WO2014017332A1 - Optical component - Google Patents
Optical component Download PDFInfo
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- WO2014017332A1 WO2014017332A1 PCT/JP2013/069281 JP2013069281W WO2014017332A1 WO 2014017332 A1 WO2014017332 A1 WO 2014017332A1 JP 2013069281 W JP2013069281 W JP 2013069281W WO 2014017332 A1 WO2014017332 A1 WO 2014017332A1
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- WIPO (PCT)
- Prior art keywords
- film
- multilayer film
- refractive index
- optical
- optical multilayer
- Prior art date
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- 230000003287 optical effect Effects 0.000 title claims abstract description 113
- 239000010955 niobium Substances 0.000 claims abstract description 54
- 239000000463 material Substances 0.000 claims abstract description 53
- 239000010936 titanium Substances 0.000 claims abstract description 45
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 37
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 37
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000000155 melt Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 206010021143 Hypoxia Diseases 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 154
- 239000010409 thin film Substances 0.000 abstract description 21
- 238000007740 vapor deposition Methods 0.000 abstract description 14
- 238000003303 reheating Methods 0.000 abstract description 9
- 230000000052 comparative effect Effects 0.000 description 55
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 24
- 238000000034 method Methods 0.000 description 20
- 229910004298 SiO 2 Inorganic materials 0.000 description 19
- 238000010586 diagram Methods 0.000 description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 13
- 229910000831 Steel Inorganic materials 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 12
- 235000012239 silicon dioxide Nutrition 0.000 description 12
- 238000004088 simulation Methods 0.000 description 12
- 239000010959 steel Substances 0.000 description 12
- 210000002268 wool Anatomy 0.000 description 12
- 239000012788 optical film Substances 0.000 description 10
- 239000004745 nonwoven fabric Substances 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 230000003373 anti-fouling effect Effects 0.000 description 7
- 239000012528 membrane Substances 0.000 description 7
- 229910010413 TiO 2 Inorganic materials 0.000 description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 6
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 229910052809 inorganic oxide Inorganic materials 0.000 description 5
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000005375 organosiloxane group Chemical group 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 150000003553 thiiranes Chemical class 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920006295 polythiol Polymers 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/02—Lenses; Lens systems ; Methods of designing lenses
Definitions
- the present invention relates to an optical component, and more particularly to an optical component using a vapor deposition material containing titanium oxide as a component as part of an optical multilayer film.
- plastic optical parts such as lenses, prisms, mirrors, and filters are prone to static electricity, and dirt such as dust and dust is likely to adhere to the optical parts. If the optical component is wiped off with the dirt attached, the surface of the component is scratched due to the dirt. Further, the performance and performance of the optical component is adversely affected, for example, the permeability and reflectivity deteriorate due to the adhesion of dirt.
- a conductive thin film is inserted into the optical multilayer film that is thinly coated on the surface of the optical component in order to suppress the generation of static electricity (suppress charging).
- static electricity compress charging
- ITO indium tin oxide
- SnO tin oxide
- ZnO zinc oxide
- Examples of the method for forming such an optical thin film include a vacuum deposition method, a sputtering method, an ion plating method, a CVD method, a sol-gel method, and a PLD method.
- the vacuum deposition method can easily handle changes in the film material and the base material to which the film is attached, using the same equipment, and the film formation speed is fast, so the processing time is short and the cost is lower than other methods. Since it has the advantage of being easily realized, it is used in many industrial fields including optical components.
- Titanium oxide is a representative material of a transparent thin film material having a high refractive index, and is generally used in a vapor deposition method as a lens coating material. It is known that when anatase type titanium oxide (TiO 2 ) is doped with niobium (Nb) in a small amount (0.1 mol% to 20 mol%), the conductivity is improved as compared with 100% titanium oxide (for example, , See Patent Document 1). In this patent document 1, a sintered body of niobium-containing titanium oxide (Nb: TiO 2 ) having an anatase type crystal structure is used as a material for forming a thin film, and this is deposited on a substrate such as a display panel by a PLD method. Thus, it is described that it is used as a transparent conductive film.
- Nb niobium-containing titanium oxide
- niobium-containing titanium oxide (Nb: TiO 2 ) film having an anatase type crystal structure When a niobium-containing titanium oxide (Nb: TiO 2 ) film having an anatase type crystal structure is used, it is necessary to increase the crystallinity of the coated thin film in order to improve conductivity. Therefore, the crystallinity is improved by performing reheating (annealing) after film formation.
- reheating annealing
- the optical multilayer film is formed by alternately laminating a low refractive index layer and a high refractive index layer, and is usually made of two kinds of materials (for example, SiO 2 and TiO 2 having a higher refractive index than this). It has a binary film structure. If an ITO film or the like is further inserted into this, a ternary film structure is formed, and the vapor deposition apparatus must be modified to handle the ternary system.
- the present invention has been made to solve such a problem, and does not apply a technique for enhancing crystallinity such as reheating after film formation, and is vapor-deposited to handle three kinds of materials. It is an object of the present invention to obtain an optical component having a high antistatic effect without modifying the apparatus.
- the material of the high refractive index layer of the optical multilayer film is composed of titanium and niobium as components. It is formed of a metal oxide melt containing oxygen vacancies (referred to as niobium-containing titanium suboxide). That is, in the present invention, an optical component is configured by forming a film on the surface of a substrate by a vapor deposition method using a material made of niobium-containing titanium suboxide.
- a metal oxide in which niobium is doped in a small amount with respect to titanium is used for the high refractive index layer in the optical multilayer film.
- the conductivity is improved and high antistatic properties can be obtained.
- the thin film becomes amorphous without crystallinity. There is no need to do it.
- the optical multilayer film since it is not necessary to insert a conductive thin film such as ITO, the optical multilayer film has a binary film structure in which low refractive index layers and high refractive index layers are alternately laminated. As a result, it is possible to obtain an optical component having a high antistatic effect without performing reheating after film formation on the surface of the substrate and without modifying the vapor deposition apparatus to handle three types of materials. it can.
- FIG. 1 is a diagram illustrating a configuration example of the optical component according to the present embodiment.
- a hard coat film 12, an optical multilayer film 13, and an antifouling film 14 are formed in this order from the base 11 on the surface of the base 11.
- FIG. 1 schematically shows a configuration example of an optical component, and does not represent the actual thickness of the substrate 11 and the actual thickness of each of the films 12 to 14 in an accurate ratio.
- a primer layer is formed between the surface of the substrate 11 and the hard coat film 12, or between the surface of the substrate 11 and the hard coat film 12, between the hard coat film 12 and the optical multilayer film 13, or optical multilayer.
- an intermediate layer may be formed between the film 13 and the antifouling film 14 or the like.
- the hard coat film 12 or the optical multilayer film 13 may be formed on the back surface or both the front and back surfaces of the substrate 11.
- Examples of the material (base material) of the substrate 11 include polyurethane resin, episulfide resin, polycarbonate resin, polyester resin, acrylic resin, polyether sulfone resin, poly-4-methylpentene-1 resin, diethyl glycol bisallyl carbonate resin, and the like. Is mentioned.
- the polyurethane resin obtained by addition-polymerizing a polyisocyanate compound, a polythiol, and / or a sulfur-containing polyol can be mentioned, for example.
- the episulfide resin obtained by addition-polymerizing an episulfide group and a polythiol and / or sulfur-containing polyol can be mentioned.
- the hard coat film 12 is formed by uniformly applying a hard coat liquid to the substrate 11 by a known method such as a dipping method, a spin coat method, or a spray method.
- a material of the hard coat film 12 for example, an organosiloxane resin containing inorganic oxide fine particles is used.
- the hard coat liquid in this case is produced by dispersing (mixing) an organosiloxane resin and an inorganic oxide fine particle sol in water or an alcohol solvent.
- the organosiloxane resin is preferably obtained by hydrolyzing and condensing alkoxysilane.
- alkoxysilane include ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, methyltrimethoxysilane, and ethyl silicate.
- alkoxysilane hydrolysis condensates are produced by hydrolyzing the alkoxysilane compound or a combination thereof with an acidic aqueous solution such as hydrochloric acid.
- the inorganic oxide fine particles include zinc oxide, silicon dioxide, aluminum oxide, titanium oxide, zirconium oxide, tin oxide, beryllium oxide, antimony oxide, tungsten oxide, and cerium oxide sol alone or in two types. What mixed the above can be mentioned.
- the size of the inorganic oxide fine particles is preferably 1 to 100 nanometers (nm), and more preferably 1 to 50 nm.
- the blending amount of the inorganic oxide fine particles preferably occupies 40 to 60 wt% in the hard coat component from the viewpoint of securing the hardness and toughness in the hard coat film 12 to an appropriate degree.
- an acetylacetone metal salt, an ethylenediaminetetraacetic acid metal salt, or the like can be added to the hard coat solution as a curing catalyst.
- a surfactant, a colorant, a solvent and the like can be added for adjustment as necessary.
- the film thickness of the hard coat film 12 is preferably 0.5 to 4.0 micrometers ( ⁇ m), more preferably 1.0 to 3.0 ⁇ m.
- the lower limit of the film thickness is determined from a limit value that a sufficient hardness cannot be obtained if the thickness is smaller than this.
- the upper limit is determined from a limit value that, if thicker than this, the possibility of occurrence of problems related to physical properties such as occurrence of cracks and brittleness is dramatically increased.
- the optical multilayer film 13 is formed by alternately laminating low refractive index layers and high refractive index layers by vacuum deposition.
- Examples of the material of the thin film forming the low refractive index layer include SiO 2 (silicon dioxide) and MgF 2 (magnesium fluoride).
- a melt of a metal oxide (niobium-containing titanium suboxide) having oxygen vacancies containing titanium and niobium as components is used as the material for the thin film forming the high refractive index layer.
- the melt is formed by melting titanium and niobium in a state having oxygen vacancies, cooling it, pulverizing to a desired grain size (for example, 3 mm or less) and sieving.
- the ratio of the niobium-containing titanium suboxide metal element (Ti 1-x Nb x ) to the oxygen element (O) is, for example, 3: 5. Hereinafter, this is expressed as (Ti 1-x Nb x ) 3 O 5 .
- the doping amount of niobium in the niobium-containing titanium suboxide is preferably 2 mol% or more and 16 mol% or less with respect to titanium.
