WO2016035876A1 - Copper foil, copper clad laminated plate, and substrate - Google Patents
Copper foil, copper clad laminated plate, and substrate Download PDFInfo
- Publication number
- WO2016035876A1 WO2016035876A1 PCT/JP2015/075173 JP2015075173W WO2016035876A1 WO 2016035876 A1 WO2016035876 A1 WO 2016035876A1 JP 2015075173 W JP2015075173 W JP 2015075173W WO 2016035876 A1 WO2016035876 A1 WO 2016035876A1
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- copper foil
- frequency
- protrusion
- height
- copper
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 126
- 239000011889 copper foil Substances 0.000 title claims description 102
- 239000000758 substrate Substances 0.000 title claims description 30
- 239000010949 copper Substances 0.000 title claims description 27
- 229910052802 copper Inorganic materials 0.000 title claims description 25
- 230000035699 permeability Effects 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims description 61
- 239000011347 resin Substances 0.000 claims description 61
- 239000000463 material Substances 0.000 claims description 51
- 230000008054 signal transmission Effects 0.000 claims description 13
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 7
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 4
- 229920001955 polyphenylene ether Polymers 0.000 claims description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 3
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 3
- 239000004697 Polyetherimide Substances 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 3
- 229920003050 poly-cycloolefin Polymers 0.000 claims description 3
- 229920002530 polyetherether ketone Polymers 0.000 claims description 3
- 229920001601 polyetherimide Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 description 63
- 238000007747 plating Methods 0.000 description 18
- 230000000694 effects Effects 0.000 description 16
- 230000003746 surface roughness Effects 0.000 description 15
- 238000005530 etching Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 239000002775 capsule Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 239000004020 conductor Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 238000007788 roughening Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000004364 calculation method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 239000011362 coarse particle Substances 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
Definitions
- the present invention relates to a copper foil or the like having excellent adhesion to a resin base material and excellent high-frequency signal transmission characteristics.
- Such a printed wiring board is manufactured from a copper clad laminate in which a circuit forming copper foil is disposed and integrated on the surface of an insulating resin base material.
- a circuit pattern is formed by applying a mask pattern to the copper foil and etching the copper-clad laminate.
- the copper foil and the resin base material are integrated by heating and pressurization, but the adhesiveness of a predetermined level or more is required.
- a method for ensuring such adhesion a method of subjecting a copper foil to a predetermined roughening treatment is generally used (for example, Patent Documents 1 to 3).
- Patent Document 1 defines the shape of a fine hump formed on the surface of a copper foil in order to ensure adhesion by an anchor effect on a resin base material.
- Patent Document 2 performs a low-roughness treatment in order to improve the linearity of the bottom line of the copper foil, and in order to ensure adhesion, a heat-resistant / rust-proof layer, a chromate film layer, and a silane coupling.
- the agent layer is formed.
- Patent Document 3 specifies the surface roughness and the like of the copper foil, prevents the occurrence of poor insulation due to the copper particles remaining after etching, and ensures adhesion.
- Patent Documents 1 to 3 ensure adhesion, high frequency transmission characteristics are not always considered sufficiently.
- coherence of transmission characteristics when using a copper-clad laminate is a major issue as well as ensuring adhesion to a resin substrate.
- the present invention has been made in view of such problems, and an object of the present invention is to provide a copper foil or the like that has excellent adhesion to a resin base material and excellent high-frequency transmission characteristics.
- the average number per length is 1 or more, and 80% or more of the protrusions satisfying h / d ⁇ 1, w ⁇ 0.1 ⁇ m and w / d ⁇ 0
- the average per 5 ⁇ m length of the protrusion with h / d ⁇ 2 80% or more of the protrusions having the number of one or more and h / d ⁇ 2 satisfy w ⁇ 0.1 ⁇ m and w / d ⁇ 0.1 h / d + 1.
- 4 is a copper foil characterized by satisfying 4.
- H is preferably 0.4 ⁇ m or more.
- W is desirably 0.2 ⁇ m or more.
- the frequency f included in the high-frequency electrical signal is 20 GHz or more.
- the ratio of the three-dimensional surface area by the optical interference microscope to the two-dimensional surface area of the roughened surface is less than three times.
- the shape of the protrusion is standardized by the skin depth defined according to the transmission frequency, sufficient adhesion with the resin base material and high transmission characteristics suitable for the use conditions are obtained. Can be obtained. Specifically, if one or more protrusions satisfying h / d ⁇ 1 are formed on average per 5 ⁇ m length, adhesion with the resin base material can be ensured. Further, since the number of protrusions satisfying w / d ⁇ 0.1 h / d + 1.4 is 80% or more, good electrical characteristics can be obtained even when the protrusion height is high.
- one or more protrusions satisfying h / d ⁇ 2 are formed on average per 5 ⁇ m length, and w / d ⁇ 0.1 h / d + 1.4 is satisfied. If the protrusion is 80% or more, better electrical characteristics can be obtained while maintaining adhesion.
- the ratio of the three-dimensional surface area measured three-dimensionally with an optical interference microscope to the two-dimensional surface area of the roughened surface is less than three times, so that even better electrical characteristics can be obtained. it can.
- the copper foil according to the first aspect and a resin base material are laminated and bonded together, and the resin base material has a dielectric constant of 4 or less and a dielectric loss tangent tan ⁇ of 0.006 or less. It is a copper clad laminated board characterized by being.
- the resin substrate is made of a liquid crystal polymer, a fluororesin, a polyetherimide, a polyetheretherketone, a polyphenylene ether, a polycycloolefin, a bismaleimide resin, a low dielectric constant polyimide, or a mixture of these. It is desirable to be.
- a low-loss copper-clad laminate can be obtained efficiently.
- high frequency resins often have poor adhesion to copper foil.
- a resin polymer or the like having a dielectric constant of 4 or less and a dielectric loss tangent tan ⁇ of 0.006 or less is used.
- a higher effect can be acquired by applying to such resin.
- a line is formed by patterning the copper foil on the copper clad laminate according to the second aspect of the invention, and the line has a wavelength defined by the frequency f of the high-frequency electrical signal.
