[go: up one dir, main page]

WO2009153219A2 - Apparatus and method for feeding a process medium - Google Patents

Apparatus and method for feeding a process medium Download PDF

Info

Publication number
WO2009153219A2
WO2009153219A2 PCT/EP2009/057285 EP2009057285W WO2009153219A2 WO 2009153219 A2 WO2009153219 A2 WO 2009153219A2 EP 2009057285 W EP2009057285 W EP 2009057285W WO 2009153219 A2 WO2009153219 A2 WO 2009153219A2
Authority
WO
WIPO (PCT)
Prior art keywords
control gas
process medium
pressure
control
valve
Prior art date
Application number
PCT/EP2009/057285
Other languages
French (fr)
Other versions
WO2009153219A3 (en
Inventor
Andreas Tikovsky
Original Assignee
L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
Intega Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, Intega Gmbh filed Critical L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
Publication of WO2009153219A2 publication Critical patent/WO2009153219A2/en
Publication of WO2009153219A3 publication Critical patent/WO2009153219A3/en

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
    • G05D16/2046—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures
    • G05D16/2053—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures the plurality of throttling means comprising only a first throttling means acting on a higher pressure and a second throttling means acting on a lower pressure, e.g. the atmosphere
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2093—Control of fluid pressure characterised by the use of electric means with combination of electric and non-electric auxiliary power

