WO2015152211A1 - Artificial nail removal liquid, artificial nail removal method, and nail art kit - Google Patents
Artificial nail removal liquid, artificial nail removal method, and nail art kit Download PDFInfo
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- WO2015152211A1 WO2015152211A1 PCT/JP2015/060071 JP2015060071W WO2015152211A1 WO 2015152211 A1 WO2015152211 A1 WO 2015152211A1 JP 2015060071 W JP2015060071 W JP 2015060071W WO 2015152211 A1 WO2015152211 A1 WO 2015152211A1
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- artificial nail
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- polymer
- compound
- acid
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Classifications
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D29/00—Manicuring or pedicuring implements
- A45D29/18—Manicure or pedicure sets, e.g. combinations without case, etui, or the like
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D31/00—Artificial nails
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/34—Alcohols
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/36—Carboxylic acids; Salts or anhydrides thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/36—Carboxylic acids; Salts or anhydrides thereof
- A61K8/365—Hydroxycarboxylic acids; Ketocarboxylic acids
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q3/00—Manicure or pedicure preparations
- A61Q3/04—Nail coating removers
Definitions
- the present invention relates to an artificial nail remover, an artificial nail removal method, and a nail art kit.
- An object of the present invention is to provide an artificial nail removal liquid with a reduced removal time. Another object of the present invention is to provide a method for removing an artificial nail using the artificial nail removing solution and a nail art kit.
- ⁇ 1> An artificial nail removal liquid, comprising an acid compound as component A, a compound having a hydroxyl group as component B, and water as component C, ⁇ 2>
- the content of Component A in the artificial nail removal liquid is 0.05 to 20% by mass (more preferably 0.1 to 10% by mass, and still more preferably 0.1% by mass relative to the total mass of the artificial nail removal liquid.
- the removal solution for artificial nails according to any one of ⁇ 1> to ⁇ 3>, ⁇ 5> The removal for an artificial nail according to any one of ⁇ 1> to ⁇ 4>, wherein the component B contains a compound having a hydroxyl value of 5 mmol / g or more (more preferably a compound having 8 mmol / g or more) liquid, ⁇ 6>
- the content of Component B in the artificial nail remover is 0.01 to 20% by mass (more preferably 0.05 to 10% by mass, and still more preferably) with respect to the total mass of the artificial nail remover 0.1-5% by mass), the removal solution for artificial nail according to any one of ⁇ 1> to ⁇ 5>, ⁇ 7>
- ⁇ 11> The artificial nail removal liquid according to any one of ⁇ 1> to ⁇ 10>, wherein the artificial nail is an artificial nail formed by curing a photocurable artificial nail composition
- ⁇ 12> A method for removing an artificial nail, comprising the step of bringing the removal liquid according to any one of ⁇ 1> to ⁇ 11> into contact with the artificial nail
- ⁇ 13> A nail art kit comprising an artificial nail composition and the removal solution for artificial nail according to any one of ⁇ 1> to ⁇ 11>, ⁇ 14> The nail art kit according to ⁇ 13>, wherein the artificial nail composition contains a polymer having an amino group.
- ⁇ 15> The nail art kit according to ⁇ 13> or ⁇ 14>, wherein the artificial nail composition contains a monomer having an amino group
- ⁇ 16> The nail art kit according to any one of ⁇ 13> to ⁇ 15>, wherein the artificial nail composition is a photocurable artificial nail composition.
- a removal liquid for artificial nails having a reduced removal time is provided. Moreover, the removal method of the artificial nail using the said removal liquid for artificial nails and the nail art kit were provided.
- a group having a substituent is also included.
- R represents an alkyl group, an aryl group or a heterocyclic group
- R is an unsubstituted alkyl group, a substituted alkyl group, an unsubstituted aryl group, a substituted aryl group
- (meth) acryl represents the concept containing both acryl and methacryl, and the same applies to (meth) acrylate and the like.
- the polymer in this specification shall include a copolymer. In the present invention, a combination of two or more preferred embodiments is more preferred.
- the artificial nail removal liquid of the present invention includes (Component A) an acid compound, (Component B) a compound having a hydroxyl group, and (Component) C) It contains water.
- Removal liquid includes (Component A) an acid compound, (Component B) a compound having a hydroxyl group, and (Component) C) It contains water.
- Component A an acid compound
- Component B a compound having a hydroxyl group
- Component C It contains water.
- an organic solvent such as acetone
- the method is to place cotton soaked on the above-mentioned artificial nail, wind it with aluminum foil, leave it as it is to swell the artificial nail, and then peel off this swollen artificial nail using a wooden spatula etc. It was mainstream.
- acetone since acetone is used, damage to the nails is large, and from the viewpoint of environmental consideration, it is required that the use of a volatile organic solvent is small.
- the present inventors have reduced the use of a volatile organic solvent such as acetone by using a remover containing components A to C, and are shorter than when a conventional remover is used. It has been found that the artificial nail can be removed in time, and the present invention has been completed. Although the detailed mechanism is unknown, by adding a compound having a hydroxyl group to the removal liquid, the affinity between the removal liquid and the artificial nail is improved as compared with the case where an acidic removal liquid is simply used, It is estimated that the removability is improved.
- the component which the removal liquid for artificial nails of this invention contains is explained in full detail.
- the removal liquid for artificial nail of the present invention contains an acid compound as Component A.
- the acid compound is not particularly limited as long as it is a compound having hydrogen dissociable in at least one water.
- any of known organic acids and inorganic acids can be used. From the viewpoint of handleability, an organic acid is preferable, and a carboxylic acid is more preferable.
- the inorganic acid include hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, carbonic acid, phosphoric acid and the like. Carbonic acid and phosphoric acid are preferable, and carbonic acid is more preferable.
- organic acid examples include carboxylic acid, sulfonic acid, sulfuric acid monoester, phosphoric acid monoester, phosphoric diester, phosphonic acid and the like, carboxylic acid, sulfonic acid, phosphoric monoester, and phosphonic acid are preferable, and carboxylic acid is More preferred.
- carboxylic acids include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid, margaric acid, stearic acid, Glycolic acid, lactic acid, tartronic acid, glyceric acid, hydroxybutyric acid, 2-hydroxybutyric acid, 3-hydroxybutyric acid, ⁇ -hydroxybutyric acid, malic acid, tartaric acid, citramalic acid, citric acid, leucine acid, meparonic acid, pantoic acid, ricinol Acid, cerebronic acid, quinic acid, shikimic acid, salicylic acid, panillic acid, syringic acid, resorcylic acid, protocatechuic acid, gentisic acid, gallic acid, mandelic acid, benzylic acid, atrolactic acid, mellilotic acid
- carboxylic acids used in cosmetics include, but are not limited to, acetic acid, formic acid, propionic acid, glycolic acid, citric acid, lactic acid, malic acid, amino acids and the like.
- citric acid, glycolic acid, malic acid, and acetic acid are particularly suitable.
- the content of the acid compound in the removal liquid is not particularly limited, but is preferably 0.05 to 20% by mass and more preferably 0.1 to 10% by mass with respect to the total mass of the removal liquid. Preferably, the content is 0.5 to 5% by mass.
- Component B Compound having a hydroxyl group
- the removal liquid for artificial nail of the present invention contains a compound having a hydroxyl group as Component B.
- the compound having a hydroxyl group any known alkyl alcohol and water-soluble aryl alcohol (phenols) can be preferably used.
- the compound having a hydroxyl group preferably has a molecular weight of 32 to 2,000. The molecular weight is more preferably 1,500 or less, and still more preferably 1,000 or less.
- the compound whose hydroxyl value is 5 mmol / g or more is preferable, the compound which is 7 mmol / g or more is more preferable, and the compound which is 8 mmol / g or more is still more preferable.
- the hydroxyl value is calculated using the following calculation formula.
- Component B is a compound having no acid group.
- a compound having an acid group and a hydroxyl group (for example, citric acid, lactic acid, malic acid, etc.) corresponds to Component A.
- component B examples include methanol, ethanol, isopropyl alcohol, n-butanol, t-butanol, hexanol, ethylene glycol, propylene glycol, 1,3-butanediol, pentanediol, cyclohexanediol, glycerol, trimethylolpropane, Examples include inositol, pentaerythritol, diglycetine, dipropylene glycol, tripropylene glycol, sorbitol, glucose, sucrose, polyethylene glycol, polyvinyl alcohol, phenol, catechol, and polyoxyethylene polyoxypropylene glycol.
- Component B is preferably one generally used in cosmetics, and specifically includes ethanol, isopropanol, n-butanol, t-butanol, ethylene glycol, propylene glycol, 1,3-butanediol, glycerol, pentane. Examples include, but are not limited to, diols. Of these, ethanol, 1,3-butaneoyl, and isopropanol are particularly preferred.
- the content of component B in the removal liquid is not particularly limited, but is preferably 0.01 to 20% by mass and more preferably 0.05 to 10% by mass with respect to the total mass of the removal liquid. Preferably, the content is 0.1 to 5% by mass.
- the artificial nail removal solution of the present invention contains water as Component C.
- water used for a removal liquid
- the content of water in the removal liquid is not particularly limited, but is preferably 50 to 99.5% by mass, more preferably 70 to 99% by mass, based on the total mass of the removal liquid. More preferably, it is -98 mass%.
- an acid salt is preferably added to form a buffer solution.
- an acid component (acid compound) salt preferably a sodium salt (sodium citrate, sodium gluconate, sodium carbonate, sodium phosphate, etc.) with an acid may be mentioned. However, it is not particularly limited.
- the removal liquid of the present invention may contain other components as required in addition to the above components.
- Specific examples include surfactants, pH buffers, preservatives, fragrances, water-soluble polymers, rust inhibitors, organic solvents, antifoaming agents, wetting agents, hard water softeners, stabilizers, thickeners, and the like. .
- the removal liquid of the present invention may be a concentrated liquid from the viewpoints of cost, transportability, and storability, and may be an embodiment in which the concentrated liquid is diluted with water or the like when used. Moreover, you may mix each raw material powder and each stock solution just before using a removal liquid. In addition, preferable content of said each component means content at the time of use.
- the pH of the removal liquid is preferably 5.0 or less, more preferably 4.0 or less, and even more preferably 3.0 or less.
- the pH of the removal liquid is preferably 1.0 or more, and more preferably 2.0 or more, from the viewpoint of safety to the skin and nails.
- the removal liquid may be used after being heated to such an extent that safety is not impaired.
- the immersion liquid may be stirred.
- the artificial nail removal method of the present invention includes a step of removing the artificial nail by contacting the removal liquid of the present invention (removal step).
- the artificial nail removal method of the present invention can be easily removed by bringing the artificial nail into contact with the removal liquid of the present invention instead of the conventional organic solvent such as acetone.
- the method of contact is not particularly limited, and the artificial nail may be directly immersed in the removing liquid, the artificial nail may be wrapped with cotton dampened with the removing liquid, or sprayed with a sprayer or a shower. . However, it is not limited to these examples.
- the removal method of the artificial nail of this invention includes the process of scratching the surface and / or front-end
- a nail file, such as a file, can be used suitably.
- the surface and / or tip of the artificial nail is arbitrarily rubbed with a nail file and then immersed in the removal solution of the present invention and left for about 1 to 5 minutes to change the solubility of the artificial nail.
- Fingertips and nails by (I) methods of wiping artificial nails with a cloth or non-woven fabric, (II) methods of peeling with a spatula or stick-like instrument, or (III) methods of picking up with tweezers or tweezers Can be peeled off very easily and safely.
- wiping, peeling off, picking up, etc. can be carried out while immersing in the above method, so that it can be removed more quickly. Further, removal may be promoted by applying ultrasonic waves or vibrations.
- the artificial nail removal method of the present invention may include other known steps.
- the nail art kit of the present invention includes an artificial nail composition and an artificial nail removal liquid, and the artificial nail removal liquid is the removal liquid of the present invention.
- the preferred embodiment of the removing solution in the nail art kit of the present invention is the same as described above.
- the nail art kit of this invention may contain arbitrary goods other than the said artificial nail composition and a removal liquid.
- an artificial nail composition for color or top a nail file such as a file, a brush or brush such as a flat brush for applying an artificial nail composition, an exposure device such as a UV light, a wiping or cleaning liquid , Wipes for wiping, nail brushes, dust brushes, nail foams used for lengthening nails, decorative stones such as acrylic, glass, metal or natural stone, decorative powders such as nail seals, glitters and holograms , A cutter, a spatula, a stick, a separator that widens the distance between fingers in order to prevent contact between the nails, and the like, but is not limited thereto.
- the artificial nail composition is a composition which is cured by drying and / or exposure on a human or animal nail or other artificial nail to form an artificial nail.
- claw formed with the artificial nail composition can be easily removed with the removal liquid of this invention.
- the artificial nail in the present invention refers to a layer formed on a human or animal nail for the purpose of beauty and / or protection.
- the other artificial nail includes a resin base material having an arbitrary shape for the purpose of nail decoration and / or protection. “Human and animal nails and other artificial nails” are also simply referred to as “nails”.
- the artificial nail is preferably nail polish such as manicure or pedicure, or gel nail.
- the artificial nail may have a multilayer structure, and may have a primer layer, a base layer, a color layer, and / or a top layer.
- the layer formed with the artificial nail composition used suitably for this invention mentioned later is a layer which is in contact with the nail
- the thickness of the artificial nail can be controlled by the application amount of the artificial nail composition.
- the thickness is not particularly limited as long as it is generally within the range of an artificial nail, but it is preferably 10 to 2,000 ⁇ m from the viewpoint of practicality and removability, and is preferably 20 to 1,500 ⁇ m. More preferred is 20 to 1,000 ⁇ m.
- the removal liquid of the present invention is suitable for removing an artificial nail having an amino group, and particularly suitable for removing an artificial nail containing a polymer having an amino group.
- the artificial nail containing a polymer having an amino group the following artificial nails (i) to (iii) are preferably exemplified.
- an artificial nail formed by an artificial nail composition containing a polymer having an amino group and / or a monomer having an amino group is preferable.
- the aspect (i) is an artificial nail formed by drying, and the artificial nail composition is a so-called artificial nail composition for nail polish.
- the above aspects (ii) and (iii) are artificial nails formed by photocuring, and the artificial nail composition is a so-called photocurable artificial nail composition (“artificial nail composition for gel nail”). ).
- the photocurable artificial nail composition is an artificial nail composition curable by actinic rays.
- Actinic light is radiation that can give energy to generate a starting species in the artificial nail composition by irradiation, and includes ultraviolet light, visible light, and the like. Among these, ultraviolet rays are preferable.
- an artificial nail composition is formed using component n: an artificial nail composition containing a polymer having an amino group, and the amino group derived from component a is an artificial nail.
- an artificial nail composition containing component b: a monomer having an amino group is photocured to form an artificial nail, and the monomer having an amino group is polymerized to form a polymer. Then, amino groups derived from monomers having amino groups are introduced into the polymer.
- the removal liquid of the present invention is suitable for removing artificial nails having amino groups, in particular, artificial nails containing a polymer having amino groups, and as an artificial nail composition for forming the artificial nails.
- the artificial nail composition preferably contains an organic solvent in addition to component a: a polymer having an amino group.
- the artificial nail composition preferably further contains a polymerizable compound and a polymerization initiator in addition to component a: an amino group-containing polymer.
- the artificial nail composition preferably contains a polymerization initiator in addition to the component b: a monomer having an amino group, and further contains a polymer component (film forming agent). Is preferred.
- the polymerizable compound further contains a monomer having an amino group
- a polymer component having an amino group is contained as the polymer component. It goes without saying that it is not something you do.
- the artificial nail as another preferred embodiment of the artificial nail, (iv) acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate type
- an artificial nail containing at least one polymer selected from the group consisting of a polymer, a urea polymer, an ethylene polymer, and an amine polymer.
- the inclusion of these polymers is preferable because of excellent adhesion and removability.
- the artificial nail is preferably an artificial nail formed from an artificial nail composition containing the polymer.
- the artificial nail composition may not contain a polymer having an amino group or a monomer having an amino group.
- the artificial nail composition preferably contains an organic solvent or a polymerizable compound and a polymerization initiator in addition to the above polymer. It is more preferable to contain a functional compound and a polymerization initiator.
- the polymer having an amino group is preferably one of the above-mentioned polymers, and more preferably a urethane polymer.
- the polymer includes a copolymer and an oligomer.
- the weight average molecular weight of the polymer is preferably 2,000 or more and 300,000 or less, more preferably 3,000 or more and 200,000 or less, and further preferably 4,000 or more and 100,000 or less. Preferably, it is 5,000 or more and 50,000 or less. It is excellent in the adhesiveness of the hardened
- the artificial nail composition contains a polymer having an amino group as the component a.
- the weight average molecular weight of component a is preferably 2,000 or more and 300,000 or less, more preferably 3,000 or more and 200,000 or less, and further preferably 4,000 or more and 100,000 or less. Preferably, it is 5,000 or more and 50,000 or less. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range, and is excellent in temporal stability.
- component a may have an ethylenically unsaturated group. When component a has an ethylenically unsaturated group, the ethylenically unsaturated group may be present in any of the main chain, side chain, and terminal of the polymer in component a.
- the amino group in component a may be any of a primary amino group, a secondary amino group, and a tertiary amino group, but is preferably a secondary amino group or a tertiary amino group, More preferably, it is a tertiary amino group.
- the resulting artificial nail is excellent in removability and water resistance, and is easy to synthesize.
- Component a may have an amino group in the main chain of the polymer or in the side chain, but is preferably a polymer having an amino group in the side chain from the viewpoint of synthesis. .
- Component a may have one type of amino group or two or more types.
- the “monomer unit” in the present invention includes not only a strict monomer-derived constituent unit but also a monomer unit modified by a polymer reaction in which a reaction such as modification is performed after a polymer is obtained.
- Component a is preferably a polymer having a structure represented by the following formula I, and more preferably a polymer having a structure represented by the following formula I in the side chain.
- R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and at least two selected from the group consisting of R 1 , R 2 and L 1 are linked to each other.
- a ring may be formed, L 1 represents a divalent linking group, and a wavy line represents a bonding position with another structure.
- R 1 and R 2 in Formula I are each independently preferably an alkyl group having 1 to 10 carbon atoms, and is a methyl group or an ethyl group, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. It is particularly preferred.
- at least two selected from the group consisting of R 1 , R 2 and L 1 may be linked to each other to form a ring.
- L 1 in Formula I is an alkylene group having 1 to 20 carbon atoms which may have a substituent, and a part of the carbon atoms may be replaced with a heteroatom from the viewpoint of the film property of the polymer.
- alkylene group having 1 to 20 carbon atoms it is preferably an alkylene group having 1 to 20 carbon atoms, an oxyalkylene group having 2 to 20 carbon atoms, or a polyoxyalkylene group having 2 to 20 carbon atoms, and an alkylene group having 1 to 20 carbon atoms or It is more preferably a polyoxyalkylene group having 2 to 20 carbon atoms, particularly preferably an alkylene group having 1 to 20 carbon atoms, and most preferably an alkylene group having 2 or 3 carbon atoms.
- the heteroatom is preferably a nitrogen atom or an oxygen atom, and more preferably an oxygen atom.
- the said hetero atom is a nitrogen atom, it is preferable that the remaining group on a nitrogen atom is a hydrogen atom or an alkyl group, and it is more preferable that it is an alkyl group.
- a monomer having the structure represented by the formula I is subjected to condensation polymerization, addition polymerization, addition condensation, ionic polymerization (cationic polymerization, Examples thereof include a method of polymerizing using a known polymerization reaction such as anionic polymerization.
- the polymer structure in component a is not particularly limited as long as it is a desired polymer structure.
- polymer structures such as styrene polymer, carbonate polymer, urea polymer, ethylene polymer, and amine polymer.
- component a may be an ether polymer, an ethylene polymer (particularly a polyethyleneimine polymer), a urethane polymer, or an acrylic polymer.
- a urethane polymer and an acrylic polymer are particularly preferable, and an acrylic polymer is most preferable.
- a urethane polymer is most preferable.
- acrylic polymer examples include known acrylic acid derivatives (for example, acrylic esters such as methyl acrylate and ethyl acrylate, acrylic amides such as acrylamide and acryloylmorpholine), and methacrylic acid derivatives (for example, methyl methacrylate, methacrylic acid).
- Any polymer can be suitably used as long as it is a polymer obtained by polymerizing a methacrylic acid ester such as ethyl or a methacrylic acid amide such as methacrylamide or isopropylamide. However, it is not limited to these examples.
- Examples of the method for introducing an amino group into the acrylic polymer include a method for polymerizing or copolymerizing a (meth) acrylic acid derivative having an amino group, and a method for introducing an amino group by a polymer reaction.
- Examples of a method for introducing an ethylenically unsaturated group into an acrylic polymer include a method for polymerizing or copolymerizing a (meth) acrylic acid derivative having an ethylenically unsaturated group, and a method for introducing an ethylenically unsaturated group by a polymer reaction. The method to introduce is mentioned.
- Urethane polymers include known polyisocyanate compounds (for example, methylene diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, phenyl diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, tolidine diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, tris ( Phenyl isocyanate) thiophosphate, phenylene diisocyanate, lysine diisocyanate, xylylene diisocyanate, bis (isocyanatomethyl) cyclohexane, dicyclohexylmethane diisocyanate, isopropylidenebis (cyclohexyl isocyanate), isophorone diisocyanate, dianisidine diisocyanate Diphenyl ether diisocyanate) and known polyol
- Examples of a method for introducing an amino group into a urethane polymer include a method of performing polycondensation using a polyisocyanate compound and / or a polyol compound having a tertiary amino group or a group in which an amino group is protected, and a polymer reaction.
- transducing an amino group by is mentioned.
- the protected amino group may be deprotected by a known method after forming a polymer. The same applies to the following.
- Examples of the method of introducing an ethylenically unsaturated group into a urethane polymer include a method of introducing by a polymer reaction and a method of polycondensation using a polyol compound or a polyisocyanate compound having an ethylenically unsaturated group. It is done. These compounds are not particularly limited, but for polyols having an ethylenically unsaturated group, (meth) acrylate-containing diol compounds as described in JP 2010-100047 can be preferably used. .
- a urethane polymer having a polycarbonate structure or a polyester structure, a polybutadiene structure, or a hydrogenated polybutadiene structure is preferable, and a urethane polymer having a polycarbonate structure is more preferable.
- the polycondensate of a diisocyanate compound and a diol compound can illustrate preferably.
- the diol component constituting the urethane polymer it is preferable to use polycarbonate diol, polyester diol, polybutadiene diol, and hydrogenated polybutadiene diol from the viewpoint of water resistance, and it is more preferable to use polycarbonate diol.
- the diisocyanate component is composed of hexamethylene diisocyanate, tolylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, dicyclohexylmethane-4,4′- from the viewpoint of the solubility of the artificial nail composition and the mechanical strength of the artificial nail to be formed.
- Diisocyanates are preferred, and isophorone diisocyanate, methylene diphenyl diisocyanate, and dicyclohexylmethane-4,4′-diisocyanate are more preferred. These compounds may be used alone or in combination.
- diol component / diisocyanate component it may be used in combination with other diol component / diisocyanate component. Further, by using a suitable diol component and a suitable diisocyanate component together, both the water resistance and mechanical strength of the artificial nail can be enhanced.
- any known cellulose such as carboxymethylcellulose, nitrocellulose, triacetylcellulose, and the like can be preferably used. However, it is not limited to these examples.
- Examples of a method for introducing an amino group into a cellulose polymer include a method for introducing an amino group by a polymer reaction.
- Examples of the method for introducing an ethylenically unsaturated group into a cellulose polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any polyester comprising a known polycarboxylic acid compound for example, succinic acid, adipic acid, phthalic acid, etc.
- polyesters composed of hydroxycarboxylic acid compounds such as polylactic acid can also be suitably used.
- a method for introducing an amino group into an ester polymer include polycondensation using a polycarboxylic acid compound, a polyol compound and / or a hydroxycarboxylic acid compound having a tertiary amino group or a group with a protected amino group.
- a method of introducing an amino group by a polymer reaction examples of a method for introducing an ethylenically unsaturated group into an ester polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any polyamide can be suitably used as long as it is a polyamide comprising a known polycarboxylic acid compound and a known polyamine compound (for example, ethylenediamine, phenylenediamine, etc.).
- polyamino acids which are proteins composed of amino acids, can also be preferably used.
- the method for introducing an amino group into the amide polymer include a polycarboxylic acid compound having a tertiary amino group or a group in which the amino group is protected, and / or a tertiary amino group that does not contribute to the polycondensation reaction.
- a method of polycondensation using a polyamine compound having a group in which an amino group is protected and a method of introducing an amino group by a polymer reaction can be mentioned.
- Examples of the method for introducing an ethylenically unsaturated group into an amide polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any vinyl polymer obtained by polymerizing a known vinyl compound for example, vinyl acetate, vinyl chloride, butadiene, etc.
- a method for introducing an amino group into a vinyl polymer include a method of polymerizing or copolymerizing a vinyl compound having an amino group, and a method of introducing an amino group by a polymer reaction.
- Examples of the method for introducing an ethylenically unsaturated group into a vinyl polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any polyether for example, polyethylene glycol, polypropylene glycol, etc.
- a method for introducing an amino group into an ether-based polymer include a method of polycondensation using a polyol compound having a tertiary amino group or a group in which the amino group is protected, and a method of introducing an amino group by a polymer reaction. Is mentioned.
- a method for introducing an ethylenically unsaturated group into an ether polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any polystyrene can be suitably used as long as it is made of a known styrene compound (for example, styrene, 4-carboxystyrene, 4-acetoxystyrene, etc.). However, it is not limited to these examples.
- the method for introducing an amino group into the styrene polymer include a method for polymerizing or copolymerizing a styrene derivative having an amino group, and a method for introducing an amino group by a polymer reaction.
- Examples of a method for introducing an ethylenically unsaturated group into a styrenic polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any polycarbonate can be suitably used as long as it is a polycarbonate composed of a known carbonic acid derivative (for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.) and a known polyol compound.
- a method for introducing an amino group into a carbonate-based polymer include a method of polycondensation using a polyol compound having a tertiary amino group or a group in which the amino group is protected, and a method of introducing an amino group by a polymer reaction. Is mentioned.
- Examples of the method for introducing an ethylenically unsaturated group into the carbonate polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- any polyurea composed of a known polyisocyanate compound and a known polyamine compound can be suitably used.
- the method for introducing an amino group into the urea polymer include a polyisocyanate compound having a tertiary amino group or a group in which the amino group is protected, and / or a tertiary amino group that does not contribute to the polycondensation reaction, or Examples thereof include a method of polycondensation using a polyamine compound having a group in which an amino group is protected, and a method of introducing an amino group by a polymer reaction.
- Examples of a method for introducing an ethylenically unsaturated group into a urea polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- Examples of the amine polymer include known polyamines.
- Examples of a method for introducing an ethylenically unsaturated group into an amine polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
- Component a may be a copolymer such as a styrene-acrylic copolymer.
- Component a is preferably a homopolymer or copolymer of a monofunctional (meth) acrylate compound or a polycondensate of a diisocyanate compound and a diol compound from the viewpoint of gloss.
- the homopolymer or copolymer of the monofunctional (meth) acrylate compound mentioned as component a is represented by the following formula II from the viewpoint of film properties, handleability (viscosity), and synthesis for introducing an amino group. It is preferable that the polymer has a monomer unit.
- R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and at least two selected from the group consisting of R 1 , R 2 and L 1 are linked to each other.
- L 1 represents a divalent linking group
- R 3 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
- X represents an oxygen atom or an NH group.
- R 1, R 2 and L 1 in formula II are each R 1, R 2 and L 1 synonymous in the formula (I), the preferred embodiment is also the same.
- R 3 in Formula II is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
- X in Formula II is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
- the component a When the component a has a monomer unit represented by the formula II, it may be used singly or in combination of two or more, or may further have other monomer units.
- Examples of the monomer that forms the monomer unit represented by the formula II include compounds represented by the following formula II-m.
- R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and R 1 and R 2 or L 1 and R 2 are linked to each other to form a ring.
- L 1 represents a divalent linking group
- R 3 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
- X represents an oxygen atom or an NH group.
- R 1 ⁇ R 3, L 1 and X in formula II-m are each a R 1 ⁇ R 3, L 1 and X synonymous in above-mentioned formula (II), preferable embodiments thereof are also the same.
- a polymer having at least a monomer unit derived from a water-insoluble monomer is preferable.
- non-water-soluble refers to that in which a mixed solution with the same volume of pure water maintains a non-uniform appearance under the conditions of 1 atm and 20 ° C.
- component a preferably has a monomer unit derived from a compound selected from the group consisting of a styrene compound and a (meth) acrylic acid derivative, in addition to the monomer unit having an amino group, and is derived from a (meth) acrylic acid derivative. It is more preferable to have a monomer unit, and it is still more preferable to have a monomer unit derived from an alkyl (meth) acrylate.
- preferred monomers that can be copolymerized with a monomer having an amino group include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, Monofunctional (meth) acrylates such as 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxyethyl (meth) acrylamide, isopropylacrylamide, morpholine Monofunctional (meth) acrylic amides such as acrylamide, vinyl monomers such as N-vinyl pyrrolidone and vinyl acetate, ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethy Glycol di (meth) acrylate, propylene glycol di (meth) acrylate,
- the component a preferably further has a monomer unit represented by the following formula IV in addition to the monomer unit having an amino group, from the viewpoint of water resistance of the artificial nail to be obtained.
- R 6 represents a hydrogen atom, an alkyl group or a group represented by the following formula V
- R 7 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
- X ′ represents an oxygen atom or an NH group. Represents.
- L 4 independently represents an ethylene group or a propylene group, n represents an integer of 1 to 20, R 8 represents a hydrogen atom or an alkyl group, and the wavy line represents the bond with X ′ above. Represents the position.
- R 6 is preferably an alkyl group or a group represented by the above formula V from the viewpoint of water resistance of the resulting artificial nail, and is an alkyl group having 1 to 20 carbon atoms or a group represented by the above formula V. More preferred is an alkyl group having 3 to 10 carbon atoms, and particularly preferred is a butyl group.
- R 7 is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
- X ′ is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
- L 4 is preferably an ethylene group.
- n is preferably an integer of 1 to 10 from the viewpoint of the water resistance of the resulting artificial nail.
- R 8 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably a methyl group, from the viewpoint of water resistance of the resulting artificial nail.
- the specific example of the homopolymer or copolymer of a monofunctional (meth) acrylate compound is shown below, it is not limited to this specific example.
- a homopolymer or copolymer of a monofunctional (meth) acrylate compound a polymer having the following structure is preferable, and a polymer having the following structure and a weight average molecular weight is more preferable.
- the number on the lower right of the parenthesis of each monomer unit represents a molar ratio.
- the number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions.
- the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple
- the polycondensate of the diisocyanate compound and the diol compound mentioned as component a is represented by the following formula III or formula III-b from the viewpoint of film properties, handleability (viscosity), and synthesis for introducing an amino group.
- a polymer having a monomer unit is preferable, and a urethane polymer having a monomer unit represented by the following formula III is more preferable.
- R 4 , R 5 and R b4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and are selected from the group consisting of R 4 , R 5 and L 3. At least two of them may be connected to each other to form a ring, R b4 and L b3 may be connected to each other to form a ring, L 2 represents a trivalent linking group, and L 3 Represents an alkylene group having 1 to 20 carbon atoms, and L b3 independently represents an alkylene group having 1 to 20 carbon atoms.
- R 4 and R 5 are each independently preferably an alkyl group having 1 to 10 carbon atoms from the viewpoint of a balance between solubility in an aqueous acid solution and water resistance, and is a methyl group or an ethyl group. It is particularly preferred.
- at least two selected from the group consisting of R 4 , R 5 and L 3 may be connected to each other to form a ring.
- L 2 in Formula III is preferably a trivalent linking group having 2 to 20 carbon atoms, more preferably a trivalent hydrocarbon group having 2 to 20 carbon atoms, and 3 having 2 to 20 carbon atoms.
- L 3 in Formula III is preferably an alkylene group having 1 to 4 carbon atoms, and particularly preferably a methylene group, from the viewpoint of the coating properties of the polymer.
- R b4 in formula III-b is preferably an alkyl group having 1 to 10 carbon atoms, and preferably an alkyl group having 2 to 8 carbon atoms, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance.
- L b3 is each independently preferably an alkylene group having 2 to 8 carbon atoms, particularly preferably an ethylene group, from the viewpoint of the coating properties of the polymer. Further, from the viewpoint of synthesis, the two L b3 are preferably the same group.
- R b4 and L b3 may be connected to each other to form a ring.
- component a When component a has a monomer unit represented by formula III or formula III-b, it may be used singly or in combination of two or more, or may be further contained Preferred examples of the monomer unit include a monomer unit derived from a diisocyanate component described later.
- Examples of the monomer that forms the monomer unit represented by the formula III include compounds represented by the following formula III-m.
- Examples of the monomer that forms the monomer unit represented by the formula III-b include compounds represented by the following formula III-bm.
- R 4 , R 5 and R b4 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and a group consisting of R 4 , R 5 and L 3. At least two selected from the above may be linked together to form a ring, R b4 and L b3 may be linked together to form a ring, L 2 represents a trivalent linking group, L 3 represents an alkylene group having 1 to 20 carbon atoms, and L b3 independently represents an alkylene group having 1 to 20 carbon atoms.
- R 4, R 5, L 2 and L 3 in formula III-m are respectively synonymous with R 4, R 5, L 2 and L 3 in the formula III, preferred embodiments are also the same.
- R b4 and L b3 in formula III-bm is respectively R b4 and L b3 synonymous in formula III-b, preferred embodiments are also the same.
- a monomer unit having the amino group and a monomer unit other than the monomer unit having the amino group are used as a polycondensate of a diisocyanate compound and a diol compound.
- a polymer having at least one is preferable.
- the monomer other than the monomer unit having an amino group a compound having two hydroxyl groups is preferable, and a water-insoluble compound having two hydroxyl groups is more preferable.
- the polycondensate of a diisocyanate compound and a diol compound preferably has a monomer unit derived from a compound selected from the group consisting of compounds having two hydroxyl groups in addition to the monomer unit having an amino group. More preferably, it has a monomer unit derived from a water-insoluble compound.
- examples of the monomer copolymerizable with a monomer having an amino group include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, 1,3- Propanediol, 1,2-propanediol, 2-methyl-1,3-propanediol, neopentyl glycol, 2-ethyl-2-methyl-1,3-propanediol, 2,2-diethyl-1,3- Propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,4-butanediol, 1,3-butanediol, 1,2 -Butanediol, 2,3-butanediol, 1,5-penta Diol,
- diisocyanate compound used in the production of a polycondensate of a diisocyanate compound and a diol compound a known diisocyanate compound can be used. Specifically, isophorone diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 2,6-tolylene diisocyanate, 2,4-tolylene diisocyanate, naphthalene-1,5-diisocyanate, diphenylmethane-4,4′-diisocyanate Diphenylmethane-2,4′-diisocyanate, 2,2-bis (4-isocyanatophenyl) propane, bis (3-methyl-4-isocyanatophenyl) methane, 1,3-bis (1-isocyanato-1- Methylethyl) benzene, 4,4′-diisocyanatobiphenyl, 4,4′-oxybis (phenylisocyanate
- the specific example of the polycondensate of a diisocyanate compound and a diol compound is shown below, it is not limited to this specific example.
- a polycondensate of a diisocyanate compound and a diol compound a polymer having the following structure is preferable, and a polymer having the following structure and a weight average molecular weight is more preferable.
- the number on the lower right of the parenthesis of each monomer unit represents a molar ratio.
- the number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions.
- the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple
- the component a may be a polymer composed only of a monomer unit having an amino group as a monomer unit, but when the component a has a monomer unit having an amino group and another monomer unit, the monomer unit having an amino group
- the content is preferably from 5 to 75 mol%, more preferably from 20 to 75 mol%, still more preferably from 20 to 60 mol%, based on all monomer units of component a. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range.
- the amine value of component a is preferably 0.1 to 10 mmol / g, more preferably 0.25 to 9 mmol / g, and still more preferably 0.5 to 8 mmol / g. It is excellent in the adhesiveness with the nail
- a method for measuring the amine value for example, a sample is weighed into a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
- the amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (solid content).
- the component a may be contained individually by 1 type, or may use 2 or more types together.
- the content of component a in the artificial nail composition is not particularly limited, but is preferably 1 to 95% by mass and more preferably 5 to 95% by mass with respect to the total mass of the artificial nail composition. . It is excellent in the removability and adhesiveness of the obtained artificial nail as it is the said range.
- the content of the solvent in the artificial nail composition is less than 10% by mass, that is, in the case of the above (ii)
- the content of component a is 10 to 90 with respect to the total mass of the artificial nail composition. More preferably, it is 20% by mass, particularly preferably 20 to 80% by mass, and particularly preferably 30 to 70% by mass.
- the content of the solvent in the artificial nail composition is 10% by mass or more, that is, in the case of the above (i), the content of the component a is 30 with respect to the total mass of the artificial nail composition. It is more preferably from 80 to 80% by mass, particularly preferably from 40 to 75% by mass.
- the artificial nail composition may contain a polymer other than the component a for the purpose of improving the film property and gloss.
- the polymer other than component a is preferably an acrylic polymer or a urethane polymer from the viewpoint of film properties.
- the content of the polymer other than the component a is preferably less than the content of the component a.
- the content is more preferably 40% by mass or less, more preferably 30% by mass or less, and still more preferably 20% by mass or less with respect to the total mass of the composition.
- the artificial nail composition preferably contains a polymerizable compound.
- the artificial nail composition can be suitably used as a photocurable artificial nail composition.
- a polymerizable compound and a photopolymerization initiator it can be more suitably used as a photocurable artificial nail composition.
- the polymerizable compound may be a radical polymerizable compound or a cationic polymerizable compound, but is preferably a radical polymerizable compound.
- the radical polymerizable compound is a compound having an ethylenically unsaturated bond capable of radical polymerization, and may be any compound as long as it has at least one ethylenically unsaturated bond capable of radical polymerization in the molecule. And those having a chemical form such as an oligomer. Only one kind of radically polymerizable compound may be used, or two or more kinds thereof may be used in combination at an arbitrary ratio in order to improve desired properties.
- the polymerizable compound is a compound other than component a, preferably a compound having a molecular weight of less than 10,000, more preferably a compound having a molecular weight of less than 5,000, and less than 2,000. Further preferred.
- Examples of the polymerizable compound having an ethylenically unsaturated bond capable of radical polymerization include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, and salts thereof, Examples thereof include radical polymerizable compounds such as anhydrides having a saturated group, acrylonitrile, styrene, and various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, unsaturated urethane oligomers, and the like.
- unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, and salts thereof
- examples thereof include radical polymerizable compounds such as anhydrides having a saturated group, acrylonitrile, styrene, and various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, unsaturated ure
- the polymerizable compound contains an ethylenically unsaturated compound having a hydroxy group or an ethylenically unsaturated compound having a (poly) alkyleneoxy group from the viewpoint of the removability, adhesion and gloss of the resulting artificial nail. It is more preferable to include a (meth) acrylate compound having a hydroxy group or a (meth) acrylate compound having a (poly) alkyleneoxy group, and more preferable to include a (meth) acrylate compound having a hydroxy group. It is particularly preferable to include a monofunctional (meth) acrylate compound having a hydroxy group.
- Examples of the (meth) acrylate compound having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2,3-dihydroxypropyl (meth).
- hydroxyalkyl (meth) acrylate such as 4-hydroxybutyl (meth) acrylate, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, poly (ethylene glycol / propylene glycol) -mono (meth) acrylate, Polyethylene glycol / polypropylene glycol / mono (meth) acrylate, poly (ethylene glycol / tetramethylene glycol) / mono (meth) acrylate, poly ( B propylene glycol tetramethylene glycol) - mono (meth) acrylate, propylene glycol polybutylene glycol - it may be mentioned preferably a mono (meth) acrylate.
- Examples of the (meth) acrylate compound having a (poly) alkyleneoxy group include methoxypolyethylene glycol- (meth) acrylate, octoxypolyethyleneglycol-polypropyleneglycol- (meth) acrylate, lauroxypolyethyleneglycol- (meth) acrylate, Stearoxy polyethylene glycol- (meth) acrylate, phenoxy polyethylene glycol- (meth) acrylate, phenoxy polyethylene glycol-polypropylene glycol- (meth) acrylate, nonylphenoxy-polyethylene glycol- (meth) acrylate, nonylphenoxy-polypropylene glycol- (meth) ) Acrylate, Nonylphenoxy-Poly (ethylene glycol-propylene glycol)- Meth) acrylate can be a preferably exemplified.
- (meth) acrylate compound having a hydroxy group and the (meth) acrylate compound having a (poly) alkyleneoxy group can be used as the (meth) acrylate compound having a hydroxy group and the (meth) acrylate compound having a (poly) alkyleneoxy group.
- Representative examples are Blemmer E, Blemmer PE-90, Blemmer PE-200, Blemmer PE-350, Blemmer P, Blemmer PP-1000, Blemmer PP-500, Blemmer PP-800, Blemmer 50 PEP-300, Blemmer 70 PEP- 350B, Blemmer 55PET-800, Blemmer PPT series, Blemmer 10PPB-500B, Blemmer AE-90, Blemmer AE-200, Blemmer AE-400, Blemmer AP-150, Blemmer AP-400, Blemmer AP-550, Blemmer PME-100 , Blemmer PME-200, Blemmer PME-
- the number of hydroxy groups in the compound is preferably 1 to 10, more preferably 1 to 5, still more preferably 1 to 3, and particularly preferably 1. preferable.
- the number of repeating units of the alkyleneoxy group in the compound is preferably 1 to 25, more preferably 1 to 15, and more preferably 1 to 10 Further preferred.
- the polymerizable compound preferably includes a hydroxyalkyl (meth) acrylate compound, and includes 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 3-hydroxypropyl (meth) acrylate. More preferably, 2-hydroxyethyl (meth) acrylate is further included.
- the polymerizable compound preferably includes an ethylenically unsaturated compound having an alkyl group having 3 or more carbon atoms from the viewpoint of water resistance of the obtained artificial nail, and is ethylenic having an alkyl group having 5 or more carbon atoms. It is more preferable to include an unsaturated compound, and it is further preferable to include an ethylenically unsaturated compound having an alkyl group having 8 or more carbon atoms. These alkyl groups may have a branched and / or ring structure.
- Examples of the ethylenically unsaturated compound having an alkyl group include propyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl methacrylate, Examples thereof include, but are not limited to, isodecyl (meth) acrylate, tridecyl (meth) acrylate, stearyl (meth) acrylate, and isomers thereof.
- the polymerizable compound preferably includes a (meth) acrylamide compound from the viewpoint of solubility of components other than the polymerizable compound.
- the (meth) acrylamide compound include N-hydroxyethyl (meth) acrylamide, N-butoxymethyl (meth) acrylamide, Nt-butyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N , N-diethyl (meth) acrylamide, N-dodecyl (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-isobutoxymethyl (meth) Examples thereof include, but are not limited to, acrylamide and N-methoxymethylacrylamide.
- the polymerizable compound preferably includes an ethylenically unsaturated compound having a Tg (glass transition temperature) of a homopolymer of 50 ° C. or higher, and a Tg of 80 ° C. or higher. It is more preferable to include an ethylenically unsaturated compound, and it is further preferable to include an ethylenically unsaturated compound having a Tg of 100 ° C. or higher.
- Examples of the ethylenically unsaturated compound having a Tg of 50 ° C. or higher as the homopolymer include methyl (meth) acrylate, t-butyl (meth) acrylate, benzyl methacrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, and the like. However, it is not limited to these.
- the polymerizable compound preferably includes a polymerizable compound having a urethane bond, more preferably includes a polyfunctional polymerizable compound having a urethane bond, from the viewpoint of the removability and film property of the resulting artificial nail. More preferably, it contains a polyfunctional (meth) acrylate compound having a urethane bond.
- the polymerizable compound preferably includes a polyfunctional polymerizable compound having a molecular weight (weight average molecular weight) of 1,000 or more, and includes a polyfunctional polymerizable compound having a molecular weight (weight average molecular weight) of 3,000 or more. Is more preferable.
- a polyfunctional polymerizable compound having a molecular weight of 1,000 or more the crosslink density is controlled to prevent the film from becoming brittle, and the durability of the artificial nail to be formed is improved.
- Preferred examples of the polyfunctional (meth) acrylate compound having a urethane bond include urethane-based addition polymerizable compounds produced by an addition reaction between an isocyanato group and a hydroxyl group. Specific examples thereof include, for example, Two or more polymerizations in one molecule in which a vinyl monomer containing a hydroxyl group represented by the following formula A is added to an isocyanate compound having two or more isocyanate groups in one molecule described in Japanese Patent No. 48-41708. And vinyl urethane compounds containing a functional vinyl group.
- the isocyanate compound include hexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, and 2,4-dimethyl diisocyanate.
- -Trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate and 2,4-dimethyldiisocyanate are more preferred, and 2,4-dimethyldiisocyanate is more preferred.
- a polyester diisocyanate, a polyether diisocyanate, or a polycarbonate diisocyanate can be suitably used for the purpose of controlling the molecular weight.
- These diisocyanate compounds can be obtained by allowing polyether diol, polyester diol, and polycarbonate diol to react with the diisocyanate compounds described above and others, isophorone diisocyanate, and methylene diphenyl diisocyanate.
- a urethane addition polymerizable compound (more preferably a diol compound and / or a diisocyanate compound) having a polyester structure or a polycarbonate structure can be preferably used.
- a polymeric compound may be contained individually by 1 type, or may use 2 or more types together.
- the content of the polymerizable compound in the artificial nail composition is not particularly limited, but is preferably 1 to 95% by mass and more preferably 10 to 90% by mass with respect to the total mass of the artificial nail composition.
- the content is more preferably 20 to 80% by mass, and particularly preferably 30 to 70% by mass. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range.
- the artificial nail composition preferably contains a photopolymerization initiator.
- a photopolymerization initiator By containing a photopolymerization initiator, the artificial nail composition can be suitably used as a photocurable artificial nail composition.
- the photopolymerization initiator include a radical photopolymerization initiator and a cationic photopolymerization initiator, but it is more preferable to contain a radical photopolymerization initiator.
- a known photopolymerization initiator can be used as the photopolymerization initiator.
- the photoinitiator which can be used for this invention may be used individually by 1 type, and may use 2 or more types together.
