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WO2008096699A1 - 配向カーボンナノチューブの製造装置および製造方法 - Google Patents

配向カーボンナノチューブの製造装置および製造方法 Download PDF

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Publication number
WO2008096699A1
WO2008096699A1 PCT/JP2008/051749 JP2008051749W WO2008096699A1 WO 2008096699 A1 WO2008096699 A1 WO 2008096699A1 JP 2008051749 W JP2008051749 W JP 2008051749W WO 2008096699 A1 WO2008096699 A1 WO 2008096699A1
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WO
WIPO (PCT)
Prior art keywords
cnt
production
catalyst coating
substrate
oriented
Prior art date
Application number
PCT/JP2008/051749
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English (en)
French (fr)
Inventor
Kenji Hata
Satoshi Yasuda
Motoo Yumura
Original Assignee
National Institute Of Advanced Industrial Science And Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute Of Advanced Industrial Science And Technology filed Critical National Institute Of Advanced Industrial Science And Technology
Priority to US12/525,719 priority Critical patent/US8455050B2/en
Priority to JP2008557096A priority patent/JP5339281B2/ja
Publication of WO2008096699A1 publication Critical patent/WO2008096699A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/16—Preparation
    • C01B32/162—Preparation characterised by catalysts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00—Structure or properties of carbon nanotubes
    • C01B2202/08—Aligned nanotubes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

　金属触媒被膜が形成された基板２を受容する反応チャンバ３と、原料ガス９及び触媒賦活物質１０の反応チャンバ３内への供給手段（ガス供給管５、６）とを有し、基板２の触媒被膜形成面２ａに直交する方向に配向するＣＮＴを製造するための装置（ＣＶＤ装置１）の構成を、原料ガス９及び触媒賦活物質１０の供給手段が、基板２の触媒被膜形成面２ａを臨む位置に設けられた複数の噴出孔を備えており、噴出孔の噴出方向が、金属触媒被膜から成長したＣＮＴの配向方向に適合しているものとする。これにより、配向ＣＮＴをより一層安価に量産することができるＣＮＴの製造技術が提供できる。
PCT/JP2008/051749 2007-02-05 2008-02-04 配向カーボンナノチューブの製造装置および製造方法 WO2008096699A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/525,719 US8455050B2 (en) 2007-02-05 2008-02-04 Manufacturing apparatus and manufacturing method for alined carbon nanotubes
JP2008557096A JP5339281B2 (ja) 2007-02-05 2008-02-04 配向カーボンナノチューブの製造装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-025161 2007-02-05
JP2007025161 2007-02-05

Publications (1)

Publication Number Publication Date
WO2008096699A1 true WO2008096699A1 (ja) 2008-08-14

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Country Link
US (1) US8455050B2 (ja)
JP (2) JP5339281B2 (ja)
WO (1) WO2008096699A1 (ja)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010076885A1 (ja) * 2008-12-30 2010-07-08 独立行政法人産業技術総合研究所 単層カーボンナノチューブ配向集合体、バルク状単層カーボンナノチューブ配向集合体、粉体状単層カーボンナノチューブ配向集合体、およびその製造方法
WO2010092787A1 (ja) * 2009-02-10 2010-08-19 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置
WO2010147193A1 (ja) * 2009-06-17 2010-12-23 独立行政法人産業技術総合研究所 高比表面積のカーボンナノチューブ集合体の製造方法
WO2010147191A1 (ja) * 2009-06-17 2010-12-23 独立行政法人産業技術総合研究所 カーボンナノチューブの製造装置および製造方法
WO2010147192A1 (ja) * 2009-06-17 2010-12-23 独立行政法人産業技術総合研究所 高比表面積のカーボンナノチューブ集合体の製造方法
JP2011148658A (ja) * 2010-01-22 2011-08-04 Hitachi Zosen Corp 熱ｃｖｄ装置
WO2012081600A1 (ja) * 2010-12-15 2012-06-21 独立行政法人産業技術総合研究所 カーボンナノチューブの製造装置および製造方法
JP2012126599A (ja) * 2010-12-15 2012-07-05 Nippon Zeon Co Ltd カーボンナノチューブ配向集合体の製造方法
WO2014097624A1 (ja) * 2012-12-20 2014-06-26 日本ゼオン株式会社 カーボンナノチューブの製造方法
EP2450310A4 (en) * 2009-07-01 2015-02-18 Zeon Corp DEVICE FOR PRODUCING AN ALIGNED CARBON NANOTRY ASSEMBLY
JPWO2013027797A1 (ja) * 2011-08-24 2015-03-19 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置及び製造方法
JP2016069212A (ja) * 2014-09-29 2016-05-09 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置
JP2016113308A (ja) * 2014-12-11 2016-06-23 大陽日酸株式会社 カーボンナノ材料製造装置、及びカーボンナノ材料製造方法