Definitions

  • the present invention relates to a method and an apparatus for feeding a process medium to a process medium consumer.
  • a preferred area of application for this invention is the regulation of the feeding of process gas to process gas consumers, such as, for example, of doping gases to corresponding apparatuses for the treatment of semiconductor components such as implanters, for example.
  • MFC components mass flow controller
  • ultrapure gas technology for regulating the gas feed. They can regulate the pressure very accurately, but are relatively expensive.
  • pressure regulation which does not have to be highly precise, but which is intended to enable reliable and relatively accurate regulation in conjunction with a simple construction. This is of importance particularly when the process medium is toxic, corrosive and/or inflammable.
  • the present invention is based on the object of specifying an apparatus and a method for regulating a process medium pressure which enable reliable regulation in conjunction with a simple construction.
  • the apparatus according to the invention for regulating a process medium flow to be fed to a process medium consumer comprises: a) a process medium path, by means of which a process medium source can be connected to the process medium consumer, and b) a control gas path, by means of which a control gas pressure can be built up with a control gas.
  • the process medium path comprises a pneumatic pressure regulator, the control input of which is connected to the control gas path, wherein means for regulating the control gas pressure are embodied which comprise a delivery valve for connecting the control gas path to a control gas pressure source and a discharge valve for decreasing pressure in the control gas path.
  • process medium is understood to mean any fluid medium in the context of this invention.
  • liquids or gases preferably gases
  • a process medium consumer is understood to mean a component or a location at which the process medium is required.
  • an apparatus for the treatment of semiconductor substrates, in particular for the doping of semiconductor substrates is preferably involved in this case.
  • the present invention can for example advantageously be used for regulating the process gas pressure of gases having a low vapour pressure, in particular of less than 10 bar at 20 0 C.
  • gases are chlorine, tungsten hexafluoride (WF6), SiH2C12.
  • WF6 tungsten hexafluoride
  • SiH2C12 SiH2C12.
  • the apparatus according to the invention and also the method according to the invention can also be used in the relaxation of gases to a pressure range of 6 bar or less, in particular proceeding from pressures of 100 bar or more, for example in the case Of SiH 4 .
  • the regulating technology according to the invention has crucial advantages here because pressure fluctuations in the process medium path which lead to a non-linear behaviour of the pressure regulator can be overcome by the use of the apparatus according to the invention and/or of the method according to the invention.
  • the process medium source can be a reservoir of the process medium or else a source of the process medium in which the process medium is isolated or synthesized.
  • process medium path and control gas path are understood to mean, in particular, lines or line systems.
  • the process medium and/or the control gas path in particular preferably comprise lines, pipes and/or hoses.
  • the control gas pressure source is understood to mean a source from which control gas can be drawn under pressure, that is to say in a manner present at a specific pressure. In particular, this can involve a reservoir or a line system in which control gas is present under pressure.
  • the control gas pressure source can contain a compressor for air.
  • the control gas pressure source can comprise a container with compressed gas, for example a compressed gas cylinder filled with nitrogen.
  • the production costs of the corresponding apparatus can be significantly reduced in comparison with an MFC. Since, on account of the pneumatic pressure regulation, it is not necessary to embody electronics at least in the regulator region, the apparatus according to the invention can also be used in explosion-protected zones. The necessary control can be integrated into controllers that are already present anyway.
  • the means for regulating the control gas pressure comprise at least one directional valve. That is to say that delivery valve and/or discharge valve are embodied as a directional valve, preferably as a 2/2 -way directional valve in each case. As an alternative or in addition, at least one valve can be embodied as a 5/3 -way directional valve. In this case, the means for regulating the control gas pressure comprise, in particular, at least one 5/3-way directional valve.
  • the means for regulating the control gas pressure comprise at least one pressure sensor for pressure measurement which can be connected to the process medium path between pneumatic pressure regulator and process medium consumer.
  • Said pressure sensor serves for monitoring the pressure between the pneumatic pressure regulator and the process medium consumer.
  • Said pressure sensor can be used to ascertain the process medium pressure downstream of the pneumatic pressure regulator.
  • the pressure monitoring is preferably effected continuously or quasi-continuously, that is to say at short predeterminable or predetermined intervals.
  • the corresponding pressure values are used for regulating the corresponding process medium flow or the pressure of the process medium towards the process medium consumer, that is to say downstream of the pneumatic pressure regulator in the process gas path.
  • the pressure sensors used are preferably thin-film sensors, in particular based on strain gauges, piezoresistive sensors and/or thick-film sensors. By way of example, it is possible to use a pressure sensor that is sold under the designation NWU 10 by the company WIKA Alexander Wiegand GmbH & Co. KG in Klingenberg.
  • control gas path between delivery valve and pneumatic pressure regulator has a volume of at least 10 cm 3 (cubic centimetres).
