WO2019131097A1 - Encapsulating epoxy resin composition for ball grid array package, cured epoxy resin object, and electronic component/device - Google Patents
Encapsulating epoxy resin composition for ball grid array package, cured epoxy resin object, and electronic component/device Download PDFInfo
- Publication number
- WO2019131097A1 WO2019131097A1 PCT/JP2018/045350 JP2018045350W WO2019131097A1 WO 2019131097 A1 WO2019131097 A1 WO 2019131097A1 JP 2018045350 W JP2018045350 W JP 2018045350W WO 2019131097 A1 WO2019131097 A1 WO 2019131097A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- epoxy resin
- particles
- resin composition
- volume
- mass
- Prior art date
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 260
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 260
- 239000000203 mixture Substances 0.000 title claims abstract description 142
- 239000002245 particle Substances 0.000 claims abstract description 220
- 239000011256 inorganic filler Substances 0.000 claims abstract description 103
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 103
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 78
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 65
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000004014 plasticizer Substances 0.000 claims abstract description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 62
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 34
- 238000007789 sealing Methods 0.000 claims description 31
- 239000005011 phenolic resin Substances 0.000 claims description 28
- 238000009826 distribution Methods 0.000 claims description 27
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 24
- 235000010290 biphenyl Nutrition 0.000 claims description 17
- 239000004305 biphenyl Substances 0.000 claims description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 6
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 claims description 6
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 5
- 229920001568 phenolic resin Polymers 0.000 claims description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 10
- 239000004848 polyfunctional curative Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 30
- -1 bisphenol F compound Chemical class 0.000 description 23
- 239000003960 organic solvent Substances 0.000 description 20
- 229930185605 Bisphenol Natural products 0.000 description 17
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 17
- 150000001450 anions Chemical class 0.000 description 15
- 239000003063 flame retardant Substances 0.000 description 12
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 11
- 238000002844 melting Methods 0.000 description 11
- 230000008018 melting Effects 0.000 description 11
- 239000007822 coupling agent Substances 0.000 description 10
- 150000002903 organophosphorus compounds Chemical class 0.000 description 10
- 229920000098 polyolefin Polymers 0.000 description 10
- 239000001993 wax Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 230000007423 decrease Effects 0.000 description 9
- 230000001965 increasing effect Effects 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000009835 boiling Methods 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000003086 colorant Substances 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 239000011777 magnesium Substances 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000945 filler Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000000113 differential scanning calorimetry Methods 0.000 description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000001721 transfer moulding Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 229910001701 hydrotalcite Inorganic materials 0.000 description 4
- 229960001545 hydrotalcite Drugs 0.000 description 4
- 238000004898 kneading Methods 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000006082 mold release agent Substances 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- URLKBWYHVLBVBO-UHFFFAOYSA-N p-dimethylbenzene Natural products CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- AZZWZMUXHALBCQ-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)methyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(CC=2C=C(C)C(O)=C(C)C=2)=C1 AZZWZMUXHALBCQ-UHFFFAOYSA-N 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000004203 carnauba wax Substances 0.000 description 2
- 235000013869 carnauba wax Nutrition 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 235000013872 montan acid ester Nutrition 0.000 description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 2
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- HRSLYNJTMYIRHM-UHFFFAOYSA-N 2-[[4-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]-2,6-dimethylphenoxy]methyl]oxirane Chemical group CC1=CC(C=2C=C(C)C(OCC3OC3)=C(C)C=2)=CC(C)=C1OCC1CO1 HRSLYNJTMYIRHM-UHFFFAOYSA-N 0.000 description 1
- OZRVXYJWUUMVOW-UHFFFAOYSA-N 2-[[4-[4-(oxiran-2-ylmethoxy)phenyl]phenoxy]methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1C(C=C1)=CC=C1OCC1CO1 OZRVXYJWUUMVOW-UHFFFAOYSA-N 0.000 description 1
- ZPQAUEDTKNBRNG-UHFFFAOYSA-N 2-methylprop-2-enoylsilicon Chemical compound CC(=C)C([Si])=O ZPQAUEDTKNBRNG-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101100294331 Drosophila melanogaster nod gene Proteins 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000004054 acenaphthylenyl group Chemical group C1(=CC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- HXGDTGSAIMULJN-UHFFFAOYSA-N acetnaphthylene Natural products C1=CC(C=C2)=C3C2=CC=CC3=C1 HXGDTGSAIMULJN-UHFFFAOYSA-N 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical class [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- CRGRWBQSZSQVIE-UHFFFAOYSA-N diazomethylbenzene Chemical compound [N-]=[N+]=CC1=CC=CC=C1 CRGRWBQSZSQVIE-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004206 montan acid ester Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- GLTDLAUASUFHNK-UHFFFAOYSA-N n-silylaniline Chemical compound [SiH3]NC1=CC=CC=C1 GLTDLAUASUFHNK-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- RQAGEUFKLGHJPA-UHFFFAOYSA-N prop-2-enoylsilicon Chemical compound [Si]C(=O)C=C RQAGEUFKLGHJPA-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- QLAGHGSFXJZWKY-UHFFFAOYSA-N triphenylborane;triphenylphosphane Chemical compound C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QLAGHGSFXJZWKY-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2227—Oxides; Hydroxides of metals of aluminium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
Definitions
- the present disclosure relates to an epoxy resin composition for sealing a ball grid array package, an epoxy resin cured product, and an electronic component device.
- semiconductor packages in place of the conventional pin insertion type, are mainly of the surface mounting type suitable for high density mounting.
- the surface mount semiconductor package is mounted by direct soldering to a printed circuit board or the like.
- As a general mounting method there is a method of heating and mounting the whole semiconductor package by an infrared ray reflow method, a vapor phase reflow method, a solder dip method or the like.
- BGA ball grid array
- the BGA package is a single-sided resin-sealed package in which the semiconductor element mounting surface of the substrate is sealed with a resin composition.
- a resin composition for sealing an epoxy resin composition is widely used from the viewpoint of the balance of various properties such as moldability, electrical properties, moisture resistance, heat resistance, mechanical properties, adhesion to an insert, etc. There is.
- Patent 4188634 gazette
- Patent Document 1 a small amount of fine particle silica is mixed with an alumina filler, and a specific biphenyl-type epoxy resin having a relatively low viscosity is used to achieve high filling of the filler.
- the method of Patent Document 1 has a problem in achieving both thermal conductivity and fluidity.
- the present disclosure provides an epoxy resin composition for sealing a BGA package which is excellent in fluidity and excellent in thermal conductivity when cured, an epoxy resin cured product obtained by curing the epoxy resin composition, and the epoxy resin cured. It is an object of the present invention to provide an electronic component device including an element sealed by an object.
- Means for solving the above problems include the following embodiments.
- An epoxy resin containing a bisphenol F type epoxy resin, a curing agent, alumina particles, or silica particles are not contained, or alumina particles are further contained, and the silica particles are 0 mass to the total amount of alumina particles and silica particles
- An epoxy resin composition for sealing a ball grid array package comprising: an inorganic filler containing more than 15% by mass and a plasticizer; and the content of the inorganic filler is 75% by volume to 84% by volume.
- the inorganic filler contains alumina particles, does not contain silica particles, or contains alumina particles and further contains silica particles in an amount of more than 0% by mass and 10% by mass or less based on the total amount of alumina particles and silica particles ⁇
- ⁇ 5> The epoxy resin for sealing a ball grid array package according to any one of ⁇ 1> to ⁇ 4>, wherein the curing agent contains a phenol resin having three or more phenolic hydroxyl groups in one molecule. Composition.
- ⁇ 6> The epoxy resin composition for sealing a ball grid array package according to any one of ⁇ 1> to ⁇ 5>, wherein the curing agent contains a triphenylmethane type phenol resin.
- ⁇ 7> The epoxy resin composition for sealing a ball grid array package according to any one of ⁇ 1> to ⁇ 6>, wherein the porosity of the inorganic filler is 18 volume% or less.
- the ratio of particles having a particle diameter of 1 ⁇ m or less is 9 volume% or more, and the ratio of particles having a particle diameter of more than 1 ⁇ m to 10 ⁇ m is 45 volume% or less Any one of ⁇ 1> to ⁇ 7>, wherein the proportion of particles having a particle size of more than 10 ⁇ m and 30 ⁇ m or less is 20% by volume or more and the proportion of particles having a particle size of more than 30 ⁇ m is 18% by volume or more
- the epoxy resin composition for ball grid array package sealing as described in a term.
- the proportion of particles having a particle size of 1 ⁇ m or less is 11 vol% or more, and the proportion of particles having a particle size of more than 1 ⁇ m and 10 ⁇ m or less is 40 vol% or less Yes, the percentage of particles having a particle size of more than 10 ⁇ m and 30 ⁇ m or less is 22 vol% or more, and the percentage of particles having a particle size of more than 30 ⁇ m is 20 vol% or more.
- Epoxy resin composition. ⁇ 10> A cured epoxy resin product obtained by curing the epoxy resin composition for sealing a ball grid array package according to any one of ⁇ 1> to ⁇ 9>.
- the electronic component apparatus which has ⁇ 11> element and the epoxy resin hardened material as described in ⁇ 10> which has sealed the said element, and has a form of a ball grid array package.
- an epoxy resin composition for sealing a BGA package which is excellent in fluidity and excellent in thermal conductivity when cured, an epoxy resin cured product obtained by curing the epoxy resin composition, and the epoxy resin cured
- An electronic component device comprising an element sealed by an object is provided.
- the term “step” includes, in addition to steps independent of other steps, such steps as long as the purpose of the step is achieved even if it can not be clearly distinguished from other steps.
- numerical values described before and after “to” are included in the numerical range indicated using “to” as the minimum value and the maximum value, respectively.
- the upper limit value or the lower limit value described in one numerical value range may be replaced with the upper limit value or the lower limit value of the other stepwise description numerical value range in the numerical value range described stepwise in the present disclosure.
- the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the example.
- each component may contain a plurality of corresponding substances.
- the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified.
- particles corresponding to each component may contain a plurality of types.
- the particle diameter of each component means the value for the mixture of the plurality of particles present in the composition unless otherwise specified.
- Epoxy resin composition for sealing BGA package contains an epoxy resin containing a bisphenol F-type epoxy resin, a curing agent, and alumina particles and does not contain silica particles And an inorganic filler containing alumina particles and further containing 0% by mass or more and 15% by mass or less of silica particles based on the total amount of the alumina particles and the silica particles, and a plasticizer, and the content of the inorganic filler is It is 75% by volume to 84% by volume.
- the epoxy resin composition of the present disclosure is excellent in fluidity and excellent in thermal conductivity when cured. Although the reason is not clear, it can be considered as follows. Generally, high thermal conductivity can be obtained by increasing the loading of alumina particles in the epoxy resin composition. However, with the high packing of alumina particles, the flowability of the composition decreases, which causes wire flow and the like. On the other hand, it is considered that the epoxy resin composition of the present disclosure can easily maintain fluidity by containing a bisphenol F-type epoxy resin and a plasticizer, even when containing a high proportion of alumina particles in the composition. . Furthermore, it is considered that this makes it possible to further improve the thermal conductivity when hardened by making the inorganic filler more highly filled.
- the epoxy resin composition of the present disclosure is used to seal a BGA package.
- the BGA package refers to a semiconductor package in which a plurality of metal bumps are arranged in a lattice on the substrate of the package.
- the BGA package is manufactured by mounting an element on the front surface of a substrate having a metal bump formed on the back surface, connecting the element and a wiring formed on the substrate by bump or wire bonding, and sealing the element.
- a CSP Chip Size Package
- a CSP Chip Size Package
- the outer diameter size is reduced to the same size as the element size is also a form of the BGA package.
- the epoxy resin composition of the present disclosure contains an epoxy resin containing a bisphenol F-type epoxy resin.
- the epoxy resin composition may contain an epoxy resin other than bisphenol F-type epoxy resin.
- a bisphenol F-type epoxy resin refers to a diglycidyl ether of substituted or unsubstituted bisphenol F.
- the bisphenol F-type epoxy resin may be used singly or in combination of two or more.
- R1 to R8 each represent a hydrogen atom or a substituted or unsubstituted monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- n is an average value and represents a number of 0 to 10.
- the bisphenol F-type epoxy resin represented by the above general formula (I) can be obtained by reacting a bisphenol F compound with epichlorohydrin by a known method.
- an alkyl group having 1 to 18 carbon atoms such as hydrogen atom, methyl group, ethyl group, propyl group, butyl group, isopropyl group, isobutyl group, t-butyl group, etc., vinyl Groups, alkenyl groups having 1 to 18 carbon atoms such as allyl group and butenyl group, and aryl groups, and the like, and hydrogen atom or methyl group is preferable.
- n is an average value, represents a number of 0 to 10, and is preferably a number of 0 to 4.
