WO2014017484A1 - Light emitting element material and light emitting element - Google Patents
Light emitting element material and light emitting element Download PDFInfo
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- WO2014017484A1 WO2014017484A1 PCT/JP2013/069910 JP2013069910W WO2014017484A1 WO 2014017484 A1 WO2014017484 A1 WO 2014017484A1 JP 2013069910 W JP2013069910 W JP 2013069910W WO 2014017484 A1 WO2014017484 A1 WO 2014017484A1
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- light emitting
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- 0 Cc1c(*)c(-c2c(*3*)c(*)c(*)c(*)c2*)c3c(*)c1* Chemical compound Cc1c(*)c(-c2c(*3*)c(*)c(*)c(*)c2*)c3c(*)c1* 0.000 description 2
- ULIZSSSZWGKHRO-UHFFFAOYSA-N Cc1cc(-[n]2c(ccc(-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c3)c3c3ccccc23)cc(-c2cc(cccc3)c3cc2)c1 Chemical compound Cc1cc(-[n]2c(ccc(-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c3)c3c3ccccc23)cc(-c2cc(cccc3)c3cc2)c1 ULIZSSSZWGKHRO-UHFFFAOYSA-N 0.000 description 1
- KTGDHUYDWBMSMR-UHFFFAOYSA-N Cc1cc(-c(cc2)ccc2-c2ccccc2)cc(-[n](c(cccc2)c2c2c3)c2ccc3-c(cc2c3c4cccc3)ccc2[n]4-c2ccccc2)c1 Chemical compound Cc1cc(-c(cc2)ccc2-c2ccccc2)cc(-[n](c(cccc2)c2c2c3)c2ccc3-c(cc2c3c4cccc3)ccc2[n]4-c2ccccc2)c1 KTGDHUYDWBMSMR-UHFFFAOYSA-N 0.000 description 1
- MPJMNVNEILDOCK-UHFFFAOYSA-N Fc1cc(-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)cc(-c(cc2)ccc2-c2ccccc2)c1 Chemical compound Fc1cc(-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)cc(-c(cc2)ccc2-c2ccccc2)c1 MPJMNVNEILDOCK-UHFFFAOYSA-N 0.000 description 1
- FOTTWXAOBNTMKT-UHFFFAOYSA-N Fc1cc(-c2ccc(cccc3)c3c2)cc(-[n]2c(ccc(-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c3)c3c3c2cccc3)c1 Chemical compound Fc1cc(-c2ccc(cccc3)c3c2)cc(-[n]2c(ccc(-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c3)c3c3c2cccc3)c1 FOTTWXAOBNTMKT-UHFFFAOYSA-N 0.000 description 1
- MHVNOVXQBTUIPV-UHFFFAOYSA-N c(cc1)ccc1-[n]1c(ccc(-c(cc2c3ccccc33)ccc2[n]3-c2cc(-c(cc3)ccc3-c3c(cccc4)c4ccc3)ccc2)c2)c2c2ccccc12 Chemical compound c(cc1)ccc1-[n]1c(ccc(-c(cc2c3ccccc33)ccc2[n]3-c2cc(-c(cc3)ccc3-c3c(cccc4)c4ccc3)ccc2)c2)c2c2ccccc12 MHVNOVXQBTUIPV-UHFFFAOYSA-N 0.000 description 1
- RQLOWRMBZQSORN-UHFFFAOYSA-N c(cc1)ccc1-[n]1c(ccc(-c(cc2c3ccccc33)ccc2[n]3-c2cc(-c3cccc4c3cccc4)ccc2)c2)c2c2ccccc12 Chemical compound c(cc1)ccc1-[n]1c(ccc(-c(cc2c3ccccc33)ccc2[n]3-c2cc(-c3cccc4c3cccc4)ccc2)c2)c2c2ccccc12 RQLOWRMBZQSORN-UHFFFAOYSA-N 0.000 description 1
- XLSVMBRTBBQLQU-UHFFFAOYSA-N c(cc1)ccc1-[n]1c(ccc(-c(cc2c3ccccc33)ccc2[n]3-c2cccc(-c3ccc(cccc4)c4c3)c2)c2)c2c2ccccc12 Chemical compound c(cc1)ccc1-[n]1c(ccc(-c(cc2c3ccccc33)ccc2[n]3-c2cccc(-c3ccc(cccc4)c4c3)c2)c2)c2c2ccccc12 XLSVMBRTBBQLQU-UHFFFAOYSA-N 0.000 description 1
- WZAKMOUIQWRNOI-UHFFFAOYSA-N c(cc1)ccc1-c(cc1)ccc1-c1c(cccc2)c2nc(-[n]2c(ccc(-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c3)c3c3c2cccc3)n1 Chemical compound c(cc1)ccc1-c(cc1)ccc1-c1c(cccc2)c2nc(-[n]2c(ccc(-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c3)c3c3c2cccc3)n1 WZAKMOUIQWRNOI-UHFFFAOYSA-N 0.000 description 1
- IEZLAYCKYNOJQS-UHFFFAOYSA-N c(cc1)ccc1-c(cc1)ccc1-c1cccc(-[n](c(cccc2)c2c2c3)c2ccc3-c(cc2c3ccccc33)ccc2[n]3-c2ccccc2)c1 Chemical compound c(cc1)ccc1-c(cc1)ccc1-c1cccc(-[n](c(cccc2)c2c2c3)c2ccc3-c(cc2c3ccccc33)ccc2[n]3-c2ccccc2)c1 IEZLAYCKYNOJQS-UHFFFAOYSA-N 0.000 description 1
- FFXNLCPZAUQIEX-UHFFFAOYSA-N c(cc1)ccc1-c(cccc1)c1-c1cccc(-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)c1 Chemical compound c(cc1)ccc1-c(cccc1)c1-c1cccc(-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)c1 FFXNLCPZAUQIEX-UHFFFAOYSA-N 0.000 description 1
- PDSLHFABDXICGU-UHFFFAOYSA-N c(cc1)ccc1-c1cc(-[n]2c3ccc(c4ccccc4[n]4-c(cc5)ccc5-c5nc(-c6ccccc6)nc(-c6ccccc6)n5)c4c3c3c2cccc3)ccc1 Chemical compound c(cc1)ccc1-c1cc(-[n]2c3ccc(c4ccccc4[n]4-c(cc5)ccc5-c5nc(-c6ccccc6)nc(-c6ccccc6)n5)c4c3c3c2cccc3)ccc1 PDSLHFABDXICGU-UHFFFAOYSA-N 0.000 description 1
- FRGCXEZJOOQXND-UHFFFAOYSA-N c(cc1)ccc1-c1cc(-c2cccc(-[n](c3ccccc3c3c4)c3ccc4-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c2)cc(-c2ccccc2)c1 Chemical compound c(cc1)ccc1-c1cc(-c2cccc(-[n](c3ccccc3c3c4)c3ccc4-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c2)cc(-c2ccccc2)c1 FRGCXEZJOOQXND-UHFFFAOYSA-N 0.000 description 1
- BSHHZSLLBWJSHC-UHFFFAOYSA-N c(cc1)ccc1-c1cccc(-c2cccc(-[n](c3ccccc3c3c4)c3ccc4-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c2)c1 Chemical compound c(cc1)ccc1-c1cccc(-c2cccc(-[n](c3ccccc3c3c4)c3ccc4-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c2)c1 BSHHZSLLBWJSHC-UHFFFAOYSA-N 0.000 description 1
- HQVKVVMERZEIPZ-UHFFFAOYSA-N c(cc1)ccc1-c1cccc(-c2ccccc2)c1-c1cccc(-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)c1 Chemical compound c(cc1)ccc1-c1cccc(-c2ccccc2)c1-c1cccc(-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)c1 HQVKVVMERZEIPZ-UHFFFAOYSA-N 0.000 description 1
- VUVVZEKUAQIAHO-UHFFFAOYSA-N c(cc1)ccc1-c1nc(-[n]2c3ccc(c4ccccc4[n]4-c5ccccc5)c4c3c3c2cccc3)nc(-c2ccccc2)n1 Chemical compound c(cc1)ccc1-c1nc(-[n]2c3ccc(c4ccccc4[n]4-c5ccccc5)c4c3c3c2cccc3)nc(-c2ccccc2)n1 VUVVZEKUAQIAHO-UHFFFAOYSA-N 0.000 description 1
- VBJWDGGEJNGTET-UHFFFAOYSA-N c(cc1)ccc1-c1nc(-c2ccccc2)nc(-[n](c2ccccc2c2ccc3c4ccccc44)c2c3[n]4-c2ccccc2)n1 Chemical compound c(cc1)ccc1-c1nc(-c2ccccc2)nc(-[n](c2ccccc2c2ccc3c4ccccc44)c2c3[n]4-c2ccccc2)n1 VBJWDGGEJNGTET-UHFFFAOYSA-N 0.000 description 1
- JKBXUNRHCKPITE-UHFFFAOYSA-N c(cc1)ccc1-c1nc(-c2ccccc2)nc(-[n]2c(cc(cc3)-c(cc4)cc(c5ccccc55)c4[n]5-c4ccccc4)c3c3c2cccc3)n1 Chemical compound c(cc1)ccc1-c1nc(-c2ccccc2)nc(-[n]2c(cc(cc3)-c(cc4)cc(c5ccccc55)c4[n]5-c4ccccc4)c3c3c2cccc3)n1 JKBXUNRHCKPITE-UHFFFAOYSA-N 0.000 description 1
- QVSJCRDHNCCXFC-UHFFFAOYSA-N c(cc1)ccc1-c1nc(-c2ccccc2)nc(-c(cc2)ccc2-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)n1 Chemical compound c(cc1)ccc1-c1nc(-c2ccccc2)nc(-c(cc2)ccc2-[n](c2ccccc2c2c3)c2ccc3-c(cc2)cc(c3ccccc33)c2[n]3-c2ccccc2)n1 QVSJCRDHNCCXFC-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/654—Aromatic compounds comprising a hetero atom comprising only nitrogen as heteroatom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
- H10K2101/10—Triplet emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
- H10K50/156—Hole transporting layers comprising a multilayered structure
Definitions
- the present invention relates to a light emitting element capable of converting electric energy into light and a light emitting element material used therefor. More specifically, the present invention relates to a light-emitting element that can be used in the fields of display elements, flat panel displays, backlights, lighting, interiors, signs, signboards, electrophotographic machines, optical signal generators, and light-emitting element materials used therefor. .
- This light emitting element is characterized by thin light emission with high luminance under a low driving voltage and multicolor light emission by selecting a fluorescent material.
- the driving voltage of the element depends greatly on the carrier transport material that transports carriers such as holes and electrons to the light emitting layer.
- materials having a carbazole skeleton are known as materials that transport holes (hole transport materials) (see, for example, Patent Documents 1 to 3).
- the material having the carbazole skeleton has a high triplet level, it is known as a host material for a light-emitting layer (see, for example, Patent Document 4).
- An object of the present invention is to provide an organic thin film light emitting device that solves the problems of the prior art and has improved luminous efficiency and durability.
- the present invention is a light emitting device material comprising a compound having a carbazole skeleton represented by the following general formula (1).
- R 1 to R 8 may be the same or different and each represents hydrogen, an alkyl group, a cycloalkyl group, a heterocyclic group, an alkenyl group, a cycloalkenyl group, an alkynyl group, an alkoxy group, an alkylthio group, an aryl ether group, an aryl thioether Group, aryl group, heteroaryl group, halogen, carbonyl group, carboxyl group, oxycarbonyl group, carbamoyl group, amino group, silyl group and —P ( ⁇ O) R 9 R 10 and the following general formula (3) Selected from the group consisting of R 9 and R 10 are an aryl group or a heteroaryl group.
- any one of R 1 to R 8 is a group represented by the following general formula (3), and is linked to any position among R 13 to R 21 in the general formula (3).