  • Such a volume serves as a type of buffer volume and prevents an oscillation behaviour of the regulating mechanism.
  • a better regulating behaviour is therefore achieved by means of the buffer volume, which can alternatively or additionally also be embodied as a separate buffer volume in the control gas path.
  • the measurement accuracy or regulating accuracy is thereby improved. This is due, in particular, to the fact that the volumetric flow rates and thus the pressure increase and/or pressure decrease are relatively small in the case of a short or else shortest possible opening of the delivery valve and/or of the discharge valve.
  • a control means is embodied, by which the means for regulating the control gas pressure can be driven, which is connected at least to the delivery valve and the discharge valve via control lines.
  • control line between control means and pressure sensor.
  • the control lines can be embodied in the form of a wire or else wirelessly. Any further possibility of connection between control means and the corresponding other components is possible and according to the invention.
  • a means for reducing the cross section capable of carrying a flow is embodied in the control gas path at least between one of the following valves: a) the delivery valve and b) the discharge valve and the control input.
  • Said means preferably comprises at least one of the following components: a) a screen; b) a metering valve; c) a needle valve; d) a regulating valve; e) a throttle valve; f) a reduction.
  • a screen is understood to mean, in particular, a component used to constrict the internal diameter of the control gas path.
  • a reduction is understood to mean, in particular, a component used to constrict the internal and external diameters of the control gas path.
  • a metering valve is understood to mean a valve that can be used to meter the through-flow of gases and liquids.
  • a needle valve is understood to mean a valve in which the through-flow of a liquid or gas can be regulated by adjusting a needle.
  • a regulating valve is understood to mean a valve that can be used to regulate the gas flow passing through the regulating valve.
  • a throttle valve is understood to mean an adjustable constriction in the control gas path.
  • the setting accuracy of the regulating circuit described here can advantageously be improved by the means for reducing the cross section capable of carrying a flow.
  • a method for regulating a process medium flow led from a process medium source to a process medium consumer wherein the process medium flow is led to the process medium consumer through a pneumatic pressure regulator, wherein a control gas pressure is present at a control input of the pneumatic pressure regulator, which control gas pressure is regulated in a manner dependent on the pressure of the process medium between pneumatic pressure regulator and process medium consumer.
  • control gas pressure depending on the deviation of the pressure of the process medium between pneumatic pressure regulator and process medium consumer from a predeterminable desired value, is increased by means of the opening of a delivery valve embodied in the control gas path with a control gas source or is decreased via a discharge valve embodied in the control gas path.
  • the delivery valve is correspondingly opened in the event of a necessary increase in the control gas pressure in order to increase the pressure of the process medium.
  • the corresponding discharge valve is opened in the event of a necessary decrease in the control gas pressure.
  • the method can proceed in particular in an apparatus according to the invention.
  • the method or the corresponding regulation in accordance with the method can have recourse to a computer for evaluating the pressure values and for driving the corresponding delivery and discharge valves.
  • control gas At least one of the following gases is used as control gas: a) an inert gas; b) nitrogen (N 2 ); and c) compressed air, preferably purified compressed air.
  • inert gases and compressed air can be discharged to the surrounding environment via the discharge valve in a preferred manner without further measures such as, in particular, gas purification. It is not necessary to comply with further safety provisions; nitrogen and compressed air and also inert gases can readily be discharged to the ambient air.
  • Fig. 1 shows a first exemplary embodiment of an apparatus according to the invention
  • Fig. 2 shows a second exemplary embodiment of an apparatus according to the invention
  • Fig. 3 shows a third exemplary embodiment of an apparatus according to the invention
  • Fig. 1 schematically shows a first exemplary embodiment of an apparatus 1 according to the invention for regulating a process medium flow 2 to be fed to a process medium consumer.
  • the apparatus 1 according to the invention comprises a process medium path 3, by means of which a process medium source (not shown here) can be connected to the process medium consumer.
  • the apparatus 1 according to the invention comprises a control gas path 4, by means of which a control gas pressure can be built up with a control gas.
  • the process medium path 3 has a pneumatic pressure regulator 5, the control input 6 of which is connected to the control gas path 4. The control gas pressure is therefore present at the control input 6.
  • Means 7 for regulating the control gas pressure are embodied, which comprise a delivery valve 8 for connecting the control gas path 4 to a control gas pressure source 9.
  • the control gas pressure source 9 comprises for example a corresponding reservoir such as, for example, a corresponding compressed gas cylinder in which the corresponding control gas, for example nitrogen, is kept available under pressure.
  • the control gas pressure source 9 can for example also comprise a compressor for compressing air, if appropriate with corresponding purifying means.
  • the apparatus comprises a discharge valve 10 for decreasing pressure in the control gas path 4. Via the discharge valve 10, a discharge flow 11 of the control gas can thereby be discharged to the surrounding environment.
