WO2012156991A2 - Glass composition and glass substrate for display devices - Google Patents
Glass composition and glass substrate for display devices Download PDFInfo
- Publication number
- WO2012156991A2 WO2012156991A2 PCT/IN2012/000343 IN2012000343W WO2012156991A2 WO 2012156991 A2 WO2012156991 A2 WO 2012156991A2 IN 2012000343 W IN2012000343 W IN 2012000343W WO 2012156991 A2 WO2012156991 A2 WO 2012156991A2
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- WIPO (PCT)
- Prior art keywords
- glass
- mole
- substrate
- glass composition
- composition
- Prior art date
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- 239000011521 glass Substances 0.000 title claims abstract description 124
- 239000000203 mixture Substances 0.000 title claims abstract description 41
- 239000000758 substrate Substances 0.000 title claims abstract description 29
- 238000007670 refining Methods 0.000 claims abstract description 25
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 9
- 239000011737 fluorine Substances 0.000 claims abstract description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000460 chlorine Substances 0.000 claims abstract description 8
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 8
- 238000002844 melting Methods 0.000 claims abstract description 8
- 230000008018 melting Effects 0.000 claims abstract description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 4
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 4
- 230000007423 decrease Effects 0.000 claims abstract description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- 238000005187 foaming Methods 0.000 claims description 6
- 238000000137 annealing Methods 0.000 claims description 3
- 238000006124 Pilkington process Methods 0.000 claims description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000006060 molten glass Substances 0.000 description 14
- 239000007789 gas Substances 0.000 description 8
- 239000000156 glass melt Substances 0.000 description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 6
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000003280 down draw process Methods 0.000 description 4
- -1 hydroxyl ions Chemical class 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 3
- 238000007499 fusion processing Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000006025 fining agent Substances 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- IKWTVSLWAPBBKU-UHFFFAOYSA-N a1010_sial Chemical compound O=[As]O[As]=O IKWTVSLWAPBBKU-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- 229960002594 arsenic trioxide Drugs 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical class [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
- C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
- C03C3/115—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron
- C03C3/118—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron containing aluminium
Definitions
- Embodiments in general relate to a glass composition and a glass substrate for use in display and in particular to a glass composition and a glass substrate for use in liquid crystal display [LCD], an electroluminescence display [ELD], a field emission display [FED], plasma display [PD] organic light emitting diode [OLED] etc.
- LCD liquid crystal display
- ELD electroluminescence display
- FED field emission display
- PD plasma display
- OLED organic light emitting diode
- AMLCDs active matrix liquid crystal displays
- a typical AMLCD comprises, inter alia, two sheets of glass, the first one is vapor-deposited with silicon that forms the basis for the thin-film transistor (TFT) array and whereas the second for the color filter (CF) materials that enables RGB displays.
- TFT thin-film transistor
- CF color filter
- a gap between the two sheets of glass holds a very thin layer of liquid crystal, wherein the gap between the two sheets has to be maintained within tight specifications.
- the glass also referred to as "glass substrate" used for depositing the silicon for the thin-film transistor array has a unique material composition, which is specifically designed for the application.
- One method of producing these substrate glasses is the down draw-fusion process [also known as the down-draw process] and is capable of producing a precision fire-polished surface that requires no additional modification such as grinding or polishing prior to use.
- the US patent numbers 3,338,696 and 3,682,609 disclose fusion downdraw processes which include allowing flow of molten glass over the edges or weirs of a forming wedge, referred to as isopipe. The molten glass flows over converging forming surfaces of the isopipe and the separate flows reunite at the apex or root where the two converging forming surfaces meet to form a glass sheet.
- the glass which has been in contact with the forming surfaces is located in the inner portion of the glass sheet and the exterior surfaces of the glass sheet are contact free.
- Pulling rolls positioned downstream of isopipe root capture edge portions of the glass sheet so formed to control the rate at which the glass sheet leaves the isopipe and thus aids in controlling the thickness of the finished sheet.
- the glass sheet descends from the root of the isopipe past the pulling rolls, it cools to form a solid elastic glass sheet, which may be processed further.
- various material properties of the glass in the molten stage must be controlled within specified limits during the downdraw process.
- the molten glass that is supplied to the isopipe has to be free of any inclusion and/or gas bubbles. If the bubbles remain in the final glass sheet that is drawn, the bubbles may cause undesired distortion in the final LCD panel made from the glass sheet. It is thereby desired that the glass sheets drawn are bubble free.