- the photopolymerization initiator that can be used in the present invention is a compound that absorbs light and generates a polymerization initiating species. Examples of light include ⁇ rays, ⁇ rays, electron beams, ultraviolet rays, visible rays, and infrared rays, and preferably ultraviolet rays and visible rays.
- photopolymerization initiator that can be used in the present invention are as follows. However, it is not limited to these examples.
- Acetophenone compounds for example, 1-hydroxycyclohexyl phenyl ketone, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 2-hydroxy-2-methylpropiophenone, 4′-isopropyl-2 -Hydroxy-2-methylpropiophenone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-1-propane, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -Butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, etc.); Benzophenone compounds (eg, benzophenone, 4,4′-bis (dimethylamino) benzophenone, 3,3
- the photopolymerization initiator is preferably a photopolymerization initiator selected from the group consisting of an acetophenone compound, a phosphine oxide compound, a metallocene compound, and a lophine dimer compound, and consists of an acetophenone compound and a phosphine oxide compound.
- a photopolymerization initiator selected from the group is preferably 0.1 to 20% by mass, and preferably 0.5 to 15% by mass with respect to the total mass of the artificial nail composition. Is more preferably 1 to 10% by mass. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range.
- the artificial nail composition may contain a solvent from the viewpoint of applicability, but from the viewpoint of safety and handleability, the content of the solvent is the artificial nail composition. Is preferably less than 10% by mass, more preferably less than 5% by mass, and particularly preferably the artificial nail composition does not contain a solvent.
- the solvent any known solvent can be suitably used.
- alcohol solvents such as ethanol, isopropanol, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether and their acetate solvents, ethyl acetate, butyl acetate, etc.
- ester solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone
- ether solvents such as tetrahydrofuran and methyl t-butyl ether.
- the boiling point of the solvent is preferably 30 to 130 ° C, more preferably 35 to 100 ° C, still more preferably 40 to 90 ° C, and more preferably 50 to 85 ° C. Is particularly preferred. It is excellent in drying property and applicability
- the solvent may be contained individually by 1 type, or may use 2 or more types together.
- the solvent preferably includes an alcohol solvent and / or a ketone solvent, and more preferably includes an alcohol solvent and a ketone solvent.
- the artificial nail composition preferably contains a solvent. From the viewpoints of applicability, removal of the obtained artificial nail and adhesion, the content of the solvent is artificial. It is preferably 1 to 90% by mass, more preferably 5 to 80% by mass, still more preferably 10 to 80% by mass, and more preferably 15 to 50% by mass with respect to the total mass of the nail composition. It is particularly preferred.
- additive components that can be generally blended in the artificial nail composition can be arbitrarily blended within a range not impairing the effects of the present invention.
- additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like.
- these arbitrary components may be previously blended in the artificial nail composition, a necessary amount of the necessary components may be blended in the artificial nail composition each time during the cosmetic treatment.
- the artificial nail composition contains a monomer having an amino group as the component b.
- the monomer having an amino group any compound having an ethylenically unsaturated group and an amino group can be used without particular limitation.
- the ethylenically unsaturated group is preferably a group represented by CH 2 ⁇ C (R) —.
- R represents a hydrogen atom or a lower alkyl group (C1-4).
- R is preferably a hydrogen atom or a methyl group.
- the ethylenically unsaturated group is preferably a (meth) acryloyl group or a (meth) acrylamide group.
- the amino group which component b has may be any of a primary amino group, a secondary amino group and a tertiary amino group.
- the primary amino group is a group represented by —NH 2
- the secondary amino group is a group represented by —NH—. Note that —CONH 2 at the molecular end is included in the primary amino group.
- the primary amino group is preferably adjacent to the methylene carbon atom. At least one primary amino group, secondary amino group, and tertiary amino group may be included in the molecule, but two or more may be included.
- the ethylenically unsaturated group in the molecule preferably has addition polymerizability, and preferably has radical polymerizability.
- This compound may be a low molecule or an oligomer.
- the ethylenically unsaturated compound having an amino group include compounds described in JP-A-2009-126833, and examples of the compound having a tertiary amino group include 2-dimethylaminoethyl (meth) Examples include acrylate, 2-dimethylaminomethyl (meth) acrylamide, 3-dimethylaminopropyl (meth) acrylate, 3-dimethylaminopropyl (meth) acrylamide and the like.
- Component b preferably has a primary amino group and / or a secondary amino group from the viewpoint of adhesion to the nail, and component b having a primary amino group and / or a secondary amino group includes Preferably, it is a compound represented by the formula I and / or a compound represented by the formula II shown below.
- R 1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group
- R 2 represents a hydrogen atom or a methyl group
- p represents an integer of 0 to 50
- X represents an alkylene group , -COO-, -CONH-, and -C 6 H 4- represent a linking group selected from the group consisting of:
- Y represents a divalent linking group, and a plurality of Y may be the same or different from each other.
- X and R 1 may combine to form a ring.
- R 2 represents a hydrogen atom or a methyl group
- p represents an integer of 0 to 50
- X represents an alkylene group, —COO—, —CONH—, and —C 6 H 4 —.
- Y represents a divalent linking group, and a plurality of Y may be the same or different.
- R 1 represents a hydrogen atom or an alkyl group, a cycloalkyl group, or an aryl group.
- the alkyl group that R 1 can adopt preferably has 1 to 6 carbon atoms, and examples thereof include a methyl group, an ethyl group, an isopropyl group, a t-butyl group, and an n-hexyl group.
- the cycloalkyl group that R 1 can take has preferably 3 to 6 carbon atoms, and more preferably a cyclopentyl group or a cyclohexyl group.
- the aryl group preferably has 6 to 12 carbon atoms, and more preferably a phenyl group.
- the ring is preferably a piperidine ring or a pyrrolidine ring.
- R 1 may have a substituent, if allowed, and the type thereof is not particularly limited, but is preferably a group inert to radical polymerization, more preferably a hydroxyl group.
- R 1 is preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and a hydrogen atom, a methyl group, an ethyl group or hydroxyethyl Particularly preferred is a group.
- R 2 represents a hydrogen atom or a methyl group.
- p is a repeat number and represents an integer of 0 to 50, preferably an integer of 0 to 30, more preferably an integer of 0 to 20, and further preferably an integer of 0 to 10.
- X is a linking group selected from the group consisting of an alkylene group, —COO—, —CONH—, and —C 6 H 4 —.
- the alkylene group preferably has 1 to 4 carbon atoms, more preferably a methylene group or ethylene group, and particularly preferably a methylene group.
- X is preferably an alkylene group, —COO— or —CONH—, and particularly preferably —CONH—.
- Y is a divalent linking group, and when p is 2 or more, a plurality of Y may be the same or different from each other. Y and R 1 may be bonded to form a ring.
- Y preferably represents an alkylene group, an alkyleneoxy group, an alkyleneamino group, a carbonyl group, or a group obtained by combining these.
- the alkylene group preferably has 1 to 10 carbon atoms, more preferably an ethylene group or a propylene group.
- an ethyleneoxy group is preferable.
- Y is particularly preferably an ethylene group or a propylene group, an ethyleneoxy group, a propyleneoxy group, or a butyleneamide group.
- R 2 , X, Y, and p are the same as defined in Formula I, and preferred ranges are also the same.
- Formula I is a monofunctional compound having only one radical polymerizable ethylenically unsaturated group
- Formula II is a bifunctional compound having two radical polymerizable ethylenically unsaturated groups.
- the use ratio of the monofunctional compound is high, the removal property of the cured film is excellent.
- the use ratio of the bifunctional compound is high, the curability is excellent. Therefore, both compounds represented by the formulas I and II are mixed at an appropriate ratio. It is preferable to mix and adjust curability, adhesion, and removability as appropriate. In addition, it is excellent in the adhesiveness and removability of the cured film obtained, so that the amine value of the compound represented by Formula I and Formula II is high.
- the amine value of the non-volatile component of the artificial nail composition according to the present invention is preferably 0.4 to 8.5 mmol / g, and 1.3 to 8.5 mmol / g. More preferably, it is 1.3 to 6.0 mmol / g. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range.
- the “nonvolatile component” means a component other than that when a volatile solvent is included.
- a sample is weighed into a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
- the amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (nonvolatile component).
- Component b can be obtained as a commercial product, or can be synthesized by a method known to those skilled in the art.
- component b is shown below, but are not limited to these specific examples.
- the blending amount of component b in the artificial nail composition is preferably 5 to 80% by mass and more preferably 10 to 60% by mass with respect to the non-volatile component of the composition.
- the artificial nail composition preferably contains a photopolymerization initiator.
- a photoinitiator the photoinitiator described in the aspect of said (ii) is illustrated, and a preferable aspect is the same.
- the artificial nail composition preferably contains a polymer component as a film forming agent.
- the weight average molecular weight of the polymer component is preferably from 2,000 to 300,000, more preferably from 3,000 to 200,000, still more preferably from 4,000 to 100,000. It is especially preferable that it is 50,000 or more and 50,000 or less. It is excellent in the adhesiveness of the hardened
- the film-forming agent means a material that forms a self-supporting film alone when it is formed on a base, preferably a polymer component having a weight average molecular weight of 5,000 or more. is there.
- the type of polymer component is not particularly limited, and is an acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea polymer.
- Known polymers such as ethylene-based polymers are used. From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are particularly preferred, and urethanes A polymer is most preferable.
- acrylic polymer examples include known acrylic acid derivatives (for example, acrylic esters such as methyl acrylate and ethyl acrylate, acrylic amides such as acrylamide and acryloylmorpholine), and methacrylic acid derivatives (for example, methyl methacrylate, methacrylic acid).
- Any polymer can be suitably used as long as it is a polymer obtained by polymerizing a methacrylic acid ester such as ethyl or a methacrylic acid amide such as methacrylamide or isopropylamide.
- an acrylic polymer containing an addition polymerizable curable group (for example, (meth) acryl group or the like) in the side chain is preferably used.
- an acrylic polymer containing an addition polymerizable curable group for example, (meth) acryl group or the like
- urethane polymer examples include known polyisocyanate compounds (for example, tolylene diisocyanate, isophorone diisocyanate) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylenediols such as p-hydroxystyrene, polyethylene)
- Any polyurethane can be used as long as it is made of a polyether diol such as glycol or polypropylene glycol, a polyester diol such as polyethylene glycol terephthalate, or a polycarbonate diol such as polyethylene glycol carbonate.
- a polyether diol such as glycol or polypropylene glycol
- polyester diol such as polyethylene glycol terephthalate
- polycarbonate diol such as polyethylene glycol carbonate
- cellulose polymer any known cellulose such as carboxymethylcellulose, nitrocellulose, triacetylcellulose, and the like can be preferably used. However, it is not limited to these examples.
- any polyester comprising a known polycarboxylic acid compound (for example, succinic acid, adipic acid, phthalic acid, etc.) and a known polyol compound can be suitably used.
- polyesters composed of hydroxycarboxylic acid compounds such as polylactic acid can also be suitably used. However, it is not limited to these examples.
- any polyamide can be suitably used as long as it is a polyamide comprising a known polycarboxylic acid compound and a known polyamine compound (for example, ethylenediamine, phenylenediamine, etc.).
- polyamino acids which are proteins composed of amino acids, can also be preferably used. However, it is not limited to these examples.
- any vinyl polymer obtained by polymerizing a known vinyl compound for example, vinyl acetate, vinyl chloride, butadiene, etc.
- a known vinyl compound for example, vinyl acetate, vinyl chloride, butadiene, etc.
- any polyether for example, polyethylene glycol, polypropylene glycol, etc.
- a known polyol compound for example, polyethylene glycol, polypropylene glycol, etc.
- any polystyrene can be suitably used as long as it is made of a known styrene compound (for example, styrene, 4-carboxystyrene, 4-acetoxystyrene, etc.). However, it is not limited to these examples.
- any polycarbonate can be suitably used as long as it is a polycarbonate composed of a known carbonic acid derivative (for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.) and a known polyol compound. However, it is not limited to these examples.
- a known carbonic acid derivative for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.
- any polyurea composed of a known polyisocyanate compound and a known polyamine compound can be suitably used. However, it is not limited to these examples.
- the content of the polymer component is preferably 0 to 80% by mass and more preferably 20 to 60% by mass with respect to the total mass of the nonvolatile components of the artificial nail composition.
- a polymerizable compound having no amino group may be contained in addition to the component b.
- the polymerizable compound having no amino group include compounds having no amino group among the polymerizable compounds described as the polymerizable compound in the embodiment in (ii), and the preferred embodiments are also the same.
- a solvent may be contained in addition to the above components.
- the solvent include the solvents described in the above embodiment (ii), and preferred embodiments are also the same.
- blended in the artificial nail composition can be arbitrarily mix
- additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like.
- these arbitrary components may be previously blended in the artificial nail composition, a necessary amount of the necessary components may be blended in the artificial nail composition each time during the cosmetic treatment.
- the amount of each component in the artificial nail composition is not particularly limited, but the mass ratio of the non-volatile components in the artificial nail composition is component b / photopolymerization.
- Initiator / polymer component / polymerizable compound having no amino group preferably in the range of 50 to 80 / 0.01 to 20/0 to 80/0 to 50.
- the total of component b to polymerizable compound having no amino group is 100 parts by mass. It is excellent in applicability
- the artificial nail is an acrylic polymer, urethane polymer (also referred to as urethane polymer or polyurethane), cellulose polymer, ester polymer, amide polymer, vinyl polymer. And at least one polymer selected from the group consisting of an ether polymer, a styrene polymer, a carbonate polymer, a urea polymer, and an ethylene polymer.
- ether polymers From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are particularly preferred, and adhesion From the viewpoint of properties, urethane polymers are most preferable.
- acrylic polymer cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea polymer and ethylene polymer, in the embodiment (iii) above, Various polymers described as the polymer component are exemplified, and preferred ranges are also the same.
- the artificial nail composition may further contain a polymerization initiator and a polymerizable compound, and may be a photocurable artificial nail composition that is cured by exposure, and also contains a solvent and is dried.
- a so-called artificial nail composition for nail polish that forms an artificial nail may be used.
- a photocurable artificial nail composition is preferable.
- the removal liquid of the present invention is suitable for removing an artificial nail containing a urethane polymer (polyurethane), and is suitably used for removing an artificial nail formed with an artificial nail composition containing a urethane polymer.
- polyurethane examples include known polyisocyanate compounds (for example, tolylene diisocyanate, isophorone diisocyanate, etc.) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylenediols such as p-hydroxystyrene, polyethylene glycol, Any polyurethane can be used as long as it is made of a polyether diol such as polypropylene glycol, a polyester diol such as polyethylene glycol terephthalate, and a polycarbonate diol such as polyethylene glycol carbonate. However, it is not limited to these examples. Although the specific example used suitably as a polyurethane is shown below, this invention is not limited to these. The number on the lower right of the parenthesis of each monomer unit represents the molar ratio.
- the polymerization initiator and the polymerizable compound described in the aspect of (ii) above may be used as the polymerization initiator and the polymerizable compound. It is preferably used and the preferred range is also the same.
- the embodiments (ii) to (iv) are preferable, the embodiment (ii) or (iii) is more preferable, and (ii) More preferably,
- the method for forming an artificial nail is not particularly limited as long as it is a method for forming an artificial nail using an artificial nail composition, but the artificial nail composition may be applied to a human or animal nail or other It is preferable that the method includes a step of coating the artificial nail to form a coating film, and a step of drying and / or exposing the coating film to form an artificial nail.
- a dry or exposure forming method can be suitably selected.
- the artificial nail composition preferably contains at least a polymer, a polymerizable compound, and a photopolymerization initiator, or contains at least a polymer and a solvent.
- the thickness of the layer formed by the artificial nail composition is not particularly limited, but is preferably 10 to 2,000 ⁇ m, more preferably 20 to 1,500 ⁇ m. It is preferably 20 to 1,000 ⁇ m.
- the method for forming an artificial nail preferably includes a step (application step) of applying an artificial nail composition on a human or animal nail or other artificial nail to form a coating film.
- the other artificial nail is not particularly limited as long as it is a base material used for the artificial nail, and examples thereof include a resin base material.
- limiting in particular as a coating method Although what is necessary is just to perform by a well-known method, The method of apply
- the thickness of the coating film is not particularly limited, and the coating thickness may be appropriately adjusted in consideration of the desired thickness of the obtained artificial nail.
- the method for forming an artificial nail preferably includes a step of drying and / or exposing the coating film to form an artificial nail (drying or exposure step).
- the artificial nail composition to be used preferably contains a solvent.
- a drying method What is necessary is just to carry out by a well-known method. Specifically, for example, a method of leaving and drying at room temperature (for example, 10 to 30 ° C.), a method of leaving and drying in an air stream, a method of drying by heating, and a method combining these are preferable.
- the heating method is not particularly limited, and examples thereof include a method of leaving in an atmosphere at a temperature higher than room temperature, a method of leaving in a heated air current, and a method of heating by a heating means such as a heater or an infrared lamp (IR lamp). .
- the drying time is not particularly limited and may be appropriately adjusted depending on the composition of the artificial nail composition, the drying method, and the coating thickness. From the viewpoint of simplicity and imparting smoothness and gloss by self-leveling, 10 seconds to It is preferably 20 minutes, more preferably 15 seconds to 10 minutes, further preferably 30 seconds to 5 minutes, and particularly preferably 30 seconds to 2 minutes.
- the artificial nail composition to be used preferably contains a polymerizable compound and a photopolymerization initiator. Moreover, when the artificial nail composition contains a solvent in addition to the polymerizable compound and the photopolymerization initiator, drying is preferably performed before exposure. Examples of light used for exposure include ultraviolet rays and visible rays, and ultraviolet rays are particularly preferable from the viewpoint of curing sensitivity and availability of the apparatus.
- the exposure means is not particularly limited, and known exposure means can be used. For example, ultraviolet lamps (UV lamps) such as mercury lamps and metal halide lamps, light emitting diodes (LEDs), laser diodes (LDs), etc. Can be mentioned.
- the exposure time is not particularly limited, but is preferably 2 seconds to 5 minutes, more preferably 5 seconds to 3 minutes, and further preferably 5 seconds to 2 minutes.
- the exposure may be performed intermittently, continuously, or with pulsed light, and may be performed by any method.
- the method for forming the artificial nail is a method for cleaning or sculpting the surface of the obtained artificial nail after the drying or exposure step from the viewpoint of removing the uncured component when exposed to gloss and aesthetics.
- a step of wiping off may be included.
- the washing or wiping method include a method of wiping with a wiping base material such as a wipe sheet or a sponge wipe containing a solvent such as ethanol, and a method of washing with a solvent such as ethanol or water.
- the solvent used for cleaning or wiping is preferably a solvent that does not dissolve the obtained artificial nail.
- the method for forming an artificial nail preferably includes a step of roughening the surface of a human or animal nail or other artificial nail before the coating step when performing exposure.
- the adhesiveness and durability of the artificial nail (gel nail) obtained by exposing as it is the said aspect.
- a roughening method of the nail claw surface
- a method of roughening with a nail file such as a file is preferred.
- the formation method of the artificial nail may include other known processes.
- each reagent used for the removal liquid is as follows. Citric acid (manufactured by Tokyo Chemical Industry Co., Ltd.) Trisodium citrate dihydrate (manufactured by Wako Pure Chemical Industries, Ltd.) Methanol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 31.2 mmol / g Ethanol (manufactured by Kanto Chemical Co., Inc.), hydroxyl value: 21.7 mmol / g Isopropyl alcohol (manufactured by Kanto Chemical Co., Inc.), hydroxyl value: 16.6 mmol / g PVA-105 (manufactured by Kuraray Co., Ltd.), hydroxyl value: 22.7 mmol / g PEG Mw200 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 10.0 mmol / g PEG Mw300 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value
- J-8 Commercial product, manufactured by Mogabrook, Calgel # CG-00 Clear Gel, polyurethane methacrylate included
- top gel manufactured by Mogabrook Co., Ltd.
- a commercially available top gel was applied as a top layer with a brush, and similarly irradiated with an ultraviolet lamp (36 W) for 5 minutes.
- an ultraviolet lamp 36 W
- the total film thickness of the color layer and the top layer was about 250 ⁇ m.
- the surface was wiped off with ethanol.
- the surface and tip of the resulting artificial nail were scratched with a file (file for nails), then immersed in the removal solution described in Table 13 for 2 minutes, and pressed using a wooden stick while being immersed.
- the peeling treatment which peels was performed, and the time (removal time; time required for peeling treatment) until peeling was evaluated.
- the surface roughness of the general nail is 13.9% as a result of measuring ⁇ S using an atomic force microscope (AFM), and an aluminum plywood (thickness is 0.3 ⁇ m) to match the value.
- JIS 1050, JIS 1100, JIS 3003 and other aluminum alloys The brush process was performed as follows. Using three bundle-planted nylon brushes with a bristle diameter of 0.3 mm and a pumice-water suspension with a median diameter of 25 ⁇ m (specific gravity 1.1 g / cm 3 ), the surface of the aluminum alloy plate sample is grained and washed with water. Washed. This sample was immersed in a 25 mass% sodium hydroxide aqueous solution at 70 ° C.
- the washed sample was immersed in a 20% nitric acid aqueous solution at 60 ° C. for 20 seconds and washed with water.
- an aluminum alloy such as JIS1050, JIS1100, and JIS3003 having a thickness of 0.3 ⁇ m was used.
- Example 5-1 and Comparative example 5-1 Using the artificial nail composition described in Japanese Patent Application Laid-Open No. 2009-126833, a comparison test was performed between the removal liquid of the present invention and the removal liquid described in the prior art.
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Abstract
The purpose of the present invention is to provide an artificial nail removal liquid that shortens removal time, to provide an artificial nail removal method that uses the artificial nail removal liquid, and to provide a nail art kit. According to the present invention, an artificial nail removal liquid is characterized by containing an acid compound as a component (A), a compound that has a hydroxyl group as a component (B), and water as a component (C). The pH of the artificial nail removal liquid is preferably 1-5. The artificial nail removal liquid preferably contains an organic acid as the component (A) and preferably contains a compound that has a hydroxyl value of 5 mmol/g or more as the component (B). According to the present invention, an artificial nail is preferably formed from an artificial nail composition that contains at least one compound selected from the group that comprises a urethane polymer, a polymer that has an amino group, and a monomer that has an amino group.
Description
本発明は、人工爪用除去液、人工爪の除去方法、及び、ネイルアートキットに関する。
The present invention relates to an artificial nail remover, an artificial nail removal method, and a nail art kit.
近年、手や足の爪にデザインを施すネイルアートに対する人気が高まり、爪(自爪)に合成樹脂製の人工爪(付け爪、ネイルチップ等)を形成する技術が発展している。特に最近、ウレタン系樹脂と光重合性モノマーとを含むジェル状の装飾用硬化性組成物を爪に塗布した後、紫外線を照射して硬化させた人工爪と呼ばれる爪装飾が、仕上がりがクリアである、爪との密着性が高く長持ちする、アクリル系樹脂のような臭いがない、等の理由から注目を集めている。
この人工爪を除去するときは、従来、人工爪表面を粗目のファイル(爪用やすり)でこすって傷を付けて除去液を滲み込みやすくさせた後、アセトン等の有機溶媒(除去液)に浸したコットンを上記人工爪上に載せ、これをアルミホイル等で巻いてそのまま放置して人工爪を膨潤させた後、この膨潤した人工爪を木製のへら等のスティック状器具等を用いて剥がす方法が主流である(特許文献1参照)。
また、従来の人工爪組成物としては、特許文献2又は3に記載された組成物が知られている。 In recent years, the popularity of nail art for designing hands and toenails has increased, and techniques for forming synthetic resin artificial nails (fake nails, nail tips, etc.) on nails (self nails) have been developed. Recently, a nail decoration called an artificial nail that has been cured by irradiating ultraviolet rays after applying a gel-like decorative curable composition containing a urethane-based resin and a photopolymerizable monomer to the nail has a clear finish. They are attracting attention for reasons such as high adhesion to nails and long-lastingness, and no smell like acrylic resins.
When removing this artificial nail, the surface of the artificial nail is conventionally rubbed with a coarse file (nail file) to make it easy to soak up the removal solution, and then in an organic solvent (removal solution) such as acetone. Place the soaked cotton on the artificial nail, wrap it with aluminum foil, leave it as it is, swell the artificial nail, and then peel off the swollen artificial nail using a stick-like instrument such as a wooden spatula The method is mainstream (see Patent Document 1).
Moreover, the composition described in patent document 2 or 3 is known as a conventional artificial nail composition.
この人工爪を除去するときは、従来、人工爪表面を粗目のファイル(爪用やすり)でこすって傷を付けて除去液を滲み込みやすくさせた後、アセトン等の有機溶媒(除去液)に浸したコットンを上記人工爪上に載せ、これをアルミホイル等で巻いてそのまま放置して人工爪を膨潤させた後、この膨潤した人工爪を木製のへら等のスティック状器具等を用いて剥がす方法が主流である(特許文献1参照)。
また、従来の人工爪組成物としては、特許文献2又は3に記載された組成物が知られている。 In recent years, the popularity of nail art for designing hands and toenails has increased, and techniques for forming synthetic resin artificial nails (fake nails, nail tips, etc.) on nails (self nails) have been developed. Recently, a nail decoration called an artificial nail that has been cured by irradiating ultraviolet rays after applying a gel-like decorative curable composition containing a urethane-based resin and a photopolymerizable monomer to the nail has a clear finish. They are attracting attention for reasons such as high adhesion to nails and long-lastingness, and no smell like acrylic resins.
When removing this artificial nail, the surface of the artificial nail is conventionally rubbed with a coarse file (nail file) to make it easy to soak up the removal solution, and then in an organic solvent (removal solution) such as acetone. Place the soaked cotton on the artificial nail, wrap it with aluminum foil, leave it as it is, swell the artificial nail, and then peel off the swollen artificial nail using a stick-like instrument such as a wooden spatula The method is mainstream (see Patent Document 1).
Moreover, the composition described in patent document 2 or 3 is known as a conventional artificial nail composition.
本発明の目的は、除去時間が短縮された人工爪用除去液を提供することである。また、本発明の他の目的は、上記人工爪用除去液を使用した人工爪の除去方法、及び、ネイルアートキットを提供することである。
An object of the present invention is to provide an artificial nail removal liquid with a reduced removal time. Another object of the present invention is to provide a method for removing an artificial nail using the artificial nail removing solution and a nail art kit.
上記目的は、下記<1>、<12>及び<13>に記載の手段により達成された。好ましい実施態様である<2>~<11>、<14>~<16>と共に以下に示す。
<1> 成分Aとして酸化合物、成分Bとして水酸基を有する化合物、及び、成分Cとして水を含有することを特徴とする、人工爪用除去液、
<2> pHが1以上5以下である、<1>に記載の人工爪用除去液、
<3> 成分Aとして、少なくとも1つの有機酸(より好ましくはカルボン酸)を含有する、<1>又は<2>に記載の人工爪用除去液、
<4> 人工爪除去液中の成分Aの含有量が、人工爪除去液の全質量に対して0.05~20質量%(より好ましくは0.1~10質量%、更に好ましくは0.5~5質量%)である、<1>~<3>のいずれか1つに記載の人工爪用除去液、
<5> 成分Bが、水酸基価が5mmol/g以上の化合物(より好ましくは8mmol/g以上の化合物)を含有する、<1>~<4>のいずれか1つに記載の人工爪用除去液、
<6> 人工爪用除去液中の成分Bの含有量が、人工爪用除去液の全質量に対し、0.01~20質量%(より好ましくは0.05~10質量%、更に好ましくは0.1~5質量%)である、<1>~<5>のいずれか1つに記載の人工爪用除去液、
<7> 人工爪がウレタンポリマーを含有する、<1>~<8>のいずれか1つに記載の人工爪用除去液、
<8> 人工爪がアミノ基を有するポリマーを含有する、<1>~<7>のいずれか1つに記載の人工爪除去液、
<9> 人工爪が、アミノ基を有するポリマーを含有する人工爪組成物により形成された人工爪である、<1>~<8>のいずれか1つに記載の人工爪用除去液、
<10> 人工爪が、アミノ基を有するモノマーを含有する人工爪組成物により形成された人工爪である、<1>~<9>のいずれか1つに記載の人工爪用除去液、
<11> 人工爪が、光硬化性人工爪組成物の硬化により形成された人工爪である、<1>~<10>のいずれか1つに記載の人工爪用除去液、
<12> 人工爪に、<1>~<11>のいずれか1つに記載の除去液を接触させる工程を含む、人工爪の除去方法、
<13> 人工爪組成物と、<1>~<11>のいずれか1つに記載の人工爪用除去液と、を含むネイルアートキット、
<14> 人工爪組成物が、アミノ基を有するポリマーを含有する、<13>に記載のネイルアートキット、
<15> 人工爪組成物が、アミノ基を有するモノマーを含有する、<13>又は<14>に記載のネイルアートキット、
<16> 人工爪組成物が、光硬化性人工爪組成物である、<13>~<15>のいずれか1つに記載のネイルアートキット。 The above object has been achieved by the means described in <1>, <12> and <13> below. It is shown below together with <2> to <11> and <14> to <16>, which are preferred embodiments.
<1> An artificial nail removal liquid, comprising an acid compound as component A, a compound having a hydroxyl group as component B, and water as component C,
<2> The removal solution for artificial nails according to <1>, wherein the pH is 1 or more and 5 or less,
<3> The removal liquid for artificial nail according to <1> or <2>, which contains at least one organic acid (more preferably, carboxylic acid) as component A,
<4> The content of Component A in the artificial nail removal liquid is 0.05 to 20% by mass (more preferably 0.1 to 10% by mass, and still more preferably 0.1% by mass relative to the total mass of the artificial nail removal liquid. 5-5% by mass), the removal solution for artificial nails according to any one of <1> to <3>,
<5> The removal for an artificial nail according to any one of <1> to <4>, wherein the component B contains a compound having a hydroxyl value of 5 mmol / g or more (more preferably a compound having 8 mmol / g or more) liquid,
<6> The content of Component B in the artificial nail remover is 0.01 to 20% by mass (more preferably 0.05 to 10% by mass, and still more preferably) with respect to the total mass of the artificial nail remover 0.1-5% by mass), the removal solution for artificial nail according to any one of <1> to <5>,
<7> The artificial nail removal solution according to any one of <1> to <8>, wherein the artificial nail contains a urethane polymer,
<8> The artificial nail removal solution according to any one of <1> to <7>, wherein the artificial nail contains a polymer having an amino group.
<9> The artificial nail removal liquid according to any one of <1> to <8>, wherein the artificial nail is an artificial nail formed of an artificial nail composition containing a polymer having an amino group.
<10> The artificial nail removal liquid according to any one of <1> to <9>, wherein the artificial nail is an artificial nail formed of an artificial nail composition containing a monomer having an amino group.
<11> The artificial nail removal liquid according to any one of <1> to <10>, wherein the artificial nail is an artificial nail formed by curing a photocurable artificial nail composition,
<12> A method for removing an artificial nail, comprising the step of bringing the removal liquid according to any one of <1> to <11> into contact with the artificial nail,
<13> A nail art kit comprising an artificial nail composition and the removal solution for artificial nail according to any one of <1> to <11>,
<14> The nail art kit according to <13>, wherein the artificial nail composition contains a polymer having an amino group.
<15> The nail art kit according to <13> or <14>, wherein the artificial nail composition contains a monomer having an amino group,
<16> The nail art kit according to any one of <13> to <15>, wherein the artificial nail composition is a photocurable artificial nail composition.
<1> 成分Aとして酸化合物、成分Bとして水酸基を有する化合物、及び、成分Cとして水を含有することを特徴とする、人工爪用除去液、
<2> pHが1以上5以下である、<1>に記載の人工爪用除去液、
<3> 成分Aとして、少なくとも1つの有機酸(より好ましくはカルボン酸)を含有する、<1>又は<2>に記載の人工爪用除去液、
<4> 人工爪除去液中の成分Aの含有量が、人工爪除去液の全質量に対して0.05~20質量%(より好ましくは0.1~10質量%、更に好ましくは0.5~5質量%)である、<1>~<3>のいずれか1つに記載の人工爪用除去液、
<5> 成分Bが、水酸基価が5mmol/g以上の化合物(より好ましくは8mmol/g以上の化合物)を含有する、<1>~<4>のいずれか1つに記載の人工爪用除去液、
<6> 人工爪用除去液中の成分Bの含有量が、人工爪用除去液の全質量に対し、0.01~20質量%(より好ましくは0.05~10質量%、更に好ましくは0.1~5質量%)である、<1>~<5>のいずれか1つに記載の人工爪用除去液、
<7> 人工爪がウレタンポリマーを含有する、<1>~<8>のいずれか1つに記載の人工爪用除去液、
<8> 人工爪がアミノ基を有するポリマーを含有する、<1>~<7>のいずれか1つに記載の人工爪除去液、
<9> 人工爪が、アミノ基を有するポリマーを含有する人工爪組成物により形成された人工爪である、<1>~<8>のいずれか1つに記載の人工爪用除去液、
<10> 人工爪が、アミノ基を有するモノマーを含有する人工爪組成物により形成された人工爪である、<1>~<9>のいずれか1つに記載の人工爪用除去液、
<11> 人工爪が、光硬化性人工爪組成物の硬化により形成された人工爪である、<1>~<10>のいずれか1つに記載の人工爪用除去液、
<12> 人工爪に、<1>~<11>のいずれか1つに記載の除去液を接触させる工程を含む、人工爪の除去方法、
<13> 人工爪組成物と、<1>~<11>のいずれか1つに記載の人工爪用除去液と、を含むネイルアートキット、
<14> 人工爪組成物が、アミノ基を有するポリマーを含有する、<13>に記載のネイルアートキット、
<15> 人工爪組成物が、アミノ基を有するモノマーを含有する、<13>又は<14>に記載のネイルアートキット、
<16> 人工爪組成物が、光硬化性人工爪組成物である、<13>~<15>のいずれか1つに記載のネイルアートキット。 The above object has been achieved by the means described in <1>, <12> and <13> below. It is shown below together with <2> to <11> and <14> to <16>, which are preferred embodiments.
<1> An artificial nail removal liquid, comprising an acid compound as component A, a compound having a hydroxyl group as component B, and water as component C,
<2> The removal solution for artificial nails according to <1>, wherein the pH is 1 or more and 5 or less,
<3> The removal liquid for artificial nail according to <1> or <2>, which contains at least one organic acid (more preferably, carboxylic acid) as component A,
<4> The content of Component A in the artificial nail removal liquid is 0.05 to 20% by mass (more preferably 0.1 to 10% by mass, and still more preferably 0.1% by mass relative to the total mass of the artificial nail removal liquid. 5-5% by mass), the removal solution for artificial nails according to any one of <1> to <3>,
<5> The removal for an artificial nail according to any one of <1> to <4>, wherein the component B contains a compound having a hydroxyl value of 5 mmol / g or more (more preferably a compound having 8 mmol / g or more) liquid,
<6> The content of Component B in the artificial nail remover is 0.01 to 20% by mass (more preferably 0.05 to 10% by mass, and still more preferably) with respect to the total mass of the artificial nail remover 0.1-5% by mass), the removal solution for artificial nail according to any one of <1> to <5>,
<7> The artificial nail removal solution according to any one of <1> to <8>, wherein the artificial nail contains a urethane polymer,
<8> The artificial nail removal solution according to any one of <1> to <7>, wherein the artificial nail contains a polymer having an amino group.
<9> The artificial nail removal liquid according to any one of <1> to <8>, wherein the artificial nail is an artificial nail formed of an artificial nail composition containing a polymer having an amino group.
<10> The artificial nail removal liquid according to any one of <1> to <9>, wherein the artificial nail is an artificial nail formed of an artificial nail composition containing a monomer having an amino group.
<11> The artificial nail removal liquid according to any one of <1> to <10>, wherein the artificial nail is an artificial nail formed by curing a photocurable artificial nail composition,
<12> A method for removing an artificial nail, comprising the step of bringing the removal liquid according to any one of <1> to <11> into contact with the artificial nail,
<13> A nail art kit comprising an artificial nail composition and the removal solution for artificial nail according to any one of <1> to <11>,
<14> The nail art kit according to <13>, wherein the artificial nail composition contains a polymer having an amino group.
<15> The nail art kit according to <13> or <14>, wherein the artificial nail composition contains a monomer having an amino group,
<16> The nail art kit according to any one of <13> to <15>, wherein the artificial nail composition is a photocurable artificial nail composition.
本発明によれば、除去時間が短縮された人工爪用除去液が提供された。また、上記人工爪用除去液を使用した人工爪の除去方法、及び、ネイルアートキットが提供された。
According to the present invention, a removal liquid for artificial nails having a reduced removal time is provided. Moreover, the removal method of the artificial nail using the said removal liquid for artificial nails and the nail art kit were provided.
以下、本発明について詳細に説明する。
なお、本明細書中、「xx~yy」の記載は、xx及びyyを含む数値範囲を表す。また、「(成分A)酸化合物」等を、単に「成分A」等ともいう。
また、本発明において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
以下の説明において、「人工爪組成物」とは、人工爪を形成するための組成物である。
本明細書中、式で表される化合物における基の表記に関して、置換あるいは無置換を記していない場合、当該基が更に置換基を有することが可能な場合には、他に特に規定がない限り、無置換の基のみならず置換基を有する基も包含する。例えば、式の説明において、「Rはアルキル基、アリール基又は複素環基を表す」との記載があれば、「Rは無置換アルキル基、置換アルキル基、無置換アリール基、置換アリール基、無置換複素環基又は置換複素環基を表す」ことを意味する。また、本明細書中、(メタ)アクリルは、アクリルとメタクリルとを共に含む概念を表し、(メタ)アクリレート等についても同様である。
また、本明細書におけるポリマーには、コポリマーを含むものとする。
本発明において、2以上の好ましい態様の組み合わせはより好ましい。 Hereinafter, the present invention will be described in detail.
In the present specification, the description of “xx to yy” represents a numerical range including xx and yy. Further, “(component A) acid compound” or the like is also simply referred to as “component A” or the like.
In the present invention, “mass%” and “wt%” are synonymous, and “part by mass” and “part by weight” are synonymous.
In the following description, the “artificial nail composition” is a composition for forming an artificial nail.
In the present specification, regarding the notation of the group in the compound represented by the formula, when there is no substitution or no substitution, the group can further have a substituent unless otherwise specified. In addition to an unsubstituted group, a group having a substituent is also included. For example, in the description of the formula, if there is a description that “R represents an alkyl group, an aryl group or a heterocyclic group”, “R is an unsubstituted alkyl group, a substituted alkyl group, an unsubstituted aryl group, a substituted aryl group, Represents an unsubstituted heterocyclic group or a substituted heterocyclic group. Moreover, in this specification, (meth) acryl represents the concept containing both acryl and methacryl, and the same applies to (meth) acrylate and the like.
Moreover, the polymer in this specification shall include a copolymer.
In the present invention, a combination of two or more preferred embodiments is more preferred.
なお、本明細書中、「xx~yy」の記載は、xx及びyyを含む数値範囲を表す。また、「(成分A)酸化合物」等を、単に「成分A」等ともいう。
また、本発明において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
以下の説明において、「人工爪組成物」とは、人工爪を形成するための組成物である。
本明細書中、式で表される化合物における基の表記に関して、置換あるいは無置換を記していない場合、当該基が更に置換基を有することが可能な場合には、他に特に規定がない限り、無置換の基のみならず置換基を有する基も包含する。例えば、式の説明において、「Rはアルキル基、アリール基又は複素環基を表す」との記載があれば、「Rは無置換アルキル基、置換アルキル基、無置換アリール基、置換アリール基、無置換複素環基又は置換複素環基を表す」ことを意味する。また、本明細書中、(メタ)アクリルは、アクリルとメタクリルとを共に含む概念を表し、(メタ)アクリレート等についても同様である。
また、本明細書におけるポリマーには、コポリマーを含むものとする。
本発明において、2以上の好ましい態様の組み合わせはより好ましい。 Hereinafter, the present invention will be described in detail.
In the present specification, the description of “xx to yy” represents a numerical range including xx and yy. Further, “(component A) acid compound” or the like is also simply referred to as “component A” or the like.
In the present invention, “mass%” and “wt%” are synonymous, and “part by mass” and “part by weight” are synonymous.
In the following description, the “artificial nail composition” is a composition for forming an artificial nail.
In the present specification, regarding the notation of the group in the compound represented by the formula, when there is no substitution or no substitution, the group can further have a substituent unless otherwise specified. In addition to an unsubstituted group, a group having a substituent is also included. For example, in the description of the formula, if there is a description that “R represents an alkyl group, an aryl group or a heterocyclic group”, “R is an unsubstituted alkyl group, a substituted alkyl group, an unsubstituted aryl group, a substituted aryl group, Represents an unsubstituted heterocyclic group or a substituted heterocyclic group. Moreover, in this specification, (meth) acryl represents the concept containing both acryl and methacryl, and the same applies to (meth) acrylate and the like.
Moreover, the polymer in this specification shall include a copolymer.
In the present invention, a combination of two or more preferred embodiments is more preferred.
(1)人工爪用除去液
本発明の人工爪用除去液(以下、単に「除去液」ともいう。)は、(成分A)酸化合物、(成分B)水酸基を有する化合物、及び、(成分C)水を含有することを特徴とする。
上述したように、従来、人工爪を除去するときは、人工爪表面を粗目のファイル(爪やすり)でこすって傷を付けて除去液を滲み込みやすくさせた後、アセトン等の有機溶剤(除去液)に浸したコットンを上記人工爪上に載せ、これをアルミホイル等で巻いてそのまま放置して人工爪を膨潤させた後、この膨潤した人工爪を木製のへら等を用いて剥がす方法が主流であった。しかし、この方法では、アセトンを使用するために、爪へのダメージが大きく、また、環境への配慮の観点からも、揮発性有機溶剤の使用が少ないことが求められている。 (1) Artificial nail removal liquid The artificial nail removal liquid of the present invention (hereinafter also simply referred to as “removal liquid”) includes (Component A) an acid compound, (Component B) a compound having a hydroxyl group, and (Component) C) It contains water.
As described above, conventionally, when removing artificial nails, the surface of the artificial nail is rubbed with a coarse file (nail file) to make it easy to soak up the removal solution, and then an organic solvent such as acetone (removal) The method is to place cotton soaked on the above-mentioned artificial nail, wind it with aluminum foil, leave it as it is to swell the artificial nail, and then peel off this swollen artificial nail using a wooden spatula etc. It was mainstream. However, in this method, since acetone is used, damage to the nails is large, and from the viewpoint of environmental consideration, it is required that the use of a volatile organic solvent is small.
本発明の人工爪用除去液(以下、単に「除去液」ともいう。)は、(成分A)酸化合物、(成分B)水酸基を有する化合物、及び、(成分C)水を含有することを特徴とする。
上述したように、従来、人工爪を除去するときは、人工爪表面を粗目のファイル(爪やすり)でこすって傷を付けて除去液を滲み込みやすくさせた後、アセトン等の有機溶剤(除去液)に浸したコットンを上記人工爪上に載せ、これをアルミホイル等で巻いてそのまま放置して人工爪を膨潤させた後、この膨潤した人工爪を木製のへら等を用いて剥がす方法が主流であった。しかし、この方法では、アセトンを使用するために、爪へのダメージが大きく、また、環境への配慮の観点からも、揮発性有機溶剤の使用が少ないことが求められている。 (1) Artificial nail removal liquid The artificial nail removal liquid of the present invention (hereinafter also simply referred to as “removal liquid”) includes (Component A) an acid compound, (Component B) a compound having a hydroxyl group, and (Component) C) It contains water.
As described above, conventionally, when removing artificial nails, the surface of the artificial nail is rubbed with a coarse file (nail file) to make it easy to soak up the removal solution, and then an organic solvent such as acetone (removal) The method is to place cotton soaked on the above-mentioned artificial nail, wind it with aluminum foil, leave it as it is to swell the artificial nail, and then peel off this swollen artificial nail using a wooden spatula etc. It was mainstream. However, in this method, since acetone is used, damage to the nails is large, and from the viewpoint of environmental consideration, it is required that the use of a volatile organic solvent is small.
本発明者等は鋭意検討した結果、成分A~成分Cを含有する除去液を用いることにより、アセトン等の揮発性有機溶剤の使用を抑制しつつ、従来の除去液を使用した場合によりも短い時間で人工爪を除去できることを見出し、本発明を完成するに至った。その詳細な機構は不明であるが、水酸基を有する化合物を除去液中に添加することによって、単に酸性除去液を使用した場合と比較して、除去液と人工爪との親和性が向上し、除去性が向上したものと推定される。
以下、本発明の人工爪用除去液が含有する成分について詳述する。 As a result of intensive studies, the present inventors have reduced the use of a volatile organic solvent such as acetone by using a remover containing components A to C, and are shorter than when a conventional remover is used. It has been found that the artificial nail can be removed in time, and the present invention has been completed. Although the detailed mechanism is unknown, by adding a compound having a hydroxyl group to the removal liquid, the affinity between the removal liquid and the artificial nail is improved as compared with the case where an acidic removal liquid is simply used, It is estimated that the removability is improved.
Hereinafter, the component which the removal liquid for artificial nails of this invention contains is explained in full detail.
以下、本発明の人工爪用除去液が含有する成分について詳述する。 As a result of intensive studies, the present inventors have reduced the use of a volatile organic solvent such as acetone by using a remover containing components A to C, and are shorter than when a conventional remover is used. It has been found that the artificial nail can be removed in time, and the present invention has been completed. Although the detailed mechanism is unknown, by adding a compound having a hydroxyl group to the removal liquid, the affinity between the removal liquid and the artificial nail is improved as compared with the case where an acidic removal liquid is simply used, It is estimated that the removability is improved.
Hereinafter, the component which the removal liquid for artificial nails of this invention contains is explained in full detail.