  • Both the delivery valve 8 and the discharge valve 10 in this exemplary embodiment in each case constitute 2/2 -way directional valves that can be driven magnetically by means of corresponding actuating magnets 12 or correspondingly electrically.
  • the actuating magnets 12 are connected to a control means 14 via control lines 13.
  • Corresponding actuating commands can be passed to the actuating magnets 12 via the control lines 13.
  • Corresponding driving of the valves 8, 10 by the control means 14 can alternatively be effected.
  • the control means is connected to a pressure sensor 15 via a further control line 13.
  • the pressure of the process medium downstream of the pneumatic pressure regulator 5 is detected by means of said pressure sensor 15.
  • the so-called back pressure of the pneumatic pressure regulator 5 is involved in this case.
  • the pressure sensor 15 detects this pressure; it is read by the control means 14.
  • the control means 14 compares this pressure with a predeterminable desired value of the pressure. If the pressure falls or rises in comparison with the desired value, the control means 14 passes a corresponding signal, in particular a current signal, via the control lines 13 to the delivery valve 8 or the discharge valve 10, or respectively the corresponding actuating magnets 12. As a result of this, the control gas pressure is increased and the pneumatic pressure regulator 5 is opened further or closed.
  • the desired value of the pressure of the process gas downstream of the pneumatic pressure regulator 5 is achieved again.
  • the pressure can be regulated accurately to at least 50 mbar.
  • Magnetic valves which have only a short play in the valve seat are preferably chosen as delivery valve 8 and/or as discharge valve 10. On the one hand, this brings about a small through-flow through the corresponding valves 8, 10 and, on the other hand, a resonant build-up, that is to say a resonant behaviour of the pneumatic pressure regulator 5, can be prevented by this small through-flow.
  • Fig. 2 shows a second exemplary embodiment of an apparatus 1 according to the invention. Supplementarily with respect to the first exemplary embodiment, it has a buffer volume 16 in the control gas path 4.
  • the second exemplary embodiment has a means 17 for reducing the cross section capable of carrying a flow.
  • Said means 17 is embodied between the delivery valve 8 and the control input 6 of the pneumatic pressure regulator 5, and between the discharge valve 10 and the control input 6 of the pneumatic pressure regulator 5.
  • the minimum amount of control gas which can flow to the control input 6 of the pneumatic pressure regulator 5 is thereby reduced. This reduces the risk of oscillation and a resonant behaviour of the regulating circuit.
  • Fig. 2 furthermore shows an implanter 18, which is supplied with the process medium, in this case a doping gas such as, for example, arsine, phosphine, boron trifluoride and/or silicon tetrafluoride.
  • a doping gas such as, for example, arsine, phosphine, boron trifluoride and/or silicon tetrafluoride.
  • Fig. 3 schematically shows a third exemplary embodiment of an apparatus 1 according to the invention for regulating a process medium flow 2 to be fed to a process medium consumer 28.
  • the apparatus 1 has a process medium path 3 comprising a pneumatic pressure regulator 5 with a control input 6.
  • the control input 6 is connected to a control gas path 4.
  • the control gas path 4 is connected to a control gas pressure source 9.
  • the control gas path 4 furthermore comprises a means 7 for regulating the control gas pressure.
  • the means 7 is embodied as a correspondingly switched 5/3 -way directional valve 19.
  • the 5/3 -way directional valve 19 is embodied in such a way that the central position is closed.
  • a corresponding discharge valve 11 is realized by means of two of the corresponding connections of the 5/3 -way directional valve 19, by means of which discharge valve the discharge flow 11 can be discharged via a sound damper 20. Via one of the connections it is possible to produce a connection to the control gas pressure source 9, such that a corresponding delivery valve 8 is realized here.
  • Two outputs are connected to the control input 6 of the pneumatic pressure regulator 5 via an adjustable throttle valve 21 and a buffer volume 16. A corresponding increase in the control gas pressure and a decrease in the control gas pressure are thus possible by corresponding changeover of the 5/3 -way directional valve 19.
  • the control is realized in control means 14 connected to the 5/3 -way directional valve 19 via corresponding control lines 13.
  • the control means 14 comprise a PI controller 22, which is provided with a desired pressure value by means of a desired value transmitter 23.
  • the desired value transmitter 23 can be part of a personal computer, an SPC controller or the like.
  • the PI controller 22 is supplied with the actual pressure values by the pressure sensor 15 via a control line 13.
  • the PI controller 22 has preset inputs 25, via which further values can be preset such as, for example, a gain factor, a lead time or the like.
  • the control means 14 comprise a pulse width modulator 26, which modulates the control signals for the corresponding inputs of the 5/3-way directional valve 19. Consequently, the process medium flow 2 from a process medium source 27 to a process medium consumer 28 can be regulated by the control means 14 by means of the increase or decrease in the control gas pressure in the control gas path 4 at the control input 6 of the pneumatic pressure regulator 5.
  • the apparatus 1 according to the invention and the method according to the invention advantageously permit precise regulation of the process medium flow 2 from a process medium source 27 to a process medium consumer 28 using simple means.
  • the magnetic valves 8, 10, 19 used such as, for example, the magnetic 5/3-way directional valve 19 for increasing or decreasing a control gas pressure in a control gas path 4, corresponding regulation can even be used in areas at risk of an explosion, such as, for example, in ultra- clean rooms, in implanters 18 or the like.

