ナトリウム、カリウムが挙げられ、ナトリウムが特に好ましい。これらは単独でも、二種以上を組み合わせて用いてもよい。
The developing solution used in the developing step is not particularly limited as long as it is a developing solution having a pH of 13.5 or less, but is preferably a developing solution having a pH of 11 or less, and a developing solution having a pH of 8.0 to 10.0. The developer having a pH of 9.0 to pH 9.9 is more preferable, and the developer is further preferable.
When a developer having a relatively low pH, such as a developer having a pH of 8.0 to 10.0, is used, for example, as compared with a developer having a high pH of about 12, the dissolution of CO 2 in the atmosphere, etc. It is easy to suppress the lowering of the derived pH. That is, it can be said that the low pH provides excellent stability during use or storage of the developer.
In the low pH developer, the decrease in the pH of the developer is suppressed as described above, so that the deterioration of the developability and the generation of development residue are suppressed.
Further, in order to keep the pH of the low pH developer at an initial value, it is preferable to use the developer as a buffer solution. The buffer solution is preferably a carbonate buffer system.
In the present disclosure, the carbonate buffer system refers to a buffer solution containing carbonate ion and hydrogen carbonate ion as a buffering agent.
In order to allow the carbonate ion and the hydrogen carbonate ion to be present in the developing solution, carbonate and hydrogen carbonate may be added to the developing solution, or the carbonate may be added by adjusting the pH after adding the carbonate or hydrogen carbonate. Ions and hydrogen carbonate ions may be generated. The carbonate and hydrogen carbonate are not particularly limited, but are preferably alkali metal salts. Examples of the alkali metal include lithium, sodium and potassium, with sodium being particularly preferred. These may be used alone or in combination of two or more.
 炭酸塩及び炭酸水素塩の総量は、現像液の全質量に対して、0.3質量%~20質量%が好ましく、0.5質量%~10質量%がより好ましく、1質量%~5質量%が特に好ましい。総量が0.3質量%以上であると現像性、処理能力が低下せず、20質量%以下であると沈殿や結晶を生成し難くなり、更に現像液の廃液処理時、中和の際にゲル化し難くなり、廃液処理に支障をきたさない。 The total amount of carbonate and hydrogen carbonate is preferably 0.3% by mass to 20% by mass, more preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass, based on the total mass of the developer. % Is particularly preferred. If the total amount is 0.3% by mass or more, developability and processing ability are not deteriorated, and if the total amount is 20% by mass or less, it becomes difficult to generate a precipitate or a crystal. It does not easily gel and does not interfere with waste liquid treatment.
 また、アルカリ濃度の微少な調整、非画像部画像記録層の溶解を補助する目的で、補足的に他のアルカリ剤、例えば有機アルカリ剤を併用してもよい。有機アルカリ剤としては、モノメチルアミン、ジメチルアミン、トリメチルアミン、モノエチルアミン、ジエチルアミン、トリエチルアミン、モノイソプロピルアミン、ジイソプロピルアミン、トリイソプロピルアミン、n-ブチルアミン、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン、モノイソプロパノールアミン、ジイソプロパノールアミン、エチレンイミン、エチレンジアミン、ピリジン、テトラメチルアンモニウムヒドロキシド等を挙げることができる。これらの他のアルカリ剤は、単独又は2種以上を組み合わせて用いられる。
 上記現像液には上記の他に、湿潤剤、防腐剤、キレート化合物、消泡剤、有機酸、有機溶剤、無機酸、無機塩などを含有することができる。ただし、水溶性高分子化合物を添加すると、特に現像液が疲労した際に版面がベトツキやすくなるため、添加しないことが好ましい。
Further, for the purpose of finely adjusting the alkali concentration and assisting the dissolution of the image recording layer in the non-image area, other alkali agents, for example, organic alkali agents may be supplementarily used. As the organic alkaline agent, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, Examples thereof include diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, tetramethylammonium hydroxide and the like. These other alkaline agents may be used alone or in combination of two or more.
In addition to the above, the developer may contain a wetting agent, a preservative, a chelate compound, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt and the like. However, when the water-soluble polymer compound is added, the plate surface tends to become sticky, especially when the developer is fatigued.
 湿潤剤としては、特開2013-134341号公報の段落0141に記載の湿潤剤を好適に用いることができる。湿潤剤は単独で用いてもよいが、2種以上併用してもよい。湿潤剤は、現像剤の全質量に対し、0.1質量%~5質量%の量で使用されることが好ましい。 As the wetting agent, the wetting agent described in paragraph 0141 of JP2013-134341A can be preferably used. The wetting agents may be used alone or in combination of two or more. The wetting agent is preferably used in an amount of 0.1% by mass to 5% by mass, based on the total mass of the developer.
 防腐剤としては、特開2013-134341号公報の段落0142に記載の防腐剤を好適に用いることができる。種々のカビ、殺菌に対して効力のあるように2種以上の防腐剤を併用することが好ましい。防腐剤の添加量は、細菌、カビ、酵母等に対して、安定に効力を発揮する量であって、細菌、カビ、酵母の種類によっても異なるが、現像液の全質量に対して、0.01質量%~4質量%の範囲が好ましい。 As the preservative, the preservative described in paragraph 0142 of JP2013-134341A can be preferably used. It is preferable to use two or more preservatives in combination so as to be effective against various molds and sterilizations. The addition amount of the preservative is an amount that exerts a stable effect on bacteria, molds, yeasts and the like, and varies depending on the types of bacteria, molds, yeasts, but it is 0 for the total mass of the developer. A range of 0.01% by mass to 4% by mass is preferable.
 キレート化合物としては、特開2013-134341号公報の段落0143に記載のキレート化合物を好適に用いることができる。キレート剤は現像液組成中に安定に存在し、印刷性を阻害しないものが選ばれる。添加量は、現像液の全質量に対して、0.001質量%~1.0質量%が好適である。 As the chelate compound, the chelate compound described in paragraph 0143 of JP2013-134341A can be preferably used. The chelating agent is selected so that it stably exists in the developer composition and does not impair the printability. The addition amount is preferably 0.001% by mass to 1.0% by mass with respect to the total mass of the developer.
 消泡剤としては、特開2013-134341号公報の段落0144に記載の消泡剤を好適に用いることができる。消泡剤の含有量は、現像液の全質量に対して、0.001質量%~1.0質量%の範囲が好適である。 As the defoaming agent, the defoaming agent described in paragraph 0144 of JP2013-134341A can be preferably used. The content of the defoaming agent is preferably in the range of 0.001% by mass to 1.0% by mass with respect to the total mass of the developer.