- R 1 to R 8 do not include a dibenzofuran skeleton, a dibenzothiophene skeleton, and a carbazole skeleton except for the group represented by the general formula (3).
- R 1 to R 10 do not include an anthracene skeleton or a pyrene skeleton.
- A is a group represented by the following general formula (2).
- R 101 to R 105 may be the same or different and each represents a ring structure formed between hydrogen, a substituted or unsubstituted aryl group, or an adjacent substituent. However, at least one of R 101 to R 105 is a ring structure formed between a substituted or unsubstituted aryl group or an adjacent substituent. Note that R 101 to R 105 do not include an anthracene skeleton and a pyrene skeleton.
- Each of n R 106 is independently selected from the group consisting of an alkyl group, a cycloalkyl group, an alkoxy group, an alkylthio group, and a halogen. n is an integer of 0-4.
- R 13 to R 21 may be the same or different from each other, and may be hydrogen, alkyl group, cycloalkyl group, heterocyclic group, alkenyl group, cycloalkenyl group, alkynyl group, alkoxy group, alkylthio group, aryl ether group, aryl thioether Selected from the group consisting of a group, an aryl group, a halogen, a carbonyl group, a carboxyl group, an oxycarbonyl group, a carbamoyl group, an amino group, a silyl group, and —P ( ⁇ O) R 22 R 23 .
- R 22 and R 23 are an aryl group or a heteroaryl group.
- any one of R 13 to R 21 is connected to any position among R 1 to R 8 in the general formula (1).
- R 13 to R 21 do not include a dibenzofuran skeleton, a dibenzothiophene skeleton, and a carbazole skeleton, except when linked to any position among R 1 to R 8 in the general formula (1).
- R 13 to R 23 do not include an anthracene skeleton and a pyrene skeleton.
- an organic electroluminescent device having high luminous efficiency and further having a sufficient durability life.
- R 1 to R 8 may be the same or different and each represents hydrogen, an alkyl group, a cycloalkyl group, a heterocyclic group, an alkenyl group, a cycloalkenyl group, an alkynyl group, an alkoxy group, an alkylthio group, an aryl ether group, an aryl thioether Group, aryl group, heteroaryl group, halogen, carbonyl group, carboxyl group, oxycarbonyl group, carbamoyl group, amino group, silyl group and —P ( ⁇ O) R 9 R 10 and the following general formula (3) Selected from the group consisting of R 9 and R 10 are an aryl group or a heteroaryl group.
- any one of R 1 to R 8 is a group represented by the following general formula (3), and is linked to any position among R 13 to R 21 in the general formula (3).
- R 1 to R 8 do not include a dibenzofuran skeleton, a dibenzothiophene skeleton, and a carbazole skeleton except for the group represented by the general formula (3).
- R 1 to R 10 do not include an anthracene skeleton or a pyrene skeleton.
- A is a group represented by the following general formula (2).
- R 101 to R 105 may be the same or different and each represents a ring structure formed between hydrogen, a substituted or unsubstituted aryl group, or an adjacent substituent. However, at least one of R 101 to R 105 is a ring structure formed between a substituted or unsubstituted aryl group or an adjacent substituent. Note that R 101 to R 105 do not include an anthracene skeleton and a pyrene skeleton.
- Each of n R 106 is independently selected from the group consisting of an alkyl group, a cycloalkyl group, an alkoxy group, an alkylthio group, and a halogen. n is an integer of 0-4.
- R 13 to R 21 may be the same or different from each other, and may be hydrogen, alkyl group, cycloalkyl group, heterocyclic group, alkenyl group, cycloalkenyl group, alkynyl group, alkoxy group, alkylthio group, aryl ether group, aryl thioether Selected from the group consisting of a group, an aryl group, a halogen, a carbonyl group, a carboxyl group, an oxycarbonyl group, a carbamoyl group, an amino group, a silyl group, and —P ( ⁇ O) R 22 R 23 .
- R 22 and R 23 are an aryl group or a heteroaryl group.
- any one of R 13 to R 21 is connected to any position among R 1 to R 8 in the general formula (1).
- R 13 to R 21 do not include a dibenzofuran skeleton, a dibenzothiophene skeleton, and a carbazole skeleton, except when linked to any position among R 1 to R 8 in the general formula (1).
- R 13 to R 23 do not include an anthracene skeleton and a pyrene skeleton.
- hydrogen may be deuterium.
- hydrogen contained in each group demonstrated below may also be deuterium.
- the alkyl group represents, for example, a saturated aliphatic hydrocarbon group such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, or a tert-butyl group, which is a substituent. It may or may not have. There is no restriction
- the number of carbon atoms of the alkyl group is not particularly limited, but is usually in the range of 1 to 20 and more preferably 1 to 8 from the viewpoint of availability and cost.
- the cycloalkyl group represents, for example, a saturated alicyclic hydrocarbon group such as cyclopropyl, cyclohexyl, norbornyl, adamantyl, etc., which may or may not have a substituent.
- carbon number of an alkyl group part is not specifically limited, Usually, it is the range of 3-20.
- the heterocyclic group refers to an aliphatic ring having atoms other than carbon, such as a pyran ring, a piperidine ring, and a cyclic amide, in the ring, which may or may not have a substituent. .
- carbon number of a heterocyclic group is not specifically limited, Usually, it is the range of 2-20.
- alkenyl group refers to an unsaturated aliphatic hydrocarbon group containing a double bond such as a vinyl group, an allyl group, or a butadienyl group, which may or may not have a substituent.
- carbon number of an alkenyl group is not specifically limited, Usually, it is the range of 2-20.
- the cycloalkenyl group refers to an unsaturated alicyclic hydrocarbon group containing a double bond such as a cyclopentenyl group, a cyclopentadienyl group, or a cyclohexenyl group, which may have a substituent. You don't have to. Although carbon number of a cycloalkenyl group is not specifically limited, Usually, it is the range of 2-20.
- the alkynyl group indicates, for example, an unsaturated aliphatic hydrocarbon group containing a triple bond such as an ethynyl group, which may or may not have a substituent.
- carbon number of an alkynyl group is not specifically limited, Usually, it is the range of 2-20.
- the alkoxy group refers to, for example, a functional group having an aliphatic hydrocarbon group bonded through an ether bond such as a methoxy group, an ethoxy group, or a propoxy group, and the aliphatic hydrocarbon group may have a substituent. It may not have. Although carbon number of an alkoxy group is not specifically limited, Usually, it is the range of 1-20.
- the alkylthio group is a group in which an oxygen atom of an ether bond of an alkoxy group is substituted with a sulfur atom.
- the hydrocarbon group of the alkylthio group may or may not have a substituent. Although carbon number of an alkylthio group is not specifically limited, Usually, it is the range of 1-20.
- An aryl ether group refers to a functional group to which an aromatic hydrocarbon group is bonded via an ether bond, such as a phenoxy group, and the aromatic hydrocarbon group may or may not have a substituent. Good. Although carbon number of an aryl ether group is not specifically limited, Usually, it is the range of 6-40.
- the aryl thioether group is a group in which an oxygen atom of an ether bond of an aryl ether group is substituted with a sulfur atom.
- the aromatic hydrocarbon group in the aryl ether group may or may not have a substituent. Although carbon number of an aryl ether group is not specifically limited, Usually, it is the range of 6-40.
- An aryl group refers to an aromatic hydrocarbon group such as a phenyl group, a naphthyl group, a biphenyl group, a fluorenyl group, a phenanthryl group, a triphenylenyl group, or a terphenyl group.
- the aryl group may or may not have a substituent. Although carbon number of an aryl group is not specifically limited, Usually, it is the range of 6-40.
- a heteroaryl group is one or more atoms other than carbon such as furanyl, thiophenyl, pyridyl, quinolinyl, pyrazinyl, pyrimidinyl, triazinyl, naphthyridyl, benzofuranyl, benzothiophenyl, indolyl, etc.
- the cyclic aromatic group which has in an individual ring is shown, This may be unsubstituted or substituted.
- carbon number of heteroaryl group is not specifically limited, Usually, it is the range of 2-30.
- Halogen means fluorine, chlorine, bromine and iodine.
- the carbonyl group, carboxyl group, oxycarbonyl group, and carbamoyl group may or may not have a substituent.
- substituents include an alkyl group, a cycloalkyl group, and an aryl group.
- the substituent may be further substituted.
- the amino group may or may not have a substituent, and examples of the substituent include an aryl group and a heteroaryl group, and these substituents may be further substituted.
- the silyl group refers to, for example, a functional group having a bond to a silicon atom such as a trimethylsilyl group, which may or may not have a substituent.
- carbon number of a silyl group is not specifically limited, Usually, it is the range of 3-20.
- the number of silicon is usually in the range of 1 to 6.
- —P ( ⁇ O) R 9 R 10 and —P ( ⁇ O) R 22 R 23 may or may not have a substituent.
- substituents include an aryl group and a heteroaryl group. These substituents may be further substituted.
- any two substituents selected from R 101 to R 105 can be mutually connected.
- This fused ring is a bicyclic fused ring, and the ring structure may contain one or more nitrogen, oxygen or sulfur atoms.
- a conventional compound having a carbazole skeleton does not necessarily have sufficient performance as a light emitting device material.
- CBP 4,4'-di (9H-carbazol-9-yl) -1,1'-biphenyl
- mCP 1,3-di (9H-carbazol-9-yl) benzene
- CBP 4,4'-di (9H-carbazol-9-yl) -1,1'-biphenyl
- mCP 1,3-di (9H-carbazol-9-yl) benzene
- a compound having a carbazole skeleton has a property of transporting both charges of holes and electrons.
- the inventors of the present invention have a small hole transport ability, so that the proportion of holes entering the light emitting layer is smaller than the electrons entering from the electron transport layer, and the charge balance in the light emitting layer is reduced. Based on this hypothesis, the inventors have invented a compound having a carbazole skeleton represented by the general formula (1).
- the compound having a carbazole skeleton represented by the general formula (1) is a compound having R 1 to R 8 in the general formula (1) in which any one of R 13 to R 21 in the general formula (3) is a mother skeleton.
- the connected carbazoles exhibit high hole transportability and lead to improvement of hole mobility in the layer, thereby enabling a low driving voltage.
- a high triplet level of the carbazole skeleton itself can be maintained, and easy deactivation can be suppressed, so that high light emission efficiency is achieved.
- the compound having a carbazole skeleton represented by the general formula (1) preferably contains two carbazole skeletons in the molecule, thereby having high thin film stability and excellent heat resistance.
- two carbazole skeletons are included, two are preferable because thermal decomposition is a concern.
- R 1 to R 8 do not include a dibenzofuran skeleton, a dibenzothiophene skeleton, and a carbazole skeleton, except in the case of the group represented by the general formula (3).
- R 13 to R 21 do not include a dibenzofuran skeleton, a dibenzothiophene skeleton, and a carbazole skeleton, except when linked to any position among R 1 to R 8 in the general formula (1).
- the compound having a carbazole skeleton of the present invention has a carbazole skeleton or a dibenzofuran skeleton having a molecular weight equivalent to that, or a dibenzothiophene skeleton as a substituent, the molecular weight increases and thermal decomposition is caused. This is because of concern.
- the compound having a carbazole skeleton represented by the general formula (1) includes a biphenyl group having at least one substituted or unsubstituted aryl group as a substituent on N (at least one of R 101 to R 105 is substituted). Or an unsubstituted aryl group), or a phenyl group having a condensed ring group (when at least one of R 101 to R 105 is a ring structure formed between adjacent substituents). By this, the performance excellent in electronic block property is shown.
- the glass transition temperature (Tg) of the compound having a carbazole skeleton represented by the general formula (1) is increased, and the electron blocking property is remarkable. To improve. As a result, the charge balance in the light emitting layer can be improved, and the light emitting element performance such as light emission efficiency and life can be improved. Further, when the number of the aryl groups is 3 or more, it is difficult to synthesize them because they are sterically crowded. Accordingly, the number of the aryl groups is preferably one or two.
