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WO2009008446A1 - Resist underlayer film forming composition, and method for resist pattern formation using the composition - Google Patents

Resist underlayer film forming composition, and method for resist pattern formation using the composition Download PDF

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Publication number
WO2009008446A1
WO2009008446A1 PCT/JP2008/062399 JP2008062399W WO2009008446A1 WO 2009008446 A1 WO2009008446 A1 WO 2009008446A1 JP 2008062399 W JP2008062399 W JP 2008062399W WO 2009008446 A1 WO2009008446 A1 WO 2009008446A1
Authority
WO
WIPO (PCT)
Prior art keywords
composition
underlayer film
film forming
resist underlayer
polymer
Prior art date
Application number
PCT/JP2008/062399
Other languages
French (fr)
Japanese (ja)
Inventor
Rikimaru Sakamoto
Original Assignee
Nissan Chemical Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Industries, Ltd. filed Critical Nissan Chemical Industries, Ltd.
Priority to JP2009522657A priority Critical patent/JP5158381B2/en
Publication of WO2009008446A1 publication Critical patent/WO2009008446A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/20—Polyesters having been prepared in the presence of compounds having one reactive group or more than two reactive groups
    • C08G63/21—Polyesters having been prepared in the presence of compounds having one reactive group or more than two reactive groups in the presence of unsaturated monocarboxylic acids or unsaturated monohydric alcohols or reactive derivatives thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

[PROBLEMS] To provide a composition for forming a resist underlayer film which is large in selection ratio of dry etching speed and, at the same time, can realize desired k value and refractive index (n) at a short wavelength as in an ArF excimer laser (wavelength: 193 nm). [MEANS FOR SOLVING PROBLEMS] A resist underlayer film forming composition for lithography, comprising a polymer and a solvent, the polymer having a main chain containing a cinnamic acid derivative. The cinnamic acid derivative is introduced into the main chain of the polymer through an ester bond, or an ester bond and an ether bond.
PCT/JP2008/062399 2007-07-11 2008-07-09 Resist underlayer film forming composition, and method for resist pattern formation using the composition WO2009008446A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009522657A JP5158381B2 (en) 2007-07-11 2008-07-09 Resist underlayer film forming composition and resist pattern forming method using the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-182140 2007-07-11
JP2007182140 2007-07-11
JP2007-220317 2007-08-27
JP2007220317 2007-08-27

Publications (1)

Publication Number Publication Date
WO2009008446A1 true WO2009008446A1 (en) 2009-01-15

Family

ID=40228617

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062399 WO2009008446A1 (en) 2007-07-11 2008-07-09 Resist underlayer film forming composition, and method for resist pattern formation using the composition

Country Status (3)

Country Link
JP (1) JP5158381B2 (en)
TW (1) TWI432905B (en)
WO (1) WO2009008446A1 (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010181453A (en) * 2009-02-03 2010-08-19 Nissan Chem Ind Ltd Composition for forming resist underfilm and method for forming resist pattern using the composition
US20110230058A1 (en) * 2008-11-27 2011-09-22 Nissan Chemical Industries, Ltd. Composition for forming resist underlayer film with reduced outgassing
WO2015019961A1 (en) * 2013-08-08 2015-02-12 日産化学工業株式会社 Resist underlayer film forming composition containing polymer which contains nitrogen-containing ring compound
KR20170070017A (en) 2014-10-21 2017-06-21 닛산 가가쿠 고교 가부시키 가이샤 Resist underlay film-forming composition
KR20170134380A (en) 2015-04-03 2017-12-06 닛산 가가쿠 고교 가부시키 가이샤 A step substrate coating composition having a photo-crosslinking group
KR20180120692A (en) 2016-03-10 2018-11-06 닛산 가가쿠 가부시키가이샤 A step substrate coating composition comprising a compound having a photo-crosslinking group by unsaturated bond between carbon atoms
WO2019069502A1 (en) 2017-10-06 2019-04-11 三井化学株式会社 Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and layered product
KR20190039472A (en) 2016-08-08 2019-04-12 닛산 가가쿠 가부시키가이샤 Photocurable composition and method for manufacturing semiconductor device
KR20190131543A (en) 2017-04-03 2019-11-26 닛산 가가쿠 가부시키가이샤 Stepped substrate coating composition comprising polyether resin having optical crosslinker
KR20190137845A (en) 2017-04-14 2019-12-11 닛산 가가쿠 가부시키가이샤 Stepped substrate coating film-forming composition comprising a plasma curable compound by unsaturated bonds between carbon atoms
KR20200003087A (en) 2017-05-31 2020-01-08 미쓰이 가가쿠 가부시키가이샤 Material for forming an underlayer film, a method for manufacturing a resist underlayer film, a resist underlayer film, and a laminate
KR20200038921A (en) 2017-08-09 2020-04-14 닛산 가가쿠 가부시키가이샤 Photocurable stepped substrate coating composition containing a crosslinkable compound
KR20200052884A (en) 2017-09-13 2020-05-15 닛산 가가쿠 가부시키가이샤 Stepped substrate coating composition comprising a compound having a curable functional group
WO2020162183A1 (en) 2019-02-07 2020-08-13 三井化学株式会社 Material for underlayer film formation use, resist underlayer film, and laminate
KR20200098595A (en) 2017-12-20 2020-08-20 닛산 가가쿠 가부시키가이샤 Photocurable silicone-containing coating film forming composition
KR20210138665A (en) 2019-03-12 2021-11-19 닛산 가가쿠 가부시키가이샤 Resist underlayer film forming composition
KR20220038346A (en) 2019-07-18 2022-03-28 닛산 가가쿠 가부시키가이샤 Step substrate coating composition comprising a compound having a curable functional group
WO2022196662A1 (en) * 2021-03-16 2022-09-22 日産化学株式会社 Resist underlayer film formation composition
WO2024048487A1 (en) * 2022-08-29 2024-03-07 日産化学株式会社 Composition for forming gap-filling material
WO2024106454A1 (en) 2022-11-16 2024-05-23 日産化学株式会社 Resist underlayer film-forming composition containing curcumin derivative
WO2024128190A1 (en) 2022-12-15 2024-06-20 日産化学株式会社 Composition for forming resist underlayer film
KR20240110876A (en) 2021-11-30 2024-07-16 닛산 가가쿠 가부시키가이샤 Composition for forming a resist underlayer film containing a hydroxycinnamic acid derivative

