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WO2012023932A1 - Procédé et dispositif de fabrication de réseaux de bragg de volume - Google Patents

Procédé et dispositif de fabrication de réseaux de bragg de volume Download PDF

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Publication number
WO2012023932A1
WO2012023932A1 PCT/US2010/045853 US2010045853W WO2012023932A1 WO 2012023932 A1 WO2012023932 A1 WO 2012023932A1 US 2010045853 W US2010045853 W US 2010045853W WO 2012023932 A1 WO2012023932 A1 WO 2012023932A1
Authority
WO
WIPO (PCT)
Prior art keywords
vbgs
mask
light beam
units
phase mask
Prior art date
Application number
PCT/US2010/045853
Other languages
English (en)
Inventor
Valentin Gapontsev
Alex Ovtchinnikov
Dmitry Starodubov
Alexey Komissarov
Original Assignee
Ipg Photonics Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ipg Photonics Corporation filed Critical Ipg Photonics Corporation
Priority to CN2010800353111A priority Critical patent/CN102652384A/zh
Priority to KR1020127004230A priority patent/KR20130098843A/ko
Priority to PCT/US2010/045853 priority patent/WO2012023932A1/fr
Priority to EP10856236.4A priority patent/EP2606541A4/fr
Priority to JP2013524823A priority patent/JP2013536469A/ja
Publication of WO2012023932A1 publication Critical patent/WO2012023932A1/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0248—Volume holograms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/0675—Resonators including a grating structure, e.g. distributed Bragg reflectors [DBR] or distributed feedback [DFB] fibre lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0268—Inorganic recording material, e.g. photorefractive crystal [PRC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/20—Copying holograms by holographic, i.e. optical means
    • G03H2001/205—Subdivided copy, e.g. scanning transfer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
    • G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
    • G03H2001/306—Tiled identical sub-holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/36—Scanning light beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/54—Photorefractive reactivity wherein light induces photo-generation, redistribution and trapping of charges then a modification of refractive index, e.g. photorefractive polymer