- n 10 or less, the melt viscosity of the resin component does not become too high, the viscosity at the time of melt molding of the epoxy resin composition decreases, filling failure, deformation of bonding wire (gold wire connecting element and lead), etc. The tendency is to suppress the occurrence of
- a bisphenol F-type epoxy resin for example, an epoxy resin having a diglycidyl ether of 4,4′-methylenebis (2,6-dimethylphenol) as a main component, 4,4′-methylenebis (2,3,6-trimethyl
- the epoxy resin which has diglycidyl ether of phenol) as a main component, the epoxy resin which has diglycidyl ether of 4,4'- methylene bisphenol as a main component, etc. are mentioned. Among them, epoxy resins based on diglycidyl ether of 4,4'-methylenebis (2,6-dimethylphenol) are preferred.
- YSLV-80XY Nippon Sumikin Sumikin Chemical Co., Ltd. brand name
- the content of the bisphenol F-type epoxy resin is not particularly limited, and is preferably 10% by mass or more, more preferably 20% by mass or more, and still more preferably 25% by mass or more in the total amount of the epoxy resin.
- the content of the bisphenol F-type epoxy resin may be 100% by mass or less, 75% by mass or less, or 50% by mass or less.
- the epoxy equivalent of the bisphenol F-type epoxy resin is not particularly limited. From the viewpoint of the balance of various properties such as moldability, reflow resistance and electrical reliability, the epoxy equivalent of the bisphenol F-type epoxy resin is preferably 100 g / eq to 1000 g / eq, and 150 g / eq to 500 g / eq. It is more preferable that it is eq. Let the epoxy equivalent of an epoxy resin be a value measured by the method according to JISK7236: 2009. The same applies to the following.
- the bisphenol F-type epoxy resin When the bisphenol F-type epoxy resin is solid, its softening point or melting point is not particularly limited.
- the softening point or melting point of the bisphenol F-type epoxy resin is preferably 40 ° C. to 180 ° C. from the viewpoint of moldability and reflow resistance, and 50 ° C. from the viewpoint of handleability in preparation of the epoxy resin composition. It is more preferable that the temperature is ⁇ 130 ° C.
- the melting point of the epoxy resin is a value measured by differential scanning calorimetry (DSC), and the softening point of the epoxy resin is a value measured by a method (ring and ball method) according to JIS K 7234: 1986. The same applies to the following.
- the epoxy resin composition may contain a biphenyl type epoxy resin in addition to the bisphenol F type epoxy resin.
- the biphenyl type epoxy resin is not particularly limited as long as it is an epoxy resin having a biphenyl skeleton.
- the epoxy resin etc. which are shown by following General formula (II) are mentioned.
- R1 to R8 each represent a hydrogen atom or a substituted or unsubstituted monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- n is an average value and represents a number of 0 to 10.
- the biphenyl type epoxy resin represented by the above general formula (II) can be obtained by reacting a biphenol compound with epichlorohydrin by a known method.
- an alkyl group having 1 to 18 carbon atoms such as hydrogen atom, methyl group, ethyl group, propyl group, butyl group, isopropyl group, isobutyl group or t-butyl group, vinyl Groups, alkenyl groups having 1 to 18 carbon atoms such as allyl group and butenyl group, and aryl groups, and the like, and hydrogen atom or methyl group is preferable.
- n is an average value, represents a number of 0 to 10, and preferably a number of 0 to 4.
- biphenyl type epoxy resin for example, 4,4′-bis (2,3-epoxypropoxy) biphenyl or 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′- It is obtained by reacting an epoxy resin containing tetramethylbiphenyl as a main component, epichlorohydrin with 4,4'-biphenol or 4,4 '-(3,3', 5,5'-tetramethyl) biphenol. An epoxy resin etc. are mentioned. Among them, epoxy resins containing 4,4'-bis (2,3-epoxypropoxy) -3,3 ', 5,5'-tetramethylbiphenyl as a main component are preferable.
- the biphenyl type epoxy resin commercially available products such as YX-4000 (Mitsubishi Chemical Co., Ltd., trade name), YL-6121H (Mitsubishi Chemical Co., Ltd., trade name), and the like are available.
- the content of the biphenyl type epoxy resin is not particularly limited, and is preferably 20% by mass or more, more preferably 30% by mass or more, based on the total amount of the epoxy resin. It is further preferable that the content is at least% by mass.
- the content of the biphenyl type epoxy resin may be less than 100% by mass, may be 90% by mass or less, may be 80% by mass or less, and may be 10% by mass or less.
- the epoxy equivalent of the biphenyl type epoxy resin is not particularly limited.
- the epoxy equivalent of the biphenyl type epoxy resin is preferably 100 g / eq to 1000 g / eq, and preferably 150 g / eq to 500 g / eq, from the viewpoint of the balance of various properties such as moldability, reflow resistance and electrical reliability. It is more preferable that
- the softening point or melting point of the epoxy resin is preferably 40 ° C. to 180 ° C. from the viewpoint of moldability and reflow resistance, and 50 ° C. to 130 ° C. from the viewpoint of handleability in preparation of the epoxy resin composition. It is more preferable that
- the epoxy resin composition may contain an epoxy resin other than bisphenol F-type epoxy resin and biphenyl type epoxy resin (also referred to as "other epoxy resin”).
- the “other epoxy resin” is not particularly limited, and is preferably an epoxy resin having two or more epoxy groups in one molecule.
- an epoxy resin having two or more epoxy groups in one molecule stilbene type epoxy resin, sulfur atom containing epoxy resin, dicyclopentadiene type epoxy resin, naphthalene type epoxy resin, salicylaldehyde type epoxy resin, naphthols and phenol And epoxy resins of the copolymerization type, aralkyl type epoxy resins, diphenylmethane type epoxy resins (excluding bisphenol F type epoxy resins), and triphenylmethane type epoxy resins.
- the “other epoxy resins” may be used alone or in combination of two or more.
- the content of the “other epoxy resin” is not particularly limited, and is preferably 30% by mass or less, more preferably 20% by mass or less, and 10% by mass or less based on the total amount of the epoxy resin. More preferably, it is particularly preferably 5% by mass or less.
- the epoxy equivalent of "other epoxy resin” is not particularly limited. From the viewpoint of balance of various properties such as moldability, reflow resistance and electrical reliability, the epoxy equivalent of “other epoxy resin” is preferably 100 g / eq to 1000 g / eq, 150 g / eq to 500 g More preferably, it is / eq.
- the “other epoxy resin” When the “other epoxy resin” is solid, its softening point or melting point is not particularly limited.
- the softening point or melting point of the “other epoxy resin” is preferably 40 ° C. to 180 ° C. from the viewpoint of moldability and reflow resistance, and it is 50 from the viewpoint of handleability in preparation of the epoxy resin composition. It is more preferable that the temperature be in the range of ° C to 130 ° C.
- the total content of the epoxy resin in the epoxy resin composition is preferably 0.5% by mass to 50% by mass, and more preferably 2% by mass to 30% by mass, in view of strength, fluidity, heat resistance, moldability, etc. It is more preferable that
- the epoxy resin preferably contains an epoxy resin having two or more epoxy groups in one molecule, and may contain an epoxy resin (also referred to as a multifunctional epoxy resin) having three or more epoxy groups in one molecule. .
- the content of the polyfunctional epoxy resin relative to the total mass of the epoxy resin is 10 mass from the viewpoint of controlling the warp of the package during mounting. % Or less is preferable, 5% by mass or less is more preferable, 1% by mass or less is still more preferable, and substantially 0% by mass is particularly preferable.
- the “substantially 0 mass%” content refers to the content of the polyfunctional epoxy resin to such an extent that the influence on the warp of the package at the time of mounting is not observed.
- the epoxy resin composition of the present disclosure contains a curing agent.
- the curing agent is not particularly limited as long as it can react with the epoxy resin.
- the curing agent is preferably a compound having two or more phenolic hydroxyl groups in one molecule (hereinafter also referred to as a phenol curing agent).
- the phenol curing agent may be a low molecular weight phenolic compound or a phenolic resin obtained by polymerizing a low molecular weight phenolic compound.
- the phenol curing agent is preferably a phenol resin.
- the curing agent may be used alone or in combination of two or more.
- the phenol curing agent preferably contains a phenol resin having two or more phenolic hydroxyl groups in one molecule, and a phenol resin (also referred to as a polyfunctional phenol resin) having three or more phenolic hydroxyl groups in one molecule. It is more preferable to include.
- the phenol resin is not particularly limited, and is not particularly limited, and biphenylene type phenol resin, aralkyl type phenol resin, dicyclopentadiene type phenol resin, copolymer resin of benzaldehyde type phenol resin and aralkyl type phenol resin, paraxylene modified phenol resin, triphenyl Methane type phenol resin etc. are mentioned. Among them, triphenylmethane-type phenol resin is preferable from the viewpoint of moldability. From the viewpoint of fluidity, para-xylene modified phenolic resin is preferred.
- the paraxylene-modified phenolic resin is not particularly limited as long as it is a phenolic resin obtained using a compound having a paraxylene skeleton as a raw material.
- phenol resins represented by the following general formula (XV), XL-225 (Mitsui Chemical Co., Ltd., trade name), XLC (Mitsui Chemical Co., Ltd., trade name), MEH-7800 (Meiwa Kasei Co., Ltd., trade name) Etc. are commercially available.
- R 30 represents a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different. Each i independently represents an integer of 0 to 3. n is an average value and is a number of 0 to 10. In the formula (XV), hydrogen atoms present on the aromatic ring are not shown.
- the triphenylmethane-type phenol resin is not particularly limited as long as it is a phenol resin obtained using a compound having a triphenylmethane skeleton as a raw material.
- a phenol resin represented by the following general formula (XVI) is preferable.
- phenol resins represented by the following general formula (XVI), MEH-7500 (Meiwa Kasei Co., Ltd., trade name) or the like in which i is 0 and k is 0 is commercially available.
- the hydroxyl equivalent of the curing agent is not particularly limited, and is preferably 500 g / eq or less, more preferably 400 g / eq or less, and still more preferably 300 g / eq or less.
- the lower limit of the hydroxyl equivalent of the curing agent is preferably 50 g / eq or more, more preferably 60 g / eq or more, and still more preferably 70 g / eq or more.
- the range of the hydroxyl equivalent of the curing agent is preferably 50 g / eq to 500 g / eq, more preferably 50 g / eq to 400 g / eq, and still more preferably 50 g / eq to 300 g / eq.
- the curing agent preferably contains a phenol curing agent having a hydroxyl equivalent of 150 g / eq or less (hereinafter, also referred to as “specific phenol curing agent”).
- specific phenol curing agent a phenol curing agent having a hydroxyl equivalent of 150 g / eq or less
- the curing agent contains a specific phenol curing agent
- the reduction in formability tends to be suppressed even in the case of containing an inorganic filler containing alumina particles. This is considered to be due to the increase in the crosslink density upon curing and the improvement of the curability.
- the curing agent contains a specific phenol curing agent, the thermal conductivity of the cured product tends to be further improved.
- the hydroxyl equivalent of the specific phenol curing agent is preferably 50 g / eq to 150 g / eq, more preferably 50 g / eq to 120 g / eq, still more preferably 60 g / eq to 110 eq, and 70 g / eq. Particularly preferred is eq ⁇ 110 g / eq.
- the hydroxyl equivalent of the phenol curing agent is a value measured by a method according to JIS K 0070: 1992.
- the phenol curing agent When the phenol curing agent is solid, its melting point or softening point is not particularly limited.
- the melting point or softening point of the phenol curing agent is preferably 50 ° C. to 250 ° C., more preferably 65 ° C. to 200 ° C., and still more preferably 80 ° C. to 170 ° C.
- the melting point or softening point of the phenol curing agent is a value measured in the same manner as the melting point or softening point of the epoxy resin.
- the content ratio of the epoxy resin to the curing agent is the ratio of the number of equivalents of the functional group of the curing agent to the number of equivalents of the epoxy group of the epoxy resin (the number of equivalents of the functional group of the curing agent / the equivalent of the epoxy group Is preferably set to be in the range of 0.5 to 2.0, more preferably set to be 0.7 to 1.5, and more preferably 0.8 to 1.3. It is further preferable to set to be When the ratio is 0.5 or more, curing of the epoxy resin is sufficient, and the heat resistance, moisture resistance, and electrical characteristics of the cured product tend to be excellent. In addition, when the ratio is 2.0 or less, the amount of the functional group of the curing agent remaining in the cured resin is suppressed, and the electrical characteristics and the moisture resistance tend to be excellent.
- the epoxy resin composition of the present disclosure contains alumina particles, does not contain silica particles, or contains alumina particles and further contains silica particles in an amount of more than 0% by mass and 15% by mass or less based on the total amount of alumina particles and silica particles. Contains wood.
