WO2013024886A1 - Fluorocopolymer composition, coating composition, article having film, and molded article - Google Patents
Fluorocopolymer composition, coating composition, article having film, and molded article Download PDFInfo
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- WO2013024886A1 WO2013024886A1 PCT/JP2012/070800 JP2012070800W WO2013024886A1 WO 2013024886 A1 WO2013024886 A1 WO 2013024886A1 JP 2012070800 W JP2012070800 W JP 2012070800W WO 2013024886 A1 WO2013024886 A1 WO 2013024886A1
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- Prior art keywords
- compound
- fluorine
- containing copolymer
- medium
- group
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 85
- 239000008199 coating composition Substances 0.000 title claims abstract description 38
- 150000001875 compounds Chemical class 0.000 claims abstract description 251
- 125000000524 functional group Chemical group 0.000 claims abstract description 34
- 230000009257 reactivity Effects 0.000 claims abstract description 18
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000005977 Ethylene Substances 0.000 claims abstract description 16
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- 150000004292 cyclic ethers Chemical class 0.000 claims abstract description 9
- 238000007142 ring opening reaction Methods 0.000 claims abstract description 9
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229920001577 copolymer Polymers 0.000 claims description 220
- 229910052731 fluorine Inorganic materials 0.000 claims description 152
- 239000011737 fluorine Substances 0.000 claims description 151
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 150
- 239000011248 coating agent Substances 0.000 claims description 119
- 238000000576 coating method Methods 0.000 claims description 105
- 239000006185 dispersion Substances 0.000 claims description 64
- 239000002904 solvent Substances 0.000 claims description 41
- 238000002844 melting Methods 0.000 claims description 34
- 230000008018 melting Effects 0.000 claims description 34
- 238000002156 mixing Methods 0.000 claims description 30
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 238000004090 dissolution Methods 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 238000000465 moulding Methods 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 230000001737 promoting effect Effects 0.000 claims description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 claims description 3
- 208000035874 Excoriation Diseases 0.000 abstract 2
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- 238000003756 stirring Methods 0.000 description 19
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- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 7
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- 229910052782 aluminium Inorganic materials 0.000 description 7
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- 239000000654 additive Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
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- 229920002799 BoPET Polymers 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
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- 230000000996 additive effect Effects 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
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- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 4
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- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 3
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 125000004018 acid anhydride group Chemical group 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
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- 239000004744 fabric Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- XAOGXQMKWQFZEM-UHFFFAOYSA-N isoamyl propanoate Chemical compound CCC(=O)OCCC(C)C XAOGXQMKWQFZEM-UHFFFAOYSA-N 0.000 description 3
- RGFNRWTWDWVHDD-UHFFFAOYSA-N isobutyl butyrate Chemical compound CCCC(=O)OCC(C)C RGFNRWTWDWVHDD-UHFFFAOYSA-N 0.000 description 3
- JSLCOZYBKYHZNL-UHFFFAOYSA-N isobutyric acid butyl ester Natural products CCCCOC(=O)C(C)C JSLCOZYBKYHZNL-UHFFFAOYSA-N 0.000 description 3
- WDAXFOBOLVPGLV-UHFFFAOYSA-N isobutyric acid ethyl ester Natural products CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- BWTMTZBMAGYMOD-UHFFFAOYSA-N (2,2,3,3,4,4,5,5-octafluoro-6-prop-2-enoyloxyhexyl) prop-2-enoate Chemical compound C=CC(=O)OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)COC(=O)C=C BWTMTZBMAGYMOD-UHFFFAOYSA-N 0.000 description 2
- RRZIJNVZMJUGTK-UHFFFAOYSA-N 1,1,2-trifluoro-2-(1,2,2-trifluoroethenoxy)ethene Chemical class FC(F)=C(F)OC(F)=C(F)F RRZIJNVZMJUGTK-UHFFFAOYSA-N 0.000 description 2
- FBGHCYZBCMDEOX-UHFFFAOYSA-N 1-(2,3,4,5,6-pentafluorophenyl)ethanone Chemical compound CC(=O)C1=C(F)C(F)=C(F)C(F)=C1F FBGHCYZBCMDEOX-UHFFFAOYSA-N 0.000 description 2
- MCYCSIKSZLARBD-UHFFFAOYSA-N 1-[3,5-bis(trifluoromethyl)phenyl]ethanone Chemical compound CC(=O)C1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 MCYCSIKSZLARBD-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- KEBDNKNVCHQIJU-UHFFFAOYSA-N 2-Methylpropyl 3-methylbutanoate Chemical compound CC(C)COC(=O)CC(C)C KEBDNKNVCHQIJU-UHFFFAOYSA-N 0.000 description 2
- FZXRXKLUIMKDEL-UHFFFAOYSA-N 2-Methylpropyl propanoate Chemical compound CCC(=O)OCC(C)C FZXRXKLUIMKDEL-UHFFFAOYSA-N 0.000 description 2
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 description 2
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 2
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 2
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- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
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- 125000004429 atom Chemical group 0.000 description 2
- XFUOBHWPTSIEOV-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) cyclohexane-1,2-dicarboxylate Chemical compound C1CCCC(C(=O)OCC2OC2)C1C(=O)OCC1CO1 XFUOBHWPTSIEOV-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
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- 238000000354 decomposition reaction Methods 0.000 description 2
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- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
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- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
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- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- MRPUVAKBXDBGJQ-UHFFFAOYSA-N methyl 2,2,3,3,4,4,4-heptafluorobutanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)F MRPUVAKBXDBGJQ-UHFFFAOYSA-N 0.000 description 1
- OSDPSOBLGQUCQX-UHFFFAOYSA-N methyl 2,2,3,3,4,4,5,5,5-nonafluoropentanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F OSDPSOBLGQUCQX-UHFFFAOYSA-N 0.000 description 1
- JHROQORAJUWVCD-UHFFFAOYSA-N methyl 2,2,3,3,4,4,5,5,6,6,7,7,7-tridecafluoroheptanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JHROQORAJUWVCD-UHFFFAOYSA-N 0.000 description 1
- NARNQFAFGNRNNN-UHFFFAOYSA-N methyl 2,2,3,3,4,4,5,5-octafluoropentanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)F NARNQFAFGNRNNN-UHFFFAOYSA-N 0.000 description 1
- UXJRQNXHCZKHRJ-UHFFFAOYSA-N methyl 2,3,4,5,6-pentafluorobenzoate Chemical compound COC(=O)C1=C(F)C(F)=C(F)C(F)=C1F UXJRQNXHCZKHRJ-UHFFFAOYSA-N 0.000 description 1
- XVTQAXXMUNXFMU-UHFFFAOYSA-N methyl 2-(3-oxo-2-pyridin-2-yl-1h-pyrazol-5-yl)acetate Chemical compound N1C(CC(=O)OC)=CC(=O)N1C1=CC=CC=N1 XVTQAXXMUNXFMU-UHFFFAOYSA-N 0.000 description 1
- JFZUABNDWZQLIJ-UHFFFAOYSA-N methyl 2-[(2-chloroacetyl)amino]benzoate Chemical compound COC(=O)C1=CC=CC=C1NC(=O)CCl JFZUABNDWZQLIJ-UHFFFAOYSA-N 0.000 description 1
- JGGBVFLRNNDHCM-UHFFFAOYSA-N methyl 3,3,3-trifluoro-2-(trifluoromethyl)propanoate Chemical compound COC(=O)C(C(F)(F)F)C(F)(F)F JGGBVFLRNNDHCM-UHFFFAOYSA-N 0.000 description 1
- LTYNBDAJUXZFHP-UHFFFAOYSA-N methyl 3,5-bis(trifluoromethyl)benzoate Chemical compound COC(=O)C1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 LTYNBDAJUXZFHP-UHFFFAOYSA-N 0.000 description 1
- QQHNNQCWKYFNAC-UHFFFAOYSA-N methyl 3-(trifluoromethyl)benzoate Chemical compound COC(=O)C1=CC=CC(C(F)(F)F)=C1 QQHNNQCWKYFNAC-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- HNBDRPTVWVGKBR-UHFFFAOYSA-N n-pentanoic acid methyl ester Natural products CCCCC(=O)OC HNBDRPTVWVGKBR-UHFFFAOYSA-N 0.000 description 1
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- PLZZPPHAMDJOSR-UHFFFAOYSA-N nonanenitrile Chemical compound CCCCCCCCC#N PLZZPPHAMDJOSR-UHFFFAOYSA-N 0.000 description 1
- YSIMAPNUZAVQER-UHFFFAOYSA-N octanenitrile Chemical compound CCCCCCCC#N YSIMAPNUZAVQER-UHFFFAOYSA-N 0.000 description 1
- AVBRYQRTMPHARE-UHFFFAOYSA-N octyl formate Chemical compound CCCCCCCCOC=O AVBRYQRTMPHARE-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- FKCRAVPPBFWEJD-XVFCMESISA-N orotidine Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1N1C(=O)NC(=O)C=C1C(O)=O FKCRAVPPBFWEJD-XVFCMESISA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- QULYNCCPRWKEMF-UHFFFAOYSA-N parachlorobenzotrifluoride Chemical compound FC(F)(F)C1=CC=C(Cl)C=C1 QULYNCCPRWKEMF-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- XJVUVRKPEBTMEC-UHFFFAOYSA-N pentyl 2,2,2-trifluoroacetate Chemical compound CCCCCOC(=O)C(F)(F)F XJVUVRKPEBTMEC-UHFFFAOYSA-N 0.000 description 1
- UYGGIIOLYXRSQY-UHFFFAOYSA-N pentyl 2-methylpropanoate Chemical compound CCCCCOC(=O)C(C)C UYGGIIOLYXRSQY-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000003884 phenylalkyl group Chemical group 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002852 poly(2,6-dimethyl-1,4-phenylene oxide) polymer Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920001483 poly(ethyl methacrylate) polymer Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920006128 poly(nonamethylene terephthalamide) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000343 polyazomethine Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000129 polyhexylmethacrylate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004626 polylactic acid Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 229920002215 polytrimethylene terephthalate Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229940075065 polyvinyl acetate Drugs 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- ASAXRKSDVDALDT-UHFFFAOYSA-N propan-2-yl 2,2,2-trifluoroacetate Chemical compound CC(C)OC(=O)C(F)(F)F ASAXRKSDVDALDT-UHFFFAOYSA-N 0.000 description 1
- OXFUJTXVBVXEHJ-UHFFFAOYSA-N propan-2-yl acetate;propyl acetate Chemical compound CCCOC(C)=O.CC(C)OC(C)=O OXFUJTXVBVXEHJ-UHFFFAOYSA-N 0.000 description 1
- CDXJNCAVPFGVNL-UHFFFAOYSA-N propyl 2,2,2-trifluoroacetate Chemical compound CCCOC(=O)C(F)(F)F CDXJNCAVPFGVNL-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- HTUIWRWYYVBCFT-UHFFFAOYSA-N propyl hexanoate Chemical compound CCCCCC(=O)OCCC HTUIWRWYYVBCFT-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000005336 safety glass Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- QJHDFBAAFGELLO-UHFFFAOYSA-N sec-butyl butyrate Chemical compound CCCC(=O)OC(C)CC QJHDFBAAFGELLO-UHFFFAOYSA-N 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- UQJLSMYQBOJUGG-UHFFFAOYSA-N tert-butyl 2,2,2-trifluoroacetate Chemical compound CC(C)(C)OC(=O)C(F)(F)F UQJLSMYQBOJUGG-UHFFFAOYSA-N 0.000 description 1
- KVWOTUDBCFBGFJ-UHFFFAOYSA-N tert-butyl 2-methylpropanoate Chemical compound CC(C)C(=O)OC(C)(C)C KVWOTUDBCFBGFJ-UHFFFAOYSA-N 0.000 description 1
- TWBUVVYSQBFVGZ-UHFFFAOYSA-N tert-butyl butanoate Chemical compound CCCC(=O)OC(C)(C)C TWBUVVYSQBFVGZ-UHFFFAOYSA-N 0.000 description 1
- SCSLUABEVMLYEA-UHFFFAOYSA-N tert-butyl pentanoate Chemical compound CCCCC(=O)OC(C)(C)C SCSLUABEVMLYEA-UHFFFAOYSA-N 0.000 description 1
- JAELLLITIZHOGQ-UHFFFAOYSA-N tert-butyl propanoate Chemical compound CCC(=O)OC(C)(C)C JAELLLITIZHOGQ-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- HTSABYAWKQAHBT-UHFFFAOYSA-N trans 3-methylcyclohexanol Natural products CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 1
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Substances OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229940070710 valerate Drugs 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
- C08F214/186—Monomers containing fluorine with non-fluorinated comonomers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F259/00—Macromolecular compounds obtained by polymerising monomers on to polymers of halogen containing monomers as defined in group C08F14/00
- C08F259/08—Macromolecular compounds obtained by polymerising monomers on to polymers of halogen containing monomers as defined in group C08F14/00 on to polymers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C09D127/18—Homopolymers or copolymers of tetrafluoroethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
- C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
- C08K5/1515—Three-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
Definitions
- the present invention relates to a fluorine-containing copolymer composition, a coating composition containing the fluorine-containing copolymer composition, an article having a coating film formed using the coating composition, and a fluorine-containing copolymer.
- the present invention relates to a molded product obtained by molding a composition.
- Fluoropolymers are used in various applications that cannot be handled by general-purpose plastics because they are excellent in solvent resistance, low dielectric properties, low surface energy, non-adhesiveness, weather resistance, and the like.
- a fluorine-containing copolymer (hereinafter also referred to as ETFE) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene is low in heat resistance, flame resistance, chemical resistance, weather resistance, Because of its excellent frictional properties, low dielectric properties, transparency, etc., it is used in a wide range of fields such as heat-resistant wire coating materials, chemical plant corrosion-resistant piping materials, agricultural vinyl house materials, and mold release films. .
- ETFE is insoluble in organic solvents
- a coating composition containing ETFE cannot be prepared.
- ETFE can be dissolved in a specific organic solvent (a fluorine-containing aromatic compound or a chain hydrocarbon compound having a carbonyl group) under heating below the melting point of ETFE. It has been clarified that an ETFE dispersion can be obtained by cooling the ETFE solution dissolved in the aromatic compound (see Patent Documents 1 and 2).
- the coating film formed by applying the ETFE dispersion on the surface of the substrate and drying it has many voids and insufficient denseness, adhesion, scratch resistance, etc. are insufficient, The substrate cannot be sufficiently protected. If the coating film is baked at a melting point of ETFE or higher, a dense coating film can be obtained, but the characteristics of ETFE are likely to deteriorate due to exposure to high temperatures. Further, when the substrate does not have sufficient heat resistance, firing at a temperature equal to or higher than the melting point cannot be applied.
- the present invention is a fluorine-containing copolymer capable of forming a coating film and a molded article excellent in adhesion, scratch resistance, base material protection performance, heat resistance, etc. even when fired at a relatively low temperature; fired at a relatively low temperature
- the coating composition capable of forming a coating film and a molded article excellent in adhesion, scratch resistance, substrate protective performance, heat resistance, etc .; while maintaining the properties of the fluorinated copolymer,
- the fluorine-containing copolymer composition of the present invention comprises a fluorine-containing copolymer (A) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene, a group having a cyclic ether having ring-opening reactivity, and an addition
- a medium (C) capable of dissolving or dispersing the fluorine-containing copolymer (A) and capable of dissolving or dispersing the compound (B).
- the mixing ratio of the fluorinated copolymer (A) and the compound (B) is preferably 98/2 to 2/98 by mass ratio, and the content ratio of the medium (C) is fluorinated copolymer composition. 10 to 99% by mass is preferable with respect to (100% by mass).
- the melting point of the fluorine-containing copolymer (A) is preferably in the range of 150 to 260 ° C. Furthermore, the melting point of the medium (C) is preferably in the range of 25 ° C. or lower, and the boiling point is preferably in the range of 230 ° C. or lower at normal pressure.
- the fluorine-containing copolymer composition of the present invention comprises a reaction of the compound (D1) having a reactive functional group capable of reacting with the reactive functional group of the compound (B) and the reactive functional group of the compound (B). It is preferable to further include at least one compound (D) selected from the group consisting of the compound (D2) that can be promoted (however, excluding the following compound (E)).
- the fluorine-containing copolymer composition of the present invention may further contain a compound (E) that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C).
- a compound (E) that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C).
- the compound (E) comprises at least one group selected from the group consisting of a primary amino group, a secondary amino group, and a nitrogen-containing heterocyclic group having a nitrogen-hydrogen bond, and an alkyl group having 1 to 20 carbon atoms. It is preferable that it is a compound (E1) which has.
- the medium (C) is preferably a solvent having a solubility index (R) represented by the following formula (1) of less than 49.
- R 4 ⁇ ( ⁇ d ⁇ 15.7) 2 + ( ⁇ p ⁇ 5.7) 2 + ( ⁇ h ⁇ 4.3) 2 (1).
- ⁇ d, ⁇ p, and ⁇ h are a dispersion term, a polar term, and a hydrogen bond term [(MPa) 1/2 ] in the Hansen solubility parameter of the solvent, respectively.
- the coating composition of the present invention includes the fluorine-containing copolymer composition of the present invention.
- the article having the coating film of the present invention has a coating film formed using the coating composition of the present invention.
- the molded article of the present invention is formed by molding the fluorine-containing copolymer composition of the present invention.
- a coating film and a molded article excellent in adhesion, scratch resistance, heat resistance and the like can be formed even when fired at a relatively low temperature.
- a coating film having excellent adhesion, scratch resistance, heat resistance and the like can be formed even when fired at a relatively low temperature.
- the article having the coating film of the present invention has a coating film excellent in adhesion, scratch resistance, heat resistance and the like while maintaining the characteristics of the fluorinated copolymer.
- the molded article of the present invention is excellent in scratch resistance, heat resistance and the like while maintaining the characteristics of the fluorine-containing copolymer.
- the “repeating unit” in the present specification means a unit derived from the monomer formed by polymerization of the monomer.
- the repeating unit may be a unit directly formed by a polymerization reaction, or may be a unit in which a part of the unit is converted into another structure by treating the polymer.
- the “monomer” in the present specification means a compound having a polymerization-reactive carbon-carbon double bond.
- the “solution state” in which the fluorine-containing copolymer (A) and / or the compound (B) is dissolved in the medium (C) means the fluorine-containing copolymer (A) and / or the compound (B ) And the medium (C) sufficiently mixed to mean that the insoluble matter is not confirmed by visual inspection.
- melting temperature in this specification refers to a temperature measured by the following method. A total of 0.10 g of the fluorinated copolymer (A) and / or the compound (B) is added to 4.90 g of the medium (C), and the mixture is heated with a stirring means or the like while always maintaining a sufficiently mixed state. Whether the polymer (A) and / or the compound (B) is dissolved is visually observed. First, the temperature at which the mixture is found to be in a uniform solution state and completely dissolved is confirmed. Subsequently, the temperature at which the solution becomes turbid is confirmed by gradually cooling, and the temperature at which the solution is reheated and becomes a uniform solution again is defined as the dissolution temperature.
- the fluorine-containing copolymer composition of the present invention is in a solution state or a dispersion state containing the fluorine-containing copolymer (A), the compound (B), and the medium (C).
- the fluorine-containing copolymer composition of the present invention may contain a compound (D), a compound (E), another resin (F) or the like as necessary.
- the fluorine-containing copolymer (A) is a copolymer having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene (hereinafter referred to as TFE).
- the molar ratio of the repeating unit based on TFE and the repeating unit based on ethylene is preferably 70/30 to 30/70, more preferably 65/35 to 40/60, and 60/40 to 40/60. Is more preferable. If the molar ratio is within the above range, it is derived from repeating units based on TFE such as heat resistance, weather resistance, chemical resistance and the like, and repeating units based on ethylene such as mechanical strength and melt moldability. Good balance with characteristics.
- the fluorine-containing copolymer (A) has repeating units based on monomers other than ethylene and TFE (hereinafter referred to as other monomers) from the viewpoint that various functions can be imparted to the obtained copolymer. Is preferred. Examples of other monomers include the following compounds.
- Olefins olefins having 3 carbon atoms (propylene, etc.), olefins having 4 carbon atoms (butylene, isobutylene, etc.), 4-methyl-1-pentene, cyclohexene, styrene, ⁇ -methylstyrene, etc. (excluding ethylene) ), Vinyl esters: vinyl acetate, vinyl lactate, vinyl butyrate, vinyl pivalate, vinyl benzoate, etc. Allyl esters: allyl acetate, etc.
- Vinyl ethers methyl vinyl ether, ethyl vinyl ether, butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, cyclohexyl vinyl ether, hydroxybutyl vinyl ether, polyoxyethylene vinyl ether, etc. Allyl ethers: allyl methyl ether, allyl ethyl ether, allyl butyl ether, allyl glycidyl ether, etc.
- (Meth) acrylic acid esters methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylic acid 4-hydroxybutyl, glycidyl (meth) acrylate, etc.
- (Meth) acrylamides (Meth) acrylamide, N-methyl (meth) acrylamide, N-isopropylacrylamide, N, N-dimethyl (meth) acrylamide, etc. Cyano group-containing monomers: acrylonitrile, etc.
- Chloroolefins Vinyl chloride, vinylidene chloride, etc.
- Compound containing carboxylic anhydride and unsaturated bond maleic anhydride, itaconic anhydride, citraconic anhydride and the like.
- Another monomer may be used individually by 1 type and may be used in combination of 2 or more type.
- the proportion of repeating units based on other monomers is preferably from 0.1 to 50 mol%, more preferably from 0.1 to 30 mol%, and more preferably from 0.1 to 20 mol based on the total repeating units (100 mol%). More preferred is mol%. If the ratio of repeating units based on other monomers is within this range, high solubility and repellency can be achieved without impairing the properties of ETFE consisting essentially of repeating units based on ethylene and repeating units based on TFE. Functions such as aqueous properties, oil repellency, adhesion to the substrate, and reactivity with the compound (B) can be imparted.
- the fluorinated copolymer (A) has reactivity with the substrate and the compound (B) from the viewpoints of adhesion of the coating film to the substrate, miscibility with the compound (B), compatibility and the like. It preferably has a reactive functional group.
- the reactive functional group may be present at any of the molecular end, side chain, or main chain of the fluorine-containing copolymer (A). Moreover, only one type of reactive functional group may be present, or two or more types may be present.
- the kind of the reactive functional group and the content thereof are appropriately selected depending on the kind of the compound (B), the functional group possessed by the compound (B), the required characteristics, the molding method and the like.
- the reactive functional group includes a carboxylic acid group, a group obtained by dehydration condensation of two carboxyl groups in one molecule (hereinafter referred to as an acid anhydride group), a hydroxyl group, a sulfonic acid group, an epoxy group, a cyano group, and a carbonate group. And at least one selected from the group consisting of an isocyanate group, an ester group, an amide group, an aldehyde group, an amino group, a hydrolyzable silyl group, a group having a carbon-carbon double bond, and a carboxylic acid halide group.
- the carboxylic acid group means a carboxyl group and a salt thereof (—COOM 1 ).
- M ⁇ 1 > is a metal atom or atomic group which can form a salt with carboxylic acid.
- the sulfonic acid group means a sulfo group and a salt thereof (—SO 3 M 2 ).
- M 2 is a metal atom or an atomic group capable of forming a salt with sulfonic acid.
- the hydrolyzable silyl group is a group in which an alkoxy group, an amino group, a halogen atom, or the like is bonded to a silicon atom, and is a group that can be crosslinked by forming a siloxane bond by hydrolysis. A trialkoxysilyl group, an alkyl dialkoxysilyl group and the like are preferable.
- carboxylic acid groups carboxylic acid groups, acid anhydride groups, hydroxyl groups, epoxy groups, carbonate groups, amino groups, amide groups, hydrolyzable silyl groups, groups having a carbon-carbon double bond
- carboxylic acids Preferably, at least one selected from the group consisting of halide groups, carboxylic acid groups, acid anhydride groups, hydroxyl groups, epoxy groups, amino groups, amide groups, groups having a carbon-carbon double bond, and carboxylic acid halide groups More preferred is at least one selected from the group consisting of
- Examples of the method for introducing a reactive functional group into the fluorinated copolymer (A) include the following methods.
- (I) A method of copolymerizing a monomer having a reactive functional group as one of the other monomers when polymerizing ethylene, TFE and another monomer.
- (Ii) Fluorine-containing copolymer (A) by using a polymerization initiator having a reactive functional group, a chain transfer agent or the like when copolymerizing ethylene, TFE and other monomers as required.
- (Iii) A method of grafting a compound having a reactive functional group and a functional group capable of grafting (such as an unsaturated bond) (grafting compound) onto the fluorine-containing copolymer (A).
- Two or more methods (i) to (iii) may be appropriately combined.
- the method (i) and / or (ii) is preferable from the viewpoint of durability of the fluorine-containing copolymer (A).
- the functional group introduced as necessary to impart various functions to the fluorine-containing copolymer (A) is the same as the method of introducing the reactive functional group. It can introduce
- the melting point of the fluorinated copolymer (A) is preferably from 130 to 275 ° C., more preferably from 140 to 265 ° C., and even more preferably from 150 to 260 ° C. from the viewpoints of solubility and strength.
- the melting point of the fluorinated copolymer (A) is measured by, for example, a differential scanning calorimetry (DSC) apparatus.
- ETFE fluorinated copolymer
- a fluorine-containing copolymer (A) may be used individually by 1 type, and may be used in combination of 2 or more type.
- Compound (B) is a curable compound having at least one reactive functional group selected from the group consisting of a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity.
- Compound (however, excluding the fluorine-containing copolymer (A)).
- the compound (B) in the temperature range in which the fluorinated copolymer (A) and the medium (C) are in a solution state, those that dissolve in the medium (C), those that partially dissolve in the medium (C), Or what does not melt
- the compound (B) is preferably one that is soluble in the medium (C) from the viewpoint of miscibility and compatibility with the fluorinated copolymer (A).
- Examples of the group having a cyclic ether having ring-opening reactivity include an epoxy group, a glycidyl group, and an oxetanyl group.
- Examples of the group having a carbon-carbon double bond having addition reactivity include a vinyl group, an allyl group, an acryloyloxy group, a methacryloyloxy group, and a styryl group.
- Examples of the compound (B1) containing a group having a cyclic ether having ring-opening reactivity include epoxy resins and oxetane resins.
- Examples of the compound (B2) containing a group having a carbon-carbon double bond having addition reactivity include an acrylic monofunctional monomer, an acrylic polyfunctional monomer, an acrylic macromonomer, an allyl monofunctional monomer, and an allyl polyfunctional monomer. A functional monomer, an allylic macromonomer, etc. are mentioned.
- Examples of the compound (B3) having a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity include glycidyl acrylate, glycidyl methacrylate, and allyl glycidyl ether. .
- the compound (B) may be a curable fluorine-containing compound.
- the curable fluorine-containing compound include a fluorine-containing epoxy resin, a curable fluorine-containing copolymer described in International Publication No. 2009/096342, a curable fluorine-containing copolymer described in Japanese Patent Application Laid-Open No. 7-228818, and the like. Is mentioned.
- the fluorine-containing copolymer (A) when the fluorine-containing copolymer (A) has a reactive functional group, the fluorine-containing copolymer (A) is preferable from the viewpoint of miscibility or compatibility with the fluorine-containing copolymer (A). What has a reactive functional group which can react with the reactive functional group of a polymer (A) is preferable.
- a commercially available curable compound may be used as the compound (B).
- the following are mentioned as a commercially available curable compound.
- a compound (B) may be used individually by 1 type, and may be used in combination of 2 or more type.
- various hardening methods such as thermosetting, photocuring, and radiation curing, are applicable. It is also preferable to cure by using a compound (D) described later in combination.
- the medium (C) is a medium that can dissolve or disperse the fluorine-containing copolymer (A) and can dissolve or disperse the compound (B).
- a solvent capable of dissolving the fluorinated copolymer (A) at a temperature not higher than the melting point of the fluorinated copolymer (A) is preferable.
- a solvent that functions as a dispersion medium for allowing the fine particles to exist in a dispersed state is more preferable at least at normal temperature and pressure.
- the medium (C) may dissolve the compound (B), or may not dissolve the compound (B) partially or at all, and the fluorine-containing copolymer (A) and the compound From the viewpoint of miscibility with (B) or compatibility, those that dissolve the compound (B) are preferred.
- Whether or not a certain solvent is a medium (C) capable of dissolving at least the fluorinated copolymer (A) can be determined by whether or not the polarity of the solvent is within a specific range.
- the Hansen solubility parameter is a three-dimensional space where the solubility parameter introduced by Hildebrand is divided by Hansen into three components: a dispersion term ⁇ d, a polar term ⁇ p, and a hydrogen bond term ⁇ h. It is.
- the dispersion term ⁇ d indicates the effect due to the dispersion force
- the polar term ⁇ p indicates the effect due to the dipole force
- the hydrogen bond term ⁇ h indicates the effect due to the hydrogen bond force.
- Hansen solubility parameter The definition and calculation method of the Hansen solubility parameter is described in the following document. Charles M. Hansen, “Hansen Solubility Parameters: A Users Handbook”, CRC Press, 2007.
- Hansen solubility parameters can be easily estimated from their chemical structures by using computer software (Hansen Solubility Parameters in Practice (HSPIP)).
- HSPiP version 3 is used, and the value is used for the solvent registered in the database, and the estimated value is used for the solvent not registered.
- the Hansen solubility parameter of a specific resin X is usually determined by conducting a solubility test in which the resin X is dissolved in a number of different solvents for which the Hansen solubility parameter has been determined and the solubility is measured. Specifically, when the coordinates of the Hansen solubility parameters of all the solvents used in the solubility test are shown in a three-dimensional space, the coordinates of the solvent in which the resin X is dissolved are all contained inside the sphere and the solvent is not dissolved. A sphere (solubility sphere) that is outside the sphere is found, and the center coordinates of the solubility sphere are used as the Hansen solubility parameter of the resin X.
- the solvent contains the resin X. It is thought to dissolve. On the other hand, if the coordinates are outside the solubility sphere, it is considered that the solvent cannot dissolve the resin X.
- the most suitable solvent for dissolving at least the fluorinated copolymer (A) at a temperature below its melting point and dispersing it as fine particles without agglomerating the fluorinated copolymer (A) at room temperature It is assumed that diisopropyl ketone is a substance having a property closest to the fluorine-containing copolymer (A) as a Hansen solubility parameter. Then, with diisopropyl ketone as the reference (the center of the solubility sphere), the solvent at a certain distance (ie, inside the solubility sphere) from the coordinates (15.7, 5.7, and 4.3) of the Hansen solubility parameter of diisopropyl ketone. Groups can be used as medium (C).
- the medium (C) preferably has a solubility index (R) of less than 49, more preferably less than 36.
- the medium (C) having the solubility index (R) within this range has high affinity with the fluorinated copolymer (A), and the solubility and dispersibility of the fluorinated copolymer (A) are increased.
- the solubility index (R) can be used as a solubility index for the fluorinated copolymer (A). For example, an average Hansen solubility parameter is obtained from the mixing ratio (volume ratio) of the mixed solvent, and the dissolution index (R) is calculated from the average value.
- Examples of the solvent that can be used as the medium (C) include ketones having 3 to 10 carbon atoms, esters, carbonates, ethers, or nitriles, fluorine-containing aromatic compounds having at least two fluorine atoms, or heterocyclic rings.
- Specific examples of the medium (C) having a dissolution index (R) of less than 49 include the following solvents.
- the following solvents are preferable from the viewpoint of high affinity with the fluorinated copolymer (A) and sufficiently high solubility and dispersibility of the fluorinated copolymer (A).
- a medium (C) may be used individually by 1 type, and may be used in combination of 2 or more type. Moreover, as long as it can be used as a medium (C) after mixing, you may use the mixed solvent which mixed another solvent with the medium (C). Furthermore, as long as it can be used as the medium (C) after mixing, a mixed solvent obtained by mixing two or more other solvents may be used. Specific examples of the mixed solvent that can be used as the medium (C) include the following combinations.
- the medium (C) it is preferable to use a solvent having a temperature range of 230 ° C. or less that exhibits a solution state with the fluorine-containing copolymer (A). If the temperature range is 230 ° C. or less, the fluorine-containing copolymer (A) and the compound (B) described later can be mixed at a temperature sufficiently lower than the melting point of the fluorine-containing copolymer (A). It is possible and the deterioration of the characteristics of the fluorine-containing copolymer (A) and the compound (B) can be suppressed.
- the following solvent is mentioned as a medium (C) whose temperature range which exhibits a solution state with a fluorine-containing copolymer (A) is 230 degrees C or less, ie, a melting temperature is 230 degrees C or less.
- Diisopropyl ketone (melting temperature: 175 ° C.), 2-hexanone (melting temperature: 175 ° C.), Cyclohexanone (dissolution temperature: 170 ° C.), 3 ′, 5′-bis (trifluoromethyl) acetophenone (melting temperature: 160 ° C.), 2 ′, 3 ′, 4 ′, 5 ′, 6′-pentafluoroacetophenone (melting temperature: 155 ° C.), Benzotrifluoride (melting temperature: 170 ° C.), Isobutyl acetate (melting temperature: 175 ° C.).
- the dissolution temperature in parentheses is the dissolution temperature when the fluorine-
- the medium (C) a solid content comprising a mixture of the fluorine-containing copolymer (A) and the compound (B) is separated from the fluorine-containing copolymer composition by reprecipitation or the like, or the fluorine-containing copolymer composition From the point of using as a coating composition, a solvent that is liquid at room temperature (25 ° C.) is preferable. Further, the melting point of the medium (C) is preferably 20 ° C. or lower for the same reason. Furthermore, the boiling point (normal pressure) of the medium (C) is preferably 230 ° C. or less from the viewpoint of the handleability of the medium (C) and the solvent removability when the solid content is separated from the fluorine-containing copolymer composition, 200 degrees C or less is more preferable.
- the compound (D) is obtained from the compound (D1) having a reactive functional group capable of reacting with the reactive functional group of the compound (B) and the compound (D2) capable of promoting the reaction of the reactive functional group of the compound (B). And at least one compound selected from the group (excluding compound (E)).
- the compound (D) may be any of those that dissolve in the medium (C), those that partially dissolve in the medium (C), or those that do not dissolve at all, but the fluorine-containing copolymer (A), the compound (B), Those that are soluble in the medium (C) are preferred from the viewpoint of miscibility or compatibility, and those that are soluble in the medium (C) at a temperature below the melting point of the fluorinated copolymer (A) are more preferred.
- Compound (D1) reacts with the reactive functional group of fluorine-containing copolymer (A) or compound (B) to form a three-dimensional network structure, and has a function of curing the fluorine-containing copolymer composition. It is an agent.
- the compound (D2) has a function of reacting the reactive functional groups of the fluorine-containing copolymer (A) and the compound (B) to form a three-dimensional network structure and curing the fluorine-containing copolymer composition. Catalyst or initiator.
- examples of the compound (D1) include acid anhydrides, polyamines, polyphenols, polythiols, and the like (D2).
- a tertiary amine compound, an imidazole compound, etc. are mentioned.
- examples of the compound (D1) include primary amines, secondary amines, and thiols.
- thermal polymerization initiators, photopolymerization initiators, and the like include thermal polymerization initiators, photopolymerization initiators, and the like.
- the compound (D) commercially available curing agents, catalysts, initiators and the like may be used. The following are mentioned as a commercially available hardening
- ADEKA Adeka Hardener (registered trademark), Adekaoptomer (registered trademark), DIC Corporation: EPICLON (registered trademark), LUCKAMIDE (registered trademark), PHENOLITE (registered trademark), BASF Corporation: IRGACURE (registered trademark), etc.
- the compound (E) is a dissolution accelerator or a dispersant that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C).
- the compound (E) is preferably soluble in the medium (C) from the viewpoint of the solubility or dispersibility of the fluorine-containing copolymer (A) or the compound (B) in the medium (C). What melt
- Compound (E) includes surfactants, dispersants, viscosity modifiers and the like.
- the compound (E) has a primary amino group, a secondary amino group, and a nitrogen-hydrogen bond because it also serves as a catalyst for promoting the reaction of a group having a cyclic ether having ring-opening reactivity.
- a compound (E1) having at least one group selected from the group consisting of nitrogen-containing heterocyclic groups and an alkyl group having 1 to 20 carbon atoms is preferable, and has an imidazolyl group and an alkyl group having 4 to 20 carbon atoms. Compounds are more preferred.
- the fluorine-containing copolymer composition of the present invention contains at least one selected from the group consisting of the compound (D) and the compound (E1) from the viewpoints of coating film adhesion, scratch resistance, heat resistance, and the like. Is preferable, and it is more preferable that the compound (D) and the compound (E1) are included.
- the other resin (F) is a thermoplastic resin or a thermosetting resin other than the fluorine-containing copolymer (A) and the compounds (B) to (E).
- the other resin (F) is one that dissolves in the medium (C) or partly dissolves in the medium (C) in a temperature range in which the fluorine-containing copolymer (A) and the medium (C) are in a solution state.
- those that are soluble in the medium (C) are preferable.
- thermoplastic resin examples include fluorine resins and hydrocarbon resins other than the fluorine-containing copolymer (A).
- fluorine resin examples include polytetrafluoroethylene, ethylene-chlorotrifluoroethylene copolymer, polyvinylidene fluoride, polyvinyl fluoride, polychlorotrifluoroethylene, chlorotrifluoroethylene-vinyl ether copolymer, poly (2,2 , 3,3,3-pentafluoropropyl methacrylate), poly (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl methacrylate) and the like. It is done.
- hydrocarbon resins examples include polyethylene, polypropylene, poly (4-methyl-1-pentene), poly (1-butene), polystyrene, polyvinyl chloride, polyvinylidene chloride, polymethyl methacrylate, polyethyl methacrylate, and polybutyl methacrylate.
- Thermosetting resins include phenolic resin, urea resin, melamine resin, guanamine resin, aniline resin, benzoxazine resin, cyanate ester resin, isocyanate resin, alkyd resin, phthalic acid resin, polyurethane, thiourethane resin, thermosetting Examples include polyimide, xylene resin, ketone resin, furan resin, COPNA resin, silicone resin, polyazomethine and the like.
- the fluorinated copolymer composition of the present invention comprises a fluorinated copolymer (A) and a compound (B) in the medium (C), and if necessary, a compound (D), a compound (E), and other resins. It can be prepared by a method of mixing (F) and the like.
- Mixing should just be a dispersion liquid state which a fluorine-containing copolymer (A) obtains through a solution state or a solution state.
- the compound (B) may be in a solution state or a dispersion state, and the miscibility or compatibility between the fluorine-containing copolymer (A) and the compound (B). Therefore, a solution state is preferable.
- Examples of the mixing method include the following methods ( ⁇ ) to ( ⁇ ).
- ( ⁇ ) After the fluorine-containing copolymer (A) and, if necessary, the compound (E) are dissolved in the medium (C), the fluorine-containing copolymer (A) is precipitated and dispersed as necessary.
- the compound (B) and, if necessary, the compound (D) are added thereto and dissolved or dispersed, followed by mixing.
- the fluorine-containing copolymer (A) and the compound (D), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) is precipitated if necessary.
- the compound (B) and, if necessary, the compound (D) are added thereto and dissolved or dispersed, and then mixed.
- the fluorine-containing copolymer (A) and the compound (B), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) is precipitated as necessary.
- the compound (D) is added and dissolved or dispersed, and then mixed.
- a method in which the fluorine-containing copolymer (A) and the compound (B) and, if necessary, the compound (D), the compound (E) and the like are dissolved or dispersed in the medium (C) and mixed.
- the temperature at the time of mixing is 0 ° C. or higher and not higher than the melting point of the fluorine-containing copolymer (A).
- the melting point of the fluorinated copolymer (A) (that is, ETFE) is the highest and is approximately 275 ° C.
- the upper limit temperature during mixing is preferably 230 ° C., more preferably 200 ° C., from the viewpoint of suppressing deterioration of the properties of the fluorinated copolymer (A) and the compound (B).
- the lower limit temperature at the time of mixing is a temperature at which the fluorine-containing copolymer (A) is dissolved in the medium (C) or the fine particles are uniformly dispersed from the viewpoint of obtaining a sufficiently dissolved state, preferably 0 ° C., 20 ° C is more preferred. It is not always necessary to dissolve the fluorine-containing copolymer (A) and the compound (B) again in the medium (C). When heating is required, mixing and heating of each component may be performed simultaneously, and after mixing each component, you may heat, stirring as needed.
- the pressure during mixing is usually preferably normal pressure or a slight pressure of about 0.5 MPa.
- the pressure is at least not more than the spontaneously generated pressure, preferably not more than 3 MPa, more preferably not more than 2 MPa, more preferably not more than 1 MPa, most preferably normal pressure It is the following, and it is preferable to mix in a pressure vessel.
- the pressure is preferably about 0.01 to 1 MPa.
- the mixing time depends on the mixing ratio of the fluorinated copolymer (A) and the compound (B), the shape of the fluorinated copolymer (A) and the compound (B) before being added to the medium (C), and the like.
- the shape of the fluorinated copolymer (A) is preferably a powder from the viewpoint of shortening the dissolution time in the medium (C), and a pellet is preferred from the viewpoint of availability.
- the shape of the compound (B) is preferably liquid or powder from the viewpoint of shortening the dissolution time in the medium (C).
- Mixing means include homomixers, high-pressure homogenizers, bead mills, planetary ball mills, Henschel mixers, Banbury mixers, pressure kneaders, ultrasonic stirrers, high-pressure abutting dispersers, thin-film swivel high-speed mixers, and various static mixers and motions
- a known stirring mixer such as a less mixer may be used.
- an apparatus such as an autoclave with a stirrer may be used.
- the stirring blade include a marine propeller blade, a paddle blade, an anchor blade, and a turbine blade.
- a magnetic stirrer or the like may be used as the stirring device.
- the mixing ratio of the fluorinated copolymer (A) and the compound (B) may be appropriately determined according to the use of the obtained fluorinated copolymer composition, and is not particularly limited.
- the mixing ratio ((A) / (B) (mass ratio)) of (A) and compound (B) is preferably 99/1 to 1/99, more preferably 98/2 to 2/98.