- the antifouling film 14 is formed in order to improve the water and oil repellency of the lens surface and prevent water scuffing, and is made of a fluorine compound.
- the antifouling film 14 can be formed by a known method such as a dipping method, a spin method, a spray method, or a vapor deposition method.
- FIG. 2 is a diagram showing experimental results obtained by performing X-ray diffraction analysis (XRD: X-Ray Diffraction analysis) on niobium-containing titanium suboxide.
- XRD X-Ray Diffraction analysis
- XRD analysis measures the intensity of a reflected wave from a material while changing the incident angle of X-rays to the material.
- a graph is obtained with the horizontal axis representing the incident angle and the vertical axis representing the intensity.
- the reference value (intensity zero) on the vertical axis is shifted in the vertical direction so that the measurement results obtained by changing the doping amount of niobium are not overlapped and difficult to see.
- Examples 1 and 2 are spectacle lenses
- Example 3 is a band-pass filter
- Example 4 is a half mirror.
- FIG. 3 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the spectacle lens according to Example 1, and a film configuration of the optical multilayer film according to Comparative Examples 1-1 and 1-2.
- 3A shows Example 1
- FIG. 3B shows Comparative Example 1-1
- FIG. 3C shows Comparative Example 1-2.
- TNO Ti 1-x Nb x
- FIG. 3 O 5 is abbreviated as TNO.
- the layers of the optical multilayer film 13 are L1 to L7 layers in order from the side closer to the substrate 11.
- the odd-numbered layer is formed of silicon dioxide (SiO 2 ) as a low-refractive index material
- the even-numbered layer is niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ) as a high-refractive index material.
- the optical multilayer film 13 of Example 1 has a binary film configuration.
- the refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L7 are as shown in FIG.
- an optical multilayer film is formed of seven layers L1 to L7 as in Example 1, and an odd layer is formed of silicon dioxide (low refractive index material). SiO 2 ), and even layers were made of zirconium dioxide (ZrO 2 ) as a high refractive index material.
- the optical multilayer film of Comparative Example 1-1 also has a binary film structure. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L7 are as shown in FIG.
- an optical multilayer film was formed of eight layers L1 to L8 by further inserting an ITO film as a conductive thin film.
- each layer of L1, L3, L5, and L8 is formed of silicon dioxide (SiO 2 ) as a low refractive index material
- each layer of L2, L4, and L6 is formed of zirconium dioxide (ZrO 2 ) as a high refractive index material.
- one layer of L7 was formed of indium tin oxide (ITO).
- the optical multilayer film of Comparative Example 1-2 has a ternary film structure. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L8 are as shown in FIG.
- Example 1 and Comparative Examples 1-1 and 1-2 in which an optical multilayer film was formed as shown in FIG. 3 an experiment regarding the presence or absence of antistatic properties was performed as follows. That is, while measuring the charged potential (kilovolt: kV) immediately after rubbing the lens convex surface with a 1 kg load for 20 seconds 20 times using a nonwoven fabric (“Pure ⁇ Leaf ”manufactured by Ozu Sangyo Co., Ltd.), the lens convex surface of the steel wool piece The presence or absence of adhesion to was observed. The charged potential was measured with a static electricity meter (“FMX-003” manufactured by Simco Japan Co., Ltd.).
- a static electricity meter FMX-003 manufactured by Simco Japan Co., Ltd.
- FIG. 4 is a diagram showing experimental results regarding this antistatic property.
- the absolute value of the charging potential is 3 minutes after the non-woven fabric is rubbed.
- the steel wool piece remained attached to the convex surface of the lens without approaching zero. This indicates that there is no antistatic property.
- Comparative Example 1-2 the absolute value of the charging potential was zero immediately after the non-woven fabric was rubbed, and the steel wool piece did not adhere to the lens convex surface at all. This indicates that there is antistatic properties.
- Comparative Example 1-2 has a ternary film structure composed of SiO 2 , ZrO 2, and ITO, there is a problem that the vapor deposition apparatus needs to be modified.
- Example 1 since it is a binary film structure composed of SiO 2 and (Ti 1-x Nb x ) 3 O 5, it is not necessary to modify the vapor deposition apparatus. Moreover, the absolute value of the charging potential is fairly small and almost zero immediately after the rubbing of the nonwoven fabric, and the charging potential is zero when 1 minute has passed. Therefore, the steel wool piece did not adhere to the lens convex surface.
- the deposited thin film is amorphous, but the conductivity is improved and high antistatic properties can be obtained. Further, since the deposited thin film is in an amorphous state having no crystallinity, it is not necessary to perform a reheating (annealing) treatment after the film formation in order to improve the crystallinity.
- FIG. 5 is a diagram showing a simulation result regarding the reflectance characteristic. As shown in FIG. 5, in both Example 1 and Comparative Examples 1-1 and 1-2, the reflectance is low in the visible wavelength range. Thus, it was found that even when (Ti 1-x Nb x ) 3 O 5 was used for the high refractive index layer as in Example 1, the visibility of the spectacle lens was not lowered.
- FIG. 6 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the spectacle lens according to Example 2, and a film configuration of the optical multilayer film according to Comparative Examples 2-1 and 2-2.
- 6A shows Example 2
- FIG. 6B shows Comparative Example 2-1
- FIG. 6C shows Comparative Example 2-2.
- TNO Ti 1-x Nb x
- FIG. 6 as well, (Ti 1-x Nb x ) 3 O 5 is abbreviated as TNO.
- the layers of the optical multilayer film 13 are L1 to L5 layers in order from the side closer to the substrate 11.
- the odd layer is formed of silicon dioxide (SiO 2 ) as a low refractive index material
- the even layer is formed from niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ) as a high refractive index material.
- the optical multilayer film 13 of Example 2 also has a binary film configuration.
- the refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L5 are as shown in FIG.
- an optical multilayer film is formed of five layers L1 to L5 as in Example 2, and an odd layer is formed of silicon dioxide (low refractive index material). SiO 2 ), and even layers were made of titanium dioxide (TiO 2 ) as a high refractive index material.
- the optical multilayer film of Comparative Example 2 also has a binary film configuration. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L5 are as shown in FIG.
- an optical multilayer film is formed of five layers L1 to L5 as in Example 2, and an odd layer is formed of silicon dioxide (low refractive index material). SiO 2 ), and even layers were made of zirconium dioxide (ZrO 2 ) as a high refractive index material.
- the optical multilayer film of Comparative Example 2-2 also has a binary film structure. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L5 are as shown in FIG.
- FIG. 7 is a diagram showing experimental results regarding the antistatic property.
- Comparative Examples 2-1 and 2-2 in the binary film structure composed of SiO 2 and TiO 2 , or SiO 2 and ZrO 2 , 3 minutes after the non-woven fabric is rubbed. The absolute value of the charging potential did not approach zero even after the lapse of time, and the steel wool piece remained attached to the convex surface of the lens. This indicates that there is no antistatic property.
- Example 2 the absolute value of the charging potential is quite small and almost zero immediately after the non-woven fabric is rubbed, and approaches zero as time elapses. Therefore, the steel wool piece did not adhere to the lens convex surface. Thus, it was found that Example 2 also exhibited antistatic properties.
- FIG. 8 is a diagram showing a simulation result relating to the reflectance characteristic. As shown in FIG. 8, in both Example 2 and Comparative Examples 2-1 and 2-2, the reflectance is low in the visible wavelength range. As a result, it was found that even when (Ti 1-x Nb x ) 3 O 5 was used for the high refractive index layer as in Example 2, the visibility of the spectacle lens was not lowered.
- FIG. 9 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the bandpass filter according to the third embodiment.
- FIG. 10 is a diagram showing a film configuration of an optical multilayer film according to Comparative Example 3.
- TNO Ti 1-x Nb x
- FIGS. 9 and 10 (Ti 1-x Nb x ) 3 O 5 is also abbreviated as TNO.
- the layers of the optical multilayer film 13 are L1 to L36 layers in order from the side closer to the substrate 11.
- the odd-numbered layer is formed of niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ), which is a high-refractive index material
- the even-numbered layer is silicon dioxide (SiO 2 ), which is a low-refractive index material.
- the optical multilayer film 13 of Example 3 has a binary film configuration.
- the refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L36 are as shown in FIG.
- the optical multilayer film is formed of 36 layers L1 to L36 as in Example 3, and the odd layer is formed of titanium dioxide (TiO 2 ) as a high refractive index material, The even layer was made of silicon dioxide (SiO 2 ) as a low refractive index material.
- the optical multilayer film of Comparative Example 3 also has a binary film configuration. The refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L36 are as shown in FIG.
- Example 3 and Comparative Example 3 in which an optical multilayer film was formed as shown in FIGS. 9 and 10 an experiment regarding the presence or absence of antistatic properties was performed as follows. That is, the surface of a component was rubbed for 20 seconds at a load of 1 kilogram for 20 seconds using a non-woven fabric (“Pure Leaf” manufactured by Ozu Sangyo Co., Ltd.), and then the presence or absence of adhesion of a steel wool piece to the component surface was observed. In addition, the surface resistance of the parts was measured with a high resistivity meter (“Hiresta-UP” manufactured by Mitsubishi Chemical). The surface resistance value was measured with an applied voltage of 500 [V] and a measurement holding time of 30 seconds, and this was repeated three times to calculate an average value.
- a non-woven fabric (“Pure Leaf” manufactured by Ozu Sangyo Co., Ltd.)
- Hiresta-UP manufactured by Mitsubishi Chemical
- FIG. 11 is a diagram showing experimental results regarding this antistatic property.
- the average value of the surface resistance is 1.74 ⁇ 10 10 [ ⁇ / ⁇ ], and the steel wool piece does not adhere to the surface of the component immediately after the non-woven fabric is rubbed. It was.
- the smaller the resistance value of the film the higher the conductivity and the antistatic property, and the antistatic property can be obtained almost certainly if the resistance value is 10 11 [ ⁇ / ⁇ ] or less. Yes. Therefore, the above experimental results show that Example 3 exhibits antistatic properties.
- Comparative Example 3 in the binary film configuration composed of TiO 2 and SiO 2 , the steel wool piece remained attached to the part surface.
- the average value of the surface resistance was 4.84 ⁇ 10 12 [ ⁇ / ⁇ ]. This indicates that Comparative Example 3 has no antistatic property.