成分A:酸化合物
本発明の人工爪用除去液は、成分Aとして酸化合物を含有する。酸化合物は、少なくとも1つの水中において解離可能な水素を有する化合物であれば特に限定されない。
本発明に用いられる酸化合物としては、公知の有機酸、無機酸のいずれも使用することができる。取扱い性の観点で、有機酸が好ましく、より好ましいのは、カルボン酸である。
無機酸としては、塩酸、硫酸、硝酸、過塩素酸、炭酸、リン酸等が例示され、炭酸、リン酸が好ましく、炭酸がより好ましい。
有機酸としては、カルボン酸、スルホン酸、硫酸モノエステル、リン酸モノエステル、リン酸ジエステル、ホスホン酸等が例示され、カルボン酸、スルホン酸、リン酸モノエステル、ホスホン酸が好ましく、カルボン酸がより好ましい。
カルボン酸の具体例としては、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、カプロン酸、エナント酸、カプリル酸、ペラルゴン酸、カプリン酸、ラウリン酸、ミリスチン酸、パルミチン酸、マルガリン酸、ステアリン酸、グリコール酸、乳酸、タルトロン酸、グリセリン酸、ヒドロキシ酪酸、2-ヒドロキシ酪酸、3-ヒドロキシ酪酸、γ-ヒドロキシ酪酸、リンゴ酸、酒石酸、シトラマル酸、クエン酸、ロイシン酸、メパロン酸、パントイン酸、リシノール酸、セレブロン酸、キナ酸、シキミ酸、サリチル酸、パニリン酸、シリング酸、レソルシル酸、プロトカテク酸、ゲンチジン酸、没食子酸、マンデル酸、ベンジル酸、アトロラクチン酸、メリロト酸、フロレト酸、クマル酸、ウンベル酸、コーヒー酸、フェラル酸、シナビン酸などが挙げられるが、この限りではない。特に好ましいのは、化粧品で使用されているカルボン酸である。具体例として、酢酸、ギ酸、プロピオン酸、グリコール酸、クエン酸、乳酸、リンゴ酸、アミノ酸類などが挙げられるが、この限りではない。
これらの中でも、クエン酸、グリコール酸、リンゴ酸、酢酸が特に好適である。 Component A: Acid compound The removal liquid for artificial nail of the present invention contains an acid compound as Component A. The acid compound is not particularly limited as long as it is a compound having hydrogen dissociable in at least one water.
As the acid compound used in the present invention, any of known organic acids and inorganic acids can be used. From the viewpoint of handleability, an organic acid is preferable, and a carboxylic acid is more preferable.
Examples of the inorganic acid include hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, carbonic acid, phosphoric acid and the like. Carbonic acid and phosphoric acid are preferable, and carbonic acid is more preferable.
Examples of the organic acid include carboxylic acid, sulfonic acid, sulfuric acid monoester, phosphoric acid monoester, phosphoric diester, phosphonic acid and the like, carboxylic acid, sulfonic acid, phosphoric monoester, and phosphonic acid are preferable, and carboxylic acid is More preferred.
Specific examples of carboxylic acids include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid, margaric acid, stearic acid, Glycolic acid, lactic acid, tartronic acid, glyceric acid, hydroxybutyric acid, 2-hydroxybutyric acid, 3-hydroxybutyric acid, γ-hydroxybutyric acid, malic acid, tartaric acid, citramalic acid, citric acid, leucine acid, meparonic acid, pantoic acid, ricinol Acid, cerebronic acid, quinic acid, shikimic acid, salicylic acid, panillic acid, syringic acid, resorcylic acid, protocatechuic acid, gentisic acid, gallic acid, mandelic acid, benzylic acid, atrolactic acid, mellilotic acid, furoletic acid, coumaric acid, Umberic acid, caffeic acid, ferulic acid, cinnamic acid, etc. It is below, but not limited thereto. Particularly preferred are carboxylic acids used in cosmetics. Specific examples include, but are not limited to, acetic acid, formic acid, propionic acid, glycolic acid, citric acid, lactic acid, malic acid, amino acids and the like.
Among these, citric acid, glycolic acid, malic acid, and acetic acid are particularly suitable.
本発明の人工爪用除去液は、成分Aとして酸化合物を含有する。酸化合物は、少なくとも1つの水中において解離可能な水素を有する化合物であれば特に限定されない。
本発明に用いられる酸化合物としては、公知の有機酸、無機酸のいずれも使用することができる。取扱い性の観点で、有機酸が好ましく、より好ましいのは、カルボン酸である。
無機酸としては、塩酸、硫酸、硝酸、過塩素酸、炭酸、リン酸等が例示され、炭酸、リン酸が好ましく、炭酸がより好ましい。
有機酸としては、カルボン酸、スルホン酸、硫酸モノエステル、リン酸モノエステル、リン酸ジエステル、ホスホン酸等が例示され、カルボン酸、スルホン酸、リン酸モノエステル、ホスホン酸が好ましく、カルボン酸がより好ましい。
カルボン酸の具体例としては、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、カプロン酸、エナント酸、カプリル酸、ペラルゴン酸、カプリン酸、ラウリン酸、ミリスチン酸、パルミチン酸、マルガリン酸、ステアリン酸、グリコール酸、乳酸、タルトロン酸、グリセリン酸、ヒドロキシ酪酸、2-ヒドロキシ酪酸、3-ヒドロキシ酪酸、γ-ヒドロキシ酪酸、リンゴ酸、酒石酸、シトラマル酸、クエン酸、ロイシン酸、メパロン酸、パントイン酸、リシノール酸、セレブロン酸、キナ酸、シキミ酸、サリチル酸、パニリン酸、シリング酸、レソルシル酸、プロトカテク酸、ゲンチジン酸、没食子酸、マンデル酸、ベンジル酸、アトロラクチン酸、メリロト酸、フロレト酸、クマル酸、ウンベル酸、コーヒー酸、フェラル酸、シナビン酸などが挙げられるが、この限りではない。特に好ましいのは、化粧品で使用されているカルボン酸である。具体例として、酢酸、ギ酸、プロピオン酸、グリコール酸、クエン酸、乳酸、リンゴ酸、アミノ酸類などが挙げられるが、この限りではない。
これらの中でも、クエン酸、グリコール酸、リンゴ酸、酢酸が特に好適である。 Component A: Acid compound The removal liquid for artificial nail of the present invention contains an acid compound as Component A. The acid compound is not particularly limited as long as it is a compound having hydrogen dissociable in at least one water.
As the acid compound used in the present invention, any of known organic acids and inorganic acids can be used. From the viewpoint of handleability, an organic acid is preferable, and a carboxylic acid is more preferable.
Examples of the inorganic acid include hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, carbonic acid, phosphoric acid and the like. Carbonic acid and phosphoric acid are preferable, and carbonic acid is more preferable.
Examples of the organic acid include carboxylic acid, sulfonic acid, sulfuric acid monoester, phosphoric acid monoester, phosphoric diester, phosphonic acid and the like, carboxylic acid, sulfonic acid, phosphoric monoester, and phosphonic acid are preferable, and carboxylic acid is More preferred.
Specific examples of carboxylic acids include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid, margaric acid, stearic acid, Glycolic acid, lactic acid, tartronic acid, glyceric acid, hydroxybutyric acid, 2-hydroxybutyric acid, 3-hydroxybutyric acid, γ-hydroxybutyric acid, malic acid, tartaric acid, citramalic acid, citric acid, leucine acid, meparonic acid, pantoic acid, ricinol Acid, cerebronic acid, quinic acid, shikimic acid, salicylic acid, panillic acid, syringic acid, resorcylic acid, protocatechuic acid, gentisic acid, gallic acid, mandelic acid, benzylic acid, atrolactic acid, mellilotic acid, furoletic acid, coumaric acid, Umberic acid, caffeic acid, ferulic acid, cinnamic acid, etc. It is below, but not limited thereto. Particularly preferred are carboxylic acids used in cosmetics. Specific examples include, but are not limited to, acetic acid, formic acid, propionic acid, glycolic acid, citric acid, lactic acid, malic acid, amino acids and the like.
Among these, citric acid, glycolic acid, malic acid, and acetic acid are particularly suitable.
除去液中の酸化合物の含有量は、特に制限はないが、除去液の全質量に対し、0.05~20質量%であることが好ましく、0.1~10質量%であることがより好ましく、0.5~5質量%であることが更に好ましい。
The content of the acid compound in the removal liquid is not particularly limited, but is preferably 0.05 to 20% by mass and more preferably 0.1 to 10% by mass with respect to the total mass of the removal liquid. Preferably, the content is 0.5 to 5% by mass.
成分B:水酸基を有する化合物
本発明の人工爪用除去液は、成分Bとして水酸基を有する化合物を含有する。
水酸基を有する化合物としては、公知のアルキルアルコール、水溶性アリールアルコール(フェノール類)であればいずれも好適に使用することができる。
水酸基を有する化合物は、分子量が32~2,000であることが好ましい。分子量は1,500以下であることがより好ましく、1,000以下であることが更に好ましい。
また、水酸基価が5mmol/g以上である化合物が好ましく、7mmol/g以上である化合物がより好ましく、8mmol/g以上である化合物が更に好ましい。
水酸基価は以下のような計算式を用いて、算出する。 Component B: Compound having a hydroxyl group The removal liquid for artificial nail of the present invention contains a compound having a hydroxyl group as Component B.
As the compound having a hydroxyl group, any known alkyl alcohol and water-soluble aryl alcohol (phenols) can be preferably used.
The compound having a hydroxyl group preferably has a molecular weight of 32 to 2,000. The molecular weight is more preferably 1,500 or less, and still more preferably 1,000 or less.
Moreover, the compound whose hydroxyl value is 5 mmol / g or more is preferable, the compound which is 7 mmol / g or more is more preferable, and the compound which is 8 mmol / g or more is still more preferable.
The hydroxyl value is calculated using the following calculation formula.
本発明の人工爪用除去液は、成分Bとして水酸基を有する化合物を含有する。
水酸基を有する化合物としては、公知のアルキルアルコール、水溶性アリールアルコール(フェノール類)であればいずれも好適に使用することができる。
水酸基を有する化合物は、分子量が32~2,000であることが好ましい。分子量は1,500以下であることがより好ましく、1,000以下であることが更に好ましい。
また、水酸基価が5mmol/g以上である化合物が好ましく、7mmol/g以上である化合物がより好ましく、8mmol/g以上である化合物が更に好ましい。
水酸基価は以下のような計算式を用いて、算出する。 Component B: Compound having a hydroxyl group The removal liquid for artificial nail of the present invention contains a compound having a hydroxyl group as Component B.
As the compound having a hydroxyl group, any known alkyl alcohol and water-soluble aryl alcohol (phenols) can be preferably used.
The compound having a hydroxyl group preferably has a molecular weight of 32 to 2,000. The molecular weight is more preferably 1,500 or less, and still more preferably 1,000 or less.
Moreover, the compound whose hydroxyl value is 5 mmol / g or more is preferable, the compound which is 7 mmol / g or more is more preferable, and the compound which is 8 mmol / g or more is still more preferable.
The hydroxyl value is calculated using the following calculation formula.
なお、成分Bは、酸基を有していない化合物である。酸基と水酸基とを有する化合物(例えば、クエン酸、乳酸、リンゴ酸等)は、成分Aに該当する。
Component B is a compound having no acid group. A compound having an acid group and a hydroxyl group (for example, citric acid, lactic acid, malic acid, etc.) corresponds to Component A.
成分Bとして具体的には、メタノール、エタノール、イソプロピルアルコール、n-ブタノール、t-ブタノール、ヘキサノール、エチレングリコール、プロピレングリコール、1,3-ブタンジオール、ペンタンジオール、シクロヘキサンジオール、グリセロール、トリメチロールプロパン、イノシトール、ペンタエリスリトール、ジグリセチン、ジプロピレングリコール、トリプロピレングリコール、ソルビトール、グルコース、スクロース、ポリエチレングリコール、ポリビニルアルコール、フェノール、カテコール、ポリオキシエチレンポリオキシプロピレングリコールなどが挙げられる。
成分Bとしては、一般的に化粧品で使用されるものが好ましく、具体的には、エタノール、イソプロパノール、n-ブタノール、t-ブタノール、エチレングリコール、プロピレングリコール、1,3-ブタンジオール、グリセロール、ペンタンジオールなどが挙げられるが、この限りではない。これらの中でも、エタノール、1,3-ブタンオジール、イソプロパノールが特に好ましく例示される。 Specific examples of component B include methanol, ethanol, isopropyl alcohol, n-butanol, t-butanol, hexanol, ethylene glycol, propylene glycol, 1,3-butanediol, pentanediol, cyclohexanediol, glycerol, trimethylolpropane, Examples include inositol, pentaerythritol, diglycetine, dipropylene glycol, tripropylene glycol, sorbitol, glucose, sucrose, polyethylene glycol, polyvinyl alcohol, phenol, catechol, and polyoxyethylene polyoxypropylene glycol.
Component B is preferably one generally used in cosmetics, and specifically includes ethanol, isopropanol, n-butanol, t-butanol, ethylene glycol, propylene glycol, 1,3-butanediol, glycerol, pentane. Examples include, but are not limited to, diols. Of these, ethanol, 1,3-butaneoyl, and isopropanol are particularly preferred.
成分Bとしては、一般的に化粧品で使用されるものが好ましく、具体的には、エタノール、イソプロパノール、n-ブタノール、t-ブタノール、エチレングリコール、プロピレングリコール、1,3-ブタンジオール、グリセロール、ペンタンジオールなどが挙げられるが、この限りではない。これらの中でも、エタノール、1,3-ブタンオジール、イソプロパノールが特に好ましく例示される。 Specific examples of component B include methanol, ethanol, isopropyl alcohol, n-butanol, t-butanol, hexanol, ethylene glycol, propylene glycol, 1,3-butanediol, pentanediol, cyclohexanediol, glycerol, trimethylolpropane, Examples include inositol, pentaerythritol, diglycetine, dipropylene glycol, tripropylene glycol, sorbitol, glucose, sucrose, polyethylene glycol, polyvinyl alcohol, phenol, catechol, and polyoxyethylene polyoxypropylene glycol.
Component B is preferably one generally used in cosmetics, and specifically includes ethanol, isopropanol, n-butanol, t-butanol, ethylene glycol, propylene glycol, 1,3-butanediol, glycerol, pentane. Examples include, but are not limited to, diols. Of these, ethanol, 1,3-butaneoyl, and isopropanol are particularly preferred.
除去液中の成分Bの含有量は、特に制限はないが、除去液の全質量に対し、0.01~20質量%であることが好ましく、0.05~10質量%であることがより好ましく、0.1~5質量%であることが更に好ましい。
The content of component B in the removal liquid is not particularly limited, but is preferably 0.01 to 20% by mass and more preferably 0.05 to 10% by mass with respect to the total mass of the removal liquid. Preferably, the content is 0.1 to 5% by mass.
(成分C)水
本発明の人工爪用除去液は、成分Cとして水を含有する。
除去液に使用する水は、特に制限はなく、水道水、蒸留水、イオン交換水等を用いることができる。除去液中の水の含有量は、特に制限はないが、除去液の全質量に対し、50~99.5質量%であることが好ましく、70~99質量%であることがより好ましく、90~98質量%であることが更に好ましい。 (Component C) Water The artificial nail removal solution of the present invention contains water as Component C.
There is no restriction | limiting in particular in the water used for a removal liquid, A tap water, distilled water, ion-exchange water etc. can be used. The content of water in the removal liquid is not particularly limited, but is preferably 50 to 99.5% by mass, more preferably 70 to 99% by mass, based on the total mass of the removal liquid. More preferably, it is -98 mass%.
本発明の人工爪用除去液は、成分Cとして水を含有する。
除去液に使用する水は、特に制限はなく、水道水、蒸留水、イオン交換水等を用いることができる。除去液中の水の含有量は、特に制限はないが、除去液の全質量に対し、50~99.5質量%であることが好ましく、70~99質量%であることがより好ましく、90~98質量%であることが更に好ましい。 (Component C) Water The artificial nail removal solution of the present invention contains water as Component C.
There is no restriction | limiting in particular in the water used for a removal liquid, A tap water, distilled water, ion-exchange water etc. can be used. The content of water in the removal liquid is not particularly limited, but is preferably 50 to 99.5% by mass, more preferably 70 to 99% by mass, based on the total mass of the removal liquid. More preferably, it is -98 mass%.
(その他の成分)
〔酸塩〕
本発明の人工爪用除去液は、pHが経時や液の希釈、濃縮などによる外部要因によって変動を起こさないようにするため、酸塩を添加して緩衝液にすることが好ましい。緩衝液にするためには、上記の酸成分(酸化合物)の塩、好ましくは、ナトリウム塩(クエン酸ナトリウム、グルコン酸ナトリウム、炭酸ナトリウム、リン酸ナトリウム等)を、酸と共存させる方法が挙げられるが、特に限定されるものではない。 (Other ingredients)
[Acid salt]
In order to prevent the pH of the artificial nail removal solution of the present invention from fluctuating due to external factors such as aging, dilution or concentration of the solution, an acid salt is preferably added to form a buffer solution. In order to make a buffer solution, a method of coexisting an acid component (acid compound) salt, preferably a sodium salt (sodium citrate, sodium gluconate, sodium carbonate, sodium phosphate, etc.) with an acid may be mentioned. However, it is not particularly limited.
〔酸塩〕
本発明の人工爪用除去液は、pHが経時や液の希釈、濃縮などによる外部要因によって変動を起こさないようにするため、酸塩を添加して緩衝液にすることが好ましい。緩衝液にするためには、上記の酸成分(酸化合物)の塩、好ましくは、ナトリウム塩(クエン酸ナトリウム、グルコン酸ナトリウム、炭酸ナトリウム、リン酸ナトリウム等)を、酸と共存させる方法が挙げられるが、特に限定されるものではない。 (Other ingredients)
[Acid salt]
In order to prevent the pH of the artificial nail removal solution of the present invention from fluctuating due to external factors such as aging, dilution or concentration of the solution, an acid salt is preferably added to form a buffer solution. In order to make a buffer solution, a method of coexisting an acid component (acid compound) salt, preferably a sodium salt (sodium citrate, sodium gluconate, sodium carbonate, sodium phosphate, etc.) with an acid may be mentioned. However, it is not particularly limited.
本発明の除去液には、上記成分の他に必要に応じてその他成分を含有させることができる。具体的には、界面活性剤、pH緩衝剤、防腐剤、香料、水溶性ポリマー、防錆剤、有機溶剤、消泡剤、湿潤剤、硬水軟化剤、安定剤、増粘剤等が挙げられる。
The removal liquid of the present invention may contain other components as required in addition to the above components. Specific examples include surfactants, pH buffers, preservatives, fragrances, water-soluble polymers, rust inhibitors, organic solvents, antifoaming agents, wetting agents, hard water softeners, stabilizers, thickeners, and the like. .
(使用の形態)
本発明の除去液は、コスト、運搬性、保管性の観点から、濃縮液としてもよく、使用する際に、当該濃縮液を水等により希釈して除去液とする実施形態でもよい。また、除去液を使用する直前に各原料粉末や各原液を混ぜてもよい。
なお、上記各成分の好ましい含有量は、使用時における含有量を意味する。 (Mode of use)
The removal liquid of the present invention may be a concentrated liquid from the viewpoints of cost, transportability, and storability, and may be an embodiment in which the concentrated liquid is diluted with water or the like when used. Moreover, you may mix each raw material powder and each stock solution just before using a removal liquid.
In addition, preferable content of said each component means content at the time of use.
本発明の除去液は、コスト、運搬性、保管性の観点から、濃縮液としてもよく、使用する際に、当該濃縮液を水等により希釈して除去液とする実施形態でもよい。また、除去液を使用する直前に各原料粉末や各原液を混ぜてもよい。
なお、上記各成分の好ましい含有量は、使用時における含有量を意味する。 (Mode of use)
The removal liquid of the present invention may be a concentrated liquid from the viewpoints of cost, transportability, and storability, and may be an embodiment in which the concentrated liquid is diluted with water or the like when used. Moreover, you may mix each raw material powder and each stock solution just before using a removal liquid.
In addition, preferable content of said each component means content at the time of use.
(pH)
除去液のpHは、5.0以下であることが好ましく、4.0以下であることがより好ましく、3.0以下であることが更に好ましい。また、除去液のpHは、皮膚・爪への安全性の観点から、1.0以上であることが好ましく、2.0以上であることがより好ましい。 (PH)
The pH of the removal liquid is preferably 5.0 or less, more preferably 4.0 or less, and even more preferably 3.0 or less. In addition, the pH of the removal liquid is preferably 1.0 or more, and more preferably 2.0 or more, from the viewpoint of safety to the skin and nails.
除去液のpHは、5.0以下であることが好ましく、4.0以下であることがより好ましく、3.0以下であることが更に好ましい。また、除去液のpHは、皮膚・爪への安全性の観点から、1.0以上であることが好ましく、2.0以上であることがより好ましい。 (PH)
The pH of the removal liquid is preferably 5.0 or less, more preferably 4.0 or less, and even more preferably 3.0 or less. In addition, the pH of the removal liquid is preferably 1.0 or more, and more preferably 2.0 or more, from the viewpoint of safety to the skin and nails.
(温度)
除去液は、安全性を損なわない程度に加温して使用してもよい。また、人工爪を除去液に浸漬する場合には、浸漬する液を撹拌してもよい。 (temperature)
The removal liquid may be used after being heated to such an extent that safety is not impaired. In addition, when the artificial nail is immersed in the removal liquid, the immersion liquid may be stirred.
除去液は、安全性を損なわない程度に加温して使用してもよい。また、人工爪を除去液に浸漬する場合には、浸漬する液を撹拌してもよい。 (temperature)
The removal liquid may be used after being heated to such an extent that safety is not impaired. In addition, when the artificial nail is immersed in the removal liquid, the immersion liquid may be stirred.
(2)人工爪の除去方法
本発明の人工爪の除去方法は、人工爪を本発明の除去液に接触させて除去する工程(除去工程)を含む。
本発明の人工爪の除去方法は、従来のアセトン等の有機溶剤の代わりに、本発明の除去液に人工爪を接触させることで簡便に除去することができる。
接触の方法は、特に限定されるものではなく、人工爪を直接除去液に浸漬してもよく、除去液を湿らせたコットン等で人工爪を包んでもよく、噴霧器やシャワーによって吹き付けてもよい。ただし、これらの例示に限定されるものではない。
また、本発明の人工爪の除去方法は、人工爪の表面及び/又は先端に傷をつける工程を含むことが好ましい。
傷を付ける方法としては、特に制限はないが、ファイル等の爪用やすりを好適に用いることができる。 (2) Artificial nail removal method The artificial nail removal method of the present invention includes a step of removing the artificial nail by contacting the removal liquid of the present invention (removal step).
The artificial nail removal method of the present invention can be easily removed by bringing the artificial nail into contact with the removal liquid of the present invention instead of the conventional organic solvent such as acetone.
The method of contact is not particularly limited, and the artificial nail may be directly immersed in the removing liquid, the artificial nail may be wrapped with cotton dampened with the removing liquid, or sprayed with a sprayer or a shower. . However, it is not limited to these examples.
Moreover, it is preferable that the removal method of the artificial nail of this invention includes the process of scratching the surface and / or front-end | tip of an artificial nail.
Although there is no restriction | limiting in particular as a method to make a damage | wound, A nail file, such as a file, can be used suitably.
本発明の人工爪の除去方法は、人工爪を本発明の除去液に接触させて除去する工程(除去工程)を含む。
本発明の人工爪の除去方法は、従来のアセトン等の有機溶剤の代わりに、本発明の除去液に人工爪を接触させることで簡便に除去することができる。
接触の方法は、特に限定されるものではなく、人工爪を直接除去液に浸漬してもよく、除去液を湿らせたコットン等で人工爪を包んでもよく、噴霧器やシャワーによって吹き付けてもよい。ただし、これらの例示に限定されるものではない。
また、本発明の人工爪の除去方法は、人工爪の表面及び/又は先端に傷をつける工程を含むことが好ましい。
傷を付ける方法としては、特に制限はないが、ファイル等の爪用やすりを好適に用いることができる。 (2) Artificial nail removal method The artificial nail removal method of the present invention includes a step of removing the artificial nail by contacting the removal liquid of the present invention (removal step).
The artificial nail removal method of the present invention can be easily removed by bringing the artificial nail into contact with the removal liquid of the present invention instead of the conventional organic solvent such as acetone.
The method of contact is not particularly limited, and the artificial nail may be directly immersed in the removing liquid, the artificial nail may be wrapped with cotton dampened with the removing liquid, or sprayed with a sprayer or a shower. . However, it is not limited to these examples.
Moreover, it is preferable that the removal method of the artificial nail of this invention includes the process of scratching the surface and / or front-end | tip of an artificial nail.
Although there is no restriction | limiting in particular as a method to make a damage | wound, A nail file, such as a file, can be used suitably.
除去方法の好ましい具体例を以下に示す。すなわち、任意に人工爪表面及び/又は先端を爪用やすりで擦って傷をつけた後、本発明の除去液に浸漬し、1~5分程度そのまま放置して人工爪の溶解性を変化させた後に、(I)人工爪を布若しくは不織布などにより拭き取る方法、(II)へら状若しくはスティック状の器具による押し剥がす方法、又は、(III)毛抜きやピンセット等による摘み上げる方法等によって指先や爪に負担をかけることなく、極めて容易かつ安全に剥がすことができる。
A preferred specific example of the removal method is shown below. In other words, the surface and / or tip of the artificial nail is arbitrarily rubbed with a nail file and then immersed in the removal solution of the present invention and left for about 1 to 5 minutes to change the solubility of the artificial nail. Fingertips and nails by (I) methods of wiping artificial nails with a cloth or non-woven fabric, (II) methods of peeling with a spatula or stick-like instrument, or (III) methods of picking up with tweezers or tweezers Can be peeled off very easily and safely.
なお、上記方法において浸漬しながら、拭き取り、押し剥がし、摘み上げ等をすることも可能であり、より早く除去することが可能になる。また、超音波や振動などを与えることで除去を促進してもよい。
また、本発明の人工爪の除去方法は、その他、公知の工程を含んでいてもよい。 In addition, wiping, peeling off, picking up, etc. can be carried out while immersing in the above method, so that it can be removed more quickly. Further, removal may be promoted by applying ultrasonic waves or vibrations.
In addition, the artificial nail removal method of the present invention may include other known steps.
また、本発明の人工爪の除去方法は、その他、公知の工程を含んでいてもよい。 In addition, wiping, peeling off, picking up, etc. can be carried out while immersing in the above method, so that it can be removed more quickly. Further, removal may be promoted by applying ultrasonic waves or vibrations.
In addition, the artificial nail removal method of the present invention may include other known steps.
(3)ネイルアートキット
本発明のネイルアートキットは、人工爪組成物と、人工爪用除去液と、を含み、上記人工爪用除去液が、本発明の除去液である。
本発明のネイルアートキットにおける除去液の好ましい態様は、上述したものと同様である。
また、本発明のネイルアートキットは、上記人工爪組成物及び除去液以外に、任意の品を含んでいてもよい。
例えば、カラー用又はトップ用等の人工爪組成物、ファイル等の爪用やすり、人工爪組成物を塗布するための平筆等の筆や刷毛、UVライト等の露光装置、拭き取り又は洗浄用液、拭き取り用ワイプ、ネイルブラシ、ダストブラシ、爪の長さ出しに使用するネイルフォーム、アクリル製、ガラス製、金属製又は天然石製等の装飾用ストーン、ネイルシール、グリッターやホログラム等の装飾用パウダー、カッター、へら、スティック、爪同士の接触を防ぐため指の間隔を広げるセパレーター等が挙げられるが、これらに制限されない。 (3) Nail Art Kit The nail art kit of the present invention includes an artificial nail composition and an artificial nail removal liquid, and the artificial nail removal liquid is the removal liquid of the present invention.
The preferred embodiment of the removing solution in the nail art kit of the present invention is the same as described above.
Moreover, the nail art kit of this invention may contain arbitrary goods other than the said artificial nail composition and a removal liquid.
For example, an artificial nail composition for color or top, a nail file such as a file, a brush or brush such as a flat brush for applying an artificial nail composition, an exposure device such as a UV light, a wiping or cleaning liquid , Wipes for wiping, nail brushes, dust brushes, nail foams used for lengthening nails, decorative stones such as acrylic, glass, metal or natural stone, decorative powders such as nail seals, glitters and holograms , A cutter, a spatula, a stick, a separator that widens the distance between fingers in order to prevent contact between the nails, and the like, but is not limited thereto.
本発明のネイルアートキットは、人工爪組成物と、人工爪用除去液と、を含み、上記人工爪用除去液が、本発明の除去液である。
本発明のネイルアートキットにおける除去液の好ましい態様は、上述したものと同様である。
また、本発明のネイルアートキットは、上記人工爪組成物及び除去液以外に、任意の品を含んでいてもよい。
例えば、カラー用又はトップ用等の人工爪組成物、ファイル等の爪用やすり、人工爪組成物を塗布するための平筆等の筆や刷毛、UVライト等の露光装置、拭き取り又は洗浄用液、拭き取り用ワイプ、ネイルブラシ、ダストブラシ、爪の長さ出しに使用するネイルフォーム、アクリル製、ガラス製、金属製又は天然石製等の装飾用ストーン、ネイルシール、グリッターやホログラム等の装飾用パウダー、カッター、へら、スティック、爪同士の接触を防ぐため指の間隔を広げるセパレーター等が挙げられるが、これらに制限されない。 (3) Nail Art Kit The nail art kit of the present invention includes an artificial nail composition and an artificial nail removal liquid, and the artificial nail removal liquid is the removal liquid of the present invention.
The preferred embodiment of the removing solution in the nail art kit of the present invention is the same as described above.
Moreover, the nail art kit of this invention may contain arbitrary goods other than the said artificial nail composition and a removal liquid.
For example, an artificial nail composition for color or top, a nail file such as a file, a brush or brush such as a flat brush for applying an artificial nail composition, an exposure device such as a UV light, a wiping or cleaning liquid , Wipes for wiping, nail brushes, dust brushes, nail foams used for lengthening nails, decorative stones such as acrylic, glass, metal or natural stone, decorative powders such as nail seals, glitters and holograms , A cutter, a spatula, a stick, a separator that widens the distance between fingers in order to prevent contact between the nails, and the like, but is not limited thereto.
次に、本発明の除去液が好適に使用される、人工爪及び人工爪組成物について詳細に説明する。
(人工爪組成物)
本発明において、人工爪組成物は、ヒト若しくは動物の爪上、又は、他の人工爪上に乾燥及び/又は露光によって硬化し、人工爪を形成する組成物である。また、人工爪組成物により形成された人工爪は、本発明の除去液によって容易に除去することが可能である。
本発明における人工爪とは、ヒト又は動物の爪上に、美装及び/又は保護を目的に形成される層を指す。また、例えば、上記他の人工爪としては、爪の美装及び/又は保護を目的とする任意の形状の樹脂基材等が挙げられる。
なお、「ヒト及び動物の爪、並びに、他の人工爪」を、単に「爪」ともいう。 Next, the artificial nail and the artificial nail composition in which the removing liquid of the present invention is preferably used will be described in detail.
(Artificial nail composition)
In the present invention, the artificial nail composition is a composition which is cured by drying and / or exposure on a human or animal nail or other artificial nail to form an artificial nail. Moreover, the artificial nail | claw formed with the artificial nail composition can be easily removed with the removal liquid of this invention.
The artificial nail in the present invention refers to a layer formed on a human or animal nail for the purpose of beauty and / or protection. In addition, for example, the other artificial nail includes a resin base material having an arbitrary shape for the purpose of nail decoration and / or protection.
“Human and animal nails and other artificial nails” are also simply referred to as “nails”.
(人工爪組成物)
本発明において、人工爪組成物は、ヒト若しくは動物の爪上、又は、他の人工爪上に乾燥及び/又は露光によって硬化し、人工爪を形成する組成物である。また、人工爪組成物により形成された人工爪は、本発明の除去液によって容易に除去することが可能である。
本発明における人工爪とは、ヒト又は動物の爪上に、美装及び/又は保護を目的に形成される層を指す。また、例えば、上記他の人工爪としては、爪の美装及び/又は保護を目的とする任意の形状の樹脂基材等が挙げられる。
なお、「ヒト及び動物の爪、並びに、他の人工爪」を、単に「爪」ともいう。 Next, the artificial nail and the artificial nail composition in which the removing liquid of the present invention is preferably used will be described in detail.
(Artificial nail composition)
In the present invention, the artificial nail composition is a composition which is cured by drying and / or exposure on a human or animal nail or other artificial nail to form an artificial nail. Moreover, the artificial nail | claw formed with the artificial nail composition can be easily removed with the removal liquid of this invention.
The artificial nail in the present invention refers to a layer formed on a human or animal nail for the purpose of beauty and / or protection. In addition, for example, the other artificial nail includes a resin base material having an arbitrary shape for the purpose of nail decoration and / or protection.
“Human and animal nails and other artificial nails” are also simply referred to as “nails”.
本発明において人工爪は、マニキュア、ペディキュア等のネイルポリッシュや、ジェルネイルであることが好ましい。本発明において、人工爪は多層構造を有していてもよく、プライマー層、ベース層、カラー層、及び/又は、トップ層等を有していてもよい。
なお、本発明において、後述する本発明に好適に使用される人工爪組成物により形成された層が、爪と接している層であることが好ましい。 In the present invention, the artificial nail is preferably nail polish such as manicure or pedicure, or gel nail. In the present invention, the artificial nail may have a multilayer structure, and may have a primer layer, a base layer, a color layer, and / or a top layer.
In addition, in this invention, it is preferable that the layer formed with the artificial nail composition used suitably for this invention mentioned later is a layer which is in contact with the nail | claw.
なお、本発明において、後述する本発明に好適に使用される人工爪組成物により形成された層が、爪と接している層であることが好ましい。 In the present invention, the artificial nail is preferably nail polish such as manicure or pedicure, or gel nail. In the present invention, the artificial nail may have a multilayer structure, and may have a primer layer, a base layer, a color layer, and / or a top layer.
In addition, in this invention, it is preferable that the layer formed with the artificial nail composition used suitably for this invention mentioned later is a layer which is in contact with the nail | claw.
上記人工爪の形状は、特に制限はなく、所望の形状に形成すればよい。例えば、爪の表面を被覆するように形成してもよいし、爪の一部のみに形成してもよいし、ネイルフォーム等を使用し爪の延長のため、爪よりも大きな形状に形成してもよい。
また、人工爪は、人工爪組成物の塗布量により厚みを制御することができる。厚みとしては、一般に人工爪がとりうる範囲であれば、特に制限されるものではないが、実用性及び除去性の観点から、10~2,000μmであることが好ましく、20~1,500μmであることがより好ましく、20~1,000μmが更に好ましい。 There is no restriction | limiting in particular in the shape of the said artificial nail, What is necessary is just to form in a desired shape. For example, it may be formed so as to cover the surface of the nail, it may be formed only on a part of the nail, or it is formed in a shape larger than the nail by using a nail foam or the like to extend the nail. May be.
Further, the thickness of the artificial nail can be controlled by the application amount of the artificial nail composition. The thickness is not particularly limited as long as it is generally within the range of an artificial nail, but it is preferably 10 to 2,000 μm from the viewpoint of practicality and removability, and is preferably 20 to 1,500 μm. More preferred is 20 to 1,000 μm.
また、人工爪は、人工爪組成物の塗布量により厚みを制御することができる。厚みとしては、一般に人工爪がとりうる範囲であれば、特に制限されるものではないが、実用性及び除去性の観点から、10~2,000μmであることが好ましく、20~1,500μmであることがより好ましく、20~1,000μmが更に好ましい。 There is no restriction | limiting in particular in the shape of the said artificial nail, What is necessary is just to form in a desired shape. For example, it may be formed so as to cover the surface of the nail, it may be formed only on a part of the nail, or it is formed in a shape larger than the nail by using a nail foam or the like to extend the nail. May be.
Further, the thickness of the artificial nail can be controlled by the application amount of the artificial nail composition. The thickness is not particularly limited as long as it is generally within the range of an artificial nail, but it is preferably 10 to 2,000 μm from the viewpoint of practicality and removability, and is preferably 20 to 1,500 μm. More preferred is 20 to 1,000 μm.
本発明の除去液は、アミノ基を有する人工爪の除去に好適であり、アミノ基を有するポリマーを含有する人工爪の除去に特に好適である。アミノ基を有するポリマーを含有する人工爪としては、以下の(i)~(iii)の人工爪が好適に例示される。
(i)成分aとして、アミノ基を有するポリマーを含有する人工爪組成物を乾燥して得られた人工爪
(ii)成分aとして、アミノ基を有するポリマーを含有する人工爪組成物を光硬化して得られた人工爪
(iii)成分bとして、アミノ基を有するモノマーを含有する人工爪組成物を光硬化して得られた人工爪
本発明の除去液の除去対象となる人工爪は、アミノ基を有するポリマー及び/又はアミノ基を有するモノマーを含有する人工爪組成物により形成された人工爪であることが好ましい。
ここで、上記(i)の態様は、乾燥により形成される人工爪であり、人工爪組成物は、所謂、マニキュア液用人工爪組成物である。一方、上記(ii)及び(iii)の態様は、光硬化により形成される人工爪であり、人工爪組成物は、所謂、光硬化性人工爪組成物(「ジェルネイル用人工爪組成物」)である。上記光硬化性人工爪組成物は、活性光線により硬化可能な人工爪組成物である。「活性光線」とは、その照射により人工爪組成物中に開始種を発生させるエネルギーを付与できる放射線であり、紫外線、可視光線などを包含する。これらの中でも、紫外線が好ましい。 The removal liquid of the present invention is suitable for removing an artificial nail having an amino group, and particularly suitable for removing an artificial nail containing a polymer having an amino group. As the artificial nail containing a polymer having an amino group, the following artificial nails (i) to (iii) are preferably exemplified.
(I) Artificial nail obtained by drying an artificial nail composition containing a polymer having an amino group as component a (ii) Photocuring an artificial nail composition containing a polymer having an amino group as component a Artificial nail obtained by photocuring an artificial nail composition containing a monomer having an amino group as the artificial nail (iii) component b obtained as described above. An artificial nail formed by an artificial nail composition containing a polymer having an amino group and / or a monomer having an amino group is preferable.
Here, the aspect (i) is an artificial nail formed by drying, and the artificial nail composition is a so-called artificial nail composition for nail polish. On the other hand, the above aspects (ii) and (iii) are artificial nails formed by photocuring, and the artificial nail composition is a so-called photocurable artificial nail composition (“artificial nail composition for gel nail”). ). The photocurable artificial nail composition is an artificial nail composition curable by actinic rays. “Actinic light” is radiation that can give energy to generate a starting species in the artificial nail composition by irradiation, and includes ultraviolet light, visible light, and the like. Among these, ultraviolet rays are preferable.
(i)成分aとして、アミノ基を有するポリマーを含有する人工爪組成物を乾燥して得られた人工爪
(ii)成分aとして、アミノ基を有するポリマーを含有する人工爪組成物を光硬化して得られた人工爪
(iii)成分bとして、アミノ基を有するモノマーを含有する人工爪組成物を光硬化して得られた人工爪
本発明の除去液の除去対象となる人工爪は、アミノ基を有するポリマー及び/又はアミノ基を有するモノマーを含有する人工爪組成物により形成された人工爪であることが好ましい。
ここで、上記(i)の態様は、乾燥により形成される人工爪であり、人工爪組成物は、所謂、マニキュア液用人工爪組成物である。一方、上記(ii)及び(iii)の態様は、光硬化により形成される人工爪であり、人工爪組成物は、所謂、光硬化性人工爪組成物(「ジェルネイル用人工爪組成物」)である。上記光硬化性人工爪組成物は、活性光線により硬化可能な人工爪組成物である。「活性光線」とは、その照射により人工爪組成物中に開始種を発生させるエネルギーを付与できる放射線であり、紫外線、可視光線などを包含する。これらの中でも、紫外線が好ましい。 The removal liquid of the present invention is suitable for removing an artificial nail having an amino group, and particularly suitable for removing an artificial nail containing a polymer having an amino group. As the artificial nail containing a polymer having an amino group, the following artificial nails (i) to (iii) are preferably exemplified.
(I) Artificial nail obtained by drying an artificial nail composition containing a polymer having an amino group as component a (ii) Photocuring an artificial nail composition containing a polymer having an amino group as component a Artificial nail obtained by photocuring an artificial nail composition containing a monomer having an amino group as the artificial nail (iii) component b obtained as described above. An artificial nail formed by an artificial nail composition containing a polymer having an amino group and / or a monomer having an amino group is preferable.
Here, the aspect (i) is an artificial nail formed by drying, and the artificial nail composition is a so-called artificial nail composition for nail polish. On the other hand, the above aspects (ii) and (iii) are artificial nails formed by photocuring, and the artificial nail composition is a so-called photocurable artificial nail composition (“artificial nail composition for gel nail”). ). The photocurable artificial nail composition is an artificial nail composition curable by actinic rays. “Actinic light” is radiation that can give energy to generate a starting species in the artificial nail composition by irradiation, and includes ultraviolet light, visible light, and the like. Among these, ultraviolet rays are preferable.
上記(i)及び(ii)の態様では、成分a:アミノ基を有するポリマーを含有する人工爪組成物を使用して人工爪を形成しており、成分aに由来するアミノ基が、人工爪中に存在する。一方、上記(iii)の態様では、成分b:アミノ基を有するモノマーを含有する人工爪組成物を光硬化して人工爪を形成しており、アミノ基を有するモノマーが重合してポリマーが形成され、上記ポリマー中にアミノ基を有するモノマーに由来するアミノ基が導入される。
このように、本発明の除去液は、アミノ基を有する人工爪、特に、アミノ基を有するポリマーを含有する人工爪の除去に好適であり、上記人工爪を形成するための人工爪組成物としては、成分aとしてアミノ基を有するポリマーを含有するか、及び/又は、成分bとしてアミノ基を有するモノマーを含有することが好ましい。 In the above aspects (i) and (ii), an artificial nail composition is formed using component n: an artificial nail composition containing a polymer having an amino group, and the amino group derived from component a is an artificial nail. Present in. On the other hand, in the embodiment of (iii) above, an artificial nail composition containing component b: a monomer having an amino group is photocured to form an artificial nail, and the monomer having an amino group is polymerized to form a polymer. Then, amino groups derived from monomers having amino groups are introduced into the polymer.
Thus, the removal liquid of the present invention is suitable for removing artificial nails having amino groups, in particular, artificial nails containing a polymer having amino groups, and as an artificial nail composition for forming the artificial nails. Preferably contains a polymer having an amino group as component a and / or a monomer having an amino group as component b.
このように、本発明の除去液は、アミノ基を有する人工爪、特に、アミノ基を有するポリマーを含有する人工爪の除去に好適であり、上記人工爪を形成するための人工爪組成物としては、成分aとしてアミノ基を有するポリマーを含有するか、及び/又は、成分bとしてアミノ基を有するモノマーを含有することが好ましい。 In the above aspects (i) and (ii), an artificial nail composition is formed using component n: an artificial nail composition containing a polymer having an amino group, and the amino group derived from component a is an artificial nail. Present in. On the other hand, in the embodiment of (iii) above, an artificial nail composition containing component b: a monomer having an amino group is photocured to form an artificial nail, and the monomer having an amino group is polymerized to form a polymer. Then, amino groups derived from monomers having amino groups are introduced into the polymer.
Thus, the removal liquid of the present invention is suitable for removing artificial nails having amino groups, in particular, artificial nails containing a polymer having amino groups, and as an artificial nail composition for forming the artificial nails. Preferably contains a polymer having an amino group as component a and / or a monomer having an amino group as component b.
上記(i)の態様では、人工爪組成物は、成分a:アミノ基を有するポリマーに加え、有機溶剤を含有することが好ましい。
上記(ii)の態様では、人工爪組成物は、成分a:アミノ基を有するポリマーに加え、重合性化合物、及び、重合開始剤を更に含有することが好ましい。
また、上記(iii)の態様では、人工爪組成物は、成分b:アミノ基を有するモノマーに加え、重合開始剤を含有することが好ましく、更に、ポリマー成分(被膜形成剤)を含有することが好ましい。
なお、上記(ii)の態様において、重合性化合物として更にアミノ基を有するモノマーを含有すること、及び、上記(iii)の態様において、ポリマー成分としてアミノ基を有するポリマー成分を含有することを排除するものではないことはいうまでもない。 In the above aspect (i), the artificial nail composition preferably contains an organic solvent in addition to component a: a polymer having an amino group.
In the above aspect (ii), the artificial nail composition preferably further contains a polymerizable compound and a polymerization initiator in addition to component a: an amino group-containing polymer.
In the embodiment (iii), the artificial nail composition preferably contains a polymerization initiator in addition to the component b: a monomer having an amino group, and further contains a polymer component (film forming agent). Is preferred.
In the embodiment (ii), it is excluded that the polymerizable compound further contains a monomer having an amino group, and in the embodiment (iii), a polymer component having an amino group is contained as the polymer component. It goes without saying that it is not something you do.
上記(ii)の態様では、人工爪組成物は、成分a:アミノ基を有するポリマーに加え、重合性化合物、及び、重合開始剤を更に含有することが好ましい。
また、上記(iii)の態様では、人工爪組成物は、成分b:アミノ基を有するモノマーに加え、重合開始剤を含有することが好ましく、更に、ポリマー成分(被膜形成剤)を含有することが好ましい。
なお、上記(ii)の態様において、重合性化合物として更にアミノ基を有するモノマーを含有すること、及び、上記(iii)の態様において、ポリマー成分としてアミノ基を有するポリマー成分を含有することを排除するものではないことはいうまでもない。 In the above aspect (i), the artificial nail composition preferably contains an organic solvent in addition to component a: a polymer having an amino group.
In the above aspect (ii), the artificial nail composition preferably further contains a polymerizable compound and a polymerization initiator in addition to component a: an amino group-containing polymer.
In the embodiment (iii), the artificial nail composition preferably contains a polymerization initiator in addition to the component b: a monomer having an amino group, and further contains a polymer component (film forming agent). Is preferred.
In the embodiment (ii), it is excluded that the polymerizable compound further contains a monomer having an amino group, and in the embodiment (iii), a polymer component having an amino group is contained as the polymer component. It goes without saying that it is not something you do.