- the ratio of the medium (C) can be determined by separating the solid content of the mixture of the fluorine-containing copolymer (A) and the compound (B) from the fluorine-containing copolymer composition by reprecipitation or the like.
- the content of the fluorinated copolymer composition (100% by mass) is preferably 5 to 99.9% by mass, and more preferably 10 to 99% by mass.
- the ratio of the medium (C) is within this range, the medium (C) can be easily removed when the solid content is separated from the fluorine-containing copolymer composition.
- it is excellent in the handleability etc. as a coating composition and the obtained coating film can be made uniform.
- the proportion of the compound (D) is preferably from 0.1 to 20 parts by mass, preferably from 0.5 to 100 parts by mass with respect to 100 parts by mass of the compound (B) from the viewpoints of adhesion, scratch resistance, heat resistance and the like of the coating film. 10 parts by mass is more preferable.
- the proportion of the compound (E) is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the fluorine-containing copolymer (A) from the viewpoint of solubility or dispersibility of the fluorine-containing copolymer (A). 0.5 to 5 parts by mass is more preferable.
- the compound (B) is in a state of being dissolved or dispersed in the medium (C).
- the resulting solution is mixed with the fluorine-containing copolymer (A) and the compound (B), or A mixture of the fluorinated copolymer (A) and the compound (B) or the fine particles of the fluorinated copolymer (A) by cooling to a temperature not higher than the temperature at which only the fluorocopolymer (A) is precipitated (usually normal temperature). Is precipitated in the medium (C).
- the cooling method may be slow cooling or rapid cooling.
- Specific examples of the state of the obtained fluorine-containing copolymer composition near room temperature include the following states (I) to (V).
- the fluorine-containing copolymer composition of the present invention contains the compound (B) in addition to the fluorine-containing copolymer (A) and the medium (C), the compound (B) Curing can form a coating film and a molded product excellent in adhesion, scratch resistance, heat resistance and the like.
- the coating composition of the present invention contains various additives as necessary.
- the state of the coating composition of the present invention may be any of the above states (I) to (V).
- Content of the fluorine-containing copolymer (A) in the coating composition of this invention can be suitably changed according to the thickness of the target coating film.
- the proportion of the fluorinated copolymer (A) is preferably 0.05 to 50% by mass, and preferably 0.1 to 30% by mass in the coating composition (100% by mass). More preferred.
- the content is within this range, the handleability is good, the viscosity, the drying speed, the uniformity of the film, etc. are excellent, and a uniform coating film can be formed.
- the content of the compound (B) in the coating composition of the present invention is appropriately determined from the mixing ratio with the fluorinated copolymer (A) according to the use of the obtained fluorinated copolymer composition.
- the ratio of the compound (B) is preferably 0.01 to 89% by mass, more preferably 0.02 to 50% by mass in the coating composition (100% by mass).
- the handleability is good, the viscosity, the drying speed, the uniformity of the film, etc. are excellent, and a uniform coating film can be formed.
- additive examples include an antioxidant, a light stabilizer, an ultraviolet absorber, a lubricant, a thickener, a filler (filler), a reinforcing agent, a pigment, a dye, a flame retardant, and an antistatic agent.
- the total proportion of the additives is preferably 30% by mass or less, more preferably 25% by mass or less in the coating composition (100% by mass).
- the additive can be added in the process of mixing the fluorine-containing copolymer (A) and the compound (B) in the medium (C), it is abundant and uniform compared to the case of adding in the process of melt kneading. Can be added. Moreover, since the coating film obtained by using the coating composition containing the additive at a high concentration can exhibit a necessary function with a thinner film thickness, the fluorine-containing copolymer (A) and the compound (B) The ratio can be reduced.
- Optical field Protective coating agent, antifouling coating agent, low reflection coating agent for various optical films, etc.
- Solar cell field protective cover material, transparent conductive member, protective coating agent such as back sheet, gas barrier layer, thin glass support resin layer, adhesive layer, etc.
- Display panel / display field Protective coating agent, antifouling coating agent, low reflection coating agent for transparent members used in various display panels (liquid crystal display panel, plasma display panel, electrochromic display panel, electroluminescence display panel, touch panel); Thin glass support resin, etc.
- Transportation equipment field Protective coating agent, antifouling coating agent, low-reflective coating agent, etc.
- the coating composition of the present invention is used as an interlayer insulating film, protective film, etc. in semiconductor elements and integrated circuit devices, the low water absorption, low dielectric constant, high heat resistance, etc. possessed by the fluorinated copolymer (A) Thus, a semiconductor element and an integrated circuit device having a high response speed and few malfunctions can be obtained.
- the coating composition of the present invention can be used as a protective coating agent or antifouling coating agent for a condensing mirror used in concentrating solar power generation; If used, a highly durable power generation system that does not require maintenance can be obtained due to the properties of the fluorine-containing copolymer (A) such as high heat resistance and low water absorption.
- the coating composition of the present invention includes a fluorine-containing copolymer composition in which the fluorine-containing copolymer (A) and the compound (B) are uniformly mixed.
- a coating film having excellent properties, scratch resistance, heat resistance, and the like can be formed.
- the article having the coating film of the present invention has a coating film formed using the above-described coating composition on the surface of the substrate.
- the coating film may be used as a film by separating from the substrate.
- the coating film or film formed using the coating composition of the present invention is thinner and more uniform than the ETFE film obtained by melt molding. What is necessary is just to determine the thickness of a coating film or a film suitably according to a use. If a coating composition with a high solid content concentration is used, a thick coating film is obtained, and if a coating composition with a low solid content concentration is used, a thin coating film is obtained. Moreover, a thicker coating film can also be obtained by repeating application
- Base material include metals (iron, stainless steel, aluminum, titanium, copper, silver, etc.), glasses (soda lime glass, silicate glass, synthetic quartz, etc.), silicon, organic materials (polycarbonate, polyethylene terephthalate, polymethyl) Methacrylate, glass fiber reinforced plastic, polyvinyl chloride, etc.), stone, wood, ceramics, cloth, paper and the like.
- the shape of the substrate is not particularly limited.
- the base material may be pretreated for the purpose of improving the adhesion between the base material and the coating film.
- the pretreatment method include a method of applying a silane coupling agent, polyethyleneimine or the like to the substrate, a method of physically treating the surface with sandblasting, a method of treating with corona discharge, or the like.
- Examples of the method for forming a coating film include a method in which the coating composition of the present invention is applied to a substrate to form a wet film, and the medium (C) is removed from the wet film to form a coating film.
- Examples of the application method include gravure coating, dip coating, die coating, electrostatic coating, brush coating, screen printing, roll coating, spin coating and the like.
- the state of the coating composition of the present invention when applied to the substrate may be any of the states (I) to (V) described above. Even in the slurry state, each fine particle is in a state of being uniformly dispersed in the medium (C). Therefore, the coating composition in the slurry state is dissolved so that the fluorinated copolymer (A) is dissolved in the medium (C). It can apply
- the application temperature depends on the composition of the coating composition, but is preferably 0 to 210 ° C, more preferably 0 to 130 ° C, and further preferably 0 to 50 ° C.
- a coating temperature of 0 ° C. or higher is preferable because the dispersion state of the fluorine-containing copolymer (A) is good.
- the medium (C) does not volatilize rapidly, and thus generation of bubbles and the like can be suppressed.
- the removal temperature of the medium (C), that is, the drying temperature is preferably 0 ° C. or higher and lower than the melting point of the fluorinated copolymer (A), more preferably 0 to 200 ° C., and further preferably 0 to 150 ° C.
- a drying temperature of 0 ° C. or higher is preferable because it does not take too much time to remove the solvent.
- the drying temperature is lower than the melting point of the fluorinated copolymer (A), the occurrence of coloring, decomposition and the like can be suppressed.
- the firing (curing) temperature is preferably 0 ° C. or higher and lower than the melting point of the fluorinated copolymer (A), more preferably 20 to 260 ° C., and further preferably 30 to 210 ° C.
- a firing (curing) temperature of 0 ° C. or higher is preferable because it does not take too long to cure. If the firing (curing) temperature is lower than the melting point of the fluorine-containing copolymer (A), the occurrence of coloring, decomposition, etc. can be suppressed.
- Optical field optical fiber, lens, optical disk, various optical films, etc.
- Solar cell field condensing mirror, protective cover material made of glass or resin, transparent conductive member, etc.
- Display panel / display field Transparent members (glass substrates and resin substrates) used in various display panels, etc.
- Electrical / electronic field Various electrical / electronic components, semiconductor elements, hybrid ICs, printed circuit boards, IC cards, various sensors, photosensitive drums, film capacitors, electric wires / cables, antennas, motors, power generators, LED sealants, etc.
- Transportation equipment field various components such as trains, buses, trucks, automobiles, ships, aircraft, Architectural field: mirror, glass window, resin window, outer wall, roofing material, bridge, tunnel, etc.
- Medical field syringe, pipette, thermometer, etc.
- Chemical field Beakers, petri dishes, graduated cylinders, etc.
- Separation membrane field reverse osmosis membrane, nanofiltration membrane, gas separation membrane, etc.
- the article having the coating film of the present invention has a coating film formed by using the coating composition described above, the coating film to be formed adheres while maintaining the characteristics of the fluorinated copolymer. Excellent in resistance, scratch resistance, heat resistance and the like. Further, by using the coating composition of the present invention, it is not necessary to perform application and drying at a high temperature, so that the base material can be decomposed or decomposed even for materials having low heat resistance such as plastic, paper, and cloth. A coating film can be formed without causing deformation.
- the molded article of the present invention is formed by molding the above-mentioned fluorine-containing copolymer composition.
- the molded article is usually produced by molding a solid content composed of a mixture of the fluorine-containing copolymer (A) and the compound (B) separated from the fluorine-containing copolymer composition.
- Examples of the solid content separation method include a method of filtering the slurry-containing fluorine-containing copolymer composition.
- As the filtration method a known method may be mentioned.
- a solvent having a low affinity for the fluorine-containing copolymer (A) and the compound (B) (hereinafter, It is preferable to complete precipitation by adding a poor solvent).
- the poor solvent include hexane and methanol.
- the separated solid content is preferably dried to remove the medium (C) and the poor solvent.
- the drying means include a vacuum drying oven.
- the molding method a known method may be mentioned.
- As a use of a molded article the same use as an article having a coating film can be given.
- the molded article of the present invention is obtained using the above-mentioned fluorine-containing copolymer composition, it is excellent in scratch resistance, heat resistance and the like while maintaining the properties of the fluorine-containing copolymer.
- the surface hardness was measured according to a pencil scratch test (JIS K5600).
- the thermal decomposition temperature was measured using a differential thermal analyzer (TG-DTA2000SA, manufactured by Bruker AXS). The temperature range of the measurement was room temperature to 600 ° C., about 10 mg of a sample was put in a platinum pan, and the measurement was performed at a temperature increase rate of 10 ° C./min in an air stream with a mixed air flow rate of 100 mL / min. The heat resistance was evaluated at a 10% mass reduction temperature observed by differential thermal analysis.
- the adhesion test was measured according to JIS K5600. In other words, the coating film on the substrate is cut with 11 vertical and horizontal cuts at 2 mm intervals using a cutter knife, a 100 square grid is made, and a cellophane adhesive tape is strongly pressure-bonded on the grid, and the tape The film was peeled off instantaneously, and the coating film remaining on the substrate without being peeled was observed. Evaluation was made based on the state of peeling of the coating film after five peeling tests. The case where 91 squares or more remained was marked as ⁇ (excellent), the case where 90 to 51 squares remained was marked as ⁇ (good), and the case where 50 to 0 squares remained was marked as x (bad).
- the press film was produced using a heating press (Tester Sangyo Co., Ltd., SA-301).
- thickness About the coating film obtained by potting, thickness was measured with the stylus type surface shape measuring device (the product made by Sloan, DEKTAK 3ST). About the thickness of the press film shape
- Compound (B) Compound (B1-1): 3,4-epoxycyclohexylmethyl 3 ′, 4′-epoxycyclohexanecarboxylate (manufactured by Wako Chemical Co., catalog number: 326-64072).
- Compound (B1-2) 1,4-butanediol diglycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B0964).
- Compound (B1-3) Neopentyl glycol diglycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: N0448).
- Compound (B1-4) Trimethylolpropane triglycidyl ether (manufactured by Aldrich, catalog number: 430269).
- Compound (B1-5) diglycidyl 1,2-cyclohexanedicarboxylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: C1434).
- Compound (B1-6) Hydrogenated bisphenol A glycidyl ether (manufactured by Shin Nippon Chemical Co., Ltd., Jamaica Resin HBE-100).
- Compound (B1-8) Bisphenol A-epichlorohydrin copolymer (glycidylated product) (manufactured by Aldrich, catalog number: 406721).
- Compound (B1-9) Phenyl glycidyl ether-formaldehyde copolymer (phenol novolac epoxy resin, manufactured by Aldrich, catalog number: 406775).
- Compound (B1-10) o-cresyl glycidyl ether-formaldehyde copolymer (cresol novolac epoxy resin, manufactured by Aldrich, catalog number: 405515).
- Compound (B1-11) 1,3-bis (N, N-diglycidylaminomethyl) cyclohexane (manufactured by Mitsubishi Gas Chemical Company, product name: Tetrad-C).
- Compound (B3-1) glycidyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0590).
- Compound (B3-2) allyl glycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: A0221).
- Compound (B2-2) Tricyclodecane dimethanol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., product name: A-DCP).
- Compound (B2-3) Neopentyl glycol diacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: N0790).
- Compound (B2-4) 1,6-bis (acryloyloxy) -2,2,3,3,4,4,5,5-octafluorohexane (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B2340).
- Compound (B2-5) Bisallyl nadiimide resin (manufactured by Maruzen Petrochemical Co., Ltd., product name: BANI-M).
- Compound (B2-6) Bisallyl nadiimide resin (manufactured by Maruzen Petrochemical Co., Ltd., product name: BANI-X).
- Compound (D) Compound (D1-1): 1,2-cyclohexanedicarboxylic anhydride (manufactured by Aldrich, catalog number: 123463).
- Compound (D1-5) 1,8-diamino-p-menthane (manufactured by Aldrich, catalog number: D19605).
- Compound (D2-1) 2-ethyl-4-methylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: E0232).
- Compound (D2-2) Tetrabutylphosphonium-O, O-diethyl phosphorodithioate (manufactured by Wako Chemical Co., catalog number: 328-33902).
- Compound (D2-4) 1-hydroxycyclohexyl phenyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0617).
- Compound (D2-5) 2,2-dimethoxy-1,2-diphenylethane 1-one (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D1702)
- Compound (E) Compound (E1-1): tetradecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: T0090).
- Compound (E1-2) N-methyloctadecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0912).
- Compound (E1-3) 2-undecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: U0012).
- Compound (E1-4) 2-heptadecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0021).
- F Olether resin
- Example 1 In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 7.0 mg of the compound (E1-1), and 15.36 g of the medium (C-1) are placed, and the mixture is stirred while being sealed under 30 ml. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment.
- Example 2 to 13 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 1 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
- Example 14 A coating film was formed on the surface in the same manner as in Example 1 except that the compound (D2-1) was not added and the composition of the other components was changed to the composition shown in Table 9 and the curing condition was changed to 200 ° C for 360 minutes. A glass substrate was obtained. Table 10 shows the evaluation results.
- Example 15 to 22 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 14 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
- Example 23 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 1 except that the compound (D1-1) was not added and the composition of the other components was changed to the composition shown in Table 9. Table 10 shows the evaluation results.
- Example 24 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 23 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
- Example 25 In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.9 mg of the compound (E1-3), and 15.36 g of the medium (C-1) are placed. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment.
- Example 26 to 30 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 25 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
- Example 31 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 25 except that the compound (D1-1) was not added. Table 10 shows the evaluation results.
- Example 32 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 31 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
- Example 33 In a 30 mL reaction vessel, 320 mg of the fluorinated copolymer (A-1), 160 mg of a 10% by mass medium (C-2) solution of the compound (B1-1), and 4.0 mg of the compound (E1-1) And 15.39 g of the medium (C-2) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. In the dispersion, 130 mg of a 10% by mass medium (C-2) solution of the compound (D1-1) and 160 mg of a 0.5% by mass medium (C-2) solution of the compound (D2-1) were added.
- the mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment.
- the dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
- Example 34 to 38 A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 33 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
- Example 39 A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 1 except that the compound (B) and the compound (D) were not used and the curing conditions shown in Table 10 were changed. Table 10 shows the evaluation results.
- Example 40 A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 39 except that the fluorinated copolymer (A-2) was used instead of the fluorinated copolymer (A-1). Table 10 shows the evaluation results.
- Example 41 In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.5 mg of the compound (E1-1), and 15.36 g of the medium (C-1) were placed, and the mixture was stirred while being sealed under 30 ml. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1) and 320 mg of a 0.5% by mass medium (C-1) solution of compound (D2-3) were added.
- the mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment.
- the dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Then, it dried for 30 minutes at 90 degreeC using the hotplate, and also the ultraviolet-ray (wavelength of 254 nm) with an illumination intensity of 10 mW / cm ⁇ 2 > was irradiated for 20 minutes at 100 degreeC, and the coating film was formed on the surface.
- a glass substrate was obtained.
- the evaluation results are shown in Table 12.
- Example 42 to 45 A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 41 except that the mixing, drying, and curing conditions shown in Tables 11 and 12 were changed. The evaluation results are shown in Table 12.
- Example 46 In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 120 mg of a 10% by mass medium (C-1) solution of the compound (B3-1), and 8.5 mg of the compound (E1-1) And 15.25 g of medium (C-1) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B2-1) and 320 mg of a 0.5% by mass medium (C-1) solution of compound (D2-4) were added.
- the mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment.
- the dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Thereafter, while heating to 100 ° C. using a hot plate, ultraviolet rays having an illuminance of 10 mW / cm 2 were irradiated for 30 minutes to cure the coating film, thereby obtaining a glass substrate on which the coating film was formed.
- the evaluation results are shown in Table 12.
- Example 47 A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 46 except that the formulation, drying, and curing conditions shown in Table 11 and Table 12 were changed. The evaluation results are shown in Table 12.
- Example 60 In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 120 mg of a 10 mass% medium (C-1) solution of the compound (B3-1), and 8. 8 of the compound (E1-1) are added. 5 mg and 15.25 g of the medium (C-1) were added, and the mixture was heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment.
- Example 61 to 62 Except having changed into the mixing
- Example 63 In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.9 mg of the compound (E1-3), and 15.36 g of the medium (C-1) are placed. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment.
- Example 39 the dispersion obtained in Example 39 as a comparative sample was coated on a silicon substrate by bar coating at room temperature, dried at 90 ° C. for 2 hours, and further heated at the temperature shown in Table 13 for 1 hour to obtain a silicon substrate. A coating was formed on top.
- the adhesion of the obtained coating film was evaluated before and after a heat and humidity resistance (PCT) test (121 ° C., 100% RH, 48 hours). The evaluation results are shown in Table 15.
- PCT heat and humidity resistance
- Example 64 The dispersion obtained in Example 41 was applied to a glass substrate by bar coating at room temperature, dried at 90 ° C. for 30 minutes, and irradiated with ultraviolet rays having an illuminance of 10 mW / cm 2 at 100 ° C. for 30 minutes to cure the coating film. And a glass substrate having a coating film formed on the surface was obtained. Similarly, a glass substrate having a coating film formed on the surface thereof was obtained using the dispersion obtained in Example 54. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a glass substrate by bar coating at room temperature, dried at 90 ° C. for 30 minutes, and further heated at 100 ° C. for 30 minutes, so that the coating film was applied to the surface. A formed glass substrate was obtained. The adhesion of the obtained coating film was evaluated. The evaluation results are shown in Table 16.
- the adhesion to the silicon substrate and the glass substrate could be improved by coating the fluorine-containing copolymer composition of the present invention.
- Example 65 The dispersion obtained in Example 20 was applied on an aluminum substrate (thickness: 200 ⁇ m) by dip coating at room temperature, dried at 90 ° C. for 2 hours, and further cured at 150 ° C. for 1 hour to be applied onto the aluminum substrate. A film was formed. Moreover, the dispersion liquid obtained in Example 39 as a comparative sample was applied on an aluminum substrate (thickness: 200 ⁇ m) by dip coating at room temperature, dried at 90 ° C. for 2 hours, and further heated at 150 ° C. for 1 hour, A coating film was formed on an aluminum substrate. The aluminum substrate on which the coating film was formed was immersed in 1N hydrochloric acid, and the change was observed. The evaluation results are shown in Table 17.
- the chemical resistance of the aluminum substrate could be remarkably improved by coating the fluorine-containing copolymer composition of the present invention.
- Example 66 In a 30 mL reaction vessel, 320 mg of the fluorinated copolymer (A-1), 28 mg of a 10% by weight medium (C-1) solution of the compound (B3-1), and 4.3 mg of the compound (E1-1) And 15.68 g of the medium (C-1) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of 10% by mass medium (C-1) solution of compound (B2-1) and 38 mg of 0.5% by mass medium (C-1) solution of compound (D2-5) were added.
- the mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment.
- the dispersion was applied to a polyethylene terephthalate (hereinafter referred to as PET) film (Toyobo Co., Ltd., Cosmo Shine A4300, thickness 100 ⁇ m) by bar coating at room temperature, dried at room temperature for 20 minutes, and further at 90 ° C.
- An ultraviolet ray having an illuminance of 10 mW / cm 2 was irradiated for 30 minutes to be cured to form a coating film on the PET film.
- Example 39 the dispersion obtained in Example 39 as a comparative sample was coated on a PET film by bar coating at room temperature, dried at room temperature for 20 minutes, and heated at 90 ° C. for 30 minutes to form a coating film on the PET film. Formed.
- the adhesion of the obtained coating film was evaluated before and after a chemical resistance test (room temperature, immersed in 1N hydrochloric acid for 1 hour). The evaluation results are shown in Table 18.
- the fluorine-containing copolymer composition of the present invention can be coated even on a substrate that does not have sufficient heat resistance such as a PET film. And adhesion could be remarkably improved.
- Example 68 Using only the fluorinated copolymer (A-2), the fluorinated copolymer was subjected to hot press molding under the conditions of temperature: 200 ° C., pressure: 10 Ma, time: 5 minutes using a heat press machine. A press film was prepared. The evaluation results are shown in Table 19.
- the fluorine-containing copolymer composition of the present invention was able to improve the surface hardness and heat resistance without affecting the mechanical properties of the molded product.
- the coating composition of the present invention includes a fluorine-containing copolymer (ETFE) having a repeating unit based on ethylene and a repeating unit based on TFE, and has good adhesion, scratch resistance, heat resistance, etc. even when baked at a low temperature. Can be easily formed, and is suitable for surface treatments that require heat resistance, flame resistance, chemical resistance, weather resistance, low friction, low dielectric properties, transparency, etc. It is industrially useful. It should be noted that the entire contents of the specification, claims, and abstract of Japanese Patent Application No. 2011-178195 filed on August 17, 2011 are incorporated herein as the disclosure of the specification of the present invention. Is.
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Abstract
Provided are: a fluorocopolymer capable of being formed into an article and film having excellent adhesion, excoriation resistance, heat resistance, and other properties even after being baked at a relatively low temperature; a coating composition containing the fluorocopolymer; an article having a film with excellent adhesion, excoriation resistance, heat resistance, and other properties while retaining the characteristics of a fluorocopolymer; and a molded article. Used is a fluorocopolymer composition comprising: a fluorocopolymer (A) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene; a compound (B) having at least one reactive functional group selected from the group consisting of a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity (where the fluorocopolymer (A) is not included); and a medium (C) in which the fluorocopolymer (A) can be dissolved or dispersed, and in which the compound (B) can be dissolved or dispersed.
Description
本発明は、含フッ素共重合体組成物、該含フッ素共重合体組成物を含むコーティング用組成物、該コーティング用組成物を用いて形成された塗膜を有する物品、及び含フッ素共重合体組成物を成形してなる成形品に関する。
The present invention relates to a fluorine-containing copolymer composition, a coating composition containing the fluorine-containing copolymer composition, an article having a coating film formed using the coating composition, and a fluorine-containing copolymer. The present invention relates to a molded product obtained by molding a composition.
フッ素樹脂は、耐溶剤性、低誘電性、低表面エネルギー性、非粘着性、耐候性等に優れていることから、汎用のプラスチックスでは対応できない種々の用途に用いられている。フッ素樹脂のうち、エチレンに基づく繰り返し単位とテトラフルオロエチレンに基づく繰り返し単位を有する含フッ素共重合体(以下、ETFEともいう。)は、耐熱性、難燃性、耐薬品性、耐候性、低摩擦性、低誘電特性、透明性等に優れることから、耐熱電線用被覆材料、ケミカルプラント用耐食配管材料、農業用ビニルハウス用材料、金型用離型フィルム等の幅広い分野に用いられている。
Fluoropolymers are used in various applications that cannot be handled by general-purpose plastics because they are excellent in solvent resistance, low dielectric properties, low surface energy, non-adhesiveness, weather resistance, and the like. Among fluororesins, a fluorine-containing copolymer (hereinafter also referred to as ETFE) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene is low in heat resistance, flame resistance, chemical resistance, weather resistance, Because of its excellent frictional properties, low dielectric properties, transparency, etc., it is used in a wide range of fields such as heat-resistant wire coating materials, chemical plant corrosion-resistant piping materials, agricultural vinyl house materials, and mold release films. .
ところで、ETFEは、有機溶媒に不溶であるため、ETFEを含むコーティング用組成物は調製できないとされてきた。しかし、最近になって、ETFEが特定の有機溶媒(含フッ素芳香族化合物又はカルボニル基を有する鎖状の炭化水素化合物)にETFEの融点以下の加熱下で溶解すること、また、ETFEが含フッ素芳香族化合物に溶解したETFE溶液を冷却すると、ETFE分散液が得られることが明らかとなった(特許文献1、及び2参照)。
Incidentally, since ETFE is insoluble in organic solvents, it has been considered that a coating composition containing ETFE cannot be prepared. However, recently, ETFE can be dissolved in a specific organic solvent (a fluorine-containing aromatic compound or a chain hydrocarbon compound having a carbonyl group) under heating below the melting point of ETFE. It has been clarified that an ETFE dispersion can be obtained by cooling the ETFE solution dissolved in the aromatic compound (see Patent Documents 1 and 2).
しかし、ETFE分散液を基材の表面に塗布し、乾燥して形成された塗膜は、空隙が多く、緻密性が不充分であるため、密着性、耐擦傷性等が不充分であり、基材を充分に保護することができない。該塗膜をETFEの融点以上で焼成すれば、緻密な塗膜が得られるものの、高温にさらされることによってETFEの特性が劣化しやすい。また、基材が充分な耐熱性を有していない場合には、融点以上の温度での焼成は適用できない。
However, since the coating film formed by applying the ETFE dispersion on the surface of the substrate and drying it has many voids and insufficient denseness, adhesion, scratch resistance, etc. are insufficient, The substrate cannot be sufficiently protected. If the coating film is baked at a melting point of ETFE or higher, a dense coating film can be obtained, but the characteristics of ETFE are likely to deteriorate due to exposure to high temperatures. Further, when the substrate does not have sufficient heat resistance, firing at a temperature equal to or higher than the melting point cannot be applied.
本発明は、比較的低温で焼成しても、密着性、耐擦傷性、基材の保護性能、耐熱性等に優れる塗膜及び成形品を形成できる含フッ素共重合体;比較的低温で焼成しても、密着性、耐擦傷性、基材の保護性能、耐熱性等に優れる塗膜及び成形品を形成できるコーティング用組成物;含フッ素共重合体の特性を維持しつつ、密着性、耐擦傷性、基材の保護性能、耐熱性等に優れる塗膜を有する物品;及び、含フッ素共重合体の特性を維持しつつ、耐擦傷性、耐熱性等に優れる成形品を提供することを目的とする。
The present invention is a fluorine-containing copolymer capable of forming a coating film and a molded article excellent in adhesion, scratch resistance, base material protection performance, heat resistance, etc. even when fired at a relatively low temperature; fired at a relatively low temperature However, the coating composition capable of forming a coating film and a molded article excellent in adhesion, scratch resistance, substrate protective performance, heat resistance, etc .; while maintaining the properties of the fluorinated copolymer, To provide an article having a coating film excellent in scratch resistance, substrate protective performance, heat resistance, etc .; and a molded article excellent in scratch resistance, heat resistance, etc. while maintaining the properties of the fluorinated copolymer. With the goal.
本発明の含フッ素共重合体組成物は、エチレンに基づく繰り返し単位とテトラフルオロエチレンに基づく繰り返し単位を有する含フッ素共重合体(A)と、開環反応性を有する環状エーテルを有する基及び付加反応性を有する炭素-炭素二重結合を有する基からなる群から選ばれる少なくとも1種の反応性官能基を有する化合物(B)(ただし、前記含フッ素共重合体(A)を除く。)と、前記含フッ素共重合体(A)を溶解又は分散し得て、かつ前記化合物(B)を溶解又は分散し得る媒体(C)とを含むことを特徴とする。
前記含フッ素共重合体(A)と前記化合物(B)の混合割合は、質量比で98/2~2/98が好ましく、前記媒体(C)の含有割合は、含フッ素共重合体組成物(100質量%)に対して10~99質量%が好ましい。
また、前記含フッ素共重合体(A)の融点は、150~260℃の範囲であることが好ましい。
さらに、前記媒体(C)の融点は25℃以下の範囲であり、沸点は常圧で230℃以下の範囲であることが好ましい。 The fluorine-containing copolymer composition of the present invention comprises a fluorine-containing copolymer (A) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene, a group having a cyclic ether having ring-opening reactivity, and an addition A compound (B) having at least one reactive functional group selected from the group consisting of a group having a reactive carbon-carbon double bond (excluding the fluorine-containing copolymer (A)); And a medium (C) capable of dissolving or dispersing the fluorine-containing copolymer (A) and capable of dissolving or dispersing the compound (B).
The mixing ratio of the fluorinated copolymer (A) and the compound (B) is preferably 98/2 to 2/98 by mass ratio, and the content ratio of the medium (C) is fluorinated copolymer composition. 10 to 99% by mass is preferable with respect to (100% by mass).
The melting point of the fluorine-containing copolymer (A) is preferably in the range of 150 to 260 ° C.
Furthermore, the melting point of the medium (C) is preferably in the range of 25 ° C. or lower, and the boiling point is preferably in the range of 230 ° C. or lower at normal pressure.
前記含フッ素共重合体(A)と前記化合物(B)の混合割合は、質量比で98/2~2/98が好ましく、前記媒体(C)の含有割合は、含フッ素共重合体組成物(100質量%)に対して10~99質量%が好ましい。
また、前記含フッ素共重合体(A)の融点は、150~260℃の範囲であることが好ましい。
さらに、前記媒体(C)の融点は25℃以下の範囲であり、沸点は常圧で230℃以下の範囲であることが好ましい。 The fluorine-containing copolymer composition of the present invention comprises a fluorine-containing copolymer (A) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene, a group having a cyclic ether having ring-opening reactivity, and an addition A compound (B) having at least one reactive functional group selected from the group consisting of a group having a reactive carbon-carbon double bond (excluding the fluorine-containing copolymer (A)); And a medium (C) capable of dissolving or dispersing the fluorine-containing copolymer (A) and capable of dissolving or dispersing the compound (B).
The mixing ratio of the fluorinated copolymer (A) and the compound (B) is preferably 98/2 to 2/98 by mass ratio, and the content ratio of the medium (C) is fluorinated copolymer composition. 10 to 99% by mass is preferable with respect to (100% by mass).
The melting point of the fluorine-containing copolymer (A) is preferably in the range of 150 to 260 ° C.
Furthermore, the melting point of the medium (C) is preferably in the range of 25 ° C. or lower, and the boiling point is preferably in the range of 230 ° C. or lower at normal pressure.
本発明の含フッ素共重合体組成物は、前記化合物(B)の反応性官能基と反応し得る反応性官能基を有する化合物(D1)及び前記化合物(B)の反応性官能基の反応を促進し得る化合物(D2)からなる群から選ばれる少なくとも1種の化合物(D)(ただし、下記化合物(E)を除く。)をさらに含むことが好ましい。
The fluorine-containing copolymer composition of the present invention comprises a reaction of the compound (D1) having a reactive functional group capable of reacting with the reactive functional group of the compound (B) and the reactive functional group of the compound (B). It is preferable to further include at least one compound (D) selected from the group consisting of the compound (D2) that can be promoted (however, excluding the following compound (E)).
本発明の含フッ素共重合体組成物は、前記含フッ素共重合体(A)又は前記化合物(B)の媒体(C)への溶解又は分散を促進し得る化合物(E)をさらに含むことが好ましい。
前記化合物(E)は、1級アミノ基、2級アミノ基及び窒素-水素結合を有する含窒素複素環基からなる群から選ばれる少なくとも1種の基と炭素数1~20のアルキル基とを有する化合物(E1)であることが好ましい。 The fluorine-containing copolymer composition of the present invention may further contain a compound (E) that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C). preferable.
The compound (E) comprises at least one group selected from the group consisting of a primary amino group, a secondary amino group, and a nitrogen-containing heterocyclic group having a nitrogen-hydrogen bond, and an alkyl group having 1 to 20 carbon atoms. It is preferable that it is a compound (E1) which has.
前記化合物(E)は、1級アミノ基、2級アミノ基及び窒素-水素結合を有する含窒素複素環基からなる群から選ばれる少なくとも1種の基と炭素数1~20のアルキル基とを有する化合物(E1)であることが好ましい。 The fluorine-containing copolymer composition of the present invention may further contain a compound (E) that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C). preferable.
The compound (E) comprises at least one group selected from the group consisting of a primary amino group, a secondary amino group, and a nitrogen-containing heterocyclic group having a nitrogen-hydrogen bond, and an alkyl group having 1 to 20 carbon atoms. It is preferable that it is a compound (E1) which has.
前記媒体(C)は、下式(1)で表わされる溶解指標(R)が49未満である溶媒であることが好ましい。
R=4×(δd-15.7)2+(δp-5.7)2+(δh-4.3)2 ・・・(1)。
ただし、δd、δp及びδhは、それぞれ、溶媒のハンセン溶解度パラメータにおける分散項、極性項及び水素結合項[(MPa)1/2]である。 The medium (C) is preferably a solvent having a solubility index (R) represented by the following formula (1) of less than 49.
R = 4 × (δd−15.7) 2 + (δp−5.7) 2 + (δh−4.3) 2 (1).
However, δd, δp, and δh are a dispersion term, a polar term, and a hydrogen bond term [(MPa) 1/2 ] in the Hansen solubility parameter of the solvent, respectively.
R=4×(δd-15.7)2+(δp-5.7)2+(δh-4.3)2 ・・・(1)。
ただし、δd、δp及びδhは、それぞれ、溶媒のハンセン溶解度パラメータにおける分散項、極性項及び水素結合項[(MPa)1/2]である。 The medium (C) is preferably a solvent having a solubility index (R) represented by the following formula (1) of less than 49.
R = 4 × (δd−15.7) 2 + (δp−5.7) 2 + (δh−4.3) 2 (1).
However, δd, δp, and δh are a dispersion term, a polar term, and a hydrogen bond term [(MPa) 1/2 ] in the Hansen solubility parameter of the solvent, respectively.
本発明のコーティング用組成物は、本発明の含フッ素共重合体組成物を含むことを特徴とする。
本発明の塗膜を有する物品は、本発明のコーティング用組成物を用いて形成された塗膜を有する。
本発明の成形品は、本発明の含フッ素共重合体組成物を成形してなるものである。 The coating composition of the present invention includes the fluorine-containing copolymer composition of the present invention.
The article having the coating film of the present invention has a coating film formed using the coating composition of the present invention.
The molded article of the present invention is formed by molding the fluorine-containing copolymer composition of the present invention.
本発明の塗膜を有する物品は、本発明のコーティング用組成物を用いて形成された塗膜を有する。
本発明の成形品は、本発明の含フッ素共重合体組成物を成形してなるものである。 The coating composition of the present invention includes the fluorine-containing copolymer composition of the present invention.
The article having the coating film of the present invention has a coating film formed using the coating composition of the present invention.
The molded article of the present invention is formed by molding the fluorine-containing copolymer composition of the present invention.
本発明の含フッ素共重合体組成物によれば、比較的低温で焼成しても、密着性、耐擦傷性、耐熱性等に優れる塗膜及び成形品を形成できる。
本発明のコーティング用組成物によれば、比較的低温で焼成しても、密着性、耐擦傷性、耐熱性等に優れる塗膜を形成できる。
本発明の塗膜を有する物品は、含フッ素共重合体の特性を維持しつつ、密着性、耐擦傷性、耐熱性等に優れる塗膜を有する。
本発明の成形品は、含フッ素共重合体の特性を維持しつつ、耐擦傷性、耐熱性等に優れる。 According to the fluorine-containing copolymer composition of the present invention, a coating film and a molded article excellent in adhesion, scratch resistance, heat resistance and the like can be formed even when fired at a relatively low temperature.
According to the coating composition of the present invention, a coating film having excellent adhesion, scratch resistance, heat resistance and the like can be formed even when fired at a relatively low temperature.
The article having the coating film of the present invention has a coating film excellent in adhesion, scratch resistance, heat resistance and the like while maintaining the characteristics of the fluorinated copolymer.
The molded article of the present invention is excellent in scratch resistance, heat resistance and the like while maintaining the characteristics of the fluorine-containing copolymer.
本発明のコーティング用組成物によれば、比較的低温で焼成しても、密着性、耐擦傷性、耐熱性等に優れる塗膜を形成できる。
本発明の塗膜を有する物品は、含フッ素共重合体の特性を維持しつつ、密着性、耐擦傷性、耐熱性等に優れる塗膜を有する。
本発明の成形品は、含フッ素共重合体の特性を維持しつつ、耐擦傷性、耐熱性等に優れる。 According to the fluorine-containing copolymer composition of the present invention, a coating film and a molded article excellent in adhesion, scratch resistance, heat resistance and the like can be formed even when fired at a relatively low temperature.
According to the coating composition of the present invention, a coating film having excellent adhesion, scratch resistance, heat resistance and the like can be formed even when fired at a relatively low temperature.
The article having the coating film of the present invention has a coating film excellent in adhesion, scratch resistance, heat resistance and the like while maintaining the characteristics of the fluorinated copolymer.
The molded article of the present invention is excellent in scratch resistance, heat resistance and the like while maintaining the characteristics of the fluorine-containing copolymer.
本明細書における「繰り返し単位」とは、単量体が重合することによって形成された該単量体に由来する単位を意味する。繰り返し単位は、重合反応によって直接形成された単位であってもよく、重合体を処理することによって該単位の一部が別の構造に変換された単位であってもよい。
また、本明細書における「単量体」とは、重合反応性の炭素-炭素二重結合を有する化合物を意味する。 The “repeating unit” in the present specification means a unit derived from the monomer formed by polymerization of the monomer. The repeating unit may be a unit directly formed by a polymerization reaction, or may be a unit in which a part of the unit is converted into another structure by treating the polymer.
Further, the “monomer” in the present specification means a compound having a polymerization-reactive carbon-carbon double bond.
また、本明細書における「単量体」とは、重合反応性の炭素-炭素二重結合を有する化合物を意味する。 The “repeating unit” in the present specification means a unit derived from the monomer formed by polymerization of the monomer. The repeating unit may be a unit directly formed by a polymerization reaction, or may be a unit in which a part of the unit is converted into another structure by treating the polymer.
Further, the “monomer” in the present specification means a compound having a polymerization-reactive carbon-carbon double bond.
また、本明細書において含フッ素共重合体(A)及び/又は化合物(B)が媒体(C)に溶解した「溶液状態」とは、含フッ素共重合体(A)及び/又は化合物(B)と媒体(C)との混合物を充分に混合した後の目視の判定で、不溶物が確認されない均一な状態であることを意味する。
Further, in this specification, the “solution state” in which the fluorine-containing copolymer (A) and / or the compound (B) is dissolved in the medium (C) means the fluorine-containing copolymer (A) and / or the compound (B ) And the medium (C) sufficiently mixed to mean that the insoluble matter is not confirmed by visual inspection.
また、本明細書における「溶解温度」とは、下記の方法で測定した温度をいう。
媒体(C)の4.90gに含フッ素共重合体(A)及び/又は化合物(B)の合計0.10gを加え、撹拌手段等で常に充分な混合状態を保ちつつ加熱し、含フッ素共重合体(A)及び/又は化合物(B)が溶解したかどうかを目視で観察する。まず、混合物が均一な溶液状態となって完全に溶解したと認められる温度を確認する。ついで、徐々に冷却して溶液が濁る温度を確認し、さらに再加熱して再び均一な溶液状態となる温度を溶解温度とする。 In addition, “melting temperature” in this specification refers to a temperature measured by the following method.
A total of 0.10 g of the fluorinated copolymer (A) and / or the compound (B) is added to 4.90 g of the medium (C), and the mixture is heated with a stirring means or the like while always maintaining a sufficiently mixed state. Whether the polymer (A) and / or the compound (B) is dissolved is visually observed. First, the temperature at which the mixture is found to be in a uniform solution state and completely dissolved is confirmed. Subsequently, the temperature at which the solution becomes turbid is confirmed by gradually cooling, and the temperature at which the solution is reheated and becomes a uniform solution again is defined as the dissolution temperature.
媒体(C)の4.90gに含フッ素共重合体(A)及び/又は化合物(B)の合計0.10gを加え、撹拌手段等で常に充分な混合状態を保ちつつ加熱し、含フッ素共重合体(A)及び/又は化合物(B)が溶解したかどうかを目視で観察する。まず、混合物が均一な溶液状態となって完全に溶解したと認められる温度を確認する。ついで、徐々に冷却して溶液が濁る温度を確認し、さらに再加熱して再び均一な溶液状態となる温度を溶解温度とする。 In addition, “melting temperature” in this specification refers to a temperature measured by the following method.