 有機酸としては、特開2013-134341号公報の段落0145に記載の消泡剤を好適に用いることができる。有機酸の含有量は、現像液の全質量に対して、0.01質量%~0.5質量%が好ましい。 As the organic acid, the defoaming agent described in paragraph 0145 of JP2013-134341A can be preferably used. The content of the organic acid is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
 有機溶剤としては、例えば、脂肪族炭化水素類(ヘキサン、ヘプタン、“アイソパーE、H、G”(エッソ化学(株)製)、ガソリン、若しくは、灯油等)、芳香族炭化水素類(トルエン、キシレン等)、又は、ハロゲン化炭化水素(メチレンジクロライド、エチレンジクロライド、トリクレン、モノクロルベンゼン等)や、極性溶剤が挙げられる。 Examples of the organic solvent include aliphatic hydrocarbons (hexane, heptane, “Isopar E, H, G” (manufactured by Esso Chemical Co., Ltd.), gasoline, or kerosene), aromatic hydrocarbons (toluene, Xylene) or halogenated hydrocarbons (methylene dichloride, ethylene dichloride, trichlene, monochlorobenzene, etc.) and polar solvents.
 極性溶剤としては、アルコール類(メタノール、エタノール、プロパノール、イソプロパノール、ベンジルアルコール、エチレングリコールモノメチルエーテル、2-エトキシエタノール等)、ケトン類(メチルエチルケトン、シクロヘキサノン等)、エステル類(酢酸エチル、乳酸メチル、プロピレングリコールモノメチルエーテルアセテート等)、その他(トリエチルホスフェート、トリクレジルホスフェート、N-フェニルエタノールアミン、N-フェニルジエタノールアミン等)等が挙げられる。 Examples of polar solvents include alcohols (methanol, ethanol, propanol, isopropanol, benzyl alcohol, ethylene glycol monomethyl ether, 2-ethoxyethanol, etc.), ketones (methyl ethyl ketone, cyclohexanone, etc.), esters (ethyl acetate, methyl lactate, propylene). Glycol monomethyl ether acetate, etc.) and others (triethyl phosphate, tricresyl phosphate, N-phenylethanolamine, N-phenyldiethanolamine, etc.) and the like.
 また、上記有機溶剤が水に不溶な場合は、界面活性剤等を用いて水に可溶化して使用することも可能である。現像液が有機溶剤を含有する場合は、安全性、引火性の観点から、溶剤の濃度は40質量%未満が好ましい。 If the above organic solvent is insoluble in water, it can be solubilized in water with a surfactant or the like before use. When the developer contains an organic solvent, the concentration of the solvent is preferably less than 40 mass% from the viewpoint of safety and flammability.
 無機酸及び無機塩としては、リン酸、メタリン酸、第一リン酸アンモニウム、第二リン酸アンモニウム、第一リン酸ナトリウム、第二リン酸ナトリウム、第一リン酸カリウム、第二リン酸カリウム、トリポリリン酸ナトリウム、ピロリン酸カリウム、ヘキサメタリン酸ナトリウム、硝酸マグネシウム、硝酸ナトリウム、硝酸カリウム、硝酸アンモニウム、硫酸ナトリウム、硫酸カリウム、硫酸アンモニウム、亜硫酸ナトリウム、亜硫酸アンモニウム、硫酸水素ナトリウム、硫酸ニッケルなどが挙げられる。無機塩の含有量は、現像液の全質量に対し、0.01質量%~0.5質量%が好ましい。 As the inorganic acid and the inorganic salt, phosphoric acid, metaphosphoric acid, monobasic ammonium phosphate, dibasic ammonium phosphate, monobasic sodium phosphate, dibasic sodium phosphate, monobasic potassium phosphate, dibasic potassium phosphate, Examples thereof include sodium tripolyphosphate, potassium pyrophosphate, sodium hexametaphosphate, magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium sulfite, ammonium sulfite, sodium hydrogensulfate and nickel sulfate. The content of the inorganic salt is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
 現像の温度は、現像可能であれば特に制限はないが、60℃以下であることが好ましく、15℃~40℃であることがより好ましい。自動現像機を用いる現像処理においては、処理量に応じて現像液が疲労してくることがあるので、補充液又は新鮮な現像液を用いて処理能力を回復させてもよい。現像及び現像後の処理の一例としては、アルカリ現像を行い、後水洗工程でアルカリを除去し、ガム引き工程でガム処理を行い、乾燥工程で乾燥する方法が例示できる。また、他の例としては、炭酸イオン、炭酸水素イオン及び界面活性剤を含有する水溶液を用いることにより、前水洗、現像及びガム引きを同時に行う方法が好ましく例示できる。よって、前水洗工程は特に行わなくともよく、一液を用いるだけで、更には一浴で前水洗、現像及びガム引きを行ったのち、乾燥工程を行うことが好ましい。現像の後は、スクイズローラ等を用いて余剰の現像液を除去してから乾燥を行うことが好ましい。 The developing temperature is not particularly limited as long as it can be developed, but is preferably 60 ° C. or lower, more preferably 15 ° C. to 40 ° C. In a developing process using an automatic developing machine, the developing solution may become fatigued depending on the processing amount, and therefore the replenishing solution or a fresh developing solution may be used to recover the processing ability. As an example of the development and the treatment after the development, a method of performing alkali development, removing the alkali in the post-water washing step, performing gum treatment in the gumming step, and drying in the drying step can be exemplified. As another example, a method of simultaneously performing pre-washing, developing and gumming can be preferably exemplified by using an aqueous solution containing carbonate ion, hydrogen carbonate ion and a surfactant. Therefore, the pre-water washing step does not have to be particularly carried out, and it is preferable to carry out the pre-water washing, development and gumming in one bath only after using one solution, and then to carry out the drying step. After the development, it is preferable to remove excess developer using a squeeze roller or the like and then perform drying.
 現像工程は、擦り部材を備えた自動処理機により好適に実施することができる。自動処理機としては、例えば、画像露光後の平版印刷版原版を搬送しながら擦り処理を行う、特開平2-220061号公報、特開昭60-59351号公報に記載の自動処理機や、シリンダー上にセットされた画像露光後の平版印刷版原版を、シリンダーを回転させながら擦り処理を行う、米国特許5148746号、同5568768号、英国特許2297719号の各明細書に記載の自動処理機等が挙げられる。中でも、擦り部材として、回転ブラシロールを用いる自動処理機が特に好ましい。 Development process can be preferably carried out by an automatic processor equipped with a rubbing member. As the automatic processor, for example, the automatic processor described in JP-A-2-220061 and JP-A-60-59351, which performs rubbing treatment while conveying the planographic printing plate precursor after image exposure, and a cylinder The lithographic printing plate precursor after image exposure set on the above is subjected to a rubbing treatment while rotating a cylinder, and the automatic processor described in each specification of US Pat. Nos. 5,148,746, 5,568,768, and British Patent 2,297,719 is Can be mentioned. Above all, an automatic processor using a rotating brush roll as the rubbing member is particularly preferable.