- FIG. 12 is a diagram illustrating a simulation result regarding the reflectance characteristic. As shown in FIG. 12, in both Example 3 and Comparative Example 3, the reflectance is low in the desired wavelength range. As a result, it was found that the desired bandpass filter characteristics were obtained in both cases of Example 3 and Comparative Example 3.
- FIG. 13 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the half mirror according to Example 4 and a film configuration of the optical multilayer film according to Comparative Example 4.
- FIG. 13A shows Example 4
- FIG. 13B shows Comparative Example 4. Also in FIG. 13, is abbreviated as (Ti 1-x Nb x) 3 O 5 is TNO.
- the layers of the optical multilayer film 13 are L1 to L12 layers in order from the side closer to the substrate 11.
- the odd layer is formed of niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ), which is a high refractive index material
- the even layer is formed of silicon dioxide (SiO 2 ), which is a low refractive index material.
- the optical multilayer film 13 of Example 4 has a binary film configuration.
- the refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L12 are as shown in FIG.
- the optical multilayer film is formed of 12 layers L1 to L12 as in Example 4, and the odd-numbered layer is made of titanium dioxide (TiO 2) of a high refractive index material. 2 ) The even layer was made of silicon dioxide (SiO 2 ) as a low refractive index material.
- the optical multilayer film of Comparative Example 4 also has a binary film configuration. The refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L12 are as shown in FIG.
- FIG. 14 is a diagram showing experimental results regarding this antistatic property.
- Comparative Example 4 in the binary film configuration composed of TiO 2 and SiO 2 , the steel wool piece remained attached to the part surface. Further, the surface resistance value was too large to be measured. This indicates that Comparative Example 4 has no antistatic property.
- Example 4 shows that it has antistatic properties.
- FIG. 15 is a diagram showing a simulation result related to the reflectance characteristic. As shown in FIG. 15, in both Example 4 and Comparative Example 4, the reflectance is high in most wavelength ranges. Thus, it was found that the characteristics of the half mirror can be obtained in both cases of Example 4 and Comparative Example 4.
- the thin film material of the high refractive index layer in the optical multilayer film 13 is converted to niobium-containing suboxide.
- Made of titanium the thin film formed by vapor-depositing niobium containing titanium suboxide will be in an amorphous state, it has high electroconductivity and can obtain high antistatic property. Further, since it is amorphous, it is not necessary to perform reheating (annealing) after film formation in order to improve crystallinity.
- the optical multilayer film 13 has a binary film configuration in which low refractive index layers and high refractive index layers are alternately laminated. Accordingly, an optical component having a high antistatic effect can be obtained without performing reheating after film formation on the surface of the substrate 11 that is vulnerable to high heat, and without modifying the vapor deposition apparatus to handle three types of materials. Obtainable.
- optical components In the above embodiment, three examples of spectacle lenses, a bandpass filter, and a half mirror have been described as examples of optical components, but the present invention is not limited to this.
- it can be applied to other optical components such as lenses other than glasses, filters other than bandpass filters, mirrors other than half mirrors, beam splitters, prisms, polarizing elements, wave plates, light shielding plates, and ground glass. .
- the said embodiment demonstrated the example provided with the base
- the base 11 and the optical multilayer film 13 are essential components, and the hard coat film 12 and the antifouling film 14 may be used in accordance with the applications of the various optical parts as described above.
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Abstract
In an optical component obtained by forming an optical multilayer film (13) on a surface of a substrate (11) by vapor deposition, a material of a high refractive index layer in the optical multilayer film (13) is made of niobium-containing titanium suboxide, whereby a thin film formed by vapor deposition of the niobium-containing titanium suboxide can be made to have improved conductivity though being in an amorphous state. This makes it possible to achieve high antistatic performance, without performing reheating treatment for increasing crystallinity for the purpose of increasing the conductivity, and without redesigning vapor deposition equipment for handling three types of materials.
Description
本発明は光学部品に関し、特に、チタン酸化物を成分として含む蒸着材料を光学多層膜の一部に用いた光学部品に関するものである。
The present invention relates to an optical component, and more particularly to an optical component using a vapor deposition material containing titanium oxide as a component as part of an optical multilayer film.
一般に、レンズ、プリズム、ミラー、フィルタ等のプラスチック製の光学部品では、静電気が発生しやすく、ゴミや埃などの汚れが光学部品に付着しやすい。汚れが付着した状態で光学部品の拭き上げを行うと、汚れが原因となって部品表面にキズがついてしまう。また、汚れの付着により透過性や反射性が悪くなるなど、光学部品の性能面にも悪影響を及ぼしてしまう。
Generally, plastic optical parts such as lenses, prisms, mirrors, and filters are prone to static electricity, and dirt such as dust and dust is likely to adhere to the optical parts. If the optical component is wiped off with the dirt attached, the surface of the component is scratched due to the dirt. Further, the performance and performance of the optical component is adversely affected, for example, the permeability and reflectivity deteriorate due to the adhesion of dirt.
そこで、従来、光学部品に対する汚れの付着を防ぐために、静電気の発生を抑制（帯電を抑制）することを目的として、光学部品の表面に薄くコーティングされる光学多層膜に導電性薄膜を挿入することが行われている。なお、用途によっては高い透光性を確保することも必要である。その場合、光学部品に帯電防止性を持たせるための薄膜形成に用いる材料としては、高い導電性と高い透光性とを両立可能な材料を用いることが必要となる。そのため、導電性薄膜の材料としては、ＩＴＯ（酸化インジウムスズ）、ＳｎＯ（酸化スズ）、ＺｎＯ（酸化亜鉛）などが用いられていた。
Therefore, conventionally, in order to prevent dirt from adhering to the optical component, a conductive thin film is inserted into the optical multilayer film that is thinly coated on the surface of the optical component in order to suppress the generation of static electricity (suppress charging). Has been done. Depending on the application, it is also necessary to ensure high translucency. In that case, as a material used for forming a thin film for imparting antistatic properties to the optical component, it is necessary to use a material that can achieve both high conductivity and high light transmission. For this reason, ITO (indium tin oxide), SnO (tin oxide), ZnO (zinc oxide), and the like have been used as the material for the conductive thin film.
このような光学薄膜の形成方法としては、真空蒸着法、スパッタリング法、イオンプレーティング法、ＣＶＤ法、ゾルゲル法、ＰＬＤ法などが挙げられる。中でも真空蒸着法は、膜材料の変更や膜を付ける基材の変更に同じ装置でも容易に対応可能であるほか、成膜速度が速いため処理時間が短く、他の方法に比べて低コストを実現しやすいといった利点を有することから、光学部品を始め多くの産業分野で用いられている。
Examples of the method for forming such an optical thin film include a vacuum deposition method, a sputtering method, an ion plating method, a CVD method, a sol-gel method, and a PLD method. In particular, the vacuum deposition method can easily handle changes in the film material and the base material to which the film is attached, using the same equipment, and the film formation speed is fast, so the processing time is short and the cost is lower than other methods. Since it has the advantage of being easily realized, it is used in many industrial fields including optical components.
チタン酸化物は高屈折率を有する透明薄膜材料の代表的な物質で、レンズのコーティング材料として一般的に蒸着法でも用いられている。なお、アナターゼ型の酸化チタン（ＴｉＯ２）にニオブ（Ｎｂ）を少量（０．１ｍｏｌ％～２０ｍｏｌ％）ドープさせると、酸化チタン１００％よりも導電性が向上することが知られている（例えば、特許文献１参照）。この特許文献１には、アナターゼ型結晶構造を有するニオブ含有酸化チタン（Ｎｂ：ＴｉＯ２）の焼結体を薄膜形成用の材料として用い、これをＰＬＤ法でディスプレイパネル等の基材に蒸着させることにより、透明導電膜として利用することが記載されている。
Titanium oxide is a representative material of a transparent thin film material having a high refractive index, and is generally used in a vapor deposition method as a lens coating material. It is known that when anatase type titanium oxide (TiO 2 ) is doped with niobium (Nb) in a small amount (0.1 mol% to 20 mol%), the conductivity is improved as compared with 100% titanium oxide (for example, , See Patent Document 1). In this patent document 1, a sintered body of niobium-containing titanium oxide (Nb: TiO 2 ) having an anatase type crystal structure is used as a material for forming a thin film, and this is deposited on a substrate such as a display panel by a PLD method. Thus, it is described that it is used as a transparent conductive film.
アナターゼ型結晶構造を有するニオブ含有酸化チタン（Ｎｂ：ＴｉＯ２）の膜を用いる場合、導電性を向上させるために、コーティングした薄膜の結晶性を高めることが必要である。そのため、成膜後に再加熱（アニール）を行うことで結晶性を高めることが行われている。しかしながら、プラスチック製の光学部品の場合、成膜後に再加熱を行うと、プラスチックが溶けてしまうため、再加熱による結晶性を高める手法は適用することができないという問題があった。
When a niobium-containing titanium oxide (Nb: TiO 2 ) film having an anatase type crystal structure is used, it is necessary to increase the crystallinity of the coated thin film in order to improve conductivity. Therefore, the crystallinity is improved by performing reheating (annealing) after film formation. However, in the case of an optical component made of plastic, there is a problem that a technique for improving crystallinity by reheating cannot be applied because the plastic melts when reheating is performed after film formation.
一方、上述したように、光学部品の表面にコーティングされる光学多層膜に導電性薄膜（ＩＴＯ、ＳｎＯ、ＺｎＯなどを材料とする膜）を挿入する方法もあるが、この方法では、蒸着装置の改造が必要になるという問題があった。すなわち、光学多層膜は、低屈折率層と高屈折率層とを交互に積層させて形成されており、通常は２種類の材料（例えば、ＳｉＯ２とこれより屈折率の高いＴｉＯ２）から成る２元系の膜構成となっている。これに更にＩＴＯ膜などを挿入すると、３元系の膜構成となり、３元系を扱うために蒸着装置を改造しなければならなくなる。
On the other hand, as described above, there is a method of inserting a conductive thin film (film made of ITO, SnO, ZnO, etc.) into an optical multilayer film coated on the surface of an optical component. There was a problem that remodeling was necessary. That is, the optical multilayer film is formed by alternately laminating a low refractive index layer and a high refractive index layer, and is usually made of two kinds of materials (for example, SiO 2 and TiO 2 having a higher refractive index than this). It has a binary film structure. If an ITO film or the like is further inserted into this, a ternary film structure is formed, and the vapor deposition apparatus must be modified to handle the ternary system.