- the apparatus are to be made up of noble metals such as platinum and titanium which are exorbitantly expensive and hence increase the cost of making apparatus. Any increase in the dimensions will obviously lead to increase in the apparatus cost.
- refining agents In addition to physical refining, it is known in the prior art that use of some chemical compounds enhances or improves the refining of molten glass. These compounds are known as the refining agents. Notable among them are arsenic oxide and antimony oxides. These refining agents are added with the raw materials and then melted along with the other glass component. These refining agents aids in removal of bubbles or gas entrapped in the molten glass by releasing oxygen that combines with the gas bubbles and increase their buoyancy thereby enhancing the chances of the bubbles to rise in short time span.
- ⁇ - ⁇ content in the glass Another significant aspect in the glass is the ⁇ - ⁇ content in the glass.
- ⁇ - ⁇ which is a part of glass structure, causes generation of oxygen bubbles at the platinum-glass interface due to the catalytic conversion of ⁇ - ⁇ into 0 2 and H 2 .
- H 2 diffuses out of the platinum wall and 0 2 remains in the glass as bubbles. It is thereby desired to have minimum ⁇ - ⁇ content in the glass.
- An object is to provide a glass composition and a substrate glass.
- Another object is to provide a glass composition and a substrate glass for display devices.
- Still another object is to provide a glass composition and a substrate glass compatible with the down draw process.
- Another object is to provide a glass composition with a refining agent that are efficient in removal of bubbles or glass in molten stage.
- Another object is to have a glass composition with minimum ⁇ - ⁇ content, and in particular below 300 ppm.
- Another object is to have a glass composition for use in liquid crystal display [LCD], an electroluminescence display [ELD], a field emission display [FED], plasma display [PD], organic light emitting diode [OLED] etc.
- LCD liquid crystal display
- ELD electroluminescence display
- FED field emission display
- PD plasma display
- OLED organic light emitting diode
- a substrate glass and a glass composition with reduced ⁇ - ⁇ , reduced bubbles or inclusion, wherein said glass composition comprises Si0 2 from about 63.3 to about 71.3 mole %; Al 2 ( 3 ⁇ 4 from about 8.1 to about 12.1 mole %; B2O3 from about 6.7 to about 12.7 mole %; CaO from about 5 to 12 mole %; BaO from about 0.2 to about 3.0 mole %; SrO from about 0.2 to about 4.5 mole %; wherein inclusion of the alkali metal Na 2 0 from about 0.001 to 0.1 mole % decreases the melting point of the substrate glass composition; fluorine from about 0.001 to about 0.1 mole % and chlorine from about 0.001 to about 0.5 mole %.
- the inclusion of chlorine and fluorine helps to dry the glass melt by reducing ⁇ - ⁇ . Additionally, the fluorine also acts as a refining agent.
- the glass composition further comprises of at least one of the refining agents chosen from the group consisting of As 2 0 3 in the range from 0 to 0.7 mole % and Sb 2 0 3 in the range from 0 to 0.8 mole % along with N 2 0 5 in the range from about 0.1 to 0.4 mole%. It is observed that use of N2O5 in conjunction with AS2O3 and Sb 2 0 3 increases the refining efficiency of the refining agents.
- the glass has a density of less than about 2.5 g/cm 3 , a coefficient of thermal expansion less than 45 x 10 "7 /°C, a logarithm of liquidus viscosity of greater than 5, a strain point of greater than 620 °C, an annealing temperature of about 650°C or greater, and a liquidus temperature of less than 1230 °C.
- the glass is down- drawable or slot drawn or press-formable in a mold or drawable through roller press or drawable through float process.
- the present invention is concerned with enhanced glasses for use as substrates in displays.
- the glasses meet the various property requirements of such substrates.
- the glass substrate composition comprises of the major components of the glass, for use in glass substrates, namely, Silica (Si0 2 ), Alumina (AI2O3), Boron Oxide (B2O3), trace amount of alkali oxides (AO) such as Na20 and alkaline earth oxides (AEO) such as CaO, SrO and BaO.
- Silica Si0 2
- Alumina AI2O3
- Boron Oxide B2O3
- trace amount of alkali oxides (AO) such as Na20
- alkaline earth oxides (AEO) such as CaO, SrO and BaO.
- silica behaves as the basic glass former, wherein the former (silica in this case) forms the basic skeleton or network.
- Formers alone may form glass however the melting point in some cases (particularly when the former is silica) will be so high so as to make it impractical to commercially melt the glasses.