- the group represented by the general formula (2) is preferably a group represented by the general formula (4) or (5). That is, the biphenyl group preferably has a meta-biphenyl structure or a para-biphenyl structure from the viewpoint of ease of synthesis.
- R 101 to R 106 and n are the same as described above.
- at least one of R 101 to R 105 in the general formula (2) is preferably a substituted or unsubstituted aryl group, and the aryl group is more preferably a phenyl group or a naphthyl group.
- the substituent in the case where the aryl group is substituted it is preferable that the conjugation of the compound is not greatly expanded or the triplet level of the compound is not lowered, and an alkyl group or a halogen is more preferable.
- two or more substituted or unsubstituted aryl groups may be the same or different.
- R 1 to R 8 in the general formula (1) and R 101 to R 105 in the general formula (2) do not include an anthracene skeleton and a pyrene skeleton. That is, the compound having a carbazole skeleton represented by the general formula (1) does not include an anthracene skeleton and a pyrene skeleton in the molecule. This is because the anthracene skeleton and the pyrene skeleton each have a low triplet level, and when the compound having the carbazole skeleton of the present invention has the substituent, the triplet level of the compound is lowered.
- the triplet level is low and the triplet is in direct contact with the light-emitting layer containing the triplet light-emitting dopant. Excitation energy leaks, resulting in a decrease in luminous efficiency. Further, when the compound having the carbazole skeleton represented by the general formula (1) is used for the light emitting layer, the effect of confining the excitation energy of the triplet light emitting material cannot be sufficiently exhibited, and the light emission efficiency is lowered.
- any one of R 1 to R 8 is a group represented by the general formula (3).
- any one of R 13 to R 21 is used for linking with R 1 to R 8 .
- R 15 being used for connection with R 3 means that the R 3 portion of the general formula (1) and the R 15 portion of the general formula (3) are directly bonded.
- R 3 is a group represented by the general formula (3) because the hole transport ability is further improved.
- the compound having a carbazole skeleton represented by the general formula (1) is preferably a group in which A and R 21 are different.
- the molecule since the molecule has an asymmetric structure, the effect of suppressing the interaction between the carbazole skeletons is increased, a more stable thin film can be formed, and the durability is further improved.
- the substituent (except for the group represented by the general formula (3)) included in the compound having a carbazole skeleton represented by the general formula (1) is hydrogen (including deuterium), It is preferably an alkyl group, an aryl group or a heteroaryl group.
- R 21 is preferably an aryl group, and more preferably a phenyl group, a naphthyl group, and a phenanthryl group. These groups may be further substituted with an alkyl group, a halogen, an aryl group or a heteroaryl group, except for an anthracenyl group or a pyrenyl group.
- R 21 is It is preferably a substituted or unsubstituted phenyl group having a high triplet level. As the substituent in this case, it is preferable that the conjugation of the compound is not greatly expanded or the triplet level of the compound is not lowered, and an alkyl group or a halogen is more preferable.
- the compound having a carbazole skeleton represented by the general formula (1) is not particularly limited, and specific examples include the following. In addition, the following is an illustration, and even if it is other than the compound specified here, if it is represented by General formula (1), it is preferably used similarly.
- a known method can be used for the synthesis of a compound having a carbazole skeleton as described above.
- Examples of the method for synthesizing the carbazole dimer include a method using a coupling reaction between a carbazole derivative using a palladium or copper catalyst and a halide or triflate, but is not limited thereto. .
- an example using 9-phenylcarbazole-3-boronic acid is shown below.
- Examples of a method for introducing a substituent onto N of carbazole include a method using a coupling reaction between a carbazole derivative and a halide using a palladium or copper catalyst, but is not limited thereto. .
- the compound represented by the general formula (1) is used as a light emitting device material.
- the light emitting device material in the present invention represents a material used for any layer of the light emitting device, and as described later, in the hole injection layer, the hole transport layer, the light emitting layer and / or the electron transport layer.
- the materials used for the cathode protective film are also included.
- the light emitting device of the present invention has an anode and a cathode and an organic layer interposed between the anode and the cathode, and the organic layer emits light by electric energy.
- the layer structure between the anode and the cathode is composed of only the light emitting layer, 1) light emitting layer / electron transport layer, 2) hole transport layer / light emitting layer, and 3) hole transport.
- Layer / light emitting layer / electron transport layer 4) hole injection layer / hole transport layer / light emitting layer / electron transport layer, 5) hole transport layer / light emitting layer / electron transport layer / electron injection layer, 6) hole A laminated structure such as injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer can be mentioned.
- Each of the layers may be either a single layer or a plurality of layers, and may be doped.
- the compound represented by the general formula (1) may be used in any of the above layers in the light emitting device, but is particularly preferably used in the hole transport layer or the light emitting layer.
- the anode and the cathode have a role of supplying a sufficient current for light emission of the device, and it is desirable that at least one of them is transparent or translucent in order to extract light.
- the anode formed on the substrate is a transparent electrode.
- the material used for the anode is a material that can efficiently inject holes into the organic layer and is transparent or translucent to extract light
- zinc oxide tin oxide, indium oxide, indium tin oxide (ITO), zinc oxide
- conductive metal oxides such as indium (IZO), metals such as gold, silver and chromium, inorganic conductive materials such as copper iodide and copper sulfide, and conductive polymers such as polythiophene, polypyrrole and polyaniline are particularly limited.
- ITO glass or Nesa glass it is particularly desirable to use ITO glass or Nesa glass.
- These electrode materials may be used alone, or a plurality of materials may be laminated or mixed.
- the resistance of the transparent electrode is not limited as long as a current sufficient for light emission of the element can be supplied, but it is desirable that the resistance be low from the viewpoint of power consumption of the element.
- an ITO substrate with a resistance of 300 ⁇ / ⁇ or less will function as a device electrode, but since it is now possible to supply a substrate with a resistance of approximately 10 ⁇ / ⁇ , use a substrate with a low resistance of 20 ⁇ / ⁇ or less. Is particularly desirable.
- the thickness of ITO can be arbitrarily selected according to the resistance value, but is usually used in a range of 50 to 300 nm.
- the light emitting element is preferably formed over a substrate.
- a glass substrate such as soda glass or non-alkali glass is preferably used.
- the thickness of the glass substrate it is sufficient that the thickness is sufficient to maintain the mechanical strength.
- alkali-free glass is preferred because it is better that there are fewer ions eluted from the glass.
- soda lime glass provided with a barrier coat such as SiO 2 is also commercially available and can be used.
- the substrate need not be glass, and for example, an anode may be formed on a plastic substrate.
- the ITO film forming method is not particularly limited, such as an electron beam method, a sputtering method, and a chemical reaction method.
- the material used for the cathode is not particularly limited as long as it can efficiently inject electrons into the light emitting layer.
- metals such as platinum, gold, silver, copper, iron, tin, aluminum, and indium, or alloys and multilayer stacks of these metals with low work function metals such as lithium, sodium, potassium, calcium, and magnesium Is preferred.
- aluminum, silver, and magnesium are preferable as the main component from the viewpoints of electrical resistance, ease of film formation, film stability, luminous efficiency, and the like.
- magnesium and silver are preferable because electron injection into the electron transport layer and the electron injection layer in the present invention is facilitated and low voltage driving is possible.
- metals such as platinum, gold, silver, copper, iron, tin, aluminum and indium, or alloys using these metals, inorganic materials such as silica, titania and silicon nitride, polyvinyl alcohol, polyvinyl chloride
- an organic polymer compound such as a hydrocarbon polymer compound is laminated on the cathode as a protective film layer.
- the protective film layer is selected from materials that are light transmissive in the visible light region.
- the production method of these electrodes is not particularly limited, such as resistance heating, electron beam, sputtering, ion plating and coating.
- the hole injection layer is a layer inserted between the anode and the hole transport layer.
- the hole injection layer may be either a single layer or a plurality of layers stacked.
- the presence of a hole injection layer between the hole transport layer and the anode is preferable because it not only drives at a lower voltage and improves the durability life, but also improves the carrier balance of the device and the light emission efficiency.
- the material used for the hole injection layer is not particularly limited.
- heterocyclic compounds and polymer systems of Polycarbonate and styrene derivatives polythiophene, polyaniline, polyfluorene, polyvinylcarbazole and polysilane are used.
- the compound represented by General formula (1) can also be used.
- a benzidine derivative, a starburst arylamine material group, a mono A carbazole derivative is more preferably used.
- the materials may be used alone or as a mixture of two or more materials.
- a plurality of materials may be stacked to form a hole injection layer.
- the hole injection layer is composed of an acceptor compound alone or that the hole injection material is doped with an acceptor compound so that the above-described effects can be obtained more remarkably.
- An acceptor compound is a material that forms a charge transfer complex with a material that forms a hole-injecting layer in contact with a hole-transporting layer when used as a single-layer film and a material that forms a hole-injecting layer when used as a doped layer. When such a material is used, the conductivity of the hole injection layer is improved, which contributes to lowering of the driving voltage of the device, and the effects of improving the light emission efficiency and improving the durability life can be obtained.
- acceptor compounds include metal chlorides such as iron (III) chloride, aluminum chloride, gallium chloride, indium chloride, antimony chloride, metal oxides such as molybdenum oxide, vanadium oxide, tungsten oxide, ruthenium oxide, A charge transfer complex such as tris (4-bromophenyl) aminium hexachloroantimonate (TBPAH).
- metal chlorides such as iron (III) chloride, aluminum chloride, gallium chloride, indium chloride, antimony chloride, metal oxides such as molybdenum oxide, vanadium oxide, tungsten oxide, ruthenium oxide,
- a charge transfer complex such as tris (4-bromophenyl) aminium hexachloroantimonate (TBPAH).
- organic compounds having a nitro group, cyano group, halogen or trifluoromethyl group in the molecule quinone compounds, acid anhydride compounds, fullerenes, and the like are also preferably used.
- these compounds include hexacyanobutadiene, hexacyanobenzene, tetracyanoethylene, tetracyanoquinodimethane (TCNQ), tetrafluorotetracyanoquinodimethane (F4-TCNQ), 4,4 ′, 4 ′.
- the hole injection layer is composed of an acceptor compound alone or when the hole injection layer is doped with an acceptor compound, the hole injection layer may be a single layer, A plurality of layers may be laminated.
- the hole transport layer is a layer that transports holes injected from the anode to the light emitting layer.
- the hole transport layer may be a single layer or may be configured by laminating a plurality of layers.
- the compound represented by the general formula (1) has an ionization potential of 5.3 to 6.0 eV (measured value of deposited film AC-2 (RIKEN Keiki)), a high triplet level, a high hole transport property and a thin film. Since it has stability, it is preferably used for the hole injection layer and the hole transport layer of the light-emitting element. In addition, since the compound represented by the general formula (1) has a large energy gap with respect to a conventional hole transport material having a benzidine skeleton, the LUMO level is high and the electron blocking property is excellent. Furthermore, the compound represented by the general formula (1) is preferably used as a hole transport material of an element using a triplet light emitting material.
- a hole transport material having a conventional benzidine skeleton has a low triplet level, and when it is in direct contact with a light emitting layer containing a triplet light emitting dopant, leakage of triplet excitation energy occurs, resulting in a decrease in luminous efficiency. This is because the compound represented by the general formula (1) has a high triplet level, and such a problem does not occur.
- the hole transport layer containing the compound represented by the general formula (1) is preferably in direct contact with the light emitting layer. This is because the compound represented by the general formula (1) has a high electron blocking property and can prevent intrusion of electrons flowing out from the light emitting layer. Furthermore, since the compound represented by the general formula (1) has a high triplet level, it also has an effect of confining the excitation energy of the triplet light-emitting material. Therefore, even when a triplet light emitting material is included in the light emitting layer, the hole transport layer containing the compound represented by the general formula (1) is preferably in direct contact with the light emitting layer.
- the compound of the present invention having a high triplet level is preferable. Used.
