WO2014171510A1 - Phase shift mask production method, phase shift mask and phase shift mask production device - Google Patents

Abstract

The topmost layer configuring a multistage region of a phase shift layer is made to have a higher oxygen content than the lower layers. By this means, the reflectivity is reduced of the topmost layer, where the exposure light is incident. Thereby, the light reflected by the phase shift mask is reduced, preventing the pattern forming accuracy from decreasing due to reflected light, making it possible to form fine and highly accurate patterns.

Description

Phase shift mask manufacturing method, phase shift mask, and phase shift mask manufacturing apparatus

The present invention relates to a method for manufacturing a phase shift mask and a phase shift mask capable of forming a fine and highly accurate exposure pattern, and more particularly to a technique used for manufacturing a flat panel display.
This application claims priority based on Japanese Patent Application No. 2013-069883 filed in Japan on April 17, 2013, the contents of which are incorporated herein by reference.

In semiconductors, pattern miniaturization has been performed over a long period of time in order to perform high-density mounting. For this purpose, various techniques such as shortening the exposure wavelength and improving the exposure method have been studied.
A phase shift mask that can form a finer pattern using a single wavelength by using light interference at a pattern edge from a photomask having a light shielding film pattern formed using a composite wavelength in order to perform pattern miniaturization in the photomask. Has been used.
In the semiconductor phase shift mask described above, an edge-enhanced phase shift mask using an i-line single wavelength is used as shown in Patent Document 1, but for further miniaturization, Patent Document 2 As shown in FIG. 1, a semi-transmission type phase shift mask has been used in which the exposure wavelength is shortened to a single ArF wavelength.

Flat panel displays, on the other hand, need to be produced at high throughput in order to reduce costs. Patterns are also formed by exposure with an exposure wavelength that is a composite wavelength of g-line, h-line, and i-line. It has been broken.
Recently, in order to form a high-definition screen even in the above flat panel display, the pattern profile has been further miniaturized. Thus, edge-enhanced phase shift masks have been used.

Japanese Unexamined Patent Publication No. 08-272071 Japanese Unexamined Patent Publication No. 2006-078953 Japanese Unexamined Patent Publication No. 2007-271720

2. Description of the Related Art In recent years, with the increase in definition of flat panel displays, with the miniaturization of wiring patterns, there has been an increasing demand for fine line width accuracy in photomasks used for manufacturing flat panel displays.
However, it has become very difficult to deal with the miniaturization technology in photomask wiring, or the examination of exposure conditions and development conditions for fine pattern formation, and new technologies are needed to achieve further miniaturization. It is getting to be.

As a method for improving the above, a method of forming a fine pattern at the time of transfer to a flat panel wiring using a phase shift mask has been used as described above. The situation is that the method is required.
As a method for solving the above problem, in the phase shift mask, the reflectance of the surface layer of the phase shift layer formed on the transparent substrate may be reduced. In the case of the phase shift mask having the phase shift layer as the uppermost layer, if the ratio of the exposure light reflected on the surface layer of the phase shift layer is large in the entire exposure light incident on the phase shift mask, an interfering wave is formed by reflection. Therefore, it becomes difficult to expose a fine wiring pattern. Therefore, a phase shift mask having a low reflectance of exposure light on the surface layer of the phase shift layer is required.

Aspects of the present invention provide a phase shift mask manufacturing method, a phase shift mask, and a phase shift mask manufacturing apparatus capable of forming a phase shift mask having a low reflectance of exposure light on the surface layer of the phase shift layer. For the purpose.

A method of manufacturing a phase shift mask according to one embodiment of the present invention includes a transparent substrate and Cr having at least a portion formed with a constant thickness on one surface side of the transparent substrate as a main component, and having a wavelength region of 300 nm to 500 nm. A method of manufacturing a phase shift mask having a phase shift layer capable of giving a phase difference of 180 ° to any light, the step of forming the phase shift layer in multiple stages, and the phase shift layer And patterning the phase shift layer to form a phase shift pattern so that the phase shift layer and the transparent substrate have a boundary portion in plan view, and at least the phase shift layer The uppermost layer to be formed is characterized by having an oxygen content higher than that of the lower layer facing the uppermost layer.

The uppermost layer constituting the phase shift layer is characterized in that the oxygen content is made larger than the layer below it.

The layer below the uppermost layer constituting the phase shift layer is characterized in that the oxygen content is increased as the layer is closer to the uppermost layer.

Among the phase shift layers, the layer facing the uppermost layer is characterized by having a lower oxygen content than the layer facing it.

The method further includes the step of forming a light shielding layer mainly composed of Cr on the transparent substrate.

The phase shift layer is characterized in that at least the uppermost layer has a lower nitrogen content than the lower layer facing it.

In the phase shift layer forming step, by setting the content of the CO ₂ gas in the film forming atmosphere gas, the oxygen content of the uppermost layer is made higher than the layers below it. Features.

In the phase shift layer, the oxygen content is controlled so that the reflectance of the uppermost layer is 19% or less.