- the content of the inorganic filler is 75% by volume to 84% by volume based on the total volume of the composition.
- the inorganic filler may contain an inorganic filler other than alumina particles and silica particles, may contain only alumina particles and silica particles, or may contain only alumina particles. Spherical silica, crystalline silica, etc. are mentioned as a silica particle.
- the particle size distribution of the inorganic filler preferably has a maximum value in the range of 0.1 ⁇ m to 80 ⁇ m.
- the average particle diameter of the alumina particles is, for example, preferably 0.1 ⁇ m to 80 ⁇ m, and more preferably 0.3 ⁇ m to 50 ⁇ m.
- the average particle size of the alumina particles is 0.1 ⁇ m or more, the increase in viscosity of the epoxy resin composition tends to be easily suppressed.
- the average particle size of the alumina particles is 80 ⁇ m or less, the mixing property of the epoxy resin composition and the alumina particles is improved, and the state of the package obtained by curing tends to be more homogeneous to suppress the dispersion of characteristics. Furthermore, the filling property in a narrow area tends to be improved.
- the average particle diameter of the alumina particles is preferably 1 ⁇ m to 50 ⁇ m, and more preferably 2 ⁇ m to 30 ⁇ m.
- the heat conductivity tends to be excellent. It is considered that this is because a heat conduction path is easily formed.
- the average particle diameter of the silica particles is, for example, preferably 0.1 ⁇ m to 50 ⁇ m, more preferably 0.3 ⁇ m to 30 ⁇ m, and more preferably 0.5 ⁇ m to 20 ⁇ m. It is further preferred that Among them, when the average particle diameter of the silica particles is 10 ⁇ m or more, the warp of the package when cured tends to be suppressed. When the average particle size of the silica particles is 50 ⁇ m or less, the flowability tends to be improved.
- the average particle size of the inorganic filler is measured using a dry particle size distribution analyzer, or using a wet particle size distribution measuring apparatus in the state of a slurry in which the inorganic filler is dispersed in water or an organic solvent. It can measure. In particular, when particles of 1 ⁇ m or less are contained, measurement is preferably performed using a wet particle size distribution analyzer. Specifically, a water slurry in which the concentration of the inorganic filler is adjusted to about 0.01% by mass is treated with a bath type ultrasonic cleaner for 5 minutes, and a laser diffraction type particle size measuring apparatus (LA-960, HORIBA, Ltd. It can be determined from the average value of all particles detected using In the present disclosure, the average particle size refers to the particle size (D50) at which the accumulation from the small diameter side is 50% in the volume-based particle size distribution.
- alumina particles having an average particle diameter of 1 ⁇ m or more and alumina particles having an average particle diameter of less than 1 ⁇ m in combination it is preferable to use alumina particles having an average particle diameter of 1 ⁇ m to 50 ⁇ m in combination with alumina particles having an average particle diameter of 0.1 ⁇ m to less than 1 ⁇ m, and alumina particles having an average particle diameter of 5 ⁇ m to 50 ⁇ m and an average particle diameter of 0.
- alumina particles of 1 ⁇ m or more and less than 1 ⁇ m More preferably, it is used in combination with alumina particles of 1 ⁇ m or more and less than 1 ⁇ m, and it is more preferable to use alumina particles with an average particle diameter of 5 ⁇ m to 30 ⁇ m and alumina particles with an average particle diameter of 0.3 ⁇ m or more and less than 1 ⁇ m. preferable.
- the inorganic filler further contains a silica particle, it is preferable to use a combination of silica particles having an average particle diameter of 1 ⁇ m or less from the viewpoint of fluidity.
- silica particles having an average particle diameter of 0.1 ⁇ m to 1 ⁇ m more preferably a combination of silica particles having an average particle diameter of 0.2 ⁇ m to 1 ⁇ m, and an average particle diameter of 0.3 ⁇ m It is more preferable to use silica particles of 1 to 1 ⁇ m in combination.
- the inclusion of the inorganic filler in which the epoxy resin composition is combined as described above can be confirmed, for example, by determining the volume-based particle size distribution (frequency distribution) of the inorganic filler.
- the mixing ratio when alumina particles having an average particle size of 1 ⁇ m or more and alumina particles having an average particle size of less than 1 ⁇ m are used in combination.
- the proportion of alumina particles having an average particle diameter of 1 ⁇ m or less is preferably 5 to 20% by mass with respect to the total amount of alumina particles, and is preferably 10 to 15% by mass. It is more preferable to do.
- the particle shape of the inorganic filler is preferably spherical, and the particle size distribution of the inorganic filler is preferably widely distributed.
- 70% by mass or more of the inorganic filler be spherical particles, and the particle diameter of the spherical particles be distributed in a wide range of 0.1 ⁇ m to 80 ⁇ m.
- Such an inorganic filler easily forms a close-packed structure by mixing particles having different sizes, and therefore, even if the content of the inorganic filler is increased, the increase in viscosity of the epoxy resin composition is suppressed. It tends to be able to obtain the epoxy resin composition which is excellent in fluidity.
- the content of the inorganic filler is 75% by volume to 84% by volume with respect to the total volume of the composition, and 76% by volume to 84% by volume from the viewpoint of the balance of characteristics such as thermal conductivity and flowability. Is preferable, and 77% by volume to 83% by volume is more preferable.
- the content of the inorganic filler is preferably 90% by mass to 96% by mass, based on the total mass of the composition, from 91% by mass to the total mass of the composition, from the viewpoint of property balance such as thermal conductivity and fluidity. It is more preferably 95% by mass, and still more preferably 92% by mass to 94% by mass.
- the inorganic filler contains alumina particles and does not contain silica particles, or contains alumina particles and further contains silica particles in an amount of more than 0% by mass and 15% by mass or less based on the total amount of alumina particles and silica particles. From the viewpoint of thermal conductivity and flowability, the inorganic filler contains alumina particles or contains no silica particles, or contains alumina particles, and further contains silica particles in an amount of more than 0% by mass to 10% by mass relative to the total amount of alumina particles and silica particles. It is preferable to contain% or less.
- the inorganic filler may contain alumina particles and no silica particles, or may contain alumina particles and further contain silica particles in an amount of more than 0% by mass and 5% by mass or less based on the total amount of alumina particles and silica particles.
- the inorganic filler may contain alumina particles and further contain 5 to 10% by mass of silica particles based on the total amount of the alumina particles and the silica particles.
- the use of silica particles in combination with alumina particles tends to improve the flowability. Although the reason for this is not clear, it is presumed that the contact area between the alumina particles is reduced and the friction between the alumina particles is reduced.
- the inorganic filler other than the alumina particles and the silica particles is not particularly limited, and glass, calcium carbonate, zirconium silicate, magnesium oxide, calcium silicate, silicon nitride, aluminum nitride, boron nitride, silicon carbide, industrial diamond, Particles of inorganic substances such as beryllia, zirconia, zircon, forsterite, steatite, spinel, mullite, titania, talc, clay and mica, beads obtained by spheroidizing these particles, and the like can be mentioned.
- inorganic fillers having a flame retardant effect may be used.
- Examples of the inorganic filler having a flame retardant effect include particles of a composite metal hydroxide such as aluminum hydroxide, magnesium hydroxide, a composite hydroxide of magnesium and zinc, zinc borate and the like.
- the inorganic particles other than the alumina particles and the silica particles may be used alone or in combination of two or more.
- the content of the inorganic filler other than the alumina particles and the silica particles is preferably 20% by volume or less, more preferably 10% by volume or less, and 5% by volume or less based on the total volume of the inorganic filler. Is more preferable, and 2% by volume or less is particularly preferable.
- the porosity of the inorganic filler is not particularly limited, and is preferably 18% by volume or less, more preferably 16% by volume or less, still more preferably 15% by volume or less, and 14% by volume or less Is particularly preferred.
- the porosity of the inorganic filler may be 7% by volume or more.
- the porosity of the inorganic filler means the porosity of one type of inorganic filler, and in the case of two or more types of inorganic fillers, the porosity of the inorganic filler Means a porosity for a mixture of two or more inorganic fillers.
- the porosity of an inorganic filler says the value measured by the following method.
- the epoxy resin composition is placed in a crucible and left at 800 ° C. for 4 hours to incinerate.
- the particle size distribution of the obtained ash content is measured by applying the refractive index of alumina using a laser diffraction type particle size distribution analyzer (for example, LA 920 manufactured by Horiba, Ltd.).
- the void ratio ⁇ is calculated from the particle size distribution using the following equation of Ouchiyama.
- the details of Ouchiyama's formula are described in the following documents. N. Ouchiyama and T. Tanaka, Ind. Eng. Chem. Fundam. , 19, 338 (1980) N. Ouchiyama and T. Tanaka, Ind. Eng. Chem. Fundam. , 20, 66 (1981) N. Ouchiyama and T. Tanaka, Ind. Eng. Chem. Fundam. , 23, 490 (1984)
- the composition tends to be excellent in curability, flowability and moldability, and excellent in thermal conductivity when it is a cured product.
- the ratio of particles having a particle diameter of 1 ⁇ m or less is 11 volume% or more, and the ratio of particles having a particle size of more than 1 ⁇ m to 10 ⁇ m is 40 volume% or less.
- the proportion of particles having a diameter of more than 10 ⁇ m and 30 ⁇ m or less is preferably 22% by volume or more, and the proportion of particles having a particle size of more than 30 ⁇ m is more preferably 20% by volume or more.
- the ratio of particles having a particle diameter of 1 ⁇ m or less is 12 volume% or more, and the ratio of particles having a particle size of more than 1 ⁇ m to 10 ⁇ m is 30 volume% or less It is more preferable that the proportion of particles having a diameter of more than 10 ⁇ m and 30 ⁇ m or less is 24% by volume or more, and the proportion of particles having a particle size of more than 30 ⁇ m is 30% by volume or more.
- the volume-based particle size distribution of the inorganic filler can be measured by the following method.
- the inorganic filler to be measured is added to the solvent (pure water) in the range of 1% by mass to 5% by mass together with 1% by mass to 8% by mass of the surfactant, and 30 seconds to 5 seconds by a 110 W ultrasonic cleaner. Vibrate for a minute to disperse the inorganic filler. About 3 mL of the dispersion is injected into the measuring cell and measured at 25 ° C.
- the measuring apparatus measures the particle size distribution based on volume using a laser diffraction type particle size distribution analyzer (for example, LA920, manufactured by Horiba, Ltd.).
- the method for adjusting the particle size distribution of the inorganic filler is not particularly limited.
- a small particle size inorganic filler having an average particle size of about 0.5 ⁇ m a medium particle size inorganic filler having an average particle size of about 2 ⁇ m, and a large particle size inorganic filler having an average particle size of about 45 ⁇ m
- the inorganic filler which exhibits the volume-based particle size distribution exemplified above is not particularly limited.
- a small particle size inorganic filler having an average particle size of about 0.5 ⁇ m a medium particle size inorganic filler having an average particle size of about 2 ⁇ m, and a large particle size inorganic filler having an average particle size of about 45 ⁇ m
- the inorganic filler which exhibits the volume-based particle size distribution exemplified above.
- the content of the plasticizer is preferably 0.001% by mass to 30% by mass, more preferably 5% by mass to 20% by mass, and 5% by mass to 15% by mass with respect to the epoxy resin. Is more preferred.
- the plasticizer may be used alone or in combination of two or more.
- the epoxy resin composition of the present disclosure may optionally contain a curing accelerator.
- a hardening accelerator what is generally used for the epoxy resin composition for sealing can be selected suitably, and can be used.
- the curing accelerator include organic phosphorus compounds, imidazole compounds, tertiary amines, and quaternary ammonium salts. Among them, organic phosphorus compounds are preferable.
- the curing accelerator may be used alone or in combination of two or more.
- Organic phosphorus compounds such as organic phosphines such as tributyl phosphine, phenyl phosphine, diphenyl phosphine, triphenyl phosphine, methyl diphenyl phosphine, triparatolyl phosphine and the like, and phosphines such as maleic anhydride, benzoquinone, diazophenyl methane and the like ⁇ Phosphorus compounds having an intramolecular polarization formed by adding a compound having a bond (for example, an adduct of triphenylphosphine and benzoquinone, and an adduct of triparatolylphosphine and benzoquinone); tetraphenylphosphonium tetraphenylborate, triphenylphosphinetetra Examples include phenyl borate, 2-ethyl-4-methylimidazole tetraphenyl borate, triphenyl
- an organophosphorus compound When used as a curing accelerator, high reliability tends to be obtained in an electronic component device sealed using an epoxy resin composition. Although the reason for this is not clear, it can be considered as follows. In general, when the epoxy resin composition contains alumina particles, the curability is reduced, and therefore, the amount of the curing accelerator tends to be increased. However, when the amount of the curing accelerator is increased, the amount of chlorine ions generated by the reaction between the chlorine derived from epichlorohydrin, which is a raw material of the epoxy resin, and the curing accelerator increases, which reduces the reliability of the electronic component device. There is a case.