- B2O3 or P2O5 is utilized as former the chemical durability will be so poor that it is impractical to use it in any application in its hundred percent forms.
- modifiers such as alkali oxides (AO) and Alkaline earth oxides (AEO) are utilized to modify the network structure formed by the glass formers so as to reduce the melting temperature and thereby improve other glass forming processes e.g., refining.
- alkali oxides such as Na 2 0 is utilized as the modifier for reasons discussed herein below.
- alkaline earth oxides such as CaO, BaO and SrO are added as modifiers.
- intermediates such as alumina is added to the glass composition.
- the substrate glass composition comprises Si0 2 from about 63.3 to about 71.3 mole %; AI2O3 from about 8.1 to about 12.1 mole %; B 2 0 3 from about 6.7 to about 12.7 mole %; CaO from about 5 to 12 mole %; BaO from about 0.2 to about 3.0 mole %; SrO from about 0.2 to about 4.5 mole %; and Na 2 0 from about 0.001 to about 0.1 mole %; wherein inclusion of the trace amount of the alkali metal Na 2 0 decreases the melting point of the substrate glass composition; fluorine from about 0.001 to about 0.1 mole % and chlorine from about 0.001 to about 0.5 mole % resulting in drying the glass, hence reducing ⁇ - ⁇ , which thereby reduces foaming behavior of the glass.
- the trace mole % of Na 2 0 is limited to a cap value of 0.1 mole % as a greater amount than this may lead to diffusion of sodium into the TFT which may interfere with the electrical working of the TFT. Presence of trace amount of Na 2 0 reduces the viscosity of glass melt, resulting in easier refining and reduced foaming.
- the substrate glass composition may contain AS2O3 in the range from about 0 to about 0.7 mole %, wherein AS2O3 is acts as a fining agent and aids in removal of bubbles or gaseous inclusions from the molten glass.
- the substrate glass composition may contain Sb 2 0 3 in the range from about 0 to about 0.8 mole %, wherein Sb 2 0 3 also acts as a fining agent and aids in removal of bubbles or gaseous inclusions from the molten glass.
- the substrate glass composition may contain N2O5 in the range from about 0.1 to 0.4 mole % in conjunction with AS2O3 and Sb 2 03, wherein addition of N 2 0 5 enhances the refining efficiency of As 2 0 3 and Sb 2 0 3 .
- the amount of As 2 0 3 and Sb 2 03 is maintained to a minimum level in the glass composition.
- the alkaline earth oxides SrO and BaO both contribute to low liquidus temperatures (high liquidus viscosities) and hence the glasses of the invention include at least one of these oxides.
- both oxides are known to raise the coefficient of thermal expansion (CTE) and density of the glass. It is desired to have both the CTE and density of the glasses to be low.
- both SrO and BaO lowers the modulus and strain point of the glass in comparison with CaO.
- the mole percentage of non-green components such as BaO and SrO is kept to a minimum so as to produce an environmentally friendly "green" product, and in particular lessening or getting rid of barium is preferred since barium is one of the listed metals in the Resources Conservation and Recovery Act (RCRA) and is therefore classified by the US EPA as hazardous.
- RCRA Resources Conservation and Recovery Act
- ⁇ - ⁇ value is used to indicate the hydroxyl concentration of a glass as measured in the conventional manner by infrared spectroscopy according to U.S. Pat. No. 4,072,489 (i.e., at an appropriate wave length of a few microns).
- ⁇ - ⁇ value of 0.04 indicates a hydroxyl concentration of about 40 ppm.
- hydroxyl ions are a part of the network structure. Chlorides react with hydroxyl ions to form Hydrogen Chloride gas, which escapes from the glass melt. This reaction of Chlorides helps to reduce the ⁇ - OH in glass, thereby resulting in an improved refining and reduced foaming of the glass melt.
- the three components i.e., Na 2 0, F and CI individually assist in directly or indirectly assist in refining. But, their combination is more effective because of the combined multiplying effects of the individual components towards a common final process improvement, i.e., refining. If the same amount of effect (as it is obtained by the combined effect of the 3 components) is desired from any one component then the quantity of one single component will have to be very high and this will lead to other side effects, e.g., if Na 2 0 alone is added then the Na 2 0 contamination of TFT will happen. If F and CI alone are added then environmental hazard will be a problem. In accordance with the present invention an advantage of the glass from the glass composition is that it exhibit higher viscosity, typically of the order of 10 6 poise.
- the glass from the glass composition exhibit a high-strain point greater than about 620 °C.