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Control Of Fluid Pressure (AREA)
  • Flow Control (AREA)

Abstract

The apparatus (1) according to the invention for regulating a process medium flow (2) to be fed to a process medium consumer (28), comprising a) a process medium path (3), by means of which a process medium source (27) can be connected to the process medium consumer (28), and b) a control gas path (4), by means of which a control gas pressure can be built up with a control gas, wherein the process medium path (3) comprises a pneumatic pressure regulator (5), the control input (6) of which is connected to the control gas path (4), wherein means (7) for regulating the control gas pressure are embodied, is distinguished by the fact that the means (7) for regulating the control gas pressure comprise a delivery valve (8) for connecting the control gas path (4) to a control gas pressure source (9) and a discharge valve (10) for decreasing pressure in the control gas path (4). The apparatus (1) according to the invention and the method according to the invention advantageously permit precise regulation of the process medium flow (2) from a process medium source (27) to a process medium consumer (28) using simple means. On account of the magnetic valves (8, 10, 19) used such as, for example, the magnetic 5/3-way directional valve (19) for increasing or decreasing a control gas pressure in a control gas path (4), corresponding regulation can even be used in areas at risk of an explosion, such as, for example, in ultra-clean rooms, in implanters (18) or the like.

Description

Apparatus and method for feeding a process medium
The present invention relates to a method and an apparatus for feeding a process medium to a process medium consumer. A preferred area of application for this invention is the regulation of the feeding of process gas to process gas consumers, such as, for example, of doping gases to corresponding apparatuses for the treatment of semiconductor components such as implanters, for example.
MFC components (mass flow controller), based for example on thermal effects or on the coriolis force, have been used hitherto in ultrapure gas technology for regulating the gas feed. They can regulate the pressure very accurately, but are relatively expensive. There are often applications - including in ultrapure gas technology - which require pressure regulation which does not have to be highly precise, but which is intended to enable reliable and relatively accurate regulation in conjunction with a simple construction. This is of importance particularly when the process medium is toxic, corrosive and/or inflammable.
Taking this as a departure point, the present invention is based on the object of specifying an apparatus and a method for regulating a process medium pressure which enable reliable regulation in conjunction with a simple construction.
This object is achieved by means of an apparatus and a method comprising the features of the independent claims; the dependent claims are directed to advantageous developments.
The apparatus according to the invention for regulating a process medium flow to be fed to a process medium consumer comprises: a) a process medium path, by means of which a process medium source can be connected to the process medium consumer, and b) a control gas path, by means of which a control gas pressure can be built up with a control gas.
According to the invention, the process medium path comprises a pneumatic pressure regulator, the control input of which is connected to the control gas path, wherein means for regulating the control gas pressure are embodied which comprise a delivery valve for connecting the control gas path to a control gas pressure source and a discharge valve for decreasing pressure in the control gas path.
The term process medium is understood to mean any fluid medium in the context of this invention. In particular, liquids or gases, preferably gases, are involved in this case. A process medium consumer is understood to mean a component or a location at which the process medium is required. By way of example, an apparatus for the treatment of semiconductor substrates, in particular for the doping of semiconductor substrates, is preferably involved in this case. Furthermore, the present invention can for example advantageously be used for regulating the process gas pressure of gases having a low vapour pressure, in particular of less than 10 bar at 200C. Examples of such gases are chlorine, tungsten hexafluoride (WF6), SiH2C12. In the case of such gases, the process gas pressure fluctuates greatly in the case of temperature fluctuations, for example. Furthermore, the apparatus according to the invention and also the method according to the invention, which is described further below, can also be used in the relaxation of gases to a pressure range of 6 bar or less, in particular proceeding from pressures of 100 bar or more, for example in the case Of SiH4. The regulating technology according to the invention has crucial advantages here because pressure fluctuations in the process medium path which lead to a non-linear behaviour of the pressure regulator can be overcome by the use of the apparatus according to the invention and/or of the method according to the invention. The process medium source can be a reservoir of the process medium or else a source of the process medium in which the process medium is isolated or synthesized.
The terms process medium path and control gas path are understood to mean, in particular, lines or line systems. The process medium and/or the control gas path in particular preferably comprise lines, pipes and/or hoses.
The control gas pressure source is understood to mean a source from which control gas can be drawn under pressure, that is to say in a manner present at a specific pressure. In particular, this can involve a reservoir or a line system in which control gas is present under pressure. By way of example, the control gas pressure source can contain a compressor for air. As an alternative or in addition, the control gas pressure source can comprise a container with compressed gas, for example a compressed gas cylinder filled with nitrogen. The apparatus according to the invention makes it possible to use customary valves as delivery valve and as discharge valve for decreasing pressure in the control gas line and thus to achieve regulation accuracies of less than 50 mbar using customary valves. By virtue of the fact that customary components such as a customary pneumatic pressure regulator and customary valves can be used, the production costs of the corresponding apparatus can be significantly reduced in comparison with an MFC. Since, on account of the pneumatic pressure regulation, it is not necessary to embody electronics at least in the regulator region, the apparatus according to the invention can also be used in explosion-protected zones. The necessary control can be integrated into controllers that are already present anyway.
In accordance with one advantageous configuration of the apparatus according to the invention, the means for regulating the control gas pressure comprise at least one directional valve. That is to say that delivery valve and/or discharge valve are embodied as a directional valve, preferably as a 2/2 -way directional valve in each case. As an alternative or in addition, at least one valve can be embodied as a 5/3 -way directional valve. In this case, the means for regulating the control gas pressure comprise, in particular, at least one 5/3-way directional valve.
Through the use of directional valves, the possibility of embodying and driving corresponding delivery and discharge valves is afforded in a simple and readily electrically or magnetically driveable manner.
In accordance with a further advantageous configuration of the apparatus according to the invention, the means for regulating the control gas pressure comprise at least one pressure sensor for pressure measurement which can be connected to the process medium path between pneumatic pressure regulator and process medium consumer.
