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WO2017185447A1 - 彩膜基板的制作方法和液晶面板的制作方法 - Google Patents

彩膜基板的制作方法和液晶面板的制作方法 Download PDF

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Publication number
WO2017185447A1
WO2017185447A1 PCT/CN2016/083648 CN2016083648W WO2017185447A1 WO 2017185447 A1 WO2017185447 A1 WO 2017185447A1 CN 2016083648 W CN2016083648 W CN 2016083648W WO 2017185447 A1 WO2017185447 A1 WO 2017185447A1
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PCT/CN2016/083648
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English (en)
French (fr)
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贺晖
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深圳市华星光电技术有限公司
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Priority to KR1020187034059A priority Critical patent/KR102170393B1/ko
Priority to JP2018556337A priority patent/JP6691974B2/ja
Priority to US15/110,095 priority patent/US10048531B2/en
Publication of WO2017185447A1 publication Critical patent/WO2017185447A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G02F1/13415—Drop filling process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a method for fabricating a color filter substrate and a method for fabricating the liquid crystal panel.
  • a Thin Film Transistor-Liquid Crystal Display includes a color filter substrate (Color Substrate, CF Substrate) and a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate), and a transparent electrode is present on the opposite side of the substrate.
  • a layer of liquid crystal molecules (Liquid Crystal, LC) is sandwiched between the two substrates.
  • the liquid crystal display controls the orientation of the liquid crystal molecules by the electric field, changes the polarization state of the light, and realizes the purpose of display by the penetration and blocking of the optical path by the polarizing plate.
  • the color film substrate is a key component for colorization of the liquid crystal display.
  • the color film substrate is manufactured by sequentially coating and exposing a black matrix material, a red, green, and blue light-resisting material, and fabricating a spacer.
  • the method has many production steps, complicated production process and low production efficiency.
  • the technical problem to be solved by the present invention is to provide a method for fabricating a liquid crystal panel, which reduces the manufacturing process of the liquid crystal panel and reduces the manufacturing cost by simplifying the manufacturing process of the color filter substrate.
  • the present invention provides a method of fabricating a color film substrate, including:
  • the colors of the three layers of photoresist materials are red, green, and blue, respectively, forming a red block and a green block during the coating and exposing steps.
  • a block and a blue block and at the same time, forming a light shielding layer by mixing the two different colors of the photoresist material, and passing through at least two of the three layers of photoresist
  • the stack of photoresist materials of different colors forms a spacer layer.
  • the step of “coating and exposing the three layers of photoresist material on the first substrate respectively” comprises: coating a red photoresist material and exposing the light to form the red block, the red spacer block, and the first portion located in the light shielding region.
  • a color resist layer coating a green photoresist material and exposing and developing to form the green block; and coating the blue photoresist material and exposing and developing to form a blue block, a blue block, and the light shielding region a second color resist layer; wherein: the red photoresist material of the first color resist layer and the blue photoresist material of the second color resist layer are mixed in the light shielding region to form a light shielding layer; A spacer is stacked with the red spacer to form the spacer layer.
  • the red block, the green block and the blue block are formed by full-through reticle exposure.
  • first color resist layer and the second color resist layer are both formed by exposure of a semi-transmissive reticle, and the light shielding layer formed by mixing the first color resist layer and the second color resist layer
  • the height is the same as the height of the red block.
  • the spacer layer comprises a main spacer layer and a secondary spacer layer which are staggered in position, and the main spacer layer forms a red main spacer by exposing the red photoresist material to the full-transmissive mask.
  • the main spacer layer forms a blue main spacer by exposing the blue photoresist material to a full-transmissive reticle, and the blue main spacer and the red main spacer are stacked to form the a main spacer layer
  • the auxiliary spacer layer is formed by forming a red auxiliary spacer by exposing the red photoresist material to a semi-transmissive reticle, and the auxiliary spacer layer is semipermeable through the blue photoresist material
  • the reticle is exposed to form a blue auxiliary spacer, and the blue auxiliary spacer and the red auxiliary spacer are stacked to form the auxiliary spacer.
  • the height of the main spacer layer is 3.2 um to 3.7 um.
  • the transmissive ray has a transmittance of 20% to 50%.
  • the light shielding layer is formed by mixing a red photoresist material and a blue photoresist material or a red photoresist material and a green photoresist material during coating exposure, and the light shielding layer is black.