- the glass from the glass composition has lower liquidus temperature of less than about 1230 °C.
- the glass from the glass composition exhibits a high liquidus viscosity of about 10 5 or greater.
- the glass from the glass composition exhibits an annealing temperature of greater than about 650 °C
- the trace amount of Na 2 0 does not chemically interact with the TFTs due to very low percentages and but still reduce the melting point of the glass.
- the substrate glass has light-weight owing to the low density of less than about 2.5 g/cm 3 . In accordance with the present invention, the substrate glass has lower coefficient of thermal expansion of less than about 40 x 10 "7 /°C
- the present invention provides a glass composition for display devices compatible with the down draw fusion process.
- the substrate glass composition may be used in liquid crystal display [LCD], an electroluminescence display [ELD], a field emission display [FED], plasma display [PD], organic light emitting diode display [OLED] etc.
- LCD liquid crystal display
- ELD electroluminescence display
- FED field emission display
- PD plasma display
- OLED organic light emitting diode display
- examples 1 to XXVIII are glass compositions in accordance with the embodiments of the present invention
- C-I is a comparative example of glass composition in accordance with known prior art. It is observed that owing to presence of ⁇ - ⁇ in . C-I, there is foam formation at about 1420 °C, whereas due to drying effect of chlorine and fluorine, the value of ⁇ - ⁇ is expected to be reduced, whereas no foam formation was observed in examples I to XXVIII due to the drying and refining effect of chlorine and fluorine.
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Abstract
The present invention discloses a substrate glass and a glass composition with reduced β-ΟΗ, reduced bubbles or inclusion, wherein said glass composition comprises Si02 from about 63.3 to about 71.3 mole %; AI2O3 from about 8.1 to about 12.1 mole %; B2O3 from about 6.7 to about 12.7 mole %; CaO from about 5 to 12 mole %; BaO from about 0.2 to about 3.0 mole %; SrO from about 0.2 to about 4.5 mole %; and Na2O from about 0.001 to about 0.1 mole %; wherein inclusion of the alkali metal Na2 decreases the melting point of the substrate glass composition; fluorine from about 0.001 to about 0.1 mole % and chlorine from about 0.001 to about 0.5 mole %, help to improve refining and reduce
Description
GLASS COMPOSITION AND GLASS SUBSTRATE FOR DISPLAY DEVICES
FIELD OF THE INVENTION
Embodiments in general relate to a glass composition and a glass substrate for use in display and in particular to a glass composition and a glass substrate for use in liquid crystal display [LCD], an electroluminescence display [ELD], a field emission display [FED], plasma display [PD] organic light emitting diode [OLED] etc.
BACKGROUND OF THE INVENTION
Over the years active matrix liquid crystal displays (AMLCDs) have become ubiquitous features of our life, wherein they are used in cellular phones, mobiles, desktops, laptops computer screens and in large screen televisions.
One aspect of all the electronic devices that has turned out to be noteworthy over the years is energy utilization by the device which is obviously desired to be as low as possible. It is quite clear that CRT has been replaced by flat panel display and in particular by AMLCD and organic light-emitting diode (OLED)- based devices.
A typical AMLCD comprises, inter alia, two sheets of glass, the first one is vapor-deposited with silicon that forms the basis for the thin-film transistor (TFT) array and whereas the second for the color filter (CF) materials that
enables RGB displays. A gap between the two sheets of glass holds a very thin layer of liquid crystal, wherein the gap between the two sheets has to be maintained within tight specifications. The glass (also referred to as "glass substrate") used for depositing the silicon for the thin-film transistor array has a unique material composition, which is specifically designed for the application.
One method of producing these substrate glasses is the down draw-fusion process [also known as the down-draw process] and is capable of producing a precision fire-polished surface that requires no additional modification such as grinding or polishing prior to use. The US patent numbers 3,338,696 and 3,682,609 disclose fusion downdraw processes which include allowing flow of molten glass over the edges or weirs of a forming wedge, referred to as isopipe. The molten glass flows over converging forming surfaces of the isopipe and the separate flows reunite at the apex or root where the two converging forming surfaces meet to form a glass sheet. Thus, in the fusion process the glass which has been in contact with the forming surfaces is located in the inner portion of the glass sheet and the exterior surfaces of the glass sheet are contact free. Pulling rolls positioned downstream of isopipe root capture edge portions of the glass sheet so formed to control the rate at which the glass sheet leaves the isopipe and thus aids in controlling the thickness of the finished sheet. As the glass sheet descends from the root of the isopipe past the pulling rolls, it cools to form a solid elastic glass sheet, which may be processed further.