本発明において、人工爪の別の好ましい態様として、(iv)アクリル系ポリマー、ウレタン系ポリマー、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー、エチレン系ポリマー及びアミン系ポリマーよりなる群から選択された少なくとも1つのポリマーを含有する人工爪が挙げられる。これらのポリマーを含有することにより、密着性及び除去性に優れるので好ましい。これらの中でも、ウレタン系ポリマー(ウレタンポリマー、ポリウレタン)を含有することが特に好ましい。なお、上記人工爪は、上記のポリマーを含有する人工爪組成物により形成された人工爪であることが好ましい。なお、上記(iv)の態様では、人工爪組成物がアミノ基を有するポリマーや、アミノ基を有するモノマーを含有しなくてもよい。上記(iv)の態様では、人工爪組成物が、上記のポリマーに加え、有機溶剤を含有するか、又は、重合性化合物と重合開始剤とを含有することが好ましく、上記のポリマーと、重合性化合物と、重合開始剤とを含有することがより好ましい。
なお、上記(i)及び(ii)の態様では、アミノ基を有するポリマーが上記のいずれかのポリマーに該当するものであることが好ましく、ウレタンポリマーであることがより好ましい。また、上記(iii)の態様では、ポリマー成分として上記のいずれかのポリマーを含有することが好ましく、ウレタンポリマーを含有することがより好ましい。
以下、人工爪組成物が含有する各種成分について、(i)及び(ii)の態様について説明した後、(iii)並びに(iv)の態様について説明する。
なお、以下の説明において、ポリマーには、コポリマー、オリゴマーをも含むものとする。上記ポリマーの重量平均分子量は、2,000以上300,000以下であることが好ましく、3,000以上200,000以下であることがより好ましく、4,000以上100,000以下であることが更に好ましく、5,000以上50,000以下であることが特に好ましい。上記範囲であると、得られる硬化物の密着性、除去性、及び経時安定性に優れる。 In the present invention, as another preferred embodiment of the artificial nail, (iv) acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate type Examples thereof include an artificial nail containing at least one polymer selected from the group consisting of a polymer, a urea polymer, an ethylene polymer, and an amine polymer. The inclusion of these polymers is preferable because of excellent adhesion and removability. Among these, it is particularly preferable to contain a urethane polymer (urethane polymer, polyurethane). The artificial nail is preferably an artificial nail formed from an artificial nail composition containing the polymer. In the above aspect (iv), the artificial nail composition may not contain a polymer having an amino group or a monomer having an amino group. In the above aspect (iv), the artificial nail composition preferably contains an organic solvent or a polymerizable compound and a polymerization initiator in addition to the above polymer. It is more preferable to contain a functional compound and a polymerization initiator.
In the above aspects (i) and (ii), the polymer having an amino group is preferably one of the above-mentioned polymers, and more preferably a urethane polymer. Moreover, in the aspect of said (iii), it is preferable to contain any one of said polymers as a polymer component, and it is more preferable to contain a urethane polymer.
Hereinafter, after describing the aspects (i) and (ii) for various components contained in the artificial nail composition, the aspects (iii) and (iv) will be described.
In the following description, the polymer includes a copolymer and an oligomer. The weight average molecular weight of the polymer is preferably 2,000 or more and 300,000 or less, more preferably 3,000 or more and 200,000 or less, and further preferably 4,000 or more and 100,000 or less. Preferably, it is 5,000 or more and 50,000 or less. It is excellent in the adhesiveness of the hardened | cured material obtained, and removability, and temporal stability as it is the said range.
なお、上記(i)及び(ii)の態様では、アミノ基を有するポリマーが上記のいずれかのポリマーに該当するものであることが好ましく、ウレタンポリマーであることがより好ましい。また、上記(iii)の態様では、ポリマー成分として上記のいずれかのポリマーを含有することが好ましく、ウレタンポリマーを含有することがより好ましい。
以下、人工爪組成物が含有する各種成分について、(i)及び(ii)の態様について説明した後、(iii)並びに(iv)の態様について説明する。
なお、以下の説明において、ポリマーには、コポリマー、オリゴマーをも含むものとする。上記ポリマーの重量平均分子量は、2,000以上300,000以下であることが好ましく、3,000以上200,000以下であることがより好ましく、4,000以上100,000以下であることが更に好ましく、5,000以上50,000以下であることが特に好ましい。上記範囲であると、得られる硬化物の密着性、除去性、及び経時安定性に優れる。 In the present invention, as another preferred embodiment of the artificial nail, (iv) acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate type Examples thereof include an artificial nail containing at least one polymer selected from the group consisting of a polymer, a urea polymer, an ethylene polymer, and an amine polymer. The inclusion of these polymers is preferable because of excellent adhesion and removability. Among these, it is particularly preferable to contain a urethane polymer (urethane polymer, polyurethane). The artificial nail is preferably an artificial nail formed from an artificial nail composition containing the polymer. In the above aspect (iv), the artificial nail composition may not contain a polymer having an amino group or a monomer having an amino group. In the above aspect (iv), the artificial nail composition preferably contains an organic solvent or a polymerizable compound and a polymerization initiator in addition to the above polymer. It is more preferable to contain a functional compound and a polymerization initiator.
In the above aspects (i) and (ii), the polymer having an amino group is preferably one of the above-mentioned polymers, and more preferably a urethane polymer. Moreover, in the aspect of said (iii), it is preferable to contain any one of said polymers as a polymer component, and it is more preferable to contain a urethane polymer.
Hereinafter, after describing the aspects (i) and (ii) for various components contained in the artificial nail composition, the aspects (iii) and (iv) will be described.
In the following description, the polymer includes a copolymer and an oligomer. The weight average molecular weight of the polymer is preferably 2,000 or more and 300,000 or less, more preferably 3,000 or more and 200,000 or less, and further preferably 4,000 or more and 100,000 or less. Preferably, it is 5,000 or more and 50,000 or less. It is excellent in the adhesiveness of the hardened | cured material obtained, and removability, and temporal stability as it is the said range.
-(i)又は(ii)の態様-
成分a:アミノ基を有するポリマー
本発明において、上記(i)又は(ii)の態様において、人工爪組成物は、成分aとして、アミノ基を有するポリマーを含有する。
成分aの重量平均分子量は、2,000以上300,000以下であることが好ましく、3,000以上200,000以下であることがより好ましく、4,000以上100,000以下であることが更に好ましく、5,000以上50,000以下であることが特に好ましい。上記範囲であると、得られる人工爪の密着性及び除去性に優れ、また、経時安定性に優れる。
また、成分aは、エチレン性不飽和基を有していてもよい。成分aがエチレン性不飽和基を有する場合、上記エチレン性不飽和基は成分aにおけるポリマーの主鎖、側鎖及び末端のいずれに有していてもよい。 -Aspect of (i) or (ii)-
Component a: Polymer having an amino group In the present invention, in the embodiment (i) or (ii), the artificial nail composition contains a polymer having an amino group as the component a.
The weight average molecular weight of component a is preferably 2,000 or more and 300,000 or less, more preferably 3,000 or more and 200,000 or less, and further preferably 4,000 or more and 100,000 or less. Preferably, it is 5,000 or more and 50,000 or less. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range, and is excellent in temporal stability.
In addition, component a may have an ethylenically unsaturated group. When component a has an ethylenically unsaturated group, the ethylenically unsaturated group may be present in any of the main chain, side chain, and terminal of the polymer in component a.
成分a:アミノ基を有するポリマー
本発明において、上記(i)又は(ii)の態様において、人工爪組成物は、成分aとして、アミノ基を有するポリマーを含有する。
成分aの重量平均分子量は、2,000以上300,000以下であることが好ましく、3,000以上200,000以下であることがより好ましく、4,000以上100,000以下であることが更に好ましく、5,000以上50,000以下であることが特に好ましい。上記範囲であると、得られる人工爪の密着性及び除去性に優れ、また、経時安定性に優れる。
また、成分aは、エチレン性不飽和基を有していてもよい。成分aがエチレン性不飽和基を有する場合、上記エチレン性不飽和基は成分aにおけるポリマーの主鎖、側鎖及び末端のいずれに有していてもよい。 -Aspect of (i) or (ii)-
Component a: Polymer having an amino group In the present invention, in the embodiment (i) or (ii), the artificial nail composition contains a polymer having an amino group as the component a.
The weight average molecular weight of component a is preferably 2,000 or more and 300,000 or less, more preferably 3,000 or more and 200,000 or less, and further preferably 4,000 or more and 100,000 or less. Preferably, it is 5,000 or more and 50,000 or less. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range, and is excellent in temporal stability.
In addition, component a may have an ethylenically unsaturated group. When component a has an ethylenically unsaturated group, the ethylenically unsaturated group may be present in any of the main chain, side chain, and terminal of the polymer in component a.
成分aにおけるアミノ基は、第一級アミノ基、第二級アミノ基、第三級アミノ基のいずれであってもよいが、第二級アミノ基又は第三級アミノ基であることが好ましく、第三級アミノ基であることがより好ましい。上記態様であると、得られる人工爪の除去性及び耐水性により優れ、また、合成が容易である。
また、成分aは、アミノ基をポリマーの主鎖に有していても、側鎖に有していてもよいが、合成上の観点から、側鎖にアミノ基を有するポリマーであることが好ましい。
成分aは、アミノ基を1種単独で有していても、2種以上を有していてもよい。
なお、本発明における「モノマー単位」には、厳密なモノマー由来の構成単位だけでなく、ポリマーを得た後に変性等の反応を行う高分子反応により変性したモノマー単位も含むものとする。 The amino group in component a may be any of a primary amino group, a secondary amino group, and a tertiary amino group, but is preferably a secondary amino group or a tertiary amino group, More preferably, it is a tertiary amino group. In the above embodiment, the resulting artificial nail is excellent in removability and water resistance, and is easy to synthesize.
Component a may have an amino group in the main chain of the polymer or in the side chain, but is preferably a polymer having an amino group in the side chain from the viewpoint of synthesis. .
Component a may have one type of amino group or two or more types.
The “monomer unit” in the present invention includes not only a strict monomer-derived constituent unit but also a monomer unit modified by a polymer reaction in which a reaction such as modification is performed after a polymer is obtained.
また、成分aは、アミノ基をポリマーの主鎖に有していても、側鎖に有していてもよいが、合成上の観点から、側鎖にアミノ基を有するポリマーであることが好ましい。
成分aは、アミノ基を1種単独で有していても、2種以上を有していてもよい。
なお、本発明における「モノマー単位」には、厳密なモノマー由来の構成単位だけでなく、ポリマーを得た後に変性等の反応を行う高分子反応により変性したモノマー単位も含むものとする。 The amino group in component a may be any of a primary amino group, a secondary amino group, and a tertiary amino group, but is preferably a secondary amino group or a tertiary amino group, More preferably, it is a tertiary amino group. In the above embodiment, the resulting artificial nail is excellent in removability and water resistance, and is easy to synthesize.
Component a may have an amino group in the main chain of the polymer or in the side chain, but is preferably a polymer having an amino group in the side chain from the viewpoint of synthesis. .
Component a may have one type of amino group or two or more types.
The “monomer unit” in the present invention includes not only a strict monomer-derived constituent unit but also a monomer unit modified by a polymer reaction in which a reaction such as modification is performed after a polymer is obtained.
成分aとしては、下記式Iで表される構造を有するポリマーであることが好ましく、下記式Iで表される構造を側鎖に有するポリマーであることがより好ましい。
Component a is preferably a polymer having a structure represented by the following formula I, and more preferably a polymer having a structure represented by the following formula I in the side chain.
式IにおけるR1及びR2はそれぞれ独立に、酸水溶液への溶解性と耐水性とのバランスの観点から、炭素数1~10のアルキル基であることが好ましく、メチル基又はエチル基であることが特に好ましい。
また、式Iにおいて、R1、R2及びL1よりなる群から選ばれた少なくとも2つは互いに連結して環を形成してもよい。
式IにおけるL1は、ポリマーの被膜性の観点から、炭素数1~20の、置換基を有してもよく、また、一部の炭素原子がヘテロ原子で置き換えられてもよいアルキレン基であることが好ましく、炭素数1~20のアルキレン基、炭素数2~20のオキシアルキレン基又は炭素数2~20のポリオキシアルキレン基であることがより好ましく、炭素数1~20のアルキレン基又は炭素数2~20のポリオキシアルキレン基であることが更に好ましく、炭素数1~20のアルキレン基であることが特に好ましく、炭素数2又は3のアルキレン基であることが最も好ましい。
また、上記ヘテロ原子は、窒素原子又は酸素原子であることが好ましく、酸素原子であることがより好ましい。また、上記ヘテロ原子が窒素原子である場合、窒素原子上の残りの基は水素原子又はアルキル基であることが好ましく、アルキル基であることがより好ましい。 R 1 and R 2 in Formula I are each independently preferably an alkyl group having 1 to 10 carbon atoms, and is a methyl group or an ethyl group, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. It is particularly preferred.
In Formula I, at least two selected from the group consisting of R 1 , R 2 and L 1 may be linked to each other to form a ring.
L 1 in Formula I is an alkylene group having 1 to 20 carbon atoms which may have a substituent, and a part of the carbon atoms may be replaced with a heteroatom from the viewpoint of the film property of the polymer. It is preferably an alkylene group having 1 to 20 carbon atoms, an oxyalkylene group having 2 to 20 carbon atoms, or a polyoxyalkylene group having 2 to 20 carbon atoms, and an alkylene group having 1 to 20 carbon atoms or It is more preferably a polyoxyalkylene group having 2 to 20 carbon atoms, particularly preferably an alkylene group having 1 to 20 carbon atoms, and most preferably an alkylene group having 2 or 3 carbon atoms.
The heteroatom is preferably a nitrogen atom or an oxygen atom, and more preferably an oxygen atom. Moreover, when the said hetero atom is a nitrogen atom, it is preferable that the remaining group on a nitrogen atom is a hydrogen atom or an alkyl group, and it is more preferable that it is an alkyl group.
また、式Iにおいて、R1、R2及びL1よりなる群から選ばれた少なくとも2つは互いに連結して環を形成してもよい。
式IにおけるL1は、ポリマーの被膜性の観点から、炭素数1~20の、置換基を有してもよく、また、一部の炭素原子がヘテロ原子で置き換えられてもよいアルキレン基であることが好ましく、炭素数1~20のアルキレン基、炭素数2~20のオキシアルキレン基又は炭素数2~20のポリオキシアルキレン基であることがより好ましく、炭素数1~20のアルキレン基又は炭素数2~20のポリオキシアルキレン基であることが更に好ましく、炭素数1~20のアルキレン基であることが特に好ましく、炭素数2又は3のアルキレン基であることが最も好ましい。
また、上記ヘテロ原子は、窒素原子又は酸素原子であることが好ましく、酸素原子であることがより好ましい。また、上記ヘテロ原子が窒素原子である場合、窒素原子上の残りの基は水素原子又はアルキル基であることが好ましく、アルキル基であることがより好ましい。 R 1 and R 2 in Formula I are each independently preferably an alkyl group having 1 to 10 carbon atoms, and is a methyl group or an ethyl group, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. It is particularly preferred.
In Formula I, at least two selected from the group consisting of R 1 , R 2 and L 1 may be linked to each other to form a ring.
L 1 in Formula I is an alkylene group having 1 to 20 carbon atoms which may have a substituent, and a part of the carbon atoms may be replaced with a heteroatom from the viewpoint of the film property of the polymer. It is preferably an alkylene group having 1 to 20 carbon atoms, an oxyalkylene group having 2 to 20 carbon atoms, or a polyoxyalkylene group having 2 to 20 carbon atoms, and an alkylene group having 1 to 20 carbon atoms or It is more preferably a polyoxyalkylene group having 2 to 20 carbon atoms, particularly preferably an alkylene group having 1 to 20 carbon atoms, and most preferably an alkylene group having 2 or 3 carbon atoms.
The heteroatom is preferably a nitrogen atom or an oxygen atom, and more preferably an oxygen atom. Moreover, when the said hetero atom is a nitrogen atom, it is preferable that the remaining group on a nitrogen atom is a hydrogen atom or an alkyl group, and it is more preferable that it is an alkyl group.
また、上記式Iで表される構造をポリマーの側鎖に導入する方法としては、例えば、式Iで表される構造を有するモノマーを縮重合・付加重合・付加縮合・イオン重合(カチオン重合・アニオン重合)など公知の重合反応を用いポリマー化する方法が挙げられる。
Further, as a method for introducing the structure represented by the above formula I into the side chain of the polymer, for example, a monomer having the structure represented by the formula I is subjected to condensation polymerization, addition polymerization, addition condensation, ionic polymerization (cationic polymerization, Examples thereof include a method of polymerizing using a known polymerization reaction such as anionic polymerization.
成分aにおけるポリマー構造は、特に限定されず、所望のポリマー構造であればよく、例えば、アクリル系ポリマー、ウレタン系ポリマー、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー、エチレン系ポリマー、アミン系ポリマー等のポリマー構造が挙げられる。
被膜性・取り扱い性(粘性)・アミノ基を導入する合成上の観点から、成分aは、エーテル系ポリマー、エチレン系ポリマー(特にポリエチレンイミン系ポリマー)、ウレタン系ポリマー、アクリル系ポリマーであることが好ましく、ウレタン系ポリマー、アクリル系ポリマーであることが特に好ましく、アクリル系ポリマーであることが最も好ましい。
また、硬化膜の柔軟性及び除去性の観点からは、ウレタン系ポリマーが最も好ましい。 The polymer structure in component a is not particularly limited as long as it is a desired polymer structure. For example, an acrylic polymer, a urethane polymer, a cellulose polymer, an ester polymer, an amide polymer, a vinyl polymer, and an ether polymer. And polymer structures such as styrene polymer, carbonate polymer, urea polymer, ethylene polymer, and amine polymer.
From the viewpoint of film properties, handleability (viscosity), and amino group-introducing synthesis, component a may be an ether polymer, an ethylene polymer (particularly a polyethyleneimine polymer), a urethane polymer, or an acrylic polymer. A urethane polymer and an acrylic polymer are particularly preferable, and an acrylic polymer is most preferable.
Further, from the viewpoint of flexibility and removability of the cured film, a urethane polymer is most preferable.
被膜性・取り扱い性(粘性)・アミノ基を導入する合成上の観点から、成分aは、エーテル系ポリマー、エチレン系ポリマー(特にポリエチレンイミン系ポリマー)、ウレタン系ポリマー、アクリル系ポリマーであることが好ましく、ウレタン系ポリマー、アクリル系ポリマーであることが特に好ましく、アクリル系ポリマーであることが最も好ましい。
また、硬化膜の柔軟性及び除去性の観点からは、ウレタン系ポリマーが最も好ましい。 The polymer structure in component a is not particularly limited as long as it is a desired polymer structure. For example, an acrylic polymer, a urethane polymer, a cellulose polymer, an ester polymer, an amide polymer, a vinyl polymer, and an ether polymer. And polymer structures such as styrene polymer, carbonate polymer, urea polymer, ethylene polymer, and amine polymer.
From the viewpoint of film properties, handleability (viscosity), and amino group-introducing synthesis, component a may be an ether polymer, an ethylene polymer (particularly a polyethyleneimine polymer), a urethane polymer, or an acrylic polymer. A urethane polymer and an acrylic polymer are particularly preferable, and an acrylic polymer is most preferable.
Further, from the viewpoint of flexibility and removability of the cured film, a urethane polymer is most preferable.
アクリル系ポリマーとしては、公知のアクリル酸誘導体(例えば、アクリル酸メチル、アクリル酸エチル等のアクリル酸エステル、アクリルアミド、アクリロイルモルホリン等のアクリル酸アミド)、メタクリル酸誘導体(例えば、メタクリル酸メチル、メタクリル酸エチル等のメタクリル酸エステル、メタクリルアミド、メタクリル酸イソプロピルアミド等のメタクリル酸アミド)を重合して得られるポリマーであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。アクリル系ポリマーにアミノ基を導入する方法としては、例えば、アミノ基を有する(メタ)アクリル酸誘導体を重合又は共重合する方法や高分子反応によりアミノ基を導入する方法が挙げられる。アクリル系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、エチレン性不飽和基を持つ(メタ)アクリル酸誘導体を重合又は共重合する方法や、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
Examples of the acrylic polymer include known acrylic acid derivatives (for example, acrylic esters such as methyl acrylate and ethyl acrylate, acrylic amides such as acrylamide and acryloylmorpholine), and methacrylic acid derivatives (for example, methyl methacrylate, methacrylic acid). Any polymer can be suitably used as long as it is a polymer obtained by polymerizing a methacrylic acid ester such as ethyl or a methacrylic acid amide such as methacrylamide or isopropylamide. However, it is not limited to these examples. Examples of the method for introducing an amino group into the acrylic polymer include a method for polymerizing or copolymerizing a (meth) acrylic acid derivative having an amino group, and a method for introducing an amino group by a polymer reaction. Examples of a method for introducing an ethylenically unsaturated group into an acrylic polymer include a method for polymerizing or copolymerizing a (meth) acrylic acid derivative having an ethylenically unsaturated group, and a method for introducing an ethylenically unsaturated group by a polymer reaction. The method to introduce is mentioned.
ウレタン系ポリマーとしては、公知のポリイソシアネート化合物(例えば、メチレンジイソシアネート、ヘキサメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネート、フェニルジイソシアネート、トリレンジイソシアネート、ジフェニルメタンジイソシアネート、トリジンジイソシアネート、ナフタレンジイソシアネート、トリフェニルメタントリイソシアネート、トリス(フェニルイソシアネート)チオホスフェート、フェニレンジイソシアネート、リジンジイソシアネート、キシリレンジイソシアネート、ビス(イソシアナトメチル)シクロヘキサン、ジシクロヘキシルメタンジイソシアネート、イソプロピリデンビス(シクロヘキシルイソシアネート)、イソホロンジイソシアネート、ジアニシジンジイソシアネート、ジフェニルエーテルジイソシアネート)と公知のポリオール化合物(例えば、ブタンジオール、ヘキサンジオール等のアルキレンジオール、p-ヒドロキシスチレン等のアリーレンジオール、ポリエチレングリコール、ポリプロピレングリコール等のポリエーテルジオール、ポリエチレングリコールテレフタレート等のポリエステルジオール、ポリエチレングリコールカーボネート等のポリカーボネートジオール等)からなるポリウレタンであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
ウレタン系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基若しくはアミノ基を保護した基を有する、ポリイソシアネート化合物及び/又はポリオール化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。なお、保護されたアミノ基は、ポリマーを形成した後、公知の方法により脱保護すればよい。後述においても同様である。
ウレタン系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応により導入する方法、及び、エチレン性不飽和基を有するポリオール化合物やポリイソシアネート化合物を用いて重縮合する方法が挙げられる。これら化合物は特に限定されないが、エチレン性不飽和基を有するポリオールについては、特開2010-100047号公報に記載されているような、(メタ)アクリレート含有ジオール化合物などを好適に使用することができる。
中でも、耐水性の観点から、ポリカーボネート構造又はポリエステル構造、ポリブタジエン構造、水添ポリブタジエン構造を有するウレタン系ポリマーであることが好ましく、ポリカーボネート構造を有するウレタン系ポリマーであることがより好ましい。 Urethane polymers include known polyisocyanate compounds (for example, methylene diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, phenyl diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, tolidine diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, tris ( Phenyl isocyanate) thiophosphate, phenylene diisocyanate, lysine diisocyanate, xylylene diisocyanate, bis (isocyanatomethyl) cyclohexane, dicyclohexylmethane diisocyanate, isopropylidenebis (cyclohexyl isocyanate), isophorone diisocyanate, dianisidine diisocyanate Diphenyl ether diisocyanate) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylene diols such as p-hydroxystyrene, polyether diols such as polyethylene glycol and polypropylene glycol, polyester diols such as polyethylene glycol terephthalate, Any polyurethane can be suitably used as long as it is a polyurethane comprising a polycarbonate diol such as polyethylene glycol carbonate. However, it is not limited to these examples.
Examples of a method for introducing an amino group into a urethane polymer include a method of performing polycondensation using a polyisocyanate compound and / or a polyol compound having a tertiary amino group or a group in which an amino group is protected, and a polymer reaction. The method of introduce | transducing an amino group by is mentioned. The protected amino group may be deprotected by a known method after forming a polymer. The same applies to the following.
Examples of the method of introducing an ethylenically unsaturated group into a urethane polymer include a method of introducing by a polymer reaction and a method of polycondensation using a polyol compound or a polyisocyanate compound having an ethylenically unsaturated group. It is done. These compounds are not particularly limited, but for polyols having an ethylenically unsaturated group, (meth) acrylate-containing diol compounds as described in JP 2010-100047 can be preferably used. .
Among these, from the viewpoint of water resistance, a urethane polymer having a polycarbonate structure or a polyester structure, a polybutadiene structure, or a hydrogenated polybutadiene structure is preferable, and a urethane polymer having a polycarbonate structure is more preferable.
ウレタン系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基若しくはアミノ基を保護した基を有する、ポリイソシアネート化合物及び/又はポリオール化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。なお、保護されたアミノ基は、ポリマーを形成した後、公知の方法により脱保護すればよい。後述においても同様である。
ウレタン系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応により導入する方法、及び、エチレン性不飽和基を有するポリオール化合物やポリイソシアネート化合物を用いて重縮合する方法が挙げられる。これら化合物は特に限定されないが、エチレン性不飽和基を有するポリオールについては、特開2010-100047号公報に記載されているような、(メタ)アクリレート含有ジオール化合物などを好適に使用することができる。
中でも、耐水性の観点から、ポリカーボネート構造又はポリエステル構造、ポリブタジエン構造、水添ポリブタジエン構造を有するウレタン系ポリマーであることが好ましく、ポリカーボネート構造を有するウレタン系ポリマーであることがより好ましい。 Urethane polymers include known polyisocyanate compounds (for example, methylene diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, phenyl diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, tolidine diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, tris ( Phenyl isocyanate) thiophosphate, phenylene diisocyanate, lysine diisocyanate, xylylene diisocyanate, bis (isocyanatomethyl) cyclohexane, dicyclohexylmethane diisocyanate, isopropylidenebis (cyclohexyl isocyanate), isophorone diisocyanate, dianisidine diisocyanate Diphenyl ether diisocyanate) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylene diols such as p-hydroxystyrene, polyether diols such as polyethylene glycol and polypropylene glycol, polyester diols such as polyethylene glycol terephthalate, Any polyurethane can be suitably used as long as it is a polyurethane comprising a polycarbonate diol such as polyethylene glycol carbonate. However, it is not limited to these examples.
Examples of a method for introducing an amino group into a urethane polymer include a method of performing polycondensation using a polyisocyanate compound and / or a polyol compound having a tertiary amino group or a group in which an amino group is protected, and a polymer reaction. The method of introduce | transducing an amino group by is mentioned. The protected amino group may be deprotected by a known method after forming a polymer. The same applies to the following.
Examples of the method of introducing an ethylenically unsaturated group into a urethane polymer include a method of introducing by a polymer reaction and a method of polycondensation using a polyol compound or a polyisocyanate compound having an ethylenically unsaturated group. It is done. These compounds are not particularly limited, but for polyols having an ethylenically unsaturated group, (meth) acrylate-containing diol compounds as described in JP 2010-100047 can be preferably used. .
Among these, from the viewpoint of water resistance, a urethane polymer having a polycarbonate structure or a polyester structure, a polybutadiene structure, or a hydrogenated polybutadiene structure is preferable, and a urethane polymer having a polycarbonate structure is more preferable.
また、ウレタン系ポリマーとしては、ジイソシアネート化合物とジオール化合物との重縮合体が好ましく例示できる。
ウレタン系ポリマーを構成するジオール成分としては、ポリカーボネートジオール、ポリエステルジオール、ポリブタジエンジオール、水添ポリブタジエンジオール、を使用することが耐水性の観点から好ましく、ポリカーボネートジオールを使用することがより好ましい。
また、構成するジイソシアネート成分としては、人工爪組成物の溶解性、形成する人工爪の力学強度の観点から、ヘキサメチレンジイソシアネート、トリレンジイソシアネート、イソホロンジイソシアネート、ジフェニルメタンジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアナートが好ましく、イソホロンジイソシアネート、メチレンジフェニルジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアナートが更に好ましい。これら化合物は1種類のみを使用してもよいし複数を組み合わせて使用してもよい。
また、上記好適なジオール成分/ジイソシアネート成分に加えて、その他のジオール成分/ジイソシアネート成分と組み合わせて使用してもよい。また、好適なジオール成分と、好適なジイソシアネート成分とをあわせて使用することで、人工爪の耐水性及び力学強度の両方を高めることができる。 Moreover, as a urethane type polymer, the polycondensate of a diisocyanate compound and a diol compound can illustrate preferably.
As the diol component constituting the urethane polymer, it is preferable to use polycarbonate diol, polyester diol, polybutadiene diol, and hydrogenated polybutadiene diol from the viewpoint of water resistance, and it is more preferable to use polycarbonate diol.
The diisocyanate component is composed of hexamethylene diisocyanate, tolylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, dicyclohexylmethane-4,4′- from the viewpoint of the solubility of the artificial nail composition and the mechanical strength of the artificial nail to be formed. Diisocyanates are preferred, and isophorone diisocyanate, methylene diphenyl diisocyanate, and dicyclohexylmethane-4,4′-diisocyanate are more preferred. These compounds may be used alone or in combination.
Further, in addition to the above preferred diol component / diisocyanate component, it may be used in combination with other diol component / diisocyanate component. Further, by using a suitable diol component and a suitable diisocyanate component together, both the water resistance and mechanical strength of the artificial nail can be enhanced.
ウレタン系ポリマーを構成するジオール成分としては、ポリカーボネートジオール、ポリエステルジオール、ポリブタジエンジオール、水添ポリブタジエンジオール、を使用することが耐水性の観点から好ましく、ポリカーボネートジオールを使用することがより好ましい。
また、構成するジイソシアネート成分としては、人工爪組成物の溶解性、形成する人工爪の力学強度の観点から、ヘキサメチレンジイソシアネート、トリレンジイソシアネート、イソホロンジイソシアネート、ジフェニルメタンジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアナートが好ましく、イソホロンジイソシアネート、メチレンジフェニルジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアナートが更に好ましい。これら化合物は1種類のみを使用してもよいし複数を組み合わせて使用してもよい。
また、上記好適なジオール成分/ジイソシアネート成分に加えて、その他のジオール成分/ジイソシアネート成分と組み合わせて使用してもよい。また、好適なジオール成分と、好適なジイソシアネート成分とをあわせて使用することで、人工爪の耐水性及び力学強度の両方を高めることができる。 Moreover, as a urethane type polymer, the polycondensate of a diisocyanate compound and a diol compound can illustrate preferably.
As the diol component constituting the urethane polymer, it is preferable to use polycarbonate diol, polyester diol, polybutadiene diol, and hydrogenated polybutadiene diol from the viewpoint of water resistance, and it is more preferable to use polycarbonate diol.
The diisocyanate component is composed of hexamethylene diisocyanate, tolylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, dicyclohexylmethane-4,4′- from the viewpoint of the solubility of the artificial nail composition and the mechanical strength of the artificial nail to be formed. Diisocyanates are preferred, and isophorone diisocyanate, methylene diphenyl diisocyanate, and dicyclohexylmethane-4,4′-diisocyanate are more preferred. These compounds may be used alone or in combination.
Further, in addition to the above preferred diol component / diisocyanate component, it may be used in combination with other diol component / diisocyanate component. Further, by using a suitable diol component and a suitable diisocyanate component together, both the water resistance and mechanical strength of the artificial nail can be enhanced.
セルロース系ポリマーとしては、カルボキシメチルセルロース、ニトロセルロース、トリアセチルセルロース等の公知のセルロースであれば好適に使用することができる。ただし、これら例示に限定されるものではない。セルロース系ポリマーにアミノ基を導入する方法としては、例えば、高分子反応によりアミノ基を導入する方法が挙げられる。セルロース系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the cellulose polymer, any known cellulose such as carboxymethylcellulose, nitrocellulose, triacetylcellulose, and the like can be preferably used. However, it is not limited to these examples. Examples of a method for introducing an amino group into a cellulose polymer include a method for introducing an amino group by a polymer reaction. Examples of the method for introducing an ethylenically unsaturated group into a cellulose polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
エステル系ポリマーとしては、公知のポリカルボン酸化合物(例えば、こはく酸、アジピン酸、フタル酸等)と公知のポリオール化合物からなるポリエステルであればいずれも好適に使用することができる。また、ポリ乳酸等のヒドロキシカルボン酸化合物からなるポリエステルも好適に使用することができる。ただし、これら例示に限定されるものではない。エステル系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基若しくはアミノ基を保護した基を有する、ポリカルボン酸化合物、ポリオール化合物及び/又はヒドロキシカルボン酸化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。エステル系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the ester polymer, any polyester comprising a known polycarboxylic acid compound (for example, succinic acid, adipic acid, phthalic acid, etc.) and a known polyol compound can be suitably used. In addition, polyesters composed of hydroxycarboxylic acid compounds such as polylactic acid can also be suitably used. However, it is not limited to these examples. Examples of a method for introducing an amino group into an ester polymer include polycondensation using a polycarboxylic acid compound, a polyol compound and / or a hydroxycarboxylic acid compound having a tertiary amino group or a group with a protected amino group. And a method of introducing an amino group by a polymer reaction. Examples of a method for introducing an ethylenically unsaturated group into an ester polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
アミド系ポリマーとしては、公知のポリカルボン酸化合物と公知のポリアミン化合物(例えば、エチレンジアミン、フェニレンジアミン等)からなるポリアミドであればいずれも好適に使用することができる。また、アミノ酸からなるタンパク質であるポリアミノ酸も好適に使用することができる。ただし、これら例示に限定されるものではない。アミド系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基若しくはアミノ基を保護した基を有する、ポリカルボン酸化合物、及び/又は、重縮合反応に寄与しない第三級アミノ基若しくはアミノ基を保護した基を有するポリアミン化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。アミド系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the amide polymer, any polyamide can be suitably used as long as it is a polyamide comprising a known polycarboxylic acid compound and a known polyamine compound (for example, ethylenediamine, phenylenediamine, etc.). In addition, polyamino acids, which are proteins composed of amino acids, can also be preferably used. However, it is not limited to these examples. Examples of the method for introducing an amino group into the amide polymer include a polycarboxylic acid compound having a tertiary amino group or a group in which the amino group is protected, and / or a tertiary amino group that does not contribute to the polycondensation reaction. Alternatively, a method of polycondensation using a polyamine compound having a group in which an amino group is protected and a method of introducing an amino group by a polymer reaction can be mentioned. Examples of the method for introducing an ethylenically unsaturated group into an amide polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
ビニル系ポリマーとしては、公知のビニル化合物(例えば、ビニル酢酸、塩化ビニル、ブタジエン等)を重合して得られるビニル系ポリマーであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。ビニル系ポリマーにアミノ基を導入する方法としては、例えば、アミノ基を有するビニル化合物を重合又は共重合する方法や高分子反応によりアミノ基を導入する方法が挙げられる。ビニル系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the vinyl polymer, any vinyl polymer obtained by polymerizing a known vinyl compound (for example, vinyl acetate, vinyl chloride, butadiene, etc.) can be suitably used. However, it is not limited to these examples. Examples of the method for introducing an amino group into a vinyl polymer include a method of polymerizing or copolymerizing a vinyl compound having an amino group, and a method of introducing an amino group by a polymer reaction. Examples of the method for introducing an ethylenically unsaturated group into a vinyl polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
エーテル系ポリマーとしては、公知のポリオール化合物からなるポリエーテル(例えば、ポリエチレングリコール、ポリプロピレングリコール等)であればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。エーテル系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基又はアミノ基を保護した基を有するポリオール化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。エーテル系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the ether polymer, any polyether (for example, polyethylene glycol, polypropylene glycol, etc.) made of a known polyol compound can be suitably used. However, it is not limited to these examples. Examples of a method for introducing an amino group into an ether-based polymer include a method of polycondensation using a polyol compound having a tertiary amino group or a group in which the amino group is protected, and a method of introducing an amino group by a polymer reaction. Is mentioned. Examples of a method for introducing an ethylenically unsaturated group into an ether polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
スチレン系ポリマーとしては、公知のスチレン化合物(例えば、スチレン、4-カルボキシスチレン、4-アセトキシスチレン等)からなるポリスチレンであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。スチレン系ポリマーにアミノ基を導入する方法としては、例えば、アミノ基を有するスチレン誘導体を重合又は共重合する方法や高分子反応によりアミノ基を導入する方法が挙げられる。スチレン系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the styrene-based polymer, any polystyrene can be suitably used as long as it is made of a known styrene compound (for example, styrene, 4-carboxystyrene, 4-acetoxystyrene, etc.). However, it is not limited to these examples. Examples of the method for introducing an amino group into the styrene polymer include a method for polymerizing or copolymerizing a styrene derivative having an amino group, and a method for introducing an amino group by a polymer reaction. Examples of a method for introducing an ethylenically unsaturated group into a styrenic polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
カーボネート系ポリマーとしては、公知の炭酸誘導体(例えば、ホスゲン、炭酸ジメチル、炭酸ジメチル等)と公知のポリオール化合物からなるポリカーボネートであればいずれも好適に使用することができる。ただしこれら例示に限定されるものではない。カーボネート系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基又はアミノ基を保護した基を有するポリオール化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。カーボネート系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the carbonate-based polymer, any polycarbonate can be suitably used as long as it is a polycarbonate composed of a known carbonic acid derivative (for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.) and a known polyol compound. However, it is not limited to these examples. Examples of a method for introducing an amino group into a carbonate-based polymer include a method of polycondensation using a polyol compound having a tertiary amino group or a group in which the amino group is protected, and a method of introducing an amino group by a polymer reaction. Is mentioned. Examples of the method for introducing an ethylenically unsaturated group into the carbonate polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
ウレア系ポリマーとしては、公知のポリイソシアネート化合物と公知のポリアミン化合物からなるポリウレアであればいずれも好適に使用することができる。ただしこれら例示に限定されるものではない。ウレア系ポリマーにアミノ基を導入する方法としては、例えば、第三級アミノ基若しくはアミノ基を保護した基を有する、ポリイソシアネート化合物、及び/又は、重縮合反応に寄与しない第三級アミノ基若しくはアミノ基を保護した基を有するポリアミン化合物を用いて重縮合を行う方法や高分子反応によりアミノ基を導入する方法が挙げられる。ウレア系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
As the urea polymer, any polyurea composed of a known polyisocyanate compound and a known polyamine compound can be suitably used. However, it is not limited to these examples. Examples of the method for introducing an amino group into the urea polymer include a polyisocyanate compound having a tertiary amino group or a group in which the amino group is protected, and / or a tertiary amino group that does not contribute to the polycondensation reaction, or Examples thereof include a method of polycondensation using a polyamine compound having a group in which an amino group is protected, and a method of introducing an amino group by a polymer reaction. Examples of a method for introducing an ethylenically unsaturated group into a urea polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
アミン系ポリマーとしては、公知のポリアミンが例示できる。アミン系ポリマーにエチレン性不飽和基を導入する方法としては、例えば、高分子反応によりエチレン性不飽和基を導入する方法が挙げられる。
また、成分aは、スチレン-アクリル系共重合体等のような、共重合ポリマーであってもよい。 Examples of the amine polymer include known polyamines. Examples of a method for introducing an ethylenically unsaturated group into an amine polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
Component a may be a copolymer such as a styrene-acrylic copolymer.
また、成分aは、スチレン-アクリル系共重合体等のような、共重合ポリマーであってもよい。 Examples of the amine polymer include known polyamines. Examples of a method for introducing an ethylenically unsaturated group into an amine polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
Component a may be a copolymer such as a styrene-acrylic copolymer.
成分aは、光沢性の観点から、単官能(メタ)アクリレート化合物の単独重合体若しくは共重合体、又は、ジイソシアネート化合物とジオール化合物との重縮合体が好ましく例示できる。
Component a is preferably a homopolymer or copolymer of a monofunctional (meth) acrylate compound or a polycondensate of a diisocyanate compound and a diol compound from the viewpoint of gloss.
成分aとして挙げられる単官能(メタ)アクリレート化合物の単独重合体又は共重合体としては、被膜性、取り扱い性(粘性)、及び、アミノ基を導入する合成上の観点から、下記式IIで表されるモノマー単位を有するポリマーであることが好ましい。
The homopolymer or copolymer of the monofunctional (meth) acrylate compound mentioned as component a is represented by the following formula II from the viewpoint of film properties, handleability (viscosity), and synthesis for introducing an amino group. It is preferable that the polymer has a monomer unit.
式IIにおけるR1、R2及びL1は、上記式(I)におけるR1、R2及びL1とそれぞれ同義であり、好ましい態様も同様である。
式IIにおけるR3は、合成上の観点から、水素原子又はメチル基であることが好ましく、メチル基であることがより好ましい。
式IIにおけるXは、得られる人工爪の耐水性及び合成上の観点から、酸素原子であることが好ましい。 R 1, R 2 and L 1 in formula II are each R 1, R 2 and L 1 synonymous in the formula (I), the preferred embodiment is also the same.
R 3 in Formula II is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
X in Formula II is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
式IIにおけるR3は、合成上の観点から、水素原子又はメチル基であることが好ましく、メチル基であることがより好ましい。
式IIにおけるXは、得られる人工爪の耐水性及び合成上の観点から、酸素原子であることが好ましい。 R 1, R 2 and L 1 in formula II are each R 1, R 2 and L 1 synonymous in the formula (I), the preferred embodiment is also the same.
R 3 in Formula II is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
X in Formula II is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
成分aが式IIで表されるモノマー単位を有する場合、1種単独で有していても、2種以上有していても、他のモノマー単位を更に有していてもよい。
式IIで表されるモノマー単位を形成するモノマーとしては、下記式II-mで表される化合物が挙げられる。 When the component a has a monomer unit represented by the formula II, it may be used singly or in combination of two or more, or may further have other monomer units.
Examples of the monomer that forms the monomer unit represented by the formula II include compounds represented by the following formula II-m.
式IIで表されるモノマー単位を形成するモノマーとしては、下記式II-mで表される化合物が挙げられる。 When the component a has a monomer unit represented by the formula II, it may be used singly or in combination of two or more, or may further have other monomer units.
Examples of the monomer that forms the monomer unit represented by the formula II include compounds represented by the following formula II-m.
式II-mにおけるR1~R3、L1及びXは、上記式(II)におけるR1~R3、L1及びXとそれぞれ同義であり、好ましい態様も同様である。
R 1 ~ R 3, L 1 and X in formula II-m are each a R 1 ~ R 3, L 1 and X synonymous in above-mentioned formula (II), preferable embodiments thereof are also the same.
また、単官能(メタ)アクリレート化合物の単独重合体又は共重合体としては、得られる人工爪の耐水性の観点から、上記アミノ基を有するモノマー単位と、上記アミノ基を有するモノマー単位以外の、非水溶性の単量体由来のモノマー単位とを少なくとも有するポリマーであることが好ましい。非水溶性の定義は、1気圧、20℃の条件で同容量の純水との混合液が不均一な外観を維持するものを指す。
非水溶性の単量体としては、スチレン化合物、(メタ)アクリル酸誘導体が好ましく、(メタ)アクリル酸誘導体がより好ましく、(メタ)アクリル酸アルキルエステルが特に好ましい。
すなわち、成分aは、アミノ基を有するモノマー単位以外に、スチレン化合物及び(メタ)アクリル酸誘導体よりなる群から選ばれた化合物由来のモノマー単位を有することが好ましく、(メタ)アクリル酸誘導体由来のモノマー単位を有することがより好ましく、(メタ)アクリル酸アルキルエステル由来のモノマー単位を有することが更に好ましい。 In addition, as a homopolymer or copolymer of a monofunctional (meth) acrylate compound, from the viewpoint of water resistance of the resulting artificial nail, other than the monomer unit having the amino group and the monomer unit having the amino group, A polymer having at least a monomer unit derived from a water-insoluble monomer is preferable. The definition of non-water-soluble refers to that in which a mixed solution with the same volume of pure water maintains a non-uniform appearance under the conditions of 1 atm and 20 ° C.
As a water-insoluble monomer, a styrene compound and a (meth) acrylic acid derivative are preferable, a (meth) acrylic acid derivative is more preferable, and a (meth) acrylic acid alkyl ester is particularly preferable.
That is, component a preferably has a monomer unit derived from a compound selected from the group consisting of a styrene compound and a (meth) acrylic acid derivative, in addition to the monomer unit having an amino group, and is derived from a (meth) acrylic acid derivative. It is more preferable to have a monomer unit, and it is still more preferable to have a monomer unit derived from an alkyl (meth) acrylate.
非水溶性の単量体としては、スチレン化合物、(メタ)アクリル酸誘導体が好ましく、(メタ)アクリル酸誘導体がより好ましく、(メタ)アクリル酸アルキルエステルが特に好ましい。
すなわち、成分aは、アミノ基を有するモノマー単位以外に、スチレン化合物及び(メタ)アクリル酸誘導体よりなる群から選ばれた化合物由来のモノマー単位を有することが好ましく、(メタ)アクリル酸誘導体由来のモノマー単位を有することがより好ましく、(メタ)アクリル酸アルキルエステル由来のモノマー単位を有することが更に好ましい。 In addition, as a homopolymer or copolymer of a monofunctional (meth) acrylate compound, from the viewpoint of water resistance of the resulting artificial nail, other than the monomer unit having the amino group and the monomer unit having the amino group, A polymer having at least a monomer unit derived from a water-insoluble monomer is preferable. The definition of non-water-soluble refers to that in which a mixed solution with the same volume of pure water maintains a non-uniform appearance under the conditions of 1 atm and 20 ° C.
As a water-insoluble monomer, a styrene compound and a (meth) acrylic acid derivative are preferable, a (meth) acrylic acid derivative is more preferable, and a (meth) acrylic acid alkyl ester is particularly preferable.
That is, component a preferably has a monomer unit derived from a compound selected from the group consisting of a styrene compound and a (meth) acrylic acid derivative, in addition to the monomer unit having an amino group, and is derived from a (meth) acrylic acid derivative. It is more preferable to have a monomer unit, and it is still more preferable to have a monomer unit derived from an alkyl (meth) acrylate.