本発明は、このような問題を解決するために成されたものであり、成膜後に再加熱を行うといった結晶性を高める手法を適用することなく、かつ、３種類の材料を扱うために蒸着装置を改造することなく、帯電防止効果の高い光学部品を得ることができるようにすることを目的とする。
The present invention has been made to solve such a problem, and does not apply a technique for enhancing crystallinity such as reheating after film formation, and is vapor-deposited to handle three kinds of materials. It is an object of the present invention to obtain an optical component having a high antistatic effect without modifying the apparatus.
上記した課題を解決するために、本発明では、基体の表面に光学多層膜を蒸着加工して成る光学部品において、光学多層膜のうち高屈折率層の材料を、チタンとニオブとを成分として含む酸素欠損を有する金属酸化物の溶融体（ニオブ含有亜酸化チタンという）により形成している。すなわち、本発明では、ニオブ含有亜酸化チタンから成る材料を用いて基体の表面に蒸着法で成膜することによって光学部品を構成している。
In order to solve the above problems, in the present invention, in an optical component formed by vapor-depositing an optical multilayer film on the surface of a substrate, the material of the high refractive index layer of the optical multilayer film is composed of titanium and niobium as components. It is formed of a metal oxide melt containing oxygen vacancies (referred to as niobium-containing titanium suboxide). That is, in the present invention, an optical component is configured by forming a film on the surface of a substrate by a vapor deposition method using a material made of niobium-containing titanium suboxide.
上記のように構成した本発明によれば、光学多層膜のうち高屈折率層については、チタンに対してニオブが少量ドープされた金属酸化物が用いられているので、チタン１００％の酸化物や他の高屈折率物質を用いる場合よりも導電性が向上し、高い帯電防止性を得ることができる。また、このような性質を有するニオブ含有亜酸化チタンから成る材料を蒸着法で成膜した場合、薄膜は結晶性のないアモルファス状態となるため、結晶性を高めるために成膜後に再加熱処理を行う必要がない。さらに、ＩＴＯ等の導電性薄膜を挿入する必要がないので、光学多層膜は低屈折率層と高屈折率層とを交互に積層させた２元系の膜構成となる。これにより、基体の表面に成膜を行った後に再加熱処理を行うことなく、かつ、３種類の材料を扱うために蒸着装置を改造することなく、帯電防止効果の高い光学部品を得ることができる。
According to the present invention configured as described above, a metal oxide in which niobium is doped in a small amount with respect to titanium is used for the high refractive index layer in the optical multilayer film. As compared with the case of using other high refractive index substances, the conductivity is improved and high antistatic properties can be obtained. In addition, when a material composed of niobium-containing titanium suboxide having such properties is deposited by vapor deposition, the thin film becomes amorphous without crystallinity. There is no need to do it. Furthermore, since it is not necessary to insert a conductive thin film such as ITO, the optical multilayer film has a binary film structure in which low refractive index layers and high refractive index layers are alternately laminated. As a result, it is possible to obtain an optical component having a high antistatic effect without performing reheating after film formation on the surface of the substrate and without modifying the vapor deposition apparatus to handle three types of materials. it can.
以下、本発明の一実施形態を図面に基づいて説明する。図１は、本実施形態による光学部品の構成例を示す図である。図１に示すように、本実施形態の光学部品は、基体１１の表面に、ハードコート膜１２、光学多層膜１３および防汚膜１４を、基体１１からこの順で形成している。図１は光学部品の構成例を模擬的に表わしたものであり、基体１１の実際の厚みおよび各膜１２～１４の実際の厚みを正確な比率で表したものではない。
Hereinafter, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a diagram illustrating a configuration example of the optical component according to the present embodiment. As shown in FIG. 1, in the optical component of this embodiment, a hard coat film 12, an optical multilayer film 13, and an antifouling film 14 are formed in this order from the base 11 on the surface of the base 11. FIG. 1 schematically shows a configuration example of an optical component, and does not represent the actual thickness of the substrate 11 and the actual thickness of each of the films 12 to 14 in an accurate ratio.
なお、基体１１の表面とハードコート膜１２との間にプライマー層を形成したり、基体１１の表面とハードコート膜１２との間、ハードコート膜１２と光学多層膜１３の間、あるいは光学多層膜１３と防汚膜１４との間などに中間層を形成したりするなど、膜構成を他のものに変更してもよい。また、基体１１の裏面あるいは表裏両面に、ハードコート膜１２や光学多層膜１３などを形成しても良い。
A primer layer is formed between the surface of the substrate 11 and the hard coat film 12, or between the surface of the substrate 11 and the hard coat film 12, between the hard coat film 12 and the optical multilayer film 13, or optical multilayer. For example, an intermediate layer may be formed between the film 13 and the antifouling film 14 or the like. Further, the hard coat film 12 or the optical multilayer film 13 may be formed on the back surface or both the front and back surfaces of the substrate 11.
基体１１の材料（基材）としては、例えば、ポリウレタン樹脂、エピスルフィド樹脂、ポリカーボネート樹脂、ポリエステル樹脂、アクリル樹脂、ポリエーテルサルホン樹脂、ポリ４－メチルペンテン－１樹脂、ジエチルグリコールビスアリルカーボネート樹脂などが挙げられる。また、屈折率が高く好適なものとして、例えば、ポリイソシアネート化合物とポリチオールおよび／または含硫黄ポリオールとを付加重合して得られるポリウレタン樹脂を挙げることができる。さらに屈折率が高く好適なものとして、エピスルフィド基とポリチオールおよび／または含硫黄ポリオールとを付加重合して得られるエピスルフィド樹脂を挙げることができる。
Examples of the material (base material) of the substrate 11 include polyurethane resin, episulfide resin, polycarbonate resin, polyester resin, acrylic resin, polyether sulfone resin, poly-4-methylpentene-1 resin, diethyl glycol bisallyl carbonate resin, and the like. Is mentioned. Moreover, as a suitable thing with a high refractive index, the polyurethane resin obtained by addition-polymerizing a polyisocyanate compound, a polythiol, and / or a sulfur-containing polyol can be mentioned, for example. Furthermore, as a suitable thing with a high refractive index, the episulfide resin obtained by addition-polymerizing an episulfide group and a polythiol and / or sulfur-containing polyol can be mentioned.
ハードコート膜１２は、基体１１にハードコート液を、ディッピング法やスピンコート法、スプレー法などの公知の方法により均一に施して形成する。ハードコート膜１２の材料としては、例えば、無機酸化物微粒子を含むオルガノシロキサン系樹脂を用いる。この場合のハードコート液は、水あるいはアルコール系の溶媒にオルガノシロキサン系樹脂と無機酸化物微粒子ゾルとを分散（混合）させて生成する。
The hard coat film 12 is formed by uniformly applying a hard coat liquid to the substrate 11 by a known method such as a dipping method, a spin coat method, or a spray method. As a material of the hard coat film 12, for example, an organosiloxane resin containing inorganic oxide fine particles is used. The hard coat liquid in this case is produced by dispersing (mixing) an organosiloxane resin and an inorganic oxide fine particle sol in water or an alcohol solvent.
ここで、オルガノシロキサン系樹脂は、アルコキシシランを加水分解し縮合させることで得られるものが好ましい。アルコキシシランの具体例として、γ－グリシドキシプロピルトリメトキシシラン、γ－グリシドキシプロピルトリエトキシシラン、メチルトリメトキシシラン、エチルシリケートを挙げることができる。これらアルコキシシランの加水分解縮合物は、当該アルコキシシラン化合物あるいはそれらの組み合わせを、塩酸などの酸性水溶液で加水分解することにより製造される。
Here, the organosiloxane resin is preferably obtained by hydrolyzing and condensing alkoxysilane. Specific examples of the alkoxysilane include γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, methyltrimethoxysilane, and ethyl silicate. These alkoxysilane hydrolysis condensates are produced by hydrolyzing the alkoxysilane compound or a combination thereof with an acidic aqueous solution such as hydrochloric acid.
また、無機酸化物微粒子の具体例としては、酸化亜鉛、二酸化ケイ素、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化スズ、酸化ベリリウム、酸化アンチモン、酸化タングステン、酸化セリウムの各ゾルを単独でまたは２種類以上を混晶化したものを挙げることができる。無機酸化物微粒子の大きさは、ハードコート膜１２の透明性確保の観点から、１～１００ナノメートル（ｎｍ）であることが好ましく、１～５０ｎｍであることがより好ましい。また、無機酸化物微粒子の配合量は、ハードコート膜１２における硬さや強靭性の適切な度合いでの確保という観点から、ハードコート成分中４０～６０ｗｔ％を占めることが好ましい。
Specific examples of the inorganic oxide fine particles include zinc oxide, silicon dioxide, aluminum oxide, titanium oxide, zirconium oxide, tin oxide, beryllium oxide, antimony oxide, tungsten oxide, and cerium oxide sol alone or in two types. What mixed the above can be mentioned. From the viewpoint of ensuring the transparency of the hard coat film 12, the size of the inorganic oxide fine particles is preferably 1 to 100 nanometers (nm), and more preferably 1 to 50 nm. Further, the blending amount of the inorganic oxide fine particles preferably occupies 40 to 60 wt% in the hard coat component from the viewpoint of securing the hardness and toughness in the hard coat film 12 to an appropriate degree.
なお、ハードコート液には、硬化触媒としてアセチルアセトン金属塩、エチレンジアミン四酢酸金属塩などを添加することができる。さらに必要に応じて、界面活性剤、着色剤、溶媒などを調整のために添加することができる。
In addition, an acetylacetone metal salt, an ethylenediaminetetraacetic acid metal salt, or the like can be added to the hard coat solution as a curing catalyst. Further, a surfactant, a colorant, a solvent and the like can be added for adjustment as necessary.
ハードコート膜１２の膜厚は、０．５～４．０マイクロメートル（μｍ）とするのが好ましく、１．０～３．０μｍとするのがより好ましい。この膜厚の下限については、これより薄いと十分な硬度が得られなくなるという限界値から定まる。一方、上限については、これより厚くするとクラックや脆さが発生するなど、物性に関する問題の生ずる可能性が飛躍的に高まるという限界値から定まる。
The film thickness of the hard coat film 12 is preferably 0.5 to 4.0 micrometers (μm), more preferably 1.0 to 3.0 μm. The lower limit of the film thickness is determined from a limit value that a sufficient hardness cannot be obtained if the thickness is smaller than this. On the other hand, the upper limit is determined from a limit value that, if thicker than this, the possibility of occurrence of problems related to physical properties such as occurrence of cracks and brittleness is dramatically increased.