- the substrate has a length of 10 effective wavelengths or more.
- the transmission loss reduction effect can be obtained more efficiently. This is because a longer line has a larger loss value as an effect, and if the line length is too short, the effect is small.
- the present invention it is possible to provide a copper foil or the like that is excellent in adhesion to a resin base material and excellent in high-frequency transmission characteristics.
- FIGS. 5A and 5B are conceptual diagrams showing a current density distribution in the vicinity of the protrusions.
- FIG. 5A is a view showing a wide protrusion
- FIG. 5B is a view showing a narrow protrusion.
- FIG. 7A is a diagram showing the scope of the present invention in the apparent conductivity distribution with respect to the height h and width w of the protrusion 9 normalized by the skin depth
- FIG. (B) is a figure shown about 80 GHz.
- FIGS. 8A and 8B are diagrams illustrating transmission characteristics with respect to frequency.
- FIG. 1 shows a substrate 1 according to the present invention.
- the substrate 1 is obtained by patterning a line 5 on a resin base material 3.
- the line 5 is formed by a copper foil 7. That is, the copper foil 7 and the resin base material 3 are bonded together, and the line 5 is formed by masking and etching.
- the copper-clad laminate 2 is obtained by bonding and integrating the copper foil 7 and the resin base material 3 before etching.
- a known method such as a hot press method, a continuous roll laminating method, a continuous belt pressing method, or the like can be used.
- the copper foil 7 may be any of an electrolytic copper foil, an electrolytic copper alloy foil, a rolled copper foil, and a rolled copper alloy foil, and can be appropriately selected according to the use of the copper clad laminate 2 and the like. The details of the copper foil 7 will be described later.
- the resin base material 3 desirably has a dielectric constant of 4 or less and a dielectric loss tangent tan ⁇ of 0.006 or less.
- a liquid crystal polymer can be applied as such a material.
- the length of the line 5 has a side that can be expressed by a transmission frequency and a transmission wavelength in addition to the dimensional length.
- the effective wavelength is on the order of about 10 wavelengths. Since the transmission loss becomes significant in a relatively long signal line of about 10 wavelength order or more with respect to the effective wavelength, it can be said that the application of the present invention is suitable.
- the line 5 is preferably 10 or more effective wavelengths long with respect to the wavelength defined by the frequency f of the high-frequency electrical signal.
- substrate 1 of this invention shall be used for transmission of the high frequency signal of 5 GHz or more. This is because the effect of the present invention cannot be sufficiently obtained when the frequency is lower than this.
- FIG. 3 is an enlarged cross-sectional view of the resin contact surface of the copper foil 7 for high-frequency electrical signal transmission.
- the copper foil 7 has protrusions 9 formed on a copper base material 11.
- the copper foil for high-frequency circuits of the present invention is provided with roughened particles by burnt plating on the surface of the copper foil as a metal substrate (the surface roughness is not particularly limited, but Rz is preferably 5.0 ⁇ m or less). To form a roughened particle layer.
- the roughened particles are preferably made of copper.
- protrusions include those formed by roughened particles.
- the silane coupling agent can be appropriately selected from epoxy, amino, methacrylic, vinyl, mercapto and the like depending on the target resin substrate 3.
- epoxy, amino, and vinyl coupling agents that are particularly excellent in compatibility can be selected.
- FIG. 2 is a diagram showing the relationship between the surface conductivity normalized by the skin depth and the transmission conductivity.
- the skin depth d of the smooth copper foil at 1 GHz is about 2.1 ⁇ m and the surface roughness (indicated by Rq) is sufficiently smaller than this, for example, 0.4 ⁇ m, as shown by the dotted line O.
- Rq surface roughness
- the equivalent conductivity is also reduced.
- the skin depth of about 2.1 ⁇ m at 1 GHz is about 0.9 ⁇ m at 5 GHz
- the skin depth d is about 0.5 ⁇ m at 20 GHz
- the surface has almost no influence like the dotted line O at 1 GHz.
- the equivalent conductivity is significantly reduced by increasing the frequency of use such as 5 GHz and 20 GHz.
- the deterioration of the transmission characteristics of the signal line becomes a problem.
- the skin depth d (m) is ⁇ (1 / ( ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ f)) (where ⁇ : conductivity (S / m), ⁇ : permeability (H / m), f: (Frequency (Hz)).
- the height of the protrusion 9 on the copper foil in the present invention is h
- the width of the protrusion 9 at a height of h / 2 is w. More specifically, in the cross-section in the width direction of the copper foil measured by HR-SEM, the vertical direction from the boundary line between the base material 11 (part corresponding to the untreated copper foil) and the protrusion 9 toward the top of the protrusion 9 A line is drawn, and the length h of this line is defined as the protrusion height. Further, w is a protrusion width at a position half the protrusion height h. The equivalent conductivity was calculated for the protrusion shape thus defined.
- the calculation model It is possible to calculate the above-mentioned equivalent conductivity by irradiating a plane wave of high-frequency electromagnetic waves perpendicularly to a copper foil having an arbitrary rough shape and observing the reflection characteristics.
- the protrusion shape is a simple conical shape.
- the calculation was performed using a model in which the same protrusions were periodically spread on the surface of the copper foil.
- the surface roughness Rz that is conventionally considered to contribute to transmission characteristics can be considered as the protrusion height h in this model.
- the width w of the conical protrusion at the height of h / 2 was assumed as a parameter, and the equivalent conductivity was calculated for any combination of the protrusion height h and the protrusion width w.
- the skin depth d is uniquely determined by the frequency used.
- the dimension parameters h and w are defined by the size normalized by the skin depth d.
- FIG. 4 is a diagram showing the calculation result of the equivalent conductivity in each protrusion shape by normalizing each protrusion height h and protrusion width w by the skin depth. Specifically, FIG. 4 is a diagram showing a result of calculating an equivalent conductivity distribution with h / d and w / d normalized by the skin depth d taken on the horizontal axis and the vertical axis, respectively. In FIG. 4, the equivalent conductivity decreases from the lower left region to the upper right region.