In order to achieve a good quality substrate glass using the fusion technique, various material properties of the glass in the molten stage must be controlled within specified limits during the downdraw process.
The molten glass that is supplied to the isopipe has to be free of any inclusion and/or gas bubbles. If the bubbles remain in the final glass sheet that is drawn, the bubbles may cause undesired distortion in the final LCD panel made from the glass sheet. It is thereby desired that the glass sheets drawn are bubble free.
In order to remove gas bubbles that are entrapped in the molten glass, refining of the molten glass is carried out, the bubbles being formed during the reaction by evolution of one or more reaction products in gas phase.
Attempts have been made to refine molten glass, that is, remove the bubbles or gas entrapped therein. One way to remove the bubbles from the molten glass is to let it flow through a distance, wherein the flow is maintained laminar. Many apparatus have been designed to maintain the molten glass flow laminar from the melting furnace to the isopipe. Further, the longer the length of the refining channel the better the . chances that the molten glass is bubble free by mechanism of rising of bubbles explained by Stoke 's Law.
However, to hold the molten glass the apparatus are to be made up of noble metals such as platinum and titanium which are exorbitantly expensive and
hence increase the cost of making apparatus. Any increase in the dimensions will obviously lead to increase in the apparatus cost.
In addition to physical refining, it is known in the prior art that use of some chemical compounds enhances or improves the refining of molten glass. These compounds are known as the refining agents. Notable among them are arsenic oxide and antimony oxides. These refining agents are added with the raw materials and then melted along with the other glass component. These refining agents aids in removal of bubbles or gas entrapped in the molten glass by releasing oxygen that combines with the gas bubbles and increase their buoyancy thereby enhancing the chances of the bubbles to rise in short time span.
Another significant aspect in the glass is the β-ΟΗ content in the glass. , β-ΟΗ which is a part of glass structure, causes generation of oxygen bubbles at the platinum-glass interface due to the catalytic conversion of β-ΟΗ into 02 and H2. H2 diffuses out of the platinum wall and 02 remains in the glass as bubbles. It is thereby desired to have minimum β-ΟΗ content in the glass.
*>
Thus, there is a need to have a glass composition with the drying agents that reduce the concentration of β-ΟΗ resulting in improved refining and decreased foaming of the glass.
OBJECTS OF THE PRESENT INVENTION
Some of the objects of the present disclosure are described herein below:
An object is to provide a glass composition and a substrate glass.
Another object is to provide a glass composition and a substrate glass for display devices.
Still another object is to provide a glass composition and a substrate glass compatible with the down draw process.
Another object is to provide a glass composition with a refining agent that are efficient in removal of bubbles or glass in molten stage.
Another object is to have a glass composition with minimum β-ΟΗ content, and in particular below 300 ppm.
Another object is to have a glass composition for use in liquid crystal display [LCD], an electroluminescence display [ELD], a field emission display [FED], plasma display [PD], organic light emitting diode [OLED] etc.
Other objects and advantages of the present invention will be more apparent from the following description when read in conjunction with the
accompanying figures, which are not intended to limit the scope of the present invention.
SUMMARY OF THE INVENTION
These and other objects of the present disclosure are to a great extent dealt within the disclosure.
In accordance with the present invention a substrate glass and a glass composition is disclosed with reduced β-ΟΗ, reduced bubbles or inclusion, wherein said glass composition comprises Si02 from about 63.3 to about 71.3 mole %; Al2 (¾ from about 8.1 to about 12.1 mole %; B2O3 from about 6.7 to about 12.7 mole %; CaO from about 5 to 12 mole %; BaO from about 0.2 to about 3.0 mole %; SrO from about 0.2 to about 4.5 mole %; wherein inclusion of the alkali metal Na20 from about 0.001 to 0.1 mole % decreases the melting point of the substrate glass composition; fluorine from about 0.001 to about 0.1 mole % and chlorine from about 0.001 to about 0.5 mole %.
In accordance with the present invention the inclusion of chlorine and fluorine helps to dry the glass melt by reducing β-ΟΗ. Additionally, the fluorine also acts as a refining agent.
In accordance with the present invention the glass composition further comprises of at least one of the refining agents chosen from the group consisting of As203 in the range from 0 to 0.7 mole % and Sb203 in the range
from 0 to 0.8 mole % along with N205 in the range from about 0.1 to 0.4 mole%. It is observed that use of N2O5 in conjunction with AS2O3 and Sb203 increases the refining efficiency of the refining agents.