光学多層膜１３は、真空蒸着法により、低屈折率層と高屈折率層とを交互に積層させて形成する。低屈折率層を形成する薄膜の材料としては、例えば、ＳｉＯ２（二酸化ケイ素）やＭｇＦ２（フッ化マグネシウム）などが挙げられる。
The optical multilayer film 13 is formed by alternately laminating low refractive index layers and high refractive index layers by vacuum deposition. Examples of the material of the thin film forming the low refractive index layer include SiO 2 (silicon dioxide) and MgF 2 (magnesium fluoride).
一方、高屈折率層を形成する薄膜の材料には、チタンとニオブとを成分として含む酸素欠損を有する金属酸化物（ニオブ含有亜酸化チタン）の溶融体を用いる。溶融体とは、酸素欠損を有する状態でチタンとニオブを溶融した後、それを冷却し、求める粒の大きさ（例えば、３ｍｍ以下）に粉砕して篩がけすることによって形成したものである。
On the other hand, a melt of a metal oxide (niobium-containing titanium suboxide) having oxygen vacancies containing titanium and niobium as components is used as the material for the thin film forming the high refractive index layer. The melt is formed by melting titanium and niobium in a state having oxygen vacancies, cooling it, pulverizing to a desired grain size (for example, 3 mm or less) and sieving.
ニオブ含有亜酸化チタンの金属元素（Ｔｉ１－ｘＮｂｘ）と酸素元素（Ｏ）の比率は、例えば３：５である。以下では、これを（Ｔｉ１－ｘＮｂｘ）３Ｏ５と表記する。ニオブ含有亜酸化チタンにおけるニオブのドープ量は、チタンに対して２ｍｏｌ％以上１６ｍｏｌ％以下とするのが好ましい。
The ratio of the niobium-containing titanium suboxide metal element (Ti 1-x Nb x ) to the oxygen element (O) is, for example, 3: 5. Hereinafter, this is expressed as (Ti 1-x Nb x ) 3 O 5 . The doping amount of niobium in the niobium-containing titanium suboxide is preferably 2 mol% or more and 16 mol% or less with respect to titanium.
防汚膜１４は、レンズ表面の撥水撥油性の向上や水ヤケ防止するために形成されるものであり、フッ素系化合物から成る。防汚膜１４は、ディッピング法、スピン法、スプレー法、蒸着法などの公知の方法で形成することができる。
The antifouling film 14 is formed in order to improve the water and oil repellency of the lens surface and prevent water scuffing, and is made of a fluorine compound. The antifouling film 14 can be formed by a known method such as a dipping method, a spin method, a spray method, or a vapor deposition method.
以下、光学多層膜１３において用いるニオブ含有亜酸化チタン（Ｔｉ１－ｘＮｂｘ）３Ｏ５の性質について、図面に基づいて説明する。図２は、ニオブ含有亜酸化チタンに対してＸ線回折分析（ＸＲＤ：X-Ray Diffraction分析）を行った実験結果を示す図である。この図２に示す実験では、ニオブ含有亜酸化チタンにおけるニオブのドープ量を異ならせて複数種類の溶融体を形成し、それに対してＸＲＤ分析を行った。ニオブのドープ量は、２ｍｏｌ％から１６ｍｏｌ％まで２ｍｏｌ％刻みで変えてある。
Hereinafter, the properties of niobium-containing titanium suboxide (Ti 1-x Nb x ) 3 O 5 used in the optical multilayer film 13 will be described with reference to the drawings. FIG. 2 is a diagram showing experimental results obtained by performing X-ray diffraction analysis (XRD: X-Ray Diffraction analysis) on niobium-containing titanium suboxide. In the experiment shown in FIG. 2, a plurality of types of melts were formed with different amounts of niobium in the niobium-containing titanium suboxide, and XRD analysis was performed on the melts. The doping amount of niobium is changed in increments of 2 mol% from 2 mol% to 16 mol%.
ＸＲＤ分析は、材料に対するＸ線の入射角度を変化させながら、材料からの反射波の強度を測定するものである。この測定により、図２に示すように横軸が入射角度で縦軸に強度をとったグラフが得られる。なお、図２では、ニオブのドープ量を変えて行った各測定結果が重なって見にくくならないように、縦軸の基準値（強度ゼロ）を縦方向にずらして示している。
XRD analysis measures the intensity of a reflected wave from a material while changing the incident angle of X-rays to the material. By this measurement, as shown in FIG. 2, a graph is obtained with the horizontal axis representing the incident angle and the vertical axis representing the intensity. In FIG. 2, the reference value (intensity zero) on the vertical axis is shifted in the vertical direction so that the measurement results obtained by changing the doping amount of niobium are not overlapped and difficult to see.
図２の実験結果から分かるように、どの入射角度のところにも強度のピークが現れていない。これは、ニオブ含有亜酸化チタンを蒸着して生成した薄膜がアモルファス（非晶質）の状態になっていることを示している。
As can be seen from the experimental results in FIG. 2, no intensity peak appears at any incident angle. This indicates that the thin film formed by vapor deposition of niobium-containing titanium suboxide is in an amorphous state.
次に、光学多層膜１３の高屈折率層にニオブ含有亜酸化チタンを用いた光学部品の具体的な実施例について説明する。ここでは光学部品の一例として、眼鏡用レンズ、バンドパスフィルタ、ハーフミラーの実施例について説明する。実施例１，２が眼鏡用レンズ、実施例３がバンドパスフィルタ、実施例４がハーフミラーである。
Next, specific examples of optical parts using niobium-containing titanium suboxide for the high refractive index layer of the optical multilayer film 13 will be described. Here, examples of spectacle lenses, bandpass filters, and half mirrors will be described as examples of optical components. Examples 1 and 2 are spectacle lenses, Example 3 is a band-pass filter, and Example 4 is a half mirror.
＜実施例１＞
図３は、実施例１に係る眼鏡用レンズを構成する光学多層膜１３の膜構成と、比較例１－１，１－２に係る光学多層膜の膜構成とを示す図である。図３（ａ）が実施例１、図３（ｂ）が比較例１－１、図３（ｃ）が比較例１－２を示している。なお、図３において、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 1>
FIG. 3 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the spectacle lens according to Example 1, and a film configuration of the optical multilayer film according to Comparative Examples 1-1 and 1-2. 3A shows Example 1, FIG. 3B shows Comparative Example 1-1, and FIG. 3C shows Comparative Example 1-2. In FIG. 3, (Ti 1-x Nb x ) 3 O 5 is abbreviated as TNO.
図３は、実施例１に係る眼鏡用レンズを構成する光学多層膜１３の膜構成と、比較例１－１，１－２に係る光学多層膜の膜構成とを示す図である。図３（ａ）が実施例１、図３（ｂ）が比較例１－１、図３（ｃ）が比較例１－２を示している。なお、図３において、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 1>
FIG. 3 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the spectacle lens according to Example 1, and a film configuration of the optical multilayer film according to Comparative Examples 1-1 and 1-2. 3A shows Example 1, FIG. 3B shows Comparative Example 1-1, and FIG. 3C shows Comparative Example 1-2. In FIG. 3, (Ti 1-x Nb x ) 3 O 5 is abbreviated as TNO.
図３（ａ）に示すように、実施例１では、光学多層膜１３の各層を基体１１に近い方から順にＬ１～Ｌ７層とする。実施例１では、奇数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）で形成するととともに、偶数層を高屈折率材料のニオブ含有亜酸化チタン（（Ｔｉ１－ｘＮｂｘ）３Ｏ５）で形成した。つまり、実施例１の光学多層膜１３は、２元系の膜構成となっている。各層Ｌ１～Ｌ７における屈折率、物理膜厚、光学膜厚は、図３（ａ）に示す通りである。
As shown in FIG. 3A, in Example 1, the layers of the optical multilayer film 13 are L1 to L7 layers in order from the side closer to the substrate 11. In Example 1, the odd-numbered layer is formed of silicon dioxide (SiO 2 ) as a low-refractive index material, and the even-numbered layer is niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ) as a high-refractive index material. Formed with. That is, the optical multilayer film 13 of Example 1 has a binary film configuration. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L7 are as shown in FIG.
また、図３（ｂ）に示すように、比較例１－１では、実施例１と同様に光学多層膜を７つの層Ｌ１～Ｌ７で形成し、奇数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）、偶数層を高屈折率材料の二酸化ジルコニウム（ＺｒＯ２）とした。比較例１－１の光学多層膜も２元系の膜構成となっている。各層Ｌ１～Ｌ７における屈折率、物理膜厚、光学膜厚は、図３（ｂ）に示す通りである。
Further, as shown in FIG. 3B, in Comparative Example 1-1, an optical multilayer film is formed of seven layers L1 to L7 as in Example 1, and an odd layer is formed of silicon dioxide (low refractive index material). SiO 2 ), and even layers were made of zirconium dioxide (ZrO 2 ) as a high refractive index material. The optical multilayer film of Comparative Example 1-1 also has a binary film structure. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L7 are as shown in FIG.
また、図３（ｃ）に示すように、比較例１－２では、導電性薄膜としてＩＴＯ膜を更に挿入することにより、光学多層膜を８つの層Ｌ１～Ｌ８で形成した。具体的には、Ｌ１，Ｌ３，Ｌ５，Ｌ８の各層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）で形成し、Ｌ２，Ｌ４，Ｌ６の各層を高屈折率材料の二酸化ジルコニウム（ＺｒＯ２）で形成し、Ｌ７の１層を酸化インジウムスズ（ＩＴＯ）で形成した。比較例１－２の光学多層膜は３元系の膜構成となっている。各層Ｌ１～Ｌ８における屈折率、物理膜厚、光学膜厚は、図３（ｃ）に示す通りである。
Further, as shown in FIG. 3C, in Comparative Example 1-2, an optical multilayer film was formed of eight layers L1 to L8 by further inserting an ITO film as a conductive thin film. Specifically, each layer of L1, L3, L5, and L8 is formed of silicon dioxide (SiO 2 ) as a low refractive index material, and each layer of L2, L4, and L6 is formed of zirconium dioxide (ZrO 2 ) as a high refractive index material. And one layer of L7 was formed of indium tin oxide (ITO). The optical multilayer film of Comparative Example 1-2 has a ternary film structure. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L8 are as shown in FIG.
