WO2018034505A1 - Vacuum deposition coating method using pattern mask - Google Patents

Abstract

The present invention relates to a vacuum deposition coating method applying a pattern mask to a substrate so as to perform vacuum deposition once or multiple times, thereby maximizing a visibility effect such as haze and a reduction in the visibility of fingerprints and handprints, and enabling an aesthetic sense to be improved through a pattern design.

Description

Vacuum deposition coating method using pattern mask

The present invention relates to a vacuum deposition coating method using a pattern mask.

Mobile electronic products such as mobile phones, MP3 players, portable multimedia players (PMP), digital multimedia broadcasting (DMB) receivers, navigation, laptops, and display products such as monitors and touch screens are metal, glass, acrylic, and polycarbonate. ; PC), polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), acrylic resin (Acrylonitrile butadiene styrene copolymer), and a sheet-like panel of various resins and mixed-injection cases, windows Parts such as keypads, function key parts, and various accessories are used, and vacuum deposition coating is performed using metals and / or metal oxides for optical beauty and luxury feeling of these parts.

In particular, in the case of a mobile phone, a non-conductive dielectric thin film coating using a metal oxide instead of a metal is formed on the front and back surfaces of the case, window, keypad, and window integrated case to form a coating layer using a vacuum deposition process for the stability of call quality when using a mobile phone.

On the other hand, the anti-fingerprint coating used in the coating layer of the case, such as the anti-fingerprint coating of the hydrophobic and lipophilic properties represented by the IF (Invisibility Finger-Print) coating agent, and the water- and oil-repellent properties represented by AF (Anti-finger) coating agent The anti-fingerprint coating was used, but the IF coating agent has excellent fingerprint visibility, but is very weak in slipping and wiping, and has a problem of bleeding when wiped. In addition, when using the AF coating agent has the advantage of excellent slip properties and wipeability, but there was a disadvantage that the fingerprint visibility is poor.

In addition, as the design is more important in products such as mobile phone cases, a variety of patterns have been applied to the market, but the pattern is not directly applied to the coating layer, but the pattern is applied to the back, and no vacuum deposition method is used.

Therefore, there is a need for a vacuum deposition coating method capable of maximizing a fingerprint and fingerprint less visible effect according to a pattern and design shape while applying a top coat such as an AF coating agent and an IF coating agent.

The present invention maximizes the visibility effect such as less visible fingerprints and fingerprints and haze by performing the vacuum deposition once or multiple times by applying the pattern mask to the substrate, and the vacuum deposition coating method that can improve the aesthetics through the design of the pattern The purpose is to provide.

Vacuum deposition coating method using a pattern mask of the present invention, the step of cleaning and pre-processing the substrate; And performing one or more circuits of vacuum deposition on the substrate, wherein all or part of the vacuum deposition step is performed by applying a pattern mask.

According to the present invention, it is possible to maximize the visibility effect such as the less visible and haze of fingerprints and fingerprints, and improve the aesthetics by realizing high-quality reflection, design and color by combining the size and type of the pattern, change of thickness and multilayer coating. You can. In addition, by applying the anti-fingerprint coating to the coating method of the present invention can be maximized wipeability or visibility. The coating method of the present invention can be applied to all top coat processes of vacuum deposition, such as touch screens, display screens, surface cases, covers, etc. of home appliances, tablet PCs, and smart devices.

Figure 1 schematically shows an embodiment of the vacuum deposition coating method using a pattern mask of the present invention.

Figure 2 shows a specific example in the case of different application of the pattern mask in the vacuum deposition coating method using the pattern mask of the present invention.

Figure 3 schematically shows the visibility improvement effect according to the vacuum deposition coating method using a pattern mask of the present invention.

Figure 4 shows the handprint visibility comparison on the Bare surface, AF coated surface and IF coated surface.

Figure 5 shows a comparison of the handprint visibility on the AF coating surface is a pattern formed by the coating method of the present invention.

Figure 6 shows a comparison of the handprint visibility in the IF coating surface patterned by the coating method of the present invention.

Figure 7 shows a comparison of visibility according to the change of the pattern pattern in the coating method of the present invention.

Hereinafter, the present invention will be described in more detail.

Vacuum deposition coating method using a pattern mask of the present invention, the step of cleaning and pre-processing the substrate; And performing one or more circuits of vacuum deposition on the substrate, wherein all or part of the vacuum deposition step is performed by applying a pattern mask.