- the content of the curing accelerator is not particularly limited, and for example, it is 1.0% by mass to 10% by mass with respect to the total amount of the epoxy resin and the curing agent
- the content is preferably 1.5% by mass to 7% by mass, and more preferably 1.8% by mass to 6% by mass.
- the epoxy resin composition of the present disclosure may contain an organic solvent.
- the organic solvent is not particularly limited, and may contain, for example, an organic solvent having a boiling point of 50 ° C. to 100 ° C. (hereinafter also referred to as a specific organic solvent).
- the specific organic solvent is not particularly limited, and, for example, one having a boiling point of 50 ° C. to 100 ° C., preferably one that is nonreactive with the components in the epoxy resin composition can be appropriately selected and used.
- the specific organic solvent include alcohol solvents, ether solvents, ketone solvents, ester solvents and the like. Among them, alcohol solvents are preferable, and methanol (boiling point 64.7 ° C.), ethanol (boiling point 78.37 ° C.), propanol (boiling point 97 ° C.) and isopropanol (boiling point 82.6 ° C.) are more preferable.
- the specific organic solvents may be used alone or in combination of two or more.
- the boiling point of the specific organic solvent refers to the boiling point of the specific organic solvent measured at normal pressure.
- the content of the specific organic solvent in the epoxy resin composition is not particularly limited.
- the content of the specific organic solvent is, for example, preferably 0.1% by mass to 10% by mass with respect to the total mass of the epoxy resin composition, and from the viewpoint of further improving the thermal conductivity, 0.3% by mass It is more preferably ⁇ 4.0% by mass, still more preferably 0.3% by mass to 3.0% by mass, and particularly preferably 0.3% by mass to 2.5% by mass.
- the content of the specific organic solvent is 0.3% by mass or more, the effect of improving the fluidity tends to be further enhanced.
- the content of the specific organic solvent is 3.0% by mass or less, generation of voids is further suppressed when the epoxy resin in the epoxy resin composition is cured, and a decrease in insulation reliability is further suppressed. is there.
- the content rate of the alcohol solvent in the specific organic solvent is not particularly limited.
- the content of the alcohol solvent is, for example, preferably 50% by mass or more, more preferably 70% by mass or more, and still more preferably 90% by mass or more based on the total mass of the specific organic solvent. And particularly preferably 95% by mass or more.
- the epoxy resin composition may not substantially contain a specific organic solvent other than the alcohol solvent.
- the epoxy resin composition may contain additives such as an anion exchanger, a mold release agent, a flame retardant, a coupling agent, a stress relaxation agent, a colorant and the like as necessary.
- the epoxy resin composition may optionally contain an anion exchanger.
- an anion exchanger when using an epoxy resin composition as a sealing material, it is preferable to contain an anion exchanger from the viewpoint of improving the moisture resistance and the high-temperature standing characteristics of the electronic component device provided with the element to be sealed.
- the anion exchanger is not particularly limited and can be selected from those conventionally used commonly in the art.
- hydrotalcite compounds and hydrous oxides of elements selected from magnesium, aluminum, titanium, zirconium and bismuth can be mentioned.
- the anion exchanger is not particularly limited and can be selected from those conventionally used commonly in the art.
- examples of the anion exchanger include a hydrotalcite compound having a composition represented by the following formula (I), and a hydrous oxide of an element selected from the group consisting of magnesium, aluminum, titanium, zirconium, bismuth and antimony. .
- the anion exchangers may be used alone or in combination of two or more. Mg 1-x Al x (OH) 2 (CO 3 ) x / 2 ⁇ mH 2 O (I) (0 ⁇ X ⁇ 0.5, m is a positive number)
- the hydrotalcite compound is captured by substituting anions such as halogen ions with CO 3 in the structure, and the halogen ions incorporated into the crystal structure are released until the crystal structure is destroyed at about 350 ° C. or higher. It is a compound with no property.
- the hydrotalcites having such properties include Mg 6 Al 2 (OH) 16 CO 3 .4H 2 O produced as a natural product, and Mg 4.3 Al 2 (OH) 12.6 CO 3 as a synthetic product. ⁇ MH 2 O etc. may be mentioned.
- the epoxy resin composition contains a phenol curing agent as a curing agent
- the epoxy resin composition exhibits an acidity under the influence of the phenol curing agent (for example, the extract of a cured product using pure water has a pH of 3 to 5)
- the phenol curing agent for example, the extract of a cured product using pure water has a pH of 3 to 5
- aluminum which is an amphoteric metal
- the corrosion of aluminum is caused by the epoxy resin composition containing a hydrotalcite compound also having an action of adsorbing an acid. Tend to be suppressed.
- the water-containing oxide of at least one element selected from the group consisting of magnesium, aluminum, titanium, zirconium, bismuth and antimony can also be captured by substituting anions such as halogen ions with hydroxide ions. it can.
- these ion exchangers exhibit excellent ion exchange ability on the acid side. Therefore, when the epoxy resin composition contains these ion exchangers, the corrosion of aluminum tends to be suppressed as in the case of containing the hydrotalcite compound.
- the content of the anion exchanger is not particularly limited as long as it is an amount sufficient to capture anions such as halogen ions.
- the content of the anion exchanger is, for example, preferably 0.1% by mass to 30% by mass, and 1.0% by mass to 5% by mass. It is more preferable that
- the epoxy resin composition may contain a mold release agent as needed from the viewpoint of exhibiting good mold release property to the mold in the molding step.
- the type of release agent is not particularly limited, and examples include release agents known in the art. Specifically, as a mold release agent, higher fatty acids such as carnauba wax, montanic acid and stearic acid, higher fatty acid metal salts, ester-based waxes such as montanic acid esters, and polyolefin-based waxes such as oxidized polyethylene and non-oxidized polyethylene It can be mentioned. Among them, carnauba wax and polyolefin wax are preferable.
- the mold release agent may be used alone or in combination of two or more.
- polystyrene-based wax a commercially available product may be used.
- low molecular weight polyethylene having a number average molecular weight of about 500 to 10000 such as H4 of PECHET, PE, PED series, etc., can be mentioned.
- the content of the polyolefin wax is preferably 0.01% by mass to 10% by mass, and 0.10% by mass to 5% by mass with respect to the epoxy resin. It is more preferable that When the content of the polyolefin wax is 0.01% by mass or more, sufficient releasability tends to be obtained, and when it is 10% by mass or less, sufficient adhesiveness tends to be obtained.
- the epoxy resin composition contains a release agent other than polyolefin wax, or when the epoxy resin composition contains a polyolefin wax and another release agent, release agents other than polyolefin wax are released.
- the content of the mold agent is preferably 0.1% by mass to 10% by mass, and more preferably 0.5% by mass to 3% by mass with respect to the epoxy resin.
- the epoxy resin composition may contain a flame retardant, if necessary, from the viewpoint of imparting flame retardancy.
- the flame retardant is not particularly limited, and examples thereof include known organic and inorganic compounds containing a halogen atom, an antimony atom, a nitrogen atom or a phosphorus atom, metal hydroxides, and acenaphthylene.
- the flame retardant may be used alone or in combination of two or more.
- the content of the flame retardant is not particularly limited as long as the flame retardant effect can be obtained.
- the content of the flame retardant is preferably 1% by mass to 30% by mass, and more preferably 2% by mass to 15% by mass, with respect to the epoxy resin. preferable.
- the epoxy resin composition may optionally contain a coupling agent from the viewpoint of enhancing the adhesion between the resin component and the inorganic filler.
- the type of coupling agent is not particularly limited.
- Examples of the coupling agent include various silane compounds such as epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane, methacrylsilane, acrylsilane and vinylsilane, titanium compounds, aluminum chelate compounds, aluminum and zirconium-containing compounds.
- the coupling agents may be used alone or in combination of two or more.
- the epoxy resin composition may contain a stress relaxation agent such as silicone oil or silicone rubber particles, if necessary, from the viewpoint of reducing the amount of warping and package cracking of the package.
- a stress relaxation agent such as silicone oil or silicone rubber particles
- a flexible agent stress relaxation agent generally used in the relevant technical field can be appropriately selected and used.
- thermoplastic elastomers such as silicone, polystyrene, polyolefin, polyurethane, polyester, polyether, polyamide, polybutadiene, etc .; NR (natural rubber), NBR (acrylonitrile-butadiene rubber), acrylic rubber, urethane rubber Rubber particles such as silicone powder; methyl methacrylate-styrene-butadiene copolymer (MBS), methyl methacrylate-silicone copolymer, rubber having a core-shell structure such as methyl methacrylate-butyl acrylate copolymer Particle etc. are mentioned.
- silicone-based stress relaxation agents containing silicone are preferable.
- silicone type stress relaxation agent what has an epoxy group, what has an amino group, what carried out polyether modification of these etc. are mentioned.
- the stress relaxation agents may be used alone or in combination of two or more.
- the epoxy resin composition may contain a colorant such as carbon black, fibrous carbon, an organic dye, an organic colorant, titanium oxide, red lead, bengara and the like.
- a colorant such as carbon black, fibrous carbon, an organic dye, an organic colorant, titanium oxide, red lead, bengara and the like.
- the content of the colorant is preferably 0.05% by mass to 5.0% by mass with respect to the inorganic filler, and 0.10% by mass to 2.%. More preferably, it is 5% by mass.
- any method may be used as long as various components can be dispersed and mixed.
- a method of melt-kneading by a mixing roll, an extruder or the like, cooling, and crushing can be mentioned.
- the epoxy resin composition is, for example, mixed and stirred with the above-mentioned components, and kneaded by a kneader, a roll, an extruder, etc. which has been heated to 70 ° C. to 140 ° C. in advance, and then cooled. It can be obtained by a method such as crushing.
- the epoxy resin composition may be tableted in size and mass to match the molding conditions of the package. The tableting of the epoxy resin composition facilitates handling.
- the epoxy resin composition of the present disclosure preferably exhibits a flow distance of 100 cm or more when the flowability is measured by the following method.
- the epoxy resin composition is molded using a spiral flow measurement mold according to EMMI-1-66, and the flow distance (cm) of the molded product of the epoxy resin composition is measured.
- the epoxy resin composition is molded using a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa and a curing time of 120 seconds.
- Epoxy resin cured product is formed by curing the above-described epoxy resin composition.
- the epoxy resin cured product of the present disclosure tends to be excellent in thermal conductivity since it is obtained by curing the above-described epoxy resin composition.
- the thermal conductivity of the cured epoxy resin is not particularly limited, and is preferably 4 W / (m ⁇ K) or more.
- the thermal conductivity of the cured epoxy resin is a value measured as follows. Transfer molding is performed using an epoxy resin composition under the conditions of a mold temperature of 180 ° C., a molding pressure of 7 MPa, and a curing time of 300 seconds, to obtain a mold-shaped epoxy resin cured product.
- the specific gravity of the obtained epoxy resin cured product is measured by the Archimedes method, and the specific heat is measured by DSC (for example, Perkin Elmer, DSC Pyris 1).
- the thermal diffusivity of the obtained cured product is measured by a laser flash method using a thermal diffusivity measuring device (for example, LFA 467, manufactured by NETZSCH).
- the thermal conductivity of the epoxy resin cured product is calculated using the obtained specific gravity, specific heat, and thermal diffusivity.
- the electronic component device of the present disclosure has a device and a cured product of the epoxy resin composition of the present disclosure sealing the device, and has the form of a BGA package.
- a BGA package is manufactured by mounting an element on the front surface of a substrate having a metal bump formed on the back surface, connecting the element and a wiring formed on the substrate by bump or wire bonding, and sealing the element. .
- the substrate may, for example, be a glass-epoxy substrate or a printed wiring board.
- an active element, a passive element, etc. are mentioned.
- the active element includes a semiconductor chip, a transistor, a diode, a thyristor and the like.
- a passive element a capacitor, a resistor, a coil, etc. are mentioned.
- the method for sealing the device with the epoxy resin cured product is not particularly limited, and methods known in the art can be applied.
- a low pressure transfer molding method is generally used, an injection molding method, a compression molding method or the like may be used.