  • the spacer layer comprises a main spacer layer and a secondary spacer layer which are staggered in position, and the main spacer
  • the underlayer is formed by stacking the two different colors of the photoresist material exposed by a full-transmissive reticle, the auxiliary spacer layer being formed by at least two different colors formed by exposure using a semi-transmissive reticle
  • the barrier materials are stacked.
  • the present invention provides a method of fabricating a liquid crystal panel, comprising the method of fabricating a color filter substrate according to any one of the preceding claims; dropping liquid crystal onto the color filter substrate; and bonding the second substrate to The color filter substrate is bonded using a sealant between an edge region of the second substrate and an edge region of the first substrate.
  • the color filter substrate of the liquid crystal panel provided by the present invention is produced by a method in which two layers of photoresist materials are mixed to form a light shielding layer, and a plurality of photoresist materials are mixed to form a spacer layer.
  • the manufacturing method of the liquid crystal panel has fewer steps, is simple in operation, and obtains a good expected effect while saving manufacturing costs.
  • FIG. 1 is a top plan view showing a structure of a color filter substrate of a liquid crystal panel according to a first embodiment of the present invention.
  • step 1 of a method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention is a plan view of step 1 of a method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG 3 is a cross-sectional view along line A-A of step 1 of a method for fabricating a liquid crystal panel according to a first embodiment of the present invention.
  • FIG 4 is a cross-sectional view taken along line B-B of step 1 of a method for fabricating a liquid crystal panel according to a first embodiment of the present invention.
  • FIG. 5 is a plan view of step 2 of a method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 6 is a cross-sectional view along line A-A of step 2 of the method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 7 is a cross-sectional view taken along line B-B of step 2 of the method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 8 is a plan view of step 3 of a method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 9 is a cross-sectional view along line A-A of step 3 of the method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 10 is a cross-sectional view along line B-B of step 3 of the method for fabricating a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 11 is a cross-sectional view showing the structure of a liquid crystal panel according to Embodiment 1 of the present invention.
  • FIG. 12 is a cross-sectional view showing a color filter substrate of a liquid crystal panel according to Embodiment 2 of the present invention.
  • the color filter substrate includes a monochromatic resist layer 10, a light shielding layer 20, a main spacer layer 32, and a secondary spacer layer 34. .
  • the primary septum 32 and the secondary septum 34 are collectively referred to as a septum layer. In one embodiment, the primary septum 32 and the secondary septum 34 are of a height difference.
  • the monochromatic resistive layer 10 includes a red resist block 102, a green block 104 and a blue block 106, and each color block of the monochromatic resist layer 10 (ie, the red block 102, the green block 104, and the blue block 106). They are separated by a light shielding layer 20.
  • the spacer layer functions as a support in the liquid crystal panel.
  • the present invention separately applies and exposes three layers of photoresist materials on a first substrate 1 .
  • the color of the three-layer photoresist material is red, green, and blue, respectively, and a red block 102, a green block 104, and a blue block 106 are formed during the coating and exposure steps, and at the same time, through the three layers.
  • the mixing or stacking of the two different colors of the photoresist material in the photoresist material forms the light shielding layer 20 and the spacer layer.
  • Step 1 please apply a red photoresist material on the first substrate 1 in combination with FIG. 2 to FIG. 4, and expose the first substrate 1 coated with the red photoresist material to form a red color on the first substrate 1.
  • the red block 102 and the red main spacer 322 are formed by the full-transmissive reticle exposure
  • the first color resist layer 202 and the red auxiliary spacer 342 are formed by the semi-transmissive reticle exposure.
  • the transmissive mask has a transmittance of 20% to 50%. .
  • the number of the red block 102, the red main spacer 322, the red auxiliary spacer 342, and the first color resist layer 202 are both plural and distributed in an array.
  • 2 is a top plan view of a portion of the first substrate 1.
  • the first row includes two first color resist layers 202 spaced apart from each other.
  • One of the first color resist layers 202 is connected to the side of the red block 102, and the other side of the other first color resist layer 202 forms the exposed area of the first substrate 1.
  • the exposed area of the first substrate 1 is used to form a green block and Blue Color block.
  • the red main spacer block 322 and the red auxiliary spacer block 342 are distributed at the position of the first color resist layer 202.
  • the height of the first color resist layer 202 is half of the red block 102, and the surface of the first color resist layer 202 is used to form color resists of other colors to form a blackout by mixing colors of different colors.