The coating method of the present invention can maximize the visibility of fingerprints and fingerprints and the visibility effects such as haze when vacuum deposition is carried out, and combines the size and type of the pattern, the thickness change and the multilayer coating to provide the advanced reflection, design and Implementing color can improve aesthetics.

Figure 1 schematically shows an embodiment of the vacuum deposition coating method using a pattern mask of the present invention, it shows a method of performing a separate coating after the vacuum deposition step to apply the cleaning and pretreatment step and the pattern.

In the cleaning and pretreatment of the substrate, a vacuum evaporator ion gun plasma or an atmospheric pressure plasma may be used, but is not particularly limited, but may be performed using a gas such as Ar, O ₂ , N ₂ , or CF ₄ .

After the step of cleaning and pretreating the substrate, the step of performing vacuum deposition on the substrate once or in a plurality of times may be performed, and all or part of the vacuum deposition step may be performed by applying a pattern mask.

The pattern mask used in the present invention may be any one of, for example, a mesh net, a perforated film in the form of a sheet, a perforated metal in the form of a sheet, and a fishnet stocking, and any pattern can be used without limitation.

The material of the pattern mask of the present invention may be selected from metal, plastic, cloth, paper and combinations thereof. Examples of the metal include Ni, stainless steel (SUS), Cu, Al, Au, Ag, Fe, W, Mo, metals including other alloys, and the like, and the plastic may include a synthetic polymer including nylon, Plastics including films (PET, PC, PP, Poly-Vinyl, etc.) can be used.

Patterns of the pattern mask of the present invention may be any one of grid pattern, honeycomb pattern, dot pattern, stripes, figure pattern (for example, circle, triangle, square, rhombus, etc.) and checkered pattern, concentric circles, wave pattern. It doesn't work.

When vacuum deposition is performed by applying a pattern in the coating method of the present invention, vacuum deposition is performed by applying any one of a vacuum deposition oxide, a metal coating agent, a surface energy control coating agent (eg anti-fingerprint coating agent), and a combination thereof. Can be.

Although not particularly limited, oxides for vacuum deposition are SiO ₂ , TiO ₂ , ZrO ₂ , CeO ₂ , Al ₂ O ₃ , MgF ₂ , MgO, Y ₂ O ₃ , HfO ₂ , ITO, Ta ₂ O ₅ , Ti ₂ O ₃ , Ti ₃ O ₅ , ZnS, ZnSe, Nb ₂ O ₅ , ZnO and combinations thereof may be used, but is not limited thereto.

In addition, the metal coating agent may be selected from Al, Si, Ni, Ti, Sn, Cr, Au, Ag, Cu, Fe, W, Mo, Y, stainless steel and combinations thereof.

Coating agents for surface energy control include water- and oil-repellent anti-fingerprint agents (e.g. AF coating agents), hydrophobic and lipophilic anti-fingerprint agents (e.g. IF coating agents), hydrophilic and oleophobic anti-fingerprint agents and hydrophobic and proprietary properties Any one selected from anti-fingerprint agents may be applied, but is not limited thereto. The water- and oil-repellent coating agent may be AF (Anti-Finger Print) consisting of a fluorine-based chain and a silane-based adhesion part. The hydrophobic and lipophilic-printing agent may be an organic carbon and silane-based adhesion part of a cycloalkylalkoxysilane. IF (Invisibility Finger-Print) coating agent may be applied. In addition, anti-fingerprinting agents having hydrophilic and oleophobic properties of less than 30 degrees based on the water contact angle, and anti-fingerprinting agents having minority and oleophobic properties around 100 degrees of the water contact angle can be applied. For example, the anti-fingerprint agent may be selected from an AF coating agent, an IF coating agent, a water repellent agent (anti-membrane agent), a hydrophilic and anti-fog coating agent, a nano primer, and a combination thereof.

In addition, the coating method of the present invention may include a step of performing a separate coating after the vacuum deposition step. The anti-fingerprint coating may be carried out by vacuum deposition or wet coating, for example, methods such as PVD (electron beam or resistive heat evaporation), wet coating (spray, dipping, spin coating) and the like. Can be used.

Figure 2 shows a specific example in the case of different application of the pattern mask in the vacuum deposition coating method using the pattern mask of the present invention, when the pattern is applied vacuum space does not occur at the position of the pattern (pattern) It can be seen that this is formed.