- the equivalent conductivity varies with h / d which is the vertical axis. That is, if the protrusion height h is small, there is no significant decrease in equivalent conductivity, and it is considered acceptable as transmission characteristics as a copper foil. Conventionally, it has been known that the smaller the surface roughness, the better the transmission characteristics. In order to ensure adhesion, increasing the height of the protrusion as a roughened surface to a depth greater than the skin depth is the transmission characteristic.
- the protrusion height higher than the skin depth that is, the characteristic starts to deteriorate in the region of h / d ⁇ 1, and further, the protrusion height such as twice that height, That is, it was difficult to adopt the h / d ⁇ 2 region.
- the phenomenon in which the equivalent conductivity rapidly changes depending on the horizontal axis w / d is an event newly discovered in the study according to the present invention. Specifically, when w / d is 1 or less, the equivalent conductivity is improved by a non-linear change. Further, by setting w / d to 0.5 or less, the above-described protrusion height h is reduced to the skin depth. The same improvement can be seen as less than twice the height. The effect of improving the equivalent conductivity due to this rapid change is particularly remarkable when the protrusion height is high (surface roughness is rough), such as h / d ⁇ 1. That is, it can be said that it is particularly effective when the projection height h needs to be sufficiently large in order to secure the adhesion with the resin substrate 3.
- FIG. 5 is a conceptual diagram showing a high frequency conduction current density on a copper foil cross section when a high frequency electric field is applied in the horizontal direction on the paper surface in electromagnetic field analysis.
- the dotted line in the figure is an equicurrent density line.
- FIG. 5A shows a case where the standardized width is a relatively thick protrusion
- FIG. 5B shows a case where the standardized width is relatively narrow.
- point A is a point where the current density is low
- point B is a point where the current density is high.
- point E is a point where the current density is low
- point F is a point where the current density is high.
- the skin effect becomes remarkable as the conduction current increases in frequency, and the current is interpreted to flow more concentrated on the copper foil surface.
- Such a phenomenon is based on the assumption that the copper foil has a smooth structure, and the current density in the case of having a protrusion shape on the surface as in the present invention is compared with that in the case where the copper foil is smooth. It will be very special. Specifically, in both FIG. 5A and FIG. 5B, it is confirmed that the current hardly flows on the front end side of the protrusion, which can be said to be the surface side (point A, point E). What is happening at the tip is thought to be cancellation of the conduction current, which is a phenomenon that exhibits the characteristic characteristics of the present invention.
- This phenomenon is due to the following reasons. If most of the current is concentrated within the skin depth of the copper foil surface and the concentrated portions do not interfere with each other, a conduction current is generated. On the other hand, when the portions below the skin depth interfere with each other, such as the tip of the protrusion, the current flows in the opposite direction at the interference portion, cancels out, and the conduction current does not flow. For example, if the current flowing toward the tip of the protrusion interferes with the current flowing from the tip to the base side, the current is canceled out, and the conductive current does not flow, so that it does not become a current loss source. This is a phenomenon newly studied in the present invention.
- the width of the protrusion is narrower than that in FIG. 5A, and the current density in the protrusion is relatively small.
- the protrusion surface position (point D) having a current density equivalent to the current density of the protrusion inner center point (point C) connecting the protrusion base is 1/2 of the protrusion height h. Shift to the tip side of the protrusion rather than the height. That is, the current density at the surface of the center portion of the protrusion height is higher than the current density at the center of the protrusion base.
- the protrusion surface position (point I) having a current density equivalent to the current density of the protrusion inner center point (point G) connecting the protrusion base is 1 / of the protrusion height h. It shifts to the protrusion base side rather than the height of 2. That is, the current density at the surface of the central portion of the protrusion height is lower than the current density at the center of the protrusion base. That is, in FIG. 5B, the current flowing inside the protrusion is small, and the current flowing on the base side of the protrusion tends to increase. In this way, by selecting a projection structure that reduces the amount of current flowing inside the projection (especially the tip side from the projection height h / 2) relative to the current flowing near the projection base, current loss due to the projection is reduced. It is thought that this can be reduced.
- FIG. 6 is a view similar to FIG.
- sufficient equivalent conductivity can be secured in a region where the projection height is low, such as h / d ⁇ 1. Therefore, the present invention is particularly effective when the projection height is high (surface roughness is rough), such as h / d ⁇ 1.
- the ideal state (equivalent conductivity in the smooth state) is obtained at any projection height. ) Equivalent electrical conductivity of about 50% or more.
- the straight line K is a linear function that substantially matches the tangent at 5 to 7 so that at least 50% of the ideal conductivity can be secured in the region where h / d is 7 or less, for example. Yes.
- the region formed by the straight lines K and J is a desirable range from the viewpoint of transmission characteristics and adhesion.
- h when it is necessary to secure adhesion, h needs to be increased, so loss due to copper foil is a problem even at a signal frequency of about 5 GHz.
- h is preferably 0.4 ⁇ m or more.
- the low-roughened copper foil can also improve the adhesion strength to the resin even in a situation where the protrusion height is small.
- the protrusion height h is 1 ⁇ m or more with respect to a copper foil for a general liquid crystal polymer. Even when such collaterality of adhesion is particularly necessary, it is necessary to reduce copper foil loss.
- the skin depth d is about 0.9 ⁇ m.
- the present invention satisfies the relationship of h / d ⁇ 1 and satisfies the relationship of w / d ⁇ 0.1 h / d + 1.4, even when a signal frequency of 5 GHz is transmitted to the copper foil. Loss can be reduced.
- the transmission frequency exceeds several GHz order. For example, characteristics of about 20 GHz or more are required for high-speed digital signal transmission exceeding 10 Gbps, and characteristics up to about 80 GHz are required for millimeter wave radar.
- the frequency is in the quasi-millimeter wave or millimeter wave band such as 20 GHz or 80 GHz, the skin depth d is reduced, so that h / d is further increased. For this reason, equivalent electrical conductivity falls. Therefore, when the height of the protrusion for securing the adhesion force is secured, there is a possibility that even if there is no problem at several GHz, it becomes impossible to disregard as a cause of transmission loss with the increase of the frequency exceeding 20 GHz.