Said pressure sensor serves for monitoring the pressure between the pneumatic pressure regulator and the process medium consumer. Said pressure sensor can be used to ascertain the process medium pressure downstream of the pneumatic pressure regulator. In this case, the pressure monitoring is preferably effected continuously or quasi-continuously, that is to say at short predeterminable or predetermined intervals. The corresponding pressure values are used for regulating the corresponding process medium flow or the pressure of the process medium towards the process medium consumer, that is to say downstream of the pneumatic pressure regulator in the process gas path. The pressure sensors used are preferably thin-film sensors, in particular based on strain gauges, piezoresistive sensors and/or thick-film sensors. By way of example, it is possible to use a pressure sensor that is sold under the designation NWU 10 by the company WIKA Alexander Wiegand GmbH & Co. KG in Klingenberg.
In accordance with a further advantageous configuration of the apparatus according to the invention, the control gas path between delivery valve and pneumatic pressure regulator has a volume of at least 10 cm3 (cubic centimetres).
Such a volume serves as a type of buffer volume and prevents an oscillation behaviour of the regulating mechanism. A better regulating behaviour is therefore achieved by means of the buffer volume, which can alternatively or additionally also be embodied as a separate buffer volume in the control gas path. The measurement accuracy or regulating accuracy is thereby improved. This is due, in particular, to the fact that the volumetric flow rates and thus the pressure increase and/or pressure decrease are relatively small in the case of a short or else shortest possible opening of the delivery valve and/or of the discharge valve.
In accordance with a further advantageous configuration of the apparatus according to the invention, a control means is embodied, by which the means for regulating the control gas pressure can be driven, which is connected at least to the delivery valve and the discharge valve via control lines.
Preferably, there is additionally a control line between control means and pressure sensor. The control lines can be embodied in the form of a wire or else wirelessly. Any further possibility of connection between control means and the corresponding other components is possible and according to the invention.
In accordance with a further advantageous configuration of the apparatus according to the invention, a means for reducing the cross section capable of carrying a flow is embodied in the control gas path at least between one of the following valves: a) the delivery valve and b) the discharge valve and the control input. Said means preferably comprises at least one of the following components: a) a screen; b) a metering valve; c) a needle valve; d) a regulating valve; e) a throttle valve; f) a reduction.
A screen is understood to mean, in particular, a component used to constrict the internal diameter of the control gas path. A reduction is understood to mean, in particular, a component used to constrict the internal and external diameters of the control gas path. A metering valve is understood to mean a valve that can be used to meter the through-flow of gases and liquids. A needle valve is understood to mean a valve in which the through-flow of a liquid or gas can be regulated by adjusting a needle. A regulating valve is understood to mean a valve that can be used to regulate the gas flow passing through the regulating valve. A throttle valve is understood to mean an adjustable constriction in the control gas path.
The setting accuracy of the regulating circuit described here can advantageously be improved by the means for reducing the cross section capable of carrying a flow.
In accordance with a further aspect of the present invention, a method for regulating a process medium flow led from a process medium source to a process medium consumer is proposed, wherein the process medium flow is led to the process medium consumer through a pneumatic pressure regulator, wherein a control gas pressure is present at a control input of the pneumatic pressure regulator, which control gas pressure is regulated in a manner dependent on the pressure of the process medium between pneumatic pressure regulator and process medium consumer. According to the invention, the control gas pressure, depending on the deviation of the pressure of the process medium between pneumatic pressure regulator and process medium consumer from a predeterminable desired value, is increased by means of the opening of a delivery valve embodied in the control gas path with a control gas source or is decreased via a discharge valve embodied in the control gas path.
This means that the delivery valve is correspondingly opened in the event of a necessary increase in the control gas pressure in order to increase the pressure of the process medium. The corresponding discharge valve is opened in the event of a necessary decrease in the control gas pressure. The method can proceed in particular in an apparatus according to the invention. The method or the corresponding regulation in accordance with the method can have recourse to a computer for evaluating the pressure values and for driving the corresponding delivery and discharge valves.
At least one of the following gases is used as control gas: a) an inert gas; b) nitrogen (N2); and c) compressed air, preferably purified compressed air.
All inert gases and compressed air can be discharged to the surrounding environment via the discharge valve in a preferred manner without further measures such as, in particular, gas purification. It is not necessary to comply with further safety provisions; nitrogen and compressed air and also inert gases can readily be discharged to the ambient air.
The details and advantages disclosed for the method according to the invention can be applied to the apparatus according to the invention, and vice versa.
Furthermore, the use according to the invention of an apparatus according to the invention and/or of a method according to the invention for feeding process gas for semiconductor doping, in particular for feeding process gas to at least one implanter, is proposed.
The details and advantages disclosed for the method according to the invention and for the apparatus according to the invention can be applied to the use according to the invention, and vice versa in each case.
The invention is explained in more detail below with reference to the accompanying drawing, without being restricted to the details shown therein. In the figures, schematically: Fig. 1 shows a first exemplary embodiment of an apparatus according to the invention;
Fig. 2 shows a second exemplary embodiment of an apparatus according to the invention, and Fig. 3 shows a third exemplary embodiment of an apparatus according to the invention. Fig. 1 schematically shows a first exemplary embodiment of an apparatus 1 according to the invention for regulating a process medium flow 2 to be fed to a process medium consumer. The apparatus 1 according to the invention comprises a process medium path 3, by means of which a process medium source (not shown here) can be connected to the process medium consumer. Furthermore, the apparatus 1 according to the invention comprises a control gas path 4, by means of which a control gas pressure can be built up with a control gas. The process medium path 3 has a pneumatic pressure regulator 5, the control input 6 of which is connected to the control gas path 4. The control gas pressure is therefore present at the control input 6. Means 7 for regulating the control gas pressure are embodied, which comprise a delivery valve 8 for connecting the control gas path 4 to a control gas pressure source 9. The control gas pressure source 9 comprises for example a corresponding reservoir such as, for example, a corresponding compressed gas cylinder in which the corresponding control gas, for example nitrogen, is kept available under pressure. The control gas pressure source 9 can for example also comprise a compressor for compressing air, if appropriate with corresponding purifying means.