In the phase shift layer, the thicknesses of the layers correspond to each other so that lights having different wavelengths have a phase difference.

A phase shift mask according to another aspect of the present invention is mainly formed of a transparent substrate and Cr having a portion formed at a constant thickness on the surface of the transparent substrate, overlaid on the transparent substrate, and having a thickness of 300 nm or more. A phase shift mask having a phase shift layer capable of giving a phase difference of 180 ° to any light in a wavelength region of 500 nm or less, wherein the phase shift layer has a boundary in plan view with the transparent substrate A phase shift pattern having a portion is formed, and has a region in which the thickness of the layer is changed in multiple stages at a boundary portion between the phase shift layer and the transparent substrate in plan view, and constitutes the phase shift layer The uppermost layer constituting the shift layer is characterized by having a higher oxygen content than the lower layer facing it.

The thickness of the phase shift layer corresponds to a phase difference of 180 ° in at least one of g-line, h-line, and i-line.

An apparatus for manufacturing a phase shift mask used in the method for manufacturing a phase shift mask according to any one of the above items, wherein the phase shift layer includes a plurality of film forming chambers that individually form the stages constituting the phase shift layer, Among these, the film formation chamber for forming the uppermost layer is controlled so that the content of CO ₂ gas in the film formation atmosphere gas is higher than the film formation chamber for forming the lower layer. It is characterized by.

According to the aspect of the present invention, at least the uppermost layer constituting the phase shift layer has a higher oxygen content than the lower layer facing it. Thus, the reflectance of the uppermost phase shift layer on the exposure light incident side is reduced. Therefore, it is possible to reduce the reflected light reflected by the phase shift mask, prevent a decrease in pattern formation accuracy due to the reflected light, and enable a fine and highly accurate pattern formation.

It is a principal part expanded sectional view which shows the phase shift mask of this invention. It is sectional drawing which shows the manufacturing method of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is sectional drawing and a table | surface which show the example of formation of the phase shift mask of this invention. It is a schematic block diagram which shows the manufacturing apparatus of the phase shift mask of this invention. It is the graph which verified the effect of the phase shift mask of this invention.

Embodiments and examples of the present invention will be described with reference to the drawings, and the present invention will be described in more detail. However, the present invention is not limited to these embodiments and examples.
Also, in the description using the following drawings, it should be noted that the drawings are schematic and the ratio of each dimension and the like are different from the actual ones, and are necessary for the description for easy understanding. Illustrations other than the members are omitted as appropriate.

(Phase shift mask)
FIG. 1 is an enlarged cross-sectional view of a main part showing the phase shift mask of the present embodiment.
The phase shift mask 10 of this embodiment includes a glass substrate (transparent substrate) 11 and a phase shift layer 12 formed on the one surface 11 a side of the glass substrate 11. The phase shift layer 12 has a phase shift pattern 12p capable of giving a phase difference of 180 ° in a region of 300 to 500 nm, and is configured as a patterning mask for an FPD glass substrate, for example. As will be described later, for the patterning of the glass substrate using the mask, a composite wavelength of i-line, h-line and g-line is used for exposure light.

The phase shift mask 10 has a thickness of the phase shift pattern 12p at the boundary portion B1 between the portion C where the glass substrate 11 is exposed in plan view and the formed phase shift pattern 12p in the exposure region where the exposure pattern is formed. Has a uniform thickness region B1a having a constant value T12, and a multi-step region B1b in which the thickness decreases from T12. Such a multi-stage region B1b is obtained by laminating a plurality of thin layers 12a to 12h, that is, eight layers in this embodiment, and shortening the end portion stepwise. The edge part of such multistage area | region B1b has comprised the substantially inclined surface (inclined area | region) when it sees as a whole. The multistage region B1b is formed by, for example, wet etching the end portions of the layers 12a to 12h.
Note that the number of stacked layers is not limited to eight, and it is sufficient that at least two or more layers are provided. Furthermore, it is more effective if it has three or more stages.

In the uniform thickness region B1a, the boundary surfaces between the layers 12a to 12h of the phase shift layer 12 are not necessarily clear and may be formed integrally in the thickness direction. In the following description, the entire layer in which the layers 12a to 12h of the thin phase shift layer 12 are stacked will be described as the phase shift layer 12.

As the transparent substrate 11, a material excellent in transparency and optical isotropy is used, and for example, a quartz glass substrate can be used. The size of the transparent substrate 11 is not particularly limited, and is appropriately selected according to a substrate (for example, an FPD substrate or a semiconductor substrate) to be exposed using the mask. In this embodiment, the present invention can be applied to a substrate having a diameter of about 100 mm, a rectangular substrate having a side of about 50 to 100 mm to a side of 300 mm or more, and further, a quartz substrate having a length of 450 mm, a width of 550 mm, and a thickness of 8 mm, A substrate having a thickness of 1000 mm or more and a thickness of 10 mm or more can also be used.