単官能(メタ)アクリレート化合物の単独重合体又は共重合体の製造において、アミノ基を有するモノマーと共重合可能なモノマーとして、好ましいモノマーは、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート等の単官能(メタ)アクリル酸エステル類、2-ヒドロキシエチル(メタ)アクリルアミド、イソプロピルアクリルアミド、モルホリンアクリルアミド、等の単官能(メタ)アクリル酸アミド類、N-ビニルピロリドン、酢酸ビニル、等のビニルモノマー類、エチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、カルドエポキシジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、等の多官能(メタ)アクリル酸エステル類、ジイソシアネートと水酸基含有(メタ)アクリル酸誘導体と任意にジオール類からなるウレタン(メタ)アクリレート等が挙げられる。ただしこれら例示に限定されるものではない。
In the production of a homopolymer or copolymer of a monofunctional (meth) acrylate compound, preferred monomers that can be copolymerized with a monomer having an amino group include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, Monofunctional (meth) acrylates such as 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxyethyl (meth) acrylamide, isopropylacrylamide, morpholine Monofunctional (meth) acrylic amides such as acrylamide, vinyl monomers such as N-vinyl pyrrolidone and vinyl acetate, ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethy Glycol di (meth) acrylate, propylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, Polyfunctional (meth) acrylic acid esters such as dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, cardoepoxy di (meth) acrylate, neopentyl glycol di (meth) acrylate, Examples thereof include urethane (meth) acrylates composed of diisocyanate, a hydroxyl group-containing (meth) acrylic acid derivative, and optionally diols. However, it is not limited to these examples.
また、成分aは、得られる人工爪の耐水性の観点から、アミノ基を有するモノマー単位に加え、下記式IVで表されるモノマー単位を更に有していることが好ましい。
In addition, the component a preferably further has a monomer unit represented by the following formula IV in addition to the monomer unit having an amino group, from the viewpoint of water resistance of the artificial nail to be obtained.
R6は、得られる人工爪の耐水性の観点から、アルキル基又は上記式Vで表される基であることが好ましく、炭素数1~20のアルキル基又は上記式Vで表される基であることがより好ましく、炭素数3~10のアルキル基であることが更に好ましく、ブチル基であることが特に好ましい。
R7は、合成上の観点から、水素原子又はメチル基であることが好ましく、メチル基であることがより好ましい。
X’は、得られる人工爪の耐水性及び合成上の観点から、酸素原子であることが好ましい。
L4は、エチレン基であることが好ましい。
nは、得られる人工爪の耐水性の観点から、1~10の整数であることが好ましい。
R8は、得られる人工爪の耐水性の観点から、炭素数1~10のアルキル基であることが好ましく、メチル基であることがより好ましい。 R 6 is preferably an alkyl group or a group represented by the above formula V from the viewpoint of water resistance of the resulting artificial nail, and is an alkyl group having 1 to 20 carbon atoms or a group represented by the above formula V. More preferred is an alkyl group having 3 to 10 carbon atoms, and particularly preferred is a butyl group.
R 7 is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
X ′ is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
L 4 is preferably an ethylene group.
n is preferably an integer of 1 to 10 from the viewpoint of the water resistance of the resulting artificial nail.
R 8 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably a methyl group, from the viewpoint of water resistance of the resulting artificial nail.
R7は、合成上の観点から、水素原子又はメチル基であることが好ましく、メチル基であることがより好ましい。
X’は、得られる人工爪の耐水性及び合成上の観点から、酸素原子であることが好ましい。
L4は、エチレン基であることが好ましい。
nは、得られる人工爪の耐水性の観点から、1~10の整数であることが好ましい。
R8は、得られる人工爪の耐水性の観点から、炭素数1~10のアルキル基であることが好ましく、メチル基であることがより好ましい。 R 6 is preferably an alkyl group or a group represented by the above formula V from the viewpoint of water resistance of the resulting artificial nail, and is an alkyl group having 1 to 20 carbon atoms or a group represented by the above formula V. More preferred is an alkyl group having 3 to 10 carbon atoms, and particularly preferred is a butyl group.
R 7 is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
X ′ is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
L 4 is preferably an ethylene group.
n is preferably an integer of 1 to 10 from the viewpoint of the water resistance of the resulting artificial nail.
R 8 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably a methyl group, from the viewpoint of water resistance of the resulting artificial nail.
以下に、単官能(メタ)アクリレート化合物の単独重合体又は共重合体の具体例を示すが、この具体例に限定されるものではない。
単官能(メタ)アクリレート化合物の単独重合体又は共重合体としては、下記構造のポリマーが好ましく、下記構造かつ重量平均分子量のポリマーがより好ましい。また、各モノマー単位の括弧の右下の数字は、モル比を表す。また、アルキレンオキシ鎖における括弧の右下の数字は、繰り返し数を表す。また、*が記載された構成単位は、該ポリマーの主鎖末端が、*で主鎖に結合した当該構造になっていることを示す。 Although the specific example of the homopolymer or copolymer of a monofunctional (meth) acrylate compound is shown below, it is not limited to this specific example.
As a homopolymer or copolymer of a monofunctional (meth) acrylate compound, a polymer having the following structure is preferable, and a polymer having the following structure and a weight average molecular weight is more preferable. Moreover, the number on the lower right of the parenthesis of each monomer unit represents a molar ratio. The number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions. Moreover, the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple | bonded with the main chain by *.
単官能(メタ)アクリレート化合物の単独重合体又は共重合体としては、下記構造のポリマーが好ましく、下記構造かつ重量平均分子量のポリマーがより好ましい。また、各モノマー単位の括弧の右下の数字は、モル比を表す。また、アルキレンオキシ鎖における括弧の右下の数字は、繰り返し数を表す。また、*が記載された構成単位は、該ポリマーの主鎖末端が、*で主鎖に結合した当該構造になっていることを示す。 Although the specific example of the homopolymer or copolymer of a monofunctional (meth) acrylate compound is shown below, it is not limited to this specific example.
As a homopolymer or copolymer of a monofunctional (meth) acrylate compound, a polymer having the following structure is preferable, and a polymer having the following structure and a weight average molecular weight is more preferable. Moreover, the number on the lower right of the parenthesis of each monomer unit represents a molar ratio. The number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions. Moreover, the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple | bonded with the main chain by *.
また、成分aとして挙げられるジイソシアネート化合物とジオール化合物との重縮合体としては、被膜性、取り扱い性(粘性)及びアミノ基を導入する合成上の観点から、下記式III又は式III-bで表されるモノマー単位を有するポリマーであることが好ましく、下記式IIIで表されるモノマー単位を有するウレタン系ポリマーであることがより好ましい。
In addition, the polycondensate of the diisocyanate compound and the diol compound mentioned as component a is represented by the following formula III or formula III-b from the viewpoint of film properties, handleability (viscosity), and synthesis for introducing an amino group. A polymer having a monomer unit is preferable, and a urethane polymer having a monomer unit represented by the following formula III is more preferable.
式IIIにおけるR4及びR5はそれぞれ独立に、酸水溶液への溶解性と耐水性とのバランスの観点から、炭素数1~10のアルキル基であることが好ましく、メチル基又はエチル基であることが特に好ましい。
また、式IIIにおいて、R4、R5及びL3よりなる群から選ばれた少なくとも2つは互いに連結して環を形成してもよい。
式IIIにおけるL2は、炭素数2~20の3価の連結基であることが好ましく、炭素数2~20の3価の炭化水素基であることがより好ましく、炭素数2~20の3価の脂肪族炭化水素基であることが更に好ましく、炭素数2~10の3価の脂肪族炭化水素基であることが特に好ましく、式IIIにおける2つの酸素原子と1位及び2位でそれぞれ結合する1,1,2-エタントリイル基であることが最も好ましい。
式IIIにおけるL3は、ポリマーの被膜性の観点から、炭素数1~4のアルキレン基であることが好ましく、メチレン基であることが特に好ましい。
式III-bにおけるRb4は、酸水溶液への溶解性と耐水性とのバランスの観点から、炭素数1~10のアルキル基であることが好ましく、炭素数2~8のアルキル基であることがより好ましく、炭素数4~8のアルキル基であることが更に好ましく、n-ブチル基であることが特に好ましい。
式III-bにおけるLb3はそれぞれ独立に、ポリマーの被膜性の観点から、炭素数2~8のアルキレン基であることが好ましく、エチレン基であることが特に好ましい。
また、合成上の観点から、2つのLb3は同じ基であることが好ましい。
また、式III-bにおいて、Rb4とLb3とは互いに連結して環を形成してもよい。 In formula III, R 4 and R 5 are each independently preferably an alkyl group having 1 to 10 carbon atoms from the viewpoint of a balance between solubility in an aqueous acid solution and water resistance, and is a methyl group or an ethyl group. It is particularly preferred.
In Formula III, at least two selected from the group consisting of R 4 , R 5 and L 3 may be connected to each other to form a ring.
L 2 in Formula III is preferably a trivalent linking group having 2 to 20 carbon atoms, more preferably a trivalent hydrocarbon group having 2 to 20 carbon atoms, and 3 having 2 to 20 carbon atoms. It is more preferably a valent aliphatic hydrocarbon group, particularly preferably a trivalent aliphatic hydrocarbon group having 2 to 10 carbon atoms, each having two oxygen atoms in Formula III at the 1-position and 2-position, respectively. Most preferred is a 1,1,2-ethanetriyl group to be bonded.
L 3 in Formula III is preferably an alkylene group having 1 to 4 carbon atoms, and particularly preferably a methylene group, from the viewpoint of the coating properties of the polymer.
R b4 in formula III-b is preferably an alkyl group having 1 to 10 carbon atoms, and preferably an alkyl group having 2 to 8 carbon atoms, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. Is more preferable, an alkyl group having 4 to 8 carbon atoms is more preferable, and an n-butyl group is particularly preferable.
In the formula III-b, L b3 is each independently preferably an alkylene group having 2 to 8 carbon atoms, particularly preferably an ethylene group, from the viewpoint of the coating properties of the polymer.
Further, from the viewpoint of synthesis, the two L b3 are preferably the same group.
In Formula III-b, R b4 and L b3 may be connected to each other to form a ring.
また、式IIIにおいて、R4、R5及びL3よりなる群から選ばれた少なくとも2つは互いに連結して環を形成してもよい。
式IIIにおけるL2は、炭素数2~20の3価の連結基であることが好ましく、炭素数2~20の3価の炭化水素基であることがより好ましく、炭素数2~20の3価の脂肪族炭化水素基であることが更に好ましく、炭素数2~10の3価の脂肪族炭化水素基であることが特に好ましく、式IIIにおける2つの酸素原子と1位及び2位でそれぞれ結合する1,1,2-エタントリイル基であることが最も好ましい。
式IIIにおけるL3は、ポリマーの被膜性の観点から、炭素数1~4のアルキレン基であることが好ましく、メチレン基であることが特に好ましい。
式III-bにおけるRb4は、酸水溶液への溶解性と耐水性とのバランスの観点から、炭素数1~10のアルキル基であることが好ましく、炭素数2~8のアルキル基であることがより好ましく、炭素数4~8のアルキル基であることが更に好ましく、n-ブチル基であることが特に好ましい。
式III-bにおけるLb3はそれぞれ独立に、ポリマーの被膜性の観点から、炭素数2~8のアルキレン基であることが好ましく、エチレン基であることが特に好ましい。
また、合成上の観点から、2つのLb3は同じ基であることが好ましい。
また、式III-bにおいて、Rb4とLb3とは互いに連結して環を形成してもよい。 In formula III, R 4 and R 5 are each independently preferably an alkyl group having 1 to 10 carbon atoms from the viewpoint of a balance between solubility in an aqueous acid solution and water resistance, and is a methyl group or an ethyl group. It is particularly preferred.
In Formula III, at least two selected from the group consisting of R 4 , R 5 and L 3 may be connected to each other to form a ring.
L 2 in Formula III is preferably a trivalent linking group having 2 to 20 carbon atoms, more preferably a trivalent hydrocarbon group having 2 to 20 carbon atoms, and 3 having 2 to 20 carbon atoms. It is more preferably a valent aliphatic hydrocarbon group, particularly preferably a trivalent aliphatic hydrocarbon group having 2 to 10 carbon atoms, each having two oxygen atoms in Formula III at the 1-position and 2-position, respectively. Most preferred is a 1,1,2-ethanetriyl group to be bonded.
L 3 in Formula III is preferably an alkylene group having 1 to 4 carbon atoms, and particularly preferably a methylene group, from the viewpoint of the coating properties of the polymer.
R b4 in formula III-b is preferably an alkyl group having 1 to 10 carbon atoms, and preferably an alkyl group having 2 to 8 carbon atoms, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. Is more preferable, an alkyl group having 4 to 8 carbon atoms is more preferable, and an n-butyl group is particularly preferable.
In the formula III-b, L b3 is each independently preferably an alkylene group having 2 to 8 carbon atoms, particularly preferably an ethylene group, from the viewpoint of the coating properties of the polymer.
Further, from the viewpoint of synthesis, the two L b3 are preferably the same group.
In Formula III-b, R b4 and L b3 may be connected to each other to form a ring.
成分aが式III又は式III-bで表されるモノマー単位を有する場合、1種単独で有していても、2種以上有していてもよく、また、更に有していてもよい他のモノマー単位としては、後述するジイソシアネート成分由来のモノマー単位等が好ましく挙げられる。
式IIIで表されるモノマー単位を形成するモノマーとしては、下記式III-mで表される化合物が挙げられる。
また、式III-bで表されるモノマー単位を形成するモノマーとしては、下記式III-bmで表される化合物が挙げられる。 When component a has a monomer unit represented by formula III or formula III-b, it may be used singly or in combination of two or more, or may be further contained Preferred examples of the monomer unit include a monomer unit derived from a diisocyanate component described later.
Examples of the monomer that forms the monomer unit represented by the formula III include compounds represented by the following formula III-m.
Examples of the monomer that forms the monomer unit represented by the formula III-b include compounds represented by the following formula III-bm.
式IIIで表されるモノマー単位を形成するモノマーとしては、下記式III-mで表される化合物が挙げられる。
また、式III-bで表されるモノマー単位を形成するモノマーとしては、下記式III-bmで表される化合物が挙げられる。 When component a has a monomer unit represented by formula III or formula III-b, it may be used singly or in combination of two or more, or may be further contained Preferred examples of the monomer unit include a monomer unit derived from a diisocyanate component described later.
Examples of the monomer that forms the monomer unit represented by the formula III include compounds represented by the following formula III-m.
Examples of the monomer that forms the monomer unit represented by the formula III-b include compounds represented by the following formula III-bm.
式III-mにおけるR4、R5、L2及びL3は、上記式IIIにおけるR4、R5、L2及びL3とそれぞれ同義であり、好ましい態様も同様である。
式III-bmにおけるRb4及びLb3は、上記式III-bにおけるRb4及びLb3とそれぞれ同義であり、好ましい態様も同様である。 R 4, R 5, L 2 and L 3 in formula III-m are respectively synonymous with R 4, R 5, L 2 and L 3 in the formula III, preferred embodiments are also the same.
R b4 and L b3 in formula III-bm is respectively R b4 and L b3 synonymous in formula III-b, preferred embodiments are also the same.
式III-bmにおけるRb4及びLb3は、上記式III-bにおけるRb4及びLb3とそれぞれ同義であり、好ましい態様も同様である。 R 4, R 5, L 2 and L 3 in formula III-m are respectively synonymous with R 4, R 5, L 2 and L 3 in the formula III, preferred embodiments are also the same.
R b4 and L b3 in formula III-bm is respectively R b4 and L b3 synonymous in formula III-b, preferred embodiments are also the same.
また、ジイソシアネート化合物とジオール化合物との重縮合体としては、得られる人工爪の強度や耐水性の観点から、上記アミノ基を有するモノマー単位と、上記アミノ基を有するモノマー単位以外のモノマー単位とを少なくとも有するポリマーであることが好ましい。
アミノ基を有するモノマー単位以外のモノマーとしては、水酸基を2つ有する化合物が好ましく、水酸基を2つ有する非水溶性の化合物がより好ましい。
すなわち、ジイソシアネート化合物とジオール化合物との重縮合体は、アミノ基を有するモノマー単位以外に、水酸基を2つ有する化合物よりなる群から選ばれた化合物由来のモノマー単位を有することが好ましく、水酸基を2つ有する非水溶性の化合物由来のモノマー単位を有することがより好ましい。
ジイソシアネート化合物とジオール化合物との重縮合体の製造において、アミノ基を有するモノマーと共重合可能なモノマーとしては、例えば、エチレングリコール、ジエチレングリコール、トリエチレングリコール、テトラエチレングリコール、ポリエチレングリコール、1,3-プロパンジオール、1,2-プロパンジオール、2-メチル-1,3-プロパンジオール、ネオペンチルグリコール、2-エチル-2-メチル-1,3-プロパンジオール、2,2-ジエチル-1,3-プロパンジオール、2-メチル-2-プロピル-1,3-プロパンジオール、2-ブチル-2-エチル-1,3-プロパンジオール、1,4-ブタンジオール、1,3-ブタンジオール、1,2-ブタンジオール、2,3-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、1,9-ノナンジオール、1,3-シクロペンタンジオール、1,2-シクロヘキサンジオール、1,3-シクロヘキサンジオール、1,4-シクロヘキサンジオール、4,4’-イソプロピリデンジシクロヘキサノール、1,4-シクロヘキサンジメタノール、1,5-デカリンジオール、4,8-ビス(ヒドロキシメチル)トリシクロ[5.2.1.0(2,6)]デカン、2,2,3,3,4,4-ヘキサフルオロ-1,5-ペンタンジオール、ジプロピレングリコール、ポリプロピレングリコール、ポリテトラメチレングリコール、2,2’-チオジエタノール、グリコール酸2-ヒドロキシエチル、N,N’-ビス(2-ヒドロキシエチル)コハク酸アミド、2,2’-スルホニルジエタノール、ビスフェノールA、ビスフェノールS、ビスフェノールF、ポリ(エチレングリコールテレフタレート)、ポリ(エチレングリコールカーボネート)、ポリ(テトラメチレングリコールカーボネート)等が挙げられる。ただしこれら例示に限定されるものではない。 Moreover, as a polycondensate of a diisocyanate compound and a diol compound, from the viewpoint of the strength and water resistance of the obtained artificial nail, a monomer unit having the amino group and a monomer unit other than the monomer unit having the amino group are used. A polymer having at least one is preferable.
As the monomer other than the monomer unit having an amino group, a compound having two hydroxyl groups is preferable, and a water-insoluble compound having two hydroxyl groups is more preferable.
That is, the polycondensate of a diisocyanate compound and a diol compound preferably has a monomer unit derived from a compound selected from the group consisting of compounds having two hydroxyl groups in addition to the monomer unit having an amino group. More preferably, it has a monomer unit derived from a water-insoluble compound.
In the production of a polycondensate of a diisocyanate compound and a diol compound, examples of the monomer copolymerizable with a monomer having an amino group include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, 1,3- Propanediol, 1,2-propanediol, 2-methyl-1,3-propanediol, neopentyl glycol, 2-ethyl-2-methyl-1,3-propanediol, 2,2-diethyl-1,3- Propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,4-butanediol, 1,3-butanediol, 1,2 -Butanediol, 2,3-butanediol, 1,5-penta Diol, 1,6-hexanediol, 1,9-nonanediol, 1,3-cyclopentanediol, 1,2-cyclohexanediol, 1,3-cyclohexanediol, 1,4-cyclohexanediol, 4,4'- Isopropylidenedicyclohexanol, 1,4-cyclohexanedimethanol, 1,5-decalindiol, 4,8-bis (hydroxymethyl) tricyclo [5.2.1.0 (2,6)] decane, 2,2 , 3,3,4,4-hexafluoro-1,5-pentanediol, dipropylene glycol, polypropylene glycol, polytetramethylene glycol, 2,2′-thiodiethanol, 2-hydroxyethyl glycolate, N, N ′ -Bis (2-hydroxyethyl) succinamide, 2,2'-sulfonyldiethanol Bisphenol A, bisphenol S, bisphenol F, poly (ethylene glycol terephthalate), poly (ethylene glycol carbonate), poly (tetramethylene glycol carbonate) and the like. However, it is not limited to these examples.
アミノ基を有するモノマー単位以外のモノマーとしては、水酸基を2つ有する化合物が好ましく、水酸基を2つ有する非水溶性の化合物がより好ましい。
すなわち、ジイソシアネート化合物とジオール化合物との重縮合体は、アミノ基を有するモノマー単位以外に、水酸基を2つ有する化合物よりなる群から選ばれた化合物由来のモノマー単位を有することが好ましく、水酸基を2つ有する非水溶性の化合物由来のモノマー単位を有することがより好ましい。
ジイソシアネート化合物とジオール化合物との重縮合体の製造において、アミノ基を有するモノマーと共重合可能なモノマーとしては、例えば、エチレングリコール、ジエチレングリコール、トリエチレングリコール、テトラエチレングリコール、ポリエチレングリコール、1,3-プロパンジオール、1,2-プロパンジオール、2-メチル-1,3-プロパンジオール、ネオペンチルグリコール、2-エチル-2-メチル-1,3-プロパンジオール、2,2-ジエチル-1,3-プロパンジオール、2-メチル-2-プロピル-1,3-プロパンジオール、2-ブチル-2-エチル-1,3-プロパンジオール、1,4-ブタンジオール、1,3-ブタンジオール、1,2-ブタンジオール、2,3-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、1,9-ノナンジオール、1,3-シクロペンタンジオール、1,2-シクロヘキサンジオール、1,3-シクロヘキサンジオール、1,4-シクロヘキサンジオール、4,4’-イソプロピリデンジシクロヘキサノール、1,4-シクロヘキサンジメタノール、1,5-デカリンジオール、4,8-ビス(ヒドロキシメチル)トリシクロ[5.2.1.0(2,6)]デカン、2,2,3,3,4,4-ヘキサフルオロ-1,5-ペンタンジオール、ジプロピレングリコール、ポリプロピレングリコール、ポリテトラメチレングリコール、2,2’-チオジエタノール、グリコール酸2-ヒドロキシエチル、N,N’-ビス(2-ヒドロキシエチル)コハク酸アミド、2,2’-スルホニルジエタノール、ビスフェノールA、ビスフェノールS、ビスフェノールF、ポリ(エチレングリコールテレフタレート)、ポリ(エチレングリコールカーボネート)、ポリ(テトラメチレングリコールカーボネート)等が挙げられる。ただしこれら例示に限定されるものではない。 Moreover, as a polycondensate of a diisocyanate compound and a diol compound, from the viewpoint of the strength and water resistance of the obtained artificial nail, a monomer unit having the amino group and a monomer unit other than the monomer unit having the amino group are used. A polymer having at least one is preferable.
As the monomer other than the monomer unit having an amino group, a compound having two hydroxyl groups is preferable, and a water-insoluble compound having two hydroxyl groups is more preferable.
That is, the polycondensate of a diisocyanate compound and a diol compound preferably has a monomer unit derived from a compound selected from the group consisting of compounds having two hydroxyl groups in addition to the monomer unit having an amino group. More preferably, it has a monomer unit derived from a water-insoluble compound.
In the production of a polycondensate of a diisocyanate compound and a diol compound, examples of the monomer copolymerizable with a monomer having an amino group include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, 1,3- Propanediol, 1,2-propanediol, 2-methyl-1,3-propanediol, neopentyl glycol, 2-ethyl-2-methyl-1,3-propanediol, 2,2-diethyl-1,3- Propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,4-butanediol, 1,3-butanediol, 1,2 -Butanediol, 2,3-butanediol, 1,5-penta Diol, 1,6-hexanediol, 1,9-nonanediol, 1,3-cyclopentanediol, 1,2-cyclohexanediol, 1,3-cyclohexanediol, 1,4-cyclohexanediol, 4,4'- Isopropylidenedicyclohexanol, 1,4-cyclohexanedimethanol, 1,5-decalindiol, 4,8-bis (hydroxymethyl) tricyclo [5.2.1.0 (2,6)] decane, 2,2 , 3,3,4,4-hexafluoro-1,5-pentanediol, dipropylene glycol, polypropylene glycol, polytetramethylene glycol, 2,2′-thiodiethanol, 2-hydroxyethyl glycolate, N, N ′ -Bis (2-hydroxyethyl) succinamide, 2,2'-sulfonyldiethanol Bisphenol A, bisphenol S, bisphenol F, poly (ethylene glycol terephthalate), poly (ethylene glycol carbonate), poly (tetramethylene glycol carbonate) and the like. However, it is not limited to these examples.
ジイソシアネート化合物とジオール化合物との重縮合体の製造において使用されるジイソシアネート化合物としては、公知のジイソシアネート化合物を使用することができる。具体的には、イソホロンジイソシアネート、m-フェニレンジイソシアネート、p-フェニレンジイソシアネート、2,6-トリレンジイソシアネート、2,4-トリレンジイソシアネート、ナフタレン-1,5-ジイソシアネート、ジフェニルメタン-4,4’-ジイソシアネート、ジフェニルメタン-2,4’-ジイソシアネート、2,2-ビス(4-イソシアナトフェニル)プロパン、ビス(3-メチル-4-イソシアナトフェニル)メタン、1,3-ビス(1-イソシアナト-1-メチルエチル)ベンゼン、4,4’-ジイソシアナトビフェニル、4,4’-オキシビス(フェニルイソシアネート)、4,4’-ジイソシアナト-3,3’-ジメチルビフェニル、4,4’-ジイソシアナト-3,3’-ジクロロビフェニル、4,4’-ジイソシアナト-3,3’-ジメトキシビフェニル、m-キシリレンジイソシアネート、p-キシリレンジイソシアネート、1-クロロメチル-2,4-ジイソシアナトベンゼン、2-メチルキシリレン-1,3-ジイソシアネート、2,2-ビス(4-イソシアナトフェニル)ヘキサフルオロプロパン、テトラメチレンジイソシアネート、ヘキサメチレンジイソシアネート、プロピレン-1,2-ジイソシアネート、ブチレン-1,2-ジイソシアネート、シクロヘキシレン-1,2-ジイソシアネート、シクロヘキシレン-1,3-ジイソシアネート、シクロヘキシレン-1,4-ジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアネート、1,4-ビス(イソシアナトメチル)シクロヘキサン、1,3-ビス(イソシアナトメチル)シクロヘキサン、ノルボルネンジイソシアネート、トリメチルヘキサメチレンジシソシアネート、リジンジイソシアネート、2-クロロ-1,4-ジイソシアナトベンゼン、2,4,6‐トリメチルフェニル‐1,3‐ジイソシアネート、2,2’,5,5’-テトラクロロジフェニル-4,4’-ジイソシアネート、等が挙げられる。ただし、これら例示に限定されるものではない。
As the diisocyanate compound used in the production of a polycondensate of a diisocyanate compound and a diol compound, a known diisocyanate compound can be used. Specifically, isophorone diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 2,6-tolylene diisocyanate, 2,4-tolylene diisocyanate, naphthalene-1,5-diisocyanate, diphenylmethane-4,4′-diisocyanate Diphenylmethane-2,4′-diisocyanate, 2,2-bis (4-isocyanatophenyl) propane, bis (3-methyl-4-isocyanatophenyl) methane, 1,3-bis (1-isocyanato-1- Methylethyl) benzene, 4,4′-diisocyanatobiphenyl, 4,4′-oxybis (phenylisocyanate), 4,4′-diisocyanato-3,3′-dimethylbiphenyl, 4,4′-diisocyanato-3, 3'-dichlorobiphenyl, 4,4 -Diisocyanato-3,3'-dimethoxybiphenyl, m-xylylene diisocyanate, p-xylylene diisocyanate, 1-chloromethyl-2,4-diisocyanatobenzene, 2-methylxylylene-1,3-diisocyanate, 2 , 2-bis (4-isocyanatophenyl) hexafluoropropane, tetramethylene diisocyanate, hexamethylene diisocyanate, propylene-1,2-diisocyanate, butylene-1,2-diisocyanate, cyclohexylene-1,2-diisocyanate, cyclohexylene -1,3-diisocyanate, cyclohexylene-1,4-diisocyanate, dicyclohexylmethane-4,4′-diisocyanate, 1,4-bis (isocyanatomethyl) cyclohexane, 1,3-bis (i Cyanatomethyl) cyclohexane, norbornene diisocyanate, trimethylhexamethylene disissocyanate, lysine diisocyanate, 2-chloro-1,4-diisocyanatobenzene, 2,4,6-trimethylphenyl-1,3-diisocyanate, 2,2 ', 5,5′-tetrachlorodiphenyl-4,4′-diisocyanate, and the like. However, it is not limited to these examples.
以下に、ジイソシアネート化合物とジオール化合物との重縮合体の具体例を示すが、この具体例に限定されるものではない。
ジイソシアネート化合物とジオール化合物との重縮合体としては、下記構造のポリマーが好ましく、下記構造かつ重量平均分子量のポリマーがより好ましい。また、各モノマー単位の括弧の右下の数字は、モル比を表す。また、アルキレンオキシ鎖における括弧の右下の数字は、繰り返し数を表す。また、*が記載された構成単位は、該ポリマーの主鎖末端が、*で主鎖に結合した当該構造になっていることを示す。 Although the specific example of the polycondensate of a diisocyanate compound and a diol compound is shown below, it is not limited to this specific example.
As a polycondensate of a diisocyanate compound and a diol compound, a polymer having the following structure is preferable, and a polymer having the following structure and a weight average molecular weight is more preferable. Moreover, the number on the lower right of the parenthesis of each monomer unit represents a molar ratio. The number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions. Moreover, the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple | bonded with the main chain by *.
ジイソシアネート化合物とジオール化合物との重縮合体としては、下記構造のポリマーが好ましく、下記構造かつ重量平均分子量のポリマーがより好ましい。また、各モノマー単位の括弧の右下の数字は、モル比を表す。また、アルキレンオキシ鎖における括弧の右下の数字は、繰り返し数を表す。また、*が記載された構成単位は、該ポリマーの主鎖末端が、*で主鎖に結合した当該構造になっていることを示す。 Although the specific example of the polycondensate of a diisocyanate compound and a diol compound is shown below, it is not limited to this specific example.
As a polycondensate of a diisocyanate compound and a diol compound, a polymer having the following structure is preferable, and a polymer having the following structure and a weight average molecular weight is more preferable. Moreover, the number on the lower right of the parenthesis of each monomer unit represents a molar ratio. The number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions. Moreover, the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple | bonded with the main chain by *.
成分aは、モノマー単位としてアミノ基を有するモノマー単位のみからなるポリマーであってもよいが、成分aがアミノ基を有するモノマー単位と他のモノマー単位とを有する場合、アミノ基を有するモノマー単位の含有量は、成分aの全モノマー単位に対し、5~75モル%であることが好ましく、20~75モル%であることがより好ましく、20~60モル%であることが更に好ましい。上記範囲であると、得られる人工爪の除去性及び耐水性により優れる。
The component a may be a polymer composed only of a monomer unit having an amino group as a monomer unit, but when the component a has a monomer unit having an amino group and another monomer unit, the monomer unit having an amino group The content is preferably from 5 to 75 mol%, more preferably from 20 to 75 mol%, still more preferably from 20 to 60 mol%, based on all monomer units of component a. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range.
また、成分aのアミン価は、0.1~10mmol/gであることが好ましく、0.25~9mmol/gであることがより好ましく、0.5~8mmol/gであることが更に好ましい。上記範囲であると、得られる人工爪の爪との密着性及び除去性により優れる。
アミン価の測定方法としては、例えば、試料をビーカーに量りとり、酢酸を加え、撹拌して溶解させて、測定温度を25℃に調整後、滴定試薬として0.1N過塩素酸酢酸溶液を用いて、滴定装置で滴定することにより、求めることができる。
なお、アミン価は、滴定した際に消費される過塩素酸の量を、試料(固形分)1g当たりのモル数で表したものである。 The amine value of component a is preferably 0.1 to 10 mmol / g, more preferably 0.25 to 9 mmol / g, and still more preferably 0.5 to 8 mmol / g. It is excellent in the adhesiveness with the nail | claw of the obtained artificial nail and removability as it is the said range.
As a method for measuring the amine value, for example, a sample is weighed into a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
The amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (solid content).
アミン価の測定方法としては、例えば、試料をビーカーに量りとり、酢酸を加え、撹拌して溶解させて、測定温度を25℃に調整後、滴定試薬として0.1N過塩素酸酢酸溶液を用いて、滴定装置で滴定することにより、求めることができる。
なお、アミン価は、滴定した際に消費される過塩素酸の量を、試料(固形分)1g当たりのモル数で表したものである。 The amine value of component a is preferably 0.1 to 10 mmol / g, more preferably 0.25 to 9 mmol / g, and still more preferably 0.5 to 8 mmol / g. It is excellent in the adhesiveness with the nail | claw of the obtained artificial nail and removability as it is the said range.
As a method for measuring the amine value, for example, a sample is weighed into a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
The amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (solid content).
成分aは、1種単独で含有していても、2種以上を併用していてもよい。
人工爪組成物における成分aの含有量は、特に制限はないが、人工爪組成物の全質量に対し、1~95質量%であることが好ましく、5~95質量%であることがより好ましい。上記範囲であると、得られる人工爪の除去性及び密着性により優れる。人工爪組成物における溶剤の含有量が10質量%未満である場合、すなわち、上記(ii)の態様である場合、成分aの含有量は、人工爪組成物の全質量に対し、10~90質量%であることが更に好ましく、20~80質量%であることが特に好ましく、30~70質量%が特に好ましい。上記範囲内であると、硬化性及び密着性に優れる。
また、人工爪組成物における溶剤の含有量が10質量%以上である場合、すなわち、上記(i)の態様である場合、成分aの含有量は、人工爪組成物の全質量に対し、30~80質量%であることが更に好ましく、40~75質量%であることが特に好ましい。 The component a may be contained individually by 1 type, or may use 2 or more types together.
The content of component a in the artificial nail composition is not particularly limited, but is preferably 1 to 95% by mass and more preferably 5 to 95% by mass with respect to the total mass of the artificial nail composition. . It is excellent in the removability and adhesiveness of the obtained artificial nail as it is the said range. When the content of the solvent in the artificial nail composition is less than 10% by mass, that is, in the case of the above (ii), the content of component a is 10 to 90 with respect to the total mass of the artificial nail composition. More preferably, it is 20% by mass, particularly preferably 20 to 80% by mass, and particularly preferably 30 to 70% by mass. It is excellent in sclerosis | hardenability and adhesiveness as it is in the said range.
Further, when the content of the solvent in the artificial nail composition is 10% by mass or more, that is, in the case of the above (i), the content of the component a is 30 with respect to the total mass of the artificial nail composition. It is more preferably from 80 to 80% by mass, particularly preferably from 40 to 75% by mass.
人工爪組成物における成分aの含有量は、特に制限はないが、人工爪組成物の全質量に対し、1~95質量%であることが好ましく、5~95質量%であることがより好ましい。上記範囲であると、得られる人工爪の除去性及び密着性により優れる。人工爪組成物における溶剤の含有量が10質量%未満である場合、すなわち、上記(ii)の態様である場合、成分aの含有量は、人工爪組成物の全質量に対し、10~90質量%であることが更に好ましく、20~80質量%であることが特に好ましく、30~70質量%が特に好ましい。上記範囲内であると、硬化性及び密着性に優れる。
また、人工爪組成物における溶剤の含有量が10質量%以上である場合、すなわち、上記(i)の態様である場合、成分aの含有量は、人工爪組成物の全質量に対し、30~80質量%であることが更に好ましく、40~75質量%であることが特に好ましい。 The component a may be contained individually by 1 type, or may use 2 or more types together.
The content of component a in the artificial nail composition is not particularly limited, but is preferably 1 to 95% by mass and more preferably 5 to 95% by mass with respect to the total mass of the artificial nail composition. . It is excellent in the removability and adhesiveness of the obtained artificial nail as it is the said range. When the content of the solvent in the artificial nail composition is less than 10% by mass, that is, in the case of the above (ii), the content of component a is 10 to 90 with respect to the total mass of the artificial nail composition. More preferably, it is 20% by mass, particularly preferably 20 to 80% by mass, and particularly preferably 30 to 70% by mass. It is excellent in sclerosis | hardenability and adhesiveness as it is in the said range.
Further, when the content of the solvent in the artificial nail composition is 10% by mass or more, that is, in the case of the above (i), the content of the component a is 30 with respect to the total mass of the artificial nail composition. It is more preferably from 80 to 80% by mass, particularly preferably from 40 to 75% by mass.
また、(i)又は(ii)の態様において、人工爪組成物は、被膜性や光沢性を向上させることを目的に、成分a以外のポリマーを含有していてもよい。
成分a以外のポリマーとしては、被膜性の観点から、アクリル系ポリマー又はウレタン系ポリマーであることが好ましい。また、塗布性を向上させることを目的に、粘度調整剤(増粘剤等)として知られる公知のポリマーを含有していてもよい。
(i)又は(ii)の態様において、人工爪組成物が成分a以外のポリマーを含有する場合、成分a以外のポリマーの含有量は、成分aの含有量未満であることが好ましく、人工爪組成物の全質量に対し、40質量%以下であることがより好ましく、30質量%以下であることがより好ましく、20質量%以下であることが更に好ましい。 In the embodiment (i) or (ii), the artificial nail composition may contain a polymer other than the component a for the purpose of improving the film property and gloss.
The polymer other than component a is preferably an acrylic polymer or a urethane polymer from the viewpoint of film properties. Moreover, you may contain the well-known polymer known as a viscosity modifier (thickener etc.) for the purpose of improving applicability | paintability.
In the aspect of (i) or (ii), when the artificial nail composition contains a polymer other than the component a, the content of the polymer other than the component a is preferably less than the content of the component a. The content is more preferably 40% by mass or less, more preferably 30% by mass or less, and still more preferably 20% by mass or less with respect to the total mass of the composition.
成分a以外のポリマーとしては、被膜性の観点から、アクリル系ポリマー又はウレタン系ポリマーであることが好ましい。また、塗布性を向上させることを目的に、粘度調整剤(増粘剤等)として知られる公知のポリマーを含有していてもよい。
(i)又は(ii)の態様において、人工爪組成物が成分a以外のポリマーを含有する場合、成分a以外のポリマーの含有量は、成分aの含有量未満であることが好ましく、人工爪組成物の全質量に対し、40質量%以下であることがより好ましく、30質量%以下であることがより好ましく、20質量%以下であることが更に好ましい。 In the embodiment (i) or (ii), the artificial nail composition may contain a polymer other than the component a for the purpose of improving the film property and gloss.
The polymer other than component a is preferably an acrylic polymer or a urethane polymer from the viewpoint of film properties. Moreover, you may contain the well-known polymer known as a viscosity modifier (thickener etc.) for the purpose of improving applicability | paintability.
In the aspect of (i) or (ii), when the artificial nail composition contains a polymer other than the component a, the content of the polymer other than the component a is preferably less than the content of the component a. The content is more preferably 40% by mass or less, more preferably 30% by mass or less, and still more preferably 20% by mass or less with respect to the total mass of the composition.
<重合性化合物>
上記の(ii)の態様では、人工爪組成物は重合性化合物を含有することが好ましい。重合性化合物を含有することにより、人工爪組成物を光硬化性人工爪組成物として好適に用いることができる。また、重合性化合物を含有する場合、後述する光重合開始剤を更に含有することが好ましい。重合性化合物及び光重合開始剤を含有することにより、光硬化性人工爪組成物としてより好適に用いることができる。 <Polymerizable compound>
In the above aspect (ii), the artificial nail composition preferably contains a polymerizable compound. By containing a polymerizable compound, the artificial nail composition can be suitably used as a photocurable artificial nail composition. Moreover, when containing a polymeric compound, it is preferable to further contain the photoinitiator mentioned later. By containing a polymerizable compound and a photopolymerization initiator, it can be more suitably used as a photocurable artificial nail composition.
上記の(ii)の態様では、人工爪組成物は重合性化合物を含有することが好ましい。重合性化合物を含有することにより、人工爪組成物を光硬化性人工爪組成物として好適に用いることができる。また、重合性化合物を含有する場合、後述する光重合開始剤を更に含有することが好ましい。重合性化合物及び光重合開始剤を含有することにより、光硬化性人工爪組成物としてより好適に用いることができる。 <Polymerizable compound>
In the above aspect (ii), the artificial nail composition preferably contains a polymerizable compound. By containing a polymerizable compound, the artificial nail composition can be suitably used as a photocurable artificial nail composition. Moreover, when containing a polymeric compound, it is preferable to further contain the photoinitiator mentioned later. By containing a polymerizable compound and a photopolymerization initiator, it can be more suitably used as a photocurable artificial nail composition.
重合性化合物としては、ラジカル重合性化合物であっても、カチオン重合性化合物であってもよいが、ラジカル重合性化合物であることが好ましい。
ラジカル重合性化合物は、ラジカル重合可能なエチレン性不飽和結合を有する化合物であり、分子中にラジカル重合可能なエチレン性不飽和結合を少なくとも1つ有する化合物であればどのようなものでもよく、モノマー、オリゴマー等の化学形態を持つものが含まれる。ラジカル重合性化合物は1種のみ用いてもよく、また目的とする特性を向上するために任意の比率で2種以上を併用してもよい。また、重合性化合物は、成分a以外の化合物であり、分子量10,000未満の化合物であることが好ましく、分子量5,000未満の化合物であることがより好ましく、2,000未満であることが更に好ましい。 The polymerizable compound may be a radical polymerizable compound or a cationic polymerizable compound, but is preferably a radical polymerizable compound.
The radical polymerizable compound is a compound having an ethylenically unsaturated bond capable of radical polymerization, and may be any compound as long as it has at least one ethylenically unsaturated bond capable of radical polymerization in the molecule. And those having a chemical form such as an oligomer. Only one kind of radically polymerizable compound may be used, or two or more kinds thereof may be used in combination at an arbitrary ratio in order to improve desired properties. The polymerizable compound is a compound other than component a, preferably a compound having a molecular weight of less than 10,000, more preferably a compound having a molecular weight of less than 5,000, and less than 2,000. Further preferred.
ラジカル重合性化合物は、ラジカル重合可能なエチレン性不飽和結合を有する化合物であり、分子中にラジカル重合可能なエチレン性不飽和結合を少なくとも1つ有する化合物であればどのようなものでもよく、モノマー、オリゴマー等の化学形態を持つものが含まれる。ラジカル重合性化合物は1種のみ用いてもよく、また目的とする特性を向上するために任意の比率で2種以上を併用してもよい。また、重合性化合物は、成分a以外の化合物であり、分子量10,000未満の化合物であることが好ましく、分子量5,000未満の化合物であることがより好ましく、2,000未満であることが更に好ましい。 The polymerizable compound may be a radical polymerizable compound or a cationic polymerizable compound, but is preferably a radical polymerizable compound.
The radical polymerizable compound is a compound having an ethylenically unsaturated bond capable of radical polymerization, and may be any compound as long as it has at least one ethylenically unsaturated bond capable of radical polymerization in the molecule. And those having a chemical form such as an oligomer. Only one kind of radically polymerizable compound may be used, or two or more kinds thereof may be used in combination at an arbitrary ratio in order to improve desired properties. The polymerizable compound is a compound other than component a, preferably a compound having a molecular weight of less than 10,000, more preferably a compound having a molecular weight of less than 5,000, and less than 2,000. Further preferred.
ラジカル重合可能なエチレン性不飽和結合を有する重合性化合物の例としては、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸等の不飽和カルボン酸及びそれらの塩、エチレン性不飽和基を有する無水物、アクリロニトリル、スチレン、更に種々の不飽和ポリエステル、不飽和ポリエーテル、不飽和ポリアミド、不飽和ウレタン等のオリゴマーなどのラジカル重合性化合物が挙げられる。
具体的には、2-エチルヘキシル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、カルビトール(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、アリル(メタ)アクリレート、グリシジル(メタ)アクリレート、N-メチロール(メタ)アクリルアミド、ジアセトン(メタ)アクリルアミド、エポキシ(メタ)アクリレート等の(メタ)アクリル酸誘導体、その他、アリルグリシジルエーテル、ジアリルフタレート、トリアリルトリメリテート等のアリル化合物の誘導体が挙げられ、更に具体的には、山下晋三編、「架橋剤ハンドブック」、(1981年大成社);加藤清視編、「UV・EB硬化ハンドブック(原料編)」(1985年、高分子刊行会);ラドテック研究会編、「UV・EB硬化技術の応用と市場」、79頁、(1989年、シーエムシー);滝山栄一郎著、「ポリエステル樹脂ハンドブック」、(1988年、日刊工業新聞社)等に記載の市販品若しくは業界で公知のラジカル重合性乃至架橋性のモノマー、及び、オリゴマーを用いることができる。
また、重合性化合物としては、上記成分aの合成に用いられるモノマーも好適に用いることができる。 Examples of the polymerizable compound having an ethylenically unsaturated bond capable of radical polymerization include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, and salts thereof, Examples thereof include radical polymerizable compounds such as anhydrides having a saturated group, acrylonitrile, styrene, and various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, unsaturated urethane oligomers, and the like.
Specifically, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, butoxyethyl (meth) acrylate, carbitol (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, methyl ( (Meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, allyl (meth) acrylate, glycidyl (meth) acrylate, N-methylol (meth) Allylation of (meth) acrylic acid derivatives such as acrylamide, diacetone (meth) acrylamide, and epoxy (meth) acrylate, as well as allyl glycidyl ether, diallyl phthalate, triallyl trimellitate, etc. More specifically, Shinzo Yamashita, “Crosslinker Handbook”, (1981 Taiseisha); Kato Kiyomi, “UV / EB Curing Handbook (Raw Materials)” (1985, Polymer Publications); Radtech Study Group, “Application and Market of UV / EB Curing Technology”, 79 pages (1989, CMC); Eiichiro Takiyama, “Polyester Resin Handbook”, (1988, Nikkan Kogyo) Commercially available products as described in Newspaper Co.), or radically polymerizable or crosslinkable monomers and oligomers known in the industry can be used.
Moreover, as a polymerizable compound, the monomer used for the synthesis | combination of the said component a can also be used suitably.
具体的には、2-エチルヘキシル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、カルビトール(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、アリル(メタ)アクリレート、グリシジル(メタ)アクリレート、N-メチロール(メタ)アクリルアミド、ジアセトン(メタ)アクリルアミド、エポキシ(メタ)アクリレート等の(メタ)アクリル酸誘導体、その他、アリルグリシジルエーテル、ジアリルフタレート、トリアリルトリメリテート等のアリル化合物の誘導体が挙げられ、更に具体的には、山下晋三編、「架橋剤ハンドブック」、(1981年大成社);加藤清視編、「UV・EB硬化ハンドブック(原料編)」(1985年、高分子刊行会);ラドテック研究会編、「UV・EB硬化技術の応用と市場」、79頁、(1989年、シーエムシー);滝山栄一郎著、「ポリエステル樹脂ハンドブック」、(1988年、日刊工業新聞社)等に記載の市販品若しくは業界で公知のラジカル重合性乃至架橋性のモノマー、及び、オリゴマーを用いることができる。
また、重合性化合物としては、上記成分aの合成に用いられるモノマーも好適に用いることができる。 Examples of the polymerizable compound having an ethylenically unsaturated bond capable of radical polymerization include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, and salts thereof, Examples thereof include radical polymerizable compounds such as anhydrides having a saturated group, acrylonitrile, styrene, and various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, unsaturated urethane oligomers, and the like.