 本開示において使用する回転ブラシロールは、画像部の傷つき難さ、更には、平版印刷版原版の支持体における腰の強さ等を考慮して適宜選択することができる。回転ブラシロールとしては、ブラシ素材をプラスチック又は金属のロールに植え付けて形成された公知のものが使用できる。例えば、特開昭58-159533号公報、特開平3-100554号公報に記載のものや、実公昭62-167253号公報に記載されているような、ブラシ素材を列状に植え込んだ金属又はプラスチックの溝型材を芯となるプラスチック又は金属のロールに隙間なく放射状に巻き付けたブラシロールが使用できる。
 ブラシ素材としては、プラスチック繊維(例えば、ポリエチレンテレフタレート、ポリブチレンテレフタレート等のポリエステル系、ナイロン6.6、ナイロン6.10等のポリアミド系、ポリアクリロニトリル、ポリ(メタ)アクリル酸アルキル等のポリアクリル系、ポリプロピレン、ポリスチレン等のポリオレフィン系の合成繊維)を使用することができ、例えば、繊維の毛の直径は20μm~400μm、毛の長さは5mm~30mmのものが好適に使用できる。
 回転ブラシロールの外径は30mm~200mmが好ましく、版面を擦るブラシの先端の周速は0.1m/sec~5m/secが好ましい。回転ブラシロールは、複数本用いることが好ましい。
The rotating brush roll used in the present disclosure can be appropriately selected in consideration of the scratch resistance of the image area, the rigidity of the support of the planographic printing plate precursor, and the like. As the rotating brush roll, a known roll formed by planting a brush material on a plastic or metal roll can be used. For example, a metal or plastic in which brush materials are implanted in rows, as described in JP-A-58-159533 and JP-A-3-100554, and JP-B-62-167253. It is possible to use a brush roll in which the groove-shaped material is wound around a plastic or metal roll serving as a core in a radial pattern without a gap.
As the brush material, plastic fibers (for example, polyester type such as polyethylene terephthalate and polybutylene terephthalate, polyamide type such as nylon 6.6 and nylon 6.10, polyacryl type such as polyacrylonitrile, alkyl poly (meth) acrylate) Polyolefin-based synthetic fibers such as polypropylene and polystyrene) can be preferably used. For example, fibers having a hair diameter of 20 μm to 400 μm and a hair length of 5 mm to 30 mm can be preferably used.
The outer diameter of the rotating brush roll is preferably 30 mm to 200 mm, and the peripheral speed of the tip of the brush rubbing the plate surface is preferably 0.1 m / sec to 5 m / sec. It is preferable to use a plurality of rotating brush rolls.
 回転ブラシロールの回転方向は、平版印刷版原版の搬送方向に対し、同一方向であっても、逆方向であってもよいが、2本以上の回転ブラシロールを使用する場合は、少なくとも1本の回転ブラシロールが同一方向に回転し、少なくとも1本の回転ブラシロールが逆方向に回転することが好ましい。これにより、非画像部の画像記録層の除去が更に確実となる。更に、回転ブラシロールをブラシロールの回転軸方向に揺動させることも効果的である。 The rotating brush roll may be rotated in the same direction or in the opposite direction with respect to the conveying direction of the lithographic printing plate precursor, but when using two or more rotating brush rolls, at least one rotating brush roll is used. It is preferable that the rotating brush rolls of 1 rotate in the same direction and at least one rotating brush roll rotate in the opposite direction. This further ensures removal of the image recording layer in the non-image area. Further, it is also effective to swing the rotating brush roll in the rotation axis direction of the brush roll.
 現像工程の後、連続的又は不連続的に乾燥工程を設けることが好ましい。乾燥は熱風、赤外線、遠赤外線等によって行う。
 本開示に係る平版印刷版の作製方法において好適に用いられる自動処理機としては、現像部と乾燥部とを有する装置が用いられ、平版印刷版原版に対して、現像槽で、現像とガム引きとが行われ、その後、乾燥部で乾燥されて平版印刷版が得られる。
After the developing step, it is preferable to provide a drying step continuously or discontinuously. Drying is performed with hot air, infrared rays, far infrared rays, or the like.
As an automatic processor preferably used in the method for producing a lithographic printing plate according to the present disclosure, an apparatus having a developing unit and a drying unit is used, and a lithographic printing plate precursor is developed and gummed in a developing tank. And then dried in the drying section to obtain a lithographic printing plate.
 また、耐刷性等の向上を目的として、現像後の印刷版を非常に強い条件で加熱することもできる。加熱温度は、200℃~500℃の範囲である事が好ましい。温度が低いと十分な画像強化作用が得られず、高すぎる場合には支持体の劣化、画像部の熱分解といった問題を生じる恐れがある。
 このようにして得られた平版印刷版はオフセット印刷機に掛けられ、多数枚の印刷に好適に用いられる。
Further, the printing plate after development can be heated under extremely strong conditions for the purpose of improving printing durability. The heating temperature is preferably in the range of 200 ° C to 500 ° C. If the temperature is low, a sufficient image strengthening effect cannot be obtained, and if it is too high, problems such as deterioration of the support and thermal decomposition of the image area may occur.
The lithographic printing plate thus obtained is set on an offset printing machine and is suitably used for printing a large number of sheets.
 以下、実施例により本開示を詳細に説明するが、本開示はこれらに限定されるものではない。実施例において、「%」、「部」とは、特に断りのない限り、それぞれ「質量%」、「質量部」を意味する。高分子化合物において、特別に規定したもの以外は、分子量は重量平均分子量(Mw)であり、構成繰り返し単位の比率はモル百分率である。重量平均分子量(Mw)は、ゲル浸透クロマトグラフィー(GPC)法によるポリスチレン換算値として測定した値である。 Hereinafter, the present disclosure will be described in detail with reference to examples, but the present disclosure is not limited thereto. In the examples, "%" and "parts" mean "mass%" and "parts by mass", respectively, unless otherwise specified. In the polymer compound, the molecular weight is a weight average molecular weight (Mw) and the ratio of the constitutional repeating units is a molar percentage, except for those specified otherwise. The weight average molecular weight (Mw) is a value measured as a polystyrene conversion value by a gel permeation chromatography (GPC) method.
(実施例1~36、並びに、比較例1及び2)
<支持体の作製>
 国際公開第2015/152209号の段落0224~0297と同様の方法により支持体を製造した。全ての実施例と比較例にてこの支持体を使用した。
(Examples 1 to 36 and Comparative Examples 1 and 2)
<Preparation of support>
A support was produced by the same method as in paragraphs 0224 to 0297 of WO 2015/152209. This support was used in all examples and comparative examples.
<特定バインダーポリマーの合成>
〔バインダーポリマーP1-1〕
 バインダーポリマーP1-1は、特許6243010号公報の段落0221に記載された方法と同様の方法により合成し、下記に示す構成単位を有するバインダーポリマーP1-1を得た。
 なお、下記構成単位中、括弧の添字は各構成単位の含有量(モル比)を表す。以下同様である。
<Synthesis of specific binder polymer>
[Binder polymer P1-1]
Binder polymer P1-1 was synthesized by a method similar to the method described in paragraph 0221 of Japanese Patent No. 6243010 to obtain binder polymer P1-1 having the structural units shown below.