In accordance with the present invention the glass has a density of less than about 2.5 g/cm3, a coefficient of thermal expansion less than 45 x 10"7/°C, a logarithm of liquidus viscosity of greater than 5, a strain point of greater than 620 °C, an annealing temperature of about 650°C or greater, and a liquidus temperature of less than 1230 °C.
In accordance with one embodiment of the present invention the glass is down- drawable or slot drawn or press-formable in a mold or drawable through roller press or drawable through float process.
DETAILED DESCRIPTION OF THE INVENTION
The embodiments herein and the various features and advantageous details thereof are explained with reference to the non-limiting embodiments in the following description. Descriptions of well-known components and processing techniques are omitted so as to not unnecessarily obscure the embodiments herein. The examples used herein are intended merely to facilitate an understanding of ways in which the embodiments herein may be practiced and to further enable those of skill in the art to practice the embodiments herein.
Accordingly, the examples should not be construed as limiting the scope of the embodiments herein
The present invention is concerned with enhanced glasses for use as substrates in displays. In particular, the glasses meet the various property requirements of such substrates.
In accordance with the present invention, the glass substrate composition comprises of the major components of the glass, for use in glass substrates, namely, Silica (Si02), Alumina (AI2O3), Boron Oxide (B2O3), trace amount of alkali oxides (AO) such as Na20 and alkaline earth oxides (AEO) such as CaO, SrO and BaO.
In accordance with the present invention silica (S1O2) behaves as the basic glass former, wherein the former (silica in this case) forms the basic skeleton or network. Formers alone may form glass however the melting point in some cases (particularly when the former is silica) will be so high so as to make it impractical to commercially melt the glasses. In other cases wherein B2O3 or P2O5 is utilized as former the chemical durability will be so poor that it is impractical to use it in any application in its hundred percent forms.
In accordance with the present invention modifiers such as alkali oxides (AO) and Alkaline earth oxides (AEO) are utilized to modify the network structure formed by the glass formers so as to reduce the melting temperature and thereby
improve other glass forming processes e.g., refining. In accordance with the present invention trace amounts of alkali oxides such as Na20 is utilized as the modifier for reasons discussed herein below.
In accordance with one embodiment of the present invention alkaline earth oxides such as CaO, BaO and SrO are added as modifiers.
Further, in accordance with the present invention intermediates such as alumina is added to the glass composition.
In accordance with one embodiment the present invention, the substrate glass composition, comprises Si02 from about 63.3 to about 71.3 mole %; AI2O3 from about 8.1 to about 12.1 mole %; B203 from about 6.7 to about 12.7 mole %; CaO from about 5 to 12 mole %; BaO from about 0.2 to about 3.0 mole %; SrO from about 0.2 to about 4.5 mole %; and Na20 from about 0.001 to about 0.1 mole %; wherein inclusion of the trace amount of the alkali metal Na20 decreases the melting point of the substrate glass composition; fluorine from about 0.001 to about 0.1 mole % and chlorine from about 0.001 to about 0.5 mole % resulting in drying the glass, hence reducing β-ΟΗ, which thereby reduces foaming behavior of the glass.
In accordance with this embodiment of the present invention, the trace mole % of Na20 is limited to a cap value of 0.1 mole % as a greater amount than this
may lead to diffusion of sodium into the TFT which may interfere with the electrical working of the TFT. Presence of trace amount of Na20 reduces the viscosity of glass melt, resulting in easier refining and reduced foaming.
In accordance with one embodiment the substrate glass composition may contain AS2O3 in the range from about 0 to about 0.7 mole %, wherein AS2O3 is acts as a fining agent and aids in removal of bubbles or gaseous inclusions from the molten glass.
In accordance with one embodiment the substrate glass composition may contain Sb203 in the range from about 0 to about 0.8 mole %, wherein Sb203 also acts as a fining agent and aids in removal of bubbles or gaseous inclusions from the molten glass.
In accordance with the present invention the substrate glass composition may contain N2O5 in the range from about 0.1 to 0.4 mole % in conjunction with AS2O3 and Sb203, wherein addition of N205 enhances the refining efficiency of As203 and Sb203.
In accordance with one embodiment of the present invention the amount of As203 and Sb203 is maintained to a minimum level in the glass composition.