- Epoxy resin 1 Biphenyl type epoxy resin (Mitsubishi Chemical Corporation, trade name "YX-4000") ⁇ Epoxy resin 2 ... bisphenol F type epoxy resin (Nippon Steel & Sumitomo Metal Chemical Co., Ltd., trade name "YSLV-80XY”) Curing agent: Multifunctional phenol resin (Air Water Co., Ltd., trade name "HE 910", triphenylmethane type phenol resin having a hydroxyl equivalent of 105 g / eq) ⁇ Hardening accelerator ⁇ Phosphorous hardening accelerator (organic phosphorus compound)
- Inorganic filler 1 Alumina-silica mixed filler (silica content: 10% by mass), volume average particle diameter: 10 ⁇ m
- Inorganic filler 2 alumina filler, volume average particle diameter: 10 ⁇ m
- Inorganic filler 3 alumina filler, volume average particle diameter: 0.8 ⁇ m
- Inorganic filler 4 silica filler, volume average particle diameter: 0.8 ⁇ m
- Plasticizer 1 Organic phosphine oxide
- Plasticizer 2 Indene-Styrene copolymer (Nisshin Chemical Co., Ltd., NH-100S)
- Coupling agent Anilinosilane (N-phenyl-3-aminopropyltrimethoxysilane, Shin-Etsu Chemical Co., Ltd., trade name: KBM-573)
- Colorant carbon black (Mitsubishi Chemical Corporation, trade name: MA-100)
- -Releasing agent Montanic acid ester (Celarika NODA)
- the evaluation of the flowability of the epoxy resin composition was performed by a spiral flow test. Specifically, the epoxy resin composition was molded using a spiral flow measurement mold according to EMMI-1-66, and the flow distance (cm) of the molded product of the epoxy resin composition was measured. Molding of the epoxy resin composition was performed using a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 120 seconds. Moreover, fluidity
- the evaluation of the thermal conductivity when the epoxy resin composition was cured was performed as follows. Specifically, transfer molding was performed using the prepared epoxy resin composition under conditions of a mold temperature of 180 ° C., a molding pressure of 7 MPa, and a curing time of 300 seconds, to obtain a molded product having a mold shape.
- the specific gravity of the obtained cured product measured by the Archimedes method was 3.00 to 3.40.
- the specific heat of the obtained cured product was measured by DSC (Perkin Elmer, DSC Pyris 1). Further, the thermal diffusivity of the cured product was measured by a laser flash method using a thermal diffusivity measuring device (LFA 467, manufactured by NETZSCH).
- the thermal conductivity of the epoxy resin cured product was calculated using the obtained specific gravity, specific heat, and thermal diffusivity.
- the thermal conductivity was A at 4 W / (m ⁇ K) or more, and B at less than 4 W / (m ⁇ K).
- the epoxy resin 2, the curing agent, the inorganic filler, and the plasticizer are contained, the content of the inorganic filler is 75% by volume to 84% by volume, and the total amount of alumina particles and silica particles In Examples 1 to 8 in which the ratio of silica particles to is within the range of 0% by mass to 15% by mass or less, both evaluations of fluidity and thermal conductivity were good.
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Abstract
Description
<1> ビスフェノールF型エポキシ樹脂を含むエポキシ樹脂と、硬化剤と、アルミナ粒子を含みシリカ粒子を含まないか、アルミナ粒子を含みさらにシリカ粒子をアルミナ粒子とシリカ粒子の合計量に対して0質量%超15質量%以下含む無機充填材と、可塑剤と、を含有し、前記無機充填材の含有率が75体積%~84体積%である、ボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<2> 前記エポキシ樹脂がさらにビフェニル型エポキシ樹脂を含む、<1>に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<3> 前記無機充填材が、アルミナ粒子を含みシリカ粒子を含まないか、アルミナ粒子を含みさらにシリカ粒子をアルミナ粒子とシリカ粒子の合計量に対して0質量%超10質量%以下含む、<1>又は<2>に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<4> 前記硬化剤が、水酸基当量150g/eq以下のフェノール硬化剤を含む、<1>~<3>のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<5> 前記硬化剤が、1分子中に3個以上のフェノール性水酸基を有するフェノール樹脂を含む、<1>~<4>のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<6> 前記硬化剤が、トリフェニルメタン型フェノール樹脂を含む、<1>~<5>のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<7> 前記無機充填材の空隙率が18体積%以下である<1>~<6>のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<8> 前記無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合が9体積%以上であり、粒子径が1μmを超え10μm以下の粒子の割合が45体積%以下であり、粒子径が10μmを超え30μm以下の粒子の割合が20体積%以上であり、粒子径が30μmを超える粒子の割合が18体積%以上である、<1>~<7>のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<9> 前記無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合が11体積%以上であり、粒子径が1μmを超え10μm以下の粒子の割合が40体積%以下であり、粒子径が10μmを超え30μm以下の粒子の割合が22体積%以上であり、粒子径が30μmを超える粒子の割合が20体積%以上である<8>に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。
<10> <1>~<9>のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物を硬化してなるエポキシ樹脂硬化物。
<11> 素子と、前記素子を封止している<10>に記載のエポキシ樹脂硬化物と、を有し、ボールグリッドアレイパッケージの形態を有する、電子部品装置。 Means for solving the above problems include the following embodiments.
<1> An epoxy resin containing a bisphenol F type epoxy resin, a curing agent, alumina particles, or silica particles are not contained, or alumina particles are further contained, and the silica particles are 0 mass to the total amount of alumina particles and silica particles An epoxy resin composition for sealing a ball grid array package, comprising: an inorganic filler containing more than 15% by mass and a plasticizer; and the content of the inorganic filler is 75% by volume to 84% by volume.
<2> The epoxy resin composition for ball grid array package sealing according to <1>, wherein the epoxy resin further contains a biphenyl type epoxy resin.
<3> The inorganic filler contains alumina particles, does not contain silica particles, or contains alumina particles and further contains silica particles in an amount of more than 0% by mass and 10% by mass or less based on the total amount of alumina particles and silica particles < The epoxy resin composition for ball grid array package sealing as described in 1> or <2>.
<4> The epoxy resin composition for sealing a ball grid array package according to any one of <1> to <3>, wherein the curing agent comprises a phenol curing agent having a hydroxyl equivalent of 150 g / eq or less.
<5> The epoxy resin for sealing a ball grid array package according to any one of <1> to <4>, wherein the curing agent contains a phenol resin having three or more phenolic hydroxyl groups in one molecule. Composition.
<6> The epoxy resin composition for sealing a ball grid array package according to any one of <1> to <5>, wherein the curing agent contains a triphenylmethane type phenol resin.
<7> The epoxy resin composition for sealing a ball grid array package according to any one of <1> to <6>, wherein the porosity of the inorganic filler is 18 volume% or less.
<8> In the volume-based particle size distribution of the inorganic filler, the ratio of particles having a particle diameter of 1 μm or less is 9 volume% or more, and the ratio of particles having a particle diameter of more than 1 μm to 10 μm is 45 volume% or less Any one of <1> to <7>, wherein the proportion of particles having a particle size of more than 10 μm and 30 μm or less is 20% by volume or more and the proportion of particles having a particle size of more than 30 μm is 18% by volume or more The epoxy resin composition for ball grid array package sealing as described in a term.
<9> In the volume-based particle size distribution of the inorganic filler, the proportion of particles having a particle size of 1 μm or less is 11 vol% or more, and the proportion of particles having a particle size of more than 1 μm and 10 μm or less is 40 vol% or less Yes, the percentage of particles having a particle size of more than 10 μm and 30 μm or less is 22 vol% or more, and the percentage of particles having a particle size of more than 30 μm is 20 vol% or more. Epoxy resin composition.
<10> A cured epoxy resin product obtained by curing the epoxy resin composition for sealing a ball grid array package according to any one of <1> to <9>.
The electronic component apparatus which has <11> element and the epoxy resin hardened material as described in <10> which has sealed the said element, and has a form of a ball grid array package.
本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率又は含有量は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率又は含有量を意味する。
本開示において各成分に該当する粒子は複数種含んでいてもよい。組成物中に各成分に該当する粒子が複数種存在する場合、各成分の粒子径は、特に断らない限り、組成物中に存在する当該複数種の粒子の混合物についての値を意味する。 In the present disclosure, the term “step” includes, in addition to steps independent of other steps, such steps as long as the purpose of the step is achieved even if it can not be clearly distinguished from other steps. .
In the present disclosure, numerical values described before and after “to” are included in the numerical range indicated using “to” as the minimum value and the maximum value, respectively.
The upper limit value or the lower limit value described in one numerical value range may be replaced with the upper limit value or the lower limit value of the other stepwise description numerical value range in the numerical value range described stepwise in the present disclosure. . In addition, in the numerical range described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the example.
In the present disclosure, each component may contain a plurality of corresponding substances. When a plurality of substances corresponding to each component are present in the composition, the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified. Means quantity.
In the present disclosure, particles corresponding to each component may contain a plurality of types. When there are a plurality of particles corresponding to each component in the composition, the particle diameter of each component means the value for the mixture of the plurality of particles present in the composition unless otherwise specified.
本開示のBGAパッケージ封止用エポキシ樹脂組成物(以下、単にエポキシ樹脂組成物ともいう)は、ビスフェノールF型エポキシ樹脂を含むエポキシ樹脂と、硬化剤と、アルミナ粒子を含みシリカ粒子を含まないか、アルミナ粒子を含みさらにシリカ粒子をアルミナ粒子とシリカ粒子の合計量に対して0質量%超15質量%以下含む無機充填材と、可塑剤と、を含有し、前記無機充填材の含有率が75体積%~84体積%である。 <Epoxy resin composition for sealing BGA package>
Whether the epoxy resin composition for sealing a BGA package of the present disclosure (hereinafter, also simply referred to as an epoxy resin composition) contains an epoxy resin containing a bisphenol F-type epoxy resin, a curing agent, and alumina particles and does not contain silica particles And an inorganic filler containing alumina particles and further containing 0% by mass or more and 15% by mass or less of silica particles based on the total amount of the alumina particles and the silica particles, and a plasticizer, and the content of the inorganic filler is It is 75% by volume to 84% by volume.
本開示のエポキシ樹脂組成物は、ビスフェノールF型エポキシ樹脂を含むエポキシ樹脂を含有する。エポキシ樹脂組成物は、ビスフェノールF型エポキシ樹脂以外のエポキシ樹脂を含有していてもよい。 [Epoxy resin]
The epoxy resin composition of the present disclosure contains an epoxy resin containing a bisphenol F-type epoxy resin. The epoxy resin composition may contain an epoxy resin other than bisphenol F-type epoxy resin.
本開示においてビスフェノールF型エポキシ樹脂とは、置換又は非置換のビスフェノールFのジグリシジルエーテルをいう。ビスフェノールF型エポキシ樹脂は、1種単独で用いても2種以上を組み合わせて用いてもよい。 (Bisphenol F type epoxy resin)
In the present disclosure, a bisphenol F-type epoxy resin refers to a diglycidyl ether of substituted or unsubstituted bisphenol F. The bisphenol F-type epoxy resin may be used singly or in combination of two or more.
エポキシ樹脂組成物は、ビスフェノールF型エポキシ樹脂に加えて、ビフェニル型エポキシ樹脂を含有してもよい。ビフェニル型エポキシ樹脂は、ビフェニル骨格を有するエポキシ樹脂であれば特に限定されない。例えば下記一般式(II)で示されるエポキシ樹脂等が挙げられる。 (Biphenyl type epoxy resin)
The epoxy resin composition may contain a biphenyl type epoxy resin in addition to the bisphenol F type epoxy resin. The biphenyl type epoxy resin is not particularly limited as long as it is an epoxy resin having a biphenyl skeleton. For example, the epoxy resin etc. which are shown by following General formula (II) are mentioned.
エポキシ樹脂組成物は、ビスフェノールF型エポキシ樹脂及びビフェニル型エポキシ樹脂以外のエポキシ樹脂(「その他のエポキシ樹脂」ともいう)を含有していてもよい。「その他のエポキシ樹脂」は特に制限されず、1分子中に2個以上のエポキシ基を有するエポキシ樹脂であることが好ましい。1分子中に2個以上のエポキシ基を有するエポキシ樹脂としては、スチルベン型エポキシ樹脂、硫黄原子含有エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、ナフタレン型エポキシ樹脂、サリチルアルデヒド型エポキシ樹脂、ナフトール類とフェノール類との共重合型エポキシ樹脂、アラルキル型エポキシ樹脂、ジフェニルメタン型エポキシ樹脂(ビスフェノールF型エポキシ樹脂を除く)、及びトリフェニルメタン型エポキシ樹脂等が挙げられる。「その他のエポキシ樹脂」は、1種単独で用いても2種以上を組み合わせて用いてもよい。 (Other epoxy resin)
The epoxy resin composition may contain an epoxy resin other than bisphenol F-type epoxy resin and biphenyl type epoxy resin (also referred to as "other epoxy resin"). The “other epoxy resin” is not particularly limited, and is preferably an epoxy resin having two or more epoxy groups in one molecule. As an epoxy resin having two or more epoxy groups in one molecule, stilbene type epoxy resin, sulfur atom containing epoxy resin, dicyclopentadiene type epoxy resin, naphthalene type epoxy resin, salicylaldehyde type epoxy resin, naphthols and phenol And epoxy resins of the copolymerization type, aralkyl type epoxy resins, diphenylmethane type epoxy resins (excluding bisphenol F type epoxy resins), and triphenylmethane type epoxy resins. The “other epoxy resins” may be used alone or in combination of two or more.