- the protrusion width is designed so that w / d ⁇ 0.1 h / d + 1.4 according to the operating frequency. It becomes possible to reduce transmission loss.
- the protrusion width is too narrow, there may be a problem in quality. For example, if the protrusion width becomes extremely narrow, there is a concern that powder may fall off during the process. For this reason, it is necessary to select a projection width that does not cause powder falling. Specifically, in a protrusion with w smaller than 0.1 ⁇ m, the possibility of avoiding powder falling increases, so w is desirably 0.1 ⁇ m or more, and more desirably, w is 0.2 ⁇ m or more.
- FIG. 7 is a diagram showing a region that is particularly effective in the present invention when w is 0.1 ⁇ m or more.
- straight lines K and J are the same as those in FIG.
- straight lines K and J are the same as those in FIG.
- h ⁇ 0.4 ⁇ m is desirable from the viewpoint of adhesion, but if h can be compatible with transmission characteristics, a larger h can be taken as long as etching residue does not become a problem. preferable.
- the protrusion height h needs to be set to such an extent that no etching residue is generated.
- the transmission characteristic of the copper foil 7 according to the operating frequency is taken into consideration, and the selection of the protrusion shape parameters Can do the design. Note that, from the viewpoint of reducing etching residue, it is assumed that the protrusion extends in a direction substantially perpendicular to the copper foil surface.
- the present invention does not need to be particularly uniform with respect to the uniformity of the protrusion shape and height, and it is not necessary for all protrusions to be within this region.
- the average number of protrusions having a height satisfying h / d ⁇ 1 (more desirably h / d ⁇ 2) per 1 ⁇ m is 1 or more, and 80 of these protrusions. % Or more so as to satisfy w ⁇ 0.1 ⁇ m and w / d ⁇ 0.1 h / d + 1.4, the effect of the present invention can be obtained.
- the ratio of the three-dimensional surface area by the optical interference microscope to the two-dimensional surface area of the roughened surface is less than three times, so that the transmission characteristics can be more reliably improved. Can be increased.
- the width and height of the protrusion can be obtained by observing with a HR-SEM (high resolution scanning electron microscope) at a measurement magnification of 3000 times or more (for example, 10,000 times). Further, the fact that one or more protrusions having a height satisfying h / d ⁇ 1 exist on average per 5 ⁇ m is determined by the average number when observing at least 20 arbitrary portions. Further, the width and height of the protrusion may be obtained by observing by a method other than HR-SEM.
- substrate 1 bonds the copper foil 7 to the resin base material 3, forms the copper clad laminated board 2, and also forms the track
- the transmission loss of the line 5 is expressed as the sum of dB of the conductor loss due to the copper foil 7 and the dielectric loss in the substrate 1 (resin base material 3). Therefore, ensuring the transmission characteristics as the substrate 1 requires not only the copper foil 7 but also the characteristics of the resin base material 3.
- the dielectric loss tangent tan ⁇ cannot be said to be sufficiently good.
- low loss resin base materials having a dielectric constant of 4 or less and tan ⁇ of less than 0.006 are provided by various companies. In order to secure transmission characteristics as the substrate 1, such low loss resin bases are provided.
- a material is preferred.
- the resin base material is any one of a liquid crystal polymer, a fluororesin, a polyetherimide, a polyetheretherketone, a polyphenylene ether, a polycycloolefin, a bismaleimide resin, and a low dielectric constant polyimide. Or a mixture of these, and specific examples include Megtron 6, BT resin, and the like.
- FIG. 8 shows an example of analyzing the transmission characteristics when the protrusion shape of the resin base material and the copper foil is changed.
- FIG. 8A shows an example using a resin base material having a dielectric constant of 3.7 and tan ⁇ of 0.01
- FIG. 8B shows a dielectric constant of 3.7 and tan ⁇ of 0.004.
- the case where the resin base material which is is shown is shown.
- the line length is 100 mm in all cases.
- the loss of the line R is small. Further, when considering the improvement effect from the line T to the line R as a percentage, the example of FIG. 8A is about 10%, whereas the example of FIG. 8B is about 20%. It will be about. That is, in combination with a low-loss resin base material, it can be said that the contribution of improvement due to the protrusion shape of the copper foil is large. Furthermore, the effect obtained by the present invention is further increased by further increasing the operating frequency and further extending the line length.
- the example of the simple microstrip line was shown as the track
- the type of the line 5 the same effect is exhibited in the triplate line and the differential line.
- the pattern can be applied not only to straight lines but also to various shapes of lines including bending, branching, filters, antennas and the like. In any case, as described above, it is suitable for a portion that transmits at least a high-frequency signal for a long section having an effective wavelength of about 10 wavelengths or more.
- High frequency applications suitable for implementing the present invention can be broadly classified into high frequency analog signal transmission applications and high speed digital signal transmission applications.
- high-frequency analog signal transmission for example, in application to radio equipment products, the upper limit frequency that can be used depending on the application is determined by the laws and regulations relating to radio waves in each country. The upper limit frequency determined by the application and transmitting the line is considered as the frequency to be secured on the board.
- the frequency that can be expressed as f 0.35 / t depending on the rise time (10% -90%) time t (seconds) of the digital signal input to the transmission line on the substrate.
- high-frequency collateral design is performed.
- the former is suitable for high-frequency applications such as millimeter-wave communication and millimeter-wave radar and large-scale applications such as base stations, and the latter is suitable for signal transmission on workstations and high-speed transmission on server backplanes. Application to the above is preferable.
- Examples 1 to 5 Comparative Examples 1 to 3> A smooth untreated copper foil having a surface roughness Rz of about 0.5 ⁇ m and a thickness of 18 ⁇ m is prepared as a metal substrate, and the untreated copper foil is subjected to burnt plating to form a roughened particle layer (protrusion). did.