Step 1 is a case where a pattern is applied to every coating, and in case 2, a vacuum is applied after the pattern is applied and vacuum deposition is performed without a pattern. In the third case, vacuum deposition was performed in the first pattern-free state, and the second coating was applied by coating the second pattern, and when the second coating was formed on the first coating, or when the second pattern was applied, the ion was applied in the pattern application state. After removal of the primary coating layer at the position where there is no pattern by a dry plasma or the like, the secondary coating material is deposited at the removed position.

In the case of using the coating method of the present invention, a vacuum deposition coating having a pattern is obtained, and thus, the effect of improving visibility can be described with reference to FIG. 3. Unlike the reflection on the smooth surface where the pattern is not formed, it can be seen that the reflection of the pattern surface causes diffuse reflections in which light is refracted like reflection on the rough surface. In terms of reflectance, the amount of reflection is the same as that of the front surface on the smooth surface, but the amount of reflection is different on the surface where the pattern is formed. Therefore, the coating surface of the pattern formed by the coating method of the present invention can maximize the visibility effect such as less visible and haze of fingerprints and fingerprints.

Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples. However, the scope of the present invention is not limited to these.

 EXAMPLE

1.Compare haze value of coated surface without fingerprint

When no coating on the glass substrate as shown in Table 1 (bare surface, Reference Example 1), when coating the AF coating (Comparative Example 1-1), IF coating (Comparative Example 1-2) Specimens were prepared and measured for haze (Hazemeter: Nippon denshoku Co., Ltd. SH-7000).

The glass substrate used tempered glass for the front cover for smartphones made of Corning's Gorilla 3 fabric. AF coating was carried out in a vacuum evaporator with a chamber size of 2050 mm, temperature 80 degrees, 5 minutes after ion gun pretreatment using SiO gas, 5 nm of SiO ₂ , and IF coating was also coated in the same process as AF coating. The degree of vacuum during coating is 8 × 10 ^- it was carried out in more than ⁵ torr.

ΔE is the amount of change in haze of the comparative example compared to Reference Example 1, and it was found that the difference in Haze value before the fingerprint (fingerprint) was not large on the surface without a pattern.

2. Comparison of haze value of coated surface with fingerprint

When there are handprints (fingerprints) without any coating on the glass substrate as shown in Table 1 (bare surface + handprints (fingerprint), Reference Example 2), when there are handprints (fingerprints) on the AF coating surface (Comparative Example 2- 1), a specimen was prepared on the IF coating surface (fingerprint) (Comparative Example 2-2) and the haze was measured.

The glass substrate used tempered glass for the front cover for smartphones made of Corning's Gorilla 3 fabric. AF coating was carried out in a vacuum evaporator with a chamber size of 2050 mm, temperature 80 degrees, 5 minutes after ion gun pretreatment using SiO gas, 5 nm of SiO ₂ , and IF coating was also coated in the same process as AF coating. The degree of vacuum during coating is 8 × 10 ^- it was carried out in more than ⁵ torr.

In addition, the handprint visibility comparison pictures on the Bare surface, AF coating surface and IF coating surface is shown in FIG.

Fingerprint visibility was compared with Haze measurements after 10 cumulative fingerprints.

ΔE is a change in haze of the comparative example compared to Reference Example 2, and the Haze value at the water- and oil-repellent AF coating surface was larger than the Haze value at the hydrophobic and lipophilic IF coating surface. Meant that the visibility was bad. In other words, it can be seen that the smaller the difference between the Haze value between the portion of the fingerprint or fingerprint and the surrounding surface, the better the visibility.

3. Comparison of haze value when fingerprint is on patterned AF coating surface

As shown in Table 1, when the fingerprint (fingerprint) was present on the surface of the AF coating (Reference Example 3), the fingerprint (fingerprint) was deposited on the surface of the AF coating on which patterns of 100 µm, 200 µm, 300 µm, 600 µm and 850 µm were formed, respectively. Specimens were prepared (Examples 3-1 to 3-5), and the haze was measured. In addition, it is shown in Figure 5 the comparison of the handprint visibility on the AF coating surface patterned by the coating method of the present invention. (Compared to AF vs pattern (lattice pattern, lattice size 850㎛, TiO ₂ 20nm thickness deposition) + AF) As can be seen in Fig. 5, it can be seen that it is clearer due to the effect of decreasing Haze on the patterned side. Can be.

In the present embodiment, the glass substrate used tempered glass for the front cover of the smartphone processed by Corning's Gorilla 3 fabric. In a vacuum evaporator with a chamber size of 2050 mm, a temperature of 80 ° C, an ion gun pretreatment using Ar gas first, 5 minutes, a grid pattern mask (by grid scale size), TiO ₂ 20 nm coating, vacuum vent (Vent), grid pattern After removing the mask, only the AF coating on the front of the secondary, without ion gun pretreatment in the same equipment. The degree of vacuum during coating was carried out at 8 × 10 ⁻⁵ torr or more.