Definitions

  • the invention relates to a method for fabricating volume diffractive elements in photo-thermo refractive glass. More particularly, the invention relates to holographic optical elements and specifically, to volume Bragg gratings (VBG) fabricated in doped photo-thermo retraactive (PTR) glasses.
  • VBG volume Bragg gratings
  • PTR photo-thermo retraactive
  • VBG diffractive optical elements
  • UV light induced refractive index structures which are fabricated in photothermorefr active glass, have been recently widely accepted in optoelectronics.
  • VBGs are the effective optical solution to stabilizing the output wavelength from a commercial laser diode.
  • a typical method for recording VBGs involves a prism-based interferometer' which has a thin elongated plate of photosensitive glass coupled to the prism's face.
  • the prism is made from material transparent at a given wavelength. The exposure of the prism to an incident light wave leads to the recordation of VBGs along the plate's surface.
  • a few inconveniences may be encountered during the manufacturing process of VBGs using the above-discussed interferometric approach.
  • the intensity of the exposure should be uniform in order to have uniform index change and refractive index modulation along and across the plate.
  • This may be technologically challenging.
  • Also challenging may be the spatial stability between the beam and the plate coupled to the prism, which likewise is required for a reproducible fabrication of gratings.
  • the coupling between the prism and plate may be sensitive to misalignment and requires a good mechanical stability.
  • a further inconvenience presented by this method may include dicing the plate so to receive individual VBGs since it is being done by cutting the plate transversely to the longitudinal direction of the grating fringes, when the angle between the grating planes and the glass surface is desired .
  • a further method of volume grating fabrication using side interferometric recording 2 allows for the fabrication of large and thick volume holograms. This approach, like the one previously discussed, may not be efficient in mass production because of the difficulty to maintain the desired alignment between the components. In addition, this method does not teach teaching dicing a slab of glass because the final product includes large, thick volume holograms, not small VBGs.
  • a method for manufacturing fiber Bragg gratings utilizes a simpler, more efficient approach than those discussed above.
  • a grating is typically imprinted in the core of an optical fiber using a silica glass grating phase mask .
  • "Laser irradiation of the phase mask with ultraviolet light at normal incidence imprints into the optical fiber core the interference pattern created by the phase mask.”
  • an apparatus for implementing the method is configured with a stationary light source radiating light having a Gaussian profile which is incident upon the mask that, in turn, is juxtaposed with a fiber.
  • phase mask A few obvious advantages of using a phase mask include, but not limited to, the use of low coherence excimer lasers for grating fabrication and reliable and reproducible length of gratings. These advantages are critical for efficient mass production. Perhaps one of possible undesirable consequences associated with the fiber grating production process stems from the stationary light source which is typically a laser with a long coherence wavelength.
  • any lengths of fiber can be irradiated as long as it does not exceed the dimension of the used mask.
  • the radiation emitted by the single mode stationary laser has a substantially Gaussian profile characterized by a high intensity field along the laser axis and smaller field intensities gradually changing as the wings of the profile run away from its central, axial region.
  • the mask is not uniformly exposed to light which leads to the variation of grating parameters such as
  • VBGs which is characterized by the light (UV) exposure uniformity.
  • the present disclosure utilizes a phase mask and displacement of the mask and laser source relative to one another so as to mass produce transverse holographic elements, such as VBGs, in photo thermo-refractive glass.
  • the disclosed apparatus allows for, among others, a uniform index change, central wavelength and radiation dosage, high mass productivity amounting to at least 95% of products exceeding the established quality standards and reproducibility of grating parameters.
  • the disclosed apparatus provides for exposing a one-piece thick slab to a UV light which is incident upon an elongated phase mask located between the light source and slab.
  • the exposure is accompanied by relative displacement of a light source, radiating UV light and the mask so as to uniformly irradiate the slab.
  • the light source moves relative to the stationary mask.
  • VBGs volume Bragg gratings
  • the slab is initially cut into a plurality of uniform units.
  • the individual units are stacked together and exposed to the displaceable UV source in a manner similar to the previously disclosed aspect.
  • FIG. 1 a highly diagrammatic view of an assembly operative to implement the disclosed method.
  • FIG. 2 is a diagrammatic view illustrating the concept underlying the disclosed method.
  • FIG. 2 A is a view of separate unit of material provided with VBGs recorded in accordance with the assembly of FIG. 1.
  • FIG. 3 is a diagrammatic view conceptually illustrating the known prior art.
  • FIG. 4 illustrates a cutting stage configured in accordance to the disclosed method.
  • FIG. 5 illustrates units of material to be irradiated provided in accordance with one aspect of the disclosed method.
  • FIG. 6 illustrates a flow chart representing the main steps of the disclosed method.
  • FIG. 1 illustrates a system 10 configured to implement a method for recording volume Bragg gratings (VBGs) in a slab 12 of photo-thermo refractive glass.
  • the system 10 further includes a light generating assembly 14 which is operative to radiate a UV beam 25 incident on a phase-mask 18.
  • the mask 18 is disposed either in contact with or close to slab 12 which is axially substantially coextensive with the mask and configured as a host material for recorded VBGs.
  • slab 12 includes an elongated body extending along axis A-A' and mounted to a support 13.
  • the system 10 operates so that mask 18, source assembly 14 and slab 12 may all linearly displaceable relative to one another by an actuator 21.
  • light assembly 14 is operative to move relative to stationary mask 18 on a direction parallel to elongated axis A-A' of slab 12.
  • the displacement of the light source assembly and mask/slab combination may be reversed so that mask 18 and slab 12, which are mounted to respective supports 13, 19 or simply displaceably fixed to one another, move relative to UV beam 25.
  • the relative displacement allows for the formation of any arbitrary length of a grating region 24. Even more importantly, the relative displacement of these components provides for a substantially uniform distribution of high intensity field of light beam 25 over grating region 24.
  • a plurality of fringes 23, as shown in dash lines, are produced in the slab to define grating region 24 which is further diced along the fringes to form a plurality of individual, separated from one another units.
  • the light generating assembly 14 is configured so as to write VBGs 22 at the desired depth within slab 12 and, of course, along the desired length of grating region 24.
  • the assembly includes a light source, such as a laser 26 which may be configured as a fiber laser radiating output beam 25 in substantially a fundamental mode with a Gaussian profile.
  • the beam 25 propagates along a light path until it impinges a first light reflecting component, such as an upstream mirror 28, which is mounted on axis 36 so as rotate as shown by double arrow 16.
  • the angular displacement of mirror 28 allows for setting the desired distance at which laser 26 may be removed from a VBG writing assembly, i.e. mask 18 without actual displacement of the laser along a vertical.
  • the light generating assembly 14 is further configured with a beam expander which may include two light reflecting elements, such as concave-formed mirror 30 and 32.
  • the beam expander is configured to modify the dimension of light spot at slab 12 produced by interfering beams 38 and 40, respectively. The greater the overlap 42 between the interfering beams, the greater the depth of light penetration into slab 12.
  • the beam expansion factor is determined by the ratio of focus lengths of respective elements 30 and 32.
  • elements 30 and 32 should have the overlapping focus in order to have the collimated beam output, which can be obtained by displacing these elements relative to one another.
  • a scanning light reflecting element 34 routes expanded beam 25 towards a writing assembly 44 hich includes mask 18 and slab 12.
  • element 34 may be controllably displaced by actuator 21 so as to optimize the uniformity of the exposure dose.
  • supports 13 and 19, respectively, are displaced relative to assembly 14.
  • FIG. 2 diagrammatically illustrates a VBG writing assembly 44. Due to the configuration of system 10 of FIG. 1 , as beam 25 impinges against slab 12 while propagating through mask 18, gratings 22 are imprinted perpendicular to axis A-A'. Such a configuration allows for the simplicity of cutting slab 12 into individual units 50. As illustrated in FIG. 2, the cutting is realized in a direction perpendicular to axis A-A', i.e., parallel to the longitudinal dimension of grating 22 along fringes 23. In contrast, as shown in FIG.
  • mask 18 and body 12 may be angularly displaceable, i.e. rotatable, as shown by a double-head arrow in FIG. 2 relative to one another about a vertical by, for example, actuator 21 of FIG. 1.
  • This structure allows for the formation of slanted VBGs 22, as shown in FIG. 2A which illustrates rectangularly shaped units 50 (only one is shown) each having grating(s) 22 extend
  • slab 12 may be placed on a translation stage (not shown) operative to pivot about axis A-A', as indicated by a double arrow in FIG. 2.
  • a translation stage (not shown) operative to pivot about axis A-A', as indicated by a double arrow in FIG. 2.
  • Such a structure allows for dicing body 12 by a saw 27 into individual units 50 each having a parallelepiped-shaped configuration in which gratings 22 extend perpendicular to the opposite top and bottom surfaces of the unit.
  • saw 27 may pivot relative to slap 12 so as to produce the parallelepiped-shaped units 50.
  • Such a configuration may be useful when slanted fringes 23 are used to reflect undesirable frequencies so that the latter bypass a source of light, such as a laser diode.
  • position of saw 27 and body 12 may be fixed for fabrication of rectangularly-shaped units 50'.
  • FIG. 6 illustrates general steps illustrating the above discussion.
  • the adjustment of the desired distance between light assembly 14 and mask 18 is realized in step 52.
  • the expander of light source is adjusted in step 54.
  • relative rotation of step 56 may be performed either to have VBGs 22 extend parallel to fringes 23, as shown in step 56' or angularly as shown by step 56".
  • step 58 illustrates a cutting stage of the disclosed process in which individual units 50 may have a rectangular shape as illustrated by step 58' or have fringes 23 slanted, as shown by step 58".