- Burn plating is a method in which a fine projection group of granular copper is adhered by performing electrolysis near a limit current density using a copper foil as a cathode in an acidic copper electrolytic bath. The solutions used for the burnt plating are shown in Table 1.
- the solution A can be uniformly roughened, the solution B has a roughened particle shape that becomes round and thick, and the solution C has a roughened particle shape that becomes thin.
- the solution C is selected to reduce the thickness of the coarse particle, and when the coarse particle height is low (high frequency), a certain amount Since it is necessary to ensure the thickness of the roughened particles, it is desirable to select the solution depending on the height of the roughening, such as selecting the solution B.
- Table 2 shows the conditions for the burnt plating.
- capsule plating was performed on the roughened particle layer by burn plating.
- Capsule plating covers the fine projections of granular copper applied by burn plating with a thin layer of ordinary copper plating (so-called “capsule layer”), and the fine projections of granular copper are coated on the surface of the copper foil. It is to be fixed.
- the conditions for capsule plating are as follows.
- both surfaces of the copper foil were subjected to rust prevention treatment with a known chromate treatment solution (corresponding to 3.0 g / L in CrO 3 concentration).
- Each copper foil thus produced was subjected to cross-sectional processing in the width direction using ion milling (IM4000 manufactured by Hitachi High-Tech), and an acceleration voltage of 3 kV (secondary) using HR-SEM (SU8020 manufactured by Hitachi High-Tech).
- An electron image and a low-angle reflected electron image) were subjected to cross-sectional observation at a magnification of 20,000 times, and the height and width of roughened particles in a 5 ⁇ m range of arbitrary 20 copper foil cross sections were measured.
- said cross-sectional observation can also be performed about the circuit board produced by pattern-processing the copper foil of the copper clad laminated board which bonded copper foil and the resin base material together.
- the cross section is processed in the longitudinal direction of the circuit pattern (line) so that the interface between the copper foil and the resin base material can be observed, and any 20 sections of the copper foil in the vicinity of the center of the circuit pattern (line). The height and width of roughened particles in the 5 ⁇ m range are measured.
- ⁇ Surface area ratio measurement> Using the three-dimensional white-light interference microscope (BRUKER Wyko Control GT-K), the ratio of the three-dimensional surface area to the two-dimensional surface area was measured (measurement conditions were a measurement magnification of 10 times, using a high-resolution CCD camera, After measurement, it was digitized without applying a special filter), and less than 3 was “ ⁇ ”, 3 or more and less than 4.5 was “ ⁇ ”, and more was “x”.
- the produced copper foil was laminated on a resin substrate by a hot press method, and a microstrip line as shown in FIG. 1 was produced as a signal line for evaluating transmission characteristics by etching.
- a resin base material polyphenylene ether resin (product name: Megtron 6 manufactured by Panasonic Corporation: dielectric constant 3.7, dielectric loss tangent tan ⁇ 0.002) was used.
- the transmission loss with respect to the high frequency signal up to 40 GHz was measured with the network analyzer.
- the characteristic impedance was 50 ⁇ .
- transmission loss is ⁇ 0.7 dB / 100 mm @ 5 GHz or less, ⁇ 1.8 dB / 100 mm @ 15 GHz or less, ⁇ 4.7 dB / 100 mm @ 40 GHz or less ⁇ , ⁇ 0.7 dB / Those exceeding 100 mm @ 5 GHz, those exceeding ⁇ 1.8 dB / @ 15 GHz, and those exceeding ⁇ 4.7 dB / 100 mm @ 40 GHz were evaluated as x.
- the above boundary value is the transmission loss of the untreated copper at each frequency and the equivalent conductivity of 75% due to the roughening treatment with respect to the conductivity of copper in the ideal state (untreated copper). It calculated from the sum of dB of loss.
- Example 1 In cross-sectional observation, in Examples 1 to 5 and Comparative Examples 1 and 3, on average, one or more protrusions satisfying h / d ⁇ 1 (hereinafter referred to as Condition A) were present per 5 ⁇ m. In Example 2, the protrusion height was low, and the average number of protrusions satisfying the condition A was less than 1 per 5 ⁇ m at any frequency.
- condition B the ratio of the protrusions satisfying the condition of w / d ⁇ 0.1 h / d + 1.4
- Example 1 at 5 GHz, among the protrusions satisfying the condition A, the protrusion satisfying the condition B was 80% or more, but at 15 GHz or more, it was less than 80%. Similarly, in Examples 2 and 3, the protrusion satisfying the condition B was 80% or more up to 15 GHz, but it was less than 80% at 30 GHz or more. In Examples 4 and 5, the protrusions satisfying the condition B among the protrusions satisfying the condition A were 80% or more at all frequencies.
- Comparative Example 2 As described above, the protrusion height is low, and there are less than one protrusion satisfying the condition A, and the condition B cannot be satisfied.
- the condition A was satisfied by repeating the burn plating and the capsule plating a plurality of times.
- w / d was large, and the protrusion satisfying the condition B was less than 80%. It was.
- w / d was small, and the number of protrusions satisfying w ⁇ 0.1 was less than 80%.
- Comparative Example 2 was satisfied with the transmission loss because the protrusion height was low, but the peel strength was insufficient.
- Comparative Example 1 since the protrusion height was sufficient, the peel strength was satisfactory, but since w / d was out of the standard, the transmission loss was x at all frequencies. Further, in Comparative Example 3, the protrusion height was sufficient, but w / d was very small, so that the peel strength was insufficient, or rough powder was generated.
- the present invention it is possible to satisfy both securing of adhesion with a resin base material and securing of transmission characteristics, which have been difficult to achieve in the past.
- the height of the resin base material is set to h / d ⁇ 1. Adhesion can be ensured. Furthermore, if h is 0.4 um or more, the adhesion to the resin substrate can be more reliably ensured.