Further, the flatness of the transparent substrate 11 may be improved by polishing the surface of the transparent substrate 11. The flatness of the transparent substrate 11 can be set to 20 μm or less, for example. As a result, the depth of focus of the mask is increased, and it is possible to greatly contribute to the formation of a fine and highly accurate pattern. Further, the flatness is preferably as small as 10 μm or less.

The phase shift layer 12 is mainly composed of Cr (chromium), specifically, Cr alone, and oxides, nitrides, carbides, oxynitrides, carbonitrides, and oxycarbonitrides of Cr. It is also possible to configure at least one selected from the above, or to stack two or more selected from these.

The phase shift mask 10 of the present embodiment can be configured as a patterning mask for an FPD glass substrate, for example. As will be described later, for the patterning of the glass substrate using the mask, a composite wavelength of i-line, h-line and g-line is used for exposure light.

The total thickness of the layers 12a to 12h constituting the phase shift layer 12 is any light in a wavelength region of 300 nm to 500 nm, which is a general wavelength as exposure light (for example, i-line with a wavelength of 365 nm, a wavelength of 436 nm (g-line, h-line having a wavelength of 405 nm) with a thickness (for example, 90 to 170 nm) capable of giving a phase difference of about 180 °. In the following description, exposure light refers to light having a wavelength shorter than the g-line having a wavelength of 436 nm, for example, light having a wavelength of 300 nm to 500 nm.

The phase shift layer 12 is, for example, a layer in which thin layers 12a to 12h having a thickness of about several nanometers to several tens of nanometers are stacked stepwise, and the thicknesses of the respective layers 12a to 12h may be the same. And may be different. Alternatively, the thicknesses of the layers 12a to 12h may be gradually reduced as going upward from the one surface 11a of the transparent substrate 11.

Each of the layers 12a to 12h has a different oxygen content. Among the layers 12a to 12h, the layer 12a positioned at the uppermost layer has an interfering wave caused by reflected light reaching the resist film of the flat panel in the flat panel manufacturing process than the layers 12b to 12h positioned below it. The reflectance with respect to exposure light is set low so that the formation of a fine pattern does not become difficult. Moreover, in the phase shift layer 12, the reflectance with respect to exposure light can be set lower in the layer positioned higher by setting the oxygen content. For example, the reflectance with respect to the exposure light is the lowest in the layer 12a, then the layer 12b is lower, and the layers 12c to 12h below it have a higher reflectance than the layer 12b.

Moreover, in the layer 12c from the uppermost layer 12a to the third layer 12c by setting the oxygen content of each layer of the phase shift layer 12, the uppermost layer 12a has the highest oxygen content, the third layer 12c is higher than the second layer 12b, When the second layer 12b is set to the lowest level, the reflectance of each layer is the lowest for the uppermost layer 12a, the third layer 12c is the next lowest, and the intermediate layer 12b is the highest.
Furthermore, when the oxygen content of the uppermost layer 12a is the second highest, the second layer 12b is the third highest, and the third layer 12c is the highest, the reflectance of each layer is the second lowest, The second layer 12b is the highest and the third layer 12c is the lowest.
The layer 12a on the exposure light incident side is formed to have a reflectance of 19% or less, for example.

The reflectance of each of the layers 12a to 12h with respect to the exposure light varies depending on the oxygen content. Specifically, when the respective layers 12a to 12h are formed, the higher the oxygen concentration in the film formation environment, the lower the reflectance with respect to the exposure light. As a method for increasing the oxygen concentration in the film formation environment, increasing the CO ₂ concentration as an oxygen supply source can be mentioned.

Also, the reflectivity of each of the layers 12a to 12h with respect to the exposure light varies depending on the nitrogen content. Specifically, when the respective layers 12a to 12h are formed, the lower the nitrogen concentration in the film formation environment, the lower the reflectance with respect to the exposure light.

Due to such characteristics, the layer 12a located at the uppermost layer among the layers 12a to 12h has a higher oxygen content than the lower layers 12b to 12h. Also, in the layers 12b to 12h, the oxygen content is higher in the upper layer. For example, the oxygen content of each layer is the highest in the layer 12a, then the layer 12b, and the lower layers 12c to 12h have a lower oxygen content than the layer 12b.

The oxygen content other than the uppermost layer is not limited to the above, and the uppermost layer 12a may be set higher than the next layer 12b. There are cases where the oxygen content can be set higher in the order of the third layer 12c, the uppermost layer 12a and the second layer 12b in the order of the uppermost layer 12a, the third layer 12c and the second layer 12b in the three layers from the uppermost layer. The lower layer can be appropriately selected by setting the pattern profile of the phase shift layer 12.

Due to such characteristics, among the layers 12a to 12h, the uppermost layer 12a has a higher oxygen content than the lower layers 12b to 12h. Also, in the layers 12b to 12h, the oxygen content is higher in the upper layer. For example, the oxygen content of each layer is the highest in the layer 12a, then the layer 12b, and the layers 12c to 12h below it have a lower oxygen content than the layer 12b.