- the hole transport layer may be composed only of the compound represented by the general formula (1), or may be mixed with other materials as long as the effects of the present invention are not impaired.
- other materials used for example, 4,4′-bis (N- (3-methylphenyl) -N-phenylamino) biphenyl (TPD), 4,4′-bis (N- (1 -Naphthyl) -N-phenylamino) biphenyl (NPD), 4,4'-bis (N, N-bis (4-biphenylyl) amino) biphenyl (TBDB), bis (N, N'-diphenyl-4-amino) Phenyl) -N, N-diphenyl-4,4′-diamino-1,1′-biphenyl (TPD232), N 4 , N 4 ′ -([1,1′-biphenyl] -4,4′-diyl) Benzidine derivatives such as bis (N 4 , N 4 , N
- the light emitting layer may be either a single layer or a plurality of layers, each formed by a light emitting material (host material, dopant material), which may be a mixture of a host material and a dopant material or a host material alone, Either is acceptable. That is, in the light emitting element of the present invention, only the host material or the dopant material may emit light in each light emitting layer, or both the host material and the dopant material may emit light. From the viewpoint of efficiently using electric energy and obtaining light emission with high color purity, the light emitting layer is preferably composed of a mixture of a host material and a dopant material. Further, the host material and the dopant material may be either one kind or a plurality of combinations, respectively.
- a light emitting material host material, dopant material
- the dopant material may be included in the entire host material or may be partially included.
- the dopant material may be laminated or dispersed.
- the dopant material can control the emission color.
- the doping method can be formed by a co-evaporation method with a host material, but may be simultaneously deposited after being previously mixed with the host material.
- the luminescent material includes metal chelation such as tris (8-quinolinolato) aluminum, condensed ring derivatives such as anthracene and pyrene, which have been known as luminescent materials.
- the host material contained in the light-emitting material is not limited to a single compound, and a plurality of compounds of the present invention may be mixed and used, or one or more other host materials may be mixed and used. Further, they may be used in a stacked manner.
- the host material is not particularly limited, but is a compound having a condensed aryl ring such as naphthalene, anthracene, phenanthrene, pyrene, chrysene, naphthacene, triphenylene, perylene, fluoranthene, fluorene, indene, or a derivative thereof, N, N′-dinaphthyl- Aromatic amine derivatives such as N, N′-diphenyl-4,4′-diphenyl-1,1′-diamine, metal chelated oxinoid compounds such as tris (8-quinolinato) aluminum (III), distyrylbenzene Bisstyryl derivatives such as derivatives, tetraphenylbutadiene derivatives, indene derivatives, coumarin derivatives, oxadiazole derivatives, pyrrolopyridine derivatives, perinone derivatives, cyclopentadiene derivatives, pyrrolopyrrole derivatives,
- metal chelated oxinoid compounds dibenzofuran derivatives, dibenzothiophene derivatives, carbazole derivatives, indolocarbazole derivatives, pyrimidine derivatives, triazine derivatives, A triphenylene derivative or the like is preferably used.
- the compound represented by the general formula (1) has an ionization potential of 5.3 to 6.0 eV (measured value of deposited film AC-2 (RIKEN Keiki)), a high triplet level, and a high hole transport property. And since it has thin film stability, it is preferably used for a light emitting layer of a light emitting element. In addition, since the compound represented by the general formula (1) has a large energy gap with respect to a conventional material having a high hole transporting property having a benzidine skeleton, the LUMO level is high and the electron blocking property is excellent. Furthermore, the compound represented by the general formula (1) is preferably used as a host material of an element using a triplet light emitting material.
- the compound represented by the general formula (1) has a low triplet level and leaks triplet excitation energy when directly in contact with a light-emitting layer containing a triplet light-emitting dopant, resulting in a decrease in light emission efficiency. Has a high triplet level, and such a problem does not occur.
- the compound represented by the general formula (1) since the compound represented by the general formula (1) exhibits good hole injecting and transporting properties as described above and also improves the electron blocking property, it can be used as a hole transporting host. Furthermore, it is preferable to use it in combination with an electron transporting host because the number of carriers in the light emitting layer is increased and the recombination probability is increased, so that the light emission efficiency is improved.
- the electron transporting host material is not particularly limited, but a carbazole compound containing a pyrimidine skeleton or a triazine skeleton or a compound having a carbazole moiety is preferably used.
- the dopant material contained in the light-emitting material is not particularly limited, but is a compound having an aryl ring such as naphthalene, anthracene, phenanthrene, chrysene, fluorene, benzofluorene, pyrene, triphenylene, perylene, fluorene, indene or a derivative thereof (for example, 2 -(Benzothiazol-2-yl) -9,10-diphenylanthracene and 5,6,11,12-tetraphenylnaphthacene), furan, pyrrole, thiophene, silole, 9-silafluorene, 9,9'- Heteroaryls such as spirobisilafluorene, benzothiophene, benzofuran, indole, dibenzothiophene, dibenzofuran, imidazopyridine, phenanthroline, pyrazine, nap
- dopants used when the light emitting layer emits triplet light emission include iridium (Ir), ruthenium (Ru), palladium (Pd), platinum (Pt), osmium (Os), and rhenium.
- a metal complex compound containing at least one metal selected from the group consisting of (Re) is preferable.
- the ligand preferably has a nitrogen-containing aromatic heterocycle such as a phenylpyridine skeleton or a phenylquinoline skeleton.
- an appropriate complex is selected from the relationship with the required emission color, device performance, and host compound.
- tris (2-phenylpyridyl) iridium complex tris ⁇ 2- (2-thiophenyl) pyridyl ⁇ iridium complex, tris ⁇ 2- (2-benzothiophenyl) pyridyl ⁇ iridium complex, tris (2-phenyl) Benzothiazole) iridium complex, tris (2-phenylbenzoxazole) iridium complex, trisbenzoquinoline iridium complex, bis (2-phenylpyridyl) (acetylacetonato) iridium complex, bis ⁇ 2- (2-thiophenyl) pyridyl ⁇ iridium Complex, bis ⁇ 2- (2-benzothiophenyl) pyridyl ⁇ (acetylacetonato) iridium complex, bis (2-phenylbenzothiazole) (acetylacetonato) iridium complex, bis (2-phenylbenzox
- the triplet light-emitting material used as the dopant material may contain only one type in the light-emitting layer, or a mixture of two or more types.
- the total weight of the dopant material is preferably 30% by weight or less, more preferably 20% by weight or less, based on the host material.
- the light emitting layer may further include a third component for adjusting the carrier balance in the light emitting layer or stabilizing the layer structure of the light emitting layer.
- a third component for adjusting the carrier balance in the light emitting layer or stabilizing the layer structure of the light emitting layer.
- the third component a material that does not cause an interaction between the host material composed of the compound having the carbazole skeleton represented by the general formula (1) and the dopant material composed of the triplet light emitting material is selected. .
- the preferred host and dopant in the triplet emission system are not particularly limited, but specific examples include the following.
- the electron transport layer is a layer in which electrons are injected from the cathode and further transports electrons.
- the electron transport layer has high electron injection efficiency, and it is desired to efficiently transport injected electrons.
- the electron transport layer is required to be a substance having a high electron affinity, a high electron mobility, excellent stability, and a trapping impurity that is unlikely to be generated during manufacture and use.
- a compound having a molecular weight of 400 or more that maintains a stable film quality is preferable because a low molecular weight compound is likely to be crystallized to deteriorate the film quality.
- the electron transport layer in the present invention includes a hole blocking layer that can efficiently block the movement of holes as the same meaning.
- Examples of the electron transport material used for the electron transport layer include condensed polycyclic aromatic derivatives such as naphthalene and anthracene, styryl aromatic ring derivatives represented by 4,4′-bis (diphenylethenyl) biphenyl, anthraquinone and diphenoquinone Quinoline derivatives, phosphorus oxide derivatives, quinolinol complexes such as tris (8-quinolinolato) aluminum (III), benzoquinolinol complexes, hydroxyazole complexes, azomethine complexes, tropolone metal complexes, and flavonol metal complexes.
- the electron-accepting nitrogen mentioned here represents a nitrogen atom forming a multiple bond with an adjacent atom. Since the nitrogen atom has a high electronegativity, the multiple bond has an electron accepting property. Therefore, an aromatic heterocycle containing electron-accepting nitrogen has a high electron affinity. An electron transport material having electron-accepting nitrogen makes it easier to receive electrons from a cathode having a high electron affinity, and can be driven at a lower voltage. In addition, since the number of electrons supplied to the light emitting layer increases and the recombination probability increases, the light emission efficiency is improved.
- heteroaryl ring containing an electron-accepting nitrogen examples include, for example, a pyridine ring, pyrazine ring, pyrimidine ring, quinoline ring, quinoxaline ring, naphthyridine ring, pyrimidopyrimidine ring, benzoquinoline ring, phenanthroline ring, imidazole ring, oxazole ring, Examples thereof include an oxadiazole ring, a triazole ring, a thiazole ring, a thiadiazole ring, a benzoxazole ring, a benzothiazole ring, a benzimidazole ring, and a phenanthrimidazole ring.
- Examples of these compounds having a heteroaryl ring structure include benzimidazole derivatives, benzoxazole derivatives, benzthiazole derivatives, oxadiazole derivatives, thiadiazole derivatives, triazole derivatives, pyrazine derivatives, phenanthroline derivatives, quinoxaline derivatives, quinoline derivatives, benzoins.
- Preferred compounds include quinoline derivatives, oligopyridine derivatives such as bipyridine and terpyridine, quinoxaline derivatives and naphthyridine derivatives.
- imidazole derivatives such as tris (N-phenylbenzimidazol-2-yl) benzene, oxadiazole derivatives such as 1,3-bis [(4-tert-butylphenyl) 1,3,4-oxadiazolyl] phenylene, Triazole derivatives such as N-naphthyl-2,5-diphenyl-1,3,4-triazole, phenanthroline derivatives such as bathocuproine and 1,3-bis (1,10-phenanthroline-9-yl) benzene, 2,2 ′
- a benzoquinoline derivative such as bis (benzo [h] quinolin-2-yl) -9,9′-spirobifluorene, 2,5-bis (6 ′-(2 ′, 2 ′′ -bipyridyl))-1, Bipyridine derivatives such as 1-dimethyl-3,4-diphenylsilole, 1,3-bis (4 ′-(2,2 )
- the condensed polycyclic aromatic skeleton is particularly preferably an anthracene skeleton, a pyrene skeleton or a phenanthroline skeleton.
- the electron transport material may be used alone, but two or more of the electron transport materials may be mixed and used, or one or more of the other electron transport materials may be mixed with the electron transport material.
- the preferred electron transport material is not particularly limited, but specific examples include the following.
- the electron transport material may be used alone, but two or more of the electron transport materials may be mixed and used, or one or more of the other electron transport materials may be mixed and used in the electron transport material.
- you may contain a donor compound.
- the donor compound is a compound that facilitates electron injection from the cathode or the electron injection layer to the electron transport layer by improving the electron injection barrier and further improves the electrical conductivity of the electron transport layer.
- Preferred examples of the donor compound include an alkali metal, an inorganic salt containing an alkali metal, a complex of an alkali metal and an organic substance, an alkaline earth metal, an inorganic salt containing an alkaline earth metal, or an alkaline earth metal and an organic substance. And the like.
- Preferred types of alkali metals and alkaline earth metals include alkaline metals such as lithium, sodium, potassium, rubidium, and cesium that have a large effect of improving the electron transport ability with a low work function, and alkaline earths such as magnesium, calcium, cerium, and barium. A metal is mentioned.
- inorganic salts include oxides such as LiO and Li 2 O, nitrides, fluorides such as LiF, NaF, and KF, Li 2 CO 3 , Na 2 CO 3 , K 2 CO 3 , Rb 2 CO 3 , Examples thereof include carbonates such as Cs 2 CO 3 .