A total of 0.10 g of the fluorinated copolymer (A) and / or the compound (B) is added to 4.90 g of the medium (C), and the mixture is heated with a stirring means or the like while always maintaining a sufficiently mixed state. Whether the polymer (A) and / or the compound (B) is dissolved is visually observed. First, the temperature at which the mixture is found to be in a uniform solution state and completely dissolved is confirmed. Subsequently, the temperature at which the solution becomes turbid is confirmed by gradually cooling, and the temperature at which the solution is reheated and becomes a uniform solution again is defined as the dissolution temperature.
<含フッ素共重合体組成物>
本発明の含フッ素共重合体組成物は、含フッ素共重合体(A)と、化合物(B)と、媒体(C)とを含む溶液状態又は分散液状態のものである。本発明の含フッ素共重合体組成物は、必要に応じて化合物(D)、化合物(E)、他の樹脂(F)等を含んでいてもよい。 <Fluorine-containing copolymer composition>
The fluorine-containing copolymer composition of the present invention is in a solution state or a dispersion state containing the fluorine-containing copolymer (A), the compound (B), and the medium (C). The fluorine-containing copolymer composition of the present invention may contain a compound (D), a compound (E), another resin (F) or the like as necessary.
本発明の含フッ素共重合体組成物は、含フッ素共重合体(A)と、化合物(B)と、媒体(C)とを含む溶液状態又は分散液状態のものである。本発明の含フッ素共重合体組成物は、必要に応じて化合物(D)、化合物(E)、他の樹脂(F)等を含んでいてもよい。 <Fluorine-containing copolymer composition>
The fluorine-containing copolymer composition of the present invention is in a solution state or a dispersion state containing the fluorine-containing copolymer (A), the compound (B), and the medium (C). The fluorine-containing copolymer composition of the present invention may contain a compound (D), a compound (E), another resin (F) or the like as necessary.
(含フッ素共重合体(A))
含フッ素共重合体(A)は、エチレンに基づく繰り返し単位とテトラフルオロエチレン(以下、TFEという。)に基づく繰り返し単位を有する共重合体である。 (Fluorine-containing copolymer (A))
The fluorine-containing copolymer (A) is a copolymer having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene (hereinafter referred to as TFE).
含フッ素共重合体(A)は、エチレンに基づく繰り返し単位とテトラフルオロエチレン(以下、TFEという。)に基づく繰り返し単位を有する共重合体である。 (Fluorine-containing copolymer (A))
The fluorine-containing copolymer (A) is a copolymer having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene (hereinafter referred to as TFE).
TFEに基づく繰返し単位とエチレンに基づく繰返し単位とのモル比(TFE/エチレン)は、70/30~30/70が好ましく、65/35~40/60がより好ましく、60/40~40/60がさらに好ましい。該モル比が該範囲内であれば、耐熱性、耐候性、耐薬品性等のTFEに基づく繰返し単位に由来する特性と、機械的強度、溶融成形性等のエチレンに基づく繰返し単位に由来する特性とのバランスが良好となる。
The molar ratio of the repeating unit based on TFE and the repeating unit based on ethylene (TFE / ethylene) is preferably 70/30 to 30/70, more preferably 65/35 to 40/60, and 60/40 to 40/60. Is more preferable. If the molar ratio is within the above range, it is derived from repeating units based on TFE such as heat resistance, weather resistance, chemical resistance and the like, and repeating units based on ethylene such as mechanical strength and melt moldability. Good balance with characteristics.
含フッ素共重合体(A)は、得られる共重合体に各種機能を付与できる点から、エチレン及びTFE以外の単量体(以下、他の単量体という。)に基づく繰り返し単位を有することが好ましい。
他の単量体としては、下記の化合物等が挙げられる。 The fluorine-containing copolymer (A) has repeating units based on monomers other than ethylene and TFE (hereinafter referred to as other monomers) from the viewpoint that various functions can be imparted to the obtained copolymer. Is preferred.
Examples of other monomers include the following compounds.
他の単量体としては、下記の化合物等が挙げられる。 The fluorine-containing copolymer (A) has repeating units based on monomers other than ethylene and TFE (hereinafter referred to as other monomers) from the viewpoint that various functions can be imparted to the obtained copolymer. Is preferred.
Examples of other monomers include the following compounds.
フルオロエチレン類:CF2=CFCl、CF2=CH2等(ただし、TFEを除く。)、
フルオロプロピレン類:CF2=CFCF3、CF2=CHCF3、CH2=CHCF3等、
フルオロイソブチレン類:(CF3)2C=CH2等、
炭素数が2~12のフルオロアルキル基を有するポリフルオロアルキルエチレン類:CF3CF2CH=CH2、CF3CF2CF2CF2CH=CH2、CF3CF2CF2CF2CF2CF2CH=CH2、CF3CF2CF2CF2CF=CH2、CF2HCF2CF2CF=CH2等、
炭素数が5~12のフルオロアルキレン基を有するポリフルオロジエン類:CH2=CH(CF2)4CH=CH2等、
ペルフルオロビニルエーテル類:Rf(OCFXCF2)mOCF=CF2(ただし、Rfは、炭素数1~6のペルフルオロアルキル基であり、Xは、フッ素原子又はトリフルオロメチル基であり、mは、0~5の整数である。)等、
容易にカルボン酸基又はスルホン酸基に変換可能な基を有するペルフルオロビニルエーテル類;CH3OC(=O)CF2CF2CF2OCF=CF2、FSO2CF2CF2OCF(CF3)CF2OCF=CF2等、
オレフィン類:炭素数が3のオレフィン(プロピレン等)、炭素数が4のオレフィン(ブチレン、イソブチレン等)、4-メチル-1-ペンテン、シクロヘキセン、スチレン、α-メチルスチレン等(ただし、エチレンを除く。)、
ビニルエステル類:酢酸ビニル、乳酸ビニル、酪酸ビニル、ピバリン酸ビニル、安息香酸ビニル等、
アリルエステル類:酢酸アリル等、
ビニルエーテル類:メチルビニルエーテル、エチルビニルエーテル、ブチルビニルエーテル、イソブチルビニルエーテル、tert-ブチルビニルエーテル、シクロヘキシルビニルエーテル、ヒドロキシブチルビニルエーテル、ポリオキシエチレンビニルエーテル等、
アリルエーテル類:アリルメチルエーテル、アリルエチルエーテル、アリルブチルエーテル、アリルグリシジルエーテル等、
(メタ)アクリル酸エステル類:(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸4-ヒドロキシブチル、(メタ)アクリル酸グリシジル等、
(メタ)アクリルアミド類:(メタ)アクリルアミド、N-メチル(メタ)アクリルアミド、N-イソプロピルアクリルアミド、N,N-ジメチル(メタ)アクリルアミド等、
シアノ基含有単量体類:アクリロニトリル等、
ジエン類:イソプレン、1,3-ブタジエン等、
クロロオレフィン類:塩化ビニル、塩化ビニリデン等、
カルボン酸無水物と不飽和結合を含む化合物:無水マレイン酸、無水イタコン酸、無水シトラコン酸等。 Fluoroethylenes: CF 2 = CFCl, CF 2 = CH 2 etc. (excluding TFE),
Hexafluoropropylene such: CF 2 = CFCF 3, CF 2 = CHCF 3, CH 2 = CHCF 3 and the like,
Fluoroisobutylenes: (CF 3 ) 2 C═CH 2 etc.
Polyfluoroalkylethylenes having a fluoroalkyl group having 2 to 12 carbon atoms: CF 3 CF 2 CH═CH 2 , CF 3 CF 2 CF 2 CF 2 CH═CH 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH = CH 2, CF 3 CF 2 CF 2 CF 2 CF = CH 2, CF 2 HCF 2 CF 2 CF = CH 2 and the like,
Polyfluorodienes having a fluoroalkylene group having 5 to 12 carbon atoms: CH 2 ═CH (CF 2 ) 4 CH═CH 2 etc.
Perfluorovinyl ethers: R f (OCFXCF 2) m OCF = CF 2 ( where the R f is a perfluoroalkyl group having 1 to 6 carbon atoms, X is a fluorine atom or a trifluoromethyl group, m, An integer of 0 to 5), etc.
Perfluorovinyl ethers having groups easily convertible to carboxylic acid groups or sulfonic acid groups; CH 3 OC (═O) CF 2 CF 2 CF 2 OCF═CF 2 , FSO 2 CF 2 CF 2 OCF (CF 3 ) CF 2 OCF = CF 2 etc.
Olefins: olefins having 3 carbon atoms (propylene, etc.), olefins having 4 carbon atoms (butylene, isobutylene, etc.), 4-methyl-1-pentene, cyclohexene, styrene, α-methylstyrene, etc. (excluding ethylene) ),
Vinyl esters: vinyl acetate, vinyl lactate, vinyl butyrate, vinyl pivalate, vinyl benzoate, etc.
Allyl esters: allyl acetate, etc.
Vinyl ethers: methyl vinyl ether, ethyl vinyl ether, butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, cyclohexyl vinyl ether, hydroxybutyl vinyl ether, polyoxyethylene vinyl ether, etc.
Allyl ethers: allyl methyl ether, allyl ethyl ether, allyl butyl ether, allyl glycidyl ether, etc.
(Meth) acrylic acid esters: methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylic acid 4-hydroxybutyl, glycidyl (meth) acrylate, etc.
(Meth) acrylamides: (Meth) acrylamide, N-methyl (meth) acrylamide, N-isopropylacrylamide, N, N-dimethyl (meth) acrylamide, etc.
Cyano group-containing monomers: acrylonitrile, etc.
Diene: isoprene, 1,3-butadiene, etc.
Chloroolefins: Vinyl chloride, vinylidene chloride, etc.
Compound containing carboxylic anhydride and unsaturated bond: maleic anhydride, itaconic anhydride, citraconic anhydride and the like.
フルオロプロピレン類:CF2=CFCF3、CF2=CHCF3、CH2=CHCF3等、
フルオロイソブチレン類:(CF3)2C=CH2等、
炭素数が2~12のフルオロアルキル基を有するポリフルオロアルキルエチレン類:CF3CF2CH=CH2、CF3CF2CF2CF2CH=CH2、CF3CF2CF2CF2CF2CF2CH=CH2、CF3CF2CF2CF2CF=CH2、CF2HCF2CF2CF=CH2等、
炭素数が5~12のフルオロアルキレン基を有するポリフルオロジエン類:CH2=CH(CF2)4CH=CH2等、
ペルフルオロビニルエーテル類:Rf(OCFXCF2)mOCF=CF2(ただし、Rfは、炭素数1~6のペルフルオロアルキル基であり、Xは、フッ素原子又はトリフルオロメチル基であり、mは、0~5の整数である。)等、
容易にカルボン酸基又はスルホン酸基に変換可能な基を有するペルフルオロビニルエーテル類;CH3OC(=O)CF2CF2CF2OCF=CF2、FSO2CF2CF2OCF(CF3)CF2OCF=CF2等、
オレフィン類:炭素数が3のオレフィン(プロピレン等)、炭素数が4のオレフィン(ブチレン、イソブチレン等)、4-メチル-1-ペンテン、シクロヘキセン、スチレン、α-メチルスチレン等(ただし、エチレンを除く。)、
ビニルエステル類:酢酸ビニル、乳酸ビニル、酪酸ビニル、ピバリン酸ビニル、安息香酸ビニル等、
アリルエステル類:酢酸アリル等、
ビニルエーテル類:メチルビニルエーテル、エチルビニルエーテル、ブチルビニルエーテル、イソブチルビニルエーテル、tert-ブチルビニルエーテル、シクロヘキシルビニルエーテル、ヒドロキシブチルビニルエーテル、ポリオキシエチレンビニルエーテル等、
アリルエーテル類:アリルメチルエーテル、アリルエチルエーテル、アリルブチルエーテル、アリルグリシジルエーテル等、
(メタ)アクリル酸エステル類:(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸4-ヒドロキシブチル、(メタ)アクリル酸グリシジル等、
(メタ)アクリルアミド類:(メタ)アクリルアミド、N-メチル(メタ)アクリルアミド、N-イソプロピルアクリルアミド、N,N-ジメチル(メタ)アクリルアミド等、
シアノ基含有単量体類:アクリロニトリル等、
ジエン類:イソプレン、1,3-ブタジエン等、
クロロオレフィン類:塩化ビニル、塩化ビニリデン等、
カルボン酸無水物と不飽和結合を含む化合物:無水マレイン酸、無水イタコン酸、無水シトラコン酸等。 Fluoroethylenes: CF 2 = CFCl, CF 2 = CH 2 etc. (excluding TFE),
Hexafluoropropylene such: CF 2 = CFCF 3, CF 2 = CHCF 3, CH 2 = CHCF 3 and the like,
Fluoroisobutylenes: (CF 3 ) 2 C═CH 2 etc.
Polyfluoroalkylethylenes having a fluoroalkyl group having 2 to 12 carbon atoms: CF 3 CF 2 CH═CH 2 , CF 3 CF 2 CF 2 CF 2 CH═CH 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH = CH 2, CF 3 CF 2 CF 2 CF 2 CF = CH 2, CF 2 HCF 2 CF 2 CF = CH 2 and the like,
Polyfluorodienes having a fluoroalkylene group having 5 to 12 carbon atoms: CH 2 ═CH (CF 2 ) 4 CH═CH 2 etc.
Perfluorovinyl ethers: R f (OCFXCF 2) m OCF = CF 2 ( where the R f is a perfluoroalkyl group having 1 to 6 carbon atoms, X is a fluorine atom or a trifluoromethyl group, m, An integer of 0 to 5), etc.
Perfluorovinyl ethers having groups easily convertible to carboxylic acid groups or sulfonic acid groups; CH 3 OC (═O) CF 2 CF 2 CF 2 OCF═CF 2 , FSO 2 CF 2 CF 2 OCF (CF 3 ) CF 2 OCF = CF 2 etc.
Olefins: olefins having 3 carbon atoms (propylene, etc.), olefins having 4 carbon atoms (butylene, isobutylene, etc.), 4-methyl-1-pentene, cyclohexene, styrene, α-methylstyrene, etc. (excluding ethylene) ),
Vinyl esters: vinyl acetate, vinyl lactate, vinyl butyrate, vinyl pivalate, vinyl benzoate, etc.
Allyl esters: allyl acetate, etc.
Vinyl ethers: methyl vinyl ether, ethyl vinyl ether, butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, cyclohexyl vinyl ether, hydroxybutyl vinyl ether, polyoxyethylene vinyl ether, etc.
Allyl ethers: allyl methyl ether, allyl ethyl ether, allyl butyl ether, allyl glycidyl ether, etc.
(Meth) acrylic acid esters: methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylic acid 4-hydroxybutyl, glycidyl (meth) acrylate, etc.
(Meth) acrylamides: (Meth) acrylamide, N-methyl (meth) acrylamide, N-isopropylacrylamide, N, N-dimethyl (meth) acrylamide, etc.
Cyano group-containing monomers: acrylonitrile, etc.
Diene: isoprene, 1,3-butadiene, etc.
Chloroolefins: Vinyl chloride, vinylidene chloride, etc.
Compound containing carboxylic anhydride and unsaturated bond: maleic anhydride, itaconic anhydride, citraconic anhydride and the like.
他の単量体は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
他の単量体に基づく繰り返し単位の割合は、全繰り返し単位(100モル%)のうち、0.1~50モル%が好ましく、0.1~30モル%がより好ましく、0.1~20モル%がさらに好ましい。他の単量体に基づく繰り返し単位の割合が該範囲内であれば、実質的にエチレンに基づく繰り返し単位及びTFEに基づく繰り返し単位のみからなるETFEが有する特性を損なうことなく、高い溶解性、撥水性、撥油性、基材に対する密着性、化合物(B)との反応性等の機能を付与できる。 Another monomer may be used individually by 1 type and may be used in combination of 2 or more type.
The proportion of repeating units based on other monomers is preferably from 0.1 to 50 mol%, more preferably from 0.1 to 30 mol%, and more preferably from 0.1 to 20 mol based on the total repeating units (100 mol%). More preferred is mol%. If the ratio of repeating units based on other monomers is within this range, high solubility and repellency can be achieved without impairing the properties of ETFE consisting essentially of repeating units based on ethylene and repeating units based on TFE. Functions such as aqueous properties, oil repellency, adhesion to the substrate, and reactivity with the compound (B) can be imparted.
他の単量体に基づく繰り返し単位の割合は、全繰り返し単位(100モル%)のうち、0.1~50モル%が好ましく、0.1~30モル%がより好ましく、0.1~20モル%がさらに好ましい。他の単量体に基づく繰り返し単位の割合が該範囲内であれば、実質的にエチレンに基づく繰り返し単位及びTFEに基づく繰り返し単位のみからなるETFEが有する特性を損なうことなく、高い溶解性、撥水性、撥油性、基材に対する密着性、化合物(B)との反応性等の機能を付与できる。 Another monomer may be used individually by 1 type and may be used in combination of 2 or more type.
The proportion of repeating units based on other monomers is preferably from 0.1 to 50 mol%, more preferably from 0.1 to 30 mol%, and more preferably from 0.1 to 20 mol based on the total repeating units (100 mol%). More preferred is mol%. If the ratio of repeating units based on other monomers is within this range, high solubility and repellency can be achieved without impairing the properties of ETFE consisting essentially of repeating units based on ethylene and repeating units based on TFE. Functions such as aqueous properties, oil repellency, adhesion to the substrate, and reactivity with the compound (B) can be imparted.
含フッ素共重合体(A)は、基材への塗膜の密着性、化合物(B)との混和性、相溶性等の点から、基材や化合物(B)に対して反応性を有する反応性官能基を有していることが好ましい。反応性官能基は、含フッ素共重合体(A)の分子末端、側鎖又は主鎖のいずれに存在していてもよい。また、反応性官能基は、1種のみが存在していてもよく、2種以上が存在していてもよい。反応性官能基の種類、及びその含有量は、化合物(B)の種類、化合物(B)が有する官能基、要求される特性、成形法等により適宜選択される。
The fluorinated copolymer (A) has reactivity with the substrate and the compound (B) from the viewpoints of adhesion of the coating film to the substrate, miscibility with the compound (B), compatibility and the like. It preferably has a reactive functional group. The reactive functional group may be present at any of the molecular end, side chain, or main chain of the fluorine-containing copolymer (A). Moreover, only one type of reactive functional group may be present, or two or more types may be present. The kind of the reactive functional group and the content thereof are appropriately selected depending on the kind of the compound (B), the functional group possessed by the compound (B), the required characteristics, the molding method and the like.
反応性官能基としては、カルボン酸基、1分子中の2つのカルボキシル基が脱水縮合した基(以下、酸無水物基という。)、ヒドロキシル基、スルホン酸基、エポキシ基、シアノ基、カーボネート基、イソシアネート基、エステル基、アミド基、アルデヒド基、アミノ基、加水分解性シリル基、炭素-炭素二重結合を有する基、及びカルボン酸ハライド基からなる群から選ばれる少なくとも1種が挙げられる。
カルボン酸基とは、カルボキシル基及びその塩(-COOM1)を意味する。ただし、M1は、カルボン酸と塩を形成し得る金属原子又は原子団である。
スルホン酸基とは、スルホ基とその塩(-SO3M2)を意味する。ただし、M2は、スルホン酸と塩を形成し得る金属原子又は原子団である。
加水分解性シリル基とは、ケイ素原子にアルコキシ基、アミノ基、ハロゲン原子等が結合してなる基であり、加水分解によりシロキサン結合を形成することにより架橋し得る基である。トリアルコキシシリル基、アルキルジアルコキシシリル基等が好ましい。 The reactive functional group includes a carboxylic acid group, a group obtained by dehydration condensation of two carboxyl groups in one molecule (hereinafter referred to as an acid anhydride group), a hydroxyl group, a sulfonic acid group, an epoxy group, a cyano group, and a carbonate group. And at least one selected from the group consisting of an isocyanate group, an ester group, an amide group, an aldehyde group, an amino group, a hydrolyzable silyl group, a group having a carbon-carbon double bond, and a carboxylic acid halide group.
The carboxylic acid group means a carboxyl group and a salt thereof (—COOM 1 ). However, M < 1 > is a metal atom or atomic group which can form a salt with carboxylic acid.
The sulfonic acid group means a sulfo group and a salt thereof (—SO 3 M 2 ). However, M 2 is a metal atom or an atomic group capable of forming a salt with sulfonic acid.
The hydrolyzable silyl group is a group in which an alkoxy group, an amino group, a halogen atom, or the like is bonded to a silicon atom, and is a group that can be crosslinked by forming a siloxane bond by hydrolysis. A trialkoxysilyl group, an alkyl dialkoxysilyl group and the like are preferable.
カルボン酸基とは、カルボキシル基及びその塩(-COOM1)を意味する。ただし、M1は、カルボン酸と塩を形成し得る金属原子又は原子団である。
スルホン酸基とは、スルホ基とその塩(-SO3M2)を意味する。ただし、M2は、スルホン酸と塩を形成し得る金属原子又は原子団である。
加水分解性シリル基とは、ケイ素原子にアルコキシ基、アミノ基、ハロゲン原子等が結合してなる基であり、加水分解によりシロキサン結合を形成することにより架橋し得る基である。トリアルコキシシリル基、アルキルジアルコキシシリル基等が好ましい。 The reactive functional group includes a carboxylic acid group, a group obtained by dehydration condensation of two carboxyl groups in one molecule (hereinafter referred to as an acid anhydride group), a hydroxyl group, a sulfonic acid group, an epoxy group, a cyano group, and a carbonate group. And at least one selected from the group consisting of an isocyanate group, an ester group, an amide group, an aldehyde group, an amino group, a hydrolyzable silyl group, a group having a carbon-carbon double bond, and a carboxylic acid halide group.
The carboxylic acid group means a carboxyl group and a salt thereof (—COOM 1 ). However, M < 1 > is a metal atom or atomic group which can form a salt with carboxylic acid.
The sulfonic acid group means a sulfo group and a salt thereof (—SO 3 M 2 ). However, M 2 is a metal atom or an atomic group capable of forming a salt with sulfonic acid.
The hydrolyzable silyl group is a group in which an alkoxy group, an amino group, a halogen atom, or the like is bonded to a silicon atom, and is a group that can be crosslinked by forming a siloxane bond by hydrolysis. A trialkoxysilyl group, an alkyl dialkoxysilyl group and the like are preferable.
反応性官能基のうち、カルボン酸基、酸無水物基、ヒドロキシル基、エポキシ基、カーボネート基、アミノ基、アミド基、加水分解性シリル基、炭素-炭素二重結合を有する基、及びカルボン酸ハライド基からなる群から選ばれる少なくとも1種が好ましく、カルボン酸基、酸無水物基、ヒドロキシル基、エポキシ基、アミノ基、アミド基、炭素-炭素二重結合を有する基、及びカルボン酸ハライド基からなる群から選ばれる少なくとも1種がより好ましい。
Among reactive functional groups, carboxylic acid groups, acid anhydride groups, hydroxyl groups, epoxy groups, carbonate groups, amino groups, amide groups, hydrolyzable silyl groups, groups having a carbon-carbon double bond, and carboxylic acids Preferably, at least one selected from the group consisting of halide groups, carboxylic acid groups, acid anhydride groups, hydroxyl groups, epoxy groups, amino groups, amide groups, groups having a carbon-carbon double bond, and carboxylic acid halide groups More preferred is at least one selected from the group consisting of
含フッ素共重合体(A)に、反応性官能基を導入する方法としては、下記の方法が挙げられる。
(i)エチレンとTFEと他の単量体とを重合する際に、他の単量体の1つとして反応性官能基を有する単量体を共重合する方法。
(ii)エチレンとTFEと必要に応じて他の単量体とを共重合する際に、反応性官能基を有する重合開始剤、連鎖移動剤等を用いることによって含フッ素共重合体(A)の分子末端に反応性官能基を導入する方法。
(iii)反応性官能基及びグラフト化が可能な官能基(不飽和結合等)を有する化合物(グラフト性化合物)を含フッ素共重合体(A)にグラフトさせる方法。 Examples of the method for introducing a reactive functional group into the fluorinated copolymer (A) include the following methods.
(I) A method of copolymerizing a monomer having a reactive functional group as one of the other monomers when polymerizing ethylene, TFE and another monomer.
(Ii) Fluorine-containing copolymer (A) by using a polymerization initiator having a reactive functional group, a chain transfer agent or the like when copolymerizing ethylene, TFE and other monomers as required. A method of introducing a reactive functional group at the molecular end of the polymer.
(Iii) A method of grafting a compound having a reactive functional group and a functional group capable of grafting (such as an unsaturated bond) (grafting compound) onto the fluorine-containing copolymer (A).
(i)エチレンとTFEと他の単量体とを重合する際に、他の単量体の1つとして反応性官能基を有する単量体を共重合する方法。
(ii)エチレンとTFEと必要に応じて他の単量体とを共重合する際に、反応性官能基を有する重合開始剤、連鎖移動剤等を用いることによって含フッ素共重合体(A)の分子末端に反応性官能基を導入する方法。
(iii)反応性官能基及びグラフト化が可能な官能基(不飽和結合等)を有する化合物(グラフト性化合物)を含フッ素共重合体(A)にグラフトさせる方法。 Examples of the method for introducing a reactive functional group into the fluorinated copolymer (A) include the following methods.
(I) A method of copolymerizing a monomer having a reactive functional group as one of the other monomers when polymerizing ethylene, TFE and another monomer.
(Ii) Fluorine-containing copolymer (A) by using a polymerization initiator having a reactive functional group, a chain transfer agent or the like when copolymerizing ethylene, TFE and other monomers as required. A method of introducing a reactive functional group at the molecular end of the polymer.
(Iii) A method of grafting a compound having a reactive functional group and a functional group capable of grafting (such as an unsaturated bond) (grafting compound) onto the fluorine-containing copolymer (A).
(i)~(iii)の方法は、2種以上を適宜組み合わせてもよい。(i)~(iii)の方法のうち、含フッ素共重合体(A)の耐久性の点から、(i)及び/又は(ii)の方法が好ましい。
なお、反応性官能基以外に、含フッ素共重合体(A)に各種機能を付与するために必要に応じて導入される官能基についても、反応性官能基を導入する方法と同様の方法で含フッ素共重合体(A)に導入できる。 Two or more methods (i) to (iii) may be appropriately combined. Among the methods (i) to (iii), the method (i) and / or (ii) is preferable from the viewpoint of durability of the fluorine-containing copolymer (A).
In addition to the reactive functional group, the functional group introduced as necessary to impart various functions to the fluorine-containing copolymer (A) is the same as the method of introducing the reactive functional group. It can introduce | transduce into a fluorine-containing copolymer (A).
なお、反応性官能基以外に、含フッ素共重合体(A)に各種機能を付与するために必要に応じて導入される官能基についても、反応性官能基を導入する方法と同様の方法で含フッ素共重合体(A)に導入できる。 Two or more methods (i) to (iii) may be appropriately combined. Among the methods (i) to (iii), the method (i) and / or (ii) is preferable from the viewpoint of durability of the fluorine-containing copolymer (A).
In addition to the reactive functional group, the functional group introduced as necessary to impart various functions to the fluorine-containing copolymer (A) is the same as the method of introducing the reactive functional group. It can introduce | transduce into a fluorine-containing copolymer (A).
含フッ素共重合体(A)の融点は、溶解性、強度等の点から、130~275℃が好ましく、140~265℃がより好ましく、150~260℃がさらに好ましい。
含フッ素共重合体(A)の融点は、たとえば、示差走査熱量測定(DSC)装置によって測定される。 The melting point of the fluorinated copolymer (A) is preferably from 130 to 275 ° C., more preferably from 140 to 265 ° C., and even more preferably from 150 to 260 ° C. from the viewpoints of solubility and strength.
The melting point of the fluorinated copolymer (A) is measured by, for example, a differential scanning calorimetry (DSC) apparatus.
含フッ素共重合体(A)の融点は、たとえば、示差走査熱量測定(DSC)装置によって測定される。 The melting point of the fluorinated copolymer (A) is preferably from 130 to 275 ° C., more preferably from 140 to 265 ° C., and even more preferably from 150 to 260 ° C. from the viewpoints of solubility and strength.
The melting point of the fluorinated copolymer (A) is measured by, for example, a differential scanning calorimetry (DSC) apparatus.
含フッ素共重合体(A)としては、市販のETFEを用いてもよい。市販のETFEとしては、下記のものが挙げられる。
旭硝子社製:Fluon(登録商標)ETFE Series、Fluon(登録商標)LM Series、
ダイキン工業社製:ネオフロン(登録商標)、
Dyneon社製:Dyneon(登録商標)ETFE、
DuPont社製:Tefzel(登録商標)等。
含フッ素共重合体(A)は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。 Commercially available ETFE may be used as the fluorinated copolymer (A). The following are mentioned as commercially available ETFE.
Asahi Glass Co., Ltd .: Fluon (registered trademark) ETFE Series, Fluon (registered trademark) LM Series,
Daikin Industries, Ltd .: Neoflon (registered trademark),
Dyneon: Dyneon (registered trademark) ETFE,
DuPont: Tefzel (registered trademark), etc.
A fluorine-containing copolymer (A) may be used individually by 1 type, and may be used in combination of 2 or more type.
旭硝子社製:Fluon(登録商標)ETFE Series、Fluon(登録商標)LM Series、
ダイキン工業社製:ネオフロン(登録商標)、
Dyneon社製:Dyneon(登録商標)ETFE、
DuPont社製:Tefzel(登録商標)等。
含フッ素共重合体(A)は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。 Commercially available ETFE may be used as the fluorinated copolymer (A). The following are mentioned as commercially available ETFE.
Asahi Glass Co., Ltd .: Fluon (registered trademark) ETFE Series, Fluon (registered trademark) LM Series,
Daikin Industries, Ltd .: Neoflon (registered trademark),
Dyneon: Dyneon (registered trademark) ETFE,
DuPont: Tefzel (registered trademark), etc.
A fluorine-containing copolymer (A) may be used individually by 1 type, and may be used in combination of 2 or more type.
(化合物(B))
化合物(B)は、開環反応性を有する環状エーテルを有する基及び付加反応性を有する炭素-炭素二重結合を有する基からなる群から選ばれる少なくとも1種の反応性官能基を有する硬化性化合物(ただし、前記含フッ素共重合体(A)を除く。)である。 (Compound (B))
Compound (B) is a curable compound having at least one reactive functional group selected from the group consisting of a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity. Compound (however, excluding the fluorine-containing copolymer (A)).
化合物(B)は、開環反応性を有する環状エーテルを有する基及び付加反応性を有する炭素-炭素二重結合を有する基からなる群から選ばれる少なくとも1種の反応性官能基を有する硬化性化合物(ただし、前記含フッ素共重合体(A)を除く。)である。 (Compound (B))
Compound (B) is a curable compound having at least one reactive functional group selected from the group consisting of a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity. Compound (however, excluding the fluorine-containing copolymer (A)).
化合物(B)としては、含フッ素共重合体(A)と媒体(C)とが溶液状態を呈する温度範囲において、媒体(C)に溶解するもの、媒体(C)に一部溶解するもの、又はまったく溶解しないもののいずれでもよい。化合物(B)としては、含フッ素共重合体(A)との混和性や相溶性の点から、媒体(C)に溶解するものが好ましい。
As the compound (B), in the temperature range in which the fluorinated copolymer (A) and the medium (C) are in a solution state, those that dissolve in the medium (C), those that partially dissolve in the medium (C), Or what does not melt | dissolve at all may be sufficient. The compound (B) is preferably one that is soluble in the medium (C) from the viewpoint of miscibility and compatibility with the fluorinated copolymer (A).
開環反応性を有する環状エーテルを有する基としては、エポキシ基、グリシジル基、オキセタニル基等が挙げられる。
付加反応性を有する炭素-炭素二重結合を有する基としては、ビニル基、アリル基、アクリロイルオキシ基、メタクリロイルオキシ基、スチリル基等が挙げられる。 Examples of the group having a cyclic ether having ring-opening reactivity include an epoxy group, a glycidyl group, and an oxetanyl group.
Examples of the group having a carbon-carbon double bond having addition reactivity include a vinyl group, an allyl group, an acryloyloxy group, a methacryloyloxy group, and a styryl group.
付加反応性を有する炭素-炭素二重結合を有する基としては、ビニル基、アリル基、アクリロイルオキシ基、メタクリロイルオキシ基、スチリル基等が挙げられる。 Examples of the group having a cyclic ether having ring-opening reactivity include an epoxy group, a glycidyl group, and an oxetanyl group.
Examples of the group having a carbon-carbon double bond having addition reactivity include a vinyl group, an allyl group, an acryloyloxy group, a methacryloyloxy group, and a styryl group.
開環反応性を有する環状エーテルを有する基を含有する化合物(B1)としては、エポキシ樹脂、オキセタン樹脂等が挙げられる。
付加反応性を有する炭素-炭素二重結合を有する基を含有する化合物(B2)としては、アクリル系単官能モノマー、アクリル系多官能モノマー、アクリル系マクロモノマー、アリル系単官能モノマー、アリル系多官能モノマー、アリル系マクロモノマー等が挙げられる。
開環反応性を有する環状エーテルを有する基及び付加反応性を有する炭素-炭素二重結合を有する基を有する化合物(B3)としては、アクリル酸グリシジル、メタクリル酸グリシジル、アリルグリシジルエーテル等が挙げられる。 Examples of the compound (B1) containing a group having a cyclic ether having ring-opening reactivity include epoxy resins and oxetane resins.
Examples of the compound (B2) containing a group having a carbon-carbon double bond having addition reactivity include an acrylic monofunctional monomer, an acrylic polyfunctional monomer, an acrylic macromonomer, an allyl monofunctional monomer, and an allyl polyfunctional monomer. A functional monomer, an allylic macromonomer, etc. are mentioned.
Examples of the compound (B3) having a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity include glycidyl acrylate, glycidyl methacrylate, and allyl glycidyl ether. .
付加反応性を有する炭素-炭素二重結合を有する基を含有する化合物(B2)としては、アクリル系単官能モノマー、アクリル系多官能モノマー、アクリル系マクロモノマー、アリル系単官能モノマー、アリル系多官能モノマー、アリル系マクロモノマー等が挙げられる。
開環反応性を有する環状エーテルを有する基及び付加反応性を有する炭素-炭素二重結合を有する基を有する化合物(B3)としては、アクリル酸グリシジル、メタクリル酸グリシジル、アリルグリシジルエーテル等が挙げられる。 Examples of the compound (B1) containing a group having a cyclic ether having ring-opening reactivity include epoxy resins and oxetane resins.
Examples of the compound (B2) containing a group having a carbon-carbon double bond having addition reactivity include an acrylic monofunctional monomer, an acrylic polyfunctional monomer, an acrylic macromonomer, an allyl monofunctional monomer, and an allyl polyfunctional monomer. A functional monomer, an allylic macromonomer, etc. are mentioned.
Examples of the compound (B3) having a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity include glycidyl acrylate, glycidyl methacrylate, and allyl glycidyl ether. .
化合物(B)は、硬化性含フッ素化合物であってもよい。硬化性含フッ素化合物としては、含フッ素エポキシ樹脂、国際公開第2009/096342号に記載の硬化性含フッ素共重合体、日本特開平7-228818号公報に記載の硬化性含フッ素共重合体等が挙げられる。
The compound (B) may be a curable fluorine-containing compound. Examples of the curable fluorine-containing compound include a fluorine-containing epoxy resin, a curable fluorine-containing copolymer described in International Publication No. 2009/096342, a curable fluorine-containing copolymer described in Japanese Patent Application Laid-Open No. 7-228818, and the like. Is mentioned.
化合物(B)としては、含フッ素共重合体(A)が反応性官能基を有している場合、含フッ素共重合体(A)との混和性、若しくは相溶性の点から、含フッ素共重合体(A)の反応性官能基と反応し得る反応性官能基を有するものが好ましい。
As the compound (B), when the fluorine-containing copolymer (A) has a reactive functional group, the fluorine-containing copolymer (A) is preferable from the viewpoint of miscibility or compatibility with the fluorine-containing copolymer (A). What has a reactive functional group which can react with the reactive functional group of a polymer (A) is preferable.
化合物(B)としては、市販の硬化性化合物を用いてもよい。市販の硬化性化合物としては、下記のものが挙げられる。
ADEKA社製:アデカレジン(登録商標)、
三菱化学社製:jER(登録商標)、
DIC社製:EPICLON(登録商標)、
ダイセル化学工業社製:セロキサイド(登録商標)
新中村化学工業社製:NKエステル(登録商標)、
丸善石油化学社製:ビスアリルナジイミド等。
化合物(B)は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
なお、化合物(B)の硬化方法としては、熱硬化、光硬化、放射線硬化等の種々の硬化方法が適用できる。また、後記の化合物(D)を併用して硬化することも好ましい。 A commercially available curable compound may be used as the compound (B). The following are mentioned as a commercially available curable compound.
Made by ADEKA: Adeka Resin (registered trademark),
Mitsubishi Chemical Corporation: jER (registered trademark)
DIC Corporation: EPICLON (registered trademark),
Daicel Chemical Industries, Ltd .: Celoxide (registered trademark)
Shin-Nakamura Chemical Co., Ltd .: NK Ester (registered trademark)
Maruzen Petrochemical Co., Ltd .: bisallyl nadiimide, etc.
A compound (B) may be used individually by 1 type, and may be used in combination of 2 or more type.
In addition, as a hardening method of a compound (B), various hardening methods, such as thermosetting, photocuring, and radiation curing, are applicable. It is also preferable to cure by using a compound (D) described later in combination.
ADEKA社製:アデカレジン(登録商標)、
三菱化学社製:jER(登録商標)、
DIC社製:EPICLON(登録商標)、
ダイセル化学工業社製:セロキサイド(登録商標)
新中村化学工業社製:NKエステル(登録商標)、
丸善石油化学社製:ビスアリルナジイミド等。
化合物(B)は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
なお、化合物(B)の硬化方法としては、熱硬化、光硬化、放射線硬化等の種々の硬化方法が適用できる。また、後記の化合物(D)を併用して硬化することも好ましい。 A commercially available curable compound may be used as the compound (B). The following are mentioned as a commercially available curable compound.
Made by ADEKA: Adeka Resin (registered trademark),
Mitsubishi Chemical Corporation: jER (registered trademark)
DIC Corporation: EPICLON (registered trademark),
Daicel Chemical Industries, Ltd .: Celoxide (registered trademark)
Shin-Nakamura Chemical Co., Ltd .: NK Ester (registered trademark)
Maruzen Petrochemical Co., Ltd .: bisallyl nadiimide, etc.
A compound (B) may be used individually by 1 type, and may be used in combination of 2 or more type.
In addition, as a hardening method of a compound (B), various hardening methods, such as thermosetting, photocuring, and radiation curing, are applicable. It is also preferable to cure by using a compound (D) described later in combination.
(媒体(C))
媒体(C)は、含フッ素共重合体(A)を溶解又は分散し得て、かつ化合物(B)を溶解又は分散し得る媒体である。 (Medium (C))
The medium (C) is a medium that can dissolve or disperse the fluorine-containing copolymer (A) and can dissolve or disperse the compound (B).
媒体(C)は、含フッ素共重合体(A)を溶解又は分散し得て、かつ化合物(B)を溶解又は分散し得る媒体である。 (Medium (C))
The medium (C) is a medium that can dissolve or disperse the fluorine-containing copolymer (A) and can dissolve or disperse the compound (B).
媒体(C)としては、含フッ素共重合体(A)の融点以下の温度で含フッ素共重合体(A)を溶解し得る溶媒が好ましく、後述する含フッ素共重合体溶液から含フッ素共重合体(A)の微粒子を析出させ、均一に分散させた後は、少なくとも常温常圧において、該微粒子を分散状態で存在させる分散媒として機能する溶媒がより好ましい。
As the medium (C), a solvent capable of dissolving the fluorinated copolymer (A) at a temperature not higher than the melting point of the fluorinated copolymer (A) is preferable. After the fine particles of the combined body (A) are precipitated and uniformly dispersed, a solvent that functions as a dispersion medium for allowing the fine particles to exist in a dispersed state is more preferable at least at normal temperature and pressure.
媒体(C)は、化合物(B)を溶解するものであってもよく、化合物(B)を一部溶解しない又はまったく溶解しないものであってもよく、含フッ素共重合体(A)と化合物(B)との混和性、若しくは相溶性の点から、化合物(B)を溶解するものが好ましい。
The medium (C) may dissolve the compound (B), or may not dissolve the compound (B) partially or at all, and the fluorine-containing copolymer (A) and the compound From the viewpoint of miscibility with (B) or compatibility, those that dissolve the compound (B) are preferred.
ある溶媒が、少なくとも含フッ素共重合体(A)を溶解し得る媒体(C)であるかどうかは、該溶媒が有する極性がある特定の範囲にあるかどうかで判断できる。本発明においては、媒体(C)として、ハンセン溶解度パラメータ(Hansen solubility parameters)に基づいて、ある特定の範囲の極性を有する溶媒を選択することが好ましい。
Whether or not a certain solvent is a medium (C) capable of dissolving at least the fluorinated copolymer (A) can be determined by whether or not the polarity of the solvent is within a specific range. In the present invention, it is preferable to select a solvent having a certain range of polarities as the medium (C) based on Hansen solubility parameters (Hansen solubility parameters).
ハンセン溶解度パラメータは、ヒルデブランド(Hildebrand)によって導入された溶解度パラメータを、ハンセン(Hansen)が分散項δd、極性項δp、及び水素結合項δhの3成分に分割し、3次元空間に示したものである。分散項δdは、分散力のよる効果を示し、極性項δpは、双極子間力による効果を示し、水素結合項δhは、水素結合力の効果を示す。3次元空間における特定の樹脂Xの座標とある溶媒の座標とが近いほど、樹脂Xは該溶媒に溶解しやすい。
The Hansen solubility parameter is a three-dimensional space where the solubility parameter introduced by Hildebrand is divided by Hansen into three components: a dispersion term δd, a polar term δp, and a hydrogen bond term δh. It is. The dispersion term δd indicates the effect due to the dispersion force, the polar term δp indicates the effect due to the dipole force, and the hydrogen bond term δh indicates the effect due to the hydrogen bond force. The closer the coordinates of a specific resin X in a three-dimensional space are to the coordinates of a certain solvent, the easier the resin X dissolves in the solvent.