- the protrusion width satisfies w / d ⁇ 0.1 h / d + 1.4, the amount of current flowing in the vicinity of the protrusion tip can be reduced relative to the vicinity of the protrusion base. For this reason, it becomes possible to reduce the conductor loss in a protrusion structure. As a result, it is possible to provide a copper foil with good signal line transmission characteristics at the used frequency. In particular, at a high frequency such as 20 GHz or higher, the height of the protrusion necessary for ensuring adhesion can be greater than or equal to the skin depth d order, which may cause an increase in transmission loss. This is effective in a situation where it is difficult to achieve both adhesion and transmission characteristics.
- the protrusion width is set to 0.1 um or more, which is the minimum width required for quality, it is possible to avoid quality deterioration such as powder falling. Further, although the adhesion is improved by increasing the protrusions, there is a trade-off relationship that etching residue is likely to occur. However, the present invention includes the protrusions for each frequency as shown in FIG. The optimum design of the shape becomes possible.
- the copper foil of the present invention to a resin base material that is generally considered to have a low loss, such as a dielectric constant of 4 or less and tan ⁇ of 0.006 or less, the ratio of the characteristic improvement contribution becomes more remarkable. Therefore, it is suitable for application to a high-frequency low-loss substrate. Also, for substrates with low loss, such as liquid crystal polymers, which are difficult to ensure chemical adhesion, as described above, with sufficient protrusion height to ensure adhesion and compatibility with transmission characteristics Can be achieved.
- the copper foil of the present invention by applying the copper foil of the present invention to a substrate having a long line pattern that effectively becomes 10 wavelengths or more specified by the transmission frequency, the effect of improving the transmission characteristics becomes remarkable, and at a higher frequency. It can contribute to securing characteristics in large applications.
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Abstract
Description
以下、図面を参照しながら、本発明の実施形態について説明する。図1は本発明にかかる基板1を示す図である。基板1は、樹脂基材3上に、線路5がパターン加工されたものである。線路5は、銅箔7によって形成される。すなわち、銅箔7と樹脂基材3とが張り合わされ、マスキングおよびエッチングによって線路5が形成されたものである。なお、エッチング前の銅箔7と樹脂基材3とが貼り合わさって一体化されたものを銅張積層板2とする。樹脂基材3と銅箔7を張り合わせて、銅張積層板2を形成する方法としては、公知の方法、例えば熱プレス方式、連続ロールラミネート方式、連続ベルトプレス方式などを用いることができる。 (Substrate 1)
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows a
次に、銅箔7について詳細に説明する。図3は、高周波電気信号の伝送用の銅箔7の樹脂密着面における断面拡大図である。銅箔7は、銅の基材11上に突起9が形成される。本発明の高周波回路用銅箔は、金属基材としての銅箔表面(表面粗さは特に限定されないが、Rzが5.0μm以下であることが好ましい)に、ヤケめっきにより粗化粒子を設けて粗化粒子層を形成する。粗化粒子は、銅からなることが好ましい。なお、本発明において、「突起」とは、粗化粒子により形成されたものを含む。 (Copper foil)
Next, the
図3に示すように、本発明における銅箔上の突起9の高さをhとし、h/2の高さにおける突起9の幅をwとする。より具体的には、HR-SEMで測定した銅箔の幅方向断面において、基材11(未処理銅箔に相当する部分)と突起9との境界線から突起9の頭頂部に向かって垂直に線を引き、この線の長さhを突起高さとする。また、突起高さhの半分の位置における突起幅をwとする。このように定義された突起形状に対して、等価導電率を計算した。 (Relationship between protrusion shape and equivalent conductivity)
As shown in FIG. 3, the height of the
図5は、電磁界解析上において紙面水平方向に高周波電界を印加し、その際に流れた高周波伝導電流密度を銅箔断面上に示した概念図である。図中の点線は、等電流密度線である。図5(a)は規格化された幅が相対的に太い突起の場合を示し、図5(b)は規格化された幅が相対的に狭い場合を示す図である。なお、図5(a)において、A点は、電流密度が小さい点であり、B点は電流密度が高い点である。また、図5(b)において、E点は、電流密度が小さい点であり、F点は電流密度が高い点である。 (Protrusion width and current density)
FIG. 5 is a conceptual diagram showing a high frequency conduction current density on a copper foil cross section when a high frequency electric field is applied in the horizontal direction on the paper surface in electromagnetic field analysis. The dotted line in the figure is an equicurrent density line. FIG. 5A shows a case where the standardized width is a relatively thick protrusion, and FIG. 5B shows a case where the standardized width is relatively narrow. In FIG. 5A, point A is a point where the current density is low, and point B is a point where the current density is high. In FIG. 5B, point E is a point where the current density is low, and point F is a point where the current density is high.
次に、本発明において、特に好ましい突起形状について説明する。図6は、図4と同様の図である。図6における直線Jは、h/d=1の直線である。前述した様に、h/d<1のように、突起高さが低い領域では、十分な等価導電率を確保できる。したがって、本発明は、特にh/d≧1のように突起高さが高い(表面粗さが粗い)場合において効果が顕著である。また、図6における直線Kは、w/d=-0.1h/d+1.4の直線である。図6に示すように、w/d<-0.1h/d+1.4となる領域(すなわち、直線Kの左側の領域)では、いかなる突起高さにおいても、理想状態(平滑状態の等価導電率)の約50%以上の等価導電率を確保できる。ここで、直線Kはh/dが例えば7以下の領域において、少なくとも等価導電率が理想状態の50%以上を確保できるようh/dが概ね5~7における接線とほぼ一致する1次関数としている。図6において、直線K、Jから形成される領域が伝送特性と密着性の観点から望ましい範囲と言える。 (Projection shape design)
Next, a particularly preferable protrusion shape in the present invention will be described. FIG. 6 is a view similar to FIG. A straight line J in FIG. 6 is a straight line with h / d = 1. As described above, sufficient equivalent conductivity can be secured in a region where the projection height is low, such as h / d <1. Therefore, the present invention is particularly effective when the projection height is high (surface roughness is rough), such as h / d ≧ 1. A straight line K in FIG. 6 is a straight line of w / d = −0.1 h / d + 1.4. As shown in FIG. 6, in the region where w / d <−0.1h / d + 1.4 (that is, the region on the left side of the straight line K), the ideal state (equivalent conductivity in the smooth state) is obtained at any projection height. ) Equivalent electrical conductivity of about 50% or more. Here, the straight line K is a linear function that substantially matches the tangent at 5 to 7 so that at least 50% of the ideal conductivity can be secured in the region where h / d is 7 or less, for example. Yes. In FIG. 6, it can be said that the region formed by the straight lines K and J is a desirable range from the viewpoint of transmission characteristics and adhesion.