- alkali metal or alkaline earth metal include lithium and cesium from the viewpoint that a large low-voltage driving effect can be obtained.
- organic substance in the complex with the organic substance include quinolinol, benzoquinolinol, pyridylphenol, flavonol, hydroxyimidazopyridine, hydroxybenzazole, and hydroxytriazole.
- a complex of an alkali metal and an organic substance is preferable from the viewpoint that the effect of lowering the voltage of the light emitting device is larger, and a complex of lithium and an organic substance is more preferable from the viewpoint of ease of synthesis and thermal stability, Lithium quinolinol, which is available at a low cost, is particularly preferred.
- the ionization potential of the electron transport layer is not particularly limited, but is preferably 5.6 eV or more and 8.0 eV or less, and more preferably 6.0 eV or more and 7.5 eV or less.
- each layer constituting the light emitting element is not particularly limited, such as resistance heating vapor deposition, electron beam vapor deposition, sputtering, molecular lamination method, coating method, etc., but resistance heating vapor deposition or electron beam vapor deposition is usually used in terms of element characteristics. preferable.
- the thickness of the organic layer is not limited because it depends on the resistance value of the luminescent material, but is preferably 1 to 1000 nm.
- the film thicknesses of the light emitting layer, the electron transport layer, and the hole transport layer are each preferably 1 nm to 200 nm, and more preferably 5 nm to 100 nm.
- the light emitting element of the present invention has a function of converting electrical energy into light.
- a direct current is mainly used as the electric energy, but a pulse current or an alternating current can also be used.
- the current value and voltage value are not particularly limited, but should be selected so that the maximum luminance can be obtained with as low energy as possible in consideration of the power consumption and lifetime of the device.
- the light-emitting element of the present invention is suitably used as a display for displaying in a matrix and / or segment system, for example.
- pixels for display are arranged two-dimensionally such as a lattice shape or a mosaic shape, and characters and images are displayed by a set of pixels.
- the shape and size of the pixel are determined by the application. For example, a square pixel with a side of 300 ⁇ m or less is usually used for displaying images and characters on a personal computer, monitor, TV, and a pixel with a side of mm order for a large display such as a display panel. become.
- monochrome display pixels of the same color may be arranged. However, in color display, red, green, and blue pixels are displayed side by side. In this case, there are typically a delta type and a stripe type.
- the matrix driving method may be either a line sequential driving method or an active matrix. Although the structure of the line sequential drive is simple, the active matrix may be superior in consideration of the operation characteristics, and it is necessary to use it depending on the application.
- the segment system in the present invention is a system in which a pattern is formed so as to display predetermined information and a region determined by the arrangement of the pattern is caused to emit light.
- a pattern is formed so as to display predetermined information and a region determined by the arrangement of the pattern is caused to emit light.
- the time and temperature display in a digital clock or a thermometer the operation state display of an audio device or an electromagnetic cooker, the panel display of an automobile, and the like can be mentioned.
- the matrix display and the segment display may coexist in the same panel.
- the light-emitting element of the present invention is also preferably used as a backlight for various devices.
- the backlight is used mainly for the purpose of improving the visibility of a display device that does not emit light, and is used for a liquid crystal display device, a clock, an audio device, an automobile panel, a display panel, a sign, and the like.
- the light-emitting element of the present invention is preferably used for a backlight for a liquid crystal display device, particularly a personal computer for which a reduction in thickness is being considered, and a backlight that is thinner and lighter than conventional ones can be provided.
- Synthesis example 1 Synthesis of Compound [1] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
- Synthesis example 2 Synthesis of Compound [18] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
- Synthesis example 3 Synthesis of Compound [19] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
- Synthesis example 4 Synthesis of Compound [21] 3-Bromocarbazole 20.9 g, 9-phenylcarbazole-3-boronic acid 15.0 g, palladium acetate 366 mg, tris (2-methylphenyl) phosphine 300 mg, 2M aqueous potassium carbonate solution 105 ml, dimethoxyethane 260 ml The mixed solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of tetrahydrofuran. The organic layer was washed twice with 100 ml of saturated brine, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by o-xylene recrystallization and vacuum dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
- Synthesis example 5 Synthesis of Compound [24] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
- Synthesis Example 6 Synthesis of Compound [4] The compound [4] was synthesized in the same manner as in Synthesis Example 2 except that (3,5-diphenylphenyl) boronic acid was used instead of 3-biphenylboronic acid to obtain a white solid.
- the results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [4].
- This compound [4] was used as a light emitting device material after sublimation purification at about 350 ° C. under a pressure of 1 ⁇ 10 ⁇ 3 Pa using an oil diffusion pump.
- the HPLC purity (area% at a measurement wavelength of 254 nm) was 99.7% before sublimation purification and 99.9% after sublimation purification.
- Synthesis example 7 Synthesis of Compound [17] Synthesis was performed in the same manner as in Synthesis Example 2 except that 2-biphenylboronic acid was used instead of 3-biphenylboronic acid to obtain a white solid.
- the results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [17].
- This compound [17] was used as a light emitting device material after sublimation purification at about 320 ° C. under a pressure of 1 ⁇ 10 ⁇ 3 Pa using an oil diffusion pump.
- the HPLC purity (area% at a measurement wavelength of 254 nm) was 99.7% before sublimation purification and 99.9% after sublimation purification.
- Synthesis example 8 Synthesis of Compound [7] Synthesis was performed in the same manner as in Synthesis Example 2 except that 2-naphthaleneboronic acid was used instead of 3-biphenylboronic acid to obtain a white solid.
- the results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was the compound [7].
- This compound [7] was used as a light emitting device material after sublimation purification at about 320 ° C. under a pressure of 1 ⁇ 10 ⁇ 3 Pa using an oil diffusion pump.
- the HPLC purity (area% at a measurement wavelength of 254 nm) was 99.7% before sublimation purification and 99.9% after sublimation purification.
- Example 1 A glass substrate (manufactured by Geomat Co., Ltd., 11 ⁇ / ⁇ , sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 ⁇ 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 ⁇ 10 ⁇ 4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method.
- “Semico Clean 56” trade name, manufactured by Furuuchi Chemical Co., Ltd.
- HT-1 was deposited to 110 nm as the first hole transport layer.
- 10 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer.
- Compound H-1 was used as the host material
- Compound D-1 was used as the dopant material
- vapor deposition was performed to a thickness of 40 nm so that the dopant concentration was 5 wt%.
- Compound E-1 was laminated to a thickness of 20 nm as an electron transport layer.
- lithium fluoride 0.5 nm and aluminum 60 nm were vapor-deposited to form a 5 ⁇ 5 mm square device.
- the film thickness here is a display value of a crystal oscillation type film thickness monitor.
- this light emitting device was DC-driven at 10 mA / cm 2 , blue light emission with a light emission efficiency of 5.1 lm / W was obtained.
- this light emitting device was continuously driven with a direct current of 10 mA / cm 2 , the luminance was reduced by half in 1500 hours.
- Compounds HI-1, HT-1, H-1, D-1, and E-1 are the compounds shown below.
- Examples 2 to 10 A light emitting device was produced in the same manner as in Example 1 except that the materials described in Table 1 were used as the second hole transport layer. The results of each example are shown in Table 1.
- Comparative Examples 1-8 A light emitting device was prepared and evaluated in the same manner as in Example 1 except that the materials described in Table 1 were used as the second hole transport layer. The results are shown in Table 1.
- HT-2 to HT-9 are the compounds shown below.
- Example 11 A glass substrate (manufactured by Geomat Co., Ltd., 11 ⁇ / ⁇ , sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 ⁇ 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 ⁇ 10 ⁇ 4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method.
- “Semico Clean 56” trade name, manufactured by Furuuchi Chemical Co., Ltd.
- HT-1 was deposited to 110 nm as the first hole transport layer.
- 10 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer.
- the compound H-2 was used as the host material
- the compound D-2 was used as the dopant material
- vapor deposition was performed to a thickness of 40 nm so that the dopant concentration was 10 wt%.
- Examples 12-19 A light emitting device was prepared and evaluated in the same manner as in Example 11 except that the materials described in Table 2 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 2.
- Comparative Examples 9-15 A light emitting device was prepared and evaluated in the same manner as in Example 11 except that the compounds described in Table 2 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 2.
- HT-10 is a compound shown below.
- Example 20 A glass substrate (manufactured by Geomat Co., Ltd., 11 ⁇ / ⁇ , sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 ⁇ 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 ⁇ 10 ⁇ 4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method.
- “Semico Clean 56” trade name, manufactured by Furuuchi Chemical Co., Ltd.
- HT-1 125 nm of HT-1 was deposited as a hole transport layer.
- the compound [1] was used as the host material
- the compound D-2 was used as the dopant material
- the dopant material was deposited to a thickness of 40 nm so that the doping concentration was 10 wt%.
- Compound E-1 was laminated to a thickness of 20 nm as an electron transport layer.
- lithium fluoride 0.5 nm and aluminum 60 nm were vapor-deposited to form a 5 ⁇ 5 mm square device.
- the film thickness here is a display value of a crystal oscillation type film thickness monitor.
- green light emission with a luminous efficiency of 17.2 lm / W was obtained.
- this light emitting device was continuously driven with a direct current of 10 mA / cm 2 , the luminance was reduced by half in 1400 hours.
- Examples 21-24 A light emitting device was prepared and evaluated in the same manner as in Example 20 except that the materials described in Table 3 were used as the hole transport layer, the host material, and the dopant material. The results are shown in Table 3.
- Comparative Examples 16-24 A light emitting device was produced and evaluated in the same manner as in Example 20 except that the compounds described in Table 3 were used as the hole transport layer, the host material, and the dopant material. The results are shown in Table 3. Compounds H-3, H-4, H-5, and H-6 are the compounds shown below.
- Example 25 A glass substrate (manufactured by Geomat Co., Ltd., 11 ⁇ / ⁇ , sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 ⁇ 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 ⁇ 10 ⁇ 4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method.
- “Semico Clean 56” trade name, manufactured by Furuuchi Chemical Co., Ltd.
- HT-7 HT-7
- 30 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer.
- Compound H-7 was used as the host material
- Compound D-3 was used as the dopant material
- the dopant material was deposited to a thickness of 30 nm so that the doping concentration was 4 wt%.
- Compound E-1 was laminated to a thickness of 35 nm as an electron transport layer.
- lithium fluoride 0.5 nm and aluminum 60 nm were vapor-deposited to form a 5 ⁇ 5 mm square device.
- the film thickness here is a display value of a crystal oscillation type film thickness monitor.
- red light emission with a luminous efficiency of 10.5 lm / W was obtained.
- this light emitting device was continuously driven with a direct current of 10 mA / cm 2 , the luminance was reduced by half in 1400 hours.
- Compounds H-7 and D-3 are the compounds shown below.
- Examples 26-32 A light emitting device was prepared and evaluated in the same manner as in Example 25 except that the materials described in Table 4 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 4.
- Comparative Examples 25-30 A light emitting device was prepared and evaluated in the same manner as in Example 25 except that the compounds described in Table 4 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 4.
- HT-11 is a compound shown below.
- Example 33 A glass substrate (manufactured by Geomat Co., Ltd., 11 ⁇ / ⁇ , sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 ⁇ 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 ⁇ 10 ⁇ 4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method.
- “Semico Clean 56” trade name, manufactured by Furuuchi Chemical Co., Ltd.
- HT-8 HT-8
- 10 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer.
- Compound H-8 was used as the host material
- Compound D-4 was used as the dopant material
- the dopant material was deposited to a thickness of 30 nm with a doping concentration of 10 wt%.
- a layer in which an organic compound (E-2) and a donor compound (Liq: lithium quinolinol) are mixed at a deposition rate ratio of 1: 1 ( 0.05 nm / s: 0.05 nm / s) is used as an electron transport layer. Laminated to a thickness of
- Examples 34-39 A light emitting device was produced and evaluated in the same manner as in Example 33 except that the materials described in Table 5 were used as the second hole transport layer. The results are shown in Table 5.