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250042775A (en) * 2022-07-29 2025-03-27 닛산 가가쿠 가부시키가이샤 Composition for forming a resist underlayer film

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215606A (en) * 1986-03-18 1987-09-22 Agency Of Ind Science & Technol Manufacturing method of photosensitive resin
WO2003017002A1 (en) * 2001-08-20 2003-02-27 Nissan Chemical Industries, Ltd. Composition for forming antireflective film for use in lithography
JP2004533637A (en) * 2001-04-17 2004-11-04 ブルーワー サイエンス アイ エヌ シー． Anti-reflective coating composition with improved spin bowl compatibility

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215606A (en) * 1986-03-18 1987-09-22 Agency Of Ind Science & Technol Manufacturing method of photosensitive resin
JP2004533637A (en) * 2001-04-17 2004-11-04 ブルーワー サイエンス アイ エヌ シー． Anti-reflective coating composition with improved spin bowl compatibility
WO2003017002A1 (en) * 2001-08-20 2003-02-27 Nissan Chemical Industries, Ltd. Composition for forming antireflective film for use in lithography

Cited By (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110230058A1 (en) * 2008-11-27 2011-09-22 Nissan Chemical Industries, Ltd. Composition for forming resist underlayer film with reduced outgassing
JP2010181453A (en) * 2009-02-03 2010-08-19 Nissan Chem Ind Ltd Composition for forming resist underfilm and method for forming resist pattern using the composition
US10113083B2 (en) 2013-08-08 2018-10-30 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound
CN105431780A (en) * 2013-08-08 2016-03-23 日产化学工业株式会社 Resist underlayer film forming composition containing polymer which contains nitrogen-containing ring compound
KR20160040521A (en) * 2013-08-08 2016-04-14 닛산 가가쿠 고교 가부시키 가이샤 Resist underlayer film forming composition containing polymer which contains nitrogen-containing ring compound
JPWO2015019961A1 (en) * 2013-08-08 2017-03-02 日産化学工業株式会社 Resist underlayer film forming composition comprising a polymer containing a nitrogen-containing ring compound
KR102307200B1 (en) * 2013-08-08 2021-10-01 닛산 가가쿠 가부시키가이샤 Resist underlayer film forming composition containing polymer which contains nitrogen-containing ring compound
WO2015019961A1 (en) * 2013-08-08 2015-02-12 日産化学工業株式会社 Resist underlayer film forming composition containing polymer which contains nitrogen-containing ring compound
KR20170070017A (en) 2014-10-21 2017-06-21 닛산 가가쿠 고교 가부시키 가이샤 Resist underlay film-forming composition
US10242871B2 (en) 2014-10-21 2019-03-26 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group
KR20170134380A (en) 2015-04-03 2017-12-06 닛산 가가쿠 고교 가부시키 가이샤 A step substrate coating composition having a photo-crosslinking group
JPWO2016159358A1 (en) * 2015-04-03 2018-03-08 日産化学工業株式会社 Stepped substrate coating composition having a photocrosslinking group
US11155684B2 (en) 2015-04-03 2021-10-26 Nissan Chemical Industries, Ltd. Photocrosslinkable group-containing composition for coating stepped substrate
KR20180120692A (en) 2016-03-10 2018-11-06 닛산 가가쿠 가부시키가이샤 A step substrate coating composition comprising a compound having a photo-crosslinking group by unsaturated bond between carbon atoms
US11681223B2 (en) 2016-08-08 2023-06-20 Nissan Chemical Corporation Photocurable composition and method for producing semiconductor device
US12147158B2 (en) 2016-08-08 2024-11-19 Nissan Chemical Corporation Photocurable composition and method for producing semiconductor device
KR20190039472A (en) 2016-08-08 2019-04-12 닛산 가가쿠 가부시키가이샤 Photocurable composition and method for manufacturing semiconductor device
KR20190131543A (en) 2017-04-03 2019-11-26 닛산 가가쿠 가부시키가이샤 Stepped substrate coating composition comprising polyether resin having optical crosslinker
US10871712B2 (en) 2017-04-03 2020-12-22 Nissan Chemical Corporation Stepped substrate-coating composition containing polyether resin having photocrosslinkable group