次に、上述した銅箔を用いた基板における本発明の効果を説明する。図1に示したように、基板1は、銅箔7を樹脂基材3へ張り合わせて銅張積層板2を形成し、さらにパターン加工によって線路5が形成される。線路5の伝送損は銅箔7による導体損と基板1(樹脂基材3)中の誘電体損のdB和であらわされることが知られている。したがって、基板1としての伝送特性の確保には銅箔7だけでなく樹脂基材3の特性確保も要求される。 (effect)
Next, the effect of the present invention in the substrate using the copper foil described above will be described. As shown in FIG. 1, the board |
本発明の実施に好適な高周波アプリケーションを大別すると、高周波アナログ信号伝送用途と高速デジタル信号伝送用途とが考えられる。高周波アナログ信号伝送に関して、例えば電波機器製品への適用においてはその用途により使用可能な上限周波数は各国電波に関する法規制により決められる。用途から決定づけられ、線路を伝送させている上限周波数が基板において担保すべき周波数と考える。 (Preferable high frequency application to which the present invention is applicable)
High frequency applications suitable for implementing the present invention can be broadly classified into high frequency analog signal transmission applications and high speed digital signal transmission applications. Regarding high-frequency analog signal transmission, for example, in application to radio equipment products, the upper limit frequency that can be used depending on the application is determined by the laws and regulations relating to radio waves in each country. The upper limit frequency determined by the application and transmitting the line is considered as the frequency to be secured on the board.
金属基材として表面粗さRzが0.5μm程度、厚さが18μmの平滑な未処理銅箔を用意し、この未処理銅箔にヤケめっき処理を施し、粗化粒子層(突起)を形成した。ヤケめっきとは、酸性銅電解浴中で銅箔を陰極とし、限界電流密度付近で電解を行うことにより粒状銅の微細な突起群を付着させるものである。ヤケめっきに用いられる溶液は表1の通りである。 <Examples 1 to 5, Comparative Examples 1 to 3>
A smooth untreated copper foil having a surface roughness Rz of about 0.5 μm and a thickness of 18 μm is prepared as a metal substrate, and the untreated copper foil is subjected to burnt plating to form a roughened particle layer (protrusion). did. Burn plating is a method in which a fine projection group of granular copper is adhered by performing electrolysis near a limit current density using a copper foil as a cathode in an acidic copper electrolytic bath. The solutions used for the burnt plating are shown in Table 1.
硫酸銅(Cu濃度として) 40~60g-Cu/L
浴温 45~60℃
電流密度 直流整流で10~20A/dm2 Sulfuric acid concentration 80 ~ 120g / L
Copper sulfate (as Cu concentration) 40-60g-Cu / L
Bath temperature 45-60 ° C
このようにして作製した各銅箔を、イオンミリング(日立ハイテク社製IM4000)を用いて幅方向に断面加工を施し、HR-SEM(日立ハイテク社製SU8020)を用い、加速電圧3kV(2次電子像,低角度反射電子像)で、20,000倍の倍率で断面観察を行い、任意の20カ所の銅箔断面の5μm範囲における粗化粒子の高さと幅を計測した。 <Section observation>
Each copper foil thus produced was subjected to cross-sectional processing in the width direction using ion milling (IM4000 manufactured by Hitachi High-Tech), and an acceleration voltage of 3 kV (secondary) using HR-SEM (SU8020 manufactured by Hitachi High-Tech). An electron image and a low-angle reflected electron image) were subjected to cross-sectional observation at a magnification of 20,000 times, and the height and width of roughened particles in a 5 μm range of arbitrary 20 copper foil cross sections were measured.
作成した銅箔を3次元白色光干渉型顕微鏡(BRUKER Wyko ContourGT-K)を用いて、二次元表面積に対する三次元表面積の比を測定(測定条件は測定倍率10倍、ハイレゾCCDカメラを使用し、測定後に特別なフィルタをかけずに数値化した)し、3未満を「○」、3以上4.5未満を「△」、それ以上を「×」とした。 <Surface area ratio measurement>
Using the three-dimensional white-light interference microscope (BRUKER Wyko Control GT-K), the ratio of the three-dimensional surface area to the two-dimensional surface area was measured (measurement conditions were a measurement magnification of 10 times, using a high-resolution CCD camera, After measurement, it was digitized without applying a special filter), and less than 3 was “◯”, 3 or more and less than 4.5 was “Δ”, and more was “x”.