Furthermore, the apparatus according to the invention comprises a discharge valve 10 for decreasing pressure in the control gas path 4. Via the discharge valve 10, a discharge flow 11 of the control gas can thereby be discharged to the surrounding environment.
Both the delivery valve 8 and the discharge valve 10 in this exemplary embodiment in each case constitute 2/2 -way directional valves that can be driven magnetically by means of corresponding actuating magnets 12 or correspondingly electrically. The actuating magnets 12 are connected to a control means 14 via control lines 13. Corresponding actuating commands can be passed to the actuating magnets 12 via the control lines 13. Corresponding driving of the valves 8, 10 by the control means 14 can alternatively be effected.
The control means is connected to a pressure sensor 15 via a further control line 13. The pressure of the process medium downstream of the pneumatic pressure regulator 5 is detected by means of said pressure sensor 15. The so-called back pressure of the pneumatic pressure regulator 5 is involved in this case. The pressure sensor 15 detects this pressure; it is read by the control means 14. The control means 14 compares this pressure with a predeterminable desired value of the pressure. If the pressure falls or rises in comparison with the desired value, the control means 14 passes a corresponding signal, in particular a current signal, via the control lines 13 to the delivery valve 8 or the discharge valve 10, or respectively the corresponding actuating magnets 12. As a result of this, the control gas pressure is increased and the pneumatic pressure regulator 5 is opened further or closed. As a result of this, the desired value of the pressure of the process gas downstream of the pneumatic pressure regulator 5 is achieved again. By means of the rapid switchings of the corresponding and in particular magnetically operated valves 8, 10, the pressure can be regulated accurately to at least 50 mbar. Magnetic valves which have only a short play in the valve seat are preferably chosen as delivery valve 8 and/or as discharge valve 10. On the one hand, this brings about a small through-flow through the corresponding valves 8, 10 and, on the other hand, a resonant build-up, that is to say a resonant behaviour of the pneumatic pressure regulator 5, can be prevented by this small through-flow.
Fig. 2 shows a second exemplary embodiment of an apparatus 1 according to the invention. Supplementarily with respect to the first exemplary embodiment, it has a buffer volume 16 in the control gas path 4. The formation of the buffer volume 16, which is formed in particular when the volume of the control gas path between delivery valve 8 and control input 6 of the pneumatic pressure regulator 5 is too small, in particular less than 10 cubic centimetres, serves to prevent a resonant behaviour of the regulating circuit. Oscillation of the control gas pressure can advantageously be prevented by the formation of the buffer volume.
Furthermore, in comparison with the first exemplary embodiment, the second exemplary embodiment has a means 17 for reducing the cross section capable of carrying a flow. Said means 17 is embodied between the delivery valve 8 and the control input 6 of the pneumatic pressure regulator 5, and between the discharge valve 10 and the control input 6 of the pneumatic pressure regulator 5. The minimum amount of control gas which can flow to the control input 6 of the pneumatic pressure regulator 5 is thereby reduced. This reduces the risk of oscillation and a resonant behaviour of the regulating circuit.
Fig. 2 furthermore shows an implanter 18, which is supplied with the process medium, in this case a doping gas such as, for example, arsine, phosphine, boron trifluoride and/or silicon tetrafluoride.
Fig. 3 schematically shows a third exemplary embodiment of an apparatus 1 according to the invention for regulating a process medium flow 2 to be fed to a process medium consumer 28. Components identical to those in the first two exemplary embodiments are provided with identical reference symbols. The apparatus 1 has a process medium path 3 comprising a pneumatic pressure regulator 5 with a control input 6. The control input 6 is connected to a control gas path 4. The control gas path 4 is connected to a control gas pressure source 9. The control gas path 4 furthermore comprises a means 7 for regulating the control gas pressure. In contrast to the first two exemplary embodiments, the means 7 is embodied as a correspondingly switched 5/3 -way directional valve 19.
The 5/3 -way directional valve 19 is embodied in such a way that the central position is closed. A corresponding discharge valve 11 is realized by means of two of the corresponding connections of the 5/3 -way directional valve 19, by means of which discharge valve the discharge flow 11 can be discharged via a sound damper 20. Via one of the connections it is possible to produce a connection to the control gas pressure source 9, such that a corresponding delivery valve 8 is realized here. Two outputs are connected to the control input 6 of the pneumatic pressure regulator 5 via an adjustable throttle valve 21 and a buffer volume 16. A corresponding increase in the control gas pressure and a decrease in the control gas pressure are thus possible by corresponding changeover of the 5/3 -way directional valve 19.
The control is realized in control means 14 connected to the 5/3 -way directional valve 19 via corresponding control lines 13. The control means 14 comprise a PI controller 22, which is provided with a desired pressure value by means of a desired value transmitter 23. The desired value transmitter 23 can be part of a personal computer, an SPC controller or the like. Furthermore, the PI controller 22 is supplied with the actual pressure values by the pressure sensor 15 via a control line 13. Furthermore, the PI controller 22 has preset inputs 25, via which further values can be preset such as, for example, a gain factor, a lead time or the like. Furthermore, the control means 14 comprise a pulse width modulator 26, which modulates the control signals for the corresponding inputs of the 5/3-way directional valve 19. Consequently, the process medium flow 2 from a process medium source 27 to a process medium consumer 28 can be regulated by the control means 14 by means of the increase or decrease in the control gas pressure in the control gas path 4 at the control input 6 of the pneumatic pressure regulator 5.
The apparatus 1 according to the invention and the method according to the invention advantageously permit precise regulation of the process medium flow 2 from a process medium source 27 to a process medium consumer 28 using simple means. On account of the magnetic valves 8, 10, 19 used such as, for example, the magnetic 5/3-way directional valve 19 for increasing or decreasing a control gas pressure in a control gas path 4, corresponding regulation can even be used in areas at risk of an explosion, such as, for example, in ultra- clean rooms, in implanters 18 or the like.
List of reference symbols
1 Apparatus for regulating a process medium flow
2 Process medium flow
3 Process medium path
4 Control gas path
5 Pneumatic pressure regulator
6 Control input
7 Means for regulating the control gas pressure
8 Delivery valve
9 Control gas pressure source
10 Discharge valve
11 Discharge flow
12 Actuating magnet
13 Control line
14 Control means
15 Pressure sensor
16 Buffer volume
17 Means for reducing the cross section capable of carrying a flow
18 Implanter
19 5/3 -way directional valve
20 Sound damper
21 Throttle valve
22 PI controller
23 Desired value transmitter
25 Preset input
26 Pulse width modulator
27 Process medium source
28 Process medium consumer