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KR101806916B1 (ko) * 2011-03-17 2017-12-12 한화테크윈 주식회사 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법
WO2017056242A1 (ja) * 2015-09-30 2017-04-06 株式会社日立国際電気 半導体装置の製造方法、基板処理装置および記録媒体
KR102566150B1 (ko) * 2020-10-07 2023-08-14 이화여자대학교 산학협력단 광 프로브

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JP2001234341A (ja) * 2000-01-26 2001-08-31 Cheol Jin Lee 熱化学気相蒸着装置及びこれを用いた炭素ナノチューブの合成方法
JP2004523460A (ja) * 2001-04-04 2004-08-05 コモンウエルス サイエンティフィック アンド インダストリアル リサーチ オーガナイゼーション 炭素ナノチューブを製造するための方法及び装置
WO2006011655A1 (ja) * 2004-07-27 2006-02-02 National Institute Of Advanced Industrial Scienceand Technology 単層カーボンナノチューブおよび配向単層カーボンナノチューブ・バルク構造体ならびにそれらの製造方法・装置および用途

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JP3935479B2 (ja) * 2004-06-23 2007-06-20 キヤノン株式会社 カーボンファイバーの製造方法及びそれを使用した電子放出素子の製造方法、電子デバイスの製造方法、画像表示装置の製造方法および、該画像表示装置を用いた情報表示再生装置
JP4706852B2 (ja) 2006-03-27 2011-06-22 株式会社豊田中央研究所 カーボンナノチューブの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001234341A (ja) * 2000-01-26 2001-08-31 Cheol Jin Lee 熱化学気相蒸着装置及びこれを用いた炭素ナノチューブの合成方法
JP2004523460A (ja) * 2001-04-04 2004-08-05 コモンウエルス サイエンティフィック アンド インダストリアル リサーチ オーガナイゼーション 炭素ナノチューブを製造するための方法及び装置
WO2006011655A1 (ja) * 2004-07-27 2006-02-02 National Institute Of Advanced Industrial Scienceand Technology 単層カーボンナノチューブおよび配向単層カーボンナノチューブ・バルク構造体ならびにそれらの製造方法・装置および用途