Further, the uppermost layer 12a only needs to have a higher oxygen content than the second layer 12b, and is not limited to the above. For example, in the three layers from the uppermost layer 12a, the uppermost layer 12a is the highest, and may be higher in the order of the third layer 12c and the second layer 12b, or in the order of the third layer 12c, the uppermost layer 12a, and the second layer 12b. It may be high.

The method for forming the phase shift layer 12 having such a multistage region B1b will be described in detail in the manufacturing method. For example, the phase shift layer 12 can be formed by sputtering, electron beam vapor deposition, laser vapor deposition, ALD, or the like.

In the phase shift pattern 12p, the thickness T12 in the uniform thickness region B1a is equal to the thickness of the phase shift pattern 12p other than the boundary portion B1. The thickness T12 is a value corresponding to a thickness Tg (for example, 145.0 nm) at which the light intensity corresponding to the g line becomes zero, for example. Alternatively, the thickness T12 of the phase shift layer 12 can be set to a value larger than Tg, and the thickness corresponding to Th and Ti can be positioned in the inclined region (multistage region B1b). In addition, the film thickness may be a film thickness Th (for example, 133.0 nm) corresponding to the h line or a film thickness Ti (for example, 120.0 nm) corresponding to the i line. When the thickness T12 is the film thickness Th corresponding to the h line, the film thickness corresponding to Ti can be positioned in the inclined region (multistage region) B1b.

The phase shift pattern 12p can also be formed such that the thickness changes stepwise in the multistage region B1b. Specifically, the width direction of the multi-stage region B1b is the end of the exposed portion C (the portion where the glass substrate 11 is exposed when the thickness of the phase shift layer is zero) from the end 12t of the thickness T12 of the phase shift pattern 12p. Up to 12u. Here, the width dimension of the multi-stage region B1b is set with respect to the direction in which the thickness decreases.
Further, the film thickness setting in each layer constituting the phase shift pattern is not limited to the above description, and can take various forms.

The multi-stage region B1b has a thickness corresponding to a thickness Th (eg, 133.0 nm) at which the light intensity corresponding to the h line becomes zero and a thickness at which the light intensity corresponding to the i-line becomes zero on the surface of the multi-stage area B1b. It is also possible to have a portion having a thickness corresponding to the thickness Ti (for example, 120.0 nm). The layers 12a to 12h of the phase shift layer 12 are formed so that the portions where the thickness Tg, the thickness Th, and the thickness Ti are within a predetermined range, respectively. Further, Th and Ti may not be included in the profile of the pattern edge through which light passes.
Furthermore, when the film thickness is set to Th, the film thickness of Ti can be included. Furthermore, the Ti film thickness may not be included in the profile of the pattern edge through which light passes.

According to the phase shift mask 10 of the present embodiment configured as described above, of the exposure light irradiated toward the phase shift mask 10 when exposing a mask pattern for forming a fine wiring pattern, The ratio of the exposure light reflected by the surface of the phase shift layer 12 which forms the incident light incident side can be reduced. That is, the reflection of exposure light on the surface of the phase shift layer 12 is increased by increasing the oxygen content of the uppermost layer 12a among the phase shift layers 12 formed in multiple stages to be lower than the layers 12b to 12h below it. The rate can be reliably reduced. For example, in the conventional phase shift mask, the reflectance of the exposure light of the phase shift layer 12 is 20% or more, but in the phase shift mask 10 of the present embodiment, the reflectance of the exposure light is 19% or less, for example, 14 %. Therefore, it is possible to prevent a decrease in pattern formation accuracy due to reflected light and to form a fine and highly accurate pattern. Thereby, a high-quality flat panel display can be manufactured.

Also, in the layers 12b to 12h below the uppermost layer 12a having the highest oxygen content and low reflectance, by increasing the oxygen content next to the layer 12a in the layers 12b and 12c close to the layer 12a, The reflectance with respect to the exposure light of the layers 12b and 12c located immediately below the uppermost layer 12a can also be reduced. Thereby, the reflectance with respect to the exposure light of the surface of the phase shift layer 12 can be reduced more reliably.

If the oxygen content of the uppermost layer 12a is higher than that of the next layer 12b, an effect will occur. Specifically, the oxygen content in the three layers from the uppermost layer 12a is higher in the order of the uppermost layer 12a, the third layer 12c, and the second layer 12b, and in the order of the third layer 12c, the uppermost layer 12a, and the second layer 12b. Even when is set high, the reflectance with respect to the exposure light can be reduced.

Furthermore, the reflectance of the exposure light can be further reduced by increasing the oxygen content of the uppermost layer 12a over the lower layers 12b to 12h and simultaneously reducing the nitrogen content.