ハンセン溶解度パラメータの定義及び計算方法は、下記の文献に記載されている。
Charles M. Hansen著、「Hansen Solubility Parameters: A Users Handbook」、CRCプレス、2007年。 The definition and calculation method of the Hansen solubility parameter is described in the following document.
Charles M. Hansen, “Hansen Solubility Parameters: A Users Handbook”, CRC Press, 2007.
Charles M. Hansen著、「Hansen Solubility Parameters: A Users Handbook」、CRCプレス、2007年。 The definition and calculation method of the Hansen solubility parameter is described in the following document.
Charles M. Hansen, “Hansen Solubility Parameters: A Users Handbook”, CRC Press, 2007.
また、文献値が知られていない溶媒については、コンピュータソフトウエア(Hansen Solubility Parameters in Practice(HSPiP))を用いることによって、その化学構造から簡便にハンセン溶解度パラメータを推算できる。
本発明においては、HSPiPバージョン3を用い、データベースに登録されている溶媒についてはその値を、登録されていない溶媒について推算値を用いる。 For solvents whose literature values are not known, Hansen solubility parameters can be easily estimated from their chemical structures by using computer software (Hansen Solubility Parameters in Practice (HSPIP)).
In the present invention, HSPiP version 3 is used, and the value is used for the solvent registered in the database, and the estimated value is used for the solvent not registered.
本発明においては、HSPiPバージョン3を用い、データベースに登録されている溶媒についてはその値を、登録されていない溶媒について推算値を用いる。 For solvents whose literature values are not known, Hansen solubility parameters can be easily estimated from their chemical structures by using computer software (Hansen Solubility Parameters in Practice (HSPIP)).
In the present invention, HSPiP version 3 is used, and the value is used for the solvent registered in the database, and the estimated value is used for the solvent not registered.
特定の樹脂Xのハンセン溶解度パラメータについては、通常、該樹脂Xを、ハンセン溶解度パラメータが確定している数多くの異なる溶媒に溶解させて溶解度を測る溶解度試験を行うことによって決定される。具体的には、溶解度試験に用いたすべての溶媒のハンセン溶解度パラメータの座標を3次元空間に示した際、樹脂Xを溶解した溶媒の座標がすべて球の内側に内包され、溶解しない溶媒の座標が球の外側になるような球(溶解度球)を探し出し、溶解度球の中心座標を樹脂Xのハンセン溶解度パラメータとする。
また、溶解度試験に用いられなかったある溶媒のハンセン溶解度パラメータの座標が(δd、δp、及びδh)であった場合、該座標が溶解度球の内側に内包されれば、該溶媒は樹脂Xを溶解すると考えられる。一方、該座標が溶解度球の外側にあれば、該溶媒は樹脂Xを溶解することができないと考えられる。 The Hansen solubility parameter of a specific resin X is usually determined by conducting a solubility test in which the resin X is dissolved in a number of different solvents for which the Hansen solubility parameter has been determined and the solubility is measured. Specifically, when the coordinates of the Hansen solubility parameters of all the solvents used in the solubility test are shown in a three-dimensional space, the coordinates of the solvent in which the resin X is dissolved are all contained inside the sphere and the solvent is not dissolved. A sphere (solubility sphere) that is outside the sphere is found, and the center coordinates of the solubility sphere are used as the Hansen solubility parameter of the resin X.
Further, when the coordinates of the Hansen solubility parameter of a certain solvent not used in the solubility test are (δd, δp, and δh), if the coordinates are included inside the solubility sphere, the solvent contains the resin X. It is thought to dissolve. On the other hand, if the coordinates are outside the solubility sphere, it is considered that the solvent cannot dissolve the resin X.
また、溶解度試験に用いられなかったある溶媒のハンセン溶解度パラメータの座標が(δd、δp、及びδh)であった場合、該座標が溶解度球の内側に内包されれば、該溶媒は樹脂Xを溶解すると考えられる。一方、該座標が溶解度球の外側にあれば、該溶媒は樹脂Xを溶解することができないと考えられる。 The Hansen solubility parameter of a specific resin X is usually determined by conducting a solubility test in which the resin X is dissolved in a number of different solvents for which the Hansen solubility parameter has been determined and the solubility is measured. Specifically, when the coordinates of the Hansen solubility parameters of all the solvents used in the solubility test are shown in a three-dimensional space, the coordinates of the solvent in which the resin X is dissolved are all contained inside the sphere and the solvent is not dissolved. A sphere (solubility sphere) that is outside the sphere is found, and the center coordinates of the solubility sphere are used as the Hansen solubility parameter of the resin X.
Further, when the coordinates of the Hansen solubility parameter of a certain solvent not used in the solubility test are (δd, δp, and δh), if the coordinates are included inside the solubility sphere, the solvent contains the resin X. It is thought to dissolve. On the other hand, if the coordinates are outside the solubility sphere, it is considered that the solvent cannot dissolve the resin X.
本発明においては、少なくとも含フッ素共重合体(A)をその融点以下の温度で溶解させ、かつ室温において含フッ素共重合体(A)を凝集させず、微粒子として分散させるのに最も適した溶媒であるジイソプロピルケトンを、ハンセン溶解度パラメータとして含フッ素共重合体(A)に最も近い性質の物質であると仮定する。そして、ジイソプロピルケトンを基準(溶解度球の中心)とし、ジイソプロピルケトンのハンセン溶解度パラメータの座標(15.7、5.7、及び4.3)から一定の距離(すなわち溶解度球の内側)にある溶媒群を媒体(C)として用いることができる。
In the present invention, the most suitable solvent for dissolving at least the fluorinated copolymer (A) at a temperature below its melting point and dispersing it as fine particles without agglomerating the fluorinated copolymer (A) at room temperature. It is assumed that diisopropyl ketone is a substance having a property closest to the fluorine-containing copolymer (A) as a Hansen solubility parameter. Then, with diisopropyl ketone as the reference (the center of the solubility sphere), the solvent at a certain distance (ie, inside the solubility sphere) from the coordinates (15.7, 5.7, and 4.3) of the Hansen solubility parameter of diisopropyl ketone. Groups can be used as medium (C).
具体的には、ハンセン溶解度パラメータの3次元空間における2点間の距離Raを求める式としてよく知られた式、
(Ra)2=4×(δd2-δd1)2+(δp2-δp1)2+(δh2-δh1)2をベースにして、ジイソプロピルケトンの座標とある溶媒の座標と距離を見積もる下式(1)を作成し、下式(1)で表わされるRを、含フッ素共重合体(A)に対する溶解指標とする。
R=4×(δd-15.7)2+(δp-5.7)2+(δh-4.3)2・・・(1)。
ただし、δd、δp及びδhは、それぞれ、溶媒のハンセン溶解度パラメータにおける分散項、極性項及び水素結合項[(MPa)1/2]である。 Specifically, an expression well known as an expression for obtaining the distance Ra between two points in the three-dimensional space of the Hansen solubility parameter,
Based on (Ra) 2 = 4 × (δd2−δd1) 2 + (δp2−δp1) 2 + (δh2−δh1) 2 , the coordinates of diisopropyl ketone and the coordinates and distance of a solvent are estimated by the following formula (1) And R represented by the following formula (1) is used as a solubility index for the fluorinated copolymer (A).
R = 4 × (δd−15.7) 2 + (δp−5.7) 2 + (δh−4.3) 2 (1).
However, δd, δp, and δh are a dispersion term, a polar term, and a hydrogen bond term [(MPa) 1/2 ] in the Hansen solubility parameter of the solvent, respectively.
(Ra)2=4×(δd2-δd1)2+(δp2-δp1)2+(δh2-δh1)2をベースにして、ジイソプロピルケトンの座標とある溶媒の座標と距離を見積もる下式(1)を作成し、下式(1)で表わされるRを、含フッ素共重合体(A)に対する溶解指標とする。
R=4×(δd-15.7)2+(δp-5.7)2+(δh-4.3)2・・・(1)。
ただし、δd、δp及びδhは、それぞれ、溶媒のハンセン溶解度パラメータにおける分散項、極性項及び水素結合項[(MPa)1/2]である。 Specifically, an expression well known as an expression for obtaining the distance Ra between two points in the three-dimensional space of the Hansen solubility parameter,
Based on (Ra) 2 = 4 × (δd2−δd1) 2 + (δp2−δp1) 2 + (δh2−δh1) 2 , the coordinates of diisopropyl ketone and the coordinates and distance of a solvent are estimated by the following formula (1) And R represented by the following formula (1) is used as a solubility index for the fluorinated copolymer (A).
R = 4 × (δd−15.7) 2 + (δp−5.7) 2 + (δh−4.3) 2 (1).
However, δd, δp, and δh are a dispersion term, a polar term, and a hydrogen bond term [(MPa) 1/2 ] in the Hansen solubility parameter of the solvent, respectively.
媒体(C)としては、溶解指標(R)が49未満のものが好ましく、36未満のものがより好ましい。溶解指標(R)が該範囲内である媒体(C)は、含フッ素共重合体(A)との親和性が高く、含フッ素共重合体(A)の溶解性及び分散性が高くなる。
媒体(C)が2種以上の溶媒を組み合わせた混合溶媒の場合であっても、溶解指標(R)を、含フッ素共重合体(A)に対する溶解指標とすることができる。たとえば、混合溶媒の混合比(体積比)から平均のハンセン溶解度パラメータを求め、該平均値から溶解指標(R)を算出する。 The medium (C) preferably has a solubility index (R) of less than 49, more preferably less than 36. The medium (C) having the solubility index (R) within this range has high affinity with the fluorinated copolymer (A), and the solubility and dispersibility of the fluorinated copolymer (A) are increased.
Even when the medium (C) is a mixed solvent in which two or more solvents are combined, the solubility index (R) can be used as a solubility index for the fluorinated copolymer (A). For example, an average Hansen solubility parameter is obtained from the mixing ratio (volume ratio) of the mixed solvent, and the dissolution index (R) is calculated from the average value.
媒体(C)が2種以上の溶媒を組み合わせた混合溶媒の場合であっても、溶解指標(R)を、含フッ素共重合体(A)に対する溶解指標とすることができる。たとえば、混合溶媒の混合比(体積比)から平均のハンセン溶解度パラメータを求め、該平均値から溶解指標(R)を算出する。 The medium (C) preferably has a solubility index (R) of less than 49, more preferably less than 36. The medium (C) having the solubility index (R) within this range has high affinity with the fluorinated copolymer (A), and the solubility and dispersibility of the fluorinated copolymer (A) are increased.
Even when the medium (C) is a mixed solvent in which two or more solvents are combined, the solubility index (R) can be used as a solubility index for the fluorinated copolymer (A). For example, an average Hansen solubility parameter is obtained from the mixing ratio (volume ratio) of the mixed solvent, and the dissolution index (R) is calculated from the average value.
媒体(C)として用い得る溶媒としては、炭素数3~10のケトン類、エステル類、カーボネート類、エーテル類若しくはニトリル類、少なくとも2つ以上のフッ素原子を有する含フッ素芳香族化合物類若しくは複素環化合物類(含フッ素ベンゾニトリル、含フッ素安息香酸若しくはそのエステル、含フッ素ニトロベンゼン、含フッ素フェニルアルキルアルコール、含フッ素フェノールのエステル、含フッ素芳香族ケトン、含フッ素芳香族エーテル、含フッ素ピリジン化合物、含フッ素芳香族カーボネート、ペルフルオロアルキル置換ベンゼン、ペルフルオロベンゼン、安息香酸のポリフルオロアルキルエステル、フタル酸のポリフルオロアルキルエステル等)、ヒドロフルオロカーボン類、ヒドロフルオロエーテル類、ヒドロフルオロアルコール類等が挙げられる。好ましくは、炭素数3~10のケトン類若しくはエステル類、含フッ素芳香族化合物類である。
Examples of the solvent that can be used as the medium (C) include ketones having 3 to 10 carbon atoms, esters, carbonates, ethers, or nitriles, fluorine-containing aromatic compounds having at least two fluorine atoms, or heterocyclic rings. Compounds (fluorinated benzonitrile, fluorine-containing benzoic acid or ester, fluorine-containing nitrobenzene, fluorine-containing phenyl alkyl alcohol, fluorine-containing phenol ester, fluorine-containing aromatic ketone, fluorine-containing aromatic ether, fluorine-containing pyridine compound, Fluoroaromatic carbonate, perfluoroalkyl-substituted benzene, perfluorobenzene, polyfluoroalkyl ester of benzoic acid, polyfluoroalkyl ester of phthalic acid, etc.), hydrofluorocarbons, hydrofluoroethers, hydrofluoroa Call, and the like can be mentioned. Preferred are ketones or esters having 3 to 10 carbon atoms and fluorine-containing aromatic compounds.
溶解指標(R)が49未満である媒体(C)としては、具体的には、下記の溶媒が挙げられる。
Specific examples of the medium (C) having a dissolution index (R) of less than 49 include the following solvents.
媒体(C)としては、含フッ素共重合体(A)との親和性が高く、含フッ素共重合体(A)の溶解性及び分散性が充分に高い点から、下記の溶媒が好ましい。
メチルエチルケトン、2-ペンタノン、メチルイソプロピルケトン、2-ヘキサノン、メチルイソブチルケトン、ピナコリン、2-ヘプタノン、4-ヘプタノン、ジイソピロピルケトン、イソアミルメチルケトン、2-オクタノン、2-ノナノン、ジイソブチルケトン、シクロヘキサノン、2-メチルシクロヘキサノン、3-メチルシクロヘキサノン、4-エチルシクロヘキサノン、2,6-ジメチルシクロヘキサノン、3,3,5-トリメチルシクロヘキサノン、シクロヘプタノン、イソホロン、(-)-フェンコン、ギ酸プロピル、ギ酸イソプロピル、ギ酸ブチル、ギ酸イソブチル、ギ酸sec-ブチル、ギ酸アミル、ギ酸イソアミル、ギ酸ヘキシル、ギ酸ヘプチル、ギ酸オクチル、ギ酸2-エチルヘキシル、酢酸エチル、酢酸プロピル、酢酸イソプロピル、酢酸ブチル、酢酸イソブチル、酢酸sec-ブチル、酢酸アミル、酢酸イソアミル、酢酸ヘキシル、酢酸シクロヘキシル、酢酸ヘプチル、酢酸2,2,2-トリフルオロエチル、酢酸2,2,3,3-テトラフルオロプロピル、酢酸2,2,3,3,3-ペンタフルオロプロピル、酢酸1,1,1,3,3,3-ヘキサフルオロ-2-プロピル、酢酸2,2-ビス(トリフルオロメチル)プロピル、酢酸2,2,3,3,4,4,4-ヘプタフルオロブチル、酢酸2,2,3,4,4,4-ヘキサフルオロブチル、酢酸2,2,3,3,4,4,5,5,5-ノナフルオロペンチル、酢酸2,2,3,3,4,4,5,5-オクタフルオロペンチル、酢酸3,3,4,4,5,5,6,6,6-ノナフルオロヘキシル、酢酸4,4,5,5,6,6,7,7,7-ノナフルオロヘプチル、酢酸2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロヘプチル、プロピオン酸メチル、プロピオン酸エチル、プロピオン酸プロピル、プロピオン酸イソプロピル、プロピオン酸ブチル、プロピオン酸イソブチル、プロピオン酸sec-ブチル、プロピオン酸t-ブチル、プロピオン酸アミル、プロピオン酸イソアミル、プロピオン酸ヘキシル、プロピオン酸シクロヘキシル、酪酸メチル、酪酸エチル、酪酸プロピル、酪酸イソプロピル、酪酸ブチル、酪酸イソブチル、酪酸sec-ブチル、酪酸t-ブチル、酪酸アミル、酪酸イソアミル、イソ酪酸メチル、イソ酪酸エチル、イソ酪酸プロピル、イソ酪酸イソプロピル、イソ酪酸ブチル、イソ酪酸イソブチル、イソ酪酸sec-ブチル、イソ酪酸t-ブチル、イソ酪酸アミル、イソ酪酸イソアミル、吉草酸メチル、吉草酸エチル、吉草酸プロピル、吉草酸イソプロピル、吉草酸ブチル、吉草酸イソブチル、吉草酸sec-ブチル、吉草酸t-ブチル、イソ吉草酸メチル、イソ吉草酸エチル、イソ吉草酸プロピル、イソ吉草酸イソプロピル、イソ吉草酸ブチル、イソ吉草酸イソブチル、イソ吉草酸sec-ブチル、イソ吉草酸t-ブチル、ヘキサン酸メチル、ヘキサン酸エチル、ヘキサン酸プロピル、ヘキサン酸イソプロピル、ヘプタン酸メチル、ヘプタン酸エチル、オクタン酸メチル、シクロヘキサンカルボン酸メチル、シクロヘキサンカルボン酸エチル、シクロヘキサンカルボン酸2,2,2-トリフルオロエチル、こはく酸ビス(2,2,2-トリフルオロエチル)、グルタル酸ビス(2,2,2-トリフルオロエチル)、トリフルオロ酢酸エチル、トリフルオロ酢酸プロピル、トリフルオロ酢酸イソプロピル、トリフルオロ酢酸ブチル、トリフルオロ酢酸イソブチル、トリフルオロ酢酸sec-ブチル、トリフルオロ酢酸t-ブチル、トリフルオロ酢酸アミル、トリフルオロ酢酸イソアミル、トリフルオロ酢酸ヘキシル、トリフルオロ酢酸シクロヘキシル、トリフルオロ酢酸ヘプチル、ジフルオロ酢酸エチル、ペルフルオロプロピオン酸エチル、ペルフルオロブタン酸メチル、ペルフルオロブタン酸エチル、ペルフルオロペンタン酸メチル、ペルフルオロペンタン酸エチル、2,2,3,3,4,4,5,5-オクタフルオロペンタン酸メチル、2,2,3,3,4,4,5,5-オクタフルオロペンタン酸エチル、ペルフルオロヘプタン酸メチル、ペルフルオロヘプタン酸エチル、2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロヘプタン酸メチル、2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロヘプタン酸エチル、2-トリフルオロメチル-3,3,3-トリフルオロプロピオン酸メチル、2-トリフルオロメチル-3,3,3-トリフルオロプロピオン酸エチル、酢酸2-プロポキシエチル、酢酸2-ブトキシエチル、酢酸2-ペンチルオキシエチル、1-メトキシ-2-アセトキシプロパン、1-エトキシ-2-アセトキシプロパン、1-プロポキシ-2-アセトキシプロパン、1-ブトキシ-2-アセトキシプロパン、酢酸3-メトキシブチル、酢酸3-エトキシブチル、酢酸3-プロポキシブチル、酢酸3-メトキシ-3-メチルブチル、酢酸3-エトキシ-3-メチルブチル、酢酸4-メトキシブチル、酢酸4-エトキシブチル、酢酸4-プロポキシブチル、炭酸ジエチル、炭酸ジプロピル、炭酸ジブチル、ビス(2,2,2-トリフルオロエチル)カーボネート、ビス(2,2,3,3-テトラフルオロプロピル)カーボネート、テトラヒドロフラン、ブチロニトリル、イソブチロニトリル、バレロニトリル、イソバレロニトリル、カプロニトリル、イソカプロニトリル、ヘプタンニトリル、オクタンニトリル、ノナンニトリル、3-(トリフルオロメチル)ベンゾニトリル、ペンタフルオロ安息香酸メチル、ペンタフルオロ安息香酸エチル、3-(トリフルオロメチル)安息香酸メチル、4-(トリフルオロメチル)安息香酸メチル、3,5-ビス(トリフルオロメチル)安息香酸メチル、1-(ペンタフルオロフェニル)エタノール、ギ酸ペンタフルオロフェニル、酢酸ペンタフルオロフェニル、プロパン酸ペンタフルオロフェニル、ブタン酸ペンタフルオロフェニル、ペンタン酸ペンタフルオロフェニル、2’,3’,4’,5’,6’-ペンタフルオロアセトフェノン、3’,5’-ビス(トリフルオロメチル)アセトフェノン、3’-(トリフルオロメチル)アセトフェノン、ペンタフルオロアニソール、3,5-ビス(トリフルオロメチル)アニソール、ペンタフルオロピリジン、4-クロロベンゾトリフルオリド、1,3-ビス(トリフルオロメチル)ベンゼン、安息香酸2,2,2-トリフルオロエチル、安息香酸2,2,3,3-テトラフルオロプロピル、安息香酸2,2,3,3,3-ペンタフルオロプロピル、安息香酸1,1,1,3,3,3-ヘキサフルオロ-2-プロピル、安息香酸2,2-ビス(トリフルオロメチル)プロピル、安息香酸2,2,3,3,4,4,4-ヘプタフルオロブチル、安息香酸2,2,3,4,4,4-ヘキサフルオロブチル、安息香酸2,2,3,3,4,4,5,5,5-ノナフルオロペンチル、安息香酸2,2,3,3,4,4,5,5-オクタフルオロペンチル、フタル酸ビス(2,2,2-トリフルオロエチル)、5-(ペルフルオロブチル)ビシクロ[2.2.1]-2-ヘプテン、5-(ペルフルオロブチル)ビシクロ[2.2.1]ヘプタン、1,1,2,2,3,3,4-ヘプタフルオロシクロペンタン、1,1,1,2,3,3-ヘキサフルオロ-4-(1,1,2,3,3,3-ヘキサフルオロプロポキシ)ペンタン、2,2,3,4,4,4-ヘキサフルオロ-1-ブタノール、2,2,3,3,4,4,5,5-オクタフルオロ-1-ペンタノール、2,2-ビス(トリフルオロメチル)-1-プロパノール、3,3,4,4,5,5,6,6,6-ノナフルオロ-1-ヘキサノール、2,3,3,3-テトラフルオロ-2-(ペルフルオロプロピルオキシ)-1-プロパノール、4,4,5,5,6,6,7,7,7-ノナフルオロ-1-ヘプタノール、2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロ-1-ヘプタノール、3,3,4,4,5,5,6,6,7,7,8,8,8-トリデカフルオロ-1-オクタノール、7,7,8,8,8-ペンタフルオロ-1-オクタノール、4,4,5,5,6,6,7,7,8,8,9,9,9-トリデカフルオロ-1-ノナノール、7,8,8,8-テトラフルオロ-7-(トリフルオロメチル)-1-オクタノール。 As the medium (C), the following solvents are preferable from the viewpoint of high affinity with the fluorinated copolymer (A) and sufficiently high solubility and dispersibility of the fluorinated copolymer (A).
Methyl ethyl ketone, 2-pentanone, methyl isopropyl ketone, 2-hexanone, methyl isobutyl ketone, pinacholine, 2-heptanone, 4-heptanone, diisopyrrole ketone, isoamyl methyl ketone, 2-octanone, 2-nonanone, diisobutyl ketone, cyclohexanone 2-methylcyclohexanone, 3-methylcyclohexanone, 4-ethylcyclohexanone, 2,6-dimethylcyclohexanone, 3,3,5-trimethylcyclohexanone, cycloheptanone, isophorone, (-)-fencon, propyl formate, isopropyl formate, Butyl formate, isobutyl formate, sec-butyl formate, amyl formate, isoamyl formate, hexyl formate, heptyl formate, octyl formate, 2-ethylhexyl formate, ethyl acetate, propyl acetate Isopropyl acetate, butyl acetate, isobutyl acetate, sec-butyl acetate, amyl acetate, isoamyl acetate, hexyl acetate, cyclohexyl acetate, heptyl acetate, 2,2,2-trifluoroethyl acetate, 2,2,3,3-tetraacetate Fluoropropyl, 2,2,3,3,3-pentafluoropropyl acetate, 1,1,1,3,3,3-hexafluoro-2-propyl acetate, 2,2-bis (trifluoromethyl) propyl acetate 2,2,3,3,4,4,4-heptafluorobutyl acetate, 2,2,3,4,4,4-hexafluorobutyl acetate, 2,2,3,3,4,4, acetic acid 5,5,5-nonafluoropentyl, acetic acid 2,2,3,3,4,4,5,5-octafluoropentyl, acetic acid 3,3,4,4,5,5,6,6,6- Nonafluorohexyl, Acid 4,4,5,5,6,6,7,7,7-nonafluoroheptyl, acetic acid 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoro Heptyl, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, butyl propionate, isobutyl propionate, sec-butyl propionate, t-butyl propionate, amyl propionate, isoamyl propionate, hexyl propionate, Cyclohexyl propionate, methyl butyrate, ethyl butyrate, propyl butyrate, isopropyl butyrate, butyl butyrate, isobutyl butyrate, sec-butyl butyrate, t-butyl butyrate, amyl butyrate, isoamyl butyrate, methyl isobutyrate, ethyl isobutyrate, propyl isobutyrate, Isopropyl isobutyrate, butyl isobutyrate, isobutyrate isobutyrate , Sec-butyl isobutyrate, t-butyl isobutyrate, amyl isobutyrate, isoamyl isobutyrate, methyl valerate, ethyl valerate, propyl valerate, isopropyl valerate, butyl valerate, isobutyl valerate, sec-valerate Butyl, t-butyl valerate, methyl isovalerate, ethyl isovalerate, propyl isovalerate, isopropyl isovalerate, butyl isovalerate, isobutyl isovalerate, sec-butyl isovalerate, t-isovalerate Butyl, methyl hexanoate, ethyl hexanoate, propyl hexanoate, isopropyl hexanoate, methyl heptanoate, ethyl heptanoate, methyl octoate, methyl cyclohexanecarboxylate, ethyl cyclohexanecarboxylate, cyclohexanecarboxylic acid 2,2,2-tri Fluoroethyl, bis succinate (2,2,2 Trifluoroethyl), bis (2,2,2-trifluoroethyl) glutarate, ethyl trifluoroacetate, propyl trifluoroacetate, isopropyl trifluoroacetate, butyl trifluoroacetate, isobutyl trifluoroacetate, sec-trifluoroacetic acid sec- Butyl, t-butyl trifluoroacetate, amyl trifluoroacetate, isoamyl trifluoroacetate, hexyl trifluoroacetate, cyclohexyl trifluoroacetate, heptyl trifluoroacetate, ethyl difluoroacetate, ethyl perfluoropropionate, methyl perfluorobutanoate, perfluorobutane Ethyl acetate, methyl perfluoropentanoate, ethyl perfluoropentanoate, methyl 2,2,3,3,4,4,5,5-octafluoropentanoate, 2,2,3,3,4,4,5,5 Ethyl octafluoropentanoate, methyl perfluoroheptanoate, ethyl perfluoroheptanoate, methyl 2,2,3,3,4,5,5,6,6,7,7-dodecafluoroheptanoate, 2,2, 3,3,4,4,5,5,6,6,7,7-ethyl dodecafluoroheptanoate, methyl 2-trifluoromethyl-3,3,3-trifluoropropionate, 2-trifluoromethyl- Ethyl 3,3,3-trifluoropropionate, 2-propoxyethyl acetate, 2-butoxyethyl acetate, 2-pentyloxyethyl acetate, 1-methoxy-2-acetoxypropane, 1-ethoxy-2-acetoxypropane, 1 -Propoxy-2-acetoxypropane, 1-butoxy-2-acetoxypropane, 3-methoxybutyl acetate, 3-ethoxybutylacetate , 3-propoxybutyl acetate, 3-methoxy-3-methylbutyl acetate, 3-ethoxy-3-methylbutyl acetate, 4-methoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, diethyl carbonate, dipropyl carbonate, Dibutyl carbonate, bis (2,2,2-trifluoroethyl) carbonate, bis (2,2,3,3-tetrafluoropropyl) carbonate, tetrahydrofuran, butyronitrile, isobutyronitrile, valeronitrile, isovaleronitrile, capronitrile , Isocapronitrile, heptanenitrile, octanenitrile, nonanenitrile, 3- (trifluoromethyl) benzonitrile, methyl pentafluorobenzoate, ethyl pentafluorobenzoate, methyl 3- (trifluoromethyl) benzoate, 4- (bird Fluoromethyl) methyl benzoate, methyl 3,5-bis (trifluoromethyl) benzoate, 1- (pentafluorophenyl) ethanol, pentafluorophenyl formate, pentafluorophenyl acetate, pentafluorophenyl propanoate, pentafluorophenyl butanoate Pentafluorophenyl pentanoate, 2 ′, 3 ′, 4 ′, 5 ′, 6′-pentafluoroacetophenone, 3 ′, 5′-bis (trifluoromethyl) acetophenone, 3 ′-(trifluoromethyl) acetophenone, Pentafluoroanisole, 3,5-bis (trifluoromethyl) anisole, pentafluoropyridine, 4-chlorobenzotrifluoride, 1,3-bis (trifluoromethyl) benzene, 2,2,2-trifluoroethyl benzoate Benzoic acid 2,2,3,3-teto Lafluoropropyl, benzoic acid 2,2,3,3,3-pentafluoropropyl, benzoic acid 1,1,1,3,3,3-hexafluoro-2-propyl, benzoic acid 2,2-bis (tri Fluoromethyl) propyl, benzoic acid 2,2,3,3,4,4,4-heptafluorobutyl, benzoic acid 2,2,3,4,4,4-hexafluorobutyl, benzoic acid 2,2,3 , 3,4,4,5,5,5-nonafluoropentyl, benzoic acid 2,2,3,3,4,4,5,5-octafluoropentyl, bis (2,2,2-triphthalate) Fluoroethyl), 5- (perfluorobutyl) bicyclo [2.2.1] -2-heptene, 5- (perfluorobutyl) bicyclo [2.2.1] heptane, 1,1,2,2,3,3 , 4-Heptafluorocyclopentane, 1,1,1 2,3,3-hexafluoro-4- (1,1,2,3,3,3-hexafluoropropoxy) pentane, 2,2,3,4,4,4-hexafluoro-1-butanol, 2 , 2,3,3,4,4,5,5-octafluoro-1-pentanol, 2,2-bis (trifluoromethyl) -1-propanol, 3,3,4,4,5,5 6,6,6-nonafluoro-1-hexanol, 2,3,3,3-tetrafluoro-2- (perfluoropropyloxy) -1-propanol, 4,4,5,5,6,6,7,7 , 7-nonafluoro-1-heptanol, 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoro-1-heptanol, 3,3,4,4,5 5,6,6,7,7,8,8,8-tridecafluoro-1-octanol, 7 7,8,8,8-pentafluoro-1-octanol, 4,4,5,5,6,6,7,7,8,8,9,9,9-tridecafluoro-1-nonanol, 7 , 8,8,8-Tetrafluoro-7- (trifluoromethyl) -1-octanol.
メチルエチルケトン、2-ペンタノン、メチルイソプロピルケトン、2-ヘキサノン、メチルイソブチルケトン、ピナコリン、2-ヘプタノン、4-ヘプタノン、ジイソピロピルケトン、イソアミルメチルケトン、2-オクタノン、2-ノナノン、ジイソブチルケトン、シクロヘキサノン、2-メチルシクロヘキサノン、3-メチルシクロヘキサノン、4-エチルシクロヘキサノン、2,6-ジメチルシクロヘキサノン、3,3,5-トリメチルシクロヘキサノン、シクロヘプタノン、イソホロン、(-)-フェンコン、ギ酸プロピル、ギ酸イソプロピル、ギ酸ブチル、ギ酸イソブチル、ギ酸sec-ブチル、ギ酸アミル、ギ酸イソアミル、ギ酸ヘキシル、ギ酸ヘプチル、ギ酸オクチル、ギ酸2-エチルヘキシル、酢酸エチル、酢酸プロピル、酢酸イソプロピル、酢酸ブチル、酢酸イソブチル、酢酸sec-ブチル、酢酸アミル、酢酸イソアミル、酢酸ヘキシル、酢酸シクロヘキシル、酢酸ヘプチル、酢酸2,2,2-トリフルオロエチル、酢酸2,2,3,3-テトラフルオロプロピル、酢酸2,2,3,3,3-ペンタフルオロプロピル、酢酸1,1,1,3,3,3-ヘキサフルオロ-2-プロピル、酢酸2,2-ビス(トリフルオロメチル)プロピル、酢酸2,2,3,3,4,4,4-ヘプタフルオロブチル、酢酸2,2,3,4,4,4-ヘキサフルオロブチル、酢酸2,2,3,3,4,4,5,5,5-ノナフルオロペンチル、酢酸2,2,3,3,4,4,5,5-オクタフルオロペンチル、酢酸3,3,4,4,5,5,6,6,6-ノナフルオロヘキシル、酢酸4,4,5,5,6,6,7,7,7-ノナフルオロヘプチル、酢酸2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロヘプチル、プロピオン酸メチル、プロピオン酸エチル、プロピオン酸プロピル、プロピオン酸イソプロピル、プロピオン酸ブチル、プロピオン酸イソブチル、プロピオン酸sec-ブチル、プロピオン酸t-ブチル、プロピオン酸アミル、プロピオン酸イソアミル、プロピオン酸ヘキシル、プロピオン酸シクロヘキシル、酪酸メチル、酪酸エチル、酪酸プロピル、酪酸イソプロピル、酪酸ブチル、酪酸イソブチル、酪酸sec-ブチル、酪酸t-ブチル、酪酸アミル、酪酸イソアミル、イソ酪酸メチル、イソ酪酸エチル、イソ酪酸プロピル、イソ酪酸イソプロピル、イソ酪酸ブチル、イソ酪酸イソブチル、イソ酪酸sec-ブチル、イソ酪酸t-ブチル、イソ酪酸アミル、イソ酪酸イソアミル、吉草酸メチル、吉草酸エチル、吉草酸プロピル、吉草酸イソプロピル、吉草酸ブチル、吉草酸イソブチル、吉草酸sec-ブチル、吉草酸t-ブチル、イソ吉草酸メチル、イソ吉草酸エチル、イソ吉草酸プロピル、イソ吉草酸イソプロピル、イソ吉草酸ブチル、イソ吉草酸イソブチル、イソ吉草酸sec-ブチル、イソ吉草酸t-ブチル、ヘキサン酸メチル、ヘキサン酸エチル、ヘキサン酸プロピル、ヘキサン酸イソプロピル、ヘプタン酸メチル、ヘプタン酸エチル、オクタン酸メチル、シクロヘキサンカルボン酸メチル、シクロヘキサンカルボン酸エチル、シクロヘキサンカルボン酸2,2,2-トリフルオロエチル、こはく酸ビス(2,2,2-トリフルオロエチル)、グルタル酸ビス(2,2,2-トリフルオロエチル)、トリフルオロ酢酸エチル、トリフルオロ酢酸プロピル、トリフルオロ酢酸イソプロピル、トリフルオロ酢酸ブチル、トリフルオロ酢酸イソブチル、トリフルオロ酢酸sec-ブチル、トリフルオロ酢酸t-ブチル、トリフルオロ酢酸アミル、トリフルオロ酢酸イソアミル、トリフルオロ酢酸ヘキシル、トリフルオロ酢酸シクロヘキシル、トリフルオロ酢酸ヘプチル、ジフルオロ酢酸エチル、ペルフルオロプロピオン酸エチル、ペルフルオロブタン酸メチル、ペルフルオロブタン酸エチル、ペルフルオロペンタン酸メチル、ペルフルオロペンタン酸エチル、2,2,3,3,4,4,5,5-オクタフルオロペンタン酸メチル、2,2,3,3,4,4,5,5-オクタフルオロペンタン酸エチル、ペルフルオロヘプタン酸メチル、ペルフルオロヘプタン酸エチル、2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロヘプタン酸メチル、2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロヘプタン酸エチル、2-トリフルオロメチル-3,3,3-トリフルオロプロピオン酸メチル、2-トリフルオロメチル-3,3,3-トリフルオロプロピオン酸エチル、酢酸2-プロポキシエチル、酢酸2-ブトキシエチル、酢酸2-ペンチルオキシエチル、1-メトキシ-2-アセトキシプロパン、1-エトキシ-2-アセトキシプロパン、1-プロポキシ-2-アセトキシプロパン、1-ブトキシ-2-アセトキシプロパン、酢酸3-メトキシブチル、酢酸3-エトキシブチル、酢酸3-プロポキシブチル、酢酸3-メトキシ-3-メチルブチル、酢酸3-エトキシ-3-メチルブチル、酢酸4-メトキシブチル、酢酸4-エトキシブチル、酢酸4-プロポキシブチル、炭酸ジエチル、炭酸ジプロピル、炭酸ジブチル、ビス(2,2,2-トリフルオロエチル)カーボネート、ビス(2,2,3,3-テトラフルオロプロピル)カーボネート、テトラヒドロフラン、ブチロニトリル、イソブチロニトリル、バレロニトリル、イソバレロニトリル、カプロニトリル、イソカプロニトリル、ヘプタンニトリル、オクタンニトリル、ノナンニトリル、3-(トリフルオロメチル)ベンゾニトリル、ペンタフルオロ安息香酸メチル、ペンタフルオロ安息香酸エチル、3-(トリフルオロメチル)安息香酸メチル、4-(トリフルオロメチル)安息香酸メチル、3,5-ビス(トリフルオロメチル)安息香酸メチル、1-(ペンタフルオロフェニル)エタノール、ギ酸ペンタフルオロフェニル、酢酸ペンタフルオロフェニル、プロパン酸ペンタフルオロフェニル、ブタン酸ペンタフルオロフェニル、ペンタン酸ペンタフルオロフェニル、2’,3’,4’,5’,6’-ペンタフルオロアセトフェノン、3’,5’-ビス(トリフルオロメチル)アセトフェノン、3’-(トリフルオロメチル)アセトフェノン、ペンタフルオロアニソール、3,5-ビス(トリフルオロメチル)アニソール、ペンタフルオロピリジン、4-クロロベンゾトリフルオリド、1,3-ビス(トリフルオロメチル)ベンゼン、安息香酸2,2,2-トリフルオロエチル、安息香酸2,2,3,3-テトラフルオロプロピル、安息香酸2,2,3,3,3-ペンタフルオロプロピル、安息香酸1,1,1,3,3,3-ヘキサフルオロ-2-プロピル、安息香酸2,2-ビス(トリフルオロメチル)プロピル、安息香酸2,2,3,3,4,4,4-ヘプタフルオロブチル、安息香酸2,2,3,4,4,4-ヘキサフルオロブチル、安息香酸2,2,3,3,4,4,5,5,5-ノナフルオロペンチル、安息香酸2,2,3,3,4,4,5,5-オクタフルオロペンチル、フタル酸ビス(2,2,2-トリフルオロエチル)、5-(ペルフルオロブチル)ビシクロ[2.2.1]-2-ヘプテン、5-(ペルフルオロブチル)ビシクロ[2.2.1]ヘプタン、1,1,2,2,3,3,4-ヘプタフルオロシクロペンタン、1,1,1,2,3,3-ヘキサフルオロ-4-(1,1,2,3,3,3-ヘキサフルオロプロポキシ)ペンタン、2,2,3,4,4,4-ヘキサフルオロ-1-ブタノール、2,2,3,3,4,4,5,5-オクタフルオロ-1-ペンタノール、2,2-ビス(トリフルオロメチル)-1-プロパノール、3,3,4,4,5,5,6,6,6-ノナフルオロ-1-ヘキサノール、2,3,3,3-テトラフルオロ-2-(ペルフルオロプロピルオキシ)-1-プロパノール、4,4,5,5,6,6,7,7,7-ノナフルオロ-1-ヘプタノール、2,2,3,3,4,4,5,5,6,6,7,7-ドデカフルオロ-1-ヘプタノール、3,3,4,4,5,5,6,6,7,7,8,8,8-トリデカフルオロ-1-オクタノール、7,7,8,8,8-ペンタフルオロ-1-オクタノール、4,4,5,5,6,6,7,7,8,8,9,9,9-トリデカフルオロ-1-ノナノール、7,8,8,8-テトラフルオロ-7-(トリフルオロメチル)-1-オクタノール。 As the medium (C), the following solvents are preferable from the viewpoint of high affinity with the fluorinated copolymer (A) and sufficiently high solubility and dispersibility of the fluorinated copolymer (A).