  • the height of the red main spacer 322 is the same as that of the red block 102, and the height of the red auxiliary spacer 342 is lower than that of the red block 102.
  • Step 2 in combination with FIG. 5 to FIG. 7, a green photoresist material is coated on the first substrate 1, and the first substrate 1 coated with the green photoresist material is exposed and developed to form a green color on the first substrate 1.
  • Block 104 In one embodiment, the green block 104 is formed by full-through reticle exposure.
  • the number of green blocks 104 is plural and distributed in an array.
  • 5 is a top plan view of a portion of the first substrate 1. The first behavior example will be described.
  • the green block 104 is disposed in the middle of the two first color resist layers 202.
  • the height of the green block 104 is twice that of the first color resist layer 202. As shown in FIG. 7, the height of the green block 104 is the same as the height of the red block 102 and the red main block 322.
  • Step 3 in combination with FIG. 8 to FIG. 10, a blue photoresist material is coated on the first substrate 1, and the first substrate 1 coated with the red photoresist material and the green photoresist material is exposed and developed to be in the first step.
  • a blue block 106, a blue main spacer 326, a second color resist layer 206 and a blue auxiliary spacer 346 are disposed on the substrate 1.
  • the blue block 106 and the blue main spacer 326 are formed by the full-transmissive reticle exposure
  • the second color resist layer 206 and the blue auxiliary spacer are formed by the semi-transmissive reticle exposure. 346.
  • the transmissive mask has a transmittance of 20% to 50%.
  • FIG. 8 is a plan view showing a part of the first substrate 1. The first behavior example will be described.
  • the blue block 106 is disposed on the right side of the second color resist layer 206.
  • the second color resist layer 206 has a height of half of the blue block 106, and the second color resist layer 206 is formed on the surface of the first color resist layer 202, and the second color resist layer 206 and the first color resist layer. 202 is mixed to form the light shielding layer 20 (see Fig. 11).
  • the height of the blue main spacer 326 is the same as that of the blue block 106, and the blue main spacer 326 is formed on the surface of the red main spacer 322, and the blue main spacer 326 and the red main
  • the spacer blocks 322 are stacked to form a main spacer layer 32 (see FIG. 11), and the height of the main spacer layer is 3.2 um to 3.7 um.
  • the height of the blue auxiliary spacer 346 is the same as the height of the red auxiliary spacer 342, and the blue auxiliary spacer 346 is formed on the surface of the red auxiliary spacer 342, the blue auxiliary spacer 346 and the red
  • the color auxiliary spacer blocks 342 are stacked to form a secondary spacer layer 34 (see FIG. 11).
  • the height of the light shielding layer 20 is the same as the height of the monochrome resist layer 10.
  • the secondary spacer layer 34 has a lower height than the primary spacer layer 32, forming a height difference.
  • the light-shielding layer 20 formed by mixing the second color resist layer 206 and the first color resist layer 202 in the light-shielding region is black.
  • the present invention may also adopt the first color resist layer 202 and the semi-transparent layer in the light-shielding region.
  • the green photoresist material exposed by the reticle is mixed to form a black light shielding layer.
  • the light shielding layer 20 is formed by mixing of the color resist layers, and the main spacer is formed by stacking the color resist layers.
  • the layer 32 and the auxiliary spacer layer 34 therefore, the first substrate 1 is formed into a color film substrate by three times of coating exposure, which saves process steps and reduces manufacturing costs.
  • Step 4 dropping the liquid crystal 3 onto the color filter substrate, and bonding the second substrate 2 to the color filter substrate, and bonding the adhesive layer 4 between the edge region of the second substrate 2 and the edge region of the first substrate 1 .
  • the second substrate 2 is an array substrate.
  • the method for fabricating the liquid crystal panel provided by the first embodiment of the present invention has fewer steps, and the first color resist layer 202 and the second color resist layer 206 in the light shielding region are mixed to form the light shielding layer 20, the red main spacer block 322 and the blue main layer.
  • the liquid crystal panel includes a first substrate 1 and a second substrate 2 stacked thereon, and a liquid crystal 3 disposed therebetween.
  • the first substrate 1 A monochromatic resist layer 10, a light shielding layer 20, a main spacer layer 32 and a secondary spacer layer 34 are further disposed between the second substrate 2 and the edge region of the second substrate 2 and the edge region of the first substrate 1. Bonded by the sealant 4.