The alkaline earth oxides SrO and BaO both contribute to low liquidus temperatures (high liquidus viscosities) and hence the glasses of the invention
include at least one of these oxides. However, both oxides are known to raise the coefficient of thermal expansion (CTE) and density of the glass. It is desired to have both the CTE and density of the glasses to be low. Further, both SrO and BaO lowers the modulus and strain point of the glass in comparison with CaO.
In accordance with one embodiment the mole percentage of non-green components such as BaO and SrO is kept to a minimum so as to produce an environmentally friendly "green" product, and in particular lessening or getting rid of barium is preferred since barium is one of the listed metals in the Resources Conservation and Recovery Act (RCRA) and is therefore classified by the US EPA as hazardous.
In accordance with the present invention, it is observed that inclusion of chlorine, helps in refining and also helps to dry the glass melt by reducing β- OH. The term "β-ΟΗ value" is used to indicate the hydroxyl concentration of a glass as measured in the conventional manner by infrared spectroscopy according to U.S. Pat. No. 4,072,489 (i.e., at an appropriate wave length of a few microns). β-ΟΗ value of 0.04 indicates a hydroxyl concentration of about 40 ppm. In the glass structure, hydroxyl ions are a part of the network structure. Chlorides react with hydroxyl ions to form Hydrogen Chloride gas, which escapes from the glass melt. This reaction of Chlorides helps to reduce the β-
OH in glass, thereby resulting in an improved refining and reduced foaming of the glass melt.
In accordance with the present invention, it is observed that inclusion of Fluorine helps in refining and also helps to dry the glass melt by reducing β- OH. As described before a β-ΟΗ value of 0.04 indicates a hydroxyl concentration of about 40 ppm. In the glass structure, hydroxyl ions are a part of the network structure. Fluorides react with hydroxyl ions to form Hydrogen Fluoride gas, which escapes from the glass melt. This reaction of Fluorides helps to reduce the β-ΟΗ in glass, thereby resulting in an improved refining and reduced foaming of the glass melt.
In accordance with the present invention, it is observed that the three components, i.e., Na20, F and CI individually assist in directly or indirectly assist in refining. But, their combination is more effective because of the combined multiplying effects of the individual components towards a common final process improvement, i.e., refining. If the same amount of effect (as it is obtained by the combined effect of the 3 components) is desired from any one component then the quantity of one single component will have to be very high and this will lead to other side effects, e.g., if Na20 alone is added then the Na20 contamination of TFT will happen. If F and CI alone are added then environmental hazard will be a problem.
In accordance with the present invention an advantage of the glass from the glass composition is that it exhibit higher viscosity, typically of the order of 106 poise.
In accordance with the present invention the glass from the glass composition exhibit a high-strain point greater than about 620 °C.
In accordance with the present invention the glass from the glass composition has lower liquidus temperature of less than about 1230 °C.
In accordance with the present invention the glass from the glass composition exhibits a high liquidus viscosity of about 105 or greater.
In accordance with the present invention the glass from the glass composition exhibits an annealing temperature of greater than about 650 °C
In accordance with the present invention the trace amount of Na20 does not chemically interact with the TFTs due to very low percentages and but still reduce the melting point of the glass.
In accordance with the present invention, the substrate glass has light-weight owing to the low density of less than about 2.5 g/cm3.
In accordance with the present invention, the substrate glass has lower coefficient of thermal expansion of less than about 40 x 10"7/°C
Thus, the present invention provides a glass composition for display devices compatible with the down draw fusion process.
In accordance with the present invention the substrate glass composition may be used in liquid crystal display [LCD], an electroluminescence display [ELD], a field emission display [FED], plasma display [PD], organic light emitting diode display [OLED] etc.
Exemplary compositions of the glass of the present disclosure are listed in Table I .
Table 1
In the Table I provided herein above, examples 1 to XXVIII are glass compositions in accordance with the embodiments of the present invention, whereas C-I is a comparative example of glass composition in accordance with known prior art. It is observed that owing to presence of β-ΟΗ in . C-I, there is foam formation at about 1420 °C, whereas due to drying effect of chlorine and fluorine, the value of β-ΟΗ is expected to be reduced, whereas no foam formation was observed in examples I to XXVIII due to the drying and refining effect of chlorine and fluorine.
The foregoing description of the specific embodiments will so fully reveal the general nature of the embodiments herein that others can, by applying current knowledge, readily modify and/or adapt for various applications such specific embodiments without departing from the generic concept, and, therefore, such adaptations and modifications should and are intended to be comprehended within the meaning and range of equivalents of the disclosed embodiments. It is to be understood that the phraseology or terminology employed herein is for the purpose of description and not of limitation. Therefore, while the embodiments herein have been described in terms of preferred embodiments, those skilled in the art will recognize that the embodiments herein can be practiced with modification within the spirit and scope of the embodiments as described herein.