本開示のエポキシ樹脂組成物は、硬化剤を含有する。硬化剤は、エポキシ樹脂と反応しうるものであれば特に制限されない。耐熱性向上の観点から、硬化剤は、1分子中に2個以上のフェノール性水酸基を有する化合物(以下、フェノール硬化剤ともいう)が好ましい。フェノール硬化剤は、低分子のフェノール化合物であっても、低分子のフェノール化合物を高分子化したフェノール樹脂であってもよい。熱伝導性の観点からは、フェノール硬化剤はフェノール樹脂であることが好ましい。硬化剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 [Hardener]
The epoxy resin composition of the present disclosure contains a curing agent. The curing agent is not particularly limited as long as it can react with the epoxy resin. From the viewpoint of improving heat resistance, the curing agent is preferably a compound having two or more phenolic hydroxyl groups in one molecule (hereinafter also referred to as a phenol curing agent). The phenol curing agent may be a low molecular weight phenolic compound or a phenolic resin obtained by polymerizing a low molecular weight phenolic compound. From the viewpoint of thermal conductivity, the phenol curing agent is preferably a phenol resin. The curing agent may be used alone or in combination of two or more.
本開示のエポキシ樹脂組成物は、アルミナ粒子を含みシリカ粒子を含まないか、アルミナ粒子を含みさらにシリカ粒子をアルミナ粒子とシリカ粒子の合計量に対して0質量%超15質量%以下含む無機充填材を含有する。無機充填材の含有率は組成物の全体積に対して75体積%~84体積%である。無機充填材は、アルミナ粒子とシリカ粒子以外の無機充填材を含んでもよく、アルミナ粒子とシリカ粒子のみを含んでもよく、アルミナ粒子のみを含んでもよい。シリカ粒子としては、球状シリカ、結晶シリカ等が挙げられる。 [Inorganic filler]
The epoxy resin composition of the present disclosure contains alumina particles, does not contain silica particles, or contains alumina particles and further contains silica particles in an amount of more than 0% by mass and 15% by mass or less based on the total amount of alumina particles and silica particles. Contains wood. The content of the inorganic filler is 75% by volume to 84% by volume based on the total volume of the composition. The inorganic filler may contain an inorganic filler other than alumina particles and silica particles, may contain only alumina particles and silica particles, or may contain only alumina particles. Spherical silica, crystalline silica, etc. are mentioned as a silica particle.
また、無機充填材がさらにシリカ粒子を含む場合には、流動性の観点からは、平均粒径が1μm以下のシリカ粒子を組み合わせて用いることが好ましい。例えば、平均粒子径が0.1μm~1μmのシリカ粒子を組み合わせて用いることが好ましく、平均粒子径が0.2μm~1μmのシリカ粒子を組み合わせて用いることがより好ましく、平均粒子径が0.3μm~1μmのシリカ粒子を組み合わせて用いることが更に好ましい。
エポキシ樹脂組成物が上記のように組み合わせた無機充填材を含有することは、例えば無機充填材の体積基準の粒度分布(頻度分布)を求めることで確認することができる。 In one embodiment, from the viewpoint of thermal conductivity, it is preferable to use alumina particles having an average particle diameter of 1 μm or more and alumina particles having an average particle diameter of less than 1 μm in combination. For example, it is preferable to use alumina particles having an average particle diameter of 1 μm to 50 μm in combination with alumina particles having an average particle diameter of 0.1 μm to less than 1 μm, and alumina particles having an average particle diameter of 5 μm to 50 μm and an average particle diameter of 0. More preferably, it is used in combination with alumina particles of 1 μm or more and less than 1 μm, and it is more preferable to use alumina particles with an average particle diameter of 5 μm to 30 μm and alumina particles with an average particle diameter of 0.3 μm or more and less than 1 μm. preferable.
When the inorganic filler further contains a silica particle, it is preferable to use a combination of silica particles having an average particle diameter of 1 μm or less from the viewpoint of fluidity. For example, it is preferable to use a combination of silica particles having an average particle diameter of 0.1 μm to 1 μm, more preferably a combination of silica particles having an average particle diameter of 0.2 μm to 1 μm, and an average particle diameter of 0.3 μm It is more preferable to use silica particles of 1 to 1 μm in combination.
The inclusion of the inorganic filler in which the epoxy resin composition is combined as described above can be confirmed, for example, by determining the volume-based particle size distribution (frequency distribution) of the inorganic filler.
また、無機充填材の含有率は、熱伝導性、流動性等の特性バランスの観点から、組成物の全質量に対して、90質量%~96質量%であることが好ましく、91質量%~95質量%であることがより好ましく、92質量%~94質量%であることが更に好ましい。 The content of the inorganic filler is 75% by volume to 84% by volume with respect to the total volume of the composition, and 76% by volume to 84% by volume from the viewpoint of the balance of characteristics such as thermal conductivity and flowability. Is preferable, and 77% by volume to 83% by volume is more preferable.
In addition, the content of the inorganic filler is preferably 90% by mass to 96% by mass, based on the total mass of the composition, from 91% by mass to the total mass of the composition, from the viewpoint of property balance such as thermal conductivity and fluidity. It is more preferably 95% by mass, and still more preferably 92% by mass to 94% by mass.
エポキシ樹脂組成物をるつぼに入れ、800℃で4時間放置し、灰化させる。得られた灰分の粒度分布を、レーザー回折式粒度分布計(例えば、株式会社堀場製作所、LA920)を用いてアルミナの屈折率を適用して測定する。粒度分布から下記の大内山の式を用いて、空隙率εを算出する。なお、大内山の式に関しては、下記文献に詳しい。
N. Ouchiyama and T.Tanaka, Ind. Eng. Chem. Fundam. , 19, 338 (1980)
N. Ouchiyama and T.Tanaka, Ind. Eng. Chem. Fundam. , 20, 66 (1981)
N. Ouchiyama and T.Tanaka, Ind. Eng. Chem. Fundam. , 23, 490 (1984) The porosity of an inorganic filler says the value measured by the following method.
The epoxy resin composition is placed in a crucible and left at 800 ° C. for 4 hours to incinerate. The particle size distribution of the obtained ash content is measured by applying the refractive index of alumina using a laser diffraction type particle size distribution analyzer (for example, LA 920 manufactured by Horiba, Ltd.). The void ratio ε is calculated from the particle size distribution using the following equation of Ouchiyama. The details of Ouchiyama's formula are described in the following documents.
N. Ouchiyama and T. Tanaka, Ind. Eng. Chem. Fundam. , 19, 338 (1980)
N. Ouchiyama and T. Tanaka, Ind. Eng. Chem. Fundam. , 20, 66 (1981)
N. Ouchiyama and T. Tanaka, Ind. Eng. Chem. Fundam. , 23, 490 (1984)
無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合は11体積%以上であり、粒子径が1μmを超え10μm以下の粒子の割合は40体積%以下であり、粒子径が10μmを超え30μm以下の粒子の割合は22体積%以上であり、粒子径が30μmを超える粒子の割合は20体積%以上であることがより好ましい。
無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合は12体積%以上であり、粒子径が1μmを超え10μm以下の粒子の割合は30体積%以下であり、粒子径が10μmを超え30μm以下の粒子の割合は24体積%以上であり、粒子径が30μmを超える粒子の割合は30体積%以上であることが更に好ましい。
無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合は20体積%以下であり、粒子径が1μmを超え10μm以下の粒子の割合は15体積%以上であり、粒子径が10μmを超え30μm以下の粒子の割合は35体積%以下であり、粒子径が30μmを超える粒子の割合は45体積%以下であってもよい。 The particle size distribution of the inorganic filler is not particularly limited. For example, in the volume-based particle size distribution of the inorganic filler, the proportion of particles having a particle size of 1 μm or less is 9 volume% or more, and the proportion of particles having a particle size of more than 1 μm and 10 μm or less is 45 volume% or less The proportion of particles having a particle size of more than 10 μm and 30 μm or less is preferably 20% by volume or more, and the proportion of particles having a particle size of more than 30 μm is preferably 18% by volume or more. When an inorganic filler exhibiting such a specific particle size distribution is contained, the composition tends to be excellent in curability, flowability and moldability, and excellent in thermal conductivity when it is a cured product.
In the volume-based particle size distribution of the inorganic filler, the ratio of particles having a particle diameter of 1 μm or less is 11 volume% or more, and the ratio of particles having a particle size of more than 1 μm to 10 μm is 40 volume% or less The proportion of particles having a diameter of more than 10 μm and 30 μm or less is preferably 22% by volume or more, and the proportion of particles having a particle size of more than 30 μm is more preferably 20% by volume or more.
In the volume-based particle size distribution of the inorganic filler, the ratio of particles having a particle diameter of 1 μm or less is 12 volume% or more, and the ratio of particles having a particle size of more than 1 μm to 10 μm is 30 volume% or less It is more preferable that the proportion of particles having a diameter of more than 10 μm and 30 μm or less is 24% by volume or more, and the proportion of particles having a particle size of more than 30 μm is 30% by volume or more.
In the volume-based particle size distribution of the inorganic filler, the ratio of particles having a particle size of 1 μm or less is 20 volume% or less, and the ratio of particles having a particle size of more than 1 μm to 10 μm is 15 volume% or more. The ratio of particles having a diameter of more than 10 μm and 30 μm or less may be 35% by volume or less, and the ratio of particles having a particle size of more than 30 μm may be 45% by volume or less.
溶媒(純水)に、測定対象の無機充填材を1質量%~5質量%の範囲内で界面活性剤1質量%~8質量%とともに添加し、110Wの超音波洗浄機で30秒~5分間振動し、無機充填材を分散する。分散液の約3mL程度を測定セルに注入して25℃で測定する。測定装置は、レーザー回折式粒度分布計(例えば、株式会社堀場製作所、LA920)を用い、体積基準の粒度分布を測定する。平均粒子径は、体積基準の粒度分布において小径側からの累積が50%となるときの粒子径(D50%)として求められる。なお、屈折率はアルミナ粒子の屈折率を用いる。無機充填材がアルミナ粒子とその他の無機充填材の混合物である場合においては、屈折率はアルミナ粒子の屈折率を用いるものとする。 The volume-based particle size distribution of the inorganic filler can be measured by the following method.
The inorganic filler to be measured is added to the solvent (pure water) in the range of 1% by mass to 5% by mass together with 1% by mass to 8% by mass of the surfactant, and 30 seconds to 5 seconds by a 110 W ultrasonic cleaner. Vibrate for a minute to disperse the inorganic filler. About 3 mL of the dispersion is injected into the measuring cell and measured at 25 ° C. The measuring apparatus measures the particle size distribution based on volume using a laser diffraction type particle size distribution analyzer (for example, LA920, manufactured by Horiba, Ltd.). The average particle size is determined as the particle size (D 50%) at which the accumulation from the small diameter side in the volume-based particle size distribution is 50%. The refractive index is the refractive index of alumina particles. In the case where the inorganic filler is a mixture of alumina particles and other inorganic fillers, the refractive index is the refractive index of alumina particles.
エポキシ樹脂組成物は、可塑剤を含有する。エポキシ樹脂組成物が可塑剤を含有すると、アルミナ粒子を含む無機充填材を高充填としても、ワイヤ流れ等の発生を抑制できる傾向にある。この理由は、高温弾性率の低下及び流動性の向上に起因するものと推測される。可塑剤としては、トリフェニルホスフィンオキシド、リン酸エステル等の有機リン化合物、シリコーン、これらの変性化合物などが挙げられる。また、可塑剤としてインデン-スチレン共重合物も好適に用いられる。中でも、可塑剤は有機リン化合物を含むことが好ましく、トリフェニルホスフィンオキシドを含むことがより好ましい。可塑剤の含有率は、エポキシ樹脂に対して0.001質量%~30質量%であることが好ましく、5質量%~20質量%であることがより好ましく、5質量%~15質量%であることが更に好ましい。可塑剤は1種を単独で用いても2種以上組み合わせて用いてもよい。 [Plasticizer]
The epoxy resin composition contains a plasticizer. When the epoxy resin composition contains a plasticizer, even when the inorganic filler containing alumina particles is highly filled, generation of wire flow and the like tends to be suppressed. The reason is presumed to be due to the decrease in high temperature elastic modulus and the improvement in fluidity. Examples of the plasticizer include organic phosphorus compounds such as triphenyl phosphine oxide and phosphoric acid esters, silicones, modified compounds thereof and the like. Further, an indene-styrene copolymer is also suitably used as a plasticizer. Among them, the plasticizer preferably contains an organophosphorus compound, and more preferably triphenylphosphine oxide. The content of the plasticizer is preferably 0.001% by mass to 30% by mass, more preferably 5% by mass to 20% by mass, and 5% by mass to 15% by mass with respect to the epoxy resin. Is more preferred. The plasticizer may be used alone or in combination of two or more.