  • the liquid crystal panel can achieve a good expected effect while being inexpensive to manufacture.
  • the liquid crystal panel provided by the second embodiment of the present invention is different in that the auxiliary spacer layer 34 is composed of a red auxiliary spacer 342.
  • the green auxiliary spacer block 344 and the blue auxiliary spacer block 346 are stacked. That is to say, the auxiliary spacer layer 34 of the present invention may be formed by stacking at least two different color photoresist materials.
  • the main spacer layer 32 may have a similar design.
  • the red auxiliary spacer 342, the green auxiliary spacer 344 and the blue auxiliary spacer 346 are each formed by exposure of a monochromatic photoresist material through a translucent reticle. This liquid crystal panel manufacturing process is small, and the material cost of a liquid crystal panel can be reduced.

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Abstract

一种彩膜基板的制作方法，包括：在第一基板（1）上分别涂布及曝光三层光阻材料，三层光阻材料的颜色分别为红、绿、蓝，在涂布及曝光步骤过程中形成红色阻块（102）、绿色阻块（104）及蓝色阻块（106），同时，通过三层光阻材料之中的两种不同颜色的光阻材料的混合形成遮光层（20），通过三层光阻材料之中的至少两种不同颜色的光阻材料的堆叠形成隔垫层。还提供了一种液晶面板的制作方法。通过简化彩膜基板的制造过程，减少了液晶面板的制造工序，降低了制造成本。

Description

彩膜基板的制作方法和液晶面板的制作方法
本申请要求2016年4月26日递交的发明名称为“彩膜基板的制作方法和液晶面板的制作方法”的申请号201610270239.X的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及液晶显示技术领域，特别是涉及一种彩膜基板的制作方法及液晶面板的制作方法。
背景技术
薄膜晶体管液晶显示器(ThinFilmTransistor-LiquidCrystalDisplay，TFT-LCD)包含彩色滤光片基板(ColorFilterSubstrate，CFSubstrate，)和薄膜晶体管阵列基板(ThinFilmTransistorSubstrate，TFTSubstrate)，基板相对内侧存在透明电极。两片基板之间夹一层液晶分子(LiquidCrystal，LC)。液晶显示器是通过电场对液晶分子取向的控制，改变光的偏振状态，并藉由偏光板实现光路的穿透与阻挡，实现显示的目的。
彩膜基板为液晶显示器彩色化的关键零组件，现有技术中，彩膜基板的制造方法是分别依次涂布和曝光黑色矩阵材料、红、绿、蓝光阻材料及制作间隔柱。该方法制作步骤较多，制作工艺复杂，生产效率较低。