Methyl ethyl ketone, 2-pentanone, methyl isopropyl ketone, 2-hexanone, methyl isobutyl ketone, pinacholine, 2-heptanone, 4-heptanone, diisopyrrole ketone, isoamyl methyl ketone, 2-octanone, 2-nonanone, diisobutyl ketone, cyclohexanone 2-methylcyclohexanone, 3-methylcyclohexanone, 4-ethylcyclohexanone, 2,6-dimethylcyclohexanone, 3,3,5-trimethylcyclohexanone, cycloheptanone, isophorone, (-)-fencon, propyl formate, isopropyl formate, Butyl formate, isobutyl formate, sec-butyl formate, amyl formate, isoamyl formate, hexyl formate, heptyl formate, octyl formate, 2-ethylhexyl formate, ethyl acetate, propyl acetate Isopropyl acetate, butyl acetate, isobutyl acetate, sec-butyl acetate, amyl acetate, isoamyl acetate, hexyl acetate, cyclohexyl acetate, heptyl acetate, 2,2,2-trifluoroethyl acetate, 2,2,3,3-tetraacetate Fluoropropyl, 2,2,3,3,3-pentafluoropropyl acetate, 1,1,1,3,3,3-hexafluoro-2-propyl acetate, 2,2-bis (trifluoromethyl) propyl acetate 2,2,3,3,4,4,4-heptafluorobutyl acetate, 2,2,3,4,4,4-hexafluorobutyl acetate, 2,2,3,3,4,4, acetic acid 5,5,5-nonafluoropentyl, acetic acid 2,2,3,3,4,4,5,5-octafluoropentyl, acetic acid 3,3,4,4,5,5,6,6,6- Nonafluorohexyl, Acid 4,4,5,5,6,6,7,7,7-nonafluoroheptyl, acetic acid 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoro Heptyl, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, butyl propionate, isobutyl propionate, sec-butyl propionate, t-butyl propionate, amyl propionate, isoamyl propionate, hexyl propionate, Cyclohexyl propionate, methyl butyrate, ethyl butyrate, propyl butyrate, isopropyl butyrate, butyl butyrate, isobutyl butyrate, sec-butyl butyrate, t-butyl butyrate, amyl butyrate, isoamyl butyrate, methyl isobutyrate, ethyl isobutyrate, propyl isobutyrate, Isopropyl isobutyrate, butyl isobutyrate, isobutyrate isobutyrate , Sec-butyl isobutyrate, t-butyl isobutyrate, amyl isobutyrate, isoamyl isobutyrate, methyl valerate, ethyl valerate, propyl valerate, isopropyl valerate, butyl valerate, isobutyl valerate, sec-valerate Butyl, t-butyl valerate, methyl isovalerate, ethyl isovalerate, propyl isovalerate, isopropyl isovalerate, butyl isovalerate, isobutyl isovalerate, sec-butyl isovalerate, t-isovalerate Butyl, methyl hexanoate, ethyl hexanoate, propyl hexanoate, isopropyl hexanoate, methyl heptanoate, ethyl heptanoate, methyl octoate, methyl cyclohexanecarboxylate, ethyl cyclohexanecarboxylate, cyclohexanecarboxylic acid 2,2,2-tri Fluoroethyl, bis succinate (2,2,2 Trifluoroethyl), bis (2,2,2-trifluoroethyl) glutarate, ethyl trifluoroacetate, propyl trifluoroacetate, isopropyl trifluoroacetate, butyl trifluoroacetate, isobutyl trifluoroacetate, sec-trifluoroacetic acid sec- Butyl, t-butyl trifluoroacetate, amyl trifluoroacetate, isoamyl trifluoroacetate, hexyl trifluoroacetate, cyclohexyl trifluoroacetate, heptyl trifluoroacetate, ethyl difluoroacetate, ethyl perfluoropropionate, methyl perfluorobutanoate, perfluorobutane Ethyl acetate, methyl perfluoropentanoate, ethyl perfluoropentanoate, methyl 2,2,3,3,4,4,5,5-octafluoropentanoate, 2,2,3,3,4,4,5,5 Ethyl octafluoropentanoate, methyl perfluoroheptanoate, ethyl perfluoroheptanoate, methyl 2,2,3,3,4,5,5,6,6,7,7-dodecafluoroheptanoate, 2,2, 3,3,4,4,5,5,6,6,7,7-ethyl dodecafluoroheptanoate, methyl 2-trifluoromethyl-3,3,3-trifluoropropionate, 2-trifluoromethyl- Ethyl 3,3,3-trifluoropropionate, 2-propoxyethyl acetate, 2-butoxyethyl acetate, 2-pentyloxyethyl acetate, 1-methoxy-2-acetoxypropane, 1-ethoxy-2-acetoxypropane, 1 -Propoxy-2-acetoxypropane, 1-butoxy-2-acetoxypropane, 3-methoxybutyl acetate, 3-ethoxybutylacetate , 3-propoxybutyl acetate, 3-methoxy-3-methylbutyl acetate, 3-ethoxy-3-methylbutyl acetate, 4-methoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, diethyl carbonate, dipropyl carbonate, Dibutyl carbonate, bis (2,2,2-trifluoroethyl) carbonate, bis (2,2,3,3-tetrafluoropropyl) carbonate, tetrahydrofuran, butyronitrile, isobutyronitrile, valeronitrile, isovaleronitrile, capronitrile , Isocapronitrile, heptanenitrile, octanenitrile, nonanenitrile, 3- (trifluoromethyl) benzonitrile, methyl pentafluorobenzoate, ethyl pentafluorobenzoate, methyl 3- (trifluoromethyl) benzoate, 4- (bird Fluoromethyl) methyl benzoate, methyl 3,5-bis (trifluoromethyl) benzoate, 1- (pentafluorophenyl) ethanol, pentafluorophenyl formate, pentafluorophenyl acetate, pentafluorophenyl propanoate, pentafluorophenyl butanoate Pentafluorophenyl pentanoate, 2 ′, 3 ′, 4 ′, 5 ′, 6′-pentafluoroacetophenone, 3 ′, 5′-bis (trifluoromethyl) acetophenone, 3 ′-(trifluoromethyl) acetophenone, Pentafluoroanisole, 3,5-bis (trifluoromethyl) anisole, pentafluoropyridine, 4-chlorobenzotrifluoride, 1,3-bis (trifluoromethyl) benzene, 2,2,2-trifluoroethyl benzoate Benzoic acid 2,2,3,3-teto Lafluoropropyl, benzoic acid 2,2,3,3,3-pentafluoropropyl, benzoic acid 1,1,1,3,3,3-hexafluoro-2-propyl, benzoic acid 2,2-bis (tri Fluoromethyl) propyl, benzoic acid 2,2,3,3,4,4,4-heptafluorobutyl, benzoic acid 2,2,3,4,4,4-hexafluorobutyl, benzoic acid 2,2,3 , 3,4,4,5,5,5-nonafluoropentyl, benzoic acid 2,2,3,3,4,4,5,5-octafluoropentyl, bis (2,2,2-triphthalate) Fluoroethyl), 5- (perfluorobutyl) bicyclo [2.2.1] -2-heptene, 5- (perfluorobutyl) bicyclo [2.2.1] heptane, 1,1,2,2,3,3 , 4-Heptafluorocyclopentane, 1,1,1 2,3,3-hexafluoro-4- (1,1,2,3,3,3-hexafluoropropoxy) pentane, 2,2,3,4,4,4-hexafluoro-1-butanol, 2 , 2,3,3,4,4,5,5-octafluoro-1-pentanol, 2,2-bis (trifluoromethyl) -1-propanol, 3,3,4,4,5,5 6,6,6-nonafluoro-1-hexanol, 2,3,3,3-tetrafluoro-2- (perfluoropropyloxy) -1-propanol, 4,4,5,5,6,6,7,7 , 7-nonafluoro-1-heptanol, 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoro-1-heptanol, 3,3,4,4,5 5,6,6,7,7,8,8,8-tridecafluoro-1-octanol, 7 7,8,8,8-pentafluoro-1-octanol, 4,4,5,5,6,6,7,7,8,8,9,9,9-tridecafluoro-1-nonanol, 7 , 8,8,8-Tetrafluoro-7- (trifluoromethyl) -1-octanol.
媒体(C)は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。また、混合後に媒体(C)として用い得るものであれば、媒体(C)に他の溶媒を混合した混合溶媒を用いてもよい。さらに、混合後に媒体(C)として用い得るものであれば、2種以上の他の溶媒を混合した混合溶媒を用いてもよい。
媒体(C)として用い得る混合溶媒としては、具体的には、下記の組み合わせのものが挙げられる。 A medium (C) may be used individually by 1 type, and may be used in combination of 2 or more type. Moreover, as long as it can be used as a medium (C) after mixing, you may use the mixed solvent which mixed another solvent with the medium (C). Furthermore, as long as it can be used as the medium (C) after mixing, a mixed solvent obtained by mixing two or more other solvents may be used.
Specific examples of the mixed solvent that can be used as the medium (C) include the following combinations.
媒体(C)として用い得る混合溶媒としては、具体的には、下記の組み合わせのものが挙げられる。 A medium (C) may be used individually by 1 type, and may be used in combination of 2 or more type. Moreover, as long as it can be used as a medium (C) after mixing, you may use the mixed solvent which mixed another solvent with the medium (C). Furthermore, as long as it can be used as the medium (C) after mixing, a mixed solvent obtained by mixing two or more other solvents may be used.
Specific examples of the mixed solvent that can be used as the medium (C) include the following combinations.
媒体(C)としては、含フッ素共重合体(A)と溶液状態を呈する温度範囲が230℃以下である溶媒を用いることが好ましい。該温度範囲が230℃以下であれば、含フッ素共重合体(A)の融点よりも充分に低い温度で、後述する含フッ素共重合体(A)と化合物(B)とを混合することが可能であり、含フッ素共重合体(A)及び化合物(B)の特性の劣化を抑えることができる。
As the medium (C), it is preferable to use a solvent having a temperature range of 230 ° C. or less that exhibits a solution state with the fluorine-containing copolymer (A). If the temperature range is 230 ° C. or less, the fluorine-containing copolymer (A) and the compound (B) described later can be mixed at a temperature sufficiently lower than the melting point of the fluorine-containing copolymer (A). It is possible and the deterioration of the characteristics of the fluorine-containing copolymer (A) and the compound (B) can be suppressed.
含フッ素共重合体(A)と溶液状態を呈する温度範囲が230℃以下である、すなわち溶解温度が230℃以下である媒体(C)としては、下記の溶媒が挙げられる。
ジイソプロピルケトン(溶解温度:175℃)、
2-ヘキサノン(溶解温度:175℃)、
シクロヘキサノン(溶解温度:170℃)、
3’,5’-ビス(トリフルオロメチル)アセトフェノン(溶解温度:160℃)、
2’,3’,4’,5’,6’-ペンタフルオロアセトフェノン(溶解温度:155℃)、
ベンゾトリフルオリド(溶解温度:170℃)、
酢酸イソブチル(溶解温度:175℃)。
ただし、括弧内の溶解温度は、含フッ素共重合体(A)が後述する実施例における含フッ素共重合体(A-1)の場合の溶解温度である。 The following solvent is mentioned as a medium (C) whose temperature range which exhibits a solution state with a fluorine-containing copolymer (A) is 230 degrees C or less, ie, a melting temperature is 230 degrees C or less.
Diisopropyl ketone (melting temperature: 175 ° C.),
2-hexanone (melting temperature: 175 ° C.),
Cyclohexanone (dissolution temperature: 170 ° C.),
3 ′, 5′-bis (trifluoromethyl) acetophenone (melting temperature: 160 ° C.),
2 ′, 3 ′, 4 ′, 5 ′, 6′-pentafluoroacetophenone (melting temperature: 155 ° C.),
Benzotrifluoride (melting temperature: 170 ° C.),
Isobutyl acetate (melting temperature: 175 ° C.).
However, the dissolution temperature in parentheses is the dissolution temperature when the fluorine-containing copolymer (A) is the fluorine-containing copolymer (A-1) in Examples described later.
ジイソプロピルケトン(溶解温度:175℃)、
2-ヘキサノン(溶解温度:175℃)、
シクロヘキサノン(溶解温度:170℃)、
3’,5’-ビス(トリフルオロメチル)アセトフェノン(溶解温度:160℃)、
2’,3’,4’,5’,6’-ペンタフルオロアセトフェノン(溶解温度:155℃)、
ベンゾトリフルオリド(溶解温度:170℃)、
酢酸イソブチル(溶解温度:175℃)。
ただし、括弧内の溶解温度は、含フッ素共重合体(A)が後述する実施例における含フッ素共重合体(A-1)の場合の溶解温度である。 The following solvent is mentioned as a medium (C) whose temperature range which exhibits a solution state with a fluorine-containing copolymer (A) is 230 degrees C or less, ie, a melting temperature is 230 degrees C or less.
Diisopropyl ketone (melting temperature: 175 ° C.),
2-hexanone (melting temperature: 175 ° C.),
Cyclohexanone (dissolution temperature: 170 ° C.),
3 ′, 5′-bis (trifluoromethyl) acetophenone (melting temperature: 160 ° C.),
2 ′, 3 ′, 4 ′, 5 ′, 6′-pentafluoroacetophenone (melting temperature: 155 ° C.),
Benzotrifluoride (melting temperature: 170 ° C.),
Isobutyl acetate (melting temperature: 175 ° C.).
However, the dissolution temperature in parentheses is the dissolution temperature when the fluorine-containing copolymer (A) is the fluorine-containing copolymer (A-1) in Examples described later.
媒体(C)としては、含フッ素共重合体組成物から再沈殿等によって含フッ素共重合体(A)及び化合物(B)の混合物からなる固形分を分離したり、含フッ素共重合体組成物をコーティング用組成物として用いたりする点から、室温(25℃)において液体である溶媒が好ましい。また、媒体(C)の融点は、同じ理由から、20℃以下が好ましい。さらに、媒体(C)の沸点(常圧)は、媒体(C)の取扱性及び含フッ素共重合体組成物から固形分を分離する際の溶媒除去性の点から、230℃以下が好ましく、200℃以下がより好ましい。
As the medium (C), a solid content comprising a mixture of the fluorine-containing copolymer (A) and the compound (B) is separated from the fluorine-containing copolymer composition by reprecipitation or the like, or the fluorine-containing copolymer composition From the point of using as a coating composition, a solvent that is liquid at room temperature (25 ° C.) is preferable. Further, the melting point of the medium (C) is preferably 20 ° C. or lower for the same reason. Furthermore, the boiling point (normal pressure) of the medium (C) is preferably 230 ° C. or less from the viewpoint of the handleability of the medium (C) and the solvent removability when the solid content is separated from the fluorine-containing copolymer composition, 200 degrees C or less is more preferable.
(化合物(D))
化合物(D)は、化合物(B)の反応性官能基と反応し得る反応性官能基を有する化合物(D1)及び化合物(B)の反応性官能基の反応を促進し得る化合物(D2)からなる群から選ばれる少なくとも1種の化合物(ただし、化合物(E)を除く。)である。
化合物(D)は、媒体(C)に溶解するもの、媒体(C)に一部溶解するもの、又は全く溶解しないもののいずれでもよいが、含フッ素共重合体(A)と化合物(B)との混和性、若しくは相溶性の点から、媒体(C)に溶解するものが好ましく、含フッ素共重合体(A)の融点以下の温度において、媒体(C)に溶解するものがより好ましい。 (Compound (D))
The compound (D) is obtained from the compound (D1) having a reactive functional group capable of reacting with the reactive functional group of the compound (B) and the compound (D2) capable of promoting the reaction of the reactive functional group of the compound (B). And at least one compound selected from the group (excluding compound (E)).
The compound (D) may be any of those that dissolve in the medium (C), those that partially dissolve in the medium (C), or those that do not dissolve at all, but the fluorine-containing copolymer (A), the compound (B), Those that are soluble in the medium (C) are preferred from the viewpoint of miscibility or compatibility, and those that are soluble in the medium (C) at a temperature below the melting point of the fluorinated copolymer (A) are more preferred.
化合物(D)は、化合物(B)の反応性官能基と反応し得る反応性官能基を有する化合物(D1)及び化合物(B)の反応性官能基の反応を促進し得る化合物(D2)からなる群から選ばれる少なくとも1種の化合物(ただし、化合物(E)を除く。)である。
化合物(D)は、媒体(C)に溶解するもの、媒体(C)に一部溶解するもの、又は全く溶解しないもののいずれでもよいが、含フッ素共重合体(A)と化合物(B)との混和性、若しくは相溶性の点から、媒体(C)に溶解するものが好ましく、含フッ素共重合体(A)の融点以下の温度において、媒体(C)に溶解するものがより好ましい。 (Compound (D))
The compound (D) is obtained from the compound (D1) having a reactive functional group capable of reacting with the reactive functional group of the compound (B) and the compound (D2) capable of promoting the reaction of the reactive functional group of the compound (B). And at least one compound selected from the group (excluding compound (E)).
The compound (D) may be any of those that dissolve in the medium (C), those that partially dissolve in the medium (C), or those that do not dissolve at all, but the fluorine-containing copolymer (A), the compound (B), Those that are soluble in the medium (C) are preferred from the viewpoint of miscibility or compatibility, and those that are soluble in the medium (C) at a temperature below the melting point of the fluorinated copolymer (A) are more preferred.
化合物(D1)は、含フッ素共重合体(A)や化合物(B)の反応性官能基と反応して三次元網状構造を形成し、含フッ素共重合体組成物を硬化させる働きを有する硬化剤である。
化合物(D2)は、含フッ素共重合体(A)や化合物(B)の反応性官能基同士を反応させて三次元網状構造を形成し、含フッ素共重合体組成物を硬化させる働きを有する触媒又は開始剤である。 Compound (D1) reacts with the reactive functional group of fluorine-containing copolymer (A) or compound (B) to form a three-dimensional network structure, and has a function of curing the fluorine-containing copolymer composition. It is an agent.
The compound (D2) has a function of reacting the reactive functional groups of the fluorine-containing copolymer (A) and the compound (B) to form a three-dimensional network structure and curing the fluorine-containing copolymer composition. Catalyst or initiator.
化合物(D2)は、含フッ素共重合体(A)や化合物(B)の反応性官能基同士を反応させて三次元網状構造を形成し、含フッ素共重合体組成物を硬化させる働きを有する触媒又は開始剤である。 Compound (D1) reacts with the reactive functional group of fluorine-containing copolymer (A) or compound (B) to form a three-dimensional network structure, and has a function of curing the fluorine-containing copolymer composition. It is an agent.
The compound (D2) has a function of reacting the reactive functional groups of the fluorine-containing copolymer (A) and the compound (B) to form a three-dimensional network structure and curing the fluorine-containing copolymer composition. Catalyst or initiator.
化合物(B)が開環反応性を有する環状エーテルを有する基を含有する化合物の場合、化合物(D1)としては、酸無水物、ポリアミン、ポリフェノール、ポリチオール等が挙げられ、化合物(D2)としては、3級アミン化合物、イミダゾール化合物等が挙げられる。
In the case where the compound (B) is a compound containing a group having a cyclic ether having ring-opening reactivity, examples of the compound (D1) include acid anhydrides, polyamines, polyphenols, polythiols, and the like (D2). A tertiary amine compound, an imidazole compound, etc. are mentioned.
化合物(B)が付加反応性を有する炭素-炭素二重結合を有する基を含有する化合物の場合、化合物(D1)としては、1級アミン、2級アミン、チオール等が挙げられ、化合物(D2)としては、公知の熱重合開始剤、光重合開始剤等が挙げられる。
When the compound (B) is a compound containing a group having a carbon-carbon double bond having addition reactivity, examples of the compound (D1) include primary amines, secondary amines, and thiols. ) Include known thermal polymerization initiators, photopolymerization initiators, and the like.
化合物(D)としては、市販の硬化剤、触媒、開始剤等を用いてもよい。市販の硬化剤、触媒、及び開始剤としては、下記のものが挙げられる。
ADEKA社製:アデカハードナー(登録商標)、アデカオプトマー(登録商標)、
DIC社製:EPICLON(登録商標)、LUCKAMIDE(登録商標)、PHENOLITE(登録商標)、
BASF社製:IRGACURE(登録商標)等。 As the compound (D), commercially available curing agents, catalysts, initiators and the like may be used. The following are mentioned as a commercially available hardening | curing agent, a catalyst, and an initiator.
Made by ADEKA: Adeka Hardener (registered trademark), Adekaoptomer (registered trademark),
DIC Corporation: EPICLON (registered trademark), LUCKAMIDE (registered trademark), PHENOLITE (registered trademark),
BASF Corporation: IRGACURE (registered trademark), etc.
ADEKA社製:アデカハードナー(登録商標)、アデカオプトマー(登録商標)、
DIC社製:EPICLON(登録商標)、LUCKAMIDE(登録商標)、PHENOLITE(登録商標)、
BASF社製:IRGACURE(登録商標)等。 As the compound (D), commercially available curing agents, catalysts, initiators and the like may be used. The following are mentioned as a commercially available hardening | curing agent, a catalyst, and an initiator.
Made by ADEKA: Adeka Hardener (registered trademark), Adekaoptomer (registered trademark),
DIC Corporation: EPICLON (registered trademark), LUCKAMIDE (registered trademark), PHENOLITE (registered trademark),
BASF Corporation: IRGACURE (registered trademark), etc.
(化合物(E))
化合物(E)は、含フッ素共重合体(A)又は化合物(B)の媒体(C)への溶解又は分散を促進し得る溶解促進剤、分散剤である。
化合物(E)は、含フッ素共重合体(A)又は化合物(B)の媒体(C)への溶解性又は分散性の点から、媒体(C)に溶解するものが好ましく、特に、含フッ素共重合体(A)の融点以下の温度において、媒体(C)に溶解するものが好ましい。 (Compound (E))
The compound (E) is a dissolution accelerator or a dispersant that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C).
The compound (E) is preferably soluble in the medium (C) from the viewpoint of the solubility or dispersibility of the fluorine-containing copolymer (A) or the compound (B) in the medium (C). What melt | dissolves in a medium (C) at the temperature below the melting | fusing point of a copolymer (A) is preferable.
化合物(E)は、含フッ素共重合体(A)又は化合物(B)の媒体(C)への溶解又は分散を促進し得る溶解促進剤、分散剤である。
化合物(E)は、含フッ素共重合体(A)又は化合物(B)の媒体(C)への溶解性又は分散性の点から、媒体(C)に溶解するものが好ましく、特に、含フッ素共重合体(A)の融点以下の温度において、媒体(C)に溶解するものが好ましい。 (Compound (E))
The compound (E) is a dissolution accelerator or a dispersant that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C).
The compound (E) is preferably soluble in the medium (C) from the viewpoint of the solubility or dispersibility of the fluorine-containing copolymer (A) or the compound (B) in the medium (C). What melt | dissolves in a medium (C) at the temperature below the melting | fusing point of a copolymer (A) is preferable.
化合物(E)としては、界面活性剤、分散剤、粘度調整剤等が挙げられる。
Compound (E) includes surfactants, dispersants, viscosity modifiers and the like.
化合物(E)としては、開環反応性を有する環状エーテルを有する基の反応を促進する触媒としての役割を兼ねていることから、1級アミノ基、2級アミノ基及び窒素-水素結合を有する含窒素複素環基からなる群から選ばれる少なくとも1種の基と、炭素数1~20のアルキル基とを有する化合物(E1)が好ましく、イミダゾリル基と炭素数4~20のアルキル基とを有する化合物がより好ましい。
The compound (E) has a primary amino group, a secondary amino group, and a nitrogen-hydrogen bond because it also serves as a catalyst for promoting the reaction of a group having a cyclic ether having ring-opening reactivity. A compound (E1) having at least one group selected from the group consisting of nitrogen-containing heterocyclic groups and an alkyl group having 1 to 20 carbon atoms is preferable, and has an imidazolyl group and an alkyl group having 4 to 20 carbon atoms. Compounds are more preferred.
本発明の含フッ素共重合体組成物は、塗膜の密着性、耐擦傷性、耐熱性等の点から、化合物(D)及び化合物(E1)からなる群から選ばれる少なくとも1種を含むことが好ましく、化合物(D)及び化合物(E1)を含むことがより好ましい。
The fluorine-containing copolymer composition of the present invention contains at least one selected from the group consisting of the compound (D) and the compound (E1) from the viewpoints of coating film adhesion, scratch resistance, heat resistance, and the like. Is preferable, and it is more preferable that the compound (D) and the compound (E1) are included.
(他の樹脂(F))
他の樹脂(F)は、含フッ素共重合体(A)、及び化合物(B)~(E)以外の熱可塑性樹脂又は熱硬化性樹脂である。
他の樹脂(F)は、含フッ素共重合体(A)と媒体(C)とが溶液状態を呈する温度範囲において、媒体(C)に溶解するもの、媒体(C)に一部溶解するもの、又はまったく溶解しないもののいずれでもよいが、含フッ素共重合体(A)と他の樹脂(F)との混和性、若しくは相溶性の点から、媒体(C)に溶解するものが好ましい。 (Other resin (F))
The other resin (F) is a thermoplastic resin or a thermosetting resin other than the fluorine-containing copolymer (A) and the compounds (B) to (E).
The other resin (F) is one that dissolves in the medium (C) or partly dissolves in the medium (C) in a temperature range in which the fluorine-containing copolymer (A) and the medium (C) are in a solution state. However, from the viewpoint of miscibility or compatibility between the fluorinated copolymer (A) and the other resin (F), those that are soluble in the medium (C) are preferable.
他の樹脂(F)は、含フッ素共重合体(A)、及び化合物(B)~(E)以外の熱可塑性樹脂又は熱硬化性樹脂である。
他の樹脂(F)は、含フッ素共重合体(A)と媒体(C)とが溶液状態を呈する温度範囲において、媒体(C)に溶解するもの、媒体(C)に一部溶解するもの、又はまったく溶解しないもののいずれでもよいが、含フッ素共重合体(A)と他の樹脂(F)との混和性、若しくは相溶性の点から、媒体(C)に溶解するものが好ましい。 (Other resin (F))
The other resin (F) is a thermoplastic resin or a thermosetting resin other than the fluorine-containing copolymer (A) and the compounds (B) to (E).
The other resin (F) is one that dissolves in the medium (C) or partly dissolves in the medium (C) in a temperature range in which the fluorine-containing copolymer (A) and the medium (C) are in a solution state. However, from the viewpoint of miscibility or compatibility between the fluorinated copolymer (A) and the other resin (F), those that are soluble in the medium (C) are preferable.
熱可塑性樹脂としては、含フッ素共重合体(A)以外のフッ素系樹脂、炭化水素系樹脂等が挙げられる。
フッ素系樹脂としては、ポリテトラフルオロエチレン、エチレン-クロロトリフルオロエチレン共重合体、ポリフッ化ビニリデン、ポリフッ化ビニル、ポリクロロトリフルオロエチレン、クロロトリフルオロエチレン-ビニルエーテル共重合体、ポリ(2,2,3,3,3-ペンタフルオロプロピルメタクリレート)、ポリ(3,3,4,4,5,5,6,6,7,7,8,8,8-トリデカフルオロオクチルメタクリレート)等が挙げられる。 Examples of the thermoplastic resin include fluorine resins and hydrocarbon resins other than the fluorine-containing copolymer (A).
Examples of the fluorine resin include polytetrafluoroethylene, ethylene-chlorotrifluoroethylene copolymer, polyvinylidene fluoride, polyvinyl fluoride, polychlorotrifluoroethylene, chlorotrifluoroethylene-vinyl ether copolymer, poly (2,2 , 3,3,3-pentafluoropropyl methacrylate), poly (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl methacrylate) and the like. It is done.
フッ素系樹脂としては、ポリテトラフルオロエチレン、エチレン-クロロトリフルオロエチレン共重合体、ポリフッ化ビニリデン、ポリフッ化ビニル、ポリクロロトリフルオロエチレン、クロロトリフルオロエチレン-ビニルエーテル共重合体、ポリ(2,2,3,3,3-ペンタフルオロプロピルメタクリレート)、ポリ(3,3,4,4,5,5,6,6,7,7,8,8,8-トリデカフルオロオクチルメタクリレート)等が挙げられる。 Examples of the thermoplastic resin include fluorine resins and hydrocarbon resins other than the fluorine-containing copolymer (A).
Examples of the fluorine resin include polytetrafluoroethylene, ethylene-chlorotrifluoroethylene copolymer, polyvinylidene fluoride, polyvinyl fluoride, polychlorotrifluoroethylene, chlorotrifluoroethylene-vinyl ether copolymer, poly (2,2 , 3,3,3-pentafluoropropyl methacrylate), poly (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl methacrylate) and the like. It is done.
炭化水素系樹脂としては、ポリエチレン、ポリプロピレン、ポリ(4-メチル-1-ペンテン)、ポリ(1-ブテン)、ポリスチレン、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリメチルメタクリレート、ポリエチルメタクリレート、ポリブチルメタクリレート、ポリイソブチルメタクリレート、ポリヘキシルメタクリレート、ポリビニルアルコール、メチルメタクリレート-スチレン共重合体、無水マレイン酸-スチレン共重合体、アクリロニトリル-スチレン共重合体、ポリオキシメチレン、ポリビニルアセタール、ポリビニルホルマール、ポリビニルブチラール、ポリ酢酸ビニル、アクリロニトリル-ブタジエン-スチレン共重合体、エチレン-酢酸ビニル共重合体、エチレン-アクリル酸共重合体、エチレン-無水マレイン酸共重合体、塩化ビニリデン-塩化ビニル共重合体、ポリ(2,6-ジメチル-1,4-フェニレンオキシド)、ポリアミド6、ポリアミド66、ポリアミド9T、ポリアミド11、ポリアミド12、ポリエチレンテレフタレート、ポリトリメチレンテレフタレート、ポリブチレンテレフタレート、ポリスルホン、ポリエーテルスルホン、ポリカーボネート、ポリエーテルエーテルケトン、ポリフェニレンスルフィド、熱可塑性ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリアリレート、シクロオレフィンポリマー、ポリ乳酸等が挙げられる。
Examples of hydrocarbon resins include polyethylene, polypropylene, poly (4-methyl-1-pentene), poly (1-butene), polystyrene, polyvinyl chloride, polyvinylidene chloride, polymethyl methacrylate, polyethyl methacrylate, and polybutyl methacrylate. , Polyisobutyl methacrylate, polyhexyl methacrylate, polyvinyl alcohol, methyl methacrylate-styrene copolymer, maleic anhydride-styrene copolymer, acrylonitrile-styrene copolymer, polyoxymethylene, polyvinyl acetal, polyvinyl formal, polyvinyl butyral, poly Vinyl acetate, acrylonitrile-butadiene-styrene copolymer, ethylene-vinyl acetate copolymer, ethylene-acrylic acid copolymer, ethylene-maleic anhydride copolymer , Vinylidene chloride-vinyl chloride copolymer, poly (2,6-dimethyl-1,4-phenylene oxide), polyamide 6, polyamide 66, polyamide 9T, polyamide 11, polyamide 12, polyethylene terephthalate, polytrimethylene terephthalate, Examples include polybutylene terephthalate, polysulfone, polyethersulfone, polycarbonate, polyetheretherketone, polyphenylene sulfide, thermoplastic polyimide, polyamideimide, polyetherimide, polyarylate, cycloolefin polymer, and polylactic acid.
熱硬化性樹脂としては、フェノール樹脂、尿素樹脂、メラミン樹脂、グアナミン樹脂、アニリン樹脂、ベンゾオキサジン樹脂、シアン酸エステル樹脂、イソシアネート樹脂、アルキド樹脂、フタル酸樹脂、ポリウレタン、チオウレタン樹脂、熱硬化性ポリイミド、キシレン樹脂、ケトン樹脂、フラン樹脂、COPNA樹脂、シリコーン樹脂、ポリアゾメチン等が挙げられる。
Thermosetting resins include phenolic resin, urea resin, melamine resin, guanamine resin, aniline resin, benzoxazine resin, cyanate ester resin, isocyanate resin, alkyd resin, phthalic acid resin, polyurethane, thiourethane resin, thermosetting Examples include polyimide, xylene resin, ketone resin, furan resin, COPNA resin, silicone resin, polyazomethine and the like.
(含フッ素共重合体組成物の調製方法)
本発明の含フッ素共重合体組成物は、媒体(C)中、含フッ素共重合体(A)と化合物(B)と、必要に応じて化合物(D)、化合物(E)、他の樹脂(F)等とを混合する方法によって調製できる。 (Method for preparing fluorine-containing copolymer composition)
The fluorinated copolymer composition of the present invention comprises a fluorinated copolymer (A) and a compound (B) in the medium (C), and if necessary, a compound (D), a compound (E), and other resins. It can be prepared by a method of mixing (F) and the like.
本発明の含フッ素共重合体組成物は、媒体(C)中、含フッ素共重合体(A)と化合物(B)と、必要に応じて化合物(D)、化合物(E)、他の樹脂(F)等とを混合する方法によって調製できる。 (Method for preparing fluorine-containing copolymer composition)
The fluorinated copolymer composition of the present invention comprises a fluorinated copolymer (A) and a compound (B) in the medium (C), and if necessary, a compound (D), a compound (E), and other resins. It can be prepared by a method of mixing (F) and the like.
(含フッ素共重合体(A)と化合物(B)との混合)
含フッ素共重合体(A)と化合物(B)との混合は、媒体(C)中、含フッ素共重合体(A)の融点以下の温度条件下で行う。 (Mixture of fluorine-containing copolymer (A) and compound (B))
Mixing of the fluorinated copolymer (A) and the compound (B) is carried out in the medium (C) under a temperature condition not higher than the melting point of the fluorinated copolymer (A).
含フッ素共重合体(A)と化合物(B)との混合は、媒体(C)中、含フッ素共重合体(A)の融点以下の温度条件下で行う。 (Mixture of fluorine-containing copolymer (A) and compound (B))
Mixing of the fluorinated copolymer (A) and the compound (B) is carried out in the medium (C) under a temperature condition not higher than the melting point of the fluorinated copolymer (A).
混合は、少なくとも含フッ素共重合体(A)が溶液状態、又は溶液状態を経て得られる分散液状態であればよい。
混合の際、化合物(B)は、溶液状態であってもよく、分散液状態であってもよく、含フッ素共重合体(A)と化合物(B)との混和性、若しくは相溶性の点から、溶液状態が好ましい。 Mixing should just be a dispersion liquid state which a fluorine-containing copolymer (A) obtains through a solution state or a solution state.
At the time of mixing, the compound (B) may be in a solution state or a dispersion state, and the miscibility or compatibility between the fluorine-containing copolymer (A) and the compound (B). Therefore, a solution state is preferable.
混合の際、化合物(B)は、溶液状態であってもよく、分散液状態であってもよく、含フッ素共重合体(A)と化合物(B)との混和性、若しくは相溶性の点から、溶液状態が好ましい。 Mixing should just be a dispersion liquid state which a fluorine-containing copolymer (A) obtains through a solution state or a solution state.
At the time of mixing, the compound (B) may be in a solution state or a dispersion state, and the miscibility or compatibility between the fluorine-containing copolymer (A) and the compound (B). Therefore, a solution state is preferable.
混合方法としては、例えば、下記の方法(α)~(ε)が挙げられる。
(α)含フッ素共重合体(A)と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、これに化合物(B)、必要に応じて化合物(D)を加えて溶解又は分散させ、混合する方法。
(β)含フッ素共重合体(A)及び化合物(D)と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、これに化合物(B)と、必要に応じて化合物(D)を加えて溶解又は分散させ、混合する方法。
(γ)含フッ素共重合体(A)及び化合物(B)と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、化合物(D)を加えて溶解又は分散させ、混合する方法。
(δ)含フッ素共重合体(A)及び化合物(B)と、必要に応じて化合物(D)、化合物(E)等を媒体(C)に溶解又は分散させ、混合する方法。
(ε)含フッ素共重合体(A)及び化合物(B)の一部と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、これに化合物(B)の残部と、必要に応じて化合物(D)を加えて溶解又は分散させ、混合する方法。 Examples of the mixing method include the following methods (α) to (ε).
(Α) After the fluorine-containing copolymer (A) and, if necessary, the compound (E) are dissolved in the medium (C), the fluorine-containing copolymer (A) is precipitated and dispersed as necessary. The compound (B) and, if necessary, the compound (D) are added thereto and dissolved or dispersed, followed by mixing.
(Β) The fluorine-containing copolymer (A) and the compound (D), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) is precipitated if necessary. The compound (B) and, if necessary, the compound (D) are added thereto and dissolved or dispersed, and then mixed.
(Γ) The fluorine-containing copolymer (A) and the compound (B), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) is precipitated as necessary. The compound (D) is added and dissolved or dispersed, and then mixed.
(Δ) A method in which the fluorine-containing copolymer (A) and the compound (B) and, if necessary, the compound (D), the compound (E) and the like are dissolved or dispersed in the medium (C) and mixed.
(Ε) A part of the fluorine-containing copolymer (A) and the compound (B), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) if necessary. Is precipitated and dispersed, and then the remainder of the compound (B) and, if necessary, the compound (D) are added to dissolve or disperse and mix.
(α)含フッ素共重合体(A)と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、これに化合物(B)、必要に応じて化合物(D)を加えて溶解又は分散させ、混合する方法。
(β)含フッ素共重合体(A)及び化合物(D)と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、これに化合物(B)と、必要に応じて化合物(D)を加えて溶解又は分散させ、混合する方法。
(γ)含フッ素共重合体(A)及び化合物(B)と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、化合物(D)を加えて溶解又は分散させ、混合する方法。
(δ)含フッ素共重合体(A)及び化合物(B)と、必要に応じて化合物(D)、化合物(E)等を媒体(C)に溶解又は分散させ、混合する方法。
(ε)含フッ素共重合体(A)及び化合物(B)の一部と、必要に応じて化合物(E)を媒体(C)に溶解させ、必要に応じて含フッ素共重合体(A)を析出させて分散させた後、これに化合物(B)の残部と、必要に応じて化合物(D)を加えて溶解又は分散させ、混合する方法。 Examples of the mixing method include the following methods (α) to (ε).
(Α) After the fluorine-containing copolymer (A) and, if necessary, the compound (E) are dissolved in the medium (C), the fluorine-containing copolymer (A) is precipitated and dispersed as necessary. The compound (B) and, if necessary, the compound (D) are added thereto and dissolved or dispersed, followed by mixing.
(Β) The fluorine-containing copolymer (A) and the compound (D), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) is precipitated if necessary. The compound (B) and, if necessary, the compound (D) are added thereto and dissolved or dispersed, and then mixed.
(Γ) The fluorine-containing copolymer (A) and the compound (B), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) is precipitated as necessary. The compound (D) is added and dissolved or dispersed, and then mixed.
(Δ) A method in which the fluorine-containing copolymer (A) and the compound (B) and, if necessary, the compound (D), the compound (E) and the like are dissolved or dispersed in the medium (C) and mixed.
(Ε) A part of the fluorine-containing copolymer (A) and the compound (B), and if necessary, the compound (E) is dissolved in the medium (C), and the fluorine-containing copolymer (A) if necessary. Is precipitated and dispersed, and then the remainder of the compound (B) and, if necessary, the compound (D) are added to dissolve or disperse and mix.
含フッ素共重合体(A)を媒体(C)に溶解させて得られる溶液又は分散液に化合物(B)、必要に応じて、化合物(D)、化合物(E)、他の樹脂(F)等を加える場合、化合物(B)、化合物(D)、化合物(E)、他の樹脂(F)等は媒体(C)の一部にあらかじめ溶解した溶液として加えてもよい。
In a solution or dispersion obtained by dissolving the fluorine-containing copolymer (A) in the medium (C), the compound (B), and if necessary, the compound (D), the compound (E), other resin (F) In the case of adding a compound (B), a compound (D), a compound (E), another resin (F), or the like, a solution previously dissolved in a part of the medium (C) may be added.
混合の際の温度は、0℃以上かつ含フッ素共重合体(A)の融点以下である。含フッ素共重合体(A)(すなわちETFE)の融点は、最も高いもので概ね275℃である。
混合の際の上限温度は、含フッ素共重合体(A)及び化合物(B)の特性の劣化を抑える点から、230℃が好ましく、200℃がより好ましい。
混合の際の下限温度は、充分な溶解状態を得る点から、含フッ素共重合体(A)が媒体(C)に溶解、又は均一に微粒子が分散する温度であり、0℃が好ましく、20℃がより好ましい。必ずしも含フッ素共重合体(A)及び化合物(B)を媒体(C)に再度溶解させる必要はない。
加熱が必要な場合は、各成分の混合及び加熱は同時に行ってもよく、各成分を混合した後、必要に応じて撹拌しながら加熱してもよい。 The temperature at the time of mixing is 0 ° C. or higher and not higher than the melting point of the fluorine-containing copolymer (A). The melting point of the fluorinated copolymer (A) (that is, ETFE) is the highest and is approximately 275 ° C.
The upper limit temperature during mixing is preferably 230 ° C., more preferably 200 ° C., from the viewpoint of suppressing deterioration of the properties of the fluorinated copolymer (A) and the compound (B).
The lower limit temperature at the time of mixing is a temperature at which the fluorine-containing copolymer (A) is dissolved in the medium (C) or the fine particles are uniformly dispersed from the viewpoint of obtaining a sufficiently dissolved state, preferably 0 ° C., 20 ° C is more preferred. It is not always necessary to dissolve the fluorine-containing copolymer (A) and the compound (B) again in the medium (C).
When heating is required, mixing and heating of each component may be performed simultaneously, and after mixing each component, you may heat, stirring as needed.
混合の際の上限温度は、含フッ素共重合体(A)及び化合物(B)の特性の劣化を抑える点から、230℃が好ましく、200℃がより好ましい。
混合の際の下限温度は、充分な溶解状態を得る点から、含フッ素共重合体(A)が媒体(C)に溶解、又は均一に微粒子が分散する温度であり、0℃が好ましく、20℃がより好ましい。必ずしも含フッ素共重合体(A)及び化合物(B)を媒体(C)に再度溶解させる必要はない。
加熱が必要な場合は、各成分の混合及び加熱は同時に行ってもよく、各成分を混合した後、必要に応じて撹拌しながら加熱してもよい。 The temperature at the time of mixing is 0 ° C. or higher and not higher than the melting point of the fluorine-containing copolymer (A). The melting point of the fluorinated copolymer (A) (that is, ETFE) is the highest and is approximately 275 ° C.
The upper limit temperature during mixing is preferably 230 ° C., more preferably 200 ° C., from the viewpoint of suppressing deterioration of the properties of the fluorinated copolymer (A) and the compound (B).
The lower limit temperature at the time of mixing is a temperature at which the fluorine-containing copolymer (A) is dissolved in the medium (C) or the fine particles are uniformly dispersed from the viewpoint of obtaining a sufficiently dissolved state, preferably 0 ° C., 20 ° C is more preferred. It is not always necessary to dissolve the fluorine-containing copolymer (A) and the compound (B) again in the medium (C).
When heating is required, mixing and heating of each component may be performed simultaneously, and after mixing each component, you may heat, stirring as needed.
混合の際の圧力は、通常、常圧又は0.5MPa程度の微加圧が好ましい。混合の際の温度が媒体(C)の沸点より高い場合は、圧力は、少なくとも自然発生圧力以下であり、好ましくは3MPa以下、より好ましくは2MPa以下、さらに好ましくは1MPa以下、最も好ましくは常圧以下であり、耐圧容器中で混合するのが好ましい。通常、圧力は、0.01~1MPa程度が好ましい。
The pressure during mixing is usually preferably normal pressure or a slight pressure of about 0.5 MPa. When the temperature at the time of mixing is higher than the boiling point of the medium (C), the pressure is at least not more than the spontaneously generated pressure, preferably not more than 3 MPa, more preferably not more than 2 MPa, more preferably not more than 1 MPa, most preferably normal pressure It is the following, and it is preferable to mix in a pressure vessel. Usually, the pressure is preferably about 0.01 to 1 MPa.
混合時間は、含フッ素共重合体(A)と化合物(B)との混合割合、媒体(C)に加える前の含フッ素共重合体(A)及び該化合物(B)の形状等に依存する。含フッ素共重合体(A)の形状は、媒体(C)への溶解時間を短くする点からは、粉末状が好ましく、入手のし易さの点からは、ペレット状が好ましい。化合物(B)の形状は、媒体(C)への溶解時間を短くする点からは、液状又は粉末状が好ましい。
The mixing time depends on the mixing ratio of the fluorinated copolymer (A) and the compound (B), the shape of the fluorinated copolymer (A) and the compound (B) before being added to the medium (C), and the like. . The shape of the fluorinated copolymer (A) is preferably a powder from the viewpoint of shortening the dissolution time in the medium (C), and a pellet is preferred from the viewpoint of availability. The shape of the compound (B) is preferably liquid or powder from the viewpoint of shortening the dissolution time in the medium (C).