KR102690024B1 (en) 2017-04-14 2024-08-05 닛산 가가쿠 가부시키가이샤 Multileveled substrate coating film forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms
KR20240119168A (en) 2017-04-14 2024-08-06 닛산 가가쿠 가부시키가이샤 Resist underlayer film forming composition
US11385546B2 (en) 2017-04-14 2022-07-12 Nissan Chemical Corporation Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms
KR20230148380A (en) 2017-04-14 2023-10-24 닛산 가가쿠 가부시키가이샤 Multileveled substrate coating film forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms
KR20190137845A (en) 2017-04-14 2019-12-11 닛산 가가쿠 가부시키가이샤 Stepped substrate coating film-forming composition comprising a plasma curable compound by unsaturated bonds between carbon atoms
KR20200003087A (en) 2017-05-31 2020-01-08 미쓰이 가가쿠 가부시키가이샤 Material for forming an underlayer film, a method for manufacturing a resist underlayer film, a resist underlayer film, and a laminate
US11886119B2 (en) 2017-05-31 2024-01-30 Mitsui Chemicals, Inc. Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate
KR20200038921A (en) 2017-08-09 2020-04-14 닛산 가가쿠 가부시키가이샤 Photocurable stepped substrate coating composition containing a crosslinkable compound
US11454889B2 (en) 2017-08-09 2022-09-27 Nissan Chemical Corporation Crosslinkable compound-containing photocurable stepped substrate-coating composition
KR20200052884A (en) 2017-09-13 2020-05-15 닛산 가가쿠 가부시키가이샤 Stepped substrate coating composition comprising a compound having a curable functional group
US11674051B2 (en) 2017-09-13 2023-06-13 Nissan Chemical Corporation Stepped substrate coating composition containing compound having curable functional group
KR20200051752A (en) 2017-10-06 2020-05-13 미쓰이 가가쿠 가부시키가이샤 Resin material for forming underlayer film, resist underlayer film, method for manufacturing resist underlayer film, and laminate
US11599025B2 (en) 2017-10-06 2023-03-07 Mitsui Chemicals, Inc. Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate
WO2019069502A1 (en) 2017-10-06 2019-04-11 三井化学株式会社 Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and layered product
KR20200098595A (en) 2017-12-20 2020-08-20 닛산 가가쿠 가부시키가이샤 Photocurable silicone-containing coating film forming composition
KR20210112361A (en) 2019-02-07 2021-09-14 미쓰이 가가쿠 가부시키가이샤 Materials for forming underlayer films, resist underlayer films and laminates
WO2020162183A1 (en) 2019-02-07 2020-08-13 三井化学株式会社 Material for underlayer film formation use, resist underlayer film, and laminate
US12044969B2 (en) 2019-03-12 2024-07-23 Nissan Chemical Corporation Resist underlayer film-forming composition
KR20210138665A (en) 2019-03-12 2021-11-19 닛산 가가쿠 가부시키가이샤 Resist underlayer film forming composition
KR20220038346A (en) 2019-07-18 2022-03-28 닛산 가가쿠 가부시키가이샤 Step substrate coating composition comprising a compound having a curable functional group
KR20230158054A (en) * 2021-03-16 2023-11-17 닛산 가가쿠 가부시키가이샤 Resist underlayer film forming composition
WO2022196662A1 (en) * 2021-03-16 2022-09-22 日産化学株式会社 Resist underlayer film formation composition
KR102781156B1 (en) 2021-03-16 2025-03-14 닛산 가가쿠 가부시키가이샤 Composition for forming a resist underlayer film
KR20240110876A (en) 2021-11-30 2024-07-16 닛산 가가쿠 가부시키가이샤 Composition for forming a resist underlayer film containing a hydroxycinnamic acid derivative
WO2024048487A1 (en) * 2022-08-29 2024-03-07 日産化学株式会社 Composition for forming gap-filling material
WO2024106454A1 (en) 2022-11-16 2024-05-23 日産化学株式会社 Resist underlayer film-forming composition containing curcumin derivative
KR20250107863A (en) 2022-11-16 2025-07-14 닛산 가가쿠 가부시키가이샤 Composition for forming a resist underlayer film having a curcumin derivative
WO2024128190A1 (en) 2022-12-15 2024-06-20 日産化学株式会社 Composition for forming resist underlayer film

Also Published As

Publication number Publication date
TWI432905B (en) 2014-04-01
JPWO2009008446A1 (en) 2010-09-09
TW200928591A (en) 2009-07-01
JP5158381B2 (en) 2013-03-06

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