Dated this 09m Day of May 2012
Claims
1. A glass composition with reduced foaming, wherein said glass composition comprises:
Si02 from about 63.3 to about 71.3 mole %;
AI2O3 from about 8.1 to about 12.1 mole %;
B203 from about 6.7 to about 12.7 mole %;
CaO from about 5 to 12 mole %;
BaO from about 0.2 to about 3.0 mole %;
SrO from about 0.2 to about 4.5 mole %;
Na20 from about 0.001 to about 0.1 mole %;
fluorine from about 0.001 to about 0.1 mole % and
chlorine from about 0.001 to about 0.5 mole %;
wherein inclusion of the alkali metal Na20 decreases the melting point of the substrate glass composition.
2. The glass as claimed in claim 1, wherein the glass further comprises of at least one of the refining agents selected from a group consisting of As203 in the range from 0 to 0.7 mole % and Sb203 in the range from 0 to 0.8 mole % along with N2Os in the range from 0.1 to 0.4 mole %.
3. The glass as claimed in claim 1, wherein said glass has a density of less than about 2.5 g/cm3.
4. The glass as claimed in claim 1, wherein said glass has a coefficient of thermal expansion less than 45 x 10"7/°C.
5. The glass as claimed in claim 1, wherein said glass has a logarithm of liquidus viscosity of greater than 5.
6. The glass as claimed in claim 1, wherein said glass has a strain point greater than 620 °C.
7. The glass as claimed in claim 1, wherein said glass has a liquidus temperature of less than 1230 °C.
8. The glass as claimed in claim 1, wherein said glass has an annealing temperature of greater than 650 °C.
9. The glass as claimed in claim 1, wherein said glass is down-drawable or slot drawn or press-formable in a mold or drawable through roller press or drawable through float process.
10. A glass sheet prepared from the glass as claimed in claim 1.
1 1. An electronic device, the electronic device comprising a glass substrate, the glass substrate comprising the glass composition as claimed in claim 1.
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019055895A (en) * | 2017-09-21 | 2019-04-11 | Agc株式会社 | Borosilicate glass, and production method thereof |
US11114472B2 (en) * | 2018-12-20 | 2021-09-07 | Samsung Display Co., Ltd. | Thin film transistor panel, display device, and method of manufacturing the thin film transistor panel |
WO2024139237A1 (en) * | 2022-12-28 | 2024-07-04 | 中建材玻璃新材料研究院集团有限公司 | Oled glass with good optical performance |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01201043A (en) * | 1988-02-05 | 1989-08-14 | Eta G K:Kk | High-strength glass |
CN1525945A (en) * | 2001-03-24 | 2004-09-01 | Ф�ز������쳧 | Alkali-free aluminoborosilicate glass and its application |
JP2007039316A (en) * | 2005-06-27 | 2007-02-15 | Nippon Electric Glass Co Ltd | Glass substrate for display |
CN101213148A (en) * | 2005-07-06 | 2008-07-02 | 旭硝子株式会社 | Manufacturing method of non-alkali glass and non-alkali glass plate |
-
2012
- 2012-05-11 WO PCT/IN2012/000343 patent/WO2012156991A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01201043A (en) * | 1988-02-05 | 1989-08-14 | Eta G K:Kk | High-strength glass |
CN1525945A (en) * | 2001-03-24 | 2004-09-01 | Ф�ز������쳧 | Alkali-free aluminoborosilicate glass and its application |
JP2007039316A (en) * | 2005-06-27 | 2007-02-15 | Nippon Electric Glass Co Ltd | Glass substrate for display |
CN101213148A (en) * | 2005-07-06 | 2008-07-02 | 旭硝子株式会社 | Manufacturing method of non-alkali glass and non-alkali glass plate |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019055895A (en) * | 2017-09-21 | 2019-04-11 | Agc株式会社 | Borosilicate glass, and production method thereof |
US11114472B2 (en) * | 2018-12-20 | 2021-09-07 | Samsung Display Co., Ltd. | Thin film transistor panel, display device, and method of manufacturing the thin film transistor panel |
WO2024139237A1 (en) * | 2022-12-28 | 2024-07-04 | 中建材玻璃新材料研究院集团有限公司 | Oled glass with good optical performance |
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WO2012156991A4 (en) | 2013-04-11 |
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