Specifically, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, butoxyethyl (meth) acrylate, carbitol (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, methyl ( (Meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, allyl (meth) acrylate, glycidyl (meth) acrylate, N-methylol (meth) Allylation of (meth) acrylic acid derivatives such as acrylamide, diacetone (meth) acrylamide, and epoxy (meth) acrylate, as well as allyl glycidyl ether, diallyl phthalate, triallyl trimellitate, etc. More specifically, Shinzo Yamashita, “Crosslinker Handbook”, (1981 Taiseisha); Kato Kiyomi, “UV / EB Curing Handbook (Raw Materials)” (1985, Polymer Publications); Radtech Study Group, “Application and Market of UV / EB Curing Technology”, 79 pages (1989, CMC); Eiichiro Takiyama, “Polyester Resin Handbook”, (1988, Nikkan Kogyo) Commercially available products as described in Newspaper Co.), or radically polymerizable or crosslinkable monomers and oligomers known in the industry can be used.
Moreover, as a polymerizable compound, the monomer used for the synthesis | combination of the said component a can also be used suitably.
重合性化合物としては、得られる人工爪の除去性、密着性及び光沢の観点から、ヒドロキシ基を有するエチレン性不飽和化合物、又は、(ポリ)アルキレンオキシ基を有するエチレン性不飽和化合物を含むことが好ましく、ヒドロキシ基を有する(メタ)アクリレート化合物、又は、(ポリ)アルキレンオキシ基を有する(メタ)アクリレート化合物を含むことがより好ましく、ヒドロキシ基を有する(メタ)アクリレート化合物を含むことが更に好ましく、ヒドロキシ基を有する単官能(メタ)アクリレート化合物を含むことが特に好ましい。
The polymerizable compound contains an ethylenically unsaturated compound having a hydroxy group or an ethylenically unsaturated compound having a (poly) alkyleneoxy group from the viewpoint of the removability, adhesion and gloss of the resulting artificial nail. It is more preferable to include a (meth) acrylate compound having a hydroxy group or a (meth) acrylate compound having a (poly) alkyleneoxy group, and more preferable to include a (meth) acrylate compound having a hydroxy group. It is particularly preferable to include a monofunctional (meth) acrylate compound having a hydroxy group.
ヒドロキシ基を有する(メタ)アクリレート化合物としては、例えば、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、2,3-ジヒドロキシプロピル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート等のヒドロキシアルキル(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、ポリ(エチレングリコール・プロピレングリコール)-モノ(メタ)アクリレート、ポリエチレングリコール・ポリプロピレングリコール-モノ(メタ)アクリレート、ポリ(エチレングリコール・テトラメチレングリコール)-モノ(メタ)アクリレート、ポリ(プロピレングリコール・テトラメチレングリコール)-モノ(メタ)アクリレート、プロピレングリコール・ポリブチレングリコール-モノ(メタ)アクリレートを好ましく挙げることができる。
Examples of the (meth) acrylate compound having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2,3-dihydroxypropyl (meth). Acrylate, hydroxyalkyl (meth) acrylate such as 4-hydroxybutyl (meth) acrylate, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, poly (ethylene glycol / propylene glycol) -mono (meth) acrylate, Polyethylene glycol / polypropylene glycol / mono (meth) acrylate, poly (ethylene glycol / tetramethylene glycol) / mono (meth) acrylate, poly ( B propylene glycol tetramethylene glycol) - mono (meth) acrylate, propylene glycol polybutylene glycol - it may be mentioned preferably a mono (meth) acrylate.
(ポリ)アルキレンオキシ基を有する(メタ)アクリレート化合物としては、例えば、メトキシポリエチレングリコール-(メタ)アクリレート、オクトキシポリエチレングリコール-ポリプロピレングリコール-(メタ)アクリレート、ラウロキシポリエチレングリコール-(メタ)アクリレート、ステアロキシポリエチレングリコール-(メタ)アクリレート、フェノキシポリエチレングリコール-(メタ)アクリレート、フェノキシポリエチレングリコール-ポリプロピレングリコール-(メタ)アクリレート、ノニルフェノキシ-ポリエチレングリコール-(メタ)アクリレート、ノニルフェノキシ-ポリプロピレングリコール-(メタ)アクリレート、ノニルフェノキシ-ポリ(エチレングリコール-プロピレングリコール)-(メタ)アクリレートを好ましく挙げることができる。
Examples of the (meth) acrylate compound having a (poly) alkyleneoxy group include methoxypolyethylene glycol- (meth) acrylate, octoxypolyethyleneglycol-polypropyleneglycol- (meth) acrylate, lauroxypolyethyleneglycol- (meth) acrylate, Stearoxy polyethylene glycol- (meth) acrylate, phenoxy polyethylene glycol- (meth) acrylate, phenoxy polyethylene glycol-polypropylene glycol- (meth) acrylate, nonylphenoxy-polyethylene glycol- (meth) acrylate, nonylphenoxy-polypropylene glycol- (meth) ) Acrylate, Nonylphenoxy-Poly (ethylene glycol-propylene glycol)- Meth) acrylate can be a preferably exemplified.
上記ヒドロキシ基を有する(メタ)アクリレート化合物、及び、(ポリ)アルキレンオキシ基を有する(メタ)アクリレート化合物は、市販のものを用いることが可能である。代表例を示すと、ブレンマーE、ブレンマーPE-90、ブレンマーPE-200、ブレンマーPE-350、ブレンマーP、ブレンマーPP-1000、ブレンマーPP-500、ブレンマーPP-800、ブレンマー50PEP-300、ブレンマー70PEP-350B、ブレンマー55PET-800、ブレンマーPPTシリーズ、ブレンマー10PPB-500B、ブレンマーAE-90、ブレンマーAE-200、ブレンマーAE-400、ブレンマーAP-150、ブレンマーAP-400、ブレンマーAP-550、ブレンマーPME-100、ブレンマーPME-200、ブレンマーPME-400、ブレンマーPME-1000、ブレンマー50POEP-800B、ブレンマーPLE-200、ブレンマーPSE-400、ブレンマーPSE-1300、ブレンマーPAE-50、ブレンマーPAE-100、ブレンマー43PAPE-600B、ブレンマーAME-400、ブレンマーALEシリーズ、ブレンマーANP-300、ブレンマー75ANP-600、ブレンマーAAE-50、ブレンマーAAE-300(以上、日油(株)製)等を挙げることができる。
Commercially available products can be used as the (meth) acrylate compound having a hydroxy group and the (meth) acrylate compound having a (poly) alkyleneoxy group. Representative examples are Blemmer E, Blemmer PE-90, Blemmer PE-200, Blemmer PE-350, Blemmer P, Blemmer PP-1000, Blemmer PP-500, Blemmer PP-800, Blemmer 50 PEP-300, Blemmer 70 PEP- 350B, Blemmer 55PET-800, Blemmer PPT series, Blemmer 10PPB-500B, Blemmer AE-90, Blemmer AE-200, Blemmer AE-400, Blemmer AP-150, Blemmer AP-400, Blemmer AP-550, Blemmer PME-100 , Blemmer PME-200, Blemmer PME-400, Blemmer PME-1000, Blemmer 50POEP-800B, Blemmer PLE-200, Blemmer PSE-4 0, Blemmer PSE-1300, Blemmer PAE-50, Blemmer PAE-100, Blemmer 43PAPE-600B, Blemmer AME-400, Blemmer ALE series, Blemmer ANP-300, Blemmer 75ANP-600, Blemmer AAE-50, Blemmer AAE-300 (Above, manufactured by NOF Corporation).
ヒドロキシ基を有するエチレン性不飽和化合物を使用する場合、当該化合物におけるヒドロキシ基の数は、1~10個が好ましく、1~5個がより好ましく、1~3個が更に好ましく、1個が特に好ましい。
また、(ポリ)アルキレンオキシ基を有するエチレン性不飽和化合物を使用する場合、当該化合物におけるアルキレンオキシ基の繰り返し単位数としては、1~25が好ましく、1~15がより好ましく、1~10が更に好ましい。 When an ethylenically unsaturated compound having a hydroxy group is used, the number of hydroxy groups in the compound is preferably 1 to 10, more preferably 1 to 5, still more preferably 1 to 3, and particularly preferably 1. preferable.
When an ethylenically unsaturated compound having a (poly) alkyleneoxy group is used, the number of repeating units of the alkyleneoxy group in the compound is preferably 1 to 25, more preferably 1 to 15, and more preferably 1 to 10 Further preferred.
また、(ポリ)アルキレンオキシ基を有するエチレン性不飽和化合物を使用する場合、当該化合物におけるアルキレンオキシ基の繰り返し単位数としては、1~25が好ましく、1~15がより好ましく、1~10が更に好ましい。 When an ethylenically unsaturated compound having a hydroxy group is used, the number of hydroxy groups in the compound is preferably 1 to 10, more preferably 1 to 5, still more preferably 1 to 3, and particularly preferably 1. preferable.
When an ethylenically unsaturated compound having a (poly) alkyleneoxy group is used, the number of repeating units of the alkyleneoxy group in the compound is preferably 1 to 25, more preferably 1 to 15, and more preferably 1 to 10 Further preferred.
これらの中でも、重合性化合物は、ヒドロキシアルキル(メタ)アクリレート化合物を含むことが好ましく、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレートを含むことがより好ましく、2-ヒドロキシエチル(メタ)アクリレートを含むことが更に好ましい。
Among these, the polymerizable compound preferably includes a hydroxyalkyl (meth) acrylate compound, and includes 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 3-hydroxypropyl (meth) acrylate. More preferably, 2-hydroxyethyl (meth) acrylate is further included.
重合性化合物としては、得られる人工爪の耐水性の観点から、炭素数が3以上のアルキル基を有するエチレン性不飽和化合物を含むことが好ましく、炭素数が5以上のアルキル基を有するエチレン性不飽和化合物を含むことがより好ましく、炭素数が8以上のアルキル基を有するエチレン性不飽和化合物を含むことが更に好ましい。これらアルキル基は分岐、及び/又は、環構造を有していてもよい。
The polymerizable compound preferably includes an ethylenically unsaturated compound having an alkyl group having 3 or more carbon atoms from the viewpoint of water resistance of the obtained artificial nail, and is ethylenic having an alkyl group having 5 or more carbon atoms. It is more preferable to include an unsaturated compound, and it is further preferable to include an ethylenically unsaturated compound having an alkyl group having 8 or more carbon atoms. These alkyl groups may have a branched and / or ring structure.
上記アルキル基を有するエチレン性不飽和化合物としては、例えば、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ラウリルメタクリレート、イソデシル(メタ)アクリレート、トリデシル(メタ)アクリレート、ステアリル(メタ)アクリレート、又は、これらの異性体などを挙げることができるが、これらに限定されるものではない。
Examples of the ethylenically unsaturated compound having an alkyl group include propyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl methacrylate, Examples thereof include, but are not limited to, isodecyl (meth) acrylate, tridecyl (meth) acrylate, stearyl (meth) acrylate, and isomers thereof.
重合性化合物としては、重合性化合物以外の成分の溶解性の観点から、(メタ)アクリルアミド化合物を含むことが好ましい。上記(メタ)アクリルアミド化合物としては、例えば、N-ヒドロキシエチル(メタ)アクリルアミド、N-ブトキシメチル(メタ)アクリルアミド、N-t-ブチル(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-ドデシル(メタ)アクリルアミド、N-ヒドロキシメチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、N-フェニル(メタ)アクリルアミド、N-イソブトキシメチル(メタ)アクリルアミド、N-メトキシメチルアクリルアミドなどを挙げることができるが、これらに限定されるものではない。
The polymerizable compound preferably includes a (meth) acrylamide compound from the viewpoint of solubility of components other than the polymerizable compound. Examples of the (meth) acrylamide compound include N-hydroxyethyl (meth) acrylamide, N-butoxymethyl (meth) acrylamide, Nt-butyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N , N-diethyl (meth) acrylamide, N-dodecyl (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-isobutoxymethyl (meth) Examples thereof include, but are not limited to, acrylamide and N-methoxymethylacrylamide.
重合性化合物としては、得られる人工爪組成物の耐熱性の観点から、ホモポリマーのTg(ガラス転移温度)が50℃以上であるエチレン性不飽和化合物を含むことが好ましく、Tgが80℃以上であるエチレン性不飽和化合物を含むことがより好ましく、Tgが100℃以上であるエチレン性不飽和化合物を含むことが更に好ましい。
From the viewpoint of heat resistance of the resulting artificial nail composition, the polymerizable compound preferably includes an ethylenically unsaturated compound having a Tg (glass transition temperature) of a homopolymer of 50 ° C. or higher, and a Tg of 80 ° C. or higher. It is more preferable to include an ethylenically unsaturated compound, and it is further preferable to include an ethylenically unsaturated compound having a Tg of 100 ° C. or higher.
上記ホモポリマーのTgが50℃以上であるエチレン性不飽和化合物としては、例えば、メチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、ベンジルメタクリレート、イソボルニル(メタ)アクリレート、アダマンチル(メタ)アクリレートなどを挙げることができるが、これらに限定されるものではない。
Examples of the ethylenically unsaturated compound having a Tg of 50 ° C. or higher as the homopolymer include methyl (meth) acrylate, t-butyl (meth) acrylate, benzyl methacrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, and the like. However, it is not limited to these.
また、重合性化合物は、得られる人工爪の除去性及び被膜性の観点から、ウレタン結合を有する重合性化合物を含むことが好ましく、ウレタン結合を有する多官能重合性化合物を含むことがより好ましく、ウレタン結合を有する多官能(メタ)アクリレート化合物を含むことが更に好ましい。
重合性化合物は、分子量(重量平均分子量)が1,000以上である多官能重合性化合物を含むことが好ましく、分子量(重量平均分子量)が3,000以上である多官能重合性化合物を含むことがより好ましい。1,000以上の分子量を有する多官能重合性化合物を含むことで、架橋密度を制御し膜が脆化することを防ぎ、形成する人工爪の持続性が向上する。 In addition, the polymerizable compound preferably includes a polymerizable compound having a urethane bond, more preferably includes a polyfunctional polymerizable compound having a urethane bond, from the viewpoint of the removability and film property of the resulting artificial nail. More preferably, it contains a polyfunctional (meth) acrylate compound having a urethane bond.
The polymerizable compound preferably includes a polyfunctional polymerizable compound having a molecular weight (weight average molecular weight) of 1,000 or more, and includes a polyfunctional polymerizable compound having a molecular weight (weight average molecular weight) of 3,000 or more. Is more preferable. By including a polyfunctional polymerizable compound having a molecular weight of 1,000 or more, the crosslink density is controlled to prevent the film from becoming brittle, and the durability of the artificial nail to be formed is improved.
重合性化合物は、分子量(重量平均分子量)が1,000以上である多官能重合性化合物を含むことが好ましく、分子量(重量平均分子量)が3,000以上である多官能重合性化合物を含むことがより好ましい。1,000以上の分子量を有する多官能重合性化合物を含むことで、架橋密度を制御し膜が脆化することを防ぎ、形成する人工爪の持続性が向上する。 In addition, the polymerizable compound preferably includes a polymerizable compound having a urethane bond, more preferably includes a polyfunctional polymerizable compound having a urethane bond, from the viewpoint of the removability and film property of the resulting artificial nail. More preferably, it contains a polyfunctional (meth) acrylate compound having a urethane bond.
The polymerizable compound preferably includes a polyfunctional polymerizable compound having a molecular weight (weight average molecular weight) of 1,000 or more, and includes a polyfunctional polymerizable compound having a molecular weight (weight average molecular weight) of 3,000 or more. Is more preferable. By including a polyfunctional polymerizable compound having a molecular weight of 1,000 or more, the crosslink density is controlled to prevent the film from becoming brittle, and the durability of the artificial nail to be formed is improved.
ウレタン結合を有する多官能(メタ)アクリレート化合物としては、イソシアナト基と水酸基の付加反応を用いて製造されるウレタン系付加重合性化合物が好ましく挙げられ、そのような具体例としては、例えば、特公昭48-41708号公報に記載されている1分子に2個以上のイソシアネート基を有するイソシアネート化合物に、下記式Aで示される水酸基を含有するビニルモノマーを付加させた1分子中に2個以上の重合性ビニル基を含有するビニルウレタン化合物等が挙げられる。
CH2=C(R7)COOCH2CH(R8)OH (A)
(ただし、R7及びR8はそれぞれ独立に、水素原子又はメチル基を表す。)
中でも、上記イソシアネート化合物としては、ヘキサメチレンジイソシアネート、2,2,4-トリメチルヘキサメチレンジイソシアネート、2,4,4-トリメチルヘキサメチレンジイソシアネート、2,4-ジメチルジイソシアネートが好ましく挙げられ、2,2,4-トリメチルヘキサメチレンジイソシアネート、2,4,4-トリメチルヘキサメチレンジイソシアネート、2,4-ジメチルジイソシアネートがより好ましく挙げられ、2,4-ジメチルジイソシアネートが更に好ましく挙げられる。
また、イソシアネート化合物は、分子量を制御することを目的に、ポリエステル型ジイソシアネートや、ポリエーテル型ジイソシアネート、ポリカーボネート型ジイソシアネートを好適に用いることができる。これらジイソシアネート化合物は、上記に記載のジイソシアネート化合物やその他、イソホロンジイソシアネート、メチレンジフェニルジイソシアネートにポリエーテルジオール、ポリエステルジオール、ポリカーボネートジオールを反応させることが得ることができる。このとき人工爪の被膜性や耐水性の観点から、ポリエステル構造、ポリカーボネート構造を有するウレタン系付加重合性化合物(より好ましくはジオール化合物及び/又はジイソシアネート化合物)を好ましく使用することができる。 Preferred examples of the polyfunctional (meth) acrylate compound having a urethane bond include urethane-based addition polymerizable compounds produced by an addition reaction between an isocyanato group and a hydroxyl group. Specific examples thereof include, for example, Two or more polymerizations in one molecule in which a vinyl monomer containing a hydroxyl group represented by the following formula A is added to an isocyanate compound having two or more isocyanate groups in one molecule described in Japanese Patent No. 48-41708. And vinyl urethane compounds containing a functional vinyl group.
CH 2 = C (R 7) COOCH 2 CH (R 8) OH (A)
(However, R 7 and R 8 each independently represents a hydrogen atom or a methyl group.)
Among these, preferable examples of the isocyanate compound include hexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, and 2,4-dimethyl diisocyanate. -Trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate and 2,4-dimethyldiisocyanate are more preferred, and 2,4-dimethyldiisocyanate is more preferred.
As the isocyanate compound, a polyester diisocyanate, a polyether diisocyanate, or a polycarbonate diisocyanate can be suitably used for the purpose of controlling the molecular weight. These diisocyanate compounds can be obtained by allowing polyether diol, polyester diol, and polycarbonate diol to react with the diisocyanate compounds described above and others, isophorone diisocyanate, and methylene diphenyl diisocyanate. At this time, from the viewpoint of the coating properties and water resistance of the artificial nail, a urethane addition polymerizable compound (more preferably a diol compound and / or a diisocyanate compound) having a polyester structure or a polycarbonate structure can be preferably used.
CH2=C(R7)COOCH2CH(R8)OH (A)
(ただし、R7及びR8はそれぞれ独立に、水素原子又はメチル基を表す。)
中でも、上記イソシアネート化合物としては、ヘキサメチレンジイソシアネート、2,2,4-トリメチルヘキサメチレンジイソシアネート、2,4,4-トリメチルヘキサメチレンジイソシアネート、2,4-ジメチルジイソシアネートが好ましく挙げられ、2,2,4-トリメチルヘキサメチレンジイソシアネート、2,4,4-トリメチルヘキサメチレンジイソシアネート、2,4-ジメチルジイソシアネートがより好ましく挙げられ、2,4-ジメチルジイソシアネートが更に好ましく挙げられる。
また、イソシアネート化合物は、分子量を制御することを目的に、ポリエステル型ジイソシアネートや、ポリエーテル型ジイソシアネート、ポリカーボネート型ジイソシアネートを好適に用いることができる。これらジイソシアネート化合物は、上記に記載のジイソシアネート化合物やその他、イソホロンジイソシアネート、メチレンジフェニルジイソシアネートにポリエーテルジオール、ポリエステルジオール、ポリカーボネートジオールを反応させることが得ることができる。このとき人工爪の被膜性や耐水性の観点から、ポリエステル構造、ポリカーボネート構造を有するウレタン系付加重合性化合物(より好ましくはジオール化合物及び/又はジイソシアネート化合物)を好ましく使用することができる。 Preferred examples of the polyfunctional (meth) acrylate compound having a urethane bond include urethane-based addition polymerizable compounds produced by an addition reaction between an isocyanato group and a hydroxyl group. Specific examples thereof include, for example, Two or more polymerizations in one molecule in which a vinyl monomer containing a hydroxyl group represented by the following formula A is added to an isocyanate compound having two or more isocyanate groups in one molecule described in Japanese Patent No. 48-41708. And vinyl urethane compounds containing a functional vinyl group.
CH 2 = C (R 7) COOCH 2 CH (R 8) OH (A)
(However, R 7 and R 8 each independently represents a hydrogen atom or a methyl group.)
Among these, preferable examples of the isocyanate compound include hexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, and 2,4-dimethyl diisocyanate. -Trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate and 2,4-dimethyldiisocyanate are more preferred, and 2,4-dimethyldiisocyanate is more preferred.
As the isocyanate compound, a polyester diisocyanate, a polyether diisocyanate, or a polycarbonate diisocyanate can be suitably used for the purpose of controlling the molecular weight. These diisocyanate compounds can be obtained by allowing polyether diol, polyester diol, and polycarbonate diol to react with the diisocyanate compounds described above and others, isophorone diisocyanate, and methylene diphenyl diisocyanate. At this time, from the viewpoint of the coating properties and water resistance of the artificial nail, a urethane addition polymerizable compound (more preferably a diol compound and / or a diisocyanate compound) having a polyester structure or a polycarbonate structure can be preferably used.
重合性化合物は、1種単独で含有していても、2種以上を併用していてもよい。
人工爪組成物における重合性化合物の含有量は、特に制限はないが、人工爪組成物の全質量に対し、1~95質量%であることが好ましく、10~90質量%であることがより好ましく、20~80質量%であることが更に好ましく、30~70質量%であることが特に好ましい。上記範囲であると、得られる人工爪の密着性及び除去性により優れる。 A polymeric compound may be contained individually by 1 type, or may use 2 or more types together.
The content of the polymerizable compound in the artificial nail composition is not particularly limited, but is preferably 1 to 95% by mass and more preferably 10 to 90% by mass with respect to the total mass of the artificial nail composition. The content is more preferably 20 to 80% by mass, and particularly preferably 30 to 70% by mass. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range.
人工爪組成物における重合性化合物の含有量は、特に制限はないが、人工爪組成物の全質量に対し、1~95質量%であることが好ましく、10~90質量%であることがより好ましく、20~80質量%であることが更に好ましく、30~70質量%であることが特に好ましい。上記範囲であると、得られる人工爪の密着性及び除去性により優れる。 A polymeric compound may be contained individually by 1 type, or may use 2 or more types together.
The content of the polymerizable compound in the artificial nail composition is not particularly limited, but is preferably 1 to 95% by mass and more preferably 10 to 90% by mass with respect to the total mass of the artificial nail composition. The content is more preferably 20 to 80% by mass, and particularly preferably 30 to 70% by mass. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range.
<光重合開始剤>
人工爪組成物は、上記(ii)の態様の場合、光重合開始剤を含むことが好ましい。光重合開始剤を含有することにより、人工爪組成物は、光硬化性人工爪組成物として好適に用いることができる。
光重合開始剤としては、ラジカル光重合開始剤、及び、カチオン光重合開始剤が挙げられるが、ラジカル光重合開始剤を含有することがより好ましい。
光重合開始剤としては、公知の光重合開始剤を使用することができる。本発明に用いることができる光重合開始剤は、1種単独で使用してもよく、2種以上を併用してもよい。また、ラジカル光重合開始剤とカチオン光重合開始剤とを併用してもよい。
本発明に用いることのできる光重合開始剤は、光を吸収して重合開始種を生成する化合物である。光としては、γ線、β線、電子線、紫外線、可視光線、赤外線が例示され、紫外線及び可視光線が好ましく例示される。 <Photopolymerization initiator>
In the case of the above (ii), the artificial nail composition preferably contains a photopolymerization initiator. By containing a photopolymerization initiator, the artificial nail composition can be suitably used as a photocurable artificial nail composition.
Examples of the photopolymerization initiator include a radical photopolymerization initiator and a cationic photopolymerization initiator, but it is more preferable to contain a radical photopolymerization initiator.
A known photopolymerization initiator can be used as the photopolymerization initiator. The photoinitiator which can be used for this invention may be used individually by 1 type, and may use 2 or more types together. Moreover, you may use together a radical photoinitiator and a cationic photoinitiator.
The photopolymerization initiator that can be used in the present invention is a compound that absorbs light and generates a polymerization initiating species. Examples of light include γ rays, β rays, electron beams, ultraviolet rays, visible rays, and infrared rays, and preferably ultraviolet rays and visible rays.
人工爪組成物は、上記(ii)の態様の場合、光重合開始剤を含むことが好ましい。光重合開始剤を含有することにより、人工爪組成物は、光硬化性人工爪組成物として好適に用いることができる。
光重合開始剤としては、ラジカル光重合開始剤、及び、カチオン光重合開始剤が挙げられるが、ラジカル光重合開始剤を含有することがより好ましい。
光重合開始剤としては、公知の光重合開始剤を使用することができる。本発明に用いることができる光重合開始剤は、1種単独で使用してもよく、2種以上を併用してもよい。また、ラジカル光重合開始剤とカチオン光重合開始剤とを併用してもよい。
本発明に用いることのできる光重合開始剤は、光を吸収して重合開始種を生成する化合物である。光としては、γ線、β線、電子線、紫外線、可視光線、赤外線が例示され、紫外線及び可視光線が好ましく例示される。 <Photopolymerization initiator>
In the case of the above (ii), the artificial nail composition preferably contains a photopolymerization initiator. By containing a photopolymerization initiator, the artificial nail composition can be suitably used as a photocurable artificial nail composition.
Examples of the photopolymerization initiator include a radical photopolymerization initiator and a cationic photopolymerization initiator, but it is more preferable to contain a radical photopolymerization initiator.
A known photopolymerization initiator can be used as the photopolymerization initiator. The photoinitiator which can be used for this invention may be used individually by 1 type, and may use 2 or more types together. Moreover, you may use together a radical photoinitiator and a cationic photoinitiator.
The photopolymerization initiator that can be used in the present invention is a compound that absorbs light and generates a polymerization initiating species. Examples of light include γ rays, β rays, electron beams, ultraviolet rays, visible rays, and infrared rays, and preferably ultraviolet rays and visible rays.
本発明に用いることができる光重合開始剤として具体的には、以下のものを好ましく例示できる。ただし、これら例示に限定されるものではない。
アセトフェノン化合物(例えば、1-ヒドロキシシクロヘキシルフェニルケトン、アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、2,2-ジエトキシアセトフェノン、2-ヒドロキシ-2-メチルプロピオフェノン、4’-イソプロピル-2-ヒドロキシ-2-メチルプロピオフェノン、2-メチル-1-〔4-(メチルチオ)フェニル〕-2-モルホリノ-1-プロパン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテル等);
ベンゾフェノン化合物(例えば、ベンゾフェノン、4,4’-ビス(ジメチルアミノ)ベンゾフェノン、3,3-ジメチル-4-メトキシ-ベンゾフェノン等);
アントラキノン化合物(例えば、アントラキノン、2-メチルアントラキノン、2-エチルアントラキノン、tert-ブチルアントラキノン等);
チオキサントン化合物(例えば、2-クロロチオキサントン、ジエチルチオキサントン、イソプロピルチオキサントン、ジイソプロピルチオキサントン等);
トリハロアルキル化合物(例えば、2,4,6-(トリクロロメチル)トリアジン、2,4-トリクロロメチル-6-(4-メトキシフェニル)トリアジン、トリブロモメチルフェニルスルホン等);
ロフィンダイマー化合物(例えば、2-(o-クロロフェニル)-4,5-ジフェニルイミダゾリル二量体);
アクリジン化合物(例えば、9-フェニルアクリジン、1,7-ビス(9-アクリジニル)ヘプタン、1,5-ビス(9-アクリジニル)ペンタン、1,3-ビス(9-アクリジニル)プロノパン);
ホスフィンオキシド化合物(例えば、トリメチルベンゾイルジフェニルホスフィンオキシド、ビス(2,4,6-トリメチルベンゾイル)フェニルホスフィンオキサイド等);
メタロセン化合物(例えば、ビスシクロペンタジエニル-ビス(ジフルオロ-ピリル-フェニル)チタニウム等);
オニウム塩(例えば、ビス(4-t-ブチルフェニル)ヨードニウムトシレート、トリフェニルスルホニウムトシレート等);
オキシムエステル化合物(例えば、1-(4-フェニルチオフェニル)-1,2-オクタンジオン-2-(O-ベンゾイルオキシム)、1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-エタノン-1-(O-アセチルオキシム)等)。 Specific examples of the photopolymerization initiator that can be used in the present invention are as follows. However, it is not limited to these examples.
Acetophenone compounds (for example, 1-hydroxycyclohexyl phenyl ketone, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 2-hydroxy-2-methylpropiophenone, 4′-isopropyl-2 -Hydroxy-2-methylpropiophenone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-1-propane, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -Butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, etc.);
Benzophenone compounds (eg, benzophenone, 4,4′-bis (dimethylamino) benzophenone, 3,3-dimethyl-4-methoxy-benzophenone, etc.);
Anthraquinone compounds (for example, anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, tert-butylanthraquinone, etc.);
A thioxanthone compound (for example, 2-chlorothioxanthone, diethylthioxanthone, isopropylthioxanthone, diisopropylthioxanthone, etc.);
Trihaloalkyl compounds (eg, 2,4,6- (trichloromethyl) triazine, 2,4-trichloromethyl-6- (4-methoxyphenyl) triazine, tribromomethylphenylsulfone, etc.);
Lophine dimer compounds (eg, 2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer);
Acridine compounds (eg, 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinyl) pentane, 1,3-bis (9-acridinyl) pronopane);
Phosphine oxide compounds (for example, trimethylbenzoyldiphenylphosphine oxide, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide);
Metallocene compounds (eg, biscyclopentadienyl-bis (difluoro-pyryl-phenyl) titanium, etc.);
Onium salts (eg, bis (4-tert-butylphenyl) iodonium tosylate, triphenylsulfonium tosylate, etc.);
Oxime ester compounds (for example, 1- (4-phenylthiophenyl) -1,2-octanedione-2- (O-benzoyloxime), 1- [9-ethyl-6- (2-methylbenzoyl) -9H- Carbazol-3-yl] -ethanone-1- (O-acetyloxime) and the like.
アセトフェノン化合物(例えば、1-ヒドロキシシクロヘキシルフェニルケトン、アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、2,2-ジエトキシアセトフェノン、2-ヒドロキシ-2-メチルプロピオフェノン、4’-イソプロピル-2-ヒドロキシ-2-メチルプロピオフェノン、2-メチル-1-〔4-(メチルチオ)フェニル〕-2-モルホリノ-1-プロパン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテル等);
ベンゾフェノン化合物(例えば、ベンゾフェノン、4,4’-ビス(ジメチルアミノ)ベンゾフェノン、3,3-ジメチル-4-メトキシ-ベンゾフェノン等);
アントラキノン化合物(例えば、アントラキノン、2-メチルアントラキノン、2-エチルアントラキノン、tert-ブチルアントラキノン等);
チオキサントン化合物(例えば、2-クロロチオキサントン、ジエチルチオキサントン、イソプロピルチオキサントン、ジイソプロピルチオキサントン等);
トリハロアルキル化合物(例えば、2,4,6-(トリクロロメチル)トリアジン、2,4-トリクロロメチル-6-(4-メトキシフェニル)トリアジン、トリブロモメチルフェニルスルホン等);
ロフィンダイマー化合物(例えば、2-(o-クロロフェニル)-4,5-ジフェニルイミダゾリル二量体);
アクリジン化合物(例えば、9-フェニルアクリジン、1,7-ビス(9-アクリジニル)ヘプタン、1,5-ビス(9-アクリジニル)ペンタン、1,3-ビス(9-アクリジニル)プロノパン);
ホスフィンオキシド化合物(例えば、トリメチルベンゾイルジフェニルホスフィンオキシド、ビス(2,4,6-トリメチルベンゾイル)フェニルホスフィンオキサイド等);
メタロセン化合物(例えば、ビスシクロペンタジエニル-ビス(ジフルオロ-ピリル-フェニル)チタニウム等);
オニウム塩(例えば、ビス(4-t-ブチルフェニル)ヨードニウムトシレート、トリフェニルスルホニウムトシレート等);
オキシムエステル化合物(例えば、1-(4-フェニルチオフェニル)-1,2-オクタンジオン-2-(O-ベンゾイルオキシム)、1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-エタノン-1-(O-アセチルオキシム)等)。 Specific examples of the photopolymerization initiator that can be used in the present invention are as follows. However, it is not limited to these examples.
Acetophenone compounds (for example, 1-hydroxycyclohexyl phenyl ketone, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 2-hydroxy-2-methylpropiophenone, 4′-isopropyl-2 -Hydroxy-2-methylpropiophenone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-1-propane, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -Butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, etc.);
Benzophenone compounds (eg, benzophenone, 4,4′-bis (dimethylamino) benzophenone, 3,3-dimethyl-4-methoxy-benzophenone, etc.);
Anthraquinone compounds (for example, anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, tert-butylanthraquinone, etc.);
A thioxanthone compound (for example, 2-chlorothioxanthone, diethylthioxanthone, isopropylthioxanthone, diisopropylthioxanthone, etc.);
Trihaloalkyl compounds (eg, 2,4,6- (trichloromethyl) triazine, 2,4-trichloromethyl-6- (4-methoxyphenyl) triazine, tribromomethylphenylsulfone, etc.);
Lophine dimer compounds (eg, 2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer);
Acridine compounds (eg, 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinyl) pentane, 1,3-bis (9-acridinyl) pronopane);
Phosphine oxide compounds (for example, trimethylbenzoyldiphenylphosphine oxide, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide);
Metallocene compounds (eg, biscyclopentadienyl-bis (difluoro-pyryl-phenyl) titanium, etc.);
Onium salts (eg, bis (4-tert-butylphenyl) iodonium tosylate, triphenylsulfonium tosylate, etc.);
Oxime ester compounds (for example, 1- (4-phenylthiophenyl) -1,2-octanedione-2- (O-benzoyloxime), 1- [9-ethyl-6- (2-methylbenzoyl) -9H- Carbazol-3-yl] -ethanone-1- (O-acetyloxime) and the like.
中でも、光重合開始剤としてはアセトフェノン化合物、ホスフィンオキシド化合物、メタロセン化合物、及び、ロフィンダイマー化合物よりなる群から選ばれた光重合開始剤であることが好ましく、アセトフェノン化合物、及び、ホスフィンオキシド化合物よりなる群から選ばれた光重合開始剤であることが特に好ましい。
人工爪組成物中における光重合開始剤の含有量としては、人工爪組成物の総質量に対して、0.1~20質量%であることが好ましく、0.5~15質量%であることがより好ましく、1~10質量%であることが更に好ましい。上記範囲であると、得られる人工爪の密着性、及び、除去性により優れる。 Among them, the photopolymerization initiator is preferably a photopolymerization initiator selected from the group consisting of an acetophenone compound, a phosphine oxide compound, a metallocene compound, and a lophine dimer compound, and consists of an acetophenone compound and a phosphine oxide compound. Particularly preferred is a photopolymerization initiator selected from the group.
The content of the photopolymerization initiator in the artificial nail composition is preferably 0.1 to 20% by mass, and preferably 0.5 to 15% by mass with respect to the total mass of the artificial nail composition. Is more preferably 1 to 10% by mass. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range.
人工爪組成物中における光重合開始剤の含有量としては、人工爪組成物の総質量に対して、0.1~20質量%であることが好ましく、0.5~15質量%であることがより好ましく、1~10質量%であることが更に好ましい。上記範囲であると、得られる人工爪の密着性、及び、除去性により優れる。 Among them, the photopolymerization initiator is preferably a photopolymerization initiator selected from the group consisting of an acetophenone compound, a phosphine oxide compound, a metallocene compound, and a lophine dimer compound, and consists of an acetophenone compound and a phosphine oxide compound. Particularly preferred is a photopolymerization initiator selected from the group.
The content of the photopolymerization initiator in the artificial nail composition is preferably 0.1 to 20% by mass, and preferably 0.5 to 15% by mass with respect to the total mass of the artificial nail composition. Is more preferably 1 to 10% by mass. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range.
<溶剤>
人工爪組成物は、上記(ii)の態様の場合、塗布性の観点から、溶剤を含有してもよいが、安全性や取り扱い性の観点からは、溶剤の含有量は、人工爪組成物の全質量に対し、10質量%未満であることが好ましく、5質量%未満であることがより好ましく、人工爪組成物が溶剤を含有しないことが特に好ましい。
溶剤としては、公知の溶剤であれば、いずれも好適に使用することができる。例えば、エタノール、イソプロパノール、エチレングリコールモノメチルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテル等のアルコール系溶剤及びこれらのアセテート系溶剤、酢酸エチル、酢酸ブチル等のエステル系溶剤、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤、テトラヒドロフラン、メチル-t-ブチルエーテル等のエーテル系溶剤等が挙げられる。ただし、これら例示に限定されるものではない。 <Solvent>
In the case of the above-mentioned (ii), the artificial nail composition may contain a solvent from the viewpoint of applicability, but from the viewpoint of safety and handleability, the content of the solvent is the artificial nail composition. Is preferably less than 10% by mass, more preferably less than 5% by mass, and particularly preferably the artificial nail composition does not contain a solvent.
As the solvent, any known solvent can be suitably used. For example, alcohol solvents such as ethanol, isopropanol, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether and their acetate solvents, ethyl acetate, butyl acetate, etc. Examples thereof include ester solvents, ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, and ether solvents such as tetrahydrofuran and methyl t-butyl ether. However, it is not limited to these examples.
人工爪組成物は、上記(ii)の態様の場合、塗布性の観点から、溶剤を含有してもよいが、安全性や取り扱い性の観点からは、溶剤の含有量は、人工爪組成物の全質量に対し、10質量%未満であることが好ましく、5質量%未満であることがより好ましく、人工爪組成物が溶剤を含有しないことが特に好ましい。
溶剤としては、公知の溶剤であれば、いずれも好適に使用することができる。例えば、エタノール、イソプロパノール、エチレングリコールモノメチルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテル等のアルコール系溶剤及びこれらのアセテート系溶剤、酢酸エチル、酢酸ブチル等のエステル系溶剤、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤、テトラヒドロフラン、メチル-t-ブチルエーテル等のエーテル系溶剤等が挙げられる。ただし、これら例示に限定されるものではない。 <Solvent>
In the case of the above-mentioned (ii), the artificial nail composition may contain a solvent from the viewpoint of applicability, but from the viewpoint of safety and handleability, the content of the solvent is the artificial nail composition. Is preferably less than 10% by mass, more preferably less than 5% by mass, and particularly preferably the artificial nail composition does not contain a solvent.
As the solvent, any known solvent can be suitably used. For example, alcohol solvents such as ethanol, isopropanol, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether and their acetate solvents, ethyl acetate, butyl acetate, etc. Examples thereof include ester solvents, ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, and ether solvents such as tetrahydrofuran and methyl t-butyl ether. However, it is not limited to these examples.
乾燥速度の観点から、溶剤の沸点は、30~130℃であることが好ましく、35~100℃であることがより好ましく、40~90℃であることが更に好ましく、50~85℃であることが特に好ましい。上記範囲であると、乾燥性及び塗布性に優れる。
From the viewpoint of the drying rate, the boiling point of the solvent is preferably 30 to 130 ° C, more preferably 35 to 100 ° C, still more preferably 40 to 90 ° C, and more preferably 50 to 85 ° C. Is particularly preferred. It is excellent in drying property and applicability | paintability as it is the said range.
溶剤は、1種単独で含有していても、2種以上を併用していてもよい。
溶剤としては、アルコール系溶剤及び/又はケトン系溶剤を含むことが好ましく、アルコール系溶剤及びケトン系溶剤を含むことがより好ましい。
人工爪組成物は、上記(i)の態様の場合には、溶剤を含有することが好ましく、塗布性、得られる人工爪の除去性及び密着性の観点からは、溶剤の含有量は、人工爪組成物の全質量に対し、1~90質量%であることが好ましく、5~80質量%であることがより好ましく、10~80質量%であることが更に好ましく、15~50質量%であることが特に好ましい。 The solvent may be contained individually by 1 type, or may use 2 or more types together.
The solvent preferably includes an alcohol solvent and / or a ketone solvent, and more preferably includes an alcohol solvent and a ketone solvent.
In the case of the embodiment (i), the artificial nail composition preferably contains a solvent. From the viewpoints of applicability, removal of the obtained artificial nail and adhesion, the content of the solvent is artificial. It is preferably 1 to 90% by mass, more preferably 5 to 80% by mass, still more preferably 10 to 80% by mass, and more preferably 15 to 50% by mass with respect to the total mass of the nail composition. It is particularly preferred.
溶剤としては、アルコール系溶剤及び/又はケトン系溶剤を含むことが好ましく、アルコール系溶剤及びケトン系溶剤を含むことがより好ましい。
人工爪組成物は、上記(i)の態様の場合には、溶剤を含有することが好ましく、塗布性、得られる人工爪の除去性及び密着性の観点からは、溶剤の含有量は、人工爪組成物の全質量に対し、1~90質量%であることが好ましく、5~80質量%であることがより好ましく、10~80質量%であることが更に好ましく、15~50質量%であることが特に好ましい。 The solvent may be contained individually by 1 type, or may use 2 or more types together.
The solvent preferably includes an alcohol solvent and / or a ketone solvent, and more preferably includes an alcohol solvent and a ketone solvent.
In the case of the embodiment (i), the artificial nail composition preferably contains a solvent. From the viewpoints of applicability, removal of the obtained artificial nail and adhesion, the content of the solvent is artificial. It is preferably 1 to 90% by mass, more preferably 5 to 80% by mass, still more preferably 10 to 80% by mass, and more preferably 15 to 50% by mass with respect to the total mass of the nail composition. It is particularly preferred.
<その他の成分>
人工爪組成物は、上記成分以外のその他の成分として、一般に人工爪組成物中に配合されうる添加成分を、本発明効果を損なわない範囲内において任意に配合することができる。このような添加成分としては、例えば、消泡剤、緩衝剤、キレート化剤、分散剤、染料、充填剤、顔料、防腐剤、樹脂粉末(例えば、ポリ(メタ)アクリル酸等)、無機粉末(例えば、シリカゲル等)、増粘剤、湿潤剤等が挙げられる。ただし、これら例示に限定されるものではない。
なお、これらの任意成分は、予め人工爪組成物に配合してもよいが、美容施術の際に、人工爪組成物にその都度必要な成分を必要な量配合してもよい。 <Other ingredients>
In the artificial nail composition, as other components other than the above components, additive components that can be generally blended in the artificial nail composition can be arbitrarily blended within a range not impairing the effects of the present invention. Examples of such additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like. However, it is not limited to these examples.
In addition, although these arbitrary components may be previously blended in the artificial nail composition, a necessary amount of the necessary components may be blended in the artificial nail composition each time during the cosmetic treatment.
人工爪組成物は、上記成分以外のその他の成分として、一般に人工爪組成物中に配合されうる添加成分を、本発明効果を損なわない範囲内において任意に配合することができる。このような添加成分としては、例えば、消泡剤、緩衝剤、キレート化剤、分散剤、染料、充填剤、顔料、防腐剤、樹脂粉末(例えば、ポリ(メタ)アクリル酸等)、無機粉末(例えば、シリカゲル等)、増粘剤、湿潤剤等が挙げられる。ただし、これら例示に限定されるものではない。
なお、これらの任意成分は、予め人工爪組成物に配合してもよいが、美容施術の際に、人工爪組成物にその都度必要な成分を必要な量配合してもよい。 <Other ingredients>
In the artificial nail composition, as other components other than the above components, additive components that can be generally blended in the artificial nail composition can be arbitrarily blended within a range not impairing the effects of the present invention. Examples of such additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like. However, it is not limited to these examples.
In addition, although these arbitrary components may be previously blended in the artificial nail composition, a necessary amount of the necessary components may be blended in the artificial nail composition each time during the cosmetic treatment.
また、人工爪組成物における各成分の配合量は、特に限定されるものではないが、質量比で、成分a/重合性化合物/重合開始剤/溶剤/その他の成分=10~90/5~85/0.5~12/0~50/0~40の範囲であることが好ましい。上記範囲であると、塗布性により優れ、また、得られる人工爪の除去性及び光沢により優れる。
Further, the compounding amount of each component in the artificial nail composition is not particularly limited, but by mass ratio, component a / polymerizable compound / polymerization initiator / solvent / other components = 10 to 90/5 to A range of 85 / 0.5 to 12/0 to 50/0 to 40 is preferable. It is excellent in applicability | paintability as it is the said range, and excellent in the removability and glossiness of the artificial nail | claw obtained.
-(iii)の態様-
成分b:アミノ基を有するモノマー
本発明において、上記(iii)の態様の場合には、人工爪組成物は成分bとして、アミノ基を有するモノマーを含有する。アミノ基を有するモノマーとしては、エチレン性不飽和基と、アミノ基とを有する化合物であれば特に限定なく使用することができる。
エチレン性不飽和基とは、CH2=C(R)-で表される基が好ましい。ここで、Rは、水素原子又は低級アルキル基(炭素数C1~4)を表す。Rとしては水素原子又はメチル基が好ましい。
エチレン性不飽和基は、(メタ)アクリロイル基又は(メタ)アクリルアミド基であることが好ましい。 -Aspect of (iii)-
Component b: Monomer having an amino group In the present invention, in the case of the embodiment (iii), the artificial nail composition contains a monomer having an amino group as the component b. As the monomer having an amino group, any compound having an ethylenically unsaturated group and an amino group can be used without particular limitation.