随着现代显示技术的发展，如何能够使得液晶面板的制造过程中的工序尽量减少，以节约制造成本，为业界所研究的方向。
发明内容
本发明所要解决的技术问题在于提供一种液晶面板的制作方法，通过简化彩膜基板的制造过程，减少液晶面板的制造工序，降低制造成本。
为了实现上述目的，本发明实施方式提供如下技术方案：
一方面，本发明提供一种彩膜基板的制作方法，包括：
在第一基板上分别涂布及曝光三层光阻材料，所述三层光阻材料的颜色分别为红、绿、蓝，在所述涂布及曝光步骤过程中形成红色阻块、绿色阻块及蓝色阻块，同时，通过所述三层光阻材料之中的两种不同颜色的所述光阻材料的混合形成遮光层，通过所述三层光阻材料之中的至少两种不同颜色的所述光阻材料的堆叠形成隔垫层。
进一步，“在第一基板上分别涂布及曝光三层光阻材料”的步骤包括：涂布红色光阻材料并曝光显影，形成所述红色阻块、红色隔垫块及位于遮光区域的第一色阻层；涂布绿色光阻材料并曝光显影，形成所述绿色阻块；及涂布蓝色光阻材料并曝光显影，形成蓝色阻块、蓝色隔垫块及位于所述遮光区域的第二色阻层；其中：所述第一色阻层的红色光阻材料和所述第二色阻层的蓝色光阻材料在所述遮光区域内混合形成遮光层；所述蓝色隔垫块与所述红色隔垫块堆叠形成所述隔垫层。
进一步，所述红色阻块、所述绿色组块及所述蓝色阻块均采用全透式光罩曝光形成。
进一步，所述第一色阻层与所述第二色阻层均采用半透式光罩曝光形成，所述第一色阻层与所述第二色阻层混合后形成的所述遮光层与所述红色阻块的高度相同。
进一步，所述隔垫层包括位置交错排列的主隔垫层与辅隔垫层，所述主隔垫层通过对所述红色光阻材料进行全透式光罩曝光形成红色主隔垫块，所述主隔垫层通过对所述蓝色光阻材料进行全透式光罩曝光形成蓝色主隔垫块，所述蓝色主隔垫块与所述红色主隔垫块堆叠后形成所述主隔垫层，所述辅隔垫层通过对所述红色光阻材料进行半透式光罩曝光形成红色辅隔垫块，所述辅隔垫层通过对所述蓝色光阻材料进行半透式光罩曝光形成蓝色辅隔垫块，所述蓝色辅隔垫块与所述红色辅隔垫块堆叠后形成所述辅隔垫层。
进一步，所述主隔垫层高度为3.2um～3.7um。
进一步，所述半透式光罩的透过率为20％～50％。
进一步，所述遮光层通过涂布曝光的过程中对红色光阻材料和蓝色光阻材料混合或者红色光阻材料和绿色光阻材料混合形成，所述遮光层呈黑色。
进一步，所述隔垫层包括位置交错排列的主隔垫层与辅隔垫层，所述主隔 垫层由采用全透式光罩曝光的两种不同颜色的所述光阻材料堆叠而成，所述辅隔垫层由采用半透式光罩曝光形成的至少两种不同颜色的所述光阻材料堆叠而成。
另一方面，本发明还提供一种液晶面板的制作方法，包括上述任意一项所述的彩膜基板的制作方法；在所述彩膜基板上滴入液晶；及将第二基板贴合至所述彩膜基板，在所述第二基板的边缘区域与所述第一基板的边缘区域之间使用框胶粘合。
本发明提供的液晶面板的彩膜基板使用两层光阻材料混合形成遮光层、多层光阻材料混合形成隔垫层的方法制成。该液晶面板的制作方法工序较少，操作简单，获得良好预期效果的同时节约制造成本。
附图说明
为了更清楚地说明本发明的技术方案，下面将对实施方式中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以如这些附图获得其他的附图。
图1为本发明实施例一提供的液晶面板的彩膜基板的结构俯视图。
图2为本发明实施例一提供的液晶面板的制作方法步骤1的俯视图。
图3为本发明实施例一提供的液晶面板的制作方法步骤1的A-A截面图。
图4为本发明实施例一提供的液晶面板的制作方法步骤1的B-B截面图。
图5为本发明实施例一提供的液晶面板的制作方法步骤2的俯视图。
图6为本发明实施例一提供的液晶面板的制作方法步骤2的A-A截面图。
图7为本发明实施例一提供的液晶面板的制作方法步骤2的B-B截面图。
图8为本发明实施例一提供的液晶面板的制作方法步骤3的俯视图。
图9为本发明实施例一提供的液晶面板的制作方法步骤3的A-A截面图。
图10为本发明实施例一提供的液晶面板的制作方法步骤3的B-B截面图。
图11为本发明实施例一提供的液晶面板结构截面图。