- Comparative Examples 31-37 A light emitting device was prepared and evaluated in the same manner as in Example 33 except that the compounds described in Table 5 were used as the second hole transport layer. The results are shown in Table 5.
- HT-12 is a compound shown below.
- Examples 40-45 As the hole injection layer, compound HT-12 and compound HI-2 are used in place of compound HI-1, and the compound HI-2 is doped with 10 nm by doping so that the doping concentration of compound HI-2 is 5% by weight.
- a light emitting device was fabricated in the same manner as in Example 33 except that. The results are shown in Table 6.
- HI-2 is a compound shown below.
- Examples 46-51 instead of compound H-8, a mixed host of compound H-8 and compound H-9 (co-deposited film of compound H-8 and compound H-9 was deposited at a deposition rate ratio of 1: 1 instead of compound H-8 as the host material.
- a light-emitting device was fabricated in the same manner as in Examples 40 to 45 except that (deposited) was used. The results are shown in Table 6.
- H-9 is a compound shown below.
- Examples 52-57 A light emitting device was fabricated in the same manner as in Examples 33 to 39 except that Compound HI-3 was used instead of Compound HI-1 as the hole injection layer. The results are shown in Table 6. HI-3 is a compound shown below.
- Examples 58-62 A light emitting device was fabricated in the same manner as in Example 28 except that the material described in Table 6 was used instead of the layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) were mixed as the electron transport layer. The results are shown in Table 6. E-3 to E-7 are the compounds shown below.
- Examples 63-64 A light emitting device was prepared and evaluated in the same manner as in Example 58 except that the compounds described in Table 6 were used as the electron transport layer. The results are shown in Table 6. E-8 to E-9 are the compounds shown below.
- Example 65 As an electron transport layer, instead of a layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) are mixed, compound E-2 and compound E-1 are laminated at a film thickness ratio of 1: 1 to a thickness of 35 nm. A light emitting device was fabricated in the same manner as in Example 41 except that the above was used. The results are shown in Table 6.
- Example 66 As an electron transport layer, instead of a layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) are mixed, compound E-3 and compound E-1 are laminated at a film thickness ratio of 1: 1 to a thickness of 35 nm. A light emitting device was fabricated in the same manner as in Example 41 except that the above was used. The results are shown in Table 6.
- Example 67 As an electron transport layer, instead of a layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) are mixed, compound E-4 and compound E-1 are laminated at a film thickness ratio of 1: 1 to a thickness of 35 nm. A light emitting device was fabricated in the same manner as in Example 41 except that the above was used. The results are shown in Table 6.
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Abstract
Description
化合物[1]の合成
3-ブロモカルバゾール20.9g、フェニルカルバゾール-3-ボロン酸15.0g、酢酸パラジウム366mg、トリス(2-メチルフェニル)ホスフィン300mg、2M炭酸カリウム水溶液105ml、ジメトキシエタン260mlの混合溶液を窒素気流下、6時間還流した。室温に冷却した後、トルエン500mlで抽出した。有機層を水100mlで2回洗浄し、硫酸マグネシウムで乾燥後、エバポレートした。得られた濃縮物をシリカゲルカラムクロマトグラフィーにより精製し、真空乾燥した後、9-フェニル-9H,9’H-3,3’-ビカルバゾール13.5gを得た。 Synthesis example 1
Synthesis of Compound [1] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
1H-NMR(CDCl3(d=ppm)):7.29-7.82(m,27H),7.91(d,1H),8.23-8.28(m,2H),8.47-8.48(t,2H)
なお、この化合物[1]は、油拡散ポンプを用いて1×10-3Paの圧力下、約330℃で昇華精製を行ってから発光素子材料として使用した。HPLC純度(測定波長254nmにおける面積%)は昇華精製前が99.8%、昇華精製後が99.9%であった。 The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [1].
1 H-NMR (CDCl 3 (d = ppm)): 7.29-7.82 (m, 27H), 7.91 (d, 1H), 8.23-8.28 (m, 2H), 8 .47-8.48 (t, 2H)
This compound [1] was used as a light emitting device material after sublimation purification at about 330 ° C. under a pressure of 1 × 10 −3 Pa using an oil diffusion pump. The HPLC purity (area% at a measurement wavelength of 254 nm) was 99.8% before sublimation purification and 99.9% after sublimation purification.
化合物[18]の合成
3-ブロモカルバゾール20.9g、フェニルカルバゾール-3-ボロン酸15.0g、酢酸パラジウム366mg、トリス(2-メチルフェニル)ホスフィン300mg、2M炭酸カリウム水溶液105ml、ジメトキシエタン260mlの混合溶液を窒素気流下、6時間還流した。室温に冷却した後、トルエン500mlで抽出した。有機層を水100mlで2回洗浄し、硫酸マグネシウムで乾燥後、エバポレートした。得られた濃縮物をシリカゲルカラムクロマトグラフィーにより精製し、真空乾燥した後、9-フェニル-9H,9’H-3,3’-ビカルバゾール13.5gを得た。 Synthesis example 2
Synthesis of Compound [18] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
1H-NMR(CDCl3(d=ppm)):7.29-7.83(m,25H),7.89-7.94(m,3H),8.24-8.27(m,2H),8.47(d,2H)
なお、この化合物[18]は、油拡散ポンプを用いて1×10-3Paの圧力下、約330℃で昇華精製を行ってから発光素子材料として使用した。HPLC純度(測定波長254nmにおける面積%)は昇華精製前が99.6%、昇華精製後が99.9%であった。 The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [18].
1 H-NMR (CDCl 3 (d = ppm)): 7.29-7.83 (m, 25H), 7.89-7.94 (m, 3H), 8.24-8.27 (m, 2H), 8.47 (d, 2H)
This compound [18] was used as a light emitting device material after sublimation purification at about 330 ° C. under a pressure of 1 × 10 −3 Pa using an oil diffusion pump. The HPLC purity (area% at a measurement wavelength of 254 nm) was 99.6% before sublimation purification and 99.9% after sublimation purification.
化合物[19]の合成
3-ブロモカルバゾール20.9g、フェニルカルバゾール-3-ボロン酸15.0g、酢酸パラジウム366mg、トリス(2-メチルフェニル)ホスフィン300mg、2M炭酸カリウム水溶液105ml、ジメトキシエタン260mlの混合溶液を窒素気流下、6時間還流した。室温に冷却した後、トルエン500mlで抽出した。有機層を水100mlで2回洗浄し、硫酸マグネシウムで乾燥後、エバポレートした。得られた濃縮物をシリカゲルカラムクロマトグラフィーにより精製し、真空乾燥した後、9-フェニル-9H,9’H-3,3’-ビカルバゾール13.5gを得た。 Synthesis example 3
Synthesis of Compound [19] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
1H-NMR(CDCl3(d=ppm)):7.30-7.83(m,26H),7.89-7.92(d,2H),8.24-8.28(m,2H),8.47-8.48(d,2H)
なお、この化合物[19]は、油拡散ポンプを用いて1×10-3Paの圧力下、約340℃で昇華精製を行ってから発光素子材料として使用した。HPLC純度(測定波長254nmにおける面積%)は昇華精製前が99.8%、昇華精製後が99.9%であった。 The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was the compound [19].
1 H-NMR (CDCl 3 (d = ppm)): 7.30-7.83 (m, 26H), 7.89-7.92 (d, 2H), 8.24-8.28 (m, 2H), 8.47-8.48 (d, 2H)
This compound [19] was used as a light emitting device material after sublimation purification at about 340 ° C. under a pressure of 1 × 10 −3 Pa using an oil diffusion pump. The HPLC purity (area% at a measurement wavelength of 254 nm) was 99.8% before sublimation purification and 99.9% after sublimation purification.
化合物[21]の合成
3-ブロモカルバゾール20.9g、9-フェニルカルバゾール-3-ボロン酸15.0g、酢酸パラジウム366mg、トリス(2-メチルフェニル)ホスフィン300mg、2M炭酸カリウム水溶液105ml、ジメトキシエタン260mlの混合溶液を窒素気流下、6時間還流した。室温に冷却した後、テトラヒドロフラン500mlで抽出した。有機層を飽和食塩水100mlで2回洗浄し、硫酸マグネシウムで乾燥後、エバポレートした。得られた濃縮物をo-キシレン再結晶により精製し、真空乾燥した後、9-フェニル-9H,9’H-3,3’-ビカルバゾール13.5gを得た。 Synthesis example 4
Synthesis of Compound [21] 3-Bromocarbazole 20.9 g, 9-phenylcarbazole-3-boronic acid 15.0 g, palladium acetate 366 mg, tris (2-methylphenyl) phosphine 300 mg, 2M aqueous potassium carbonate solution 105 ml, dimethoxyethane 260 ml The mixed solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of tetrahydrofuran. The organic layer was washed twice with 100 ml of saturated brine, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by o-xylene recrystallization and vacuum dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
1H-NMR(CDCl3(d=ppm)):7.29-7.68(m,19H),7.73-7.99(m,13H),8.24-8.28(m,2H),8.48(s,2H)。
なお、この化合物[21]は、油拡散ポンプを用いて1×10-3Paの圧力下、約340℃で昇華精製を行ってから発光素子材料として使用した。HPLC純度(測定波長254nmにおける面積%)は昇華精製前が99.7%、昇華精製後が99.9%であった。 The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [21].
1 H-NMR (CDCl 3 (d = ppm)): 7.29-7.68 (m, 19H), 7.73-7.99 (m, 13H), 8.24-8.28 (m, 2H), 8.48 (s, 2H).
This compound [21] was used as a light emitting device material after sublimation purification at about 340 ° C. under a pressure of 1 × 10 −3 Pa using an oil diffusion pump. The HPLC purity (area% at a measurement wavelength of 254 nm) was 99.7% before sublimation purification and 99.9% after sublimation purification.
化合物[24]の合成
3-ブロモカルバゾール20.9g、フェニルカルバゾール-3-ボロン酸15.0g、酢酸パラジウム366mg、トリス(2-メチルフェニル)ホスフィン300mg、2M炭酸カリウム水溶液105ml、ジメトキシエタン260mlの混合溶液を窒素気流下、6時間還流した。室温に冷却した後、トルエン500mlで抽出した。有機層を水100mlで2回洗浄し、硫酸マグネシウムで乾燥後、エバポレートした。得られた濃縮物をシリカゲルカラムクロマトグラフィーにより精製し、真空乾燥した後、9-フェニル-9H,9’H-3,3’-ビカルバゾール13.5gを得た。 Synthesis example 5
Synthesis of Compound [24] Mixing of 20.9 g of 3-bromocarbazole, 15.0 g of phenylcarbazole-3-boronic acid, 366 mg of palladium acetate, 300 mg of tris (2-methylphenyl) phosphine, 105 ml of 2M aqueous potassium carbonate solution, and 260 ml of dimethoxyethane The solution was refluxed for 6 hours under a nitrogen stream. After cooling to room temperature, extraction was performed with 500 ml of toluene. The organic layer was washed twice with 100 ml of water, dried over magnesium sulfate and evaporated. The obtained concentrate was purified by silica gel column chromatography and vacuum-dried to obtain 13.5 g of 9-phenyl-9H, 9′H-3,3′-bicarbazole.
1H-NMR(CDCl3(d=ppm)):7.30-7.69(m,17H),7.78-7.86(m,6H),7.92-7.99(m,2H),8.06-8.10(t,1H),8.24-8.29(m,2H),8.48-8.50(t,2H)
なお、この化合物[24]は、油拡散ポンプを用いて1×10-3Paの圧力下、約330℃で昇華精製を行ってから発光素子材料として使用した。HPLC純度(測定波長254nmにおける面積%)は昇華精製前が99.6%、昇華精製後が99.9%であった。 The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was the compound [24].