混合手段としては、ホモミキサ、高圧ホモジナイザー、ビーズミル、遊星ボールミル、ヘンシェルミキサ、バンバリーミキサ、加圧ニーダ、超音波撹拌機、高圧衝合型分散装置、薄膜旋回型高速ミキサー、並びに各種のスタティックミキサ及びモーションレスミキサ等の公知の撹拌混合機を用いればよい。
加圧下に混合する場合には、撹拌機付きオートクレーブ等の装置を用いてもよい。撹拌翼としては、マリンプロペラ翼、パドル翼、アンカー翼、タービン翼等が挙げられる。小スケールで行う場合には、撹拌装置としては、マグネティックスターラー等を用いてもよい。 Mixing means include homomixers, high-pressure homogenizers, bead mills, planetary ball mills, Henschel mixers, Banbury mixers, pressure kneaders, ultrasonic stirrers, high-pressure abutting dispersers, thin-film swivel high-speed mixers, and various static mixers and motions A known stirring mixer such as a less mixer may be used.
When mixing under pressure, an apparatus such as an autoclave with a stirrer may be used. Examples of the stirring blade include a marine propeller blade, a paddle blade, an anchor blade, and a turbine blade. When performing on a small scale, a magnetic stirrer or the like may be used as the stirring device.
加圧下に混合する場合には、撹拌機付きオートクレーブ等の装置を用いてもよい。撹拌翼としては、マリンプロペラ翼、パドル翼、アンカー翼、タービン翼等が挙げられる。小スケールで行う場合には、撹拌装置としては、マグネティックスターラー等を用いてもよい。 Mixing means include homomixers, high-pressure homogenizers, bead mills, planetary ball mills, Henschel mixers, Banbury mixers, pressure kneaders, ultrasonic stirrers, high-pressure abutting dispersers, thin-film swivel high-speed mixers, and various static mixers and motions A known stirring mixer such as a less mixer may be used.
When mixing under pressure, an apparatus such as an autoclave with a stirrer may be used. Examples of the stirring blade include a marine propeller blade, a paddle blade, an anchor blade, and a turbine blade. When performing on a small scale, a magnetic stirrer or the like may be used as the stirring device.
含フッ素共重合体(A)と化合物(B)との混合割合は、得られる含フッ素共重合体組成物の用途に応じて適宜決定すればよく、特に限定はされないが、含フッ素共重合体(A)と化合物(B)との混合割合((A)/(B)(質量比))は、99/1~1/99が好ましく、98/2~2/98がより好ましい。
The mixing ratio of the fluorinated copolymer (A) and the compound (B) may be appropriately determined according to the use of the obtained fluorinated copolymer composition, and is not particularly limited. The mixing ratio ((A) / (B) (mass ratio)) of (A) and compound (B) is preferably 99/1 to 1/99, more preferably 98/2 to 2/98.
媒体(C)の割合は、含フッ素共重合体組成物から再沈殿等によって含フッ素共重合体(A)及び化合物(B)の混合物からなる固形分を分離したり、含フッ素共重合体組成物をコーティング用組成物として用いたりする点から、含フッ素共重合体組成物中(100質量%)、5~99.9質量%が好ましく、10~99質量%がより好ましい。媒体(C)の割合が該範囲内であれば、含フッ素共重合体組成物から固形分を分離する際の媒体(C)の除去が容易である。また、コーティング用組成物としての取扱性等に優れ、かつ得られる塗膜を均質なものとすることができる。
The ratio of the medium (C) can be determined by separating the solid content of the mixture of the fluorine-containing copolymer (A) and the compound (B) from the fluorine-containing copolymer composition by reprecipitation or the like. In view of using the product as a coating composition, the content of the fluorinated copolymer composition (100% by mass) is preferably 5 to 99.9% by mass, and more preferably 10 to 99% by mass. When the ratio of the medium (C) is within this range, the medium (C) can be easily removed when the solid content is separated from the fluorine-containing copolymer composition. Moreover, it is excellent in the handleability etc. as a coating composition, and the obtained coating film can be made uniform.
化合物(D)の割合は、塗膜の密着性、耐擦傷性、耐熱性等の点から、化合物(B)100質量部に対して、0.1~20質量部が好ましく、0.5~10質量部がより好ましい。
化合物(E)の割合は、含フッ素共重合体(A)の溶解性又は分散性の点から、含フッ素共重合体(A)100質量部に対して、0.1~10質量部が好ましく、0.5~5質量部がより好ましい。 The proportion of the compound (D) is preferably from 0.1 to 20 parts by mass, preferably from 0.5 to 100 parts by mass with respect to 100 parts by mass of the compound (B) from the viewpoints of adhesion, scratch resistance, heat resistance and the like of the coating film. 10 parts by mass is more preferable.
The proportion of the compound (E) is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the fluorine-containing copolymer (A) from the viewpoint of solubility or dispersibility of the fluorine-containing copolymer (A). 0.5 to 5 parts by mass is more preferable.
化合物(E)の割合は、含フッ素共重合体(A)の溶解性又は分散性の点から、含フッ素共重合体(A)100質量部に対して、0.1~10質量部が好ましく、0.5~5質量部がより好ましい。 The proportion of the compound (D) is preferably from 0.1 to 20 parts by mass, preferably from 0.5 to 100 parts by mass with respect to 100 parts by mass of the compound (B) from the viewpoints of adhesion, scratch resistance, heat resistance and the like of the coating film. 10 parts by mass is more preferable.
The proportion of the compound (E) is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the fluorine-containing copolymer (A) from the viewpoint of solubility or dispersibility of the fluorine-containing copolymer (A). 0.5 to 5 parts by mass is more preferable.
(微粒子の析出)
得られた含フッ素共重合体溶液を、含フッ素共重合体(A)及び/又は化合物(B)が媒体(C)中に析出する条件下(通常は常温常圧下)におくことで、含フッ素共重合体(A)及び/又は化合物(B)が、媒体(C)中に析出し、スラリー(分散液)が得られる。
また、含フッ素共重合体(A)、化合物(B)及び媒体(C)の種類によっては、含フッ素共重合体(A)の微粒子だけが、媒体(C)中に析出し、スラリー(分散液)が得られる。この際、化合物(B)は媒体(C)中に溶解又は分散している状態となる。
具体的には、含フッ素共重合体(A)と化合物(B)との混合を加熱下で行った場合、得られた溶液を含フッ素共重合体(A)及び化合物(B)、又は含フッ素共重合体(A)のみが析出する温度以下(通常は常温)まで冷却することにより、含フッ素共重合体(A)と化合物(B)の混合物又は含フッ素共重合体(A)の微粒子を媒体(C)中に析出させる。冷却の方法は、徐冷であってもよく、急冷であってもよい。 (Precipitation of fine particles)
By placing the obtained fluorinated copolymer solution under conditions where the fluorinated copolymer (A) and / or the compound (B) is precipitated in the medium (C) (usually under normal temperature and normal pressure), The fluorine copolymer (A) and / or compound (B) is precipitated in the medium (C) to obtain a slurry (dispersion).
Further, depending on the types of the fluorinated copolymer (A), the compound (B) and the medium (C), only the fine particles of the fluorinated copolymer (A) are precipitated in the medium (C), and the slurry (dispersion) Liquid). At this time, the compound (B) is in a state of being dissolved or dispersed in the medium (C).
Specifically, when the fluorine-containing copolymer (A) and the compound (B) are mixed with heating, the resulting solution is mixed with the fluorine-containing copolymer (A) and the compound (B), or A mixture of the fluorinated copolymer (A) and the compound (B) or the fine particles of the fluorinated copolymer (A) by cooling to a temperature not higher than the temperature at which only the fluorocopolymer (A) is precipitated (usually normal temperature). Is precipitated in the medium (C). The cooling method may be slow cooling or rapid cooling.
得られた含フッ素共重合体溶液を、含フッ素共重合体(A)及び/又は化合物(B)が媒体(C)中に析出する条件下(通常は常温常圧下)におくことで、含フッ素共重合体(A)及び/又は化合物(B)が、媒体(C)中に析出し、スラリー(分散液)が得られる。
また、含フッ素共重合体(A)、化合物(B)及び媒体(C)の種類によっては、含フッ素共重合体(A)の微粒子だけが、媒体(C)中に析出し、スラリー(分散液)が得られる。この際、化合物(B)は媒体(C)中に溶解又は分散している状態となる。
具体的には、含フッ素共重合体(A)と化合物(B)との混合を加熱下で行った場合、得られた溶液を含フッ素共重合体(A)及び化合物(B)、又は含フッ素共重合体(A)のみが析出する温度以下(通常は常温)まで冷却することにより、含フッ素共重合体(A)と化合物(B)の混合物又は含フッ素共重合体(A)の微粒子を媒体(C)中に析出させる。冷却の方法は、徐冷であってもよく、急冷であってもよい。 (Precipitation of fine particles)
By placing the obtained fluorinated copolymer solution under conditions where the fluorinated copolymer (A) and / or the compound (B) is precipitated in the medium (C) (usually under normal temperature and normal pressure), The fluorine copolymer (A) and / or compound (B) is precipitated in the medium (C) to obtain a slurry (dispersion).
Further, depending on the types of the fluorinated copolymer (A), the compound (B) and the medium (C), only the fine particles of the fluorinated copolymer (A) are precipitated in the medium (C), and the slurry (dispersion) Liquid). At this time, the compound (B) is in a state of being dissolved or dispersed in the medium (C).
Specifically, when the fluorine-containing copolymer (A) and the compound (B) are mixed with heating, the resulting solution is mixed with the fluorine-containing copolymer (A) and the compound (B), or A mixture of the fluorinated copolymer (A) and the compound (B) or the fine particles of the fluorinated copolymer (A) by cooling to a temperature not higher than the temperature at which only the fluorocopolymer (A) is precipitated (usually normal temperature). Is precipitated in the medium (C). The cooling method may be slow cooling or rapid cooling.
得られた含フッ素共重合体組成物の室温付近における状態としては、具体的には、下記の(I)~(V)の状態が挙げられる。
Specific examples of the state of the obtained fluorine-containing copolymer composition near room temperature include the following states (I) to (V).
含フッ素共重合体(A)の媒体(C)への溶解温度が室温よりも高い場合:
(I)含フッ素共重合体(A)及び化合物(B)の均一な混合物の微粒子が媒体(C)中に析出したスラリー(分散液)状態。
(II)含フッ素共重合体(A)の微粒子が媒体(C)中に析出し、化合物(B)が媒体(C)に溶解したままのスラリー(分散液)状態。
(III)化合物(B)の微粒子の表面に含フッ素共重合体(A)が析出してなるコアシェル型微粒子が媒体(C)中に析出したスラリー(分散液)状態。 When the melting temperature of the fluorinated copolymer (A) in the medium (C) is higher than room temperature:
(I) A slurry (dispersion) state in which fine particles of a uniform mixture of the fluorinated copolymer (A) and the compound (B) are precipitated in the medium (C).
(II) A slurry (dispersion) state in which fine particles of the fluorinated copolymer (A) are precipitated in the medium (C) and the compound (B) is dissolved in the medium (C).
(III) A slurry (dispersion) state in which core-shell type fine particles formed by precipitation of the fluorinated copolymer (A) on the surface of the fine particles of the compound (B) are precipitated in the medium (C).
(I)含フッ素共重合体(A)及び化合物(B)の均一な混合物の微粒子が媒体(C)中に析出したスラリー(分散液)状態。
(II)含フッ素共重合体(A)の微粒子が媒体(C)中に析出し、化合物(B)が媒体(C)に溶解したままのスラリー(分散液)状態。
(III)化合物(B)の微粒子の表面に含フッ素共重合体(A)が析出してなるコアシェル型微粒子が媒体(C)中に析出したスラリー(分散液)状態。 When the melting temperature of the fluorinated copolymer (A) in the medium (C) is higher than room temperature:
(I) A slurry (dispersion) state in which fine particles of a uniform mixture of the fluorinated copolymer (A) and the compound (B) are precipitated in the medium (C).
(II) A slurry (dispersion) state in which fine particles of the fluorinated copolymer (A) are precipitated in the medium (C) and the compound (B) is dissolved in the medium (C).
(III) A slurry (dispersion) state in which core-shell type fine particles formed by precipitation of the fluorinated copolymer (A) on the surface of the fine particles of the compound (B) are precipitated in the medium (C).
含フッ素共重合体(A)の媒体(C)への溶解温度が室温よりも低い場合:
(IV)化合物(B)の微粒子が媒体(C)中に分散し、含フッ素共重合体(A)が媒体(C)に溶解したままのスラリー(分散液)状態。
(V)含フッ素共重合体(A)及び化合物(B)が媒体(C)に溶解した溶液状態。 When the melting temperature of the fluorinated copolymer (A) in the medium (C) is lower than room temperature:
(IV) A slurry (dispersion) state in which fine particles of the compound (B) are dispersed in the medium (C) and the fluorinated copolymer (A) is dissolved in the medium (C).
(V) A solution state in which the fluorine-containing copolymer (A) and the compound (B) are dissolved in the medium (C).
(IV)化合物(B)の微粒子が媒体(C)中に分散し、含フッ素共重合体(A)が媒体(C)に溶解したままのスラリー(分散液)状態。
(V)含フッ素共重合体(A)及び化合物(B)が媒体(C)に溶解した溶液状態。 When the melting temperature of the fluorinated copolymer (A) in the medium (C) is lower than room temperature:
(IV) A slurry (dispersion) state in which fine particles of the compound (B) are dispersed in the medium (C) and the fluorinated copolymer (A) is dissolved in the medium (C).
(V) A solution state in which the fluorine-containing copolymer (A) and the compound (B) are dissolved in the medium (C).
(作用効果)
本発明の含フッ素共重合体組成物は、含フッ素共重合体(A)と媒体(C)の他に、化合物(B)を含むため、比較的低温で焼成しても、化合物(B)が硬化することによって、密着性、耐擦傷性、耐熱性等に優れる塗膜及び成形品を形成できる。 (Function and effect)
Since the fluorine-containing copolymer composition of the present invention contains the compound (B) in addition to the fluorine-containing copolymer (A) and the medium (C), the compound (B) Curing can form a coating film and a molded product excellent in adhesion, scratch resistance, heat resistance and the like.
本発明の含フッ素共重合体組成物は、含フッ素共重合体(A)と媒体(C)の他に、化合物(B)を含むため、比較的低温で焼成しても、化合物(B)が硬化することによって、密着性、耐擦傷性、耐熱性等に優れる塗膜及び成形品を形成できる。 (Function and effect)
Since the fluorine-containing copolymer composition of the present invention contains the compound (B) in addition to the fluorine-containing copolymer (A) and the medium (C), the compound (B) Curing can form a coating film and a molded product excellent in adhesion, scratch resistance, heat resistance and the like.
<コーティング用組成物>
本発明のコーティング用組成物は、必要に応じて各種添加剤を含むものである。
本発明のコーティング用組成物の状態は、上述の(I)~(V)の状態のいずれであってもよい。
本発明のコーティング用組成物における含フッ素共重合体(A)の含有量は、目的とする塗膜の厚さに応じて適宜変えることができる。塗膜の形成性の観点から、含フッ素共重合体(A)の割合は、コーティング用組成物中(100質量%)、0.05~50質量%が好ましく、0.1~30質量%がより好ましい。含有量がこの範囲であれば、取り扱い性が良好であり、粘度、乾燥速度、膜の均一性等に優れ、均質な塗膜を形成できる。
また、本発明のコーティング用組成物における化合物(B)の含有量は、得られる含フッ素共重合体組成物の用途に応じて、含フッ素共重合体(A)との混合割合より適宜決定される。なかでも、化合物(B)の割合は、コーティング用組成物中(100質量%)、0.01~89質量%が好ましく、0.02~50質量%がより好ましい。含有量がこの範囲であれば、取り扱い性が良好であり、粘度、乾燥速度、膜の均一性等に優れ、均質な塗膜を形成できる。 <Coating composition>
The coating composition of the present invention contains various additives as necessary.
The state of the coating composition of the present invention may be any of the above states (I) to (V).
Content of the fluorine-containing copolymer (A) in the coating composition of this invention can be suitably changed according to the thickness of the target coating film. From the viewpoint of the formability of the coating film, the proportion of the fluorinated copolymer (A) is preferably 0.05 to 50% by mass, and preferably 0.1 to 30% by mass in the coating composition (100% by mass). More preferred. When the content is within this range, the handleability is good, the viscosity, the drying speed, the uniformity of the film, etc. are excellent, and a uniform coating film can be formed.
Further, the content of the compound (B) in the coating composition of the present invention is appropriately determined from the mixing ratio with the fluorinated copolymer (A) according to the use of the obtained fluorinated copolymer composition. The Among them, the ratio of the compound (B) is preferably 0.01 to 89% by mass, more preferably 0.02 to 50% by mass in the coating composition (100% by mass). When the content is within this range, the handleability is good, the viscosity, the drying speed, the uniformity of the film, etc. are excellent, and a uniform coating film can be formed.
本発明のコーティング用組成物は、必要に応じて各種添加剤を含むものである。
本発明のコーティング用組成物の状態は、上述の(I)~(V)の状態のいずれであってもよい。
本発明のコーティング用組成物における含フッ素共重合体(A)の含有量は、目的とする塗膜の厚さに応じて適宜変えることができる。塗膜の形成性の観点から、含フッ素共重合体(A)の割合は、コーティング用組成物中(100質量%)、0.05~50質量%が好ましく、0.1~30質量%がより好ましい。含有量がこの範囲であれば、取り扱い性が良好であり、粘度、乾燥速度、膜の均一性等に優れ、均質な塗膜を形成できる。
また、本発明のコーティング用組成物における化合物(B)の含有量は、得られる含フッ素共重合体組成物の用途に応じて、含フッ素共重合体(A)との混合割合より適宜決定される。なかでも、化合物(B)の割合は、コーティング用組成物中(100質量%)、0.01~89質量%が好ましく、0.02~50質量%がより好ましい。含有量がこの範囲であれば、取り扱い性が良好であり、粘度、乾燥速度、膜の均一性等に優れ、均質な塗膜を形成できる。 <Coating composition>
The coating composition of the present invention contains various additives as necessary.
The state of the coating composition of the present invention may be any of the above states (I) to (V).
Content of the fluorine-containing copolymer (A) in the coating composition of this invention can be suitably changed according to the thickness of the target coating film. From the viewpoint of the formability of the coating film, the proportion of the fluorinated copolymer (A) is preferably 0.05 to 50% by mass, and preferably 0.1 to 30% by mass in the coating composition (100% by mass). More preferred. When the content is within this range, the handleability is good, the viscosity, the drying speed, the uniformity of the film, etc. are excellent, and a uniform coating film can be formed.
Further, the content of the compound (B) in the coating composition of the present invention is appropriately determined from the mixing ratio with the fluorinated copolymer (A) according to the use of the obtained fluorinated copolymer composition. The Among them, the ratio of the compound (B) is preferably 0.01 to 89% by mass, more preferably 0.02 to 50% by mass in the coating composition (100% by mass). When the content is within this range, the handleability is good, the viscosity, the drying speed, the uniformity of the film, etc. are excellent, and a uniform coating film can be formed.
(添加剤)
添加剤としては、酸化防止剤、光安定剤、紫外線吸収剤、滑剤、増粘剤、充填剤(フィラー)、強化剤、顔料、染料、難燃剤、帯電防止剤等が挙げられる。
添加剤の合計の割合は、コーティング用組成物中(100質量%)、30質量%以下が好ましく、25質量%以下がより好ましい。 (Additive)
Examples of the additive include an antioxidant, a light stabilizer, an ultraviolet absorber, a lubricant, a thickener, a filler (filler), a reinforcing agent, a pigment, a dye, a flame retardant, and an antistatic agent.
The total proportion of the additives is preferably 30% by mass or less, more preferably 25% by mass or less in the coating composition (100% by mass).
添加剤としては、酸化防止剤、光安定剤、紫外線吸収剤、滑剤、増粘剤、充填剤(フィラー)、強化剤、顔料、染料、難燃剤、帯電防止剤等が挙げられる。
添加剤の合計の割合は、コーティング用組成物中(100質量%)、30質量%以下が好ましく、25質量%以下がより好ましい。 (Additive)
Examples of the additive include an antioxidant, a light stabilizer, an ultraviolet absorber, a lubricant, a thickener, a filler (filler), a reinforcing agent, a pigment, a dye, a flame retardant, and an antistatic agent.
The total proportion of the additives is preferably 30% by mass or less, more preferably 25% by mass or less in the coating composition (100% by mass).
添加剤は、媒体(C)中、含フッ素共重合体(A)と化合物(B)とを混合する過程において添加できるため、溶融混練等の過程において添加する場合に比べ、多量に、かつ均一に添加できる。また、添加剤を高濃度に含むコーティング用組成物を用いることによって得られる塗膜が、より薄い膜厚で必要な機能を発揮できるため、含フッ素共重合体(A)及び化合物(B)の割合をより少なくできる。
Since the additive can be added in the process of mixing the fluorine-containing copolymer (A) and the compound (B) in the medium (C), it is abundant and uniform compared to the case of adding in the process of melt kneading. Can be added. Moreover, since the coating film obtained by using the coating composition containing the additive at a high concentration can exhibit a necessary function with a thinner film thickness, the fluorine-containing copolymer (A) and the compound (B) The ratio can be reduced.
(用途)
本発明のコーティング用組成物としては、下記の用途が挙げられる。
光学分野:光ファイバのクラッド材、レンズ等、各種光学フィルムの保護コート剤、防汚コート剤、低反射コート剤等、
太陽電池分野:保護カバー材、透明導電部材、バックシート等の保護コート剤、ガスバリア層、薄板ガラスのサポート樹脂層、接着層等、
表示パネル・ディスプレイ分野:各種表示パネル(液晶表示パネル、プラズマディスプレイパネル、エレクトロクロミックディスプレイパネル、エレクトロルミネッセンスディスプレイパネル、タッチパネル)に用いられる透明部材の保護コート剤、防汚コート剤、低反射コート剤;薄板ガラスのサポート樹脂等、
電気・電子分野:光ディスク、液晶セル、プリント基板、ICカード、感光ドラム、各種センサー、アンテナ、被覆電線、モータ、発電装置等の各種電気・電子部品の保護コート剤、撥水コート剤、低反射コート剤;半導体素子や集積回路装置における層間絶縁膜、保護膜;ソルダーマスク、ソルダーレジスト、IC封止剤、LED封止剤、電気絶縁性の被覆材等、
輸送機器分野:各種部材(表示機器表面材等の外装部材、計器盤表面材等の内装部材、安全ガラス用積層材等)の保護コート剤、防汚コート剤、低反射コート剤等、
建築分野:鏡、ガラス窓、樹脂窓等の保護コート剤、防汚コート剤、低反射コート剤等;建築用部材のシーラント部分、シーラントの防汚コート剤等、
分離膜分野:膜モジュール製造における接着剤、防汚コート剤;逆浸透膜、ナノ濾過膜等の機能層;二酸化炭素、水素等を分離するガス分離膜の機能層等、
その他:ゴム・プラスチック、木材、石材の保護コート剤、耐候・防汚コート剤;繊維・布帛の保護コート剤;防錆塗料、樹脂付着防止剤、インキ付着防止剤、ラミネート鋼板用プライマー、各種接着剤、結着剤等。 (Use)
The following uses are mentioned as a coating composition of this invention.
Optical field: Protective coating agent, antifouling coating agent, low reflection coating agent for various optical films, etc.
Solar cell field: protective cover material, transparent conductive member, protective coating agent such as back sheet, gas barrier layer, thin glass support resin layer, adhesive layer, etc.
Display panel / display field: Protective coating agent, antifouling coating agent, low reflection coating agent for transparent members used in various display panels (liquid crystal display panel, plasma display panel, electrochromic display panel, electroluminescence display panel, touch panel); Thin glass support resin, etc.
Electrical and electronic fields: Optical discs, liquid crystal cells, printed circuit boards, IC cards, photosensitive drums, various sensors, antennas, covered electric wires, motors, protective coating agents for various electrical and electronic parts, water repellent coating agents, low reflection Coating agent; interlayer insulating film in semiconductor element and integrated circuit device, protective film; solder mask, solder resist, IC sealing agent, LED sealing agent, electrically insulating coating material, etc.
Transportation equipment field: Protective coating agent, antifouling coating agent, low-reflective coating agent, etc. for various members (exterior members such as display device surface materials, interior members such as instrument panel surface materials, safety glass laminates, etc.)
Architectural field: Protective coating agents for mirrors, glass windows, resin windows, etc., antifouling coating agents, low-reflective coating agents, etc .; sealants for building components, antifouling coating agents for sealants,
Separation membrane field: Adhesives, antifouling coating agents in membrane module production; functional layers such as reverse osmosis membranes and nanofiltration membranes; functional layers of gas separation membranes that separate carbon dioxide, hydrogen, etc.
Others: Rubber / plastic, wood, stone protective coating agent, weathering / antifouling coating agent; fiber / fabric protective coating agent; anticorrosion paint, resin adhesion inhibitor, ink adhesion inhibitor, laminated steel plate primer, various adhesives Agents, binders, etc.
本発明のコーティング用組成物としては、下記の用途が挙げられる。
光学分野:光ファイバのクラッド材、レンズ等、各種光学フィルムの保護コート剤、防汚コート剤、低反射コート剤等、
太陽電池分野:保護カバー材、透明導電部材、バックシート等の保護コート剤、ガスバリア層、薄板ガラスのサポート樹脂層、接着層等、
表示パネル・ディスプレイ分野:各種表示パネル(液晶表示パネル、プラズマディスプレイパネル、エレクトロクロミックディスプレイパネル、エレクトロルミネッセンスディスプレイパネル、タッチパネル)に用いられる透明部材の保護コート剤、防汚コート剤、低反射コート剤;薄板ガラスのサポート樹脂等、
電気・電子分野:光ディスク、液晶セル、プリント基板、ICカード、感光ドラム、各種センサー、アンテナ、被覆電線、モータ、発電装置等の各種電気・電子部品の保護コート剤、撥水コート剤、低反射コート剤;半導体素子や集積回路装置における層間絶縁膜、保護膜;ソルダーマスク、ソルダーレジスト、IC封止剤、LED封止剤、電気絶縁性の被覆材等、
輸送機器分野:各種部材(表示機器表面材等の外装部材、計器盤表面材等の内装部材、安全ガラス用積層材等)の保護コート剤、防汚コート剤、低反射コート剤等、
建築分野:鏡、ガラス窓、樹脂窓等の保護コート剤、防汚コート剤、低反射コート剤等;建築用部材のシーラント部分、シーラントの防汚コート剤等、
分離膜分野:膜モジュール製造における接着剤、防汚コート剤;逆浸透膜、ナノ濾過膜等の機能層;二酸化炭素、水素等を分離するガス分離膜の機能層等、
その他:ゴム・プラスチック、木材、石材の保護コート剤、耐候・防汚コート剤;繊維・布帛の保護コート剤;防錆塗料、樹脂付着防止剤、インキ付着防止剤、ラミネート鋼板用プライマー、各種接着剤、結着剤等。 (Use)
The following uses are mentioned as a coating composition of this invention.
Optical field: Protective coating agent, antifouling coating agent, low reflection coating agent for various optical films, etc.
Solar cell field: protective cover material, transparent conductive member, protective coating agent such as back sheet, gas barrier layer, thin glass support resin layer, adhesive layer, etc.
Display panel / display field: Protective coating agent, antifouling coating agent, low reflection coating agent for transparent members used in various display panels (liquid crystal display panel, plasma display panel, electrochromic display panel, electroluminescence display panel, touch panel); Thin glass support resin, etc.
Electrical and electronic fields: Optical discs, liquid crystal cells, printed circuit boards, IC cards, photosensitive drums, various sensors, antennas, covered electric wires, motors, protective coating agents for various electrical and electronic parts, water repellent coating agents, low reflection Coating agent; interlayer insulating film in semiconductor element and integrated circuit device, protective film; solder mask, solder resist, IC sealing agent, LED sealing agent, electrically insulating coating material, etc.
Transportation equipment field: Protective coating agent, antifouling coating agent, low-reflective coating agent, etc. for various members (exterior members such as display device surface materials, interior members such as instrument panel surface materials, safety glass laminates, etc.)
Architectural field: Protective coating agents for mirrors, glass windows, resin windows, etc., antifouling coating agents, low-reflective coating agents, etc .; sealants for building components, antifouling coating agents for sealants,
Separation membrane field: Adhesives, antifouling coating agents in membrane module production; functional layers such as reverse osmosis membranes and nanofiltration membranes; functional layers of gas separation membranes that separate carbon dioxide, hydrogen, etc.
Others: Rubber / plastic, wood, stone protective coating agent, weathering / antifouling coating agent; fiber / fabric protective coating agent; anticorrosion paint, resin adhesion inhibitor, ink adhesion inhibitor, laminated steel plate primer, various adhesives Agents, binders, etc.
特に、半導体素子や集積回路装置における層間絶縁膜、保護膜等として本発明のコーティング用組成物を用いれば、含フッ素共重合体(A)の有する低吸水性、低誘電率、高耐熱性等の特性を生かした、応答速度が速く誤動作の少ない半導体素子や集積回路装置を得ることができる。
また、集光型太陽熱発電に用いられる集光用ミラーの保護コート剤、防汚コート剤;集光ミラーの裏打ち樹脂等の封止部分の保護コート剤;等として本発明のコーティング用組成物を用いれば、含フッ素共重合体(A)の有する高耐熱性、低吸水性等の特性によって、高耐久性でメンテナンスを必要としない発電システムを得ることができる。 In particular, if the coating composition of the present invention is used as an interlayer insulating film, protective film, etc. in semiconductor elements and integrated circuit devices, the low water absorption, low dielectric constant, high heat resistance, etc. possessed by the fluorinated copolymer (A) Thus, a semiconductor element and an integrated circuit device having a high response speed and few malfunctions can be obtained.
In addition, the coating composition of the present invention can be used as a protective coating agent or antifouling coating agent for a condensing mirror used in concentrating solar power generation; If used, a highly durable power generation system that does not require maintenance can be obtained due to the properties of the fluorine-containing copolymer (A) such as high heat resistance and low water absorption.
また、集光型太陽熱発電に用いられる集光用ミラーの保護コート剤、防汚コート剤;集光ミラーの裏打ち樹脂等の封止部分の保護コート剤;等として本発明のコーティング用組成物を用いれば、含フッ素共重合体(A)の有する高耐熱性、低吸水性等の特性によって、高耐久性でメンテナンスを必要としない発電システムを得ることができる。 In particular, if the coating composition of the present invention is used as an interlayer insulating film, protective film, etc. in semiconductor elements and integrated circuit devices, the low water absorption, low dielectric constant, high heat resistance, etc. possessed by the fluorinated copolymer (A) Thus, a semiconductor element and an integrated circuit device having a high response speed and few malfunctions can be obtained.
In addition, the coating composition of the present invention can be used as a protective coating agent or antifouling coating agent for a condensing mirror used in concentrating solar power generation; If used, a highly durable power generation system that does not require maintenance can be obtained due to the properties of the fluorine-containing copolymer (A) such as high heat resistance and low water absorption.
(作用効果)
本発明のコーティング用組成物は、含フッ素共重合体(A)と化合物(B)とが均一に混合された含フッ素共重合体組成物を含むため、比較的低温で焼成しても、密着性、耐擦傷性、耐熱性等に優れる塗膜を形成できる。 (Function and effect)
The coating composition of the present invention includes a fluorine-containing copolymer composition in which the fluorine-containing copolymer (A) and the compound (B) are uniformly mixed. A coating film having excellent properties, scratch resistance, heat resistance, and the like can be formed.
本発明のコーティング用組成物は、含フッ素共重合体(A)と化合物(B)とが均一に混合された含フッ素共重合体組成物を含むため、比較的低温で焼成しても、密着性、耐擦傷性、耐熱性等に優れる塗膜を形成できる。 (Function and effect)
The coating composition of the present invention includes a fluorine-containing copolymer composition in which the fluorine-containing copolymer (A) and the compound (B) are uniformly mixed. A coating film having excellent properties, scratch resistance, heat resistance, and the like can be formed.
<塗膜を有する物品>
本発明の塗膜を有する物品は、上記したコーティング用組成物を用いて形成された塗膜を基材の表面に有するものである。塗膜は、基材と分離することによって、フィルムとして用いてもよい。 <Article with coating film>
The article having the coating film of the present invention has a coating film formed using the above-described coating composition on the surface of the substrate. The coating film may be used as a film by separating from the substrate.
本発明の塗膜を有する物品は、上記したコーティング用組成物を用いて形成された塗膜を基材の表面に有するものである。塗膜は、基材と分離することによって、フィルムとして用いてもよい。 <Article with coating film>
The article having the coating film of the present invention has a coating film formed using the above-described coating composition on the surface of the substrate. The coating film may be used as a film by separating from the substrate.
(塗膜)
本発明のコーティング用組成物を用いて形成された塗膜又はフィルムは、溶融成形で得られるETFEフィルムに比べて、薄くかつ均一である。
塗膜又はフィルムの厚さは、用途に応じて適宜決定すればよい。固形分濃度の高いコーティング用組成物を用いれば、厚みのある塗膜が得られ、固形分濃度の低いコーティング用組成物を用いれば、薄い塗膜が得られる。また、塗布を複数回繰り返して行うことによって、より厚みのある塗膜を得ることもできる。 (Coating)
The coating film or film formed using the coating composition of the present invention is thinner and more uniform than the ETFE film obtained by melt molding.
What is necessary is just to determine the thickness of a coating film or a film suitably according to a use. If a coating composition with a high solid content concentration is used, a thick coating film is obtained, and if a coating composition with a low solid content concentration is used, a thin coating film is obtained. Moreover, a thicker coating film can also be obtained by repeating application | coating several times.
本発明のコーティング用組成物を用いて形成された塗膜又はフィルムは、溶融成形で得られるETFEフィルムに比べて、薄くかつ均一である。
塗膜又はフィルムの厚さは、用途に応じて適宜決定すればよい。固形分濃度の高いコーティング用組成物を用いれば、厚みのある塗膜が得られ、固形分濃度の低いコーティング用組成物を用いれば、薄い塗膜が得られる。また、塗布を複数回繰り返して行うことによって、より厚みのある塗膜を得ることもできる。 (Coating)
The coating film or film formed using the coating composition of the present invention is thinner and more uniform than the ETFE film obtained by melt molding.
What is necessary is just to determine the thickness of a coating film or a film suitably according to a use. If a coating composition with a high solid content concentration is used, a thick coating film is obtained, and if a coating composition with a low solid content concentration is used, a thin coating film is obtained. Moreover, a thicker coating film can also be obtained by repeating application | coating several times.
(基材)
基材としては、金属類(鉄、ステンレス鋼、アルミニウム、チタン、銅、銀等)、ガラス類(ソーダライムガラス、シリケートガラス、合成石英等)、シリコン、有機材料(ポリカーボネート、ポリエチレンテレフタレート、ポリメチルメタクリレート、ガラス繊維強化プラスチック、ポリ塩化ビニル等)、石材、木材、セラミックス、布、紙等が挙げられる。
基材の形状は、特に限定されない。 (Base material)
Base materials include metals (iron, stainless steel, aluminum, titanium, copper, silver, etc.), glasses (soda lime glass, silicate glass, synthetic quartz, etc.), silicon, organic materials (polycarbonate, polyethylene terephthalate, polymethyl) Methacrylate, glass fiber reinforced plastic, polyvinyl chloride, etc.), stone, wood, ceramics, cloth, paper and the like.
The shape of the substrate is not particularly limited.
基材としては、金属類(鉄、ステンレス鋼、アルミニウム、チタン、銅、銀等)、ガラス類(ソーダライムガラス、シリケートガラス、合成石英等)、シリコン、有機材料(ポリカーボネート、ポリエチレンテレフタレート、ポリメチルメタクリレート、ガラス繊維強化プラスチック、ポリ塩化ビニル等)、石材、木材、セラミックス、布、紙等が挙げられる。
基材の形状は、特に限定されない。 (Base material)
Base materials include metals (iron, stainless steel, aluminum, titanium, copper, silver, etc.), glasses (soda lime glass, silicate glass, synthetic quartz, etc.), silicon, organic materials (polycarbonate, polyethylene terephthalate, polymethyl) Methacrylate, glass fiber reinforced plastic, polyvinyl chloride, etc.), stone, wood, ceramics, cloth, paper and the like.
The shape of the substrate is not particularly limited.
基材には、基材と塗膜との密着性の向上等を目的として、前処理を施してもよい。前処理の方法としては、基材にシランカップリング剤、ポリエチレンイミン等を塗布する方法、サンドブラスト等によって表面を物理的に処理する方法、コロナ放電等によって処理する方法等が挙げられる。
The base material may be pretreated for the purpose of improving the adhesion between the base material and the coating film. Examples of the pretreatment method include a method of applying a silane coupling agent, polyethyleneimine or the like to the substrate, a method of physically treating the surface with sandblasting, a method of treating with corona discharge, or the like.
(塗膜の形成方法)
塗膜の形成方法としては、本発明のコーティング用組成物を基材に塗布してウエット膜を形成し、ウエット膜から媒体(C)を除去して塗膜とする方法が挙げられる。
塗布方法としては、グラビアコーティング、ディップコーティング、ダイコーティング、静電塗装、刷毛塗り、スクリーン印刷、ロールコーティング、スピンコーティング等が挙げられる。 (Formation method of coating film)
Examples of the method for forming a coating film include a method in which the coating composition of the present invention is applied to a substrate to form a wet film, and the medium (C) is removed from the wet film to form a coating film.
Examples of the application method include gravure coating, dip coating, die coating, electrostatic coating, brush coating, screen printing, roll coating, spin coating and the like.
塗膜の形成方法としては、本発明のコーティング用組成物を基材に塗布してウエット膜を形成し、ウエット膜から媒体(C)を除去して塗膜とする方法が挙げられる。
塗布方法としては、グラビアコーティング、ディップコーティング、ダイコーティング、静電塗装、刷毛塗り、スクリーン印刷、ロールコーティング、スピンコーティング等が挙げられる。 (Formation method of coating film)
Examples of the method for forming a coating film include a method in which the coating composition of the present invention is applied to a substrate to form a wet film, and the medium (C) is removed from the wet film to form a coating film.
Examples of the application method include gravure coating, dip coating, die coating, electrostatic coating, brush coating, screen printing, roll coating, spin coating and the like.
基材に塗布される際の本発明のコーティング用組成物の状態は、上述の(I)~(V)の状態のいずれであってもよい。スラリーの状態においても、各微粒子は媒体(C)中に均一に分散した状態にあるため、スラリー状態のコーティング用組成物を、含フッ素共重合体(A)が媒体(C)に溶解する溶解温度未満の塗布温度にて基材に塗布し、比較的低い乾燥温度にて媒体(C)を除去できる。塗布温度及び乾燥温度を比較的低い温度とすることによって、作業性が向上し、緻密で平坦な塗膜を得ることができる。
The state of the coating composition of the present invention when applied to the substrate may be any of the states (I) to (V) described above. Even in the slurry state, each fine particle is in a state of being uniformly dispersed in the medium (C). Therefore, the coating composition in the slurry state is dissolved so that the fluorinated copolymer (A) is dissolved in the medium (C). It can apply | coat to a base material at the application temperature less than temperature, and can remove a medium (C) at a comparatively low drying temperature. By making the coating temperature and the drying temperature relatively low, workability is improved and a dense and flat coating film can be obtained.
塗布温度は、コーティング用組成物の組成にもよるが、0~210℃が好ましく、0~130℃がより好ましく、0~50℃がさらに好ましい。塗布温度が0℃以上であれば、含フッ素共重合体(A)の分散状態が良好となり好ましい。塗布温度が210℃以下であれば、媒体(C)が急激に揮発しないため、気泡等の発生が抑えられる。
The application temperature depends on the composition of the coating composition, but is preferably 0 to 210 ° C, more preferably 0 to 130 ° C, and further preferably 0 to 50 ° C. A coating temperature of 0 ° C. or higher is preferable because the dispersion state of the fluorine-containing copolymer (A) is good. When the coating temperature is 210 ° C. or lower, the medium (C) does not volatilize rapidly, and thus generation of bubbles and the like can be suppressed.
媒体(C)の除去温度、すなわち乾燥温度は、0℃以上含フッ素共重合体(A)の融点未満が好ましく、0~200℃がより好ましく、0~150℃がさらに好ましい。乾燥温度が0℃以上であれば、溶媒の除去に時間がかかり過ぎず好ましい。乾燥温度が含フッ素共重合体(A)の融点未満であれば、着色、分解等の発生が抑えられる。
The removal temperature of the medium (C), that is, the drying temperature is preferably 0 ° C. or higher and lower than the melting point of the fluorinated copolymer (A), more preferably 0 to 200 ° C., and further preferably 0 to 150 ° C. A drying temperature of 0 ° C. or higher is preferable because it does not take too much time to remove the solvent. When the drying temperature is lower than the melting point of the fluorinated copolymer (A), the occurrence of coloring, decomposition and the like can be suppressed.
焼成(硬化)温度は、0℃以上含フッ素共重合体(A)の融点未満が好ましく、20~260℃がより好ましく、30~210℃がさらに好ましい。焼成(硬化)温度が0℃以上であれば、硬化に時間がかかり過ぎず好ましい。焼成(硬化)温度が含フッ素共重合体(A)の融点未満であれば、着色、分解等の発生が抑えられる。
The firing (curing) temperature is preferably 0 ° C. or higher and lower than the melting point of the fluorinated copolymer (A), more preferably 20 to 260 ° C., and further preferably 30 to 210 ° C. A firing (curing) temperature of 0 ° C. or higher is preferable because it does not take too long to cure. If the firing (curing) temperature is lower than the melting point of the fluorine-containing copolymer (A), the occurrence of coloring, decomposition, etc. can be suppressed.