图12为本发明实施例二提供的液晶面板的彩膜基板截面图。
具体实施方式
下面将结合本发明实施方式中的附图，对本发明实施方式中的技术方案进行清楚、完整地描述。
图1为本发明实施例一提供的液晶面板的彩膜基板的结构俯视图，如图所示，彩膜基板包括单色阻层10、遮光层20、主隔垫层32及辅隔垫层34。主隔垫层32和辅隔垫层34统称为隔垫层，一种实施方式中，主隔垫层32及辅隔垫层34是存在高度差的。其中单色阻层10包括红色阻块102、绿色阻块104及蓝色阻块106，单色阻层10之各色阻块(即红色阻块102、绿色阻块104及蓝色阻块106)之间被遮光层20分隔开来。隔垫层在液晶面板中起到支撑的作用。
请参考图2至图10，本发明实施例一提供的一种彩膜基板的制作方法及液晶面板的制作方法，本发明在第一基板1上分别涂布及曝光三层光阻材料，所述三层光阻材料的颜色分别为红、绿、蓝，在所述涂面及曝光步骤过程中形成红色阻块102、绿色阻块104及蓝色阻块106，同时，通过所述三层光阻材料之中的两种不同颜色的所述光阻材料的混合或堆叠形成遮光层20及隔垫层。
一种实施方式中，本发明之具体步骤如下：
步骤1、请结合图2至图4，在第一基板1上涂布红色光阻材料，对涂布有红色光阻材料的第一基板1进行曝光显影，以在第一基板1上形成红色阻块102、红色主隔垫块322、红色辅隔垫块342及位于遮光区域的第一色阻层202。一种实施方式中，通过全透式光罩曝光形成红色阻块102、红色主隔垫块322，同时通过半透式光罩曝光形成第一色阻层202及红色辅隔垫块342。其中半透过式光罩的透过率为20％～50％。。
红色阻块102、红色主隔垫块322、红色辅隔垫块342及第一色阻层202的数量均为多个，且呈阵列分布。图2所示为第一基板1的局部的俯视图，以第一行为例进行说明，第一行包括两个第一色阻层202，二者彼此间隔设置。其中一个第一色阻层202连接于红色阻块102的侧边，另一个第一色阻层202的两侧形成第一基板1裸露区域，第一基板1裸露区域用于制作绿色阻块和蓝 色阻块。红色主隔垫块322、红色辅隔垫块342分布在第一色阻层202位置处。
如图3所示，第一色阻层202的高度为红色阻块102的一半，第一色阻层202的表面用于形成其它颜色的色阻，以通过不同颜色的色阻的混合形成遮光功能。如图4所示，红色主隔垫块322的高度与红色阻块102相同，红色辅隔垫块342的高度低于红色阻块102。
步骤2、请结合图5至图7，在第一基板1上涂布绿色光阻材料，对涂布有绿色光阻材料的第一基板1进行曝光显影，以在第一基板1上形成绿色阻块104。一种实施方式中，通过全透式光罩曝光形成绿色阻块104。
绿色阻块104的数量为多个，且呈阵列分布。图5所示为第一基板1的局部的俯视图，以第一行为例进行说明，绿色阻块104设置在两个第一色阻层202的中间。
如图6所示，绿色阻块104的高度为第一色阻层202的两倍。如图7所示，绿色阻块104的高度与红色阻块102、红色主隔垫块322的高度均相同。
步骤3、请结合图8至图10，在第一基板1上涂布蓝色光阻材料，对涂布有红色光阻材料和绿色光阻材料的第一基板1进行曝光显影，以在第一基板1上形成蓝色阻块106、蓝色主隔垫块326、位于遮光区域的第二色阻层206及蓝色辅隔垫块346。一种实施方式中，通过全透式光罩曝光形成蓝色阻块106、蓝色主隔垫块326，同时通过半透式光罩曝光形成第二色阻层206、蓝色辅隔垫块346。其中半透过式光罩的透过率为20％～50％。
蓝色阻块106、蓝色主隔垫块326、蓝色辅隔垫块346及第二色阻层206的数量均为多个，且呈阵列分布。图8所示为第一基板1的局部的俯视图，以第一行为例进行说明，蓝色阻块106设置在第二色阻层206的右侧。