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010076885A1 (ja) * 2008-12-30 2010-07-08 独立行政法人産業技術総合研究所 単層カーボンナノチューブ配向集合体、バルク状単層カーボンナノチューブ配向集合体、粉体状単層カーボンナノチューブ配向集合体、およびその製造方法
CN106430152A (zh) * 2008-12-30 2017-02-22 独立行政法人产业技术综合研究所 取向单层碳纳米管集合体及其制造方法
EP2383225A4 (en) * 2008-12-30 2015-12-09 Nat Inst Of Advanced Ind Scien ARRANGEMENT OF EQUALIZED, UNIFORM CARBON NANOTUBES, BULK ARRANGEMENT OF EQUIPPED, UNILATED CARBON NANOTUBES, POWDERY ARRANGEMENT OF ORIENTED, CARBONIZED CARBON NANOTUBES AND MANUFACTURING METHOD THEREFOR
CN104192818A (zh) * 2008-12-30 2014-12-10 独立行政法人产业技术综合研究所 取向单层碳纳米管集合体、块状取向单层碳纳米管集合体、粉体状取向单层碳纳米管集合体、及其制造方法
JP4803687B2 (ja) * 2008-12-30 2011-10-26 独立行政法人産業技術総合研究所 単層カーボンナノチューブ配向集合体の製造方法
CN102272045A (zh) * 2008-12-30 2011-12-07 独立行政法人产业技术综合研究所 取向单层碳纳米管集合体、块状取向单层碳纳米管集合体、粉体状取向单层碳纳米管集合体、及其制造方法
WO2010092787A1 (ja) * 2009-02-10 2010-08-19 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置
US9598285B2 (en) 2009-02-10 2017-03-21 Zeon Corporation Apparatus for producing aligned carbon nanotube aggregates
JP5574265B2 (ja) * 2009-02-10 2014-08-20 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置
JP5549983B2 (ja) * 2009-06-17 2014-07-16 独立行政法人産業技術総合研究所 高比表面積のカーボンナノチューブ集合体の製造方法
WO2010147192A1 (ja) * 2009-06-17 2010-12-23 独立行政法人産業技術総合研究所 高比表面積のカーボンナノチューブ集合体の製造方法
WO2010147193A1 (ja) * 2009-06-17 2010-12-23 独立行政法人産業技術総合研究所 高比表面積のカーボンナノチューブ集合体の製造方法
US20120231163A1 (en) * 2009-06-17 2012-09-13 Kenji Hata Apparatus and method for producing carbon
WO2010147191A1 (ja) * 2009-06-17 2010-12-23 独立行政法人産業技術総合研究所 カーボンナノチューブの製造装置および製造方法
EP2444370A4 (en) * 2009-06-17 2015-04-29 Nat Inst Of Advanced Ind Scien METHOD FOR PRODUCING A CARBON NANOTUBE ASSEMBLY WITH A LARGE SPECIFIC SURFACE AREA
JP5549984B2 (ja) * 2009-06-17 2014-07-16 独立行政法人産業技術総合研究所 高比表面積のカーボンナノチューブ集合体の製造方法
US20120148476A1 (en) * 2009-06-17 2012-06-14 Kenji Hata Method for producing carbon nanotube assembly having high specific surface area
EP2444370A1 (en) * 2009-06-17 2012-04-25 National Institute of Advanced Industrial Science And Technology Method for producing carbon nanotube assembly having high specific surface area
JP5608952B2 (ja) * 2009-06-17 2014-10-22 独立行政法人産業技術総合研究所 カーボンナノチューブの製造装置および製造方法
US8883260B2 (en) 2009-06-17 2014-11-11 National Institute Of Advanced Industrial Science And Technology Apparatus and method for producing carbon
EP2450310A4 (en) * 2009-07-01 2015-02-18 Zeon Corp DEVICE FOR PRODUCING AN ALIGNED CARBON NANOTRY ASSEMBLY
JP2011148658A (ja) * 2010-01-22 2011-08-04 Hitachi Zosen Corp 熱ｃｖｄ装置
JP5791157B2 (ja) * 2010-12-15 2015-10-07 国立研究開発法人産業技術総合研究所 合成炉
WO2012081600A1 (ja) * 2010-12-15 2012-06-21 独立行政法人産業技術総合研究所 カーボンナノチューブの製造装置および製造方法
JPWO2012081600A1 (ja) * 2010-12-15 2014-05-22 独立行政法人産業技術総合研究所 カーボンナノチューブの製造装置および製造方法
JP2012126599A (ja) * 2010-12-15 2012-07-05 Nippon Zeon Co Ltd カーボンナノチューブ配向集合体の製造方法
JPWO2013027797A1 (ja) * 2011-08-24 2015-03-19 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置及び製造方法
US10046969B2 (en) 2011-08-24 2018-08-14 Zeon Corporation Device for manufacturing and method for manufacturing oriented carbon nanotube aggregates
WO2014097624A1 (ja) * 2012-12-20 2014-06-26 日本ゼオン株式会社 カーボンナノチューブの製造方法
JPWO2014097624A1 (ja) * 2012-12-20 2017-01-12 日本ゼオン株式会社 カーボンナノチューブの製造方法
JP2016069212A (ja) * 2014-09-29 2016-05-09 日本ゼオン株式会社 カーボンナノチューブ配向集合体の製造装置
JP2016113308A (ja) * 2014-12-11 2016-06-23 大陽日酸株式会社 カーボンナノ材料製造装置、及びカーボンナノ材料製造方法

Also Published As

Publication number Publication date
JP2013047178A (ja) 2013-03-07
US20100062157A1 (en) 2010-03-11
JPWO2008096699A1 (ja) 2010-05-20
US8455050B2 (en) 2013-06-04
JP5594704B2 (ja) 2014-09-24
JP5339281B2 (ja) 2013-11-13

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