In addition, in the following structural units, parenthesized subscripts represent the content (molar ratio) of each structural unit. The same applies hereinafter.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
〔バインダーポリマーP2-1〕
 バインダーポリマーP2-1は、下記に示す構成単位を有するバインダーポリマー(市販品)(住友ベークライト(株)製、商品名;スミライトレジン PR54046)を使用した。
[Binder polymer P2-1]
As the binder polymer P2-1, a binder polymer (commercially available product) having a constitutional unit shown below (manufactured by Sumitomo Bakelite Co., Ltd., trade name: Sumilite Resin PR54046) was used.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
〔バインダーポリマーP3-1〕
 バインダーポリマーP3-1は、特開2011-186139号公報に記載された方法により、下記に示す構成単位を有するバインダーポリマーP3-1を合成した。
[Binder polymer P3-1]
As the binder polymer P3-1, a binder polymer P3-1 having the constitutional units shown below was synthesized by the method described in JP-A-2011-186139.
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
〔バインダーポリマーP4-1〕
 窒素気流下、N-フェニルマレイミド26.25g、アクリロニトリル7.95g、アクリルアミド10.65g、メタクリル酸4.3gを2-メトキシエタノール133.1gに加え、70℃に加熱した後、α、α’-アゾビスイソブチロニトリル0.25gを加えて8時間重合反応を行った。反応液を精製したのち、重量平均分子量43,000の下記に示す構成単位を有するバインダーポリマーP4-1を得た。
[Binder polymer P4-1]
Under a nitrogen stream, 26.25 g of N-phenylmaleimide, 7.95 g of acrylonitrile, 10.65 g of acrylamide and 4.3 g of methacrylic acid were added to 133.1 g of 2-methoxyethanol and heated to 70 ° C., then α, α′- 0.25 g of azobisisobutyronitrile was added and a polymerization reaction was carried out for 8 hours. After the reaction solution was purified, a binder polymer P4-1 having a structural unit shown below with a weight average molecular weight of 43,000 was obtained.
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
〔バインダーポリマーP4-2〕
 コンデンサー及び撹拌機を取り付けた3つ口フラスコに、N,N’-ジメチルホルムアミド(富士フイルム和光純薬(株)製)5.80gを秤量し、窒素フローしながら65℃で30分撹拌した。次いで滴下ロートに4-メタクリルアミドベンゼンスルホンアミド(富士フイルムファインケミカルズ(株)製)7.21g、メタクリル酸メチル(富士フイルム和光純薬(株)製)3.00g、アクリロニトリル(東京化成工業(株)製)2.12g、N,N’-ジメチルホルムアミド(富士フイルム和光純薬(株)製)23.0g、アソビスイソブチロニトリル(富士フイルム和光純薬(株)製)0.324gを秤量し、溶解させ、2時間かけてフラスコに滴下した。更に65℃で3時間撹拌した。反応液を純水0.5L、メタノール0.5Lの混合液に滴下し、ポリマーを析出させた。これを濾取、洗浄、乾燥し、重量平均分子量50,000の下記構成単位を有するバインダーポリマーP4-2:11.2gを得た。
[Binder polymer P4-2]
In a three-necked flask equipped with a condenser and a stirrer, 5.80 g of N, N'-dimethylformamide (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) was weighed and stirred at 65 ° C for 30 minutes while flowing nitrogen. Next, in the dropping funnel, 7.21 g of 4-methacrylamidobenzenesulfonamide (manufactured by FUJIFILM Fine Chemicals Co., Ltd.), 3.00 g of methyl methacrylate (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and acrylonitrile (manufactured by Tokyo Chemical Industry Co., Ltd.) 2.12 g, N, N'-dimethylformamide (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) 23.0 g, and 0.324 g of asobisisobutyronitrile (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) , Dissolved, and added dropwise to the flask over 2 hours. The mixture was further stirred at 65 ° C for 3 hours. The reaction solution was added dropwise to a mixed solution of 0.5 L of pure water and 0.5 L of methanol to precipitate a polymer. This was collected by filtration, washed and dried to obtain 11.2 g of a binder polymer P4-2 having the following structural unit with a weight average molecular weight of 50,000.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
〔バインダーポリマーP5-1〕
 バインダーポリマーP5-1は、下記に示す構成単位を有するバインダーポリマー(市販品)(積水化学工業(株)社製、商品名;エスレックBL-1H)を使用した。
[Binder polymer P5-1]
As the binder polymer P5-1, a binder polymer (commercially available product) having a constitutional unit shown below (manufactured by Sekisui Chemical Co., Ltd., trade name: S-REC BL-1H) was used.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
<下塗層の形成>
 上記支持体上に、以下に示す下塗層塗布液1を塗布した後、80℃で15秒間乾燥し、下塗層を設けた。乾燥後の被覆量は、15mg/m2であった。
<Formation of undercoat layer>
After coating the undercoat layer coating liquid 1 shown below on the support, it was dried at 80 ° C. for 15 seconds to form an undercoat layer. The coating amount after drying was 15 mg / m 2 .
〔下塗層塗布液1〕
 ・重量平均分子量2.8万の下記共重合体:0.3部
 ・メタノール:100部
 ・水:1部
[Undercoat layer coating liquid 1]
-The following copolymer having a weight average molecular weight of 28,000: 0.3 part-Methanol: 100 parts-Water: 1 part
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 上記化学式中、括弧の添字は各構成単位の含有量(質量%)を表す。また、Etはエチル基を表す。 In the above chemical formula, the subscripts in parentheses indicate the content (mass%) of each structural unit. Et represents an ethyl group.
<感光性樹脂組成物の調製>
 下記組成に記載した各成分を混合し、感光性樹脂組成物(I)を調製した。感光性樹脂組成物(I)はポジ型の感光性樹脂組成物である。
<Preparation of photosensitive resin composition>
Photosensitive resin composition (I) was prepared by mixing the components described in the following composition. The photosensitive resin composition (I) is a positive type photosensitive resin composition.