(Phase shift mask manufacturing method)
Hereinafter, a method of manufacturing a phase shift mask for manufacturing the phase shift mask 10 of the present embodiment will be described.
FIG. 2 is a cross-sectional view showing the phase shift mask manufacturing method according to the present embodiment step by step.
As shown in FIG. 2 (j), the phase shift mask 10 of the present embodiment has alignment marks for alignment on the outer periphery of the exposure region, and this alignment mark is formed of a light shielding layer 13a. . As described above, the light shielding layer 13a for the alignment mark may be provided, but the light shielding layer 13a for the alignment mark may not be provided, and the alignment mark may be a semi-transmissive film including only the phase shift layer 12.

First, as shown in FIG. 2A, a light shielding layer 13 mainly composed of Cr is formed on one surface 11a of the glass substrate 11. Next, as shown in FIG. 2B, a photoresist layer 14 is formed on the light shielding layer 13. The photoresist layer 14 may be a positive type or a negative type.

Subsequently, as shown in FIG. 2C, the photoresist layer 14 is exposed and developed to form a resist pattern 14a on the light shielding layer 13. The resist pattern 14 a functions as an etching mask for the light shielding layer 13, and the shape is appropriately determined according to the etching pattern of the light shielding layer 13. FIG. 2C shows an example in which a resist pattern 14 a is formed so that the light shielding layer 13 remains in a predetermined range of the periphery of the glass substrate 11. As the photoresist layer 14, a liquid resist is used.

Subsequently, as shown in FIG. 2D, the light shielding layer 13 is wet etched using the first etching solution over the resist pattern 14a. As the first etching solution, an etching solution containing cerium diammonium nitrate can be used. For example, cerium diammonium nitrate containing an acid such as nitric acid or perchloric acid is preferably used.

Thereby, the light shielding layer 13 a patterned in a predetermined shape is formed on the one surface 11 a of the glass substrate 11. After the patterning of the light shielding layer 13a, the resist pattern 14a is removed as shown in FIG. For example, a sodium hydroxide aqueous solution can be used for removing the resist pattern 14a.

Next, the phase shift layer 12 is formed. As shown in FIG. 2F, the phase shift layer 12 is formed on the one surface 11a of the glass substrate 11 so as to cover the light shielding layer 13a. The phase shift layer 12 is made of a chromium oxynitride material and is formed by a DC sputtering method. In this case, a mixed gas of a nitriding gas and an oxidizing gas, or a mixed gas of an inert gas, a nitriding gas, and an oxidizing gas can be used as the process gas. The film forming pressure can be set to 0.1 Pa to 0.5 Pa, for example. As the inert gas, halogen, especially argon can be applied.

As the oxidizing gas, CO, CO ₂ , NO, N ₂ O, NO ₂ , O ₂ or the like can be used. As the nitriding gas, NO, N ₂ O, NO ₂ , N ₂ or the like can be used. In the present embodiment, for example, CO ₂ is used. By controlling the flow rate of CO ₂ , the oxygen content of the phase shift layer 12 is controlled. Alternatively, the oxygen content of the phase shift layer 12 can also be controlled by controlling the CO ₂ concentration. Ar, He, Xe or the like is used as the inert gas, but typically Ar is used. Note that the mixed gas may further contain a carbonizing gas such as CH ₄ .

In the formation (film formation) of the phase shift layer 12, as shown in FIG. 1, thin layers 12a to 12h each having a thickness of, for example, several nanometers to several tens of nanometers are laminated step by step. For example, first, the layer 12h is formed on the one surface 11a of the glass substrate 11, and then the layer 12g is formed on the layer 12h. Further, the layers 12f to 12a are sequentially stacked on the layer 12g.

As described above, when the phase shift layer 12 is formed in multiple stages, at least when the uppermost layer 12a is formed, the uppermost layer 12a is formed more than when the lower layers 12b to 12h are formed. So that the oxygen content incorporated into the gas is increased. For example, when the layer 12a of the phase shift layer 12 is formed, the CO ₂ flow rate is increased or the concentration is controlled to be higher than when the layers 12b to 12h below it are formed. By such control, the uppermost layer 12a has a higher oxygen content than the lower layers 12b to 12h.

Note that the oxygen content of each layer is not limited to the above, and the oxygen content of three layers from the uppermost layer 12a is illustrated as an example in the order of the uppermost layer 12a, the third layer 12c, and the second layer 12b. When the content increases, the oxygen content increases in the order of the third layer 12c, the uppermost layer 12a, and the second layer 12b. When the oxygen content increases in the order of the third layer 12c, the second layer 12b, and the uppermost layer 12a. It may be mentioned.

Further, when forming the layers 12b to 12h constituting the phase shift layer 12, the layers 12b to 12h (layers 12b and 12c) closer to the layer 12a have the CO ₂ content so that the oxygen content is increased next to the layer 12a. It is preferable to control the flow rate and concentration of the liquid.