図３のように光学多層膜を形成した実施例１および比較例１－１，１－２について、帯電防止性の有無に関する実験を次のように行った。すなわち、不織布（小津産業株式会社製「Pure Leaf」）を用いてレンズ凸面を１キログラム荷重で１０秒間２０往復擦った直後の帯電電位（キロボルト：ｋＶ）を測定するとともに、スチールウール片のレンズ凸面に対する付着の有無を観測した。帯電電位の測定は、静電気測定器（シムコジャパン株式会社製「FMX-003」）により行った。
For Example 1 and Comparative Examples 1-1 and 1-2 in which an optical multilayer film was formed as shown in FIG. 3, an experiment regarding the presence or absence of antistatic properties was performed as follows. That is, while measuring the charged potential (kilovolt: kV) immediately after rubbing the lens convex surface with a 1 kg load for 20 seconds 20 times using a nonwoven fabric (“Pure「 Leaf ”manufactured by Ozu Sangyo Co., Ltd.), the lens convex surface of the steel wool piece The presence or absence of adhesion to was observed. The charged potential was measured with a static electricity meter (“FMX-003” manufactured by Simco Japan Co., Ltd.).
図４は、この帯電防止性に関する実験結果を示す図である。図４において、比較例１－１に示されるように、ＳｉＯ２とＺｒＯ２とから成る２元系の膜構成では、不織布を擦り終わってから３分を経過しても帯電電位の絶対値はゼロに近づかず、スチールウール片はレンズ凸面に付着したままであった。これは、帯電防止性がないことを示している。
FIG. 4 is a diagram showing experimental results regarding this antistatic property. In FIG. 4, as shown in Comparative Example 1-1, in the binary film configuration composed of SiO 2 and ZrO 2 , the absolute value of the charging potential is 3 minutes after the non-woven fabric is rubbed. The steel wool piece remained attached to the convex surface of the lens without approaching zero. This indicates that there is no antistatic property.
一方、比較例１－２の場合は、不織布を擦り終わった直後から帯電電位の絶対値がゼロとなっており、スチールウール片はレンズ凸面に全く付着しなかった。これは、帯電防止性があることを示している。しかしながら、比較例１－２は、ＳｉＯ２とＺｒＯ２とＩＴＯとから成る３元系の膜構成のため、蒸着装置の改造が必要という問題が生じる。
On the other hand, in Comparative Example 1-2, the absolute value of the charging potential was zero immediately after the non-woven fabric was rubbed, and the steel wool piece did not adhere to the lens convex surface at all. This indicates that there is antistatic properties. However, since Comparative Example 1-2 has a ternary film structure composed of SiO 2 , ZrO 2, and ITO, there is a problem that the vapor deposition apparatus needs to be modified.
これに対して、実施例１の場合は、ＳｉＯ２と（Ｔｉ１－ｘＮｂｘ）３Ｏ５とから成る２元系の膜構成なので、蒸着装置の改造は不要である。しかも、不織布を擦り終わった直後から帯電電位の絶対値はかなり小さくて殆どゼロとなっており、１分を経過した時点で帯電電位はゼロとなっている。そのため、スチールウール片はレンズ凸面に付着しなかった。
On the other hand, in the case of Example 1, since it is a binary film structure composed of SiO 2 and (Ti 1-x Nb x ) 3 O 5, it is not necessary to modify the vapor deposition apparatus. Moreover, the absolute value of the charging potential is fairly small and almost zero immediately after the rubbing of the nonwoven fabric, and the charging potential is zero when 1 minute has passed. Therefore, the steel wool piece did not adhere to the lens convex surface.
このように、光学多層膜１３の薄膜材料としてニオブ含有亜酸化チタンを用いることにより、蒸着した薄膜はアモルファスであるが導電性が向上し、高い帯電防止性を得ることができることが分かった。また、蒸着した薄膜は結晶性のないアモルファス状態となるため、結晶性を高めるために成膜後に再加熱（アニール）処理を行う必要もない。
Thus, it was found that by using niobium-containing titanium suboxide as the thin film material of the optical multilayer film 13, the deposited thin film is amorphous, but the conductivity is improved and high antistatic properties can be obtained. Further, since the deposited thin film is in an amorphous state having no crystallinity, it is not necessary to perform a reheating (annealing) treatment after the film formation in order to improve the crystallinity.
また、図３のように光学多層膜を形成した実施例１および比較例１－１，１－２について、反射率特性に関するシミュレーションを行った。図５は、その反射率特性に関するシミュレーション結果を示す図である。図５に示すように、実施例１および比較例１－１，１－２の何れにおいても、可視域となる波長範囲では反射率が低い値を示している。これにより、実施例１のように高屈折率層に（Ｔｉ１－ｘＮｂｘ）３Ｏ５を用いた場合でも、眼鏡用レンズの視認性が低下しないことが分かった。
In addition, a simulation regarding reflectance characteristics was performed for Example 1 and Comparative Examples 1-1 and 1-2 in which an optical multilayer film was formed as shown in FIG. FIG. 5 is a diagram showing a simulation result regarding the reflectance characteristic. As shown in FIG. 5, in both Example 1 and Comparative Examples 1-1 and 1-2, the reflectance is low in the visible wavelength range. Thus, it was found that even when (Ti 1-x Nb x ) 3 O 5 was used for the high refractive index layer as in Example 1, the visibility of the spectacle lens was not lowered.
＜実施例２＞
図６は、実施例２に係る眼鏡用レンズを構成する光学多層膜１３の膜構成と、比較例２－１，２－２に係る光学多層膜の膜構成とを示す図である。図６（ａ）が実施例２、図６（ｂ）が比較例２－１、図６（ｃ）が比較例２－２を示している。なお、図６においても、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 2>
FIG. 6 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the spectacle lens according to Example 2, and a film configuration of the optical multilayer film according to Comparative Examples 2-1 and 2-2. 6A shows Example 2, FIG. 6B shows Comparative Example 2-1, and FIG. 6C shows Comparative Example 2-2. In FIG. 6 as well, (Ti 1-x Nb x ) 3 O 5 is abbreviated as TNO.
図６は、実施例２に係る眼鏡用レンズを構成する光学多層膜１３の膜構成と、比較例２－１，２－２に係る光学多層膜の膜構成とを示す図である。図６（ａ）が実施例２、図６（ｂ）が比較例２－１、図６（ｃ）が比較例２－２を示している。なお、図６においても、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 2>
FIG. 6 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the spectacle lens according to Example 2, and a film configuration of the optical multilayer film according to Comparative Examples 2-1 and 2-2. 6A shows Example 2, FIG. 6B shows Comparative Example 2-1, and FIG. 6C shows Comparative Example 2-2. In FIG. 6 as well, (Ti 1-x Nb x ) 3 O 5 is abbreviated as TNO.
図６（ａ）に示すように、実施例２では、光学多層膜１３の各層を基体１１に近い方から順にＬ１～Ｌ５層とする。実施例２では、奇数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）で形成するととともに、偶数層を高屈折率材料のニオブ含有亜酸化チタン（（Ｔｉ１－ｘＮｂｘ）３Ｏ５）で形成した。つまり、実施例２の光学多層膜１３も、２元系の膜構成となっている。各層Ｌ１～Ｌ５における屈折率、物理膜厚、光学膜厚は、図６（ａ）に示す通りである。
As shown in FIG. 6A, in Example 2, the layers of the optical multilayer film 13 are L1 to L5 layers in order from the side closer to the substrate 11. In Example 2, the odd layer is formed of silicon dioxide (SiO 2 ) as a low refractive index material, and the even layer is formed from niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ) as a high refractive index material. Formed with. That is, the optical multilayer film 13 of Example 2 also has a binary film configuration. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L5 are as shown in FIG.
また、図６（ｂ）に示すように、比較例２－１では、実施例２と同様に光学多層膜を５つの層Ｌ１～Ｌ５で形成し、奇数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）、偶数層を高屈折率材料の二酸化チタン（ＴｉＯ２）とした。比較例２の光学多層膜も２元系の膜構成となっている。各層Ｌ１～Ｌ５における屈折率、物理膜厚、光学膜厚は、図６（ｂ）に示す通りである。
Further, as shown in FIG. 6B, in Comparative Example 2-1, an optical multilayer film is formed of five layers L1 to L5 as in Example 2, and an odd layer is formed of silicon dioxide (low refractive index material). SiO 2 ), and even layers were made of titanium dioxide (TiO 2 ) as a high refractive index material. The optical multilayer film of Comparative Example 2 also has a binary film configuration. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L5 are as shown in FIG.
また、図６（ｃ）に示すように、比較例２－２では、実施例２と同様に光学多層膜を５つの層Ｌ１～Ｌ５で形成し、奇数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）、偶数層を高屈折率材料の二酸化ジルコニウム（ＺｒＯ２）とした。比較例２－２の光学多層膜も２元系の膜構成となっている。各層Ｌ１～Ｌ５における屈折率、物理膜厚、光学膜厚は、図６（ｃ）に示す通りである。
Further, as shown in FIG. 6C, in Comparative Example 2-2, an optical multilayer film is formed of five layers L1 to L5 as in Example 2, and an odd layer is formed of silicon dioxide (low refractive index material). SiO 2 ), and even layers were made of zirconium dioxide (ZrO 2 ) as a high refractive index material. The optical multilayer film of Comparative Example 2-2 also has a binary film structure. The refractive index, physical film thickness, and optical film thickness in each of the layers L1 to L5 are as shown in FIG.
図６のように光学多層膜を形成した実施例２および比較例２－１，２－２について、実施例１と同様の方法により帯電防止性の有無に関する実験を行った。図７は、その帯電防止性に関する実験結果を示す図である。図７において、比較例２－１，２－２に示されるように、ＳｉＯ２とＴｉＯ２、あるいはＳｉＯ２とＺｒＯ２から成る２元系の膜構成では、不織布を擦り終わってから３分を経過しても帯電電位の絶対値はゼロに近づかず、スチールウール片はレンズ凸面に付着したままであった。これは、帯電防止性がないことを示している。
With respect to Example 2 and Comparative Examples 2-1 and 2-2 in which an optical multilayer film was formed as shown in FIG. 6, an experiment regarding the presence or absence of antistatic properties was performed by the same method as in Example 1. FIG. 7 is a diagram showing experimental results regarding the antistatic property. In FIG. 7, as shown in Comparative Examples 2-1 and 2-2, in the binary film structure composed of SiO 2 and TiO 2 , or SiO 2 and ZrO 2 , 3 minutes after the non-woven fabric is rubbed. The absolute value of the charging potential did not approach zero even after the lapse of time, and the steel wool piece remained attached to the convex surface of the lens. This indicates that there is no antistatic property.