1 H-NMR (CDCl 3 (d = ppm)): 7.30-7.69 (m, 17H), 7.78-7.86 (m, 6H), 7.92-7.99 (m, 2H), 8.06-8.10 (t, 1H), 8.24-8.29 (m, 2H), 8.48-8.50 (t, 2H)
This compound [24] was used as a light emitting device material after sublimation purification at about 330 ° C. under a pressure of 1 × 10 −3 Pa using an oil diffusion pump. The HPLC purity (area% at a measurement wavelength of 254 nm) was 99.6% before sublimation purification and 99.9% after sublimation purification.
化合物[4]の合成
3-ビフェニルボロン酸の代わりに(3,5-ジフェニルフェニル)ボロン酸を用いた以外は合成例2と同様の方法で合成し、白色固体を得た。得られた粉末の1H-NMR分析結果は次の通りであり、上記で得られた白色固体が化合物[4]であることが確認された。
1H-NMR(DMSO-d6(d=ppm)):7.29-7.60(m,20H),7.65-7.74(m,7H),7.80-7.93(m,10H),8.02-8.08(m,4H),8.22(s,1H),8.39(t,2H,J=6.8Hz),8.69(dd,2H,1J=4.3Hz,2J=1.6Hz)。 Synthesis Example 6
Synthesis of Compound [4] The compound [4] was synthesized in the same manner as in Synthesis Example 2 except that (3,5-diphenylphenyl) boronic acid was used instead of 3-biphenylboronic acid to obtain a white solid. The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [4].
1 H-NMR (DMSO-d 6 (d = ppm)): 7.29-7.60 (m, 20H), 7.65-7.74 (m, 7H), 7.80-7.93 ( m, 10H), 8.02-8.08 (m, 4H), 8.22 (s, 1H), 8.39 (t, 2H, J = 6.8 Hz), 8.69 (dd, 2H, 1 J = 4.3 Hz, 2 J = 1.6 Hz).
化合物[17]の合成
3-ビフェニルボロン酸の代わりに2-ビフェニルボロン酸を用いた以外は合成例2と同様の方法で合成し、白色固体を得た。得られた粉末の1H-NMR分析結果は次の通りであり、上記で得られた白色固体が化合物[17]であることが確認された。
1H-NMR(DMSO-d6(d=ppm)):7.20-7.75(m,26H),7.88(dt,2H,1J=8.6Hz,2J=1.8Hz),8.38(dd,2H,1J=7.7Hz,2J=2.6Hz),8.68(dd,2H,1J=3.2Hz,2J=1.6Hz)。 Synthesis example 7
Synthesis of Compound [17] Synthesis was performed in the same manner as in Synthesis Example 2 except that 2-biphenylboronic acid was used instead of 3-biphenylboronic acid to obtain a white solid. The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was Compound [17].
1 H-NMR (DMSO-d 6 (d = ppm)): 7.20-7.75 (m, 26H), 7.88 (dt, 2H, 1 J = 8.6 Hz, 2 J = 1.8 Hz) ), 8.38 (dd, 2H, 1 J = 7.7 Hz, 2 J = 2.6 Hz), 8.68 (dd, 2H, 1 J = 3.2 Hz, 2 J = 1.6 Hz).
化合物[7]の合成
3-ビフェニルボロン酸の代わりに2-ナフタレンボロン酸を用いた以外は合成例2と同様の方法で合成し、白色固体を得た。得られた粉末の1H-NMR分析結果は次の通りであり、上記で得られた白色固体が化合物[7]であることが確認された。
1H-NMR(DMSO-d6(d=ppm)):7.30-7.74(m,15H),7.82-8.11(m,10H),8.40(m,3H),8.70(dd,2H,1J=4.1Hz,2J=1.6Hz)。 Synthesis example 8
Synthesis of Compound [7] Synthesis was performed in the same manner as in Synthesis Example 2 except that 2-naphthaleneboronic acid was used instead of 3-biphenylboronic acid to obtain a white solid. The results of 1 H-NMR analysis of the obtained powder are as follows, and it was confirmed that the white solid obtained above was the compound [7].
1 H-NMR (DMSO-d 6 (d = ppm)): 7.30-7.74 (m, 15H), 7.82-8.11 (m, 10H), 8.40 (m, 3H) , 8.70 (dd, 2H, 1 J = 4.1 Hz, 2 J = 1.6 Hz).
ITO透明導電膜を50nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を38×46mmに切断し、エッチングを行った。得られた基板を “セミコクリーン56”(商品名、フルウチ化学(株)製)で15分間超音波洗浄してから、超純水で洗浄した。この基板を素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、正孔注入層としてHI-1を10nm蒸着した。次に、第一正孔輸送層として、HT-1を110nm蒸着した。次に、第二正孔輸送層として、化合物[1]を10nm蒸着した。次に、発光層として、ホスト材料に化合物H-1を、ドーパント材料に化合物D-1を用い、ドーパント材料のドープ濃度が5重量%になるようにして40nmの厚さに蒸着した。次に、電子輸送層として、化合物E-1を20nmの厚さに積層した。 Example 1
A glass substrate (manufactured by Geomat Co., Ltd., 11Ω / □, sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 × 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 × 10 −4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method. Next, HT-1 was deposited to 110 nm as the first hole transport layer. Next, 10 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer. Next, as a light-emitting layer, Compound H-1 was used as the host material, Compound D-1 was used as the dopant material, and vapor deposition was performed to a thickness of 40 nm so that the dopant concentration was 5 wt%. Next, Compound E-1 was laminated to a thickness of 20 nm as an electron transport layer.
第二正孔輸送層として表1に記載した材料を用いたこと以外は実施例1と同様にして発光素子を作製した。各実施例の結果は表1に示した。 Examples 2 to 10
A light emitting device was produced in the same manner as in Example 1 except that the materials described in Table 1 were used as the second hole transport layer. The results of each example are shown in Table 1.
第二正孔輸送層として表1に記載した材料を用いたこと以外は実施例1と同様にして発光素子を作製し、評価した。結果を表1に示す。なお、HT-2~HT-9は以下に示す化合物である。 Comparative Examples 1-8
A light emitting device was prepared and evaluated in the same manner as in Example 1 except that the materials described in Table 1 were used as the second hole transport layer. The results are shown in Table 1. HT-2 to HT-9 are the compounds shown below.
ITO透明導電膜を50nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を38×46mmに切断し、エッチングを行った。得られた基板を “セミコクリーン56”(商品名、フルウチ化学(株)製)で15分間超音波洗浄してから、超純水で洗浄した。この基板を素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、正孔注入層としてHI-1を10nm蒸着した。次に、第一正孔輸送層として、HT-1を110nm蒸着した。次に、第二正孔輸送層として、化合物[1]を10nm蒸着した。次に、発光層として、ホスト材料に化合物H-2を、ドーパント材料に化合物D-2を用い、ドーパント材料のドープ濃度が10重量%になるようにして40nmの厚さに蒸着した。次に、有機化合物(E-2)とドナー性化合物(リチウムキノリノール)を蒸着速度比1:1(=0.05nm/s:0.05nm/s)で混合した層を、電子輸送層として10nmの厚さに積層した。 Example 11
A glass substrate (manufactured by Geomat Co., Ltd., 11Ω / □, sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 × 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 × 10 −4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method. Next, HT-1 was deposited to 110 nm as the first hole transport layer. Next, 10 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer. Next, as a light emitting layer, the compound H-2 was used as the host material, the compound D-2 was used as the dopant material, and vapor deposition was performed to a thickness of 40 nm so that the dopant concentration was 10 wt%. Next, a layer in which the organic compound (E-2) and the donor compound (lithium quinolinol) were mixed at a deposition rate ratio of 1: 1 (= 0.05 nm / s: 0.05 nm / s) was used as an electron transport layer with a thickness of 10 nm. Laminated.
第二正孔輸送層、ホスト材料、ドーパント材料として表2に記載した材料を用いたこと以外は実施例11と同様にして発光素子を作製し、評価した。結果を表2に示す。 Examples 12-19
A light emitting device was prepared and evaluated in the same manner as in Example 11 except that the materials described in Table 2 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 2.
第二正孔輸送層、ホスト材料、ドーパント材料として表2に記載した化合物を用いたこと以外は実施例11と同様にして発光素子を作製し、評価した。結果を表2に示す。なお、HT-10は以下に示す化合物である。 Comparative Examples 9-15
A light emitting device was prepared and evaluated in the same manner as in Example 11 except that the compounds described in Table 2 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 2. HT-10 is a compound shown below.
ITO透明導電膜を50nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を38×46mmに切断し、エッチングを行った。得られた基板を “セミコクリーン56”(商品名、フルウチ化学(株)製)で15分間超音波洗浄してから、超純水で洗浄した。この基板を素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、正孔注入層としてHI-1を10nm蒸着した。次に、正孔輸送層として、HT-1を125nm蒸着した。次に、発光層として、ホスト材料に化合物[1]を、ドーパント材料に化合物D-2を用い、ドーパント材料のドープ濃度が10重量%になるようにして40nmの厚さに蒸着した。次に、電子輸送層として、化合物E-1を20nmの厚さに積層した。 Example 20
A glass substrate (manufactured by Geomat Co., Ltd., 11Ω / □, sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 × 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 × 10 −4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method. Next, 125 nm of HT-1 was deposited as a hole transport layer. Next, as the light emitting layer, the compound [1] was used as the host material, the compound D-2 was used as the dopant material, and the dopant material was deposited to a thickness of 40 nm so that the doping concentration was 10 wt%. Next, Compound E-1 was laminated to a thickness of 20 nm as an electron transport layer.
正孔輸送層、ホスト材料、ドーパント材料として表3に記載した材料を用いたこと以外は実施例20と同様に発光素子を作製し、評価した。結果を表3に示す。 Examples 21-24
A light emitting device was prepared and evaluated in the same manner as in Example 20 except that the materials described in Table 3 were used as the hole transport layer, the host material, and the dopant material. The results are shown in Table 3.
正孔輸送層、ホスト材料、ドーパント材料として表3に記載した化合物を用いたこと以外は実施例20と同様にして発光素子を作製し、評価した。結果を表3に示す。なお、化合物H-3、H-4、H-5、H-6は以下に示す化合物である。 Comparative Examples 16-24
A light emitting device was produced and evaluated in the same manner as in Example 20 except that the compounds described in Table 3 were used as the hole transport layer, the host material, and the dopant material. The results are shown in Table 3. Compounds H-3, H-4, H-5, and H-6 are the compounds shown below.
ITO透明導電膜を50nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を38×46mmに切断し、エッチングを行った。得られた基板を “セミコクリーン56”(商品名、フルウチ化学(株)製)で15分間超音波洗浄してから、超純水で洗浄した。この基板を素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、正孔注入層としてHI-1を10nm蒸着した。次に、第一正孔輸送層として、HT-7を90nm蒸着した。次に、第二正孔輸送層として、化合物[1]を30nm蒸着した。次に、発光層として、ホスト材料に化合物H-7を、ドーパント材料に化合物D-3を用い、ドーパント材料のドープ濃度が4重量%になるようにして30nmの厚さに蒸着した。次に、電子輸送層として、化合物E-1を35nmの厚さに積層した。 Example 25
A glass substrate (manufactured by Geomat Co., Ltd., 11Ω / □, sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 × 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 × 10 −4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method. Next, 90 nm of HT-7 was deposited as a first hole transport layer. Next, 30 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer. Next, as a light emitting layer, Compound H-7 was used as the host material, Compound D-3 was used as the dopant material, and the dopant material was deposited to a thickness of 30 nm so that the doping concentration was 4 wt%. Next, Compound E-1 was laminated to a thickness of 35 nm as an electron transport layer.
第二正孔輸送層、ホスト材料、ドーパント材料として表4に記載した材料を用いたこと以外は実施例25と同様に発光素子を作製し、評価した。結果を表4に示す。 Examples 26-32
A light emitting device was prepared and evaluated in the same manner as in Example 25 except that the materials described in Table 4 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 4.