When forming the layers 12a to 12h constituting the phase shift layer 12, for example, each layer may be formed one by one in correspondence with each of the layers 12a to 12h using eight film forming chambers. At this time, the deposition chamber for depositing the uppermost layer 12a may be controlled so that the flow rate of CO ₂ is increased or the concentration is increased.
In the example described above, the phase shift layer 12 is composed of eight layers. However, the phase shift layer 12 is not limited to eight layers, and the reflectance can be controlled as long as it is at least two layers. In the film forming apparatus, three or more layers may be used.
Alternatively, the layers 12a to 12h constituting the phase shift layer 12 are sequentially formed using one film forming chamber, and the flow rate of CO _{2 in} the film forming chamber is changed at the timing of forming the uppermost layer 12a. The number may be increased or the concentration may be controlled to be high.

The total thickness T12 of the formed phase shift layer 12 can have a phase difference of 180 ° with respect to the g-line, h-line, and i-line in the wavelength region of 300 nm or more and 500 nm or less in the multistage region B1b. Thickness. The light to which the phase difference of 180 ° is given is inverted in phase, so that the intensity of the light is canceled by the interference action with the light that does not pass through the phase shift layer 12. By such a phase shift effect, a region where the light intensity is minimum (for example, zero) is formed, so that the exposure pattern becomes clear and a fine pattern can be formed with high accuracy.

In the present embodiment, the light in the wavelength region is a composite light (polychromatic light) of i-line (wavelength 365 nm), h-line (wavelength 405 nm), and g-line (wavelength 436 nm). Thus, the phase shift layer 12 is formed with a thickness that can give a phase difference of 180 °. The light having the target wavelength may be any of i-line, h-line, and g-line, or light in a wavelength region other than these. As the light whose phase is to be inverted has a shorter wavelength, a finer pattern can be formed.
The film thickness of the phase shift layer 12 is preferably at least uniform in the exposure area in the surface of the transparent substrate 11 except for the boundary portion B1.

Further, the shape of the end of the multistage region B1b is set by setting the flow rate ratio of the oxidizing gas in the atmospheric gas as the film forming condition of the phase shift layer 12.
By adjusting the flow rate of the oxidizing gas at the time of forming the phase shift layer 12, the etching state in the phase shift layer 12 can be controlled to set the shape of the stepped inclined surface. Further, the profile of the pattern edge can be appropriately adjusted by controlling the oxidizing gas.

By controlling the inclination state of the profile of the pattern edge by the flow rate ratio of the oxidizing gas, and using a composite wavelength including g-line (436 nm), h-line (405 nm), and i-line (365 nm) as exposure light, The pattern contour is formed so that the light intensity is minimized by the phase reversal action, and the thickness change of the multi-stage region B1b of the boundary portion B1 can be set after etching so that the exposure pattern becomes thicker. be able to.

Subsequently, as shown in FIG. 2G, a photoresist layer 14 is formed on the layer 12a (see FIG. 1) constituting the phase shift layer 12. Next, as illustrated in FIG. 2H, the photoresist layer 14 is exposed and developed to form a resist pattern 14 a on the phase shift layer 12. The resist pattern 14 a functions as an etching mask for the phase shift layer 12, and the shape is appropriately determined according to the etching pattern of the phase shift layer 12.

Subsequently, the phase shift layer 12 is etched into a predetermined pattern shape. Thereby, as shown in FIG. 2I, the phase shift pattern 12p patterned into a predetermined shape and the exposed portion C of the glass substrate 11 are formed on the one surface 11a of the glass substrate 11. After patterning the phase shift layer 12, the resist pattern 14a is removed as shown in FIG. For example, a sodium hydroxide aqueous solution can be used for removing the resist pattern 14a. Through the above steps, the phase shift mask 10 of this embodiment can be obtained.

As mentioned above, although embodiment of this invention was described, of course, this invention is not limited to this, A various deformation | transformation is possible based on the technical idea of this invention. In particular, regarding the stepwise inclined state at the boundary portion B1 of the phase shift layer 12, various shapes can be used.
Hereinafter, in FIG. 3 to FIG. 10, examples of forming the boundary portion B1 of the phase shift layer 12 will be given. 3 to 10, the shape of the boundary portion B1 of the phase shift layer 12 and the layer configuration are shown on the right side. Further, the table on the left shows the flow rate and ratio of the deposition gas when forming each layer in each shape example, the film thickness, distance / film thickness, and reflectance of each layer. Note that the numbers indicating each layer in the shape diagram on the right side correspond to the number of layers on the left side. The number of layers is listed in order of the first layer and the second layer from the lower layer. The distance / film thickness is a value of (width of the inclined surface in plan view) / (thickness of the phase shift layer).