ΔE represents the amount of change in haze of the example compared with Reference Example 3.

4. Comparison of haze value when fingerprint is on patterned IF coating

As shown in Table 1, when the fingerprint (fingerprint) is present on the IF coating surface (Reference Example 4), the fingerprint (fingerprint) is deposited on the IF coating surface on which the 100 µm, 200 µm, 300 µm, 600 µm and 850 µm patterns are formed, respectively. Specimens were prepared, if any (Examples 4-1 to 4-5), and haze was measured. In addition, the comparison of the handprint visibility in the IF coating surface patterned by the coating method of the present invention is shown in FIG. (IF vs pattern (lattice pattern, lattice size 850㎛, TiO ₂ 20nm thickness deposition) + IF comparison) As can be seen in Figure 6, it appears clearer due to the effect of decreasing Haze on the side with the pattern relatively Can be.

In the present embodiment, the glass substrate used tempered glass for the front cover of the smartphone processed by Corning's Gorilla 3 fabric. In a vacuum evaporator with a chamber size of 2050 mm, a temperature of 80 ° C, an ion gun pretreatment using Ar gas first, 5 minutes, a grid pattern mask (by grid scale size), TiO ₂ 20 nm coating, vacuum vent (Vent), grid pattern After removing the mask, only the IF coating was performed on the front side of the second equipment without the ion gun pretreatment. The degree of vacuum during coating was carried out at 8 × 10 ⁻⁵ torr or more.

ΔE represents the amount of change in haze of the example compared to Reference Example 4.

As can be seen from Table 1, since the Haze value of the fingerprint or fingerprint was measured lower on the surface to which the pattern was applied, it was found that the pattern contributed to visibility. In addition, the surface to which the AF coating agent is applied exhibits a higher Haze value than the surface to which the IF coating agent is applied. However, when the pattern is applied by the coating method of the present invention, the decrease in Haze value is larger, and thus the visibility improvement effect is greater. there was.

Table 1

In addition, Figure 7 shows a comparison of visibility according to the change of the pattern pattern in the coating method of the present invention. In addition, if only the mask pattern is changed, various patterns and various kinds of expressions can be expressed according to the type and thickness of the coating material.

Claims (8)

1. Cleaning and pretreating the substrate; And

   Performing one or more circuits of vacuum deposition on the substrate,

   All or part of the vacuum deposition step is performed by applying a pattern mask,

   Vacuum deposition coating method using a pattern mask.
2. The method of claim 1, wherein the pattern mask is any one of a mesh net, a perforated film in sheet form, a perforated metal in sheet form, and a mesh stocking.
3. The method of claim 1, wherein the pattern of the pattern mask is any one of a lattice pattern, a honeycomb pattern, a dot pattern, a stripe pattern, a graphic pattern, and a check pattern, a concentric circle, and a wavy pattern.
4. The method of claim 1, wherein the material of the pattern mask is selected from metal, plastic, cloth, paper, and combinations thereof.
5. The vacuum deposition coating method of claim 1, wherein the vacuum deposition is performed by applying any one of a vacuum deposition oxide, a metal coating agent, a surface energy control coating agent, and a combination thereof.
6. The method of claim 5, wherein the vacuum deposition oxide is SiO ₂ , TiO ₂ , ZrO ₂ , CeO ₂ , Al ₂ O ₃ , MgF ₂ , MgO, Y ₂ O ₃ , HfO ₂ , ITO, Ta ₂ O ₅ , Ti ₂ O ₃ , Ti ₃ O ₅ , ZnS, ZnSe, Nb ₂ O ₅ , ZnO and a combination thereof, vacuum deposition coating method using a pattern mask.
7. The pattern mask of claim 5, wherein the metal coating agent is selected from Al, Si, Ni, Ti, Sn, Cr, Au, Ag, Cu, Fe, W, Mo, Y, stainless steel, and combinations thereof. Vacuum deposition coating method using.
8. The coating agent for surface energy control according to claim 5, wherein the coating agent for surface energy control is selected from water- and oil-repellent anti-fingerprint coatings, hydrophobic and lipophilic anti-fingerprint coatings, hydrophilic and oleophobic coatings and hydrophobic and oleophobic coatings. Vacuum deposition coating method using phosphorus, pattern mask.

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