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

L'invention porte sur un système d'enregistrement de multiples réseaux de Bragg de volume (VBG), dans un matériau photo-réfringent thermique, qui est configuré pour mettre en œuvre un procédé qui permet l'irradiation du matériau par une lumière cohérente à travers un masque de phase. Le système possède une pluralité d'actionneurs opérationnels pour déplacer la source de lumière, un masque de phase et un matériau les uns par rapport aux autres, de façon à produire en masse de multiples unités du matériau ayant chacune un ou plusieurs VBG configurés de manière uniforme.
PCT/US2010/045853 2010-08-18 2010-08-18 Procédé et dispositif de fabrication de réseaux de bragg de volume WO2012023932A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN2010800353111A CN102652384A (zh) 2010-08-18 2010-08-18 制造体积布拉格光栅的方法和装置
KR1020127004230A KR20130098843A (ko) 2010-08-18 2010-08-18 볼륨 브래그 격자들을 제조하기 위한 방법 및 장치
PCT/US2010/045853 WO2012023932A1 (fr) 2010-08-18 2010-08-18 Procédé et dispositif de fabrication de réseaux de bragg de volume
EP10856236.4A EP2606541A4 (fr) 2010-08-18 2010-08-18 Procédé et dispositif de fabrication de réseaux de bragg de volume
JP2013524823A JP2013536469A (ja) 2010-08-18 2010-08-18 体積ブラッグ回折格子の作製方法ならびに装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2010/045853 WO2012023932A1 (fr) 2010-08-18 2010-08-18 Procédé et dispositif de fabrication de réseaux de bragg de volume

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WO2012023932A1 true WO2012023932A1 (fr) 2012-02-23

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EP (1) EP2606541A4 (fr)
JP (1) JP2013536469A (fr)
KR (1) KR20130098843A (fr)
CN (1) CN102652384A (fr)
WO (1) WO2012023932A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022187945A1 (fr) * 2021-03-08 2022-09-15 Teraxion Inc. Réseau de bragg en volume dans un milieu en vrac cylindrique

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CN102902002B (zh) * 2012-09-25 2014-06-25 浙江大学 一种反射式体全息布拉格光栅紫外曝光的方法
CN104133267B (zh) * 2014-08-19 2017-12-26 林安英 制作多波长体布拉格光栅的方法
CN110275244B (zh) * 2019-06-26 2021-03-23 苏州东辉光学有限公司 一种体布拉格光栅的制备方法

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Publication number Priority date Publication date Assignee Title
WO2022187945A1 (fr) * 2021-03-08 2022-09-15 Teraxion Inc. Réseau de bragg en volume dans un milieu en vrac cylindrique

Also Published As

Publication number Publication date
EP2606541A1 (fr) 2013-06-26
JP2013536469A (ja) 2013-09-19
EP2606541A4 (fr) 2014-01-15
KR20130098843A (ko) 2013-09-05
CN102652384A (zh) 2012-08-29

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