In FIG. 3, the phase shift layer 12 is composed of eight layers, and the end portions are gently inclined from the first layer to the upper eighth layer (uppermost layer).
In FIG. 4, the phase shift layer 12 is composed of two layers, the first layer having a large thickness and the second layer (the uppermost layer) having a small thickness are stacked thereon, and the end of the second layer is gently inclined. ing.
In FIG. 5, the phase shift layer 12 is composed of two layers, and the end portions of the thick first layer and the thin second layer (uppermost layer) thereon are gently inclined.
In FIG. 6, the phase shift layer 12 is composed of three layers, and the boundary portion between the thick first layer and the second layer is recessed, and the boundary portion between the thin third layer and the thick second layer. Is protruding.
In FIG. 7, the phase shift layer 12 is composed of three layers, the boundary between the thick first layer and the second layer is projected, and the gap between the thin third layer and the thick second layer is shown. It is gently inclined.
In FIG. 8, the phase shift layer 12 is composed of six layers, and a layer having a gradual inclination and a layer having a steep inclination are alternately stacked to make the first layer thicker than the other layers.
In FIG. 9, the phase shift layer 12 is composed of six layers, and a layer having a gradual inclination and a layer having a steep inclination are alternately overlapped to make the first layer thicker than the other layers.
In FIG. 10, the phase shift layer 12 is composed of three layers, the boundary portion between the thick first layer and the second layer is recessed, and the boundary portion between the thin third layer and the thick second layer. Is slightly protruding.

Note that this example is only an example, and the present invention is not limited to the above example. By setting various film formation conditions and the number of film formation layers other than the present example, the reflectance and It is possible to define the cross-sectional shape. Further, the distance / film thickness can be defined as a value of −3 ≦ (width of the inclined surface in plan view) / (thickness of the phase shift layer) ≦ 3 from the above embodiment. Further, it is possible to set −1 <(width of the inclined surface in plan view) / (thickness of the phase shift layer) <1 by adjusting the lamination form.

(Phase shift mask manufacturing equipment)
FIG. 11 is a schematic configuration diagram showing a phase shift mask manufacturing apparatus (film forming apparatus) that can be used when manufacturing the phase shift mask as shown in FIG.
The film forming apparatus (phase shift mask manufacturing apparatus) 50 includes, for example, eight film forming chambers 51a to 51h. A cathode 52 and the like are formed in each of the film forming chambers 51a to 51h. A gas supply mechanism 53 for supplying a film forming gas containing an oxidizing gas such as CO ₂ is formed in each of the film forming chambers 51a to 51h. The gas supply mechanism 53 includes a film forming gas source 54, a supply pipe 55, and the like.

The eight film forming chambers 51a to 51h form, for example, eight layers 12a to 12h (see FIG. 1) of the thin phase shift layer 12 constituting the phase shift layer 12, respectively. For example, the layer 12h of the phase shift layer 12 is first formed on the glass substrate 11 by the film formation chamber 51h. Next, the layer 12g of the phase shift layer 12 is formed by the film formation chamber 51g. Further, the layers 12f to 12b of the phase shift layer 12 are formed in the film forming chambers 51f to 51b, respectively. Finally, the layer 12a of the phase shift layer 12 that is the uppermost layer of the phase shift layer 12 is formed by the film formation chamber 51a.
The chamber is not limited to one corresponding to the eight phase shift layers 12. However, when the number of layers is very large, the manufacturing cost of the film forming apparatus is greatly increased.

Among these film forming chambers 51a to 51h, for example, the CO ₂ flow rate of the film forming chamber 51a for forming the layer 12a is controlled to be larger than the CO ₂ flow rates of the other seven film forming chambers 51b to 51h. . As a result, the uppermost layer 12a formed in the film forming chamber 51a has a higher oxygen content than the lower layers 12b to 12h.
Thereby, the reflectance of the uppermost layer 12a on the exposure light incident side is reduced.

In the layers 12b to 12h below the layer 12a, it is also preferable to control so that the CO ₂ flow rate increases in the film formation chambers 51b to 51h for forming the layers 12b to 12h close to the layer 12a. Further, the oxidizing gas such as CO ₂ may be configured to control the concentration control or both in addition to the flow rate control.

Further, the oxygen content of each layer is not limited to the above, and the oxygen content of three layers from the uppermost layer 12a is illustrated as an example in the order of the uppermost layer 12a, the third layer 12c, and the second layer 12b. When the content increases, the oxygen content increases in the order of the third layer 12c, the uppermost layer 12a, and the second layer 12b. When the oxygen content increases in the order of the third layer 12c, the second layer 12b, and the uppermost layer 12a. It may be mentioned.

In this embodiment, eight film forming chambers 51a to 51h are provided in accordance with the eight thin layers 12a to 12h constituting the phase shift layer 12. However, the number of stacks constituting the phase shift layer 12 is not necessarily limited. The number of deposition chambers need not match. For example, the number of deposition chambers can be selected as appropriate, for example, two layers are deposited in one deposition chamber.

The effect of the present invention was verified.
First, during the formation of the phase shift layer 12, a conventional phase shift mask was formed by CO ₂ flow rate (Example 1), phase shift masks (Embodiment was deposited by reducing the CO ₂ flow rate than conventional CO ₂ flow rate Example 2) and a phase shift mask (Example 3) each of which was formed by increasing the CO ₂ flow rate in comparison with the conventional CO ₂ flow rate were prepared. Then, measurement light was applied to these three types of phase shift masks, and the reflectance of each phase shift mask was measured. The wavelength range of the measurement light was changed from 300 nm to 800 nm.
FIG. 12 shows a graph of the verification result.