结合图9，第二色阻层206的高度为蓝色阻块106的一半，且第二色阻层206形成在第一色阻层202表面，第二色阻层206与第一色阻层202混合形成遮光层20(请参阅图11)。结合图10，蓝色主隔垫块326的高度与蓝色阻块106相同，且蓝色主隔垫块326形成在红色主隔垫块322的表面，蓝色主隔垫块326与红色主隔垫块322堆叠形成主隔垫层32(请参阅图11)，主隔垫层高度为3.2um～3.7um。蓝色辅隔垫块346的高度与红色辅隔垫块342的高度相同，且蓝色辅隔垫块346形成在红色辅隔垫块342的表面，蓝色辅隔垫块346和红 色辅隔垫块342堆叠形成辅隔垫层34(请参阅图11)。遮光层20的高度与单色阻层10的高度相同。辅隔垫层34的高度低于主隔垫层32，形成高度差。
位于遮光区域的第二色阻层206与第一色阻层202混合形成的遮光层20呈黑色，其它实施方式中，本发明也可以通过第一色阻层202和在遮光区域采用半透式光罩曝光的绿色光阻材料混合形成黑色的遮光层。
本发明通过在第一基板1上依次涂布及曝光三层光阻材料，在涂布及曝光的过程中，通过色阻层的混合形成遮光层20，通过色阻层的堆叠形成主隔垫层32及辅隔垫层34，因此，通过三次的涂布曝光就将第一基板1制成了彩膜基板，节约工艺步骤，降低制造成本。
步骤4、在彩膜基板上滴入液晶3，并将第二基板2贴合至彩膜基板，在第二基板2的边缘区域与第一基板1的边缘区域之间使用框胶4粘合。第二基板2为阵列基板。
本发明实施例一提供的液晶面板的制作方法工序较少，使用位于遮光区域的第一色阻层202与第二色阻层206混合形成遮光层20、红色主隔垫块322与蓝色主隔垫块326堆叠形成主隔垫层32、红色辅隔垫块342与蓝色辅隔垫块346堆叠形成辅隔垫层34的方法将制造过程简化，节省材料成本。
图11为本发明实施例一提供的液晶面板结构截面图，如图所示，液晶面板包括层叠设置第一基板1和第二基板2以及设于二者之间的液晶3，第一基板1和第二基板2之间还设有单色阻层10、遮光层20、主隔垫层32及辅隔垫层34，在第二基板2的边缘区域、第一基板1的边缘区域之间通过框胶4粘合。该液晶面板可以获得良好预期效果的同时制造成本较低。
图12为本发明实施例二提供的液晶面板的彩膜基板截面图，如图所示，与本发明实施例二提供的液晶面板的区别在于，辅隔垫层34由红色辅隔垫块342、绿色辅隔垫块344及蓝色辅隔垫块346堆叠而成。也就是说本发明之辅隔垫层34可以由至少两种不同颜色的光阻材料堆叠而成，当然主隔垫层32也可以有类似的设计。红色辅隔垫块342、绿色辅隔垫层344及蓝色辅隔垫块346均由单色光阻材料通过半透式光罩曝光形成。该液晶面板制造工序少，可以降低液晶面板的材料成本。
以上所述是本发明的优选实施方式，应当指出，对于本技术领域的普通技 术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也视为本发明的保护范围。

Claims (18)

  1. 一种彩膜基板的制作方法，其中，包括：
    在第一基板上分别涂布及曝光三层光阻材料，所述三层光阻材料的颜色分别为红、绿、蓝，在所述涂布及曝光步骤过程中形成红色阻块、绿色阻块及蓝色阻块，同时，通过所述三层光阻材料之中的两种不同颜色的所述光阻材料的混合形成遮光层，通过所述三层光阻材料之中的至少两种不同颜色的所述光阻材料的堆叠形成隔垫层。
  2. 如权利要求1所述的彩膜基板的制作方法，其中，“在第一基板上分别涂布及曝光三层光阻材料”的步骤包括：涂布红色光阻材料并曝光显影，形成所述红色阻块、红色隔垫块及位于遮光区域的第一色阻层；涂布绿色光阻材料并曝光显影，形成所述绿色阻块；及涂布蓝色光阻材料并曝光显影，形成蓝色阻块、蓝色隔垫块及位于所述遮光区域的第二色阻层；其中：所述第一色阻层的红色光阻材料和所述第二色阻层的蓝色光阻材料在所述遮光区域内混合形成遮光层；所述蓝色隔垫块与所述红色隔垫块堆叠形成所述隔垫层。
  3. 如权利要求2所述的彩膜基板的制作方法，其中，所述红色阻块、所述绿色组块及所述蓝色阻块均采用全透式光罩曝光形成。
  4. 如权利要求3所述的彩膜基板的制作方法，其中，所述第一色阻层与所述第二色阻层均采用半透式光罩曝光形成，所述遮光层与所述红色阻块的高度相同。