〔感光性樹脂組成物(I)〕
・表1又は表2に記載の特定バインダーポリマー:表1又は表2に記載の量
・赤外線吸収剤(IR色素(1):下記構造):0.045部
・メガファックF-780:0.03部
・メチルエチルケトン:13.0部
・1-メトキシ-2-プロパノール:30.0部
・1-(4-メチルベンジル)-1-フェニルピペリジニウムの5-ベンゾイル-4-ヒドロキシ-2-メトキシベンゼンスルホン酸塩:0.01部
[Photosensitive resin composition (I)]
-Specific binder polymer shown in Table 1 or Table 2: Amount shown in Table 1 or Table 2-Infrared absorber (IR dye (1): structure below): 0.045 part-Megafac F-780: 0. 03 parts Methyl ethyl ketone: 13.0 parts 1-Methoxy-2-propanol: 30.0 parts 1- (4-methylbenzyl) -1-phenylpiperidinium 5-benzoyl-4-hydroxy-2-methoxy Benzene sulfonate: 0.01 part
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
<画像記録層(単層)の形成>
 各実施例又は比較例において、得られた下塗り層付きの支持体に、上記感光性樹脂組成物(I)を、ワイヤーバーで塗布した後、150℃の乾燥オーブンで40秒間乾燥して、表に示す特定バインダーポリマーの塗布量になるように塗工し、画像記録層を設け、更に、オーバーコート層を設けて、平版印刷版原版を得た。
<Formation of image recording layer (single layer)>
In each of the Examples or Comparative Examples, the above-mentioned support with an undercoat layer was coated with the above-mentioned photosensitive resin composition (I) using a wire bar, and then dried in a drying oven at 150 ° C. for 40 seconds to give a table. The coating amount of the specific binder polymer shown in (3) was applied to provide an image recording layer and an overcoat layer to obtain a lithographic printing plate precursor.
(粒子塗布法)
 表1又は表2に記載の粒子を、下記オーバーコート層塗布液(I)に、表1又は表2に記載の面内密度となるように添加量を調製して添加した。
 画像記録層上に、下記組成のオーバーコート層塗布液をバー塗布し、125℃で75秒間オーブン乾燥し、乾燥塗布量0.15g/mのオーバーコート層を形成した。
(Particle coating method)
The particles shown in Table 1 or Table 2 were added to the following overcoat layer coating liquid (I) at an adjusted addition amount so as to have the in-plane density shown in Table 1 or Table 2.
An overcoat layer coating solution having the following composition was bar-coated on the image recording layer and oven-dried at 125 ° C. for 75 seconds to form an overcoat layer having a dry coating amount of 0.15 g / m 2 .
〔オーバーコート層塗布液(I)〕
・ポリビニルアルコール(CKS-50(製品名)、ケン化度99モル%、重合度300、日本合成化学工業(株)製):0.29質量部
・第一工業製薬(株)セロゲン(登録商標)PR:0.12質量部
・界面活性剤-1(日本エマルジョン(株)製、エマレックス710(商品名)):0.025質量部
・表1又は表2に記載の粒子:0.10質量部
・純水:69.2質量部
[Overcoat layer coating liquid (I)]
-Polyvinyl alcohol (CKS-50 (product name), saponification degree 99 mol%, polymerization degree 300, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.): 0.29 parts by mass-Daiichi Kogyo Seiyaku Co., Ltd. Serogen (registered trademark) ) PR: 0.12 parts by mass Surfactant-1 (manufactured by Nippon Emulsion Co., Ltd., Emalex 710 (trade name)): 0.025 parts by mass Particles shown in Table 1 or Table: 0.10. Parts by mass / pure water: 69.2 parts by mass
(実施例37)
<画像記録層(重層)の形成>
 上記実施例1~36並びに比較例1及び2と同様の支持体上に、下記下層形成用組成物(I)を、ワイヤーバーで塗布したのち、150℃の乾燥オーブンで40秒間乾燥して特定バインダーポリマーの塗布量が表3に記載の量となるように塗布し、下層を設けた後、下記組成の上層形成用塗布液組成物(I)が0.22g/mになるようワイヤーバーで塗布したのち、塗布後150℃、40秒間の乾燥を行った。下層と上層とを設け、更に、オーバーコート層を設けることで実施例37の平版印刷版原版を得た。
(Example 37)
<Formation of image recording layer (multilayer)>
The following lower layer forming composition (I) was applied onto a support similar to those in Examples 1 to 36 and Comparative Examples 1 and 2 with a wire bar, and then dried in a drying oven at 150 ° C. for 40 seconds to specify. After coating so that the coating amount of the binder polymer becomes the amount shown in Table 3 and providing the lower layer, the wire bar so that the coating liquid composition (I) for forming the upper layer having the following composition is 0.22 g / m 2. After coating, the coating was dried at 150 ° C. for 40 seconds. A lithographic printing plate precursor of Example 37 was obtained by providing a lower layer and an upper layer and further providing an overcoat layer.
〔下層形成用塗布液組成物(I)〕
・表3に記載の特定バインダーポリマー:表3に記載の量
・赤外線吸収剤(IR色素(1):上記構造):0.045部
・メガファックF-780:0.03部
・メチルエチルケトン:13.0部
・1-メトキシ-2-プロパノール:30.0部
・1-(4-メチルベンジル)-1-フェニルピペリジニウムの5-ベンゾイル-4-ヒドロキシ-2-メトキシベンゼンスルホン酸塩:0.01部
[Coating liquid composition for forming lower layer (I)]
-Specific binder polymer shown in Table 3: amount shown in Table 3-infrared absorber (IR dye (1): the above structure): 0.045 part-Megafac F-780: 0.03 part-methyl ethyl ketone: 13 0.0 parts 1-methoxy-2-propanol: 30.0 parts 1- (4-methylbenzyl) -1-phenylpiperidinium 5-benzoyl-4-hydroxy-2-methoxybenzenesulfonate: 0 .01 copy
〔上層形成用塗布液組成物(I)〕
・ノボラック樹脂(m-クレゾール/p-クレゾール/フェノール=3/2/5、重量平均分子量8,000):0.34部
・赤外線吸収剤(IR色素(1):上記構造):0.023部
・フッ素系界面活性剤(メガファックF-780、DIC(株)製):0.02部
・メチルエチルケトン:15.0部
・1-メトキシ-2-プロパノール:30.0部
・1-(4-メチルベンジル)-1-フェニルピペリジニウムの5-ベンゾイル-4- ・ヒドロキシ-2-メトキシベンゼンスルホン酸塩:0.01部
[Coating liquid composition for forming upper layer (I)]
-Novolak resin (m-cresol / p-cresol / phenol = 3/2/5, weight average molecular weight 8,000): 0.34 parts-Infrared absorber (IR dye (1): the above structure): 0.023 Parts-Fluorosurfactant (Megafuck F-780, manufactured by DIC Corporation): 0.02 parts-Methylethylketone: 15.0 parts-Methoxy-2-propanol: 30.0 parts-1- (4 -Methylbenzyl) -1-phenylpiperidinium 5-benzoyl-4-.hydroxy-2-methoxybenzenesulfonate: 0.01 part
(粒子塗布法)
 表3に記載の粒子は、下記オーバーコート層塗布液(II)に、表3に記載の面内密度となるように添加量を調製して添加した。
 画像記録層上に、下記組成のオーバーコート層塗布液(II)をバー塗布し、125℃で75秒間オーブン乾燥し、乾燥塗布量0.15g/mのオーバーコート層を形成した。
(Particle coating method)
The particles described in Table 3 were added to the following overcoat layer coating liquid (II) at an addition amount adjusted so that the in-plane density described in Table 3 was obtained.