According to the graph shown in FIG. 12, light in a wavelength range of 300 nm to 500 nm, which is a wavelength range including i-line (wavelength 365 nm), h-line (wavelength 405 nm) and g-line (wavelength 436 nm) used as exposure light. On the other hand, the reflectivity of Example 2 was higher than that of Example 1. On the other hand, the reflectance of Example 3 which is an example of the present invention is lower than that of Example 1. From these results, the phase shift mask (Example 3) formed by increasing the CO ₂ flow rate increases the oxygen content of the phase shift layer 12, and as a result, for light in the wavelength range of 300 nm to 500 nm, It was confirmed that the reflectance can be greatly reduced.

According to the present embodiment, patterning on a flat panel using the phase shift mask of the present invention is performed using a phase shift mask having a conventional reflectance of 27.5% in the g-line and g in FIG. In the case of using the phase shift mask that was 14.8% in the line, it was found that a line width as fine as 30% can be formed in the case of using the phase shift mask of FIG.

As described above, some embodiments of the present invention have been described. However, the present invention is not limited to this, and can be appropriately changed without departing from the spirit of the invention.

10 Phase shift mask 11 Glass substrate (transparent substrate)
12 Phase shift layer (laminate)
12a to 12h layers (each layer constituting the phase shift layer)
13, 13a Light-shielding layer B1b Multi-stage region

Claims (12)

1. A transparent substrate;
   A phase having Cr as a main component and having a portion formed with a constant thickness on at least one surface side of the transparent substrate, and having a phase difference of 180 ° with respect to any light in a wavelength region of 300 nm to 500 nm. A phase shift mask having a shift layer,
   Forming the phase shift layer in multiple stages;
   Etching the phase shift layer to form the phase shift pattern by patterning the phase shift layer so that the phase shift layer and the transparent substrate have a boundary portion in plan view.
   The first layer located at the uppermost stage in the phase shift layer is characterized in that the oxygen content is higher than that of the second layer located under the first layer and facing the first layer. A method of manufacturing a phase shift mask.
2. 2. The phase shift mask according to claim 1, wherein the second layer of the phase shift layer has a lower oxygen content than a third layer facing the second layer. Method.
3. 2. The method of manufacturing a phase shift mask according to claim 1, wherein, among the phase shift layers, the first layer has an oxygen content higher than that of a layer below the first layer.
4. 2. The method of manufacturing a phase shift mask according to claim 1, wherein the oxygen content of the layer below the first layer in the phase shift layer is increased as the layer is closer to the first layer.
5. The method of manufacturing a phase shift mask according to claim 1, further comprising a step of forming a light shielding layer containing Cr as a main component on the transparent substrate.
6. 2. The method of manufacturing a phase shift mask according to claim 1, wherein at least the first layer of the phase shift layer has a lower nitrogen content than the second layer.
7. In the step of forming the phase shift layer, by setting the content of the CO ₂ gas in the film formation atmosphere gas, the content of the oxygen in the first layer is set to be lower than the layer below the first layer. 2. The method of manufacturing a phase shift mask according to claim 1, wherein the number is increased.
8. 2. The method of manufacturing a phase shift mask according to claim 1, wherein the oxygen content is controlled so that the reflectance of the first layer of the phase shift layer is 19% or less.
9. 2. The method of manufacturing a phase shift mask according to claim 1, wherein in the phase shift layer, the thickness of each layer corresponds so that light of different wavelengths has a phase difference.
10. It is manufactured by the method for manufacturing a phase shift mask according to any one of claims 1 to 8,
    A transparent substrate, which is formed so as to overlap with the transparent substrate and has at least a portion formed on the surface of the transparent substrate with a constant thickness as a main component, with respect to any light in a wavelength region of 300 nm to 500 nm A phase shift layer having a phase shift layer capable of having a phase difference of 180 °,
    In the phase shift layer, a phase shift pattern having a boundary portion in plan view with the transparent substrate is formed,
    In the boundary portion between the phase shift layer and the transparent substrate in plan view, it has a region where the thickness of the phase shift layer is changed in multiple stages,
    The phase shift layer is characterized in that the first layer located at the uppermost stage has a higher oxygen content than the second layer located below the first layer and facing the first layer. mask.
11. The phase shift mask according to claim 10, wherein the thickness of the phase shift layer corresponds to a phase difference of 180 ° in at least one of g-line, h-line, and i-line.
12. A phase shift mask manufacturing apparatus used in the phase shift mask manufacturing method according to any one of claims 1 to 9,
    A plurality of film forming chambers for individually forming the stages constituting the phase shift layer, and the film forming chamber for forming the uppermost layer of the phase shift layers is located below the uppermost layer; An apparatus for manufacturing a phase shift mask, characterized in that control is performed such that the content of CO ₂ gas in a deposition atmosphere gas is larger than in a deposition chamber in which a layer is formed.

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