  5. 如权利要求2所述的彩膜基板的制作方法，其中，所述隔垫层包括位置交错排列的主隔垫层与辅隔垫层，所述主隔垫层通过对所述红色光阻材料进行全透式光罩曝光形成红色主隔垫块，所述主隔垫层通过对所述蓝色光阻材料进行全透式光罩曝光形成蓝色主隔垫块，所述蓝色主隔垫块与所述红色主隔垫块堆叠后形成所述主隔垫层，所述辅隔垫层通过对所述红色光阻材料进行半透式光罩曝光形成红色辅隔垫块，所述辅隔垫层通过对所述蓝色光阻材料进行半透式光罩曝光形成蓝色辅隔垫块，所述蓝色辅隔垫块与所述红色辅隔垫块堆叠后形成所述辅隔垫层。
  6. 如权利要求5所述的彩膜基板的制作方法，其中，所述主隔垫层高度为 3.2um～3.7um。
  7. 如权利要求5所述的彩膜基板的制作方法，其中，所述半透式光罩的透过率为20％～50％。
  8. 如权利要求1所述的彩膜基板的制作方法，其中，所述遮光层通过涂布曝光的过程中对红色光阻材料和蓝色光阻材料混合或者红色光阻材料和绿色光阻材料混合形成，所述遮光层呈黑色。
  9. 如权利要求1所述的彩膜基板的制作方法，其中，所述隔垫层包括位置交错排列的主隔垫层与辅隔垫层，所述主隔垫层由采用全透式光罩曝光的两种不同颜色的所述光阻材料堆叠而成，所述辅隔垫层由采用半透式光罩曝光形成的至少两种不同颜色的所述光阻材料堆叠而成。
  10. 一种液晶面板的制作方法，其中，包括
    彩膜基板的制作方法，包括：在第一基板上分别涂布及曝光三层光阻材料，所述三层光阻材料的颜色分别为红、绿、蓝，在所述涂布及曝光步骤过程中形成红色阻块、绿色阻块及蓝色阻块，同时，通过所述三层光阻材料之中的两种不同颜色的所述光阻材料的混合形成遮光层，通过所述三层光阻材料之中的至少两种不同颜色的所述光阻材料的堆叠形成隔垫层；
    在所述彩膜基板上滴入液晶；及
    将第二基板贴合至所述彩膜基板，在所述第二基板的边缘区域与所述第一基板的边缘区域之间使用框胶粘合。
  11. 如权利要求10所述的液晶面板的制作方法，其中，“在第一基板上分别涂布及曝光三层光阻材料”的步骤包括：涂布红色光阻材料并曝光显影，形成所述红色阻块、红色隔垫块及位于遮光区域的第一色阻层；涂布绿色光阻材料并曝光显影，形成所述绿色阻块；及涂布蓝色光阻材料并曝光显影，形成蓝色阻块、蓝色隔垫块及位于所述遮光区域的第二色阻层；其中：所述第一色阻层的红色光阻材料和所述第二色阻层的蓝色光阻材料在所述遮光区域内混合形成遮光层；所述蓝色隔垫块与所述红色隔垫块堆叠形成所述隔垫层。
  12. 如权利要求11所述的液晶面板的制作方法，其中，所述红色阻块、所述绿色组块及所述蓝色阻块均采用全透式光罩曝光形成。
  13. 如权利要求12所述的液晶面板的制作方法，其中，所述第一色阻层 与所述第二色阻层均采用半透式光罩曝光形成，所述遮光层与所述红色阻块的高度相同。
  14. 如权利要求11所述的彩膜基板的制作方法，其中，所述隔垫层包括位置交错排列的主隔垫层与辅隔垫层，所述主隔垫层通过对所述红色光阻材料进行全透式光罩曝光形成红色主隔垫块，所述主隔垫层通过对所述蓝色光阻材料进行全透式光罩曝光形成蓝色主隔垫块，所述蓝色主隔垫块与所述红色主隔垫块堆叠后形成所述主隔垫层，所述辅隔垫层通过对所述红色光阻材料进行半透式光罩曝光形成红色辅隔垫块，所述辅隔垫层通过对所述蓝色光阻材料进行半透式光罩曝光形成蓝色辅隔垫块，所述蓝色辅隔垫块与所述红色辅隔垫块堆叠后形成所述辅隔垫层。
  15. 如权利要求14所述的液晶面板的制作方法，其中，所述主隔垫层高度为3.2um～3.7um。
  16. 如权利要求14所述的液晶面板的制作方法，其中，所述半透式光罩的透过率为20％～50％。
  17. 如权利要求10所述的液晶面板的制作方法，其中，所述遮光层通过涂布曝光的过程中对红色光阻材料和蓝色光阻材料混合或者红色光阻材料和绿色光阻材料混合形成，所述遮光层呈黑色。
  18. 如权利要求10所述的液晶面板的制作方法，其中，所述隔垫层包括位置交错排列的主隔垫层与辅隔垫层，所述主隔垫层由采用全透式光罩曝光的两种不同颜色的所述光阻材料堆叠而成，所述辅隔垫层由采用半透式光罩曝光形成的至少两种不同颜色的所述光阻材料堆叠而成。
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