WO2008111404A1 - 超音波洗浄装置 - Google Patents
超音波洗浄装置 Download PDFInfo
- Publication number
- WO2008111404A1 WO2008111404A1 PCT/JP2008/053552 JP2008053552W WO2008111404A1 WO 2008111404 A1 WO2008111404 A1 WO 2008111404A1 JP 2008053552 W JP2008053552 W JP 2008053552W WO 2008111404 A1 WO2008111404 A1 WO 2008111404A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cleaning
- ultrasonic vibration
- article
- ultrasonic
- cleaned
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
本発明は、洗浄槽内全域における音圧の均一化を確保しつつ、単位時間当たりに被洗浄物に加わる音圧の低下を抑え、洗浄効率の良い超音波洗浄装置を提供することを目的とする。
超音波振動により被洗物を洗浄する超音波洗浄装置であって、周波数変調された信号を生成し超音波振動を発生する超音波振動発生手段と、前記被洗浄物が浸漬される洗浄液を内部に貯留し、前記超音波振動発生手段により発生した超音波振動により前記被洗浄物を洗浄するための洗浄槽と、を備え、前記信号は、単一の周波数を中心周波数として変調幅が異なる少なくとも2つの周波数変調部を有する。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/531,178 US20100108111A1 (en) | 2007-03-14 | 2008-02-28 | Ultrasonic cleaning apparatus |
US13/661,694 US8652262B2 (en) | 2007-03-14 | 2012-10-26 | Ultrasonic cleaning method for generating ultrasonic vibrations by a frequency modulated signal |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-065620 | 2007-03-14 | ||
JP2007065620A JP4493675B2 (ja) | 2007-03-14 | 2007-03-14 | 超音波洗浄装置 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/531,178 A-371-Of-International US20100108111A1 (en) | 2007-03-14 | 2008-02-28 | Ultrasonic cleaning apparatus |
US13/661,694 Division US8652262B2 (en) | 2007-03-14 | 2012-10-26 | Ultrasonic cleaning method for generating ultrasonic vibrations by a frequency modulated signal |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008111404A1 true WO2008111404A1 (ja) | 2008-09-18 |
Family
ID=39759347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/053552 WO2008111404A1 (ja) | 2007-03-14 | 2008-02-28 | 超音波洗浄装置 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20100108111A1 (ja) |
JP (1) | JP4493675B2 (ja) |
TW (1) | TW200841946A (ja) |
WO (1) | WO2008111404A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5780890B2 (ja) * | 2011-08-31 | 2015-09-16 | 株式会社国際電気セミコンダクターサービス | 超音波洗浄方法及びその装置 |
JP5892109B2 (ja) * | 2013-05-14 | 2016-03-23 | 信越半導体株式会社 | 超音波洗浄装置及び洗浄方法 |
CN114097024B (zh) * | 2020-06-05 | 2022-09-09 | 株式会社海上 | 超声波清洗装置 |
JP7308182B2 (ja) * | 2020-12-21 | 2023-07-13 | 株式会社Screenホールディングス | ノズル洗浄装置および塗布装置 |
US12042827B1 (en) * | 2023-05-09 | 2024-07-23 | Yield Engineering Systems, Inc. | Integrated ultrasonics and megasonics cleaning |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0263580A (ja) * | 1987-01-09 | 1990-03-02 | William L Puskas | 超音波周波数ジェネレータ |
JPH07289991A (ja) * | 1994-04-28 | 1995-11-07 | Mitsui Petrochem Ind Ltd | 駆動装置 |
JPH0947733A (ja) * | 1995-08-03 | 1997-02-18 | Kokusai Denki L Tec:Kk | 超音波洗浄装置 |
JPH10135176A (ja) * | 1996-09-04 | 1998-05-22 | Tokyo Electron Ltd | 超音波洗浄装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6336534A (ja) | 1986-07-30 | 1988-02-17 | Puretetsuku:Kk | 洗浄装置 |
JP2696017B2 (ja) * | 1991-10-09 | 1998-01-14 | 三菱電機株式会社 | 洗浄装置及び洗浄方法 |
KR0144949B1 (ko) * | 1994-07-26 | 1998-08-17 | 김광호 | 웨이퍼 카세트 및 이를 사용한 세정장치 |
JPH08131978A (ja) | 1994-09-22 | 1996-05-28 | Kaijo Corp | 超音波洗浄装置 |
JPH10128255A (ja) * | 1996-11-01 | 1998-05-19 | Kaijo Corp | 超音波洗浄装置 |
US6276370B1 (en) * | 1999-06-30 | 2001-08-21 | International Business Machines Corporation | Sonic cleaning with an interference signal |
JP4990439B2 (ja) * | 2001-02-26 | 2012-08-01 | 芝浦メカトロニクス株式会社 | 超音波発振装置及び超音波発振方法、洗浄装置及び洗浄方法 |
US20090173358A1 (en) * | 2008-01-09 | 2009-07-09 | Micron Technology, Inc. | Megasonic cleaning with controlled boundary layer thickness and associated systems and methods |
-
2007
- 2007-03-14 JP JP2007065620A patent/JP4493675B2/ja active Active
-
2008
- 2008-02-28 US US12/531,178 patent/US20100108111A1/en not_active Abandoned
- 2008-02-28 WO PCT/JP2008/053552 patent/WO2008111404A1/ja active Application Filing
- 2008-03-10 TW TW097108253A patent/TW200841946A/zh unknown
-
2012
- 2012-10-26 US US13/661,694 patent/US8652262B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0263580A (ja) * | 1987-01-09 | 1990-03-02 | William L Puskas | 超音波周波数ジェネレータ |
JPH07289991A (ja) * | 1994-04-28 | 1995-11-07 | Mitsui Petrochem Ind Ltd | 駆動装置 |
JPH0947733A (ja) * | 1995-08-03 | 1997-02-18 | Kokusai Denki L Tec:Kk | 超音波洗浄装置 |
JPH10135176A (ja) * | 1996-09-04 | 1998-05-22 | Tokyo Electron Ltd | 超音波洗浄装置 |
Also Published As
Publication number | Publication date |
---|---|
US20100108111A1 (en) | 2010-05-06 |
US20130048013A1 (en) | 2013-02-28 |
US8652262B2 (en) | 2014-02-18 |
JP4493675B2 (ja) | 2010-06-30 |
TWI361729B (ja) | 2012-04-11 |
TW200841946A (en) | 2008-11-01 |
JP2008227300A (ja) | 2008-09-25 |
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