An overcoat layer coating solution (II) having the following composition was applied onto the image recording layer by a bar and oven-dried at 125 ° C. for 75 seconds to form an overcoat layer having a dry coating amount of 0.15 g / m 2 .
〔オーバーコート層塗布液(II)〕
・ポリビニルアルコール(CKS-50(製品名)、ケン化度99モル%、重合度300、日本合成化学工業(株)製):0.29質量部
・第一工業製薬(株)セロゲン(登録商標)PR:0.12質量部
・界面活性剤-1(日本エマルジョン(株)製、エマレックス710(商品名)):0.025質量部
・表3に記載の粒子:0.10質量部
・純水:69.2質量部
[Overcoat layer coating liquid (II)]
-Polyvinyl alcohol (CKS-50 (product name), saponification degree 99 mol%, polymerization degree 300, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.): 0.29 parts by mass-Daiichi Kogyo Seiyaku Co., Ltd. Serogen (registered trademark) ) PR: 0.12 parts by mass Surfactant-1 (manufactured by Nippon Emulsion Co., Ltd., Emarex 710 (trade name)): 0.025 parts by mass Particles shown in Table 3: 0.10 parts by mass Pure water: 69.2 parts by mass
(実施例38)
 上記実施例1~36並びに比較例1及び2と同様の支持体上に、上記下層形成用組成物(I)を、ワイヤーバーで塗布したのち、150℃の乾燥オーブンで40秒間乾燥して特定バインダーポリマーの塗布量を表3に記載の量となるように塗布し、下層を設けた後、下記組成の上層形成用塗布液組成物(II)における表3に記載の粒子が、表3に記載の面内密度となるようにワイヤーバーで塗布したのち、塗布後150℃、40秒間の乾燥を行い、下層と上層とを画像記録層を設けた実施例38の平版印刷版原版を得た。
(Example 38)
The composition for forming an underlayer (I) was applied onto a support similar to those in Examples 1 to 36 and Comparative Examples 1 and 2 with a wire bar, and then dried in a drying oven at 150 ° C. for 40 seconds to specify. The coating amount of the binder polymer was applied so as to be the amount shown in Table 3, and after the lower layer was provided, the particles shown in Table 3 in the coating liquid composition (II) for forming the upper layer having the following composition are shown in Table 3. After coating with a wire bar so as to have the in-plane density as described, the coating was dried at 150 ° C. for 40 seconds to obtain a lithographic printing plate precursor of Example 38 having an image recording layer as a lower layer and an upper layer. .
〔上層形成用塗布液組成物(II)〕
 ・ノボラック樹脂(m-クレゾール/p-クレゾール/フェノール=3/2/5、重量平均分子量8,000):0.34部
 ・赤外線吸収剤(IR色素(1):上記構造):0.023部
 ・フッ素系界面活性剤(メガファックF-780、DIC(株)製):0.02部
 ・メチルエチルケトン:15.0部
 ・表3に記載の粒子:0.1質量部
 ・1-メトキシ-2-プロパノール:30.0部
 ・1-(4-メチルベンジル)-1-フェニルピペリジニウムの5-ベンゾイル-4-ヒドロキシ-2-メトキシベンゼンスルホン酸塩:0.01部
[Coating liquid composition for forming upper layer (II)]
Novolak resin (m-cresol / p-cresol / phenol = 3/2/5, weight average molecular weight 8,000): 0.34 parts Infrared absorber (IR dye (1): the above structure): 0.023 Parts-Fluorosurfactant (Megafuck F-780, manufactured by DIC Corporation): 0.02 part-Methyl ethyl ketone: 15.0 parts-Particles shown in Table 3: 0.1 parts by mass-1-Methoxy- 2-propanol: 30.0 parts 1- (4-methylbenzyl) -1-phenylpiperidinium 5-benzoyl-4-hydroxy-2-methoxybenzenesulfonate: 0.01 parts
 得られた平版印刷版原版を用いて、以下の評価を行った。結果は表1~表3に記載した。
 実施例1~38並びに比較例1及び2の平版印刷版原版において、画像記録層を有する側における最外層表面のBekk平滑度及び算術平均高さSaは、それぞれ表1~表3に示した。
The following evaluation was performed using the obtained planographic printing plate precursor. The results are shown in Tables 1 to 3.
In the lithographic printing plate precursors of Examples 1 to 38 and Comparative Examples 1 and 2, Bekk smoothness and arithmetic mean height Sa of the outermost layer surface on the side having the image recording layer are shown in Tables 1 to 3, respectively.
<平版印刷版原版の評価>
-耐傷性の評価-
 平版印刷版原版を25℃60%RHの環境下で2時間調湿後、2.5cm×2.5cmに打ち抜き、新東科学(株)製の連続加重式引掻強度試験機TYPE-18に取り付け、打ち抜いていない平版印刷版原版の表面の上に、打ち抜いた平版印刷版原版の裏面が接触するようにセットし、0gf~1,500gf(0N~14.7N)の圧力で平版印刷版原版の数箇所に擦れ傷をつけた。擦れ傷をつけた平版印刷版原版をCreo社製Trendsetter3244にセットし、解像度2,400dpi(dot per inch、1inchは2.54cm)で出力7W、外面ドラム回転数150rpm(revolutions per minute)、版面エネルギー110mJ/cmで画像露光した。画像露光後の平版印刷版原版を、(株)東京機械製作所製オフセット輪転印刷機に装着し、新聞用印刷インキとしてインクテック(株)製ソイビーKKST-S(紅)、湿し水としてサカタインクス(株)製エコセブンN-1を用い、新聞用紙に100,000枚/時のスピードで印刷した。印刷過程において、1,000枚目の印刷物をサンプリングし、擦れ傷に起因するキズ汚れの程度を目視で観察した。
 耐傷性の評価は1~5の官能評価で行い、3以上が実用上好ましいレベルである。
5:キズ汚れなし。
4:視認では確認はできないが、6倍率のルーペで確認可能なキズ汚れが1か所あり。
3:視認では確認はできないが、6倍率のルーペで確認可能なキズ汚れが数か所あり。
2:複数個所に視認で確認可能なキズ汚れあり。
1:全面にキズ汚れあり。
<Evaluation of original planographic printing plate>
-Evaluation of scratch resistance-
The lithographic printing plate precursor was conditioned at 25 ° C. and 60% RH for 2 hours, and then punched into 2.5 cm × 2.5 cm, and the continuous weighted scratch strength tester TYPE-18 manufactured by Shinto Kagaku Co., Ltd. was used. Set so that the back surface of the punched lithographic printing plate precursor is in contact with the surface of the lithographic printing plate precursor that has not been attached or punched, and the lithographic printing plate precursor is applied at a pressure of 0 gf to 1,500 gf (0N to 14.7N). I scratched several places. The lithographic printing plate precursor with scratches was set on the Trendsetter 3244 manufactured by Creo, and the output was 7 W at the resolution of 2,400 dpi (dot per inch, 1 inch was 2.54 cm), the outer surface drum rotation speed was 150 rpm (revolutions per minute), and the plate surface energy was set. Image exposure was performed at 110 mJ / cm 2 . The lithographic printing plate precursor after image exposure was mounted on an offset rotary printing machine manufactured by Tokyo Kikai Seisakusho, and Soybee KKST-S (red) manufactured by Inktec Co., Ltd. was used as printing ink for newspapers, and Sakata Inx as dampening water ( Using Eco Seven N-1 manufactured by Co., Ltd., printing was performed on newsprint paper at a speed of 100,000 sheets / hour. In the printing process, the 1,000th printed material was sampled, and the degree of scratch stains caused by scratches was visually observed.