これに対して、実施例２の場合は、不織布を擦り終わった直後から帯電電位の絶対値はかなり小さくて殆どゼロとなっており、時間が経過するにつれてゼロに近づいている。そのため、スチールウール片はレンズ凸面に付着しなかった。このように、実施例２でも帯電防止性を呈していることが分かった。
On the other hand, in the case of Example 2, the absolute value of the charging potential is quite small and almost zero immediately after the non-woven fabric is rubbed, and approaches zero as time elapses. Therefore, the steel wool piece did not adhere to the lens convex surface. Thus, it was found that Example 2 also exhibited antistatic properties.
また、図６のように光学多層膜を形成した実施例２および比較例２－１，２－２について、反射率特性に関するシミュレーションを行った。図８は、その反射率特性に関するシミュレーション結果を示す図である。図８に示すように、実施例２および比較例２－１，２－２の何れにおいても、可視域となる波長範囲では反射率が低い値を示している。これにより、実施例２のように高屈折率層に（Ｔｉ１－ｘＮｂｘ）３Ｏ５を用いた場合でも、眼鏡用レンズの視認性が低下しないことが分かった。
Further, a simulation regarding reflectance characteristics was performed for Example 2 and Comparative Examples 2-1 and 2-2 in which an optical multilayer film was formed as shown in FIG. FIG. 8 is a diagram showing a simulation result relating to the reflectance characteristic. As shown in FIG. 8, in both Example 2 and Comparative Examples 2-1 and 2-2, the reflectance is low in the visible wavelength range. As a result, it was found that even when (Ti 1-x Nb x ) 3 O 5 was used for the high refractive index layer as in Example 2, the visibility of the spectacle lens was not lowered.
＜実施例３＞
図９は、実施例３に係るバンドパスフィルタを構成する光学多層膜１３の膜構成を示す図である。また、図１０は、比較例３に係る光学多層膜の膜構成を示す図である。なお、図９および図１０においても、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 3>
FIG. 9 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the bandpass filter according to the third embodiment. FIG. 10 is a diagram showing a film configuration of an optical multilayer film according to Comparative Example 3. In FIGS. 9 and 10, (Ti 1-x Nb x ) 3 O 5 is also abbreviated as TNO.
図９は、実施例３に係るバンドパスフィルタを構成する光学多層膜１３の膜構成を示す図である。また、図１０は、比較例３に係る光学多層膜の膜構成を示す図である。なお、図９および図１０においても、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 3>
FIG. 9 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the bandpass filter according to the third embodiment. FIG. 10 is a diagram showing a film configuration of an optical multilayer film according to Comparative Example 3. In FIGS. 9 and 10, (Ti 1-x Nb x ) 3 O 5 is also abbreviated as TNO.
図９に示すように、実施例３では、光学多層膜１３の各層を基体１１に近い方から順にＬ１～Ｌ３６層とする。実施例３では、奇数層を高屈折率材料のニオブ含有亜酸化チタン（（Ｔｉ１－ｘＮｂｘ）３Ｏ５）で形成するととともに、偶数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）で形成した。つまり、実施例３の光学多層膜１３は、２元系の膜構成となっている。各層Ｌ１～Ｌ３６における屈折率、物理膜厚、光学膜厚、中心波長は、図９に示す通りである。
As shown in FIG. 9, in Example 3, the layers of the optical multilayer film 13 are L1 to L36 layers in order from the side closer to the substrate 11. In Example 3, the odd-numbered layer is formed of niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ), which is a high-refractive index material, and the even-numbered layer is silicon dioxide (SiO 2 ), which is a low-refractive index material. Formed with. That is, the optical multilayer film 13 of Example 3 has a binary film configuration. The refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L36 are as shown in FIG.
また、図１０に示すように、比較例３では、実施例３と同様に光学多層膜を３６個の層Ｌ１～Ｌ３６で形成し、奇数層を高屈折率材料の二酸化チタン（ＴｉＯ２）、偶数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）とした。比較例３の光学多層膜も２元系の膜構成となっている。各層Ｌ１～Ｌ３６における屈折率、物理膜厚、光学膜厚、中心波長は、図１０に示す通りである。
Further, as shown in FIG. 10, in Comparative Example 3, the optical multilayer film is formed of 36 layers L1 to L36 as in Example 3, and the odd layer is formed of titanium dioxide (TiO 2 ) as a high refractive index material, The even layer was made of silicon dioxide (SiO 2 ) as a low refractive index material. The optical multilayer film of Comparative Example 3 also has a binary film configuration. The refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L36 are as shown in FIG.
図９、図１０のように光学多層膜を形成した実施例３および比較例３について、帯電防止性の有無に関する実験を次のように行った。すなわち、不織布（小津産業株式会社製「Pure Leaf」）を用いて部品表面を１キログラム荷重で１０秒間２０往復擦った後、スチールウール片の部品表面に対する付着の有無を観測した。また、高抵抗率計（三菱化学製「Hiresta-UP」）により部品の表面抵抗値を測定した。印加電圧を５００[Ｖ]、測定保持時間を３０秒として表面抵抗値を測定し、これを３回行って平均値を算出した。
For Example 3 and Comparative Example 3 in which an optical multilayer film was formed as shown in FIGS. 9 and 10, an experiment regarding the presence or absence of antistatic properties was performed as follows. That is, the surface of a component was rubbed for 20 seconds at a load of 1 kilogram for 20 seconds using a non-woven fabric (“Pure Leaf” manufactured by Ozu Sangyo Co., Ltd.), and then the presence or absence of adhesion of a steel wool piece to the component surface was observed. In addition, the surface resistance of the parts was measured with a high resistivity meter (“Hiresta-UP” manufactured by Mitsubishi Chemical). The surface resistance value was measured with an applied voltage of 500 [V] and a measurement holding time of 30 seconds, and this was repeated three times to calculate an average value.
図１１は、この帯電防止性に関する実験結果を示す図である。図１１において、実施例３に示されるように、表面抵抗の平均値は１．７４×１０10[Ω／□]であり、不織布を擦り終わった直後からスチールウール片は部品表面に付着しなかった。一般に、膜の抵抗値が小さいほど導電性が高くなって帯電防止性が向上し、抵抗値が１０11[Ω／□]以下であればほぼ確実に帯電防止性が得られることが知られている。よって、以上の実験結果は、実施例３が帯電防止性を呈していることを示している。
FIG. 11 is a diagram showing experimental results regarding this antistatic property. In FIG. 11, as shown in Example 3, the average value of the surface resistance is 1.74 × 10 10 [Ω / □], and the steel wool piece does not adhere to the surface of the component immediately after the non-woven fabric is rubbed. It was. In general, it is known that the smaller the resistance value of the film, the higher the conductivity and the antistatic property, and the antistatic property can be obtained almost certainly if the resistance value is 10 11 [Ω / □] or less. Yes. Therefore, the above experimental results show that Example 3 exhibits antistatic properties.
これに対して、比較例３に示されるように、ＴｉＯ２とＳｉＯ２とから成る２元系の膜構成では、スチールウール片は部品表面に付着したままであった。また、表面抵抗の平均値は４．８４×１０12[Ω／□]であった。このことは、比較例３は帯電防止性がないことを示している。
On the other hand, as shown in Comparative Example 3, in the binary film configuration composed of TiO 2 and SiO 2 , the steel wool piece remained attached to the part surface. The average value of the surface resistance was 4.84 × 10 12 [Ω / □]. This indicates that Comparative Example 3 has no antistatic property.
また、実施例３および比較例３について、反射率特性に関するシミュレーションを行った。図１２は、その反射率特性に関するシミュレーション結果を示す図である。図１２に示すように、実施例３および比較例３の何れにおいても、所望の波長範囲で反射率が低い値を示している。これにより、実施例３および比較例３の何れの場合も、所望のバンドパスフィルタ特性が得られることが分かった。
In addition, for Example 3 and Comparative Example 3, simulations on reflectance characteristics were performed. FIG. 12 is a diagram illustrating a simulation result regarding the reflectance characteristic. As shown in FIG. 12, in both Example 3 and Comparative Example 3, the reflectance is low in the desired wavelength range. As a result, it was found that the desired bandpass filter characteristics were obtained in both cases of Example 3 and Comparative Example 3.
＜実施例４＞
図１３は、実施例４に係るハーフミラーを構成する光学多層膜１３の膜構成と、比較例４に係る光学多層膜の膜構成とを示す図である。図１３（ａ）が実施例４、図１３（ｂ）が比較例４を示している。なお、図１３においても、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 4>
FIG. 13 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the half mirror according to Example 4 and a film configuration of the optical multilayer film according to Comparative Example 4. FIG. 13A shows Example 4 and FIG. 13B shows Comparative Example 4. Also in FIG. 13, is abbreviated as (Ti 1-x Nb x) 3O 5 is TNO.
図１３は、実施例４に係るハーフミラーを構成する光学多層膜１３の膜構成と、比較例４に係る光学多層膜の膜構成とを示す図である。図１３（ａ）が実施例４、図１３（ｂ）が比較例４を示している。なお、図１３においても、（Ｔｉ１－ｘＮｂｘ）３Ｏ５はＴＮＯと略記している。 <Example 4>
FIG. 13 is a diagram illustrating a film configuration of the optical multilayer film 13 constituting the half mirror according to Example 4 and a film configuration of the optical multilayer film according to Comparative Example 4. FIG. 13A shows Example 4 and FIG. 13B shows Comparative Example 4. Also in FIG. 13, is abbreviated as (Ti 1-x Nb x) 3
図１３（ａ）に示すように、実施例４では、光学多層膜１３の各層を基体１１に近い方から順にＬ１～Ｌ１２層とする。実施例４では、奇数層を高屈折率材料のニオブ含有亜酸化チタン（（Ｔｉ１－ｘＮｂｘ）３Ｏ５）で形成するととともに、偶数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）で形成した。つまり、実施例４の光学多層膜１３は、２元系の膜構成となっている。各層Ｌ１～Ｌ１２における屈折率、物理膜厚、光学膜厚、中心波長は、図１３（ａ）に示す通りである。
As shown in FIG. 13A, in Example 4, the layers of the optical multilayer film 13 are L1 to L12 layers in order from the side closer to the substrate 11. In Example 4, the odd layer is formed of niobium-containing titanium suboxide ((Ti 1-x Nb x ) 3 O 5 ), which is a high refractive index material, and the even layer is formed of silicon dioxide (SiO 2 ), which is a low refractive index material. Formed with. That is, the optical multilayer film 13 of Example 4 has a binary film configuration. The refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L12 are as shown in FIG.