本開示のエポキシ樹脂組成物は、必要に応じて硬化促進剤を含有してもよい。硬化促進剤としては、封止用エポキシ樹脂組成物に一般に用いられるものを適宜選択して使用することができる。硬化促進剤としては、例えば、有機リン化合物、イミダゾール化合物、第3級アミン、及び第4級アンモニウム塩が挙げられる。中でも、有機リン化合物が好ましい。硬化促進剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 [Hardening accelerator]
The epoxy resin composition of the present disclosure may optionally contain a curing accelerator. As a hardening accelerator, what is generally used for the epoxy resin composition for sealing can be selected suitably, and can be used. Examples of the curing accelerator include organic phosphorus compounds, imidazole compounds, tertiary amines, and quaternary ammonium salts. Among them, organic phosphorus compounds are preferable. The curing accelerator may be used alone or in combination of two or more.
本開示のエポキシ樹脂組成物は、有機溶剤を含有してもよい。エポキシ樹脂組成物が有機溶剤を含有すると、組成物の粘度が低下し、混練性及び流動性が向上する傾向にある。有機溶剤は特に制限されず、例えば、沸点が50℃~100℃である有機溶剤(以下、特定有機溶剤ともいう)を含有してもよい。 [Organic solvent]
The epoxy resin composition of the present disclosure may contain an organic solvent. When the epoxy resin composition contains an organic solvent, the viscosity of the composition tends to decrease, and the kneadability and fluidity tend to be improved. The organic solvent is not particularly limited, and may contain, for example, an organic solvent having a boiling point of 50 ° C. to 100 ° C. (hereinafter also referred to as a specific organic solvent).
エポキシ樹脂組成物は、必要に応じて陰イオン交換体、離型剤、難燃剤、カップリング剤、応力緩和剤、着色剤等の添加剤を含有してもよい。 [Additive]
The epoxy resin composition may contain additives such as an anion exchanger, a mold release agent, a flame retardant, a coupling agent, a stress relaxation agent, a colorant and the like as necessary.
エポキシ樹脂組成物は、必要に応じて陰イオン交換体を含有してもよい。特に、エポキシ樹脂組成物を封止材料として用いる場合には、封止される素子を備える電子部品装置の耐湿性及び高温放置特性を向上させる観点から、陰イオン交換体を含有することが好ましい。 (Anion exchanger)
The epoxy resin composition may optionally contain an anion exchanger. In particular, when using an epoxy resin composition as a sealing material, it is preferable to contain an anion exchanger from the viewpoint of improving the moisture resistance and the high-temperature standing characteristics of the electronic component device provided with the element to be sealed.
Mg1-xAlx(OH)2(CO3)x/2・mH2O (I)
(0<X≦0.5、mは正の数) The anion exchanger is not particularly limited and can be selected from those conventionally used commonly in the art. Examples of the anion exchanger include a hydrotalcite compound having a composition represented by the following formula (I), and a hydrous oxide of an element selected from the group consisting of magnesium, aluminum, titanium, zirconium, bismuth and antimony. . The anion exchangers may be used alone or in combination of two or more.
Mg 1-x Al x (OH) 2 (CO 3 ) x / 2 · mH 2 O (I)
(0 <X ≦ 0.5, m is a positive number)
エポキシ樹脂組成物は、成形工程において金型に対する良好な離型性を発揮させる観点から、必要に応じて離型剤を含有してもよい。離型剤の種類は特に制限されず、当該技術分野において公知の離型剤が挙げられる。具体的に、離型剤としては、カルナバワックス、モンタン酸、ステアリン酸等の高級脂肪酸、高級脂肪酸金属塩、モンタン酸エステル等のエステル系ワックス、酸化ポリエチレン、非酸化ポリエチレン等のポリオレフィン系ワックスなどが挙げられる。中でも、カルナバワックス及びポリオレフィン系ワックスが好ましい。離型剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Release agent)
The epoxy resin composition may contain a mold release agent as needed from the viewpoint of exhibiting good mold release property to the mold in the molding step. The type of release agent is not particularly limited, and examples include release agents known in the art. Specifically, as a mold release agent, higher fatty acids such as carnauba wax, montanic acid and stearic acid, higher fatty acid metal salts, ester-based waxes such as montanic acid esters, and polyolefin-based waxes such as oxidized polyethylene and non-oxidized polyethylene It can be mentioned. Among them, carnauba wax and polyolefin wax are preferable. The mold release agent may be used alone or in combination of two or more.
また、エポキシ樹脂組成物がポリオレフィン系ワックス以外のその他の離型剤を含有する場合、又はエポキシ樹脂組成物がポリオレフィン系ワックス及びその他の離型剤を含有する場合、ポリオレフィン系ワックス以外のその他の離型剤の含有率は、エポキシ樹脂に対して0.1質量%~10質量%であることが好ましく、0.5質量%~3質量%であることがより好ましい。 When the epoxy resin composition contains a polyolefin wax, the content of the polyolefin wax is preferably 0.01% by mass to 10% by mass, and 0.10% by mass to 5% by mass with respect to the epoxy resin. It is more preferable that When the content of the polyolefin wax is 0.01% by mass or more, sufficient releasability tends to be obtained, and when it is 10% by mass or less, sufficient adhesiveness tends to be obtained.
When the epoxy resin composition contains a release agent other than polyolefin wax, or when the epoxy resin composition contains a polyolefin wax and another release agent, release agents other than polyolefin wax are released. The content of the mold agent is preferably 0.1% by mass to 10% by mass, and more preferably 0.5% by mass to 3% by mass with respect to the epoxy resin.
エポキシ樹脂組成物は、難燃性を付与する観点から、必要に応じて難燃剤を含有してもよい。難燃剤は特に制限されず、例えば、ハロゲン原子、アンチモン原子、窒素原子又はリン原子を含む公知の有機化合物及び無機化合物、金属水酸化物、並びにアセナフチレンが挙げられる。難燃剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Flame retardants)
The epoxy resin composition may contain a flame retardant, if necessary, from the viewpoint of imparting flame retardancy. The flame retardant is not particularly limited, and examples thereof include known organic and inorganic compounds containing a halogen atom, an antimony atom, a nitrogen atom or a phosphorus atom, metal hydroxides, and acenaphthylene. The flame retardant may be used alone or in combination of two or more.
エポキシ樹脂組成物は、必要に応じて、樹脂成分と無機充填材との接着性を高める観点から、カップリング剤を含有してもよい。カップリング剤の種類は、特に制限されない。カップリング剤としては、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、メタクリルシラン、アクリルシラン、ビニルシラン等の各種シラン化合物、チタン化合物、アルミニウムキレート化合物、アルミニウム及びジルコニウム含有化合物などが挙げられる。カップリング剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (Coupling agent)
The epoxy resin composition may optionally contain a coupling agent from the viewpoint of enhancing the adhesion between the resin component and the inorganic filler. The type of coupling agent is not particularly limited. Examples of the coupling agent include various silane compounds such as epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane, methacrylsilane, acrylsilane and vinylsilane, titanium compounds, aluminum chelate compounds, aluminum and zirconium-containing compounds. The coupling agents may be used alone or in combination of two or more.
エポキシ樹脂組成物は、パッケージの反り変形量及びパッケージクラックを低減させる観点から、必要に応じて、シリコーンオイル、シリコーンゴム粒子等の応力緩和剤を含有してもよい。使用可能な応力緩和剤としては、当該技術分野で一般に用いられる可とう剤(応力緩和剤)を適宜選択して使用することができる。 (Stress relaxation agent)
The epoxy resin composition may contain a stress relaxation agent such as silicone oil or silicone rubber particles, if necessary, from the viewpoint of reducing the amount of warping and package cracking of the package. As a usable stress relaxation agent, a flexible agent (stress relaxation agent) generally used in the relevant technical field can be appropriately selected and used.
エポキシ樹脂組成物は、カーボンブラック、繊維状カーボン、有機染料、有機着色剤、酸化チタン、鉛丹、ベンガラ等の着色剤を含有してもよい。エポキシ樹脂組成物が着色剤を含有する場合、着色剤の含有率は、無機充填材に対して0.05質量%~5.0質量%であることが好ましく、0.10質量%~2.5質量%であることがより好ましい。 (Colorant)
The epoxy resin composition may contain a colorant such as carbon black, fibrous carbon, an organic dye, an organic colorant, titanium oxide, red lead, bengara and the like. When the epoxy resin composition contains a colorant, the content of the colorant is preferably 0.05% by mass to 5.0% by mass with respect to the inorganic filler, and 0.10% by mass to 2.%. More preferably, it is 5% by mass.
エポキシ樹脂組成物の調製には、各種成分を分散混合できるのであれば、いずれの手法を用いてもよい。一般的な手法として、各種成分をミキサー等によって充分混合した後、ミキシングロール、押出機等によって溶融混練し、冷却し、粉砕する方法を挙げることができる。より具体的には、エポキシ樹脂組成物は、例えば、上述した成分を混合して攪拌し、予め70℃~140℃に加熱してあるニーダー、ロール、エクストルーダー等で混練した後、冷却し、粉砕する等の方法によって得ることができる。エポキシ樹脂組成物は、パッケージの成形条件に合うような寸法及び質量でタブレット化してもよい。エポキシ樹脂組成物をタブレット化することで、取り扱いが容易になる。 [Method of Preparing Epoxy Resin Composition]
For preparation of the epoxy resin composition, any method may be used as long as various components can be dispersed and mixed. As a general method, after various components are sufficiently mixed by a mixer or the like, a method of melt-kneading by a mixing roll, an extruder or the like, cooling, and crushing can be mentioned. More specifically, the epoxy resin composition is, for example, mixed and stirred with the above-mentioned components, and kneaded by a kneader, a roll, an extruder, etc. which has been heated to 70 ° C. to 140 ° C. in advance, and then cooled. It can be obtained by a method such as crushing. The epoxy resin composition may be tableted in size and mass to match the molding conditions of the package. The tableting of the epoxy resin composition facilitates handling.
本開示のエポキシ樹脂組成物は、以下の方法で流動性を測定したときに、100cm以上の流動距離を示すことが好ましい。EMMI-1-66に準じたスパイラルフロー測定用金型を用いてエポキシ樹脂組成物を成形し、エポキシ樹脂組成物の成形物の流動距離(cm)を測定する。エポキシ樹脂組成物の成形は、トランスファー成形機を用い、金型温度180℃、成形圧力6.9MPa、硬化時間120秒の条件下で行うものとする。 [Flowability of Epoxy Resin Composition]
The epoxy resin composition of the present disclosure preferably exhibits a flow distance of 100 cm or more when the flowability is measured by the following method. The epoxy resin composition is molded using a spiral flow measurement mold according to EMMI-1-66, and the flow distance (cm) of the molded product of the epoxy resin composition is measured. The epoxy resin composition is molded using a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa and a curing time of 120 seconds.
本開示のエポキシ樹脂硬化物は、上述したエポキシ樹脂組成物を硬化してなる。本開示のエポキシ樹脂硬化物は、上述したエポキシ樹脂組成物を硬化して得られることから、熱伝導性に優れる傾向にある。 <Epoxy resin cured product>
The epoxy resin cured product of the present disclosure is formed by curing the above-described epoxy resin composition. The epoxy resin cured product of the present disclosure tends to be excellent in thermal conductivity since it is obtained by curing the above-described epoxy resin composition.
エポキシ樹脂硬化物の熱伝導率は特に制限されず、4W/(m・K)以上であることが好ましい。本開示においてエポキシ樹脂硬化物の熱伝導率は以下のように測定したときの値とする。エポキシ樹脂組成物を用いて、金型温度180℃、成形圧力7MPa、硬化時間300秒間の条件でトランスファー成形を行い、金型形状のエポキシ樹脂硬化物を得る。得られたエポキシ樹脂硬化物の比重をアルキメデス法により測定し、比熱をDSC(例えば、Perkin Elmer社、DSC Pyris1)で測定する。また、得られた硬化物の熱拡散率を、熱拡散率測定装置(例えば、NETZSCH社、LFA467)を用いてレーザーフラッシュ法により測定する。得られた比重、比熱、及び熱拡散率を用いてエポキシ樹脂硬化物の熱伝導率を算出する。 [Thermal conductivity of epoxy resin cured product]
The thermal conductivity of the cured epoxy resin is not particularly limited, and is preferably 4 W / (m · K) or more. In the present disclosure, the thermal conductivity of the cured epoxy resin is a value measured as follows. Transfer molding is performed using an epoxy resin composition under the conditions of a mold temperature of 180 ° C., a molding pressure of 7 MPa, and a curing time of 300 seconds, to obtain a mold-shaped epoxy resin cured product. The specific gravity of the obtained epoxy resin cured product is measured by the Archimedes method, and the specific heat is measured by DSC (for example, Perkin Elmer, DSC Pyris 1). In addition, the thermal diffusivity of the obtained cured product is measured by a laser flash method using a thermal diffusivity measuring device (for example, LFA 467, manufactured by NETZSCH). The thermal conductivity of the epoxy resin cured product is calculated using the obtained specific gravity, specific heat, and thermal diffusivity.