The scratch resistance is evaluated by a sensory evaluation of 1 to 5, and 3 or more is a practically preferable level.
5: No scratch stains.
4: Although it cannot be visually confirmed, there is one scratch stain that can be confirmed with a magnifying glass of 6 magnifications.
3: Although it cannot be visually confirmed, there are several scratches that can be confirmed with a magnifying glass of 6 magnifications.
2: There are scratch stains that can be visually confirmed at multiple locations.
1: There are scratches and stains on the entire surface.
-膜抜け抑制性の評価-
 平版印刷版原版を、富士フイルム(株)製現像液XP-D(希釈して、電導度を43mS/cmとしたもの)を仕込んだ富士フイルム(株)製PS版プロセッサーLP940Hを用い、現像液温度30℃、現像時間20秒で現像を行った。現像後の平版印刷版を5.0cm×5.0cmにカットし、画像部の抜けの有無及び程度を目視により観察した。
 膜抜け抑制性の評価は、下記1~5の官能評価で行い、4以上が実用上好ましいレベルである。
5:画像部に抜けが認められなかった。
4:画像部の抜けが視認では確認はできないが、6倍率のルーペで確認可能な膜抜けが1か所確認された。
3:画像部の抜けが視認では確認はできないが、6倍率のルーペで確認可能な膜抜けが数か所認められた。
2:目視で確認可能な画像部の抜けが、複数個所に確認された。
1:目視で確認可能な画像部の抜けが、全面に認められた。
-Evaluation of membrane detachment suppression-
The planographic printing plate precursor was developed using Fuji Film Co., Ltd. PS plate processor LP940H in which developer XP-D (diluted to have an electric conductivity of 43 mS / cm) was prepared. Development was performed at a temperature of 30 ° C. and a development time of 20 seconds. The lithographic printing plate after development was cut into 5.0 cm × 5.0 cm, and the presence or absence and degree of omission of the image area were visually observed.
The evaluation of the film omission suppressing property is performed by the following sensory evaluations 1 to 5, and 4 or more is a practically preferable level.
5: No omission was observed in the image area.
4: The omission of the image area cannot be visually confirmed, but one omission of the film was confirmed with a magnifying glass of 6 magnifications.
3: Although the omission of the image area cannot be visually confirmed, several omissions of the film which were observable with a magnifying glass of 6 magnifications were observed.
2: Visually visible omission of the image area was confirmed at multiple locations.
1: Visually visible omission of the image area was observed on the entire surface.
-アブレーション抑制性の評価-
 平版印刷版原版の表面に、透明な0.1mm厚さのポリエチレンテレフタレートフイルム(富士フイルム(株)製)を密着させた状態にし、Creo社製Trendsetterにて、ドラム回転速度150rpm、ビーム強度10Wで全面露光した。
 露光後に上記ポリエチレンテレフタレートフイルムを外して目視し、表面の汚れ具合を観察した。汚れが認められなかったものを5、汚れが若干認められたものを4、フイルムを通して向こう側を透かして見えない程度まで汚れたものを3として、それぞれ判定した。
 汚れが少ないほどアブレーション抑制性に優れているといえ、評価は5又は4が好ましく、5がより好ましい。
-Ablation suppression evaluation-
A transparent polyethylene terephthalate film (manufactured by Fuji Film Co., Ltd.) having a thickness of 0.1 mm was brought into close contact with the surface of the lithographic printing plate precursor, and a drum rotating speed of 150 rpm and a beam intensity of 10 W were applied by a Creo Trendsetter. The entire surface was exposed.
After the exposure, the polyethylene terephthalate film was removed and visually inspected to observe the degree of dirt on the surface. The case where no stain was observed was 5, the case where a little stain was observed was 4, and the case where the film was contaminated to the extent that it was not visible through the film through the film was rated as 3.
It can be said that the less the dirt is, the more excellent the abrasion resistance is. Therefore, the evaluation is preferably 5 or 4, and more preferably 5.
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
 上記表1~表3において、種類に欄の記載は、使用した特定バインダーポリマー又は粒子の種類を示している。例えば、実施例15では、アートパールC-800及びアートパールJ-7PYを50:50(モル比)の割合で含み、アートパールC-800の弾性率(GPa)が0.03GPaであり粒子径(μm)が6.0μmであり、アートパールJ-7PYの弾性率(GPa)が0.55GPaであり、粒子径(μm)が6.5μmであることを示している。
 表2中、粒子の欄に「-」と記載した例については、粒子の添加を行わなかったことを示している。
 なお、粒子の詳細は以下のとおりである。
 アートパールC-800;ウレタン樹脂、根上工業(株)製
 アートパールJ-7PS;中架橋アクリル樹脂、根上工業(株)製
 トスパール2000B;シリカ、(株)タナック製
 アートパールJ-7PY;高架橋アクリル樹脂、根上工業(株)製
 オプトビーズ6500M;メラミン樹脂とシリカからなる複合球状粒子、日産化学工業(株)製
 アートパールJ-4P;中架橋アクリル樹脂、根上工業(株)製
 アートパールJ-5P;中架橋アクリル樹脂、根上工業(株)製
 アートパールJ-6P;中架橋アクリル樹脂、根上工業(株)製
 アートパールGR600;中架橋アクリル架橋(PMMA)樹脂、根上工業(株)製
 アートパールP-800T;ウレタン樹脂、根上工業(株)製
 アートパールCE-800T;ウレタン樹脂、根上工業(株)製
In Tables 1 to 3 above, the description in the type column indicates the type of the specific binder polymer or particles used. For example, in Example 15, Art Pearl C-800 and Art Pearl J-7PY were contained at a ratio of 50:50 (molar ratio), the elastic modulus (GPa) of Art Pearl C-800 was 0.03 GPa, and the particle diameter was (Μm) is 6.0 μm, the elastic modulus (GPa) of Art Pearl J-7PY is 0.55 GPa, and the particle size (μm) is 6.5 μm.