また、図１３（ｂ）に示すように、比較例４では、実施例４と同様に光学多層膜を１２個の層Ｌ１～Ｌ１２で形成し、奇数層を高屈折率材料の二酸化チタン（ＴｉＯ２）、偶数層を低屈折率材料の二酸化ケイ素（ＳｉＯ２）とした。比較例４の光学多層膜も２元系の膜構成となっている。各層Ｌ１～Ｌ１２における屈折率、物理膜厚、光学膜厚、中心波長は、図１３（ｂ）に示す通りである。
Further, as shown in FIG. 13B, in Comparative Example 4, the optical multilayer film is formed of 12 layers L1 to L12 as in Example 4, and the odd-numbered layer is made of titanium dioxide (TiO 2) of a high refractive index material. 2 ) The even layer was made of silicon dioxide (SiO 2 ) as a low refractive index material. The optical multilayer film of Comparative Example 4 also has a binary film configuration. The refractive index, physical film thickness, optical film thickness, and center wavelength in each of the layers L1 to L12 are as shown in FIG.
図１３のように光学多層膜を形成した実施例４および比較例４について、実施例３と同様の方法により帯電防止性の有無に関する実験を行った。図１４は、この帯電防止性に関する実験結果を示す図である。図１４において、比較例４に示されるように、ＴｉＯ２とＳｉＯ２とから成る２元系の膜構成では、スチールウール片は部品表面に付着したままであった。また、表面抵抗値は大き過ぎて測定不能であった。これは、比較例４は帯電防止性がないことを示している。
For Example 4 and Comparative Example 4 in which an optical multilayer film was formed as shown in FIG. 13, an experiment was conducted regarding the presence or absence of antistatic properties by the same method as in Example 3. FIG. 14 is a diagram showing experimental results regarding this antistatic property. In FIG. 14, as shown in Comparative Example 4, in the binary film configuration composed of TiO 2 and SiO 2 , the steel wool piece remained attached to the part surface. Further, the surface resistance value was too large to be measured. This indicates that Comparative Example 4 has no antistatic property.
これに対して、実施例４の場合は、表面抵抗の平均値は３．１８×１０12[Ω／□]であり、不織布を擦り終わった直後からスチールウール片は部品表面に付着しなかった。表面抵抗値が１０11[Ω／□]以上となっているが、スチールウール片が部品表面に付着しなかったことから、実施例４は帯電防止性を有していることを示している。
On the other hand, in the case of Example 4, the average value of the surface resistance was 3.18 × 10 12 [Ω / □], and the steel wool piece did not adhere to the surface of the component immediately after rubbing the nonwoven fabric. . Although the surface resistance value is 10 11 [Ω / □] or more, since the steel wool piece did not adhere to the surface of the part, Example 4 shows that it has antistatic properties.
また、実施例４および比較例４について、反射率特性に関するシミュレーションを行った。図１５は、その反射率特性に関するシミュレーション結果を示す図である。図１５に示すように、実施例４および比較例４の何れにおいても、殆どの波長範囲では反射率が高い値を示している。これにより、実施例４および比較例４の何れの場合も、ハーフミラーの特性が得られることが分かった。
In addition, for Example 4 and Comparative Example 4, simulations on reflectance characteristics were performed. FIG. 15 is a diagram showing a simulation result related to the reflectance characteristic. As shown in FIG. 15, in both Example 4 and Comparative Example 4, the reflectance is high in most wavelength ranges. Thus, it was found that the characteristics of the half mirror can be obtained in both cases of Example 4 and Comparative Example 4.
以上詳しく説明したように、本実施形態では、基体１１の表面に光学多層膜１３を蒸着加工して成る光学部品において、光学多層膜１３のうち高屈折率層の薄膜の材料をニオブ含有亜酸化チタンにより形成した。これにより、ニオブ含有亜酸化チタンを蒸着して形成された薄膜はアモルファス状態となるが高い導電性を有し、高い帯電防止性を得ることができる。また、アモルファスであるため、結晶性を高めるために成膜後に再加熱（アニール）処理を行う必要もない。さらに、ＩＴＯ等の導電性薄膜を挿入する必要がないので、光学多層膜１３は低屈折率層と高屈折率層とを交互に積層させた２元系の膜構成となる。これにより、高熱に弱い基体１１の表面に成膜を行った後に再加熱を行うことなく、かつ、３種類の材料を扱うために蒸着装置を改造することなく、帯電防止効果の高い光学部品を得ることができる。
As described above in detail, in this embodiment, in the optical component formed by vapor-depositing the optical multilayer film 13 on the surface of the substrate 11, the thin film material of the high refractive index layer in the optical multilayer film 13 is converted to niobium-containing suboxide. Made of titanium. Thereby, although the thin film formed by vapor-depositing niobium containing titanium suboxide will be in an amorphous state, it has high electroconductivity and can obtain high antistatic property. Further, since it is amorphous, it is not necessary to perform reheating (annealing) after film formation in order to improve crystallinity. Furthermore, since it is not necessary to insert a conductive thin film such as ITO, the optical multilayer film 13 has a binary film configuration in which low refractive index layers and high refractive index layers are alternately laminated. Accordingly, an optical component having a high antistatic effect can be obtained without performing reheating after film formation on the surface of the substrate 11 that is vulnerable to high heat, and without modifying the vapor deposition apparatus to handle three types of materials. Obtainable.
なお、上記実施形態では、光学部品の例として眼鏡用レンズ、バンドパスフィルタ、ハーフミラーの３つを挙げて説明したが、本発明はこれに限定されない。例えば、眼鏡用以外のレンズ、バンドパスフィルタ以外のフィルタ、ハーフミラー以外のミラー、ビームスプリッタ、プリズム、偏光素子、波長板、遮光板、スリガラスなど、他の光学部品に適用することも可能である。
In the above embodiment, three examples of spectacle lenses, a bandpass filter, and a half mirror have been described as examples of optical components, but the present invention is not limited to this. For example, it can be applied to other optical components such as lenses other than glasses, filters other than bandpass filters, mirrors other than half mirrors, beam splitters, prisms, polarizing elements, wave plates, light shielding plates, and ground glass. .
また、上記実施形態では、光学部品の構成として、図１に示すように基体１１、ハードコート膜１２、光学多層膜１３および防汚膜１４を備える例について説明したが、本発明はこれに限定されない。すなわち、基体１１と光学多層膜１３は必須の構成として、ハードコート膜１２および防汚膜１４については、上記のような種々の光学部品の用途に合わせて必要なものを用いればよい。
Moreover, although the said embodiment demonstrated the example provided with the base | substrate 11, the hard-coat film | membrane 12, the optical multilayer film 13, and the antifouling film | membrane 14 as a structure of an optical component as shown in FIG. 1, this invention is limited to this. Not. In other words, the base 11 and the optical multilayer film 13 are essential components, and the hard coat film 12 and the antifouling film 14 may be used in accordance with the applications of the various optical parts as described above.
その他、上記実施形態は、本発明を実施するにあたっての具体化の一例を示したものに過ぎず、これによって本発明の技術的範囲が限定的に解釈されてはならないものである。すなわち、本発明はその要旨、またはその主要な特徴から逸脱することなく、様々な形で実施することができる。
In addition, the above-described embodiment is merely an example of implementation in carrying out the present invention, and the technical scope of the present invention should not be interpreted in a limited manner. That is, the present invention can be implemented in various forms without departing from the gist or the main features thereof.
１１ 基体
１２ ハードコート膜
１３ 光学多層膜
１４ 防汚膜 11Substrate 12 Hard coat film 13 Optical multilayer film 14 Antifouling film
１２ ハードコート膜
１３ 光学多層膜
１４ 防汚膜 11
Claims (4)
- 基体の表面に光学多層膜を蒸着加工して成る光学部品であって、
上記光学多層膜のうち高屈折率層の材料が、チタンとニオブとを成分として含む酸素欠損を有する金属酸化物であるニオブ含有亜酸化チタンの溶融体から成ることを特徴とする光学部品。 An optical component formed by vapor-depositing an optical multilayer film on the surface of a substrate,
An optical component characterized in that the material of the high refractive index layer in the optical multilayer film comprises a melt of niobium-containing titanium suboxide which is a metal oxide having oxygen deficiency containing titanium and niobium as components. - 上記ニオブ含有亜酸化チタンにおいて、金属元素数と酸素元素数の比率が３：５であることを特徴とする請求項１に記載の光学部品。 2. The optical component according to claim 1, wherein in the niobium-containing titanium suboxide, the ratio of the number of metal elements to the number of oxygen elements is 3: 5.
- 上記光学多層膜は奇数数の層から成り、上記基体から数えて奇数層が低屈折率材料、偶数層が高屈折率材料から成り、上記偶数層において上記ニオブ含有亜酸化チタンを用いたことを特徴とする請求項１または２の何れかに記載の光学部品。 The optical multilayer film is composed of an odd number of layers, the odd layer counted from the substrate is composed of a low refractive index material, the even layer is composed of a high refractive index material, and the niobium-containing titanium suboxide is used in the even layer. The optical component according to claim 1, wherein the optical component is characterized by the following.
- 上記光学多層膜は偶数数の層から成り、上記基体から数えて奇数層が高屈折率材料、偶数層が低屈折率材料から成り、上記奇数層において上記ニオブ含有亜酸化チタンを用いたことを特徴とする請求項１または２の何れかに記載の光学部品。 The optical multilayer film is composed of an even number of layers, the odd layer counted from the substrate is composed of a high refractive index material, the even layer is composed of a low refractive index material, and the niobium-containing titanium suboxide is used in the odd layer. The optical component according to claim 1, wherein the optical component is characterized by the following.
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