(用途)
塗膜を有する物品としては、下記の用途が挙げられる。
光学分野:光ファイバ、レンズ、光ディスク、各種光学フィルム等、
太陽電池分野:集光用ミラー、ガラス又は樹脂で構成された保護カバー材、透明導電部材等、
表示パネル・ディスプレイ分野:各種表示パネルに用いられる透明部材(ガラス基板及び樹脂基板)等、
電気・電子分野:各種電気・電子部品、半導体素子、ハイブリッドIC、プリント基板、ICカード、各種センサー、感光ドラム、フィルムコンデンサ、電線・ケーブル、アンテナ、モータ、発電装置、LED封止剤等、
輸送機器分野:電車、バス、トラック、自動車、船舶、航空機等の各種部材、
建築分野:鏡、ガラス窓、樹脂窓、外壁、屋根材、橋、トンネル等、
医療分野:注射器、ピペット、体温計等、
化学分野:ビーカー類、シャーレ、メスシリンダー等、
分離膜分野:逆浸透膜、ナノ濾過膜、ガス分離膜等。 (Use)
The following uses are mentioned as an article | item which has a coating film.
Optical field: optical fiber, lens, optical disk, various optical films, etc.
Solar cell field: condensing mirror, protective cover material made of glass or resin, transparent conductive member, etc.
Display panel / display field: Transparent members (glass substrates and resin substrates) used in various display panels, etc.
Electrical / electronic field: Various electrical / electronic components, semiconductor elements, hybrid ICs, printed circuit boards, IC cards, various sensors, photosensitive drums, film capacitors, electric wires / cables, antennas, motors, power generators, LED sealants, etc.
Transportation equipment field: various components such as trains, buses, trucks, automobiles, ships, aircraft,
Architectural field: mirror, glass window, resin window, outer wall, roofing material, bridge, tunnel, etc.
Medical field: syringe, pipette, thermometer, etc.
Chemical field: Beakers, petri dishes, graduated cylinders, etc.
Separation membrane field: reverse osmosis membrane, nanofiltration membrane, gas separation membrane, etc.
塗膜を有する物品としては、下記の用途が挙げられる。
光学分野:光ファイバ、レンズ、光ディスク、各種光学フィルム等、
太陽電池分野:集光用ミラー、ガラス又は樹脂で構成された保護カバー材、透明導電部材等、
表示パネル・ディスプレイ分野:各種表示パネルに用いられる透明部材(ガラス基板及び樹脂基板)等、
電気・電子分野:各種電気・電子部品、半導体素子、ハイブリッドIC、プリント基板、ICカード、各種センサー、感光ドラム、フィルムコンデンサ、電線・ケーブル、アンテナ、モータ、発電装置、LED封止剤等、
輸送機器分野:電車、バス、トラック、自動車、船舶、航空機等の各種部材、
建築分野:鏡、ガラス窓、樹脂窓、外壁、屋根材、橋、トンネル等、
医療分野:注射器、ピペット、体温計等、
化学分野:ビーカー類、シャーレ、メスシリンダー等、
分離膜分野:逆浸透膜、ナノ濾過膜、ガス分離膜等。 (Use)
The following uses are mentioned as an article | item which has a coating film.
Optical field: optical fiber, lens, optical disk, various optical films, etc.
Solar cell field: condensing mirror, protective cover material made of glass or resin, transparent conductive member, etc.
Display panel / display field: Transparent members (glass substrates and resin substrates) used in various display panels, etc.
Electrical / electronic field: Various electrical / electronic components, semiconductor elements, hybrid ICs, printed circuit boards, IC cards, various sensors, photosensitive drums, film capacitors, electric wires / cables, antennas, motors, power generators, LED sealants, etc.
Transportation equipment field: various components such as trains, buses, trucks, automobiles, ships, aircraft,
Architectural field: mirror, glass window, resin window, outer wall, roofing material, bridge, tunnel, etc.
Medical field: syringe, pipette, thermometer, etc.
Chemical field: Beakers, petri dishes, graduated cylinders, etc.
Separation membrane field: reverse osmosis membrane, nanofiltration membrane, gas separation membrane, etc.
(作用効果)
本発明の塗膜を有する物品は、上記したコーティング用組成物を用いて形成された塗膜を有するものであるため、形成される塗膜が含フッ素共重合体の特性を維持しつつ、密着性、耐擦傷性、耐熱性等に優れる。
また、本発明のコーティング用組成物を用いることによって、塗布や乾燥を高温で行う必要がなくなることから、プラスチック、紙、布のような耐熱性の低い材料に対しても、基材の分解又は変形を起こさずに塗膜を形成できる。 (Function and effect)
Since the article having the coating film of the present invention has a coating film formed by using the coating composition described above, the coating film to be formed adheres while maintaining the characteristics of the fluorinated copolymer. Excellent in resistance, scratch resistance, heat resistance and the like.
Further, by using the coating composition of the present invention, it is not necessary to perform application and drying at a high temperature, so that the base material can be decomposed or decomposed even for materials having low heat resistance such as plastic, paper, and cloth. A coating film can be formed without causing deformation.
本発明の塗膜を有する物品は、上記したコーティング用組成物を用いて形成された塗膜を有するものであるため、形成される塗膜が含フッ素共重合体の特性を維持しつつ、密着性、耐擦傷性、耐熱性等に優れる。
また、本発明のコーティング用組成物を用いることによって、塗布や乾燥を高温で行う必要がなくなることから、プラスチック、紙、布のような耐熱性の低い材料に対しても、基材の分解又は変形を起こさずに塗膜を形成できる。 (Function and effect)
Since the article having the coating film of the present invention has a coating film formed by using the coating composition described above, the coating film to be formed adheres while maintaining the characteristics of the fluorinated copolymer. Excellent in resistance, scratch resistance, heat resistance and the like.
Further, by using the coating composition of the present invention, it is not necessary to perform application and drying at a high temperature, so that the base material can be decomposed or decomposed even for materials having low heat resistance such as plastic, paper, and cloth. A coating film can be formed without causing deformation.
<成形品>
本発明の成形品は、上記した含フッ素共重合体組成物を成形してなるものである。
成形品は、通常、含フッ素共重合体組成物から分離された、含フッ素共重合体(A)及び化合物(B)の混合物からなる固形分を成形することによって製造される。 <Molded product>
The molded article of the present invention is formed by molding the above-mentioned fluorine-containing copolymer composition.
The molded article is usually produced by molding a solid content composed of a mixture of the fluorine-containing copolymer (A) and the compound (B) separated from the fluorine-containing copolymer composition.
本発明の成形品は、上記した含フッ素共重合体組成物を成形してなるものである。
成形品は、通常、含フッ素共重合体組成物から分離された、含フッ素共重合体(A)及び化合物(B)の混合物からなる固形分を成形することによって製造される。 <Molded product>
The molded article of the present invention is formed by molding the above-mentioned fluorine-containing copolymer composition.
The molded article is usually produced by molding a solid content composed of a mixture of the fluorine-containing copolymer (A) and the compound (B) separated from the fluorine-containing copolymer composition.
固形分の分離方法としては、スラリー状態の含フッ素共重合体組成物を濾過する方法が挙げられる。濾過方法としては、公知の方法が挙げられる。
含フッ素共重合体組成物が溶液状態(又は溶液状態とスラリー状態が混在した状態)の場合は、含フッ素共重合体(A)及び化合物(B)に対して親和性の低い溶媒(以下、貧溶媒という。)を加えて析出を完全なものにするのが好ましい。貧溶媒としては、ヘキサン、メタノール等が挙げられる。 Examples of the solid content separation method include a method of filtering the slurry-containing fluorine-containing copolymer composition. As the filtration method, a known method may be mentioned.
When the fluorine-containing copolymer composition is in a solution state (or a state where a solution state and a slurry state are mixed), a solvent having a low affinity for the fluorine-containing copolymer (A) and the compound (B) (hereinafter, It is preferable to complete precipitation by adding a poor solvent). Examples of the poor solvent include hexane and methanol.
含フッ素共重合体組成物が溶液状態(又は溶液状態とスラリー状態が混在した状態)の場合は、含フッ素共重合体(A)及び化合物(B)に対して親和性の低い溶媒(以下、貧溶媒という。)を加えて析出を完全なものにするのが好ましい。貧溶媒としては、ヘキサン、メタノール等が挙げられる。 Examples of the solid content separation method include a method of filtering the slurry-containing fluorine-containing copolymer composition. As the filtration method, a known method may be mentioned.
When the fluorine-containing copolymer composition is in a solution state (or a state where a solution state and a slurry state are mixed), a solvent having a low affinity for the fluorine-containing copolymer (A) and the compound (B) (hereinafter, It is preferable to complete precipitation by adding a poor solvent). Examples of the poor solvent include hexane and methanol.
分離された固形分は、乾燥し、媒体(C)及び貧溶媒を除去することが好ましい。乾燥手段としては、真空ドライオーブン等が挙げられる。
成形方法としては、公知の方法が挙げられる。
成形品の用途としては、塗膜を有する物品と同様の用途が挙げられる。 The separated solid content is preferably dried to remove the medium (C) and the poor solvent. Examples of the drying means include a vacuum drying oven.
As the molding method, a known method may be mentioned.
As a use of a molded article, the same use as an article having a coating film can be given.
成形方法としては、公知の方法が挙げられる。
成形品の用途としては、塗膜を有する物品と同様の用途が挙げられる。 The separated solid content is preferably dried to remove the medium (C) and the poor solvent. Examples of the drying means include a vacuum drying oven.
As the molding method, a known method may be mentioned.
As a use of a molded article, the same use as an article having a coating film can be given.
(作用効果)
本発明の成形品は、上記した含フッ素共重合体組成物を用いて得られたものであるため、含フッ素共重合体の特性を維持しつつ、耐擦傷性、耐熱性等に優れる。 (Function and effect)
Since the molded article of the present invention is obtained using the above-mentioned fluorine-containing copolymer composition, it is excellent in scratch resistance, heat resistance and the like while maintaining the properties of the fluorine-containing copolymer.
本発明の成形品は、上記した含フッ素共重合体組成物を用いて得られたものであるため、含フッ素共重合体の特性を維持しつつ、耐擦傷性、耐熱性等に優れる。 (Function and effect)
Since the molded article of the present invention is obtained using the above-mentioned fluorine-containing copolymer composition, it is excellent in scratch resistance, heat resistance and the like while maintaining the properties of the fluorine-containing copolymer.
以下、実施例により本発明をさらに詳細に説明するが、本発明はこれら実施例に限定されて解釈されない。
例1~38、及び41~67は実施例であり、例39、40及び68は比較例である。 EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is limited to these Examples and is not interpreted.
Examples 1 to 38 and 41 to 67 are examples, and examples 39, 40 and 68 are comparative examples.
例1~38、及び41~67は実施例であり、例39、40及び68は比較例である。 EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is limited to these Examples and is not interpreted.
Examples 1 to 38 and 41 to 67 are examples, and examples 39, 40 and 68 are comparative examples.
(表面硬度)
表面硬度は、鉛筆引っかき試験(JIS K5600)に準じて測定した。 (surface hardness)
The surface hardness was measured according to a pencil scratch test (JIS K5600).
表面硬度は、鉛筆引っかき試験(JIS K5600)に準じて測定した。 (surface hardness)
The surface hardness was measured according to a pencil scratch test (JIS K5600).
(熱分解温度)
熱分解温度は、示差熱分析計(ブルカー・エイエックスエス社製、TG-DTA2000SA)を用いて測定した。測定の温度範囲は、室温~600℃であり、サンプル約10mgを白金パンに入れて、混合エアー流量100mL/分の空気気流中において、昇温速度10℃/分で測定した。示差熱分析で観察される10%質量減少温度で耐熱性を評価した。 (Pyrolysis temperature)
The thermal decomposition temperature was measured using a differential thermal analyzer (TG-DTA2000SA, manufactured by Bruker AXS). The temperature range of the measurement was room temperature to 600 ° C., about 10 mg of a sample was put in a platinum pan, and the measurement was performed at a temperature increase rate of 10 ° C./min in an air stream with a mixed air flow rate of 100 mL / min. The heat resistance was evaluated at a 10% mass reduction temperature observed by differential thermal analysis.
熱分解温度は、示差熱分析計(ブルカー・エイエックスエス社製、TG-DTA2000SA)を用いて測定した。測定の温度範囲は、室温~600℃であり、サンプル約10mgを白金パンに入れて、混合エアー流量100mL/分の空気気流中において、昇温速度10℃/分で測定した。示差熱分析で観察される10%質量減少温度で耐熱性を評価した。 (Pyrolysis temperature)
The thermal decomposition temperature was measured using a differential thermal analyzer (TG-DTA2000SA, manufactured by Bruker AXS). The temperature range of the measurement was room temperature to 600 ° C., about 10 mg of a sample was put in a platinum pan, and the measurement was performed at a temperature increase rate of 10 ° C./min in an air stream with a mixed air flow rate of 100 mL / min. The heat resistance was evaluated at a 10% mass reduction temperature observed by differential thermal analysis.
(密着性試験)
密着性の試験は、JIS K5600に準じて測定した。すなわち、基材上の塗膜にカッターナイフを用いて2mm間隔の直行する縦横11本の切傷を付け、100マスの碁盤目を作り、この碁盤目上にセロファン粘着テープを強く圧着し、該テープの端を持ち、瞬間的に引き剥がし、基材上に剥離せず残存している塗膜を観察した。5回の剥離試験の後の塗膜の剥離の状態により評価した。
91マス以上が残存していたものを○(優)、90~51マスが残存していたものを△(良)、50~0マスが残存していたものを×(不良)とした。 (Adhesion test)
The adhesion test was measured according to JIS K5600. In other words, the coating film on the substrate is cut with 11 vertical and horizontal cuts at 2 mm intervals using a cutter knife, a 100 square grid is made, and a cellophane adhesive tape is strongly pressure-bonded on the grid, and the tape The film was peeled off instantaneously, and the coating film remaining on the substrate without being peeled was observed. Evaluation was made based on the state of peeling of the coating film after five peeling tests.
The case where 91 squares or more remained was marked as ◯ (excellent), the case where 90 to 51 squares remained was marked as △ (good), and the case where 50 to 0 squares remained was marked as x (bad).
密着性の試験は、JIS K5600に準じて測定した。すなわち、基材上の塗膜にカッターナイフを用いて2mm間隔の直行する縦横11本の切傷を付け、100マスの碁盤目を作り、この碁盤目上にセロファン粘着テープを強く圧着し、該テープの端を持ち、瞬間的に引き剥がし、基材上に剥離せず残存している塗膜を観察した。5回の剥離試験の後の塗膜の剥離の状態により評価した。
91マス以上が残存していたものを○(優)、90~51マスが残存していたものを△(良)、50~0マスが残存していたものを×(不良)とした。 (Adhesion test)
The adhesion test was measured according to JIS K5600. In other words, the coating film on the substrate is cut with 11 vertical and horizontal cuts at 2 mm intervals using a cutter knife, a 100 square grid is made, and a cellophane adhesive tape is strongly pressure-bonded on the grid, and the tape The film was peeled off instantaneously, and the coating film remaining on the substrate without being peeled was observed. Evaluation was made based on the state of peeling of the coating film after five peeling tests.
The case where 91 squares or more remained was marked as ◯ (excellent), the case where 90 to 51 squares remained was marked as △ (good), and the case where 50 to 0 squares remained was marked as x (bad).
(加熱プレス成形)
プレスフィルムの作製は、加熱プレス機(テスター産業社製、SA-301)を用いて行った。 (Hot press molding)
The press film was produced using a heating press (Tester Sangyo Co., Ltd., SA-301).
プレスフィルムの作製は、加熱プレス機(テスター産業社製、SA-301)を用いて行った。 (Hot press molding)
The press film was produced using a heating press (Tester Sangyo Co., Ltd., SA-301).
(引張試験)
加熱プレス機で成形したプレスフィルムからダンベル形状の試験片(長さ:45mm、平行部分の長さ:22mm、幅:5mm、厚さ:約100μm)を作製した。オリエンテック社製、Tensilon RTC-1210を用い、下記の条件にて降伏点応力、破断点伸度を測定した。
つかみ具間距離:22mm、
引張速度:10mm/分、
温度:25℃、
相対湿度:50%、
その他の条件:JIS K7113(プラスチックの引張試験方法)に準じた。 (Tensile test)
A dumbbell-shaped test piece (length: 45 mm, length of parallel part: 22 mm, width: 5 mm, thickness: about 100 μm) was produced from a press film formed by a heating press. Using Tensilon RTC-1210 manufactured by Orientec Co., Ltd., yield stress and elongation at break were measured under the following conditions.
Distance between grips: 22mm
Tensile speed: 10 mm / min,
Temperature: 25 ° C
Relative humidity: 50%
Other conditions: Conforms to JIS K7113 (plastic tensile test method).
加熱プレス機で成形したプレスフィルムからダンベル形状の試験片(長さ:45mm、平行部分の長さ:22mm、幅:5mm、厚さ:約100μm)を作製した。オリエンテック社製、Tensilon RTC-1210を用い、下記の条件にて降伏点応力、破断点伸度を測定した。
つかみ具間距離:22mm、
引張速度:10mm/分、
温度:25℃、
相対湿度:50%、
その他の条件:JIS K7113(プラスチックの引張試験方法)に準じた。 (Tensile test)
A dumbbell-shaped test piece (length: 45 mm, length of parallel part: 22 mm, width: 5 mm, thickness: about 100 μm) was produced from a press film formed by a heating press. Using Tensilon RTC-1210 manufactured by Orientec Co., Ltd., yield stress and elongation at break were measured under the following conditions.
Distance between grips: 22mm
Tensile speed: 10 mm / min,
Temperature: 25 ° C
Relative humidity: 50%
Other conditions: Conforms to JIS K7113 (plastic tensile test method).
(厚さ)
ポッティングで得られた塗膜については、触針式表面形状測定器(Sloan社製、DEKTAK 3ST)にて厚さを測定した。
加熱プレス機で成形したプレスフィルムの厚さについては、デジタルマイクロメータ(新潟精機社製、MCD191-30WD)にて厚さを測定した。
上記以外の方法で得られた塗膜については、非接触光学式薄膜測定装置(フィルメトリクス社製、Filmetrics F-20)にて厚さを測定した。 (thickness)
About the coating film obtained by potting, thickness was measured with the stylus type surface shape measuring device (the product made by Sloan, DEKTAK 3ST).
About the thickness of the press film shape | molded with the heating press machine, thickness was measured with the digital micrometer (the Niigata Seiki company make, MCD191-30WD).
About the coating film obtained by methods other than the above, the thickness was measured with a non-contact optical thin film measuring apparatus (Filmtrics F-20, manufactured by Filmetrics).
ポッティングで得られた塗膜については、触針式表面形状測定器(Sloan社製、DEKTAK 3ST)にて厚さを測定した。
加熱プレス機で成形したプレスフィルムの厚さについては、デジタルマイクロメータ(新潟精機社製、MCD191-30WD)にて厚さを測定した。
上記以外の方法で得られた塗膜については、非接触光学式薄膜測定装置(フィルメトリクス社製、Filmetrics F-20)にて厚さを測定した。 (thickness)
About the coating film obtained by potting, thickness was measured with the stylus type surface shape measuring device (the product made by Sloan, DEKTAK 3ST).
About the thickness of the press film shape | molded with the heating press machine, thickness was measured with the digital micrometer (the Niigata Seiki company make, MCD191-30WD).
About the coating film obtained by methods other than the above, the thickness was measured with a non-contact optical thin film measuring apparatus (Filmtrics F-20, manufactured by Filmetrics).
(含フッ素共重合体(A))
含フッ素共重合体(A-1)及び(A-2)は、日本特許第3272474号公報又は国際公開第2006/134764号に記載の方法で製造した。
含フッ素共重合体(A-1):単量体に基づく繰り返し単位の割合(モル比):TFE/エチレン/3,3,4,4,4-ペンタフルオロ-1-ブテン/無水イタコン酸=57.5/39.9/2.3/0.3、融点:240℃。
含フッ素共重合体(A-2):単量体に基づく繰り返し単位の割合(モル比):TFE/エチレン/ヘキサフルオロプロピレン/3,3,4,4,5,5,6,6,6-ノナフルオロ-1-ヘキセン/無水イタコン酸=47.7/42.5/8.4/1.2/0.2、融点:188℃。 (Fluorine-containing copolymer (A))
The fluorine-containing copolymers (A-1) and (A-2) were produced by the method described in Japanese Patent No. 3272474 or International Publication No. 2006/134664.
Fluorine-containing copolymer (A-1): ratio of repeating units based on monomer (molar ratio): TFE / ethylene / 3,3,4,4,4-pentafluoro-1-butene / itaconic anhydride = 57.5 / 39.9 / 2.3 / 0.3, melting point: 240 ° C.
Fluorine-containing copolymer (A-2): Ratio of repeating units based on monomer (molar ratio): TFE / ethylene / hexafluoropropylene / 3,3,4,4,5,5,6,6,6 Nonafluoro-1-hexene / itaconic anhydride = 47.7 / 42.5 / 8.4 / 1.2 / 0.2, melting point: 188 ° C.
含フッ素共重合体(A-1)及び(A-2)は、日本特許第3272474号公報又は国際公開第2006/134764号に記載の方法で製造した。
含フッ素共重合体(A-1):単量体に基づく繰り返し単位の割合(モル比):TFE/エチレン/3,3,4,4,4-ペンタフルオロ-1-ブテン/無水イタコン酸=57.5/39.9/2.3/0.3、融点:240℃。
含フッ素共重合体(A-2):単量体に基づく繰り返し単位の割合(モル比):TFE/エチレン/ヘキサフルオロプロピレン/3,3,4,4,5,5,6,6,6-ノナフルオロ-1-ヘキセン/無水イタコン酸=47.7/42.5/8.4/1.2/0.2、融点:188℃。 (Fluorine-containing copolymer (A))
The fluorine-containing copolymers (A-1) and (A-2) were produced by the method described in Japanese Patent No. 3272474 or International Publication No. 2006/134664.
Fluorine-containing copolymer (A-1): ratio of repeating units based on monomer (molar ratio): TFE / ethylene / 3,3,4,4,4-pentafluoro-1-butene / itaconic anhydride = 57.5 / 39.9 / 2.3 / 0.3, melting point: 240 ° C.
Fluorine-containing copolymer (A-2): Ratio of repeating units based on monomer (molar ratio): TFE / ethylene / hexafluoropropylene / 3,3,4,4,5,5,6,6,6 Nonafluoro-1-hexene / itaconic anhydride = 47.7 / 42.5 / 8.4 / 1.2 / 0.2, melting point: 188 ° C.
(化合物(B))
化合物(B1-1):3’,4’-エポキシシクロヘキサンカルボン酸3,4-エポキシシクロヘキシルメチル(ワコーケミカル社製、カタログ番号:326-64072)。
化合物(B1-2):1,4-ブタンジオールジグリシジルエーテル(東京化成社製、カタログ番号:B0964)。
化合物(B1-3):ネオペンチルグリコールジグリシジルエーテル(東京化成社製、カタログ番号:N0448)。
化合物(B1-4):トリメチロールプロパントリグリシジルエーテル(Aldrich社製、カタログ番号:430269)。
化合物(B1-5):1,2-シクロヘキサンジカルボン酸ジグリシジル(東京化成社製、カタログ番号:C1434)。
化合物(B1-6):水素化ビスフェノールAグリシジルエーテル(新日本理化社製、リカレジンHBE-100)。
化合物(B1-7):2,2-ビス(4-グリシジルオキシフェニル)プロパン(ビスフェノールA型エポキシ樹脂、東京化成社製、カタログ番号:B1796)。
化合物(B1-8):ビスフェノールA-エピクロロヒドリン共重合体(グリシジル化体)(Aldrich社製、カタログ番号:406821)。
化合物(B1-9):フェニルグリシジルエーテル-ホルムアルデヒド共重合体(フェノールノボラックエポキシ樹脂、Aldrich社製、カタログ番号:406775)。
化合物(B1-10):o-クレジルグリシジルエーテル-ホルムアルデヒド共重合体(クレゾールノボラックエポキシ樹脂、Aldrich社製、カタログ番号:405515)。
化合物(B1-11):1,3-ビス(N,N-ジグリシジルアミノメチル)シクロヘキサン(三菱ガス化学社製、製品名:テトラッド-C)。
化合物(B3-1):メタクリル酸グリシジル(東京化成社製、カタログ番号:M0590)。
化合物(B3-2):アリルグリシジルエーテル(東京化成社製、カタログ番号:A0221)。
化合物(B2-1):トリメチロールプロパントリアクリレート(東京化成社製、カタログ番号:T0949)。
化合物(B2-2):トリシクロデカンジメタノールジアクリレート(新中村化学社製、製品名:A-DCP)。
化合物(B2-3):ネオペンチルグリコールジアクリレート(東京化成社製、カタログ番号:N0790)。
化合物(B2-4):1,6-ビス(アクリロイルオキシ)-2,2,3,3,4,4,5,5-オクタフルオロヘキサン(東京化成社製、カタログ番号:B2340)。
化合物(B2-5):ビスアリルナジイミド樹脂(丸善石油化学社製、製品名:BANI-M)。
化合物(B2-6):ビスアリルナジイミド樹脂(丸善石油化学社製、製品名:BANI-X)。
化合物(B2-7):メタクリル酸メチル(東京化成社製、カタログ番号:M0087)。
化合物(B2-8):メタクリル酸イソブチル(東京化成社製、カタログ番号:M0132)。 (Compound (B))
Compound (B1-1): 3,4-epoxycyclohexylmethyl 3 ′, 4′-epoxycyclohexanecarboxylate (manufactured by Wako Chemical Co., catalog number: 326-64072).
Compound (B1-2): 1,4-butanediol diglycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B0964).
Compound (B1-3): Neopentyl glycol diglycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: N0448).
Compound (B1-4): Trimethylolpropane triglycidyl ether (manufactured by Aldrich, catalog number: 430269).
Compound (B1-5): diglycidyl 1,2-cyclohexanedicarboxylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: C1434).
Compound (B1-6): Hydrogenated bisphenol A glycidyl ether (manufactured by Shin Nippon Chemical Co., Ltd., Rica Resin HBE-100).
Compound (B1-7): 2,2-bis (4-glycidyloxyphenyl) propane (bisphenol A type epoxy resin, manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B1796).
Compound (B1-8): Bisphenol A-epichlorohydrin copolymer (glycidylated product) (manufactured by Aldrich, catalog number: 406721).
Compound (B1-9): Phenyl glycidyl ether-formaldehyde copolymer (phenol novolac epoxy resin, manufactured by Aldrich, catalog number: 406775).
Compound (B1-10): o-cresyl glycidyl ether-formaldehyde copolymer (cresol novolac epoxy resin, manufactured by Aldrich, catalog number: 405515).
Compound (B1-11): 1,3-bis (N, N-diglycidylaminomethyl) cyclohexane (manufactured by Mitsubishi Gas Chemical Company, product name: Tetrad-C).
Compound (B3-1): glycidyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0590).
Compound (B3-2): allyl glycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: A0221).
Compound (B2-1): trimethylolpropane triacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: T0949).
Compound (B2-2): Tricyclodecane dimethanol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., product name: A-DCP).
Compound (B2-3): Neopentyl glycol diacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: N0790).
Compound (B2-4): 1,6-bis (acryloyloxy) -2,2,3,3,4,4,5,5-octafluorohexane (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B2340).
Compound (B2-5): Bisallyl nadiimide resin (manufactured by Maruzen Petrochemical Co., Ltd., product name: BANI-M).
Compound (B2-6): Bisallyl nadiimide resin (manufactured by Maruzen Petrochemical Co., Ltd., product name: BANI-X).
Compound (B2-7): Methyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0087).
Compound (B2-8): Isobutyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0132).
化合物(B1-1):3’,4’-エポキシシクロヘキサンカルボン酸3,4-エポキシシクロヘキシルメチル(ワコーケミカル社製、カタログ番号:326-64072)。
化合物(B1-2):1,4-ブタンジオールジグリシジルエーテル(東京化成社製、カタログ番号:B0964)。
化合物(B1-3):ネオペンチルグリコールジグリシジルエーテル(東京化成社製、カタログ番号:N0448)。
化合物(B1-4):トリメチロールプロパントリグリシジルエーテル(Aldrich社製、カタログ番号:430269)。
化合物(B1-5):1,2-シクロヘキサンジカルボン酸ジグリシジル(東京化成社製、カタログ番号:C1434)。
化合物(B1-6):水素化ビスフェノールAグリシジルエーテル(新日本理化社製、リカレジンHBE-100)。
化合物(B1-7):2,2-ビス(4-グリシジルオキシフェニル)プロパン(ビスフェノールA型エポキシ樹脂、東京化成社製、カタログ番号:B1796)。
化合物(B1-8):ビスフェノールA-エピクロロヒドリン共重合体(グリシジル化体)(Aldrich社製、カタログ番号:406821)。
化合物(B1-9):フェニルグリシジルエーテル-ホルムアルデヒド共重合体(フェノールノボラックエポキシ樹脂、Aldrich社製、カタログ番号:406775)。
化合物(B1-10):o-クレジルグリシジルエーテル-ホルムアルデヒド共重合体(クレゾールノボラックエポキシ樹脂、Aldrich社製、カタログ番号:405515)。
化合物(B1-11):1,3-ビス(N,N-ジグリシジルアミノメチル)シクロヘキサン(三菱ガス化学社製、製品名:テトラッド-C)。
化合物(B3-1):メタクリル酸グリシジル(東京化成社製、カタログ番号:M0590)。
化合物(B3-2):アリルグリシジルエーテル(東京化成社製、カタログ番号:A0221)。
化合物(B2-1):トリメチロールプロパントリアクリレート(東京化成社製、カタログ番号:T0949)。
化合物(B2-2):トリシクロデカンジメタノールジアクリレート(新中村化学社製、製品名:A-DCP)。
化合物(B2-3):ネオペンチルグリコールジアクリレート(東京化成社製、カタログ番号:N0790)。
化合物(B2-4):1,6-ビス(アクリロイルオキシ)-2,2,3,3,4,4,5,5-オクタフルオロヘキサン(東京化成社製、カタログ番号:B2340)。
化合物(B2-5):ビスアリルナジイミド樹脂(丸善石油化学社製、製品名:BANI-M)。
化合物(B2-6):ビスアリルナジイミド樹脂(丸善石油化学社製、製品名:BANI-X)。
化合物(B2-7):メタクリル酸メチル(東京化成社製、カタログ番号:M0087)。
化合物(B2-8):メタクリル酸イソブチル(東京化成社製、カタログ番号:M0132)。 (Compound (B))
Compound (B1-1): 3,4-epoxycyclohexylmethyl 3 ′, 4′-epoxycyclohexanecarboxylate (manufactured by Wako Chemical Co., catalog number: 326-64072).
Compound (B1-2): 1,4-butanediol diglycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B0964).
Compound (B1-3): Neopentyl glycol diglycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: N0448).
Compound (B1-4): Trimethylolpropane triglycidyl ether (manufactured by Aldrich, catalog number: 430269).
Compound (B1-5): diglycidyl 1,2-cyclohexanedicarboxylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: C1434).
Compound (B1-6): Hydrogenated bisphenol A glycidyl ether (manufactured by Shin Nippon Chemical Co., Ltd., Rica Resin HBE-100).
Compound (B1-7): 2,2-bis (4-glycidyloxyphenyl) propane (bisphenol A type epoxy resin, manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B1796).
Compound (B1-8): Bisphenol A-epichlorohydrin copolymer (glycidylated product) (manufactured by Aldrich, catalog number: 406721).
Compound (B1-9): Phenyl glycidyl ether-formaldehyde copolymer (phenol novolac epoxy resin, manufactured by Aldrich, catalog number: 406775).
Compound (B1-10): o-cresyl glycidyl ether-formaldehyde copolymer (cresol novolac epoxy resin, manufactured by Aldrich, catalog number: 405515).
Compound (B1-11): 1,3-bis (N, N-diglycidylaminomethyl) cyclohexane (manufactured by Mitsubishi Gas Chemical Company, product name: Tetrad-C).
Compound (B3-1): glycidyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0590).
Compound (B3-2): allyl glycidyl ether (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: A0221).
Compound (B2-1): trimethylolpropane triacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: T0949).
Compound (B2-2): Tricyclodecane dimethanol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., product name: A-DCP).
Compound (B2-3): Neopentyl glycol diacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: N0790).
Compound (B2-4): 1,6-bis (acryloyloxy) -2,2,3,3,4,4,5,5-octafluorohexane (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: B2340).
Compound (B2-5): Bisallyl nadiimide resin (manufactured by Maruzen Petrochemical Co., Ltd., product name: BANI-M).
Compound (B2-6): Bisallyl nadiimide resin (manufactured by Maruzen Petrochemical Co., Ltd., product name: BANI-X).
Compound (B2-7): Methyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0087).
Compound (B2-8): Isobutyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0132).
(媒体(C))
媒体(C-1):ジイソプロピルケトン(東京化成社製、カタログ番号:D0770)。
媒体(C-2):2-ヘキサノン(東京化成社製、カタログ番号:H0114)。 (Medium (C))
Medium (C-1): diisopropyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D0770).
Medium (C-2): 2-hexanone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0114).
媒体(C-1):ジイソプロピルケトン(東京化成社製、カタログ番号:D0770)。
媒体(C-2):2-ヘキサノン(東京化成社製、カタログ番号:H0114)。 (Medium (C))
Medium (C-1): diisopropyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D0770).
Medium (C-2): 2-hexanone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0114).
(化合物(D))
化合物(D1-1):1,2-シクロヘキサンジカルボン酸無水物(Aldrich社製、カタログ番号:123463)。
化合物(D1-2):4-メチル-4-シクロヘキセン-1,2-ジカルボン酸無水物(東京化成社製、カタログ番号:M1192)。
化合物(D1-3):フタル酸無水物(東京化成社製、カタログ番号:P1614)。
化合物(D1-4):イソオクタデシルコハク酸無水物(東京化成社製、カタログ番号:I0146)。
化合物(D1-5):1,8-ジアミノ-p-メンタン(Aldrich社製、カタログ番号:D19605)。
化合物(D2-1):2-エチル-4-メチルイミダゾール(東京化成社製、カタログ番号:E0232)。
化合物(D2-2):テトラブチルホスホニウム-O,O-ジエチルホスホロジチオアート(ワコーケミカル社製、カタログ番号:328-33902)。
化合物(D2-3):ジフェニルヨードニウムヘキサフルオロホスフェート(東京化成社製、カタログ番号:D2238)。
化合物(D2-4):1-ヒドロキシシクロヘキシルフェニルケトン(東京化成社製、カタログ番号:H0617)。
化合物(D2-5):2,2-ジメトキシ-1,2-ジフェニルエタン1-オン(東京化成社製、カタログ番号:D1702) (Compound (D))
Compound (D1-1): 1,2-cyclohexanedicarboxylic anhydride (manufactured by Aldrich, catalog number: 123463).
Compound (D1-2): 4-methyl-4-cyclohexene-1,2-dicarboxylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M1192).
Compound (D1-3): phthalic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: P1614).
Compound (D1-4): Isooctadecyl succinic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: I0146).
Compound (D1-5): 1,8-diamino-p-menthane (manufactured by Aldrich, catalog number: D19605).
Compound (D2-1): 2-ethyl-4-methylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: E0232).
Compound (D2-2): Tetrabutylphosphonium-O, O-diethyl phosphorodithioate (manufactured by Wako Chemical Co., catalog number: 328-33902).
Compound (D2-3): Diphenyliodonium hexafluorophosphate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D2238).
Compound (D2-4): 1-hydroxycyclohexyl phenyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0617).
Compound (D2-5): 2,2-dimethoxy-1,2-diphenylethane 1-one (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D1702)
化合物(D1-1):1,2-シクロヘキサンジカルボン酸無水物(Aldrich社製、カタログ番号:123463)。
化合物(D1-2):4-メチル-4-シクロヘキセン-1,2-ジカルボン酸無水物(東京化成社製、カタログ番号:M1192)。
化合物(D1-3):フタル酸無水物(東京化成社製、カタログ番号:P1614)。
化合物(D1-4):イソオクタデシルコハク酸無水物(東京化成社製、カタログ番号:I0146)。
化合物(D1-5):1,8-ジアミノ-p-メンタン(Aldrich社製、カタログ番号:D19605)。
化合物(D2-1):2-エチル-4-メチルイミダゾール(東京化成社製、カタログ番号:E0232)。
化合物(D2-2):テトラブチルホスホニウム-O,O-ジエチルホスホロジチオアート(ワコーケミカル社製、カタログ番号:328-33902)。
化合物(D2-3):ジフェニルヨードニウムヘキサフルオロホスフェート(東京化成社製、カタログ番号:D2238)。
化合物(D2-4):1-ヒドロキシシクロヘキシルフェニルケトン(東京化成社製、カタログ番号:H0617)。
化合物(D2-5):2,2-ジメトキシ-1,2-ジフェニルエタン1-オン(東京化成社製、カタログ番号:D1702) (Compound (D))
Compound (D1-1): 1,2-cyclohexanedicarboxylic anhydride (manufactured by Aldrich, catalog number: 123463).
Compound (D1-2): 4-methyl-4-cyclohexene-1,2-dicarboxylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M1192).
Compound (D1-3): phthalic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: P1614).
Compound (D1-4): Isooctadecyl succinic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: I0146).
Compound (D1-5): 1,8-diamino-p-menthane (manufactured by Aldrich, catalog number: D19605).
Compound (D2-1): 2-ethyl-4-methylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: E0232).
Compound (D2-2): Tetrabutylphosphonium-O, O-diethyl phosphorodithioate (manufactured by Wako Chemical Co., catalog number: 328-33902).
Compound (D2-3): Diphenyliodonium hexafluorophosphate (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D2238).
Compound (D2-4): 1-hydroxycyclohexyl phenyl ketone (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0617).
Compound (D2-5): 2,2-dimethoxy-1,2-diphenylethane 1-one (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: D1702)
(化合物(E))
化合物(E1-1):テトラデシルアミン(東京化成社製、カタログ番号:T0090)。
化合物(E1-2):N-メチルオクタデシルアミン(東京化成社製、カタログ番号:M0912)。
化合物(E1-3):2-ウンデシルイミダゾール(東京化成社製、カタログ番号:U0012)。
化合物(E1-4):2-ヘプタデシルイミダゾール(東京化成社製、カタログ番号:H0021)。 (Compound (E))
Compound (E1-1): tetradecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: T0090).
Compound (E1-2): N-methyloctadecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0912).
Compound (E1-3): 2-undecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: U0012).
Compound (E1-4): 2-heptadecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0021).
化合物(E1-1):テトラデシルアミン(東京化成社製、カタログ番号:T0090)。
化合物(E1-2):N-メチルオクタデシルアミン(東京化成社製、カタログ番号:M0912)。
化合物(E1-3):2-ウンデシルイミダゾール(東京化成社製、カタログ番号:U0012)。
化合物(E1-4):2-ヘプタデシルイミダゾール(東京化成社製、カタログ番号:H0021)。 (Compound (E))
Compound (E1-1): tetradecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: T0090).
Compound (E1-2): N-methyloctadecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: M0912).
Compound (E1-3): 2-undecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: U0012).
Compound (E1-4): 2-heptadecylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd., catalog number: H0021).
(他の樹脂(F))
他の樹脂(F-1):PMMA:ポリメチルメタクリレート(Aldrich社製、カタログ番号:200336、質量平均分子量:15000)。
他の樹脂(F-2):PIBMA:ポリイソブチルメタクリレート(Aldrich社製、カタログ番号:181544、質量平均分子量:70000)。
他の樹脂(F-3):PVC:ポリ塩化ビニル(Aldrich社製、カタログ番号:81388)。 (Other resin (F))
Other resin (F-1): PMMA: Polymethyl methacrylate (manufactured by Aldrich, catalog number: 200036, mass average molecular weight: 15000).
Other resin (F-2): PIBMA: polyisobutyl methacrylate (manufactured by Aldrich, catalog number: 181544, mass average molecular weight: 70000).
Other resin (F-3): PVC: polyvinyl chloride (manufactured by Aldrich, catalog number: 81388).
他の樹脂(F-1):PMMA:ポリメチルメタクリレート(Aldrich社製、カタログ番号:200336、質量平均分子量:15000)。
他の樹脂(F-2):PIBMA:ポリイソブチルメタクリレート(Aldrich社製、カタログ番号:181544、質量平均分子量:70000)。
他の樹脂(F-3):PVC:ポリ塩化ビニル(Aldrich社製、カタログ番号:81388)。 (Other resin (F))
Other resin (F-1): PMMA: Polymethyl methacrylate (manufactured by Aldrich, catalog number: 200036, mass average molecular weight: 15000).
Other resin (F-2): PIBMA: polyisobutyl methacrylate (manufactured by Aldrich, catalog number: 181544, mass average molecular weight: 70000).
Other resin (F-3): PVC: polyvinyl chloride (manufactured by Aldrich, catalog number: 81388).
〔例1〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-1)の7.0mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、化合物(D1-1)の10質量%の媒体(C-1)溶液の290mg、及び化合物(D2-1)の0.5質量%の媒体(C-1)溶液の320mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、風乾した。その後、ドライオーブンを用いて90℃で120分間乾燥し、さらに150℃で60分間加熱して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 1]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 7.0 mg of the compound (E1-1), and 15.36 g of the medium (C-1) are placed, and the mixture is stirred while being sealed under 30 ml. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1), 290 mg of a 10% by mass medium (C-1) solution of compound (D1-1), and compound ( D2-1) 0.5 mg% medium (C-1) solution 320 mg was added and stirred using a planetary ball mill (Sinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310). A fine particle dispersion without sediment was obtained. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-1)の7.0mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、化合物(D1-1)の10質量%の媒体(C-1)溶液の290mg、及び化合物(D2-1)の0.5質量%の媒体(C-1)溶液の320mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、風乾した。その後、ドライオーブンを用いて90℃で120分間乾燥し、さらに150℃で60分間加熱して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 1]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 7.0 mg of the compound (E1-1), and 15.36 g of the medium (C-1) are placed, and the mixture is stirred while being sealed under 30 ml. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1), 290 mg of a 10% by mass medium (C-1) solution of compound (D1-1), and compound ( D2-1) 0.5 mg% medium (C-1) solution 320 mg was added and stirred using a planetary ball mill (Sinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310). A fine particle dispersion without sediment was obtained. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
〔例2~13〕
表9に示す配合に変更した以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 2 to 13]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 1 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
表9に示す配合に変更した以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 2 to 13]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 1 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
〔例14〕
化合物(D2-1)を加えず、他の成分の配合を表9に示す配合に変更し、硬化条件を200℃で360分間とした以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 14]
A coating film was formed on the surface in the same manner as in Example 1 except that the compound (D2-1) was not added and the composition of the other components was changed to the composition shown in Table 9 and the curing condition was changed to 200 ° C for 360 minutes. A glass substrate was obtained. Table 10 shows the evaluation results.