The ethylenically unsaturated group is preferably a group represented by CH 2 ═C (R) —. Here, R represents a hydrogen atom or a lower alkyl group (C1-4). R is preferably a hydrogen atom or a methyl group.
The ethylenically unsaturated group is preferably a (meth) acryloyl group or a (meth) acrylamide group.
成分b:アミノ基を有するモノマー
本発明において、上記(iii)の態様の場合には、人工爪組成物は成分bとして、アミノ基を有するモノマーを含有する。アミノ基を有するモノマーとしては、エチレン性不飽和基と、アミノ基とを有する化合物であれば特に限定なく使用することができる。
エチレン性不飽和基とは、CH2=C(R)-で表される基が好ましい。ここで、Rは、水素原子又は低級アルキル基(炭素数C1~4)を表す。Rとしては水素原子又はメチル基が好ましい。
エチレン性不飽和基は、(メタ)アクリロイル基又は(メタ)アクリルアミド基であることが好ましい。 -Aspect of (iii)-
Component b: Monomer having an amino group In the present invention, in the case of the embodiment (iii), the artificial nail composition contains a monomer having an amino group as the component b. As the monomer having an amino group, any compound having an ethylenically unsaturated group and an amino group can be used without particular limitation.
The ethylenically unsaturated group is preferably a group represented by CH 2 ═C (R) —. Here, R represents a hydrogen atom or a lower alkyl group (C1-4). R is preferably a hydrogen atom or a methyl group.
The ethylenically unsaturated group is preferably a (meth) acryloyl group or a (meth) acrylamide group.
成分bが有するアミノ基は、第1級アミノ基、第2級アミノ基及び第3級アミノ基のいずれであってもよい。
第1級アミノ基は-NH2で示される基であり、第2級アミノ基は-NH-で示される基である。なお、分子末端にある-CONH2は、第1級アミノ基に含めるものとする。ただし、第1級アミノ基はメチレン炭素原子に隣接することが好ましい。第1級アミノ基、第2級アミノ基及び第3級アミノ基は、分子内に少なくとも1つあればよいが、2以上含まれていてもよい。
成分bは、その分子内のエチレン性不飽和基が付加重合性を有することが好ましく、ラジカル重合性を有することが好ましい。この化合物は、低分子であっても、オリゴマーであってもよい。
アミノ基を有するエチレン性不飽和化合物としては、特開2009-126833号公報に記載されている化合物が例示され、例えば、第3級アミノ基を有する化合物としては、2-ジメチルアミノエチル(メタ)アクリレート、2-ジメチルアミノメチル(メタ)アクリルアミド、3-ジメチルアミノプロピル(メタ)アクリレート、3-ジメチルアミノプロピル(メタ)アクリルアミド等が例示される。 The amino group which component b has may be any of a primary amino group, a secondary amino group and a tertiary amino group.
The primary amino group is a group represented by —NH 2 , and the secondary amino group is a group represented by —NH—. Note that —CONH 2 at the molecular end is included in the primary amino group. However, the primary amino group is preferably adjacent to the methylene carbon atom. At least one primary amino group, secondary amino group, and tertiary amino group may be included in the molecule, but two or more may be included.
In component b, the ethylenically unsaturated group in the molecule preferably has addition polymerizability, and preferably has radical polymerizability. This compound may be a low molecule or an oligomer.
Examples of the ethylenically unsaturated compound having an amino group include compounds described in JP-A-2009-126833, and examples of the compound having a tertiary amino group include 2-dimethylaminoethyl (meth) Examples include acrylate, 2-dimethylaminomethyl (meth) acrylamide, 3-dimethylaminopropyl (meth) acrylate, 3-dimethylaminopropyl (meth) acrylamide and the like.
第1級アミノ基は-NH2で示される基であり、第2級アミノ基は-NH-で示される基である。なお、分子末端にある-CONH2は、第1級アミノ基に含めるものとする。ただし、第1級アミノ基はメチレン炭素原子に隣接することが好ましい。第1級アミノ基、第2級アミノ基及び第3級アミノ基は、分子内に少なくとも1つあればよいが、2以上含まれていてもよい。
成分bは、その分子内のエチレン性不飽和基が付加重合性を有することが好ましく、ラジカル重合性を有することが好ましい。この化合物は、低分子であっても、オリゴマーであってもよい。
アミノ基を有するエチレン性不飽和化合物としては、特開2009-126833号公報に記載されている化合物が例示され、例えば、第3級アミノ基を有する化合物としては、2-ジメチルアミノエチル(メタ)アクリレート、2-ジメチルアミノメチル(メタ)アクリルアミド、3-ジメチルアミノプロピル(メタ)アクリレート、3-ジメチルアミノプロピル(メタ)アクリルアミド等が例示される。 The amino group which component b has may be any of a primary amino group, a secondary amino group and a tertiary amino group.
The primary amino group is a group represented by —NH 2 , and the secondary amino group is a group represented by —NH—. Note that —CONH 2 at the molecular end is included in the primary amino group. However, the primary amino group is preferably adjacent to the methylene carbon atom. At least one primary amino group, secondary amino group, and tertiary amino group may be included in the molecule, but two or more may be included.
In component b, the ethylenically unsaturated group in the molecule preferably has addition polymerizability, and preferably has radical polymerizability. This compound may be a low molecule or an oligomer.
Examples of the ethylenically unsaturated compound having an amino group include compounds described in JP-A-2009-126833, and examples of the compound having a tertiary amino group include 2-dimethylaminoethyl (meth) Examples include acrylate, 2-dimethylaminomethyl (meth) acrylamide, 3-dimethylaminopropyl (meth) acrylate, 3-dimethylaminopropyl (meth) acrylamide and the like.
成分bは、爪との密着性の観点から、第1級アミノ基及び/又は第2級アミノ基を有することが好ましく、第1級アミノ基及び/又は第2級アミノ基を有する成分bは、好ましくは、下記に示す、式Iで表される化合物及び/又は式IIで表される化合物である。
Component b preferably has a primary amino group and / or a secondary amino group from the viewpoint of adhesion to the nail, and component b having a primary amino group and / or a secondary amino group includes Preferably, it is a compound represented by the formula I and / or a compound represented by the formula II shown below.
まず、式Iで表される化合物について説明する。
R1は、水素原子又はアルキル基、シクロアルキル基、又は、アリール基を表す。R1が採りうるアルキル基としては、炭素数1~6が好ましく、メチル基、エチル基、イソプロピル基、t-ブチル基、n-ヘキシル基が例示される。R1が採りうるシクロアルキル基としては、炭素数3~6が好ましく、シクロペンチル基、シクロヘキシル基がより好ましい。
アリール基としては、炭素数6~12であることが好ましく、フェニル基がより好ましい。 First, the compound represented by Formula I will be described.
R 1 represents a hydrogen atom or an alkyl group, a cycloalkyl group, or an aryl group. The alkyl group that R 1 can adopt preferably has 1 to 6 carbon atoms, and examples thereof include a methyl group, an ethyl group, an isopropyl group, a t-butyl group, and an n-hexyl group. The cycloalkyl group that R 1 can take has preferably 3 to 6 carbon atoms, and more preferably a cyclopentyl group or a cyclohexyl group.
The aryl group preferably has 6 to 12 carbon atoms, and more preferably a phenyl group.
R1は、水素原子又はアルキル基、シクロアルキル基、又は、アリール基を表す。R1が採りうるアルキル基としては、炭素数1~6が好ましく、メチル基、エチル基、イソプロピル基、t-ブチル基、n-ヘキシル基が例示される。R1が採りうるシクロアルキル基としては、炭素数3~6が好ましく、シクロペンチル基、シクロヘキシル基がより好ましい。
アリール基としては、炭素数6~12であることが好ましく、フェニル基がより好ましい。 First, the compound represented by Formula I will be described.
R 1 represents a hydrogen atom or an alkyl group, a cycloalkyl group, or an aryl group. The alkyl group that R 1 can adopt preferably has 1 to 6 carbon atoms, and examples thereof include a methyl group, an ethyl group, an isopropyl group, a t-butyl group, and an n-hexyl group. The cycloalkyl group that R 1 can take has preferably 3 to 6 carbon atoms, and more preferably a cyclopentyl group or a cyclohexyl group.
The aryl group preferably has 6 to 12 carbon atoms, and more preferably a phenyl group.
なお、YとR1とが結合して環を形成する場合、その環はピペリジン環又はピロリジン環であることが好ましい。
When Y and R 1 are bonded to form a ring, the ring is preferably a piperidine ring or a pyrrolidine ring.
R1は、許容される場合には、置換基を有していてもよく、その種類は特に限定されないが、ラジカル重合に対して不活性な基であることが好ましく、水酸基であることがより好ましい。
R1は、水素原子又は炭素数1~6のアルキル基であることが好ましく、水素原子又は炭素数1~3のアルキル基であることがより好ましく、水素原子、メチル基、エチル基又はヒドロキシエチル基であることが特に好ましい。 R 1 may have a substituent, if allowed, and the type thereof is not particularly limited, but is preferably a group inert to radical polymerization, more preferably a hydroxyl group. preferable.
R 1 is preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and a hydrogen atom, a methyl group, an ethyl group or hydroxyethyl Particularly preferred is a group.
R1は、水素原子又は炭素数1~6のアルキル基であることが好ましく、水素原子又は炭素数1~3のアルキル基であることがより好ましく、水素原子、メチル基、エチル基又はヒドロキシエチル基であることが特に好ましい。 R 1 may have a substituent, if allowed, and the type thereof is not particularly limited, but is preferably a group inert to radical polymerization, more preferably a hydroxyl group. preferable.
R 1 is preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and a hydrogen atom, a methyl group, an ethyl group or hydroxyethyl Particularly preferred is a group.
R2は、水素原子又はメチル基を表す。
pは、繰り返し数であって、0~50の整数を表し、好ましくは0~30の整数であり、より好ましくは0~20の整数であり、更に好ましくは0~10の整数である。
Xは、アルキレン基、-COO-、-CONH-、-C6H4-よりなる群から選ばれた連結基である。アルキレン基としては、炭素数1~4であることが好ましく、メチレン基又はエチレン基がより好ましく、メチレン基が特に好ましい。Xは、アルキレン基、-COO-又は-CONH-であることが好ましく、-CONH-であることが特に好ましい。 R 2 represents a hydrogen atom or a methyl group.
p is a repeat number and represents an integer of 0 to 50, preferably an integer of 0 to 30, more preferably an integer of 0 to 20, and further preferably an integer of 0 to 10.
X is a linking group selected from the group consisting of an alkylene group, —COO—, —CONH—, and —C 6 H 4 —. The alkylene group preferably has 1 to 4 carbon atoms, more preferably a methylene group or ethylene group, and particularly preferably a methylene group. X is preferably an alkylene group, —COO— or —CONH—, and particularly preferably —CONH—.
pは、繰り返し数であって、0~50の整数を表し、好ましくは0~30の整数であり、より好ましくは0~20の整数であり、更に好ましくは0~10の整数である。
Xは、アルキレン基、-COO-、-CONH-、-C6H4-よりなる群から選ばれた連結基である。アルキレン基としては、炭素数1~4であることが好ましく、メチレン基又はエチレン基がより好ましく、メチレン基が特に好ましい。Xは、アルキレン基、-COO-又は-CONH-であることが好ましく、-CONH-であることが特に好ましい。 R 2 represents a hydrogen atom or a methyl group.
p is a repeat number and represents an integer of 0 to 50, preferably an integer of 0 to 30, more preferably an integer of 0 to 20, and further preferably an integer of 0 to 10.
X is a linking group selected from the group consisting of an alkylene group, —COO—, —CONH—, and —C 6 H 4 —. The alkylene group preferably has 1 to 4 carbon atoms, more preferably a methylene group or ethylene group, and particularly preferably a methylene group. X is preferably an alkylene group, —COO— or —CONH—, and particularly preferably —CONH—.
Yは、2価の連結基であって、pが2以上である場合には、複数のYは互いに同一でも異なっていてもよい。また、YとR1とが結合して環を形成していてもよい。Yは、好ましくは、アルキレン基、アルキレンオキシ基、アルキレンアミノ基、カルボニル基、及び、これらを組み合わせて得られる基を表す。
アルキレン基としては炭素数1~10が好ましく、より好ましくはエチレン基、プロピレン基である。アルキレンオキシ基としては、エチレンオキシ基が好ましい。これらの中でも、Yは、エチレン基又はプロピレン基、エチレンオキシ基、プロピレンオキシ基、又は、ブチレンアミド基であることが特に好ましい。
なお、上記のカルボニル基はエチレン性不飽和基の炭素と結合して、末端アミド基を形成することが好ましい。 Y is a divalent linking group, and when p is 2 or more, a plurality of Y may be the same or different from each other. Y and R 1 may be bonded to form a ring. Y preferably represents an alkylene group, an alkyleneoxy group, an alkyleneamino group, a carbonyl group, or a group obtained by combining these.
The alkylene group preferably has 1 to 10 carbon atoms, more preferably an ethylene group or a propylene group. As the alkyleneoxy group, an ethyleneoxy group is preferable. Among these, Y is particularly preferably an ethylene group or a propylene group, an ethyleneoxy group, a propyleneoxy group, or a butyleneamide group.
In addition, it is preferable that said carbonyl group couple | bonds with carbon of an ethylenically unsaturated group, and forms a terminal amide group.
アルキレン基としては炭素数1~10が好ましく、より好ましくはエチレン基、プロピレン基である。アルキレンオキシ基としては、エチレンオキシ基が好ましい。これらの中でも、Yは、エチレン基又はプロピレン基、エチレンオキシ基、プロピレンオキシ基、又は、ブチレンアミド基であることが特に好ましい。
なお、上記のカルボニル基はエチレン性不飽和基の炭素と結合して、末端アミド基を形成することが好ましい。 Y is a divalent linking group, and when p is 2 or more, a plurality of Y may be the same or different from each other. Y and R 1 may be bonded to form a ring. Y preferably represents an alkylene group, an alkyleneoxy group, an alkyleneamino group, a carbonyl group, or a group obtained by combining these.
The alkylene group preferably has 1 to 10 carbon atoms, more preferably an ethylene group or a propylene group. As the alkyleneoxy group, an ethyleneoxy group is preferable. Among these, Y is particularly preferably an ethylene group or a propylene group, an ethyleneoxy group, a propyleneoxy group, or a butyleneamide group.
In addition, it is preferable that said carbonyl group couple | bonds with carbon of an ethylenically unsaturated group, and forms a terminal amide group.
次に、式IIについて説明する。
R2、X、Y、及びpは、式Iにおける定義と同じであり、好ましい範囲も同じである。 Next, Formula II will be described.
R 2 , X, Y, and p are the same as defined in Formula I, and preferred ranges are also the same.
R2、X、Y、及びpは、式Iにおける定義と同じであり、好ましい範囲も同じである。 Next, Formula II will be described.
R 2 , X, Y, and p are the same as defined in Formula I, and preferred ranges are also the same.
式Iは、ラジカル重合性のエチレン性不飽和基を1つのみ有する単官能の化合物であり、式IIはラジカル重合性のエチレン性不飽和基を2つ有する二官能の化合物である。本発明において、式I又は式IIの化合物を単独で使用するか、又は、式Iで表される単官能化合物と、式IIで表される二官能化合物とを併用することが好ましい。単官能化合物の使用比率が高いと硬化膜の除去性に優れ、一方、二官能化合物の使用比率が高いと硬化性に優れるので、式I及び式IIで表される両化合物を適当な比率で配合して、硬化性、密着性、除去性を適宜調節することが好ましい。
なお、式I及び式IIで表される化合物のアミン価が高いほど、得られる硬化膜の密着性や除去性に優れる。 Formula I is a monofunctional compound having only one radical polymerizable ethylenically unsaturated group, and Formula II is a bifunctional compound having two radical polymerizable ethylenically unsaturated groups. In the present invention, it is preferable to use the compound of formula I or formula II alone or to use a monofunctional compound represented by formula I and a bifunctional compound represented by formula II in combination. When the use ratio of the monofunctional compound is high, the removal property of the cured film is excellent. On the other hand, when the use ratio of the bifunctional compound is high, the curability is excellent. Therefore, both compounds represented by the formulas I and II are mixed at an appropriate ratio. It is preferable to mix and adjust curability, adhesion, and removability as appropriate.
In addition, it is excellent in the adhesiveness and removability of the cured film obtained, so that the amine value of the compound represented by Formula I and Formula II is high.
なお、式I及び式IIで表される化合物のアミン価が高いほど、得られる硬化膜の密着性や除去性に優れる。 Formula I is a monofunctional compound having only one radical polymerizable ethylenically unsaturated group, and Formula II is a bifunctional compound having two radical polymerizable ethylenically unsaturated groups. In the present invention, it is preferable to use the compound of formula I or formula II alone or to use a monofunctional compound represented by formula I and a bifunctional compound represented by formula II in combination. When the use ratio of the monofunctional compound is high, the removal property of the cured film is excellent. On the other hand, when the use ratio of the bifunctional compound is high, the curability is excellent. Therefore, both compounds represented by the formulas I and II are mixed at an appropriate ratio. It is preferable to mix and adjust curability, adhesion, and removability as appropriate.
In addition, it is excellent in the adhesiveness and removability of the cured film obtained, so that the amine value of the compound represented by Formula I and Formula II is high.
また、(iii)の態様の場合、本発明に係る人工爪組成物の不揮発成分のアミン価は、0.4~8.5mmol/gであることが好ましく、1.3~8.5mmol/gであることがより好ましく、1.3~6.0mmol/gであることが更に好ましい。上記範囲であると、得られる人工爪の除去性及び耐水性により優れる。ここで、「不揮発成分」とは、揮発性の溶媒を含む場合には、それ以外の成分を意味する。
アミン価の測定方法としては、例えば、試料をビーカーに量りとり、酢酸を加え、撹拌して溶解させて、測定温度を25℃に調整後、滴定試薬として0.1N過塩素酸酢酸溶液を用いて、滴定装置で滴定することにより、求めることができる。
なお、アミン価は、滴定した際に消費される過塩素酸の量を、試料(不揮発成分)1g当たりのモル数で表したものである。 In the case of the embodiment (iii), the amine value of the non-volatile component of the artificial nail composition according to the present invention is preferably 0.4 to 8.5 mmol / g, and 1.3 to 8.5 mmol / g. More preferably, it is 1.3 to 6.0 mmol / g. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range. Here, the “nonvolatile component” means a component other than that when a volatile solvent is included.
As a method for measuring the amine value, for example, a sample is weighed into a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
The amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (nonvolatile component).
アミン価の測定方法としては、例えば、試料をビーカーに量りとり、酢酸を加え、撹拌して溶解させて、測定温度を25℃に調整後、滴定試薬として0.1N過塩素酸酢酸溶液を用いて、滴定装置で滴定することにより、求めることができる。
なお、アミン価は、滴定した際に消費される過塩素酸の量を、試料(不揮発成分)1g当たりのモル数で表したものである。 In the case of the embodiment (iii), the amine value of the non-volatile component of the artificial nail composition according to the present invention is preferably 0.4 to 8.5 mmol / g, and 1.3 to 8.5 mmol / g. More preferably, it is 1.3 to 6.0 mmol / g. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range. Here, the “nonvolatile component” means a component other than that when a volatile solvent is included.
As a method for measuring the amine value, for example, a sample is weighed into a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
The amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (nonvolatile component).
成分bは市販品として入手できるか、又は、当業者に公知の方法で合成できる。
Component b can be obtained as a commercial product, or can be synthesized by a method known to those skilled in the art.
以下に成分bの具体例を示すが、これらの具体例に限定されるものではない。
Specific examples of component b are shown below, but are not limited to these specific examples.
人工爪組成物中における成分bの配合量は、組成物の不揮発成分に対して、5~80質量%であることが好ましく、10~60質量%であることがより好ましい。
The blending amount of component b in the artificial nail composition is preferably 5 to 80% by mass and more preferably 10 to 60% by mass with respect to the non-volatile component of the composition.
<重合開始剤>
本発明において、上記(iii)の態様では、人工爪組成物は光重合開始剤を含有することが好ましい。光重合開始剤としては、上記(ii)の態様において記載した光重合開始剤が例示され、好ましい態様は同様である。 <Polymerization initiator>
In the present invention, in the embodiment (iii), the artificial nail composition preferably contains a photopolymerization initiator. As a photoinitiator, the photoinitiator described in the aspect of said (ii) is illustrated, and a preferable aspect is the same.
本発明において、上記(iii)の態様では、人工爪組成物は光重合開始剤を含有することが好ましい。光重合開始剤としては、上記(ii)の態様において記載した光重合開始剤が例示され、好ましい態様は同様である。 <Polymerization initiator>
In the present invention, in the embodiment (iii), the artificial nail composition preferably contains a photopolymerization initiator. As a photoinitiator, the photoinitiator described in the aspect of said (ii) is illustrated, and a preferable aspect is the same.
<ポリマー成分>
本発明において、人工爪組成物は、上記(iii)の態様の場合、被膜形成剤として、ポリマー成分を含有することが好ましい。
ポリマー成分の重量平均分子量は、2,000以上300,000以下であることが好ましく、3,000以上200,000以下がより好ましく、4,000以上100,000以下であることが更に好ましく、5,000以上50,000以下であることが特に好ましい。上記範囲であると、得られる硬化物の密着性、除去性、及び経時安定性に優れる。
ポリマー成分の構造については、特に制限はなく、任意の構造であればよい。例えば、鎖状構造、枝分かれ(分岐)構造、星型構造、架橋構造、網状構造などが挙げられる。
ここで、被膜形成剤とは、基剤上に成膜した場合に、単独で自己支持性のある被膜を形成する材料を意味し、好ましくは、重量平均分子量が5,000以上のポリマー成分である。 <Polymer component>
In the present invention, in the case of the above (iii), the artificial nail composition preferably contains a polymer component as a film forming agent.
The weight average molecular weight of the polymer component is preferably from 2,000 to 300,000, more preferably from 3,000 to 200,000, still more preferably from 4,000 to 100,000. It is especially preferable that it is 50,000 or more and 50,000 or less. It is excellent in the adhesiveness of the hardened | cured material obtained, and removability, and temporal stability as it is the said range.
There is no restriction | limiting in particular about the structure of a polymer component, What is necessary is just an arbitrary structure. Examples thereof include a chain structure, a branched (branched) structure, a star structure, a crosslinked structure, and a network structure.
Here, the film-forming agent means a material that forms a self-supporting film alone when it is formed on a base, preferably a polymer component having a weight average molecular weight of 5,000 or more. is there.
本発明において、人工爪組成物は、上記(iii)の態様の場合、被膜形成剤として、ポリマー成分を含有することが好ましい。
ポリマー成分の重量平均分子量は、2,000以上300,000以下であることが好ましく、3,000以上200,000以下がより好ましく、4,000以上100,000以下であることが更に好ましく、5,000以上50,000以下であることが特に好ましい。上記範囲であると、得られる硬化物の密着性、除去性、及び経時安定性に優れる。
ポリマー成分の構造については、特に制限はなく、任意の構造であればよい。例えば、鎖状構造、枝分かれ(分岐)構造、星型構造、架橋構造、網状構造などが挙げられる。
ここで、被膜形成剤とは、基剤上に成膜した場合に、単独で自己支持性のある被膜を形成する材料を意味し、好ましくは、重量平均分子量が5,000以上のポリマー成分である。 <Polymer component>
In the present invention, in the case of the above (iii), the artificial nail composition preferably contains a polymer component as a film forming agent.
The weight average molecular weight of the polymer component is preferably from 2,000 to 300,000, more preferably from 3,000 to 200,000, still more preferably from 4,000 to 100,000. It is especially preferable that it is 50,000 or more and 50,000 or less. It is excellent in the adhesiveness of the hardened | cured material obtained, and removability, and temporal stability as it is the said range.
There is no restriction | limiting in particular about the structure of a polymer component, What is necessary is just an arbitrary structure. Examples thereof include a chain structure, a branched (branched) structure, a star structure, a crosslinked structure, and a network structure.
Here, the film-forming agent means a material that forms a self-supporting film alone when it is formed on a base, preferably a polymer component having a weight average molecular weight of 5,000 or more. is there.
ポリマー成分の種類は、特に限定されず、アクリル系ポリマー、ウレタン系ポリマー、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー、エチレン系ポリマー、等の公知のポリマーが用いられる。
被膜形成性及び取り扱い性(粘性)の観点から、エーテル系ポリマー、エチレン系ポリマー(特にポリエチレンイミン系ポリマー)、ウレタン系ポリマー、アクリル系ポリマーが好ましく、ウレタン系ポリマー、アクリル系ポリマーが特に好ましく、ウレタン系ポリマーが最も好ましい。 The type of polymer component is not particularly limited, and is an acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea polymer. , Known polymers such as ethylene-based polymers are used.
From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are particularly preferred, and urethanes A polymer is most preferable.
被膜形成性及び取り扱い性(粘性)の観点から、エーテル系ポリマー、エチレン系ポリマー(特にポリエチレンイミン系ポリマー)、ウレタン系ポリマー、アクリル系ポリマーが好ましく、ウレタン系ポリマー、アクリル系ポリマーが特に好ましく、ウレタン系ポリマーが最も好ましい。 The type of polymer component is not particularly limited, and is an acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea polymer. , Known polymers such as ethylene-based polymers are used.
From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are particularly preferred, and urethanes A polymer is most preferable.
アクリル系ポリマーとしては、公知のアクリル酸誘導体(例えば、アクリル酸メチル、アクリル酸エチル等のアクリル酸エステル、アクリルアミド、アクリロイルモルホリン等のアクリル酸アミド)、メタクリル酸誘導体(例えば、メタクリル酸メチル、メタクリル酸エチル等のメタクリル酸エステル、メタクリルアミド、メタクリル酸イソプロピルアミド等のメタクリル酸アミド)を重合して得られるポリマーであればいずれも好適に使用することができる。本発明では特に、側鎖に付加重合性の硬化性基(例えば(メタ)アクリル基等)を含むアクリル系ポリマーが好ましく用いられる。ただしこれら例示に限定されるものではない。
Examples of the acrylic polymer include known acrylic acid derivatives (for example, acrylic esters such as methyl acrylate and ethyl acrylate, acrylic amides such as acrylamide and acryloylmorpholine), and methacrylic acid derivatives (for example, methyl methacrylate, methacrylic acid). Any polymer can be suitably used as long as it is a polymer obtained by polymerizing a methacrylic acid ester such as ethyl or a methacrylic acid amide such as methacrylamide or isopropylamide. In the present invention, in particular, an acrylic polymer containing an addition polymerizable curable group (for example, (meth) acryl group or the like) in the side chain is preferably used. However, it is not limited to these examples.
ウレタン系ポリマーとしては、公知のポリイソシアネート化合物(例えば、トリレンジイソシアネート、イソホロンジイソシアネート等)と公知のポリオール化合物(例えば、ブタンジオール、ヘキサンジオール等のアルキレンジオール、p-ヒドロキシスチレン等のアリーレンジオール、ポリエチレングリコール、ポリプロピレングリコール等のポリエーテルジオール、ポリエチレングリコールテレフタレート等のポリエステルジオール、ポリエチレングリコールカーボネート等のポリカーボネートジオール等)からなるポリウレタンであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
Examples of the urethane polymer include known polyisocyanate compounds (for example, tolylene diisocyanate, isophorone diisocyanate) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylenediols such as p-hydroxystyrene, polyethylene) Any polyurethane can be used as long as it is made of a polyether diol such as glycol or polypropylene glycol, a polyester diol such as polyethylene glycol terephthalate, or a polycarbonate diol such as polyethylene glycol carbonate. However, it is not limited to these examples.
セルロース系ポリマーとしては、カルボキシメチルセルロース、ニトロセルロース、トリアセチルセルロース等の公知のセルロースであれば好適に使用することができる。ただし、これら例示に限定されるものではない。
As the cellulose polymer, any known cellulose such as carboxymethylcellulose, nitrocellulose, triacetylcellulose, and the like can be preferably used. However, it is not limited to these examples.
エステル系ポリマーとしては、公知のポリカルボン酸化合物(例えば、こはく酸、アジピン酸、フタル酸等)と公知のポリオール化合物からなるポリエステルであればいずれも好適に使用することができる。また、ポリ乳酸等のヒドロキシカルボン酸化合物からなるポリエステルも好適に使用することができる。ただし、これら例示に限定されるものではない。
As the ester polymer, any polyester comprising a known polycarboxylic acid compound (for example, succinic acid, adipic acid, phthalic acid, etc.) and a known polyol compound can be suitably used. In addition, polyesters composed of hydroxycarboxylic acid compounds such as polylactic acid can also be suitably used. However, it is not limited to these examples.
アミド系ポリマーとしては、公知のポリカルボン酸化合物と公知のポリアミン化合物(例えば、エチレンジアミン、フェニレンジアミン等)からなるポリアミドであればいずれも好適に使用することができる。また、アミノ酸からなるタンパク質であるポリアミノ酸も好適に使用することができる。ただし、これら例示に限定されるものではない。
As the amide polymer, any polyamide can be suitably used as long as it is a polyamide comprising a known polycarboxylic acid compound and a known polyamine compound (for example, ethylenediamine, phenylenediamine, etc.). In addition, polyamino acids, which are proteins composed of amino acids, can also be preferably used. However, it is not limited to these examples.
ビニル系ポリマーとしては、公知のビニル化合物(例えば、ビニル酢酸、塩化ビニル、ブタジエン等)を重合して得られるビニル系ポリマーであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
As the vinyl polymer, any vinyl polymer obtained by polymerizing a known vinyl compound (for example, vinyl acetate, vinyl chloride, butadiene, etc.) can be suitably used. However, it is not limited to these examples.
エーテル系ポリマーとしては、公知のポリオール化合物からなるポリエーテル(例えば、ポリエチレングリコール、ポリプロピレングリコール等)であればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
As the ether polymer, any polyether (for example, polyethylene glycol, polypropylene glycol, etc.) made of a known polyol compound can be suitably used. However, it is not limited to these examples.
スチレン系ポリマーとしては、公知のスチレン化合物(例えば、スチレン、4-カルボキシスチレン、4-アセトキシスチレン等)からなるポリスチレンであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
As the styrene-based polymer, any polystyrene can be suitably used as long as it is made of a known styrene compound (for example, styrene, 4-carboxystyrene, 4-acetoxystyrene, etc.). However, it is not limited to these examples.
カーボネート系ポリマーとしては、公知の炭酸誘導体(例えば、ホスゲン、炭酸ジメチル、炭酸ジメチル等)と公知のポリオール化合物からなるポリカーボネートであればいずれも好適に使用することができる。ただしこれら例示に限定されるものではない。
As the carbonate-based polymer, any polycarbonate can be suitably used as long as it is a polycarbonate composed of a known carbonic acid derivative (for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.) and a known polyol compound. However, it is not limited to these examples.
ウレア系ポリマーとしては、公知のポリイソシアネート化合物と公知のポリアミン化合物からなるポリウレアであればいずれも好適に使用することができる。ただしこれら例示に限定されるものではない。
As the urea polymer, any polyurea composed of a known polyisocyanate compound and a known polyamine compound can be suitably used. However, it is not limited to these examples.
ポリマー成分の含有量は、人工爪組成物の不揮発成分の総質量に対して、0~80質量%であることが好ましく、20~60質量%であることがより好ましい。
The content of the polymer component is preferably 0 to 80% by mass and more preferably 20 to 60% by mass with respect to the total mass of the nonvolatile components of the artificial nail composition.
<アミノ基を有しない重合性化合物>
上記(iii)の態様の場合、成分bに加え、アミノ基を有しない重合性化合物を含んでもよい。アミノ基を有しない重合性化合物としては、上記(ii)に態様において重合性化合物として記載した重合性化合物のうち、アミノ基を有しない化合物が例示され、好ましい態様も同様である。 <Polymerizable compound having no amino group>
In the case of the above embodiment (iii), a polymerizable compound having no amino group may be contained in addition to the component b. Examples of the polymerizable compound having no amino group include compounds having no amino group among the polymerizable compounds described as the polymerizable compound in the embodiment in (ii), and the preferred embodiments are also the same.
上記(iii)の態様の場合、成分bに加え、アミノ基を有しない重合性化合物を含んでもよい。アミノ基を有しない重合性化合物としては、上記(ii)に態様において重合性化合物として記載した重合性化合物のうち、アミノ基を有しない化合物が例示され、好ましい態様も同様である。 <Polymerizable compound having no amino group>
In the case of the above embodiment (iii), a polymerizable compound having no amino group may be contained in addition to the component b. Examples of the polymerizable compound having no amino group include compounds having no amino group among the polymerizable compounds described as the polymerizable compound in the embodiment in (ii), and the preferred embodiments are also the same.
<その他の成分>
上記(iii)の態様の場合、上記の成分に加え、溶剤を含有してもよい。溶剤としては、上記の(ii)の態様において記載した溶剤が例示され、好ましい態様も同様である。
また、一般に人工爪組成物中に配合されうる添加成分を、本発明効果を損なわない範囲内において任意に配合することができる。このような添加成分としては、例えば、消泡剤、緩衝剤、キレート化剤、分散剤、染料、充填剤、顔料、防腐剤、樹脂粉末(例えば、ポリ(メタ)アクリル酸等)、無機粉末(例えば、シリカゲル等)、増粘剤、湿潤剤等が挙げられる。ただし、これら例示に限定されるものではない。
なお、これらの任意成分は、予め人工爪組成物に配合してもよいが、美容施術の際に、人工爪組成物にその都度必要な成分を必要な量配合してもよい。 <Other ingredients>
In the case of the embodiment (iii), a solvent may be contained in addition to the above components. Examples of the solvent include the solvents described in the above embodiment (ii), and preferred embodiments are also the same.
Moreover, generally the additive component which can be mix | blended in the artificial nail composition can be arbitrarily mix | blended within the range which does not impair the effect of this invention. Examples of such additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like. However, it is not limited to these examples.
In addition, although these arbitrary components may be previously blended in the artificial nail composition, a necessary amount of the necessary components may be blended in the artificial nail composition each time during the cosmetic treatment.
上記(iii)の態様の場合、上記の成分に加え、溶剤を含有してもよい。溶剤としては、上記の(ii)の態様において記載した溶剤が例示され、好ましい態様も同様である。
また、一般に人工爪組成物中に配合されうる添加成分を、本発明効果を損なわない範囲内において任意に配合することができる。このような添加成分としては、例えば、消泡剤、緩衝剤、キレート化剤、分散剤、染料、充填剤、顔料、防腐剤、樹脂粉末(例えば、ポリ(メタ)アクリル酸等)、無機粉末(例えば、シリカゲル等)、増粘剤、湿潤剤等が挙げられる。ただし、これら例示に限定されるものではない。
なお、これらの任意成分は、予め人工爪組成物に配合してもよいが、美容施術の際に、人工爪組成物にその都度必要な成分を必要な量配合してもよい。 <Other ingredients>
In the case of the embodiment (iii), a solvent may be contained in addition to the above components. Examples of the solvent include the solvents described in the above embodiment (ii), and preferred embodiments are also the same.
Moreover, generally the additive component which can be mix | blended in the artificial nail composition can be arbitrarily mix | blended within the range which does not impair the effect of this invention. Examples of such additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like. However, it is not limited to these examples.
In addition, although these arbitrary components may be previously blended in the artificial nail composition, a necessary amount of the necessary components may be blended in the artificial nail composition each time during the cosmetic treatment.
また、上記(iii)の態様の場合、人工爪組成物における各成分の配合量は、特に限定されるものではないが、人工爪組成物中の不揮発成分の質量比で、成分b/光重合開始剤/ポリマー成分/アミノ基を有しない重合性化合物=50~80/0.01~20/0~80/0~50の範囲であることが好ましい。ただし、成分b~アミノ基を有しない重合性化合物の合計を100質量部とする。上記範囲であると、塗布性により優れ、また、得られる人工爪の除去性及び光沢により優れる。
In the case of the above (iii), the amount of each component in the artificial nail composition is not particularly limited, but the mass ratio of the non-volatile components in the artificial nail composition is component b / photopolymerization. Initiator / polymer component / polymerizable compound having no amino group = preferably in the range of 50 to 80 / 0.01 to 20/0 to 80/0 to 50. However, the total of component b to polymerizable compound having no amino group is 100 parts by mass. It is excellent in applicability | paintability as it is the said range, and excellent in the removability and glossiness of the artificial nail | claw obtained.
-(iv)の態様-
本発明において、上記(iv)の態様の場合には、人工爪がアクリル系ポリマー、ウレタン系ポリマー(ウレタンポリマー、ポリウレタンともいう。)、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー及びエチレン系ポリマーよりなる群から選択された少なくとも1つのポリマーを含有する。
被膜形成性及び取り扱い性(粘性)の観点から、エーテル系ポリマー、エチレン系ポリマー(特にポリエチレンイミン系ポリマー)、ウレタン系ポリマー、アクリル系ポリマーが好ましく、ウレタン系ポリマー、アクリル系ポリマーが特に好ましく、密着性の観点からウレタン系ポリマーが最も好ましい。
アクリル系ポリマー、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー及びエチレン系ポリマーについては、上記(iii)の態様において、ポリマー成分として記載した各種ポリマーが例示され、好ましい範囲も同様である。
上記(iv)の態様の場合、人工爪組成物は、重合開始剤及び重合性化合物を更に含有し、露光により硬化する光硬化性人工爪組成物でもよく、また、溶剤を含有し、乾燥により人工爪を形成する所謂マニキュア液用人工爪組成物であってもよい。これらの中でも、光硬化性人工爪組成物であることが好ましい。 -Aspect of (iv)-
In the embodiment of the present invention (iv), the artificial nail is an acrylic polymer, urethane polymer (also referred to as urethane polymer or polyurethane), cellulose polymer, ester polymer, amide polymer, vinyl polymer. And at least one polymer selected from the group consisting of an ether polymer, a styrene polymer, a carbonate polymer, a urea polymer, and an ethylene polymer.
From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are particularly preferred, and adhesion From the viewpoint of properties, urethane polymers are most preferable.
For the acrylic polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea polymer and ethylene polymer, in the embodiment (iii) above, Various polymers described as the polymer component are exemplified, and preferred ranges are also the same.
In the case of the above (iv), the artificial nail composition may further contain a polymerization initiator and a polymerizable compound, and may be a photocurable artificial nail composition that is cured by exposure, and also contains a solvent and is dried. A so-called artificial nail composition for nail polish that forms an artificial nail may be used. Among these, a photocurable artificial nail composition is preferable.
本発明において、上記(iv)の態様の場合には、人工爪がアクリル系ポリマー、ウレタン系ポリマー(ウレタンポリマー、ポリウレタンともいう。)、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー及びエチレン系ポリマーよりなる群から選択された少なくとも1つのポリマーを含有する。
被膜形成性及び取り扱い性(粘性)の観点から、エーテル系ポリマー、エチレン系ポリマー(特にポリエチレンイミン系ポリマー)、ウレタン系ポリマー、アクリル系ポリマーが好ましく、ウレタン系ポリマー、アクリル系ポリマーが特に好ましく、密着性の観点からウレタン系ポリマーが最も好ましい。
アクリル系ポリマー、セルロース系ポリマー、エステル系ポリマー、アミド系ポリマー、ビニル系ポリマー、エーテル系ポリマー、スチレン系ポリマー、カーボネート系ポリマー、ウレア系ポリマー及びエチレン系ポリマーについては、上記(iii)の態様において、ポリマー成分として記載した各種ポリマーが例示され、好ましい範囲も同様である。
上記(iv)の態様の場合、人工爪組成物は、重合開始剤及び重合性化合物を更に含有し、露光により硬化する光硬化性人工爪組成物でもよく、また、溶剤を含有し、乾燥により人工爪を形成する所謂マニキュア液用人工爪組成物であってもよい。これらの中でも、光硬化性人工爪組成物であることが好ましい。 -Aspect of (iv)-
In the embodiment of the present invention (iv), the artificial nail is an acrylic polymer, urethane polymer (also referred to as urethane polymer or polyurethane), cellulose polymer, ester polymer, amide polymer, vinyl polymer. And at least one polymer selected from the group consisting of an ether polymer, a styrene polymer, a carbonate polymer, a urea polymer, and an ethylene polymer.
From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are particularly preferred, and adhesion From the viewpoint of properties, urethane polymers are most preferable.
For the acrylic polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea polymer and ethylene polymer, in the embodiment (iii) above, Various polymers described as the polymer component are exemplified, and preferred ranges are also the same.
In the case of the above (iv), the artificial nail composition may further contain a polymerization initiator and a polymerizable compound, and may be a photocurable artificial nail composition that is cured by exposure, and also contains a solvent and is dried. A so-called artificial nail composition for nail polish that forms an artificial nail may be used. Among these, a photocurable artificial nail composition is preferable.
<ウレタンポリマー>
本発明の除去液は、ウレタンポリマー(ポリウレタン)を含有する人工爪の除去に好適であり、ウレタンポリマーを含有する人工爪組成物により形成された人工爪の除去に好適に使用される。
ポリウレタンとしては、公知のポリイソシアネート化合物(例えば、トリレンジイソシアネート、イソホロンジイソシアネート等)と公知のポリオール化合物(例えば、ブタンジオール、ヘキサンジオール等のアルキレンジオール、p-ヒドロキシスチレン等のアリーレンジオール、ポリエチレングリコール、ポリプロピレングリコール等のポリエーテルジオール、ポリエチレングリコールテレフタレート等のポリエステルジオール、ポリエチレングリコールカーボネート等のポリカーボネートジオール等)からなるポリウレタンであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
ポリウレタンとして好適に使用される具体例を以下に示すが、本発明はこれらに限定されるものではない。各モノマー単位の括弧の右下の数字は、モル比を表す。 <Urethane polymer>
The removal liquid of the present invention is suitable for removing an artificial nail containing a urethane polymer (polyurethane), and is suitably used for removing an artificial nail formed with an artificial nail composition containing a urethane polymer.
Examples of the polyurethane include known polyisocyanate compounds (for example, tolylene diisocyanate, isophorone diisocyanate, etc.) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylenediols such as p-hydroxystyrene, polyethylene glycol, Any polyurethane can be used as long as it is made of a polyether diol such as polypropylene glycol, a polyester diol such as polyethylene glycol terephthalate, and a polycarbonate diol such as polyethylene glycol carbonate. However, it is not limited to these examples.
Although the specific example used suitably as a polyurethane is shown below, this invention is not limited to these. The number on the lower right of the parenthesis of each monomer unit represents the molar ratio.
本発明の除去液は、ウレタンポリマー(ポリウレタン)を含有する人工爪の除去に好適であり、ウレタンポリマーを含有する人工爪組成物により形成された人工爪の除去に好適に使用される。
ポリウレタンとしては、公知のポリイソシアネート化合物(例えば、トリレンジイソシアネート、イソホロンジイソシアネート等)と公知のポリオール化合物(例えば、ブタンジオール、ヘキサンジオール等のアルキレンジオール、p-ヒドロキシスチレン等のアリーレンジオール、ポリエチレングリコール、ポリプロピレングリコール等のポリエーテルジオール、ポリエチレングリコールテレフタレート等のポリエステルジオール、ポリエチレングリコールカーボネート等のポリカーボネートジオール等)からなるポリウレタンであればいずれも好適に使用することができる。ただし、これら例示に限定されるものではない。
ポリウレタンとして好適に使用される具体例を以下に示すが、本発明はこれらに限定されるものではない。各モノマー単位の括弧の右下の数字は、モル比を表す。 <Urethane polymer>
The removal liquid of the present invention is suitable for removing an artificial nail containing a urethane polymer (polyurethane), and is suitably used for removing an artificial nail formed with an artificial nail composition containing a urethane polymer.
Examples of the polyurethane include known polyisocyanate compounds (for example, tolylene diisocyanate, isophorone diisocyanate, etc.) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, arylenediols such as p-hydroxystyrene, polyethylene glycol, Any polyurethane can be used as long as it is made of a polyether diol such as polypropylene glycol, a polyester diol such as polyethylene glycol terephthalate, and a polycarbonate diol such as polyethylene glycol carbonate. However, it is not limited to these examples.
Although the specific example used suitably as a polyurethane is shown below, this invention is not limited to these. The number on the lower right of the parenthesis of each monomer unit represents the molar ratio.
(iv)の態様において、人工爪組成物が光硬化性人工爪組成物である場合、重合開始剤及び重合性化合物としては、上記(ii)の態様において記載した重合開始剤及び重合性化合物が好適に使用され、好ましい範囲も同様である。
In the aspect of (iv), when the artificial nail composition is a photocurable artificial nail composition, the polymerization initiator and the polymerizable compound described in the aspect of (ii) above may be used as the polymerization initiator and the polymerizable compound. It is preferably used and the preferred range is also the same.
本発明において、上記の(i)~(iv)の態様の中で、(ii)~(iv)の態様が好ましく、(ii)又は(iii)の態様であることがより好ましく、(ii)の態様であることが更に好ましい。
In the present invention, among the above embodiments (i) to (iv), the embodiments (ii) to (iv) are preferable, the embodiment (ii) or (iii) is more preferable, and (ii) More preferably,
(人工爪の形成方法)
本発明において、人工爪の形成方法は、人工爪組成物を用いて人工爪を形成する方法であれば、特に制限はないが、人工爪組成物をヒト若しくは動物の爪上、又は、他の人工爪上に塗布し塗布膜を形成する工程、並びに、上記塗布膜を乾燥及び/又は露光して人工爪を形成する工程、を含む方法であることが好ましい。
人工爪組成物を人工爪として形成するには、乾燥又は露光のいずれかの形成方法を好適に選択することができる。
また、人工爪組成物は、ポリマーと、重合性化合物と、光重合開始剤とを少なくとも含むか、又は、ポリマーと溶剤とを少なくとも含むことが好ましい。
また、人工爪組成物により形成された層の厚さ(人工爪の厚さ)は、特に制限はないが、10~2,000μmであることが好ましく、20~1,500μmであることがより好ましく、20~1,000μmが更に好ましい。 (Artificial nail formation method)
In the present invention, the method for forming an artificial nail is not particularly limited as long as it is a method for forming an artificial nail using an artificial nail composition, but the artificial nail composition may be applied to a human or animal nail or other It is preferable that the method includes a step of coating the artificial nail to form a coating film, and a step of drying and / or exposing the coating film to form an artificial nail.