作製した銅箔を熱プレス方式により樹脂基材に積層し、エッチングにより、伝送特性評価用の信号線路として図1に示すようなマイクロストリップラインを作製した。樹脂基材としては、ポリフェニレンエーテル系樹脂(製品名:パナソニック株式会社製メグトロン6:誘電率3.7、誘電正接tanδ0.002)を用いた。このマイクロストリップラインについて、ネットワークアナライザで40GHzまでの高周波信号に対する伝送損失を測定した。特性インピーダンスは50Ωとした。 <Evaluation of transmission characteristics>
The produced copper foil was laminated on a resin substrate by a hot press method, and a microstrip line as shown in FIG. 1 was produced as a signal line for evaluating transmission characteristics by etching. As the resin base material, polyphenylene ether resin (product name:
作製した銅箔を熱プレス方式により樹脂基材(パナソニック株式会社製メグトロン6)に積層し、銅張積層板を作製した。この銅張積層板の銅箔部を10mm巾テープでマスキングし、塩化銅エッチングを行った後テープを除去して10mm巾の回路配線を作製した。東洋精機製作所社製 テンシロンテスターを使用し、回路配線を90度方向に50mm/分の速度で剥離してピール(剥離)強度を求めた。ピール強度の判定基準0.5kN/m以上を○、それ未満を×とした。結果を表3に示す。 <Peel test>
The produced copper foil was laminated | stacked on the resin base material (
2………銅張積層板
3………樹脂基材
5………線路
7………銅箔
9………突起
11………基材
DESCRIPTION OF
Claims (9)
- 高周波電気信号の伝送用の銅箔であって、
表面に複数の突起を有し、
表皮深さd(m)=√(1/(σ・μ・π・f))(但し、σ:導電率(S/m)、μ:透磁率(H/m)、f:前記高周波電気信号に含まれる周波数(Hz))とした場合において、
f≧5GHzであり、
前記突起の高さをh(μm)、当該突起のh/2の高さ位置における幅をw(μm)とした際に、
h/d≧1となる前記突起の、5μm長さ当たりの平均個数が1個以上であり、かつ、
h/d≧1となる前記突起のうち80%以上の前記突起が、w≧0.1μmであり、かつ、w/d<-0.1h/d+1.4を満たすことを特徴とする銅箔。 A copper foil for high-frequency electrical signal transmission,
Having a plurality of protrusions on the surface,
Skin depth d (m) = √ (1 / (σ · μ · π · f)) (where σ: conductivity (S / m), μ: permeability (H / m), f: the high-frequency electricity In the case of frequency (Hz) included in the signal,
f ≧ 5 GHz,
When the height of the protrusion is h (μm) and the width of the protrusion at the height of h / 2 is w (μm),
The average number of the protrusions with h / d ≧ 1 per 5 μm length is 1 or more, and
80% or more of the protrusions satisfying h / d ≧ 1 satisfy w ≧ 0.1 μm and satisfy w / d <−0.1 h / d + 1.4 . - 高周波電気信号の伝送用の銅箔であって、
表面に複数の突起を有し、
表皮深さd(m)=√(1/(σ・μ・π・f))(但し、σ:導電率(S/m)、μ:透磁率(H/m)、f:前記高周波電気信号に含まれる周波数(Hz))とした場合において、
f≧5GHzであり、
前記突起の高さをh(μm)、当該突起のh/2の高さ位置における幅をw(μm)とした際に、
h/d≧2となる前記突起の、5μm長さ当たりの平均個数が1個以上であり、かつ、
h/d≧2となる前記突起のうち80%以上の前記突起が、w≧0.1μmであり、かつ、w/d<-0.1h/d+1.4を満たすことを特徴とする銅箔。 A copper foil for high-frequency electrical signal transmission,
Having a plurality of protrusions on the surface,
Skin depth d (m) = √ (1 / (σ · μ · π · f)) (where σ: conductivity (S / m), μ: permeability (H / m), f: the high-frequency electricity In the case of frequency (Hz) included in the signal,
f ≧ 5 GHz,
When the height of the protrusion is h (μm) and the width of the protrusion at the height of h / 2 is w (μm),
The average number of protrusions per 5 μm length of h / d ≧ 2 is 1 or more, and
80% or more of the protrusions satisfying h / d ≧ 2 satisfy w ≧ 0.1 μm and satisfy w / d <−0.1 h / d + 1.4 . - hが0.4μm以上であることを特徴とする請求項1または請求項2記載の銅箔。 3. The copper foil according to claim 1, wherein h is 0.4 μm or more.
- wが0.2μm以上であることを特徴とする請求項1または請求項2記載の銅箔。 The copper foil according to claim 1, wherein w is 0.2 μm or more.
- 前記高周波電気信号に含まれる周波数fが20GHz以上であることを特徴とする請求項1または請求項2記載の銅箔。 The copper foil according to claim 1 or 2, wherein the frequency f included in the high-frequency electric signal is 20 GHz or more.
- 粗化処理面の二次元表面積に対する光干渉顕微鏡による三次元表面積の比が3倍未満であることを特徴とする請求項5に記載の銅箔。 The copper foil according to claim 5, wherein the ratio of the three-dimensional surface area by the optical interference microscope to the two-dimensional surface area of the roughened surface is less than three times.
- 請求項1または請求項2記載の銅箔と、樹脂基材と、が積層貼着されてなり、
前記樹脂基材は、誘電率が4以下であり、誘電正接tanδが0.006以下であることを特徴とする銅張積層板。 The copper foil according to claim 1 or claim 2 and a resin base material are laminated and adhered,
The resin base material has a dielectric constant of 4 or less and a dielectric loss tangent tan δ of 0.006 or less. - 前記樹脂基材は、液晶ポリマー、フッ素樹脂、ポリエーテルイミド、ポリエーテルエーテルケトン、ポリフェニレンエーテル、ポリシクロオレフィン、ビスマレイミド樹脂、低誘電率ポリイミドのいずれか、又はこれらの混合樹脂からなるものであることを特徴とする請求項7記載の銅張積層板。 The resin substrate is made of any one of a liquid crystal polymer, a fluororesin, a polyetherimide, a polyetheretherketone, a polyphenylene ether, a polycycloolefin, a bismaleimide resin, a low dielectric constant polyimide, or a mixed resin thereof. The copper clad laminate according to claim 7.
- 請求項7記載の銅張積層板に対し、前記銅箔がパターン加工されて線路が形成されており、
前記線路は、高周波電気信号の周波数fで規定される波長に対し、10実効波長以上の長さであることを特徴とする基板。 The copper-clad laminate according to claim 7, wherein the copper foil is patterned to form a line,
The substrate, wherein the line has a length of 10 effective wavelengths or more with respect to a wavelength defined by a frequency f of a high-frequency electric signal.
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JP2018090906A (en) * | 2016-12-06 | 2018-06-14 | Jx金属株式会社 | Surface treated copper foil, copper foil with carrier, laminate, printed wiring board manufacturing method and electronic device manufacturing method |
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KR102714025B1 (en) * | 2022-05-30 | 2024-10-07 | 주식회사 코젼트솔루션 | Flexible copper clad laminates |
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KR20170039084A (en) | 2017-04-10 |
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CN106574389B (en) | 2018-09-21 |
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