第二正孔輸送層、ホスト材料、ドーパント材料として表4に記載した化合物を用いたこと以外は実施例25と同様にして発光素子を作製し、評価した。結果を表4に示す。なお、HT-11は以下に示す化合物である。 Comparative Examples 25-30
A light emitting device was prepared and evaluated in the same manner as in Example 25 except that the compounds described in Table 4 were used as the second hole transport layer, the host material, and the dopant material. The results are shown in Table 4. HT-11 is a compound shown below.
ITO透明導電膜を50nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を38×46mmに切断し、エッチングを行った。得られた基板を “セミコクリーン56”(商品名、フルウチ化学(株)製)で15分間超音波洗浄してから、超純水で洗浄した。この基板を素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、正孔注入層としてHI-1を10nm蒸着した。次に、第一正孔輸送層として、HT-8を80nm蒸着した。次に、第二正孔輸送層として、化合物[1]を10nm蒸着した。次に、発光層として、ホスト材料に化合物H-8を、ドーパント材料に化合物D-4を用い、ドーパント材料のドープ濃度が10重量%になるようにして30nmの厚さに蒸着した。次に、有機化合物(E-2)とドナー性化合物(Liq:リチウムキノリノール)を蒸着速度比1:1(=0.05nm/s:0.05nm/s)で混合した層を、電子輸送層として35nmの厚さに積層した。 Example 33
A glass substrate (manufactured by Geomat Co., Ltd., 11Ω / □, sputtered product) on which an ITO transparent conductive film was deposited to 50 nm was cut into 38 × 46 mm and etched. The obtained substrate was ultrasonically cleaned with “Semico Clean 56” (trade name, manufactured by Furuuchi Chemical Co., Ltd.) for 15 minutes and then with ultrapure water. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the device, placed in a vacuum deposition apparatus, and evacuated until the degree of vacuum in the apparatus became 5 × 10 −4 Pa or less. HI-1 was deposited as a hole injection layer to a thickness of 10 nm by a resistance heating method. Next, 80 nm of HT-8 was deposited as a first hole transport layer. Next, 10 nm of compound [1] was vapor-deposited as a 2nd positive hole transport layer. Next, as a light-emitting layer, Compound H-8 was used as the host material, Compound D-4 was used as the dopant material, and the dopant material was deposited to a thickness of 30 nm with a doping concentration of 10 wt%. Next, a layer in which an organic compound (E-2) and a donor compound (Liq: lithium quinolinol) are mixed at a deposition rate ratio of 1: 1 (= 0.05 nm / s: 0.05 nm / s) is used as an electron transport layer. Laminated to a thickness of
第二正孔輸送層として表5に記載した材料を用いたこと以外は実施例33と同様に発光素子を作製し、評価した。結果を表5に示す。 Examples 34-39
A light emitting device was produced and evaluated in the same manner as in Example 33 except that the materials described in Table 5 were used as the second hole transport layer. The results are shown in Table 5.
第二正孔輸送層として表5に記載した化合物を用いたこと以外は実施例33と同様にして発光素子を作製し、評価した。結果を表5に示す。なお、HT-12は以下に示す化合物である。 Comparative Examples 31-37
A light emitting device was prepared and evaluated in the same manner as in Example 33 except that the compounds described in Table 5 were used as the second hole transport layer. The results are shown in Table 5. HT-12 is a compound shown below.
正孔注入層として、化合物HI-1の代わりに化合物HT-12と化合物HI-2を用い、化合物HT-12に対して化合物HI-2のドープ濃度が5重量%になるようにして10nm蒸着したこと以外は実施例33と同様にして発光素子を作製した。結果を表6に示す。なお、HI-2は以下に示す化合物である。 Examples 40-45
As the hole injection layer, compound HT-12 and compound HI-2 are used in place of compound HI-1, and the compound HI-2 is doped with 10 nm by doping so that the doping concentration of compound HI-2 is 5% by weight. A light emitting device was fabricated in the same manner as in Example 33 except that. The results are shown in Table 6. HI-2 is a compound shown below.
ホスト材料に化合物H-8の代わりに化合物H-8と化合物H-9の混合ホスト(化合物H-8と化合物H-9の共蒸着膜を蒸着速度比が1:1で蒸着、さらにドーパントが蒸着される)を用いたこと以外は実施例40~45と同様にして発光素子を作製した。結果を表6に示す。なお、H-9は以下に示す化合物である。 Examples 46-51
Instead of compound H-8, a mixed host of compound H-8 and compound H-9 (co-deposited film of compound H-8 and compound H-9 was deposited at a deposition rate ratio of 1: 1 instead of compound H-8 as the host material. A light-emitting device was fabricated in the same manner as in Examples 40 to 45 except that (deposited) was used. The results are shown in Table 6. H-9 is a compound shown below.
正孔注入層として、化合物HI-1の代わりに化合物HI-3を用いたこと以外は実施例33~39と同様にして発光素子を作製した。結果を表6に示す。なお、HI-3は以下に示す化合物である。 Examples 52-57
A light emitting device was fabricated in the same manner as in Examples 33 to 39 except that Compound HI-3 was used instead of Compound HI-1 as the hole injection layer. The results are shown in Table 6. HI-3 is a compound shown below.
電子輸送層として、化合物E-2とドナー性化合物(Liq:リチウムキノリノール)を混合した層の代わりに表6に記載した材料を用いた以外は実施例28と同様にして発光素子を作製した。結果を表6に示す。なお、E-3~E-7は以下に示す化合物である。 Examples 58-62
A light emitting device was fabricated in the same manner as in Example 28 except that the material described in Table 6 was used instead of the layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) were mixed as the electron transport layer. The results are shown in Table 6. E-3 to E-7 are the compounds shown below.
電子輸送層として、表6に記載した化合物を用いたこと以外は実施例58と同様にして発光素子を作製し、評価した。結果を表6に示す。なお、E-8~E-9は以下に示す化合物である。 Examples 63-64
A light emitting device was prepared and evaluated in the same manner as in Example 58 except that the compounds described in Table 6 were used as the electron transport layer. The results are shown in Table 6. E-8 to E-9 are the compounds shown below.
電子輸送層として、化合物E-2とドナー性化合物(Liq:リチウムキノリノール)を混合した層の代わりに化合物E-2と化合物E-1を膜厚比1:1で35nmの厚さに積層して用いた以外は実施例41と同様にして発光素子を作製した。結果を表6に示す。 Example 65
As an electron transport layer, instead of a layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) are mixed, compound E-2 and compound E-1 are laminated at a film thickness ratio of 1: 1 to a thickness of 35 nm. A light emitting device was fabricated in the same manner as in Example 41 except that the above was used. The results are shown in Table 6.
電子輸送層として、化合物E-2とドナー性化合物(Liq:リチウムキノリノール)を混合した層の代わりに化合物E-3と化合物E-1を膜厚比1:1で35nmの厚さに積層して用いた以外は実施例41と同様にして発光素子を作製した。結果を表6に示す。 Example 66
As an electron transport layer, instead of a layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) are mixed, compound E-3 and compound E-1 are laminated at a film thickness ratio of 1: 1 to a thickness of 35 nm. A light emitting device was fabricated in the same manner as in Example 41 except that the above was used. The results are shown in Table 6.
電子輸送層として、化合物E-2とドナー性化合物(Liq:リチウムキノリノール)を混合した層の代わりに化合物E-4と化合物E-1を膜厚比1:1で35nmの厚さに積層して用いた以外は実施例41と同様にして発光素子を作製した。結果を表6に示す。 Example 67
As an electron transport layer, instead of a layer in which compound E-2 and a donor compound (Liq: lithium quinolinol) are mixed, compound E-4 and compound E-1 are laminated at a film thickness ratio of 1: 1 to a thickness of 35 nm. A light emitting device was fabricated in the same manner as in Example 41 except that the above was used. The results are shown in Table 6.
Claims (11)
- 下記一般式(1)で表されるカルバゾール骨格を有する化合物を含有することを特徴とする発光素子材料。
- 前記一般式(1)において、AとR21が異なる基である請求項1記載の発光素子材料。 The light emitting device material according to claim 1, wherein in the general formula (1), A and R 21 are different groups.
- 前記一般式(1)において、R3が前記一般式(3)で表される基であり、R15の位置と連結する請求項1又は2記載の発光素子材料。 The light emitting device material according to claim 1, wherein, in the general formula (1), R 3 is a group represented by the general formula (3) and is connected to the position of R 15 .
- 前記一般式(2)で表される基が、下記一般式(4)又は(5)で表される基である請求項1~3のいずれか記載の発光素子材料。
- 陽極と陰極の間に有機層が存在し、電気エネルギーにより発光する発光素子であって、前記陽極と陰極の間のいずれかの層に請求項1~5のいずれか記載の発光素子材料を含有することを特徴とする発光素子。 6. A light emitting device in which an organic layer is present between an anode and a cathode and emits light by electric energy, and the light emitting device material according to claim 1 is contained in any layer between the anode and the cathode. A light emitting element characterized by comprising:
- 陽極と陰極の間に少なくとも正孔輸送層が存在し、電気エネルギーにより発光する素子であって、前記正孔輸送層に請求項1~5のいずれか記載の発光素子材料を含有することを特徴とする発光素子。 An element that has at least a hole transport layer between an anode and a cathode and emits light by electric energy, wherein the hole transport layer contains the light emitting element material according to any one of claims 1 to 5. A light emitting element.
- 陽極と陰極の間に少なくとも正孔輸送層および発光層が存在し、電気エネルギーにより発光する素子であって、前記正孔輸送層に請求項1~5のいずれか記載の発光素子材料を含有し、前記発光層に三重項発光材料を含有することを特徴とする発光素子。 An element that has at least a hole transport layer and a light-emitting layer between an anode and a cathode and emits light by electric energy, wherein the hole-transport layer contains the light-emitting element material according to any one of claims 1 to 5. A light emitting element comprising a triplet light emitting material in the light emitting layer.
- 前記発光層がホスト材料と三重項発光性ドーパント材料を有し、請求項1~5のいずれか記載の発光素子材料がホスト材料であることを特徴とする請求項8記載の発光素子。 The light emitting device according to claim 8, wherein the light emitting layer has a host material and a triplet light emitting dopant material, and the light emitting device material according to any one of claims 1 to 5 is a host material.
- 前記正孔輸送層と陽極の間に正孔注入層が存在し、前記正孔注入層がアクセプター性化合物を含有することを特徴とする請求項6~9のいずれか記載の発光素子。 10. The light emitting device according to claim 6, wherein a hole injection layer exists between the hole transport layer and the anode, and the hole injection layer contains an acceptor compound.
- 前記発光層と陰極の間に少なくとも電子輸送層が存在し、前記電子輸送層が、電子受容性窒素を含み、さらに炭素、水素、窒素、酸素、ケイ素、リンの中から選ばれる元素で構成されるヘテロアリール環構造を有する化合物を含有することを特徴とする請求項6~10のいずれか記載の発光素子。 There is at least an electron transport layer between the light-emitting layer and the cathode, and the electron transport layer contains electron-accepting nitrogen, and further includes an element selected from carbon, hydrogen, nitrogen, oxygen, silicon, and phosphorus. The light-emitting device according to claim 6, further comprising a compound having a heteroaryl ring structure.
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KR102095764B1 (en) | 2020-04-02 |
JP6658719B2 (en) | 2020-03-04 |
CN104488105A (en) | 2015-04-01 |
TW201412712A (en) | 2014-04-01 |
KR20150039131A (en) | 2015-04-09 |
EP2879196A4 (en) | 2016-02-24 |
CN104488105B (en) | 2017-03-22 |
TWI693212B (en) | 2020-05-11 |
JPWO2014017484A1 (en) | 2016-07-11 |
JP6299223B2 (en) | 2018-03-28 |
JP2018061052A (en) | 2018-04-12 |
EP2879196A1 (en) | 2015-06-03 |
EP2879196B1 (en) | 2019-06-19 |
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