Claims

Patent Claims
1. Apparatus (1) for regulating a process medium flow (2) to be fed to a process medium consumer (28), comprising a) a process medium path (3), by means of which a process medium source (27) can be connected to the process medium consumer (28), and b) a control gas path (4), by means of which a control gas pressure can be built up with a control gas, wherein the process medium path (3) comprises a pneumatic pressure regulator (5), the control input (6) of which is connected to the control gas path (4), wherein means (7) for regulating the control gas pressure are embodied, characterized in that the means (7) for regulating the control gas pressure comprise a delivery valve (8) for connecting the control gas path (4) to a control gas pressure source (9) and a discharge valve (10) for decreasing pressure in the control gas path (4).
2. Apparatus (1) according to Claim 1, in which the means (7) for regulating the control gas pressure comprise at least one directional valve.
3. Apparatus (1) according to either of Claims 1 and 2, in which the means (7) for regulating the control gas pressure comprise at least one 2/2 -way directional valve.
4. Apparatus (1) according to any of Claims 2 to 3, in which the means (7) for regulating the control gas pressure comprise at least one 5/3 -way directional valve (19).
5. Apparatus (1) according to any of the preceding claims, in which the means (7) for regulating the control gas pressure comprise at least one pressure sensor (15) for pressure measurement which can be connected to the process medium path (3) between pneumatic pressure regulator (5) and process medium consumer (28).
6. Apparatus (1) according to any of the preceding claims, in which the control gas path (4) between delivery valve (8) and pneumatic pressure regulator (6) has a volume of at least 10 cm .
7. Apparatus (1) according to any of the preceding claims, in which the control gas path (4) has a buffer volume (16) of at least 10 cm3.
8. Apparatus (1) according to any of the preceding claims, in which a control means (14) is embodied, by which the means (7) for regulating the control gas pressure can be driven, which is connected at least to the delivery valve (8) and the discharge valve (10) via control lines (13).
9. Apparatus (1) according to any of the preceding claims, in which a means (17) for reducing the cross section capable of carrying a flow is embodied in the control gas path
(4) at least between one of the following valves: a) the delivery valve (8) and b) the discharge valve (10) and the control input (6).
10. Apparatus (1) according to Claim 9, in which the means (17) for reducing the cross section capable of carrying a flow comprises at least one of the following components: a) a screen; b) a metering valve; c) a needle valve; d) a regulating valve; e) a throttle valve (21); f) a reduction.
11. Method for regulating a process medium flow (2) led from a process medium source (27) to a process medium consumer (28), wherein the process medium flow (2) is led to the process medium consumer (28) through a pneumatic pressure regulator (6), wherein a control gas pressure is present at a control input (6) of the pneumatic pressure regulator (5), which control gas pressure is regulated in a manner dependent on the pressure of the process medium between pneumatic pressure regulator (6) and process medium consumer (28), characterized in that the control gas pressure, depending on the deviation of the pressure of the process medium between pneumatic pressure regulator (6) and process medium consumer (28) from a predeterminable desired value, is increased by means of the opening of a delivery valve (8) embodied in the control gas path (4) with a control gas pressure source (9) or is decreased via a discharge valve (10) embodied in the control gas path (4).
12. Method according to Claim 11, in which at least one of the following gases is used as control gas: a) an inert gas; b) nitrogen (N2); and c) compressed air.
13. Use of an apparatus according to any of Claims 1 to 10 and/or of a method comprising the features of Claim 11 or 12 for feeding process gas for semiconductor doping, in particular for feeding process gas to implanters (18).
PCT/EP2009/057285 2008-06-20 2009-06-12 Apparatus and method for feeding a process medium WO2009153219A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008029008.4 2008-06-20
DE102008029008A DE102008029008A1 (en) 2008-06-20 2008-06-20 Apparatus and method for supplying a process medium

Publications (2)

Publication Number Publication Date
WO2009153219A2 true WO2009153219A2 (en) 2009-12-23
WO2009153219A3 WO2009153219A3 (en) 2012-02-02

Family

ID=41317807

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2009/057285 WO2009153219A2 (en) 2008-06-20 2009-06-12 Apparatus and method for feeding a process medium

Country Status (2)

Country Link
DE (1) DE102008029008A1 (en)
WO (1) WO2009153219A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2818961B1 (en) * 2013-06-28 2016-11-09 Automa S.r.l. Control system for gas pressure controllers in explosion risk areas

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5654885A (en) * 1995-03-28 1997-08-05 Virginia Valve Company Corporation Valve position controller
DE19746717C1 (en) * 1997-10-15 1999-06-10 Mannesmann Ag Electronic controller for a pressure regulation valve
DE29809412U1 (en) * 1998-05-15 1998-10-08 Mannesmann AG, 40213 Düsseldorf Electronic device for controlling a pressure control valve
DE10142355A1 (en) * 2001-08-30 2003-03-20 Duerr Systems Gmbh Coating plant with a control loop
US20050150552A1 (en) * 2004-01-06 2005-07-14 Randy Forshey Device, method, and system for controlling fluid flow

Also Published As

Publication number Publication date
DE102008029008A1 (en) 2009-12-24
WO2009153219A3 (en) 2012-02-02

Similar Documents

Publication Publication Date Title
CN100487620C (en) Device for controlling chamber inner pressure and inner pressure controlled-type chamber
CN101636641B (en) Controller gain scheduling for mass flow controllers
CN100407083C (en) Flow Measurement Modules and Methods
CN100538573C (en) Divide stream supply device and gas shunting supply method from gas feeding apparatus to the gas of container shunting ground supply gas with volume control device
JP6193679B2 (en) Gas diversion supply apparatus and gas diversion supply method
US20210318698A1 (en) Mass flow controller with absolute and differential pressure transducer
CN103597259B (en) Equilibrated valve
JP5091821B2 (en) Mass flow controller
KR20190059298A (en) Apparatus and method for a self-compensating pressure-based mass flow controller
US20080223455A1 (en) Gas supply unit
MXPA04004957A (en) High purity fluid delivery system.
KR20160042129A (en) Pressure-type flow rate control device
US12174647B2 (en) Flow rate control device
CN110621415B (en) Powder feed control system and method
JP2007133829A (en) Fluid control apparatus, pressure regulating valve and control method
US11550341B2 (en) Mass flow control system, and semiconductor manufacturing equipment and vaporizer including the system
WO2009153219A2 (en) Apparatus and method for feeding a process medium
JP4763031B2 (en) Mass flow controller
JP2018065073A (en) Diluted hydrogen gas generation device
WO2001004718A1 (en) Electronic controlled pressure regulator system
JP2007248320A (en) Gas flowmeter and apparatus for controlling quantity of gas flow
RU2216762C1 (en) Gear to adjust parameters of gas flow
JP3311762B2 (en) Mass flow controller and semiconductor device manufacturing equipment
KR101889379B1 (en) Liquid flow rate control system
KR20180050610A (en) Liquid flow rate control system

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09765799

Country of ref document: EP

Kind code of ref document: A2

122 Ep: pct application non-entry in european phase

Ref document number: 09765799

Country of ref document: EP

Kind code of ref document: A2