本開示の電子部品装置は、素子と、前記素子を封止している本開示のエポキシ樹脂組成物の硬化物と、を有し、BGAパッケージの形態を有する。BGAパッケージは、裏面に金属バンプを形成した基板のおもて面に素子を搭載し、バンプ又はワイヤボンディングにより素子と基板に形成された配線を接続した後、素子を封止して作製される。基板としては、ガラス-エポキシ基板、プリント配線版等が挙げられる。素子としては、能動素子、受動素子等が挙げられる。能動素子としては、半導体チップ、トランジスタ、ダイオード、サイリスタ等が挙げられる。受動素子としては、コンデンサ、抵抗体、コイル等が挙げられる。 <Electronic component device>
The electronic component device of the present disclosure has a device and a cured product of the epoxy resin composition of the present disclosure sealing the device, and has the form of a BGA package. A BGA package is manufactured by mounting an element on the front surface of a substrate having a metal bump formed on the back surface, connecting the element and a wiring formed on the substrate by bump or wire bonding, and sealing the element. . The substrate may, for example, be a glass-epoxy substrate or a printed wiring board. As an element, an active element, a passive element, etc. are mentioned. The active element includes a semiconductor chip, a transistor, a diode, a thyristor and the like. As a passive element, a capacitor, a resistor, a coil, etc. are mentioned.
下記に示す成分を表1に示す配合割合で混合し、実施例と比較例のエポキシ樹脂組成物を調製した。表1中、成分の配合量は特段の記載がない場合は質量部を表し、「-」は成分が配合されていないことを示す。 (Preparation of epoxy resin composition)
The components shown below were mixed at blending ratios shown in Table 1 to prepare epoxy resin compositions of the examples and comparative examples. In Table 1, the blending amounts of the components represent parts by mass unless otherwise specified, and "-" indicates that the component is not blended.
・エポキシ樹脂2・・・ビスフェノールF型エポキシ樹脂(新日鐵住金化学株式会社、商品名「YSLV-80XY」)
・硬化剤…多官能フェノール樹脂(エア・ウォーター株式会社、商品名「HE910」、水酸基当量105g/eqのトリフェニルメタン型フェノール樹脂)
・硬化促進剤…リン系硬化促進剤(有機リン化合物) ・ Epoxy resin 1: Biphenyl type epoxy resin (Mitsubishi Chemical Corporation, trade name "YX-4000")
・ Epoxy resin 2 ... bisphenol F type epoxy resin (Nippon Steel & Sumitomo Metal Chemical Co., Ltd., trade name "YSLV-80XY")
Curing agent: Multifunctional phenol resin (Air Water Co., Ltd., trade name "HE 910", triphenylmethane type phenol resin having a hydroxyl equivalent of 105 g / eq)
· Hardening accelerator ··· Phosphorous hardening accelerator (organic phosphorus compound)
・無機充填材1:アルミナ-シリカ混合フィラー(シリカ含有率:10質量%)、体積平均粒子径:10μm
・無機充填材2:アルミナフィラー、体積平均粒子径:10μm
・無機充填材3:アルミナフィラー、体積平均粒子径:0.8μm
・無機充填材4:シリカフィラー、体積平均粒子径:0.8μm The following were prepared as inorganic fillers.
· Inorganic filler 1: Alumina-silica mixed filler (silica content: 10% by mass), volume average particle diameter: 10 μm
Inorganic filler 2: alumina filler, volume average particle diameter: 10 μm
Inorganic filler 3: alumina filler, volume average particle diameter: 0.8 μm
Inorganic filler 4: silica filler, volume average particle diameter: 0.8 μm
・可塑剤1:有機ホスフィンオキシド
・可塑剤2:インデン-スチレン共重合物(日塗化学株式会社、NH-100S) The following were prepared as plasticizers.
・ Plasticizer 1: Organic phosphine oxide ・ Plasticizer 2: Indene-Styrene copolymer (Nisshin Chemical Co., Ltd., NH-100S)
・カップリング剤:アニリノシラン(N-フェニル-3-アミノプロピルトリメトキシシラン、信越化学工業株式会社、商品名:KBM-573)
・着色剤:カーボンブラック(三菱ケミカル株式会社、商品名:MA-100)
・離型剤:モンタン酸エステル(株式会社セラリカNODA) In addition, the following were prepared as various additives.
Coupling agent: Anilinosilane (N-phenyl-3-aminopropyltrimethoxysilane, Shin-Etsu Chemical Co., Ltd., trade name: KBM-573)
・ Colorant: carbon black (Mitsubishi Chemical Corporation, trade name: MA-100)
-Releasing agent: Montanic acid ester (Celarika NODA)
エポキシ樹脂組成物の流動性の評価は、スパイラルフロー試験により行った。
具体的には、EMMI-1-66に準じたスパイラルフロー測定用金型を用いてエポキシ樹脂組成物を成形し、エポキシ樹脂組成物の成形物の流動距離(cm)を測定した。エポキシ樹脂組成物の成形は、トランスファー成形機を用い、金型温度180℃、成形圧力6.9MPa、硬化時間120秒の条件下で行った。また、流動性は100cm以上をAとし、100cm未満をBとした。 (Evaluation of liquidity)
The evaluation of the flowability of the epoxy resin composition was performed by a spiral flow test.
Specifically, the epoxy resin composition was molded using a spiral flow measurement mold according to EMMI-1-66, and the flow distance (cm) of the molded product of the epoxy resin composition was measured. Molding of the epoxy resin composition was performed using a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 120 seconds. Moreover, fluidity | liquidity made 100 cm or more into A, and made less than 100 cm into B.
エポキシ樹脂組成物を硬化したときの熱伝導率の評価は、下記により行った。具体的には、調製したエポキシ樹脂組成物を用いて、金型温度180℃、成形圧力7MPa、硬化時間300秒間の条件でトランスファー成形を行い、金型形状の硬化物を得た。得られた硬化物をアルキメデス法により測定した比重は3.00~3.40であった。得られた硬化物の比熱をDSC(Perkin Elmer社、DSC Pyris1)で測定した。また硬化物の熱拡散率を熱拡散率測定装置(NETZSCH社、LFA467)を用いてレーザーフラッシュ法により測定した。得られた比重、比熱、及び熱拡散率を用いてエポキシ樹脂硬化物の熱伝導率を算出した。熱伝導率は4W/(m・K)以上をAとし、4W/(m・K)未満をBとした。 (Evaluation of thermal conductivity)
The evaluation of the thermal conductivity when the epoxy resin composition was cured was performed as follows. Specifically, transfer molding was performed using the prepared epoxy resin composition under conditions of a mold temperature of 180 ° C., a molding pressure of 7 MPa, and a curing time of 300 seconds, to obtain a molded product having a mold shape. The specific gravity of the obtained cured product measured by the Archimedes method was 3.00 to 3.40. The specific heat of the obtained cured product was measured by DSC (Perkin Elmer, DSC Pyris 1). Further, the thermal diffusivity of the cured product was measured by a laser flash method using a thermal diffusivity measuring device (LFA 467, manufactured by NETZSCH). The thermal conductivity of the epoxy resin cured product was calculated using the obtained specific gravity, specific heat, and thermal diffusivity. The thermal conductivity was A at 4 W / (m · K) or more, and B at less than 4 W / (m · K).
本明細書に記載された全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に援用されて取り込まれる。 The disclosure of Japanese Patent Application No. 2017-254882 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards described herein are as specific and distinct as when individual documents, patent applications, and technical standards are incorporated by reference. Hereby incorporated by reference.
Claims (11)
- ビスフェノールF型エポキシ樹脂を含むエポキシ樹脂と、
硬化剤と、
アルミナ粒子を含みシリカ粒子を含まないか、アルミナ粒子を含みさらにシリカ粒子をアルミナ粒子とシリカ粒子の合計量に対して0質量%超15質量%以下含む無機充填材と、
可塑剤と、
を含有し、前記無機充填材の含有率が75体積%~84体積%である、
ボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 Epoxy resin containing bisphenol F type epoxy resin,
A curing agent,
An inorganic filler containing alumina particles, containing no silica particles, or containing alumina particles and further containing silica particles in an amount of more than 0% by mass and 15% by mass or less based on the total amount of the alumina particles and the silica particles;
With a plasticizer,
The content of the inorganic filler is 75% by volume to 84% by volume,
Epoxy resin composition for sealing a ball grid array package. - 前記エポキシ樹脂がさらにビフェニル型エポキシ樹脂を含む、請求項1に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 The epoxy resin composition for sealing a ball grid array package according to claim 1, wherein the epoxy resin further comprises a biphenyl type epoxy resin.
- 前記無機充填材が、アルミナ粒子を含みシリカ粒子を含まないか、アルミナ粒子を含みさらにシリカ粒子をアルミナ粒子とシリカ粒子の合計量に対して0質量%超10質量%以下含む、請求項1又は請求項2に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 The inorganic filler contains alumina particles and does not contain silica particles, or contains alumina particles and further contains silica particles in an amount of more than 0% by mass and 10% by mass or less based on the total amount of alumina particles and silica particles. The epoxy resin composition for ball grid array package sealing according to claim 2.
- 前記硬化剤が、水酸基当量150g/eq以下のフェノール硬化剤を含む、請求項1~請求項3のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 The epoxy resin composition for sealing a ball grid array package according to any one of claims 1 to 3, wherein the curing agent contains a phenol curing agent having a hydroxyl equivalent of 150 g / eq or less.
- 前記硬化剤が、1分子中に3個以上のフェノール性水酸基を有するフェノール樹脂を含む、請求項1~請求項4のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 The epoxy resin composition for sealing a ball grid array package according to any one of claims 1 to 4, wherein the curing agent contains a phenolic resin having three or more phenolic hydroxyl groups in one molecule.
- 前記硬化剤が、トリフェニルメタン型フェノール樹脂を含む、請求項1~請求項5のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 The epoxy resin composition for sealing a ball grid array package according to any one of claims 1 to 5, wherein the curing agent comprises a triphenylmethane type phenolic resin.
- 前記無機充填材の空隙率が18体積%以下である請求項1~請求項6のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 The epoxy resin composition for sealing a ball grid array package according to any one of claims 1 to 6, wherein a porosity of the inorganic filler is 18 volume% or less.
- 前記無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合が9体積%以上であり、粒子径が1μmを超え10μm以下の粒子の割合が45体積%以下であり、粒子径が10μmを超え30μm以下の粒子の割合が20体積%以上であり、粒子径が30μmを超える粒子の割合が18体積%以上である、請求項1~請求項7のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 In the volume-based particle size distribution of the inorganic filler, the proportion of particles having a particle size of 1 μm or less is 9 volume% or more, and the proportion of particles having a particle size of more than 1 μm to 10 μm is 45 volume% or less The ratio of particles having a diameter of more than 10 μm and 30 μm or less is 20% by volume or more, and the ratio of particles having a particle size of more than 30 μm is 18% by volume or more. Epoxy resin composition for sealing a ball grid array package.
- 前記無機充填材の体積基準の粒度分布における、粒子径が1μm以下の粒子の割合が11体積%以上であり、粒子径が1μmを超え10μm以下の粒子の割合が40体積%以下であり、粒子径が10μmを超え30μm以下の粒子の割合が22体積%以上であり、粒子径が30μmを超える粒子の割合が20体積%以上である請求項8に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物。 In the volume-based particle size distribution of the inorganic filler, the proportion of particles having a particle size of 1 μm or less is 11 volume% or more, and the proportion of particles having a particle size of more than 1 μm to 10 μm is 40 volume% or less 9. The epoxy resin for sealing a ball grid array package according to claim 8, wherein the proportion of particles having a diameter of more than 10 μm and not more than 30 μm is 22 volume% or more and the proportion of particles having a particle size of more than 30 μm is 20 volume% or more. Composition.
- 請求項1~請求項9のいずれか1項に記載のボールグリッドアレイパッケージ封止用エポキシ樹脂組成物を硬化してなるエポキシ樹脂硬化物。 An epoxy resin cured product obtained by curing the epoxy resin composition for sealing a ball grid array package according to any one of claims 1 to 9.
- 素子と、前記素子を封止している請求項10に記載のエポキシ樹脂硬化物と、を有し、ボールグリッドアレイパッケージの形態を有する、電子部品装置。 The electronic component apparatus which has an element and the epoxy resin hardened material of Claim 10 which has sealed the said element, and has a form of a ball grid array package.
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