化合物(D2-1)を加えず、他の成分の配合を表9に示す配合に変更し、硬化条件を200℃で360分間とした以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 14]
A coating film was formed on the surface in the same manner as in Example 1 except that the compound (D2-1) was not added and the composition of the other components was changed to the composition shown in Table 9 and the curing condition was changed to 200 ° C for 360 minutes. A glass substrate was obtained. Table 10 shows the evaluation results.
〔例15~22〕
表9に示す配合に変更した以外は例14と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 15 to 22]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 14 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
表9に示す配合に変更した以外は例14と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 15 to 22]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 14 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
〔例23〕
化合物(D1-1)を加えず、他の成分の配合を表9に示す配合に変更した以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 23]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 1 except that the compound (D1-1) was not added and the composition of the other components was changed to the composition shown in Table 9. Table 10 shows the evaluation results.
化合物(D1-1)を加えず、他の成分の配合を表9に示す配合に変更した以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 23]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 1 except that the compound (D1-1) was not added and the composition of the other components was changed to the composition shown in Table 9. Table 10 shows the evaluation results.
〔例24〕
表9に示す配合に変更した以外は例23と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 24]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 23 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
表9に示す配合に変更した以外は例23と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 24]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 23 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
〔例25〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-3)の8.9mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D1-1)の10質量%の媒体(C-1)溶液の290mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、風乾した。その後、ドライオーブンを用いて90℃で120分間乾燥し、さらに150℃で60分間加熱して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 25]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.9 mg of the compound (E1-3), and 15.36 g of the medium (C-1) are placed. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of the compound (B1-1) and 290 mg of a 10% by mass medium (C-1) solution of the compound (D1-1) were added, The mixture was stirred using a planetary ball mill (manufactured by Shinky Co., Ltd., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-3)の8.9mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D1-1)の10質量%の媒体(C-1)溶液の290mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、風乾した。その後、ドライオーブンを用いて90℃で120分間乾燥し、さらに150℃で60分間加熱して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 25]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.9 mg of the compound (E1-3), and 15.36 g of the medium (C-1) are placed. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of the compound (B1-1) and 290 mg of a 10% by mass medium (C-1) solution of the compound (D1-1) were added, The mixture was stirred using a planetary ball mill (manufactured by Shinky Co., Ltd., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
〔例26~30〕
表9に示す配合に変更した以外は例25と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 26 to 30]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 25 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
表9に示す配合に変更した以外は例25と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 26 to 30]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 25 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
〔例31〕
化合物(D1-1)を加えない以外は例25と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 Example 31
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 25 except that the compound (D1-1) was not added. Table 10 shows the evaluation results.
化合物(D1-1)を加えない以外は例25と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 Example 31
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 25 except that the compound (D1-1) was not added. Table 10 shows the evaluation results.
〔例32〕
表9に示す配合に変更した以外は例31と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 32]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 31 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
表9に示す配合に変更した以外は例31と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 32]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 31 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
〔例33〕
30mLの反応容器に、含フッ素共重合体(A-1)の320mg、化合物(B1-1)の10質量%の媒体(C-2)溶液の160mg、化合物(E1-1)の4.0mg、及び媒体(C-2)の15.39gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(D1-1)の10質量%の媒体(C-2)溶液の130mg、及び化合物(D2-1)の0.5質量%の媒体(C-2)溶液の160mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、風乾した。その後、ドライオーブンを用いて90℃で120分間乾燥し、さらに150℃で60分間加熱して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 33]
In a 30 mL reaction vessel, 320 mg of the fluorinated copolymer (A-1), 160 mg of a 10% by mass medium (C-2) solution of the compound (B1-1), and 4.0 mg of the compound (E1-1) And 15.39 g of the medium (C-2) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. In the dispersion, 130 mg of a 10% by mass medium (C-2) solution of the compound (D1-1) and 160 mg of a 0.5% by mass medium (C-2) solution of the compound (D2-1) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
30mLの反応容器に、含フッ素共重合体(A-1)の320mg、化合物(B1-1)の10質量%の媒体(C-2)溶液の160mg、化合物(E1-1)の4.0mg、及び媒体(C-2)の15.39gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(D1-1)の10質量%の媒体(C-2)溶液の130mg、及び化合物(D2-1)の0.5質量%の媒体(C-2)溶液の160mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、風乾した。その後、ドライオーブンを用いて90℃で120分間乾燥し、さらに150℃で60分間加熱して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 33]
In a 30 mL reaction vessel, 320 mg of the fluorinated copolymer (A-1), 160 mg of a 10% by mass medium (C-2) solution of the compound (B1-1), and 4.0 mg of the compound (E1-1) And 15.39 g of the medium (C-2) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. In the dispersion, 130 mg of a 10% by mass medium (C-2) solution of the compound (D1-1) and 160 mg of a 0.5% by mass medium (C-2) solution of the compound (D2-1) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried. Then, it dried for 120 minutes at 90 degreeC using the dry oven, and also heated for 60 minutes at 150 degreeC, the coating film was hardened, and the glass substrate with which the coating film was formed in the surface was obtained. Table 10 shows the evaluation results.
〔例34~38〕
表9に示す配合に変更した以外は例33と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 34 to 38]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 33 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
表9に示す配合に変更した以外は例33と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Examples 34 to 38]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 33 except that the formulation shown in Table 9 was changed. Table 10 shows the evaluation results.
〔例39〕
化合物(B)、化合物(D)を用いず、表10に示す硬化条件に変更した以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 39]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 1 except that the compound (B) and the compound (D) were not used and the curing conditions shown in Table 10 were changed. Table 10 shows the evaluation results.
化合物(B)、化合物(D)を用いず、表10に示す硬化条件に変更した以外は例1と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 39]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 1 except that the compound (B) and the compound (D) were not used and the curing conditions shown in Table 10 were changed. Table 10 shows the evaluation results.
〔例40〕
含フッ素共重合体(A-1)の代わりに含フッ素共重合体(A-2)を用いた以外は例39と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 40]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 39 except that the fluorinated copolymer (A-2) was used instead of the fluorinated copolymer (A-1). Table 10 shows the evaluation results.
含フッ素共重合体(A-1)の代わりに含フッ素共重合体(A-2)を用いた以外は例39と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表10に示す。 [Example 40]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 39 except that the fluorinated copolymer (A-2) was used instead of the fluorinated copolymer (A-1). Table 10 shows the evaluation results.
〔例41〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-1)の8.5mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D2-3)の0.5質量%の媒体(C-1)溶液の320mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、室温で20分間風乾した。その後、ホットプレートを用いて90℃で30分間乾燥し、さらに100℃で照度10mW/cm2の紫外線(波長254nm)を20分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Example 41]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.5 mg of the compound (E1-1), and 15.36 g of the medium (C-1) were placed, and the mixture was stirred while being sealed under 30 ml. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1) and 320 mg of a 0.5% by mass medium (C-1) solution of compound (D2-3) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Then, it dried for 30 minutes at 90 degreeC using the hotplate, and also the ultraviolet-ray (wavelength of 254 nm) with an illumination intensity of 10 mW / cm < 2 > was irradiated for 20 minutes at 100 degreeC, and the coating film was formed on the surface. A glass substrate was obtained. The evaluation results are shown in Table 12.
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-1)の8.5mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D2-3)の0.5質量%の媒体(C-1)溶液の320mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、室温で20分間風乾した。その後、ホットプレートを用いて90℃で30分間乾燥し、さらに100℃で照度10mW/cm2の紫外線(波長254nm)を20分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Example 41]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.5 mg of the compound (E1-1), and 15.36 g of the medium (C-1) were placed, and the mixture was stirred while being sealed under 30 ml. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1) and 320 mg of a 0.5% by mass medium (C-1) solution of compound (D2-3) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Then, it dried for 30 minutes at 90 degreeC using the hotplate, and also the ultraviolet-ray (wavelength of 254 nm) with an illumination intensity of 10 mW / cm < 2 > was irradiated for 20 minutes at 100 degreeC, and the coating film was formed on the surface. A glass substrate was obtained. The evaluation results are shown in Table 12.
〔例42~45〕
表11及び表12に示す配合、乾燥、及び硬化条件に変更した以外は、例41と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Examples 42 to 45]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 41 except that the mixing, drying, and curing conditions shown in Tables 11 and 12 were changed. The evaluation results are shown in Table 12.
表11及び表12に示す配合、乾燥、及び硬化条件に変更した以外は、例41と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Examples 42 to 45]
A glass substrate having a coating film formed on the surface thereof was obtained in the same manner as in Example 41 except that the mixing, drying, and curing conditions shown in Tables 11 and 12 were changed. The evaluation results are shown in Table 12.
〔例46〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(B3-1)の10質量%の媒体(C-1)溶液の120mg、化合物(E1-1)の8.5mg、及び媒体(C-1)の15.25gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B2-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D2-4)の0.5質量%の媒体(C-1)溶液の320mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、室温で20分間風乾した。その後、ホットプレートを用いて100℃に加熱しながら、照度10mW/cm2の紫外線を30分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Example 46]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 120 mg of a 10% by mass medium (C-1) solution of the compound (B3-1), and 8.5 mg of the compound (E1-1) And 15.25 g of medium (C-1) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B2-1) and 320 mg of a 0.5% by mass medium (C-1) solution of compound (D2-4) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Thereafter, while heating to 100 ° C. using a hot plate, ultraviolet rays having an illuminance of 10 mW / cm 2 were irradiated for 30 minutes to cure the coating film, thereby obtaining a glass substrate on which the coating film was formed. The evaluation results are shown in Table 12.
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(B3-1)の10質量%の媒体(C-1)溶液の120mg、化合物(E1-1)の8.5mg、及び媒体(C-1)の15.25gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B2-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D2-4)の0.5質量%の媒体(C-1)溶液の320mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、室温で20分間風乾した。その後、ホットプレートを用いて100℃に加熱しながら、照度10mW/cm2の紫外線を30分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Example 46]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 120 mg of a 10% by mass medium (C-1) solution of the compound (B3-1), and 8.5 mg of the compound (E1-1) And 15.25 g of medium (C-1) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B2-1) and 320 mg of a 0.5% by mass medium (C-1) solution of compound (D2-4) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Thereafter, while heating to 100 ° C. using a hot plate, ultraviolet rays having an illuminance of 10 mW / cm 2 were irradiated for 30 minutes to cure the coating film, thereby obtaining a glass substrate on which the coating film was formed. The evaluation results are shown in Table 12.
〔例47~59〕
表11、及び表12に示す配合、乾燥、及び硬化条件に変更した以外は、例46と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Examples 47 to 59]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 46 except that the formulation, drying, and curing conditions shown in Table 11 and Table 12 were changed. The evaluation results are shown in Table 12.
表11、及び表12に示す配合、乾燥、及び硬化条件に変更した以外は、例46と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表12に示す。 [Examples 47 to 59]
A glass substrate having a coating film formed on the surface was obtained in the same manner as in Example 46 except that the formulation, drying, and curing conditions shown in Table 11 and Table 12 were changed. The evaluation results are shown in Table 12.
〔例60〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(B3-1)の10質量%の媒体(C-1)溶液の120mg、及び化合物(E1-1)の8.5mg、媒体(C-1)の15.25gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B2-1)の10質量%の媒体(C-1)溶液の320mg、化合物(B2-7)の96mg、化合物(D2-5)の0.5質量%の媒体(C-1)溶液の1280mg、及び他の樹脂(F-1)の10質量%の媒体(C-1)溶液の640mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、室温で20分間風乾した。その後、ホットプレートを用いて90℃に加熱しながら、照度10mW/cm2の紫外線を30分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表14に示す。 [Example 60]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 120 mg of a 10 mass% medium (C-1) solution of the compound (B3-1), and 8. 8 of the compound (E1-1) are added. 5 mg and 15.25 g of the medium (C-1) were added, and the mixture was heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B2-1), 96 mg of compound (B2-7), 0.5% by mass medium of compound (D2-5) ( C-1) 1280 mg of the solution and 640 mg of a 10% by mass medium (C-1) solution of the other resin (F-1) were put into a planetary ball mill (Sinky Corp., rotation / revolution mixer Nertaro Awatori ARE -310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Thereafter, while heating to 90 ° C. using a hot plate, ultraviolet rays having an illuminance of 10 mW / cm 2 were irradiated for 30 minutes to cure the coating film, thereby obtaining a glass substrate on which the coating film was formed. The evaluation results are shown in Table 14.
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(B3-1)の10質量%の媒体(C-1)溶液の120mg、及び化合物(E1-1)の8.5mg、媒体(C-1)の15.25gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B2-1)の10質量%の媒体(C-1)溶液の320mg、化合物(B2-7)の96mg、化合物(D2-5)の0.5質量%の媒体(C-1)溶液の1280mg、及び他の樹脂(F-1)の10質量%の媒体(C-1)溶液の640mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液をガラス基板上に室温でポッティングにより塗布し、室温で20分間風乾した。その後、ホットプレートを用いて90℃に加熱しながら、照度10mW/cm2の紫外線を30分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。評価結果を表14に示す。 [Example 60]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 120 mg of a 10 mass% medium (C-1) solution of the compound (B3-1), and 8. 8 of the compound (E1-1) are added. 5 mg and 15.25 g of the medium (C-1) were added, and the mixture was heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B2-1), 96 mg of compound (B2-7), 0.5% by mass medium of compound (D2-5) ( C-1) 1280 mg of the solution and 640 mg of a 10% by mass medium (C-1) solution of the other resin (F-1) were put into a planetary ball mill (Sinky Corp., rotation / revolution mixer Nertaro Awatori ARE -310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied onto a glass substrate by potting at room temperature and air-dried at room temperature for 20 minutes. Thereafter, while heating to 90 ° C. using a hot plate, ultraviolet rays having an illuminance of 10 mW / cm 2 were irradiated for 30 minutes to cure the coating film, thereby obtaining a glass substrate on which the coating film was formed. The evaluation results are shown in Table 14.
〔例61~62〕
表13に示す配合に変更した以外は、例60と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表14に示す。 [Examples 61 to 62]
Except having changed into the mixing | blending shown in Table 13, it carried out similarly to Example 60, and obtained the glass substrate in which the coating film was formed on the surface. The evaluation results are shown in Table 14.
表13に示す配合に変更した以外は、例60と同様にして、塗膜が表面に形成されたガラス基板を得た。評価結果を表14に示す。 [Examples 61 to 62]
Except having changed into the mixing | blending shown in Table 13, it carried out similarly to Example 60, and obtained the glass substrate in which the coating film was formed on the surface. The evaluation results are shown in Table 14.
(密着性評価)
〔例63〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-3)の8.9mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D1-2)の10質量%の媒体(C-1)溶液の360mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液を、シリコン基板(厚さ200μm)上に室温でバーコートにより塗布し、90℃で2時間乾燥し、さらに表13に示す温度で1時間硬化させて、シリコン基板上に塗膜を形成した。また、比較サンプルとして例39で得られた分散液を、シリコン基板上に室温でバーコートにより塗布し、90℃で2時間乾燥し、さらに表13に示す温度で1時間加熱して、シリコン基板上に塗膜を形成した。得られた塗膜の密着性を耐湿熱性(PCT)試験(121℃、100%RH、48時間)の前後で評価した。評価結果を表15に示す。 (Adhesion evaluation)
[Example 63]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.9 mg of the compound (E1-3), and 15.36 g of the medium (C-1) are placed. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To this dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1) and 360 mg of a 10% by mass medium (C-1) solution of compound (D1-2) were added, The mixture was stirred using a planetary ball mill (manufactured by Shinky Co., Ltd., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied to a silicon substrate (thickness: 200 μm) by bar coating at room temperature, dried at 90 ° C. for 2 hours, and further cured at the temperature shown in Table 13 for 1 hour to form a coating film on the silicon substrate. Formed. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a silicon substrate by bar coating at room temperature, dried at 90 ° C. for 2 hours, and further heated at the temperature shown in Table 13 for 1 hour to obtain a silicon substrate. A coating was formed on top. The adhesion of the obtained coating film was evaluated before and after a heat and humidity resistance (PCT) test (121 ° C., 100% RH, 48 hours). The evaluation results are shown in Table 15.
〔例63〕
30mLの反応容器に、含フッ素共重合体(A-1)の640mg、化合物(E1-3)の8.9mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B1-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D1-2)の10質量%の媒体(C-1)溶液の360mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液を、シリコン基板(厚さ200μm)上に室温でバーコートにより塗布し、90℃で2時間乾燥し、さらに表13に示す温度で1時間硬化させて、シリコン基板上に塗膜を形成した。また、比較サンプルとして例39で得られた分散液を、シリコン基板上に室温でバーコートにより塗布し、90℃で2時間乾燥し、さらに表13に示す温度で1時間加熱して、シリコン基板上に塗膜を形成した。得られた塗膜の密着性を耐湿熱性(PCT)試験(121℃、100%RH、48時間)の前後で評価した。評価結果を表15に示す。 (Adhesion evaluation)
[Example 63]
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-1), 8.9 mg of the compound (E1-3), and 15.36 g of the medium (C-1) are placed. Heated to 185 ° C. for minutes to give a uniform and clear solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To this dispersion, 320 mg of a 10% by mass medium (C-1) solution of compound (B1-1) and 360 mg of a 10% by mass medium (C-1) solution of compound (D1-2) were added, The mixture was stirred using a planetary ball mill (manufactured by Shinky Co., Ltd., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied to a silicon substrate (thickness: 200 μm) by bar coating at room temperature, dried at 90 ° C. for 2 hours, and further cured at the temperature shown in Table 13 for 1 hour to form a coating film on the silicon substrate. Formed. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a silicon substrate by bar coating at room temperature, dried at 90 ° C. for 2 hours, and further heated at the temperature shown in Table 13 for 1 hour to obtain a silicon substrate. A coating was formed on top. The adhesion of the obtained coating film was evaluated before and after a heat and humidity resistance (PCT) test (121 ° C., 100% RH, 48 hours). The evaluation results are shown in Table 15.
〔例64〕
例41で得られた分散液を、ガラス基板上に室温でバーコートにより塗布し、90℃で30分間乾燥し、100℃で照度10mW/cm2の紫外線を30分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。同様にして、例54で得られた分散液を用い、塗膜が表面に形成されたガラス基板を得た。また、比較サンプルとして例39で得られた分散液を、ガラス基板上に室温でバーコートにより塗布し、90℃で30分間乾燥し、さらに100℃で30分間加熱して、塗膜が表面に形成されたガラス基板を得た。得られた塗膜の密着性を評価した。評価結果を表16に示す。 [Example 64]
The dispersion obtained in Example 41 was applied to a glass substrate by bar coating at room temperature, dried at 90 ° C. for 30 minutes, and irradiated with ultraviolet rays having an illuminance of 10 mW / cm 2 at 100 ° C. for 30 minutes to cure the coating film. And a glass substrate having a coating film formed on the surface was obtained. Similarly, a glass substrate having a coating film formed on the surface thereof was obtained using the dispersion obtained in Example 54. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a glass substrate by bar coating at room temperature, dried at 90 ° C. for 30 minutes, and further heated at 100 ° C. for 30 minutes, so that the coating film was applied to the surface. A formed glass substrate was obtained. The adhesion of the obtained coating film was evaluated. The evaluation results are shown in Table 16.
例41で得られた分散液を、ガラス基板上に室温でバーコートにより塗布し、90℃で30分間乾燥し、100℃で照度10mW/cm2の紫外線を30分間照射して塗膜を硬化させ、塗膜が表面に形成されたガラス基板を得た。同様にして、例54で得られた分散液を用い、塗膜が表面に形成されたガラス基板を得た。また、比較サンプルとして例39で得られた分散液を、ガラス基板上に室温でバーコートにより塗布し、90℃で30分間乾燥し、さらに100℃で30分間加熱して、塗膜が表面に形成されたガラス基板を得た。得られた塗膜の密着性を評価した。評価結果を表16に示す。 [Example 64]
The dispersion obtained in Example 41 was applied to a glass substrate by bar coating at room temperature, dried at 90 ° C. for 30 minutes, and irradiated with ultraviolet rays having an illuminance of 10 mW / cm 2 at 100 ° C. for 30 minutes to cure the coating film. And a glass substrate having a coating film formed on the surface was obtained. Similarly, a glass substrate having a coating film formed on the surface thereof was obtained using the dispersion obtained in Example 54. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a glass substrate by bar coating at room temperature, dried at 90 ° C. for 30 minutes, and further heated at 100 ° C. for 30 minutes, so that the coating film was applied to the surface. A formed glass substrate was obtained. The adhesion of the obtained coating film was evaluated. The evaluation results are shown in Table 16.
表15及び表16に示すように、本発明の含フッ素共重合体組成物をコーティングすることによって、シリコン基板及びガラス基板への密着性を向上させることができた。
As shown in Table 15 and Table 16, the adhesion to the silicon substrate and the glass substrate could be improved by coating the fluorine-containing copolymer composition of the present invention.
(耐薬品性保護コーティング)
〔例65〕
例20で得られた分散液を、アルミニウム基板(厚さ200μm)上に室温でディップコートにより塗布し、90℃で2時間乾燥し、さらに150℃で1時間硬化させて、アルミニウム基板上に塗膜を形成した。また、比較サンプルとして例39で得られた分散液を、アルミニウム基板(厚さ200μm)上に室温でディップコートにより塗布し、90℃で2時間乾燥し、さらに150℃で1時間加熱して、アルミニウム基板上に塗膜を形成した。塗膜が形成されたアルミニウム基板を1N塩酸に浸し、変化を観察した。評価結果を表17に示す。 (Chemical resistant protective coating)
[Example 65]
The dispersion obtained in Example 20 was applied on an aluminum substrate (thickness: 200 μm) by dip coating at room temperature, dried at 90 ° C. for 2 hours, and further cured at 150 ° C. for 1 hour to be applied onto the aluminum substrate. A film was formed. Moreover, the dispersion liquid obtained in Example 39 as a comparative sample was applied on an aluminum substrate (thickness: 200 μm) by dip coating at room temperature, dried at 90 ° C. for 2 hours, and further heated at 150 ° C. for 1 hour, A coating film was formed on an aluminum substrate. The aluminum substrate on which the coating film was formed was immersed in 1N hydrochloric acid, and the change was observed. The evaluation results are shown in Table 17.
〔例65〕
例20で得られた分散液を、アルミニウム基板(厚さ200μm)上に室温でディップコートにより塗布し、90℃で2時間乾燥し、さらに150℃で1時間硬化させて、アルミニウム基板上に塗膜を形成した。また、比較サンプルとして例39で得られた分散液を、アルミニウム基板(厚さ200μm)上に室温でディップコートにより塗布し、90℃で2時間乾燥し、さらに150℃で1時間加熱して、アルミニウム基板上に塗膜を形成した。塗膜が形成されたアルミニウム基板を1N塩酸に浸し、変化を観察した。評価結果を表17に示す。 (Chemical resistant protective coating)
[Example 65]
The dispersion obtained in Example 20 was applied on an aluminum substrate (thickness: 200 μm) by dip coating at room temperature, dried at 90 ° C. for 2 hours, and further cured at 150 ° C. for 1 hour to be applied onto the aluminum substrate. A film was formed. Moreover, the dispersion liquid obtained in Example 39 as a comparative sample was applied on an aluminum substrate (thickness: 200 μm) by dip coating at room temperature, dried at 90 ° C. for 2 hours, and further heated at 150 ° C. for 1 hour, A coating film was formed on an aluminum substrate. The aluminum substrate on which the coating film was formed was immersed in 1N hydrochloric acid, and the change was observed. The evaluation results are shown in Table 17.
表17に示すように、本発明の含フッ素共重合体組成物をコーティングすることによって、アルミニウム基板の耐薬品性を著しく向上させることができた。
As shown in Table 17, the chemical resistance of the aluminum substrate could be remarkably improved by coating the fluorine-containing copolymer composition of the present invention.
〔例66〕
30mLの反応容器に、含フッ素共重合体(A-1)の320mg、化合物(B3-1)の10質量%の媒体(C-1)溶液の28mg、化合物(E1-1)の4.3mg、及び媒体(C-1)の15.68gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B2-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D2-5)の0.5質量%の媒体(C-1)溶液の38mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液を、ポリエチレンテレフタレート(以下、PETと記す。)フィルム(東洋紡社製、コスモシャインA4300、厚さ100μm)上に室温でバーコートにより塗布し、室温で20分間乾燥し、さらに90℃で照度10mW/cm2の紫外線を30分間照射して硬化させて、PETフィルム上に塗膜を形成した。また、比較サンプルとして例39で得られた分散液を、PETフィルム上に室温でバーコートにより塗布し、室温で20分間乾燥し、90℃で30分間加熱して、PETフィルム上に塗膜を形成した。得られた塗膜の密着性を耐薬品性試験(室温、1N塩酸に1時間浸漬)の前後で評価した。評価結果を表18に示す。 [Example 66]
In a 30 mL reaction vessel, 320 mg of the fluorinated copolymer (A-1), 28 mg of a 10% by weight medium (C-1) solution of the compound (B3-1), and 4.3 mg of the compound (E1-1) And 15.68 g of the medium (C-1) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of 10% by mass medium (C-1) solution of compound (B2-1) and 38 mg of 0.5% by mass medium (C-1) solution of compound (D2-5) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied to a polyethylene terephthalate (hereinafter referred to as PET) film (Toyobo Co., Ltd., Cosmo Shine A4300, thickness 100 μm) by bar coating at room temperature, dried at room temperature for 20 minutes, and further at 90 ° C. An ultraviolet ray having an illuminance of 10 mW / cm 2 was irradiated for 30 minutes to be cured to form a coating film on the PET film. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a PET film by bar coating at room temperature, dried at room temperature for 20 minutes, and heated at 90 ° C. for 30 minutes to form a coating film on the PET film. Formed. The adhesion of the obtained coating film was evaluated before and after a chemical resistance test (room temperature, immersed in 1N hydrochloric acid for 1 hour). The evaluation results are shown in Table 18.
30mLの反応容器に、含フッ素共重合体(A-1)の320mg、化合物(B3-1)の10質量%の媒体(C-1)溶液の28mg、化合物(E1-1)の4.3mg、及び媒体(C-1)の15.68gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。該分散液に、化合物(B2-1)の10質量%の媒体(C-1)溶液の320mg、及び化合物(D2-5)の0.5質量%の媒体(C-1)溶液の38mgを入れ、遊星ボールミル(シンキー社製、自転・公転ミキサーあわとり練太郎ARE-310)を用いて撹拌し、均一で沈降物のない微粒子分散液を得た。該分散液を、ポリエチレンテレフタレート(以下、PETと記す。)フィルム(東洋紡社製、コスモシャインA4300、厚さ100μm)上に室温でバーコートにより塗布し、室温で20分間乾燥し、さらに90℃で照度10mW/cm2の紫外線を30分間照射して硬化させて、PETフィルム上に塗膜を形成した。また、比較サンプルとして例39で得られた分散液を、PETフィルム上に室温でバーコートにより塗布し、室温で20分間乾燥し、90℃で30分間加熱して、PETフィルム上に塗膜を形成した。得られた塗膜の密着性を耐薬品性試験(室温、1N塩酸に1時間浸漬)の前後で評価した。評価結果を表18に示す。 [Example 66]
In a 30 mL reaction vessel, 320 mg of the fluorinated copolymer (A-1), 28 mg of a 10% by weight medium (C-1) solution of the compound (B3-1), and 4.3 mg of the compound (E1-1) And 15.68 g of the medium (C-1) were added and heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. To the dispersion, 320 mg of 10% by mass medium (C-1) solution of compound (B2-1) and 38 mg of 0.5% by mass medium (C-1) solution of compound (D2-5) were added. The mixture was stirred using a planetary ball mill (manufactured by Shinky Corp., rotation / revolution mixer Awatori Nertaro ARE-310) to obtain a uniform fine particle dispersion without sediment. The dispersion was applied to a polyethylene terephthalate (hereinafter referred to as PET) film (Toyobo Co., Ltd., Cosmo Shine A4300, thickness 100 μm) by bar coating at room temperature, dried at room temperature for 20 minutes, and further at 90 ° C. An ultraviolet ray having an illuminance of 10 mW / cm 2 was irradiated for 30 minutes to be cured to form a coating film on the PET film. In addition, the dispersion obtained in Example 39 as a comparative sample was coated on a PET film by bar coating at room temperature, dried at room temperature for 20 minutes, and heated at 90 ° C. for 30 minutes to form a coating film on the PET film. Formed. The adhesion of the obtained coating film was evaluated before and after a chemical resistance test (room temperature, immersed in 1N hydrochloric acid for 1 hour). The evaluation results are shown in Table 18.
表18に示すように、本発明の含フッ素共重合体組成物は、PETフィルムのような充分な耐熱性を有していない基材に対してもコーティングすることができ、硬化によって、耐薬品性、及び密着性を著しく向上させることができた。
As shown in Table 18, the fluorine-containing copolymer composition of the present invention can be coated even on a substrate that does not have sufficient heat resistance such as a PET film. And adhesion could be remarkably improved.
(成形品)
〔例67〕
30mLの反応容器に、含フッ素共重合体(A-2)の640mg、化合物(B1-8)の32mg、化合物(D1-1)の21mg、化合物(E1-1)の8.5mg、化合物(E1-4)の1.6mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。さらに、該分散液をヘキサンの70gに加えて15分撹拌した。濾過後、70℃で12時間減圧乾燥し、含フッ素共重合体(A-2)、化合物(B1-8)、化合物(D1-1)、化合物(E1-1)及び化合物(E1-4)から成る組成物568mgを得た。 その後、加熱プレス機を用いて、温度:200℃、圧力:10Ma、時間:5分間の条件にて該組成物を加熱プレス成形し、プレスフィルムを作製した。評価結果を表19に示す。 (Molding)
Example 67
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-2), 32 mg of the compound (B1-8), 21 mg of the compound (D1-1), 8.5 mg of the compound (E1-1), E1-4) (1.6 mg) and medium (C-1) (15.36 g) were added, and the mixture was heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. Further, the dispersion was added to 70 g of hexane and stirred for 15 minutes. After filtration, it was dried under reduced pressure at 70 ° C. for 12 hours, and the fluorinated copolymer (A-2), compound (B1-8), compound (D1-1), compound (E1-1) and compound (E1-4) 568 mg of a composition consisting of Then, using a hot press machine, the composition was hot press molded under the conditions of temperature: 200 ° C., pressure: 10 Ma, time: 5 minutes, and a press film was produced. The evaluation results are shown in Table 19.
〔例67〕
30mLの反応容器に、含フッ素共重合体(A-2)の640mg、化合物(B1-8)の32mg、化合物(D1-1)の21mg、化合物(E1-1)の8.5mg、化合物(E1-4)の1.6mg、及び媒体(C-1)の15.36gを入れ、密閉下撹拌しながら30分間、185℃に加熱し、均一で透明な溶液とした。次いで、該溶液を撹拌しながら一旦室温まで冷却し、均一で沈降物のない微粒子分散液を得た。さらに、該分散液をヘキサンの70gに加えて15分撹拌した。濾過後、70℃で12時間減圧乾燥し、含フッ素共重合体(A-2)、化合物(B1-8)、化合物(D1-1)、化合物(E1-1)及び化合物(E1-4)から成る組成物568mgを得た。 その後、加熱プレス機を用いて、温度:200℃、圧力:10Ma、時間:5分間の条件にて該組成物を加熱プレス成形し、プレスフィルムを作製した。評価結果を表19に示す。 (Molding)
Example 67
In a 30 mL reaction vessel, 640 mg of the fluorinated copolymer (A-2), 32 mg of the compound (B1-8), 21 mg of the compound (D1-1), 8.5 mg of the compound (E1-1), E1-4) (1.6 mg) and medium (C-1) (15.36 g) were added, and the mixture was heated to 185 ° C. for 30 minutes with stirring under tight sealing to obtain a uniform and transparent solution. Next, the solution was once cooled to room temperature while stirring to obtain a uniform fine particle dispersion without sediment. Further, the dispersion was added to 70 g of hexane and stirred for 15 minutes. After filtration, it was dried under reduced pressure at 70 ° C. for 12 hours, and the fluorinated copolymer (A-2), compound (B1-8), compound (D1-1), compound (E1-1) and compound (E1-4) 568 mg of a composition consisting of Then, using a hot press machine, the composition was hot press molded under the conditions of temperature: 200 ° C., pressure: 10 Ma, time: 5 minutes, and a press film was produced. The evaluation results are shown in Table 19.
〔例68〕
含フッ素共重合体(A-2)のみを用いて、加熱プレス機を用いて、温度:200℃、圧力:10Ma、時間:5分間の条件にて該含フッ素共重合体を加熱プレス成形し、プレスフィルムを作製した。評価結果を表19に示す。 Example 68
Using only the fluorinated copolymer (A-2), the fluorinated copolymer was subjected to hot press molding under the conditions of temperature: 200 ° C., pressure: 10 Ma, time: 5 minutes using a heat press machine. A press film was prepared. The evaluation results are shown in Table 19.
含フッ素共重合体(A-2)のみを用いて、加熱プレス機を用いて、温度:200℃、圧力:10Ma、時間:5分間の条件にて該含フッ素共重合体を加熱プレス成形し、プレスフィルムを作製した。評価結果を表19に示す。 Example 68
Using only the fluorinated copolymer (A-2), the fluorinated copolymer was subjected to hot press molding under the conditions of temperature: 200 ° C., pressure: 10 Ma, time: 5 minutes using a heat press machine. A press film was prepared. The evaluation results are shown in Table 19.
表19に示すように、本発明の含フッ素共重合体組成物は、成形品に関しても機械的性質に影響することなく、表面硬度、及び耐熱性を向上させることができた。
As shown in Table 19, the fluorine-containing copolymer composition of the present invention was able to improve the surface hardness and heat resistance without affecting the mechanical properties of the molded product.
本発明のコーティング用組成物は、エチレンに基づく繰り返し単位とTFEに基づく繰り返し単位とを有する含フッ素共重合体(ETFE)を含み、低温で焼成しても密着性、耐擦傷性、耐熱性等が良好な塗膜を容易に形成することが可能であり、耐熱性、難燃性、耐薬品性、耐候性、低摩擦性、低誘電特性、透明性等を必要とする表面処理に適しており、産業上有用である。
なお、2011年8月17日に出願された日本特許出願2011-178195号の明細書、特許請求の範囲、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。 The coating composition of the present invention includes a fluorine-containing copolymer (ETFE) having a repeating unit based on ethylene and a repeating unit based on TFE, and has good adhesion, scratch resistance, heat resistance, etc. even when baked at a low temperature. Can be easily formed, and is suitable for surface treatments that require heat resistance, flame resistance, chemical resistance, weather resistance, low friction, low dielectric properties, transparency, etc. It is industrially useful.
It should be noted that the entire contents of the specification, claims, and abstract of Japanese Patent Application No. 2011-178195 filed on August 17, 2011 are incorporated herein as the disclosure of the specification of the present invention. Is.
なお、2011年8月17日に出願された日本特許出願2011-178195号の明細書、特許請求の範囲、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。 The coating composition of the present invention includes a fluorine-containing copolymer (ETFE) having a repeating unit based on ethylene and a repeating unit based on TFE, and has good adhesion, scratch resistance, heat resistance, etc. even when baked at a low temperature. Can be easily formed, and is suitable for surface treatments that require heat resistance, flame resistance, chemical resistance, weather resistance, low friction, low dielectric properties, transparency, etc. It is industrially useful.
It should be noted that the entire contents of the specification, claims, and abstract of Japanese Patent Application No. 2011-178195 filed on August 17, 2011 are incorporated herein as the disclosure of the specification of the present invention. Is.
Claims (12)
- エチレンに基づく繰り返し単位とテトラフルオロエチレンに基づく繰り返し単位を有する含フッ素共重合体(A)と、
開環反応性を有する環状エーテルを有する基及び付加反応性を有する炭素-炭素二重結合を有する基からなる群から選ばれる少なくとも1種の反応性官能基を有する化合物(B)(ただし、前記含フッ素共重合体(A)を除く。)と、
前記含フッ素共重合体(A)を溶解又は分散し得て、かつ前記化合物(B)を溶解又は分散し得る媒体(C)と
を含む、含フッ素共重合体組成物。 A fluorine-containing copolymer (A) having a repeating unit based on ethylene and a repeating unit based on tetrafluoroethylene;
Compound (B) having at least one reactive functional group selected from the group consisting of a group having a cyclic ether having ring-opening reactivity and a group having a carbon-carbon double bond having addition reactivity (provided that Except for the fluorinated copolymer (A)),
A fluorine-containing copolymer composition comprising: a medium (C) capable of dissolving or dispersing the fluorine-containing copolymer (A) and capable of dissolving or dispersing the compound (B). - 前記含フッ素共重合体(A)と前記化合物(B)の混合割合が、98/2~2/98(質量比)である請求項1に記載の含フッ素共重合体組成物。 The fluorine-containing copolymer composition according to claim 1, wherein a mixing ratio of the fluorine-containing copolymer (A) and the compound (B) is 98/2 to 2/98 (mass ratio).
- 前記媒体(C)の含有割合が、含フッ素共重合体組成物(100質量%)に対して10~99質量%である請求項1又は2に記載の含フッ素共重合体組成物。 The fluorine-containing copolymer composition according to claim 1 or 2, wherein the content ratio of the medium (C) is 10 to 99% by mass with respect to the fluorine-containing copolymer composition (100% by mass).
- 前記含フッ素共重合体(A)の融点が、150~260℃である請求項1~3のいずれかに記載の含フッ素共重合体組成物。 The fluorine-containing copolymer composition according to any one of claims 1 to 3, wherein the melting point of the fluorine-containing copolymer (A) is 150 to 260 ° C.
- 前記媒体(C)の融点は25℃以下であり、沸点が常圧で230℃以下である請求項1~4のいずれかに記載の含フッ素共重合体組成物。 The fluorine-containing copolymer composition according to any one of claims 1 to 4, wherein the medium (C) has a melting point of 25 ° C or lower and a boiling point of 230 ° C or lower at normal pressure.
- 前記化合物(B)の反応性官能基と反応し得る反応性官能基を有する化合物(D1)及び前記化合物(B)の反応性官能基の反応を促進し得る化合物(D2)からなる群から選ばれる少なくとも1種の化合物(D)(ただし、前記含フッ素共重合体(A)又は前記化合物(B)の媒体(C)への溶解又は分散を促進し得る化合物(E)を除く。)をさらに含む、請求項1~5のいずれかに記載の含フッ素共重合体組成物。 Selected from the group consisting of the compound (D1) having a reactive functional group capable of reacting with the reactive functional group of the compound (B) and the compound (D2) capable of promoting the reaction of the reactive functional group of the compound (B) At least one compound (D) (excluding the compound (E) that can promote dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C)). The fluorine-containing copolymer composition according to any one of claims 1 to 5, further comprising:
- 前記含フッ素共重合体(A)又は前記化合物(B)の媒体(C)への溶解又は分散を促進し得る化合物(E)をさらに含む、請求項1~6のいずれかに記載の含フッ素共重合体組成物。 The fluorine-containing compound according to any one of claims 1 to 6, further comprising a compound (E) capable of promoting dissolution or dispersion of the fluorine-containing copolymer (A) or the compound (B) in the medium (C). Copolymer composition.
- 前記化合物(E)が、1級アミノ基、2級アミノ基及び窒素-水素結合を有する含窒素複素環基からなる群から選ばれる少なくとも1種の基と炭素数1~20のアルキル基とを有する化合物(E1)である、請求項7に記載の含フッ素共重合体組成物。 The compound (E) comprises at least one group selected from the group consisting of a primary amino group, a secondary amino group, and a nitrogen-containing heterocyclic group having a nitrogen-hydrogen bond, and an alkyl group having 1 to 20 carbon atoms. The fluorine-containing copolymer composition according to claim 7, which is a compound (E1) having.
- 前記媒体(C)は、下式(1)で表わされる溶解指標(R)が49未満である溶媒である、請求項1~8のいずれかに記載の含フッ素共重合体組成物。
R=4×(δd-15.7)2+(δp-5.7)2+(δh-4.3)2 ・・・(1)。
ただし、δd、δp及びδhは、それぞれ、溶媒のハンセン溶解度パラメータにおける分散項、極性項及び水素結合項[(MPa)1/2]である。 The fluorine-containing copolymer composition according to any one of claims 1 to 8, wherein the medium (C) is a solvent having a solubility index (R) represented by the following formula (1) of less than 49.
R = 4 × (δd−15.7) 2 + (δp−5.7) 2 + (δh−4.3) 2 (1).
However, δd, δp, and δh are a dispersion term, a polar term, and a hydrogen bond term [(MPa) 1/2 ] in the Hansen solubility parameter of the solvent, respectively. - 請求項1~9のいずれかに記載の含フッ素共重合体組成物を含む、コーティング用組成物。 A coating composition comprising the fluorine-containing copolymer composition according to any one of claims 1 to 9.
- 請求項10に記載のコーティング用組成物を用いて形成された塗膜を有する物品。 An article having a coating film formed using the coating composition according to claim 10.
- 請求項1~9のいずれかに記載の含フッ素共重合体組成物を成形してなる成形品。 A molded product obtained by molding the fluorine-containing copolymer composition according to any one of claims 1 to 9.
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