In order to form the artificial nail composition as an artificial nail, either a dry or exposure forming method can be suitably selected.
The artificial nail composition preferably contains at least a polymer, a polymerizable compound, and a photopolymerization initiator, or contains at least a polymer and a solvent.
Further, the thickness of the layer formed by the artificial nail composition (the thickness of the artificial nail) is not particularly limited, but is preferably 10 to 2,000 μm, more preferably 20 to 1,500 μm. It is preferably 20 to 1,000 μm.
本発明において、人工爪の形成方法は、人工爪組成物を用いて人工爪を形成する方法であれば、特に制限はないが、人工爪組成物をヒト若しくは動物の爪上、又は、他の人工爪上に塗布し塗布膜を形成する工程、並びに、上記塗布膜を乾燥及び/又は露光して人工爪を形成する工程、を含む方法であることが好ましい。
人工爪組成物を人工爪として形成するには、乾燥又は露光のいずれかの形成方法を好適に選択することができる。
また、人工爪組成物は、ポリマーと、重合性化合物と、光重合開始剤とを少なくとも含むか、又は、ポリマーと溶剤とを少なくとも含むことが好ましい。
また、人工爪組成物により形成された層の厚さ(人工爪の厚さ)は、特に制限はないが、10~2,000μmであることが好ましく、20~1,500μmであることがより好ましく、20~1,000μmが更に好ましい。 (Artificial nail formation method)
In the present invention, the method for forming an artificial nail is not particularly limited as long as it is a method for forming an artificial nail using an artificial nail composition, but the artificial nail composition may be applied to a human or animal nail or other It is preferable that the method includes a step of coating the artificial nail to form a coating film, and a step of drying and / or exposing the coating film to form an artificial nail.
In order to form the artificial nail composition as an artificial nail, either a dry or exposure forming method can be suitably selected.
The artificial nail composition preferably contains at least a polymer, a polymerizable compound, and a photopolymerization initiator, or contains at least a polymer and a solvent.
Further, the thickness of the layer formed by the artificial nail composition (the thickness of the artificial nail) is not particularly limited, but is preferably 10 to 2,000 μm, more preferably 20 to 1,500 μm. It is preferably 20 to 1,000 μm.
<塗布工程>
人工爪の形成方法は、人工爪組成物をヒト若しくは動物の爪上、又は、他の人工爪上に塗布し塗布膜を形成する工程(塗布工程)を含むことが好ましい。
他の人工爪は、人工爪に用いられる基材であれば、特に制限はなく、例えば、樹脂基材が挙げられる。
塗布方法としては、特に制限はなく、公知の方法により行えばよいが、刷毛や筆等を使用して塗布する方法が好ましく挙げられる。また、スプレー塗布やインクジェット塗布を行ってもよい。
塗布膜の厚さについても、特に制限はなく、得られる人工爪における所望の厚さを考慮して、塗布厚を適宜調整すればよい。 <Application process>
The method for forming an artificial nail preferably includes a step (application step) of applying an artificial nail composition on a human or animal nail or other artificial nail to form a coating film.
The other artificial nail is not particularly limited as long as it is a base material used for the artificial nail, and examples thereof include a resin base material.
There is no restriction | limiting in particular as a coating method, Although what is necessary is just to perform by a well-known method, The method of apply | coating using a brush, a brush, etc. is mentioned preferably. Further, spray coating or ink jet coating may be performed.
The thickness of the coating film is not particularly limited, and the coating thickness may be appropriately adjusted in consideration of the desired thickness of the obtained artificial nail.
人工爪の形成方法は、人工爪組成物をヒト若しくは動物の爪上、又は、他の人工爪上に塗布し塗布膜を形成する工程(塗布工程)を含むことが好ましい。
他の人工爪は、人工爪に用いられる基材であれば、特に制限はなく、例えば、樹脂基材が挙げられる。
塗布方法としては、特に制限はなく、公知の方法により行えばよいが、刷毛や筆等を使用して塗布する方法が好ましく挙げられる。また、スプレー塗布やインクジェット塗布を行ってもよい。
塗布膜の厚さについても、特に制限はなく、得られる人工爪における所望の厚さを考慮して、塗布厚を適宜調整すればよい。 <Application process>
The method for forming an artificial nail preferably includes a step (application step) of applying an artificial nail composition on a human or animal nail or other artificial nail to form a coating film.
The other artificial nail is not particularly limited as long as it is a base material used for the artificial nail, and examples thereof include a resin base material.
There is no restriction | limiting in particular as a coating method, Although what is necessary is just to perform by a well-known method, The method of apply | coating using a brush, a brush, etc. is mentioned preferably. Further, spray coating or ink jet coating may be performed.
The thickness of the coating film is not particularly limited, and the coating thickness may be appropriately adjusted in consideration of the desired thickness of the obtained artificial nail.
<乾燥又は露光工程>
人工爪の形成方法は、上記塗布膜を乾燥及び/又は露光して人工爪を形成する工程(乾燥又は露光工程)を含むことが好ましい。 <Drying or exposure process>
The method for forming an artificial nail preferably includes a step of drying and / or exposing the coating film to form an artificial nail (drying or exposure step).
人工爪の形成方法は、上記塗布膜を乾燥及び/又は露光して人工爪を形成する工程(乾燥又は露光工程)を含むことが好ましい。 <Drying or exposure process>
The method for forming an artificial nail preferably includes a step of drying and / or exposing the coating film to form an artificial nail (drying or exposure step).
-乾燥工程-
乾燥により人工爪を形成する場合、使用する人工爪組成物は、溶剤を含有していることが好ましい。
乾燥方法としては、特に制限はなく、公知の方法により行えばよい。
具体的には、例えば、室温(例えば、10~30℃)にて放置乾燥する方法、気流下において放置乾燥する方法、加熱乾燥する方法、及び、これらを組み合わせた方法が好ましく挙げられる。加熱方法としては、特に制限はないが、室温より高い温度の雰囲気下に放置する方法、加熱気流下に放置する方法、ヒーターや赤外線ランプ(IRランプ)等の加熱手段により加熱する方法が例示できる。
乾燥時間としては、特に制限はなく、人工爪組成物の組成や、乾燥方法、塗布厚によって適宜調整すればよいが、簡便性及びセルフレベリングによる平滑性や光沢性付与の観点から、10秒~20分であることが好ましく、15秒~10分であることがより好ましく、30秒~5分であることが更に好ましく、30秒~2分であることが特に好ましい。 -Drying process-
When the artificial nail is formed by drying, the artificial nail composition to be used preferably contains a solvent.
There is no restriction | limiting in particular as a drying method, What is necessary is just to carry out by a well-known method.
Specifically, for example, a method of leaving and drying at room temperature (for example, 10 to 30 ° C.), a method of leaving and drying in an air stream, a method of drying by heating, and a method combining these are preferable. The heating method is not particularly limited, and examples thereof include a method of leaving in an atmosphere at a temperature higher than room temperature, a method of leaving in a heated air current, and a method of heating by a heating means such as a heater or an infrared lamp (IR lamp). .
The drying time is not particularly limited and may be appropriately adjusted depending on the composition of the artificial nail composition, the drying method, and the coating thickness. From the viewpoint of simplicity and imparting smoothness and gloss by self-leveling, 10 seconds to It is preferably 20 minutes, more preferably 15 seconds to 10 minutes, further preferably 30 seconds to 5 minutes, and particularly preferably 30 seconds to 2 minutes.
乾燥により人工爪を形成する場合、使用する人工爪組成物は、溶剤を含有していることが好ましい。
乾燥方法としては、特に制限はなく、公知の方法により行えばよい。
具体的には、例えば、室温(例えば、10~30℃)にて放置乾燥する方法、気流下において放置乾燥する方法、加熱乾燥する方法、及び、これらを組み合わせた方法が好ましく挙げられる。加熱方法としては、特に制限はないが、室温より高い温度の雰囲気下に放置する方法、加熱気流下に放置する方法、ヒーターや赤外線ランプ(IRランプ)等の加熱手段により加熱する方法が例示できる。
乾燥時間としては、特に制限はなく、人工爪組成物の組成や、乾燥方法、塗布厚によって適宜調整すればよいが、簡便性及びセルフレベリングによる平滑性や光沢性付与の観点から、10秒~20分であることが好ましく、15秒~10分であることがより好ましく、30秒~5分であることが更に好ましく、30秒~2分であることが特に好ましい。 -Drying process-
When the artificial nail is formed by drying, the artificial nail composition to be used preferably contains a solvent.
There is no restriction | limiting in particular as a drying method, What is necessary is just to carry out by a well-known method.
Specifically, for example, a method of leaving and drying at room temperature (for example, 10 to 30 ° C.), a method of leaving and drying in an air stream, a method of drying by heating, and a method combining these are preferable. The heating method is not particularly limited, and examples thereof include a method of leaving in an atmosphere at a temperature higher than room temperature, a method of leaving in a heated air current, and a method of heating by a heating means such as a heater or an infrared lamp (IR lamp). .
The drying time is not particularly limited and may be appropriately adjusted depending on the composition of the artificial nail composition, the drying method, and the coating thickness. From the viewpoint of simplicity and imparting smoothness and gloss by self-leveling, 10 seconds to It is preferably 20 minutes, more preferably 15 seconds to 10 minutes, further preferably 30 seconds to 5 minutes, and particularly preferably 30 seconds to 2 minutes.
-露光工程-
露光により人工爪を形成する場合、使用する人工爪組成物は、重合性化合物、及び、光重合開始剤を含有することが好ましい。
また、人工爪組成物が、重合性化合物及び光重合開始剤に加え、溶剤を含有している場合、露光を行う前に、乾燥を行うことが好ましい。
露光に使用する光としては、紫外線、可視光線などが挙げられ、硬化感度及び装置の入手容易性の観点から、紫外線が特に好ましい。
露光手段としては、特に制限はなく、公知の露光手段を用いることができるが、例えば、水銀ランプ及びメタルハライドランプ等の紫外線ランプ(UVランプ)、発光ダイオード(LED)、レーザーダイオード(LD)等が挙げられる。
露光時間としては、特に制限はないが、2秒~5分が好ましく、5秒~3分がより好ましく、5秒~2分が更に好ましい。また、露光は、間歇的に行っても、連続的に行ってもよいし、パルス光により行ってもよく、任意の方法で露光すればよい。 -Exposure process-
When an artificial nail is formed by exposure, the artificial nail composition to be used preferably contains a polymerizable compound and a photopolymerization initiator.
Moreover, when the artificial nail composition contains a solvent in addition to the polymerizable compound and the photopolymerization initiator, drying is preferably performed before exposure.
Examples of light used for exposure include ultraviolet rays and visible rays, and ultraviolet rays are particularly preferable from the viewpoint of curing sensitivity and availability of the apparatus.
The exposure means is not particularly limited, and known exposure means can be used. For example, ultraviolet lamps (UV lamps) such as mercury lamps and metal halide lamps, light emitting diodes (LEDs), laser diodes (LDs), etc. Can be mentioned.
The exposure time is not particularly limited, but is preferably 2 seconds to 5 minutes, more preferably 5 seconds to 3 minutes, and further preferably 5 seconds to 2 minutes. In addition, the exposure may be performed intermittently, continuously, or with pulsed light, and may be performed by any method.
露光により人工爪を形成する場合、使用する人工爪組成物は、重合性化合物、及び、光重合開始剤を含有することが好ましい。
また、人工爪組成物が、重合性化合物及び光重合開始剤に加え、溶剤を含有している場合、露光を行う前に、乾燥を行うことが好ましい。
露光に使用する光としては、紫外線、可視光線などが挙げられ、硬化感度及び装置の入手容易性の観点から、紫外線が特に好ましい。
露光手段としては、特に制限はなく、公知の露光手段を用いることができるが、例えば、水銀ランプ及びメタルハライドランプ等の紫外線ランプ(UVランプ)、発光ダイオード(LED)、レーザーダイオード(LD)等が挙げられる。
露光時間としては、特に制限はないが、2秒~5分が好ましく、5秒~3分がより好ましく、5秒~2分が更に好ましい。また、露光は、間歇的に行っても、連続的に行ってもよいし、パルス光により行ってもよく、任意の方法で露光すればよい。 -Exposure process-
When an artificial nail is formed by exposure, the artificial nail composition to be used preferably contains a polymerizable compound and a photopolymerization initiator.
Moreover, when the artificial nail composition contains a solvent in addition to the polymerizable compound and the photopolymerization initiator, drying is preferably performed before exposure.
Examples of light used for exposure include ultraviolet rays and visible rays, and ultraviolet rays are particularly preferable from the viewpoint of curing sensitivity and availability of the apparatus.
The exposure means is not particularly limited, and known exposure means can be used. For example, ultraviolet lamps (UV lamps) such as mercury lamps and metal halide lamps, light emitting diodes (LEDs), laser diodes (LDs), etc. Can be mentioned.
The exposure time is not particularly limited, but is preferably 2 seconds to 5 minutes, more preferably 5 seconds to 3 minutes, and further preferably 5 seconds to 2 minutes. In addition, the exposure may be performed intermittently, continuously, or with pulsed light, and may be performed by any method.
人工爪の形成方法は、得られる人工爪の光沢や美観、また、露光を行った場合は未硬化成分の除去の観点から、乾燥又は露光工程の後、得られた人工爪の表面を洗浄又は拭き取る工程を含んでいてもよい。
洗浄又は拭き取り方法としては、エタノール等の溶剤を含ませたワイプシートやスポンジワイプ等の拭き取り基材により拭き取る方法、エタノール等の溶剤や水により洗浄する方法が例示できる。
また、洗浄又は拭き取りに使用する溶剤としては、得られた人工爪を溶解しない溶剤であることが好ましい。
また、人工爪の形成方法は、露光を行う場合、塗布工程の前に、ヒト若しくは動物の爪、又は、他の人工爪の表面を粗面化する工程を含むことが好ましい。上記態様であると、露光して得られる人工爪(ジェルネイル)の密着性及び耐久性に優れる。
爪表面の粗面化方法としては、特に制限はなく、公知の方法により行うことができる。例えば、ファイル等の爪用やすりにより粗面化を行う方法が好ましく挙げられる。
また、人工爪の形成方法は、その他、公知の工程を含んでいてもよい。 The method for forming the artificial nail is a method for cleaning or sculpting the surface of the obtained artificial nail after the drying or exposure step from the viewpoint of removing the uncured component when exposed to gloss and aesthetics. A step of wiping off may be included.
Examples of the washing or wiping method include a method of wiping with a wiping base material such as a wipe sheet or a sponge wipe containing a solvent such as ethanol, and a method of washing with a solvent such as ethanol or water.
The solvent used for cleaning or wiping is preferably a solvent that does not dissolve the obtained artificial nail.
In addition, the method for forming an artificial nail preferably includes a step of roughening the surface of a human or animal nail or other artificial nail before the coating step when performing exposure. It is excellent in the adhesiveness and durability of the artificial nail (gel nail) obtained by exposing as it is the said aspect.
There is no restriction | limiting in particular as a roughening method of the nail | claw surface, It can carry out by a well-known method. For example, a method of roughening with a nail file such as a file is preferred.
Moreover, the formation method of the artificial nail may include other known processes.
洗浄又は拭き取り方法としては、エタノール等の溶剤を含ませたワイプシートやスポンジワイプ等の拭き取り基材により拭き取る方法、エタノール等の溶剤や水により洗浄する方法が例示できる。
また、洗浄又は拭き取りに使用する溶剤としては、得られた人工爪を溶解しない溶剤であることが好ましい。
また、人工爪の形成方法は、露光を行う場合、塗布工程の前に、ヒト若しくは動物の爪、又は、他の人工爪の表面を粗面化する工程を含むことが好ましい。上記態様であると、露光して得られる人工爪(ジェルネイル)の密着性及び耐久性に優れる。
爪表面の粗面化方法としては、特に制限はなく、公知の方法により行うことができる。例えば、ファイル等の爪用やすりにより粗面化を行う方法が好ましく挙げられる。
また、人工爪の形成方法は、その他、公知の工程を含んでいてもよい。 The method for forming the artificial nail is a method for cleaning or sculpting the surface of the obtained artificial nail after the drying or exposure step from the viewpoint of removing the uncured component when exposed to gloss and aesthetics. A step of wiping off may be included.
Examples of the washing or wiping method include a method of wiping with a wiping base material such as a wipe sheet or a sponge wipe containing a solvent such as ethanol, and a method of washing with a solvent such as ethanol or water.
The solvent used for cleaning or wiping is preferably a solvent that does not dissolve the obtained artificial nail.
In addition, the method for forming an artificial nail preferably includes a step of roughening the surface of a human or animal nail or other artificial nail before the coating step when performing exposure. It is excellent in the adhesiveness and durability of the artificial nail (gel nail) obtained by exposing as it is the said aspect.
There is no restriction | limiting in particular as a roughening method of the nail | claw surface, It can carry out by a well-known method. For example, a method of roughening with a nail file such as a file is preferred.
Moreover, the formation method of the artificial nail may include other known processes.
以下、実施例により本発明を更に具体的に説明するが、本発明はこれらの実施例における形態に限定されるものではない。なお、特に断りのない限り、「部」、及び「%」は質量基準である。
Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the embodiments in these examples. Unless otherwise specified, “part” and “%” are based on mass.
(除去液の調液)
以下表13に示す各種成分を均一に混合し、除去液を調液した。 (Preparation of removal liquid)
Various components shown in Table 13 below were uniformly mixed to prepare a removal solution.
以下表13に示す各種成分を均一に混合し、除去液を調液した。 (Preparation of removal liquid)
Various components shown in Table 13 below were uniformly mixed to prepare a removal solution.
除去液に使用した各試薬の詳細は、以下の通りである。
クエン酸(東京化成工業(株)製)
クエン酸三ナトリウム二水和物(和光純薬工業(株)製)
メタノール(東京化成工業(株)製)、水酸基価:31.2mmol/g
エタノール(関東化学(株)製)、水酸基価:21.7mmol/g
イソプロピルアルコール(関東化学(株)製)、水酸基価:16.6mmol/g
PVA-105(クラレ(株)製)、水酸基価:22.7mmol/g
PEG Mw200(東京化成工業(株)製)、水酸基価:10.0mmol/g
PEG Mw300(東京化成工業(株)製)、水酸基価:6.7mmol/g
PEG Mw400(東京化成工業(株)製)、水酸基価:5.0mmol/g
PEG Mw600(東京化成工業(株)製)、水酸基価:3.3mmol/g
カテコール(東京化成工業(株)製)、水酸基価:18.2mmol/g
プロピレングリコール(太陽日酸(株)製)、水酸基価:26.3mmol/g
1,3-ブタンジオール(東京化成工業(株)製)、水酸基価:22.2mmol/g
マルチトール(東京化成工業(株)製)、水酸基価:26.1mmol/g
グリセロール(東京化成工業(株)製)、水酸基価:32.6mmol/g Details of each reagent used for the removal liquid are as follows.
Citric acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
Trisodium citrate dihydrate (manufactured by Wako Pure Chemical Industries, Ltd.)
Methanol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 31.2 mmol / g
Ethanol (manufactured by Kanto Chemical Co., Inc.), hydroxyl value: 21.7 mmol / g
Isopropyl alcohol (manufactured by Kanto Chemical Co., Inc.), hydroxyl value: 16.6 mmol / g
PVA-105 (manufactured by Kuraray Co., Ltd.), hydroxyl value: 22.7 mmol / g
PEG Mw200 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 10.0 mmol / g
PEG Mw300 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 6.7 mmol / g
PEG Mw400 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 5.0 mmol / g
PEG Mw600 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 3.3 mmol / g
Catechol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 18.2 mmol / g
Propylene glycol (manufactured by Taiyo Nippon Sanso Co., Ltd.), hydroxyl value: 26.3 mmol / g
1,3-butanediol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 22.2 mmol / g
Maltitol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 26.1 mmol / g
Glycerol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 32.6 mmol / g
クエン酸(東京化成工業(株)製)
クエン酸三ナトリウム二水和物(和光純薬工業(株)製)
メタノール(東京化成工業(株)製)、水酸基価:31.2mmol/g
エタノール(関東化学(株)製)、水酸基価:21.7mmol/g
イソプロピルアルコール(関東化学(株)製)、水酸基価:16.6mmol/g
PVA-105(クラレ(株)製)、水酸基価:22.7mmol/g
PEG Mw200(東京化成工業(株)製)、水酸基価:10.0mmol/g
PEG Mw300(東京化成工業(株)製)、水酸基価:6.7mmol/g
PEG Mw400(東京化成工業(株)製)、水酸基価:5.0mmol/g
PEG Mw600(東京化成工業(株)製)、水酸基価:3.3mmol/g
カテコール(東京化成工業(株)製)、水酸基価:18.2mmol/g
プロピレングリコール(太陽日酸(株)製)、水酸基価:26.3mmol/g
1,3-ブタンジオール(東京化成工業(株)製)、水酸基価:22.2mmol/g
マルチトール(東京化成工業(株)製)、水酸基価:26.1mmol/g
グリセロール(東京化成工業(株)製)、水酸基価:32.6mmol/g Details of each reagent used for the removal liquid are as follows.
Citric acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
Trisodium citrate dihydrate (manufactured by Wako Pure Chemical Industries, Ltd.)
Methanol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 31.2 mmol / g
Ethanol (manufactured by Kanto Chemical Co., Inc.), hydroxyl value: 21.7 mmol / g
Isopropyl alcohol (manufactured by Kanto Chemical Co., Inc.), hydroxyl value: 16.6 mmol / g
PVA-105 (manufactured by Kuraray Co., Ltd.), hydroxyl value: 22.7 mmol / g
PEG Mw200 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 10.0 mmol / g
PEG Mw300 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 6.7 mmol / g
PEG Mw400 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 5.0 mmol / g
PEG Mw600 (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 3.3 mmol / g
Catechol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 18.2 mmol / g
Propylene glycol (manufactured by Taiyo Nippon Sanso Co., Ltd.), hydroxyl value: 26.3 mmol / g
1,3-butanediol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 22.2 mmol / g
Maltitol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 26.1 mmol / g
Glycerol (manufactured by Tokyo Chemical Industry Co., Ltd.), hydroxyl value: 32.6 mmol / g
(人工爪組成物の調製)
以下表14に示す各種成分を均一に混合し、人工爪組成物を得た。 (Preparation of artificial nail composition)
Various components shown in Table 14 below were uniformly mixed to obtain an artificial nail composition.
以下表14に示す各種成分を均一に混合し、人工爪組成物を得た。 (Preparation of artificial nail composition)
Various components shown in Table 14 below were uniformly mixed to obtain an artificial nail composition.
また、J-8としては、以下の製品を使用した。
J-8:市販品、モガブルック社製、カルジェル#CG-00 クリアジェル、ポリウレタンメタクリレート含有 The following products were used as J-8.
J-8: Commercial product, manufactured by Mogabrook, Calgel # CG-00 Clear Gel, polyurethane methacrylate included
J-8:市販品、モガブルック社製、カルジェル#CG-00 クリアジェル、ポリウレタンメタクリレート含有 The following products were used as J-8.
J-8: Commercial product, manufactured by Mogabrook, Calgel # CG-00 Clear Gel, polyurethane methacrylate included
人工爪組成物に使用した各試薬の詳細は、以下の通りである。
Details of each reagent used in the artificial nail composition are as follows.
ポリウレタンアクリレート;日本合成化学工業(株)製、紫光UV-3300B、重量平均分子量=13,000、官能基数=2
2-ヒドロキシエチルメタクリレート(東京化成工業(株)製)
2-ヒドロキシプロピルメタクリレート(東京化成工業(株)製)
2-ジメチルアミノエチルメタクリレート(共栄社化学(株)製)
イソボロニルメタクリレート(東京化成工業(株)製)
ジフェニル(2,4,6-トリメチルベンゾイル)ホスフィンオキシド(和光純薬工業(株)製)
1-ヒドロキシシクロヘキシルフェニルケトン(東京化成工業(株)製)
酢酸t-ブチル(ハイケム(株)製) Polyurethane acrylate; manufactured by Nippon Synthetic Chemical Industry Co., Ltd., purple light UV-3300B, weight average molecular weight = 13,000, number of functional groups = 2
2-hydroxyethyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)
2-hydroxypropyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)
2-Dimethylaminoethyl methacrylate (manufactured by Kyoeisha Chemical Co., Ltd.)
Isobornyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)
Diphenyl (2,4,6-trimethylbenzoyl) phosphine oxide (manufactured by Wako Pure Chemical Industries, Ltd.)
1-hydroxycyclohexyl phenyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd.)
T-Butyl acetate (manufactured by Hichem Corp.)
2-ヒドロキシエチルメタクリレート(東京化成工業(株)製)
2-ヒドロキシプロピルメタクリレート(東京化成工業(株)製)
2-ジメチルアミノエチルメタクリレート(共栄社化学(株)製)
イソボロニルメタクリレート(東京化成工業(株)製)
ジフェニル(2,4,6-トリメチルベンゾイル)ホスフィンオキシド(和光純薬工業(株)製)
1-ヒドロキシシクロヘキシルフェニルケトン(東京化成工業(株)製)
酢酸t-ブチル(ハイケム(株)製) Polyurethane acrylate; manufactured by Nippon Synthetic Chemical Industry Co., Ltd., purple light UV-3300B, weight average molecular weight = 13,000, number of functional groups = 2
2-hydroxyethyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)
2-hydroxypropyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)
2-Dimethylaminoethyl methacrylate (manufactured by Kyoeisha Chemical Co., Ltd.)
Isobornyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)
Diphenyl (2,4,6-trimethylbenzoyl) phosphine oxide (manufactured by Wako Pure Chemical Industries, Ltd.)
1-hydroxycyclohexyl phenyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd.)
T-Butyl acetate (manufactured by Hichem Corp.)
(除去性評価方法-1)
表14記載の人工爪組成物をベースジェルとして使用し、表面の粗さが一般的な爪の表面凹凸と酷似するように、ブラシ処理を行ったアルミ上に、人工爪組成物(ベースジェル)を塗布した。その後、紫外線ランプ(36W)を2分間照射した。なお、人工爪組成物(ベースジェル)は、照射後の膜厚が約100μm(±10μm)程度になるように塗布した。
その後、カラー層として市販のカルジェル#CG-03 フレッシュピンク(モガブルック社製)を筆で塗布した後、紫外線ランプ(36W)で5分間照射した。更に、トップ層として市販のトップジェル(モガブルック社製)を筆で塗布し、同様に紫外線ランプ(36W)で5分間照射した。形成した人工爪を目視及び指触で観察したところ、完全に固化していた。
カラー層とトップ層とを合わせた膜厚は約250μmであった。その後エタノールで表面を拭き取った。
得られた人工爪の表面及び先端に対して、ファイル(爪用のヤスリ)で傷を付け、その後、表13記載の除去液に2分浸漬し、浸漬させながら木の棒を用いて、押し剥がす剥離施術を行い、剥離するまでの時間(除去時間;剥離施術に要した時間)を評価した。 (Removability evaluation method-1)
An artificial nail composition (base gel) is used on a brush-treated aluminum so that the surface roughness of the artificial nail composition described in Table 14 is very similar to that of a general nail surface unevenness. Was applied. Then, the ultraviolet lamp (36W) was irradiated for 2 minutes. The artificial nail composition (base gel) was applied so that the film thickness after irradiation was about 100 μm (± 10 μm).
Thereafter, commercially available calgel # CG-03 fresh pink (manufactured by Mogabrook) was applied as a color layer with a brush, and then irradiated with an ultraviolet lamp (36 W) for 5 minutes. Furthermore, a commercially available top gel (manufactured by Mogabrook Co., Ltd.) was applied as a top layer with a brush, and similarly irradiated with an ultraviolet lamp (36 W) for 5 minutes. When the formed artificial nail was observed visually and with a finger touch, it was completely solidified.
The total film thickness of the color layer and the top layer was about 250 μm. Thereafter, the surface was wiped off with ethanol.
The surface and tip of the resulting artificial nail were scratched with a file (file for nails), then immersed in the removal solution described in Table 13 for 2 minutes, and pressed using a wooden stick while being immersed. The peeling treatment which peels was performed, and the time (removal time; time required for peeling treatment) until peeling was evaluated.
表14記載の人工爪組成物をベースジェルとして使用し、表面の粗さが一般的な爪の表面凹凸と酷似するように、ブラシ処理を行ったアルミ上に、人工爪組成物(ベースジェル)を塗布した。その後、紫外線ランプ(36W)を2分間照射した。なお、人工爪組成物(ベースジェル)は、照射後の膜厚が約100μm(±10μm)程度になるように塗布した。
その後、カラー層として市販のカルジェル#CG-03 フレッシュピンク(モガブルック社製)を筆で塗布した後、紫外線ランプ(36W)で5分間照射した。更に、トップ層として市販のトップジェル(モガブルック社製)を筆で塗布し、同様に紫外線ランプ(36W)で5分間照射した。形成した人工爪を目視及び指触で観察したところ、完全に固化していた。
カラー層とトップ層とを合わせた膜厚は約250μmであった。その後エタノールで表面を拭き取った。
得られた人工爪の表面及び先端に対して、ファイル(爪用のヤスリ)で傷を付け、その後、表13記載の除去液に2分浸漬し、浸漬させながら木の棒を用いて、押し剥がす剥離施術を行い、剥離するまでの時間(除去時間;剥離施術に要した時間)を評価した。 (Removability evaluation method-1)
An artificial nail composition (base gel) is used on a brush-treated aluminum so that the surface roughness of the artificial nail composition described in Table 14 is very similar to that of a general nail surface unevenness. Was applied. Then, the ultraviolet lamp (36W) was irradiated for 2 minutes. The artificial nail composition (base gel) was applied so that the film thickness after irradiation was about 100 μm (± 10 μm).
Thereafter, commercially available calgel # CG-03 fresh pink (manufactured by Mogabrook) was applied as a color layer with a brush, and then irradiated with an ultraviolet lamp (36 W) for 5 minutes. Furthermore, a commercially available top gel (manufactured by Mogabrook Co., Ltd.) was applied as a top layer with a brush, and similarly irradiated with an ultraviolet lamp (36 W) for 5 minutes. When the formed artificial nail was observed visually and with a finger touch, it was completely solidified.
The total film thickness of the color layer and the top layer was about 250 μm. Thereafter, the surface was wiped off with ethanol.
The surface and tip of the resulting artificial nail were scratched with a file (file for nails), then immersed in the removal solution described in Table 13 for 2 minutes, and pressed using a wooden stick while being immersed. The peeling treatment which peels was performed, and the time (removal time; time required for peeling treatment) until peeling was evaluated.
なお、一般的な爪の表面凹凸は、原子間力顕微鏡(AFM)を用いて、ΔSを測定した結果13.9%であり、その値と合わせるようにアルミニウム合板(厚みが0.3μmである、JIS1050、JIS1100、JIS3003等のアルミニウム合金)の表面をブラシ処理した。ブラシ処理は、以下のように行った。
毛径0.3mmの束植ナイロンブラシ3本とメジアン径25μmのパミス-水懸濁液(比重1.1g/cm3)を用いて、上記アルミニウム合金板試料の表面を砂目立てし、水で洗浄した。この試料を70℃の25質量%水酸化ナトリウム水溶液に25秒間浸漬してエッチングを行い、水洗した。次いで、水洗した試料を60℃の20%硝酸水溶液に20秒間浸漬し、水洗した。
なお、アルミニウム合板には、厚みが0.3μmである、JIS1050、JIS1100、JIS3003等のアルミニウム合金を使用した。 The surface roughness of the general nail is 13.9% as a result of measuring ΔS using an atomic force microscope (AFM), and an aluminum plywood (thickness is 0.3 μm) to match the value. , JIS 1050, JIS 1100, JIS 3003 and other aluminum alloys). The brush process was performed as follows.
Using three bundle-planted nylon brushes with a bristle diameter of 0.3 mm and a pumice-water suspension with a median diameter of 25 μm (specific gravity 1.1 g / cm 3 ), the surface of the aluminum alloy plate sample is grained and washed with water. Washed. This sample was immersed in a 25 mass% sodium hydroxide aqueous solution at 70 ° C. for 25 seconds for etching and washed with water. Next, the washed sample was immersed in a 20% nitric acid aqueous solution at 60 ° C. for 20 seconds and washed with water.
For the aluminum plywood, an aluminum alloy such as JIS1050, JIS1100, and JIS3003 having a thickness of 0.3 μm was used.
毛径0.3mmの束植ナイロンブラシ3本とメジアン径25μmのパミス-水懸濁液(比重1.1g/cm3)を用いて、上記アルミニウム合金板試料の表面を砂目立てし、水で洗浄した。この試料を70℃の25質量%水酸化ナトリウム水溶液に25秒間浸漬してエッチングを行い、水洗した。次いで、水洗した試料を60℃の20%硝酸水溶液に20秒間浸漬し、水洗した。
なお、アルミニウム合板には、厚みが0.3μmである、JIS1050、JIS1100、JIS3003等のアルミニウム合金を使用した。 The surface roughness of the general nail is 13.9% as a result of measuring ΔS using an atomic force microscope (AFM), and an aluminum plywood (thickness is 0.3 μm) to match the value. , JIS 1050, JIS 1100, JIS 3003 and other aluminum alloys). The brush process was performed as follows.
Using three bundle-planted nylon brushes with a bristle diameter of 0.3 mm and a pumice-water suspension with a median diameter of 25 μm (specific gravity 1.1 g / cm 3 ), the surface of the aluminum alloy plate sample is grained and washed with water. Washed. This sample was immersed in a 25 mass% sodium hydroxide aqueous solution at 70 ° C. for 25 seconds for etching and washed with water. Next, the washed sample was immersed in a 20% nitric acid aqueous solution at 60 ° C. for 20 seconds and washed with water.
For the aluminum plywood, an aluminum alloy such as JIS1050, JIS1100, and JIS3003 having a thickness of 0.3 μm was used.
(除去性評価方法-2)
爪状に型取りしたプラスチック基材上に筆を使って、表14記載の人工爪組成物(ベースジェル)を0.25g塗布し、紫外線ランプ(36W)を2分間照射した。その後に、エタノールで表面を洗浄した。その後、硬化膜表面をファイル(爪用のヤスリ)で傷を付け、表13記載の除去液に浸漬させた、次いで、取り出した各試料(硬化膜)につき、木の棒を用いて押し剥がす剥離施術を行い、剥離するまでの時間(除去時間;剥離施術に要した時間)を評価した。 (Removability evaluation method-2)
Using a brush on a plastic base material molded into a nail shape, 0.25 g of the artificial nail composition (base gel) shown in Table 14 was applied and irradiated with an ultraviolet lamp (36 W) for 2 minutes. Thereafter, the surface was washed with ethanol. Then, the surface of the cured film was scratched with a file (file for nails) and immersed in the removal liquid shown in Table 13, and then each sample (cured film) taken out was peeled off using a wooden stick. The treatment was performed, and the time until removal (removal time; time required for the separation treatment) was evaluated.
爪状に型取りしたプラスチック基材上に筆を使って、表14記載の人工爪組成物(ベースジェル)を0.25g塗布し、紫外線ランプ(36W)を2分間照射した。その後に、エタノールで表面を洗浄した。その後、硬化膜表面をファイル(爪用のヤスリ)で傷を付け、表13記載の除去液に浸漬させた、次いで、取り出した各試料(硬化膜)につき、木の棒を用いて押し剥がす剥離施術を行い、剥離するまでの時間(除去時間;剥離施術に要した時間)を評価した。 (Removability evaluation method-2)
Using a brush on a plastic base material molded into a nail shape, 0.25 g of the artificial nail composition (base gel) shown in Table 14 was applied and irradiated with an ultraviolet lamp (36 W) for 2 minutes. Thereafter, the surface was washed with ethanol. Then, the surface of the cured film was scratched with a file (file for nails) and immersed in the removal liquid shown in Table 13, and then each sample (cured film) taken out was peeled off using a wooden stick. The treatment was performed, and the time until removal (removal time; time required for the separation treatment) was evaluated.
(実施例1-1~1-4、及び、比較例1-1~1-4)
除去液として、水酸基を有する化合物を含有するA-2と、水酸基を有する化合物を含有しないA-1を使用して、種々の人工爪組成物を用いて形成した人工爪の除去性を評価した、結果を以下の表に示す。 (Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-4)
Using A-2 containing a compound having a hydroxyl group and A-1 not containing a compound having a hydroxyl group as the removing solution, the removability of artificial nails formed using various artificial nail compositions was evaluated. The results are shown in the table below.
除去液として、水酸基を有する化合物を含有するA-2と、水酸基を有する化合物を含有しないA-1を使用して、種々の人工爪組成物を用いて形成した人工爪の除去性を評価した、結果を以下の表に示す。 (Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-4)
Using A-2 containing a compound having a hydroxyl group and A-1 not containing a compound having a hydroxyl group as the removing solution, the removability of artificial nails formed using various artificial nail compositions was evaluated. The results are shown in the table below.
この結果から、クエン酸pH=2.6に水酸基を含有する化合物(1,3-ブタンジオール)を添加することで、除去性が向上すること明らかとなった。また、特に、アミノ基基を有するウレタンポリマーを処方した人工爪組成物(ベースジェル)を用いた人工爪と本発明の除去液とを組み合わせることで、より迅速に除去できることが分かった。
From this result, it was revealed that the removability was improved by adding a compound containing a hydroxyl group (1,3-butanediol) to citric acid pH = 2.6. Moreover, it turned out that it can remove more rapidly especially by combining the artificial nail | claw using the artificial nail composition (base gel) which prescribed | regulated the urethane polymer which has an amino group, and the removal liquid of this invention.
(実施例2-1~2-4)
除去液のpHにより、除去性にどのような影響が生じるのかについて評価を行った。結果を以下の表に示す。 (Examples 2-1 to 2-4)
The influence of the pH of the removal solution on the removability was evaluated. The results are shown in the table below.
除去液のpHにより、除去性にどのような影響が生じるのかについて評価を行った。結果を以下の表に示す。 (Examples 2-1 to 2-4)
The influence of the pH of the removal solution on the removability was evaluated. The results are shown in the table below.
この結果から、pHが5以下では、除去性はほぼ変わらず、迅速に除去できることがわかった。
From this result, it was found that when the pH is 5 or less, the removability is almost unchanged and can be removed quickly.
(実施例3-1~3-13、及び、比較例3-1)
種々の水酸基を有する化合物を除去液に添加して、除去性の評価を行った。結果を以下の表に示す。 (Examples 3-1 to 3-13 and Comparative Example 3-1)
Various compounds having a hydroxyl group were added to the removal solution to evaluate the removability. The results are shown in the table below.
種々の水酸基を有する化合物を除去液に添加して、除去性の評価を行った。結果を以下の表に示す。 (Examples 3-1 to 3-13 and Comparative Example 3-1)
Various compounds having a hydroxyl group were added to the removal solution to evaluate the removability. The results are shown in the table below.
クエン酸 pH=2.6水溶液に、多様な水酸基を有する化合物を添加した除去液は、どれも除去性に優れることが分かった。
It was found that any removal solution obtained by adding various hydroxyl group-containing compounds to citric acid pH = 2.6 aqueous solution was excellent in removability.
(実施例4-1、及び、比較例4-1~4-2)
種々の除去液を使用して、人工爪の剥離を行った。結果を下記の表に示す。 (Example 4-1 and Comparative Examples 4-1 and 4-2)
The artificial nail was peeled off using various removal solutions. The results are shown in the table below.
種々の除去液を使用して、人工爪の剥離を行った。結果を下記の表に示す。 (Example 4-1 and Comparative Examples 4-1 and 4-2)
The artificial nail was peeled off using various removal solutions. The results are shown in the table below.
この結果から、酸化合物、水酸基を有する化合物、水を単独の系と比較し、左記3構成成分が混合した除去液で、除去性が明らかに向上することが分かった。
From these results, it was found that the removal property was obviously improved by the removal liquid in which the three constituents shown on the left were mixed as compared with the single system of acid compound, hydroxyl group-containing compound and water.
(実施例5-1、及び、比較例5-1)
特開2009-126833号公報に記載の人工爪組成物を使用し、本発明の除去液と、先行文献に記載の除去液との対比試験を行った。 (Example 5-1 and Comparative example 5-1)
Using the artificial nail composition described in Japanese Patent Application Laid-Open No. 2009-126833, a comparison test was performed between the removal liquid of the present invention and the removal liquid described in the prior art.
特開2009-126833号公報に記載の人工爪組成物を使用し、本発明の除去液と、先行文献に記載の除去液との対比試験を行った。 (Example 5-1 and Comparative example 5-1)
Using the artificial nail composition described in Japanese Patent Application Laid-Open No. 2009-126833, a comparison test was performed between the removal liquid of the present invention and the removal liquid described in the prior art.
この結果から、先行技術との比較においても、水酸基を有する化合物を添加することで、上記実験結果と同様に除去性が向上することが分かった。
From this result, it was found that, in comparison with the prior art, the removability was improved by adding a compound having a hydroxyl group, similar to the above experimental result.
Claims (14)
- 成分Aとして酸化合物、
成分Bとして水酸基を有する化合物、及び、
成分Cとして水を含有することを特徴とする、
人工爪用除去液。 An acid compound as component A;
A compound having a hydroxyl group as component B, and
It contains water as component C,
Remover for artificial nails. - pHが1以上5以下である、請求項1に記載の人工爪用除去液。 The removal solution for artificial nails according to claim 1, wherein the pH is 1 or more and 5 or less.
- 成分Aとして、少なくとも1つの有機酸を含有する、請求項1又は2に記載の人工爪用除去液。 The removal liquid for artificial nails according to claim 1 or 2, containing at least one organic acid as component A.
- 成分Bが、水酸基価が5mmol/g以上の化合物を含有する、請求項1~3のいずれか1項に記載の人工爪用除去液。 The removal liquid for artificial nail according to any one of claims 1 to 3, wherein Component B contains a compound having a hydroxyl value of 5 mmol / g or more.
- 人工爪がウレタンポリマーを含有する、請求項1~4のいずれか1項に記載の人工爪用除去液。 The artificial nail removal liquid according to any one of claims 1 to 4, wherein the artificial nail contains a urethane polymer.
- 人工爪がアミノ基を有するポリマーを含有する、請求項1~5のいずれか1項に記載の人工爪除去液。 The artificial nail removal solution according to any one of claims 1 to 5, wherein the artificial nail contains a polymer having an amino group.
- 人工爪が、アミノ基を有するポリマーを含有する人工爪組成物により形成された人工爪である、請求項1~6のいずれか1項に記載の人工爪用除去液。 The artificial nail removal solution according to any one of claims 1 to 6, wherein the artificial nail is an artificial nail formed of an artificial nail composition containing a polymer having an amino group.
- 人工爪が、アミノ基を有するモノマーを含有する人工爪組成物により形成された人工爪である、請求項1~7のいずれか1項に記載の人工爪用除去液。 The artificial nail removal solution according to any one of claims 1 to 7, wherein the artificial nail is an artificial nail formed of an artificial nail composition containing a monomer having an amino group.
- 人工爪が、光硬化性人工爪組成物の硬化により形成された人工爪である、請求項1~8のいずれか1項に記載の人工爪用除去液。 The removal solution for artificial nails according to any one of claims 1 to 8, wherein the artificial nails are artificial nails formed by curing a photocurable artificial nail composition.
- 人工爪に、請求項1~9のいずれか1項に記載の除去液を接触させる工程を含む、人工爪の除去方法。 A method for removing an artificial nail, comprising a step of bringing the removal liquid according to any one of claims 1 to 9 into contact with the artificial nail.
- 人工爪組成物と、
請求項1~9のいずれか1項に記載の人工爪用除去液と、を含む
ネイルアートキット。 An artificial nail composition;
A nail art kit comprising the artificial nail removal solution according to any one of claims 1 to 9. - 人工爪組成物が、アミノ基を有するポリマーを含有する、請求項11に記載のネイルアートキット。 The nail art kit according to claim 11, wherein the artificial nail composition contains a polymer having an amino group.
- 人工爪組成物が、アミノ基を有するモノマーを含有する、請求項11又は12に記載のネイルアートキット。 The nail art kit according to claim 11 or 12, wherein the artificial nail composition contains a monomer having an amino group.
- 人工爪組成物が、光硬化性人工爪組成物である、請求項11~13のいずれか1項に記載のネイルアートキット。 The nail art kit according to any one of claims 11 to 13, wherein the artificial nail composition is a photocurable artificial nail composition.
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155206A (en) * | 1985-12-27 | 1987-07-10 | Towa Kagaku Kk | Manicure enamel remover |
US5342536A (en) * | 1992-12-17 | 1994-08-30 | Chesebrough-Pond's Usa Co., Division Of Conopco, Inc. | Nail polish remover with gelatin |
JP2009126833A (en) * | 2007-11-26 | 2009-06-11 | Shiseido Co Ltd | Artificial nail composition |
WO2011016531A1 (en) * | 2009-08-05 | 2011-02-10 | Jsr株式会社 | Curable composition for nail decoration, method for forming nail decoration, and method for removing nail decoration |
US20120252710A1 (en) * | 2011-03-29 | 2012-10-04 | Mycone Dental Supply Co., Inc. | Method and composition for removing radiation-curable, pigmented, artificial nail gel coatings |
JP2013241362A (en) * | 2012-05-21 | 2013-12-05 | Lion Corp | Remover for nail coating agent and removing method |
-
2015
- 2015-03-31 WO PCT/JP2015/060071 patent/WO2015152211A1/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155206A (en) * | 1985-12-27 | 1987-07-10 | Towa Kagaku Kk | Manicure enamel remover |
US5342536A (en) * | 1992-12-17 | 1994-08-30 | Chesebrough-Pond's Usa Co., Division Of Conopco, Inc. | Nail polish remover with gelatin |
JP2009126833A (en) * | 2007-11-26 | 2009-06-11 | Shiseido Co Ltd | Artificial nail composition |
WO2011016531A1 (en) * | 2009-08-05 | 2011-02-10 | Jsr株式会社 | Curable composition for nail decoration, method for forming nail decoration, and method for removing nail decoration |
US20120252710A1 (en) * | 2011-03-29 | 2012-10-04 | Mycone Dental Supply Co., Inc. | Method and composition for removing radiation-curable, pigmented, artificial nail gel coatings |
JP2013241362A (en) * | 2012-05-21 | 2013-12-05 | Lion Corp | Remover for nail coating agent and removing method |
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