In Table 2, the examples in which "-" is written in the column of particles indicate that particles were not added.
The details of the particles are as follows.
Art Pearl C-800; Urethane resin, Negami Kogyo Co., Ltd. Art Pearl J-7PS; Medium cross-linked acrylic resin, Negami Kogyo Co., Ltd. Tospearl 2000B; Silica, Tanac Co. Art Pearl J-7PY; Highly cross-linked acrylic Resin, Negami Kogyo Co., Ltd. Optobeads 6500M; Composite spherical particles composed of melamine resin and silica, Nissan Chemical Industries, Ltd. Art Pearl J-4P; Medium cross-linked acrylic resin, Negami Kogyo Co., Ltd. Art Pearl J- 5P: Medium-crosslinked acrylic resin, manufactured by Negami Kogyo Co., Ltd. Art Pearl J-6P; Medium-crosslinked acrylic resin, manufactured by Negami Kogyo Co., Ltd. Art Pearl GR600; Medium-crosslinked acrylic crosslinked (PMMA) resin, manufactured by Negami Kogyo Co., Ltd. Art Pearl P-800T: Urethane resin, Negami Kogyo Co., Ltd. Art Pearl CE-800T: Urethane resin, Negami Product
 表1~表3に記載の結果から、本開示に係る平版印刷版原版は、合紙レスであっても、耐傷性に優れることがわかる。また、本開示に係る平版印刷版原版は、膜抜けの抑制性及びアブレーション抑制性にも優れていることがわかる。 From the results shown in Tables 1 to 3, it can be seen that the lithographic printing plate precursor according to the present disclosure has excellent scratch resistance even without interleaving paper. Further, it can be seen that the lithographic printing plate precursor according to the present disclosure is also excellent in the prevention of film omission and the ablation.
 2018年10月25日に出願された日本国特許出願第2018-200690号の開示は、その全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許出願、及び、技術規格は、個々の文献、特許出願、及び、技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2018-200690 filed on October 25, 2018 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually noted to be incorporated by reference. Are incorporated herein by reference.

Claims (15)

  1.  アルミニウム支持体上に、ポジ型画像記録層を有し、
     前記画像記録層を有する側における最外層表面のBekk平滑度が1,000秒以下であり、
     前記最外層が粒子を含み、
     前記粒子の弾性率が3.0GPa以下である、
     平版印刷版原版。
    Having a positive image recording layer on an aluminum support,
    The Bekk smoothness of the outermost layer surface on the side having the image recording layer is 1,000 seconds or less,
    The outermost layer contains particles,
    The elastic modulus of the particles is 3.0 GPa or less,
    Original planographic printing plate.
  2.  前記画像記録層を有する側における最外層表面の算術平均高さSaが、0.3μm以上20μm以下である、請求項1に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 1, wherein the arithmetic average height Sa of the outermost layer surface on the side having the image recording layer is 0.3 μm or more and 20 μm or less.
  3.  前記粒子が、アクリル樹脂粒子、シリカ粒子及びウレタン樹脂粒子よりなる群から選ばれる少なくとも1種を含む、請求項1又は請求項2に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 1 or 2, wherein the particles include at least one selected from the group consisting of acrylic resin particles, silica particles, and urethane resin particles.
  4.  前記画像記録層が、ガラス転移温度が60℃~230℃の樹脂を含む、請求項1~請求項3のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 3, wherein the image recording layer contains a resin having a glass transition temperature of 60 ° C to 230 ° C.
  5.  前記画像記録層が、アセタール樹脂、フェノール樹脂、アクリル樹脂、及び、ウレア結合、ウレタン結合又はアミド結合を主鎖に有する樹脂よりなる群から選ばれる少なくとも1つの樹脂を含む、請求項1~請求項4のいずれか1項に記載の平版印刷版原版。 The image recording layer contains at least one resin selected from the group consisting of acetal resin, phenol resin, acrylic resin, and resin having urea bond, urethane bond or amide bond in the main chain. The lithographic printing plate precursor as described in any one of 4 above.
  6.  前記画像記録層が、マレイミド構造を有するアクリル樹脂を含む、請求項5に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 5, wherein the image recording layer contains an acrylic resin having a maleimide structure.
  7.  前記画像記録層が、単層である、請求項1~請求項6のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 6, wherein the image recording layer is a single layer.
  8.  前記画像記録層が、上層及び下層からなる重層である、請求項1~請求項6のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor as claimed in any one of claims 1 to 6, wherein the image recording layer is a multilayer consisting of an upper layer and a lower layer.
  9.  前記最外層が、前記画像記録層である、請求項1~請求項8のいずれか1項に記載の平版印刷版原版。 The planographic printing plate precursor according to any one of claims 1 to 8, wherein the outermost layer is the image recording layer.
  10.  前記画像記録層上にオーバーコート層を更に有し、前記オーバーコート層が、前記最外層である、請求項1~請求項9のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 9, further comprising an overcoat layer on the image recording layer, and the overcoat layer is the outermost layer.
  11.  前記画像記録層を有する側と反対の側にバックコート層を有する、請求項1~請求項10のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 10, which has a back coat layer on the side opposite to the side having the image recording layer.
  12.  請求項1~請求項11のいずれか1項に記載の平版印刷版原版を、画像様に露光し、露光部と未露光部とを形成する工程と、
     pH13.5以下のアルカリ水溶液を用いて現像する工程と、
     を含む、
     平版印刷版の作製方法。
    A step of imagewise exposing the lithographic printing plate precursor according to any one of claims 1 to 11 to form an exposed portion and an unexposed portion;
    developing with an alkaline aqueous solution having a pH of 13.5 or less,
    including,
    Method of making a lithographic printing plate.
  13.  前記アルカリ水溶液のpHが11以下である、請求項12に記載の平版印刷版の作製方法。 The method for preparing a lithographic printing plate according to claim 12, wherein the pH of the alkaline aqueous solution is 11 or less.
  14.  請求項1~請求項11のいずれか1項に記載の平版印刷版原版を積層した、平版印刷版原版積層体。 A lithographic printing plate precursor laminate in which the lithographic printing plate precursors according to any one of claims 1 to 11 are laminated.
  15.  前記平版印刷版原版の画像記録層を有する側における最外層と、他の平版印刷版原版の画像記録層を有する側とは反対側における最外層とを、直接接触させて積層させた、請求項14に記載の平版印刷版原版積層体。 The outermost layer on the side having the image recording layer of the planographic printing plate precursor and the outermost layer on the side opposite to the side having the image recording layer of the other planographic printing plate precursor are directly contacted and laminated. 14. The lithographic printing plate precursor laminate according to 14.
PCT/JP2019/041989 2018-10-25 2019-10-25 Lithographic printing original plate, layered body of lithographic printing original plates, and method for producing lithographic printing plate WO2020085500A1 (en)

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